WO2015115046A1 - Feuille optique et dispositif électroluminescent - Google Patents

Feuille optique et dispositif électroluminescent Download PDF

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Publication number
WO2015115046A1
WO2015115046A1 PCT/JP2015/000179 JP2015000179W WO2015115046A1 WO 2015115046 A1 WO2015115046 A1 WO 2015115046A1 JP 2015000179 W JP2015000179 W JP 2015000179W WO 2015115046 A1 WO2015115046 A1 WO 2015115046A1
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Prior art keywords
light
diffusion layer
optical sheet
light diffusion
layer
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PCT/JP2015/000179
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English (en)
Japanese (ja)
Inventor
平澤　拓
安寿 稲田
享 橋谷
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パナソニックＩｐマネジメント株式会社
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Priority to JP2015559802A priority Critical patent/JPWO2015115046A1/ja
Publication of WO2015115046A1 publication Critical patent/WO2015115046A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133602—Direct backlight
    • G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0252—Diffusing elements; Afocal elements characterised by the diffusing properties using holographic or diffractive means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0257—Diffusing elements; Afocal elements characterised by the diffusing properties creating an anisotropic diffusion characteristic, i.e. distributing output differently in two perpendicular axes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light

Definitions

  • the present invention relates to an optical sheet and a light emitting device including a light diffusion layer that diffuses at least a part of incident light by diffraction.
  • Patent Document 1 discloses an optical sheet formed by randomly arranging minute uneven structures. By incorporating such an optical sheet into the light emitting device, at least part of the light incident on the optical sheet at an incident angle exceeding the critical angle can be extracted to the outside by diffusing the light by the light diffraction phenomenon.
  • the present invention provides an optical sheet, a light emitting device, a manufacturing method of the optical sheet, and a manufacturing method of the light emitting device that can further increase the light extraction efficiency.
  • an optical sheet includes a light diffusion layer that diffuses at least part of incident light by diffraction, and the light diffusion layer includes a plurality of first minute regions. And a plurality of second microregions, wherein the plurality of first microregions and the plurality of second microregions are light transmitted through each of the plurality of first microregions, It is comprised so that a phase difference may arise between the light which permeate
  • optical sheet of the present invention light incident on the light diffusion layer at an incident angle exceeding the critical angle can be efficiently extracted to the outside, and the light extraction efficiency can be increased.
  • FIG. 1 is a cross-sectional view showing the light emitting device according to the first embodiment.
  • 2A is a plan view showing the optical sheet according to Embodiment 1.
  • FIG. 2B is a plan view showing a first unit structure and a second unit structure constituting the optical sheet of FIG. 2A.
  • 2C is a cross-sectional view of the optical sheet cut along line AA in FIG. 2A.
  • FIG. 2D is a cross-sectional view of the optical sheet when the optical sheet is manufactured using the nanoimprint technique.
  • FIG. 2E is a cross-sectional view showing a part of the light emitting device when a light diffusion layer is formed on the surface of the transparent substrate.
  • FIG. 3 is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 2A.
  • FIG. 4B is a
  • FIG. 5 is a diagram showing a one-dimensional distribution in a certain direction among the spatial frequencies obtained by performing Fourier transform on the pattern in the light diffusion layer.
  • FIG. 6 is a diagram illustrating a result of calculating the incident angle dependency of the light transmittance in the light diffusion layer.
  • FIG. 7 is a diagram showing the result of calculating the dependence of the total light emission amount of the light emitted to the air layer through the light diffusion layer on the unit size w of each of the first minute region and the second minute region. It is.
  • FIG. 8A is a diagram illustrating a result of calculating an emission angle distribution of a total light emission amount of light emitted to the air layer through the light diffusion layer of the first embodiment.
  • FIG. 8B is a diagram illustrating a result of calculating an emission angle distribution of a total light emission amount of light emitted to the air layer through a conventional optical sheet.
  • FIG. 9 is a plan view showing the optical sheet when the appearance probabilities of the first unit structure and the second unit structure are 75% and 25%, respectively.
  • FIG. 10 is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG.
  • FIG. 11A is a diagram showing a one-dimensional distribution in a certain direction among the spatial frequencies obtained by performing Fourier transform on a pattern when the appearance probability of the first unit structure is 100%.
  • FIG. 11B is a diagram illustrating a one-dimensional distribution in a certain direction among the spatial frequencies obtained by performing Fourier transform on a pattern when the appearance probability of the first unit structure is 80%.
  • FIG. 11C is a diagram illustrating a one-dimensional distribution in a certain direction among the spatial frequencies obtained by performing Fourier transform on a pattern when the appearance probability of the first unit structure is 70%.
  • FIG. 11D is a diagram illustrating a one-dimensional distribution in a certain direction among the spatial frequencies obtained by performing Fourier transform on a pattern when the appearance probability of the first unit structure is 60%.
  • FIG. 11E is a diagram illustrating a one-dimensional distribution in a certain direction among the spatial frequencies obtained by performing Fourier transform on a pattern when the appearance probability of the first unit structure is 50%.
  • FIG. 12 is a diagram illustrating a result of calculating the dependence of the total light emission amount of the light emitted to the air layer through the light diffusion layer on the height h of each of the plurality of convex portions.
  • FIG. 13 is a cross-sectional view illustrating an optical sheet according to a modification.
  • FIG. 14 shows the total light emission amount of light emitted to the air layer through the light diffusion layer according to the modification of the first embodiment with respect to the unit size w of each of the first minute region and the second minute region. It is a figure which shows the result of having calculated dependence.
  • FIG. 15A is a cross-sectional view showing the light-emitting device according to Embodiment 2.
  • FIG. 15B is an enlarged cross-sectional view of a part of the light-emitting device of FIG. 15A.
  • FIG. 16 is a diagram illustrating a result of calculating the incident angle dependency of the light transmittance in the light diffusion layer.
  • FIG. 17 shows the first minute region and the second minute region of the total light emission amount of the light emitted to the protective layer through the light diffusion layer when light isotropically exists in the high refractive index layer. It is a figure which shows the result of having calculated the dependence with respect to each unit size w.
  • FIG. 18 shows the first minute region and the first minute region of the total light emission amount of the light emitted to the protective layer through the light diffusion layer when only the light traveling at an angle greater than the critical angle exists in the high refractive index layer.
  • FIG. 19A is a cross-sectional view showing the light-emitting device according to Embodiment 3.
  • FIG. 19B is a cross-sectional view showing a light-emitting device according to a modification of Embodiment 3.
  • 20A is a plan view showing an optical sheet according to Embodiment 4.
  • FIG. 20B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 20A.
  • FIG. 21 is a diagram for explaining a pattern in the light diffusion layer of FIG. 20A.
  • FIG. 22A is a plan view showing an optical sheet having a conventional diffraction grating pattern.
  • FIG. 22B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the diffraction grating pattern of FIG. 22A.
  • FIG. 23A is a plan view showing an optical sheet having a conventional diffraction grating pattern.
  • FIG. 23B is a diagram showing the amplitude of the spatial frequency component by performing Fourier transform on the diffraction grating pattern of FIG. 23A.
  • FIG. 24A is a plan view showing an optical sheet in which randomness is imparted to a conventional diffraction grating.
  • FIG. 24B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern of FIG. 24A.
  • FIG. 25 is a diagram for explaining a pattern in the optical sheet of FIG. 24A.
  • FIG. 26A is a plan view showing an optical sheet according to Embodiment 5.
  • FIG. 26B is a plan view showing four types of unit structures constituting the light diffusion layer of FIG. 26A.
  • FIG. 26C is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 26A.
  • FIG. 27A is a plan view showing an optical sheet according to Embodiment 6.
  • FIG. FIG. 27B is a plan view showing two types of unit structures constituting the light diffusion layer of FIG. 27A.
  • FIG. 27C is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 27A.
  • FIG. 27D is a diagram showing a one-dimensional distribution in a certain direction among the spatial frequencies obtained by performing Fourier transform on the pattern of FIG. 27A.
  • FIG. 27E shows the first minute region and the second minute region of the total amount of light emitted to the air layer through the light diffusion layer when the light diffusion layer is provided on the surface of the transparent substrate. It is a figure which shows the result of having calculated the dependence with respect to each unit size w.
  • FIG. 27F shows the first minute region and the second minute region of the total light emission amount of the light emitted to the protective layer through the optical sheet when the optical sheet is provided between the high refractive index layer and the protective layer. It is a figure which shows the result of having calculated the dependence with respect to unit size w of each micro area
  • FIG. 28A is a plan view showing an optical sheet according to Embodiment 7.
  • FIG. 28B is a plan view showing four types of unit structures constituting the light diffusion layer of FIG. 28A.
  • FIG. 28C is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 28A.
  • FIG. 29A is a plan view showing an optical sheet according to Embodiment 8.
  • FIG. 29B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 29A.
  • FIG. 30A is a plan view showing an optical sheet when a plurality of regular hexagonal unit structures are arranged in a conventional random pattern.
  • FIG. 30B is a diagram showing the amplitude of the spatial frequency component by performing a Fourier transform on the random pattern in the optical sheet of FIG. 30A.
  • FIG. 31A is a plan view showing an optical sheet according to a modification of the eighth embodiment.
  • FIG. 31B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 31A.
  • 32A is a plan view showing an optical sheet according to Embodiment 9.
  • FIG. 32B is a plan view showing two types of unit structures constituting the light diffusion layer of FIG. 32A.
  • FIG. 32C is a cross-sectional view of the first unit structure taken along line BB in FIG. 32B.
  • FIG. 32D is a perspective view showing the first unit structure.
  • FIG. 32E is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 32A.
  • FIG. 33A is a plan view showing an optical sheet according to Embodiment 10.
  • FIG. 33B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 33A.
  • FIG. 34A is a plan view showing an optical sheet according to Embodiment 11.
  • FIG. FIG. 34B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer of FIG. 34A.
  • FIG. 35A is a plan view illustrating a part of the optical sheet according to Embodiment 12 in an enlarged manner.
  • FIG. 35B is a plan view showing two types of unit structures constituting the light diffusion layer of FIG. 35A.
  • FIG. 35C is a cross-sectional view of the light diffusion layer taken along line CC in FIG. 35A.
  • FIG. 35D is a diagram showing a result of calculating the dependency of the total light emission amount of the light emitted to the air layer through the light diffusion layer according to Embodiment 12 on the ratio between the unit size w2 and the unit size w1. It is.
  • FIG. 36A is a cross-sectional view illustrating the light-emitting device according to Embodiment 13.
  • FIG. 36B is a cross-sectional view showing a light-emitting device according to a variation of Embodiment 13.
  • FIG. 37A is a plan view showing a conventional optical sheet.
  • FIG. 37B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the random pattern in the optical sheet of FIG. 37A.
  • FIG. 39 is a diagram schematically showing diffused light emitted from a conventional optical sheet.
  • FIG. 40 is a cross-sectional view schematically showing a part of the concavo-convex structure of the light diffusion layer 151 in the fourteenth embodiment.
