WO2016107507A1 - 一种硅片边缘保护装置 - Google Patents

一种硅片边缘保护装置 Download PDF

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Publication number
WO2016107507A1
WO2016107507A1 PCT/CN2015/099084 CN2015099084W WO2016107507A1 WO 2016107507 A1 WO2016107507 A1 WO 2016107507A1 CN 2015099084 W CN2015099084 W CN 2015099084W WO 2016107507 A1 WO2016107507 A1 WO 2016107507A1
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WO
WIPO (PCT)
Prior art keywords
silicon wafer
wafer edge
protection device
edge protection
assembly
Prior art date
Application number
PCT/CN2015/099084
Other languages
English (en)
French (fr)
Inventor
周旭
崔海仓
倪费
葛黎黎
Original Assignee
上海微电子装备有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 上海微电子装备有限公司 filed Critical 上海微电子装备有限公司
Priority to JP2017534779A priority Critical patent/JP6371911B2/ja
Priority to US15/541,331 priority patent/US9964864B2/en
Priority to SG11201705286VA priority patent/SG11201705286VA/en
Publication of WO2016107507A1 publication Critical patent/WO2016107507A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Definitions

  • the present invention relates to the field of semiconductor manufacturing, and in particular to a silicon wafer edge protection device.
  • Lithography devices are primarily used in the fabrication of integrated circuit ICs or other micro devices.
  • the mask pattern can be imaged onto the photoresist-coated silicon wafer by a lithographic apparatus.
  • the lithography apparatus exposes the designed mask pattern onto the photoresist by exposure of the projection objective lens, and as a core component of the lithography apparatus, the wafer edge protection device is important for realizing the edge protection function of the wafer during the exposure process of the negative glue process. influences.
  • Photoresist also known as photoresist (referred to as resist) or photosensitive paste, also known as photoresist or photoresist
  • positive photoresist referred to as positive glue
  • negative photoresist referred to as Negative glue
  • the photoresist is coated on the silicon wafer. After exposure, the photoresist in which the exposed portion is dissolved by the developer is referred to as a positive photoresist, and the photoresist in which the non-exposed portion is dissolved by the developer is referred to as a negative photoresist.
  • the silicon edge protector is a device produced for the negative lithography process.
  • the silicon wafer edge protection device in the prior art shields the edge of the silicon wafer with a guard ring, and protects the edge of the silicon wafer from being exposed during exposure.
  • the protection ring is a blackout shielding member whose central portion is hollow and the edge is solid.
  • the silicon wafer edge protection device comprises a protection ring mechanical transmission component and a control module, and the control module controls the protection ring mechanical transmission component when the workpiece stage of the lithographic apparatus carries the silicon wafer to move to the position of the transfer protection ring directly under the silicon wafer edge protection device. Transfer the guard ring to the workpiece table or retrieve the guard ring from the workpiece table. Referring to FIG.
  • the silicon wafer edge protection device does not have a speed regulating device, and the control device directly outputs a switching signal to the air source switching valve, regulates the gas pressure through the switching valve, and then controls the mechanical transmission of the protection ring.
  • the cylinder moves in the vertical direction of the assembly.
  • the acceleration is first moved to the time t1.
  • the speed reaches V1.
  • the velocity is continuously moved at the speed V1.
  • the protection ring mechanically transmits the component and the light.
  • the safety and reliability of the silicon wafer edge protection device are required in a narrow space of the lithography apparatus, especially in the debugging process, if the workpiece stage and the silicon wafer edge protection device The relative position of the wafer is not correct.
  • the edge protection device of the silicon wafer collides with the workpiece table.
  • the edge protection device of the silicon wafer impacts the workpiece table momentarily.
  • the ordinate A represents the amplitude in Hertz (Hz) and the abscissa.
  • t represents time in seconds (s).
  • the collision produces a strong vibration signal, and the momentary strong impact will permanently damage the structure and performance of the workpiece table; and vibrate or directly crush the silicon wafer.
  • the prior art also provides a silicon wafer edge protection device, which performs a plurality of radial synchronization forces through a power source, and converts a linear displacement into a plurality of equally divided radial displacements, thereby realizing the exchange of the protection rings. Less power source and high synchronism. However, in the working process, the wafer edge protection device cannot protect the workpiece table when there is a collision, and there is a safety hazard.
  • the present invention provides a silicon wafer edge protection device.
  • a silicon wafer edge protection device comprising: a horizontal motion component; a vertical motion component; and a speed control device coupled to the vertical motion component for adjusting a speed of movement of the vertical motion assembly; a flexible collision avoidance assembly connecting the horizontal motion assembly and the vertical motion assembly for reducing a vibration amplitude of a silicon wafer edge protection device during a collision; and a control device
  • the speed governor signal connection is used to send a control signal to the speed control device to control the movement of the vertical motion component.
  • the silicon wafer edge protection device further comprises a collision signal detecting and protecting component for detecting a vibration signal of the horizontal motion component relative to the vertical motion component, and issuing an alarm signal and a protection signal according to the vibration signal;
  • the collision signal detection and protection component and the control The device signal is connected, and the control device receives the alarm signal and the protection signal, and sends a control signal to the speed regulating device according to the alarm signal and the protection signal to control the movement of the vertical motion component.
  • the horizontal movement assembly comprises: a fixed disc; a three-eccentric cam disc fixed on the fixed disc by a bearing, the three eccentric cam discs are evenly provided with at least one eccentric groove; a horizontal cylinder
  • the horizontal direction cylinder has a first end connected to the fixed disc, and a second end connected to the three eccentric cams; at least one cam follower disposed in at least one eccentric groove of the three eccentric cam discs; At least one protection claw embedded in the fixed disk, a first end of each of the at least one protection claws being fixedly coupled to a corresponding one of the at least one cam followers, the at least one protection claw The second end of each of them is used to grab or release a guard ring.
  • the first end of the horizontal direction cylinder is connected to the fixed disc by a first hinge shaft, and the second end of the horizontal direction cylinder is connected to the three eccentric cam by a second hinge shaft.
  • the upper end of the vertical movement assembly is fixedly coupled with a vertical direction fixing member, and the lower end of the vertical movement assembly is connected to the flexible collision avoidance assembly through the adapter plate assembly.
  • the vertical movement assembly is a vertical direction cylinder.
  • the speed governing device is a servo valve disposed on a source of air.
  • the flexible collision avoidance assembly comprises a flexible sheet and a stop assembly for limiting the flexible sheet, the flexible sheet being coupled to the vertical movement assembly, the flexible sheet being secured to the horizontal movement assembly connection.
  • said flexible sheet is coupled to said vertical movement assembly by an adapter plate assembly.
