WO2015167015A1 - Capteur gyroscopique - Google Patents

Capteur gyroscopique Download PDF

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Publication number
WO2015167015A1
WO2015167015A1 PCT/JP2015/063101 JP2015063101W WO2015167015A1 WO 2015167015 A1 WO2015167015 A1 WO 2015167015A1 JP 2015063101 W JP2015063101 W JP 2015063101W WO 2015167015 A1 WO2015167015 A1 WO 2015167015A1
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WO
WIPO (PCT)
Prior art keywords
gyro sensor
flow path
medium
layer
cantilever
Prior art date
Application number
PCT/JP2015/063101
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English (en)
Japanese (ja)
Inventor
勲 下山
潔 松本
智之 高畑
哲朗 菅
堅太郎 野田
平謙 阮
貴徳 宇佐美
Original Assignee
国立大学法人東京大学
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Filing date
Publication date
Application filed by 国立大学法人東京大学 filed Critical 国立大学法人東京大学
Publication of WO2015167015A1 publication Critical patent/WO2015167015A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects

Definitions

  • the present invention relates to a gyro sensor.
  • the vibration type gyro sensor detects the angular velocity by detecting the Coriolis force acting on the vibrator when acceleration or centrifugal force is applied.
  • acceleration and centrifugal force are large, and the effects of linear acceleration, angular acceleration, and centrifugal force cannot be ignored and cause drift.
  • the Coriolis force is proportional to the mass, the sensitivity is reduced when the size is reduced.
  • an optical gyro sensor high intensity light from a pump laser (excitation light source) is incident on a ring-shaped resonator (resonator ring), and stimulated Brillouin scattering is generated as a nonlinear optical effect.
  • An apparatus using the interference effect of laser light is disclosed (for example, Patent Document 1).
  • the laser beam circulates in the ring-shaped resonator, the time required for the rotation changes according to the rotational angular velocity of the optical gyro sensor itself (Sagnac effect).
  • the laser light that has circulated clockwise and counterclockwise has a phase difference corresponding to the rotational angular velocity.
  • the optical gyro sensor detects the phase difference by measuring the intensity of the light combined with the laser light that has circulated clockwise and counterclockwise, and detects the rotational angular velocity from the phase difference. Unlike the vibration type gyro sensor that detects the Coriolis force, the optical gyro sensor has an advantage that the above-described drift due to acceleration or centrifugal force does not occur.
  • an object of the present invention is to provide a gyro sensor that can be miniaturized.
  • a gyro sensor includes a main body having a flow path formed therein, a medium filled in the flow path, and a pressure sensor provided in the flow path and detecting an inertial force of the medium. It is characterized by providing.
  • FIGS. 4A and 4B are diagrams showing step by step the manufacturing method of the detection unit according to the first embodiment, and FIG. 4A is an end view schematically showing the step of forming a piezoresistive layer, and FIG. 4B is a plan view. It is a figure which shows the manufacturing method of the detection part which concerns on 1st Embodiment in steps, FIG.
  • FIG. 5A is an end elevation which shows typically the step which formed the electrode layer
  • FIG. 5B is a top view.
  • FIG. 6A is an end view which shows typically the step which formed the external shape of the cantilever
  • FIG. 6B is a top view.
  • FIG. 7A is an end view which shows typically the step which removed some electrode layers
  • FIG. 7B is a top view. It is a figure which shows the manufacturing method of the detection part which concerns on 1st Embodiment in steps, FIG.
  • FIG. 8A is an end view which shows typically the step which removed a part of Si substrate
  • FIG. 8B is a top view.
  • Figure 9A is an end view showing the step of removing the portion of SiO 2 layer schematically
  • FIG. 9B is a plan view.
  • It is a block diagram which shows the structure of an experimental apparatus. It is a graph which shows the result of having measured the resistance change rate of the gyro sensor which concerns on 1st Embodiment. It is a schematic diagram which shows the whole structure of the gyro sensor which concerns on 2nd Embodiment.
  • FIG. 13A is a perspective view of an upper layer
  • FIG. 13B is a perspective view of a lower layer.
  • FIG. 13A is a perspective view of an upper layer
  • FIG. 13B is a perspective view of a lower layer.
  • FIG. 17A is a perspective view of the base material for upper layers
  • FIG. 17B is a perspective view of the base material for lower layers.
  • a gyro sensor 10 shown in FIG. 1 is provided so as to block an annular main body 14 in which a flow path 12 is formed, a medium (not shown) filled in the flow path 12, and the flow path 12. And a pressure sensor 16 for detecting the inertial force of the medium.
  • the main body 14 is not particularly limited, and can be formed of metal or resin. Moreover, it is preferable that the main body 14 is formed with a material or structure with high heat insulation, for example, it is preferable to form with a vacuum heat insulation structure.
