WO2015010036A1 - Procédé de fabrication de films barrières - Google Patents

Procédé de fabrication de films barrières Download PDF

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Publication number
WO2015010036A1
WO2015010036A1 PCT/US2014/047220 US2014047220W WO2015010036A1 WO 2015010036 A1 WO2015010036 A1 WO 2015010036A1 US 2014047220 W US2014047220 W US 2014047220W WO 2015010036 A1 WO2015010036 A1 WO 2015010036A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
film
vacuum chamber
barrier film
tacky
Prior art date
Application number
PCT/US2014/047220
Other languages
English (en)
Inventor
Walter SEAMAN
John E. Madocks
Original Assignee
General Plasma, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Plasma, Inc. filed Critical General Plasma, Inc.
Publication of WO2015010036A1 publication Critical patent/WO2015010036A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Definitions

  • the present invention in general relates to barrier films and in particular, to vacuum deposited barrier films to prevent water vapor and/or oxygen gas permeation and to the manufacturing of such films.
  • a significant challenge in making a vacuum deposited barrier film is particles on the substrate before the barrier film is deposited.
  • Particles such as dust, compounds used to ease web winding operations (anti-blocking compounds) and machine generated debris, land on the substrate and cause pin-holes and poor barrier performance.
  • Particles can be added to the substrate surface during the substrate manufacturing process, (for example, when anti-blocking compounds are applied to flexible webs), and/or during the vacuum coating operation prior to the barrier film deposition.
  • An existing approach to reduce or eliminate particles from the to-be-coated surface is to contact the surface with a tacky roll.
  • a tacky roller is in contact with the substrate surface where particles adhere to this roller and are removed from the substrate.
  • a second roller cleans the particles building up on the first roller to extend the effective life of the first tacky roll.
  • this method is not fully effective for several reasons: 1) This method does nothing to prevent particles from landing on and becoming embedded into the substrate surface in the first place. 2) Surface damage due to roller contact is not considered in this approach. 3) The effectiveness of the tacky roll degrades over time as particles build up and begin to be added back onto the substrate.
  • a method for depositing barrier films, while minimizing the amount of particles and contaminants on a deposition surface to which the barrier film is applied is provided.
  • a substrate with a tacky film already applied to a deposition surface of the substrate is supplied into a vacuum chamber.
  • the tacky film is then removed from the substrate leaving the deposition surface clear of particles and contaminants that otherwise accumulate on the surface outside the vacuum chamber.
  • the substrate is coated with the barrier film.
  • the tacky film has a backing for removal and storage in a roll. The removing of the tacky film is done after all physical contact with the to-be-coated deposition surface occurs and after the vacuum chamber has reached process vacuum conditions. In other embodiments, the tacky film is removed in a reduced pressure ante-chamber to the vacuum chamber in which deposition occurs.
  • the method further includes treating the deposition surface with an ion beam to improve adhesion of the barrier film.
  • the substrate is flexible and supplied in a roll; or may be sheets for example of, glass, or metal.
  • the substrate to be treated may be curved or a pre-cut shape. Coating is by plasma-enhanced chemical vapor deposition (PECVD), or by physical vapor deposition (PVD).
  • PECVD plasma-enhanced chemical vapor deposition
  • PVD physical vapor deposition
  • the method may further include applying a secondary tacky film to the barrier film.
  • the barrier film is a silicon nitride containing material, a silicon oxide, or an aluminum oxide film.
  • a system for carrying out the method for depositing barrier films, while minimizing the amount of particles and contaminants on a deposition surface to which the barrier film is applied includes a supply of a substrate with a tacky film already applied to a deposition surface of the substrate.