  • the limiting component comprises at least two limiting rods, wherein the bottoms of the at least two limiting rods are fixedly connected with the horizontal moving component, and the at least two limiting rods penetrate through the bottom from top to bottom.
  • the flexible piece and the adapter plate assembly are provided with a lock nut at an upper end of the at least two limiting rods.
  • the at least two limit bars are evenly disposed around the flexible sheet.
  • the upper end of the at least two limiting rods is sleeved with a limit washer.
  • the flexible sheet has a circular shape, and at least one surface of the flexible sheet is disposed to form a a plurality of ribs of the ring; a flexible sheet inside the ring surrounded by the plurality of ribs is fixedly connected to the adapter plate assembly, and a flexible piece outside the ring surrounded by the plurality of ribs and the horizontal movement The components are fixedly connected.
  • a plurality of outer holes are formed on the outer side of the ring surrounded by the ribs, and a plurality of inner holes are formed on the inner side of the ring surrounded by the plurality of ribs;
  • the first screw is fixedly coupled to the adapter plate assembly; the plurality of inner holes of the flexible sheet are fixedly coupled to the horizontal movement assembly by a plurality of second screws.
  • each of the plurality of ribs has a fan shape.
  • said collision avoidance signal detection and protection assembly includes at least one collision detection sensor coupled to said horizontal motion assembly and said vertical motion assembly.
  • said at least one impact detecting sensor is attached to said wafer edge protection device by at least one sensor holder.
  • the silicon wafer edge protection device controls the speed of the vertical motion component by setting the speed regulating device, and the control device controls the vertical motion component to accelerate the movement firstly through the speed regulating device; when the speed is accelerated to a certain degree, the uniform motion is maintained;
  • the vertical motion component drives the horizontal motion component to move closer to the workpiece table, the deceleration motion, when the horizontal motion component moves closer to the workpiece table, the motion speed of the vertical motion component has been greatly reduced, reducing the The probability of collision between the horizontal motion component and the workpiece table, and reducing the impact force between the horizontal motion component and the workpiece table when colliding with each other, avoiding the horizontal motion component from strongly impacting the workpiece table in an instant, reducing silicon
  • the amplitude of the vibration of the edge protector prevents the horizontal moving assembly from crushing the silicon wafer.
  • the speed control device can protect the workpiece table and the silicon wafer on the basis of ensuring production efficiency.
  • the flexible anti-collision component is arranged to reduce the vibration amplitude of the silicon wafer edge protection device during the collision, and when the silicon wafer edge protection device collides with the workpiece table, the impact force between the silicon wafer edge protection device and the workpiece table is reduced. Avoid the silicon edge protection device from momentarily impacting the workpiece table, thus preventing the silicon edge protection device from crushing the silicon wafer.
  • the silicon wafer edge protection device Detecting a vibration signal of the horizontal motion component relative to the vertical motion component by setting the collision signal detection and protection component, and when the vibration signal does not exceed a threshold, the silicon wafer edge protection device normally moves; when the vibration signal exceeds When the threshold is reached, it is determined that a collision occurs, and the collision signal detecting and protection component issues an alarm signal and a protection signal; the control device receives the alarm signal and then alarms. At the same time, the control device receives the protection signal, controls the silicon wafer edge protection device to perform the protection movement through the speed regulating device, ends the collision action in time, protects the workpiece table, and avoids crushing the silicon wafer.
  • FIG. 1 is a front elevational view of a wafer edge protection device in accordance with an embodiment of the present invention
  • FIG. 2 is a perspective view of a silicon wafer edge protection device according to an embodiment of the present invention.
  • 3a is a schematic diagram of a speed control method of a silicon wafer edge protection device in which no speed regulating device is provided in the prior art;
  • 3b is a schematic view showing a speed control method of a silicon wafer edge protection device provided with a speed regulating device according to the present invention
  • FIG. 4a is a schematic diagram showing a speed change of a silicon wafer edge protection device in which no speed regulating device is provided in the prior art
  • 4b is a schematic diagram showing the speed change of the silicon wafer edge protection device provided with the speed regulating device of the present invention
  • FIG. 5a is a schematic structural view of a flexible sheet of a silicon wafer edge protection device according to an embodiment of the present invention.
  • 5b is a schematic view of a flexible sheet of a silicon wafer edge protection device in different motion states according to an embodiment of the present invention
  • 6a is a schematic diagram of a vibration signal when a silicon wafer edge protection device collides with a workpiece table in the prior art
  • FIG. 6b is a schematic diagram of vibration signals of a horizontal moving component relative to a vertical moving component when a silicon wafer edge protection device collides with a workpiece table according to an embodiment of the present invention.
  • the figure shows: 1, vertical motion component, 2, vertical direction fixture, 3, collision detection sensor, 4, guard ring, 5, protection claw, 6, sensor bracket, 7, fixed disc, 8, flexible sheet, 8 -1, outer hole, 8-2, ribs, 8-3, inner hole, 8a, flexible sheet stable state, 8b, flexible sheet acceleration downward movement or collision state, 8c, flexible sheet accelerated upward movement state, 9, adapter plate assembly, 10 , limit rod, 11, limit washer, 12, lock nut, 13, horizontal cylinder, 14, first hinge, 15, second hinge, 16, three eccentric cam, 17, cam follower, 18, bearing, 19, gas source, 20, speed control device.
  • a silicon wafer edge protection device includes: a horizontal motion component; a vertical motion component 1; a speed regulating device 20 for adjusting a motion speed of the vertical motion component 1; a flexible collision avoidance component, Connecting the horizontal motion component and the vertical motion component 1 for reducing a vibration amplitude of a silicon wafer edge protection device during a collision; a collision signal detecting and protecting component for detecting the horizontal motion component relative to the vertical motion a vibration signal of the component 1 and an alarm signal and a protection signal according to the vibration signal; a control device (not shown), the control device being signally connected to the speed regulating device 20 for issuing a control signal to the speed regulating device 20 Controlling the movement of the vertical motion assembly 1.
  • the collision signal detecting and protecting component is connected to the control device, and the control device receives the alarm signal and the protection signal, and sends a control signal to the speed regulating device 20 according to the alarm signal and the protection signal to control the vertical
  • the movement of the moving assembly 1 the movement of the vertical moving assembly 1 drives the horizontal moving assembly to move, preventing the horizontal moving assembly from striking strongly with the workpiece table.
  • the horizontal movement assembly includes: a fixed disk 7, a triple eccentric cam disk 16, a horizontal direction cylinder 13, a cam follower 17, at least one guard ring 4, at least one protection claw 5;
  • the three eccentric cam discs 16 are fixed to the fixed disc 7 by bearings 18, and the three eccentric cam discs 16 are circumferentially moved by a cylindrical surface of the bearing 18, and the three eccentric cam discs 16 are evenly disposed.