  • the material constituting the main body 14 preferably has a thermal expansion coefficient close to that of the medium.
  • the medium has a large heat capacity in terms of improving the thermal stability.
  • fluid or gel can be used.
  • liquid and gas can be applied.
  • the liquid for example, water, silicon oil, ionic liquid, or the like can be used.
  • the gas for example, carbon dioxide, xenon, or the like can be used.
  • collagen or agarose gel can be used as the gel.
  • the pressure sensor 16 includes a substrate 20 in which an opening 17 is formed, and a detection unit 18 provided in the substrate 20 so as to close the opening 17.
  • the detection unit 18 includes a Si layer 24, an insulating layer 25, an upper Si layer 26, a piezoresistive layer 27, and an electrode layer 28.
  • a cantilever portion 22 is formed by the upper Si layer 26 and the piezoresistive layer 27.
  • an opening 30 connected to the opening 17 of the substrate 20 is formed on one side of the cantilever 22.
  • the detection unit 18 has a gap 23 formed at the outer edge of the cantilever unit 22. The gap 23 penetrates in the thickness direction of the cantilever part 22 and connects one side and the other side of the cantilever part 22.
  • the cantilever portion 22 has a flat plate-like pressure receiving portion 32 and a pair of hinge portions 34 integrally formed on one side surface of the pressure receiving portion 32. 37 is fixed.
  • the pair of hinge portions 34 are electrically connected to the electrodes 33 and 35, respectively.
  • the electrodes 33 and 35 are electrically disconnected.
  • the cantilever portion 22 is formed so as to be elastically deformable around the hinge portion 34 due to a pressure difference generated between one side and the other side of the cantilever portion 22.
  • the gap 23 formed between the outer edge of the cantilever portion 22 and the frame body 37 is formed in a size (width) that makes it difficult for the medium to circulate.
  • the width of the gap 23 is preferably about 100 times or less of the mean free path of the molecules of the medium. This is because if the width of the gap 23 is larger than 100 times the mean free path of the molecules of the medium, the medium leaks in the gap 23 and the sensitivity is lowered.
  • an impurity is doped into the upper Si layer 26 of the SOI substrate 29 having the SOI structure by a thermal diffusion method or the like to form a piezoresistive layer 27 in which a part of the upper Si layer 26 is an N-type or P-type semiconductor (FIG. 4A, FIG. 4B).
  • a photoresist mask is selectively formed on the piezoresistive layer 27, and, for example, gold is deposited by an evaporation method to form an electrode layer.
  • a cross-shaped pattern 36 in which the insulating layer 25 is exposed in a strip shape from each side is formed (FIGS. 5A and 5B).
  • a groove 38 reaching the insulating layer 25 is formed using a focused ion beam (FIB) at the center of the pattern 36 with the cross-shaped pattern 36 as a mark, and the electrode layer 28 and the piezoresistive layer 27.
  • FIB focused ion beam
  • the upper Si layer 26 and the insulating layer 25 are etched into a cantilever shape (FIGS. 6A and 6B).
  • Electrodes 33 and 35 are formed by removing the photoresist mask (FIGS. 7A and 7B).
  • the Si layer 24 immediately below the cantilever portion 22 is removed by plasma etching to form a hole 42 (FIGS. 8A and 8B). Further, the insulating layer 25 immediately below the cantilever portion 22 is removed by etching using HF vapor to form an opening 30 (FIGS. 9A and 9B). Thereby, one side and the other side of the cantilever part 22 are connected through the gap 23, and the detection part 18 can be obtained.
  • the gap 23 is formed in a shape that tapers from the other side of the cantilever portion 22 toward one side by processing using the FIB.
  • the pressure sensor 16 configured as described above is provided so that the detection unit 18 closes the flow path 12, and the gap 23 formed in the detection unit 18 has a size (width) that makes it difficult for the medium to circulate. Is formed. Therefore, when the gyro sensor 10 rotates the main body 14 in the direction of the arrow shown in FIG. 1, the medium filled in the flow path 12 is pushed by the detection unit 18 formed in the flow path 12. As a result, the medium rotates integrally with the main body 14. That is, a force necessary for rotating the medium integrally with the main body 14, that is, an inertial force of the medium acts on the pressure sensor 16.
  • the cantilever portion 22 of the pressure sensor 16 is elastically deformed around the pair of hinge portions 34 by the acting pressure P. Then, the electric resistance value of the cantilever part 22 changes according to the deformation amount.
  • the gyro sensor 10 can measure the pressure P by measuring the resistance change rate of the cantilever part 22, and can thereby measure the angular acceleration ⁇ .
  • the gyro sensor 10 is configured to measure the inertial force of the medium, it is possible to reduce the size and improve the sensitivity. Since the sensitivity of the medium can be further improved by using a medium having a high density, for example, a liquid, the medium can be further reduced in size.
