WO2015019819A1 - Composition de résine colorante photosensible, film durci, filtre coloré, procédé de fabrication de filtre coloré, élément d'imagerie à semi-conducteurs et dispositif d'affichage d'image - Google Patents

Composition de résine colorante photosensible, film durci, filtre coloré, procédé de fabrication de filtre coloré, élément d'imagerie à semi-conducteurs et dispositif d'affichage d'image Download PDF

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WO2015019819A1
WO2015019819A1 PCT/JP2014/069023 JP2014069023W WO2015019819A1 WO 2015019819 A1 WO2015019819 A1 WO 2015019819A1 JP 2014069023 W JP2014069023 W JP 2014069023W WO 2015019819 A1 WO2015019819 A1 WO 2015019819A1
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group
carbon atoms
substituent
general formula
resin composition
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PCT/JP2014/069023
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English (en)
Japanese (ja)
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陽祐 村上
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富士フイルム株式会社
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B29/00—Monoazo dyes prepared by diazotising and coupling
    • C09B29/32—Monoazo dyes prepared by diazotising and coupling from coupling components containing a reactive methylene group
    • C09B29/33—Aceto- or benzoylacetylarylides
    • C09B29/335—Aceto- or benzoylacetylarylides free of acid groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments

Definitions

  • the present invention relates to a colored photosensitive resin composition suitable for producing a color filter used for a liquid crystal display element (LCD), a solid-state imaging element (CCD, CMOS, etc.), and a colored region produced by the composition.
  • the present invention relates to a color filter having a color filter, a solid-state imaging device having the color filter, and an image display device such as an organic LED liquid crystal display device.
  • a pigment is generally used.
  • the coloring compositions described in Patent Documents 1 to 3 are disclosed.
  • the crosstalk (mixture of light) is reduced by making the color filter thinner, but it is required to make the film thinner while maintaining the spectral shape, so it is required to greatly increase the pigment concentration in the solid content. It is done.
  • the content of components necessary for lithography is relatively small, and pattern formation tends to be difficult.
  • the present invention solves such a problem, and it is possible to obtain a good dispersion with a small amount of a dispersing agent, and good lithography (resolution), pattern linearity, and the same color pixels between patterns.
  • the present invention relates to a colored photosensitive resin composition excellent in stability and luminance unevenness, a cured film, a color filter, a method for producing a color filter, a solid-state imaging device, and an image display device using the colored photosensitive resin composition.
  • the present inventors have found that the above-described problems can be solved by using a predetermined pigment and a predetermined dye derivative. Specifically, the above-mentioned problem has been solved by the following means ⁇ 1>, preferably ⁇ 2> to ⁇ 15>.
  • Photosensitive resin composition a zinc halide phthalocyanine pigment, (B-1) a dye derivative represented by the following general formula (I) and / or (B-2) a dye derivative represented by the following general formula (II),
  • Coloring containing C) a dispersant, (D) a photopolymerization initiator, and (E) a polymerizable compound, wherein the content of (C) the dispersant is 20 to 40 parts by mass with respect to 100 parts by mass of the pigment.
  • Photosensitive resin composition
  • Dye represents an n-valent organic dye residue
  • X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 —, or —CH 2 NHCOCH 2 NH—Y 2 —.
  • Y 2 represents an optionally substituted alkylene group or arylene group
  • Y 1 represents —NH— or —O—
  • Z represents a hydroxyl group when n represents 1
  • n represents an integer of 2 to 4 hydroxyl case each represent an alkoxy group or a group of the following formula (III)
  • R 1 or R 2 are each represents an alkyl group optionally having a substituent
  • R 1 and R 2 May combine with each other to form a heterocycle containing a nitrogen atom.
  • m represents an integer of 1 to 6
  • n represents an integer of 1 to 4.
  • n 2 or more, the plurality of X, Y 1 , R 1 , and R 2 may be the same or different.
  • Y 3 represents —NH— or —O—.
  • R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 may be bonded to each other to form a heterocyclic ring containing a nitrogen atom.
  • m represents an integer of 1 to 6.
  • Dye represents an optionally substituted quinophthalone residue
  • X 1 represents —NR′SO 2 —, —SO 2 NR′—, —CONR′—, —CH 2 NR′COCH 2 NR′— or —NR′CO—
  • X 2 may have a substituent, an arylene group having 6 to 20 carbon atoms, or a substituent Represents a heteroaromatic group having 4 to 20 carbon atoms, and these groups are bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO—. May be.
  • X 3 represents —NR′— or —O—.
  • R ′ has a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or a substituent. And an aryl group having 6 to 20 carbon atoms which may be present.
  • a and B are each a group represented by the following general formula (1), a group represented by the following general formula (2), —O— (CH 2 ) n —R 8 , —OR 9 , —NR 10 R 11 represents a group selected from —Cl, —F and —X 3 —X 2 —X 1 —Dye, R 8 represents an optionally substituted nitrogen-containing heterocyclic residue, R 9 , R 10 R 11 represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or a substituent.
  • a and B is a group represented by the following general formula (1), a group represented by the following general formula (2), —O— (CH 2 ) n—R 8 , —OR 9 or — NR 10 R 11 and t represents an integer of 1 to 3.
  • t is 2 or more, the plurality of X 1 , X 2 , X 3 , A, and B may be the same or different.
  • Y 1 represents —NR′— or —O—
  • Y 2 represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, or a substituent.
  • an alkenylene group having 2 to 20 carbon atoms or an arylene group having 6 to 20 carbon atoms which may have a substituent and these groups are represented by —NR′—, —O—, —SO They may be bonded to each other through a divalent linking group selected from 2- and -CO-.
  • R ′ has a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or a substituent.
  • an aryl group having 6 to 20 carbon atoms which may be present
  • R 1 and R 2 each represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent.
  • R 1 and R 2 may be combined to form a heterocyclic structure, and the heterocyclic structure may contain a further nitrogen atom, oxygen atom or sulfur atom, or may have a substituent.
  • Z 1 is a single bond connecting a triazine ring and a nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ′′ —, —NR′—G —SO 2 —, —NR′—G—SO 2 NR ′′ —, —O—G—CO—, —O—G—CONR′—, —O—G—SO 2 — or —O—G—SO 2 represents NR′—, G represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent or a substituent.
  • R ′ and R ′′ are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or a substituted group.
  • R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent.
  • the yellow pigment is C.I. I. Pigment yellow 150 and / or C.I. I.
  • the colored photosensitive resin composition according to ⁇ 2> which is CI Pigment Yellow 185.
  • the dispersant is obtained by reacting the hydroxyl group of a vinyl polymer having a hydroxyl group at one end with a tricarboxylic acid anhydride or tetracarboxylic dianhydride, according to ⁇ 1> to ⁇ 3>
  • the colored photosensitive resin composition in any one.
  • Dye in the general formula (I) has a monoazo dye structure having a benzimidazolone skeleton.
  • each of R ′ and R ′′ is a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted alkenyl group having 2 to 20 carbon atoms.
  • a and B represent a group represented by the general formula (1) or a group represented by the general formula (2), and are the same group, ⁇ 1> The colored photosensitive resin composition according to any one of to ⁇ 6>. ⁇ 8> (A) The zinc halide phthalocyanine pigment is C.I. I. The colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 7>, which is CI Pigment Green 58.
  • ⁇ 9> The colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 8>, wherein the total amount of the colorant relative to the total solid content in the composition is 40% by mass or more.
  • ⁇ 10> The colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 9>, which is used for forming a colored region of a color filter.
  • ⁇ 11> A cured film obtained by curing the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 10>.
  • ⁇ 12> A step of applying the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 10> on a support to form a colored photosensitive resin composition layer, and a colored photosensitive resin composition layer
  • a method for producing a color filter which comprises a step of exposing the substrate to a pattern and a step of developing and removing unexposed portions to form a colored pattern.
  • ⁇ 13> A step of applying the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 10> on a support to form a colored photosensitive resin composition layer and curing to form a colored layer , Forming a photoresist layer on the colored layer;
  • a method for producing a color filter comprising: a step of patterning a photoresist layer by exposure and development to obtain a resist pattern; and a step of dry etching a colored layer using the resist pattern as an etching mask.
  • ⁇ 15> A solid-state imaging device or an image display device having the color filter according to ⁇ 14>.
  • the present invention since a good dispersion can be obtained even if the content of the dispersant is small, excellent lithography (resolution), pattern linearity, stability between pixels of the same color in the pattern, and luminance unevenness are excellent. It has become possible to provide a colored photosensitive resin composition, a cured film, a color filter, a method for producing a color filter, a solid-state imaging device, and an image display device using the colored photosensitive resin composition.
  • the organic EL element in the present invention refers to an organic electroluminescence element.
  • the total solid content refers to the total mass of components excluding the solvent from the total composition of the colored photosensitive resin composition.
  • the description which does not describe substitution and unsubstituted includes the thing which has a substituent with the thing which does not have a substituent.
  • the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • “radiation” in the present specification means, for example, an emission line spectrum of a mercury lamp, far ultraviolet rays represented by excimer laser, extreme ultraviolet rays (EUV light), X-rays, electron beams, and the like. In the present invention, light means actinic rays or radiation.
  • exposure in this specification is not only exposure with far-ultraviolet rays such as mercury lamps and excimer lasers, X-rays, EUV light, but also drawing with particle beams such as electron beams and ion beams. Are also included in the exposure.
  • (meth) acrylate represents both and / or acrylate and methacrylate
  • (meth) acryl represents both and / or acryl and “(meth) acrylic”
  • "Acryloyl” represents both and / or acryloyl and methacryloyl.
  • “monomer” and “monomer” are synonymous.
  • the monomer in this specification is distinguished from an oligomer and a polymer, and refers to a compound having a weight average molecular weight of 2,000 or less.
  • the polymerizable compound means a compound having a polymerizable functional group, and may be a monomer or a polymer.
  • the polymerizable functional group refers to a group that participates in a polymerization reaction.
  • a weight average molecular weight and a number average molecular weight are defined as a polystyrene conversion value by GPC measurement.
  • the weight average molecular weight (Mw) and the number average molecular weight (Mn) are, for example, HLC-8220 (manufactured by Tosoh Corporation), and TSKgel Super AWM-H (manufactured by Tosoh Corporation, 6) as a column.
  • 0.0 mm ID ⁇ 15.0 cm can be determined by using a 10 mmol / L lithium bromide NMP (N-methylpyrrolidinone) solution as the eluent.
  • Me in the chemical formula represents a methyl group
  • Et represents an ethyl group
  • Pr represents a propyl group
  • Bu represents a butyl group
  • Ph represents a phenyl group
  • process is not limited to an independent process, and is included in the term if the intended action of the process is achieved even when it cannot be clearly distinguished from other processes. .
  • This invention is made
  • composition of the present invention Colored photosensitive resin composition of the present invention (hereinafter sometimes referred to as “composition of the present invention” or “colored composition”)
  • A a zinc halide phthalocyanine pigment
  • B-1 a dye derivative represented by the general formula (I) and / or
  • B-2) a dye derivative represented by the general formula (II)
  • C a dispersant
  • D a photopolymerization initiator
  • E a polymerizable compound
  • content of (C) the dispersant is: 20 to 40 parts by mass with respect to 100 parts by mass of the total amount of pigment.
  • composition of the present invention By using the composition of the present invention, a good dispersion can be obtained even if the content of the dispersant is reduced to 20 to 40 parts by mass with respect to 100 parts by mass of the pigment. In addition, pattern linearity, stability between pixels of the same color in the pattern, and luminance unevenness are improved. The reason why the effects of the present invention can be obtained is not clear, but depends on the fact that the planarity of the molecular structure of the halogenated zinc phthalocyanine used as the pigment is higher than that of non-halogenated phthalocyanine, copper phthalocyanine, etc. It is thought that there is.
  • the pigment can be dispersed even with a small amount of the dispersant because the higher the planarity of the molecule is more easily adsorbed when the dispersant is dispersed by the interaction.
  • the (B) dye derivative used in the present invention has a triazine structure, and the triazine structure strongly adsorbs to a compound having high planarity. Therefore, the zinc halide phthalocyanine having high planarity depends on the dye derivative. It is strongly adsorbed. As a result, it is presumed that a very good dispersion with a low content of dispersant can be obtained.
  • the composition of the present invention will be described in detail.
  • the present invention includes (A) a zinc halide phthalocyanine pigment.
  • the substituents substituted on the phthalocyanine skeleton are only halogen atoms, and a total of at least two halogen atoms are bonded per phthalocyanine molecule (structure) in a maximum of 16 pieces. It is a structural pigment.
  • the halogen atom preferably contains at least one of a fluorine atom, a chlorine atom and a bromine atom, more preferably a chlorine atom and / or a bromine atom, and further preferably contains both a chlorine atom and a bromine atom.
  • X 1 to X 16 each represent a chlorine atom, a bromine atom or a hydrogen atom, and at least two of X 1 to X 16 are a chlorine atom or a bromine atom.
  • the hue of the halogenated zinc phthalocyanine pigment changes from blue to green.
  • the halogen atom bonded to the molecule has 8 or more bromine atoms, and among them, having 12 or more bromine atoms is more yellowish. It is more preferable in terms of developing a high green color. It is preferable that more bromine atoms are contained than chlorine atoms in order to obtain a more yellowish green color.
  • the number of bromine atoms substituted is more preferably 10 to 14. Further, among X 1 to X 16 , two or less of those taking a hydrogen atom are preferable.
  • the zinc halide phthalocyanine pigment used in the present invention is preferably a zinc halide phthalocyanine having an average primary particle diameter of 0.01 to 0.30 ⁇ m.
  • the average particle diameter of the primary particles of the pigment in the present invention is a value measured by the following method.
  • the average primary particle diameter in the present invention is the longer one of 100 primary particles of a zinc halide phthalocyanine pigment constituting an aggregate on a two-dimensional image obtained by photographing particles in the field of view with a transmission electron microscope. The average value of the diameter (major axis) and the shorter diameter (minor axis) is obtained and averaged.
  • the composition of the present invention only one kind of zinc halide phthalocyanine pigment may be used, or a plurality of kinds may be used in combination.
  • a plurality of types of polyhalogenated zinc phthalocyanine pigments having a specific halogen atom composition each having a different number of substitutions of halogen atoms selected from bromine atoms and chlorine atoms, are contained in a specific ratio. It may be a thing.
  • Preferable embodiments include a combination of a polyhalogenated zinc phthalocyanine pigment containing 16 bromine atoms and a polyhalogenated zinc phthalocyanine pigment containing 15 bromine atoms and one chlorine atom.
  • the ratio of the two is preferably in the range of 80:20 to 100: 0.
  • the average composition of the (A) zinc halide phthalocyanine pigment contained in the curable composition of the present invention is determined by mass spectrometry based on mass spectroscopy and halogen content analysis by flask combustion ion chromatography, Similarly, the mole% of each specific zinc halide phthalocyanine pigment contained in the pigment composition can be easily determined by analyzing the results of mass spectrometry.
  • the zinc halide phthalocyanine pigment that can be suitably used in the present invention can be produced by the method described in JP-A-2007-320986 and JP-A-2008-19383.
  • halogenated zinc phthalocyanine pigment C.I. I. And CI Pigment Green 58.
  • the amount of the zinc halide phthalocyanine pigment in the composition of the present invention is preferably 20 to 100% by mass of the total pigment component, more preferably 30 to 90% by mass, and 40 to 80% by mass. Is more preferable.
  • the composition of the present invention may contain a pigment other than the halogenated zinc phthalocyanine pigment. Specifically, those described in JP-A-2012-219106, paragraphs 0046 to 0052 can be adopted, and the contents thereof are incorporated in the present specification. In the present invention, a yellow pigment is preferred. Other pigments may be used alone or in combination of two or more.