  • one end of the horizontal direction cylinder 13 is connected to the fixed plate 7
  • the other end is connected to the three eccentric cams 16; the cam followers 17 are disposed in the eccentric grooves of the three eccentric cam discs 16; the protection claws 5 are embedded in the fixed discs 7 through the linear guides ( (not shown) is connected to the fixed disk 7; the protection claw 5 can be radially reciprocated relative to the fixed disk 7 along a linear guide, and one end of the protection claw 5 is fixedly connected to the cam follower 17.
  • the other end is in contact with the guard ring 4, and the cam follower 17 drives the protection grip 5 to perform a radial reciprocating motion in the fixed disc 7, thereby achieving the grasping and releasing of the guard ring 4.
  • the protective claw 5 also protects the overload of the guard ring 4.
  • the horizontal direction cylinder 13 is connected to the fixed disk 7 via a first hinge shaft 14 and to the three eccentric cams 16 via a second hinge shaft 15.
  • the horizontal direction cylinder 13 drives the three eccentric cams 16 to perform a circular motion, and the three eccentric cams 16 drive the cam followers 17 to perform radial movement through the eccentric grooves.
  • the cam follower 17 drives the protection claw 5 to move along the linear guide rail relative to the fixed disc 7 to realize clamping and loosening of the protection ring 4 by the protection claw 5, thereby realizing the The exchange of the guard ring 4 transfers the guard ring 4 to the workpiece table or retrieves the guard ring 4 from the workpiece table.
  • the vertical movement assembly 1 is a vertical direction cylinder, and the vertical direction cylinder upper end is fixedly coupled with a vertical direction fixing member 2, and the vertical direction cylinder lower end passes through the adapter plate assembly 9 and the flexibility.
  • the anti-collision component is connected.
  • the speed regulating device 20 is a servo valve disposed on the air source 19, and the servo valve is signally connected to the control device.
  • the control device outputs a voltage control signal to the servo valve
  • the servo valve receives a voltage control signal from the control device, correspondingly outputs the modulated flow rate and pressure, and adjusts the gas pressure or flow rate of the gas source 19 input to the vertical direction cylinder.
  • V2 is the speed of the wafer edge protection device in the uniform motion stage in the embodiment
  • V3 is when the horizontal motion component moves to be close to the workpiece table or in the state of the transfer protection ring 4.
  • the speed of the wafer edge protection device controls the vertical cylinder first acceleration motion by the speed regulating device 20; when the speed is accelerated to V2, the uniform motion is maintained; when the vertical cylinder moves the horizontal motion component to move closer to the workpiece table, the deceleration motion
  • the vertical cylinder movement speed has been reduced to V3 (corresponding to the time t2 shown in FIG.
  • the horizontal moving component is prevented from crushing the silicon wafer. It can be seen from FIG. 4a and FIG.
  • the speed adjusting device 20 can be provided to protect the workpiece table and the silicon wafer on the basis of ensuring production efficiency.
  • the flexible anti-collision assembly includes a flexible sheet 8 and a limiting assembly for limiting the flexible sheet 8.
  • the flexible sheet 8 is connected to the vertical moving assembly 1 below, and the flexible sheet 8 is below
  • the horizontal motion component is fixedly connected.
  • the flexible sheet 8 is connected to the vertical movement assembly 1 through the adapter plate assembly 9. Below the flexible sheet 8, it is fixedly connected to the fixed disk 7 of the horizontal movement assembly.
  • the limiting component comprises at least two limiting rods 10, and the bottom of the limiting rod 10 is fixedly connected with the horizontal moving component, and the limiting rod 10 penetrates through the flexible sheet 8 in order from bottom to top.
  • the adapter plate assembly 9, the upper end of the limiting rod 10 is provided with a lock nut 12.
  • the locking rod 10 is locked by the lock nut 12 to prevent the horizontal movement assembly and the vertical movement assembly 1 from moving away from each other, and the relative position of the horizontal movement assembly and the vertical movement assembly 1 is restricted.
  • the limiting rod 10 is evenly disposed around the flexible sheet 8 to facilitate uniform positioning of the flexible sheet by the limiting component.
  • a limiting washer 11 is disposed on the upper end of the limiting rod 10 and below the lock nut 12, and the limiting washer 11 is used for buffering the locking nut 12, preventing the lock nut 12 from being fixed too tightly and not being able to turn.
  • the flexible sheet 8 is circular, and at least one surface of the flexible sheet 8 is provided with a plurality of ribs 8-2 surrounding a circle; the ribs 8-
  • the flexible sheet 8 on the inner side of the ring is fixedly connected to the adapter plate assembly 9, and the flexible sheet 8 on the outer side of the ring surrounded by the ribs 8-2 is fixedly connected to the fixed disk 7 of the horizontal movement assembly.
  • the ribs 8-2 are fan-shaped, and may be any other suitable shape.
  • the outer side of the ring surrounded by the ribs 8-2 is provided with a ring outer hole 8-1, and the inner side of the ring 8-2 is provided with an inner hole 8-3;
  • the outer hole 8 of the flexible piece 8 -1 is fixedly connected to the adapter plate assembly 9 by screws;
  • the inner hole 8-3 of the flexible sheet 8 is fixedly connected to the fixed disk 7 of the horizontal movement assembly by screws.
  • FIG. 5b in conjunction with FIG. 1 and FIG. 2, in the steady state of the flexible sheet 8, the flexible sheet 8 is subjected to the pulling force of the horizontal moving assembly, and the rib 8-2 of the middle portion of the flexible sheet 8 is bent and deformed, and the entire flexible sheet 8 is formed.
  • Round. 8a in Fig. 5b is a case where the flexible sheet 8 is in a stable state after the limit member is set.
  • the horizontal movement component is accelerated downward or subjected to an upward collision force, and the fan-shaped bending degree of the flexible sheet 8 is reduced as compared with the steady state.
  • the flexible sheet 8 is shaped like 8b in FIG. 5b, horizontally.
  • the moving component and the vertical moving component 1 are close to each other; when the horizontal moving component accelerates upward movement, the fan-shaped bending degree of the flexible sheet 8 is increased compared to the steady state, and at this time, the flexible sheet 8 is shaped like 8c in FIG. 5b, the horizontal moving component and The vertical motion components 1 are remote from each other.
  • the limit assembly By providing the limit assembly, the degree of bending of the flexible sheet 8 is limited, preventing the horizontal movement assembly and the vertical movement assembly 1 from moving away from each other.
  • the horizontal movement assembly and the workpiece table have a gap of only 0.4 mm.
  • the limit assembly limits the degree of deformation of the flexible sheet 8, and when the horizontal movement assembly and the vertical movement assembly 1 have a tendency to move away, the limit assembly ensures a relative relationship between the horizontal movement assembly and the vertical movement assembly 1.
