WO2016173153A1 - 彩膜基板、彩膜基板的制造方法、触摸屏及显示装置 - Google Patents

彩膜基板、彩膜基板的制造方法、触摸屏及显示装置 Download PDF

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Publication number
WO2016173153A1
WO2016173153A1 PCT/CN2015/087257 CN2015087257W WO2016173153A1 WO 2016173153 A1 WO2016173153 A1 WO 2016173153A1 CN 2015087257 W CN2015087257 W CN 2015087257W WO 2016173153 A1 WO2016173153 A1 WO 2016173153A1
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Prior art keywords
touch electrode
transparent substrate
color
metal
substrate
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PCT/CN2015/087257
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English (en)
French (fr)
Inventor
陈启超
王勇
张炜
古成
牛君华
刘正才
Original Assignee
京东方科技集团股份有限公司
重庆京东方光电科技有限公司
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Priority to US14/913,096 priority Critical patent/US9990068B2/en
Publication of WO2016173153A1 publication Critical patent/WO2016173153A1/zh

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    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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Definitions

  • the present invention relates to the field of touch screen technologies, and in particular, to a color film substrate, a method of manufacturing a color film substrate, a touch screen, and a display device.
  • Touch screen technology is an intelligent human-computer interaction input technology. Compared with traditional keyboard and mouse input methods, touch screen input is more intuitive.
  • touch screen input is more intuitive.
  • touch screens mainly comes from the consumer electronics industry, especially mobile phones, portable game consoles, personal digital assistants and portable navigation devices.
  • touch screens There are many types of touch screens, and capacitive in-cell touch screens are one of the most common types.
  • the capacitive in-cell touch screen mainly uses the current sensing of the human body to work.
  • the color film substrate of the capacitive in-cell touch screen usually uses two layers of Indium Tin Oxide (ITO) in the color filter.
  • Touch electrodes are formed on both sides of (Color Filter, CF for short).
  • the backlight 1001, the polarizer 1002, the bottom glass substrate 1003, the thin film field effect transistor 1004, the liquid crystal layer 1005, and the first ITO are sequentially arranged from bottom to top.
  • a coupling capacitor is formed on the surface of the human body electric field, the user, and the capacitive in-line touch screen.
  • the capacitor is a direct conductor, and the finger sucks a small current from the contact point. .
  • the current flows out through the touch electrode, and the main controller of the touch screen performs accurate calculation according to the current flowing out to obtain the position information of the touch point.
  • the impedance of the ITO as the touch electrode is large, the toughness is poor, and the price of the ITO is expensive. Therefore, the impedance of the touch screen using ITO as the touch electrode is large, and the touch screen is thick. And the cost is higher.
  • the embodiment of the present invention provides a method for manufacturing a color film substrate, a color film substrate, and a touch. Screen and display device.
  • An embodiment of the present invention provides a color filter substrate including: a transparent substrate; a color resist layer disposed on one side of the transparent substrate; and a side on which the color resist layer is disposed on the transparent substrate a first touch electrode, the first touch electrode being made of metal or ash metal; and a second touch electrode disposed on one side of the transparent substrate.
  • the second touch electrode and the first touch electrode may be disposed on different sides of the transparent substrate.
  • the second touch electrode may be made of ashed metal.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels, and a projection of the first touch electrode on the transparent substrate is located on a projection of the black matrix on the transparent substrate within the area.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels, and the first touch electrode is disposed on a surface of a side of the black matrix away from the transparent substrate.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels, and the first touch electrode is disposed between the transparent substrate and the black matrix.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels, and a projection of the second touch electrode on the transparent substrate is located on a projection of the black matrix on the transparent substrate within the area.
  • the metal may include at least one of copper, molybdenum, aluminum, and silver.
  • the ashing metal may be molybdenum oxynitride.
  • the color filter substrate may further include an erasing layer disposed on a surface of the second touch electrode on a side away from the transparent substrate.
  • Another embodiment of the present invention provides a method of fabricating a color filter substrate, comprising the steps of: forming a color resist layer on one side of the transparent substrate; forming a first side on the side of the color resist layer on the transparent substrate a touch electrode, the first touch electrode is made of metal or ash metal; and a second touch electrode is formed on one side of the transparent substrate.
  • the forming the second touch electrode on one side of the transparent substrate may include forming a second touch electrode such that the second touch electrode and the first touch electrode are disposed on different sides of the transparent substrate.
  • the second touch electrode may be made of ashed metal.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels.
  • the step of forming the first touch electrode on the side where the color resist layer on the transparent substrate is formed may include: forming a first touch electrode such that a projection of the first touch electrode on the transparent substrate is located The black matrix is in the projection area on the transparent substrate.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels, and the step of forming the first touch electrode on a side of the transparent substrate on which the color resist layer is located may include Forming a first touch electrode such that the first touch electrode is disposed on a surface of a side of the black matrix away from the transparent substrate.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels, and the step of forming the first touch electrode on a side of the transparent substrate on which the color resist layer is located may include Forming a first touch electrode such that the first touch electrode is disposed between the transparent substrate and the black matrix.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels, and the step of forming a second touch electrode on one side of the transparent substrate may include: forming a second touch electrode such that A projection of the second touch electrode on the transparent substrate is located in a projection area of the black matrix on the transparent substrate.
  • the metal may include at least one of copper, molybdenum, aluminum, and silver.
