WO2016090692A1 - 一种湿制程机台的腔室结构 - Google Patents

一种湿制程机台的腔室结构 Download PDF

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Publication number
WO2016090692A1
WO2016090692A1 PCT/CN2014/095486 CN2014095486W WO2016090692A1 WO 2016090692 A1 WO2016090692 A1 WO 2016090692A1 CN 2014095486 W CN2014095486 W CN 2014095486W WO 2016090692 A1 WO2016090692 A1 WO 2016090692A1
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WIPO (PCT)
Prior art keywords
inclined plate
processing machine
disposed
wet processing
chamber structure
Prior art date
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Ceased
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PCT/CN2014/095486
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English (en)
French (fr)
Inventor
王凡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Publication of WO2016090692A1 publication Critical patent/WO2016090692A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0404—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays

Definitions

  • the invention relates to the technical field of wet process, in particular to a chamber structure of a wet process machine.
  • the top of the wet process machine chamber is horizontally designed and has no flow guiding effect.
  • the nozzle will eject a liquid, which is prone to generate water vapor under the action of high temperature, and the water vapor will accumulate at the top of the chamber, so that droplets are easily formed, and when the droplets are excessively concentrated, the liquid The drops will fall down and stain on the process substrate, which will cause the process substrate to have a similar drop-like color unevenness, which will affect the yield of the product.
  • the object of the present invention is to provide a chamber structure of a wet processing machine, which aims to solve the problem that the top of the wet process machine chamber existing in the prior art is easy to collect droplets due to the horizontal design.
  • the droplets will fall and become contaminated on the process substrate, which will cause the process substrate to have a phenomenon similar to the drop-like color unevenness and affect the yield of the product.
  • the chamber structure of the wet processing machine comprises: a cavity, and a first nozzle, a process substrate, a roller device, and a second nozzle disposed in the cavity
  • the first nozzle is disposed above the process substrate, the roller device is disposed under the process substrate, and the second nozzle is disposed under the roller device; wherein the first nozzle is used for The upper surface of the process substrate is cleaned; the second nozzle is used for cleaning the lower surface of the process substrate; and the roller device is configured to transport the process substrate to another chamber;
  • the chamber structure of the wet processing machine further includes: an inclined plate disposed in the cavity, the inclined plate is disposed at the top of the cavity, and the inclined plate and the horizontal direction are empty
  • the top of the chamber is disposed at an angle, and the inclined plate is configured to discharge the droplets collected by the inclined plate to the non-process article region; wherein a plurality of grooves are disposed on the lower surface of the inclined plate, A plurality of grooves are arranged in parallel; the grooves have a row of outlets.
  • the inclined plate covers an area above the entire process substrate.
  • the angle between the inclined plate and the top of the cavity chamber in the horizontal direction ranges between 10 degrees and 80 degrees.
  • a protrusion is disposed on an inner surface of the first side wall of the cavity, wherein the first side wall is a side wall connected to the groove discharge port; the protrusion is used for collecting Droplets flowing down through the grooves.
  • the groove has a semicircular, triangular or trapezoidal cross section.
  • the groove is integrally formed with the inclined plate.
  • the protrusion comprises a first baffle and a second baffle, the first baffle and the second baffle are disposed at an angle, and the droplet collected by the protrusion passes through the first baffle And a second baffle is arranged on both sides of the first side wall.
  • the angle between the first baffle and the second baffle ranges between 120 degrees and 170 degrees.
  • the plurality of grooves are sequentially connected together.
  • a transmission port is disposed on the second sidewall of the cavity, and the transmission port is a port for transmitting the process substrate to another chamber; wherein the first sidewall and the first The two side walls are oppositely arranged.
  • a chamber structure of a wet processing machine includes: a cavity chamber, and a first nozzle, a process substrate, and a roller device disposed in the cavity; the first a nozzle for spraying a liquid to clean the process substrate located above the roller device;
  • the chamber structure of the wet processing machine further includes: an inclined plate disposed in the cavity, the inclined plate is disposed at the top of the cavity, and the inclined plate and the horizontal direction are empty The top of the chamber is disposed at an angle, and the inclined plate is used to discharge the droplets collected by the inclined plate to the non-process area.
  • a plurality of grooves are arranged on the lower surface of the inclined plate, and the plurality of grooves are arranged in parallel; wherein the groove has a row of outlets.
  • the chamber structure of the wet processing machine further includes: a second nozzle disposed in the cavity; the first nozzle is disposed above the process substrate, and the second nozzle is disposed at the Underneath the roller device; wherein the first nozzle is for cleaning the upper surface of the process substrate; the second nozzle is for cleaning the lower surface of the process substrate; and the roller device is used for Transferring the process substrate to another chamber.
  • the inclined plate covers an area above the entire process substrate.
  • the angle between the inclined plate and the top of the cavity chamber in the horizontal direction ranges between 10 degrees and 80 degrees.
  • a protrusion is disposed on an inner surface of the first side wall of the cavity, wherein the first side wall is a side wall connected to the groove discharge port; the protrusion is used for collecting Droplets flowing down through the grooves.
  • the groove has a semicircular, triangular or trapezoidal cross section.
  • the groove is integrally formed with the inclined plate.
  • the protrusion comprises a first baffle and a second baffle, the first baffle and the second baffle are disposed at an angle, and the droplet collected by the protrusion passes through the first baffle And a second baffle is arranged on both sides of the first side wall.
  • the angle between the first baffle and the second baffle ranges between 120 degrees and 170 degrees.
