WO2016002701A1 - Composition absorbant le rayonnement dans le proche infrarouge, filtre de coupure du rayonnement proche infrarouge, procédé de fabrication dudit filtre, élément d'imagerie à semi-conducteurs, et module de caméra - Google Patents
Composition absorbant le rayonnement dans le proche infrarouge, filtre de coupure du rayonnement proche infrarouge, procédé de fabrication dudit filtre, élément d'imagerie à semi-conducteurs, et module de caméra Download PDFInfo
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- WO2016002701A1 WO2016002701A1 PCT/JP2015/068641 JP2015068641W WO2016002701A1 WO 2016002701 A1 WO2016002701 A1 WO 2016002701A1 JP 2015068641 W JP2015068641 W JP 2015068641W WO 2016002701 A1 WO2016002701 A1 WO 2016002701A1
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- atom
- copper
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- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 20
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 8
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- 125000004429 atom Chemical group 0.000 claims description 89
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- 125000005647 linker group Chemical group 0.000 claims description 44
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 28
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 21
- 238000010521 absorption reaction Methods 0.000 claims description 16
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 4
- 239000005750 Copper hydroxide Substances 0.000 description 4
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- BSXVKCJAIJZTAV-UHFFFAOYSA-L copper;methanesulfonate Chemical compound [Cu+2].CS([O-])(=O)=O.CS([O-])(=O)=O BSXVKCJAIJZTAV-UHFFFAOYSA-L 0.000 description 4
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- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 3
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- MSPOSRHJXMILNK-UHFFFAOYSA-N ethyl 1h-pyrazole-5-carboxylate Chemical compound CCOC(=O)C1=CC=NN1 MSPOSRHJXMILNK-UHFFFAOYSA-N 0.000 description 2
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical group C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000004334 sorbic acid Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical class [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14621—Colour filter arrangements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/42—Introducing metal atoms or metal-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
Abstract
Cette invention concerne une composition absorbant le rayonnement dans le proche infrarouge capable de former un film durci ayant une excellente résistance à la chaleur tout en conservant des propriétés de blindage élevées contre le proche infrarouge, un filtre de coupure du rayonnement proche infrarouge qui utilise la composition absorbant le rayonnement dans le proche infrarouge, un procédé de fabrication dudit filtre, un élément d'imagerie à semi-conducteurs, et un module de caméra. La composition absorbant le rayonnement dans le proche infrarouge comprend un composé obtenu par réaction d'un composant de cuivre et d'un polymère contenant un atome de coordination coordonné au composant de cuivre par une paire d'électrons non partagée. L'atome de coordination est, de préférence, au moins une espèce choisie parmi l'oxygène, l'azote, le soufre, et le phosphore. Un filtre de coupure du rayonnement proche infrarouge et un module de caméra fabriqués à l'aide de la composition absorbant le rayonnement dans le proche infrarouge sont en outre décrits.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020167034410A KR101958696B1 (ko) | 2014-06-30 | 2015-06-29 | 근적외선 흡수성 조성물, 근적외선 차단 필터, 근적외선 차단 필터의 제조 방법, 고체 촬상 소자, 카메라 모듈 |
