WO2015019805A1 - 透光性導電部材およびそのパターニング方法 - Google Patents
透光性導電部材およびそのパターニング方法 Download PDFInfo
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- WO2015019805A1 WO2015019805A1 PCT/JP2014/068813 JP2014068813W WO2015019805A1 WO 2015019805 A1 WO2015019805 A1 WO 2015019805A1 JP 2014068813 W JP2014068813 W JP 2014068813W WO 2015019805 A1 WO2015019805 A1 WO 2015019805A1
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/94—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the way in which the control signals are generated
- H03K17/96—Touch switches
- H03K17/962—Capacitive touch switches
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
Definitions
- the present invention relates to a translucent conductive member in which a conductive region and a non-conductive region are divided, and a patterning method thereof.
- the translucent conductive member disposed in front of the display panel is used as an electrostatic touch panel or the like.
- Patent Document 1 discloses a translucent conductive layer in which a network of conductive nanowires is embedded in a resin layer. Since this conductive layer is resistant to physical external forces such as bending stress, it is suitable for use in a translucent conductive member or the like having a resin film that can be bent and deformed as a base material.
- patterning can be performed in which the conductive nanowires are dissolved by an etching process to partially form non-conductive regions.
- etching process to partially form non-conductive regions.
- optical characteristics such as light transmission characteristics between the conductive region where the conductive nanowire is left and the non-conductive region where the conductive nanowire is removed.
- Patent Document 1 describes a step of chemically transforming a part of conductive nanowires into non-conductive nanowires or high resistivity nanowires.
- an oxidizing agent is applied to the region to be made non-conductive to convert the silver nanowires into an insoluble metal salt to be made non-conductive.
- a part of the nanowire is exposed on the surface of the conductive layer in order to ensure conductivity with a metal layer or the like formed thereon. Therefore, when an oxidizing agent is applied to the region to be made non-conductive, the nanowire exposed on the surface of the conductive layer becomes a metal oxide compound and remains as a cloudy substance, and the optical characteristics of the region to be made non-conductive deteriorate. is there.
- Patent Document 1 exemplifies an oxidizing salt such as hypochlorite as an oxidizing agent and an organic oxidizing agent such as tetracyanoquinodimethane (TCNQ).
- oxidizing salt such as hypochlorite
- organic oxidizing agent such as tetracyanoquinodimethane (TCNQ)
- TCNQ tetracyanoquinodimethane
- these oxidants do not have adequate penetration into the overcoat layer, which is a resin layer in which the silver nanowire network is embedded, and precisely control the patterning to distinguish between conductive and non-conductive regions. It is difficult.
- a lead layer or the like is formed of a metal layer such as copper or silver on a conductive layer including silver nanowires, a problem that the metal layer is easily damaged occurs.
- the present invention solves the above-described conventional problems.
- a part of a conductive layer is modified to a non-conductive region, the difference in optical characteristics between the conductive region and the non-conductive region can be reduced. It aims at providing a photoconductive member.
- the present invention relates to a translucent conductive member in which a conductive layer in which silver nanowires are embedded in an overcoat layer is formed on the surface of a translucent substrate.
- the conductive layer is divided into a conductive region and a non-conductive region having a surface resistivity higher than that of the conductive region, and at least a part of the silver nanowire embedded in the overcoat layer is in the non-conductive region.
- silver iodide is not exposed from the surface of the overcoat layer, or the amount of silver iodide exposed on the surface of the overcoat layer in the nonconductive region
- the amount of silver nanowires exposed on the surface of the overcoat layer in the region is smaller.
- the translucent conductive member of the present invention has a surface resistivity higher than that of the conductive region without significantly changing the light transmittance with the conductive region by transforming silver nanowires in the non-conductive region into silver iodide. Can do. In the non-conductive region, there is little or no silver iodide present on the surface of the overcoat layer, so there is almost no cloudy silver iodide on the surface of the non-conductive layer. The haze of the conductive region is small and transparency can be maintained high.
