WO2019056682A1 - 显示面板及其制造方法 - Google Patents
显示面板及其制造方法 Download PDFInfo
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- WO2019056682A1 WO2019056682A1 PCT/CN2018/073768 CN2018073768W WO2019056682A1 WO 2019056682 A1 WO2019056682 A1 WO 2019056682A1 CN 2018073768 W CN2018073768 W CN 2018073768W WO 2019056682 A1 WO2019056682 A1 WO 2019056682A1
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- substrate
- spacer
- display panel
- layer
- color filter
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
Definitions
- the present application relates to a manufacturing method, and in particular to a display panel and a method of fabricating the same.
- the display panel comprises two opposite substrates, which may be an active switch array substrate and a color filter substrate, or a combination of an array substrate combined with a color filter and a counter substrate.
- a spacer Photo Spacer
- a spacer must be provided between the two substrates to maintain a fixed gap between the two substrates.
- the spacer has another design, a double-segment difference spacer design. That is, the spacer is divided into a main spacer (main PS) and a secondary spacer (sub PS), generally the main spacer plays a supporting role, the auxiliary spacer is suspended, and when the display panel is squeezed, the auxiliary spacer starts. Supporting role.
- main PS main spacer
- sub PS secondary spacer
- film layer stacking mode the step difference between the main spacer and the auxiliary spacer is realized by an active switch array (Array) with a pad height and a main spacer.
- the step difference between the main spacer and the auxiliary spacer is the sum of the thicknesses of the metal layer (M2), the doped semiconductor layer (N+), and the semiconductor layer (a-Si).
- M2 the metal layer
- N+ the doped semiconductor layer
- a-Si the semiconductor layer
- the spacer is easily interfered by the stacking portion, and the substrate cannot be restored from the offset.
- the main spacer and the auxiliary spacer are formed with a step when they are formed.
- the step difference between the main spacer and the auxiliary spacer is too small, and the liquid crystal margin (LC margin) of the liquid crystal display panel is relatively low and too small, and the mass production benefit is relatively small. Lower.
- an object of the present application is to provide a display panel and a method of manufacturing the same, which can increase the step difference of the main and auxiliary spacers of the display panel without significantly changing the existing production process.
- a display panel includes: a first substrate, a plurality of active switches formed on the first substrate; and a second substrate disposed opposite the first substrate, including a plurality of a plurality of pixel regions of the second substrate and a plurality of pixel regions of the first substrate; the two electrode layers are respectively formed on a surface of the first substrate opposite to the second substrate; a color filter layer on one of the first substrate and the second substrate; a plurality of photo spacers between the first substrate and the second substrate, the plurality of photo spacers including a spacer and a second spacer, the color filter layer including a first portion positioned relative to the first spacer and a second portion positioned relative to the second spacer, the first portion and The height of the second portion is different, and the sum of the heights of the first spacer and the first portion is greater than the sum of the heights of the second spacer and the second portion.
- the first substrate is an active switch array substrate
- the color filter layer is formed on the second substrate
- the first portion and the second portion are An active switch of a substrate is disposed oppositely
- the first spacer is formed between the first portion and an active switch of the first substrate
- the second spacer is formed at the second portion and is The active switch of the first substrate is disposed oppositely.
- the color filter layer includes a plurality of color resist layers, and the first spacers and the second spacers are disposed in the same color, different or partially identical colors. Resistance layer.
- the plurality of color resist layers include three red color resist layers, a blue resist layer and a green resist layer; or the plurality of color resist layers include four different layers.
- the first substrate is an active switch array substrate
- the color filter layer is formed on the first substrate
- the second substrate includes a light shielding layer
- the first portion and the The second portion is disposed opposite to the light shielding layer
- the first spacer is formed between the first portion and the light shielding layer
- the second spacer is formed on the light shielding layer and The second portion is disposed oppositely.
- the first portion is in a convex shape.
- the second portion is in a concave shape.
- the second object of the present application is a display panel, comprising: a first substrate, forming a plurality of active switches on the first substrate; a second substrate disposed opposite the first substrate; a color filter layer, Formed on one of the first substrate and the second substrate; two electrode layers are respectively formed on a surface of the first substrate opposite to the second substrate; a plurality of photo spacers are located on the first substrate Between the second substrate and the second substrate; wherein the plurality of photo spacers comprise a first spacer and a second spacer, the color filter layer including a first portion of the position relative to the first spacer Positioning the second portion of the second spacer with the color filter layer at the first portion and the second portion as a concave-convex surface, wherein a height of the first portion is greater than the second portion The height of the first spacer and the first portion is greater than the sum of the heights of the second spacer and the second portion.
- Another object of the present application is a method of manufacturing a display panel, comprising: providing a first substrate and a second substrate disposed opposite to each other; forming an active switch and the first substrate; and forming a color filter layer on the first One of the substrate and the second substrate, the color filter layer includes a first portion and a second portion, and the heights of the first portion and the second portion are different; forming two electrode layers on the first a surface of the substrate opposite to the second substrate; forming a plurality of photo spacers between the first substrate and the second substrate, the plurality of photo spacers including a position relative to the first portion a first spacer and a second spacer at a position relative to the second portion, a sum of heights of the first spacer and the first portion being greater than a sum of heights of the second spacer and the second portion .
- the first substrate is an active switch array substrate
- the color filter layer is formed on the second substrate
- the first portion and the second portion are An active switch of a substrate is disposed oppositely
- the first spacer is formed between the first portion and an active switch of the first substrate
- the second spacer is formed at the second portion and is The active switch of the first substrate is disposed oppositely.
