WO2016023280A1 - 蒸镀线源 - Google Patents
蒸镀线源 Download PDFInfo
- Publication number
- WO2016023280A1 WO2016023280A1 PCT/CN2014/090482 CN2014090482W WO2016023280A1 WO 2016023280 A1 WO2016023280 A1 WO 2016023280A1 CN 2014090482 W CN2014090482 W CN 2014090482W WO 2016023280 A1 WO2016023280 A1 WO 2016023280A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- vapor deposition
- pot body
- line source
- heat
- outer casing
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Definitions
- the present invention relates to the field of vapor deposition, and in particular to a vapor deposition line source.
- the linear evaporation source (referred to as a line source) is used for vapor deposition of the luminescent material.
- the existing vapor deposition line source is filled with a luminescent material in a vapor deposition line source before being vapor-deposited, and sealed.
- the vacuum state inside and outside the line source is maintained, and the vapor deposition line source is heated by the heating device to evaporate the internal material, and the cooling device cools the outer wall of the vapor deposition line source to prevent the heat from being too high to damage the equipment outside the line source.
- the heating energy of the heating device is partially lost in heat exchange with the cooling device
- the present invention provides a vapor deposition line source.
- a vapor deposition line source comprising a casing and a crucible disposed in the casing, the crucible including a pot body and a nozzle, and the outside of the pot body is provided with heating for heating the pot body
- the device is provided with a heat insulating device between the outer casing and the heating device for preventing heat from being radiated to the outer casing.
- the heat insulating device is provided with a reflective layer in a direction toward the pot body.
- the reflective layer is provided with a clearance hole for preventing deformation.
- the heat insulating device surrounds the pot body, and the heat insulating device is provided with an opening at a position corresponding to the nozzle.
- the thermal insulation device further comprises a substrate carrying the reflective layer.
- the reflective layer comprises a layer of heat reflective material and a film layer for attaching the layer of heat reflective material to the substrate.
- the heat reflective material comprises a metal oxide doped with lanthanide NaZn (PO 4), aluminum-doped NaZn (PO 4) or doped alumina NaZn (PO 4).
- the distance between the reflective layer and the crucible is greater than 2 cm.
- the vapor deposition line source further comprises a cooling device for cooling the outer casing, the cooling device being disposed on a side of the outer casing close to the pot body, a side facing away from the pot body or a casing chamber.
- the invention has the beneficial effects that the evaporation wire source of the invention is provided with a heat insulating device between the outer casing and the pot body for preventing heat from being radiated to the outer casing, which can effectively reduce the energy loss of the heating device during heating,
- the inner wall of the outer casing reduces the heat radiation from the heating device and prolongs the service life.
- FIG. 1 is a schematic structural view of a vapor deposition line source according to an embodiment of the present invention
- Figure 2 is a cross-sectional view of Figure 1;
- FIG. 3 is a distribution diagram of a clearance hole of a heat insulating device on a vapor deposition line source according to an embodiment of the present invention
- FIG. 4 is a cross-sectional view of a heat insulating device on a vapor deposition line source in accordance with an embodiment of the present invention.
- FIG. 1 is a schematic structural view of a vapor deposition line source according to an embodiment of the present invention.
- the vapor deposition line source of the embodiment includes a housing 100 and a crucible 200 disposed in the housing 100, and the external arrangement of the crucible 200 There is a heating device 300 for heating the crucible 200, and a heat insulating device 400 for preventing heat from being radiated to the outer casing 100 is provided between the outer casing 100 and the heating device 300.
- the vapor deposition line source of the present invention is provided with a heat insulating device for preventing heat from being radiated to the outer casing between the outer casing and the heating device of the crucible, which can effectively reduce the energy loss of the heating device during heating, and the heating device is reduced due to the inner wall of the outer casing. Thermal radiation, extended service life.
- the vapor deposition line source of the present invention further includes a cooling device 500 for cooling the outer casing, and the cooling device 500 can select various structures suitable for cooling the outer casing.
- a liquid cooling bag is employed in the embodiment, and the liquid cooling bag may be disposed in a side of the outer casing adjacent to the weir, a side facing away from the weir, or a chamber of the outer casing.
- the liquid cooling bag is a circulating liquid so that the outer casing can be continuously cooled.