  • the gyro sensor 10 can suppress the influence by a rapid temperature change by using a medium having a large heat capacity, for example, a liquid, and can improve the thermal stability.
  • a pressure sensor 16 having a cantilever portion 22 having a length of 22.5 ⁇ m, a width of 20 ⁇ m, and a thickness of 0.15 ⁇ m was manufactured and evaluated.
  • the hinge 34 has a length of 2.5 ⁇ m and a width of 0.5 ⁇ m.
  • the width of the gap 23 was about 20 nm.
  • This pressure sensor 16 was installed in the main body 14 so as to block the flow path 12 having a radius of 9.5 cm (flow path diameter: 5 mm).
  • the flow path 12 of the main body 14 was filled with silicon oil (density ⁇ : 1000) as a medium.
  • a power source 50 was connected to the detection unit 18 of the pressure sensor 16 via a function generator (not shown).
  • the electrical resistance value of the detection unit 18 was measured with an oscilloscope 54 after removing noise with a lock-in amplifier 52 and converting it into a voltage.
  • the gyro sensor 100 is provided so as to close the main body 103 having a flow path 102 formed therein, a medium (not shown) filled in the flow path 102, and the flow path 102, and the inertial force of the medium. And a pressure sensor 112 for detecting.
  • the main body 103 includes an upper layer 106, a lower layer 108, and an intermediate layer 110 sandwiched between the upper layer 106 and the lower layer 108.
  • the upper layer 106 and the lower layer 108 have flow path forming grooves 121 and 124 formed on the inner surfaces, respectively.
  • the flow path forming grooves 121 and 124 have a shape in which an annular ring is divided into two in the axial direction.
  • One end 121a of the flow path forming groove 121 of the upper layer 106 is formed so as to overlap vertically with one end part 124a of the flow path forming groove 124 of the lower layer 108 and the intermediate layer 110 interposed therebetween.
  • the other end 121 b of the flow path forming groove 121 of the upper layer 106 is formed so as to overlap vertically with the other end 124 b of the flow path forming groove 124 of the lower layer 108 sandwiching the intermediate layer 110.
  • the intermediate layer 110 includes a through portion 128 formed at a position corresponding to the one end portions 121a and 124a, and a pressure sensor 112 formed at a position corresponding to the other end portions 121b and 124b. .
  • the penetration part 128 penetrates in the thickness direction.
  • the detection unit 18 is formed in parallel to the surface direction of the intermediate layer 110.
  • the main body 103 formed by sequentially stacking the upper layer 106, the intermediate layer 110, and the lower layer 108 configured as described above includes a flow path including an upper flow path 102a and a lower flow path 102b.
  • 102 is formed.
  • the upper flow path 102a is formed by a flow path forming groove 121 and an intermediate layer 110 formed in the upper layer 106 as shown in FIG. 13A.
  • the lower flow path 102b is formed by a flow path forming groove 124 and an intermediate layer 110 formed in the lower layer 108 as shown in FIG. 13B.
  • the upper flow path 102a and the lower flow path 102b are connected to each other through the communication portion 104 corresponding to the through portion 128 formed in the intermediate layer 110 at one end portions 121a and 124a, and the other end portions 121b and 124b are connected to the intermediate layer 110.
  • the gyro sensor 100 is obtained by laminating a predetermined base material to produce a laminate including a plurality of gyro sensors and dividing the laminate into individual pieces.
  • the base materials used for manufacturing are the intermediate layer base material, the upper layer base material, and the lower layer base material, and each base material has a plurality of gyrosensors formed in a lump by producing a plurality of flow paths. A plurality of components are provided so as to be obtained. This will be described in detail below.
  • a predetermined plate-like member is prepared, and through portions 128 and pressure sensors 112 are formed in a plurality of defined unit regions 127 to obtain an intermediate layer base material 126.
  • the intermediate layer base material 126 has a circular shape, but is not limited thereto. It can form using the plate-shaped member of arbitrary shapes.
  • the through portion 128 can be formed at a predetermined position of the unit region 127 by etching or the like.
  • the pressure sensor 112 can be formed by the same method as in the first embodiment.
  • the intermediate layer base material 126 thus produced is provided with a plurality of through portions 128 and pressure sensors 112.
  • a plate-like member having the same size and shape is prepared, and as shown in FIG. 17A, a plurality of flow path forming grooves 121 are formed from the back surface side to obtain the upper layer base material 120.
  • the flow path forming groove 121 is formed in a region corresponding to the unit region 127 defined in the intermediate layer base material 126.