  • the film supply is in communication with a vacuum chamber directly or via an optional ante-chamber.
  • a take up roll is provided in the system for removing the tacky film in the vacuum chamber, or ante-chamber.
  • One or more plasma sources are provided in the vacuum chamber for coating the substrate with the barrier film.
  • the system in some embodiments has an ion source that emits an ion beam and treats the surface of the substrate to improve adhesion of the barrier film, and a cooled rotating drum for supporting and moving the substrate within the vacuum chamber.
  • a secondary roll of tacky film within the vacuum chamber is provided for application over the barrier film.
  • the system plasma source is configured for plasma-enhanced chemical vapor deposition (PECVD) or physical vapor deposition (PVD).
  • FIG. 1 shows a vacuum web coater implementing the inventive method
  • FIG. 2 diagrams the steps of an embodiment of the inventive method of barrier coating manufacture.
  • the present invention has utility for manufacturing vacuum deposited barrier films that prevent water vapor and/or oxygen gas permeation, while minimizing the amount of particles and contaminants on the surface to which the barrier film is to be applied.
  • range is intended to encompass not only the end point values of the range but also intermediate values of the range as explicitly being included within the range and varying by the last significant figure of the range.
  • a recited range of from 1 to 4 is intended to include 1-2, 1-3, 2-4, 3-4, and 1-4.
  • FIG. 1 illustrates a simplified drawing of a vacuum thin film coating system 100 for depositing plasma-enhanced chemical vapor deposition (PECVD), but can also be done by PVD (physical vapor deposition) methods such as sputtering or evaporation, films on a flexible substrate 23.
  • Coating system 100 includes vacuum pumps (not shown) to remove atmosphere from the chamber 8 prior to the coating operation.
  • a chilled drum 14 supports the flexible substrate 23 and helps to maintain the substrate 23 at an acceptable temperature during the PECVD process.
  • System 100 has an unwind roll having a core 3 supporting a roll 1 of uncoated flexible substrate. As per an embodiment of the inventive method, described further in FIG.
  • uncoated flexible substrate 23, termed 'web' has a tacky adhesive and a thin adhesive support film 12 adhered to web 23 and wound into roll 1.
  • the protective tacky film 12 is applied to the web 23 during the web manufacturing process when the web is free of particles of any kind.
  • a roll 1 of web 23' with tacky film with backing 12 is installed on core 3 and threaded through the web path of the coater. As shown in the drawing of coater 100, roller 6 of the web path contacts the side of web 23' that will be coated with a barrier film. In this case however, the coated surface of web 23 ' is protected from contacting roller 6 by tacky film 12.
  • Nip roll 13 on chill drum 14 also touches the to-be-coated surface of tacky film 12.
  • Nip roll 13 presses web 23' against drum 14 to keep the web 23' and 23 from slipping as drum 14 turns.
  • tacky film 12 is peeled away and rolled up on core 11.
  • the web to-be-coated surface is clean and free of particles.
  • no further contact to the to-be-coated side of web 23 is made until after the barrier coating is deposited.
  • the vacuum chamber 8 is partitioned to form an antechamber 8' and a plasma deposition chamber 8".
  • the ante-chamber 8' in still other embodiments having a separate pumping system that affords a user with the option of having a different level of reduced pressure for film removal relative to deposition. It is appreciated that any solvent de- gassing or possible contaminants associated with the film 12 occurs in the ante-chamber thereby reducing wear on the deposition chamber pumping system and retaining controlled plasma deposition conditions. Possible contaminants associated with the film 12 include gaseous organic molecules and polymeric cure catalysts.
  • the tack of the film 12 is readily quantified using conventional techniques such as ASTM 3121.
  • the tack, or related adjective "tacky" referring to a film herein denotes a required to separate the adhesive from the adherend deposition substrate at the interface therebetween shortly after the film and substrate surface have been brought into contact under a load equal only to the weight of the film on a 6.45 cm 2 contact area.