- the circulating liquid may be a liquid such as water or a cooling oil to circulate and cool the outer casing to lower the temperature.
- the crucible 200 includes a pot 201 and a nozzle 202.
- the heat insulating device 300 is fixed to the bottom of the line source through the base 403.
- the heat insulating device of the present embodiment surrounds the pot body 201, and the heat insulating device 300 is provided with an opening at a position corresponding to the nozzle 202 of the crucible so as to match the pot body of the crucible.
- the pot body of the crucible of this embodiment may have a square shape, a circular shape or the like.
- the heat insulating device of the present invention is used for blocking the heating device from dissipating heat to the outer casing.
- the heat insulating device 300 is provided with a reflective layer 401 in a direction toward the pot body, thereby reflecting heat back to the direction of the pot body, thereby avoiding heat loss.
- the reflective layer is provided with a clearance hole 404 for preventing deformation. Since the reflective layer causes expansion under the action of the heating device, it causes cracking and affects the service life.
- the present invention provides a plurality of clearance holes on the reflective layer, and the clearance holes are evenly distributed, thereby avoiding expansion and cracking of the reflective layer.
- the base of the heat insulating device is also provided with a gap at a position corresponding to the clearance hole on the reflective layer, so that a through hole is formed in the heat insulating device, and the size and shape of the through hole can be set as needed.
- the clearance holes are strip-shaped and symmetrically distributed on the heat insulating device.
- the invention forms a clearance hole in the heat insulating device, which greatly reduces the cracking caused by heat of the heat insulating device.
- the heat insulating device is made of a material having a sufficiently strong strength, it is also possible to provide no clearance holes. At this point, the cost required will increase.
- the heat insulating device of the present embodiment is a plate-like structure including a plate-like base 402 and a reflective layer 401 formed on the plate-like base in a direction in which the heat insulating device faces the weir direction.
- the plate-like substrate 402 is disposed in a direction away from the crucible, and the plate-like substrate 402 is aluminum or a copper alloy.
- the plate-shaped heat insulating device of this embodiment is composed of a plurality of curved faces which form a matching structure with the pan body.
- the reflective layer 401 of the thermal insulation device of the present embodiment includes a heat reflective material layer and a film layer for attaching the heat reflective material layer to the plate substrate 402.
- the layer of heat reflective material is made of a heat reflective material to reflect the received heat from the crucible.
- the heat reflective material comprises NaZn (PO 4 ) doped with lanthanum oxide metal, NaZn doped with aluminum ( PO 4 ) or NaZn (PO 4 ) doped with alumina.
- the distance between the reflective layer and the crucible is greater than 2 cm, so that the heat in the crucible can be reduced to the thermal insulation device.
- the distance between the reflective layer and the crucible of the present invention can be designed according to the size of a specific line source, and the distance can be adjusted as needed.
- a methyl or ethyl or propyl or isopropyl or butyl or tert-butyl or isobutyl acrylate emulsion is used as the film layer to adhere the heat reflective material to the substrate.
- the lanthanide metal is preferably lanthanum, cerium, lanthanum or cerium.
- Lanthanum oxide-based metal constitutes NaZn (PO 4) 0.1% to 1%, the proportion of alumina or aluminum NaZn (PO 4) 0.5 to 2%.