  • the present invention provides an inclined plate disposed at the top of the cavity chamber, and the inclined plate is disposed at an angle with the top of the cavity chamber in the horizontal direction, the inclined plate is used for tilting
  • the droplets collected by the plate are discharged to the non-process article area; therefore, the droplets collected in the cavity do not fall onto the process substrate, but flow away from the sidewall of the cavity, effectively protecting the quality of the process substrate.
  • FIG. 1 is a schematic view showing a structure of a chamber of a wet processing machine according to Embodiment 1 of the present invention
  • FIG. 2 is a schematic structural view of a tilting plate according to Embodiment 1 of the present invention.
  • FIG. 3 is a schematic structural view of a first side wall of a cavity chamber according to Embodiment 1 of the present invention.
  • FIG. 4 is a schematic view showing a structure of a chamber of a wet processing machine according to Embodiment 2 of the present invention.
  • FIG. 5 is a schematic structural view of a tilting plate according to Embodiment 2 of the present invention.
  • FIG. 6 is a schematic structural view of a first side wall of a cavity chamber according to Embodiment 2 of the present invention.
  • an inclined plate is disposed on the top of the cavity chamber, and the inclined plate is disposed at an angle with the top of the cavity chamber in the horizontal direction, and the inclined plate is used to tilt the inclined plate.
  • the droplets collected by the plate are discharged to the non-process product area; therefore, the chamber structure of the wet processing machine provided by the embodiment of the present invention solves the problem that the top of the wet process machine chamber existing in the prior art is horizontally designed, so When the droplets are concentrated too much, the droplets will fall and stain on the process substrate, which will cause the process substrate to have a phenomenon similar to the drop-like color unevenness and affect the yield of the product.
  • FIG. 1 is a schematic view showing a structure of a chamber of a wet processing machine according to Embodiment 1 of the present invention; for convenience of explanation, only parts related to the embodiment of the present invention are shown.
  • the chamber structure of the wet processing machine includes: a cavity 101, a first nozzle 102, a process substrate 103, a roller device 104, and a second nozzle 105; wherein the first nozzle 102, the process substrate 103, and the roller
  • the device 104 and the second nozzle 105 are both disposed in the cavity 101, and the first nozzle 102 is used to spray liquid to clean the process substrate 103 located above the roller device 104.
  • the first nozzle 102 is disposed above the process substrate 103
  • the roller device 104 is disposed under the process substrate 103
  • the second nozzle 105 is disposed under the roller device 104; a first nozzle 102 for cleaning an upper surface of the process substrate 103, a second nozzle 105 for cleaning a lower surface of the process substrate 103, and a roller device 104 for transmitting the
  • the substrate 103 is processed to another chamber.
  • the first nozzle 102 can include a plurality of the first nozzles 102 that can be hooked by a main rod; likewise, the second nozzles 105 can also include multiple The plurality of the second nozzles 105 may also be hooked by a main rod; or, the plurality of the second nozzles 105 may be directly spaced apart at the bottom of the cavity 101.
  • the advantage of providing a plurality of the first nozzles 102 and the second nozzles 105 is that the entire surface of the process substrate 103 can be cleaned and cleaned in one place, thereby saving cleaning time and cleaning times.
  • the roller device 104 includes a plurality of rollers, and the rollers are spaced apart from the rollers, and the plurality of rollers can effectively transfer the process substrate 103 to another chamber.
  • a plurality of the second nozzles 105 are respectively disposed corresponding to the interval between the roller and the roller, such that the liquid ejected by the second nozzle 105 is sprayed toward the process substrate 103 through the interval.
  • the lower surface is used to clean the lower surface of the process substrate 103.
  • the chamber structure of the wet processing machine further includes: an inclined plate 106 disposed in the cavity, the inclined plate 106 is disposed on the top of the cavity 101, and The inclined plate 106 is disposed at an angle to the top of the cavity 101 in the horizontal direction, and the inclined plate 106 is used to discharge the droplets collected by the inclined plate 106 to the non-process area.
  • the angle between the inclined plate 106 and the top of the cavity 101 in the horizontal direction ranges between 10 degrees and 80 degrees.
  • the angle between the inclined plate 106 and the top of the cavity 101 in the horizontal direction is 30 degrees, so that the droplets collected by the inclined plate 106 can be effectively discharged to the non- The process area can reduce the occupied space. Because of the design of this angle, the inclined plate 106 does not need to be set too low, thereby effectively reducing the occupied space.
  • FIG. 2 is a schematic structural diagram of a tilting plate according to Embodiment 1 of the present invention.
  • a plurality of grooves 1061 are disposed on a lower surface of the inclined plate 106, and the plurality of grooves 1061 are arranged in parallel; wherein the groove 1061 has a row of outlets.
  • the plurality of grooves 1061 are sequentially connected together, that is, there is no gap between the groove 1061 and the groove 1061, so that the design has the advantages of preventing the droplets collected by the inclined plate 106 from falling onto the process substrate. Since there is no gap between the groove 1061 and the groove 1061, the droplets collected by the inclined plate 106 flow through the groove 1061 to the side wall of the cavity 101.
  • the plurality of grooves 1061 are not necessarily arranged in parallel; for example, one end of the plurality of grooves 1061 away from the discharge port may be gathered together, and the plurality of grooves 1061 This end of the discharge port is separated, and there is no gap between the groove 1061 and the groove 1061, that is, the arrangement of the plurality of grooves 1061 is fan-shaped. This arrangement is also such that since there is no gap between the groove 1061 and the groove 1061, the droplets collected by the inclined plate 106 flow through the groove 1061 to the side wall of the cavity 101.
  • the inclined plate 106 covers the entire area above the process substrate 103, that is, the area of the inclined plate 106 is larger than the area of the process substrate 103.
