WO2016043053A1 - 排気処理装置、基板処理システム、及び、排気を処理する方法 - Google Patents

排気処理装置、基板処理システム、及び、排気を処理する方法 Download PDF

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Publication number
WO2016043053A1
WO2016043053A1 PCT/JP2015/074953 JP2015074953W WO2016043053A1 WO 2016043053 A1 WO2016043053 A1 WO 2016043053A1 JP 2015074953 W JP2015074953 W JP 2015074953W WO 2016043053 A1 WO2016043053 A1 WO 2016043053A1
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Prior art keywords
exhaust treatment
gas
exhaust
unit
treatment unit
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PCT/JP2015/074953
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English (en)
French (fr)
Japanese (ja)
Inventor
剛 守屋
仙尚 小林
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東京エレクトロン株式会社
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Publication of WO2016043053A1 publication Critical patent/WO2016043053A1/ja

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/38—Removing components of undefined structure
    • B01D53/44—Organic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/54—Nitrogen compounds
    • B01D53/58—Ammonia
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds

Definitions

  • the present invention relates to an exhaust processing apparatus, a substrate processing system, and a method for processing exhaust.
  • Japanese Patent Application Laid-Open No. 2010-58118 describes an exhaust processing apparatus for processing a halogen-containing gas used in a semiconductor process apparatus.
  • This exhaust treatment apparatus has a plurality of treatment units.
  • this exhaust treatment apparatus includes, as a plurality of treatment units, a cleaning unit that removes acid components and impurities, a gas separation membrane, a deoxidation unit, and a dehumidification unit.
  • the plurality of processing units are connected in series.
  • a halogen-containing gas from a semiconductor process apparatus is mixed with a purge gas by a system pump to generate a dilution gas.
  • the dilution gas sequentially passes through the plurality of processing units. Thereby, a reusable purge gas is generated.
  • the generated purge gas is returned to the system pump again and reused as a purge gas mixed with the halogen-containing gas.
  • one or more exhaust treatment units among the plurality of exhaust treatment units are selected according to the recipe. Therefore, it is possible to determine how much contaminants have been processed in each processing unit. Further, the contaminated gas is processed only by the selected one or more exhaust processing units. That is, the contaminated gas is passed only through the exhaust treatment unit corresponding to the component contained in the contaminated gas. Therefore, unnecessary replacement of the filtration component of the exhaust treatment device can be suppressed, and the replacement frequency of the filtration component can be reduced.
  • an exhaust treatment device includes a main gas line that sequentially connects a plurality of exhaust treatment units, a plurality of bypass gas lines that bypass each of the plurality of exhaust treatment units, and a main gas line and a plurality of bypass gas lines
  • a plurality of direction switching valves may be further provided between the two and the control unit may control the plurality of direction switching valves according to the recipe. In this embodiment, by controlling the direction switching valve, it is possible to send the pollutant gas only to the exhaust treatment unit selected according to the recipe.
  • the first exhaust treatment unit has a plurality of filters, and the controller controls the first exhaust treatment unit according to the concentration of the acidic gas in the contaminated gas specified according to the recipe.
  • One or more filters may be selected from the plurality of filters, and the first exhaust treatment unit may be controlled so that the pollutant gas passes through the selected one or more filters.
  • acidic gas can be efficiently processed according to its concentration. Further, since the pollutant gas passes only through the filter selected according to the concentration, it is possible to determine how much the pollutant has been processed in each filter. Therefore, the replacement frequency of the filtration parts can be reduced.
  • the second exhaust treatment unit has a plurality of filters, and the controller controls the second exhaust treatment unit according to the concentration of the alkaline gas in the contaminated gas specified according to the recipe.
  • One or more filters may be selected from the plurality of filters, and the second exhaust treatment unit may be controlled so that the pollutant gas passes through the selected one or more filters.
  • alkaline gas can be efficiently processed according to its concentration. Further, since the pollutant gas passes only through the filter selected according to the concentration, it is possible to determine how much the pollutant has been processed in each filter. Therefore, the replacement frequency of the filtration parts can be reduced.
  • the third exhaust treatment unit has a plurality of treatment units including an activated carbon filter and an ultraviolet treatment unit that treats contaminated gas with ultraviolet rays, and the control unit is specified according to a recipe. According to the concentration of the volatile component in the polluted gas, one or more processing units are selected from the plurality of processing units of the third exhaust processing unit, and the pollutant gas passes through the selected one or more processing units. Three exhaust treatment units may be controlled.
  • the control unit controls the third exhaust treatment unit so that the pollutant gas sequentially passes through the activated carbon filter and the ultraviolet treatment unit, and the volatile component
  • the third exhaust treatment unit may be controlled so that the pollutant gas passes through the ultraviolet treatment unit.