  • FIG. 41 is a diagram illustrating a result of calculating the transmission characteristics of the light extraction sheet when the antireflection structure 300 according to the fourteenth embodiment is provided.
  • FIG. 42 is a graph showing the effect of improving the light extraction efficiency in the fourteenth embodiment.
  • FIG. 43A is an enlarged view showing a first example of a random pattern structure and a nanostructure formed on a transparent substrate in the fifteenth embodiment.
  • FIG. 43B is an enlarged view showing a second example of the random pattern structure and the nanostructure formed on the transparent substrate in the fifteenth embodiment.
  • FIG. 44A is a perspective view showing an example of a light diffusion layer 151 in which minute nanostructures are formed on the surface of a random pattern.
  • FIG. 44B is a partial cross-sectional view showing another example of the minute nanostructure in the fifteenth embodiment.
  • FIG. 45 is a diagram showing the results of calculating the incident angle dependence of the transmittance of light incident on the light diffusion layer 151 from the air layer 16 when the nanostructure is formed in the random pattern and when the nanostructure is not formed. It is.
  • FIG. 46 is a graph showing the effect of improving the light extraction efficiency in the fifteenth embodiment.
  • FIG. 37A is a plan view showing a conventional optical sheet 60.
  • a plurality of first micro regions 601 that is, regions shown by white squares in FIG. 37A
  • a plurality of second micro regions 602 That is, a random pattern is formed by a black square in FIG. 37A.
  • Each of the plurality of first minute regions 601 is a convex portion
  • each of the plurality of second minute regions 602 is a concave portion.
  • FIG. 37B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the random pattern in the optical sheet 60 of FIG. 37A.
  • the center of FIG. 37B represents a component having a spatial frequency of 0 (DC component).
  • the spatial frequency is displayed so as to increase from the center toward the outside.
  • the diffusion patterns of the light emitted from the optical sheet 60 when the light is incident on the optical sheet 60 at incident angles ⁇ x 0 °, 20 °, and 40 °, respectively, were obtained by calculation. It is a figure which shows a result. As understood from FIGS. 38A, 38B, and 38C, the diffused light emitted from the optical sheet 60 is diffused around the emission direction of the non-diffused light that is the zero-order light emitted from the optical sheet 60.
  • FIG. 39 is a diagram schematically showing diffused light emitted from the conventional optical sheet 60.
  • the optical sheet 60 is provided on the surface of the transparent substrate 61.
  • Light from a light emitting unit passes through the transparent substrate 61 and then enters the optical sheet 60.
  • the diffused light emitted from the optical sheet 60 is centered on the emission direction of the non-diffused light that is zero-order light emitted from the optical sheet 60 (that is, the direction indicated by the one-dot chain line arrow in FIG. 39).
  • Spread Therefore, when light enters the optical sheet 60 at an incident angle exceeding the critical angle, only a part of the diffused light emitted from the optical sheet 60 can be extracted to the outside, so that the light extraction efficiency is not greatly improved. The problem arises.
  • an optical sheet includes a light diffusion layer that diffuses at least part of incident light by diffraction, and the light diffusion layer includes a plurality of first diffusion layers.
  • Each of the microregions is a concave portion, and at least a part of the convex portion and the concave portion is provided with an antireflection structure, and a central emission wavelength of light incident on the light diffusion layer is ⁇ , Where n is the refractive index of the layer in contact with the light exit side.
  • the spatial frequency component of the pattern formed by the micro area and the plurality of second micro areas has a peak at a peak at least part of incident light by d
  • the material constituting the plurality of first minute regions and the material constituting the plurality of second minute regions have different refractive indexes.
  • each of the plurality of first micro regions is a convex portion having a flat surface
  • each of the plurality of second micro regions is a concave portion having a flat surface
  • the plurality of concave portions The average height of the plurality of convex portions with respect to is 1.5 ⁇ m or less.
  • the antireflection structure is formed by an AR coat.
  • the antireflection structure is formed by a micro concavo-convex structure including a plurality of convex structures and a plurality of concave structures having a size smaller than that of the first micro area and the second micro area.
  • each convex structure in the micro concavo-convex structure has a conical shape or a pyramid shape.
  • the size of each convex structure and each concave structure in the micro concavo-convex structure in a direction parallel to the light diffusion layer is 0.05 ⁇ m or more and 0.1 ⁇ m or less.
  • the height of each convex structure in the fine concavo-convex structure is 0.1 ⁇ m or more and 1.4 ⁇ m or less.
  • a light-emitting device includes a light-emitting layer that emits light and a light diffusion layer that diffuses at least part of the light emitted from the light-emitting layer by diffraction, and the light diffusion layer includes a plurality of first light-emitting layers.
  • the phase difference is generated between the light transmitted through each of the plurality of second micro regions, and each of the plurality of first micro regions is a convex portion,
  • Each of the second minute regions is a concave portion, and at least a part of the convex portion and the concave portion is provided with an antireflection structure, and the central emission wavelength of light incident on the light diffusion layer is ⁇ ,
  • the plurality The spatial frequency component of the pattern formed by the first microregion and the plurality of second microregions is a spatial frequency of 0.068 / ( ⁇ ⁇ n) or more and 2.8 / ( ⁇ ⁇ n) or less. Has a peak.
  • the light emitting device further includes a first electrode layer having translucency, a second electrode layer, and a transparent substrate, and the light emitting layer includes the first electrode layer and the first electrode layer.
  • the light diffusion layer is provided between the first electrode layer and the transparent substrate.
  • the light diffusion layer is provided between the first electrode layer and the transparent substrate.
  • FIG. 1 is a cross-sectional view showing a light emitting device 1 according to the first embodiment.
  • the light emitting device 1 is a light emitting device in which an electrode 11, a light emitting layer 12 (having a light emitting portion), a transparent electrode 13, a transparent substrate 14, and an optical sheet 15 (including a light diffusion layer 151) are stacked in this order.
  • the light emitting device 1 is, for example, an organic electroluminescence element or an LED (Light Emitting Diode).
  • the electrode 11 When the electrode 11 has light reflectivity, the electrode 11 has a function of returning light generated in the light emitting layer 12 toward the air layer 16.
  • the transparent light emitting device 1 When the electrode 11 has light transmittance, the transparent light emitting device 1 can be configured. Any of the above-described configurations is included in the scope of the present invention because an effect of improving the light extraction efficiency can be obtained. Below, the case where the electrode 11 has light reflectivity is demonstrated.
  • the electrode 11 is a cathode, for example.
  • Electrode 11 When a predetermined voltage is applied between the electrode 11 and the transparent electrode 13, electrons (or holes) are injected from the electrode 11 into the light emitting layer 12.
  • a material of the electrode 11 for example, silver (Ag), aluminum (Al), copper (Cu), magnesium (Mg), lithium (Li), sodium (Na), or the like can be used.
  • stacking transparent conductive materials such as ITO (indium tin oxide) or PEDOT: PSS (mixture of polythiophene and polystyrene sulfonic acid), for example, so that these metals may be contact
  • the transparent electrode 13 is, for example, a light transmissive anode.
  • a predetermined voltage is applied between the electrode 11 and the transparent electrode 13, holes (or electrons) are injected from the transparent electrode 13 into the light emitting layer 12.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • PEDOT PSS (mixture of polythiophene and polystyrene sulfonic acid), or the like can be used.
  • an electron transport layer, a hole transport layer, and the like may be provided on both sides of the light emitting layer 12.
  • the electron transport layer is disposed on the electrode 11 side, and the hole transport layer is disposed on the transparent electrode 13 side.
  • the electrode 11 is an anode, the electron transport layer is disposed on the transparent electrode 13 side, and the hole transport layer is disposed on the electrode 11 side.
  • the material for the electron transport layer can be appropriately selected from the group of compounds having electron transport properties.
  • Examples of this type of compound include metal complexes known as electron transport materials such as Alq3 (tris (8-quinolinolato) aluminum), and heterocycles such as phenanthroline derivatives, pyridine derivatives, tetrazine derivatives, and oxadiazole derivatives. And the like.
  • the material is not limited to these materials, and any generally known electron transporting material can be used. In particular, it is suitable to use a material having a high electron transporting property.
  • the material of the hole transport layer can be appropriately selected from the group of compounds having hole transport properties.
  • Examples of this type of compound include 4,4′-bis [N- (naphthyl) -N-phenyl-amino] biphenyl ( ⁇ -NPD), N, N′-bis (3-methylphenyl)-(1 , 1′-biphenyl) -4,4′-diamine (TPD), 2-TNATA, 4,4 ′, 4 ′′ -tris (N- (3-methylphenyl) N-phenylamino) triphenylamine (MTDATA) 4,4'-N, N'-dicarbazole biphenyl (CBP), spiro-NPD, spiro-TPD, spiro-TAD, TNB, and the like, and triarylamine compounds, amine compounds containing carbazole groups And amine compounds containing fluorene derivatives, etc.
  • the present invention is not limited to these materials, and any generally known hole transporting material is used. Bets are possible.
  • the transparent substrate 14 is provided to hold the transparent electrode 13.
  • a material of the transparent substrate 14 for example, a transparent material such as glass and resin can be used.
  • the refractive index of the transparent substrate 14 is generally about 1.45 to 1.65.
  • a high refractive index substrate having a refractive index of about 1.65 to 2.0 may be used.
  • the transparent substrate 14 is not necessarily required. Examples of such a case include a case where a substrate for holding the electrode 11 is provided, and a case where the electrode 11 has a thickness that does not need to be held.
  • the optical sheet 15 has a light diffusion layer 151 (described later) at least on the surface in contact with the air layer 16.
  • An optical sheet 15 is provided on the surface of the transparent substrate 14 on the side opposite to the transparent electrode 13.
  • the light diffusion layer 151 may be directly provided on the surface of the transparent substrate 14.
  • the optical sheet 15 having the light diffusion layer 151 or the light diffusion layer 151 is directly provided so as to be adjacent to the transparent electrode 13. At least part of the light incident on the light diffusion layer 151 is diffused by the light diffraction phenomenon and then emitted from the light diffusion layer 151.
  • the diffused light emitted from the light diffusing layer 151 is emitted from the non-diffused light that is zero-order light emitted from the light diffusing layer 151 (that is, the direction indicated by the dashed-dotted arrow in FIG. 1). Diffuse around different directions.
  • 0th-order light is light through which incident light passes without being diffused, its emission angle is determined by Snell's law. That is, the exit angle ⁇ 1 of the 0th-order light is expressed by the following equation 1 where ⁇ 0 is the incident angle of the incident light, n 0 is the refractive index of the medium on the incident side, and n 1 is the refractive index of the medium on the output side. It is expressed as follows.
  • the emission angle of the 0th-order light can be calculated by the above formula 1, and the configuration in which the diffused light diffuses around a direction different from the emission direction is as follows.
  • a specific configuration of the light diffusion layer 151 will be described later.
  • the optical sheet 15 or the light diffusion layer 151 is provided on the surface of the transparent substrate 14, but these may be provided inside the transparent substrate 14.