  • the position prevents the horizontal movement assembly and the vertical movement assembly 1 from moving away from each other, preventing the horizontal movement assembly from moving downward due to deformation of the flexible sheet 8, and avoiding collision of the horizontal movement assembly with the workpiece stage.
  • the flexible anti-collision assembly has a phase connection with the rigid connection in the prior art. The same effect.
  • the flexible sheet 8 not only has sufficient rigidity in the horizontal direction to ensure that the flexible sheet does not twist, but also provides gravity support of the horizontal moving component and a certain amount of flexible deformation in the vertical direction; a suitable balance point needs to be achieved between the two. .
  • the rigidity of the flexible sheet 8 can be adjusted by changing the thickness of the flexible sheet 8, the number of ribs, and the width of the rib 8-2.
  • the ribs 8-2 are eight, and the ribs 8-2 are 7 mm wide
  • the rigidity is reached: when the flexible sheet 8 is loaded with an impact force of 100 N, the flexible sheet 8 is in a vertical direction in a steady state.
  • the displacement is 1 mm
  • the stiffness is 0.01 mm/N
  • the flexible sheet 8 is not twisted in the horizontal direction.
  • the flexible sheet 8 is used to buffer the instantaneous impact between the horizontal moving component and the workpiece table into a flexible collision process for a long time, and the vibration amplitude generated by the collision is greatly reduced, so as to detect the collision signal.
  • the detection provides sufficient time for the anti-collision signal detection and protection component to issue a protection signal in time, and the control device controls the vertical motion cylinder 1 to perform corresponding protection actions in time to prevent the silicon wafer edge protection device from immediately impacting the workpiece table. Reduce the vibration amplitude to avoid crushing the silicon wafer.
  • the anti-collision signal detecting and protecting component comprises at least one collision detecting sensor 3, and the collision detecting sensor 3 is connected with the horizontal moving component and the vertical moving component 1 for the collision.
  • the detection sensor 3 is fixed to the wafer edge protection device via the sensor holder 6.
  • the collision detecting sensor 3 is fixed to the adapter plate assembly 9 via a sensor bracket 6.
  • the collision detecting sensor 3 is capable of detecting a vibration signal of the horizontal moving component relative to the vertical moving component 1 during operation of the wafer edge protection device.
  • the collision detecting sensor 3 detects a vibration signal of the horizontal motion component relative to the vertical motion component 1, and when the vibration signal does not exceed a threshold, the silicon wafer edge protection device normally moves; when the vibration signal exceeds a threshold, Then, it is determined that a collision occurs, and the collision detecting sensor 3 issues an alarm signal and a protection signal; the control device receives an alarm signal and then alarms.
  • the protection signal is divided into two types: a rising signal and a stop signal.