  • the ashing metal may be molybdenum oxynitride.
  • the method may further include: forming a shadow removing layer on a surface of the second touch electrode on a side away from the transparent substrate.
  • Yet another embodiment of the present invention provides a touch screen including the color film substrate described above.
  • Still another embodiment of the present invention provides a display device including the touch panel described above.
  • a color resist layer is disposed on one side of the transparent substrate, and the first side of the color resist layer on the transparent substrate is formed first.
  • the electrode is touched, and the first touch electrode is made of metal or ash metal, and a second touch electrode is formed on one side of the transparent substrate.
  • FIG. 1 is a schematic structural diagram of a conventional touch screen according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a color filter substrate according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural diagram of another color film substrate according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural view of still another color film substrate according to an embodiment of the present invention.
  • FIG. 5 is a schematic structural diagram of a grid line distribution of a first touch electrode and a second touch electrode according to an embodiment of the present invention
  • FIG. 6 is a partial enlarged structural diagram of a grid line distribution of a first touch electrode and a second touch electrode according to an embodiment of the present invention
  • FIG. 7 is a schematic structural diagram of still another color film substrate according to an embodiment of the present invention.
  • FIG. 8 is a schematic structural view of a shadow elimination layer provided by the prior art.
  • FIG. 9 is a flowchart of a method of manufacturing a color filter substrate according to an embodiment of the present invention.
  • an embodiment of the present invention provides a color filter substrate 100 including: a transparent substrate 101; a color resist layer 102 disposed on one side of the transparent substrate 101; and a color resist on the transparent substrate 101.
  • the first touch electrode 104 disposed on one side of the layer 102, the first touch electrode 104 is made of metal or ash metal; and the second touch electrode 105 disposed on one side of the transparent substrate 101.
  • the first touch electrode 104 may be a sensing electrode
  • the second touch electrode 105 may be a transmission electrode
  • first touch electrode 104 and the second touch electrode 105 may be disposed on different sides of the transparent substrate 101 as shown in FIG. 2 .
  • first touch electrode and the second touch electrode may also be disposed on the same side (not shown) of the transparent substrate.
  • the size and thickness of the touch screen can be reduced, and the effect of thinning the touch screen can be achieved.
  • a color resist layer is provided on one side of the transparent substrate, and a first touch electrode made of metal or ash metal is provided on a side of the color resist layer on the transparent substrate. And providing a second touch electrode on one side of the transparent substrate.
  • another embodiment of the present invention provides a color filter substrate 100 including: a transparent substrate 101; a color resist layer 102 disposed on one side of the transparent substrate 101; and a color on the transparent substrate 101.
  • the first touch electrode 104 disposed on one side of the resist layer 102, the first touch electrode 104 may be made of metal or ash metal; the second touch electrode 105 disposed on the other side of the transparent substrate 101, the second touch The electrode 105 is made of ashed metal.
  • the color resist layer 102 includes a color pixel 1021 and a black matrix 1022 located between adjacent color pixels 1021.
  • the first touch electrode 104 is disposed on a surface of the color resist layer 102 on the side away from the transparent substrate 101.
  • 106 refers to a photo-resist material (Photo Spacer, PS for short)
  • 107 refers to liquid crystal
  • 103 refers to an array substrate.
  • the color pixel 1021 may include a red pixel (R), a green pixel (G), and a blue pixel (B). In practical applications, the color pixel 1021 may also include other color pixels, which is not limited in the present invention.
  • another embodiment of the present invention provides a color filter substrate 100 including: a transparent substrate 101; a color resist layer 102 disposed on one side of the transparent substrate 101; and a color on the transparent substrate 101.
  • a first touch electrode 104 disposed on a side where the resist layer 102 is located; and a second touch electrode 105 disposed on the other side of the transparent substrate 101.
  • the color resist layer 102 includes a color pixel 1021 and a black matrix 1022 located between adjacent color pixels 1021.
  • the projection of the first touch electrode 104 on the transparent substrate 101 is located in the projection area of the black matrix 1022 on the transparent substrate 101, and the first touch electrode 104 is disposed.
  • the first touch electrode 104 is disposed on a surface of the black matrix 1022 that is relatively close to the array substrate 103 and away from the side of the transparent substrate 101.
  • the first touch electrode 104 may be made of an ashed metal such as molybdenum oxynitride.
  • the first touch electrode 104 may also be made of metal, which may include up to copper, molybdenum, aluminum, and silver. One less.
  • the projection of the second touch electrode 105 on the transparent substrate 101 may be located in a projection area of the black matrix 1022 on the transparent substrate 101, and the second touch electrode 105 can be made of ashed metal.
  • the non-reflective effect can be achieved, the display effect and the touch performance of the touch screen can be improved, and the cost can be reduced.
  • the structure referred to by other marks in FIG. 4 can be referred to the description of the mark in FIG.
  • the ashing metal may be any material having a low reflectivity, for example, may be molybdenum oxynitride, which is not limited in the embodiment of the present invention.
  • FIG. 5 is a top plan view showing a mesh distribution of a first touch electrode and a second touch electrode.
  • 104 denotes a first touch electrode
  • 105 denotes a second touch electrode
  • 1022 denotes a black matrix.
  • FIG. 6 is a partially enlarged schematic view of FIG. 5, and the structure indicated by the mark in FIG. 6 can be referred to the description of the mark in FIG. 5.