  • a part of the light generated in the light emitting layer 12 enters the light diffusion layer 151 after passing through the transparent electrode 13 and the transparent substrate 14. Further, another part of the light generated in the light emitting layer 12 is reflected by the electrode 11, passes through the transparent electrode 13 and the transparent substrate 14, and enters the light diffusion layer 151. At least a part of the light incident on the light diffusion layer 151 is diffused by diffraction and taken out to the air layer 16 outside the light emitting device 1.
  • the refractive index of the air layer 16 is 1.0, for example.
  • FIG. 2A is a plan view showing the optical sheet 15 according to Embodiment 1.
  • FIG. 2B is a plan view showing the first unit structure 152 and the second unit structure 153 constituting the optical sheet 15 of FIG. 2A.
  • FIG. 2C is a cross-sectional view of the optical sheet 15 cut along the line AA in FIG. 2A.
  • the optical sheet 15 has a light diffusion layer 151 that diffuses incident light by diffraction.
  • the optical sheet 15 has the light diffusion layer 151 on the surface in contact with the air layer 16 (that is, the layer in contact with the light emission side).
  • the light diffusion layer 151 is formed by arranging a plurality of first unit structures 152 and second unit structures 153 shown in FIG. 2B.
  • the first unit structure 152 is formed by arranging two first microregions 154 and two second microregions 155 in a first arrangement pattern.
  • the first arrangement pattern is an arrangement pattern in which two first minute regions 154 and two second minute regions 155 are arranged diagonally.
  • the first unit structure 152 has a quadrangular (square) shape in plan view.
  • the second unit structure 153 is formed by arranging two first microregions 154 and two second microregions 155 in a second arrangement pattern different from the first arrangement pattern.
  • the second arrangement pattern is an arrangement pattern obtained by inverting the first minute area 154 and the second minute area 155 in the first arrangement pattern.
  • the second unit structure 153 has a quadrangular (square) shape in plan view.
  • the first minute region 154 is a region indicated by a white square in FIG. 2B, and includes a convex portion 154a that protrudes toward the air layer 16 side.
  • the convex part 154a has a flat surface in the layer direction.
  • the flat surface means a surface that is flat when a structure having a size that is not recognized by light (which is sufficiently smaller than the wavelength of light) is ignored.
  • the second minute region 155 is a region indicated by a black square in FIG. 2B, and includes a recess 155 a that is recessed toward the transparent substrate 14.
  • the recess 155a has a flat surface in the layer direction. Note that each of the first minute region 154 and the second minute region 155 has a quadrangular (square) shape in plan view.
  • a phase difference is generated between the light transmitted through the first microregion 154 and the light transmitted through the second microregion 155.
  • the refractive index of the first minute region 154 is n 1
  • the refractive index of the second minute region 155 is n 2
  • the wavelength of light is ⁇
  • the light passes through the first minute region 154 and the second minute region 155.
  • the phase difference of light is represented by (n 1 ⁇ n 2 ) ⁇ d / ⁇ , where d is the transmission distance.
  • the phase difference of light is realized by a concavo-convex structure.
  • the material forming the first microregion 154 and the material forming the second microregion 155 are different in refractive index. May be realized.
  • a pattern is formed by arranging a plurality of first minute regions 154 and a plurality of second minute regions 155.
  • the heights h of the plurality of convex portions 154a with respect to the plurality of concave portions 155a are substantially the same.
  • the height h of each of the plurality of convex portions 154a with respect to the plurality of concave portions 155a is suitably 1.5 ⁇ m or less.
  • a manufacturing method of the optical sheet 15 of this embodiment having such a pattern for example, a method using a semiconductor process or cutting, or a mold made using a semiconductor process or cutting is transferred by a nanoimprint technique. There are methods.
  • the optical sheet 15 is configured as shown in FIG. 2C. That is, as shown in FIG. 2C, the light diffusion layer 151 is formed in a concavo-convex shape processed on the transparent substrate 150. Note that the substrate 150 and the first minute region 154 may be made of the same material.
  • a semiconductor process is effective when performing fine processing with a pattern controlled on the micron order.
  • a step structure having a flat surface (having discrete height levels) is easy to process. For example, when the height level is a two-stage structure, processing can be performed by one etching. Further, by performing the etching process twice, it is possible to process a structure having a three-level or four-level height.
  • FIG. 2D is a cross-sectional view of the optical sheet 15 when the optical sheet 15 is manufactured using the nanoimprint technique.
  • a step of pressing a mold against a liquid resin is performed, and then a step of curing the resin is performed.
  • the first minute region 154 and the second minute region 155 are formed by transferring the uneven portion of the mold to the liquid resin.
  • a residual film portion 151 'to which the uneven portion of the mold is not transferred remains in the resin.
  • a transparent adhesive or the like may be used to hold the optical sheet 15 as shown in FIGS. 2C and 2D adjacent to the transparent substrate 14.
  • FIG. 2E is a cross-sectional view showing a part of the light emitting device 1 when the light diffusion layer 151 is formed on the surface of the transparent substrate 14 by using a semiconductor process or cutting.
  • the concave and convex shapes 154 and 155 are formed on the transparent substrate 14, and then the above-described material is used with a material having a refractive index different from that of the transparent substrate 14.
  • the uneven shapes 154 and 155 are embedded. Thereby, the uneven light diffusion layer 151 can be directly formed on the surface of the transparent substrate 14.
  • any of the manufacturing methods described above are included in the scope of the present invention because the light diffusion layer 151 can suppress the total reflection of light and improve the light extraction efficiency.
  • the critical angle is set.
  • the light that has entered the light diffusion layer 151 at an incident angle that exceeds the angle causes total reflection at the interface between the transparent substrate 14 and the light diffusion layer 151, and does not reach the first minute region 154 and the second minute region 155. Therefore, it is suitable that the refractive index n 1 of the first minute region 154 is equal to or higher than the refractive index of the transparent substrate 14.
  • the refractive index n 2 of the second minute region 155 is smaller than the refractive index n 1 of the first minute region 154, and the air layer 16 It is suitable that the refractive index is about the same.
  • a material of the first minute region 154 for example, a transparent material such as glass and resin can be used.
  • a material of the second minute region 155 for example, a transparent material such as air and a low refractive index resin can be used.
  • FIG. 3 is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151 of FIG. 2A.
  • “Fourier transform of a pattern” means that a phase shift of light caused by the first microregion 154 and the second microregion 155 is a two-dimensional coordinate x, y on the surface of the light diffusion layer 151. It means Fourier transform when expressed as a function.
  • the Fourier transform of the pattern has a two-dimensional distribution of the height of the flat portion on the light diffusion layer 151.
  • FIG. 3 the coordinates in the frequency space are represented by x and y as in the real space.
  • the center of FIG. 3 represents a component having a spatial frequency of 0 (DC component).
  • the spatial frequency is displayed so as to increase from the center toward the outside.
  • the low frequency component is suppressed at the spatial frequency of the pattern in the light diffusion layer 151 of FIG. 2A.
  • the refractive index of the first microregion 154 and the refractive index of the transparent substrate 14 are 1.5
  • the refractive indexes of the second microregion 155 and the air layer 16 are 1.0
  • the light diffusion layer 151 is set.
  • the wavelength of the incident light is 550 nm
  • the unit size w of each of the first minute region 154 and the second minute region 155 is 0.6 ⁇ m
  • the height h of the first minute region 154 (convex portion 154a) is 0. .6 ⁇ m.
  • the unit size w refers to the length of one side of each of the first microregion 154 and the second microregion 155 in plan view.
  • the diffused light emitted from the light diffusion layer 151 is non-diffused which is zero-order light emitted from the light diffusion layer 151 even in the range of the incident angle ⁇ x> 0 °. The light diffuses around a direction different from the light emission direction.
  • FIG. 5 is a diagram illustrating a one-dimensional distribution in a certain direction among the spatial frequencies obtained by performing Fourier transform on the pattern in the light diffusion layer 151.
  • the horizontal axis indicates the spatial frequency of the pattern
  • the vertical axis indicates the intensity of the spatial frequency in arbitrary units.
  • a thick solid line graph indicates a one-dimensional distribution of the spatial frequency of the pattern of the present embodiment
  • a broken line graph indicates a conventional random pattern (for example, a pattern disclosed in Patent Document 1).
  • a one-dimensional distribution of spatial frequencies is shown, and a thin solid line graph shows a one-dimensional distribution of spatial frequencies of a pattern generally called white noise (for example, a pattern in which structures having random sizes are arranged at random positions).
  • white noise for example, a pattern in which structures having random sizes are arranged at random positions.
  • the spatial frequency of the pattern of the present embodiment has a peak at a spatial frequency near 1 / (2w). Furthermore, in the spatial frequency component of this pattern, a high spatial frequency in the vicinity of 1 / w and a low spatial frequency in the vicinity of 0 are respectively suppressed with respect to the peak. That is, the spatial frequencies near 1 / w and 0 are suppressed, and the intensity distribution has a mountain shape with a peak at the spatial frequency near 1 / (2w).
  • the intensity distribution curve has, for example, a half width of about 1 / (2w). Note that it is desirable that the intensity distribution curve has a spectral width ⁇ or more of the emission wavelength of the light emitting element in the vicinity of the peak component 1 / (2w).
  • w is the unit size w described above. Since a spatial frequency larger than the reciprocal of the wavelength of light does not contribute to the diffraction of light, a high spatial frequency in the vicinity of 1 / w or higher is suppressed with respect to the peak, so that the light incident on the light diffusion layer 151 is reduced. More light can be converted into diffused light.
  • the conventional random pattern has a peak at a low spatial frequency in the vicinity of 0, and the white noise pattern has all the spatial frequencies within a certain amplitude range.
  • the light diffusion layer 151 of the present embodiment exhibits completely different properties from the optical sheet 60 shown in FIG. 37A, for example.
  • the diffused light emitted from the light diffusion layer 151 of the present embodiment is diffused around a direction different from the emission direction of the non-diffused light that is the zero-order light emitted from the light diffusion layer 151.
  • the diffused light emitted from the conventional optical sheet 60 is diffused around the emission direction of the non-diffused light that is the zero-order light emitted from the optical sheet 60.
  • FIG. 6 is a diagram showing the result of calculating the incident angle dependency of the light transmittance in the light diffusion layer 151.
  • the horizontal axis indicates the incident angle of light with respect to the light diffusion layer 151
  • the vertical axis indicates the transmittance of light transmitted through the light diffusion layer 151.
  • the refractive index was 1.0, and the height h of the first minute region 154 (convex portion 154a) was 1.0 ⁇ m.
  • three broken line graphs show calculation results when the unit size w of each of the first minute region 154 and the second minute region 155 is 250 nm, 1 ⁇ m, and 2.5 ⁇ m. .
  • the solid line graph shows the calculation result when the light diffusion layer 151 does not exist.
  • the light transmittance is 0 at the incident angle exceeding the critical angle of about 42 °, while in the case where the light diffusion layer 151 is present.
  • the transmittance was greater than 0 even at an incident angle exceeding a critical angle of about 42 °. From this, it is understood that by providing the light diffusion layer 151 of the present embodiment, light incident on the light diffusion layer 151 at an incident angle exceeding the critical angle can be efficiently extracted to the outside.