| JP2016531356A JP6340078B2 (ja) | 2014-06-30 | 2015-06-29 | 近赤外線吸収性組成物、近赤外線カットフィルタ、近赤外線カットフィルタの製造方法、固体撮像素子、カメラモジュール |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014134256 | 2014-06-30 | ||
| JP2014-134256 | 2014-06-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2016002701A1 true WO2016002701A1 (fr) | 2016-01-07 |
Family
ID=55019236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2015/068641 WO2016002701A1 (fr) | 2014-06-30 | 2015-06-29 | Composition absorbant le rayonnement dans le proche infrarouge, filtre de coupure du rayonnement proche infrarouge, procédé de fabrication dudit filtre, élément d'imagerie à semi-conducteurs, et module de caméra |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6340078B2 (fr) |
| KR (1) | KR101958696B1 (fr) |
| TW (1) | TWI667243B (fr) |
| WO (1) | WO2016002701A1 (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016208258A1 (fr) * | 2015-06-24 | 2016-12-29 | 富士フイルム株式会社 | Composition absorbant l'infrarouge proche, filtre bloquant l'infrarouge proche, procédé permettant de produire un filtre bloquant l'infrarouge proche, appareil, procédé permettant de produire un polymère contenant du cuivre et polymère contenant du cuivre |
| US11555132B2 (en) | 2019-02-01 | 2023-01-17 | Samsung Electronics Co., Ltd. | Near-infrared absorbing composition, optical structure, and camera module and electronic device comprising the same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102476708B1 (ko) | 2017-11-01 | 2022-12-09 | 삼성전자주식회사 | 광학 필터, 및 이를 포함하는 카메라 모듈 및 전자 장치 |
Citations (11)
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| JPH0866971A (ja) * | 1994-08-30 | 1996-03-12 | Nippon Hikyumen Lens Kk | 金属含有樹脂の製造方法及びこの樹脂を素材とするレンズ |
| JPH1152127A (ja) * | 1997-08-07 | 1999-02-26 | Kyoritsu Kagaku Sangyo Kk | 近赤外線吸収材料、その合成方法、および近赤外線吸収性樹脂組成物 |
| JPH11315215A (ja) * | 1998-02-20 | 1999-11-16 | Mitsubishi Rayon Co Ltd | 銅化合物含有樹脂組成物、樹脂板およびｐｄｐ用前面板 |
| JP2000007870A (ja) * | 1998-06-23 | 2000-01-11 | Kureha Chem Ind Co Ltd | 樹脂組成物およびその製造方法、光学フィルターおよびこれを備えた装置、熱線吸収フィルター、光ファイバーおよび眼鏡レンズ |
| JP2007178915A (ja) * | 2005-12-28 | 2007-07-12 | Fujifilm Corp | 金属微粒子分散物及び赤外線遮蔽フィルター |
| JP2010134457A (ja) * | 2008-11-06 | 2010-06-17 | Uni-Chemical Co Ltd | 赤外線遮断性フィルム及び赤外線遮断性積層フィルム |
| WO2011135974A1 (fr) * | 2010-04-26 | 2011-11-03 | 一般財団法人川村理化学研究所 | Film mince absorbable par un rayonnement infrarouge contenant des cristaux d'oxyde de titane de type rutile, et son procédé de production |
| JP2013253224A (ja) * | 2012-05-08 | 2013-12-19 | Fujifilm Corp | 近赤外線吸収性液状組成物、これを用いた近赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法 |
| WO2014084288A1 (fr) * | 2012-11-30 | 2014-06-05 | 富士フイルム株式会社 | Composition de résine durcissable, et puce de capteur d'image ainsi que procédé de fabrication de celle-ci mettant en œuvre cette composition |
| WO2015012322A1 (fr) * | 2013-07-24 | 2015-01-29 | 富士フイルム株式会社 | Composition absorbant l'infrarouge proche, filtre de coupure de l'infrarouge proche obtenu en l'utilisant, procédé de production dudit filtre de coupure, module pour appareil photo et procédé pour produire ledit module, et élément photographique solide |
| WO2015111530A1 (fr) * | 2014-01-21 | 2015-07-30 | 富士フイルム株式会社 | Composition absorbant les proches infrarouges, filtre arrêtant les proches infrarouges, procédé de production du filtre arrêtant les proches infrarouges, module d'appareil photographique, et procédé de fabrication du module d'appareil photographique |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001213918A (ja) | 2000-02-04 | 2001-08-07 | Nisshinbo Ind Inc | 近赤外吸収組成物及び該組成物より製造した近赤外吸収フィルター |
