WO2014188931A1 - Dispositif d'affichage à réflexion - Google Patents

Dispositif d'affichage à réflexion Download PDF

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Publication number
WO2014188931A1
WO2014188931A1 PCT/JP2014/062828 JP2014062828W WO2014188931A1 WO 2014188931 A1 WO2014188931 A1 WO 2014188931A1 JP 2014062828 W JP2014062828 W JP 2014062828W WO 2014188931 A1 WO2014188931 A1 WO 2014188931A1
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Prior art keywords
substrate
partition wall
hole
counter electrode
electrode
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PCT/JP2014/062828
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English (en)
Japanese (ja)
Inventor
浩之 本多
徹 三好
雅規 梅谷
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大日本印刷株式会社
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Publication of WO2014188931A1 publication Critical patent/WO2014188931A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/166—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
    • G02F1/167—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675—Constructional details
    • G02F1/1679—Gaskets; Spacers; Sealing of cells; Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675—Constructional details
    • G02F1/1676—Electrodes
    • G02F1/16766—Electrodes for active matrices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675—Constructional details
    • G02F1/1679—Gaskets; Spacers; Sealing of cells; Filling or closing of cells
    • G02F1/1681—Gaskets; Spacers; Sealing of cells; Filling or closing of cells having two or more microcells partitioned by walls, e.g. of microcup type

Definitions

  • the present invention relates to a reflective display device applied to electronic paper or the like.
  • An electrophoretic display device is a device that displays information by using electrophoretic migration, that is, particle movement, of an electrophoretic body (usually electrophoretic particles) in air or in a solvent.
  • electrophoretic migration that is, particle movement
  • an electrophoretic state is controlled by applying an electric field between two substrates, thereby realizing a desired display.
  • the electrophoretic body charged powder as well as charged particles can be used. In that case, the charged powder electrophoreses in the gas.
  • the electrophoretic display device has attracted attention especially as an electronic paper.
  • an electronic paper When applied as an electronic paper, it is possible to enjoy advantages such as visibility at the printed matter level (easy for eyes), ease of information rewriting, low power consumption, and light weight.
  • an electrophoretic display device In an electrophoretic display device, however, display defects, particularly a decrease in contrast, may occur due to sedimentation or uneven distribution of particles or powder. In order to prevent this phenomenon, it is used to form partition walls between the upper and lower electrode substrates and divide the migration space of the particles and powder to be electrophoresed, that is, the movement space into minute spaces. This minute space is called a cell. In each cell, ink or gas (display medium) containing an electrophoretic body is enclosed.
  • Japanese Unexamined Patent Application Publication No. 2011-170019 and International Publication No. 2005/015892 disclose conventional examples of such type of electrophoretic display devices.
  • the present inventor has obtained the following knowledge while earnestly researching the arrangement method of the partition wall on the pixel electrode.
  • the arrangement relationship between the pixel electrode and the partition wall becomes a problem. That is, since the through-hole for electrically connecting the upper layer electrode and the lower layer electrode is formed in the electrode having an island-like upper layer portion, as shown in FIG. If it is arranged below, there will be a passage communicating between the cells through the through hole under the partition.
  • the electroresponsive material included in the display medium may move to another cell through the passage.
  • the electrically responsive material moves between cells, the component ratio of the display material in the cell fluctuates and the charge balance is lost, resulting in display characteristics defects such as a decrease in reflectance and display unevenness. End up.
  • the partition and the pixel electrode are precisely aligned so that the pattern misalignment between them does not occur, and the partition is placed on the pixel electrode so that the through hole is not disposed under the partition.
  • Arrangement is also possible.
  • the partition wall and the pixel electrode are arranged on different substrates, they are not required for precise alignment between the partition wall and the pixel electrode in terms of manufacturing ease and manufacturing cost. It is preferable that these substrates are bonded together.
  • the electrode substrate when a plastic film is used as the electrode substrate, the dimensional stability of the substrate itself cannot be ensured in the first place, so the upper and lower electrode substrates are bonded together while performing precise alignment between the partition walls and the pixel electrodes. It is impossible.
  • even when the partition walls are formed in an aperiodic pattern, it is difficult to perform precise alignment between the partition walls and the pixel electrodes.
  • the present invention has been made based on such circumstances, and the object thereof is to suppress the movement of particles in the display medium between cells even when the through-hole of the counter electrode is disposed under the partition. Another object is to provide a reflective display device.
  • a display medium including at least one kind of electrically responsive material is sealed between two opposing substrates on which at least one has translucency and each has electrodes formed thereon,
  • a reflective display device in which the display medium performs a desired display when a predetermined electric field is applied between two substrates, and a partition that partitions a plurality of regions disposed between the two substrates;
  • An electrode is formed, the transparent electrode and the counter electrode are arranged to face each other, and the counter electrode has a through hole formed on the top of the partition on the counter electrode side.