- the amount of nanowires exposed on the surface of the overcoat layer means the total per unit area of the mass of nanowires exposed on the surface. Or the area ratio which the nanowire exposed on the surface occupies within a unit area is meant.
- the patterning method of the translucent light guide member of the present invention is as follows. Using a translucent laminate in which a conductive layer in which silver nanowires are embedded in an overcoat layer is formed on the surface of a translucent substrate, Covering a part of the conductive layer with a resist layer; Treating the surface of the conductive layer not covered with the resist layer with an iodine solution to iodide at least a portion of the silver nanowires; And a step of applying a thiosulfate solution to the surface of the conductive layer not covered with the resist layer to remove silver iodide exposed on the surface of the overcoat layer. .
- the iodine solution is an iodine iodine iodide solution, and the iodine concentration in the solution is preferably 0.05 to 1.0% by mass, and the potassium iodide concentration is preferably 0.1 to 5.0% by mass. .
- the thiosulfate solution is a sodium thiosulfate solution, and the concentration of sodium thiosulfate is preferably 1.0 to 25% by mass.
- the iodide is exposed on the surface of the overcoat layer by providing a step of removing silver iodide after the treatment step of iodinating the silver nanowires.
- Silver nanowires can be removed, the haze of the insulating layer is small, and transparency can be improved.
- the iodine iodide salt solution easily penetrates into the overcoat layer and easily transforms silver nanowires in the conductive layer not covered with the resist layer into silver iodide. Patterning can be performed with high accuracy.
- the thiosulfate solution does not easily penetrate into the acrylic overcoat layer and has little influence on the iodinated silver nanowires existing inside the overcoat layer in the non-conductive region. Therefore, silver nanowires with increased surface resistance can be left inside the overcoat layer even after the treatment to remove the silver iodide exposed on the surface of the overcoat layer by applying a thiosulfate solution. The difference in optical characteristics between the non-conductive region and the conductive region can be reduced. Also, the thiosulfate solution hardly penetrates into the overcoat layer, and there is little residual liquid inside the overcoat layer. Furthermore, the thiosulfate solution has a low oxidizing power, and it is formed as a lead layer on the surface of the conductive region. It becomes difficult to damage copper and silver.
- silver nanowires in some regions are transformed into non-conductive or high-resistance silver iodide, so that the conductive regions and non-conductive regions are not removed without completely removing the silver nanowires.
- the conductive region can be separated.
- silver iodide is hardly exposed on the surface of the overcoat layer in the non-conductive region, it is possible to suppress the white turbidity or whitening of the metal compound remaining on the surface of the non-conductive region and to improve the light transmittance. Can be.
- the difference in optical characteristics between the nonconductive region and the conductive region can be reduced.
- the patterning for partitioning the conductive region and the non-conductive region is performed. It becomes easy to control. Moreover, the silver iodide exposed on the surface of the overcoat layer is removed with the thiosulfate solution, but the thiosulfate solution is difficult to penetrate into the overcoat layer, so that the liquid remains in the overcoat layer. In addition, the oxidizing power of the thiosulfate solution is low, and it is easy to prevent damage to the metal layer formed on the overcoat layer.
- iodination treatment of silver nanowires using iodine solution and silver iodide removal treatment using thiosulfate solution are performed in different steps. For example, if processing is performed once using a mixed solution of an iodine solution and a thiosulfate solution, the silver nanowires in the overcoat layer are dissolved, and the optical characteristics of the non-conductive region are greatly changed. However, in the method of the present invention, by separating the two steps, the silver iodide on the surface of the overcoat layer can be removed with the silver nanowires iodinated remaining inside the overcoat layer. It is possible to reduce the difference in optical characteristics between the conductive region having the silver nanowire inside the overcoat layer and the non-conductive region.