  • an embodiment of the present invention provides a color film substrate 100.
  • a first touch electrode 104 may be disposed between the transparent substrate 101 and the black matrix 1022 to reduce the first touch.
  • the influence of the electrode 104 on the electric field of the liquid crystal 107 improves the touch sensitivity of the touch screen.
  • the first touch electrode 104 may be made of ash metal.
  • the color filter substrate 100 may further include a shadow removing layer 108 disposed on an outer surface of the second touch electrode 105.
  • the outer surface of the second touch electrode 105 refers to the surface of the second touch electrode 105 on the side away from the transparent substrate 101.
  • a pair of molybdenum tantalum (MoNb) targets are added on both sides of a common metal aluminide (AlNd), and a low reflectivity metal is formed by a sputtering process.
  • Molybdenum oxynitride (MoNbOxNy) is used to cover the high reflectivity metal layer (MoNb) with a low reflectivity metal shadow layer to achieve metal shadowing.
  • the erasing layer 108 is disposed on the outer surface of the grayed second touch electrode 105, and the second touch electrode 105 is matched with the erasing layer 108, which can better avoid the moire interference.
  • the occurrence of the phenomenon makes the overall reflectance less than 20%, and achieves the purpose of ashing the film layer, reducing the reflectivity, and invisible metal lines.
  • the metal mesh is used as the touch electrode because the metal mesh has low resistance.
  • the resistance has a square resistance range of about 5 ohms to 10 ohms, while the conventional ITO film layer has an impedance range of about 50 ohms to 100 ohms, and the thin film touch sensor has an impedance of about 150 ohms.
  • the metal grid can handle medium to large size touch solutions and can be applied to notebook or all-in-one products.
  • the color film substrate provided by the embodiment of the invention adopts a metal mesh technology of ashing copper or silver material, and the display effect and cost are superior to ITO.
  • the first touch electrode is made of metal or ash metal
  • the second touch electrode is made of anti-reflection ashing metal, which can reduce the wire resistance, increase the sensitivity of the touch, reduce the power consumption, and promote the narrow line width and the narrow frame. Reduce the cost of driving the integrated circuit.
  • the line of the first touch electrode is hidden under the black matrix, and the line of the second touch electrode is overlapped above the black matrix, thereby solving the problem that the influence of the Moire interference phenomenon on the display is solved. And increase the light transmittance.
  • the metal erasing technology By combining the metal erasing technology with the metal grid technology and applying it to the in-cell touch screen technology (which can be understood as the side where the first touch electrode is formed on the color resist layer on the color filter substrate), The electrical characteristics are achieved, and the effect of ashing of the film layer, reduction of reflectance, and invisible metal lines by the naked eye is achieved.
  • ordinary metal or ashing metal instead of ITO with high impedance, poor toughness and high price, the touch performance is better and the cost is lower, which is suitable for large-sized products and reduces the thickness of the touch screen.
  • a color resist layer is provided on one side of the transparent substrate, and a metal or ash metal is provided on a side of the color resist layer on the transparent substrate.
  • a first touch electrode, and a second touch electrode are provided on one side of the transparent substrate.
  • the embodiment of the invention further provides a method for manufacturing a color filter substrate. As shown in FIG. 9, the method includes the following steps 601 to 603.
  • step 601 a color resist layer is formed on one side of the transparent substrate.
  • a first touch electrode is formed on a side of the color resist layer on the transparent substrate, and the first touch electrode is made of metal or ash metal.
  • step 603 a second touch electrode is formed on one side of the transparent substrate.
  • a color resist layer is formed on one side of the transparent substrate, and a first metal or gray metal is formed on a side of the color resist layer on the transparent substrate.
  • the electrode is touched, and a second touch electrode is formed on one side of the transparent substrate.
  • Step 603 may include forming a second touch electrode on one side of the transparent substrate such that the second touch electrode and the first touch electrode are located on different sides of the transparent substrate.
  • first touch electrode and the second touch electrode may also be disposed on the same side of the transparent substrate, so as to reduce the size of the touch screen and achieve the effect of thinning the touch screen.
  • the color resist layer may include a color pixel and a black matrix between adjacent color pixels.
  • the step 602 may include: forming a first touch electrode on a side of the transparent substrate on which the color resist layer is located, such that the projection of the first touch electrode on the transparent substrate is located on the black matrix on the transparent substrate.
  • the first touch electrode can be made of an ashed metal such as molybdenum oxynitride.
  • the first touch electrode may be made of a metal, which may include at least one of copper, molybdenum, aluminum, and silver.
  • step 603 may include forming a second touch electrode on one side of the transparent substrate such that the projection of the second touch electrode on the transparent substrate is located in a projection area of the black matrix on the transparent substrate.
  • the second touch electrode may be made of ashed metal.
  • step 602 may include forming a first touch electrode on a side of the transparent substrate on which the color resist layer is located and between the transparent substrate and the black matrix.
  • the method of manufacturing the color filter substrate may further include: forming a shadow mask on the outer surface of the second touch electrode (the surface away from the transparent substrate).
  • a shadow mask on the outer surface of the second touch electrode, the overall reflectance is less than 20%, and the purpose of ashing the film layer, reducing the reflectance, and invisible metal lines by the naked eye is achieved.
  • a color resist layer is formed on one side of the transparent substrate, and a metal or an ash metal is formed on a side of the color resist layer on the transparent substrate.