  • the droplets collected by the inclined plate 106 do not fall into the process substrate region, but flow to the side walls of the cavity 101 through the grooves 1061.
  • the groove 1061 has a triangular cross section, which can accelerate the flow of droplets to the side wall of the cavity 101.
  • FIG. 3 is a schematic structural view of a first sidewall of a cavity according to Embodiment 1 of the present invention.
  • a protrusion 1071 is disposed on the inner surface of the first side wall 107 of the cavity 101, wherein the first side wall 107 is connected to the discharge port of the groove 1061.
  • a side wall; the protrusion 1071 is configured to collect droplets flowing down through the groove 1061.
  • the first side wall 107 herein may be one of the four side walls of the cavity 101.
  • a transmission port is disposed on the second sidewall 108 of the cavity 101, and the transmission port is a port for transmitting the process substrate 103 to another chamber; wherein the first sidewall 107 is disposed opposite to the second side wall 108.
  • the protrusion 1071 is disposed on the opposite first side wall 107 for transporting the process substrate 103 to the side wall of another chamber, which has the advantage that the liquid that the inclined plate 106 collects The droplets will never flow to the process substrate.
  • the groove 1061 and the inclined plate 106 may be integrally formed; or an inclined plate 106 may be provided, and then the groove 1061 is disposed on the inclined plate 106.
  • FIG. 4 is a schematic view showing a structure of a chamber of a wet processing machine according to a second embodiment of the present invention; for convenience of explanation, only parts related to the embodiment of the present invention are shown.
  • the chamber structure of the wet processing machine includes: a cavity 201, a first nozzle 202, a process substrate 203, a roller device 204, and a second nozzle 205; wherein the first nozzle 202, the process substrate 203, and the roller
  • the device 204 and the second nozzle 205 are disposed in the cavity 201.
  • the first nozzle 202 is disposed above the process substrate 203
  • the roller device 204 is disposed under the process substrate 203.
  • the second nozzle 205 is disposed under the roller device 204.
  • the first nozzle 202 is configured to clean the upper surface of the process substrate 203
  • the second nozzle 205 is configured to The lower surface of the process substrate 203 is cleaned; the roller device 204 is configured to transport the process substrate 203 to another chamber.
  • the first nozzle 202 may include multiple, and the plurality of the first nozzles 202 may be hooked by a main rod; likewise, the second nozzle 205 may also include multiple The plurality of the second nozzles 205 may also be hooked by a main rod; or, the plurality of the second nozzles 205 may be directly spaced apart at a bottom portion in the cavity 201.
  • the advantage of providing a plurality of the first nozzles 202 and the second nozzles 205 is that the entire surface of the process substrate 203 can be cleaned and cleaned in one place, thereby saving cleaning time and cleaning times.
  • the roller device 204 includes a plurality of rollers, and the rollers are spaced apart from the roller, and the plurality of rollers can effectively transfer the process substrate 203 to another chamber.
  • the plurality of the second nozzles 205 are respectively disposed corresponding to the interval between the roller and the roller, such that the liquid sprayed by the second nozzle 205 is sprayed toward the process substrate 203 through the interval.
  • the lower surface is used to clean the lower surface of the process substrate 203.
  • the chamber structure of the wet processing machine further includes: an inclined plate 206 disposed in the cavity, the inclined plate 206 is disposed on the top of the cavity 201, and The inclined plate 206 is disposed at an angle with the top of the cavity 201 in the horizontal direction, and the inclined plate 206 is used to discharge the droplets collected by the inclined plate 206 to the non-process area.
  • the angle between the inclined plate 206 and the top of the cavity 201 in the horizontal direction ranges between 10 degrees and 80 degrees.
  • the angle between the inclined plate 206 and the top of the cavity 201 in the horizontal direction is 30 degrees, so that the droplets collected by the inclined plate 206 can be effectively discharged to the non- The process area can reduce the occupied space. Because of the design of this angle, the inclined plate 206 does not need to be set too low, thereby effectively reducing the occupied space.
  • FIG. 5 is a schematic structural diagram of a tilting plate according to Embodiment 2 of the present invention.
  • a plurality of grooves 2061 are disposed on the lower surface of the inclined plate 206, and the plurality of grooves 2061 are arranged in parallel; wherein the groove 2061 has a discharge port.
  • the plurality of grooves 2061 are sequentially connected together, that is, there is no gap between the groove 2061 and the groove 2061, and the design has the advantages of preventing the droplets collected by the inclined plate 206 from falling onto the process substrate. Since there is no gap between the groove 2061 and the groove 2061, the droplets collected by the inclined plate 206 flow to the side wall of the cavity 201 through the groove 2021.
  • the plurality of grooves 2061 are not necessarily arranged in parallel; for example, one end of the plurality of grooves 2061 away from the discharge port may be gathered together, and the plurality of grooves 2061 This end of the discharge port is separated, and there is no gap between the groove 2061 and the groove 2061, that is, the arrangement of the plurality of grooves 2061 is fan-shaped. In this arrangement design, also because there is no gap between the groove 2061 and the groove 2061, the droplets collected by the inclined plate 206 flow through the groove 2061 to the side wall of the cavity 201.
  • the inclined plate 206 covers the entire area of the process substrate 203, that is, the area of the inclined plate 206 is larger than the area of the process substrate 203.
  • the droplets collected by the inclined plate 206 do not fall into the process substrate region, but flow to the side walls of the cavity 201 through the grooves 2061.
  • the groove 2061 has a semicircular cross section, which can accelerate the flow of the liquid droplets to the side wall of the cavity 201.