  • the organic solvent can be efficiently processed according to the concentration of the volatile component. Further, since the pollutant gas passes only through the processing unit selected according to the concentration, it is possible to determine how much the pollutant has been processed in each processing unit. Therefore, the replacement frequency of the processing unit can be reduced.
  • the third exhaust treatment unit includes a thermal catalyst processing unit that processes a volatile component in the contaminated gas with a heated thermal catalyst, and the thermal catalyst processing unit heats the thermal catalyst and the thermal catalyst.
  • a heater and a container containing the thermal catalyst and the heater, and the control unit includes a thermal catalyst when the third exhaust treatment unit is included in one or more exhaust treatment units selected according to the recipe.
  • the third exhaust treatment unit may be controlled in an idle mode in which heating by the heater is weaker than heating by the heater in the exhaust mode. In this embodiment, the power consumption of the heater is reduced in the idle mode when the third exhaust treatment unit is not selected as one or more exhaust treatment units for treating polluted gases. Therefore, the running cost of the third exhaust treatment unit is suppressed.
  • a substrate processing system in another aspect, includes a chamber, a cleaning apparatus that cleans an object to be processed in the chamber, an exhaust processing apparatus of any one of the above-described one aspect and various embodiments, and a chamber. And an exhaust pipe connected to the exhaust treatment device.
  • a method for treating a polluted gas discharged from a chamber of a cleaning apparatus for cleaning an object to be processed using an exhaust processing apparatus includes a plurality of exhaust treatment units and a gas line.
  • the plurality of exhaust processing units perform different processes on the contaminated gas.
  • the gas line circulates gas output through at least one of the plurality of exhaust treatment units to the chamber.
  • the method includes the steps of controlling the exhaust treatment device such that the pollutant gas passes through one or more exhaust treatment units selected according to a recipe that identifies the cleaning process in the chamber; and the pollutant gas in one or more exhaust treatment units. Processing, and returning the gas output from the one or more exhaust processing units to the chamber.
  • the plurality of exhaust treatment units includes a second exhaust treatment unit, and the second exhaust treatment unit has a plurality of filters, and the concentration of alkaline gas in the polluted gas specified according to the recipe And selecting one or more filters from the plurality of filters of the second exhaust treatment unit and controlling the second exhaust treatment unit so that the pollutant gas passes through the selected one or more filters. May be included.
  • the plurality of exhaust treatment units includes a third exhaust treatment unit
  • the third exhaust treatment unit includes a plurality of treatment units including an activated carbon filter and an ultraviolet treatment unit that treats a contaminated gas with ultraviolet rays.
  • selecting one or more processing units among the plurality of processing units of the third exhaust processing unit according to the concentration of the volatile component in the polluted gas specified according to the recipe, and selecting one or more selected The method may further include a step of controlling the third exhaust processing unit so that the pollutant gas passes through the processing unit.
  • the third exhaust in the step of controlling the third exhaust treatment unit, when the concentration of the volatile component is equal to or higher than the first concentration, the third exhaust is performed so that the pollutant gas sequentially passes through the activated carbon filter and the ultraviolet treatment unit.
  • the third exhaust processing unit may be controlled so that the pollutant gas passes through the ultraviolet processing unit.
  • the plurality of exhaust treatment units includes a third exhaust treatment unit, and the third exhaust treatment unit treats a volatile component based on an organic solvent in a polluted gas with a heated thermal catalyst.
  • the thermal catalyst processing unit may include a thermal catalyst, a heater for heating the thermal catalyst, and a container for storing the thermal catalyst and the heater.
  • the method includes heating the thermal catalyst to the one or more exhaust treatment units when the third exhaust treatment unit is not included in the one or more exhaust treatment units selected according to the recipe.
  • a step of controlling the third exhaust treatment unit so as to be weaker than the heating by the heater in the case where the third exhaust treatment unit is included may be further included.
  • the third exhaust treatment unit when the third exhaust treatment unit is included in one or more exhaust treatment units selected according to the recipe, contamination in the container when the concentration of the volatile component is equal to or higher than a predetermined concentration.
  • the third exhaust treatment unit may be controlled so that the pressure of the gas is higher than the pressure of the contaminated gas when the concentration of the volatile component is lower than the predetermined concentration.
  • FIG. 5 is a flowchart illustrating an embodiment of an exhaust treatment method. It is a flowchart which shows the process condition setting in an acid process. It is a flowchart which shows the process condition setting in an alkali process. It is a flowchart which shows the process condition setting in organic type
  • FIG. 1 is a diagram showing a configuration of a substrate processing system according to an embodiment.