  • the flow path forming groove 121 has an annular shape in which one end portion 121a reaches the through portion 128 and the other end portion 121b reaches the pressure sensor 112. To form.
  • the flow path forming groove 121 can be formed by etching or the like.
  • a plate-like member having the same size and shape is prepared, and a plurality of flow path forming grooves 124 are formed from the surface side by the same method as shown in FIG.
  • the flow path forming groove 124 is also formed in an area corresponding to the unit area 127 defined in the intermediate layer base material 126.
  • the flow path forming groove 124 has an annular shape in which one end portion 124a reaches the through portion 128 and the other end portion 124b reaches the pressure sensor 112. Form.
  • a plurality of gyro sensors 132 are formed in the laminate 130 obtained by sandwiching and joining the intermediate layer base material 126 between the upper layer base material 120 and the lower layer base material 123.
  • the Rukoto are individually cut using, for example, a dicing apparatus, and the gyro sensor 100 of the present embodiment is obtained.
  • the gyro sensor 100 of the present embodiment includes the pressure sensor 112 having the same configuration as that of the first embodiment, and can be filled with the same medium. Therefore, when a motion is given to the gyro sensor 100 so that the flow path 102 rotates in the direction of the arrow shown in FIG. 15, the same action as in the case of the first embodiment occurs and the same effect is obtained. .
  • the gyro sensor 100 is configured to measure the inertial force of the medium, it is possible to reduce the size and improve the sensitivity. Further, by appropriately selecting the medium, the size can be further reduced, and the thermal stability can be improved.
  • the flow path 102 includes an upper flow path 102a and a lower flow path 102b, and the upper flow path 102a and the lower flow path 102b are pressure sensors provided sideways.
  • 112 is partitioned.
  • the intermediate layer 110 provided with the pressure sensor 112 constitutes a part of the upper flow path 102a and the lower flow path 102b.
  • a plurality of gyro sensors 100 can be manufactured in a lump by laminating the substrates. By individually cutting the gyro sensors 100 manufactured in a lump, a plurality of gyro sensors 100 can be efficiently manufactured by a simplified method.
  • the present invention is not limited to the above-described embodiment, and can be appropriately changed within the scope of the gist of the present invention.
  • the temperature compensating element 62 has an external shape similar to that of the cantilever portion 22, but the piezoresistive layer 27 is not formed.
  • a second gap 64 is formed between the temperature compensating element 62 and the cantilever portion 22.
  • the second gap 64 is preferably the same width as the gap 23.
  • the temperature compensating element 62 has a base end bifurcated to form a pair of legs 63 and 65.
  • An opening 66 is formed between the leg portions 63 and 65, and the pair of leg portions 63 and 65 are connected to electrodes 67 and 68, respectively.
  • the electrodes 67 and 68 are electrically disconnected from each other and are electrically disconnected from the electrodes 33 and 35 connected to the cantilever portion 22.
  • the temperature compensation element 62 configured as described above outputs a signal corresponding to the temperature of the detection unit 60.
  • the gyro sensors 10 and 100 can perform temperature compensation for the electric resistance value of the cantilever portion 22 by using the signal output from the temperature compensating element 62. Specifically, the gyro sensors 10 and 100 measure the electrical resistance value accompanying the rotation of the main bodies 14 and 103 by the cantilever part 22 and measure the actual temperature by the temperature compensation element 62. A compensation value corresponding to the actual temperature is calculated from the temperature characteristics of the cantilever portion 22 measured in advance. Accordingly, the gyro sensors 10 and 100 can perform temperature compensation on the electrical resistance value by dividing the compensation value from the measured electrical resistance value.
  • the acceleration in the three-axis direction can be measured.
  • the pressure sensor 112 may be formed instead of the through portion 128.
  • the pressure sensor 112 is provided at a position corresponding to the one end part 121 a in the upper layer 106 and the one end part 124 a in the lower layer 108, and a position corresponding to the other end part 121 b in the upper layer 106 and 124 b in the lower layer 108.
  • the gyro sensor 100 can measure the pressure P by measuring the resistance change rate of the cantilever part 22 in the two pressure sensors 112, thereby measuring the angular acceleration ⁇ with high sensitivity, and temperature compensation for the electrical resistance value. Can also be done.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Pressure Sensors (AREA)
  • Gyroscopes (AREA)
  • Micromachines (AREA)