  • the width is the opening on the partition side of the through hole.
  • a reflection type display device being larger than the width.
  • the width of the top of the partition wall on the counter electrode side is larger than the width of the opening on the partition wall side of the through hole.
  • the top portion of the partition wall on the counter electrode side is disposed so as to partially overlap the through hole when viewed from the one substrate toward the other substrate.
  • a display medium containing at least one or more kinds of electrically responsive materials is sealed between two opposing substrates on which at least one has translucency and each electrode is formed.
  • a reflective display device in which the display medium displays a desired display when a predetermined electric field is applied between the two substrates, and divides a plurality of regions arranged between the two substrates.
  • the top is from the one substrate to the other
  • the partition that is arranged so as to partially overlap the through hole when viewed in the direction toward the plate, and that overlaps the through hole when viewed in the direction from the one substrate toward the other substrate
  • the reflective display device is characterized in that the width of the top portion on the counter electrode side is larger than the width of the opening on the partition wall side of the through hole.
  • the width of the top portion on the counter electrode side of the partition arranged so as to overlap the through hole is larger than the width of the opening on the partition side of the through hole.
  • the partition arranged so as to overlap the through hole blocks the through hole, formation of a passage communicating between the cells is suppressed under the partition arranged so as to overlap the through hole. The Therefore, it is suppressed that the particle
  • the counter electrode is a pixel electrode having a TFT electrode structure.
  • the counter electrode is a segment electrode.
  • a display medium containing at least one or more kinds of electrically responsive materials is sealed between two opposing substrates on which at least one has translucency and each electrode is formed.
  • a method of manufacturing a reflective display device in which the display medium displays a desired display when a predetermined electric field is applied between the two substrates, and a plurality of regions are partitioned on one substrate.
  • the one substrate and the other substrate are arranged so that the top surface of the partition wall of the one substrate faces the other substrate so that the display medium is sealed in each cell.
  • a counter substrate placement process A transparent electrode is formed in advance on the one substrate, and a counter electrode having a through hole is formed in advance on the other substrate.
  • the transparent electrode Manufacturing of a reflective display device wherein the reflective electrode device is disposed so as to face the counter electrode, and a width of a top portion of the partition wall on the counter electrode side is larger than a width of an opening of the through hole on the partition wall side. Is the method.
  • the width of the top of the partition wall on the counter electrode side is larger than the width of the opening on the partition wall side of the through hole.
  • the top of the partition on the counter electrode side is arranged so as to partially overlap the through hole when viewed in the direction from the one substrate to the other substrate.
  • a display medium containing at least one or more kinds of electrically responsive materials is sealed between two opposing substrates on which at least one has translucency and each electrode is formed.
  • a method of manufacturing a reflective display device in which the display medium displays a desired display when a predetermined electric field is applied between the two substrates, and a plurality of regions are partitioned on one substrate.
  • the one substrate and the other substrate are arranged so that the top surface of the partition wall of the one substrate faces the other substrate so that the display medium is sealed in each cell.
  • a counter substrate placement process A transparent electrode is formed in advance on the one substrate, and a counter electrode having a through hole is formed in advance on the other substrate.
  • the transparent electrode The counter electrode is disposed so as to oppose the counter electrode, and the top of the partition on the counter electrode side is partially overlapped with the through hole when viewed from the one substrate toward the other substrate.
  • the width of the top of the partition on the counter electrode side which is disposed so as to overlap the through hole when viewed in the direction from the one substrate to the other substrate, is on the partition side of the through hole. It is a manufacturing method of a reflection type display device characterized by being larger than the width of an opening.
  • the width of the top portion on the counter electrode side of the partition arranged so as to overlap the through hole is larger than the width of the opening on the partition side of the through hole.
  • the partition wall arranged so as to overlap the through hole closes the through hole, a passage communicating between the cells may be formed under the partition wall arranged so as to overlap the through hole. It is suppressed. Therefore, it is suppressed that the particle
  • FIG. 1 is a cross-sectional view schematically showing a configuration of a reflective display device according to an embodiment of the present invention.
  • FIG. 2 is a plan view schematically showing a pixel electrode formed on the other substrate of the reflective display device shown in FIG. 1 and a through hole formed in the pixel electrode.
  • FIG. 3 is a diagram schematically showing a pixel electrode, a TFT electrode structure disposed on the pixel electrode, and a through hole for electrically connecting the pixel electrode and the TFT electrode structure.
  • FIG. 3A is a plan view showing a pixel electrode, a TFT electrode structure, and a through hole
  • FIG. 3B is a cross-sectional view taken along line 3b-3b of FIG. FIG.