- the above technical solution is provided with a heat insulating device between the outer casing and the pot body for preventing heat from being radiated to the outer casing, which can effectively reduce the energy loss of the heating device during heating, and the inner wall of the outer casing reduces the heat radiation of the heated device. Extended service life.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
- 一种蒸镀线源,其特征在于,包括外壳(100)和设置在所述外壳(100)中的坩埚(200),所述坩埚(200)包括锅体(201)和喷嘴(202),所述锅体(201)的外部设置有用于对所述锅体进行加热的加热装置(300),所述外壳(100)和所述加热装置(300)之间设有用于阻止热量向所述外壳(100)进行散发的隔热装置(400)。
- 根据权利要求1所述的蒸镀线源,其特征在于,所述隔热装置(400)在朝向所述锅体(201)的方向设有反射层(401)。
- 根据权利要求2所述的蒸镀线源,其特征在于,所述反射层(401)上设有用于防止变形的间隙孔(404)。
- 根据权利要求3所述的蒸镀线源,其特征在于,所述隔热装置(400)围绕在所述锅体(201)的周围,所述隔热装置(400)在与所述喷嘴(202)对应位置设有开口。
- 根据权利要求3所述的蒸镀线源,其特征在于,所述隔热装置(400)还包括承载所述反射层(401)的基底(402)。
- 根据权利要求5所述的蒸镀线源,其特征在于,所述反射层(401)包括热反射材料层和用于将热反射材料层附着到基底上的膜层。
- 根据权利要求6所述的蒸镀线源,其特征在于,所述热反射材料包括掺杂氧化镧系金属的NaZn(PO4)、掺杂铝的NaZn(PO4)或掺杂氧化铝的NaZn(PO4)。
- 根据权利要求7所述的蒸镀线源,其特征在于,所述氧化镧系金属占NaZn(PO4)的0.1%~1%,所述铝或所述氧化铝占NaZn(PO4)的0.5~2%。
- 根据权利要求2-8任何一项所述的蒸镀线源,其特征在于,所述反射层(401)与所述坩埚(200)的距离大于2cm。
- 根据权利要求1-8任何一项所述的蒸镀线源,其特征在于,所述蒸镀线源还包括用于对外壳进行冷却的冷却装置(500),所述冷却 装置(500)设置在所述外壳(100)靠近所述锅体(201)的一侧、背离所述锅体(201)的一侧或者所述外壳(100)的腔室中。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/770,155 US20160251752A1 (en) | 2014-08-14 | 2014-11-06 | Linear evaporation source |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410400453.3 | 2014-08-14 | ||
CN201410400453.3A CN104294219A (zh) | 2014-08-14 | 2014-08-14 | 蒸镀线源 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2016023280A1 true WO2016023280A1 (zh) | 2016-02-18 |
Family
ID=52314165
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CN2014/090482 WO2016023280A1 (zh) | 2014-08-14 | 2014-11-06 | 蒸镀线源 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20160251752A1 (zh) |
CN (1) | CN104294219A (zh) |
WO (1) | WO2016023280A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111455322B (zh) * | 2020-05-09 | 2022-04-26 | Tcl华星光电技术有限公司 | 坩埚装置、蒸镀装置 |
CN112609160B (zh) * | 2020-12-29 | 2023-06-06 | 尚越光电科技股份有限公司 | 一种cigs共蒸法的蒸发源加热结构 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1814854A (zh) * | 2005-01-31 | 2006-08-09 | 三星Sdi株式会社 | 蒸发源和采用该蒸发源的蒸镀装置 |
CN1924079A (zh) * | 2005-08-31 | 2007-03-07 | 三星Sdi株式会社 | 线型沉积源 |
KR20100120420A (ko) * | 2009-05-06 | 2010-11-16 | (주)알파플러스 | 하향식 노즐형 진공 증발원 장치 및 이를 이용한 하향식 노즐형 진공 증착 장치 |
CN102040210A (zh) * | 2010-10-21 | 2011-05-04 | 华南理工大学 | 一种高紫外及高红外反射材料及其制备方法 |
CN102268642A (zh) * | 2011-07-22 | 2011-12-07 | 上海奕瑞光电子科技有限公司 | 电阻加热式蒸发源 |
CN102676999A (zh) * | 2011-03-08 | 2012-09-19 | 株式会社日立高新技术 | 蒸发源及蒸镀装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4262186A (en) * | 1977-10-27 | 1981-04-14 | Rohr Industries, Inc. | Laser chem-milling method, apparatus and structure resulting therefrom |
US4451514A (en) * | 1981-12-24 | 1984-05-29 | Hunt Brion L | Automotive heat reflector shield |
US6708687B2 (en) * | 2001-06-12 | 2004-03-23 | James B. Blackmon, Jr. | Thermally controlled solar reflector facet with heat recovery |
