WO2014183378A1 - 取向装置 - Google Patents

取向装置 Download PDF

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Publication number
WO2014183378A1
WO2014183378A1 PCT/CN2013/085349 CN2013085349W WO2014183378A1 WO 2014183378 A1 WO2014183378 A1 WO 2014183378A1 CN 2013085349 W CN2013085349 W CN 2013085349W WO 2014183378 A1 WO2014183378 A1 WO 2014183378A1
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WO
WIPO (PCT)
Prior art keywords
orientation
friction
plate
orientation device
substrate
Prior art date
Application number
PCT/CN2013/085349
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English (en)
French (fr)
Inventor
李辉
毛利军
魏永辉
李永涛
Original Assignee
北京京东方光电科技有限公司
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Application filed by 北京京东方光电科技有限公司 filed Critical 北京京东方光电科技有限公司
Publication of WO2014183378A1 publication Critical patent/WO2014183378A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing

Definitions

  • Embodiments of the present invention relate to the field of liquid crystal display manufacturing technology, and in particular, to an orientation device. Background technique
  • a metal pad surface is formed by a coating, an exposure, and an etching process, such as a metal wiring and an identification mark.
  • the metal is placed next to the active area of the display having a thin film transistor configuration such that the connection leads electrically conduct the active area of the display having the thin film transistor configuration.
  • the metal substrate area on the array substrate will be higher than the active area shown.
  • orientation is generally performed on a large glass substrate having a plurality of array substrates.
  • the conventional alignment process is as shown in Fig. 1.
  • the glass substrate 01 includes a plurality of array substrates including a bulk metal substrate region 011 and an active region 012 for display.
  • the orientation roller 02 of the orientation device has a circular cross section, and the orientation roller 02 can be rotated about the central axis by the motor.
  • the glass substrate 01 is moved relative to the orientation roller in the direction of the arrow as shown in FIG. 1, and the orientation on the orientation roller 02
  • the oriented hair 021 of the rubbing cloth will be in contact with the array substrate coated with the alignment liquid.
  • An alignment groove may be formed on the array substrate by friction with the array substrate.
  • the orientation of the glass substrate 01 by rolling causes the orientation of the orientation hair 021 to be different, and the conventional orientation roller 02 is oriented to each array when oriented.
  • the bulk metal substrate area 011 of the substrate (the metal substrate area 011 on the array substrate is higher than the active area 012 shown, and the degree of bending may also make the orientation hair 021 be different), the orientation roller 02 is a block metal
  • the substrate bottom region 011 is oriented, the degree of bending of the oriented hair 021 is as shown in FIG. 2
  • the orientation roller 02 is oriented in the effective region 012 for display, the degree of bending of the oriented hair 021 is as shown in FIG.
  • the block metal floor area 011 will exhibit defects of a plurality of black vertical tracks 0111, affecting the display area, such as Summary of the invention
  • Embodiments of the present invention provide an orientation device that avoids orientation of a bulk metal substrate region within a substrate, thereby improving uniformity of the alignment process.
  • the orientation device provided by the embodiment of the invention includes a base, the base having a support surface supporting the substrate, and further comprising:
  • each of the friction plates is attached with an orientation rubbing cloth toward one side of the support surface, the plane of the hair of the orientation rubbing cloth is a friction surface, and the friction surface is parallel to the support surface ;
  • a transmission that drives the friction plate to frictionally orient the active area of the substrate is
  • the transmission includes:
  • each of the friction plates is fixedly connected to one of the conveying mechanisms, and the other end is fixedly connected to another conveying mechanism, wherein the friction surface is
  • the spacing between the support surfaces of the abutments is adjustable.
  • each of the brackets includes at least two guide rods perpendicular to the support surface, a bracket slidably coupled to the guide rod, and a drive for driving the tray to slide along the guide rod
  • the device is disposed on a side of the pallet that faces away from the support surface.
  • the driving device comprises:
  • a driving motor fixed to the guiding rod and drivingly connected to one end of the driving screw; a slider fixed to the supporting surface and drivingly connected to one end of the driving screw.
  • each of the transport mechanisms is a conveyor belt.
  • each of the two ends of the friction plate is coupled to the two of the conveyor belts by a fixture.
  • each of the conveying mechanisms comprises: a conveying plate slidably engaged with the pallet, the conveying plate having a second slider facing one side of the supporting surface;
  • a stepping motor fixed to the pallet, an output shaft of the stepping motor and the second transmission wire One end of the bar is connected to the drive.
