WO2016106834A1 - 一种气刻配向方法及设备 - Google Patents

一种气刻配向方法及设备 Download PDF

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Publication number
WO2016106834A1
WO2016106834A1 PCT/CN2015/070549 CN2015070549W WO2016106834A1 WO 2016106834 A1 WO2016106834 A1 WO 2016106834A1 CN 2015070549 W CN2015070549 W CN 2015070549W WO 2016106834 A1 WO2016106834 A1 WO 2016106834A1
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gas
spray gun
platform
glass substrate
engraving
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French (fr)
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袁履璀
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

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  • the invention relates to the field of alignment film processing in the production process of liquid crystal display screens, in particular to a method using gas engraving alignment and equipment used.
  • the quality of the alignment film also determines the pros and cons of the display.
  • Rubbing cloth 1 rough cloth
  • the alignment film 2 are hard to avoid, and particle 3 (fine particles) and static electricity 4 and scratches 5 are extremely hard to be avoided.
  • this paper proposes a non-contact alignment method - the gas engraving alignment method and the special equipment used. Due to the non-contact alignment, the alignment method can effectively avoid static electricity, scratches, and film surface particles.
  • the aligning gas recycling it is not necessary to replace the Rubbing cloth frequently like the Rubbing machine. Therefore, the cost of the alignment process can be effectively reduced.
  • an object of the present invention is to provide a gas engraving and aligning apparatus comprising:
  • a spray gun disposed above the platform and aligned with the glass substrate
  • a high pressure jet system for supplying high pressure air to the spray gun
  • a mobile system used to drive a platform or spray gun to move the platform and gun relative to each other.
  • the spray gun is a plurality of nozzles arranged uniformly side by side.
  • the nozzle diameter of the spray gun is not more than 100 ⁇ m, and the distance between adjacent nozzles is not more than 1000 ⁇ m.
  • the nozzle is incident on the glass substrate at a preset angle ⁇ of between 1 and 80 degrees.
  • Another object of the present invention is to provide a gas engraving alignment method using the apparatus as described above, comprising the steps of:
  • the diameter of the spray gun nozzle is not more than 100 ⁇ m.
  • the spacing between two adjacent nozzles is not more than 1000 ⁇ m.
  • step 5 is further included: adjusting the gas pressure to be less than the etching force threshold x, and repeatedly combing the surface of the alignment film with a high pressure gas stream.
  • the effect of the bristles on the alignment film in the rubbing-like technique can be achieved, so that the liquid crystal molecules have the minimum surface free energy when aligned on the surface of the alignment film in accordance with the impact direction of the high-pressure gas stream.
  • the etching force threshold value x is obtained by gradually gradually pressurizing under the condition that the preset angle ⁇ , the platform or the moving speed of the spray gun is constant, and when the alignment film generates the groove, the air pressure value is etched.
  • the velocity threshold x is obtained by gradually gradually pressurizing under the condition that the preset angle ⁇ , the platform or the moving speed of the spray gun is constant, and when the alignment film generates the groove, the air pressure value is etched.
  • the special equipment and the gas aligning method provided by the invention avoid direct contact with the alignment film, effectively avoid the production of particles, static electricity and scratches on the surface of the alignment film, and the groove regularization obtained by the gas engraving is beneficial to better control the liquid crystal alignment. Moreover, in the final repeated combing step, it is also advantageous to impact the surface of the alignment film to change the arrangement pattern of the molecular chains of the alignment film to better achieve the effect of alignment with the liquid crystal molecules.
  • 1 is a schematic view of a conventional friction alignment method.
  • FIG. 2 is a schematic view of a gas engraving and aligning apparatus according to an embodiment of the present invention.
  • FIG 3 is a partial schematic view of a gas engraving alignment process in accordance with an embodiment of the present invention.
  • Fig. 4 is a schematic view showing the angle adjustment of the spray gun and the alignment film according to the embodiment of the present invention.
  • Fig. 5 is a schematic view showing the effect of the gas engraving in the embodiment of the present invention.
  • the gas engraving and aligning apparatus includes a platform 10 for carrying a glass substrate 30 for work; a spray gun 20 is disposed above the platform 10, and the spray gun 20 is evenly arranged side by side. a nozzle 21, a nozzle 21 aligned with the glass substrate 30, an alignment film 40 formed on the glass substrate 30; a high pressure jet system 50 connected to the spray gun 20 for supplying high pressure airflow to the spray gun 20; and a movement system 60 for driving
  • the platform 10 is moved to cause the platform 10 and the lance 20 to move relative to each other such that under the use of a high pressure gas stream, the alignment film 40 will create a groove (see Figure 3).
  • the nozzle 21 of the spray gun has a diameter of 100 ⁇ m, and the adjacent two nozzles have a pitch of 1000 ⁇ m.
  • the preset angle ⁇ of the nozzle 21 incident on the glass substrate 30 is adjusted to 5 degrees (see FIG. 4), and the preset angle ⁇ determines the shape of the groove; the threshold value x of the etching force under the working condition is found to be Key, Pro
  • the boundary value X can be gradually gradually pressurized and recorded at a certain pressure.
  • the gas pressure value is a critical value because the critical value X and the material of the alignment film, the formation process of the alignment film, and the gas flow incidence.
  • the angle is the preset angle ⁇ , the speed of the platform movement and other factors are related, so the data obtained by the above method is the most reliable; in determining the above data, when the formal air engraving is started, the mobile system 60 is activated, so that the platform 10 and the spray gun 20 are made. Relative movement, so that under the action of the high-pressure air flow, the alignment film completes the engraving, and a groove is formed on the surface of the alignment film.
  • the shape of the groove is as shown in FIG.
  • the groove obtained by the engraving is V-shaped, including the width d and the depth h, and further includes a slope in which the angle between the inclined surface and the alignment film is substantially equal to the predetermined angle ⁇ .
  • the effect of the bristles on the alignment film in the rubbing-like technique can be achieved, so that the liquid crystal molecules 80 have the minimum surface free energy when aligned on the surface of the alignment film according to the impact direction of the high-pressure airflow, and at the same time, the surface of the alignment film can be cleaned. the remains.
  • the variation of the adjacent two nozzles of the spray gun can be appropriately adjusted, generally not more than 1000 ⁇ m, and the diameter of the nozzle is not more than 100 ⁇ m, which can meet the requirements of the present invention; and the preset angle ⁇ of the nozzle incident glass substrate is 1-80 degrees.
  • the requirements of the present invention can be achieved, but the effect is better between 1-10 degrees.
  • the mobile system is the driving platform relative to the spray gun movement. In other embodiments, the mobile system can also drive the spray gun movement, which can also achieve the object of the present invention.
  • the special equipment and the gas aligning method provided by the invention avoid direct contact with the alignment film, effectively avoid the production of particles, static electricity and scratches on the surface of the alignment film, and the groove regularization obtained by the gas engraving is beneficial to better control the liquid crystal alignment. And in the final repeated combing step, it is also beneficial to impact the surface of the alignment film from The arrangement pattern of the molecular chains of the alignment film is changed to better achieve the effect of alignment with the liquid crystal molecules.