  • a substrate processing system 1 shown in FIG. 1 is a system that performs a cleaning process on an object to be processed such as a semiconductor substrate.
  • the substrate processing system 1 includes a cleaning device 10, a cleaning liquid supply source 70, a gas supply source 80, and an exhaust processing device 60.
  • the cleaning liquid supply source 70 supplies a cleaning liquid selected from a plurality of cleaning liquids to each chamber 11 via a corresponding cleaning liquid line 71.
  • the cleaning liquid supplied by the cleaning liquid supply source 70 may include, for example, pure water, acidic cleaning liquid, alkaline cleaning liquid, and organic cleaning liquid.
  • the cleaning liquid supplied by the cleaning liquid supply source 70 includes SC-1 cleaning liquid, SC-2 cleaning liquid, DHF cleaning liquid, and isopropyl alcohol (IPA).
  • Each cleaning liquid line 71 is provided with a flow rate control unit 72 for controlling the flow rate of the cleaning liquid.
  • the flow rate control unit 72 includes, for example, a valve and a flow rate controller.
  • the flow rate control unit 72 can adjust the flow rate of the cleaning liquid supplied to each chamber 11.
  • the plurality of chambers 11 are supplied with a carrier gas from a gas supply source 80, such as nitrogen gas or dry air.
  • a gas line 81 is provided between the gas supply source 80 and the plurality of chambers 11.
  • Each gas line 81 is provided with a flow rate control unit 82 for adjusting the flow rate of the carrier gas supplied to the corresponding chamber 11.
  • the flow rate control unit 82 includes, for example, a flow rate controller such as a valve and a mass flow controller.
  • the carrier gas is used as a gas for spraying the cleaning liquid onto the object to be cleaned at a high pressure and / or as a gas for replacing the gas in the chamber 11.
  • the cleaning process in the cleaning apparatus 10 is controlled by the control unit 12.
  • the control unit 12 may be a computer having various elements such as a central processing unit such as a CPU, storage means such as a memory for storing recipes, an input device for input by an operator, and a display device.
  • the control unit 12 controls each unit of the substrate processing system 1 based on a recipe for specifying the cleaning process in order to execute the cleaning process in the cleaning apparatus 10.
  • This recipe includes various information regarding the conditions of the cleaning liquid and the carrier gas supplied to each chamber 11.
  • the recipe includes information such as the type, concentration, flow rate, temperature and supply time of the cleaning liquid, and the flow rate and supply time of the carrier gas.
  • the controller 12 controls the cleaning liquid supply source 70 so that the type of cleaning liquid specified by the recipe is supplied to the chamber 11 for the time specified by the recipe. Further, the control unit 12 controls the flow rate control unit 72 so that the cleaning liquid is supplied to the chamber 11 at a flow rate specified by the recipe. Further, the control unit 12 controls the flow rate control unit 72 so that the carrier gas is supplied to the chamber 11 at the flow rate specified by the recipe for the time specified by the recipe.
  • the pollutant is an acidic gas for an acidic cleaning liquid, an alkaline gas for an alkaline cleaning liquid, and an organic volatile component for an organic cleaning liquid.
  • the types and concentrations of these contaminants in the carrier gas are determined by the type, concentration, flow rate, temperature and supply time of the cleaning liquid, and the flow rate and supply time of the carrier gas.
  • a carrier gas containing a contaminant in the chamber 11 is sent to the exhaust processing apparatus 60 as a contaminant gas.
  • the plurality of chambers 11 are connected to the exhaust treatment device 60 via the exhaust pipe 11a.
  • the exhaust pipe 11a includes a plurality of pipes extending from the plurality of chambers 11 and one pipe where the plurality of pipes merge.
  • the exhaust treatment device 60 is a device that treats the contaminated gas discharged from the cleaning device 10 into a reusable state and circulates the treated gas to the cleaning device 10.
  • the exhaust treatment device 60 includes an exhaust treatment unit 61 and a control unit 62.
  • An exhaust pipe 11 a is connected to the exhaust processing unit 61.
  • a gas line 63 extending to each chamber 11 is connected to the exhaust processing unit 61.
  • the contaminated gas used for cleaning in each chamber 11 is sent to the exhaust processing unit 61 through the exhaust pipe 11a.
  • the contaminated gas is processed in the exhaust processing unit 61.
  • reusable gas that is, gas similar to the carrier gas supplied from the gas supply source 80 is generated.
  • the gas generated by the exhaust processing unit 61 is returned to each chamber 11 via the gas line 63.
  • the control unit 62 may be a computer device as with the control unit 12.
