WO2016145688A1 - 彩膜基板、彩膜基板的制备方法及液晶显示器 - Google Patents

彩膜基板、彩膜基板的制备方法及液晶显示器 Download PDF

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Publication number
WO2016145688A1
WO2016145688A1 PCT/CN2015/075829 CN2015075829W WO2016145688A1 WO 2016145688 A1 WO2016145688 A1 WO 2016145688A1 CN 2015075829 W CN2015075829 W CN 2015075829W WO 2016145688 A1 WO2016145688 A1 WO 2016145688A1
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WIPO (PCT)
Prior art keywords
color
body portion
main body
color filter
filter substrate
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Ceased
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PCT/CN2015/075829
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English (en)
French (fr)
Inventor
谢畅
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Wuhan China Star Optoelectronics Technology Co Ltd
TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
Wuhan China Star Optoelectronics Technology Co Ltd
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Publication of WO2016145688A1 publication Critical patent/WO2016145688A1/zh
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular, to a color film substrate, a method for preparing a color film substrate, and a liquid crystal display.
  • the array substrate and the color film substrate are separately prepared, and then the array substrate and the color film substrate are paired to form a liquid crystal cell.
  • the black matrix on the color filter substrate corresponds to the positions of the scanning lines, the data lines, and the thin film transistors (TFTs) on the array substrate, and the scanning lines, the data lines, the thin film transistors, and the like are blocked by the black matrix. component.
  • a misalignment often occurs between the array substrate and the color filter substrate, so that the black matrix and the scan lines, the data lines, and the thin film transistors are Misplaced.
  • the misalignment causes light leakage at the edge of the black matrix, thereby causing a crosstalk (V-CrossTalk) phenomenon, which affects the display effect of the liquid crystal display.
  • the liquid crystal display As the mainstream of the display, the liquid crystal display is becoming more and more widely used, and the corresponding performance is also improved. For example, the size of the display is getting larger and larger, the color is getting richer, and the brightness is getting higher and higher.
  • the above performance improvement will directly or indirectly increase the difficulty of preparation of the liquid crystal display. A slight inadvertentness in the process causes the liquid crystal display to leak light and affect the display effect.
  • the present invention provides a color film substrate, a method for preparing a color film substrate, and a liquid crystal display to avoid the occurrence of light leakage.
  • an embodiment of the present invention provides a method for preparing a color film substrate, including:
  • the color resist comprising a main body portion and an extension portion, wherein the main body portion has a rectangular shape, and the extension portion is located at the The vertices of the rectangle of the body portion extend toward opposite sides of the rectangle.
  • the extension is one of a rectangle, a circle, a diamond or a trapezoid.
  • the extension portion coincides with the body portion.
  • the center of the extension coincides with the apex of the illustrated body portion.
  • the step (3) specifically includes:
  • the reticle includes a reticle main body portion and a reticle extension portion, and the reticle main body portion has a rectangular shape, and the reticle extension portion is located at the apex of the rectangle of the reticle main body portion toward the rectangular shape The opposite side extends.
  • the predetermined coating sequence comprises one of the following: red, blue, and green color resists; red, blue, green, and yellow color resists; or red, blue, green, and white color resists;
  • the three-color color resist is applied, the formed three-color color resist is distributed in a strip shape, a diagonal line or a mosaic shape; when the four-color color resist is applied, the formed four-color color resist is distributed in a mosaic form.
  • the method further includes:
  • the invention also provides a color film substrate comprising:
  • a color film layer formed on the black matrix including color resistance of a plurality of colors, and the color resistance includes a main body portion and an extension portion, and the main body portion has a rectangular shape, and the extension portion is located The vertices of the rectangle of the body portion extend toward opposite sides of the rectangle.
  • the extension is one of a rectangle, a circle, a diamond or a trapezoid.
  • the extension portion coincides with the body portion.
  • the center of the extension coincides with the apex of the illustrated body portion.