  • the first touch electrode is fabricated, and the second touch electrode is fabricated on one side of the transparent substrate.
  • a color film substrate may be prepared first, and the color film substrate may include: a transparent substrate; formed on one side of the transparent substrate a color resist layer comprising a color pixel and a black matrix between adjacent color pixels; a first touch electrode formed on a side of the transparent substrate on which the color resist layer is located; and a PS, etc.
  • the color film substrate and the array substrate are combined, and then the combined color film substrate and the array substrate are thinned, and then the second touch electrode is formed on the thinned color film substrate and the array substrate, that is, in the transparent A second touch electrode is formed on the other side of the substrate.
  • a second touch electrode is formed on one side of a transparent substrate on which a structure of a color filter substrate is to be formed by a patterning process, and then a structure of a color filter substrate is formed on the other side of the transparent substrate, the color
  • the film substrate may include: the transparent substrate; a color resist layer formed on the other side of the transparent substrate, the color group layer including color pixels and a black matrix between adjacent color pixels; formed on the transparent substrate a first touch electrode on one side of the color resist layer; and a PS or the like, and then combining the color filter substrate and the array substrate.
  • a color resist layer is formed on one side of the transparent substrate, and the color group layer includes a color pixel and a black matrix between adjacent color pixels.
  • the projection on the color resist layer can overlap with the black matrix.
  • Another embodiment of the present invention provides a touch screen including the color filter substrate shown in FIG. 2, FIG. 3, FIG. 4 or FIG.
  • Another embodiment of the present invention further provides a display device comprising the touch screen in the above embodiment or the color filter substrate in the above embodiment.
  • a color resist layer is formed on one side of the transparent substrate, and the color group layer includes color pixels and black between adjacent color pixels.
  • a matrix a first touch electrode is formed on a side of the color resist layer on the transparent substrate, on the transparent base
  • a second touch electrode made of ashed metal is formed on one side of the board while the projection of the first touch electrode and the second touch electrode on the color resist layer may overlap with the black matrix.