  • organic pigments examples include azo pigments, azomethine pigments, isoindoline pigments, and quinophthalone pigments. Of these, azo pigments and isoindoline pigments are preferred for the reason of dispersion stability.
  • C.I. I. Pigment yellow 150 (azo pigment)
  • C.I. I. Pigment Yellow 139,185 isoindoline pigment
  • the other pigment used in the present invention preferably has one or two ring structures in the molecule constituting the other pigment.
  • the condensed ring has one ring structure as a whole. Since pigments having one or two ring structures have a smaller intermolecular interaction direction than pigments having three or more ring structures, it is considered that the pigments can be easily released during dispersion (particulate formation). In addition, when the number of particles increases due to the dissolution of the pigment, adsorption to the halogenated zinc phthalocyanine pigment is likely to occur. Presumably effective in viscosity stability (inhibition of thickening).
  • the pigment having one or two ring structures in the molecule constituting the pigment is preferably a yellow pigment. I. Pigment yellow 150, C.I. I. Pigment Yellow 185 is more preferable.
  • composition of the present invention may contain (A) a known dye other than the pigment.
  • A a known dye other than the pigment.
  • a known dye other than the pigment for example, JP-A-64-90403, JP-A-64-91102, JP-A-1-94301, JP-A-6-11614, Tokuho 2592207, U.S. Pat. No. 4,808,501, U.S. Pat. No. 5, U.S. Pat. No. 505950, JP-A-5-333207, JP-A-6-35183, JP-A-6-51115, JP-A-6-194828, etc. Can be used.
  • the chemical structure includes pyrazole azo, pyromethene, anilinoazo, triphenylmethane, anthraquinone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, etc.
  • Dyes can be used.
  • a dye multimer may be used as the dye. Examples of the dye multimer include compounds described in JP2011-213925A and JP2013-041097A.
  • the content of the pigment in the composition of the present invention is preferably 40% by mass or more based on the total amount of the phthalocyanine pigment and other pigments, excluding the solvent contained in the colored photosensitive resin composition.
  • the amount is preferably 45 to 70% by mass, and more preferably 50 to 65% by mass.
  • the composition of the present invention may contain a dye within a range not departing from the gist of the present invention. When the dye is included, the total of the colorants (dye and pigment) is preferably within the above range. Only one kind of pigment may be contained in the composition of the present invention, or two or more kinds thereof may be contained. When two or more types are included, the total amount is preferably within the above range.
  • the composition of the present invention comprises (B-1) a dye derivative represented by the general formula (I) and / or (B-2) a dye derivative represented by the general formula (II) as the dye derivative (B). Including.
  • (B-1) the dye derivative represented by the general formula (I) and (B-2) the dye derivative represented by the general formula (II) will be described.
  • Dye represents an n-valent organic dye residue
  • X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 —, or —CH 2 NHCOCH 2 NH—Y 2 —.
  • Y 2 represents an optionally substituted alkylene group or arylene group
  • Y 1 represents —NH— or —O—
  • Z represents a hydroxyl group when n represents 1
  • n represents an integer of 2 to 4 hydroxyl case each represent an alkoxy group or a group of the following formula (III)
  • R 1 or R 2 are each represents an alkyl group optionally having a substituent
  • R 1 and R 2 May combine with each other to form a heterocycle containing a nitrogen atom.
  • m represents an integer of 1 to 6
  • n represents an integer of 1 to 4.
  • n 2 or more, the plurality of X, Y 1 , R 1 , and R 2 may be the same or different.
  • Y 3 represents —NH— or —O—.
  • R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 may be bonded to each other to form a heterocyclic ring containing a nitrogen atom.
  • m represents an integer of 1 to 6.
  • Dye represents an n-valent organic dye residue.
  • the organic dye residue include a chromogenic group in the pigment as described above, a similar structure, or a partial structure thereof.
  • a skeleton having an azo group a skeleton having a urea structure, a skeleton having an amide structure
  • Examples include a structure containing one or more partial structures selected from a skeleton having a cyclic amide structure, an aromatic ring having a heteroatom-containing 5-membered ring, and an aromatic ring having a heteroatom-containing 6-membered ring, and Dye Is a substituent containing these organic dye residues.
  • the dye preferably has a pigment mother nucleus structure, or a pigment mother nucleus structure and an aromatic ring, a nitrogen-containing aromatic ring, an oxygen-containing aromatic ring, or a sulfur-containing aromatic ring, and the amino group has a pigment mother nucleus structure, an aromatic ring It is bonded directly or through a linking group to any of the ring, nitrogen-containing aromatic ring, oxygen-containing aromatic ring and sulfur-containing aromatic ring.
  • quinoline residue benzimidazolone residue, isoindoline residue, diketopyrrolopyrrole residue, azo residue, phthalocyanine residue, anthraquinone residue, quinacridone residue , Dioxazine residues, perinone residues, perylene residues, thioindigo residues, isoindolinone residues, quinophthalone residues, selenium residues, metal complex residues and the like.
  • organic dye residue represented by Dye include a copper phthalocyanine residue and the following organic dye residues.
  • * represents a binding site with X in the general formula (I).
  • monoazo dyes having a benzimidazolone skeleton are preferable.
  • X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 — or —CH 2 NHCOCH 2 NH—Y 2 —, and preferably a single bond.
  • Y 2 represents an alkylene group or an arylene group which may have a substituent.
  • the alkylene group is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 6 carbon atoms, and still more preferably an alkylene group having 1 to 3 carbon atoms. Specific examples include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, and a hexylene group.
  • the alkylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • the arylene group is preferably an arylene group having 6 to 20 carbon atoms, and more preferably an arylene group having 6 to 10 carbon atoms. Specific examples include a phenylene group, a naphthylene group, and an anthracenylene group.
  • the alkylene group and the arylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • Y 1 represents —NH— or —O—, preferably —NH—.
  • R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 may be bonded to each other to form a heterocyclic ring containing a nitrogen atom.
  • the alkyl group an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable. Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
  • the alkyl group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • R 1 and R 2 preferably represent an alkyl group which may have the same substituent.
  • n represents an integer of 1 to 6, preferably 1 to 4, and more preferably 1 to 3.
  • n represents an integer of 1 to 4, preferably 1 to 3, and more preferably 1 or 2.
  • Z is a hydroxyl group, an alkoxy group, a group represented by the above general formula (III), or —NH—X—Dye (where X is the same as X in the general formula (I)) when n represents 1.
  • n represents an integer of 2 to 4, each represents a hydroxyl group, an alkoxy group, or a group represented by the above general formula (III).
  • Z is preferably a group represented by the above general formula (III) or —NH—X-Dye, and more preferably a group represented by the above general formula (III).
  • Z is preferably a group represented by the above general formula (III).
  • Y 3 represents —NH— or —O—, preferably —NH—.
  • Y 3 preferably represents the same group as Y 1 in formula (I).
  • R 1 and R 2 are in the formula (III), represents an optionally substituted alkyl group has the same meaning as R 1 and R 2 in formula (I), and preferred ranges are also the same .
  • R 1 and R 2 in the general formula (III) preferably represent an alkyl group which may have the same substituent.
  • R ⁇ 1 > and R ⁇ 2 > in general formula (III) represent the alkyl group which may have the same substituent as R ⁇ 1 > and R ⁇ 2 > in general formula (I).
  • M represents an integer of 1 to 6, preferably 1 to 4, and more preferably 1 to 3.
  • m preferably represents the same integer as m in formula (I).
  • Dye represents an optionally substituted quinophthalone residue
  • X 1 represents —NR′SO 2 —, —SO 2 NR′—, —CONR′—, —CH 2 NR′COCH 2 NR′— or —NR′CO—
  • X 2 may have a substituent, an arylene group having 6 to 20 carbon atoms, or a substituent Represents a heteroaromatic group having 4 to 20 carbon atoms, and these groups are bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO—. May be.
  • X 3 represents —NR′— or —O—.
  • R ′ has a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or a substituent. And an aryl group having 6 to 20 carbon atoms which may be present.
  • a and B are each a group represented by the following general formula (1), a group represented by the following general formula (2), —O— (CH 2 ) n —R 8 , —OR 9 , —NR 10 R 11 represents a group selected from —Cl, —F and —X 3 —X 2 —X 1 —Dye, R 8 represents an optionally substituted nitrogen-containing heterocyclic residue, R 9 , R 10 R 11 represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or a substituent.
  • a and B is a group represented by the following general formula (1), a group represented by the following general formula (2), —O— (CH 2 ) n—R 8 , —OR 9 or — NR 10 R 11 and t represents an integer of 1 to 3.
  • t is 2 or more, the plurality of X 1 , X 2 , X 3 , A, and B may be the same or different.
  • Y 1 represents —NR′— or —O—
  • Y 2 represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, or a substituent.
  • an alkenylene group having 2 to 20 carbon atoms or an arylene group having 6 to 20 carbon atoms which may have a substituent and these groups are represented by —NR′—, —O—, —SO They may be bonded to each other through a divalent linking group selected from 2- and -CO-.
  • R ′ has a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or a substituent.
  • an aryl group having 6 to 20 carbon atoms which may be present
  • R 1 and R 2 each represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent.
  • R 1 and R 2 may be combined to form a heterocyclic structure, and the heterocyclic structure may contain a further nitrogen atom, oxygen atom or sulfur atom, or may have a substituent.
  • Z 1 is a single bond connecting a triazine ring and a nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ′′ —, —NR′—G —SO 2 —, —NR′—G—SO 2 NR ′′ —, —O—G—CO—, —O—G—CONR′—, —O—G—SO 2 — or —O—G—SO 2 represents NR′—, G represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent or a substituent.
  • R ′ and R ′′ are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or a substituted group.
  • R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent.
  • Dye represents the quinophthalone residue which may have a substituent.
  • the quinophthalone residue is specifically represented by the following general formula (II-1).
  • D and E each have a substituent formed with a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, or a benzene ring to which D and E are bonded.
  • R ′ and R ′′ is a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted alkenyl group having 2 to 20 carbon atoms.
  • p represents an integer of 0 to 4, and q represents an integer calculated by 4-p.
  • * Represents a binding site with X 1 in the general formula (II).
  • D and E are each a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, an aromatic ring group or a heterocyclic group which may have a substituent formed together with a benzene ring to which D and E are bonded;
  • R ′ and R ′′ are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or a substituted group.
  • An aryl group having 6 to 20 carbon atoms which may have a group.
  • the alkyl group having 1 to 20 carbon atoms an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable.
  • Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
  • the aromatic ring group or the heterocyclic group include a phenyl group, a naphthyl group, a thiophene ring group, a pyridine ring group, and a pyrrole ring group.
  • the aromatic or heterocyclic group represented by D and E the alkyl group having 1 to 20 carbon atoms, the alkenyl group having 2 to 20 carbon atoms and the aryl group having 6 to 20 carbon atoms represented by R ′ and R ′′ are: It may have a substituent, and examples of the substituent include the groups described in the section of the substituent. Among these, it is preferable that D and E are a hydrogen atom and a halogen atom.
  • P represents an integer of 0 to 4, more preferably an integer of 1 to 4, and still more preferably 4.
  • q represents an integer calculated by 4-p, specifically, preferably an integer of 0 to 3, more preferably 2 to 3, and still more preferably 4.
  • the binding site with X 1 in the general formula (II) is not particularly limited, but the 5th or 8th position of the quinoline skeleton in the quinophthalone residue is preferably a binding site, and the 8th position is a binding site. Is more preferable.
  • X 1 is, -NR'SO 2 -, - SO 2 NR '-, - CONR' -, - CH 2 NR'COCH 2 NR'-, or -NR'CO- represent, —NR′SO 2 — is preferred.
  • t is 2 or more, the plurality of X 1 may be the same or different.
  • R ′ in X 1 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, Alternatively, it represents an aryl group having 6 to 20 carbon atoms which may have a substituent, and a hydrogen atom is preferable.
  • the alkyl group having 1 to 20 carbon atoms is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms.
  • Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
  • the alkenyl group having 2 to 20 carbon atoms is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 6 carbon atoms.
  • Specific examples include a vinyl group, a propenyl group, a butenyl group, a pentenyl group, and a hexenyl group.
  • the aryl group having 6 to 20 carbon atoms is preferably an aryl group having 6 to 10 carbon atoms, and specific examples include a phenyl group, a naphthyl group, and an anthracenyl group. These may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • X 2 is an arylene group having 6 to 20 carbon atoms which may have a substituent, or a heteroaromatic ring having 4 to 20 carbon atoms which may have a substituent. And these groups may be bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO— (R ′ represents the above X 1). It is synonymous with R ′ in the middle, and the preferred range is also the same.).
  • R ′ represents the above X 1). It is synonymous with R ′ in the middle, and the preferred range is also the same.).
  • the plurality of X 2 may be the same or different.
  • the arylene group having 6 to 20 carbon atoms is preferably an arylene group having 6 to 10 carbon atoms, and specific examples thereof include a phenylene group, a naphthylene group, and an anthracenylene group.
  • the heteroaromatic group having 4 to 20 carbon atoms is preferably a heteroaromatic group having 4 to 10 carbon atoms, and specific examples include a thiophene ring group, a pyridine ring group, and a pyrrole ring group. These may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • X 3 represents —NR′— or —O—, preferably —NR′—.
  • t is 2 or more, the plurality of X 3 may be the same or different.
  • R ′ has the same meaning as R ′ above, and the preferred range is also the same.
  • a and B are each a group represented by the following general formula (1) or the following general formula (2), -O- (CH 2 ) n -R 8, -OR 9, -NR 10 R 11, - Represents a group selected from Cl, —F or —X 3 —X 2 —X 1 —Dye, and one of A and B is a group represented by the following formula (1) or (2), —O -(CH 2 ) n-R 8 , -OR 9 , or -NR 10 R 11 .
  • a and B are preferably groups represented by the following general formula (1) or the following general formula (2), and A and B are represented by the following general formula (1) or the following general formula (2). More preferably, A and B are the same group.
  • R 8 represents an optionally substituted nitrogen-containing heterocyclic residue, and specific examples thereof include a pyrrole ring residue and a pyridine ring residue.
  • R 9 , R 10 and R 11 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl having 2 to 20 carbon atoms which may have a substituent. Represents an aryl group having 6 to 20 carbon atoms which may have a group or a substituent.
  • R 9 , R 10 and R 11 have the same meaning as R ′ described above, and the preferred ranges are also the same.
  • Y 1 represents —NR′— or —O—
  • Y 2 represents an alkylene group having 2 to 20 carbon atoms which may have a substituent, or a substituent.
  • an alkenylene group having 2 to 20 carbon atoms or an arylene group having 6 to 20 carbon atoms which may have a substituent, and these groups are represented by —NR′—, —O—, —SO They may be bonded to each other through a divalent linking group selected from 2- and -CO-.
  • R ′ has a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or a substituent. And an aryl group having 6 to 20 carbon atoms which may be present.
  • R 1 and R 2 each independently represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent. (R 1 and R 2 may be combined to form a heterocyclic structure, and the heterocyclic structure may further contain a nitrogen atom, an oxygen atom or a sulfur atom, or may have a substituent. .
  • Y 1 represents —NR′— or —O—, preferably —NR′—.
  • R ′ has the same meaning as R ′ above, and the preferred range is also the same.
  • Y 2 may have an optionally substituted alkylene group having 1 to 20 carbon atoms, an optionally substituted alkenylene group having 2 to 20 carbon atoms, or an optionally substituted group. And an arylene group having 6 to 20 carbon atoms, which are bonded to each other through a divalent linking group selected from —NR′—, —O—, —SO 2 —, and —CO—.