- the color filter layer includes a plurality of color resist layers, and the first spacers and the second spacers are disposed in the same color, different or partially identical colors. Resistance layer.
- the plurality of color resist layers include three red color resist layers, a blue resist layer and a green resist layer; or the plurality of color resist layers include four different layers.
- the first substrate is an active switch array substrate
- the color filter layer is formed on the first substrate
- the second substrate includes a light shielding layer
- the first portion and the The second portion is disposed opposite to the light shielding layer
- the first spacer is formed between the first portion and the light shielding layer
- the second spacer is formed on the light shielding layer and The second portion is disposed oppositely.
- the first portion is in a convex shape.
- the second portion is in a concave shape.
- the application can increase the step difference of the main and auxiliary spacers of the display panel by the difference of the surface height difference of the color resist and the height difference of the spacer itself without significantly changing the existing production process, and the step difference of the spacer does not need to stack different films.
- the layer can reduce the interference of the spacer by the stacking part and cause the substrate to be unable to be restored from the offset situation.
- the liquid crystal margin of the liquid crystal display panel can be improved and the mass production yield can be improved by the difference in the height difference between the main and auxiliary spacers.
- Figure 1a is a schematic cross-sectional view of an exemplary display panel.
- Figure 1b is a schematic cross-sectional view of a fabrication in an exemplary display panel.
- Figure 1c is a simplified schematic of a first spacer step configuration in an exemplary display panel.
- FIG. 1d is a simplified view of a second spacer segment configuration in an exemplary display panel
- FIG. 2 is a cross-sectional view showing the application of a color resistive layer bump structure to a display panel in accordance with the method of the present application.
- FIG 3 is a schematic cross-sectional view showing a recessed structure of a color resist layer applied to a display panel in accordance with the method of the present application.
- FIG. 4 is a cross-sectional view showing the application of a color resist layer bump structure to an array substrate in accordance with the method of the present application.
- FIG. 5 is a cross-sectional view showing the application of a color resist layer bump structure to an array substrate in accordance with the method of the present application.
- FIG. 6 is a schematic cross-sectional view showing a high-resistance structure in which a color resist layer raised structure is combined with a stacked film layer to form a composite pad high structure according to the method of the present application.
- FIG. 7 is a schematic cross-sectional view showing a high-resistance structure of a color resist layer recessed structure in combination with a stacked film layer in accordance with the method of the present application.
- FIG. 8 is a block diagram showing the structure of a display device according to an embodiment of the present application.
- the word “comprising” is to be understood to include the component, but does not exclude any other component.
- “on” means located above or below the target component, and does not mean that it must be on the top based on the direction of gravity.
- FIG. 1a is a schematic cross-sectional view of an exemplary display panel
- FIG. 1b is a schematic cross-sectional view of an exemplary display panel
- FIG. 1c is a schematic view of a first spacer segment configuration in an exemplary display panel
- FIG. A brief is configured for the second spacer segment difference in the exemplary display panel.
- a double-gap transflective MVA liquid crystal display is taken as an example.
- the double-gap half-transflective liquid crystal display is provided with an adjustment layer 208 in the reflection region R.
- the adjustment layer may be disposed on the color filter layer substrate side or the thin film transistor substrate side.
- FIG. 1a the adjustment layer may be disposed on the color filter layer substrate side or the thin film transistor substrate side.
- the basic structure of the double gap transflective MVA liquid crystal display comprises a first substrate 10, a second substrate 20 and a liquid crystal layer 30.
- the first substrate 10 has a plurality of pixel regions 110, and each of the pixel regions 110 is provided with a reflective region R and a penetrating region T.
- the second substrate 20 includes a color filter layer 210 having a color resist layer 202 having a plurality of pixel regions 120 thereon, the pixel regions 120 respectively corresponding to the plurality of pixel regions 110 of the first substrate, and each pixel The region 120 is provided with an adjustment layer 208 at a position corresponding to the reflection region R.
- the liquid crystal layer 30 is disposed between the first substrate 10 and the second substrate 20.
- the active array switch is disposed in each pixel region 110 of the first substrate 10 (for example, a thin film transistor, but not limited thereto), and a storage capacitor 308 is reflected.
- a flat layer 104 is then formed on the upper surface of the first substrate 10. Then, a surface having irregularities is formed on the flat layer 104 in the reflective region R, and a metal having high reflectance (for example, aluminum, silver, etc.) is plated as a reflective electrode, and a penetration region T of each of the pixel regions 110 is formed.
- a transparent electrode 114 is also provided.
- the reflective region R of each pixel region 110 of the first substrate 10 further has a contact hole 310 for electrically connecting the reflective electrode and the storage capacitor 308.
- the color filter layer 210 is further provided with an alignment protrusion 122 (PR) for the position of the reflection area R and the penetration area T of the first substrate 10. Since the alignment protrusions 122 change the distribution of the power lines, the liquid crystal molecules are tilted in the direction of the alignment protrusions 122 to produce multi-domain liquid crystal alignment (Multi-domains), thereby achieving a wide viewing angle technique and improving single-region liquid crystals. The problem of grayscale inversion when there is a single-domain. As shown in FIG.
- the color filter layer 210 is further provided with a photo spacer (PS) 300 to fix the pitch of the panel (Cell Gap).
- PS photo spacer
- a plurality of platforms corresponding to the spacers 300 are designed on the side of the first substrate 10, so that the photo spacers 300 can maintain the panel pitch more stably.
- the inter-substrate is designed with a double-segment difference spacer.
- the spacer 300 region is designed as a main spacer (main PS) 301 and a secondary spacer (sub PS) 302.