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Abstract

彩膜基板、制造彩膜基板的方法、触摸屏及显示装置。所述彩膜基板（100）包括：透明基板（101）；设置在所述透明基板（101）的一侧的色阻层（102）；在所述透明基板上（101）的所述色阻层（102）所在的一侧设置的第一触摸电极（104），所述第一触摸电极（104）由金属或灰化金属制成；设置在所述透明基板（101）的一侧的第二触摸电极（105）。解决了以ITO作为触摸电极的触摸屏的阻抗较大、触摸屏尺寸较厚且成本较高的问题，从而降低了触摸屏的阻抗，减小了触摸屏厚度，并且降低了成本。

Description

彩膜基板、彩膜基板的制造方法、触摸屏及显示装置 技术领域
本发明涉及触摸屏技术领域，特别涉及彩膜基板、彩膜基板的制造方法、触摸屏及显示装置。
背景技术
触摸屏技术是一种智能化的人机交互输入技术，与传统的键盘和鼠标输入方式相比，触摸屏输入更加直观。当前，对触摸屏的需求主要来自于消费电子产业，尤其是移动电话、便携游戏机、个人数字助理及便携导航设备等。触摸屏的类型很多，电容式内嵌触摸屏是最为常见的类型之一。
现有技术中，电容式内嵌触摸屏主要是利用人体的电流感应进行工作的，电容式内嵌触摸屏的彩膜基板通常采用两层氧化铟锡(Indium Tin Oxide，简称ITO)在彩色滤光片(Color Filter，简称CF)的两侧制作触摸电极。具体的，如图1所示，在该电容式内嵌触摸屏中，从下到上依次为背光源1001、偏光片1002、底层玻璃基板1003、薄膜场效应晶体管1004、液晶层1005、第一ITO触摸电极1006、CF 1007、顶层玻璃基板1008、第二ITO触摸电极1009、偏光片或盖板1010等。当手指触摸电容式内嵌触摸屏时，由于人体电场、用户和电容式内嵌触摸屏表面形成一个耦合电容，对于高频电流来说，电容是直接导体，手指从接触点吸走一个很小的电流。该电流通过触摸电极流出，触摸屏的主控制器根据流出的电流进行精确计算，得出触摸点的位置信息。
但是，电容式内嵌触摸屏的彩膜基板中作为触摸电极的ITO的阻抗较大，韧性较差，且ITO的价格昂贵，因此，以ITO作为触摸电极的触摸屏的阻抗较大，触摸屏尺寸较厚，并且成本较高。
发明内容
为了解决以ITO作为触摸电极的触摸屏的阻抗较大、触摸屏尺寸较厚以及成本较高的问题，本发明实施例提供了彩膜基板、彩膜基板的制造方法、触摸 屏及显示装置。
本发明的一个实施例提供了一种彩膜基板，包括：透明基板；设置在所述透明基板的一侧的色阻层；在所述透明基板上的所述色阻层所在的一侧设置的第一触摸电极，所述第一触摸电极由金属或灰化金属制成；以及设置在所述透明基板的一侧的第二触摸电极。
第二触摸电极与所述第一触摸电极可以设置在所述透明基板的不同侧。
所述第二触摸电极可以由灰化金属制成。
所述色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述第一触摸电极在所述透明基板上的投影位于所述黑矩阵在所述透明基板上的投影区域内。
所述色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述第一触摸电极设置在所述黑矩阵的远离所述透明基板的一侧的表面上。
所述色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述第一触摸电极设置在所述透明基板与所述黑矩阵之间。
所述色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述第二触摸电极在所述透明基板上的投影位于所述黑矩阵在所述透明基板上的投影区域内。
所述金属可以包括铜、钼、铝和银中的至少一种。所述灰化金属可以为氮氧化钼铌。
所述彩膜基板还可以包括消影层，所述消影层设置在所述第二触摸电极的远离所述透明基板的一侧的表面上。
本发明的另一个实施例提供了一种彩膜基板的制造方法，包括步骤：在透明基板的一侧形成色阻层；在所述透明基板上的所述色阻层所在的一侧形成第一触摸电极，所述第一触摸电极由金属或灰化金属制成；以及在所述透明基板的一侧形成第二触摸电极。
所述在所述透明基板的一侧形成第二触摸电极的步骤可以包括：形成第二触摸电极，使得所述第二触摸电极与所述第一触摸电极设置在所述透明基板的不同侧。
所述第二触摸电极可以由灰化金属制成。
所述色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所 述在所述透明基板上的所述色阻层所在的一侧形成第一触摸电极的步骤可以包括：形成第一触摸电极，使得所述第一触摸电极在所述透明基板上的投影位于所述黑矩阵在所述透明基板上的投影区域内。
所述色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述在所述透明基板上的所述色阻层所在的一侧形成第一触摸电极的步骤可以包括：形成第一触摸电极，使得所述第一触摸电极设置在所述黑矩阵的远离所述透明基板的一侧的表面上。
所述色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述在所述透明基板上的所述色阻层所在的一侧形成第一触摸电极的步骤可以包括：形成第一触摸电极，使得所述第一触摸电极设置在所述透明基板与所述黑矩阵之间。
所述色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述在所述透明基板的一侧形成第二触摸电极的步骤可以包括：形成第二触摸电极，使得所述第二触摸电极在所述透明基板上的投影位于所述黑矩阵在所述透明基板上的投影区域内。
所述金属可以包括铜、钼、铝和银中的至少一种。所述灰化金属可以为氮氧化钼铌。
所述在所述透明基板的一侧形成第二触摸电极之后，所述方法还可以包括：在所述第二触摸电极的远离所述透明基板的一侧的表面上形成消影层。
本发明的又一个实施例提供了一种触摸屏，包括上述的彩膜基板。