  • FIG. 4 is a diagram schematically showing a display pattern electrode of a segment electrode, a wiring electrode arranged on the display pattern electrode, and a through hole for electrically connecting the display pattern electrode and the wiring electrode. It is. Specifically, FIG. 4A is a plan view showing segment electrodes, wiring electrodes, and through holes, and FIG. 4B is a cross-sectional view taken along line 4b-4b of FIG. 4A.
  • FIG. 5 is a diagram for explaining the definition of the width of the through hole.
  • FIG. 6 is a flowchart schematically showing a manufacturing method of the reflective display device according to the embodiment of the present invention.
  • FIG. 7 is a diagram schematically showing an example of the partition wall forming step.
  • FIG. 4 is a diagram schematically showing a display pattern electrode of a segment electrode, a wiring electrode arranged on the display pattern electrode, and a through hole for electrically connecting the display pattern electrode and the wiring electrode. It is. Specifically, FIG. 4A is a plan view showing segment electrodes, wiring
  • FIG. 8 is a diagram for explaining the definition of the width of the top surface of the partition wall.
  • FIG. 9 is a diagram schematically showing an example of the adhesive layer forming step.
  • FIG. 10 is a diagram for explaining the definition of the width of the top of the partition wall on the counter electrode side when an adhesive layer is formed on the partition wall.
  • FIG. 11 is a diagram for explaining the definition of the width of the top portion of the partition wall on the counter electrode side when the adhesive layer is not formed on the partition wall.
  • FIG. 12 is a diagram schematically showing an example of the display medium arranging step.
  • FIG. 13 is a cross-sectional view schematically showing a state where the other substrate is bonded onto one substrate in the counter substrate arranging step.
  • FIG. 14 is a cross-sectional view schematically showing the relationship between the width of the top portion of the partition wall on the counter substrate side and the width of the opening of the through hole on the partition wall side in the display device according to the comparative example of the present invention.
  • FIG. 1 is a cross-sectional view schematically showing a configuration of a reflective display device according to an embodiment of the present invention.
  • the reflective display device according to the present embodiment, at least one of the electrical responses is provided between the two opposing substrates 11 and 16 on which at least one of them has translucency and the electrodes 111 and 161 are respectively formed.
  • a display medium 13 containing a conductive material is enclosed, and the display medium 13 performs a desired display when a predetermined electric field is applied between the two substrates 11 and 16.
  • “translucent” means a property of transmitting light.
  • the substrate (one substrate 11) arranged on the viewing side has a light-transmitting property such that the total light transmittance is 50% or more, preferably 80% or more, more preferably 90% or more. have.
  • an electrode 111 is provided on the surface of one substrate 11, but the illustration of the electrode 111 is omitted.
  • one substrate 11 is disposed on the viewing side, and the other substrate 16 is disposed on the non-viewing side.
  • One substrate 11 includes a light-transmitting film such as polyethylene (PE), polyethylene terephthalate (PET), polyethersulfone (PES), polyethylene naphthalate (PEN), or light-transmitting glass, and indium tin oxide (ITO). ), Zinc oxide (ZnO), tin oxide (SnO), or the like, to which a transparent electrode (transparent electrode) 111 is attached can be typically used.
  • PE polyethylene
  • PET polyethylene terephthalate
  • PES polyethersulfone
  • PEN polyethylene naphthalate
  • ITO indium tin oxide
  • Zinc oxide ZnO
  • SnO tin oxide
  • transparent electrode transparent electrode
  • the transparent electrode 111 can be formed by a coating method, sputtering, a vacuum deposition method, a CVD method, or the like. Since the transparent electrode 111 is used as a common electrode in the case of active matrix driving and segment driving, it is not always necessary to form a pattern, and the entire surface of the substrate may be an electrode.
  • the thickness of one substrate 11 is preferably 10 ⁇ m to 1 mm. If it is thinner than 10 ⁇ m, the strength as a panel cannot be obtained and the risk of breakage increases. On the other hand, if it is thicker than 1 mm, the panel weight becomes too heavy and the handling becomes inconvenient and the cost also increases. Because.
  • a preferred thickness range that is difficult to break and easy to handle is about 50 ⁇ m to 300 ⁇ m.
  • a barrier layer may be provided on one substrate 11.
  • the function of the barrier layer is to prevent display deterioration due to moisture entering the cells.
  • the barrier layer may be disposed on the surface of one substrate 11 on which the display medium 13 is disposed (the surface on the display medium side), or provided on the surface opposite to the surface on the display medium side. Also good. Further, the barrier layer may be provided between the one substrate 11 and the electrode 111. In this embodiment, since one substrate is disposed on the viewing side, the barrier layer needs to be light-transmitting.
  • the barrier layer may be obtained by depositing an inorganic film on one substrate 11, or may be obtained by pasting a film on which a barrier layer has been previously formed on one substrate 11. .