- main spacer 301 and the auxiliary spacer 302 are formed, there is a step difference.
- main spacer 301 plays a supporting role
- auxiliary spacer 302 is suspended.
- the auxiliary spacer 302 plays a supporting role.
- the step difference between the main spacer 301 and the auxiliary spacer 302 is generally realized by an active switch array (Array) which is disposed opposite to the main spacer 301. Therefore, the step difference between the main spacer 301 and the auxiliary spacer 302 is an active switch including a sum of thicknesses of a metal layer (M2) 111, a doped semiconductor layer (N+) 112, a semiconductor layer (a-Si) 113, and the like.
- M2 metal layer
- N+ doped semiconductor layer
- a-Si semiconductor layer
- the reflective wide viewing angle display panel is taken as an example, the scope of application of the present application is not limited thereto. It is more applicable to the case of a double-gap half-transparent display panel and a single-gap half-transparent display panel.
- the display panel 300 includes a first substrate 10 and a plurality of active switches formed on the first substrate 10 .
- the first substrate 10 includes: a first substrate 100; a first insulating layer 102 is formed on the first substrate 100; and a first electrode 106 is formed on the first insulating layer 102.
- the second substrate 20 is disposed opposite to the first substrate 10.
- the second substrate 20 includes a plurality of pixel regions, and the plurality of pixel regions of the second substrate 20 and the plurality of pixel regions of the first substrate 10 correspond to each other.
- the color filter layer 210 includes a plurality of color resist layers formed on one of the first substrate 10 and the second substrate 20. A plurality of photo spacers are located between the first substrate 10 and the second substrate 20.
- the plurality of photo spacers includes a first spacer 301 and a second spacer 302.
- the color filter layer 210 includes a first portion 211 and a second portion 212, and the position of the first portion 211 is opposite to
- the first spacer 301 is located at a position different from the second spacer 302, and the heights of the first portion 211 and the second portion 212 are different, and the first interval is different.
- the sum of the heights of the object 301 and the first portion 211 is greater than the sum of the heights of the second spacer 302 and the second portion 212, thereby forming a relatively distinct step.
- the first substrate 10 is an active switch array substrate
- the second substrate 20 includes: a second substrate 200; a color filter layer 210 on the second substrate 200; and a second electrode 204 is located on the color filter layer 210.
- the first portion 211 and the second portion 212 are disposed opposite to the active switch of the first substrate 10, and the first spacer 301 is formed on the first portion 211 and the first substrate Between the active switches of 10, the second spacers 302 are formed on the second portion 212 and are disposed opposite to the active switches of the first substrate 10.
- the color filter layer 210 includes a plurality of color resist layers including three red color resist layers, blue resist layers and green resist layers; or The plurality of color resist layers include four red color resist layers, blue resist layers, green resist layers and white resist layers of different colors, but are not limited thereto.
- the first spacer 301 and the second spacer 302 are disposed on the same, different or partially identical color resist layers.
- the height of the first portion 211 is greater than the height of the second portion 212.
- the first portion 211 is in the shape of a bump.
- the second substrate 20 further includes a light shielding layer (for example, Black Matrix, BM) 205, substantially directly above the photo spacer.
- a light shielding layer for example, Black Matrix, BM
- FIG. 3 is a schematic cross-sectional view showing a recessed structure of a color resist layer applied to a display panel in accordance with the method of the present application.
- the difference from that shown in Figure 2 is that the second portion 212 is a concave shape.
- the first substrate 10 is an active switch array substrate
- the color filter layer 210 is formed on the first substrate 10
- the second substrate 20 includes a light shielding layer 205
- the first portion 211 and the second portion 212 are disposed opposite to the light shielding layer 205
- the first spacer 301 is formed between the first portion 211 and the light shielding layer 205
- the second spacer 302 is formed on the light shielding layer 205 and disposed opposite to the second portion 212.
- the first portion 211 is in the shape of a bump.
- FIG. 5 is a cross-sectional view showing the application of a color resist layer bump structure to an array substrate in accordance with the method of the present application.
- the difference from that shown in Figure 4 is that the second portion 212 is a concave shape.
- the first substrate 10 is an active switch array substrate
- the color filter layer 210 is formed on the second substrate 20
- the first portion 211 and the second portion 212 are The active switch of the first substrate 10 is disposed oppositely
- the first portion 211 is in the shape of a bump.
- the first spacer 301 is formed between the first portion 211 and an active switch of the first substrate 10
- the second spacer 302 is formed on the second portion 212 and the first substrate
- the active switch of 10 is the opposite setting.
- the step difference between the main spacer 301 and the auxiliary spacer 302 is a stacked film layer of the active switch, including the heights of the metal layer (M2) 111, the doped semiconductor layer (N+) 112, the semiconductor layer (a-Si) 113, and the like.
- the height difference between the first portion 211 and the second portion 212 is the sum of the two.
- FIG. 7 is a schematic cross-sectional view showing a high-resistance structure of a color resist layer recessed structure in combination with a stacked film layer in accordance with the method of the present application.
- the difference from that shown in Figure 6 is that the second portion 212 is a concave shape.
- a method of manufacturing a display panel of the present application includes: providing a first substrate 10 and a second substrate 20 disposed opposite to each other; forming a color filter layer 210 on the first substrate 10 and In one of the second substrates 20, the color filter layer 210 includes a first portion 211 and a second portion 212, and the heights of the first portion 211 and the second portion 212 are different; forming two electrode layers (106, 204) on a surface of the first substrate 10 opposite to the second substrate 20; forming a plurality of photo spacers between the first substrate 10 and the second substrate 20, the plurality of The photo spacer includes a first spacer 301 positioned at a position relative to the first portion 211 and a second spacer 302 positioned at a position relative to the second portion 212, the first spacer 301 and the first portion 211 The sum of the heights is greater than the sum of the heights of the second spacer 302 and the second portion 212.