  • the horizontal axis indicates the unit size w of each of the first micro area 154 and the second micro area 155
  • the vertical axis indicates the light emitted to the air layer 16 through the light diffusion layer 151.
  • the total light emission amount is shown.
  • the refractive index of the first minute region 154 and the refractive index of the transparent substrate 14 are 1.5, the refractive index of the second minute region 155, and the air layer 16 respectively.
  • the refractive index of each was 1.0.
  • the solid line graph shows the calculation result in the light diffusion layer 151 of the present embodiment.
  • the broken line graph shows the calculation result in the conventional optical sheet 60.
  • the light diffusion layer 151 of the present embodiment can obtain the same light extraction efficiency as that of the conventional optical sheet 60.
  • the size w is in the range of 250 nm to 4 ⁇ m
  • the light diffusion layer 151 of the present embodiment has a light extraction efficiency superior to that of the conventional optical sheet 60.
  • FIG. 8A is a diagram illustrating a result of calculating an emission angle distribution of the total emission amount of light emitted to the air layer 16 through the light diffusion layer 151 of the present embodiment.
  • the horizontal axis indicates the light emission angle with respect to the light diffusion layer 151
  • the vertical axis indicates the total amount of light emitted to the air layer 16 via the light diffusion layer 151.
  • the refractive index of the first minute region 154 and the refractive index of the transparent substrate 14 are 1.5, the refractive index of the second minute region 155, and the air layer 16 respectively.
  • the refractive index of each was 1.0.
  • three broken line graphs indicate that the unit sizes w of the first microregion 154 and the second microregion 155 in the light diffusion layer 151 of the present embodiment are 0.25 ⁇ m and 0.4 ⁇ m, respectively. , 0.6 ⁇ m, and 3.0 ⁇ m.
  • the solid line graph shows the calculation result when the light diffusion layer 151 does not exist.
  • FIG. 8B is a diagram showing the result of calculating the emission angle distribution of the total amount of light emitted to the air layer via the conventional optical sheet 60.
  • FIG. 8B three broken line graphs are obtained when the unit sizes of the first microregion 601 and the second microregion 602 in the conventional optical sheet 60 are 0.6 ⁇ m, 3.0 ⁇ m, and 10 ⁇ m, respectively. The calculation result is shown.
  • the conventional optical sheet 60 extracts more light on the wide-angle side (that is, the direction in which the emission angle is relatively large), whereas the light of the present embodiment.
  • the unit size w is preferably 100 nm to 4 ⁇ m and more preferably 250 nm to 4 ⁇ m in order to improve the light extraction efficiency. I understood that. Further, in order to extract light more to the front side while improving the light extraction efficiency, the unit size w is suitably 250 nm to 0.6 ⁇ m.
  • the range of the unit size w is a numerical range when the wavelength of light is 550 nm. Since the light diffusion in the light diffusion layer 151 is based on the diffraction phenomenon, the range of the unit size w is proportional to the wavelength of the light.
  • the unit size w is suitably 0.18 ⁇ to 7.3 ⁇ , and 0.45 ⁇ to 7.3 ⁇ is more suitable. Is suitable. Further, in order to extract light to the front side while improving the light extraction efficiency, the unit size w is suitably 0.45 ⁇ to 1.1 ⁇ .
  • the central emission wavelength ⁇ is a wavelength where the sum of light intensities having a wavelength larger than that wavelength is equal to the sum of light intensities having a wavelength smaller than that wavelength.
  • the spatial frequency of the pattern in the light diffusion layer 151 of the present embodiment has a peak at a spatial frequency near 1 / (2w). Furthermore, among the spatial frequency components of this pattern, a high spatial frequency in the vicinity of 1 / w and a low spatial frequency in the vicinity of 0 are suppressed. That is, the spatial frequencies near 1 / w and 0 are suppressed, and the intensity distribution has a mountain shape with a peak at the spatial frequency near 1 / (2w).
  • the intensity distribution curve has, for example, a half width of about 1 / (2w).
  • the intensity distribution curve has a spectral width ⁇ or more of the emission wavelength of the light emitting element in the vicinity of the peak component 1 / (2w). That is, it is desirable to have a spread of 1 / (2w ⁇ ⁇ / 2) or more. Thereby, light with different wavelengths emitted from the light emitting element can be extracted.
  • the unit size w of each of the first minute region 154 and the second minute region 155 is suitably 0.18 ⁇ to 7.3 ⁇ . Therefore, 0.45 ⁇ to 7.3 ⁇ is more suitable. Therefore, the spatial frequency condition of the pattern described above can be expressed as follows using the central emission wavelength ⁇ . That is, in the pattern of the present embodiment, among the spatial frequency components, the component near 0 and the component near 1 / w are simultaneously suppressed, and the range of w is 0.18 ⁇ to 7.3 ⁇ . It is suitable that it is 0.45 ⁇ to 7.3 ⁇ .
  • the peak position of the spatial frequency is suitably in the vicinity of 1 / (2w).
  • the spatial frequency condition of the pattern described above can be expressed as follows.
  • the incident angle of light is ⁇ 1
  • the outgoing angle of light is ⁇
  • Equation 2 m is an integer and ⁇ is the wavelength of light.
  • the pattern in the light diffusion layer 151 of the present embodiment is a diffusion structure that can more effectively convert the light emission angle ⁇ 0 by suppressing a sufficiently large spatial frequency and a sufficiently small spatial frequency. It can be said that.
  • the emission angle ⁇ 0 depends on the refractive index n 0 of the air layer 16. Since the spatial frequency condition of the pattern described above is almost inversely proportional to the refractive index n 0 of the air layer 16, it can be expressed as follows. That is, in the pattern, among the spatial frequency components, the component near 0 and the component near 1 / w are simultaneously suppressed, and the range of w is 0.18 n 0 ⁇ ⁇ to 7.3 n 0 ⁇ ⁇ . It is more suitable that 0.45n 0 ⁇ ⁇ to 7.3n 0 ⁇ ⁇ is more suitable.
  • the peak position of the spatial frequency is suitably in the vicinity of 1 / (2w).
  • FIG. 9 is a plan view showing the optical sheet 15A when the appearance probabilities of the first unit structure 152 and the second unit structure 153 are 75% and 25%, respectively.
  • FIG. 10 is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151A of FIG.
  • 11A to 11E respectively show the spatial frequency obtained by Fourier transform of the pattern when the appearance probability of the first unit structure 152 is 100%, 80%, 70%, 60%, and 50%. It is a figure which shows the one-dimensional distribution in a certain azimuth
  • the appearance probability of the first unit structure 152 is 100%, since the periodic component appears strongly, as shown in FIG. 11A, the spatial frequency of the pattern is sharp to the spatial frequency component corresponding to the cycle. It has a peak and contains almost no other components.
  • the appearance probability of the first unit structure 152 is 50%, as shown in FIG. 11E, the spatial frequency of the pattern does not have a sharp peak.
  • the spatial frequency of the pattern has almost a sharp peak. Absent.
  • the spatial frequency of the pattern is It has a random component, that is, an intensity distribution that gently transitions (has a broadening), and also has a sharp peak due to the periodic component.
  • the appearance probability of the first unit structure 152 is x% and the appearance probability of the second unit structure 153 is y% (where x> y).
  • the y% portion of the first unit structure 152 is a random component because there are pairs corresponding to y% of the second unit structure 153, but the (%) of the first unit structure 152 xy)% is a periodic component because there is no pair of second unit structures 153. That is, when the appearance probability of the first unit structure 152 is x% and the appearance probability of the second unit structure 153 is y%, the y% portion of the first unit structure 152 is a random component, The (xy)% portion of the first unit structure 152 is a periodic component.
  • the condition that the random component becomes dominant is “y> xy”.
  • the condition is “x ⁇ 66.6%”.
  • this condition is mostly a random component when the appearance probability of the first unit structure 152 is 60%, but as shown in FIG. 11C, the first unit structure 152 When the appearance probability of the structure 152 is 70%, it coincides with the fact that the periodic component clearly appears.
  • the random component is dominant. For example, in the spatial frequency spectrum of a certain pattern, if the amplitude of the intensity distribution due to randomness is greater than the amplitude of the frequency component due to periodicity, the pattern is said to be dominated by the randomness component Can be considered. In the pattern of the light diffusion layer 151 of this embodiment, the random component is dominant.
  • FIG. 12 is a diagram illustrating a result of calculating the dependence of the total light emission amount of the light emitted to the air layer 16 through the light diffusion layer 151 on the height h of each of the plurality of convex portions 154a.
  • the horizontal axis indicates the height h of each of the plurality of convex portions 154a with respect to the plurality of concave portions 155a
  • the vertical axis indicates the total amount of light emitted to the air layer 16 through the light diffusion layer 151.
  • the refractive index of the first minute region 154 and the refractive index of the transparent substrate 14 are 1.5, the refractive index of the second minute region 155, and the air layer 16 respectively.
  • the unit size w of each of the first microregion 154 and the second microregion 155 is 1 ⁇ m.
  • the solid line graph indicates the calculation result in the light diffusion layer 151 of the present embodiment.
  • the broken line graph shows the calculation result in the conventional optical sheet 60.
  • the light diffusion layer 151 of the present embodiment has a light extraction efficiency superior to that of the conventional optical sheet.
  • the height h of each of the plurality of convex portions 154a can be set to 1.5 ⁇ m or less, for example.
  • the height h was 0.1 ⁇ m or more, light extraction efficiency superior to that of the conventional optical sheet was obtained.
  • the height h was 0.5 ⁇ m or more, further excellent light extraction efficiency was obtained. Therefore, the height h of each of the plurality of convex portions 154a is suitably 0.1 ⁇ m or more.
  • FIG. 13 is a cross-sectional view showing an optical sheet 15B according to a modification.
  • the height of each of the plurality of convex portions 154Ba with respect to the plurality of concave portions 155Ba is random.
  • the average phase difference of the transmitted light is determined by the average height of the plurality of convex portions 154Ba. Therefore, even in this case, as long as a sufficient average phase difference is given to the transmitted light, the average height of each of the plurality of convex portions 154Ba can be set to 1.5 ⁇ m or less, for example.
  • the broken line graph shows the calculation result in the conventional optical sheet 60.
  • the light extraction efficiency superior to that of the conventional optical sheet 60 was obtained when the unit size w was in the range of 0.6 ⁇ m to 5 ⁇ m. .
  • the range of the unit size w is 1.1 ⁇ to 9.1 ⁇ .
  • the spatial frequency condition of the pattern of this modification can be expressed as follows, where ⁇ is the central emission wavelength and n is the refractive index of the air layer 16 on the emission side. That is, in the pattern of the present embodiment, among the spatial frequency components, the component near 0 and the component near 1 / w are simultaneously suppressed, and the range of w is 1.1n ⁇ ⁇ ⁇ 9. It is suitable that 1n ⁇ ⁇ .
  • the peak position of the spatial frequency is suitably in the vicinity of 1 / (2w).