| JP2009013200A (ja) | 2007-06-29 | 2009-01-22 | Toyo Ink Mfg Co Ltd | 近赤外線吸収性感圧式接着剤及び近赤外線吸収性感圧式接着シート |
| JP5941424B2 (ja) * | 2012-07-09 | 2016-06-29 | 富士フイルム株式会社 | 近赤外線吸収性組成物、これを用いた近赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法 |
-
2015
- 2015-06-09 TW TW104118547A patent/TWI667243B/zh not_active IP Right Cessation
- 2015-06-29 JP JP2016531356A patent/JP6340078B2/ja not_active Expired - Fee Related
- 2015-06-29 KR KR1020167034410A patent/KR101958696B1/ko active IP Right Grant
- 2015-06-29 WO PCT/JP2015/068641 patent/WO2016002701A1/fr active Application Filing
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH0866971A (ja) * | 1994-08-30 | 1996-03-12 | Nippon Hikyumen Lens Kk | 金属含有樹脂の製造方法及びこの樹脂を素材とするレンズ |
| JPH1152127A (ja) * | 1997-08-07 | 1999-02-26 | Kyoritsu Kagaku Sangyo Kk | 近赤外線吸収材料、その合成方法、および近赤外線吸収性樹脂組成物 |
| JPH11315215A (ja) * | 1998-02-20 | 1999-11-16 | Mitsubishi Rayon Co Ltd | 銅化合物含有樹脂組成物、樹脂板およびｐｄｐ用前面板 |
| JP2000007870A (ja) * | 1998-06-23 | 2000-01-11 | Kureha Chem Ind Co Ltd | 樹脂組成物およびその製造方法、光学フィルターおよびこれを備えた装置、熱線吸収フィルター、光ファイバーおよび眼鏡レンズ |
| JP2007178915A (ja) * | 2005-12-28 | 2007-07-12 | Fujifilm Corp | 金属微粒子分散物及び赤外線遮蔽フィルター |
| JP2010134457A (ja) * | 2008-11-06 | 2010-06-17 | Uni-Chemical Co Ltd | 赤外線遮断性フィルム及び赤外線遮断性積層フィルム |
| WO2011135974A1 (fr) * | 2010-04-26 | 2011-11-03 | 一般財団法人川村理化学研究所 | Film mince absorbable par un rayonnement infrarouge contenant des cristaux d'oxyde de titane de type rutile, et son procédé de production |
| JP2013253224A (ja) * | 2012-05-08 | 2013-12-19 | Fujifilm Corp | 近赤外線吸収性液状組成物、これを用いた近赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法 |
| WO2014084288A1 (fr) * | 2012-11-30 | 2014-06-05 | 富士フイルム株式会社 | Composition de résine durcissable, et puce de capteur d'image ainsi que procédé de fabrication de celle-ci mettant en œuvre cette composition |
| WO2015012322A1 (fr) * | 2013-07-24 | 2015-01-29 | 富士フイルム株式会社 | Composition absorbant l'infrarouge proche, filtre de coupure de l'infrarouge proche obtenu en l'utilisant, procédé de production dudit filtre de coupure, module pour appareil photo et procédé pour produire ledit module, et élément photographique solide |
| WO2015111530A1 (fr) * | 2014-01-21 | 2015-07-30 | 富士フイルム株式会社 | Composition absorbant les proches infrarouges, filtre arrêtant les proches infrarouges, procédé de production du filtre arrêtant les proches infrarouges, module d'appareil photographique, et procédé de fabrication du module d'appareil photographique |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016208258A1 (fr) * | 2015-06-24 | 2016-12-29 | 富士フイルム株式会社 | Composition absorbant l'infrarouge proche, filtre bloquant l'infrarouge proche, procédé permettant de produire un filtre bloquant l'infrarouge proche, appareil, procédé permettant de produire un polymère contenant du cuivre et polymère contenant du cuivre |
| US11555132B2 (en) | 2019-02-01 | 2023-01-17 | Samsung Electronics Co., Ltd. | Near-infrared absorbing composition, optical structure, and camera module and electronic device comprising the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6340078B2 (ja) | 2018-06-06 |
| TW201600523A (zh) | 2016-01-01 |
| KR20170007365A (ko) | 2017-01-18 |
| TWI667243B (zh) | 2019-08-01 |
| JPWO2016002701A1 (ja) | 2017-06-01 |
| KR101958696B1 (ko) | 2019-03-15 |
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