  • the cross-section of the recess 2061 can also be trapezoidal, which can accelerate the flow of droplets to the sidewalls of the cavity 201.
  • the cross section of the groove 2061 can also be a groove of other shapes, and any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the present invention.
  • FIG. 6 is a schematic structural diagram of a first sidewall of a cavity according to Embodiment 2 of the present invention.
  • a protrusion is disposed on the inner surface of the first side wall 207 of the cavity 201, and further preferably, the protrusion includes a first baffle 2071 and a second baffle 2072.
  • the first baffle 2071 and the second baffle 2072 are disposed at an angle, and the droplets collected by the protrusion are discharged to the first sidewall through the first baffle 2071 and the second baffle 2072. side.
  • first baffle 2071 and the second baffle 2072 are in the shape of a pyramid, and this design can better discharge the liquid droplets to both sides of the first side wall.
  • angle between the first baffle 2071 and the second baffle 2072 ranges from 120 degrees to 170 degrees; preferably, the first baffle 2071 and the second baffle 2072 The angle between the angles is 160 degrees.
  • the first sidewall 207 is a sidewall connected to the discharge port of the recess 2061.
  • the first side wall 207 herein may be one of the four side walls of the cavity 201.
  • a transmission port is disposed on the second sidewall 208 of the cavity 201, and the transmission port is a port for transmitting the process substrate 203 to another chamber; wherein the first sidewall 207 is disposed opposite to the second sidewall 208.
  • the protrusion 2071 is disposed on the opposite first side wall 207 for transporting the process substrate 203 to the sidewall of the other chamber, which has the advantage that the liquid condensed by the inclined plate 206 The droplets will never flow to the process substrate.
  • the groove 2061 and the inclined plate 206 may be integrally formed; or an inclined plate 206 may be provided, and then the groove 2061 is disposed on the inclined plate 206.
  • an inclined plate is disposed at the top of the cavity chamber, and the inclined plate is disposed at an angle with the top of the cavity chamber in the horizontal direction, and the inclined plate is used to gather the inclined plate
  • the liquid droplets are discharged to the non-process product area; therefore, the chamber structure of the wet processing machine provided by the embodiment of the present invention can be flowed by the inclined plate by the inclined plate provided at the top of the cavity chamber.