- FIG. 8 is a block diagram showing the structure of a display device according to an embodiment of the present application.
- a display device 400 of the present application includes: a control unit 410, and further includes any one of the foregoing embodiments.
- the display panel of the present application includes a liquid crystal display panel including a first substrate 10 and a second substrate 20 and a liquid crystal layer 30 formed between the two substrates.
- the first substrate 10 and the second substrate 20 can be, for example, an active switch array (nowadays)
- the process is mostly Thin Film Transistor (TFT); but not limited to) substrate, color filter (CF) substrate.
- TFT Thin Film Transistor
- CF color filter
- the active switch array and the color filter layer of the present application may also be formed on the same substrate.
- the display panel of the present application includes a liquid crystal display panel, but is not limited thereto, and may also be an OLED display panel, a W-OLED display panel, a QLED display panel, a plasma display panel, and a curved display panel. Or other types of display panels.
- the application can increase the step difference of the main and auxiliary spacers of the display panel by the difference of the surface height difference of the color resist and the height difference of the spacer itself without significantly changing the existing production process, and the step difference of the spacer does not need to stack different films.
- the layer can reduce the interference of the spacer by the stacking part and cause the substrate to be unable to be restored from the offset situation.
- the liquid crystal margin of the liquid crystal display panel can be improved and the mass production yield can be improved by the difference in the height difference between the main and auxiliary spacers.
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Abstract
一种显示面板及其制造方法。显示面板,包括:对向设置的第一基板(10)与第二基板(20);形成于第一基板(10)及第二基板(20)之一的彩色滤光层(210),彩色滤光层(210)包括高度相异的第一部位(211)与第二部位(212);两电极层(106,204),分别形成于第一基板(10)与第二基板(20)相对的表面;光间隔物包括位置相对于第一部位(211)的第一间隔物(301)与位置相对于第二部位(212)的第二间隔物(302),第一间隔物(301)及第一部位(211)的高度总和大于第二间隔物(302)与第二部位(212)的高度总和。
Description
本申请涉及一种制造方式,特别是涉及一种显示面板及其制造方法。
随着科技进步,具有省电、无幅射、体积小、低耗电量、平面直角、高分辨率、画质稳定等多项优势的显示器,尤其是现今各式信息产品如:手机、笔记本电脑、数字相机、PDA、屏幕等产品越来越普及,也使得显示面板的需求量大大提升。因此如何提升生产制程效率与及产品良率,将是经营者须面对的问题。
显示面板包括相对设置的两基板构成,其可为主动开关阵列基板与彩色滤光片基板,或是结合彩色滤光片的阵列基板结合对向基板的组合。为了确保稳定的显示品质,两基板之间必须设置间隔物(Photo Spacer),以使两基板之间维持固定的间隙(gap)。