  • R ′ has the same meaning as R ′ above, and the preferred range is also the same).
  • the alkylene group having 1 to 20 carbon atoms is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 6 carbon atoms, and further preferably an alkylene group having 1 to 3 carbon atoms. Specific examples include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, and a hexylene group.
  • the alkylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • the alkenylene group having 2 to 20 carbon atoms is preferably an alkenylene group having 2 to 10 carbon atoms, more preferably an alkenylene group having 2 to 6 carbon atoms, and further preferably an alkenylene group having 2 to 3 carbon atoms. Specific examples include vinylene group, propynylene group, butynylene group, pentynylene group, hexynylene group and the like.
  • the alkenylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • the arylene group having 6 to 20 carbon atoms is preferably an arylene group having 6 to 20 carbon atoms, and more preferably an arylene group having 6 to 10 carbon atoms. Specific examples include a phenylene group, a naphthylene group, and an anthracenylene group.
  • the arylene group may have a substituent, and examples of the substituent include the groups described in the section of the substitu
  • R 1 and R 2 each independently represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent.
  • R 1 and R 2 may be combined to form a heterocyclic structure, and the heterocyclic structure may further contain a nitrogen atom, an oxygen atom or a sulfur atom, or may have a substituent.
  • the alkyl group having 1 to 20 carbon atoms is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms.
  • the alkenyl group having 2 to 20 carbon atoms is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 6 carbon atoms.
  • Specific examples include a vinyl group, a propenyl group, a butenyl group, a pentenyl group, and a hexenyl group. These groups may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • R 1 and R 2 preferably represent the same group.
  • Z 1 is a single bond connecting a triazine ring and a nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ′′ —, —NR′—G —SO 2 —, —NR′—G—SO 2 NR ′′ —, —O—G—CO—, —O—G—CONR′—, —O—G—SO 2 — or —O—G—SO 2 represents NR′—, G represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent or a substituent.
  • R ′ and R ′′ are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or a substituted group.
  • R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent.
  • Z 1 is a single bond connecting a triazine ring and a nitrogen atom, —NR′—, —NR′—G—CO—, N R′—G—CONR ′′ —, —NR′—G—SO 2 —, —NR′—G—SO 2 NR ′′ —, —O—G—CO—, —O—G—CONR′—, It represents —O—G—SO 2 — or —O—G—SO 2 NR′—, and preferably a single bond.
  • R ′ and R ′′ are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, Alternatively, it represents an aryl group having 6 to 20 carbon atoms which may have a substituent.
  • R ′ and R ′′ are synonymous with R ′ in the general formula (1), and preferred ranges thereof are also the same.
  • G represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or an optionally substituted carbon. It represents an arylene group having a number of 6 to 20.
  • G has the same meaning as Y 2 in the general formula (1), and preferred ranges are also the same.
  • R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent. Represents an alkenyl group having ⁇ 20 or an aryl group having 6 to 20 carbon atoms which may have a substituent.
  • R 3 , R 4 , R 5 , and R 6 have the same meaning as R ′ in the general formula (1), and the preferred range is also the same.
  • R 7 represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent.
  • R 7 has the same meaning as R 1 in the general formula (1), and the preferred range is also the same.
  • T in the general formula (II) represents an integer of 1 to 3, preferably 1 or 2, and more preferably 1.
  • the content of the (B) pigment derivative in the present invention is preferably 0.5 parts by mass or more and 50 parts by mass or less, and preferably 1 part by mass or more and 25 parts by mass with respect to 100 parts by mass in total of the phthalocyanine pigment and other pigments. It is more preferable that the amount is not more than part by mass. Only 1 type may be contained in the composition of this invention, and 2 or more types may be contained for the pigment derivative. When two or more types are included, the total amount is preferably within the above range.
  • the composition of the present invention contains (C) a dispersant, and the content of the dispersant is 20 to 40 parts by mass with respect to 100 parts by mass of the pigment.
  • the content of the (C) dispersant is preferably 22 to 38 parts by mass, more preferably 25 to 35 parts by mass with respect to 100 parts by mass in total of the phthalocyanine pigment and other pigments.
  • Only 1 type of dispersing agent may be contained in the composition of this invention, and may be contained 2 or more types. When two or more types are included, the total amount is preferably within the above range.
  • dispersant examples include polymer dispersants [for example, polyamidoamine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meth) acrylate, (Meth) acrylic copolymer, naphthalenesulfonic acid formalin condensate], and surfactants such as polyoxyethylene alkyl phosphate ester, polyoxyethylene alkyl amine, alkanol amine, and pigment derivatives. it can.
  • the polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer according to the structure.
  • Examples of the terminal-modified polymer having an anchor site to the pigment surface include a polymer having a phosphate group at the terminal described in JP-A-3-112992, JP-A-2003-533455, and the like. Examples thereof include polymers having a sulfonic acid group at the terminal end described in JP-A-273191 and the like, and polymers having a partial skeleton of an organic dye and a heterocyclic ring described in JP-A-9-77994. In addition, polymers having two or more pigment surface anchor sites (acid groups, basic groups, organic dye partial skeletons, heterocycles, etc.) introduced at the polymer ends described in JP-A-2007-277514 are also available. It is preferable because of excellent dispersion stability.
  • Examples of the graft polymer having an anchor site to the pigment surface include a polyester-based dispersant, and specific examples thereof include JP-A-54-37082, JP-A-8-507960, Reaction products of poly (lower alkyleneimine) and polyester described in JP-A-2009-258668, etc., reaction products of polyallylamine and polyester described in JP-A-9-169821, etc., JP-A-10-339949 A copolymer of a macromonomer and a nitrogen atom monomer described in JP-A-2004-37986, International Publication Pamphlet WO 2010/110491, JP-A-2003-238837, JP-A-2008-9426, JP-A Graphs having partial skeletons and heterocyclic rings of organic dyes described in JP-A-2008-81732 Type polymer, and a copolymer of a macromonomer and acid group-containing monomers described in JP 2010-106268 Publication.
  • amphoteric dispersion resin having a basic group and an acidic group described in JP-A-2009-203462 is a dispersibility of a pigment dispersion, a dispersion stability, and a colored photosensitive resin composition using the pigment dispersion. It is particularly preferable from the viewpoint of developability.
  • Macromonomer AA-6 (terminal) manufactured by Toa Gosei Co., Ltd. Polymethyl methacrylate having a methacryloyl group), AS-6 (polystyrene having a methacryloyl group at the end group), AN-6S (a copolymer of styrene and acrylonitrile having a methacryloyl group at the end group), AB-6 ( Polybutyl acrylate whose end group is a methacryloyl group), Plaxel FM5 manufactured by Daicel Chemical Industries, Ltd.
  • polyester-based macromonomer described in the 2009 publication.
  • the polyester-based macromonomer that is particularly excellent in flexibility and solvophilicity is from the viewpoint of the dispersibility of the pigment dispersion, the dispersion stability, and the developability exhibited by the colored photosensitive resin composition using the pigment dispersion.
  • Particularly preferred is a polyester macromonomer represented by the polyester macromonomer described in JP-A-2-272009.
  • block polymers having an anchor site to the pigment surface block polymers described in JP-A Nos. 2003-49110 and 2009-52010 are preferable.
  • the dispersant that can be used in the present invention is also available as a commercial product. Specific examples thereof include “DA-7301” manufactured by Kashiwagi Kasei Co., Ltd. and “Disperbyk-101 (polyamideamine phosphate) manufactured by BYK Chemie.
  • These dispersants may be used alone or in combination of two or more. In the present invention, it is particularly preferable to use a combination of a pigment derivative and a polymer dispersant.
  • the pigment dispersant may be used in combination with an alkali-soluble resin together with a terminal-modified polymer, a graft polymer, or a block polymer having an anchor site to the pigment surface.
  • Alkali-soluble resins include (meth) acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer, etc., and carboxylic acid in the side chain.
  • the dispersant (C) in particular, a dispersant obtained by reacting the hydroxyl group of a vinyl polymer having a hydroxyl group at one end with a tricarboxylic anhydride or tetracarboxylic dianhydride is used. preferable.
  • the dispersant obtained by reacting the hydroxyl group of a vinyl polymer having a hydroxyl group at one end with a tricarboxylic acid anhydride or tetracarboxylic dianhydride will be described.
  • the vinyl polymer having a hydroxyl group at one end is preferably a polymer represented by the following general formula (1).
  • the polymer represented by the general formula (1) is a vinyl polymer obtained by polymerizing an ethylenically unsaturated monomer.
  • Y 2 represents a polymerization termination group of the vinyl polymer
  • Z 2 represents —OH or R 28 (OH) 2
  • R 28 represents a trivalent having 1 to 18 carbon atoms.
  • R 21 and R 22 each represent a hydrogen atom or a methyl group
  • one of R 23 and R 24 represents a hydrogen atom
  • the other represents an aromatic group, or —C ( ⁇ O) —X 6 —R 25 (where X 6 represents —O— or —N (R 26 ) —, and R 25 and R 26 each represents a hydrogen atom or a straight chain of 1 to 18 carbon atoms)
  • X 4 represents a single bond, —O—R 27 — or S—R 27 —
  • R 27 represents a linear or branched alkyl group which may have an aromatic group as a substituent.
  • n represents an integer of 2 to 50.
  • Y 2 represents a polymerization termination group of the vinyl polymer, and is any known polymerization termination group introduced when polymerization of a normal ethylenically unsaturated monomer is carried out by a usual method.
  • it can be a group derived from a polymerization initiator, a group derived from a chain transfer agent, a group derived from a solvent, or a group derived from an ethylenically unsaturated monomer. Even if Y 2 has any of these chemical structures, the dispersant of the present invention can exert its effect without being affected by the polymerization termination group Y 2 .
  • the polymerization termination group include a carboxylic acid residue and an alcohol residue, and a carboxylic acid residue is preferable.
  • Z 2 represents —OH or R 28 (OH) 2 and is preferably —OH.
  • R 28 represents a trivalent hydrocarbon group having 1 to 18 carbon atoms.
  • R 28 is preferably a trivalent hydrocarbon group having 1 to 18 carbon atoms, more preferably a trivalent hydrocarbon group having 1 to 10 carbon atoms, and further preferably a trivalent hydrocarbon group having 1 to 6 carbon atoms.
  • the trivalent hydrocarbon group three hydrogen atoms are removed from a saturated hydrocarbon molecule having 1 to 18 carbon atoms such as methane, ethane, propane, 2-methylpropane, butane, cycloheptane, and cyclohexane.
  • R 21 and R 22 each represent a hydrogen atom or a methyl group, preferably a hydrogen atom.
  • R 23 and R 24 represents a hydrogen atom and the other one is an aromatic group, or —C ( ⁇ O) —X 6 —R 25 (where X 6 represents —O— or —N (R 26 ) —
  • the aromatic group is preferably an aromatic group having 6 to 20 carbon atoms, more preferably an aromatic group having 6 to 14 carbon atoms, and further preferably an aromatic group having 6 to 10 carbon atoms. Specific examples include a phenyl group, a naphthyl group, and an anthracenyl group.
  • X 6 represents —O— or —N (R 26 ) —, and each of R 25 and R 26 has a hydrogen atom or a linear or branched group having 1 to 18 carbon atoms and has an aromatic group as a substituent.
  • the linear or branched alkyl group having 1 to 18 carbon atoms an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable.
  • the aromatic group as a substituent of the alkyl group is preferably an aromatic group having 6 to 20 carbon atoms, more preferably an aromatic group having 6 to 14 carbon atoms, and further an aromatic group having 6 to 10 carbon atoms. preferable. Specifically, a phenyl group, a naphthyl group, an anthracenyl group, etc. are mentioned.
  • X 4 represents a single bond, —O—R 27 — or S—R 27 —, preferably S—R 27 —.
  • R 27 represents a linear or branched alkylene group having 1 to 18 carbon atoms.
  • the alkylene group having 1 to 18 carbon atoms an alkylene group having 1 to 10 carbon atoms is preferable, and an alkylene group having 1 to 6 carbon atoms is more preferable.
  • Specific examples include a methylene group, an ethylene group, a propylene group, an isopropylene group, a butylene group, an isobutylene group, a pentylene group, and a hexylene group.
  • N represents an integer of 2 to 50, preferably an integer of 2 to 40, more preferably an integer of 2 to 30.
  • the part of the repeating unit of the polymer represented by the general formula (1), that is, ⁇ — [C (R 21 ) (R 23 ) —C (R 22 ) (R 24 )] n — ⁇ is mutually identical (Homopolymer) made of a different material or (copolymer) made of a different material.
  • R 21 and R 22 are either a hydrogen atom, the other is a hydrogen atom or a methyl group, and R 23 and R 24 are either One is a hydrogen atom and the other is —C ( ⁇ O) —O—R 29 (R 29 is a linear or branched alkyl group having 1 to 8 carbon atoms and has an aromatic group as a substituent.
  • —X 4 —Z 2 is —S—CH 2 CH 2 —OH or —S—CH 2 CH (OH) CH 2 —OH.
  • the method for producing the polymer represented by the general formula (1) can be referred to the description in paragraphs 0044 to 0060 of Japanese Patent No. 5117913 (Japanese Patent Application Laid-Open No. 2009-251481), the contents of which are incorporated herein.
  • Tricarboxylic anhydride or tetracarboxylic dianhydride examples include an aliphatic tricarboxylic acid anhydride or an aromatic tricarboxylic acid anhydride.
  • Examples of the aliphatic tricarboxylic acid anhydride include 3-carboxymethylglutaric acid anhydride, 1,2,4-butanetricarboxylic acid-1,2-anhydride, cis-propene-1,2,3-tricarboxylic acid- 1,2-anhydride, 1,3,4-cyclopentanetricarboxylic acid anhydride and the like.
  • aromatic tricarboxylic acid anhydride examples include benzene tricarboxylic acid anhydride (1,2,3-benzenetricarboxylic acid anhydride, trimellitic acid anhydride (1,2,4-benzenetricarboxylic acid anhydride), etc.), Naphthalene tricarboxylic acid anhydride (1,2,4-naphthalene tricarboxylic acid anhydride, 1,4,5-naphthalene tricarboxylic acid anhydride, 2,3,6-naphthalene tricarboxylic acid anhydride, 1,2,8-naphthalene tricarboxylic acid Acid anhydride, etc.), 3,4,4′-benzophenone tricarboxylic acid anhydride, 3,4,4′-biphenyl ether tricarboxylic acid anhydride, 3,4,4′-biphenyl tricarboxylic acid anhydride, 2′-biphenyltricarboxylic acid anhydride,
  • an aromatic tricarboxylic acid anhydride is preferable among the above.
  • tetracarboxylic dianhydride examples include aliphatic tetracarboxylic dianhydrides, aromatic tetracarboxylic dianhydrides, and polycyclic tetracarboxylic dianhydrides.
  • Examples of the aliphatic tetracarboxylic dianhydride include 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, and 1,3-dimethyl.
  • aromatic tetracarboxylic dianhydride examples include pyromellitic dianhydride, ethylene glycol ditrimellitic anhydride ester, propylene glycol ditrimellitic anhydride ester, butylene glycol ditrimellitic anhydride ester, 3, 3 ', 4,4'-benzophenonetetracarboxylic dianhydride, 2,2', 3,3'-benzophenonetetracarboxylic dianhydride, 3,3 ', 4,4'-biphenylsulfonetetracarboxylic dianhydride 2,2 ′, 3,3′-biphenylsulfonetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride Anhydride, 3,3 ′, 4,4′-biphenyl ether tetracarboxylic dianhydride
  • polycyclic tetracarboxylic dianhydride examples include 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene succinic dianhydride, 3,4-dicarboxy-1,2 , 3,4-tetrahydro-6-methyl-1-naphthalene succinic dianhydride.