- FIG. 4 is an exploded perspective view showing a portable electronic device equipped with the translucent conductive member of the present invention,
- the top view which shows the pattern of the conductive layer of a translucent conductive member, Expansion explanatory diagram of the pattern of the conductive layer,
- the perspective view which shows the basic structure of a translucent conductive member,
- Explanatory drawing which shows the patterning method of a translucent conductive member,
- the electronic device 1 shown in FIG. 1 is a portable electronic device, and is used as an information communication terminal, a mobile phone, a portable game machine, a portable navigation device, or the like.
- the electronic device 1 is configured by combining an input panel 6 and a display panel 5.
- the display panel 5 is a color liquid crystal panel or an electrochromic display element having a backlight.
- a back film 3 such as PET is bonded to the back of the input panel 6.
- An ITO layer 4 is provided on the entire surface of the back film 3, and the ITO layer 4 is set to the ground potential.
- a translucent cover panel 2 is attached in front of the input panel 6.
- the input panel 6 is an electrostatic touch panel that can detect an input coordinate position by a capacitance change.
- the input panel 6 is composed of a translucent conductive member 10 shown in FIG.
- the translucency in this specification is not limited to pure transparency, and preferably includes, for example, a total light transmittance of 80% or more.
- the translucent conductive member 10 shown in FIG. 4 has a translucent base film 11.
- the base film 11 is a translucent film represented by a PET (polyethylene terephthalate) film, a PC (polycarbonate) film, a COP (cycloolefin polymer) film, and the like.
- a translucent conductive layer 12 is formed on the surface 11 a of the base film 11.
- the conductive layer 12 is configured by laminating a silver nanowire network 13 that is an aggregate of silver nanowires 13a on a surface 11a, and covering the surface with a translucent overcoat layer 14 such as acrylic.
- the conductive layer 12 has a structure in which silver nanowires 13a are embedded in an overcoat layer 14 serving as a translucent resin layer. Further, as exaggeratedly shown in the cross-sectional view of FIG. 5, a part of the silver nanowire network 13 protrudes from the surface of the overcoat layer 14 and is exposed to form a metal layer formed on the conductive layer 12. The contact resistance with the conductive layer 12 can be reduced.
- the thickness of the base film 11 is about 50 to 300 ⁇ m, and the thickness of the conductive layer 12 is about 100 nm.
- the silver nanowire 13 a is transformed into a non-conductive region 25 in a partial region, and the non-transformed region becomes a conductive region 20.
- the conductive region 20 is divided into a first electrode portion 21, a connection conductive portion 22, and a second electrode portion 23.
- the first electrode portion 21 has a quadrangular shape or a rhombus shape, and is arranged in the Y direction.
- the first electrode portion 21 and the first electrode portion 21 that are adjacent to each other in the Y direction are electrically connected by a connection conduction portion 22.
- electrical_connection part 22 are formed continuously.
- the second electrode portion 23 has the same shape and the same area as the first electrode portion 21. However, the first electrode part 21 and the second electrode part 23 may be formed with different shapes and different areas.
- the second electrode portions 23 are formed independently of each other so as to sandwich the connection conducting portion 22, and each is linearly arranged in the X direction. A region between the first electrode portion 21 and the connection conducting portion 22 and the second electrode portion 23 is electrically separated through a non-conductive region 25.
- an organic insulating layer extends between the connection conductive portion 22, the nonconductive region 25 on both sides thereof, and the second electrode portions 23 on both sides thereof. 31 is formed.
- the organic insulating layer 31 is formed of an acrylic translucent organic insulating material such as a novolac resin.
- Bridge wiring 32 is formed on the surface of the organic insulating layer 31, and the second electrode portions 23 arranged in the X direction are electrically connected by the bridge wiring 32.
- the bridge wiring 32 is formed of a wiring material typified by Cu, Ni, Ag, Au, ITO or the like. Or it forms in a single layer with various alloy materials. Alternatively, a stacked conductive layer in which a plurality of conductive materials are stacked is formed. The bridge wiring 31 is formed thin and thin so that it is difficult to see.