  • each of the two ends of the friction plate is coupled to the two transfer plates by a fixing member.
  • each of the conveying plates is provided with a plurality of spaced-apart card slots, one end of each of the friction plates is engaged with one of the card slots on one of the conveying plates, and the other end is coupled to the other The card slots at corresponding positions on the transport plate are engaged.
  • each of the guide bars is a drive screw driven by a drive motor, and the drive screw is provided with a slidable third slider, and both ends of the plate are fixed to the third slider.
  • the friction plates are a plurality of pieces, and the distance between adjacent two of the friction plates is equal.
  • a plurality of spaced apart oriented rubbing cloths are attached to each of the friction plates toward one side of the support surface.
  • each of the oriented rubbing cloths has a width of from 2 cm to 8 cm.
  • Figure 1 is a schematic view showing the orientation of a prior art orientation roller
  • Figure 2 is a view showing the degree of bending of the oriented hair when the orientation roller of the prior art is oriented in the block metal substrate region;
  • Figure 3 is a schematic view showing the degree of bending of the oriented hair when the orientation roller of the prior art is oriented in the displayed active area;
  • FIG. 4 is a schematic structural view of a block metal bottom region in a gray state
  • FIG. 5 is a schematic structural diagram of a first orientation device according to an embodiment of the present invention.
  • FIG. 6 is a schematic structural view of a second orientation device according to an embodiment of the present invention.
  • Figure 7 is a schematic view showing the structure of the orientation device shown in Figure 6 when the conveying device is a conveyor belt;
  • FIG. 8 is a schematic view showing the structure of the orientation device shown in Figure 6 when the conveying device is a conveying plate;
  • FIG. 9 is a schematic structural view of a conveying plate and a friction plate in a second orientation device according to an embodiment of the present invention. detailed description
  • the substrate is not limited to the size and structure as shown in FIG. 5.
  • the fifth embodiment of the present invention will be described with reference to the fifth generation line substrate (4*3).
  • the orientation device provided by the embodiment of the present invention can not only align the array substrate, but also can orient the color filter substrate. The orientation of the array substrate by the orientation device will be explained below as an example.
  • Example 1
  • the structure of the orientation device provided in this embodiment is as shown in FIG. 5, and includes a base 1 having a support surface for supporting the substrate 3.
  • the orientation device further includes:
  • At least one friction plate 2 (for example, three), one surface of each of the friction plates 2 facing the support surface is attached with an orientation rubbing cloth 21, the plane of the hair of the orientation rubbing cloth 21 is a friction surface, and the friction surface is parallel to the support surface;
  • a transmission device 4 that frictionally orients the movable region of the substrate 3 by the friction plate 2.
  • a plurality of uniformly distributed array substrates 31 are generally disposed on the substrate 3 (ie, there are n array substrates in a row direction, and m array substrates are arranged in a row), and each of the array substrates 31 has a block metal village.
  • the bottom region and the active region, and the upper edge of the bulk metal 311 coincides with the edge on the corresponding array substrate 31.
  • the substrate 3 is placed on the base 1, and an alignment liquid is applied on the substrate 3 to form an alignment layer, and the friction plates 2 are placed in the movable regions of the same row of array substrates 31, respectively.
  • the conveying direction of the transmission 4 is the moving direction a of the friction plate 2
  • the initial position of the orientation rubbing cloth 21 on the friction plate 2 is such that the upper edge of the orientation rubbing cloth 21 coincides with the lower edge of the bulk metal 311 ( That is, the orientation rubbing cloth is not in the block metal bottom region, and the friction surface between the friction plate 2 and the support surface is adjusted.
  • the distance is further adjusted to adjust the depth of the hair of the orientation rubbing cloth 21 into the orientation layer on the substrate 3, and the transmission device 4 drives the friction plate 2 to move, thereby driving the orientation rubbing cloth 21 to perform rubbing orientation on the substrate 3 (along the column direction of the substrate)
  • the moving distance (i.e., the orientation distance) of the orientation device is set as follows: Activity of each array substrate 31 The difference between the length L of the region and the width W of the orientation rubbing cloth 21.
  • each of the orientation rubbing cloths 21 is, for example, 2 cm to 8 cm. That is, the width of the orientation cloth 21 is smaller than the length of the active area of each of the array substrates 31.
  • the width W of each of the orientation rubbing cloths 21 can be, for example, about 2 cm, 4 cm, 6 cm, 8 cm or the like.
  • a plurality of spaced-apart oriented rubbing cloths 21 are attached to each of the friction plates 2 toward one side of the supporting surface for better uniform orientation of the substrate 3.