  • a rising signal When the wafer edge protection device is vertical
  • the collision detecting sensor 3 sends a rising signal;
  • the control device receives the rising signal from the collision detecting sensor 3, and controls the silicon through the speed adjusting device 20.
  • the edge protection device moves upwards to protect the workpiece table from crushing the silicon wafer.
  • a stop signal is issued, and the control device receives the stop signal from the collision detecting sensor 3, and controls the silicon wafer edge protection device to stop moving through the speed regulating device 20, and ends the collision action in time. .

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种硅片边缘保护装置，包括：水平运动组件；垂直运动组件（1）；调速装置（20），与所述垂直运动组件（1）信号连接，用于调节所述垂直运动组件（1）的运动速度；柔性防撞组件，连接所述水平运动组件和所述垂直运动组件（1），用于减小碰撞时硅片边缘保护装置的振动幅度；以及一控制装置，与所述调速装置（20）信号连接，用于发出控制信号至所述调速装置（20），以控制所述垂直运动组件（1）的运动。硅片边缘保护装置可以避免瞬间强烈冲击工作台，避免压碎硅片；当发生碰撞时，可以保护工作台和硅片；并且提高了生产效率。

Description

一种硅片边缘保护装置 技术领域
本发明涉及半导体制造领域，尤其涉及一种硅片边缘保护装置。
背景技术
光刻装置主要用于集成电路IC或其他微型器件的制造。通过光刻装置，可将掩膜图形成像于涂覆有光刻胶的硅片上。光刻装置通过投影物镜曝光，将设计的掩模图形转移到光刻胶上，而作为光刻装置的核心元件，硅片边缘保护装置对实现负胶工艺曝光过程硅片边缘保护功能有重要的影响。
光刻胶，也称光致抗蚀剂(简称抗蚀剂)或光敏胶，也有地区称光阻或光阻剂，可分为正光刻胶(简称正胶)和负光刻胶(简称负胶)两类。将光刻胶涂覆于硅片上，曝光后，曝光部分被显影剂溶解的光刻胶称为正光刻胶，非曝光部分被显影液溶解的光刻胶称为负光刻胶。硅片边缘保护装置就是为负胶光刻工艺而产生的一种装置。
现有技术中的硅片边缘保护装置是利用保护环遮挡硅片边缘，保护硅片边缘在曝光过程中不会被曝光，所述保护环是一种中央部分镂空，边缘为实体的遮光屏蔽物件。这种硅片边缘保护装置包括保护环机械传送组件和控制模块，当光刻设备的工件台携带硅片运动至硅片边缘保护装置正下方交接保护环位置时，控制模块控制保护环机械传送组件将保护环传送到工件台上或者从工件台上取回保护环。请参考图3a和4a，现有技术中这种硅片边缘保护装置不设置调速装置，控制装置直接输出开关信号至气源的开关阀，通过开关阀调控气体压力，然后控制保护环机械传送组件垂直方向气缸运动，保护环机械传送组件向下运动过程中，先加速运动至t1时刻，此时速度达到V1，t1时刻后一直以速度为V1做匀速运动，当保护环机械传送组件与光刻设备中携带硅片的工件台碰撞时，硅片边缘保护装置的运动速度较大，二者之间的 冲击力较大，会破坏工件台和硅片。
因此，为了防止破坏工件台和硅片，在光刻装置狭窄空间中，硅片边缘保护装置的安全性和可靠性要求很高，特别是在调试过程中，如果工件台和硅片边缘保护装置的相对位置不正确，硅片边缘保护装置与工件台相撞，硅片边缘保护装置瞬间强烈冲击工件台，请参考图6a，其中，纵坐标A代表振幅，单位是赫兹(Hz)，横坐标t代表时间，单位是秒(s)。碰撞产生强烈的振动信号，瞬间强烈的冲击会对工件台的结构和性能造成永久性破坏；并振动或者直接压碎硅片。通过减小硅片边缘保护装置垂直方向的速度可以减小硅片边缘保护装置对工件台和硅片的冲击，但是会导致生产效率下降。
现有技术中还提供一种硅片边缘保护装置，通过一个动力源来完成多个径向同步力，使一种直线位移转化为多个等分径向位移，从而实现保护环的交换，需要动力源少，同步性高。但是这种硅片边缘保护装置在工作过程中，发生碰撞时，无法对工件台进行保护，存在安全隐患。
发明内容
为了提高安全性能，保护工件台和硅片，本发明提供一种硅片边缘保护装置。
为了解决以上技术问题，本发明的技术方案是：一种硅片边缘保护装置，包括：一水平运动组件；一垂直运动组件；一调速装置，与所述垂直运动组件信号连接，用于调节所述垂直运动组件的运动速度；一柔性防撞组件，连接所述水平运动组件和所述垂直运动组件，用于减小碰撞时硅片边缘保护装置的振动幅度；以及一控制装置，与所述调速装置信号连接，用于发出控制信号至所述调速装置，以控制所述垂直运动组件的运动。
作为优选，所述硅片边缘保护装置还包括一碰撞信号检测及保护组件，用于检测所述水平运动组件相对于所述垂直运动组件的振动信号，并根据振动信号发出报警信号和保护信号；所述碰撞信号检测及保护组件与所述控制 装置信号连接，所述控制装置接收报警信号和保护信号，根据报警信号和保护信号，发出控制信号至调速装置，控制所述垂直运动组件的运动。
作为优选，所述水平运动组件包括：一固定盘；三偏心凸轮盘，通过一轴承固定在所述固定盘上方，所述三偏心凸轮盘上均匀设置有至少一个偏心槽；水平方向气缸，所述水平方向气缸具有第一端与所述固定盘连接，以及第二端与所述三偏心凸轮连接；至少一个凸轮随动器，设置在所述三偏心凸轮盘的至少一个偏心槽内；以及至少一个保护爪，嵌在所述固定盘中，所述至少一个保护爪中的每一个的第一端与所述至少一个凸轮随动器中相对应的一个固定连接，所述至少一个保护爪中的每一个的第二端用于抓取或释放一保护环。
作为优选，所述水平方向气缸的第一端通过第一铰轴与所述固定盘连接，所述水平方向气缸的第二端通过第二铰轴与所述三偏心凸轮连接。
作为优选，所述垂直运动组件上端固定连接有垂直方向固定件，所述垂直运动组件下端通过转接板组件与所述柔性防撞组件连接。
作为优选，所述垂直运动组件是垂直方向气缸。
作为优选，所述调速装置是设置在气源上的伺服阀。
作为优选，所述柔性防撞组件包括柔性片和用于对所述柔性片限位的限位组件，所述柔性片与所述垂直运动组件连接，所述柔性片与所述水平运动组件固定连接。
作为优选，所述柔性片通过转接板组件与所述垂直运动组件连接。
作为优选，所述限位组件包括至少两个限位杆，所述至少两个限位杆的底部均与所述水平运动组件固定连接，所述至少两个限位杆从下至上依次贯穿所述柔性片和所述转接板组件，所述至少两个限位杆上端设有锁紧螺母。
作为优选，所述至少两个限位杆均匀设置在所述柔性片周围。
作为优选，所述至少两个限位杆上端套有限位垫圈。
作为优选，所述柔性片呈圆形，所述柔性片至少一个表面设置有围成一 圈的多个筋条；所述多个筋条围成的圈内侧的柔性片与所述转接板组件固定连接，所述多个筋条围成的圈外侧的柔性片与所述水平运动组件固定连接。
作为优选，所述筋条围成的圈外侧设有多个外孔，所述多个筋条围成的圈内侧设有多个内孔；所述柔性片的多个外孔处通过多个第一螺钉与所述转接板组件固定连接；所述柔性片的多个内孔处通过多个第二螺钉与所述水平运动组件固定连接。
