WO2015100877A1 - 一种坩埚设备及其在液晶面板生产中的应用 - Google Patents

一种坩埚设备及其在液晶面板生产中的应用 Download PDF

Info

Publication number
WO2015100877A1
WO2015100877A1 PCT/CN2014/075117 CN2014075117W WO2015100877A1 WO 2015100877 A1 WO2015100877 A1 WO 2015100877A1 CN 2014075117 W CN2014075117 W CN 2014075117W WO 2015100877 A1 WO2015100877 A1 WO 2015100877A1
Authority
WO
WIPO (PCT)
Prior art keywords
crucible
heating
equipment
stirring mechanism
stirring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2014/075117
Other languages
English (en)
French (fr)
Inventor
张鑫狄
邹清华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/647,105 priority Critical patent/US20160310921A1/en
Publication of WO2015100877A1 publication Critical patent/WO2015100877A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/47—Mixing liquids with liquids; Emulsifying involving high-viscosity liquids, e.g. asphalt
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/90—Heating or cooling systems
    • B01F35/92—Heating or cooling systems for heating the outside of the receptacle, e.g. heated jackets or burners
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/80—Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis
    • B01F27/90—Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis with paddles or arms 
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
    • B01F27/80—Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis
    • B01F27/91—Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis with propellers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/90—Heating or cooling systems
    • B01F2035/99—Heating