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)

Abstract

一种气刻配向设备，其中，包括平台（10），用于承载玻璃基板（30）；喷枪（20），设于平台（10）上方，对准玻璃基板（30）；高压喷气系统（50），用于给喷枪（20）提供高压气流；移动系统（60），用于驱动平台（10）或喷枪（20）使平台（10）和喷枪（20）做相对运动。结合以上设备提供一种气刻配向方法，包括步骤：将喷枪（20）对准配向膜（40），并调节喷枪（20）与配向膜（40）的夹角为预设角度（θ）；启动高压喷气系统（50），并调节气压，使得气压力度大于刻蚀力度临界值（x）进行气刻。

Description

一种气刻配向方法及设备 技术领域
本发明涉及液晶显示屏生产过程中的配向膜加工领域，特别是采用气刻配向的方法及所使用的设备。
背景技术
在液晶显示屏生产过程中，配向膜加工的好坏也决定了显示屏的优劣。如图1所示，在以往的Rubbing(摩擦)配向技术中，Rubbing cloth 1(摩擦布)与配向膜2摩擦后难以避免的会产生particle 3(微粒)和静电4和划痕5，极大地影响了玻璃面板的质量，为了消除上述因素带来的影响，本文提出了一种非接触式的配向方法——气刻配向方法和所采用的专用设备。由于采用非接触式配向，所以该配向方法一方面可以有效地避免静电、划痕的产生以及减少膜面particle，另一方面，由于配向气体循环利用，无需像Rubbing机器那样需要经常更换Rubbing布，所以可以有效降低配向制程的成本。
发明内容
为达到以上目的，本发明的目的之一是提供一种气刻配向设备，包括：
平台，承载用于作业的玻璃基板；
喷枪，设于平台上方，对准玻璃基板；
高压喷气系统，用于给喷枪提供高压气流；
移动系统，用于驱动平台或喷枪使平台和喷枪做相对运动。
其中，喷枪为并排均匀设置的多个喷嘴。
其中，喷枪的喷嘴口径不大于100μm，相邻两个喷嘴间距不大于1000μm。
其中，喷嘴入射玻璃基板预设角度θ在1-80度之间。
本发明的另一个目的是提供一种气刻配向方法，使用如以上所述的设备，包括如下步骤：
1)、将形成好配向膜的玻璃基板置于平台上；
2)、将喷枪对准配向膜，并调节喷枪与配向膜的夹角为预设角度θ；
3)、启动高压喷气系统，并调节气压，使得气压力度大于刻蚀力度临界值x进行气刻；
4)、启动移动系统，使得平台和喷枪做相对运动，完成气刻。
其中，喷枪喷嘴的口径不大于100μm。
其中，相邻两个喷嘴的间距不大于1000μm。
另外，在步骤4)后还包括步骤5)：调节气压力度小于刻蚀力度临界值x，用高压气流对配向膜表面进行反复梳吹。这样就可以达到类似于Rubbing(摩擦)技术中刷毛对配向膜的作用效果，使液晶分子按照高压气流的冲击方向在配向膜表面排列时拥有最小表面自由能。
其中，刻蚀力度临界值x的获得方法是：在预设角度θ、平台或喷枪移动速度条件不变情况下，逐渐缓慢加压，当配向膜产生刻槽时，则该气压值为刻蚀力度临界值x。
本发明提供的专用设备和气刻配向方法避免了直接接触配向膜，有效避免配向膜表面微粒、静电和划痕的现象生产，而且气刻得到的沟槽规整，有利于更好的控制液晶配向，并且在最后的反复梳吹环节也有利于冲击配向膜表面从而改变配向膜分子链的排布形态，以更好地达到与液晶分子配向的效果。