  • the color resistance of the plurality of colors comprises one of the following:
  • Red, blue, and green color resists and the three color resists formed by the three color resists are strip-shaped, diagonal, or mosaic-like; or
  • the four color resists of red, blue, green and yellow, or the four color resists of red, blue, green and white, and the four color resists formed by the four color resists are mosaic-like.
  • the color film layer further comprises a sputtered transparent electrode layer.
  • the present invention also provides a liquid crystal display comprising the above color film substrate.
  • the color film substrate, the color film substrate manufacturing method and the liquid crystal display of the present invention prevent the color resistance from shrinking due to surface tension by forming an extension at the apex of each color resistance of the color film layer.
  • the light leakage area avoids the phenomenon of light leakage, and the preparation process is simple and the cost is low.
  • FIG. 1 is a schematic flow chart of a method for preparing a color film substrate according to Embodiment 1 of the present invention
  • 2A-2C are schematic top views of a single color resist in the first embodiment of the present invention.
  • 3A-3D are top plan views of a plurality of color resists in the first embodiment of the present invention.
  • FIG. 4 is a schematic cross-sectional view showing a color filter substrate according to Embodiment 2 of the present invention.
  • FIG. 5 is a cross-sectional view showing a liquid crystal display device according to Embodiment 3 of the present invention.
  • FIG. 1 shows a method for preparing a color film substrate according to the present invention.
  • step S101 a glass substrate is prepared.
  • the preparation process of this step is mainly to cut according to a predetermined size and to be cleaned by a washing machine.
  • step S102 a black matrix is prepared on the glass substrate.
  • the step of preparing the black matrix can also be refined to:
  • the black film comprising a black chrome film or a black pigment film
  • the black film is subjected to photoresist stripping, and a black matrix is formed, which is used for shading.
  • step S103 color resists of a plurality of colors are sequentially generated on the black matrix to form a color film layer.
  • the color resist includes a color resist body portion 31 and a color resist extension portion (32, 33 or 34).
  • the color resisting body portion 31 has a rectangular shape
  • the color resisting extension portion (32, 33 or 34) extends at opposite vertices of the rectangular portion of the main body portion 31 toward opposite sides of the rectangular shape, and may have any predetermined shape.
  • the color resisting extension portion 32 has a rectangular shape
  • the color resisting extension portion 33 has a circular shape as shown in FIG. 2B
  • the color resisting extension portion 34 has one of irregular polygons as shown in FIG. 2C. Diamond or trapezoidal.
  • the extension portion (32, 33 or 34) of the color resist is partially overlapped with the main body portion 31.
  • One of the cases of coincidence is that the center of the extension (32, 33 or 34) coincides with the apex of the illustrated main body portion 31.
  • the irregularly shaped reticle includes a reticle main body portion and a reticle extension portion, and the reticle main body portion has a rectangular shape, and the reticle extension portion is located at each apex of the rectangle of the reticle main body portion toward the The opposite sides of the rectangle extend and can assume any predetermined shape. Since the shape of the mask is in one-to-one correspondence with the color resistance formed by the mask, the shape thereof can also be referred to the above-mentioned FIGS. 2A to 2C.
  • the specific steps of sequentially forming the color film layer include:
  • the predetermined coating sequence includes one of the following: (1) red, blue, green, that is, RBG three colors; (2) red, blue, green, yellow, that is, RBGY four colors; or (3) Red, blue, green, white, that is, RGBW four colors.
  • the advantage is that it protects the color set behind, giving it a more natural, bright color and a clearer picture.
  • the order of the above colors can be adjusted according to the size of the liquid crystal display and the product category of the final application. For example, the color of a large-sized advertising liquid crystal display applied to the outdoor should be brighter, and the monitoring display applied to the monitoring room can be darker, and the coating order of the corresponding color is correspondingly shifted back.
  • FIG. 3A to FIG. 3D are schematic top views of a plurality of color resists.
  • the three-color color resistance formed therein has a strip shape as shown in FIG. 3A, a diagonal line as shown in FIG. 3B, or a mosaic shape as shown in FIG. 3C.
  • the four color resists formed are in a mosaic-like distribution as shown in FIG. 3D, where X represents Y or W.