Definitions

  • Tantalum device and application thereof in production of liquid crystal panel
  • the present invention relates to a helium device. Halo technology
  • the heating source currently used is close to the crucible, and conducts heat to the material to evaporate the material. If the crucible is thick, the material with poor thermal conductivity will be said to be far away from the wall and the temperature is high near the wall. When vapor deposition is performed using such a crucible device, the problem of uneven heating is likely to occur.
  • the present invention is achieved by the following technical solution: a crucible apparatus, wherein the crucible apparatus includes a heating source, a crucible, and a stirring mechanism for heating a material in the crucible, the stirring mechanism being used for The material in the crucible is agitated.
  • the heating source includes a barrel structure and a heating electric wire wound around an inner wall of the barrel structure.
  • the crucible is located inside the barrel structure.
  • the winding density of the heating electric heating wire is different in the vertical direction.
  • the lower portion of the crucible is provided with a heat insulating mat.
  • the crucible has a receiving portion and an outlet portion, and the receiving portion communicates with the outlet portion.
  • the outlet portion has an air outlet or a plurality of air outlets.
  • the outlet portion has a plurality of air outlets, and the plurality of air outlets are arranged in a straight line or a plane shape.
  • the agitation mechanism includes a stirring fan and a driving source that drives the rotation of the agitating fan.
  • the driving source is a motor.
  • the driving source is mechanically coupled to the stirring fan through a bearing.
  • germanium device in the production of a liquid crystal panel, wherein the germanium device is the germanium device described above.
  • the invention has the beneficial effects that the crucible apparatus of the present invention comprises a heating source, a crucible and a stirring mechanism for heating the material in the crucible, and the stirring mechanism is used for the material in the crucible Stirring allows the material in the crucible to be evenly heated.
  • FIG. 1 is a schematic structural view of a cymbal apparatus according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a stirring mechanism of a crucible apparatus according to an embodiment of the present invention
  • FIG. 3 is a schematic view for explaining a liquid level of a material when the stirring mechanism is not in operation;
  • Fig. 4 is a schematic view for explaining that the liquid level of the material when the stirring mechanism is operated is a curved surface. detailed description
  • the crucible apparatus of the present embodiment includes a heating source 120, a crucible 110, and a stirring mechanism 200.
  • the heating source 120 is used to heat the material in the crucible 110
  • the agitating mechanism 200 is used to agitate the material in the crucible 110.
  • the heating source 120 includes a barrel structure 112 and a heating electric heating wire 122 wound around an inner wall of the barrel structure 112, the crucible 110 being located inside the barrel structure 112.
  • the barrel structure 112 can be made of metal.
  • the material to be heated is placed in the crucible 110, and the crucible 110 is heated by the heating wire.
  • the lower portion of the crucible 110 is provided with a heat insulating pad 132.
  • the heat insulating pad 132 is located between the bottom wall of the accommodating portion 104 to be described later and the bottom wall of the tub structure 112.
  • the insulating pad 132 can be a metal layer or a heat insulating layer to prevent heat loss. Based on this configuration, the heating electric wire 122 is energized and the crucible 110 is heated, and when it reaches a certain temperature, the material in the crucible 110 evaporates.
  • the winding density of the heating heating wire 122 is different in the vertical direction.
  • reference numeral 124 denotes a heating electric heating wire located at the center in which the winding density is dense in the vertical direction.
  • Reference numeral 126 denotes a heating electric heating wire located at a lower portion in which the winding density is sparse in the vertical direction.
  • the crucible 110 has a housing portion 104 and an outlet portion.
  • the receiving portion 104 is in communication with the outlet portion.
  • the outlet portion may have an air outlet 102 or a plurality of air outlets.
  • the outlet portion has a plurality of air outlets, and the plurality of air outlets are arranged in a straight line or a planar shape.
  • the agitation mechanism 200 includes a stirring fan 300 and a driving source 202 that drives the rotation of the stirring fan 300, as shown in Figs.
  • the driving source 202 is a motor.
  • the drive source 202 is dynamically coupled to the mounting shaft 206 of the agitating fan 300 via a bearing 204.
  • the germanium device is the germanium device described above.
  • the crucible device can be used as an evaporation heating source structure.
  • the material evaporates until it is consumed, and the amount of material placed is determined by the capacity of the crucible.
  • the crucible apparatus of this embodiment can effectively achieve a uniform and suitable temperature for the material in the crucible having a large diameter.
  • the diameter of the crucible can be increased correspondingly to increase the capacity, the number of times of material filling is reduced, and the number of cavities is reduced.
  • the liquid level of the material is almost flat.
  • the temperature of the material is determined by the distance from the crucible wall. Although there is thermal cycling, the viscosity of the liquid material is higher, resulting in a difference in the temperature of the material at different locations. The temperature of the material near the crucible is higher, and the material away from the crucible is higher. The temperature is lower, and the specific temperature difference value is related to the material heat transfer coefficient.
  • the agitating mechanism 200 does not operate when the material is not fully liquid when the helium device is in operation. After all the material in the crucible 110 has melted, the agitation is turned on until the material is consumed below the warning line.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明公开了一种坩埚设备及其在液晶面板生产中的应用。所述坩埚设备包括加热源、坩埚以及搅拌机构。所述加热源用于对所述坩埚内的材料进行加热，所述搅拌机构用于对所述坩埚内的材料进行搅拌。本发明的坩埚设备可以通过搅拌机构使坩埚内材料受热均匀。