为了增加显示面板对外力按压的容忍度,公知间隔物具有另一种设计,双段差间隔物设计。即是将间隔物区分为主间隔物(main PS)和辅间隔物(sub PS),一般是主间隔物起支撑作用,辅间隔物悬空,当显示面板受到挤压时,辅间隔物才起支撑作用。实现方式主要有两种:(1)膜层堆叠方式,主间隔物和辅间隔物的段差是通过垫高与主间隔物相对设置的主动开关阵列(Array)来实现。所以主间隔物和辅间隔物的段差是金属层(M2)、掺杂半导体层(N+)、半导体层(a-Si)的厚度总和。此种设计里,间隔物容易受堆叠部位的干涉而造成基板无法自偏移情形还原。(2)主间隔物和辅间隔物在制成时就形成有段差。然而,此种设计应用在液晶显示面板时,会使得主间隔物和辅间隔物之间的段差太小,造成液晶显示面板的液晶裕度(LC margin)相对较低太小,量产效益相对较低。
发明内容
为了解决上述技术问题,本申请的目的在于,提供一种显示面板及其制造方法,不仅可以在不大幅改变现有生产流程的前提,增加显示面板的主、辅间隔物的段差。
本申请的目的及解决其技术问题是采用以下技术方案来实现的。依据本申请提出的一种显示面板,所述显示面板,包括:第一基板,形成多个主动开关于所述第一基板;与所述第一基板对向设置的第二基板,包括多个像素区,所述第二基板的多个像素区与所述第一基板的多个像素区相互对应;两电极层,分别形成于所述第一基板与所述第二基板相对的表面;形成于所述第一基板及所述第二基板之一的彩色滤光层;位于所述第一基板与所述第二基板之间的多个光间隔物,所述多个光间隔物包括第一间隔物与第二间隔物,所述彩色滤光层包括位置相对于所述第一间隔物的第一部位 与位置相对于所述第二间隔物的第二部位,所述第一部位与所述第二部位的高度为相异,所述第一间隔物及所述第一部位的高度总和大于所述第二间隔物与所述第二部位的高度总和。
本申请解决其技术问题还可采用以下技术措施进一步实现。
在本申请的一实施例中,所述第一基板为主动开关阵列基板,所述彩色滤光层形成于所述第二基板,所述第一部位与所述第二部位是与所述第一基板的主动开关为对向设置,所述第一间隔物形成于所述第一部位与所述第一基板的主动开关之间,所述第二间隔物形成于所述第二部位并与所述第一基板的主动开关为对向设置。
在本申请的一实施例中,所述彩色滤光层包括多个色阻层,所述第一间隔物与所述第二间隔物设置于相同、相异或局部相同的所述多个色阻层。
在本申请的一实施例中,所述多个色阻层包括三个相异颜色的红色阻层、蓝色阻层与绿色阻层;或,所述多个色阻层包括四个相异颜色的红色阻层、蓝色阻层、绿色阻层与白色阻层。
在本申请的一实施例中,所述第一基板为主动开关阵列基板,所述彩色滤光层形成于所述第一基板,所述第二基板包括遮光层,所述第一部位与所述第二部位是与所述遮光层为对向设置,所述第一间隔物形成于所述第一部位与所述遮光层之间,所述第二间隔物形成于所述遮光层并与所述第二部位为对向设置。
在本申请的一实施例中,所述第一部位为凸块形状。
在本申请的一实施例中,所述第二部位为凹陷形状。
本申请的次一目的为一种显示面板,其中包括:第一基板,形成多个主动开关于所述第一基板;第二基板,与所述第一基板对向设置;彩色滤光层,形成于所述第一基板及所述第二基板之一;两电极层,分别形成于所述第一基板与所述第二基板相对的表面;多个光间隔物,位于所述第一基板与所述第二基板之间;其中,所述多个光间隔物包括第一间隔物与第二间隔物,所述彩色滤光层包括位置相对于所述第一间隔物的第一部位与位置相对于所述第二间隔物的第二部位,所述彩色滤光层位于所述第一部位与所述第二部位为凹凸表面,其中所述第一部位的高度大于所述第二部位的高度,所述第一间隔物及所述第一部位的高度总和大于所述第二间隔物与所述第二部位的高度总和。
本申请的另一目的为一种显示面板的制造方法,包括:提供对向设置的第一基板与第二基板;形成主动开关与所述第一基板;形成彩色滤光层于所述第一基板及所述第二基板之一,所述彩色滤光层包括第一部位与第二部位,所述第一部位与所述第二部位的高度为相异;形成两电极层于所述第一基板与所述第二基板相对的表面;形成多个光间隔物于所述第一基板与所述第二基板之间,所述多个光间隔物包括位置相对于所述第一部位的第一间隔物及位置相对于所述第二部位的第二间隔物,所述第一间隔物及所述第一部位的高度总和大于所述第二间隔物与所述第二部位的高度总 和。
在本申请的一实施例中,所述第一基板为主动开关阵列基板,所述彩色滤光层形成于所述第二基板,所述第一部位与所述第二部位是与所述第一基板的主动开关为对向设置,所述第一间隔物形成于所述第一部位与所述第一基板的主动开关之间,所述第二间隔物形成于所述第二部位并与所述第一基板的主动开关为对向设置。
在本申请的一实施例中,所述彩色滤光层包括多个色阻层,所述第一间隔物与所述第二间隔物设置于相同、相异或局部相同的所述多个色阻层。
在本申请的一实施例中,所述多个色阻层包括三个相异颜色的红色阻层、蓝色阻层与绿色阻层;或,所述多个色阻层包括四个相异颜色的红色阻层、蓝色阻层、绿色阻层与白色阻层。
在本申请的一实施例中,所述第一基板为主动开关阵列基板,所述彩色滤光层形成于所述第一基板,所述第二基板包括遮光层,所述第一部位与所述第二部位是与所述遮光层为对向设置,所述第一间隔物形成于所述第一部位与所述遮光层之间,所述第二间隔物形成于所述遮光层并与所述第二部位为对向设置。
在本申请的一实施例中,所述第一部位为凸块形状。
在本申请的一实施例中,所述第二部位为凹陷形状。
本申请可以在不大幅改变现有生产流程的前提,通过色阻的表面高度差异结合间隔物本身的高度差异,增加显示面板的主、辅间隔物的段差,间隔物的段差不需堆叠不同膜层,故能降低间隔物受堆叠部位的干涉而造成基板无法自偏移情形还原的情形。其次,用于液晶显示面板时,通过主、辅间隔物的明显高度段差,较能提升液晶显示面板的液晶裕度,改善量产良率。
图1a为范例性的显示面板中横截面示意图。
图1b为范例性的显示面板中的制造横截面示意图。
图1c为范例性的显示面板中的第一种间隔物段差配置简意图。