  • the side walls of the cavity are not dropped in the process area, avoiding product contamination.

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Abstract

一种湿制程机台的腔室结构，包括：空腔室(101)，以及设置于空腔室(101)内的第一喷嘴(102)、制程基板(103)、滚轮装置(104)、倾斜板(106)；倾斜板(106)设置于空腔室(101)顶部，倾斜板(106)与水平方向的空腔室(101)顶部呈一定夹角设置，倾斜板(106)用于将倾斜板聚集的液滴排出至非制程品区域。倾斜板(106)聚集的液滴能够流向空腔室(101)的侧壁，而不会掉在制程品区域，避免了产品污染。

Description

一种湿制程机台的腔室结构 技术领域
本发明涉及湿制程技术领域，特别涉及一种湿制程机台的腔室结构。
 背景技术
在现有技术中，湿制程机台腔室顶部为水平设计，并无导流作用。然而，在湿制程过程中，喷嘴会喷出液体，该液体在高温作用下，容易产生水蒸气，该水蒸气会聚集在腔室顶部，因此容易形成液滴，当液滴聚集过多时，液滴会落下，沾染到制程基板上，从而导致制程基板会出现类似水滴状色不均现象，影响产品的良莠率。
故，有必要提出一种新的技术方案，以解决上述技术问题。
 技术问题
本发明的目的在于提供一种湿制程机台的腔室结构，旨在解决现有技术中存在的湿制程机台腔室顶部由于水平设计，因此容易聚集液滴，当液滴聚集过多时，液滴会落下，沾染到制程基板上，从而导致制程基板会出现类似水滴状色不均现象，影响产品的良莠率的问题。
 技术解决方案
一种湿制程机台的腔室结构，其中所述湿制程机台的腔室结构包括：一空腔室，以及设置于所述空腔室内的第一喷嘴、制程基板、滚轮装置、第二喷嘴；所述第一喷嘴设置于所述制程基板上方，所述滚轮装置设置于所述制程基板下方，所述第二喷嘴设置于所述滚轮装置下方；其中，所述第一喷嘴，用于对所述制程基板上表面进行清洗；所述第二喷嘴，用于对所述制程基板下表面进行清洗；所述滚轮装置，用于传输所述制程基板至另一腔室；
所述湿制程机台的腔室结构还包括：一设置于所述空腔室内的倾斜板，所述倾斜板设置于所述空腔室顶部，且所述倾斜板与水平方向的所述空腔室顶部呈一定夹角设置，所述倾斜板用于将所述倾斜板聚集的液滴排出至非制程品区域；其中，在所述倾斜板的下表面设置有多条凹槽，所述多条凹槽之间平行排列；所述凹槽具有一排出口。
优选的，所述倾斜板覆盖整个所述制程基板上方的区域。
优选的，所述倾斜板与水平方向的所述空腔室顶部之间的所述夹角范围在10度至80度之间。
优选的，在所述空腔室的第一侧壁内表面设置有一突台，其中，所述第一侧壁为与所述凹槽排出口连接的侧壁；所述突台，用于收集通过所述凹槽流下的液滴。
优选的，所述凹槽的横截面呈半圆形、三角形或梯形。
优选的，所述凹槽与所述倾斜板一体成型。
优选的，所述突台包括第一挡板和第二挡板，所述第一挡板和第二挡板呈一定夹角设置，所述突台收集的液滴通过所述第一挡板和第二挡板排到所述第一侧壁两侧。
优选的，所述第一挡板和第二挡板之间的所述夹角范围在120度至170度之间。
优选的，所述多条凹槽依次连接在一起。
优选的，在所述空腔室第二侧壁上设置有传输口，所述传输口为将所述制程基板传输至另一腔室的口；其中，所述第一侧壁与所述第二侧壁相对设置。
一种湿制程机台的腔室结构，所述湿制程机台的腔室结构包括：一空腔室，以及设置于所述空腔室内的第一喷嘴、制程基板、滚轮装置；所述第一喷嘴用于喷洒液体以对位于所述滚轮装置上方的所述制程基板进行清洗；
所述湿制程机台的腔室结构还包括：一设置于所述空腔室内的倾斜板，所述倾斜板设置于所述空腔室顶部，且所述倾斜板与水平方向的所述空腔室顶部呈一定夹角设置，所述倾斜板用于将所述倾斜板聚集的液滴排出至非制程品区域。
优选的，在所述倾斜板的下表面设置有多条凹槽，所述多条凹槽之间平行排列；其中，所述凹槽具有一排出口。
优选的，所述湿制程机台的腔室结构还包括：一设置于所述空腔室内的第二喷嘴；所述第一喷嘴设置于所述制程基板上方，所述第二喷嘴设置于所述滚轮装置下方；其中，所述第一喷嘴，用于对所述制程基板上表面进行清洗；所述第二喷嘴，用于对所述制程基板下表面进行清洗；所述滚轮装置，用于传输所述制程基板至另一腔室。
优选的，所述倾斜板覆盖整个所述制程基板上方的区域。
优选的，所述倾斜板与水平方向的所述空腔室顶部之间的所述夹角范围在10度至80度之间。
优选的，在所述空腔室的第一侧壁内表面设置有一突台，其中，所述第一侧壁为与所述凹槽排出口连接的侧壁；所述突台，用于收集通过所述凹槽流下的液滴。
优选的，所述凹槽的横截面呈半圆形、三角形或梯形。
优选的，所述凹槽与所述倾斜板一体成型。
优选的，所述突台包括第一挡板和第二挡板，所述第一挡板和第二挡板呈一定夹角设置，所述突台收集的液滴通过所述第一挡板和第二挡板排到所述第一侧壁两侧。
优选的，所述第一挡板和第二挡板之间的所述夹角范围在120度至170度之间。
 有益效果
相对现有技术，本发明通过在空腔室内的顶部设置一倾斜板，且所述倾斜板与水平方向的所述空腔室顶部呈一定夹角设置，所述倾斜板用于将所述倾斜板聚集的液滴排出至非制程品区域；因此空腔室内聚集的液滴不会落到制程基板上，而是从空腔室的侧壁流走，有效的保护了制程基板的质量。
 附图说明
图1为本发明实施例一提供的湿制程机台的腔室结构的示意图；
图2为本发明实施例一提供的倾斜板的结构示意图；
图3为本发明实施例一提供的空腔室的第一侧壁的结构示意图；