Description

一种坩埚设备及其在液晶面板生产中的应用 技术领域
本发明涉及一种坩埚设备。 背暈技术
目前常使用的加热源与坩埚相靠近，将热传导至材料，使材料升温蒸发。 若 坩埚较粗，导热性不良的材料会出说现远离坩埚壁处温度低，靠近坩埚壁处温度高 的现象。 用这种坩埚设备进行蒸镀时，容易出现受热不均的问题。 发明内容 书
本发明的目的在于，提供一种坩埚设备，其可以使坩埚内材料受热均勻。 本发明通过如下技术方案实现：一种坩埚设备，其中，所述坩埚设备包括加 热源、 坩埚以及搅拌机构，所述加热源用于对所述坩埚内的材料进行加热，所述 搅拌机构用于对所述坩埚内的材料进行搅拌。
作为上述技术方案的进一步改进，所述加热源包括桶状结构以及缠绕在所述 桶状结构的内壁上的加热电热丝。
作为上述技术方案的进一步改进，所述坩埚位于所述桶状结构内部。
作为上述技术方案的进一步改进，所述加热电热丝的缠绕密度在竖直方向上 不同。
作为上述技术方案的进一步改进，所述坩埚的下部设置有隔热垫。
作为上述技术方案的进一步改进，所述坩埚具有容纳部及出口部，所述容纳 部与所述出口部连通。
作为上述技术方案的进一步改进，所述出口部具有一个出气口或多个出气口。 作为上述技术方案的进一步改进，所述出口部具有多个出气口 ，且所述多个 出气口排列成一条直线状或面状。
作为上述技术方案的进一步改进，所述搅拌机构包括搅拌扇以及驱动所述搅 拌扇旋转的驱动源。
作为上述技术方案的进一步改进，所述驱动源为马达。 作为上述技术方案的进一步改进，所述驱动源通过轴承与所述搅拌扇动力连 接。
根据本发明的另一方面，还提供了一种坩埚设备在液晶面板生产中的应用 ， 其中，所述坩埚设备为上述的坩埚设备。
本发明的有益效果是：本发明的坩埚设备包括加热源、 坩埚以及搅拌机构， 所述加热源用于对所述坩埚内的材料进行加热，所述搅拌机构用于对所述坩埚内 的材料进行搅拌，可以使坩埚内材料受热均勻。
附图说明
图 1是根据本发明的一个具体实施例的坩埚设备的结构示意图 ；
图 2是根据本发明的一个具体实施例的坩埚设备的搅拌机构的结构示意图 ； 图 3是用于说明搅拌机构未工作时的材料液面为平面的示意图 ；
图 4是用于说明搅拌机构工作时的材料液面为曲面的示意图。 具体实施方式
以下结合附图对本发明的具体实施方式进行进一步的说明。
如图 1所示，本实施例的坩埚设备包括加热源 120、 坩埚 110以及搅拌机构 200。 其中，所述加热源 120用于对所述坩埚 110内的材料进行加热，所述搅拌机 构 200用于对所述坩埚 110内的材料进行搅拌。
所述加热源 120包括桶状结构 112以及缠绕在所述桶状结构 112的内壁上的加 热电热丝 122 ,所述坩埚 110位于所述桶状结构 112内部。 其中，桶状结构 112可 以采用金属材质。这样，将需要加热的材料装在坩埚 110内，坩埚 110由电热丝加 热。所述坩埚 110的下部设置有隔热垫 132。如图 1所示，隔热垫 132位于后述容 纳部 104的底壁与桶状结构 112的底壁之间。 隔热垫 132可以为金属层或绝热层， 防止热量散失。 基于这种结构，加热电热丝 122通电升温，坩埚 110被加热，到 达一定温度时，坩埚 110内的材料会蒸发。
其中，所述加热电热丝 122的缠绕密度在竖直方向上不同。 其中，如图 1所 示，标号 124表示缠绕密度在竖直方向上较密集的位于中部的加热电热丝。 标号 126表示缠绕密度在竖直方向上较稀疏的位于下部的加热电热丝。
所述坩埚 110具有容纳部 104及出口部。 所述容纳部 104与所述出口部连通。 其中，所述出口部可以具有一个出气口 102或多个出气口。 在某些实施例中，所 述出口部具有多个出气口 ，且所述多个出气口排列成一条直线状或面状。
在本实施例的坩埚设备中，所述搅拌机构 200包括搅拌扇 300以及驱动所述 搅拌扇 300旋转的驱动源 202，如图 1和图 2所示。其中，所述驱动源 202为马达。 而且，所述驱动源 202通过轴承 204与所述搅拌扇 300的安装轴 206动力连接。
根据本发明的另一方面，还提供了一种坩埚设备在液晶面板生产中的应用 ， 其中，所述坩埚设备为上述的坩埚设备。 该坩埚设备可以用作蒸镀加热源结构。
使用该坩埚设备进行加热时，材料会蒸发直至消耗完毕，材料的放置量由坩 埚的容量决定。
本实施例的坩埚设备，可以有效的使直径大的坩埚内的材料达到均勻的适合 的温度。 用本实施例的坩埚设备，可以相应增加坩埚的直径，达到增加容量的作 用 ，减少材料填充的次数，减少开腔次数。
如图 3所示，当坩埚内无外力作用时，材料的液面几乎是平的。 材料的温度 决定于距坩埚壁的距离，虽有热循环，但是因液态材料的粘滞系数较高，导致不 同位置材料的温度有差异；靠近坩埚壁的材料温度较高，远离坩埚壁的材料温度 较低，具体温差数值与材料热传导系数有关。
如图 4所示，在搅拌机构 200的作用下，材料间导热不再只依靠热循环，不 同位置间的材料温差大大减小；因离心力使液面呈曲面，增加蒸发面，可以提高 蒸镀速率。
在本发明的另一些实施例中，在坩埚设备工作时，搅拌机构 200在材料未全 部变成液态时不工作。 当坩埚 110 内的材料全部融化以后，搅拌开启，直至材料 消耗至警戒线以下。
以上具体实施方式对本发明进行了详细的说明，但这些并非构成对本发明的 限制。 本发明的保护范围并不以上述实施方式为限，但凡本领域普通技术人员根 据本发明所掲示内容所作的等效修饰或变化，皆应纳入权利要求书中记载的保护 范围内。