- the Y extraction electrode layer 35 is connected to the first electrode portion 21 connected in the Y direction.
- a plurality of first land portions 36 are formed at the edge of the input panel 6, and each Y extraction electrode layer 35 is individually connected to the first land portion 36.
- the second electrode layer 23 connected in the X direction by the bridge wiring 31 is connected to the X extraction electrode layer 37 for each row.
- Each X lead electrode layer 37 is individually connected to the second land portion 38.
- an electrostatic capacity is formed between the first electrode portion 21 and the second electrode portion 23, but when the finger is brought into contact with the surface of the cover panel 2, the first electrode portion 21 is formed.
- a capacitance is formed between the second electrode portion 23 and the finger.
- pulsed driving power By applying pulsed driving power to the first electrode unit 21 in order for each column and measuring the current values detected from all the second electrode units 23, a plurality of first electrodes It can be calculated which part 21 is closest to the finger.
- pulse-like driving power is sequentially applied to the second electrode unit 23 for each column, and the current values detected from all the first electrode units 21 are measured, whereby a plurality of second power units are measured. It can be calculated which of the electrode parts 23 is closest to the finger.
- the present invention is not limited to the case where the first electrode portion 21 and the second electrode portion 23 are formed on the same surface of the base film 11, and a film on which an electrode continuous in the X direction is formed It may be an input panel in which two films of films on which electrodes continuous in the Y direction are formed are stacked. Or the some independent electrode part may be provided and each electrode part and the land part 36 may be connected individually.
- FIG. 5 (A) schematically shows a cross-sectional structure of the translucent conductive member 10 before patterning.
- a conductive layer 12 is provided on the surface 11 a of the base film 11.
- a silver nanowire network 13 is embedded in the overcoat layer 14. Although exaggerated in the figure, a part of the silver nanowire 13 a is exposed on the surface of the overcoat layer 14.
- a positive type or negative type photoresist or film resist is formed on the conductive layer 12.
- the photoresist is formed by various methods such as a spin coating method and a roll coating method so that the film thickness becomes about 1 ⁇ m to 5 ⁇ m. When a film resist is used, the film thickness is about 20 ⁇ m.
- the photoresist is partially exposed.
- the conductive layer exposed in the subsequent development process is developed with an alkaline solution such as TMAH, so that a partial resist layer 41 remains as shown in FIG.
- the resist layer 41 is left in a portion that becomes the conductive region 20 that forms the first electrode portion 21, the coupling conductive portion 22, and the second electrode portion 23, and a photo of the portion that becomes the non-conductive region 25.
- the resist is removed.
- the iodine solution is an iodine iodide salt solution, for example, an iodine iodide iodide solution.
- the iodine potassium iodide solution is a solution in which iodine is dissolved in the potassium iodide solution, and contains 0.05 to 1.0% by mass of iodine and about 0.1 to 5.0% by mass of potassium iodide. Aqueous solution is used.
- the translucent conductive member 10 on which the resist layer 41 is formed is immersed in a potassium iodide iodide solution for about 0.5 to 10 minutes, so that the inside of the overcoat layer 14 is not covered with the resist layer 41.
- the solution permeates into at least a portion of the silver nanowires 13a and is transformed into silver iodide.
- the silver nanowires 13a are iodinated, so that the area resistivity of the conductive layer 12 in the region is increased, and a non-conductive region that substantially exhibits an electrical insulating function. 25.
- the silver nanowires exposed on the surface of the overcoat layer 14 are iodinated and whitened or whitened in the region to be the non-conductive region 25.
- a metal compound is produced.
- a metal compound such as a white turbid or whitened silver iodide on the surface of the overcoat layer 14 is removed using a thiosulfate solution.
- a thiosulfate solution a sodium thiosulfate solution having a concentration of 1.0 to 25% by mass is used.