图4为本发明实施例二提供的湿制程机台的腔室结构的示意图；
图5为本发明实施例二提供的倾斜板的结构示意图；
图6为本发明实施例二提供的空腔室的第一侧壁的结构示意图；
 本发明的最佳实施方式
本说明书所使用的词语“实施例”意指用作实例、示例或例证。此外，本说明书和所附权利要求中所使用的冠词“一”一般地可以被解释为意指“一个或多个”，除非另外指定或从上下文清楚导向单数形式。
在本发明实施例中，通过在空腔室内的顶部设置一倾斜板，且所述倾斜板与水平方向的所述空腔室顶部呈一定夹角设置，所述倾斜板用于将所述倾斜板聚集的液滴排出至非制程品区域；因此，本发明实施例提供的湿制程机台的腔室结构，解决了现有技术中存在的湿制程机台腔室顶部由于水平设计，因此容易聚集液滴，当液滴聚集过多时，液滴会落下，沾染到制程基板上，从而导致制程基板会出现类似水滴状色不均现象，影响产品的良莠率的问题。
实施例一
请参阅图1，为本发明实施例一提供的湿制程机台的腔室结构的示意图；为了便于说明，仅示出了与本发明实施例相关的部分。
所述湿制程机台的腔室结构包括：一空腔室101、第一喷嘴102、制程基板103、滚轮装置104、以及第二喷嘴105；其中，所述第一喷嘴102、制程基板103、滚轮装置104、以及第二喷嘴105均设置于所述空腔室101内，所述第一喷嘴102用于喷洒液体以对位于所述滚轮装置104上方的所述制程基板103进行清洗。具体的，所述第一喷嘴102设置于所述制程基板103上方，所述滚轮装置104设置于所述制程基板103下方，所述第二喷嘴105设置于所述滚轮装置104下方；其中，所述第一喷嘴102，用于对所述制程基板103上表面进行清洗，所述第二喷嘴105，用于对所述制程基板103下表面进行清洗；所述滚轮装置104，用于传输所述制程基板103至另一腔室。
然而，可以理解的是，所述第一喷嘴102可以包括多个，可以通过一主杆将这多个所述第一喷嘴102挂接起来；同样，所述第二喷嘴105也可以包括多个，也可以通过一主杆将这多个所述第二喷嘴105挂接起来；或者是，将这多个所述第二喷嘴105直接间隔的安装在空腔室101内的底部。设置多个所述第一喷嘴102和所述第二喷嘴105的好处是：能够对制程基板103的整个板面均清洗到，一次清洗到位，从而节省了清洗时间以及清洗次数。
然而，可以理解的是，所述滚轮装置104包括多个滚轮，滚轮与滚轮之间间隔设置，多个滚轮能够有效的将所述制程基板103传输至另一腔室。
在本发明实施例中，多个所述第二喷嘴105分别对应滚轮与滚轮之间的间隔处而设置，这样所述第二喷嘴105喷出的液体通过该间隔处喷向所述制程基板103下表面，从而对所述制程基板103下表面进行清洗。
在本发明实施例中，所述湿制程机台的腔室结构还包括：一设置于所述空腔室内的倾斜板106，所述倾斜板106设置于所述空腔室101顶部，且所述倾斜板106与水平方向的所述空腔室101顶部呈一定夹角设置，所述倾斜板106用于将所述倾斜板106聚集的液滴排出至非制程品区域。
在本发明实施例中，所述倾斜板106与水平方向的所述空腔室101顶部之间的所述夹角范围在10度至80度之间。优选的是，所述倾斜板106与水平方向的所述空腔室101顶部之间的所述夹角为30度，这样，具能有效的将所述倾斜板106聚集的液滴排出至非制程品区域，又能减少占用空间。因为这个角度的设计，使得所述倾斜板106不需要设置的太低，从而有效的减少占用空间。
请参阅图2，图2为本发明实施例一提供的倾斜板的结构示意图。作为本发明一优选实施例，在所述倾斜板106的下表面设置有多条凹槽1061，所述多条凹槽1061之间平行排列；其中，所述凹槽1061具有一排出口。所述多条凹槽1061依次连接在一起，即所述凹槽1061与所述凹槽1061之间没有间隙，这样设计的好处是：防止所述倾斜板106聚集的液滴落到制程基板上；由于所述凹槽1061与所述凹槽1061之间没有间隙，那么所述倾斜板106聚集的液滴都会通过凹槽1061流向所述空腔室101的侧壁。
然而，可以理解的是，所述多条凹槽1061之间不一定平行排列；例如，可以是所述多条凹槽1061的远离排出口的一端聚集在一起，而所述多条凹槽1061的排出口的这一端则分开，且所述凹槽1061与所述凹槽1061之间同样没有间隙，即多条凹槽1061的排列呈扇形。这种排列设计，同样由于所述凹槽1061与所述凹槽1061之间没有间隙，那么所述倾斜板106聚集的液滴都会通过凹槽1061流向所述空腔室101的侧壁。
可以理解的是，只要是每一条凹槽1061的排出口不会被挡住，且每一条凹槽1061的排出口均能够与所述空腔室101的侧壁相通，那么不管凹槽1061的排列如何，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。
作为本发明另一优选实施例，所述倾斜板106覆盖整个所述制程基板103上方的区域，即所述倾斜板106的面积大于所述制程基板103的面积。这样所述倾斜板106聚集的液滴不会掉到制程基板区域，而是通过凹槽1061流向所述空腔室101的侧壁。
作为本发明一实施例，所述凹槽1061的横截面呈三角形，这样能够加速液滴流向所述空腔室101的侧壁。
请参阅图3，图3为本发明实施例一提供的空腔室的第一侧壁的结构示意图。作为本发明另一优选实施例，在所述空腔室101的第一侧壁107内表面设置有一突台1071，其中，所述第一侧壁107为与所述凹槽1061排出口连接的侧壁；所述突台1071，用于收集通过所述凹槽1061流下的液滴。然而，可以理解的是，在这里的第一侧壁107可以是所述空腔室101的四个侧壁中的其中一个。
进一步优选的，在所述空腔室101第二侧壁108上设置有传输口，所述传输口为将所述制程基板103传输至另一腔室的口；其中，所述第一侧壁107与所述第二侧壁108相对设置。这里，将所述突台1071设置在用于传输所述制程基板103至另一腔室的侧壁的相对的所述第一侧壁107，这样的好处是，所述倾斜板106聚集的液滴绝对不会流向制程基板。