  • FIG. 15A is a cross-sectional view showing light emitting device 1C according to Embodiment 2.
  • a protective layer (transparent substrate) 16C is provided on the opposite side of the high refractive index layer 14C across the light diffusion layer 151C.
  • the light diffusion layer 151C is provided between the light emitting layer 12 and the protective layer 16C.
  • the refractive index of the protective layer 16C is, for example, 1.4 to 1.65, and the refractive index of the high refractive index layer 14C is equal to or higher than the refractive index of the protective layer 16C.
  • a transparent material such as glass and resin can be used as a material of the protective layer 16C.
  • a transparent material such as glass and resin
  • the material for the high refractive index layer 14C include ITO (indium tin oxide), TiO 2 (titanium oxide), SiN (silicon nitride), Ta 2 O 5 (tantalum pentoxide), ZrO 2 (zirconia), and resin.
  • ITO indium tin oxide
  • TiO 2 titanium oxide
  • SiN silicon nitride
  • Ta 2 O 5 tantalum pentoxide
  • ZrO 2 zirconia
  • the refractive index of the first minute region 154 is as high as the refractive index of the high refractive index layer 14C, and for example, a transparent material such as glass and resin is used. be able to.
  • the refractive index of the second minute region 155 is approximately the same as that of the protective layer 16C, and examples of the material thereof include ITO (indium tin oxide), TiO 2 (titanium oxide), SiN (silicon nitride). ), Ta 2 O 5 (tantalum pentoxide), ZrO 2 (zirconia), resin, and the like can be used.
  • FIG. 16 is a diagram illustrating the calculation result of the incident angle dependence of the light transmittance in the light diffusion layer 151C.
  • the horizontal axis indicates the incident angle of light with respect to the light diffusion layer 151C
  • the vertical axis indicates the transmittance of light transmitted through the light diffusion layer 151C.
  • the refractive index of the first minute region 154 and the refractive index of the high refractive index layer 14C are 1.75 respectively
  • the refractive index of the second minute region 155 and the refractive index of the protective layer 16C are 1.5 respectively.
  • the height h of the light diffusion layer 151C was 1.0 ⁇ m.
  • three broken line graphs indicate calculation results when the unit size w of each of the first minute region 154 and the second minute region 155 is 125 nm, 2 ⁇ m, and 5 ⁇ m.
  • the solid line graph shows the calculation result when the light diffusion layer 151C does not exist.
  • the light transmittance is 0 at the incident angle exceeding the critical angle of about 60 °, while the light diffusion layer 151C exists.
  • the transmittance was greater than 0 even at an incident angle exceeding the critical angle of about 60 °.
  • FIG. 17 shows the first minute region 154 and the second minute amount of the total light emission amount of the light emitted to the protective layer 16C via the light diffusion layer 151C when light isotropically exists in the high refractive index layer 14C. It is a figure which shows the result of having calculated the dependence with respect to unit size w of each micro area
  • the horizontal axis indicates the unit size w of each of the first microregion 154 and the second microregion 155
  • the vertical axis indicates the light emitted to the protective layer 16C via the light diffusion layer 151C.
  • the total light emission amount is shown.
  • the refractive index of the first minute region 154 and the refractive index of the high refractive index layer 14C are 1.75 respectively
  • the refractive index of the second minute region 155 and the refractive index of the protective layer 16C are 1.5 respectively. It was.
  • the solid line graph shows the calculation result in the light diffusion layer 151C of the present embodiment.
  • the broken line graph shows the calculation result in the conventional optical sheet 60.
  • the light extraction efficiency superior to that of the conventional optical sheet 60 was obtained when the unit size w was in the range of 125 nm to 6 ⁇ m.
  • FIG. 18 shows a first emission amount of light emitted to the protective layer 16C through the light diffusion layer 151C when only light traveling at an angle larger than the critical angle exists in the high refractive index layer 14C. It is a figure which shows the result of having calculated the dependence with respect to unit size w of each of the micro area
  • FIG. 18 in the range where the unit size w is 1.2 ⁇ m or more, the light diffusion layer 151C of the present embodiment has a light extraction efficiency superior to that of the conventional optical sheet 60.
  • the unit size w is suitably 125 nm to 6 ⁇ m in order to improve the light extraction efficiency in the pattern in the light diffusion layer 151C of the present embodiment.
  • the range of the unit size w is a numerical range when the wavelength of light is 550 nm. Therefore, in order to improve the light extraction efficiency when the central emission wavelength of light is ⁇ , the unit size w is suitably 0.23 ⁇ to 11 ⁇ . Therefore, the condition of the spatial frequency of the pattern can be expressed as follows, where ⁇ is the central emission wavelength and n is the refractive index of the protective layer 16C.
  • FIG. 15B is an enlarged cross-sectional view of a part of the light emitting device 1C of FIG. 15A.
  • a sheet member substrate 150C, residual film portion 151Ca ′ and second minute region 155 is formed on the surface of the protective layer 16C.
  • the first microregion 154 and the remaining film portion 151Cb ′ can be formed by embedding irregularities with a resin having a higher refractive index than that of the second microregion 155.
  • the first minute region is embedded by embedding the unevenness with a resin having a higher refractive index than that of the second minute region 155.
  • 154 and the remaining film portion 151Cb ′ can be formed.
  • the high refractive index layer 14C may not be provided, and the transparent electrode 13 may be formed on the surface of the remaining film portion 151Cb '.
  • the second minute region 155 and the remaining film portion 151Ca are formed by embedding irregularities with a resin having a different refractive index. 'Can be formed. In this case, the substrate 150C is not necessary.
  • the remaining film portion 151Ca 'and the remaining film portion 151Cb' can be configured not to exist.
  • the necessary members are collectively referred to as a light diffusion layer 151C.
  • the light diffusion layer 151C has the effect of suppressing the total reflection of light and improving the light extraction efficiency.
  • the light diffusion layer 151C is formed when the refractive index of the first minute region 154, the remaining film portion 151Cb ′, and the high refractive index layer 14C is higher than the refractive index of the second minute region 155 and the remaining film portion 151Ca ′.
  • a transparent material such as glass and resin can be used as a material for the substrate 150C, the first minute region 154, and the remaining film portion 151Ca ′.
  • Examples of the material of the second minute region 155 and the remaining film portion 151Cb ′ include optical refractive index glass, resin, and inorganic materials (ITO, TiO 2 , SiN, Transparent materials such as Ta 2 O 5 and ZrO 2 can be used.
  • FIG. 19A is a cross-sectional view showing light emitting device 1D according to Embodiment 3.
  • the light emitting device 1D of the present embodiment includes a reflective layer 21, an optical sheet 22, a transparent substrate 23, and a light emitting unit 24.
  • the light emitting unit 24 is provided, for example, inside the transparent substrate 23.
  • the optical sheet 22 is provided between the reflective layer 21 and the light emitting unit 24, and is configured, for example, in the same manner as the optical sheet 15 (15A to 15C) described in the first and second embodiments.
  • the light traveling at an angle larger than the critical angle is totally reflected at the interface between the transparent substrate 23 and the outer layer 25.
  • the light totally reflected in this way is reflected by the reflection layer 21 and then diffused by diffraction in the optical sheet 22.
  • Most of the diffused light from the optical sheet 22 travels at an angle smaller than the critical angle, so that it passes through the transparent substrate 23 and is extracted to the outer layer 25.
  • the light emission part 24 was provided in the inside of the transparent substrate 23, it is not restricted to this, for example, the light emission part 24 can also be provided in the exterior of the transparent substrate 23.
  • FIG. 19B is a cross-sectional view showing a light emitting device 1DA according to a modification of the third embodiment.
  • the light emitting unit 24DA is provided on the transparent substrate 23DA so as to be in contact with the optical sheet 22DA.
  • the transparent substrate 23DA is provided so as to be in contact with the optical sheet 22DA as in the third embodiment.
  • the optical sheet 22DA includes a light diffusion layer 221.
  • the light diffusion layer 221 includes, for example, a plurality of convex portions 222 (a plurality of first micro regions) and a plurality of concave portions 223 (a plurality of second micro regions), as described in the first and second embodiments. )have.
  • the spatial frequency component obtained by performing Fourier transform on the data obtained by digitizing the height distribution of each of the plurality of convex portions 222 in the light diffusing layer 221 of the present modification has a center emission wavelength of light ⁇ , Assuming that the refractive index of the outer layer 25 is n, it can be expressed as follows. That is, the peak position of the spatial frequency component can be configured to exist in a range of 0.068 / ( ⁇ ⁇ n) or more and 2.8 / ( ⁇ ⁇ n) or less.
  • FIG. 20A is a plan view showing an optical sheet 15E according to Embodiment 4.
  • FIG. 20B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151E of FIG. 20A.
  • FIG. 21 is a diagram for explaining a pattern in the light diffusion layer 151E of FIG. 20A.
  • the arrangement pattern of the plurality of second minute regions 155 has a diffraction grating period p as an average with respect to the diffraction grating arrangement pattern indicated by the broken line in FIG.
  • This is an arrangement pattern that is given a position fluctuation ⁇ r that is larger than one-fourth (or larger than one-half the unit size w of the second minute region 155).
  • the pattern in the light diffusion layer 151E of the present embodiment no periodic component appears. Therefore, in the present embodiment, the same effect as in the first embodiment can be obtained. Therefore, the pattern in the light diffusion layer 151E of the present embodiment is included in the scope of the present invention.
  • FIG. 22A is a plan view showing an optical sheet 20 having a conventional diffraction grating pattern.
  • FIG. 22B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the diffraction grating pattern of FIG. 22A.
  • the diffraction grating has a property of concentrating incident light in a specific direction due to an interference effect.
  • the property of the diffraction grating is different from the property of the pattern in the light diffusion layer 151E of the present embodiment, that is, the property of diffusing incident light by diffraction.
  • the diffraction grating has a large wavelength dependency, when the diffraction grating is applied to a light emitting device, color unevenness and brightness unevenness occur depending on the angle (viewing angle) at which the light emitting device is viewed. Therefore, it is difficult to apply a light emitting device using a diffraction grating as a display and an illumination light source.
  • FIG. 23A is a plan view showing an optical sheet 30 having a conventional diffraction grating pattern.
  • FIG. 23B is a diagram showing the amplitude of the spatial frequency component by performing Fourier transform on the diffraction grating pattern of FIG. 23A.
  • FIG. 24A is a plan view showing an optical sheet 40 in which randomness is imparted to a conventional diffraction grating.
  • FIG. 24B is a diagram showing a spatial frequency component by performing Fourier transform on the pattern of FIG. 24A.
  • the optical sheet 40 shown in FIG. 24A is formed by arranging a plurality of first minute regions 411 and a plurality of second minute regions 412 according to the rules described below.
  • FIG. 25 is a diagram for explaining a pattern in the optical sheet 40 of FIG. 24A.
  • the arrangement pattern of the plurality of second minute regions 412 is four times the diffraction grating period p with respect to the arrangement pattern of the diffraction grating indicated by the broken line in FIG. This is an arrangement pattern in which a position fluctuation ⁇ r of 1 or less (or less than 1/2 of the unit size w) is given.