  • the photoresist since the photoresist is liquid or gel-like at the time of coating, it shrinks due to its surface tension, forms a round-shaped edge such as water droplets at the edge, and forms an unevenness after baking.
  • the curved surface which in turn forms a light leakage area.
  • the extension is performed at the apex of the original body portion which is most easily contracted, thereby avoiding the phenomenon of light leakage due to surface tension, and the preparation process is simple and the cost is low.
  • step S104 a transparent electrode layer is sputtered on the color film layer.
  • the transparent electrode layer is an indium tin oxide (ITO) film
  • a protective film may be further disposed between the ITO film and the color film layer, and the preparation step is: applying glue on the color film layer by a glue applicator The machine is coated to form the protective film.
  • ITO indium tin oxide
  • the color resistance is prevented from shrinking due to surface tension to form a light leakage region, thereby avoiding light leakage, and the preparation process Simple and low cost.
  • FIG. 4 a cross-sectional view of the color filter substrate is shown.
  • the color filter substrate 1 includes a glass substrate 10, a black matrix 20, a color filter layer 30, a protective film 40, and a transparent electrode layer 50.
  • the black matrix 20 is formed on the glass substrate 10.
  • a color film layer 30 is formed on the black matrix 20, and the color film layer 30 includes color resists of a plurality of colors.
  • the color resist includes a main body portion 31 and an extension portion (32, 33 or 34).
  • the main body portion 31 has a rectangular shape, and the extension portion (32, 33 or 34) extends at opposite vertices of the rectangular portion of the main body portion 31 toward opposite sides of the rectangular shape, and may have any predetermined shape.
  • the extension 32 is rectangular in shape as shown in Fig. 2A, or the extension 33 is circular as shown in Fig. 2B, or the extension 34 is one of irregular polygons as shown in Fig. 2C.
  • the extension portion (32, 33 or 34) of the color resist is partially overlapped with the main body portion 31.
  • One of the cases of coincidence is that the center of the extension (32, 33 or 34) coincides with the apex of the illustrated main body portion 31.
  • the distribution of the color resistance includes the following situations:
  • the color resistance is divided into red, blue, and green, that is, when the RBG is three colors, the three color resists formed therein are in the shape of a strip as shown in FIG. 3A, as shown in FIG. 3B, or a mosaic-like distribution as shown in Figure 3C;
  • the four color resists formed are in a mosaic shape as shown in FIG. 3D, wherein X Represents Y or W.
  • the color resist is prevented from shrinking due to surface tension to form a light leakage region, thereby avoiding light leakage.
  • FIG. 4 a cross-sectional view of a liquid crystal display of the present invention is shown.
  • the liquid crystal display mainly comprises: a color film substrate 1, an array substrate 2, a liquid crystal layer 3, and a backlight (not labeled).
  • the array substrate 2 includes, in order from the backlight (arrow) direction to the liquid crystal layer direction, a polarizer 21, a glass substrate 22, a transparent conductive film (pixel electrode) 23, and an alignment film 24.
  • the color filter substrate 1 includes, in order from the human eye direction to the liquid crystal layer direction, a polarizer 12, a glass substrate 10, a black matrix 20, a color filter layer 30, a protective film 40, a transparent electrode layer 50, and an alignment film 11.