Abstract

　La présente invention se rapporte à un capteur gyroscopique qui peut être rendu plus compact. Le capteur est caractérisé en ce qu'il est pourvu d'une unité principale (14) comprenant un canal d'écoulement (12), d'un milieu qui remplit l'intérieur du canal d'écoulement (12), et d'un capteur de pression (16) situé à l'intérieur du canal d'écoulement (12), le capteur de pression (16) détectant la force d'inertie du milieu.
PCT/JP2015/063101 2014-05-02 2015-05-01 Capteur gyroscopique WO2015167015A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2014-095026 2014-05-02
JP2014095026 2014-05-02
JP2014-266582 2014-12-26
JP2014266582A JP6548067B2 (ja) 2014-05-02 2014-12-26 ジャイロセンサ

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WO2015167015A1 true WO2015167015A1 (fr) 2015-11-05

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7152752B2 (ja) * 2018-09-14 2022-10-13 国立大学法人 東京大学 角加速度センサ

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6069565A (ja) * 1983-09-26 1985-04-20 Nec Home Electronics Ltd 流体慣性センサ−
JPS62282270A (ja) * 1986-01-07 1987-12-08 ソ−ン　イ−エムアイ　ピ−エルシ− 流れ感知装置
JP2007093528A (ja) * 2005-09-30 2007-04-12 Sunx Ltd 圧力センサ
JP2009047591A (ja) * 2007-08-21 2009-03-05 Canon Inc 角速度センサ及びその製造方法
JP2011209130A (ja) * 2010-03-30 2011-10-20 Kikuchiseisakusho Co Ltd 流量センサーおよび流量検出装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2893296B1 (fr) * 2012-09-04 2018-08-29 Julius Georgiou Implant vestibulaire comprenant un gyroscope mems microfluidique hybride

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6069565A (ja) * 1983-09-26 1985-04-20 Nec Home Electronics Ltd 流体慣性センサ−
JPS62282270A (ja) * 1986-01-07 1987-12-08 ソ−ン　イ−エムアイ　ピ−エルシ− 流れ感知装置
JP2007093528A (ja) * 2005-09-30 2007-04-12 Sunx Ltd 圧力センサ
JP2009047591A (ja) * 2007-08-21 2009-03-05 Canon Inc 角速度センサ及びその製造方法
JP2011209130A (ja) * 2010-03-30 2011-10-20 Kikuchiseisakusho Co Ltd 流量センサーおよび流量検出装置

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JP2015227863A (ja) 2015-12-17

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