本发明的再一个实施例提供了一种显示装置，包括上述的触摸屏。
在本发明提供的彩膜基板、彩膜基板的制造方法、触摸屏及显示装置中，在透明基板的一侧设置色阻层，在透明基板上的所述色阻层所在的一侧形成第一触摸电极，并且第一触摸电极由金属或灰化金属制成，以及在透明基板的一侧形成第二触摸电极。通过采用金属或灰化金属来形成彩膜基板中的第一触摸电极，降低了触摸屏的阻抗，减小了触摸屏尺寸，并且降低了成本。
应当理解的是，以上的一般描述和后文的细节描述仅是示例性和解释性的，并不在于限制本发明。
附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。在附图中：
图1是本发明实施例提供的现有触摸屏的结构示意图；
图2是本发明实施例提供的一种彩膜基板的结构示意图；
图3是本发明实施例提供的另一种彩膜基板的结构示意图；
图4是本发明实施例提供的又一种彩膜基板的结构示意图；
图5是本发明实施例提供的第一触摸电极和第二触摸电极的一种网格线路分布的结构示意图；
图6是本发明实施例提供的第一触摸电极和第二触摸电极的网格线路分布的局部放大结构示意图；
图7是本发明实施例提供的再一种彩膜基板的结构示意图；
图8是现有技术提供的一种消影层叠成的结构示意图；以及
图9是本发明实施例提供的一种彩膜基板的制造方法的流程图。
通过上述附图，已示出本发明实施例，后文中将有更详细的描述。这些附图和文字描述并不是为了通过任何方式限制本发明构思的范围，而是通过参考特定实施例为本领域技术人员说明本发明的概念。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚，下面将结合附图对本发明实施方式作进一步地详细描述。
参照图2，本发明实施例提供了一种彩膜基板100，该彩膜基板100包括：透明基板101；设置在透明基板101的一侧的色阻层102；在透明基板101上的色阻层102所在的一侧设置的第一触摸电极104，第一触摸电极104由金属或灰化金属制成；以及设置在透明基板101的一侧的第二触摸电极105。
例如，第一触摸电极104可以为感应电极，第二触摸电极105可以为传输电极。
例如，第一触摸电极104与第二触摸电极105可以设置在透明基板101的不同侧，如图2所示。
可替代地，第一触摸电极与第二触摸电极也可以设置在透明基板的同一侧(未示出)。当第一触摸电极与第二触摸电极设置在透明基板的同一侧时，可以减小触摸屏的尺寸厚度，实现触摸屏的薄型化的效果。
在本发明实施例提供的彩膜基板中，在透明基板的一侧提供色阻层，在透明基板上的色阻层所在的一侧提供由金属或灰化金属制成的第一触摸电极，以及在透明基板的一侧提供第二触摸电极。通过采用金属或灰化金属来制成彩膜基板中的第一触摸电极，降低了触摸屏的阻抗，减小了触摸屏的尺寸和厚度，并且降低了成本。
参照图3，本发明实施例提供了另一种彩膜基板100，该彩膜基板100包括：透明基板101；设置在透明基板101的一侧的色阻层102；在透明基板101上的色阻层102所在的一侧设置的第一触摸电极104，第一触摸电极104可以由金属或灰化金属制成；设置在透明基板101的另一侧的第二触摸电极105，该第二触摸电极105由灰化金属制成。此外，色阻层102包括彩色像素1021和位于相邻的各彩色像素1021之间的黑矩阵1022。在该彩膜基板100中，第一触摸电极104设置在色阻层102的远离透明基板101的一侧的表面上。
此外，在图3的附图标记中，106指的是光阻材料(Photo Spacer，简称PS)，107指的是液晶，103指的是阵列基板。彩色像素1021可以包括红色像素(R)、绿色像素(G)和蓝色像素(B)。在实际应用中，彩色像素1021也可以包括其他颜色像素，本发明对此不做限定。
参照图4，本发明实施例提供了又一种彩膜基板100，该彩膜基板100包括：透明基板101；设置在透明基板101的一侧的色阻层102；在透明基板101上的色阻层102所在的一侧设置的第一触摸电极104；设置在透明基板101的另一侧的第二触摸电极105。此外，色阻层102包括彩色像素1021和位于相邻的各彩色像素1021之间的黑矩阵1022。在该彩膜基板100中，为了避免莫尔干涉现象的发生，第一触摸电极104在透明基板101上的投影位于黑矩阵1022在透明基板101上的投影区域内，并且第一触摸电极104设置在黑矩阵1022的外表面上并且靠近阵列基板103，即，第一触摸电极104设置在黑矩阵1022的相对靠近阵列基板103而远离透明基板101的一侧的表面上。
例如，第一触摸电极104可以由灰化金属制成，如氮氧化钼铌。可替代地，第一触摸电极104也可以由金属制成，该金属可以包括铜、钼、铝和银中的至 少一种。
为了进一步避免莫尔干涉现象的发生，在该彩膜基板100中，第二触摸电极105在透明基板101上的投影可以位于黑矩阵1022在透明基板101上的投影区域内，并且第二触摸电极105可以由灰化金属制成。
通过利用灰化金属制成第一触摸电极和第二触摸电极，能够实现不反光的效果，提高触摸屏的显示效果和触控性能，同时还可以降低成本。图4中的其他标记所指的结构可以参考对于图3中的标记进行的说明。
需要说明的是，灰化金属可以为任一种低反射率的材料，例如，可以为氮氧化钼铌，本发明实施例对此不作限定。
图5是示出第一触摸电极和第二触摸电极的网格分布的俯视示意图。在图5的附图标记中，104指的是第一触摸电极，105指的是第二触摸电极，1022指的是黑矩阵。图6为图5的局部放大结构示意图，图6中的标记所指的结构可以参考对于图5中的标记进行的说明。
参照图7，本发明实施例提供了再一种彩膜基板100，在该彩膜基板100中，第一触摸电极104可以设置在透明基板101与黑矩阵1022之间，以便减小第一触摸电极104对液晶107电场的影响，提高了触摸屏的触控灵敏度。为了进一步避免莫尔干涉现象的发生，该第一触摸电极104可以由灰化金属制成。图7中的其它标记所指的结构可以参考对于图4中的标记进行的说明，在此不再赘述。