  • the color filter substrate 1 is prepared by the preparation method of the first embodiment or the color film substrate of the second embodiment. Since the front view shape of the color filter substrate 1 has been highlighted in the above embodiment, FIG. 2 and FIG. 3, details are not described herein again.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
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Abstract

一种彩膜基板(1)、彩膜基板(1)的制备方法及液晶显示器，该彩膜基板(1)的制备方法包括：在玻璃基板(10)上制备黑矩阵(20)；在黑矩阵(20)上依次生成多种颜色的色阻以形成彩膜层(30)，色阻包括主体部(31)和延长部(32、33或34)，且主体部(31)呈矩形，延长部(32、33或34)位于主体部的矩形各顶点处向矩形的相对侧延伸。该彩膜基板(1)通过各色阻上设置延长部(32、33或34)，避免了漏光的现象，且制备工艺简单、成本低廉。

Description

彩膜基板、彩膜基板的制备方法及液晶显示器 技术领域
本发明涉及液晶显示技术领域，特别涉及一种彩膜基板、彩膜基板的制备方法及液晶显示器。
 背景技术
在液晶显示器的制备过程中，先独立制备阵列基板和彩膜基板，再将阵列基板与彩膜基板进行对盒，形成液晶盒。其中，彩膜基板上的黑矩阵与阵列基板上的扫描线、数据线及薄膜晶体管（TFT）等部件的位置相对应，通过所述黑矩阵挡住所述的扫描线、数据线及薄膜晶体管等部件。
在阵列基板与彩膜基板进行对盒过程中，特别是对于大尺寸的液晶显示器，阵列基板与彩膜基板之间经常会出现对位偏差，使黑矩阵与扫描线、数据线及薄膜晶体管之间发生错位。所述错位，会使黑矩阵的边缘出现漏光，从而发生串扰（V-CrossTalk）现象，影响液晶显示器的显示效果。
液晶显示器作为显示器的主流，应用的场合越来越广，相应的性能也要进行改善。比如，显示器的尺寸越来越大、色彩越来越丰富、亮度越来越高等。然而上述性能的改善都会直接或间接的增加液晶显示器的制备难度。工艺上稍有不慎，便使液晶显示器产生漏光现象，并影响显示效果。
 技术问题
有鉴于此，本发明提供一种彩膜基板、彩膜基板的制备方法、及液晶显示器，以避免漏光现象的产生。
 技术解决方案
为解决上述技术问题，本发明实施例提供了一种彩膜基板的制备方法，包括：
(1)制备玻璃基板；
(2)在所述玻璃基板上制备黑矩阵；以及
(3)在所述黑矩阵上依次生成多种颜色的色阻，以形成彩膜层，所述色阻包括主体部和延长部，且所述主体部呈矩形，所述延长部位于所述主体部的矩形各顶点处向所述矩形的相对侧延伸。
优选地，所述延长部呈矩形、圆形、菱形或梯形中的一种。
优选地，所述延长部与所述主体部部分重合。
优选地，所述延长部的中心与所示主体部的顶点重合。
优选地，所述步骤(3)具体包括：
在所述黑矩阵上涂布第一颜色的光刻胶，并进行预烘烤；
通过掩模板对所述光刻胶进行曝光；
进行显影及蚀刻，以形成第一颜色的色阻；以及
按照预设涂布顺序，依此形成其他预设颜色。
优选地，所述掩模板包括掩模板主体部和掩模板延长部，且所述掩模板主体部呈矩形，所述掩模板延长部位于所述掩模板主体部的矩形各顶点处向所述矩形的相对侧延伸。
优选地，所述预设涂布顺序包括如下中的一种：红、蓝、绿三色色阻；红、蓝、绿、黄四色色阻；或红、蓝、绿、白四色色阻；且当涂布所述三色色阻时，所形成的三色色阻呈条形、对角线或马赛克状分布；当涂布所述四色色阻时，所形成的四色色阻呈马赛克状分布。