  • the pattern shown in FIG. 24A can be regarded as a diffraction grating because the amplitude of the frequency component due to periodicity is larger than the frequency component due to randomness, and the nature of the pattern is the pattern of this embodiment. Different from the nature of.
  • FIG. 26A is a plan view showing an optical sheet 15F according to Embodiment 5.
  • FIG. 26B is a plan view showing four types of unit structures 156, 157, 158, and 159 constituting the light diffusion layer 151F of FIG. 26A.
  • FIG. 26C is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151F of FIG. 26A.
  • the light diffusion layer 151F of this embodiment has a pattern in which a plurality of first unit structures 156, second unit structures 157, third unit structures 158, and fourth unit structures 159 are arranged. . As shown in FIG. 26C, in the pattern of the present embodiment, there is no spatial frequency near 0, that is, there is no diffused light near the emission direction of the non-diffused light that is the 0th-order light emitted from the light diffusion layer 151F. . Therefore, also in the present embodiment, the same effect as in the first embodiment can be obtained.
  • FIG. 27A is a plan view showing an optical sheet 15G according to Embodiment 6.
  • FIG. 27B is a plan view showing two types of unit structures 160 and 161 constituting the light diffusion layer 151G of FIG. 27A.
  • FIG. 27C is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151G of FIG. 27A.
  • the light diffusion layer 151G of the present embodiment has a pattern in which a plurality of first unit structures 160 and a plurality of second unit structures 161 are arranged. As shown in FIG. 27C, in the pattern of the present embodiment, there is no spatial frequency near 0, that is, there is no diffused light near the emission direction of the non-diffused light that is the 0th-order light emitted from the light diffusion layer 151G. . Therefore, also in the present embodiment, the same effect as in the first embodiment can be obtained.
  • FIG. 27D is a diagram showing a one-dimensional distribution in a certain direction among the spatial frequencies obtained by Fourier transforming the pattern of FIG. 27A.
  • the spatial frequency component of the pattern of the present embodiment has a peak at a spatial frequency slightly higher than 1 / (2w). Further, in the spatial frequency component of this pattern, a high spatial frequency near 1 / w and a low spatial frequency near 0 are suppressed. In other words, the spatial frequencies near 1 / w and 0 are suppressed, and the intensity distribution has a mountain shape with a peak at a spatial frequency slightly higher than 1 / (2w). The half width of the intensity distribution curve is about 1 / (2w).
  • FIG. 27E shows a first minute region and a second region of the total light emission amount of light emitted to the air layer 16 through the light diffusion layer 151G when the light diffusion layer 151G is provided on the surface of the transparent substrate 14. It is a figure which shows the result of having calculated the dependence with respect to unit size w of each micro area
  • the refractive index of the first microregion and the refractive index of the transparent substrate 14 are 1.5, the refractive index of the second microregion, and the air layer 16 The refractive index was 1.0.
  • the solid line graph indicates the calculation result in the light diffusion layer 151G of the present embodiment.
  • the broken line graph shows the calculation result in the conventional optical sheet 60.
  • the light extraction efficiency superior to that of the conventional optical sheet 60 was obtained when the unit size w was in the range of 100 nm to 4 ⁇ m.
  • FIG. 27F shows the total emission amount of light emitted to the protective layer 16C through the light diffusion layer 151G when the light diffusion layer 151G is provided between the high refractive index layer 14C and the protective layer 16C. It is a figure which shows the result of having calculated the dependence with respect to unit magnitude
  • the refractive index of the first microregion and the refractive index of the high refractive index layer 14C are 1.75, the refractive index of the second microregion and the protective layer, respectively.
  • the refractive index of 16C was 1.5.
  • the solid line graph shows the calculation result in the light diffusion layer 151G of the present embodiment.
  • the broken line graph shows the calculation result in the conventional optical sheet 60.
  • the light diffusion layer 151G of the present embodiment has a light extraction efficiency superior to that of the conventional optical sheet 60.
  • FIG. 28A is a plan view showing an optical sheet 15H according to Embodiment 7.
  • FIG. 28B is a plan view showing four types of unit structures 162, 163, 164, and 165 constituting the light diffusion layer 151H of FIG. 28A.
  • FIG. 28C is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151H of FIG. 28A.
  • the light diffusion layer 151H has a pattern in which a plurality of first unit structures 162, second unit structures 163, third unit structures 164, and fourth unit structures 165 are arranged.
  • FIG. 28C in the pattern of the present embodiment, there is no spatial frequency near 0, that is, there is no diffused light in the vicinity of the emission direction of the non-diffused light that is the zero-order light emitted from the light diffusion layer 151H. . Therefore, also in the present embodiment, the same effect as in the first embodiment can be obtained.
  • FIG. 29A is a plan view showing an optical sheet 15I according to Embodiment 8.
  • FIG. 29B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151I of FIG. 29A.
  • the light diffusion layer 151I has a pattern in which a plurality of regular hexagonal unit structures are arranged in plan view. As shown in FIG. 29B, the spatial frequency near 0 is suppressed in the pattern of the present embodiment. That is, the diffused light in the vicinity of the emission direction of the non-diffused light that is the 0th order light emitted from the light diffusion layer 151I is suppressed. Therefore, also in the present embodiment, the same effect as in the first embodiment can be obtained.
  • FIG. 30A is a plan view showing the optical sheet 50 when a plurality of regular hexagonal unit structures are arranged in a conventional random pattern.
  • FIG. 30B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the random pattern in the optical sheet 50 of FIG. 30A.
  • FIG. 31A is a plan view showing an optical sheet 15IA according to a modification of the eighth embodiment.
  • FIG. 31B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151IA of FIG. 31A.
  • the light diffusion layer 151IA has a pattern in which a plurality of regular hexagonal unit structures are arranged in plan view. Note that the pattern of this modification is a pattern different from that of the eighth embodiment.
  • the spatial frequency in the vicinity of 0 is suppressed in the pattern of this modification. That is, the diffused light in the vicinity of the emission direction of the non-diffused light that is the 0th-order light emitted from the light diffusion layer 151IA is suppressed. Therefore, also in the present embodiment, the same effect as in the first embodiment can be obtained.
  • FIG. 32A is a plan view showing an optical sheet 15J according to Embodiment 9.
  • FIG. 32B is a plan view showing two types of unit structures 166 and 167 constituting the light diffusion layer 151J of FIG. 32A.
  • FIG. 32C is a cross-sectional view of the first unit structure 166 cut along the line BB in FIG. 32B.
  • FIG. 32D is a perspective view showing the first unit structure 166.
  • FIG. 32E is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151J of FIG. 32A.
  • the light diffusion layer 151J has a pattern in which a plurality of first unit structures 166 and a plurality of second unit structures 167 are arranged.
  • the first unit structure 166 includes four first microregions 166a, four second microregions 166b, four third microregions 166c, and four fourth microregions 166d. It is formed by arranging with the first arrangement pattern.
  • the first unit structure 166 has a quadrangular (square) shape in plan view.
  • the second unit structure 167 includes four first micro regions 166a, four second micro regions 166b, four third micro regions 166c, and four fourth micro regions 166d. It is formed by arranging with a second arrangement pattern different from the first arrangement pattern.
  • the second unit structure 167 has a quadrangular (square) shape in plan view.
  • the height of the first minute region 166a is the highest
  • the height of the second minute region 166b is the second highest
  • the height of the third minute region 166c is the third
  • the height of the fourth minute region 166d is the lowest.
  • FIG. 33A is a plan view showing an optical sheet 15K according to the tenth embodiment.
  • FIG. 33B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151K of FIG. 33A.
  • the light diffusion layer 151K of the optical sheet 15K includes a first minute region 168a (that is, a region shown in white in FIG. 33A) and a second minute region 168b (that is, FIG. 33A).
  • 33A has a pattern in which a plurality of regions (shown in gray in FIG. 33A) and a plurality of third minute regions 168c (that is, regions shown in black in FIG. 33A) are arranged.
  • Each of the first minute region 168a and the third minute region 168c has a regular hexagonal shape in plan view. For example, the height of the first minute region 168a is the highest, the height of the second minute region 168b is the second highest, and the height of the third minute region 168c is the lowest.
  • the spatial frequency near 0 is suppressed. That is, the diffused light in the vicinity of the emission direction of the non-diffused light that is the zero-order light emitted from the light diffusion layer 151K is suppressed. Therefore, also in the present embodiment, the same effect as in the first embodiment can be obtained.
  • FIG. 34A is a plan view showing an optical sheet 15L according to Embodiment 11.
  • FIG. 34B is a diagram showing the amplitude of the spatial frequency component by Fourier-transforming the pattern in the light diffusion layer 151L of FIG. 34A.
  • the light diffusion layer 151L of the optical sheet 15L of the present embodiment includes a first minute region 169a (that is, a region shown in white in FIG. 34A) and a second minute region 169b (that is, FIG. 34A).
  • 34A a region indicated by gray
  • a third microregion 169c that is, a region indicated by black in FIG. 34A
  • Each of the first minute region 169a and the third minute region 169c has a quadrangular shape in plan view. For example, the height of the first minute region 169a is the highest, the height of the second minute region 169b is the second highest, and the height of the third minute region 169c is the lowest.
  • the spatial frequency near 0 is suppressed in the pattern of the present embodiment. That is, the diffused light in the vicinity of the emission direction of the non-diffused light that is the zero-order light emitted from the light diffusion layer 151L is suppressed. Therefore, also in the present embodiment, the same effect as in the first embodiment can be obtained.
  • FIG. 35A is a plan view illustrating a part of the optical sheet 15M according to Embodiment 12 in an enlarged manner.
  • FIG. 35B is a plan view showing two types of unit structures 170 and 171 constituting the light diffusion layer 151M of FIG. 35A.
  • FIG. 35C is a cross-sectional view of the light diffusion layer 151M cut along the line CC in FIG. 35A.
  • the light diffusion layer 151M of the optical sheet 15M of the present embodiment has a pattern in which a plurality of first unit structures 170 and a plurality of second unit structures 171 are arranged.
  • the first unit structure 170 includes a plurality of types of micro regions having different heights, that is, two first micro regions 172a (that is, regions shown in white in FIG. 35B), 2 Second micro regions 172b (ie, regions shown in light gray in FIG. 35B), two third micro regions 172c (ie, regions shown in dark gray in FIG. 35B), and two fourth micro regions
  • the region 172d (that is, the region shown in black in FIG. 35B) is formed by arranging with the first arrangement pattern.
  • Each of the first to fourth minute regions 172a to 172d has a quadrangular (square) shape in plan view.
  • the first unit structure 170 as a whole has a quadrangular (square) multistage shape in plan view.
  • the second unit structure 171 includes a plurality of types of micro regions having different heights, that is, two first micro regions 172a, two second micro regions 172b, and two third micro regions 172c. And the two fourth micro regions 172d are arranged in a second arrangement pattern different from the first arrangement pattern.