附图说明
图1是现有的摩擦配向方法示意图。
图2是本发明实施例气刻配向设备示意图。
图3是本发明实施例气刻配向过程局部示意图。
图4是本发明实施例喷枪和配向膜角度调节示意图。
图5是本发明实施例气刻效果示意图。
具体实施方式
下面将结合附图用实施例对本发明进一步说明。
如图2所示，本发明实施例提供的这种气刻配向设备，包括用于承载用于作业的玻璃基板30的平台10；平台10上方设有喷枪20，喷枪20上并排均匀设置的多个喷嘴21，喷嘴21对准玻璃基板30，玻璃基板30上形成有配向膜40；喷枪20上连接有高压喷气系统50，用于给喷枪20提供高压气流；还包括移动系统60，用于驱动平台10移动，使平台10和喷枪20做相对运动，这样在高压气流使用下，配向膜40将产生刻槽(见图3)。本实施例中，根据刻槽的需要，优选喷枪的喷嘴21口径是100μm，相邻两个喷嘴间距是1000μm设置。开始气刻前，调节好喷嘴21入射玻璃基板30预设角度θ为5度(参见图4)，预设角度θ决定了刻槽的形状；找到该工作条件下的刻蚀力度临界值x是关键，临 界值X的获得可以先逐渐缓慢加压并记录在某一气压时，配向膜产生刻槽，则该气压值为临界值，因为临界值X与配向膜的原料、配向膜形成工艺、气流入射角度即预设角度θ，平台移动的速度等因素相关，所以采用以上方法获得的数据是最为可靠的；在确定以上数据了，正式气刻时，启动移动系统60，使得平台10和喷枪20做相对运动，这样在高压气流作用下，配向膜完成气刻，在配向膜表面形成一道道的刻槽，刻槽的形状如图5所示，因为喷嘴21与配向膜40形成一预定角度θ，所以气刻得到的刻槽为V形，包括宽度d和深度h，其中还包括其中一斜面与配向膜的夹角大致等于上述预定角度θ的斜面。在气刻完成后，还有必要对配向膜40做进一步梳吹处理，即采用同样的气流入射角、同样的平台移动速度，调节气压力度小于刻蚀力度临界值x，用高压气流对配向膜表面进行反复梳吹。这样就可以达到类似于Rubbing(摩擦)技术中刷毛对配向膜的作用效果，使液晶分子80按照高压气流的冲击方向在配向膜表面排列时拥有最小表面自由能，同时还可以清洁配向膜表面的残留物。
同时，在实践中，还了解到，在预设角度越小时，即配向膜表面受到的冲击力的角度越小，临界值X就越大，刻槽的宽度d和深度h的比例也会随之变化，喷枪的相邻两个喷嘴的间距可以做适当调整，一般不大于1000μm，喷嘴的口径不大于100μm均可以达到本发明要求；而喷嘴入射玻璃基板预设角度θ在1-80度之间都可以达到本发明要求，但是在1-10度间的效果更好。以上实施例中移动系统是驱动平台相对喷枪运动，在其他实施例中，也可以是移动系统驱动喷枪运动，同样可以达到本发明目的。
本发明提供的专用设备和气刻配向方法避免了直接接触配向膜，有效避免配向膜表面微粒、静电和划痕的现象生产，而且气刻得到的沟槽规整，有利于更好的控制液晶配向，并且在最后的反复梳吹环节也有利于冲击配向膜表面从 而改变配向膜分子链的排布形态，以更好地达到与液晶分子配向的效果。
以上所述仅是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。