  • the control unit 62 controls the operation of the exhaust processing unit 61.
  • the control unit 12 of the cleaning apparatus 10 and the control unit 62 of the exhaust treatment apparatus 60 are connected to each other via a communication line 8 so that they can communicate with each other. Further, the control unit 12 and the control unit 62 are synchronized.
  • FIG. 2 is a diagram illustrating an example of the exhaust processing unit 61.
  • the exhaust processing unit 61 includes a plurality of exhaust processing units that perform different processes on the contaminated gas.
  • the exhaust treatment unit 61 shown in FIG. 2 is based on a first exhaust treatment unit (acid treatment unit) 100 that filters acidic gas, a second exhaust treatment unit (alkaline treatment unit) 200 that filters alkaline gas, and an organic solvent.
  • a third exhaust processing unit (organic processing unit) 300 that filters volatile components and a fourth exhaust processing unit (particle processing unit) 400 that filters particles are provided.
  • the exhaust processing unit 61 includes a main gas line 64 that sequentially connects the first exhaust processing unit 100, the second exhaust processing unit 200, the third exhaust processing unit 300, and the fourth exhaust processing unit 400. . That is, the first exhaust processing unit 100 and the second exhaust processing unit 200 are connected by the main gas line 64a, and the second exhaust processing unit 200 and the third exhaust processing unit 300 are connected by the main gas line 64b. The third exhaust processing unit 300 and the fourth exhaust processing unit 400 are connected by the main gas line 64c. An exhaust pipe 11 a extending from the chamber 11 is connected to the first exhaust processing unit 100. A gas line 63 extending to each chamber 11 is connected to the fourth exhaust processing unit 400.
  • the exhaust processing unit 61 is provided with a plurality of bypass gas lines 65a to 65c that bypass each of the first exhaust processing unit 100, the second exhaust processing unit 200, and the third exhaust processing unit 300.
  • the bypass gas line 65a is connected to the exhaust pipe 11a and the main gas line 64a.
  • Direction switching valves 66a are provided between the bypass gas line 65a and the exhaust pipe 11a and between the bypass gas line 65a and the main gas line 64a, respectively. As the direction switching valve 66a is controlled by the control unit 62, the contaminated gas passes through either the first exhaust processing unit 100 or the bypass gas line 65a.
  • the bypass gas line 65b is connected to the main gas line 64a and the main gas line 64b via the direction switching valve 66b.
  • the bypass gas line 65c is connected to the main gas line 64b and the main gas line 64c via the direction switching valve 66c.
  • the first exhaust treatment unit 100 is provided with a plurality of bypass gas lines 26a to 26d that bypass each of the plurality of filters.
  • Each bypass gas line 26 a to 26 d is connected to the main gas line 25 via a direction switching valve 27.
  • the control unit 62 controls one or more of the first filter 110, the second filter 120, the third filter 130, and the fourth filter 140 according to the concentration of the acidic gas in the contaminated gas.
  • the direction switching valve 27 is controlled so as to pass.
  • FIG. 4 is a diagram illustrating an example of the second exhaust treatment unit 200.
  • the second exhaust treatment unit 200 includes a plurality of filters.
  • the second exhaust treatment unit 200 includes a first filter 210, a second filter 220, a third filter 230, and a fourth filter 240 corresponding to the concentration of alkaline gas contained in the polluted gas.
  • the first filter 210 corresponds to the highest density
  • the density corresponding to the second filter 220, the third filter 230, and the fourth filter 240 in this order decreases.
  • the second exhaust treatment unit 200 includes a main gas line 35 that sequentially connects the first filter 210, the second filter 220, the third filter 230, and the fourth filter 240.
  • Each filter used in the first exhaust treatment unit 100 and the second exhaust treatment unit 200 is not particularly limited as long as it has a function of filtering acidic or alkaline contaminants.
  • various filters such as a chemical filter and a scrubber can be used.
  • FIG. 5 is a diagram illustrating an example of the third exhaust treatment unit 300.
  • the third exhaust treatment unit 300 includes a plurality of filters.
  • the third exhaust processing unit 300 includes a plurality of processing units corresponding to the concentration of the volatile organic compound (VOC) contained in the contaminated gas.
  • the third exhaust processing unit 300 includes a first processing unit 310 and a second processing unit 320.
  • the first processing unit 310 corresponds to a high density
  • the second processing unit 320 corresponds to a low density.
  • the third exhaust processing unit 300 includes a main gas line 45 that connects the first processing unit 310 and the second processing unit 320.
  • the third exhaust processing unit 300 is provided with a bypass gas line 46 a that bypasses the first processing unit 310 and a bypass gas line 46 b that bypasses the second processing unit 320.