优选地，所述步骤(3)之后，还包括：
(4)在所述彩膜层上溅镀透明电极层。
本发明还提供了一种彩膜基板，包括：
玻璃基板；
黑矩阵，形成于所述玻璃基板上；以及
彩膜层，形成于所述黑矩阵上，所述彩膜层包括多种颜色的色阻，且所述色阻包括主体部和延长部，且所述主体部呈矩形，所述延长部位于所述主体部的矩形各顶点处向所述矩形的相对侧延伸。
优选地，所述延长部呈矩形、圆形、菱形或梯形中的一种。
优选地，所述延长部与所述主体部部分重合。
优选地，所述延长部的中心与所示主体部的顶点重合。
优选地，所述多种颜色的色阻，包括如下中的一种：
红、蓝、绿三色色阻，且所述三色色阻所形成的三色色阻呈条形、对角线或马赛克状分布；或
红、蓝、绿、黄四色色阻、或红、蓝、绿、白四色色阻，且所述四色色阻所形成的四色色阻呈马赛克状分布。
优选地，所述彩膜层上还包括溅镀的透明电极层。
本发明还提供了一种液晶显示器，包括上述的彩膜基板。
 有益效果
相对于现有技术，本发明的彩膜基板、彩膜基板的制备方法及液晶显示器，通过在彩膜层的各色阻的顶点处设置延长部，避免了色阻由于表面张力而进行收缩进而形成漏光区域，从而避免了漏光的现象，且制备工艺简单、成本低廉。
 附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面对实施例中所需要使用的附图作简单的介绍。下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获取其他的附图。
图1为本发明实施例一中彩膜基版的制备方法的流程示意图；
图2A~2C为本发明实施例一中单个色阻的俯视示意图；
图3A~3D为本发明实施例一中多个色阻的俯视示意图；
图4为本发明实施例二中彩膜基板的剖面示意图；
图5为本发明实施例三中液晶显示器的剖面示意图。
 本发明的最佳实施方式
请参照附图中的图式，其中相同的组件符号代表相同的组件。以下的说明是基于所例示的本发明具体实施例，其不应被视为限制本发明未在此详述的其它具体实施例。
实施例一
请参阅图1，所示为本发明中一种彩膜基板的制备方法。
在步骤S101中，制备玻璃基板。
可以理解的是，本步骤的制备工艺，主要是按照预定尺寸进行切割，并通过清洗机进行清洗。
在步骤S102中，在所述玻璃基板上制备黑矩阵。
具体而言，所述制备黑矩阵的步骤还可以细化为：
(1)在所述玻璃基板上溅镀黑色膜，所述黑色膜包括黑铬膜或黑色颜料膜；
(2)在所述黑色膜上进行光刻胶涂布并进行预烘烤，形成光刻胶层；
(3)通过光刻掩模对所述光刻胶层进行紫外线照射；
(4)对所述光刻胶层依次进行曝光、显影；
(5)依照显影结果对所述黑色膜进行蚀刻；以及
(6)对黑色膜进行光刻胶剥离，并形成黑矩阵，所述黑矩阵用于遮光。
在步骤S103中，在所述黑矩阵上依次生成多种颜色的色阻，以形成彩膜层。
请参阅图2A~2C，所示为本发明实施例中单个色阻的俯视示意图。概而言之，色阻包括色阻主体部31和色阻延长部（32、33或34）。其中色阻主体部31呈矩形，所述色阻延长部（32、33或34）位于所述主体部31的矩形各顶点处向所述矩形的相对侧延伸，并可以呈任意预设形状。如图2A所示色阻延长部32呈矩形、或如图2B所示色阻延长部33呈圆形、亦或如图2C所示色阻延长部34呈不规则多边形中的一种，如菱形或梯形。且，所述色阻的延长部（32、33或34）与所主体部31部分重合。其中一种重合的情形为：所述延长部（32、33或34）的中心与所示主体部31的顶点重合。
可以理解的是，在本发明中，还需要设计一种不规则形状的掩模板。所述不规则形状的掩模板包括掩模板主体部和掩模板延长部，且所述掩模板主体部呈矩形，所述掩模板延长部位于所述掩模板主体部的矩形各顶点处向所述矩形的相对侧延伸，并可以呈任意预设形状。由于所述掩模板的形状与其形成的色阻一一对应，因此其形状即亦可参照上述图2A~2C所示。