在本发明实施例中，所述凹槽1061与所述倾斜板106可一体成型；也可以是提供一倾斜板106，然后在倾斜板106上设置凹槽1061。
实施例二
请参阅图4，为本发明实施例二提供的湿制程机台的腔室结构的示意图；为了便于说明，仅示出了与本发明实施例相关的部分。
所述湿制程机台的腔室结构包括：一空腔室201、第一喷嘴202、制程基板203、滚轮装置204、以及第二喷嘴205；其中，所述第一喷嘴202、制程基板203、滚轮装置204、以及第二喷嘴205均设置于所述空腔室201内；具体的，所述第一喷嘴202设置于所述制程基板203上方，所述滚轮装置204设置于所述制程基板203下方，所述第二喷嘴205设置于所述滚轮装置204下方；其中，所述第一喷嘴202，用于对所述制程基板203上表面进行清洗，所述第二喷嘴205，用于对所述制程基板203下表面进行清洗；所述滚轮装置204，用于传输所述制程基板203至另一腔室。
然而，可以理解的是，所述第一喷嘴202可以包括多个，可以通过一主杆将这多个所述第一喷嘴202挂接起来；同样，所述第二喷嘴205也可以包括多个，也可以通过一主杆将这多个所述第二喷嘴205挂接起来；或者是，将这多个所述第二喷嘴205直接间隔的安装在空腔室201内的底部。设置多个所述第一喷嘴202和所述第二喷嘴205的好处是：能够对制程基板203的整个板面均清洗到，一次清洗到位，从而节省了清洗时间以及清洗次数。
然而，可以理解的是，所述滚轮装置204包括多个滚轮，滚轮与滚轮之间间隔设置，多个滚轮能够有效的将所述制程基板203传输至另一腔室。
在本发明实施例中，多个所述第二喷嘴205分别对应滚轮与滚轮之间的间隔处而设置，这样所述第二喷嘴205喷出的液体通过该间隔处喷向所述制程基板203下表面，从而对所述制程基板203下表面进行清洗。
在本发明实施例中，所述湿制程机台的腔室结构还包括：一设置于所述空腔室内的倾斜板206，所述倾斜板206设置于所述空腔室201顶部，且所述倾斜板206与水平方向的所述空腔室201顶部呈一定夹角设置，所述倾斜板206用于将所述倾斜板206聚集的液滴排出至非制程品区域。
在本发明实施例中，所述倾斜板206与水平方向的所述空腔室201顶部之间的所述夹角范围在10度至80度之间。优选的是，所述倾斜板206与水平方向的所述空腔室201顶部之间的所述夹角为30度，这样，具能有效的将所述倾斜板206聚集的液滴排出至非制程品区域，又能减少占用空间。因为这个角度的设计，使得所述倾斜板206不需要设置的太低，从而有效的减少占用空间。
请参阅图5，图5为本发明实施例二提供的倾斜板的结构示意图。作为本发明一优选实施例，在所述倾斜板206的下表面设置有多条凹槽2061，所述多条凹槽2061之间平行排列；其中，所述凹槽2061具有一排出口。所述多条凹槽2061依次连接在一起，即所述凹槽2061与所述凹槽2061之间没有间隙，这样设计的好处是：防止所述倾斜板206聚集的液滴落到制程基板上；由于所述凹槽2061与所述凹槽2061之间没有间隙，那么所述倾斜板206聚集的液滴都会通过凹槽2061流向所述空腔室201的侧壁。
然而，可以理解的是，所述多条凹槽2061之间不一定平行排列；例如，可以是所述多条凹槽2061的远离排出口的一端聚集在一起，而所述多条凹槽2061的排出口的这一端则分开，且所述凹槽2061与所述凹槽2061之间同样没有间隙，即多条凹槽2061的排列呈扇形。这种排列设计，同样由于所述凹槽2061与所述凹槽2061之间没有间隙，那么所述倾斜板206聚集的液滴都会通过凹槽2061流向所述空腔室201的侧壁。
可以理解的是，只要是每一条凹槽2061的排出口不会被挡住，且每一条凹槽2061的排出口均能够与所述空腔室201的侧壁相通，那么不管凹槽2061的排列如何，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。
作为本发明另一优选实施例，所述倾斜板206覆盖整个所述制程基板203上方的区域，即所述倾斜板206的面积大于所述制程基板203的面积。这样所述倾斜板206聚集的液滴不会掉到制程基板区域，而是通过凹槽2061流向所述空腔室201的侧壁。
作为本发明一实施例，所述凹槽2061的横截面呈半圆形，这样能够加速液滴流向所述空腔室201的侧壁。然而，可以理解的是，所述凹槽2061的横截面也可以呈梯形，这样能够加速液滴流向所述空腔室201的侧壁。可以理解的是，所述凹槽2061的横截面也可以是其他形状的凹槽，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。
请参阅图6，图6为本发明实施例二提供的空腔室的第一侧壁的结构示意图。作为本发明另一优选实施例，在所述空腔室201的第一侧壁207内表面设置有一突台，进一步优选的，所述突台包括第一挡板2071和第二挡板2072，所述第一挡板2071和第二挡板2072呈一定夹角设置，所述突台收集的液滴通过所述第一挡板2071和第二挡板2072排到所述第一侧壁两侧。例如，所述第一挡板2071和第二挡板2072交接呈金字塔形状，这种设计，能更好的将液滴排到所述第一侧壁两侧。又如，所述第一挡板2071和第二挡板2072之间的所述夹角范围在120度至170度之间；优选的是，所述第一挡板2071和第二挡板2072之间的所述夹角为160度。其中，所述第一侧壁207为与所述凹槽2061排出口连接的侧壁。然而，可以理解的是，在这里的第一侧壁207可以是所述空腔室201的四个侧壁中的其中一个。
进一步优选的，在所述空腔室201第二侧壁208上设置有传输口，所述传输口为将所述制程基板203传输至另一腔室的口；其中，所述第一侧壁207与所述第二侧壁208相对设置。这里，将所述突台2071设置在用于传输所述制程基板203至另一腔室的侧壁的相对的所述第一侧壁207，这样的好处是，所述倾斜板206聚集的液滴绝对不会流向制程基板。
在本发明实施例中，所述凹槽2061与所述倾斜板206可一体成型；也可以是提供一倾斜板206，然后在倾斜板206上设置凹槽2061。