  • an ultraviolet cut film or an ultraviolet absorption layer may be provided on the surface of the one substrate 11 opposite to the display medium side.
  • one substrate 11 itself may have an ultraviolet absorbing function.
  • an antiglare layer (AG layer), a scratch prevention layer (HC layer), and an antireflection layer (AR layer). Etc. may be added.
  • One substrate 11 can be applied in either a roll shape or a sheet shape.
  • a substrate in which a counter electrode 161 is formed of a conductive material such as a metal on a display medium side surface such as a resin film, a resin plate, glass, or epoxy glass (glass epoxy) can be used.
  • a pattern electrode is used in the case of segment driving, and a pixel electrode in which a TFT (Thin Film Transistor) is arranged in the case of active matrix driving.
  • TFT Thin Film Transistor
  • the other substrate 16 may be a translucent base material. Furthermore, it may be an opaque base material that is translucent, but an opaque glass base material, resin film, resin plate, glass, epoxy glass with the other surface different from the electrode surface roughened. (Garaepo) or the like can be used. In the present embodiment, since the other substrate 16 is disposed at a position opposite to the viewing side, there is no necessity of having translucency. However, when the same physical properties as the one substrate 11 such as thermal expansion characteristics are required, a light-transmitting member similar to the one substrate 11 can be used.
  • the thickness of the other substrate 16 is preferably 10 ⁇ m to 1 mm, similarly to the thickness of the one substrate 11. If it is thinner than 10 ⁇ m, the strength as a panel cannot be obtained and the risk of breakage increases. On the other hand, if it is thicker than 1 mm, the panel weight becomes too heavy and the handling becomes inconvenient and the cost also increases. Because. A preferred thickness range that is difficult to break and easy to handle is about 50 ⁇ m to 300 ⁇ m.
  • the thickness of the other substrate 16 is preferably 10 ⁇ m to 1 mm, similarly to the thickness of the one substrate 11. If it is thinner than 10 ⁇ m, the strength as a panel cannot be obtained and the risk of breakage increases. On the other hand, if it is thicker than 1 mm, the panel weight becomes too heavy and the handling becomes inconvenient and the cost also increases. Because. A preferred thickness range that is difficult to break and easy to handle is about 50 ⁇ m to 300 ⁇ m.
  • a barrier film can be attached on the other substrate 16. Even if a transparent film in which a transparent inorganic film barrier layer is formed in advance by vapor deposition or the like, or a transparent film in which a non-transparent barrier layer such as a metal film is formed as the other substrate 16, is the same as this. The function of can be demonstrated.
  • the barrier film or barrier layer may be provided on the display medium side surface of the other substrate 16 (on the pixel electrode 161), or may be provided on the surface opposite to the display medium side surface.
  • an ultraviolet cut film or an ultraviolet absorption layer may be provided on the surface of the other substrate 16 opposite to the display medium side.
  • the other substrate 16 itself may have an ultraviolet absorbing function.
  • the other substrate 16 can be applied in either a roll shape or a sheet shape.
  • the counter electrode 161 is a pixel electrode having a TFT (Thin Film Transistor) electrode structure 163 as shown in FIG. 3, and the pixel electrode 161 is used for a desired display in a reflective display device. They are arranged in a matrix so as to cover the area (display area) (see FIG. 2). As shown in FIG. 3, each pixel electrode 161 is electrically connected to the pixel electrode 161 and a TFT electrode structure 163 provided between the pixel electrode 161 and the other substrate 16. A through hole 162 is formed.
  • TFT Thin Film Transistor
  • the counter electrode 161 is a display pattern electrode
  • the display pattern electrode 161 includes the display pattern electrode 161 and the display pattern.
  • a through hole 162 for electrically connecting the electrode 161 and the wiring electrode 164 provided between the other substrate 16 is formed.
  • the width of the opening on the partition wall 12 side of the through hole 162 is 10 ⁇ m to 100 ⁇ m, preferably 10 ⁇ m to 50 ⁇ m.
  • the definition of the width of the opening on the partition wall 12 side of the through hole 162 is shown in FIG.
  • the opening is circular as shown in FIG. 5A, and the width of the opening is defined as the length of the diameter.
  • the width of the opening is defined as its maximum width. For example, when the opening is a rectangle as shown in FIG. 5B, it is understood as the length of the diagonal line, and when the opening is an ellipse as shown in FIG. Is understood as the length of.
  • variety of the opening by the side of the partition 12 of the through hole 162 can be measured using the non-contact three-dimensional surface shape and roughness measuring device (NewView7100 by Zygo Corporation), for example.
  • FIG. 6 is a flowchart schematically showing a manufacturing method of the reflective display device according to the embodiment of the present invention.
  • FIG. 7 is a diagram schematically showing an example of the partition wall forming step.