  • the second unit structure 171 has a quadrangular (square) multistage shape in plan view as a whole.
  • the height of the first microregion 172a is the highest
  • the height of the second microregion 172b is the second highest
  • the height of the third microregion 172c is the third highest
  • the height of the fourth minute region 172d is the lowest.
  • the height of the fourth minute region 172d is used as a reference and the height of the third minute region 172c is h0
  • the height of the second minute region 172b is 2h0
  • the first minute region 172a Is 3h0 in height.
  • the unit size w2 of the first minute region 172a is smaller than the unit size w1 of the second minute region 172b.
  • the unit size w2 of the fourth minute region 172d is smaller than the unit size w1 of the third minute region 172c.
  • FIG. 35D shows the result of calculating the dependence of the total light emission amount of the light emitted to the air layer through the light diffusion layer 151M according to Embodiment 12 on the ratio between the unit size w2 and the unit size w1.
  • the horizontal axis indicates the ratio w2 / w1 between the unit size w2 and the unit size w1
  • the vertical axis indicates the total amount of light emitted to the air layer through the light diffusion layer 151M.
  • each of the five graphs has a unit size w1 of the second microregion 172b (or the third microregion 172c) of 1.2 ⁇ m, 1.5 ⁇ m, 2.0 ⁇ m, 2.5 ⁇ m, and 3.0 ⁇ m.
  • the calculation result in the case of is shown.
  • the ratio w2 / w1 of the unit size w2 to the unit size w1 is in the range of 0.4 to 1.0.
  • the extraction efficiency was obtained.
  • FIG. 36A is a cross-sectional view showing light emitting device 1N according to Embodiment 13.
  • the light emitting device 1N according to the present embodiment includes an electrode 11, a light emitting layer 12 (having a light emitting portion 24), a transparent electrode 13, a light diffusion layer 151, a transparent substrate 14, and an auxiliary optical sheet 18.
  • the light emitting devices are sequentially stacked. Since the configurations of the electrode 11, the light emitting layer 12, the transparent electrode 13, the transparent substrate 14, and the light diffusion layer 151 are the same as those in the first embodiment, description thereof will be omitted.
  • the auxiliary optical sheet 18 is provided on the surface of the transparent substrate 14.
  • the auxiliary optical sheet 18 has a structure in which a light diffusion layer 181 and a microlens 182 as a light extraction structure are combined.
  • the light diffusion layer 181 is provided on the surface of the transparent substrate 14 and has, for example, a light diffusion function similar to that of the light diffusion layer 151 of the optical sheet 15.
  • the microlens 182 is provided on the surface of the light diffusion layer 181.
  • a plurality of convex lens portions 182 a are two-dimensionally arranged on the surface of the microlens 182.
  • a part of the light generated in the light emitting part 24 passes through the transparent electrode 13 and then enters the light diffusion layer 151. Further, part of the light generated in the light emitting unit 24 is reflected by the electrode 11, then passes through the transparent electrode 13 and enters the light diffusion layer 151. At least part of the light incident on the light diffusion layer 151 is diffused by diffraction and then passes through the transparent substrate 14. The light transmitted through the transparent substrate 14 enters the auxiliary optical sheet 18. At least a part of the light incident on the auxiliary optical sheet 18 is diffused by diffraction and then taken out to the air layer 16 outside the light emitting device 1N.
  • the auxiliary optical sheet 18 is provided in addition to the light diffusion layer 151, the light extraction efficiency can be further increased.
  • FIG. 36B is a cross-sectional view showing a light-emitting device 1P according to a modification of Embodiment 13.
  • the auxiliary optical sheet 18P has a structure in which a diffraction grating 183 and a pyramid structure 184 as a light extraction structure are combined.
  • the diffraction grating 183 is provided on the surface of the transparent substrate 14 and has a function of diffracting incident light.
  • the pyramid structure 184 is provided on the surface of the diffraction grating 183.
  • the auxiliary optical sheet 18P is provided in addition to the light diffusion layer 151, the light extraction efficiency can be further increased.
  • the auxiliary optical sheet 18P is configured by combining the diffraction grating 183 and the pyramid structure 184, but is not limited thereto.
  • the auxiliary optical sheet may have a structure in which any two or more of the light diffusion layer 181, the microlens 182, the diffraction grating 183, and the pyramid structure 184 described above are combined.
  • the auxiliary optical sheet may have a structure having any one of the above-described light diffusion layer 181, microlens 182, diffraction grating 183, and pyramid structure 184.
  • a light diffusion layer having fine particles that diffuse light may be used instead of the light diffusion layer 181 described above.
  • FIG. 40 is a cross-sectional view schematically showing a part of the concavo-convex structure of the light diffusion layer 151 in the fourteenth embodiment.
  • This embodiment is different from the above embodiments in that an antireflection structure 300 that suppresses reflection of light is formed on the surface of each convex portion 154a and each concave portion 155a in the light diffusion layer 151.
  • Such an antireflection structure 300 can be applied to any of the concavo-convex structures in the previous embodiments.
  • the appearance of the optical sheet proposed by the present application is improved and the light extraction efficiency is further improved.
  • the uneven structure having the random pattern in any of the above embodiments is formed on the surface of the optical sheet (hereinafter also referred to as “light extraction sheet”)
  • the antireflection structure 300 is formed on the surface. If not, most of the light incident from the outside (for example, the air layer) is reflected in a random direction. Therefore, there is no reflection that can visually recognize the image.
  • the light extraction sheet in the embodiment of the present application has a feature that a scattering pattern of light incident from the outside is strongly scattered in a specific direction as compared with complete scattering. For this reason, when the light extraction sheet is observed, an interference color derived from a specific frequency component may be slightly observed.
  • an appearance problem is caused by light reflected from the surface of the concavo-convex structure. Therefore, in the present embodiment, the above problem is solved by forming an antireflection structure 300 made of an AR (Anti-Reflection) coat on the surface of the concavo-convex structure.
  • the AR coating reflects the light by interfering with each other by causing a phase difference close to an odd multiple of a half wavelength between the light that is captured and reflected inside and the light that is reflected from the surface. Realize the prevention effect.
  • FIG. 41 is a diagram showing the result of calculating the transmission characteristics of the light extraction sheet when such an antireflection structure 300 is provided.
  • a 110 nm thick layer made of a transparent material having a refractive index of 1.25 is formed as an AR coat on the surface of the concavo-convex structure having the pattern shown in FIG. 29A
  • the light enters the light diffusion layer 151 from the air layer 16.
  • the incident angle dependence of the transmitted light was calculated.
  • the result when the AR coat is formed is indicated by a dotted line
  • the result when the AR coat is not formed is indicated by a solid line. It can be seen that by providing the AR coat, the transmittance is high at all incident angles.
  • the AR coat the light reflected on the surface can be reduced and the appearance can be improved.
  • FIG. 42 is a graph showing the effect of improving the light extraction efficiency in the present embodiment.
  • FIG. 42 shows the calculation result of the incident angle dependence of the transmittance of light emitted from the inside of the optical sheet (on the transparent substrate 14 side) to the air layer 16 in the configuration shown in FIG.
  • the horizontal axis indicates the incident angle of light to the light diffusion layer 151
  • the vertical axis indicates the transmittance of light transmitted through the light diffusion layer 151.
  • the refractive index of the first minute region 154 and the refractive index of the transparent substrate 14 are 1.5
  • the refractive index of the second minute region 155 and the refractive index of the air layer 16 are 1.0
  • the height h of one minute region 154 (convex portion 154a) was 1.0 ⁇ m.
  • the average transmittance for all incident angles was 51.9%.
  • the average transmittance in the previous embodiments without the AR coat was 49.6%. It can be seen that the provision of the AR coat improves the light transmittance when the incident angle is in the vicinity of 0 to 58 degrees. Thus, it has been confirmed that the antireflection function in the present embodiment can be obtained even in combination with the random pattern.
  • the total amount of light emitted to the air layer 16 via the light diffusion layer 151 is calculated.
  • the AR coat is It was confirmed that it was improved by 3.9% compared with the case where it was not provided.
  • the calculation in this embodiment is performed assuming that the AR coat is formed of one coat layer.
  • the AR coat is not limited to one layer, and the antireflection structure 300 in which a plurality of coat layers are stacked is formed. May be.
  • the antireflection structure 300 does not need to be formed on the entire surface of the convex portion and the concave portion, and may be formed on at least a part of the convex portion and the concave portion.
  • the antireflection structure 300 only needs to reduce the reflection of incident light as much as possible, and does not necessarily have a function of completely preventing reflection.
  • Such an AR coat can be formed by, for example, forming the light diffusion layer of any of Embodiments 1 to 13 and then laminating a known coating material on the uneven surface by a method such as vapor deposition or coating. .
  • the manufacturing method of the AR coat is not limited to a specific one, and any known method may be adopted.
  • the optical sheet in Embodiment 14 is not limited to the surface of the light emitting device, and may be provided inside the light emitting device, for example, as shown in FIG. 15A. Therefore, as a modification, a configuration in which an optical sheet in which an AR coat is formed on the surface of a concavo-convex structure having a random pattern shown in FIG. 29A is provided between the light emitting layer 12 and the transparent substrate 14 was examined.
  • the refractive index of the first microregion 154 and the refractive index of the transparent substrate 14 are each 1.76
  • the refractive index of the second microregion 155 and the refractive index of the air layer 16 are each 1.5
  • the first microregion 154 is.
  • the height h of the (convex portion 154a) is 1.0 ⁇ m
  • the refractive index of the AR coating layer is 1.6
  • the thickness is 86 nm.
  • the transmittance of light incident on the transparent substrate 14 via the scattering layer 151 was calculated by changing the incident angle.
  • the average transmittance of light at all incident angles was 68.1%.
  • the average transmittance without the intermediate refractive index layer was 67.4%. That is, the light transmitted through the transparent substrate 14 can be increased by providing the AR coating layer.
  • the total amount of light emitted to the transparent substrate 14 via the light diffusing layer 151 is calculated. It was confirmed that it was improved by 0.9% compared to the case where it was not provided. Thus, even in the configuration in which the light diffusion layer is provided inside, the light extraction efficiency can be increased by providing the antireflection structure.
  • one layer having an intermediate refractive index is provided as the antireflection structure, but the number of layers is not limited to one, and a plurality of layers may be stacked.
  • the antireflection structure a plurality of convex structures and concave structures smaller than the respective areas are formed on a random pattern composed of the first minute area (convex part) and the second minute area (concave part).
  • a minute concavo-convex structure can be referred to as a nanostructure (body) because each convex portion and each concave portion have a nanoscale size.
  • the present embodiment has the same structure as that of the fourteenth embodiment except that the antireflection structure is formed by such a nanostructure instead of the AR coat.
  • the random pattern structure includes a plurality of concave portions 155a and a plurality of convex portions 154a whose height with respect to the concave portion is h. 2 minute regions are formed.
  • a nanostructure 400 composed of a plurality of convex structures and a plurality of concave structures smaller than the first and second minute regions is provided. As the unevenness of the nanostructure 400, as shown in FIG.