图1d为范例性的显示面板中的第二种间隔物段差配置简意图
图2为显示依据本申请的方法,一色阻层凸起结构应用于显示面板的横截面示意图。
图3为显示依据本申请的方法,一色阻层凹陷结构应用于显示面板的横截面示意图。
图4为显示依据本申请的方法,一色阻层凸起结构应用于阵列基板的横截面示意图。
图5为显示依据本申请的方法,一色阻层凸起结构应用于阵列基板的横截面示意图。
图6为显示依据本申请的方法,一色阻层凸起结构结合堆叠膜层形成复合垫高结构的横截面示意图。
图7为显示依据本申请的方法,一色阻层凹陷结构结合堆叠膜层形成复合垫高结构的横截面示意图。
图8为显示依据本申请的方法,一实施例的显示装置的架构示意图。
以下各实施例的说明是参考附加的图式,用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语,例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本申请,而非用以限制本申请。
附图和说明被认为在本质上是示出性的,而不是限制性的。在图中,结构相似的单元是以相同标号表示。另外,为了理解和便于描述,附图中示出的每个组件的尺寸和厚度是任意示出的,但是本申请不限于此。
在附图中,为了清晰起见,夸大了层、膜、面板、区域等的厚度。在附图中,为了理解和便于描述,夸大了一些层和区域的厚度。将理解的是,当例如层、膜、区域或基底的组件被称作“在”另一组件“上”时,所述组件可以直接在所述另一组件上,或者也可以存在中间组件。
另外,在说明书中,除非明确地描述为相反的,否则词语“包括”将被理解为意指包括所述组件,但是不排除任何其它组件。此外,在说明书中,“在......上”意指位于目标组件上方或者下方,而不意指必须位于基于重力方向的顶部上。
为更进一步阐述本申请为达成预定发明目的所采取的技术手段及功效,以下结合附图及具体实施例,对依据本申请提出的一种显示面板及其制造方法,其具体实施方式、结构、特征及其功效,详细说明如后。
图1a为范例性的显示面板中横截面示意图、图1b为范例性的显示面板中的制造横截面示意图、图1c为范例性的显示面板中的第一种间隔物段差配置简意图、图1d为范例性的显示面板中的第二种间隔物段差配置简意图。请参照图1a及图1b,以双间隙(Dual Gap)的半穿半反MVA液晶显示器为例。通常双间隙的半穿半反液晶显示器会在反射区R设置一个调整层208,如图1a所示,此调整层可以设置在彩色滤光层基板侧或薄膜晶体管基板侧。如图1a所示,双间隙半穿半反MVA液晶显示器的基本结构包括一第一基板10、一第二基板20及一液晶层30。其中,第一基板10具有多个像素区110,每一个像素区110均设有一反射区R以及一穿透区T。第二基板20包括彩色滤光层210,具有色阻层202,其上也具有多个像素区120,所述像素区120分别与第一基板的多个像素区110相对应,且每一个像素区120在与反射区R相对应的位置处均设有一调整层208。液晶层30则设于第一基板10与第二基板20之间。
请继续参考图1a、图1b与图1c,第一基板10的各个像素区110内都设有主动阵列开关(以薄 膜晶体管为例,但不以此为限),以及一储存电容308于反射区R的下方。接着形成一平坦层104于第一基板10的上表面。然后在平坦层104上制作出凹凸的表面于反射区R,再镀上具有高反射率的金属(例如:铝、银…等)当作反射电极,同时每一个像素区110的穿透区T也均设有一透明电极114。值得一提的是,第一基板10的各像素区110的反射区R内更具有一接触孔310,用以电性连接反射电极与储存电容308。另外,彩色滤光层210相对于第一基板10的反射区R与穿透区T的位置上更设有一配向凸起物122(Protrusion,简称PR)。由于配向凸起物122会改变电力线的分布,使得液晶分子往配向凸起物122的方向倾斜以产生多区域液晶配向(Multi-domains)的效果,而达到广视角的技术,并改善单一区域液晶配向(Single-domain)时所存在的灰阶反转的问题。如图1b所示,通常在组立第一基板10与第二基板20时,彩色滤光层210更设有光间隔物(Photo Spacer,简称PS)300来固定面板的间距(Cell Gap),在第一基板10侧设计多个与间隔物300相对应的平台,使光间隔物300能够更稳定的维持面板间距。
为提升显示面板的按压容忍度,将间介物以双段差间隔物设计。第一种如图1c所示,将间隔物300区设计成主间隔物(main PS)301和辅间隔物(sub PS)302,主间隔物301与辅间隔物302在形成时即有段差,一般是主间隔物301起支撑作用,辅间隔物302悬空,当显示面板受到挤压时,辅间隔物302才起支撑作用。
第二种如图1d绘示,主间隔物301和辅间隔物302的段差一般是通过垫高与主间隔物301相对设置的主动开关阵列(Array)来实现。所以主间隔物301和辅间隔物302的段差是主动开关,包括金属层(M2)111、掺杂半导体层(N+)112、半导体层(a-Si)113等结构的厚度总和。
以上所述,虽以反射式广视角显示面板为例来作一说明,但本申请的应用范围并不仅限于此。其更可应用于双间隙半穿半反显示面板以及单间隙半穿半反显示面板的情况。
图2为显示依据本申请的方法,一色阻层凸起结构应用于显示面板的横截面示意图。请参照图2,在本申请一实施例中,所述一种显示面板300,包括:第一基板10,形成多个主动开关于所述第一基板10。所述第一基板10包括:第一基底100;第一绝缘层102形成于所述第一基底100上;以及第一电极106形成于所述第一绝缘层102上。第二基板20,与所述第一基板10对向设置。第二基板20包括多个像素区,所述第二基板20的多个像素区与所述第一基板10的多个像素区相互对应。彩色滤光层210,包括多个色阻层,形成于所述第一基板10及所述第二基板20之一。多个光间隔物,位于所述第一基板10与所述第二基板20之间。