综上所述，通过在空腔室内的顶部设置一倾斜板，且所述倾斜板与水平方向的所述空腔室顶部呈一定夹角设置，所述倾斜板用于将所述倾斜板聚集的液滴排出至非制程品区域；因此，本发明实施例提供的湿制程机台的腔室结构，由于在空腔室内的顶部设置一倾斜板，因此所述倾斜板聚集的液滴能够流向空腔室内的侧壁，而不会掉在制程品区域，避免了产品污染。
尽管已经相对于一个或多个实现方式示出并描述了本发明，但是本领域技术人员基于对本说明书和附图的阅读和理解将会想到等价变型和修改。本发明包括所有这样的修改和变型，并且仅由所附权利要求的范围限制。特别地关于由上述组件执行的各种功能，用于描述这样的组件的术语旨在对应于执行所述组件的指定功能（例如其在功能上是等价的）的任意组件（除非另外指示），即使在结构上与执行本文所示的本说明书的示范性实现方式中的功能的公开结构不等同。此外，尽管本说明书的特定特征已经相对于若干实现方式中的仅一个被公开，但是这种特征可以与如可以对给定或特定应用而言是期望和有利的其他实现方式的一个或多个其他特征组合。而且，就术语“包括”、“具有”、“含有”或其变形被用在具体实施方式或权利要求中而言，这样的术语旨在以与术语“包含”相似的方式包括。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种湿制程机台的腔室结构，其中所述湿制程机台的腔室结构包括：一空腔室，以及设置于所述空腔室内的第一喷嘴、制程基板、滚轮装置、第二喷嘴；所述第一喷嘴设置于所述制程基板上方，所述滚轮装置设置于所述制程基板下方，所述第二喷嘴设置于所述滚轮装置下方；其中，所述第一喷嘴，用于对所述制程基板上表面进行清洗；所述第二喷嘴，用于对所述制程基板下表面进行清洗；所述滚轮装置，用于传输所述制程基板至另一腔室；
    所述湿制程机台的腔室结构还包括：一设置于所述空腔室内的倾斜板，所述倾斜板设置于所述空腔室顶部，且所述倾斜板与水平方向的所述空腔室顶部呈一定夹角设置，所述倾斜板用于将所述倾斜板聚集的液滴排出至非制程品区域；其中，在所述倾斜板的下表面设置有多条凹槽，所述多条凹槽之间平行排列；所述凹槽具有一排出口。
  2. 根据权利要求1所述的湿制程机台的腔室结构，其中所述倾斜板覆盖整个所述制程基板上方的区域。
  3. 根据权利要求1所述的湿制程机台的腔室结构，其中所述倾斜板与水平方向的所述空腔室顶部之间的所述夹角范围在10度至80度之间。
  4. 根据权利要求1所述的湿制程机台的腔室结构，其中在所述空腔室的第一侧壁内表面设置有一突台，其中，所述第一侧壁为与所述凹槽排出口连接的侧壁；所述突台，用于收集通过所述凹槽流下的液滴。
  5. 根据权利要求1所述的湿制程机台的腔室结构，其中所述凹槽的横截面呈半圆形、三角形或梯形。
  6. 根据权利要求1所述的湿制程机台的腔室结构，其中所述凹槽与所述倾斜板一体成型。
  7. 根据权利要求4所述的湿制程机台的腔室结构，其中所述突台包括第一挡板和第二挡板，所述第一挡板和第二挡板呈一定夹角设置，所述突台收集的液滴通过所述第一挡板和第二挡板排到所述第一侧壁两侧。
  8. 根据权利要求7所述的湿制程机台的腔室结构，其中所述第一挡板和第二挡板之间的所述夹角范围在120度至170度之间。
  9. 根据权利要求1所述的湿制程机台的腔室结构，其中所述多条凹槽依次连接在一起。
  10. 根据权利要求4所述的湿制程机台的腔室结构，其中在所述空腔室第二侧壁上设置有传输口，所述传输口为将所述制程基板传输至另一腔室的口；其中，所述第一侧壁与所述第二侧壁相对设置。
  11. 一种湿制程机台的腔室结构，其中所述湿制程机台的腔室结构包括：一空腔室，以及设置于所述空腔室内的第一喷嘴、制程基板、滚轮装置；所述第一喷嘴用于喷洒液体以对位于所述滚轮装置上方的所述制程基板进行清洗；
    所述湿制程机台的腔室结构还包括：一设置于所述空腔室内的倾斜板，所述倾斜板设置于所述空腔室顶部，且所述倾斜板与水平方向的所述空腔室顶部呈一定夹角设置，所述倾斜板用于将所述倾斜板聚集的液滴排出至非制程品区域。
  12. 根据权利要求11所述的湿制程机台的腔室结构，其中在所述倾斜板的下表面设置有多条凹槽，所述多条凹槽之间平行排列；其中，所述凹槽具有一排出口。
  13. 根据权利要求11所述的湿制程机台的腔室结构，其中所述湿制程机台的腔室结构还包括：一设置于所述空腔室内的第二喷嘴；所述第一喷嘴设置于所述制程基板上方，所述第二喷嘴设置于所述滚轮装置下方；其中，所述第一喷嘴，用于对所述制程基板上表面进行清洗；所述第二喷嘴，用于对所述制程基板下表面进行清洗；所述滚轮装置，用于传输所述制程基板至另一腔室。
  14. 根据权利要求12所述的湿制程机台的腔室结构，其中所述倾斜板覆盖整个所述制程基板上方的区域。
  15. 根据权利要求11所述的湿制程机台的腔室结构，其中所述倾斜板与水平方向的所述空腔室顶部之间的所述夹角范围在10度至80度之间。
  16. 根据权利要求12所述的湿制程机台的腔室结构，其中在所述空腔室的第一侧壁内表面设置有一突台，其中，所述第一侧壁为与所述凹槽排出口连接的侧壁；所述突台，用于收集通过所述凹槽流下的液滴。
  17. 根据权利要求12所述的湿制程机台的腔室结构，其中所述凹槽的横截面呈半圆形、三角形或梯形。
  18. 根据权利要求12所述的湿制程机台的腔室结构，其中所述凹槽与所述倾斜板一体成型。
  19. 根据权利要求16所述的湿制程机台的腔室结构，其中所述突台包括第一挡板和第二挡板，所述第一挡板和第二挡板呈一定夹角设置，所述突台收集的液滴通过所述第一挡板和第二挡板排到所述第一侧壁两侧。
  20. 根据权利要求19所述的湿制程机台的腔室结构，其中所述第一挡板和第二挡板之间的所述夹角范围在120度至170度之间。
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