  • partition walls 12 are formed on the upper surface of one substrate 11 generally placed in the horizontal direction by, for example, photolithography (exposure by ultraviolet (UV) irradiation ⁇ development ⁇ firing).
  • the partition wall 12 is a member that defines a plurality of cells to be described later.
  • the “cell” means the upper and lower electrode substrates 11, 11 to prevent display defects due to sedimentation or uneven distribution of particles or powder, in particular, reduction in contrast.
  • the partition wall 12 can be composed of an ultraviolet curable resin, a thermosetting resin, a room temperature curable resin, or the like.
  • a mold transfer method such as embossing can be adopted in addition to a photolithography method.
  • a method of manufacturing a structure having a desired pattern as a partition and sticking the structure to one substrate 11 may be employed.
  • the aperture ratio is preferably 70% or more, and particularly preferably 90% or more. The higher the aperture ratio, the wider the displayable area, so that high contrast can be obtained.
  • the shape of the unit pattern of the partition wall 12 is basically arbitrary such as a circle, a lattice, a hexagon, and other polygons.
  • the cell size (pitch) is 0.05 mm to 1 mm, preferably 0.1 mm to 0.5 mm, although it depends on the size of the display panel.
  • the pitch means the distance between the center points of adjacent cells.
  • the width of the top surface of the partition wall 12 is 9 ⁇ m to 50 ⁇ m, preferably 9 ⁇ m to 20 ⁇ m.
  • 9 ⁇ m is the lower limit of the line width at which the partition wall 12 can be patterned without falling down.
  • the width of the top surface of the partition wall 12 is less than 9 ⁇ m, in a pattern in which the length of the partition wall 12 is 60 ⁇ m or more, at least a part of the partition wall 12 falls, peels off, or the separated partition wall 12 moves over the substrate. Or move. In that case, the function of preventing the movement of particles by the partition wall 12 is lost, and the display quality is deteriorated.
  • the upper limit of 50 ⁇ m which is the upper limit of the preferred range, is an upper limit at which the partition wall 12 is not too conspicuous when visually observed.
  • the definition of the width of the top surface of the partition wall 12 is shown in FIG. If the corners of the top surface are not rounded, the width of the top surface is defined as it is, as shown in FIGS. 8 (a) and 8 (b). On the other hand, when the corner of the top surface is rounded, it is understood as the width between the intersecting lines of the extended surface of the top surface and the extended surface of the wall surface as shown in FIG. 8 (c) and FIG. 8 (d).
  • the As a measurement method for evaluation one substrate 11 on which the partition wall 12 was formed was embedded in a curable resin, and a cross section of the partition wall 12 was cut out by a microtome (Daiwa Kogyo Co., Ltd .: FX-801). Each width can be measured based on an image taken by a scanning electron microscope (SEM).
  • the thickness of the partition wall 12 is 5 to 50 ⁇ m, preferably 10 to 50 ⁇ m. If the thickness is 5 ⁇ m or less, the amount of ink to be filled is small, and sufficient display characteristics, in particular, contrast cannot be obtained. On the other hand, if the thickness is 50 ⁇ m or more, the panel is too thick and the drive voltage increases excessively. From the viewpoint of obtaining good display characteristics at a low driving voltage, a thickness in the range of 10 to 50 ⁇ m is preferable.
  • a thermoplastic resin such as a polyester-based thermoplastic adhesive is formed with a thickness of 1 ⁇ m to 100 ⁇ m by, for example, a transfer method or a printing method. It is preferably formed with a thickness of 1 ⁇ m to 50 ⁇ m, particularly preferably with a thickness of 1 ⁇ m to 20 ⁇ m.
  • a polyester-based thermoplastic adhesive having a thickness of 20 ⁇ m on a PET film as a substrate 21.
  • a transfer sheet 20 on which an adhesive 221 is formed is prepared.
  • the transfer sheet 20 is arranged to face the one substrate 11 so that the surface of the adhesive 221 is arranged on the top surface of the partition wall 12 of the one substrate 11.
  • one substrate 11 and the transfer sheet 20 are laminated at a normal temperature and a pressure of 1 kPa.
  • an adhesive using a thermoplastic material is preferable. It has a property of softening by heating and solidifying when cooled, and is plastic when repeated cooling and heating. Is a material that is reversibly maintained.
  • the adhesive solidified on the transfer sheet substrate is softened by heating to a temperature exceeding the softening temperature, and only on the upper surface of the partition wall.
  • the adhesive can be reliably thermally transferred. Further, since the adhesive after thermal transfer is cooled to room temperature and solidified again, tackiness, that is, stickiness, is eliminated. Further, since there is no tack or stickiness, the display medium filled in the cell does not adhere to the adhesive. Then, the adhesive on the top surface of the partition wall is heated again to a temperature exceeding the softening temperature to be softened, so that it has tackiness, that is, stickiness, so that it is securely bonded to the other substrate. Since the adhesive after being bonded to the other substrate does not have tack or stickiness at normal temperature again, the display medium will not adhere to the adhesive and display quality may not be deteriorated.