  • aromatic tetracarboxylic dianhydride is preferable among the above.
  • the tricarboxylic acid anhydride or tetracarboxylic dianhydride used in the present invention is not limited to the compounds exemplified above, and may have any structure. These may be used alone or in combination. What is preferably used in the present invention is an aromatic tricarboxylic acid anhydride or an aromatic tetracarboxylic acid dianhydride from the viewpoint of reducing the viscosity of the pigment dispersion or various inks.
  • pyromellitic dianhydride 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 9,9-bis (3,4-dicarboxyphenyl) fluorene dianhydride, 2, 3,6,7-naphthalenetetracarboxylic dianhydride, ethylene glycol ditrimellitic anhydride ester and trimellitic anhydride are preferred.
  • the reaction ratio is 0.3.
  • ⁇ ⁇ H> / ⁇ N> ⁇ 3 is preferable, and more preferably 0.5 ⁇ ⁇ H> / ⁇ N> ⁇ 2.
  • a catalyst may be used for the reaction between the vinyl polymer having a hydroxyl group at one end and the aromatic tricarboxylic acid anhydride.
  • tertiary amine compounds can be used, such as triethylamine, triethylenediamine, N, N-dimethylbenzylamine, N-methylmorpholine, 1,8-diazabicyclo- [5.4.0] -7-undecene. And 1,5-diazabicyclo- [4.3.0] -5-nonene.
  • the reaction between the hydroxyl group of the vinyl polymer having a hydroxyl group at one end and the acid anhydride group of the aromatic tricarboxylic acid anhydride may be performed without a solvent, or an appropriate dehydrated organic solvent may be used. . After completion of the reaction, the solvent used in the reaction can be removed by an operation such as distillation, or can be used as it is as a part of the product of the dispersant.
  • the solvent used is not particularly limited, but ethyl acetate, n-butyl acetate, isobutyl acetate, toluene, xylene, acetone, hexane, methyl ethyl ketone, cyclohexanone, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether acetate, ethylene glycol mono Ethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate and the like are used. Two or more of these solvents may be used in combination.
  • the reaction temperature between the hydroxyl group of the vinyl polymer having a hydroxyl group at one end and the acid anhydride group of the aromatic tricarboxylic acid anhydride is preferably 50 ° C. to 180 ° C., more preferably 60 ° C. to 160 ° C. Do. When the reaction temperature is less than 50 ° C., the reaction rate is slow. When the reaction temperature exceeds 180 ° C., the acid anhydride that has reacted and opened the ring forms a cyclic anhydride again, which may make it difficult to complete the reaction.
  • the composition of this invention contains a photoinitiator from a viewpoint of the further sensitivity improvement.
  • the photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of the polymerizable compound described later, and can be appropriately selected from known photopolymerization initiators. For example, those having photosensitivity to visible light from the ultraviolet region are preferable. Further, it may be an activator that generates some action with a photoexcited sensitizer and generates an active radical, or may be an initiator that initiates cationic polymerization according to the type of monomer.
  • the photopolymerization initiator preferably contains at least one compound having a molecular extinction coefficient of at least about 50 within a range of about 300 nm to 800 nm (more preferably 330 nm to 500 nm).
  • Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.), acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime.
  • Examples include oxime compounds such as derivatives, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, and hydroxyacetophenones.
  • trihalomethyltriazine compounds trihalomethyltriazine compounds, benzyldimethylketal compounds, ⁇ -hydroxyketone compounds, ⁇ -aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triallyl-imidazole dimers, oniums
  • compounds selected from the group consisting of compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds and derivatives thereof, cyclopentadiene-benzene-iron complexes and salts thereof, halomethyloxadiazole compounds, and 3-aryl substituted coumarin compounds are preferred.
  • trihalomethyltriazine compounds More preferred are trihalomethyltriazine compounds, ⁇ -aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, oxime compounds, triarylimidazole dimers, triarylimidazole compounds, benzimidazole compounds, onium compounds, benzophenone compounds, and acetophenone compounds.
  • At least one compound selected from the group consisting of a trihalomethyltriazine compound, an ⁇ -aminoketone compound, an oxime compound, a triallylimidazole compound, a benzophenone compound, a triarylimidazole compound, and a benzimidazole compound is particularly preferable.
  • the triarylimidazole compound may be a mixture with benzimidazole.
  • examples of the trihalomethyltriazine compound include the following compounds. Note that Ph is a phenyl group.
  • Examples of the triarylimidazole compound and the benzimidazole compound include the following compounds.
  • a commercially available product can be used as the trihalomethyltriazine compound, for example, TAZ-107 (manufactured by Midori Chemical Co., Ltd.) can also be used.
  • TAZ-107 manufactured by Midori Chemical Co., Ltd.
  • stepper exposure is used for curing exposure, but this exposure machine may be damaged by halogen, and the amount of photopolymerization initiator added must be kept low. Therefore, in view of these points, it is most preferable to use an oxime compound as the photopolymerization initiator (D) in order to form a fine pattern such as a solid-state imaging device.
  • halogenated hydrocarbon derivative having a triazine skeleton examples include those described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), a compound described in British Patent No. 1388492, a compound described in JP-A-53-133428, a compound described in German Patent No. 3333724, F.I. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), compound described in JP-A-62-258241, compound described in JP-A-5-281728, compound described in JP-A-5-34920, US Pat. No. 4,221,976 And the compounds described in the book.
  • Examples of the compound described in US Pat. No. 4,221,976 include compounds having an oxadiazole skeleton (for example, 2-trichloromethyl-5-phenyl-1,3,4-oxadiazole, 2- Trichloromethyl-5- (4-chlorophenyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1,3,4-oxadiazole, 2-trichloromethyl-5 -(2-naphthyl) -1,3,4-oxadiazole, 2-tribromomethyl-5-phenyl-1,3,4-oxadiazole, 2-tribromomethyl-5- (2-naphthyl) -1,3,4-oxadiazole; 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (4-chlorostyryl) ) -1,3,4-oxadiazole, 2-trichlor
  • photopolymerization initiators other than those mentioned above, polyhalogen compounds (for example, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane, etc.), N-phenylglycine, etc.
  • polyhalogen compounds for example, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane, etc.
  • N-phenylglycine etc.
  • acylphosphine oxides for example, bis (2,4 , 6-Trimethylbenzoyl) -phenylphos Zinc oxide, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethyl-pentylphenylphosphine oxide, Lucirin TPO, etc.
  • metallocenes for example, bis ( ⁇ 5-2,4-cyclopentadien-1-yl)- Bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium, ⁇ 5-cyclopentadienyl- ⁇ 6-cumenyl-iron (1 +)-hexafluorophosphate (1-), etc.
  • Examples thereof include compounds described in JP-A Nos. 53-133428, 57-1819, 57-6096, and US Pat.
  • ketone compound examples include benzophenone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 4-methoxybenzophenone, 2-chlorobenzophenone, 4-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone, 2-ethoxycarbonylbenzophenone, benzophenonetetracarboxylic acid or tetramethyl ester thereof, 4,4′-bis (dialkylamino) benzophenones (eg, 4,4′-bis (dimethylamino) benzophenone, 4,4′-bisdicyclohexyl) Amino) benzophenone, 4,4'-bis (diethylamino) benzophenone, 4,4'-bis (dihydroxyethylamino) benzophenone, 4-methoxy-4'-dimethylamino Benzophenone, 4,4'-dimethoxybenzophenone, 4-dimethylaminobenzophen
  • hydroxyacetophenone compounds As the photopolymerization initiator, hydroxyacetophenone compounds, aminoacetophenone compounds, and acylphosphine compounds can also be suitably used. More specifically, for example, aminoacetophenone initiators described in JP-A-10-291969 and acylphosphine oxide initiators described in Japanese Patent No. 4225898 can also be used.
  • hydroxyacetophenone-based initiator IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, IRGACURE-127 (trade names: all manufactured by BASF) can be used.
  • aminoacetophenone-based initiator commercially available products IRGACURE-907, IRGACURE-369, IRGACURE-379, IRGACURE-OXE379 (trade names: all manufactured by BASF) can be used.
  • aminoacetophenone-based initiator compounds described in JP-A-2009-191179 whose absorption wavelength is matched with a long wave light source of 365 nm or 405 nm can also be used.
  • acylphosphine initiator commercially available products such as IRGACURE-819 and DAROCUR-TPO (trade names: both manufactured by BASF) can be used.
  • More preferable examples of the photopolymerization initiator include oxime compounds.
  • Specific examples of the oxime compound include compounds described in JP-A No. 2001-233842, compounds described in JP-A No. 2000-80068, and compounds described in JP-A No. 2006-342166.
  • Examples of oxime compounds include J.M. C. S. Perkin II (1979) pp. 1653-1660), J.M. C. S. Perkin II (1979) pp. 156-162, Journal of Photopolymer Science and Technology (1995), pp. 156-162. 202-232, compounds described in JP-A No. 2000-66385, compounds described in JP-A Nos. 2000-80068, JP-T 2004-534797, JP-A No. 2006-342166, and the like.
  • IRGACURE-OXE01 manufactured by BASF
  • IRGACURE-OXE02 manufactured by BASF
  • TR-PBG-304 manufactured by Changzhou Strong Electronic New Materials Co., Ltd.
  • oxime compounds other than those described above compounds described in JP-A-2009-519904 in which an oxime is linked to the carbazole N-position, compounds described in US Pat. No. 7,626,957 in which a hetero substituent is introduced into the benzophenone moiety, Compounds described in Japanese Patent Application Laid-Open No. 2010-15025 and US Patent Publication No. 2009-292039, in which a nitro group is introduced into the dye moiety, a ketoxime compound described in International Patent Publication No. 2009-131189, a triazine skeleton and an oxime skeleton in the same molecule
  • a compound described in US Pat. No. 7,556,910 contained therein a compound described in JP-A-2009-221114 having an absorption maximum at 405 nm and good sensitivity to a g-line light source, and the like may be used.
  • cyclic oxime compounds described in JP-A-2007-231000 and JP-A-2007-322744 can also be suitably used for the cyclic oxime compounds described in JP-A-2007-231000 and JP-A-2007-322744.
  • cyclic oxime compounds in particular, cyclic oxime compounds fused to carbazole dyes described in JP2010-32985A and JP2010-185072A have high light absorptivity and high sensitivity. preferable.
  • the compounds described in JP-A-2009-242469 having an unsaturated bond at a specific site of the oxime compound can be preferably used because high sensitivity can be achieved by regenerating the active radical from the polymerization inert radical. it can.
  • an oxime compound having a specific substituent as disclosed in JP 2007-26997A and an oxime compound having a thioaryl group as disclosed in JP 2009-191061 A can be given.
  • the oxime compound that is a photopolymerization initiator is preferably a compound represented by the following general formula (OX-1).
  • the oxime N—O bond may be an (E) oxime compound, a (Z) oxime compound, or a mixture of (E) and (Z) isomers. .
  • R and B each independently represent a monovalent substituent
  • A represents a divalent organic group
  • Ar represents an aryl group.
  • the monovalent substituent represented by R is preferably a monovalent nonmetallic atomic group.
  • the monovalent nonmetallic atomic group include an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic group, an alkylthiocarbonyl group, and an arylthiocarbonyl group.
  • these groups may have one or more substituents.
  • the substituent mentioned above may be further substituted by another substituent.
  • substituents examples include a halogen atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, an acyloxy group, an acyl group, an alkyl group, and an aryl group.
  • an alkyl group having 1 to 30 carbon atoms is preferable. Specifically, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group, an octadecyl group, an isopropyl group , Isobutyl, sec-butyl, tert-butyl, 1-ethylpentyl, cyclopentyl, cyclohexyl, trifluoromethyl, 2-ethylhexyl, phenacyl, 1-naphthoylmethyl, 2-naphthoyl Methyl group, 4-methylsulfanylphenacyl group, 4-phenylsulfanylphenacyl group, 4-dimethylaminophenacyl group, 4-cyanophenacyl group, 4-methylphenacyl
  • the aryl group is preferably an aryl group having 6 to 30 carbon atoms, and specifically includes a phenyl group, a biphenyl group, a 1-naphthyl group, a 2-naphthyl group, a 9-anthryl group, a 9-phenanthryl group, and a 1-pyrenyl group.
  • the acyl group is preferably an acyl group having 2 to 20 carbon atoms, and specifically includes an acetyl group, a propanoyl group, a butanoyl group, a trifluoroacetyl group, a pentanoyl group, a benzoyl group, a 1-naphthoyl group, and a 2-naphthoyl group.
  • the alkoxycarbonyl group is preferably an alkoxycarbonyl group having 2 to 20 carbon atoms, and specifically includes a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, a hexyloxycarbonyl group, an octyloxycarbonyl group, a decyl group. Examples thereof include an oxycarbonyl group, an octadecyloxycarbonyl group, and a trifluoromethyloxycarbonyl group.
  • aryloxycarbonyl group examples include phenoxycarbonyl group, 1-naphthyloxycarbonyl group, 2-naphthyloxycarbonyl group, 4-methylsulfanylphenyloxycarbonyl group, 4-phenylsulfanylphenyloxycarbonyl group, 4-dimethylamino.
  • heterocyclic group an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom is preferable.
  • thienyl group benzo [b] thienyl group, naphtho [2,3-b] thienyl group, thiantenyl group, furyl group, pyranyl group, isobenzofuranyl group, chromenyl group, xanthenyl group, phenoxathiyl Nyl group, 2H-pyrrolyl group, pyrrolyl group, imidazolyl group, pyrazolyl group, pyridyl group, pyrazinyl group, pyrimidinyl group, pyridazinyl group, indolizinyl group, isoindolyl group, 3H-indolyl group, indolyl group, 1H-indazolyl group, purinyl group 4
  • alkylthiocarbonyl group examples include a methylthiocarbonyl group, a propylthiocarbonyl group, a butylthiocarbonyl group, a hexylthiocarbonyl group, an octylthiocarbonyl group, a decylthiocarbonyl group, an octadecylthiocarbonyl group, and a trifluoromethylthiocarbonyl group.
  • a methylthiocarbonyl group a propylthiocarbonyl group, a butylthiocarbonyl group, a hexylthiocarbonyl group, an octylthiocarbonyl group, a decylthiocarbonyl group, an octadecylthiocarbonyl group, and a trifluoromethylthiocarbonyl group.
  • arylthiocarbonyl group examples include a 1-naphthylthiocarbonyl group, a 2-naphthylthiocarbonyl group, a 4-methylsulfanylphenylthiocarbonyl group, a 4-phenylsulfanylphenylthiocarbonyl group, and a 4-dimethylaminophenylthiocarbonyl group.
  • the monovalent substituent represented by B represents an aryl group, a heterocyclic group, an arylcarbonyl group, or a heterocyclic carbonyl group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
  • Y, X, and n have the same meanings as Y, X, and n in General Formula (OX-2) described later, and preferred examples are also the same.
  • examples of the divalent organic group represented by A include an alkylene group having 1 to 12 carbon atoms, a cycloalkylene group, and an alkynylene group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent. Among them, A in the formula (OX-1) is an unsubstituted alkylene group, an alkyl group (for example, a methyl group, an ethyl group, a tert-butyl group, dodecyl) from the viewpoint of increasing sensitivity and suppressing coloring due to heating.
  • an alkyl group for example, a methyl group, an ethyl group, a tert-butyl group, dodecyl
  • alkylene group alkenyl group (eg vinyl group, allyl group) alkylene group, aryl group (eg phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl) Group, a phenanthryl group, and a styryl group) are preferable.