  • Each of the bypass gas line 46 a and the bypass gas line 46 b is connected to the main gas line 45 via the direction switching valve 47.
  • the control unit 62 controls the direction switching valve 47 so that the contaminated gas passes through one or more of the first processing unit 310 and the second processing unit 320 according to the concentration of VOC in the contaminated gas. .
  • Each processing unit used in the third exhaust processing unit 300 is not particularly limited as long as it has a function of filtering VOC.
  • the first processing unit 310 is an activated carbon filter that adsorbs VOCs by the action of activated carbon
  • the second processing unit 320 is an ultraviolet processing device (ultraviolet processing unit) that decomposes VOCs by ultraviolet rays.
  • step S ⁇ b> 1 the control unit 62 of the exhaust processing apparatus 60 reads a recipe specifying the cleaning process in each chamber 11 from the control unit 12 of the cleaning apparatus 10.
  • step S ⁇ b> 2 the control unit 62 selects one or more exhaust treatment units from the first exhaust treatment unit 100, the second exhaust treatment unit 200, and the third exhaust treatment unit 300.
  • the selected exhaust treatment unit is determined according to the recipe acquired in step S1.
  • the direction switching valve 66a, the direction switching valve 66b, and the direction switching valve 66c are controlled so that the exhaust passes only through the selected exhaust processing unit.
  • step S3 conditions of each exhaust treatment unit are set.
  • This condition setting is executed for the exhaust control unit selected in step S2 among the first exhaust processing unit 100, the second exhaust processing unit 200, and the third exhaust processing unit 300.
  • the condition setting for the first exhaust processing unit 100, the second exhaust processing unit 200, and the third exhaust processing unit 300 in step S3 is executed by the control unit 62.
  • concentrations C1a, C1b, and C1c can be arbitrarily set by the control unit 62 within a range that satisfies “C1a ⁇ C1b ⁇ C1c”. If it is determined that the concentration is less than C1a, control for condition 1 is performed in step S110. If it is determined that the concentration is greater than or equal to C1a and less than C1b, control for condition 2 is performed in step S120. If it is determined that the concentration is greater than or equal to C1b and less than C1c, control for Condition 3 is performed in step S130. If it is determined that the concentration is C1c or higher, control for condition 4 is performed in step S140.
  • the direction switching valve 27 is controlled so that the contaminated gas passes only through the fourth filter 140.
  • the direction switching valve 27 is controlled so that the contaminated gas passes only through the third filter 130 and the fourth filter 140.
  • the direction switching valve 27 is controlled so that the contaminated gas passes only through the second filter 120, the third filter 130, and the fourth filter 140.
  • the direction switching valve 27 is set so that the contaminated gas passes through all of the first filter 110, the second filter 120, the third filter 130, and the fourth filter 140. Be controlled.
  • FIG. 8 is a flowchart showing condition setting (step S3) in the second exhaust treatment unit 200.
  • step S200 the concentration of the alkaline gas contained in the contaminated gas is determined. This concentration is calculated from, for example, the type, concentration, flow rate and temperature of the alkaline cleaning liquid described in the recipe, and the supply time of the cleaning liquid and the carrier gas. In this example, it is determined based on the recipe which range of the conditions 1 to 4 the concentration of the alkaline gas contained in the polluted gas is in. In this determination, for example, three reference concentrations C2a, C2b, and C2c (arbitrary units) are used.
  • concentrations C2a, C2b, and C2c can be arbitrarily set by the control unit 62 within a range that satisfies “C2a ⁇ C2b ⁇ C2c”. If it is determined that the concentration is less than C2a, control for condition 1 is performed in step S210. If it is determined that the concentration is greater than or equal to C2a and less than C2b, control for condition 2 is performed in step S220. If it is determined that the concentration is greater than or equal to C2b and less than C2c, control for condition 3 is performed in step S230. If it is determined that the concentration is C2c or higher, control for Condition 4 is performed in step S140.
  • FIG. 9 is a flowchart showing condition setting (step S3) in the third exhaust treatment unit 300.
  • step S300 the concentration of VOC contained in the contaminated gas is obtained. This concentration is calculated from, for example, the type, concentration, flow rate and temperature of the organic cleaning liquid described in the recipe, and the supply time of the cleaning liquid and the carrier gas. In this example, it is determined based on the recipe which range of the conditions 1 to 4 the concentration of VOC contained in the polluted gas is in. In this determination, for example, three reference concentrations C3a, C3b, and C3c (arbitrary units) are used.
  • the direction switching valve 47 is controlled so that the contaminated gas passes only through the second processing unit 320.