- the conductive layer 12 is divided into a conductive region 20 and a non-conductive region 25 as shown in FIG. As shown in FIGS. 2 and 3, the first electrode portion 21, the connecting conductive portion 22, and the third electrode portion 23 are formed by the conductive region 20.
- the non-conductive region 25 becomes non-conductive because it contains silver iodide, or the area resistivity is significantly higher than that of the conductive region 20.
- the silver nanowires iodinated remain inside the overcoat layer 14, so that the difference in optical characteristics with the conductive region 20 in which the silver nanowires exist is small. Therefore, there is no significant difference in the transmission characteristics of display light from the display panel 5 between the conductive region 20 and the non-conductive region 25.
- silver iodide appearing on the surface of the overcoat layer 14 is removed.
- the amount of silver iodide appearing on the surface of the overcoat layer 14 is significantly smaller than the amount of silver nanowires 13 a exposed on the surface of the overcoat layer 14 in the conductive region 20.
- the iodination treatment of the silver nanowires 13a using an iodine solution and the removal treatment of a cloudy metal compound such as a silver iodide using a thiosulfate solution are performed in different steps. For example, if processing is performed once using a mixed solution of an iodine solution and a thiosulfate solution, the silver nanowires in the overcoat layer are dissolved, and the optical characteristics of the non-conductive region are greatly changed.
- a metal compound such as silver iodide on the surface of the overcoat layer is removed in a state where the silver nanowires iodinated remain inside the overcoat layer. It is possible to reduce the difference in optical characteristics between the conductive region having silver nanowires therein and the non-conductive region.
- a transparent conductive member 10 having a conductive layer 12 having a thickness of about 100 nm formed of a silver nanowire network 13 and an acrylic overcoat layer 14 is formed on the surface of a PET film.
- the conductive region and the non-conductive region were patterned.
- the silver nanowire In the iodination treatment of the silver nanowire, it was immersed for 120 seconds in an iodine iodide solution having an iodine concentration of 0.1% by mass and a potassium iodide concentration of 0.5% by mass. In the removal treatment of the metal compound such as silver iodide remaining on the surface of the overcoat layer 14, it was immersed in a sodium thiosulfate solution having a concentration of 10% by mass for 30 seconds.
- Comparative example A comparative example using the same translucent conductive member 10 as in the example, etching a region having the same area as the non-conductive region shown in FIG. 6 with an aqua regia etchant, and dissolving the silver nanowires in the overcoat layer 14 It was.
- Table 1 compares the optical characteristics of the example and the comparative example. Examples in Table 1 show the haze and total light transmittance of the conductive layer, that is, the conductive region before treatment, and the haze and total light transmittance of the non-conductive region that was treated with the iodine iodide solution and sodium thiosulfate. The rate is compared.
- the comparative example in Table 1 compares the haze and total light transmittance of the conductive layer before the treatment without etching with the haze and total light transmittance of the region where the silver nanowire was etched with the aqua regia etchant.
- the haze of the non-conductive region is lower than that of the conductive region, but it can be seen that the haze of the non-conductive region is much better than the haze of the region from which the silver nanowires are removed in the comparative example.
- the optical contrast between the conductive region and the non-conductive region is as shown in FIG.