  • thermoplastic base polymers such as ethylene-vinyl acetate copolymer, polyester, polyamide, polyolefin, polyurethane, natural rubber, styrene-butadiene block copolymer, styrene-isoprene block copolymer, styrene-ethylene.
  • a resin mainly composed of a thermoplastic elastomer such as butylene-styrene block copolymer or styrene-ethylene-propylene-styrene copolymer, and a tackifier resin or a plasticizer is mainly used.
  • the partition wall 12 may be subjected to a surface treatment by ultraviolet irradiation or plasma treatment, or a primer may be formed.
  • a silane coupling agent may be added to the adhesive 221.
  • the adhesive layer 22 has a width D of the adhesive layer 22 in the width direction of the top surface of the partition wall 12 on the plane of the counter electrode 161 after the counter substrate placement step described later.
  • the through hole 162 is formed to be larger than the width of the opening on the partition wall 12 side.
  • the top surface of the partition wall 22 is larger than the opening width of the through hole 162 on the partition wall 12 side. What is necessary is just to form so that it may become.
  • the width of the top of the partition wall on the counter electrode side refers to the counter substrate placement step when the adhesive layer 22 is formed on the top surface of the partition wall 12. It means the width of the adhesive layer 22 in the width direction of the top surface of the partition wall 12 on the counter electrode 16 later.
  • the adhesive layer 22 is not formed on the top surface of the partition wall 12, it is defined as the width of the top surface of the partition wall 12 itself. That is, if the corner of the top surface of the partition wall 12 is not rounded, it means the width of the top surface of the partition wall 12 defined as described above with reference to FIG. 8A and FIG.
  • the width of the top surface of the partition wall 12 defined as described above with reference to FIGS. 8C and 8D, that is, the extended surface of the top surface of the partition wall 12 It means the width of the top surface of the partition wall 12 not including the extended surface, not the width between the intersecting lines with the extended surface of the wall surface.
  • the adhesive layer 22 in the width direction of the top surface of the partition wall 12 on the counter electrode 161 after the counter substrate placement step of the adhesive layer 22. Is narrower than the width of the top surface of the partition wall 12 and the top surface of the partition wall 12 is in contact with the counter electrode 161, the “width of the top of the partition wall on the counter electrode side” It means the width of the top surface itself.
  • the width of the top portion of the partition wall 12 on the counter electrode 161 side is larger than the width of the opening of the through hole 162 on the partition wall 12 side, but in order to achieve a desirable contrast in the display panel, It is not more than twice the width of the opening.
  • not all of the partition walls 12 may be formed so that the width of the top of the partition wall 12 on the counter electrode 161 side is larger than the width of the opening of the through hole 162 on the partition wall 12 side.
  • the partition wall 12 to be disposed to face the through hole 162 may be formed so that the width of the top portion is larger than the width of the opening.
  • FIG. 12 is a diagram schematically showing an example of the display medium arranging step.
  • (1) the ink 13 is dropped from the dispenser 31 or inkjet or die coat (ink dropping step), and (2) the ink 13 is made uniform in the surface by the applicator 32 or doctor blade, doctor knife, and central squeegee. It is applied (ink application process).
  • the ink 13 may be disposed on the other substrate 16.
  • a display medium containing at least one or more types of electrically responsive materials can be used.
  • the electroresponsive material include a charged particle material and a liquid crystal material
  • the charged particle material includes a so-called electrophoretic material in which colored particles such as white, black, and color move in response to an electric field, or two particles.
  • the liquid crystal material includes a material for electrically controlling transmission and scattering known by PDLC (Polymer Dispersed Liquid Crystal), a material in which a dye is mixed with liquid crystal, and a cholesteric liquid crystal material.
  • the average particle size of the display medium 13 is 0.05 ⁇ m or more, preferably 0.08 ⁇ m or more, and more preferably, as described in, for example, Japanese Patent No. 45164481 and Japanese Patent No. 4579768. Is 0.1 ⁇ m or more.
  • the average particle diameter of the display medium 13 is generally 5 ⁇ m or less, preferably 3 ⁇ m or less, and more preferably 1 as described in, for example, Japanese Patent Nos. 4516481 and 4579768. .5 ⁇ m or less.
  • the outer periphery of the display area on the other substrate 16 prevents moisture and oxygen from entering the display area from the outside of the display area, and the solvent in the display medium 13 from the display area to the outside of the display area Sealing material 62 for preventing leaching is arranged so as to continuously surround the display area (sealing material arranging step: step (4) in FIG. 6).
  • the sealing material 62 is disposed on the outer periphery of each of the plurality of display areas.