Claims

权 利 要 求 书
1、 一种坩埚设备，其中，所述坩埚设备包括加热源、 坩埚以及搅拌机构所述 加热源用于对所述坩埚内的材料进行加热，所述搅拌机构用于对所述坩埚内的材 料进行搅拌。
2、 根据权利要求 1所述的坩埚设备，其中，所述加热源包括桶状结构以及缠 绕在所述桶状结构的内壁上的加热电热丝。
3、根据权利要求 2所述的坩埚设备，其中，所述坩埚位于所述桶状结构内部。
4、 根据权利要求 2所述的坩埚设备 其中，所述加热电热丝的缠绕密度在竖 直方向上不同。
5、 根据权利要求 1所述的坩埚设备 ,其中，所述坩埚的下部设置有隔热垫。
6、 根据权利要求 1所述的坩埚设备，其中，所述坩埚具有容纳部及出口部， 所述容纳部与所述出口部连通。
7、 根据权利要求 6所述的坩埚设备 ,其中，所述出口部具有一个出气口或多 个出气口。
8、 根据权利要求 7所述的坩埚设备 ,其中，所述出口部具有多个出气口 ，且 所述多个出气口排列成一条直线状或面状。
9、 根据权利要求 1所述的坩埚设备，其中，所述搅拌机构包括搅拌扇以及驱 动所述搅拌扇旋转的驱动源。
10、 根据权利要求 9所述的坩埚设备，其中，所述驱动源为马达。
11、 根据权利要求 10所述的坩埚设备，其中，所述驱动源通过轴承与所述搅 拌扇动力连接。
12、 一种坩埚设备在液晶面板生产中的应用 ，其中 ，所述坩埚设备为权利要 求 1所述的坩埚设备。
PCT/CN2014/075117 2013-12-31 2014-04-10 一种坩埚设备及其在液晶面板生产中的应用 Ceased WO2015100877A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US14/647,105 US20160310921A1 (en) 2013-12-31 2014-04-10 Crucible device and the use of the crucible device in lcd panel productions

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201310754053.8 2013-12-31
CN201310754053.8A CN103757591B (zh) 2013-12-31 2013-12-31 一种坩埚设备及其在液晶面板生产中的应用

Publications (1)

Publication Number Publication Date
WO2015100877A1 true WO2015100877A1 (zh) 2015-07-09

Family

ID=50524905

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2014/075117 Ceased WO2015100877A1 (zh) 2013-12-31 2014-04-10 一种坩埚设备及其在液晶面板生产中的应用

Country Status (3)