  • Tacky film 12 typically has a qualitative "finger tack" that generally corresponds to values of between 5 and 60 Newtons per centimeter (N/cm).
  • an ion source 24 emits ion beam 25 and treats the to-be-coated surface to improve adhesion.
  • Pretreatment of a web to improve adhesion is well known in the industry.
  • one or more PECVD sources, 18 deposit a barrier film 18B on web 23.
  • the plasma 19 of source 18 breaks down a precursor gas as is well known in PECVD technology.
  • Source 18 is an AC ion source that has previously been the subject of patent application publications PCT/US2009/067149 and US2005/0247885 to the same assignee of the instant application.
  • the web 23 can be conveyed to a rewind core 4 and rolled up into roll 2.
  • another adhesive tacky film 21 can be applied to the coated surface of web 23 from core 16 and roll 10.
  • Nip roll 15 presses the tacky film onto web 23.
  • the combined web 23 and tacky film 21, indicated as 22, is wound up as roll 2.
  • roll 7, in particular inventive embodiments on the rewind section of the web path contacts the coated side of web 23.
  • the barrier film has already been deposited on web 23, the barrier properties are not affected by roller contact.
  • the addition of a new tacky film will be dependent on the sensitivity of the barrier film and the requirements for follow-on coatings or converting operations.
  • FIG. 2 with reference to FIG. 1 diagrams an embodiment of an improved method for depositing a vacuum coated barrier film. As shown, the steps are as follows:
  • a) Start with a base substrate 23 that has an adhesive tacky film with adhesive backing 12 already adhered to the clean, to-be-coated substrate surface 23 to form web 23 '.
  • This is typically done by the substrate manufacturer in a clean environment, such as a clean room, so that particles are not incorporated into the interface between the substrate 23 and tacky film 12.
  • One benefit of the tacky film is that even if particles are left at the interface, the particles are retained with the adhesive when the tacky film 12 is removed in the vacuum chamber.
  • the tacky film 12 is removed just prior to web 23 treatment and barrier film 18B deposition. Importantly, the tacky film 12 is only removed after all physical contact with the to-be-coated surface occurs and after the vacuum chamber has reached process vacuum conditions. By leaving the tacky film 12 covering web 23 until after these conditions are past, many fewer particles reside on the to-be-coated web surface 23 than if no tacky film 12 were used or if the film were removed earlier.
  • barrier film 18B Deposits the barrier film 18B on the substrate 23. This is done preferably by PECVD process but can also be done by PVD (physical vapor deposition) methods such as sputtering or evaporation.
  • the barrier film 18B preferably is a silicon nitride containing material but can also be a silicon oxide or an aluminum oxide film. These films can incorporate carbon depending upon the precursor used in the PECVD process. [0018] At this point the method is complete and an improved barrier film 18B is created. Often, particles added onto the coated web 23 do not affect the barrier performance, and the web 23 can simply be wound up and sent to other converting operations.
  • a second tacky film 21 can be applied to the barrier deposited web 23 to form assembly 22.
  • This second tacky film 21 helps to keep the surface of barrier film on web 23 protected from damage due to sharp points on rollers and prevents particles from reaching the barrier film 18B coated surface of web 23.
  • the inventive method has been diagramed and described for a flexible web substrate.
  • Protecting a to-be-coated surface with an adhesive tacky film through vacuum pump down and from roller contact, etc., is a useful method for treating other substrates as well.
  • the method can be applied to rigid substrates such as glass or metal.
  • a glass substrate with a pre- coated film stack for example, a glass sheet with coatings for making an organic light-emitting diode (OLED) display can be protected with a tacky film per the inventive method.
  • Small substrates such as glass lenses can also benefit from the inventive method.
  • other substrates such as rolls of metal strip and substrates with curved or pre-cut shapes.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