  • alkenyl group eg vinyl group, allyl group
  • aryl group eg phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl
  • a phenanthryl group e.g., phenanthryl group
  • styryl group alkylene group substituted alkylene group
  • alkenyl group eg vinyl group, allyl group
  • aryl group eg phenyl group, p-tolyl group, xylyl group, cumenyl group, naphth
  • the aryl group represented by Ar is preferably an aryl group having 6 to 30 carbon atoms, and may have a substituent.
  • substituents include the same substituents as those introduced into the substituted aryl group mentioned above as specific examples of the aryl group which may have a substituent.
  • a substituted or unsubstituted phenyl group is preferable from the viewpoint of increasing sensitivity and suppressing coloring due to heating.
  • the oxime compound is preferably a compound represented by the following general formula (OX-2).
  • R and X each independently represent a monovalent substituent
  • a and Y each independently represent a divalent organic group
  • Ar represents an aryl group
  • n represents 0 to It is an integer of 5.
  • R, A and Ar in the general formula (OX-2) have the same meanings as R, A and Ar in the general formula (OX-1), and preferred examples thereof are also the same.
  • the monovalent substituent represented by X includes an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyloxy group, an acyl group, an alkoxycarbonyl group, an amino group, and a heterocyclic ring.
  • X in the general formula (OX-2) is preferably an alkyl group from the viewpoint of solvent solubility and improvement of absorption efficiency in the long wavelength region.
  • n represents an integer of 0 to 5, and an integer of 0 to 2 is preferable.
  • examples of the divalent organic group represented by Y include the following structures.
  • “*” represents a bonding position between Y and an adjacent carbon atom in the formula (OX-2).
  • the oxime compound is preferably a compound represented by the following general formula (OX-3) or (OX-4).
  • R and X each independently represent a monovalent substituent
  • A represents a divalent organic group
  • Ar represents an aryl group
  • n represents 0 An integer of ⁇ 5.
  • R, X, A, Ar, and n in the general formula (OX-3) or (OX-4) have the same meanings as R, X, A, Ar, and n in the general formula (OX-2), respectively.
  • the preferred examples are also the same.
  • the oxime compound has a maximum absorption wavelength in a wavelength region of 350 nm to 500 nm, preferably has an absorption wavelength in a wavelength region of 360 nm to 480 nm, and particularly preferably has a high absorbance at 365 nm and 455 nm.
  • the molar extinction coefficient at 365 nm or 405 nm of the oxime compound is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, and more preferably 5,000 to 200,000 from the viewpoint of sensitivity. 000 is particularly preferred.
  • the molar extinction coefficient of the compound can be measured by using a known method. Specifically, for example, in an ultraviolet-visible spectrophotometer (Varian Inc., Cary-5 spcphotometer), an ethyl acetate solvent is used. It is preferable to measure at a concentration of 0.01 g / L.
  • the photopolymerization initiator used in the present invention may be used in combination of two or more as required.
  • the content of the photopolymerization initiator (D) in the composition of the present invention is preferably 0.1% by mass or more and 10% by mass or less, more preferably 0.5% by mass with respect to the total solid content of the composition. It is 5 mass% or less, More preferably, it is 1 mass% or more and 3 mass% or less. Within this range, better sensitivity and pattern formability can be obtained.
  • the composition of the present invention contains (E) a polymerizable compound.
  • a polymerizable compound known polymerizable compounds that can be cross-linked by radicals, acids, and heat can be used, and examples thereof include polymerizable compounds containing an ethylenically unsaturated bond, cyclic ether (epoxy, oxetane), methylol and the like.
  • the polymerizable compound is preferably selected from compounds having at least one terminal ethylenically unsaturated bond, preferably two or more, from the viewpoint of sensitivity. Among them, a polyfunctional polymerizable compound having 4 or more functional groups is preferable, and a polyfunctional polymerizable compound having 5 or more functional groups is more preferable.
  • Such compound groups are widely known in the industrial field, and these can be used without particular limitation in the present invention. These may be in any chemical form such as, for example, monomers, prepolymers, ie dimers, trimers and oligomers or mixtures thereof and oligomers thereof.
  • the polymeric compound in this invention may be used individually by 1 type, and may use 2 or more types together.
  • examples of monomers and prepolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, amides, And multimers thereof, preferably esters of unsaturated carboxylic acids and aliphatic polyhydric alcohol compounds, amides of unsaturated carboxylic acids and aliphatic polyhydric amine compounds, and multimers thereof. is there.
  • unsaturated carboxylic acids for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.
  • esters thereof for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.
  • esters thereof for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.
  • a dehydration condensation reaction product with a functional carboxylic acid is also preferably used.
  • an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an isocyanate group or an epoxy group with a monofunctional or polyfunctional alcohol, amine, or thiol, and a halogen group A substitution reaction product of an unsaturated carboxylic acid ester or amide having a detachable substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable.
  • compounds described in paragraphs [0095] to [0108] of JP-A-2009-288705 can be preferably used in the present invention.
  • the polymerizable compound is also preferably a compound having at least one addition-polymerizable ethylene group and having an ethylenically unsaturated group having a boiling point of 100 ° C. or higher under normal pressure.
  • monofunctional acrylates and methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, trimethylolethanetri ( (Meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, hexanediol ( (
  • polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid, and mixtures thereof.
  • a polyfunctional (meth) acrylate obtained by reacting a polyfunctional carboxylic acid with a compound having a cyclic ether group such as glycidyl (meth) acrylate and an ethylenically unsaturated group can also be used.
  • preferable polymerizable compounds include fluorene rings described in JP 2010-160418 A, JP 2010-129825 A, Japanese Patent No. 4364216, etc., and ethylenically unsaturated groups. It is also possible to use a compound having two or more functional groups, a cardo resin.
  • radically polymerizable monomers represented by the following general formulas (MO-1) to (MO-5) can also be suitably used.
  • T is an oxyalkylene group
  • the terminal on the carbon atom side is bonded to R.
  • n is 0 to 14 and m is 1 to 8.
  • a plurality of R and T present in one molecule may be the same or different.
  • a group represented by C (CH 3 ) ⁇ CH 2 is represented.
  • Specific examples of the polymerizable compounds represented by the general formulas (MO-1) to (MO-5) include compounds described in paragraphs 0248 to 0251 of JP-A-2007-2699779. It can be suitably used in the invention.
  • dipentaerythritol triacrylate (KAYARAD D-330 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (KAYARAD D-320 as a commercial product; Nippon Kayaku) Dipentaerythritol penta (meth) acrylate (commercially available) KAYARAD D-310 (commercially available product), dipentaerythritol hexa (meth) acrylate (commercially available KAYARAD DPHA; Nippon Kayaku Co., Ltd.)
  • a structure manufactured by A-DPH-12E (manufactured by Shin-Nakamura Chemical Co., Ltd.) and these (meth) acryloyl groups via ethylene glycol and propylene glycol residues are preferred.
  • These oligomer types can also be used.
  • Preferred embodiments of the polymerizable compound are shown below.
  • the polymerizable compound is a polyfunctional monomer and may have an acid group such as a carboxyl group, a sulfonic acid group, or a phosphoric acid group. If the ethylenic compound has an unreacted carboxyl group as in the case of a mixture as described above, this can be used as it is. Non-aromatic carboxylic acid anhydrides may be reacted to introduce acid groups.
  • non-aromatic carboxylic acid anhydride examples include tetrahydrophthalic anhydride, alkylated tetrahydrophthalic anhydride, hexahydrophthalic anhydride, alkylated hexahydrophthalic anhydride, succinic anhydride, anhydrous Maleic acid is mentioned.
  • the monomer having an acid group is an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, and a non-aromatic carboxylic acid anhydride is reacted with an unreacted hydroxyl group of the aliphatic polyhydroxy compound.
  • a polyfunctional monomer having an acid group is preferred, Particularly preferably, in this ester, the aliphatic polyhydroxy compound is pentaerythritol and / or dipentaerythritol.
  • examples of commercially available products include M-510 and M-520 as polybasic acid-modified acrylic oligomers manufactured by Toagosei Co., Ltd.
  • a preferable acid value of the polyfunctional monomer having an acid group is 0.1 mgKOH / g to 40 mgKOH / g, and particularly preferably 5 mgKOH / g to 30 mgKOH / g.
  • the acid value of the polyfunctional monomer is too low, the developing dissolution properties are lowered, and if it is too high, the production and handling are difficult, the photopolymerization performance is lowered, and the curability such as the surface smoothness of the pixel is deteriorated. Accordingly, when two or more polyfunctional monomers having different acid groups are used in combination, or when a polyfunctional monomer having no acid group is used in combination, the acid groups as the entire polyfunctional monomer should be adjusted so as to fall within the above range. Is preferred.
  • polyfunctional monomer having a caprolactone structure is not particularly limited as long as it has a caprolactone structure in the molecule.
  • R 1 represents a hydrogen atom or a methyl group
  • m represents a number of 1 or 2
  • “*” represents a bond
  • R 1 represents a hydrogen atom or a methyl group, and “*” represents a bond.
  • the polyfunctional monomer which has a caprolactone structure can be used individually or in mixture of 2 or more types.
  • the polymerizable monomer that can be used in the present invention is preferably at least one selected from the group of compounds represented by the following general formula (Z-4) or (Z-5).
  • each E independently represents — ((CH 2 ) yCH 2 O) — or — ((CH 2 ) yCH (CH 3 ) O) —.
  • Each represents independently an integer of 0 to 10
  • each X independently represents an acryloyl group, a methacryloyl group, a hydrogen atom, or a carboxyl group.
  • the total of the acryloyl group and the methacryloyl group is 3 or 4
  • each m independently represents an integer of 0 to 10
  • the total of each m is an integer of 0 to 40. is there. However, when the total of each m is 0, any one of X is a carboxyl group.
  • the total number of acryloyl groups and methacryloyl groups is 5 or 6, each n independently represents an integer of 0 to 10, and the sum of each n is an integer of 0 to 60. is there. However, when the total of each n is 0, any one of X is a carboxyl group.
  • m is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
  • the total of each m is preferably an integer of 2 to 40, more preferably an integer of 2 to 16, and particularly preferably an integer of 4 to 8.
  • n is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
  • the total of each n is preferably an integer of 3 to 60, more preferably an integer of 3 to 24, and particularly preferably an integer of 6 to 12.
  • — ((CH 2 ) yCH 2 O) — or — ((CH 2 ) yCH (CH 3 ) O) — in the general formula (Z-4) or the general formula (Z-5) is an oxygen atom side.
  • a form in which the terminal of X is bonded to X is preferred.
  • the compounds represented by the general formula (Z-4) or the general formula (Z-5) may be used alone or in combination of two or more.
  • a form in which all six Xs are acryloyl groups is preferable.
  • the total content of the compound represented by the general formula (Z-4) or the general formula (Z-5) in the polymerizable compound is preferably 20% by mass or more, and more preferably 50% by mass or more.
  • the compound represented by the general formula (Z-4) or the general formula (Z-5) is a conventionally known process, in which ethylene oxide or propylene oxide is opened to pentaerythritol or dipentaerythritol. It can be synthesized from a step of bonding a ring-opening skeleton by an addition reaction and a step of introducing a (meth) acryloyl group by reacting, for example, (meth) acryloyl chloride with a terminal hydroxyl group of the ring-opening skeleton. Each step is a well-known step, and a person skilled in the art can easily synthesize a compound represented by the general formula (i) or (ii).
  • pentaerythritol derivatives and / or dipentaerythritol derivatives are more preferable.
  • Specific examples include compounds represented by the following formulas (a) to (f) (hereinafter also referred to as “exemplary compounds (a) to (f)”).
  • exemplary compounds (a), (f) b), (e) and (f) are preferred.
  • Examples of commercially available polymerizable compounds represented by the general formulas (Z-4) and (Z-5) include SR-494, a tetrafunctional acrylate having four ethyleneoxy chains manufactured by Sartomer, Nippon Kayaku Examples thereof include DPCA-60, which is a hexafunctional acrylate having six pentyleneoxy chains, and TPA-330, which is a trifunctional acrylate having three isobutyleneoxy chains.
  • polymerizable compound examples include urethane acrylates as described in JP-B-48-41708, JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765. Also suitable are urethane compounds having an ethylene oxide skeleton as described in JP-B-58-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418. Furthermore, addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238 are described as polymerizable compounds.
  • polymerizable compounds include urethane oligomers UAS-10, UAB-140 (manufactured by Sanyo Kokusaku Pulp Co., Ltd.), UA-7200 "(manufactured by Shin-Nakamura Chemical Co., Ltd., DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA- 306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha), trimethylolpropane triacrylate (commercially available products are A-TMPT; manufactured by Shin-Nakamura Chemical Co., Ltd.), etc. It is done.
  • cyclic ether examples include those having an epoxy group such as bisphenol A type epoxy resin, JER-827, JER-828, JER-834, JER-1001, JER-1002, JER-1003.
  • JER-1055, JER-1007, JER-1009, JER-1010 manufactured by Japan Epoxy Resin Co., Ltd.
  • EPICLON 860, EPICLON 1050, EPICLON 1051, EPICLON 1055 manufactured by DIC Corporation
  • bisphenol F As type epoxy resins, JER-806, JER-807, JER-4004, JER-4005, JER-4007, JER-4010 (above, manufactured by Japan Epoxy Resins Co., Ltd.), EPICLON83 EPICLON 835 (above, manufactured by DIC Corporation), LCE-21, RE-602S (above, manufactured by Nippon Kayaku Co., Ltd.), etc., and phenol novolac type epoxy resins such as JER-152, JER-154, JER -157S70, JER-157S65 (above, manufactured by Japan Epoxy Resin Co., Ltd.), EPICLON N-740, EPICLON N-770,
  • the details of usage methods can be arbitrarily set according to the final performance design of the colored photosensitive resin composition.
  • a structure having a high unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable.
  • those having three or more functional groups are preferable, and further, different functional groups / different polymerizable groups (for example, acrylic ester, methacrylate ester, styrene). It is also effective to adjust both sensitivity and strength by using a compound of a vinyl compound or a vinyl ether compound).
  • the developability of the colored photosensitive resin composition can be adjusted, and an excellent pattern forming ability can be obtained.
  • the selection of the polymerizable compound is also possible with respect to the compatibility and dispersibility with other components (for example, a photopolymerization initiator, a dispersion, an alkali-soluble resin, etc.) contained in the colored photosensitive resin composition.
  • the method of use is an important factor. For example, compatibility may be improved by using a low-purity compound or using two or more kinds in combination.
  • a specific structure may be selected from the viewpoint of improving adhesion to a hard surface such as a support.
  • the content of the polymerizable compound in the composition of the present invention is preferably 3 to 25% by mass, more preferably 5 to 20% by mass, and more preferably 7 to 15% by mass with respect to the total solid content in the colored photosensitive resin composition. % Is particularly preferred.
  • composition of the present invention is a range that does not impair the effects of the present invention, and (G) a resin having a polymerizable double bond in the side chain, an organic solvent, a crosslinking agent, etc. May be included.
  • a resin having a polymerizable double bond in the side chain (hereinafter also referred to as “(G) resin”) may be contained. (G) By further containing a resin having a polymerizable double bond in the side chain, the composition of the present invention can be cured more effectively.
  • the resin having a polymerizable double bond in the side chain is not particularly limited as long as it has a polymerizable double bond in the side chain, but the polymerizable monomer having 2 to 6 hydroxyl groups (p) And a copolymer (a) with other polymerizable monomer (q), a resin obtained by reacting a functional group capable of reacting with a hydroxyl group and a compound (b) having an ethylenically unsaturated double bond Is preferred.
  • the polymerizable monomer having 2 to 6 hydroxyl groups constituting the resin having a polymerizable double bond in the side chain (p) has 2 to 6 hydroxyl groups and an ethylenically unsaturated double bond.