Country Link
US (1) US20160310921A1 (zh)
CN (1) CN103757591B (zh)
WO (1) WO2015100877A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104947042B (zh) * 2015-05-25 2017-09-29 京东方科技集团股份有限公司 一种蒸发装置
CN106626209A (zh) * 2016-12-30 2017-05-10 苏州恒昇海绵机械制造有限公司 一种带真空搅拌装置的海绵发泡机
CN107190237A (zh) * 2017-06-26 2017-09-22 深圳市华星光电技术有限公司 蒸发源加热系统
CN109289600A (zh) * 2018-09-12 2019-02-01 东莞理工学院 一种高度集成化的多功能搅拌机
AU2021200246A1 (en) 2020-01-31 2021-08-19 Howmedica Osteonics Corp. Injection molding feedstock delivery system
CN111809150B (zh) * 2020-07-27 2025-01-14 福建华佳彩有限公司 一种搅拌蒸发源

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05295461A (ja) * 1992-04-17 1993-11-09 Nippon Light Metal Co Ltd アルミニウム精製方法及び装置
CN202246836U (zh) * 2011-07-22 2012-05-30 上海奕瑞光电子科技有限公司 电阻加热式蒸发源
CN202336310U (zh) * 2011-09-27 2012-07-18 唐山海泰新能科技有限公司 一种用于坩埚的搅拌器和搅拌系统
CN102794432A (zh) * 2012-07-24 2012-11-28 江苏万里活塞轴瓦有限公司 铝合金半固态浆料制备装置
TW201247535A (en) * 2011-02-25 2012-12-01 Evonik Degussa Gmbh Method of purifying silicon
CN102861524A (zh) * 2012-10-12 2013-01-09 天津修船技术研究所 坩埚搅拌装置

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL142820C (zh) * 1940-08-27
US3141656A (en) * 1960-02-17 1964-07-21 American Enka Corp Viscose dissolver
US3663192A (en) * 1969-11-28 1972-05-16 Johns Manville Glass melting pot
US4007325A (en) * 1975-08-13 1977-02-08 National Forge Company Furnace assembly
GB9411489D0 (en) * 1994-06-08 1994-07-27 Morgan Crucible Co Furnace lining
IT1288891B1 (it) * 1996-04-30 1998-09-25 Danieli Off Mecc Sistema di raffreddamento della volta per forni elettrici ad arco
US6283908B1 (en) * 2000-05-04 2001-09-04 Radioactive Isolation Consortium, Llc Vitrification of waste with conitnuous filling and sequential melting
KR100889758B1 (ko) * 2002-09-03 2009-03-20 삼성모바일디스플레이주식회사 유기박막 형성장치의 가열용기
US6800110B2 (en) * 2002-09-23 2004-10-05 Stuart Biddulph System for producing noble metals
US6837610B2 (en) * 2002-09-27 2005-01-04 Ilc Dover Lpp Bioprocess container, bioprocess container mixing device and method of use thereof
JP2004296201A (ja) * 2003-03-26 2004-10-21 Tohoku Pioneer Corp 蒸着源、蒸着装置、有機ｅｌ素子、有機ｅｌ素子の製造方法
MXPA06011837A (es) * 2004-04-27 2007-01-16 Baxter Int Sistema de reactor de tanque agitado.
US7304715B2 (en) * 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
GB2425447B (en) * 2005-04-21 2008-09-10 Lmk Thermosafe Ltd Heating apparatus
US7556089B2 (en) * 2006-03-31 2009-07-07 Coolit Systems, Inc. Liquid cooled thermosiphon with condenser coil running in and out of liquid refrigerant
JP5248826B2 (ja) * 2006-09-22 2013-07-31 東京エレクトロン株式会社 熱処理炉及びその製造方法
US8042498B2 (en) * 2006-12-13 2011-10-25 Dai-Ichi High Frequency Co., Ltd. Superheated steam generator
JP2008285719A (ja) * 2007-05-17 2008-11-27 Fujifilm Corp 真空蒸着方法
JP5467774B2 (ja) * 2008-03-24 2014-04-09 株式会社神戸製鋼所 タイヤ加硫機
DE102008041104A1 (de) * 2008-08-07 2010-02-11 Maschinenfabrik Gustav Eirich Gmbh & Co. Kg Mischvorrichtung mit Induktionsheizung
US20100080078A1 (en) * 2008-09-29 2010-04-01 Martin Herbert Goller Method and apparatus for homogenizing a glass melt
EP3240362A1 (en) * 2010-06-18 2017-11-01 Electrolux Home Products Corporation N.V. Induction coil assembly
KR101732023B1 (ko) * 2010-12-23 2017-05-02 삼성전자주식회사 반도체 장치의 형성 방법
WO2012128603A1 (fr) * 2011-03-22 2012-09-27 Aouad Salah Mohammed Dispositif automatique et procede de preparation de solutions
US20120286623A1 (en) * 2011-05-09 2012-11-15 Sefe, Inc. Atmospheric Energy Collection
CN102268642A (zh) * 2011-07-22 2011-12-07 上海奕瑞光电子科技有限公司 电阻加热式蒸发源
US8635858B2 (en) * 2011-10-25 2014-01-28 Ford Global Technologies, Llc Fluid-spray atomizer