  • the sealing material 62 is made of, for example, an adhesive such as an ultraviolet curable resin with a line width of 0.6 mm and a height of 60 ⁇ m using a dispenser. It arrange
  • the ultraviolet curable resin used for the sealing material 62 is preferably a monomer or oligomer of urethane acrylate, polyester acrylate, or epoxy acrylate. , 3034, 3057, 3052, 3054, 3056B, 3170D, LCB-610 manufactured by EACH Sea Co., Ltd., etc. are applicable.
  • the sealing material 62 preferably has adhesiveness. In this case, even if it is difficult to keep the posture of one of the substrates or the other substrate flat due to distortion of one of the substrates or the other substrate, it is later on the substrate of one of the substrates or the other substrate 16.
  • the two substrates are bonded together in a state where the display medium is disposed on the display medium, no gap is formed between the sealing material 62 and the two substrates 11 and 16, and the display medium 13 disposed in the display region 60 is sealed. It moves outside the area surrounded by 62, and display unevenness and generation of bubbles in the cell do not occur.
  • a material having a functional group such as a hydroxyl group, an alkoxy group, a urethane group, or an epoxy group capable of reacting with a substrate surface such as a film or glass is preferable.
  • the sealing material 62 can be constituted by a thermosetting resin, a room temperature curable resin, a heat seal resin or the like in addition to the ultraviolet curable resin.
  • the sealing material 62 can be arranged by various printing methods or thermocompression bonding, and may be arranged on one substrate 11.
  • the adhesive layer 22 on the partition wall 12 and the other substrate 16 facing the one substrate 11 are bonded while extruding excess ink exceeding the cell volume in the partition wall 12 (opposing substrate placement step: Step (5) in FIG. Thereby, the display medium (ink 13) is sealed in each cell.
  • the one substrate 11 and the other substrate 16 do not need to be precisely aligned using a microscope or the like, for example, for alignment provided on the one substrate 11. You may align, aligning a mark and the mark for alignment provided in the other board
  • the alignment between one substrate 11 and the other substrate 16 is such that the top of the partition wall 12 on the counter electrode 161 side is partially viewed from the one substrate 11 toward the other substrate 16. It was made to overlap with the through hole 162, that is, partially overlap with the through hole 162.
  • the adhesive 221 transferred as the adhesive layer 22 is heated to obtain an adhesive force.
  • the adhesive 221 is heated from the periphery to a temperature exceeding its softening point or melting point to soften the partition wall 12 and the other.
  • the substrate 16 is bonded.
  • other thermocompression bonding modes may be employed.
  • the pressing force applied by the laminator 91 is preferably 0.01 MPa to 0.7 MPa, and particularly preferably 0.1 MPa to 0.4 MPa.
  • the sheet is cut into a predetermined size by a cutting device 51 such as a guillotine, an upper blade slide device, a laser cutting device, or a laser cutter (cutting step: step (6) in FIG. 6) and desired reflection.
  • a cutting device 51 such as a guillotine, an upper blade slide device, a laser cutting device, or a laser cutter (cutting step: step (6) in FIG. 6) and desired reflection.
  • the width of the top portion of the partition wall 12 on the counter electrode 161 side is larger than the width of the opening of the through hole 162 on the partition wall 12 side.
  • One substrate 11 is a 300 mm ⁇ 400 mm ⁇ 0.1 mm thick polyethylene terephthalate (PET) film (A4100, manufactured by Toyobo Co.). .. 2 ⁇ m) was prepared.
  • the transparent electrode 111 is formed by a general film formation method such as sputtering, vacuum evaporation, or CVD, and is also formed by zinc oxide (ZnO), tin oxide (SnO), etc. in addition to indium tin oxide (ITO). Can be done.
  • a negative photosensitive resin material (DuPont MRC Dry Film Resistry Dry Film Resist) is laminated on the one substrate 11 to a thickness of 30 ⁇ m and heated at 100 ° C. for 1 minute. Then, exposure is performed using an exposure mask (exposure amount: 500 mJ / cm 2 ), and thereafter development using a 1% KOH aqueous solution is performed for 30 seconds, and baking is performed at 120 ° C. for 60 minutes. A 20 ⁇ m partition wall 12 was formed.
  • an exposure mask exposure amount: 500 mJ / cm 2
  • development using a 1% KOH aqueous solution is performed for 30 seconds
  • baking is performed at 120 ° C. for 60 minutes.
  • a 20 ⁇ m partition wall 12 was formed.
  • a 50 ⁇ m-thick PET film 21 (manufactured by Teijin DuPont) is used as the transfer film substrate 21, and a polyester-based thermoplastic adhesive 221 (Toyobo's Byron 630) is applied by a die coder and dried. It was. Thereby, a roll-shaped transfer sheet 20 having an adhesive layer of 20 ⁇ m was produced.