作为优选，所述多个筋条的每一个呈扇形。
作为优选，所述防撞信号检测及保护组件包括至少一个碰撞检测传感器，所述碰撞检测传感器与所述水平运动组件以及所述垂直运动组件信号连接。
作为优选，所述至少一个碰撞检测传感器通过至少一个传感器支架固定在所述硅片边缘保护装置上。
本发明所提供的硅片边缘保护装置，通过设置调速装置控制垂直运动组件的速度，控制装置通过调速装置控制所述垂直运动组件先加速运动；速度加速至一定程度时，保持匀速运动；当所述垂直运动组件带动所述水平运动组件运动接近工件台时，减速运动，当所述水平运动组件运动至接近工件台上方，所述垂直运动组件运动速度已经大大减小，减小了所述水平运动组件与工件台发生碰撞的几率，并且减小所述水平运动组件与工件台相互碰撞时二者之间的冲击力，避免所述水平运动组件瞬间强烈冲击工件台，减小了硅片边缘保护装置的振动幅度，避免所述水平运动组件压碎硅片。相比不设置调速装置的情况，设置调速装置后，所述垂直运动组件在匀速运动阶段的运动速度大大提高，进而提高了生产效率。因此，设置调速装置可以在保证生产效率的基础上，保护工件台和硅片。
通过设置柔性防撞组件减小碰撞时硅片边缘保护装置振动幅度，当硅片边缘保护装置与工件台碰撞时，减小硅片边缘保护装置与工件台碰撞时二者之间的冲击力，避免硅片边缘保护装置瞬间强烈冲击工件台，进而避免硅片边缘保护装置压碎硅片。
通过设置所述碰撞信号检测及保护组件，检测所述水平运动组件相对于所述垂直运动组件的振动信号，当振动信号没有超过阈值时，所述硅片边缘保护装置正常运动；当振动信号超过阈值时，则判定为发生碰撞，所述碰撞信号检测及保护组件发出报警信号和保护信号；控制装置接收报警信号后报警。同时控制装置接收保护信号，通过调速装置控制所述硅片边缘保护装置执行保护运动，及时结束碰撞动作，保护工件台，避免压碎硅片。
附图说明
图1是本发明一实施例的硅片边缘保护装置的主视图；
图2是本发明一实施例的硅片边缘保护装置的立体图；
图3a是现有技术中未设置调速装置的硅片边缘保护装置速度控制方法示意图；
图3b是本发明设置有调速装置的硅片边缘保护装置速度控制方法示意图；
图4a是现有技术中未设置调速装置的硅片边缘保护装置速度变化示意图；
图4b是本发明设置有调速装置的硅片边缘保护装置速度变化示意图；
图5a是本发明一实施例的硅片边缘保护装置的柔性片的结构示意图；
图5b是本发明一实施例的硅片边缘保护装置的柔性片在不同运动状态时的示意图；
图6a是现有技术中硅片边缘保护装置与工件台发生碰撞时的振动信号示意图；
图6b是本发明一实施例中硅片边缘保护装置与工件台发生碰撞时水平运动组件相对于垂直运动组件的振动信号示意图。
图中所示：1、垂直运动组件，2、垂直方向固定件，3、碰撞检测传感器，4、保护环，5、保护爪，6、传感器支架，7、固定盘，8、柔性片，8-1、外孔， 8-2、筋条，8-3、内孔，8a、柔性片稳定状态，8b、柔性片加速度向下运动或者碰撞状态，8c、柔性片加速向上运动状态，9、转接板组件，10、限位杆，11、限位垫圈，12、锁紧螺母，13、水平方向气缸，14、第一铰轴，15、第二铰轴，16、三偏心凸轮，17、凸轮随动器、18、轴承，19、气源，20、调速装置。
具体实施方式
下面结合附图对本发明作详细描述。
请参考图1和图2，一种硅片边缘保护装置，包括：水平运动组件；垂直运动组件1；调速装置20，用于调节所述垂直运动组件1的运动速度；柔性防撞组件，连接所述水平运动组件和所述垂直运动组件1，用于减小碰撞时硅片边缘保护装置的振动幅度；碰撞信号检测及保护组件，用于检测所述水平运动组件相对于所述垂直运动组件1的振动信号，并根据振动信号发出报警信号和保护信号；控制装置(图未示出)，所述控制装置与所述调速装置20信号连接，用于发出控制信号至调速装置20，控制所述垂直运动组件1的运动。
具体地，所述碰撞信号检测及保护组件与所述控制装置信号连接，所述控制装置接收报警信号和保护信号，根据报警信号和保护信号，发出控制信号至调速装置20，控制所述垂直运动组件1的运动，所述垂直运动组件1的运动带动所述水平运动组件运动，防止所述水平运动组件与工件台发生强烈撞击。
继续参考图1和图2，所述水平运动组件包括：固定盘7、三偏心凸轮盘16、水平方向气缸13、凸轮随动器17、至少一个保护环4、至少一个保护爪5；所述三偏心凸轮盘16通过轴承18固定在所述固定盘7上，所述三偏心凸轮盘16以所述轴承18的圆柱面为滑动轴作圆周运动，所述三偏心凸轮盘16上均匀设置有若干个偏心槽；所述水平方向气缸13一端与所述固定盘7连接， 另一端与所述三偏心凸轮16连接；所述凸轮随动器17设置在所述三偏心凸轮盘16的偏心槽内；所述保护爪5嵌在所述固定盘7中，通过直线导轨(图未示出)与所述固定盘7连接；保护爪5可以沿着直线导轨相对于所述固定盘7做径向往复运动，所述保护爪5一端与所述凸轮随动器17固定连接，另一端与所述保护环4接触连接，凸轮随动器17带动所述保护抓5在固定盘7内进行径向往复运动，从而实现对保护环4的抓取与释放。所述保护爪5还对所述保护环4的过载起到保护作用。
较佳的，所述水平方向气缸13通过第一铰轴14与所述固定盘7连接，通过第二铰轴15与所述三偏心凸轮16连接。
具体地，水平方向气缸13通气后，所述水平方向气缸13驱动所述三偏心凸轮16做圆周运动，所述三偏心凸轮16通过所述偏心槽带动所述凸轮随动器17作径向运动，所述凸轮随动器17带动所述保护爪5沿着直线导轨相对固定盘7做径向运动，实现所述保护爪5对所述保护环4的夹紧和松开，从而实现所述保护环4的交换，将所述保护环4传送到工件台上或者从工件台上取回所述保护环4。
请参考图1和图2，所述垂直运动组件1是垂直方向气缸，所述垂直方向气缸上端固定连接有垂直方向固定件2，所述垂直方向气缸下端通过转接板组件9与所述柔性防撞组件连接。
请参考图3b，结合图1和图2，本实施例中，所述调速装置20是设置在气源19上的伺服阀，所述伺服阀与所述控制装置信号连接。工作过程中，控制装置向所述伺服阀输出电压控制信号，伺服阀接收控制装置发出的电压控制信号，相应输出调制的流量和压力，调节气源19输入所述垂直方向气缸的气体压力或流量，从而控制所述垂直方向气缸的运动速度，所述垂直方向气缸带动所述水平运动组件运动。
请参考图4b，结合图1和图2，V2是本实施例中硅片边缘保护装置匀速运动阶段的速度，V3是所述水平运动组件运动至接近工件台上方或处于交接 保护环4状态时所述硅片边缘保护装置的速度。控制装置通过调速装置20控制所述垂直方向气缸先加速运动；速度加速至V2时，保持匀速运动；当所述垂直方向气缸带动所述水平运动组件运动接近工件台时，减速运动，当所述水平运动组件运动至接近工件台上方，处于交接保护环4状态时，所述垂直方向气缸运动速度已经减小至V3(对应图4b所示t2时刻)，V3远远小于V1，因此减小了所述水平运动组件与工件台发生碰撞的几率，并且根据动能定理E＝1/2mv2(其中E代表动能，m代表质量，v代表速度)，在水平运动组件质量不变的情况下，减小其运动速度可以减小所述水平运动组件与工件台相互碰撞时二者之间的冲击力，避免所述水平运动组件瞬间强烈冲击工件台，减小了硅片边缘保护装置的振动幅度，避免所述水平运动组件压碎硅片。从图4a和图4b可以看出，相比现有技术中不设置调速装置的情况，本发明设置调速装置20后，所述垂直方向气缸在匀速运动阶段的运动速度大大提高(即V2>V1)，进而提高了生产效率。因此，设置调速装置20可以在保证生产效率的基础上，保护工件台和硅片。