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05295461A (ja) * 1992-04-17 1993-11-09 Nippon Light Metal Co Ltd アルミニウム精製方法及び装置
TW201247535A (en) * 2011-02-25 2012-12-01 Evonik Degussa Gmbh Method of purifying silicon
CN202246836U (zh) * 2011-07-22 2012-05-30 上海奕瑞光电子科技有限公司 电阻加热式蒸发源
CN202336310U (zh) * 2011-09-27 2012-07-18 唐山海泰新能科技有限公司 一种用于坩埚的搅拌器和搅拌系统
CN102794432A (zh) * 2012-07-24 2012-11-28 江苏万里活塞轴瓦有限公司 铝合金半固态浆料制备装置
CN102861524A (zh) * 2012-10-12 2013-01-09 天津修船技术研究所 坩埚搅拌装置

Also Published As

Publication number Publication date
CN103757591B (zh) 2016-03-30
CN103757591A (zh) 2014-04-30
US20160310921A1 (en) 2016-10-27

Similar Documents

Publication Publication Date Title
WO2015100877A1 (zh) 一种坩埚设备及其在液晶面板生产中的应用
CN204746778U (zh) 涂层烘干装置
CN203120929U (zh) 罗汉果真空微波干燥装置
US20210339430A1 (en) Drying oven for three-dimensional (3d) printing materials
JP2017538413A (ja) アイスクリーム製造器およびアイスクリーム製造器用熱交換装置
CN106765472B (zh) 一种石墨烯碳晶掺杂的分布式太阳能取暖器
CN103361612A (zh) 圆柱磁控溅射靶
CN204578954U (zh) 一种改进型无刷电机控制器的散热机构
CN221752300U (zh) 一种蜂蜜加工蒸发设备
CN105413526A (zh) 一种加工蓄冷剂用节能型搅拌装置
CN105486054B (zh) 丸剂螺旋干燥设备
CN206670313U (zh) 一种烘箱的红外线加热装置
CN204724103U (zh) 一种可快速搅拌均匀的搅拌釜
CN103789733B (zh) 可任意角度安装使用的真空蒸发源
CN210159228U (zh) 一种化工多级蒸馏塔
CN108642469A (zh) 柔性产品卷绕式真空镀膜设备
CN204261647U (zh) 电磁溶解槽
CN210905860U (zh) 一种储能调温纤维加工用配料装置
CN207727139U (zh) 一种磁控溅射镀膜用加热装置
CN215121247U (zh) 一种低损耗smms纺粘设备的电磁加热设备
CN219572296U (zh) 一种光纤预制棒管道原料温度控制装置
JP2007093178A (ja) 乾燥装置
CN222139240U (zh) 一种蒸镀加热冷却系统及蒸镀设备
CN201751428U (zh) 具有加热罩的真空蒸镀装置
CN211792089U (zh) 一种双泡法吹膜机双重加热装置

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 14647105

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14876391

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 14876391

Country of ref document: EP

Kind code of ref document: A1