Claims (17)

  1. 一种气刻配向设备，其中，包括
    平台，承载用于作业的玻璃基板；
    喷枪，设于平台上方，对准玻璃基板；
    高压喷气系统，用于给喷枪提供高压气流；
    移动系统，用于驱动平台或喷枪使平台和喷枪做相对运动。
  2. 根据权利要求1所述的气刻配向设备，其中，所述喷枪为并排均匀设置的多个喷嘴。
  3. 根据权利要求2所述的气刻配向设备，其中，所述喷枪的喷嘴口径不大于100μm，相邻两个喷嘴间距不大于1000μm。
  4. 根据权利要求1所述的气刻配向设备，其中，所述喷嘴入射玻璃基板预设角度θ在1-80度之间。
  5. 根据权利要求2所述的气刻配向设备，其中，所述喷嘴入射玻璃基板预设角度θ在1-80度之间。
  6. 根据权利要求3所述的气刻配向设备，其中，所述喷嘴入射玻璃基板预设角度θ在1-80度之间。
  7. 根据权利要求4所述的气刻配向设备，其中，所述喷嘴入射玻璃基板预设角度θ在1-10度之间。
  8. 根据权利要求5所述的气刻配向设备，其中，所述喷嘴入射玻璃基板预设角度θ在1-10度之间。
  9. 根据权利要求6所述的气刻配向设备，其中，所述喷嘴入射玻璃基板预设角度θ在1-10度之间。
  10. 一种气刻配向方法，其中，使用气刻配向设备，包括：
    平台，承载用于作业的玻璃基板；
    喷枪，设于平台上方，对准玻璃基板；
    高压喷气系统，用于给喷枪提供高压气流；
    移动系统，用于驱动平台或喷枪使平台和喷枪做相对运动；
    配向方法包括如下步骤：
    1)、将形成好配向膜的玻璃基板置于平台上；
    2)、将喷枪对准配向膜，并调节喷嘴入射玻璃基板预设角度θ；
    3)、启动高压喷气系统，并调节气压，使得气压力度大于刻蚀力度临界值x进行气刻；
    4)、启动移动系统，使得平台和喷枪做相对运动，完成气刻。
  11. 根据权利要求10所述的气刻配向方法，其中，所述喷枪的喷嘴的口径不大于100μm。
  12. 根据权利要求11所述的气刻配向方法，其中，所述相邻两个喷嘴的间距不大于1000μm。
  13. 根据权利要求12所述的气刻配向方法，其中，在步骤4)后还包括步骤：
    5)调节气压力度小于刻蚀力度临界值x，用高压气流对配向膜表面进行反 复梳吹。
  14. 根据权利要求10所述的气刻配向方法，其中，所述刻蚀力度临界值x的获得方法是：在预设角度θ、平台或喷枪移动速度条件不变情况下，逐渐缓慢加压，当配向膜产生刻槽时，则该气压值为刻蚀力度临界值x。
  15. 根据权利要求11所述的气刻配向方法，其中，所述刻蚀力度临界值x的获得方法是：在预设角度θ、平台或喷枪移动速度条件不变情况下，逐渐缓慢加压，当配向膜产生刻槽时，则该气压值为刻蚀力度临界值x。
  16. 根据权利要求12所述的气刻配向方法，其中，所述刻蚀力度临界值x的获得方法是：在预设角度θ、平台或喷枪移动速度条件不变情况下，逐渐缓慢加压，当配向膜产生刻槽时，则该气压值为刻蚀力度临界值x。
  17. 根据权利要求13所述的气刻配向方法，其中，所述刻蚀力度临界值x的获得方法是：在预设角度θ、平台或喷枪移动速度条件不变情况下，逐渐缓慢加压，当配向膜产生刻槽时，则该气压值为刻蚀力度临界值x。
PCT/CN2015/070549 2014-12-30 2015-01-12 一种气刻配向方法及设备 Ceased WO2016106834A1 (zh)

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