所述依次形成彩膜层的具体步骤，包括：
(1)在所述黑矩阵上涂布第一颜色的光刻胶，并进行预烘烤；
(2)通过上述掩模板对所述光刻胶进行曝光；
(3)进行显影及蚀刻，以形成第一颜色的色阻；以及
(4)按照预设涂布顺序，返回步骤(1)的工艺以依此形成其他预设颜色的色阻。
其中，所述预设涂布顺序为包括以下中一种：(1)红、蓝、绿，即RBG三色；(2)红、蓝、绿、黄，即RBGY四色；或(3)红、蓝、绿、白，即RGBW四色。其好处是：更大程度的保护了靠后设置的颜色，使其呈现出更加自然、明亮的色彩、画面更加清晰。
可以理解的是：上述颜色的顺序可以根据液晶显示器的尺寸及最终应用的产品类别进行调节。比如：应用于户外的大型广告用液晶显示器的色彩应当更鲜亮，而应用于监控室的监控显示器则可以偏暗些，并将对应颜色的涂布顺序相应的后移。
请参阅图3A~图3D，所示为多个色阻的俯视示意图。其中，若为上述RBG三色时，其形成的三色色阻呈如图3A所示的条形、如图3B所示的对角线、或如图3C所示的马赛克状分布。若为上述RGBY或RGBW四色时，其形成的四色色阻呈如图3D所示的马赛克状分布，其中X代表Y或者W。
可以理解的是，由于光刻胶在涂布时呈液态或胶状，会因其表面张力而进行收缩，在边缘处形成如水滴类的圆弧形边缘，并在烘烤后形成不平滑的曲面，进而形成漏光区域。而在本步骤中，在原主体部最易收缩的顶点处进行延展，从而避免了因为表面张力导致的漏光的现象，且制备工艺简单、成本较低。
在步骤S104中，在所述彩膜层上溅镀透明电极层。
所述透明电极层为氧化铟锡（ITO）膜，在ITO膜与彩膜层之间还可以包括一层保护膜，其制备步骤为：通过涂胶机在所述彩膜层上通过涂胶机进行涂布，以形成所述保护膜。
本发明的彩膜基板的制备方法，通过在彩膜层的各色阻的顶点处设置延长部，避免了色阻由于表面张力而进行收缩进而形成漏光区域，从而避免了漏光的现象，且制备工艺简单、成本低廉。
实施例二
请参阅图4，所示为彩膜基板的剖面示意图。
所述彩膜基板1包括：玻璃基板10、黑矩阵20、彩膜层30、保护膜40、以及透明电极层50。
其中，所述黑矩阵20，形成于所述玻璃基板10上。
彩膜层30，形成于所述黑矩阵20上，所述彩膜层30包括多种颜色的色阻。
请参阅图2A~2C，所示为本发明实施例中单个色阻的俯视示意图。其中，色阻包括主体部31和延长部（32、33或34）。其中主体部31呈矩形，所述延长部（32、33或34）位于所述主体部31的矩形各顶点处向所述矩形的相对侧延伸，并可以呈任意预设形状。如图2A所示延长部32呈矩形、或如图2B所示延长部33呈圆形、亦或如图2C所示延长部34呈不规则多边形中的一种。且，且，所述色阻的延长部（32、33或34）与所主体部31部分重合。其中一种重合的情形为：所述延长部（32、33或34）的中心与所示主体部31的顶点重合。
其中，所述色阻的分布包括如下情形：
（1）所述色阻分为：红、蓝、绿，即RBG三色时，则其形成的三色色阻呈如图3A所示的条形、如图3B所示的对角线、或如图3C所示的马赛克状分布；
（2）所述色阻分为红、蓝、绿、黄四色或红、蓝、绿、白四色时，则其形成的四色色阻呈如图3D所示的马赛克状分布，其中X代表Y或者W。
本发明的彩膜基板，通过在彩膜层的各色阻的顶点处设置延长部，避免了色阻由于表面张力而进行收缩进而形成漏光区域，从而避免了漏光的现象。
实施例三
请参阅图4，所示为本发明液晶显示器的剖面示意图。
所述液晶显示器主要包括：彩膜基板1、阵列基板2、液晶层3、以及背光源（未标示）。
其中，所述阵列基板2从背光源（箭头）方向至所述液晶层方向，依次包括：偏光片21、玻璃基板22、透明导电膜（像素电极）23、以及取向膜24。
所述彩膜基板1从人眼方向至所述液晶层方向，依次包括：偏光片12、玻璃基板10、黑矩阵20、彩膜层30、保护膜40、透明电极层50以及取向膜11。