其中,所述多个光间隔物包括第一间隔物301与第二间隔物302,所述彩色滤光层210包括第一部位211与第二部位212,所述第一部位211的位置相对于所述第一间隔物301,所述第二部位212的位置相对于所述第二间隔物302,所述第一部位211与所述第二部位212的高度为相异,所 述第一间隔物301及所述第一部位211的高度总和大于所述第二间隔物302与所述第二部位212的高度总和,从而形成相对明显的段差。
在一些实施例中,所述第一基板10为主动开关阵列基板,所述第二基板20包括:第二基底200;彩色滤光层210,位于所述第二基底200上;以及第二电极204,位于所述彩色滤光层210上。所述第一部位211与所述第二部位212是与所述第一基板10的主动开关为对向设置,所述第一间隔物301形成于所述第一部位211与所述第一基板10的主动开关之间,所述第二间隔物302形成于所述第二部位212并与所述第一基板10的主动开关为对向设置。
在一些实施例中,所述彩色滤光层210包括多个色阻层,所述多个色阻层包括三个相异颜色的红色阻层、蓝色阻层与绿色阻层;或,所述多个色阻层包括四个相异颜色的红色阻层、蓝色阻层、绿色阻层与白色阻层,然不限于此。所述第一间隔物301与所述第二间隔物302设置于相同、相异或局部相同的所述多个色阻层。
在一些实施例中,所述第一部位211的高度大于所述第二部位212的高度。
在一些实施例中,所述第一部位211为凸块形状。
在一些实施例中,所述第二基板20更包括一遮光层(举例为黑色矩阵Black Matrix,BM)205,大体位于所述光间隔物正上方。
图3为显示依据本申请的方法,一色阻层凹陷结构应用于显示面板的横截面示意图。在一些实施例中,与图2所示不同在于,所述第二部位212为凹陷形状。
图4为显示依据本申请的方法,一色阻层凸起结构应用于阵列基板的横截面示意图。在一些实施例中,所述第一基板10为主动开关阵列基板,所述彩色滤光层210形成于所述第一基板10,所述第二基板20包括遮光层205,所述第一部位211与所述第二部位212是与所述遮光层205为对向设置,所述第一间隔物301形成于所述第一部位211与所述遮光层205之间,所述第二间隔物302形成于所述遮光层205并与所述第二部位212为对向设置。在一些实施例中,所述第一部位211为凸块形状。
图5为显示依据本申请的方法,一色阻层凸起结构应用于阵列基板的横截面示意图。在一些实施例中,与图4所示不同在于,所述第二部位212为凹陷形状。
图6为显示依据本申请的方法,一色阻层凸起结构结合堆叠膜层形成复合垫高结构的横截面示意图。在一些实施例中,所述第一基板10为主动开关阵列基板,所述彩色滤光层210形成于所述第二基板20,所述第一部位211与所述第二部位212是与所述第一基板10的主动开关为对向设置,所述第一部位211为凸块形状。所述第一间隔物301形成于所述第一部位211与所述第一基板10的主动开关之间,所述第二间隔物302形成于所述第二部位212并与所述第一基板10的主动开关 为对向设置。所以主间隔物301和辅间隔物302的段差是主动开关的堆叠膜层,包括金属层(M2)111、掺杂半导体层(N+)112、半导体层(a-Si)113等结构的高度,再加上第一部位211与第二部位212高度差,两者的总和。
图7为显示依据本申请的方法,一色阻层凹陷结构结合堆叠膜层形成复合垫高结构的横截面示意图。在一些实施例中,与图6所示不同在于,所述第二部位212为凹陷形状。
在本申请一实施例中,本申请的一种显示面板的制造方法,包括:提供对向设置的第一基板10与第二基板20;形成彩色滤光层210于所述第一基板10及所述第二基板20之一,所述彩色滤光层210包括第一部位211与第二部位212,所述第一部位211与所述第二部位212的高度为相异;形成两电极层(106,204)于所述第一基板10与所述第二基板20相对的表面;形成多个光间隔物于所述第一基板10与所述第二基板20之间,所述多个光间隔物包括位置相对于所述第一部位211的第一间隔物301及位置相对于所述第二部位212的第二间隔物302,所述第一间隔物301及所述第一部位211的高度总和大于所述第二间隔物302与所述第二部位212的高度总和。
图8为显示依据本申请的方法,一实施例的显示装置的架构示意图。在本申请一实施例中,本申请的一种显示装置400,其包括:控制部件410,还包括前述各实施例中的任一种显示面板300。
本申请的显示面板包括液晶显示面板,其包括第一基板10及第二基板20与形成于两基板之间的液晶层30,第一基板10及第二基板20可例如为主动开关阵列(现今制程多以薄膜晶体管Thin Film Transistor,TFT;但不以此为限)基板、彩色滤光层(Color Filter,CF)基板。然不限于此,在一实施例中,本申请的主动开关阵列及彩色滤光层亦可形成于同一基板上。
在一些实施例中,本申请的所述显示面板包括液晶显示面板,然不限于此,其亦可为OLED显示面板,W-OLED显示面板,QLED显示面板,等离子体显示面板,曲面型显示面板或其他类型显示面板。
本申请可以在不大幅改变现有生产流程的前提,通过色阻的表面高度差异结合间隔物本身的高度差异,增加显示面板的主、辅间隔物的段差,间隔物的段差不需堆叠不同膜层,故能降低间隔物受堆叠部位的干涉而造成基板无法自偏移情形还原的情形。其次,用于液晶显示面板时,通过主、辅间隔物的明显高度段差,较能提升液晶显示面板的液晶裕度,改善量产良率。
“在一些实施例中”及“在各种实施例中”等用语被重复地使用。此用语通常不是指相同的实施例;但它也可以是指相同的实施例。“包含”、“具有”及“包括”等用词是同义词,除非其前后文意显示出其它意思。
以上所述,仅是本申请具体的实施例而已,并非对本申请作任何形式上的限制,虽然本申请已以具体实施例揭露如上,然而并非用以限定本申请,任何熟悉本专业的技术人员,在不脱离本申请 技术方案范围内,当可利用上述揭示的技术内容作出些许更动或修饰为等同变化的等效实施例,但凡是未脱离本申请技术方案的内容,依据本申请的技术实质对以上实施例所作的任何简单修改、等同变化与修饰,均仍属于本申请技术方案的范围内。