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Abstract
Description
前記導電層が、導電領域と、前記導電領域よりも表面抵抗率の高い非導電領域とに区分され、前記非導電領域で、前記オーバーコート層に埋設されている銀ナノワイヤの少なくとも一部がヨウ化されており、
前記非導電領域では、前記オーバーコート層の表面から銀ヨウ化物が露出していないか、または、前記非導電領域における前記オーバーコート層の表面に露出している銀ヨウ化物の量が、前記導電領域において前記オーバーコート層の表面に露出している銀ナノワイヤの量よりも少ないことを特徴とするものである。
透光性の基材の表面に、オーバーコート層に銀ナノワイヤが埋設された導電層が形成された透光性の積層材を使用し、
前記導電層の一部をレジスト層で覆う工程と、
レジスト層で覆われていない導電層の表面をヨウ素液で処理して、銀ナノワイヤの少なくとも一部をヨウ化する工程と、
レジスト層で覆われていない導電層の表面に、チオ硫酸塩溶液を与えて、オーバーコート層の表面に露出している銀ヨウ化物を除去する工程と、を有することを特徴とするものである。
PETフィルムの表面に、銀ナノワイヤネットワーク13とアクリル系のオーバーコート層14とから成る厚さが約100nmの導電層12が形成された透光性導電部材10を使用し、図6に示すように、導電領域と非導電領域をパターニングした。
実施例と同じ透光性導電部材10を使用し、図6に示す非導電領域と同じ面積の領域を、王水系エッチャントでエッチングし、オーバーコート層14内の銀ナノワイヤを溶解したものを比較例とした。
表1の実施例は、処理前の導電層すなわち導電領域のヘイズならびに全光線透過率と、ヨウ素ヨウ化カリウム溶液の処理とチオ硫酸ナトリウムの処理とを行った非導電領域のヘイズならびに全光線透過率とを比較している。
5 表示パネル
6 入力パネル
10 透光性導電部材
11 基材フィルム
11a 表面
12 導電層
13 銀ナノワイヤネットワーク
13a 銀ナノワイヤ
14 オーバーコート層
20 導電領域
21 第1の電極部
22 連結導電部
23 第2の電極部
25 非導電領域
41 レジスト層
Claims (6)
- 透光性の基材の表面に、オーバーコート層に銀ナノワイヤが埋設された導電層が形成されている透光性導電部材において、
前記導電層が、導電領域と、前記導電領域よりも表面抵抗率の高い非導電領域とに区分され、前記非導電領域で、前記オーバーコート層に埋設されている銀ナノワイヤの少なくとも一部がヨウ化されており、
前記非導電領域では、前記オーバーコート層の表面から銀ヨウ化物が露出していないか、または、前記非導電領域における前記オーバーコート層の表面に露出している銀ヨウ化物の量が、前記導電領域において前記オーバーコート層の表面に露出している銀ナノワイヤの量よりも少ないことを特徴とする透光性導電部材。 - 透光性の基材の表面に、オーバーコート層に銀ナノワイヤが埋設された導電層が形成された透光性の積層材を使用し、
前記導電層の一部をレジスト層で覆う工程と、
レジスト層で覆われていない導電層の表面をヨウ素液で処理して、銀ナノワイヤの少なくとも一部をヨウ化する工程と、
レジスト層で覆われていない導電層の表面に、チオ硫酸塩溶液を与えて、オーバーコート層の表面に露出している銀ヨウ化物を除去する工程と、
を有することを特徴とする透光性導電部材のパターニング方法。 - 前記ヨウ素液は、ヨウ素ヨウ化カリウム溶液である請求項2記載の透光性導電部材のパターニング方法。
- ヨウ素ヨウ化カリウム溶液中のヨウ素の濃度が0.05~1.0質量%、ヨウ化カリウムの濃度が0.1~5.0質量%である請求項3記載の透光性導電部材のパターニング方法。
- チオ硫酸塩溶液が、チオ硫酸ナトリウム溶液である請求項1ないし4のいずれかに記載の透光性導電部材のパターニング方法。
- チオ硫酸ナトリウムの濃度が1.0~25質量%である請求項5記載の透光性導電部材のパターニング方法。
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018101209A1 (ja) * | 2016-12-02 | 2018-06-07 | アルプス電気株式会社 | 透明電極部材およびその製造方法、ならびに該透明電極部材を用いた静電容量式センサ |
JP2018517238A (ja) * | 2015-04-16 | 2018-06-28 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | パターニングされた透明導電膜及びこのようなパターニングされた透明導電膜の製造方法 |
KR101913282B1 (ko) * | 2017-12-29 | 2018-10-30 | (주)아이테드 | 투명전극 제조방법 |
WO2019181772A1 (ja) | 2018-03-22 | 2019-09-26 | アルプスアルパイン株式会社 | 透明電極部材、積層透明電極部材および静電容量式センサ |
WO2019181396A1 (ja) | 2018-03-23 | 2019-09-26 | アルプスアルパイン株式会社 | 入力装置および入力装置付き表示装置 |
JP2020030448A (ja) * | 2018-08-20 | 2020-02-27 | 地方独立行政法人大阪産業技術研究所 | 静電容量式タッチセンサおよびその製造方法 |
