WO2015083681A1 - Film barrière aux gaz et procédé de production s'y rapportant - Google Patents

Film barrière aux gaz et procédé de production s'y rapportant Download PDF

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Publication number
WO2015083681A1
WO2015083681A1 PCT/JP2014/081825 JP2014081825W WO2015083681A1 WO 2015083681 A1 WO2015083681 A1 WO 2015083681A1 JP 2014081825 W JP2014081825 W JP 2014081825W WO 2015083681 A1 WO2015083681 A1 WO 2015083681A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas barrier
barrier layer
film
carbon
flexible substrate
Prior art date
Application number
PCT/JP2014/081825
Other languages
English (en)
Japanese (ja)
Inventor
浩了 有田
鈴木　一生
Original Assignee
コニカミノルタ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by コニカミノルタ株式会社 filed Critical コニカミノルタ株式会社
Priority to JP2015551511A priority Critical patent/JPWO2015083681A1/ja
Publication of WO2015083681A1 publication Critical patent/WO2015083681A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/0046—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by constructional aspects of the apparatus
    • B32B37/0053—Constructional details of laminating machines comprising rollers; Constructional features of the rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • B32B2037/246—Vapour deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/724—Permeability to gases, adsorption
    • B32B2307/7242—Non-permeable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2310/00—Treatment by energy or chemical effects
    • B32B2310/14—Corona, ionisation, electrical discharge, plasma treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Wrappers (AREA)
  • Laminated Bodies (AREA)

Abstract

La présente invention a pour objet un film barrière aux gaz qui permet de supprimer l'apparition de dommages dus à la chaleur sur un substrat et qui a d'excellentes performance de barrière aux gaz et souplesse. Le film barrière aux gaz selon l'invention est caractérisé en ce qu'il comprend une couche barrière aux gaz sur au moins une surface d'un substrat souple, la couche barrière aux gaz étant déposée à l'aide d'un procédé de dépôt chimique en phase vapeur assisté par plasma qui utilise un plasma produit par application d'une tension entre deux électrodes cylindriques opposées qui comprennent au moins un élément de production de champ magnétique qui produit un champ magnétique et la couche barrière aux gaz satisfaisant à toutes les exigences (1)-(3) ci-dessous. (1) La couche barrière aux gaz contient du silicium, de l'oxygène et du carbone en tant qu'éléments constitutifs. (2) Le rapport (C/O) de la quantité de carbone à la quantité d'oxygène dans la couche barrière aux gaz change en continu, ce dernier variant dans la direction de l'épaisseur de la couche. (3) Le nombre de pics dans le rapport (C/O) de la quantité de carbone à la quantité d'oxygène dans la direction de l'épaisseur de la couche pour un processus de dépôt est de 2.
PCT/JP2014/081825 2013-12-05 2014-12-02 Film barrière aux gaz et procédé de production s'y rapportant WO2015083681A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015551511A JPWO2015083681A1 (ja) 2013-12-05 2014-12-02 ガスバリアーフィルム及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-251667 2013-12-05
JP2013251667 2013-12-05

Publications (1)

Publication Number Publication Date
WO2015083681A1 true WO2015083681A1 (fr) 2015-06-11

Family

ID=53273443

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2014/081825 WO2015083681A1 (fr) 2013-12-05 2014-12-02 Film barrière aux gaz et procédé de production s'y rapportant

Country Status (2)

Country Link
JP (1) JPWO2015083681A1 (fr)
WO (1) WO2015083681A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017185789A (ja) * 2016-03-31 2017-10-12 住友化学株式会社 積層フィルム及びその製造方法
WO2018092657A1 (fr) * 2016-11-18 2018-05-24 コニカミノルタ株式会社 Film optique, film de protection de plaque polarisante, plaque polarisante comprenant ces films, et dispositif d'affichage comprenant ces films
CN113308940A (zh) * 2021-05-17 2021-08-27 佛山南海力豪包装有限公司 一种等离子体高阻隔纸及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012082467A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd プラズマｃｖｄ成膜装置、成膜方法
JP2012082466A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd プラズマｃｖｄ成膜装置、成膜方法
JP2012097291A (ja) * 2010-10-29 2012-05-24 Kobe Steel Ltd プラズマｃｖｄ装置
JP2012096531A (ja) * 2010-10-08 2012-05-24 Sumitomo Chemical Co Ltd 積層フィルム
JP2014083691A (ja) * 2012-10-19 2014-05-12 Konica Minolta Inc ガスバリアーフィルム及びガスバリアーフィルムの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012082467A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd プラズマｃｖｄ成膜装置、成膜方法
JP2012082466A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd プラズマｃｖｄ成膜装置、成膜方法
JP2012096531A (ja) * 2010-10-08 2012-05-24 Sumitomo Chemical Co Ltd 積層フィルム
JP2012097291A (ja) * 2010-10-29 2012-05-24 Kobe Steel Ltd プラズマｃｖｄ装置
JP2014083691A (ja) * 2012-10-19 2014-05-12 Konica Minolta Inc ガスバリアーフィルム及びガスバリアーフィルムの製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017185789A (ja) * 2016-03-31 2017-10-12 住友化学株式会社 積層フィルム及びその製造方法
JP2021151794A (ja) * 2016-03-31 2021-09-30 住友化学株式会社 積層フィルム及びその製造方法
JP7261837B2 (ja) 2016-03-31 2023-04-20 住友化学株式会社 積層フィルム及びその製造方法
WO2018092657A1 (fr) * 2016-11-18 2018-05-24 コニカミノルタ株式会社 Film optique, film de protection de plaque polarisante, plaque polarisante comprenant ces films, et dispositif d'affichage comprenant ces films
CN113308940A (zh) * 2021-05-17 2021-08-27 佛山南海力豪包装有限公司 一种等离子体高阻隔纸及其制备方法

Also Published As

Publication number Publication date
JPWO2015083681A1 (ja) 2017-03-16

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