  • a monomer represented by the following general formula (1) can be used.
  • each of R 1 and R 4 represents a hydrogen atom or an optionally substituted alkyl group having 1 to 5 carbon atoms
  • R 2 represents an alkylene group having 1 to 4 carbon atoms
  • R 3 represents 1 to C carbon atoms
  • 4 represents an alkylene group or a single bond
  • n represents an integer of 2 or more and 6 or less.
  • Examples of the monomer represented by the general formula (1) include monoesters of polyhydric alcohols having an ethylenically unsaturated double bond, and glycerol mono (meth) acrylate is preferred.
  • the other polymerizable monomer (q) is a polymerizable monomer copolymerizable with the polymerizable monomer (p) having 2 to 6 hydroxyl groups.
  • Esters N-vinylpyrrolidone; styrene and its derivatives, styrenes such as ⁇ -methylstyrene; acrylamides such as (meth) acrylamide, methylol (meth) acrylamide, alkoxymethylol (meth) acrylamide, and diacetone (meth) acrylamide; Examples include (meth) acrylonitrile, other vinyl compounds such as ethylene, propylene, butylene, vinyl chloride, and vinyl acetate, and macromonomers such as polymethyl methacrylate macromonomer and polystyrene macromonomer. These monomers can be used individually by 1 type or in mixture of 2 or more types.
  • the copolymerization ratio of the polymerizable monomer (p) having 2 to 6 hydroxyl groups and the other polymerizable monomer (q) is preferably 5 to 95% by mass: 95 to 5% by mass, 70% by mass: More preferably, it is 70 to 30% by mass.
  • the copolymerization ratio of the polymerizable monomer (p) is less than 5% by mass, the number of ethylenically unsaturated double bonds that can be introduced is small, and the double bond equivalent (double bond equivalent defined by the following formula) The numerical value becomes large and sufficient sensitivity cannot be obtained.
  • the copolymerization ratio of the polymerizable monomer (p) exceeds 95% by mass, it becomes possible to introduce many ethylenically unsaturated double bonds, but the ratio of the polymerizable monomer (q) becomes low. It is difficult to maintain physical properties such as dispersion stability, solubility, and chemical resistance.
  • a copolymer (a) of a polymerizable monomer (p) having 2 to 6 hydroxyl groups and another polymerizable monomer (q) can be produced by a known method. No. 156930, paragraph 0013 can be referred to, the contents of which are incorporated herein.
  • the resin having a polymerizable double bond in the side chain is obtained by reacting the copolymer (a) with a functional group capable of reacting with a hydroxyl group and a compound (b) having an ethylenically unsaturated double bond. Is obtained.
  • the functional group capable of reacting with a hydroxyl group of the compound (b) having a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond include an isocyanate group and a carboxyl group. Groups are preferred.
  • Specific examples of the compound having an isocyanate group and an ethylenically unsaturated double bond include 2-acryloylethyl isocyanate and 2-methacryloylethyl isocyanate.
  • Specific examples of the compound having a carboxyl group and an ethylenically unsaturated double bond include acrylic acid, methacrylic acid, and maleic anhydride.
  • the amount of ethylenically unsaturated double bonds introduced into the copolymer (a) via a hydroxyl group is indicated by the “double bond equivalent” of the resulting resin.
  • the double bond equivalent of the (G) resin is preferably 200 to 2,000, and more preferably 300 to 900.
  • the weight average molecular weight (Mw) of the (G) resin is preferably 2000 to 200000, more preferably 5000 to 50000 from the viewpoint of good dispersibility of the composition of the present invention.
  • the reaction between the copolymer (a) and the compound (b) having a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond can be carried out by a known method, for example, JP-A-2005-156930. Reference can be made to the description of paragraph 0016 of the publication, the contents of which are incorporated herein.
  • the content of the resin having a polymerizable double bond in the side chain (G) is as follows: The amount is preferably 10 to 100% by mass, more preferably 20 to 90% by mass, and still more preferably 30 to 80% by mass.
  • (G) 1 type of resin which has a polymerizable double bond in a side chain may be contained in the composition of this invention, and may be contained 2 or more types. When two or more types are included, the total amount is preferably within the above range.
  • composition of the present invention may further contain an alkali-soluble resin as a binder.
  • component contained in the composition of this invention as an dispersing agent component is not contained in alkali-soluble resin here.
  • the alkali-soluble resin is a linear organic polymer, and promotes at least one alkali-solubility in a molecule (preferably a molecule having an acrylic copolymer or a styrene copolymer as a main chain). It can be suitably selected from alkali-soluble resins having a group. From the viewpoint of heat resistance, polyhydroxystyrene resins, polysiloxane resins, acrylic resins, acrylamide resins, and acryl / acrylamide copolymer resins are preferable. From the viewpoint of development control, acrylic resins and acrylamide resins are preferable. Resins and acrylic / acrylamide copolymer resins are preferred.
  • Examples of the group that promotes alkali solubility include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group.
  • the group is soluble in an organic solvent and developed with a weak alkaline aqueous solution. Possible are preferable, and (meth) acrylic acid is particularly preferable.
  • These acid groups may be used alone or in combination of two or more.
  • Examples of the monomer capable of imparting an acid group after the polymerization include a monomer having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, a monomer having an epoxy group such as glycidyl (meth) acrylate, and 2-isocyanatoethyl (methacrylate). ) Monomers having an isocyanate group such as acrylate. These monomers for introducing an acid group may be only one type or two or more types.
  • a monomer having an acid group and / or a monomer capable of imparting an acid group after polymerization (hereinafter sometimes referred to as “monomer for introducing an acid group”) .) May be polymerized as a monomer component.
  • a treatment for imparting an acid group as described later is required after the polymerization.
  • a known radical polymerization method can be applied.
  • Polymerization conditions such as temperature, pressure, type and amount of radical initiator, type of solvent, etc. when producing an alkali-soluble resin by radical polymerization can be easily set by those skilled in the art, and the conditions are determined experimentally. It can also be done.
  • a polymer having a carboxylic acid in the side chain is preferable, such as a methacrylic acid copolymer, an acrylic acid copolymer, an itaconic acid copolymer, and a crotonic acid copolymer.
  • a copolymer of (meth) acrylic acid and another monomer copolymerizable therewith is suitable as the alkali-soluble resin.
  • examples of other monomers copolymerizable with (meth) acrylic acid include alkyl (meth) acrylates, aryl (meth) acrylates, and vinyl compounds.
  • alkyl (meth) acrylate and aryl (meth) acrylate methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, pentyl (meth) acrylate,
  • vinyl compounds such as hexyl (meth) acrylate, octyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, tolyl (meth) acrylate, naphthyl (meth) acrylate, cyclohexyl (meth) acrylate, styrene, ⁇ -methylstyrene, vinyltoluene, glycidyl methacrylate, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, tetrahydrofurfury
  • the alkali-soluble resin may include a polymer (a) obtained by polymerizing a monomer component which essentially includes a compound represented by the following general formula (ED) (hereinafter sometimes referred to as “ether dimer”). preferable.
  • ED general formula
  • R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.
  • the coloring composition of this invention can form the cured coating film which was very excellent also in transparency with heat resistance.
  • the hydrocarbon group having 1 to 25 carbon atoms which may have a substituent represented by R 1 and R 2 is not particularly limited.
  • Linear or branched alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, tert-amyl, stearyl, lauryl, 2-ethylhexyl; aryl groups such as phenyl; Alicyclic groups such as cyclohexyl, tert-butylcyclohexyl, dicyclopentadienyl, tricyclodecanyl, isobornyl, adamantyl, 2-methyl-2-adamantyl; substituted with alkoxy such as 1-methoxyethyl, 1-ethoxyethyl An alkyl group substituted with an aryl group such as benzyl; and the like.
  • an acid such as methyl, ethyl, cyclohexyl, benzyl or the like, or a primary or secondary carbon substituent which is
  • ether dimer examples include dimethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, diethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, (N-propyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (isopropyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (n-butyl) ) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (isobutyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (tert-butyl) -2, 2 '-[oxybis (methylene)] bis-2-propenoate, di (tert-amyl) -2,2'-[oxybis (methylene)] bis 2-propenoate, di (stearyl) -2,
  • dimethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, diethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, dicyclohexyl-2,2′- [Oxybis (methylene)] bis-2-propenoate and dibenzyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate are preferred.
  • These ether dimers may be only one kind or two or more kinds.
  • the structure derived from the compound represented by the general formula (ED) may be copolymerized with other monomers.
  • an alkali-soluble resin having a polymerizable group may be used.
  • an alkali-soluble resin having a polymerizable group an alkali-soluble resin containing an allyl group, a (meth) acryl group, an allyloxyalkyl group or the like in the side chain is useful.
  • Examples of the above-described polymer containing a polymerizable group include a dial NR series (manufactured by Mitsubishi Rayon Co., Ltd.), Photomer 6173 (COOH-containing polyurethane acrylic oligomer. Diamond Shamrock Co.
  • KS resist 106 all manufactured by Osaka Organic Chemical Industries, Ltd.
  • Cyclomer P series all manufactured by Plaxel
  • CF200 series all manufactured by Daicel Chemical Industries, Ltd.
  • Ebecryl 3800 manufactured by Daicel UCB Corporation
  • an alkali-soluble resin containing these polymerizable groups an isocyanate group and an OH group are reacted in advance to leave one unreacted isocyanate group and a compound containing a (meth) acryloyl group and an acrylic resin containing a carboxyl group; Urethane-modified polymerizable double bond-containing acrylic resin obtained by the above reaction, unsaturated group-containing acrylic obtained by reaction of an acrylic resin containing a carboxyl group and a compound having both an epoxy group and a polymerizable double bond in the molecule Resin, acid pendant type epoxy acrylate resin, OH group-containing acrylic resin and polymerizable double bond-containing acrylic resin obtained by reacting a polymerizable double bond, OH group-containing acrylic resin and isocyanate Resin obtained by reacting compound having polymerizable group, JP 2002-229207 A Resin obtained by basic treatment of a resin having an ester group having a leaving group such as a halogen atom or a sulf
  • alkali-soluble resin in particular, a benzyl (meth) acrylate / (meth) acrylic acid copolymer and a multi-component copolymer composed of benzyl (meth) acrylate / (meth) acrylic acid / other monomers are suitable.
  • the description in paragraphs 0558 to 0571 of JP2012-208494A (corresponding to [0685] to [0700] of the corresponding US Patent Application Publication No. 2012/0235099) can be referred to and the contents thereof can be referred to. Is incorporated herein.
  • the copolymer (B) described in paragraph Nos. 0029 to 0063 described in JP 2012-32767 A and the alkali-soluble resin used in Examples paragraph Nos. 0088 to 2020 of JP 2012-208474 A
  • the binder resin described in 0098 and the binder resin used in Examples the binder resin described in Paragraph Nos.
  • the acid value of the alkali-soluble resin is preferably 30 mgKOH / g to 200 mgKOH / g, more preferably 50 mgKOH / g to 150 mgKOH / g, and most preferably 70 mgKOH / g to 120 mgKOH / g.
  • the weight average molecular weight (Mw) of the alkali-soluble resin is preferably 2,000 to 50,000, more preferably 5,000 to 30,000, and most preferably 7,000 to 20,000.
  • the content of the alkali-soluble resin in the coloring composition is preferably 1% by mass to 15% by mass, more preferably based on the total solid content of the coloring composition. Is 2% by mass to 12% by mass, and particularly preferably 3% by mass to 10% by mass.
  • the composition of the present invention may contain only one kind of alkali-soluble resin, or may contain two or more kinds. When two or more types are included, the total amount is preferably within the above range.
  • the composition of the present invention may contain an organic solvent.
  • the organic solvent is basically not particularly limited as long as the solubility of each component and the coating property of the colored photosensitive resin composition are satisfied, but in particular, the solubility and coating of ultraviolet absorbers, alkali-soluble resins and dispersants, etc. Is preferably selected in consideration of safety and safety.
  • organic solvents examples include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, and oxyacetic acid.
  • esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, and oxyacetic acid.
  • Alkyl eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate)
  • 3-oxypropionic acid alkyl esters Examples: methyl 3-oxypropionate, ethyl 3-oxypropionate etc.
  • 2-Oxypropio Acid alkyl esters eg, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc.
  • organic solvents are preferably mixed in two or more types from the viewpoints of solubility of the ultraviolet absorber and the alkali-soluble resin, improvement of the coated surface, and the like.
  • It is a mixed solution composed of two or more selected from carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, and propylene glycol methyl ether acetate.
  • the content of the organic solvent in the composition is preferably such that the total solid concentration of the composition is 5% by mass to 80% by mass from the viewpoint of applicability, and is further 5% by mass to 60% by mass. 10% by mass to 50% by mass is particularly preferable.
  • the crosslinking agent is not particularly limited as long as the film can be cured by a crosslinking reaction.
  • at least selected from (a) an epoxy resin, (b) a methylol group, an alkoxymethyl group, and an acyloxymethyl group.
  • the blending amount of the crosslinking agent is not particularly defined, but is preferably 2 to 30% by mass, more preferably 3 to 20% by mass, based on the total solid content of the composition. preferable.
  • the composition of the present invention may contain only one type of cross-linking agent, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
  • -Polymerization inhibitor- In the composition of the present invention, it is desirable to add a small amount of a polymerization inhibitor in order to prevent unnecessary thermal polymerization of the polymerizable compound during the production or storage of the composition.
  • the polymerization inhibitor that can be used in the present invention include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6- tert-butylphenol), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like.
  • the addition amount of the polymerization inhibitor is preferably about 0.01% by mass to about 5% by mass with respect to the mass of the whole composition.
  • the composition of the present invention may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
  • Various surfactants may be added to the composition of the present invention from the viewpoint of further improving coatability.
  • various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
  • the composition of the present invention contains a fluorosurfactant
  • the liquid properties (particularly fluidity) when prepared as a coating liquid are further improved. Sex can be improved more. That is, when a film is formed using a coating liquid to which a composition containing a fluorosurfactant is applied, the wettability to the coated surface is reduced by reducing the interfacial tension between the coated surface and the coating liquid. Is improved, and the coating property to the coated surface is improved. For this reason, even when a thin film of about several ⁇ m is formed with a small amount of liquid, it is effective in that it is possible to more suitably form a film having a uniform thickness with small thickness unevenness.
  • the fluorine content in the fluorosurfactant is preferably 3% by mass to 40% by mass, more preferably 5% by mass to 30% by mass, and particularly preferably 7% by mass to 25% by mass.
  • a fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of coating film thickness and liquid-saving properties, and has good solubility in the composition.
  • fluorosurfactant examples include Megafac F171, F172, F173, F176, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, F780, F781 (above DIC Corporation), Florard FC430, FC431, FC171 (above, Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC1068, SC-381, SC-383, S393, KH-40 (above, manufactured by Asahi Glass Co., Ltd.) and the like.
  • nonionic surfactant examples include glycerol, trimethylolpropane, trimethylolethane, and ethoxylates and propoxylates thereof (for example, glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene Stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester (Pluronic L10, L31, L61, L62 manufactured by BASF, 10R5, 17R2, 25R2, Tetronic 304, 701, 704, 901, 904, 150R1) Solsperse 20000 (Lubrizol Japan Co., Ltd.), and the like.
  • cationic surfactant examples include phthalocyanine derivatives (trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.), organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 (manufactured by Kyoeisha Chemical Co., Ltd.) and W001 (manufactured by Yusho Co., Ltd.).
  • phthalocyanine derivatives trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.
  • organosiloxane polymer KP341 manufactured by Shin-Etsu Chemical Co., Ltd.
  • (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 manufactured by Kyoeisha Chemical Co., Ltd.