KR100685431B1 (ko) * | 2004-11-26 | 2007-02-22 | 삼성에스디아이 주식회사 | 유기물 증착원 |
JP2007039791A (ja) * | 2005-06-29 | 2007-02-15 | Fujifilm Corp | リフレクタ、それを備えた加熱用るつぼおよび放射線像変換パネルの製造方法 |
CN101144933A (zh) * | 2006-09-13 | 2008-03-19 | 苏州璨宇光学有限公司 | 背光模组 |
EP2523802A1 (en) * | 2010-01-13 | 2012-11-21 | 3M Innovative Properties Company | Optical films with microstructured low refractive index nanovoided layers and methods therefor |
CN103556118B (zh) * | 2013-10-12 | 2016-03-02 | 深圳市华星光电技术有限公司 | 蒸镀装置 |
-
2014
- 2014-08-14 CN CN201410400453.3A patent/CN104294219A/zh active Pending
- 2014-11-06 WO PCT/CN2014/090482 patent/WO2016023280A1/zh active Application Filing
- 2014-11-06 US US14/770,155 patent/US20160251752A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1814854A (zh) * | 2005-01-31 | 2006-08-09 | 三星Sdi株式会社 | 蒸发源和采用该蒸发源的蒸镀装置 |
CN1924079A (zh) * | 2005-08-31 | 2007-03-07 | 三星Sdi株式会社 | 线型沉积源 |
KR20100120420A (ko) * | 2009-05-06 | 2010-11-16 | (주)알파플러스 | 하향식 노즐형 진공 증발원 장치 및 이를 이용한 하향식 노즐형 진공 증착 장치 |
CN102040210A (zh) * | 2010-10-21 | 2011-05-04 | 华南理工大学 | 一种高紫外及高红外反射材料及其制备方法 |
CN102676999A (zh) * | 2011-03-08 | 2012-09-19 | 株式会社日立高新技术 | 蒸发源及蒸镀装置 |
CN102268642A (zh) * | 2011-07-22 | 2011-12-07 | 上海奕瑞光电子科技有限公司 | 电阻加热式蒸发源 |
Also Published As
Publication number | Publication date |
---|---|
CN104294219A (zh) | 2015-01-21 |
US20160251752A1 (en) | 2016-09-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3474647B1 (en) | Cooling system of working medium contact type for high-power device, and working method thereof | |
JP2013211138A (ja) | 蒸発源、及びそれを用いた真空蒸着装置 | |
WO2017215169A1 (zh) | 高功率电磁波发生器的工质接触式冷却系统及其工作方法 | |
KR20150012514A (ko) | 증착장치용 증착원 | |
CN107894689A (zh) | 自增强散热的荧光粉轮及其制备方法 | |
WO2016023280A1 (zh) | 蒸镀线源 | |
KR100446084B1 (ko) | 화상표시장치 | |
CN106658942A (zh) | 一种高散热线路板 | |
KR101885092B1 (ko) | 리플렉터실드의 온도상승을 억제시키는 증착챔버 | |
CN209133947U (zh) | 一种高效散热数控系统配电柜 | |
US20200337183A1 (en) | Smartphone vapor chamber of stainless steel material coated with sio2 | |
WO2020238080A1 (zh) | 蒸镀源清洁设备及蒸镀系统 | |
CN110475466A (zh) | 一种风冷散热器以及电气设备 | |
CN204141642U (zh) | 电磁炉及用于电磁炉的散热组件 | |
JP3170057U (ja) | 放熱ユニットおよび放熱モジュール | |
US20180358134A1 (en) | Passive cooling of a nuclear reactor | |
CN106714504B (zh) | 射频拉远单元、安装件及射频通信系统 | |
KR101456250B1 (ko) | 냉각쉴드를 갖는 증착 소스 장치 | |
KR20150083066A (ko) | 기판 온도 상승을 억제하는 선형 증착 시스템 | |
CN108803841A (zh) | 用于机箱的水冷板机构 | |
CN107560264A (zh) | 半导体制冷片冷藏箱 | |
CN107121002B (zh) | 一种带有磁铁腔的熔融盐蓄热罐 | |
CN210831888U (zh) | 一种高效散热系统的光束灯 | |
CN210399138U (zh) | 一种空调 | |
CN108415541A (zh) | 用于机箱的水冷板机构 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 14770155 Country of ref document: US |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 14899832 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
32PN | Ep: public notification in the ep bulletin as address of the adressee cannot be established |
Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC ( EPO FORM 1205A DATED 27-06-2017 ) |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 14899832 Country of ref document: EP Kind code of ref document: A1 |