如图7所示，该彩膜基板100还可以包括消影层108，消影层108设置在第二触摸电极105的外表面上。需要说明的是，第二触摸电极105的外表面指的是第二触摸电极105的远离透明基板101的一侧的表面。如图8所示，在现有的消影技术中，通过在普通金属铝化钕(AlNd)的两侧增加一对钼铌(MoNb)靶材，利用溅射工艺形成低反射率的金属消影层氮氧化钼铌(MoNbOxNy)，以便使用低反射率的金属消影层来覆盖高反射率的金属层(MoNb)，从而达到金属消影的目的。在本发明实施例中，将消影层108设置在灰化后的第二触摸电极105的外表面上，第二触摸电极105正好与消影层108相匹配，能够更好地避免莫尔干涉现象的发生，使整体反射率小于20％，并且达到了膜层灰化、降低反射率、肉眼不可见金属线路的目的。
在本发明实施例中，将金属网格作为触摸电极，是因为金属网格具有低阻 抗的优势，其方阻范围大约为5欧姆至10欧姆，而传统的ITO膜层的阻抗范围大约为50欧姆至100欧姆，以及薄膜触控感测器的阻抗大约为150欧姆。此外，金属网格可以应对中大尺寸触摸方案，可以应用于笔记本或一体机产品上。
本发明实施例提供的彩膜基板采用了灰化处理的铜或银材料的金属网格技术，其显示效果和成本均优于ITO。第一触摸电极由金属或灰化金属制成，第二触摸电极由防反射灰化金属制成，其能够降低导线电阻，增加触摸的灵敏度，降低功耗，促进窄线宽和窄边框化，降低驱动集成电路的成本。通过采用金属网格技术，将第一触摸电极的线路隐藏在黑矩阵的下方，并且将第二触摸电极的线路重叠于黑矩阵的上方，从而解决了莫尔干涉现象对显示的影响的问题，并且增加了光透过率。通过将金属消影技术与金属网格技术相结合，并应用到内嵌式触摸屏技术中(其可以理解为将第一触摸电极制作在彩膜基板上的色阻层所在的一侧)，提高了电学特性，并且实现了膜层灰化、降低反射率、肉眼不可见金属线路的效果。通过利用普通金属或灰化金属来代替阻抗较大、韧性较差、价格昂贵的ITO，触控性能更优，成本更低，适合大尺寸产品，并且降低了触摸屏的厚度。
综上所述，在本发明实施例提供的彩膜基板中，在透明基板的一侧提供色阻层，在透明基板上的色阻层所在的一侧提供由金属或灰化金属制成的第一触摸电极，以及在透明基板的一侧提供第二触摸电极。通过采用金属或灰化金属来制成彩膜基板中的第一触摸电极，降低了触摸屏的阻抗，减小了触摸屏尺寸，并且降低了成本。
本发明实施例还提供了一种制造彩膜基板的方法，如图9所示，该方法包括以下步骤601至步骤603。
步骤601中，在透明基板的一侧形成色阻层。
步骤602中，在透明基板上的色阻层所在的一侧形成第一触摸电极，该第一触摸电极由金属或灰化金属制成。
步骤603中，在透明基板的一侧形成第二触摸电极。
在本发明实施例提供的制造彩膜基板的方法中，在透明基板的一侧形成色阻层，在透明基板上的色阻层所在的一侧形成由金属或灰化金属制成的第一触摸电极，以及在透明基板的一侧形成第二触摸电极。通过采用金属或灰化金属来制成彩膜基板中的第一触摸电极，降低了触摸屏的阻抗，减小了触摸屏尺寸， 并且降低了成本。
步骤603可以包括：在透明基板的一侧形成第二触摸电极，使得第二触摸电极与第一触摸电极位于透明基板的不同侧。
需要说明的是，第一触摸电极与第二触摸电极也可以设置在透明基板的同一侧，以便减小触摸屏的尺寸，并且实现触摸屏的薄型化的效果。
进一步地，色阻层可以包括彩色像素和位于相邻的各彩色像素之间的黑矩阵。
为了避免莫尔干涉现象的发生，步骤602可以包括：在透明基板上的色阻层所在的一侧形成第一触摸电极，使得第一触摸电极在透明基板上的投影位于黑矩阵在透明基板上的投影区域内。例如，第一触摸电极可以由灰化金属制成，如氮氧化钼铌。可替代地，第一触摸电极可以由金属制成，该金属可以包括铜、钼、铝和银中的至少一种。
为了进一步避免莫尔干涉现象的发生，步骤603可以包括：在透明基板的一侧形成第二触摸电极，使得第二触摸电极在透明基板上的投影位于黑矩阵在透明基板上的投影区域内。第二触摸电极可以由灰化金属制成。
进一步地，步骤602可以包括：在透明基板上的色阻层所在的一侧以及在透明基板与黑矩阵之间形成第一触摸电极。通过将第一触摸电极形成在透明基板与黑矩阵之间，减小了第一触摸电极对液晶电场的影响，提高了触摸屏的触控灵敏度。
在步骤603之后，该制造彩膜基板的方法还可以包括：在第二触摸电极的外表面(远离透明基板的表面)上形成消影层。通过在第二触摸电极的外表面上形成消影层，使整体反射率小于20％，并且达到了膜层灰化、降低反射率、肉眼不可见金属线路的目的。
综上所述，在本发明实施例提供的制造彩膜基板的方法中，在透明基板的一侧制造色阻层，在透明基板上的色阻层所在的一侧形成由金属或灰化金属制成的第一触摸电极，以及在透明基板的一侧制造第二触摸电极。通过采用金属或灰化金属来形成彩膜基板中的第一触摸电极，降低了触摸屏的阻抗，减小了触摸屏尺寸，并且降低了成本。
需要说明的是，根据本发明实施例，在制造触摸屏的过程中，例如，可以先制备彩膜基板，该彩膜基板可以包括：透明基板；形成在透明基板的一侧上 的色阻层，该色组层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵；形成在透明基板上的色阻层所在的一侧上的第一触摸电极；以及PS等，再将该彩膜基板和阵列基板相结合，然后将结合后的彩膜基板和阵列基板变薄，之后在变薄后的彩膜基板和阵列基板上形成第二触摸电极，即，在该透明基板的另一侧上形成第二触摸电极。可替代地，例如，通过构图工艺先在要形成彩膜基板的结构的透明基板的一侧上形成第二触摸电极，然后在该透明基板的另一侧上形成彩膜基板的结构，该彩膜基板可以包括：该透明基板；形成在该透明基板的另一侧上的色阻层，该色组层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵；形成在透明基板上的色阻层所在的一侧上的第一触摸电极；以及PS等，之后将上述彩膜基板和阵列基板相结合。
需要说明的是，本发明实施例提供的制造彩膜基板的方法中的步骤的先后顺序可以进行适当调整，步骤也可以根据情况进行相应增减，任何熟悉本技术领域的技术人员在本发明揭露的技术范围内，可轻易想到变化的方法，都应涵盖在本发明的保护范围之内，因此不再赘述。
所属领域的技术人员可以清楚地了解到，为描述的方便和简洁，上述描述的制造方法，可以参考前述装置实施例中的说明，在此不再赘述。