  • the softening temperature of the polyester thermoplastic adhesive 221 was about 110 ° C.
  • thermoplastic adhesive 221 was thermally transferred to the entire top surface of the partition wall 12.
  • the height from the top surface of the partition wall 12 to the top of the thermoplastic adhesive 221 was about 10 ⁇ m.
  • an ink 13 having the following components is used as a display medium, dropped from the dispenser 31, and the ink 13 is deposited on one substrate 11 by an applicator 32 (manufactured by Tester Sangyo Co., Ltd.). It was applied at 35 ⁇ m.
  • Electrophoretic particles titanium dioxide: 60 parts by weight
  • Dispersion liquid 40 parts by weight
  • a PEN substrate of 300 mm ⁇ 400 mm ⁇ thickness 0.1 mm is provided with a counter electrode 161. The formed one was used.
  • the electrodes 161 in this embodiment are active matrix drive pixel electrodes, and each pixel electrode 161 has a TFT.
  • the width of the opening on the partition wall 12 side of the through hole 162 formed in the pixel electrode 161 was 15 ⁇ m.
  • an acrylic sealing material (manufactured by ThreeBond Co .: 3052D) is applied to the outer periphery of the region where the pixel electrode 161 is formed using a dispenser, so that the sealing material 62 has a line width of 0.6 mm and a thickness of A thickness of 60 ⁇ m was formed.
  • one substrate 11 is overlaid on the other substrate 16 and heated to 90 ° C. while further applying a certain pressing force by a laminator 91, and on the partition wall 12 of one substrate 11.
  • the adhesive layer 22 and the other substrate 16 were in close contact (see FIG. 13).
  • one of the substrates 11 is curled so that no air bubbles remain between the two substrates, and the partition wall is directed from one side of the one substrate 11 and the other substrate 16 to the opposite side.
  • the excess ink 13 exceeding the cell volume in 12 was pasted while being pushed out of the display area. As a result, only a specified amount of ink was filled in the cell.
  • a display panel was fabricated in the same process as in the above example, except that the width of the opening on the partition wall 12 side of the through hole was 30 ⁇ m.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

La présente invention se rapporte à un dispositif d'affichage à réflexion qui comprend un support d'affichage fournissant un affichage souhaité lorsqu'un champ électrique prédéterminé est appliqué entre deux substrats. Ce dispositif d'affichage à réflexion comporte une cloison de séparation qui se situe entre les deux substrats et qui délimite une pluralité de régions. L'un des substrats est muni d'une électrode transparente, et l'autre substrat est doté d'une contre-électrode. La contre-électrode possède un trou débouchant, et la largeur de la partie supérieure côté contre-électrode de la cloison de séparation est supérieure à la largeur de l'ouverture côté cloison de séparation du trou débouchant.
PCT/JP2014/062828 2013-05-22 2014-05-14 Dispositif d'affichage à réflexion WO2014188931A1 (fr)

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JP2016224370A (ja) * 2015-06-03 2016-12-28 ソニー株式会社 表示装置および電子機器
CN106483725B (zh) * 2015-08-28 2020-01-03 群创光电股份有限公司 液晶显示面板
KR102405312B1 (ko) * 2015-10-06 2022-06-02 엘지디스플레이 주식회사 광 제어장치, 그를 포함한 투명표시장치 및 그의 제조방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008003598A (ja) * 2006-06-22 2008-01-10 Samsung Electronics Co Ltd 電気泳動表示装置及びその製造方法
JP2009265270A (ja) * 2008-04-23 2009-11-12 Nippon Shokubai Co Ltd 電気光学表示装置
WO2010024255A1 (fr) * 2008-08-28 2010-03-04 株式会社ブリヂストン Appareil d'affichage d'informations

Family Cites Families (4)

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JP2011002484A (ja) * 2009-06-16 2011-01-06 Seiko Epson Corp アクティブマトリックス基板の製造方法、電気光学装置、及び電子機器
JP4811510B2 (ja) * 2009-09-09 2011-11-09 カシオ計算機株式会社 電気泳動表示装置及びその駆動方法
JP2011095479A (ja) * 2009-10-29 2011-05-12 Seiko Epson Corp 電気泳動表示パネルの駆動方法、電気泳動表示装置及び電子機器
JP2011203398A (ja) * 2010-03-25 2011-10-13 Seiko Epson Corp 電気泳動表示装置、時計、電子機器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008003598A (ja) * 2006-06-22 2008-01-10 Samsung Electronics Co Ltd 電気泳動表示装置及びその製造方法
JP2009265270A (ja) * 2008-04-23 2009-11-12 Nippon Shokubai Co Ltd 電気光学表示装置
WO2010024255A1 (fr) * 2008-08-28 2010-03-04 株式会社ブリヂストン Appareil d'affichage d'informations

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