所述柔性防撞组件包括柔性片8和用于对所述柔性片8限位的限位组件，所述柔性片8上方与所述垂直运动组件1连接，所述柔性片8下方与所述水平运动组件固定连接。较佳的，所述柔性片8上方通过转接板组件9与所述垂直运动组件1连接。所述柔性片8下方与所述水平运动组件的固定盘7固定连接。
较佳的，所述限位组件包括至少两个限位杆10，所述限位杆10底部与所述水平运动组件固定连接，所述限位杆10从下至上依次贯穿所述柔性片8和所述转接板组件9，所述限位杆10上端设置有锁紧螺母12。通过锁紧螺母12锁紧所述限位杆10，防止水平运动组件和垂直运动组件1相互远离，限制水平运动组件和垂直运动组件1相对位置。所述限位杆10均匀设置在所述柔性片8周围，便于所述限位组件对所述柔性片均匀限位。所述限位杆10上端、锁紧螺母12下方套有限位垫圈11，所述限位垫圈11用于缓冲所述锁紧螺母 12，防止所述锁紧螺母12固定过紧而转不开。
请参考图5a，结合图1和图2，所述柔性片8是圆形，所述柔性片8至少一个表面设有围成一圈的若干个筋条8-2；所述筋条8-2围成的圈内侧的柔性片8与所述转接板组件9固定连接，所述筋条8-2围成的圈外侧的柔性片8与所述水平运动组件的固定盘7固定连接。
较佳的，所述筋条8-2是扇形，也可为其他任何适合的形状。所述筋条8-2围成的圈外侧设有一圈外孔8-1，所述筋条8-2围成的圈内侧设有内孔8-3；所述柔性片8的外孔8-1处通过螺钉与所述转接板组件9固定连接；所述柔性片8的内孔8-3处通过螺钉与所述水平运动组件的固定盘7固定连接。
请参考图5b，结合图1和图2，柔性片8稳定状态下，柔性片8受到水平运动组件的拉力作用，柔性片8中间部分的筋条8-2发生弯曲变形，整个柔性片8呈圆形。如图5b中的8a是设置限位组件后柔性片8处于稳定状态的情况。
如果不设置限位组件，水平运动组件加速度向下或者受向上的碰撞力时，柔性片8的扇状弯曲程度相比稳定状态时减小，此时柔性片8形状如图5b中的8b，水平运动组件和垂直运动组件1相互靠近；水平运动组件加速向上运动时，柔性片8的扇状弯曲程度相比稳定状态时增大，此时柔性片8形状如图5b中的8c，水平运动组件和垂直运动组件1相互远离。
通过设置限位组件，柔性片8的弯曲程度受到限制，避免水平运动组件和垂直运动组件1相互远离。硅片边缘保护装置向下运动至和工件台处于交接保护环4状态时，水平运动组件与工件台只有0.4mm高度的间隙。限位组件限制柔性片8变形程度，当所述水平运动组件和所述垂直运动组件1有远离趋势时，限位组件保证所述水平运动组件和所述垂直运动组件1二者之间的相对位置，防止水平运动组件和垂直运动组件1相互远离，防止由于柔性片8变形导致水平运动组件向下运动，避免水平运动组件与工件台发生碰撞。保证交接保护环4过程中，所述柔性防撞组件与现有技术中刚性连接具有相 同的效果。
柔性片8不但要在水平方向上具备足够的刚度保证柔性片不发生扭转，而且在垂直方向上要提供水平运动组件的重力支撑及一定量的柔性变形；两者之间需要达到合适的平衡点。通过改变柔性片8厚度、筋条数量和筋条8-2的宽度可以调整柔性片8的刚度。较佳的，当柔性片8厚度1mm，筋条8-2是八条，筋条8-2宽7mm，刚度达到：当柔性片8负载100N的冲击力时，稳定状态下，柔性片8垂直方向位移为1mm，刚度为0.01mm/N，柔性片8水平方向未发生扭转现象。
请参考图图6b，结合图1和图2，同样地，纵坐标A代表振幅，单位是Hz，横坐标t代表时间，单位是秒(s)。与现有技术中的刚性碰撞相比，采用柔性片8使水平运动组件与工件台之间的瞬间冲击缓冲为较长时间的柔性碰撞过程，碰撞产生的振动幅度大大减小，为检测碰撞信号的检测提供了充足的时间，便于所述防撞信号检测及保护组件及时发出保护信号，控制装置及时控制垂直运动气缸1做出相应的保护动作，避免硅片边缘保护装置瞬间强烈冲击工件台，减小振动幅度，避免压碎硅片。
请参考图1和图2，所述防撞信号检测及保护组件包括至少一个碰撞检测传感器3，所述碰撞检测传感器3与所述水平运动组件以及所述垂直运动组件1信号连接，所述碰撞检测传感器3通过传感器支架6固定在硅片边缘保护装置上。较佳的，所述碰撞检测传感器3通过传感器支架6固定在所述转接板组件9上。碰撞检测传感器3能够在所述硅片边缘保护装置工作过程中检测所述水平运动组件相对于所述垂直运动组件1的振动信号。
具体地，碰撞检测传感器3检测所述水平运动组件相对于所述垂直运动组件1的振动信号，当振动信号没有超过阈值时，所述硅片边缘保护装置正常运动；当振动信号超过阈值时，则判定为发生碰撞，所述碰撞检测传感器3发出报警信号和保护信号；控制装置接收报警信号后报警。
保护信号分为上升信号和停止信号两种。当所述硅片边缘保护装置垂直 向下运动，并且保护环4夹持在所述水平运动组件上时，所述碰撞检测传感器3发出上升信号；控制装置接收碰撞检测传感器3发出的上升信号，通过调速装置20控制所述硅片边缘保护装置向上运动，保护工件台，避免压碎硅片。
当所述硅片边缘保护装置处于其他工况时均发出停止信号，控制装置接收碰撞检测传感器3发出的停止信号，通过调速装置20控制所述硅片边缘保护装置停止运动，及时结束碰撞动作。
本领域的技术人员可以对发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包括这些改动和变型在内。

Claims (17)

  1. 一种硅片边缘保护装置，其特征在于，包括：
    一水平运动组件；
    一垂直运动组件；
    一调速装置，与所述垂直运动组件信号连接，用于调节所述垂直运动组件的运动速度；
    一柔性防撞组件，连接所述水平运动组件和所述垂直运动组件，用于减小碰撞时硅片边缘保护装置的振动幅度；以及
    一控制装置，与所述调速装置信号连接，用于发出控制信号至所述调速装置，以控制所述垂直运动组件的运动。
  2. 根据权利要求1所述的硅片边缘保护装置，其特征在于，还包括一碰撞信号检测及保护组件，用于检测所述水平运动组件相对于所述垂直运动组件的振动信号，并根据振动信号发出报警信号和保护信号；所述碰撞信号检测及保护组件与所述控制装置信号连接，所述控制装置接收报警信号和保护信号，根据报警信号和保护信号，发出控制信号至调速装置，控制所述垂直运动组件的运动。
  3. 根据权利要求1所述的硅片边缘保护装置，其特征在于，所述水平运动组件包括：
    一固定盘；
    三偏心凸轮盘，通过一轴承固定在所述固定盘上，所述三偏心凸轮盘上均匀设置有至少一个偏心槽；
    水平方向气缸，所述水平方向气缸具有第一端与所述固定盘连接，以及第二端与所述三偏心凸轮连接；
    至少一个凸轮随动器，设置在所述三偏心凸轮盘的至少一个偏心槽内；以及
    至少一个保护爪，嵌在所述固定盘中，所述至少一个保护爪中的每一个的第一端与所述至少一个凸轮随动器中相对应的一个固定连接，所述至少一个保护爪中的每一个的第二端用于抓取或释放一保护环。
  4. 根据权利要求3所述的硅片边缘保护装置，其特征在于，所述水平方向气缸的第一端通过第一铰轴与所述固定盘连接，所述水平方向气缸的第二端通过第二铰轴与所述三偏心凸轮连接。
  5. 根据权利要求1所述的硅片边缘保护装置，其特征在于，所述垂直运动组件上端固定连接有垂直方向固定件，所述垂直运动组件下端通过转接板组件与所述柔性防撞组件连接。
  6. 根据权利要求5所述的硅片边缘保护装置，其特征在于，所述垂直运动组件为垂直方向气缸。
  7. 根据权利要求1所述的硅片边缘保护装置，其特征在于，所述调速装置为设置在气源上的伺服阀。
  8. 根据权利要求1所述的硅片边缘保护装置，其特征在于，所述柔性防撞组件包括柔性片和用于对所述柔性片限位的限位组件，所述柔性片与所述垂直运动组件连接，所述柔性片与所述水平运动组件固定连接。
  9. 根据权利要求8所述的硅片边缘保护装置，其特征在于，所述柔性片通过转接板组件与所述垂直运动组件连接。