L'invention concerne un procédé de fabrication par dépôt sous vide de films barrières arrêtant la perméation de la vapeur d'eau et/ou de l'oxygène gazeux, tout en limitant de façon optimale la quantité de particules et de contaminants abandonnés sur la surface à enduire par le film barrière. Le procédé consiste à protéger la surface à enduire au moyen d'un film adhésif en utilisant notamment une pompe à vide pour faire descendre ce film depuis un contact avec un cylindre. Ce procédé s'adresse particulièrement à des surfaces telles que des substrats en voile souple et des substrats rigides en verre ou en métal. Le procédé de l'invention permet ainsi de protéger au moyen d'un film adhésif un substrat en verre comportant un empilement de films pré-enduits, par exemple une feuille de verre garnie de revêtements destinés à la fabrication d'un écran à diodes électroluminescentes organiques. Le procédé de l'invention est applicable également à des petits substrats tels que les verres de lunettes, voire également à d'autres substrats tels que les rouleaux de bandes de métal et les substrats présentant des formes courbes ou prédécoupées.
PCT/US2014/047220 2013-07-18 2014-07-18 Procédé de fabrication de films barrières WO2015010036A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361847956P 2013-07-18 2013-07-18
US61/847,956 2013-07-18

Publications (1)

Publication Number Publication Date
WO2015010036A1 true WO2015010036A1 (fr) 2015-01-22

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190256971A1 (en) * 2016-06-10 2019-08-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for coating a flexible substrate provided with a protective film
CN114990503A (zh) * 2022-06-30 2022-09-02 业成科技（成都）有限公司 镀膜方法、镀膜设备和电子设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06299321A (ja) * 1993-02-19 1994-10-25 Toppan Printing Co Ltd 金属あるいは金属酸化物被覆フィルムの製造装置
JPH0797689A (ja) * 1993-09-30 1995-04-11 Kao Corp 金属薄膜の製造装置
JPH07238378A (ja) * 1994-02-28 1995-09-12 Kao Corp 金属系薄膜体の製造装置
JPH10287967A (ja) * 1997-04-15 1998-10-27 Victor Co Of Japan Ltd 真空蒸着装置及びそれを使用した成膜方法
US20110091742A1 (en) * 2009-10-15 2011-04-21 Fujifilm Corporation Functional film and method for producing the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06299321A (ja) * 1993-02-19 1994-10-25 Toppan Printing Co Ltd 金属あるいは金属酸化物被覆フィルムの製造装置
JPH0797689A (ja) * 1993-09-30 1995-04-11 Kao Corp 金属薄膜の製造装置
JPH07238378A (ja) * 1994-02-28 1995-09-12 Kao Corp 金属系薄膜体の製造装置
JPH10287967A (ja) * 1997-04-15 1998-10-27 Victor Co Of Japan Ltd 真空蒸着装置及びそれを使用した成膜方法
US20110091742A1 (en) * 2009-10-15 2011-04-21 Fujifilm Corporation Functional film and method for producing the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190256971A1 (en) * 2016-06-10 2019-08-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for coating a flexible substrate provided with a protective film
JP2019525992A (ja) * 2016-06-10 2019-09-12 フラウンホーファー−ゲゼルシャフト ツル フェルデルング デル アンゲヴァンテン フォルシュング エー ファウＦｒａｕｎｈｏｆｅｒ−Ｇｅｓｅｌｌｓｃｈａｆｔ ｚｕｒ Ｆｏｅｒｄｅｒｕｎｇ ｄｅｒ ａｎｇｅｗａｎｄｔｅｎ Ｆｏｒｓｃｈｕｎｇ ｅ．Ｖ． 保護フィルムを備えたフレキシブル基材を被覆する方法
US10907249B2 (en) 2016-06-10 2021-02-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for coating a flexible substrate provided with a protective film
EP3469113B1 (fr) * 2016-06-10 2021-11-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Procédé de revêtement d'un substrat flexible muni d'un film de protection
CN114990503A (zh) * 2022-06-30 2022-09-02 业成科技（成都）有限公司 镀膜方法、镀膜设备和电子设备
CN114990503B (zh) * 2022-06-30 2023-12-12 业成科技（成都）有限公司 镀膜方法、镀膜设备和电子设备

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