可以理解的是，所述彩膜基板1，是由上述实施例一的制备方法制备而成、或采用实施例二的彩膜基板。由于上述实施例、图2以及图3已着重展示了彩膜基板1的正面形状，因此在此不再赘述。
好的产品不仅是生成出来的，更是设计出来的。本发明的液晶显示器，通过在彩膜层的各色阻的顶点处设置延长部，避免了色阻由于表面张力而进行收缩进而形成漏光区域，从而避免了漏光的现象，且制备工艺简单、成本低廉。
可以理解的是：虽然各实施例的侧重不同，但其设计思想是一致的，某个实施例中没有详述的部分，可以参见说明书全文的详细描述，不再赘述。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通测试人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (15)

  1. 一种彩膜基板的制备方法，其中，包括：
    (1)制备玻璃基板；
    (2)在所述玻璃基板上制备黑矩阵；以及
    (3)在所述黑矩阵上依次生成多种颜色的色阻，以形成彩膜层，所述色阻包括主体部和延长部，且所述主体部呈矩形，所述延长部位于所述主体部的矩形各顶点处向所述矩形的相对侧延伸。
  2. 如权利要求1所述的制备方法，其中，所述延长部呈矩形、圆形、菱形或梯形中的一种。
  3. 如权利要求2所述的制备方法，其中，所述延长部与所述主体部部分重合。
  4. 如权利要求2所述的制备方法，其中，所述延长部的中心与所示主体部的顶点重合。
  5. 如权利要求1所述的制备方法，其中，所述步骤(3)具体包括：
    在所述黑矩阵上涂布第一颜色的光刻胶，并进行预烘烤；
    通过掩模板对所述光刻胶进行曝光；
    进行显影及蚀刻，以形成第一颜色的色阻；以及
    按照预设涂布顺序，依此形成其他预设颜色。
  6. 如权利要求5所述的制备方法，其中，所述掩模板包括掩模板主体部和掩模板延长部，且所述掩模板主体部呈矩形，所述掩模板延长部位于所述掩模板主体部的矩形各顶点处向所述矩形的相对侧延伸。
  7. 如权利要5所述的制备方法，其中，所述预设涂布顺序包括如下中的一种：红、蓝、绿三色色阻；红、蓝、绿、黄四色色阻；或红、蓝、绿、白四色色阻；
    且当涂布所述三色色阻时，所形成的三色色阻呈条形、对角线或马赛克状分布；当涂布所述四色色阻时，所形成的四色色阻呈马赛克状分布。
  8. 如权利要求1所述的制备方法，其中，所述步骤(3)之后，还包括：
    (4)在所述彩膜层上溅镀透明电极层。
  9. 一种彩膜基板，其中，包括：
    玻璃基板；
    黑矩阵，形成于所述玻璃基板上；以及
    彩膜层，形成于所述黑矩阵上，所述彩膜层包括多种颜色的色阻，且所述色阻包括主体部和延长部，且所述主体部呈矩形，所述延长部位于所述主体部的矩形各顶点处向所述矩形的相对侧延伸。
  10. 如权利要求9所述的彩膜基板，其中，所述延长部呈矩形、圆形、菱形或梯形中的一种。
  11. 如权利要求10所述的彩膜基板，其中，所述延长部与所述主体部部分重合。
  12. 如权利要求10所述的彩膜基板，其中，所述延长部的中心与所示主体部的顶点重合。
  13. 如权利要9所述的彩膜基板，其中，所述多种颜色的色阻，包括如下中的一种：
    红、蓝、绿三色色阻，且所述三色色阻所形成的三色色阻呈条形、对角线或马赛克状分布；或
    红、蓝、绿、黄四色色阻、或红、蓝、绿、白四色色阻，且所述四色色阻所形成的四色色阻呈马赛克状分布。
  14. 如权利要9所述的彩膜基板，其中，所述彩膜层上还包括溅镀的透明电极层。
  15. 一种液晶显示器，其中，包括如权利要求9所述的彩膜基板。
PCT/CN2015/075829 2015-03-18 2015-04-03 彩膜基板、彩膜基板的制备方法及液晶显示器 Ceased WO2016145688A1 (zh)

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