US11119617B2 (en) | 2018-03-14 | 2021-09-14 | Alps Alpine Co., Ltd. | Transparent electrode member, multilayer transparent electrode member, and capacitive sensor |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102248460B1 (ko) * | 2014-08-08 | 2021-05-07 | 삼성디스플레이 주식회사 | 터치 스크린 패널 및 그 제조 방법 |
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US11435863B1 (en) * | 2021-04-15 | 2022-09-06 | Tpk Advanced Solutions Inc. | Touch sensor and manufacturing method thereof |
DE102021126955A1 (de) * | 2021-10-18 | 2023-04-20 | Heine Optotechnik Gmbh & Co. Kg | Otoskop |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010507199A (ja) | 2006-10-12 | 2010-03-04 | カンブリオス テクノロジーズ コーポレイション | ナノワイヤベースの透明導電体およびその適用 |
JP2011060686A (ja) * | 2009-09-14 | 2011-03-24 | Konica Minolta Holdings Inc | パターン電極の製造方法及びパターン電極 |
JP2013073748A (ja) * | 2011-09-27 | 2013-04-22 | Toshiba Corp | 透明電極積層体およびその製造方法 |
JP2013137982A (ja) * | 2011-04-14 | 2013-07-11 | Fujifilm Corp | 導電性部材、導電性部材の製造方法、タッチパネルおよび太陽電池 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4438685B2 (ja) * | 2005-05-23 | 2010-03-24 | セイコーエプソン株式会社 | 透明導電膜とその形成方法、電気光学装置、及び電子機器 |
CN102087885A (zh) * | 2009-12-08 | 2011-06-08 | 中国科学院福建物质结构研究所 | 平坦化的银纳米线透明导电薄膜及其制备方法 |
TWI549900B (zh) * | 2010-03-23 | 2016-09-21 | 坎畢歐科技公司 | 奈米結構透明導體之圖案化蝕刻 |
JP2011219363A (ja) * | 2010-04-02 | 2011-11-04 | Idemitsu Kosan Co Ltd | ホモアダマンタン誘導体、その製造方法及びフォトレジスト用感光性材料 |
JP2013175152A (ja) * | 2012-01-24 | 2013-09-05 | Dexerials Corp | 透明導電性素子およびその製造方法、入力装置、電子機器、ならびに薄膜のパターニング方法 |
JP5865851B2 (ja) * | 2012-03-23 | 2016-02-17 | 富士フイルム株式会社 | 導電性部材の製造方法、導電性部材、それを用いたタッチパネル |
KR20150095247A (ko) | 2014-02-13 | 2015-08-21 | 한국전자통신연구원 | 단말 접속 제어 장치 및 단말 접속 제어 방법 |
-
2014
- 2014-07-15 CN CN201480044544.6A patent/CN105474140B/zh not_active Expired - Fee Related
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- 2014-07-15 JP JP2015530771A patent/JP6058141B2/ja not_active Expired - Fee Related
-
2016
- 2016-01-25 US US15/005,428 patent/US9965124B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010507199A (ja) | 2006-10-12 | 2010-03-04 | カンブリオス テクノロジーズ コーポレイション | ナノワイヤベースの透明導電体およびその適用 |
JP2011060686A (ja) * | 2009-09-14 | 2011-03-24 | Konica Minolta Holdings Inc | パターン電極の製造方法及びパターン電極 |
JP2013137982A (ja) * | 2011-04-14 | 2013-07-11 | Fujifilm Corp | 導電性部材、導電性部材の製造方法、タッチパネルおよび太陽電池 |