  • W001 manufactured by Yusho Co., Ltd.
  • anionic surfactants include W004, W005, W017 (manufactured by Yusho Co., Ltd.) and the like.
  • silicone surfactant examples include “Toray Silicone DC3PA”, “Toray Silicone SH7PA”, “Toray Silicone DC11PA”, “Tore Silicone SH21PA”, “Tore Silicone SH28PA”, “Toray Silicone” manufactured by Toray Dow Corning Co., Ltd.
  • the addition amount of the surfactant is preferably 0.001% by mass to 2.0% by mass, more preferably 0.001% by mass with respect to the total mass of the composition. 005 mass% to 1.0 mass%.
  • the composition of the present invention may contain only one type of surfactant or two or more types of surfactant. When two or more types are included, the total amount is preferably within the above range.
  • additives for example, fillers, adhesion promoters, antioxidants, ultraviolet absorbers, anti-aggregation agents, and the like can be blended with the composition of the present invention as necessary.
  • these additives include those described in paragraphs 0155 to 0156 of JP-A No. 2004-295116.
  • the composition of the present invention may contain a sensitizer and a light stabilizer described in paragraph 0078 of JP-A No. 2004-295116, and a thermal polymerization inhibitor described in paragraph 0081 of the same publication.
  • the following compounds are preferably used as the ultraviolet absorber.
  • Organic carboxylic acid, organic carboxylic anhydride-- may contain an organic carboxylic acid having a molecular weight of 1000 or less and / or an organic carboxylic acid anhydride.
  • Specific examples of the organic carboxylic acid compound include aliphatic carboxylic acids and aromatic carboxylic acids.
  • aliphatic carboxylic acids include monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, glycolic acid, acrylic acid, methacrylic acid, oxalic acid, malonic acid, succinic acid, Examples thereof include dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, cyclohexanedicarboxylic acid, cyclohexenedicarboxylic acid, itaconic acid, citraconic acid, maleic acid and fumaric acid, and tricarboxylic acids such as tricarbaryl acid and aconitic acid.
  • monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, glycolic acid, acrylic acid, methacrylic acid, oxalic acid, malonic acid, succinic acid
  • aromatic carboxylic acid examples include carboxylic acids in which a carboxyl group is directly bonded to a phenyl group such as benzoic acid and phthalic acid, and carboxylic acids in which a carboxyl group is bonded to the phenyl group through a carbon bond.
  • carboxylic acids in which a carboxyl group is directly bonded to a phenyl group such as benzoic acid and phthalic acid
  • carboxylic acids in which a carboxyl group is bonded to the phenyl group through a carbon bond examples of the aromatic carboxylic acid.
  • those having a molecular weight of 600 or less, particularly those having a molecular weight of 50 to 500 specifically maleic acid, malonic acid, succinic acid, and itaconic acid are preferred.
  • organic carboxylic acid anhydrides include aliphatic carboxylic acid anhydrides and aromatic carboxylic acid anhydrides. Specific examples include acetic anhydride, trichloroacetic anhydride, trifluoroacetic anhydride, and tetrahydrophthalic anhydride. Succinic anhydride, maleic anhydride, citraconic anhydride, itaconic anhydride, glutaric anhydride, 1,2-cyclohexene dicarboxylic anhydride, n-octadecyl succinic anhydride, 5-norbornene-2,3-dicarboxylic anhydride, etc. An aliphatic carboxylic acid anhydride is mentioned.
  • aromatic carboxylic acid anhydride examples include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and naphthalic anhydride. Of these, those having a molecular weight of 600 or less, particularly those having a molecular weight of 50 to 500, specifically maleic anhydride, succinic anhydride, citraconic anhydride, and itaconic anhydride are preferred.
  • the amount of these organic carboxylic acid and / or organic carboxylic acid anhydride is usually 0.01 to 10 mass in the total solid content. %, Preferably 0.03 to 5% by mass, more preferably 0.05 to 3% by mass.
  • the composition of the present invention is prepared by mixing the aforementioned components.
  • the components constituting the composition may be combined at once, or may be sequentially combined after each component is dissolved and dispersed in a solvent.
  • the composition may be prepared by dissolving and dispersing all components in a solvent at the same time. If necessary, each component may be suitably used as two or more solutions / dispersions at the time of use (at the time of application). ) May be mixed to prepare a composition.
  • composition prepared as described above is preferably subjected to use after being filtered using a filter having a pore size of about 0.01 ⁇ m to 3.0 ⁇ m, more preferably about 0.05 ⁇ m to 0.5 ⁇ m. be able to.
  • the composition of the present invention can form a cured film having excellent heat resistance and color characteristics, it is suitably used for forming a color pattern (colored layer) of a color filter.
  • the composition of the present invention is preferably used for forming a colored pattern such as a color filter used in a solid-state imaging device (for example, CCD, CMOS, etc.) or an image display device such as a liquid crystal display device (LCD). it can. Furthermore, it can be suitably used as a production application for printing ink, inkjet ink, paint, and the like.
  • a color filter for a solid-state imaging device such as a CCD and a CMOS can be suitably used as a production application.
  • a colored photosensitive resin composition layer (hereinafter also referred to as “colored composition layer”) is formed by applying the colored photosensitive resin composition of the present invention on a support.
  • the pattern forming method of the present invention can be suitably applied to the formation of a colored pattern (pixel) included in a color filter.
  • the support for forming a pattern by the pattern forming method of the present invention is not particularly limited as long as it is a support applicable to pattern formation in addition to a plate-like material such as a substrate.
  • the method for producing a color filter of the present invention applies the pattern forming method of the present invention, and includes a step of forming a colored pattern on a support using the pattern forming method of the present invention. That is, the method for producing a color filter of the present invention applies the pattern forming method of the present invention.
  • the colored photosensitive resin composition layer of the present invention is applied on a support to form a colored photosensitive resin composition layer. And a step of exposing the colored photosensitive resin composition layer in a pattern, and a step of developing and removing an unexposed portion to form a colored pattern. Further, if necessary, a step of baking the colored photosensitive resin composition layer (pre-baking step) and a step of baking the developed colored pattern (post-baking step) may be provided.
  • the colored photosensitive resin composition layer is formed on the support by applying the composition of the present invention.
  • a solid-state imaging device in which an imaging element (light-receiving element) such as a CCD (Charge Coupled Device) or a CMOS (Complementary Metal-Oxide Semiconductor) is provided on a substrate (for example, a silicon substrate).
  • An element substrate can be used.
  • the colored pattern in the present invention may be formed on the imaging element forming surface side (front surface) of the solid-state imaging element substrate, or may be formed on the imaging element non-forming surface side (back surface).
  • a light shielding film may be provided between the colored patterns in the solid-state image sensor or on the back surface of the substrate for the solid-state image sensor.
  • an undercoat layer may be provided on the support for improving adhesion with the upper layer, preventing diffusion of substances, or flattening the substrate surface.
  • composition of the present invention on the support, various coating methods such as slit coating, ink jet method, spin coating, cast coating, roll coating, screen printing method and the like can be applied.
  • the colored photosensitive resin composition layer coated on the support can be dried (prebaked) at a temperature of 50 ° C. to 140 ° C. for 10 seconds to 300 seconds using a hot plate, oven or the like.
  • Step of exposing colored photosensitive resin composition layer to pattern (when pattern is formed by photolithography method) >> -Exposure process-
  • the colored photosensitive resin composition layer formed in the colored photosensitive resin composition layer forming step is subjected to pattern exposure through a mask having a predetermined mask pattern using an exposure device such as a stepper, for example. Thereby, a cured film is obtained.
  • an exposure device such as a stepper, for example.
  • a cured film is obtained.
  • radiation (light) that can be used for exposure ultraviolet rays such as g-line and i-line are particularly preferable (particularly preferably i-line).
  • Irradiation dose is more preferably 30mJ / cm 2 ⁇ 1500mJ / cm 2 is preferably 50mJ / cm 2 ⁇ 1000mJ / cm 2, and most preferably 80mJ / cm 2 ⁇ 500mJ / cm 2.
  • the thickness of the cured film is preferably 1.0 ⁇ m or less, more preferably 0.1 ⁇ m to 0.9 ⁇ m, and further preferably 0.2 ⁇ m to 0.8 ⁇ m. It is preferable to set the film thickness to 1.0 ⁇ m or less because high resolution and high adhesion can be obtained.
  • a cured film having a thin film thickness of 0.7 ⁇ m or less can also be suitably formed, and the obtained cured film is developed in a pattern forming process described later, thereby forming a thin film.
  • the coloring pattern excellent in developability, surface roughness suppression, and pattern shape can be obtained.
  • the colored photosensitive resin composition layer in the light unirradiated portion in the exposure step is eluted in the alkaline aqueous solution, and only the photocured portion remains.
  • the developer is preferably an organic alkali developer that does not cause damage to the underlying image sensor or circuit.
  • the development temperature is usually 20 ° C. to 30 ° C., and the development time is conventionally 20 seconds to 90 seconds. In order to remove the residue more, in recent years, it may be carried out for 120 seconds to 180 seconds. Furthermore, in order to further improve residue removability, the process of shaking off the developer every 60 seconds and further supplying a new developer may be repeated several times.
  • alkaline agent used in the developer examples include ammonia water, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide.
  • Organic alkaline compounds such as choline, pyrrole, piperidine, 1,8-diazabicyclo- [5,4,0] -7-undecene, and the concentration of these alkaline agents is 0.001 to 10% by mass
  • An alkaline aqueous solution diluted with pure water so as to be preferably 0.01% by mass to 1% by mass is preferably used as the developer.
  • an inorganic alkali may be used for the developer, and as the inorganic alkali, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium oxalate, sodium metaoxalate and the like are preferable.
  • a developer composed of such an alkaline aqueous solution it is generally washed (rinsed) with pure water after development.
  • post-bake heat treatment after drying. If a multicolor coloring pattern is formed, the said process can be repeated sequentially for every color, and a cured film can be manufactured. Thereby, a color filter is obtained.
  • the post-baking is a heat treatment after development for complete curing, and a heat curing treatment is usually performed at 100 ° C. to 240 ° C., preferably 200 ° C. to 240 ° C.
  • This post-bake treatment is performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), a high-frequency heater, or the like so that the coating film after development is in the above-described condition. be able to.
  • Step of Forming Photoresist Layer, Step of Obtaining Resist Pattern, and Step of Dry Etching can be performed using an etching gas with the patterned photoresist layer as a mask.
  • a positive or negative radiation sensitive composition is applied on a colored layer obtained by curing a colored photosensitive resin composition layer, and dried to form a photoresist layer.
  • a mode in which heat treatment after exposure (PEB) and heat treatment after development (post-bake treatment) are desirable.
  • a positive type radiation sensitive composition As the photoresist, for example, a positive type radiation sensitive composition is used.
  • positive type radiation sensitive composition positive type photo sensitive to radiation such as ultraviolet rays (g rays, h rays, i rays), deep ultraviolet rays including excimer lasers, electron beams, ion beams and X rays.
  • a positive resist composition suitable for resist can be used.
  • the radiation g-line, h-line and i-line are preferable, and i-line is particularly preferable.
  • a composition containing a quinonediazide compound and an alkali-soluble resin is preferable.
  • a positive radiation-sensitive composition containing a quinonediazide compound and an alkali-soluble resin indicates that a quinonediazide group is decomposed by irradiation with light having a wavelength of 500 nm or less to produce a carboxyl group, resulting in alkali-solubility from an alkali-insoluble state. It is what you use. Since this positive photoresist has remarkably excellent resolution, it is used for manufacturing integrated circuits such as ICs and LSIs.
  • the quinonediazide compound include a naphthoquinonediazide compound.
  • Examples of commercially available products include FHi622BC (manufactured by FUJIFILM Electronics Materials).
  • the thickness of the photoresist layer is preferably from 0.1 to 3 ⁇ m, preferably from 0.2 to 2.5 ⁇ m, and more preferably from 0.3 to 2 ⁇ m.
  • the formation of the photoresist layer by coating can be suitably performed using the coating method for the colored layer described above.
  • a resist pattern (patterned photoresist layer) provided with a group of resist through holes is formed.
  • the formation of the resist pattern is not particularly limited, and can be performed by appropriately optimizing a conventionally known photolithography technique.
  • a resist through hole group in the photoresist layer By providing a resist through hole group in the photoresist layer by exposure and development, a resist pattern as an etching mask used in the next etching is provided on the colored layer.
  • the exposure of the photoresist layer is performed by exposing the positive-type or negative-type radiation-sensitive composition with g-line, h-line, i-line, etc., preferably i-line, through a predetermined mask pattern. Can do. After the exposure, the photoresist is removed in accordance with a region where a colored pattern is to be formed by developing with a developer.
  • any developer can be used as long as it dissolves the exposed portion of the positive resist and the uncured portion of the negative resist without affecting the colored layer containing the colorant.
  • Combinations of solvents and alkaline aqueous solutions can be used.
  • an alkaline aqueous solution prepared by dissolving an alkaline compound so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 5% by mass is suitable.
  • alkaline compounds include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, Examples include pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene.
  • alkaline aqueous solution is used as a developing solution, generally a washing process is performed with water after development.
  • the resist pattern as an etching mask, patterning is performed by dry etching so that a through hole group is formed in the colored layer. Thereby, a colored pattern is formed.
  • the through hole group is provided in a checkered pattern in the colored layer. Therefore, the first colored pattern in which the through hole group is provided in the colored layer has a plurality of square-shaped first colored pixels in a checkered pattern.
  • Dry etching is preferably performed in the following manner from the viewpoint of forming a pattern cross section closer to a rectangle and reducing damage to the support.
  • a mixed gas of fluorine-based gas and oxygen gas (O 2 ) a first stage etching is performed to a region (depth) where the support is not exposed, and a nitrogen gas ( N 2 ) and oxygen gas (O 2 ), and a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed.
  • N 2 nitrogen gas
  • O 2 oxygen gas
  • a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed
  • over-etching is performed after the support is exposed.
  • the form containing these is preferable.
  • Dry etching is performed by obtaining etching conditions in advance by the following method.
  • (1) The etching rate (nm / min) in the first stage etching and the etching rate (nm / min) in the second stage etching are calculated respectively.
  • (2) The time for etching the desired thickness in the first stage etching and the time for etching the desired thickness in the second stage etching are respectively calculated.
  • (3) The first-stage etching is performed according to the etching time calculated in (2).
  • the second stage etching is performed according to the etching time calculated in (2).
  • the etching time may be determined by endpoint detection, and the second stage etching may be performed according to the determined etching time.
  • Overetching time is calculated with respect to the total time of (3) and (4), and overetching is performed.
  • the mixed gas used in the first stage etching step preferably contains a fluorine-based gas and an oxygen gas (O 2 ) from the viewpoint of processing the organic material that is the film to be etched into a rectangular shape.
  • the first stage etching process can avoid damage to the support body by etching to a region where the support body is not exposed.
  • the second etching step and the over-etching step may be performed by etching the region where the support is not exposed by the mixed gas of fluorine-based gas and oxygen gas in the first etching process, and then damaging the support. From the viewpoint of avoidance, it is preferable to perform the etching process using a mixed gas of nitrogen gas and oxygen gas.
  • the ratio between the etching amount in the first stage etching process and the etching amount in the second stage etching process is preferably in the range of more than 0% and not more than 50%. 10 to 20% is more preferable.
  • the etching amount is an amount calculated from the difference between the remaining film thickness to be etched and the film thickness before etching.
  • the etching preferably includes an over-etching process.
  • the overetching process is preferably performed by setting an overetching ratio. Moreover, it is preferable to calculate the overetching ratio from the etching process time to be performed first.