综上所述，在本发明实施例提供的制造彩膜基板的方法中，在透明基板的一侧形成色阻层，色组层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，在透明基板上的色阻层所在的一侧形成第一触摸电极，以及在透明基板的一侧形成由灰化金属制成的第二触摸电极，同时第一触摸电极和第二触摸电极在色阻层上的投影可以与黑矩阵重叠。通过采用金属或灰化金属来形成彩膜基板中的触摸电极，避免了莫尔干涉现象的发生，降低了触摸屏的阻抗，减小了触摸屏尺寸，并且降低了成本。
本发明的另一个实施例提供了一种触摸屏，该触摸屏包括图2、图3、图4或图7所示的彩膜基板。
本发明的另一个实施例还提供了一种显示装置，该显示装置包括上述实施例中的触摸屏或者上述实施例中的彩膜基板。
根据本发明实施例提供的显示装置，在该显示装置包括的彩膜基板中，在透明基板的一侧形成色阻层，色组层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，在透明基板上的色阻层所在的一侧形成第一触摸电极，在透明基 板的一侧形成由灰化金属制成的第二触摸电极，同时第一触摸电极和第二触摸电极在色阻层上的投影可以与黑矩阵重叠。通过采用金属或灰化金属形成彩膜基板中的触摸电极，避免了莫尔干涉现象的发生，降低了触摸屏的阻抗，减小了显示装置尺寸，并且降低了成本。
以上所述仅为本发明的较佳实施例，并不用以限制本发明，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (20)

  1. 一种彩膜基板，包括：
    透明基板；
    设置在所述透明基板的一侧的色阻层；
    在所述透明基板上的所述色阻层所在的一侧设置的第一触摸电极，所述第一触摸电极由金属或灰化金属制成；以及
    设置在所述透明基板的一侧的第二触摸电极。
  2. 根据权利要求1所述的彩膜基板，其中，所述第二触摸电极与所述第一触摸电极设置在所述透明基板的不同侧。
  3. 根据权利要求2所述的彩膜基板，其中，所述第二触摸电极由灰化金属制成。
  4. 根据权利要求1所述的彩膜基板，其中，所述色阻层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述第一触摸电极在所述透明基板上的投影位于所述黑矩阵在所述透明基板上的投影区域内。
  5. 根据权利要求1所述的彩膜基板，其中，所述色阻层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述第一触摸电极设置在所述黑矩阵的远离所述透明基板的一侧的表面上。
  6. 根据权利要求1所述的彩膜基板，其中，所述色阻层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述第一触摸电极设置在所述透明基板与所述黑矩阵之间。
  7. 根据权利要求1所述的彩膜基板，其中，所述色阻层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述第二触摸电极在所述透明基板上的投影位于所述黑矩阵在所述透明基板上的投影区域内。
  8. 根据权利要求1所述的彩膜基板，其中，所述金属包括铜、钼、铝和银中的至少一种，所述灰化金属为氮氧化钼铌。
  9. 根据权利要求1至8中任一项所述的彩膜基板，其中，所述彩膜基板还包括消影层，所述消影层设置在所述第二触摸电极的远离所述透明基板的一侧的表面上。
  10. 一种制造彩膜基板的方法，包括步骤：
    在透明基板的一侧形成色阻层；
    在所述透明基板上的所述色阻层所在的一侧形成第一触摸电极，所述第一触摸电极由金属或灰化金属制成；以及
    在所述透明基板的一侧形成第二触摸电极。
  11. 根据权利要求10所述的方法，其中，所述在所述透明基板的一侧形成第二触摸电极的步骤包括：
    形成第二触摸电极，使得所述第二触摸电极与所述第一触摸电极设置在所述透明基板的不同侧。
  12. 根据权利要求11所述的方法，其中，所述第二触摸电极由灰化金属制成。
  13. 根据权利要求10所述的方法，其中，所述色阻层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述在所述透明基板上的所述色阻层所在的一侧形成第一触摸电极的步骤包括：
    形成第一触摸电极，使得所述第一触摸电极在所述透明基板上的投影位于所述黑矩阵在所述透明基板上的投影区域内。
  14. 根据权利要求10所述的方法，其中，所述色阻层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述在所述透明基板上的所述色阻层所在的 一侧形成第一触摸电极的步骤包括：
    形成第一触摸电极，使得所述第一触摸电极设置在所述黑矩阵的远离所述透明基板的一侧的表面上。
  15. 根据权利要求10所述的方法，其中，所述色阻层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述在所述透明基板上的所述色阻层所在的一侧形成第一触摸电极的步骤包括：
    形成第一触摸电极，使得所述第一触摸电极设置在所述透明基板与所述黑矩阵之间。
  16. 根据权利要求10所述的方法，其中，所述色阻层包括彩色像素和位于相邻的各彩色像素之间的黑矩阵，所述在所述透明基板的一侧形成第二触摸电极的步骤包括：
    形成第二触摸电极，使得所述第二触摸电极在所述透明基板上的投影位于所述黑矩阵在所述透明基板上的投影区域内。
  17. 根据权利要求10所述的方法，其中，所述金属包括铜、钼、铝和银中的至少一种，所述灰化金属为氮氧化钼铌。
  18. 根据权利要求10至17中任一项所述的方法，其中，所述在所述透明基板的一侧形成第二触摸电极之后，所述方法还包括：
    在所述第二触摸电极的远离所述透明基板的一侧的表面上形成消影层。
  19. 一种触摸屏，包括权利要求1至9中任一项所述的彩膜基板。
  20. 一种显示装置，包括权利要求19所述的触摸屏。
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