  • the direction switching valve 47 is controlled so that the contaminated gas passes only through the second processing unit 320, and further, the residence time of the contaminated gas in the second processing unit 320 is a condition.
  • the flow rate is controlled to be longer than in the case of 1.
  • the direction switching valve 47 is controlled so that the contaminated gas passes through the first processing unit 310 and the second processing unit 320.
  • the direction switching valve 47 is controlled so that the contaminated gas passes through the first processing unit 310 and the second processing unit 320, and further, the first processing unit 310 and the second processing unit 320 are controlled.
  • the flow rate is controlled so that the residence time in the second processing unit 320 is longer than that in the condition 3.
  • the residence time of the contaminated gas in the first processing unit 310 and the second processing unit 320 can be controlled by pumps provided downstream of the first processing unit 310 and the second processing unit 320, respectively. It is.
  • step S4 exhaust processing by the exhaust processing device 60 is performed.
  • the contaminated gas from the cleaning apparatus 10 passes only through the exhaust processing unit selected in step S2 and the fourth exhaust processing unit 400 among the first to third exhaust processing units.
  • the exhaust gas passes through the exhaust processing unit 61 controlled according to the recipe, so that the gas from which the contaminant is filtered is output from the exhaust processing unit 61.
  • step S5 the gas output from the exhaust processing unit 61 in step S4 is circulated to each chamber 11 via the gas line 63.
  • step S6 the control unit 62 determines whether there is a change in the type of contaminant contained in the contaminated gas from the cleaning apparatus 10 according to the recipe.
  • the types of contaminants are divided into three types, acidic, alkaline, and VOC, and it is determined whether there is a change in this type. If the result of determination is that the type of pollutant gas has changed, the process returns to step S2. In step S2, an exhaust treatment unit is selected according to the changed type of contaminant, and the subsequent processing is continued.
  • step S6 If it is determined in step S6 that there is no change in the type of contaminant, the process proceeds to step S7.
  • step S7 it is determined whether the processing steps for all recipes have been completed. If not completed, the process proceeds to step S3, and if there is a change in the conditions of the exhaust processing unit, the exhaust processing unit is reset.
  • step S7 when it is determined that all recipe processing steps have been completed, the control unit ends the exhaust processing.
  • FIG. 10 is a time chart showing the relationship between the recipe and the exhaust treatment process.
  • the exhaust treatment process will be described more specifically in accordance with this time chart.
  • FIG. 10 shows an example in which the cleaning process based on the recipe R1 proceeds in one chamber, and in parallel, the cleaning process based on a different recipe R2 proceeds in another chamber 11.
  • the time chart shown in FIG. 10 shows the contents of the processing steps in the recipes R1 and R2, the types of pollutants in the polluted gas expected to be generated by the processing steps, and the relative concentration changes of the pollutants. Has been. Further, in the time chart shown in FIG. 10, it is shown which of the exhaust treatment units the polluted gas is flowing.
  • step S1 recipe R1 and recipe R2 are read.
  • the recipe R1 includes processing steps in which cleaning is performed in the order of DHF cleaning and IPA drying. More specifically, after completion of DHF cleaning, switching to rinsing with pure water is performed. Next, after the rinsing is completed, switching to IPA drying is performed. When the IPA drying is finished, the cleaning process is finished.
  • the recipe R2 includes processing steps in which cleaning is performed in the order of SC-1 cleaning, SC-2 cleaning, and IPA drying. More specifically, after SC-1 cleaning is completed, switching to rinsing with pure water is performed. Next, after the rinsing is completed, switching to SC-2 cleaning is performed. After completion of the SC-1 cleaning, the rinsing is again performed with pure water. Then, after the rinsing is completed, switching to IPA drying is performed. When the IPA drying is finished, the cleaning process is finished.
  • the direction switching valves 66a, 66b, and 66c are controlled so that the exhaust passes only through the selected first exhaust processing unit 100 and the second exhaust processing unit 200. Exhaust gas passes only through the first exhaust gas processing unit 100, the second exhaust gas processing unit 200, and the fourth exhaust gas processing unit 400 without passing through the third exhaust gas processing unit 300.
  • step S3 conditions are set for the first exhaust processing unit 100 and the second exhaust processing unit 200 selected in step S2.
  • step S100 and step S200 it is determined based on the recipe R1 and the recipe R2 whether the concentration of HF and NH 4 in the contaminated gas at the start of processing t0 is included in any of the conditions 1 to 4. .
  • the first exhaust processing unit 100 and the second exhaust processing unit 200 are controlled according to the determined conditions. For example, when the concentration of HF is C1c or higher, the first exhaust treatment unit 100 is controlled for condition 4.