  10. 根据权利要求8所述的硅片边缘保护装置，其特征在于，所述限位组件包括至少两个限位杆，所述至少两个限位杆的底部均与所述水平运动组件固定连接，所述至少两个限位杆从下至上依次贯穿所述柔性片和所述转接板组件，所述至少两个限位杆上端设置有锁紧螺母。
  11. 根据权利要求10所述的硅片边缘保护装置，其特征在于，所述至少两个限位杆均匀设置在所述柔性片周围。
  12. 根据权利要求10所述的硅片边缘保护装置，其特征在于，所述至少两个限位杆上端均套有限位垫圈。
  13. 根据权利要求8至12任一项所述的硅片边缘保护装置，其特征在于，所述柔性片呈圆形，所述柔性片至少一个表面设置有围成一圈的多个筋条；所述多个筋条围成的圈内侧的柔性片与所述转接板组件固定连接，所述多个筋条围成的圈外侧的柔性片与所述水平运动组件固定连接。
  14. 根据权利要求13所述的硅片边缘保护装置，其特征在于，所述多个筋条围成的圈外侧设有多个外孔，所述多个筋条围成的圈内侧设有多个内孔；所述柔性片的多个外孔处通过多个第一螺钉与所述转接板组件固定连接；所述柔性片的多个内孔处通过多个第二螺钉与所述水平运动组件固定连接。
  15. 根据权利要求13所述的硅片边缘保护装置，其特征在于，所述多个筋条的每一个呈扇形。
  16. 根据权利要求1所述的硅片边缘保护装置，其特征在于，所述防撞信号检测及保护组件包括至少一个碰撞检测传感器，与所述水平运动组件以及所述垂直运动组件信号连接。
  17. 根据权利要求16所述的硅片边缘保护装置，其特征在于，所述至少一个碰撞检测传感器通过至少一个传感器支架固定在所述硅片边缘保护装置上。
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Families Citing this family (6)

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Publication number Priority date Publication date Assignee Title
CN107219728B (zh) * 2017-07-31 2020-09-29 中国振华集团永光电子有限公司（国营第八七三厂） 一种防止硅片翘片的光刻方法
CN110609448B (zh) * 2018-06-14 2020-12-01 上海微电子装备（集团）股份有限公司 一种硅片边缘保护装置
DE102019213914A1 (de) * 2019-09-12 2021-03-18 Carl Zeiss Smt Gmbh Vorrichtung zur Reinigung einer Oberfläche im Inneren eines optischen Systems
JP7045353B2 (ja) * 2019-10-02 2022-03-31 株式会社アルバック 基板搬送装置、および、基板搬送方法
CN112859531B (zh) * 2019-11-28 2022-06-03 上海微电子装备（集团）股份有限公司 交接力测量装置及方法、光刻机
CN112530843B (zh) * 2020-11-30 2022-11-04 四川立泰电子有限公司 大功率管三极管自动剪脚设备

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11297587A (ja) * 1998-04-08 1999-10-29 Canon Inc 露光装置およびデバイス製造方法
CN102012639A (zh) * 2009-09-04 2011-04-13 上海微电子装备有限公司 一种硅片边缘保护方法与装置
CN102141735A (zh) * 2010-01-28 2011-08-03 上海微电子装备有限公司 硅片边缘保护装置及其应用方法
CN103293862A (zh) * 2012-02-22 2013-09-11 上海微电子装备有限公司 硅片边缘保护装置
CN103901733A (zh) * 2012-12-28 2014-07-02 上海微电子装备有限公司 曝光装置
CN203774252U (zh) * 2013-12-12 2014-08-13 上海华虹宏力半导体制造有限公司 应用于激光退火机器的边缘保护装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI223734B (en) * 1999-12-21 2004-11-11 Asml Netherlands Bv Crash prevention in positioning apparatus for use in lithographic projection apparatus
US6440219B1 (en) * 2000-06-07 2002-08-27 Simplus Systems Corporation Replaceable shielding apparatus
JP2003109999A (ja) * 2001-09-28 2003-04-11 Hitachi Kokusai Electric Inc 基板処理装置
US6680774B1 (en) * 2001-10-09 2004-01-20 Ultratech Stepper, Inc. Method and apparatus for mechanically masking a workpiece
EP1477852A1 (en) * 2003-05-16 2004-11-17 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7310132B2 (en) * 2006-03-17 2007-12-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009239018A (ja) * 2008-03-27 2009-10-15 Orc Mfg Co Ltd 投影露光装置
CN101487990B (zh) * 2009-02-27 2011-04-13 上海微电子装备有限公司 带边缘曝光保护的工件台
US9013695B2 (en) * 2010-09-13 2015-04-21 Orc Manufacturing Co., Ltd. Projection aligner

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11297587A (ja) * 1998-04-08 1999-10-29 Canon Inc 露光装置およびデバイス製造方法
CN102012639A (zh) * 2009-09-04 2011-04-13 上海微电子装备有限公司 一种硅片边缘保护方法与装置
CN102141735A (zh) * 2010-01-28 2011-08-03 上海微电子装备有限公司 硅片边缘保护装置及其应用方法
CN103293862A (zh) * 2012-02-22 2013-09-11 上海微电子装备有限公司 硅片边缘保护装置
CN103901733A (zh) * 2012-12-28 2014-07-02 上海微电子装备有限公司 曝光装置
CN203774252U (zh) * 2013-12-12 2014-08-13 上海华虹宏力半导体制造有限公司 应用于激光退火机器的边缘保护装置

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