Claims (20)
- 一种显示面板,包括:第一基板,形成多个主动开关于所述第一基板;第二基板,与所述第一基板对向设置;彩色滤光层,形成于所述第一基板及所述第二基板之一;两电极层,分别形成于所述第一基板与所述第二基板相对的表面;多个光间隔物,位于所述第一基板与所述第二基板之间;以及其中,所述多个光间隔物包括第一间隔物与第二间隔物,所述彩色滤光层包括位置相对于所述第一间隔物的第一部位与位置相对于所述第二间隔物的第二部位,所述第一部位与所述第二部位的高度为相异,所述第一间隔物及所述第一部位的高度总和大于所述第二间隔物与所述第二部位的高度总和。
- 如权利要求1所述的显示面板,其中,所述彩色滤光层形成于所述第二基板,所述第一部位与所述第二部位是与所述第一基板的主动开关为对向设置,所述第一间隔物形成于所述第一部位与所述第一基板的主动开关之间,所述第二间隔物形成于所述第二部位并与所述第一基板的主动开关为对向设置。
- 如权利要求2所述的显示面板,所述彩色滤光层包括多个色阻层,所述第一间隔物与所述第二间隔物设置于相同、相异或局部相同的所述多个色阻层。
- 如权利要求3所述的显示面板,所述多个色阻层包括三个相异颜色的红色阻层、蓝色阻层与绿色阻层。
- 如权利要求3所述的显示面板,所述多个色阻层包括四个相异颜色的红色阻层、蓝色阻层、绿色阻层与白色阻层。
- 如权利要求1所述的显示面板,其中,所述彩色滤光层形成于所述第一基板,所述第二基板包括遮光层,所述第一部位与所述第二部位是与所述遮光层为对向设置。
- 如权利要求6所述的显示面板,其中,所述第一间隔物形成于所述第一部位与所述遮光层之间。
- 如权利要求6所述的显示面板,其中,所述第二间隔物形成于所述遮光层并与所述第二部位为对向设置。
- 如权利要求1所述的显示面板,其中,所述第一部位为凸块形状。
- 如权利要求1所述的显示面板,其中,所述第二部位为凹陷形状。
- 一种显示面板,包括:第一基板,形成多个主动开关于所述第一基板;第二基板,与所述第一基板对向设置;彩色滤光层,形成于所述第一基板及所述第二基板之一;两电极层,分别形成于所述第一基板与所述第二基板相对的表面;多个光间隔物,位于所述第一基板与所述第二基板之间;以及其中,所述多个光间隔物包括第一间隔物与第二间隔物,所述彩色滤光层包括位置相对于所述第一间隔物的第一部位与位置相对于所述第二间隔物的第二部位,所述彩色滤光层位于所述第一部位与所述第二部位为凹凸表面,其中所述第一部位的高度大于所述第二部位的高度,所述第一间隔物及所述第一部位的高度总和大于所述第二间隔物与所述第二部位的高度总和。
- 一种显示面板的制造方法,包括:提供对向设置的第一基板与第二基板;形成主动开关与所述第一基板;形成彩色滤光层于所述第一基板及所述第二基板之一,所述彩色滤光层包括第一部位与第二部位,所述第一部位与所述第二部位的高度为相异;形成两电极层于所述第一基板与所述第二基板相对的表面;形成多个光间隔物于所述第一基板与所述第二基板之间,所述多个光间隔物包括位置相对于所述第一部位的第一间隔物及位置相对于所述第二部位的第二间隔物,所述第一间隔物及所述第一部位的高度总和大于所述第二间隔物与所述第二部位的高度总和;其中,所述彩色滤光层形成于所述第二基板,所述第一部位与所述第二部位是与所述第一基板的主动开关为对向设置,所述第一间隔物形成于所述第一部位与所述第一基板的主动开关之间,所述第二间隔物形成于所述第二部位并与所述第一基板的主动开关为对向设置。
- 如权利要求12所述的显示面板的制造方法,所述彩色滤光层包括多个色阻层,所述第一间隔物与所述第二间隔物设置于相同、相异或局部相同的所述多个色阻层。
- 如权利要求13所述的显示面板的制造方法,所述多个色阻层包括三个相异颜色的红色阻层、蓝色阻层与绿色阻层。
- 如权利要求13所述的显示面板的制造方法,所述多个色阻层包括四个相异颜色的红色阻层、蓝色阻层、绿色阻层与白色阻层。
- 如权利要求12所述的显示面板的制造方法,其中,所述彩色滤光层形成于所述第一基板,所述第二基板包括遮光层,所述第一部位与所述第二部位是与所述遮光层为对向设置。
- 如权利要求16所述的显示面板的制造方法,其中,所述第一间隔物形成于所述第一部位与所述遮光层之间。
- 如权利要求16所述的显示面板的制造方法,其中,所述第二间隔物形成于所述遮光层并与所述第二部位为对向设置。
- 如权利要求12所述的显示面板的制造方法,其中,所述第一部位为凸块形状。
- 如权利要求12所述的显示面板的制造方法,其中,所述第二部位为凹陷形状。
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CN108931869B (zh) * | 2018-07-17 | 2021-01-08 | 惠科股份有限公司 | 显示面板和显示装置 |
US10747065B2 (en) | 2018-07-17 | 2020-08-18 | HKC Corporation Limited | Display panel and display device |
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CN109283752B (zh) * | 2018-10-30 | 2021-02-12 | 惠科股份有限公司 | 一种显示面板、显示面板的制造方法和显示装置 |
CN109839782B (zh) * | 2018-12-25 | 2021-01-05 | 惠科股份有限公司 | 显示装置及其阵列基板制作方法和计算机可读存储介质 |
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