  • the over-etching ratio can be arbitrarily set, but it is preferably 30% or less of the etching processing time in the etching process, and preferably 5 to 25% from the viewpoint of etching resistance of the photoresist and maintaining the rectangularity of the pattern to be etched. Is more preferable, and 10 to 15% is particularly preferable.
  • the resist pattern that is, etching mask
  • the removal of the resist pattern preferably includes a step of applying a stripping solution or a solvent on the resist pattern so that the resist pattern can be removed, and a step of removing the resist pattern using cleaning water.
  • Examples of the step of applying a stripping solution or solvent on the resist pattern so that the resist pattern can be removed include, for example, a step of applying a stripping solution or solvent on at least the resist pattern and stagnating for a predetermined time to perform paddle development Can be mentioned.
  • time to make stripping solution or a solvent stagnant It is preferable that it is several dozen seconds to several minutes.
  • examples of the step of removing the resist pattern using the cleaning water include a step of removing the resist pattern by spraying the cleaning water onto the resist pattern from a spray type or shower type spray nozzle.
  • the washing water pure water can be preferably used.
  • examples of the injection nozzle include an injection nozzle in which the entire support is included in the injection range, and an injection nozzle that is a movable injection nozzle and in which the movable range includes the entire support. When the spray nozzle is movable, the resist pattern is more effectively removed by moving the support pattern from the center of the support to the end of the support more than twice during the process of removing the resist pattern and spraying the cleaning water. be able to.
  • the stripping solution generally contains an organic solvent, but may further contain an inorganic solvent.
  • organic solvents include 1) hydrocarbon compounds, 2) halogenated hydrocarbon compounds, 3) alcohol compounds, 4) ether or acetal compounds, 5) ketones or aldehyde compounds, and 6) ester compounds.
  • the stripping solution preferably contains a nitrogen-containing compound, and more preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound.
  • the acyclic nitrogen-containing compound is preferably an acyclic nitrogen-containing compound having a hydroxyl group.
  • Specific examples include monoisopropanolamine, diisopropanolamine, triisopropanolamine, N-ethylethanolamine, N, N-dibutylethanolamine, N-butylethanolamine, monoethanolamine, diethanolamine, and triethanolamine.
  • they are monoethanolamine, diethanolamine, and triethanolamine, and more preferably monoethanolamine (H 2 NCH 2 CH 2 OH).
  • cyclic nitrogen-containing compounds include isoquinoline, imidazole, N-ethylmorpholine, ⁇ -caprolactam, quinoline, 1,3-dimethyl-2-imidazolidinone, ⁇ -picoline, ⁇ -picoline, ⁇ -picoline, 2- Preferred examples include pipecoline, 3-pipecoline, 4-pipecoline, piperazine, piperidine, pyrazine, pyridine, pyrrolidine, N-methyl-2-pyrrolidone, N-phenylmorpholine, 2,4-lutidine, and 2,6-lutidine.
  • NMP N-methyl-2-pyrrolidone
  • NMP N-methyl-2-pyrrolidone
  • the stripping solution preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound.
  • acyclic nitrogen-containing compound at least one selected from monoethanolamine, diethanolamine, and triethanolamine, and cyclic
  • the nitrogen-containing compound preferably includes at least one selected from N-methyl-2-pyrrolidone and N-ethylmorpholine, and more preferably includes monoethanolamine and N-methyl-2-pyrrolidone.
  • a deposit means an etching product deposited and deposited on the side wall of a colored layer.
  • the content of the non-cyclic nitrogen-containing compound is 9 parts by weight or more and 11 parts by weight or less with respect to 100 parts by weight of the stripping solution, and the content of the cyclic nitrogen-containing compound is 100 parts by weight of the stripping solution. On the other hand, what is 65 to 70 mass parts is desirable. Further, the stripping solution is preferably obtained by diluting a mixture of an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound with pure water.
  • the manufacturing method of this invention may have a well-known process as a manufacturing method of the color filter for solid-state image sensors as a process other than the above as needed.
  • a curing step of curing the formed colored pattern by heating and / or exposure may be included as necessary. Good.
  • the composition according to the present invention when used, for example, clogging of a nozzle or a piping part of a coating apparatus discharge part, contamination due to adhesion, sedimentation, or drying of a colored composition or pigment in the coating machine may occur. . Therefore, in order to efficiently clean the contamination caused by the composition of the present invention, it is preferable to use the solvent related to the present composition as the cleaning liquid.
  • the solvent related to the present composition as the cleaning liquid.
  • JP-A-7-128867, JP-A-7-146562, JP-A-8-278737, JP-A-2000-273370, JP-A-2006-85140, JP-A-2006-291191 The cleaning liquids described in JP2007-2101A, JP2007-2102A, JP2007-281523A, etc.
  • alkylene glycol monoalkyl ether carboxylates and alkylene glycol monoalkyl ethers are preferred.
  • These solvents may be used alone or in combination of two or more. When mixing 2 or more types, it is preferable to mix the solvent which has a hydroxyl group, and the solvent which does not have a hydroxyl group.
  • the mass ratio of the solvent having a hydroxyl group and the solvent having no hydroxyl group is from 1/99 to 99/1, preferably from 10/90 to 90/10, more preferably from 20/80 to 80/20.
  • the ratio is particularly preferably 60/40.
  • a surfactant related to the present composition described above may be added to the cleaning liquid.
  • the color filter of the present invention uses the composition of the present invention, the exposure can be performed with excellent exposure margin, and the formed colored pattern (colored pixel) is excellent in pattern shape, and the pattern surface is rough and developed. Since the residue in the portion is suppressed, the color characteristics are excellent.
  • the color filter of the present invention can be suitably used for a solid-state imaging device such as a CCD or CMOS, and is particularly suitable for a CCD or CMOS having a high resolution exceeding 1 million pixels.
  • the color filter for a solid-state imaging device of the present invention can be used as a color filter disposed between, for example, a light receiving portion of each pixel constituting a CCD or CMOS and a microlens for condensing light.
  • the size (pattern width) of the colored pattern (colored pixel) is preferably 2.5 ⁇ m or less, more preferably 2.0 ⁇ m or less, and particularly preferably 1.7 ⁇ m or less.
  • the solid-state imaging device of the present invention includes the above-described color filter of the present invention.
  • the configuration of the solid-state imaging device of the present invention is a configuration provided with the color filter in the present invention, and is not particularly limited as long as it is a configuration that functions as a solid-state imaging device. .
  • a transfer electrode comprising a plurality of photodiodes and polysilicon constituting a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) is provided on a support, and the photodiode and the transfer electrode are provided on the support.
  • a solid-state imaging device CCD image sensor, CMOS image sensor, etc.
  • light collecting means for example, a microlens, etc., the same applies hereinafter
  • the color filter of the present invention can be used not only for the solid-state imaging device but also for an image display device such as a liquid crystal display device or an organic EL display device, and is particularly suitable for use in a liquid crystal display device.
  • the liquid crystal display device provided with the color filter of the present invention can display a high-quality image with a good display image color and excellent display characteristics.
  • display devices For the definition of display devices and details of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, Kogyo Kenkyukai, 1990)”, “Display Device (Junsho Ibuki, Industrial Books Co., Ltd.) Issued in the first year).
  • the liquid crystal display device is described, for example, in “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, Industrial Research Co., Ltd., published in 1994)”.
  • the liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
  • the color filter of the present invention may be used in a color TFT liquid crystal display device.
  • the color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”.
  • the present invention is applied to a liquid crystal display device with a wide viewing angle, such as a horizontal electric field driving method such as IPS and a pixel division method such as MVA, STN, TN, VA, OCS, FFS, and R-OCB. it can.
  • the color filter in the present invention can be used for a bright and high-definition COA (Color-filter On Array) system.
  • COA Color-filter On Array
  • the required characteristics for the color filter layer require the required characteristics for the interlayer insulating film, that is, the low dielectric constant and the resistance to the stripping solution, in addition to the normal required characteristics as described above.
  • the color filter of the present invention since a dye multimer excellent in hue is used, the color purity, light transmittance, etc. are good and the color pattern (pixel) is excellent in hue, so the resolution is high and the long-term durability is excellent.
  • a COA type liquid crystal display device can be provided.
  • a resin film may be provided on the color filter layer.
  • the liquid crystal display device provided with the color filter of the present invention includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film.
  • the color filter of the present invention can be applied to a liquid crystal display device composed of these known members.
  • these components for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market (Kentaro Shima CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” Fuji Chimera Research Institute, Ltd., published in 2003) ”.
  • backlights SID meeting Digest 1380 (2005) (A. Konno et.al), Monthly Display December 2005, pages 18-24 (Yasuhiro Shima), pages 25-30 (Takaaki Yagi), etc. Are listed.
  • the color filter according to the present invention When the color filter according to the present invention is used in a liquid crystal display device, a high contrast can be realized when combined with a conventionally known three-wavelength tube of a cold cathode tube, and further, red, green and blue LED light sources (RGB-LED).
  • RGB-LED red, green and blue LED light sources
  • Pigment Dispersion Composition 1 Zinc halide phthalocyanine pigment (CI Pigment Green 58) 9.59 parts by weight Yellow pigment (CI Pigment Yellow 185) 4.11 parts by weight The following dye derivative (I-1) 1.37 parts by weight Dispersant (C-1) 4.93 parts by mass Propylene glycol monomethyl ether acetate (PGMEA) 80.0 parts by mass
  • a colored photosensitive resin composition was prepared by uniformly stirring and mixing a mixture having the following composition.
  • Pigment dispersion composition 1 65.7 parts by mass
  • Resin binder 1 1.24 parts by mass (as 40% by mass resin solution)
  • Photopolymerization initiator 1.2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)] (manufactured by BASF, IRGACURE OXE01)
  • Ethylenically unsaturated compound Dipentaerythritol hexaacrylate modified with ethylene oxide (manufactured by Shin-Nakamura Chemical Co., Ltd., NK Ester A-DPH-12E))
  • 2.34 parts by mass Fluorosurfactant (Dainippon Ink Co., Ltd., MegaFuck F- 781F) 0.02 parts by mass p-methoxyphenol 0.0003 parts by mass Propylene glycol
  • Colored photosensitive resin compositions 2 to 15 were prepared in the same manner as the colored photosensitive resin composition 1 except that the composition content was changed to the composition shown in Table 1 below.
  • the derivative A, derivative (I-2), derivative (II-1), and derivative (II-2) used in the colored photosensitive resin compositions 2 to 12 are represented by the following structural formula.
  • Pattern linearity >> The pattern substrate obtained above was observed from above using a length measuring SEM (S-4800, manufactured by Hitachi).
  • Viscosity change before and after aging is 3.0% or less.
  • 4 The viscosity change before and after aging is more than 3.0% and 5.0% or less.
  • 3 The viscosity change before and after aging is more than 5.0% and 10.0% or less.
  • 2 The viscosity change before and after aging is more than 10.0% and 30.0% or less.
  • 1 Viscosity change before and after aging exceeds 30.0%.
  • Luminance unevenness The colored photosensitive resin compositions of Examples and Comparative Examples obtained above were applied on a glass substrate using a spin coater so that the film thickness after drying was 0.8 ⁇ m, and prebaked at 100 ° C. for 120 seconds. Thus, a colored coating film was obtained.
  • Each colored coating obtained was placed between the observation lens and the light source of the optical microscope, irradiated with light toward the observation lens, and transmitted through an optical microscope in which a digital camera with a magnification of 1000 was installed. The light state was observed.
  • the digital camera installed in the optical microscope is equipped with a CCD with 1.28 million pixels, and the surface of the colored coating film in the transmitted light state was photographed with the digital camera.
  • the photographed image was stored as digitally converted data (digital image) in an 8-bit bitmap format.
  • photography of the coating film surface of a colored coating film was performed with respect to 20 area
  • the digitally converted data was digitized and stored as a density distribution of 256 gradations in which the luminance of each of the three primary colors RGB was 0 to 255.
  • the stored digital image was divided into a grid shape so that one grid size corresponds to 0.5 ⁇ m square on the actual substrate, and the luminance in one section was averaged.
  • the total number of sections in one area was 636416.
  • an arbitrary luminance and the average luminance of all adjacent sections adjacent to it were measured.
  • a section having a difference from the average brightness of the adjacent section of 5% or more was recognized as a significant difference section, and the average total number of significant difference sections in all regions was calculated. The smaller the numerical value, the smaller the density difference between adjacent sections, the less the luminance unevenness, and the better the characteristics as a color filter.
  • ⁇ Criteria ⁇ 5 The number of significant difference sections is 2000 or less. 4: The number of significant difference compartments is 2001 to 3000. 3: The number of significant difference compartments is 3001 to 5000. 2: The number of significant difference compartments is 5001 to 10,000. 1: The number of significant difference sections is 10001 or more.
  • each symbol means the following compound.
  • PG58 zinc halide phthalocyanine pigment (CI Pigment Green 58)
  • PY139 Isoindoline yellow pigment (CI Pigment Yellow 139)
  • PY150 Nickel azo yellow pigment (CI Pigment Yellow 150)
  • PY185 Isoindoline yellow pigment (CI Pigment Yellow 185)
  • PG36 Copper halide phthalocyanine pigment (CI Pigment Green 36)
  • Unsubstituted Zn phthalocyanine pigment non-halogenated zinc phthalocyanine pigment
  • the photosensitive resin composition of the present invention shown in Examples includes (A) a zinc halide phthalocyanine pigment and (B) a dye derivative having a specific structure, which are essential components for the composition of the present invention. It can be seen that lithography, pattern linearity, stability, and luminance unevenness are greatly improved.

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  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

La présente invention concerne une composition de résine colorante et photosensible qui contient (A) un pigment phtalocyanine de zinc halogéné, (B-1) un dérivé de colorant représenté par la formule générale (I) et/ou (B-2) un dérivé de colorant représenté par la formule générale (II), (C) un agent dispersant, (D) un initiateur de photo-polymérisation et (E) un composé polymérisable. La teneur en agent dispersant (C) est de 20 à 40 parties en masse pour 100 parties en masse du pigment.
PCT/JP2014/069023 2013-08-05 2014-07-17 Composition de résine colorante photosensible, film durci, filtre coloré, procédé de fabrication de filtre coloré, élément d'imagerie à semi-conducteurs et dispositif d'affichage d'image WO2015019819A1 (fr)

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JP2013-162162 2013-08-05
JP2013162162A JP6147135B2 (ja) 2013-08-05 2013-08-05 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置

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JP (1) JP6147135B2 (fr)
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CN111522199A (zh) * 2020-04-21 2020-08-11 武汉华星光电技术有限公司 光阻及其制备方法、显示装置
US20200348595A1 (en) * 2018-01-23 2020-11-05 Jsr Corporation Composition, film, and production method of patterned substrate
CN112739726A (zh) * 2018-09-26 2021-04-30 富士胶片株式会社 着色组合物、固化膜的形成方法、滤色器的制造方法及显示装置的制造方法

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KR102132194B1 (ko) * 2016-02-15 2020-07-09 후지필름 가부시키가이샤 착색 경화성 조성물, 컬러 필터, 고체 촬상 소자, 화상 표시 장치, 및 경화막의 제조 방법
TWI829777B (zh) * 2018-10-15 2024-01-21 日商富士軟片股份有限公司 結構體、固體攝像元件及圖像顯示裝置
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CN112739726B (zh) * 2018-09-26 2023-09-19 富士胶片株式会社 着色组合物、固化膜的形成方法、滤色器的制造方法及显示装置的制造方法
CN111522199A (zh) * 2020-04-21 2020-08-11 武汉华星光电技术有限公司 光阻及其制备方法、显示装置
CN111522199B (zh) * 2020-04-21 2023-11-28 武汉华星光电技术有限公司 光阻及其制备方法、显示装置

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