  • the second exhaust treatment unit 200 is controlled for the condition 3. In this state, the exhaust process in step S4 and the gas circulation in step S5 are performed.
  • the concentration of the contaminant is gradually reduced in both the recipe R1 and the recipe R2. Therefore, when it is determined that the conditions have been changed in steps S100 and S200 according to such a concentration change, the first exhaust processing unit 100 and the second exhaust processing unit 200 are controlled according to each condition.
  • step S2 the direction switching valve is controlled so that the contaminated gas flows only through the first exhaust processing unit 100, the third exhaust processing unit 300, and the fourth exhaust processing unit 400.
  • step S ⁇ b> 3 conditions are set for the first exhaust processing unit 100 and the third exhaust processing unit 300.
  • the concentration of HCl is C1a or more and less than C2b
  • the first exhaust processing unit 100 is controlled for the condition 2.
  • the IPA concentration is C2c or higher
  • the third exhaust treatment unit 300 is controlled for condition 4.
  • the exhaust processing is continued while the processing conditions of the first exhaust processing unit and the third exhaust processing unit are reset in step S3.
  • control is performed so that the contaminated gas flows only in the first exhaust processing unit 100 and the fourth exhaust processing unit 400 in step S2.
  • the conditions of the first exhaust treatment unit 100 are reset by the process S3 according to the change in the HCl concentration.
  • control is performed so that the contaminated gas flows only in the third exhaust processing unit 300 and the fourth exhaust processing unit 400 in step S2.
  • the conditions of the third exhaust treatment unit 300 are reset in step S3 according to the change in the VOC concentration.
  • step S7 it is determined as “Yes”, and the exhaust process is completed.
  • the exhaust treatment device 60 includes the bypass gas lines 65a, 65b, and 65c that bypass the first exhaust treatment unit 100, the second exhaust treatment unit 200, and the third exhaust treatment unit 300, respectively. And direction switching valves 66a to 66c interposed between the main gas line 64 and the bypass gas lines 65a, 65b, 65c.
  • the control unit 62 controls the direction switching valves 66a to 66c according to the recipe. By controlling the direction switching valves 66a to 66c, the exhaust treatment unit can be easily selected.
  • the second exhaust treatment unit 200 includes a plurality of filters (a first filter 210, a second filter 220, a third filter 230, and a fourth filter 240).
  • the control part 62 changes the combination of the filter selected from several filters according to the density
  • concentration of the alkaline gas specified from a recipe thereby, alkaline gas can be processed efficiently according to the concentration.
  • concentration of the alkaline gas specified from a recipe.
  • concentration of the alkaline gas specified from a recipe concentration
  • concentration of the alkaline gas specified from a recipe concentration
  • concentration of the alkaline gas specified from a recipe concentration
  • concentration of the alkaline gas specified from a recipe concentration
  • concentration of the alkaline gas specified from a recipe e.g., concentration of the filter 210
  • concentration of the alkaline gas specified from a recipe e.g., concentration of the filter 210 e.g., a low concentration alkaline gas.
  • FIG. 11 is a diagram illustrating an example of the third exhaust treatment unit 1300.
  • the third exhaust treatment unit 1300 includes a thermal catalyst treatment unit 1310 that treats VOC contained in the contaminated gas.
  • the thermal catalyst processing unit 1310 includes a heater 1312 and a thermal catalyst 1311 heated by the heater 1312.
  • the heater 1312 and the thermal catalyst 1311 are accommodated in a container 1313.
  • the heater 1312 is a heating wire formed in a honeycomb shape
  • the thermal catalyst 1311 is an oxide semiconductor such as titanium dioxide supported on the heating wire.
  • a power supply unit 1314 is connected to the heater 1312. In response to a command from the control unit 62, the power supply unit 1314 performs ON / OFF switching of the heater 1312 and power control of heating in the heater 1312.
  • Step S3 conditions of each exhaust treatment unit are set in Step S3 (see FIG. 6).
  • the condition setting for the third exhaust processing unit 1300 is executed even when the third exhaust processing unit 1300 is not selected in step 2.
  • FIG. 12 is a flowchart showing condition setting (step S3) in the third exhaust treatment unit 1300.
  • step S1300 it is determined whether or not the third exhaust treatment unit 1300 has been selected in step S2. If the third exhaust treatment unit 1300 is not selected, control for condition 1 is performed in step S1310. If the third exhaust treatment unit 1300 is selected, the process proceeds to step S1320, and the concentration of VOC contained in the contaminated gas is obtained. This concentration is calculated from, for example, the type, concentration, flow rate and temperature of the organic cleaning liquid described in the recipe, and the supply time of the cleaning liquid and the carrier gas.