  • a concave structure with a width (period) A and a depth h2 may be formed on the surface of the random pattern structure, or as shown in FIG.
  • a convex structure having a height h2 may be formed on the surface of the random pattern structure.
  • the concave structure and the convex structure of the nanostructure shown in FIGS. 43A and 43B may be inverted, and the same effect can be obtained in any case.
  • FIG. 44A is a perspective view showing an example of the light diffusion layer 151 in which such a fine nanostructure is formed on the surface of a random pattern.
  • each convex structure in the nanostructure has a shape close to a cone, and each concave structure is a space portion sandwiched between a plurality of convex structures.
  • the shape of each convex structure is not limited to this example, and may be, for example, a pyramid shape or a prism shape.
  • FIG. 44B is a partial cross-sectional view showing an example of a nanostructure 400 ′ in which each structure has a prismatic shape, that is, a cross-sectional shape taken along a plane perpendicular to the light diffusion layer is a rectangle. Even when such a nanostructure 400 ′ is used, an antireflection effect can be obtained. Note that the uneven structure in the nanostructure is not necessarily arranged periodically.
  • the nanostructure has a size A (period in a direction parallel to the surface of the transparent substrate 14) smaller than the wavelength of light emitted from the light emitting layer.
  • the size A of the unevenness of the nanostructure can be set to 1 ⁇ 4 or less of the wavelength of light, for example.
  • the size A can be set to, for example, 0.05 ⁇ m or more and 0.1 ⁇ m or less. If the size A is less than 0.05 ⁇ m, processing becomes difficult, and if the size A is larger than 0.1 ⁇ m, diffracted light is generated, so that it is difficult to suppress reflection of external light.
  • the depth (or height) h2 of the unevenness of the nanostructure can be set to 0.1 ⁇ m or more and 1.4 ⁇ m or less, for example. If the depth h ⁇ b> 2 is less than 0.1 ⁇ m, the refractive index change in the thickness direction becomes extreme, so that it is difficult to obtain the effect of low reflection. In addition, as the depth h2 is deeper, the refractive index changes more gradually, but processing becomes difficult. Furthermore, if the depth h2 is larger than 1.4 ⁇ m, it becomes difficult to maintain the shape of the random pattern structure.
  • Such a nanostructure is also called a moth-eye structure (claw eye structure).
  • G It was discovered by Bernhard (see, for example, Non-Patent Document 1 and Non-Patent Document 2).
  • the light when light is incident on a material from the air side and a two-dimensional nanostructure is formed on the material surface, the light has a refractive index intermediate between that air and this material. The reflectance of light decreases.
  • FIG. 44A it is known that the reflectance of light further decreases when the nanostructure is formed into a pointed cone shape and the refractive index of air and a substance is gradually changed.
  • by forming a nanostructure having a moth-eye structure surface reflection can be suppressed and the appearance of the light-emitting device can be improved.
  • the nanostructure can be produced by a semiconductor process or a transfer process using nanoimprint or the like, similarly to the random pattern structure.
  • the manufacturing method of the nanostructure is not limited to a specific method, and any method may be used.
  • FIG. 45 shows the incidence of the transmittance of light incident on the light diffusion layer 151 from the air layer 16 when the nanostructure as shown in FIG. 44A is formed in the random pattern shown in FIG. 29A and when the nanostructure is not formed.
  • the result of calculating the angle dependence is shown. It can be seen that by providing the nanostructure, the transmittance is high at all angles. That is, by providing the nanostructure, the light reflected on the surface can be reduced and the appearance can be improved.
  • FIG. 46 is a graph showing the effect of improving the light extraction efficiency in the present embodiment. 46 shows the calculation result of the incident angle dependence of the transmittance of light emitted from the inside of the optical sheet (on the transparent substrate 14 side) to the air layer 16 in the configuration shown in FIG.
  • the horizontal axis in FIG. 46 indicates the incident angle of light to the light diffusion layer 151, and the vertical axis indicates the transmittance of light transmitted through the light diffusion layer 151.
  • the refractive index of the first minute region 154 and the refractive index of the transparent substrate 14 are 1.5
  • the refractive index of the second minute region 155 and the refractive index of the air layer 16 are 1.0
  • the height h of one minute region 154 (convex portion 154a) was 1.0 ⁇ m.
  • the average transmittance for all incident angles was 51.1%.
  • the average transmittance when no nanostructure was added was 49.6%.
  • the nanostructure When light isotropically exists on the transparent substrate 14, the total amount of light emitted to the air layer 16 via the light diffusion layer 151 is calculated.
  • the nanostructure When the nanostructure is provided, the nanostructure It was confirmed that it was improved by 2.7% compared to the case where it was not provided.
  • the nanostructure of this embodiment can be applied to all the uneven patterns of the above-described embodiment. Further, by making the shape of the nanostructure into a cone or a polygonal pyramid like the conventional moth-eye structure and setting the period A and the height h2 to the optimum dimensions with respect to external light, it is possible to obtain a further reflection reduction effect. it can.
  • the concavity and convexity of the nanostructure is a cone or a polygonal pyramid
  • the height h2 of the cone is set to, for example, 0.1 ⁇ m to 1.4 ⁇ m
  • the size A is, for example, 0.05 ⁇ m to 0.1 ⁇ m. It can be set to:
  • the optical sheet in Embodiment 15 is not limited to the surface of the light emitting device, and may be provided inside. Therefore, as a modification, an optical sheet in which a nanostructure smaller than each region is formed on the surface of the concavo-convex structure having a random pattern shown in FIG. 29A is provided between the light emitting layer 12 and the transparent substrate 14. investigated.
  • the refractive index of the first microregion 154 and the refractive index of the transparent substrate 14 are each 1.76
  • the refractive index of the second microregion 155 and the refractive index of the air layer 16 are each 1.5
  • the first microregion 154 is.
  • the height h of the (convex portion 154a) is 1.0 ⁇ m
  • the height h2 of the nanostructure is 0.1 ⁇ m
  • the size A is 0.08 ⁇ m.
  • the transmittance of light incident on the transparent substrate 14 from 12 through the light scattering layer 151 was calculated by changing the incident angle.
  • the average transmittance of light at all incident angles was 68.0%.
  • the average transmittance when no nanostructure was added was 67.4%. That is, the light transmitted through the transparent substrate 14 can be increased by providing the nanostructure.
  • the total amount of light emitted to the transparent substrate 14 through the light diffusion layer 151 is calculated.
  • the nanostructure is It was confirmed that the ratio was improved by 0.7% compared to the case where no provision was made.
  • the light extraction efficiency can be increased by forming the nanostructure as the antireflection structure.
  • optical sheet, the light emitting device, the method for manufacturing the optical sheet, and the method for manufacturing the light emitting device according to one or more aspects of the present invention have been described above based on the embodiments.
  • the form is not limited. Unless it deviates from the gist of the present invention, one or more of the present invention may be applied to various modifications that can be conceived by those skilled in the art, or forms constructed by combining components in different embodiments. It may be included within the scope of the embodiments.
  • the layer from which light is emitted from the light emitting device is configured by the air layer or the protective layer, but is not limited thereto, and may be configured by, for example, a liquid layer.
  • the first The first micro area and the second micro area have the same height and different refractive indexes, for example.
  • the medium and the second medium can also be used.
  • optical sheet or light diffusion layer In the first to twelfth and twelfth and fourteenth to fifteenth embodiments, an example in which only one optical sheet or light diffusion layer is present has been described.
  • a plurality of light diffusing layers may be present, and when the same optical sheet or light diffusing layer as that shown in the above embodiment is used in at least one place, it is included in the scope of the present invention.
  • a plurality of optical sheets or light diffusion layers may be present inside the light emitting device.
  • the first minute region and the second minute region are each formed into a quadrangle in a plan view, and in the eighth embodiment, these are formed into a hexagon in a plan view.
  • the shape of each of the first minute region and the second minute region can be changed as appropriate.
  • the shape of each of the first minute region and the second minute region can be configured as a truncated cone or a cone.
  • region can also be comprised in a round shape.
  • a corner portion may be processed into a round shape, or a step portion may be processed into a slope shape. Even when these factors occur when processing the light diffusion layer, as long as the above-mentioned pattern properties are not lost, the first minute region and the second region in which the corner portions are processed in a round shape.
  • An optical sheet having a minute region is also included in the scope of the present invention.
  • the light emitting device according to the present invention can be applied as, for example, a flat panel display, a backlight for a liquid crystal display device, a light source for illumination, and the like.
  • the optical sheet according to the present invention can be applied to the above-described light emitting device.
  • Electrode 12 Light emitting layer 13 Transparent electrode 14, 23, 23DA, 61 Transparent substrate 14C High refractive index layer 15, 15A, 15B, 15C, 15E, 15F, 15G, 15H , 15I, 15IA, 15J, 15K, 15L, 15M, 20, 22, 22DA, 30, 40, 50, 60 Optical sheet 16 Air layer 16C Transparent substrate 18, 18P Auxiliary optical sheet 21 Reflective layer 24, 24DA Light emitting unit 25 External Layer 100 Power feeding unit 150 Substrate 151, 151A, 151C, 151E, 151F, 151G, 151H, 151I, 151IA, 151J, 151K, 151L, 151M, 181, 221 Light diffusion layers 151 ′, 151Ca ′, 151Cb ′ , 156, 160, 162, 166, 170 First unit structure 1 3, 157, 161, 163, 167, 171 Second

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

L'invention concerne une feuille optique qui, selon un mode de réalisation, est munie d'une couche de diffusion optique pour diffuser au moins une certaine lumière incidente par l'intermédiaire d'une diffraction. La couche de diffusion optique comprend une pluralité de premières micro-régions et une pluralité de secondes micro-régions. Chacune de la pluralité de premières micro-régions est une saillie (154a), et chacune de la pluralité de secondes micro-régions est un évidement (155a). Une structure anti-réfléchissante (400) est prévue sur au moins une partie de chaque saillie et chaque évidement. Les composantes de fréquences spatiales du motif formé par la pluralité de premières micro- régions et la pluralité de secondes micro-régions ont des pics dans des fréquences spatiales entre 0,068 / (λ × n) et 2,8 / (λ × n) inclus, où λ représente la longueur d'onde d'émission centrale de la lumière incidente sur la couche de diffusion optique et n représente l'indice de réfraction d'une couche en contact avec la couche de diffusion optique sur le côté d'émission de lumière.
PCT/JP2015/000179 2014-01-28 2015-01-16 Feuille optique et dispositif électroluminescent WO2015115046A1 (fr)

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JP2020534635A (ja) * 2017-09-18 2020-11-26 京東方科技集團股▲ふん▼有限公司Ｂｏｅ Ｔｅｃｈｎｏｌｏｇｙ Ｇｒｏｕｐ Ｃｏ．，Ｌｔｄ． 光変調装置、バックライトモジュール、表示装置及びその製造方法
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JP7239092B2 (ja) 2017-09-18 2023-03-14 京東方科技集團股▲ふん▼有限公司 光変調装置、バックライトモジュール、表示装置及びその製造方法

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