JP2013073748A (ja) * | 2011-09-27 | 2013-04-22 | Toshiba Corp | 透明電極積層体およびその製造方法 |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018517238A (ja) * | 2015-04-16 | 2018-06-28 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | パターニングされた透明導電膜及びこのようなパターニングされた透明導電膜の製造方法 |
WO2018101209A1 (ja) * | 2016-12-02 | 2018-06-07 | アルプス電気株式会社 | 透明電極部材およびその製造方法、ならびに該透明電極部材を用いた静電容量式センサ |
CN110023888A (zh) * | 2016-12-02 | 2019-07-16 | 阿尔卑斯阿尔派株式会社 | 透明电极构件及其制造方法和使用该透明电极构件的静电电容式传感器 |
CN110023888B (zh) * | 2016-12-02 | 2022-05-10 | 阿尔卑斯阿尔派株式会社 | 透明电极构件及其制造方法和使用该透明电极构件的静电电容式传感器 |
JPWO2018101209A1 (ja) * | 2016-12-02 | 2019-10-24 | アルプスアルパイン株式会社 | 透明電極部材およびその製造方法、ならびに該透明電極部材を用いた静電容量式センサ |
US10747383B2 (en) | 2016-12-02 | 2020-08-18 | Alps Alpine Co., Ltd. | Transparent electrode member, method of manufacturing the same, and capacitive sensor that uses transparent electrode member |
US11073953B2 (en) | 2016-12-02 | 2021-07-27 | Alps Alpine Co., Ltd. | Transparent electrode member, method of manufacturing the same, and capacitive sensor that uses transparent electrode member |
KR101913282B1 (ko) * | 2017-12-29 | 2018-10-30 | (주)아이테드 | 투명전극 제조방법 |
WO2019132243A1 (ko) * | 2017-12-29 | 2019-07-04 | (주)아이테드 | 투명전극 제조방법 |
US11469011B2 (en) | 2017-12-29 | 2022-10-11 | Ited Inc. | Method for producing transparent electrode |
US11119617B2 (en) | 2018-03-14 | 2021-09-14 | Alps Alpine Co., Ltd. | Transparent electrode member, multilayer transparent electrode member, and capacitive sensor |
CN111699461A (zh) * | 2018-03-22 | 2020-09-22 | 阿尔卑斯阿尔派株式会社 | 透明电极构件、层叠透明电极构件以及静电电容式传感器 |
KR20200100187A (ko) | 2018-03-22 | 2020-08-25 | 알프스 알파인 가부시키가이샤 | 투명 전극 부재, 적층 투명 전극 부재 및 정전 용량식 센서 |
WO2019181772A1 (ja) | 2018-03-22 | 2019-09-26 | アルプスアルパイン株式会社 | 透明電極部材、積層透明電極部材および静電容量式センサ |
US11847284B2 (en) | 2018-03-22 | 2023-12-19 | Alps Alpine Co., Ltd. | Transparent electrode member, multilayer transparent electrode member, and capacitive sensor |
KR20200106931A (ko) | 2018-03-23 | 2020-09-15 | 알프스 알파인 가부시키가이샤 | 입력 장치 및 입력 장치 부착 표시 장치 |
US11194434B2 (en) | 2018-03-23 | 2021-12-07 | Alps Alpine Co., Ltd. | Input device having transparent electrodes containing nanowires and display apparatus with input device |
WO2019181396A1 (ja) | 2018-03-23 | 2019-09-26 | アルプスアルパイン株式会社 | 入力装置および入力装置付き表示装置 |
JP2020030448A (ja) * | 2018-08-20 | 2020-02-27 | 地方独立行政法人大阪産業技術研究所 | 静電容量式タッチセンサおよびその製造方法 |
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