  • step S1320 it is determined based on the recipe whether the concentration of VOC contained in the contaminated gas is included in any of the conditions 2 or 3 in the concentration range. In this determination, for example, a reference density C3 (arbitrary unit) is used. If it is determined that the VOC concentration is less than C3, control for condition 2 is performed in step S1330. If it is determined that the concentration of VOC is equal to or higher than C3, control for condition 3 is performed in step S1340.
  • the control for condition 2 and the control for condition 3 both control the third exhaust processing unit 1300 to the exhaust mode (normal mode, high efficiency mode).
  • the third exhaust treatment unit 1300 is controlled to the idle mode.
  • the heater 1312 of the thermal catalyst processing unit 1310 is stopped, or the heater 1312 is controlled to be weaker than the heating of the heater 1312 in the exhaust mode. Thereby, the power consumption of the heater 1312 is reduced, and the running cost of the third exhaust treatment unit 1300 is suppressed.
  • FIG. 11A is a configuration diagram showing the setting of each valve of the third exhaust processing unit 1300 in the idle mode.
  • the direction switching valves 147a, 147b, and 147c in FIG. 11A the portions shown in black are closed and the portions shown in white are opened (FIGS. 11B and 11C). The same applies to the above).
  • the direction switching valve 147a in the idle mode, is closed with respect to the main gas line 45 on the upstream side of the direction switching valve 147a, and is downstream of the direction switching valve 147a.
  • the main gas line 45 and the bypass gas line 146a on the side are open.
  • the direction switching valve 147b is closed with respect to the main gas line 45 on the downstream side of the direction switching valve 147b, and is connected to the main gas line 45 and the bypass gas line 146b on the upstream side of the direction switching valve 147b. On the other hand, it is open.
  • the direction switching valve 147c is closed with respect to the main gas line 45 on the downstream side of the direction switching valve 147c, and is connected to the main gas line 45 and the bypass gas line 146b on the upstream side of the direction switching valve 147c. On the other hand, it is open. In the idle mode, the pump 148 is driven in such a state that the settings of the respective valves are formed.
  • the gas in the container 1313 passes through the bypass gas line 146a from the direction switching valve 147c, further passes through the bypass gas line 146b via the direction switching valves 147a and 147b, and is exhausted downstream ( The pressure control valve 149 is open). Further, the contaminated gas is not supplied into the container 1313.
  • the inside of the container 1313 is depressurized and a heat insulating effect is exhibited in the container 1313. Therefore, in the idle mode, it is difficult for the heat of the heater 1312 to be radiated to the outside of the container 1313. Therefore, when the third exhaust processing unit 1300 is again controlled to the exhaust mode according to the recipe, the heater 1312 can be easily reheated.
  • the third exhaust processing unit 1300 is controlled to the normal mode.
  • the bypass gas lines 146a, 146b are not used, and the direction switching valves 147a, 147b, 147c are controlled so that the contaminated gas flows through the main gas line 45.
  • the thermal catalyst 1311 is heated by the heater 1312 of the thermal catalyst processing unit 1310 for VOC processing.
  • the pressure control valve 149 is open regardless of the pressure in the thermal catalyst processing unit 1310.
  • the third exhaust treatment unit 1300 is controlled to the high efficiency mode.
  • the bypass gas lines 146a and 146b are not used, and the direction switching valves 147a, 147b and 147c are controlled so that the pollutant gas flows through the main gas line 45.
  • the thermal catalyst 1311 is heated by the heater 1312 of the thermal catalyst processing unit 1310 for VOC processing.
  • the pressure control valve 149 is controlled so that the pressure in the container 1313 is in a positive pressure state higher than the pressure in the container 1313 in the normal mode.
  • step S4 to step S7 are sequentially executed as in the above embodiment (see FIG. 6). And if it determines with the process process of all the recipes having been complete
  • the cleaning apparatus 10 and the exhaust treatment apparatus 60 have shown the example provided with the separate control part 12 and the control part 62, it is not limited to this.
  • the cleaning device and the exhaust treatment device may be controlled by a common control unit.
PCT/JP2015/074953 2014-09-17 2015-09-02 排気処理装置、基板処理システム、及び、排気を処理する方法 WO2016043053A1 (ja)

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CN109045979A (zh) * 2018-09-10 2018-12-21 青海盐湖工业股份有限公司 一种对镁电解槽的混合尾气进行处理的方法
CN109092029A (zh) * 2018-09-10 2018-12-28 青海盐湖工业股份有限公司 一种对镁电解槽混合尾气进行处理的系统
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JP2019072207A (ja) * 2017-10-16 2019-05-16 株式会社三洋物産 遊技機
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