  • each of the friction plates may have only one piece of oriented rubbing cloth.
  • the orientation rubbing cloth is effectively prevented from being oriented to the bulk metal substrate region of the array substrate, and the substrate is oriented in a translational manner, so that the orientation hair can be bent to the same extent. Therefore, the orientation apparatus provided in this embodiment improves the uniformity of the orientation process.
  • Example 2
  • This embodiment provides a schematic structural view of a second orientation device as shown in FIG.
  • the orientation device comprises a base 1 , at least one friction plate 2 (for example three) and a transmission 4.
  • the transmission device of this embodiment includes:
  • each friction plate 2 is fixedly connected with one conveying mechanism 41, and the other end is fixedly connected with another conveying mechanism 41; wherein, between the friction surface and the supporting surface of the base 1
  • the spacing is adjustable.
  • each bracket includes at least two guide rods 51 perpendicular to the support surface, a bracket 52 slidably coupled to the guide rod 51, and a driving device for driving the carriage 52 to slide along the guide rod 51, and transporting
  • the mechanism 41 is disposed on a side of the pallet 52 that faces away from the support surface.
  • the pallet 52 is movable along the guide bar 51, so that the distance between the friction surface of the friction plate 2 and the support surface of the base 1 is adjustable.
  • the driving device may include: a drive screw 7 perpendicular to the support surface;
  • a slider 71 fixed to the pallet 52 and drivingly coupled to the drive screw 7.
  • the driving motor 6 drives the driving screw 7 to rotate, and the driving screw 7 drives the slider 71 to move up and down along the driving screw 7, and the slider 71 drives the pallet 52 to move up and down along the guiding rod 51, so
  • the distance between the friction surface of the friction plate 2 and the support surface of the base 1 is adjustable.
  • the guide bar 51 can also be replaced with a drive screw driven by a drive motor.
  • a slider is fixed at each end of the pallet, and each slider is connected with the driving screw to slide the slider on the driving screw.
  • the directions of rotation of the two drive screws need to be the same, and the transmission speeds of the two drive motors need to be the same.
  • each drive motor drives the corresponding drive screw to rotate, and the drive screw drives the slider to move up and down along the drive screw, and the slider drives the pallet to move up and down along the drive screw to achieve friction of the friction plate 2
  • the spacing between the face and the support surface of the base 1 is adjustable.
  • each conveying mechanism is, for example, a conveyor belt 411, and both ends of the friction plate 2 are mounted on the conveyor belt.
  • the conveyor belt 411 moves the friction plate 2, and the oriented hair of the orientation rubbing cloth 21 is rubbed against the substrate 3 to orient the active area of the array substrate 31 in the substrate 3.
  • the speed of the friction plate 2 transmitted by the conveyor belt 411 is relatively fast and uniform, and the transmission is relatively smooth.
  • each friction plate 2 is respectively connected to the two conveyor belts 411 by fixing members such as screws 8. . More preferably, a spacer may be provided at the fixing of the screw 8 and the conveyor belt 411 for fastening.
  • each transport mechanism includes:
  • a conveying plate 412 which is slidably engaged with the pallet 52, and a side of the conveying plate 412 facing the supporting surface has a sliding block 71';
  • a stepping motor 9 fixed to the pallet 52, an output shaft of the stepping motor 9 and a drive screw 7' One end of the drive connection.
  • both ends of the friction plate 2 are mounted on the transfer plate 412.
  • a sliding groove is provided on a side of the supporting plate 52 away from the supporting surface, and the stepping motor 9 drives the driving screw 7' to rotate, thereby driving the sliding block 71' to slide along the driving screw 7', so that the driving plate 412 can be pushed along the sliding slot slide.
  • the conveying plate 412 drives the friction plate 2 to move, and then the oriented hair of the orientation rubbing cloth 21 is rubbed against the substrate 3 to orient the active area of the array substrate 31 in the substrate 3.
  • each of the conveying plates 412 is provided with a plurality of spaced-apart card slots 4121, one end of each of the friction plates 2 is engaged with one of the card slots 4121 on one of the conveying plates 412, and the other end is transferred to the other.
  • the card slot 4121 at a corresponding position on the board 412 is engaged.
  • the orientation rubbing cloth is effectively prevented from being oriented to the bulk metal substrate region of the array substrate, and the substrate is oriented in a translational manner, so that the orientation hair can be bent to the same extent. Therefore, the orientation apparatus provided in this embodiment improves the uniformity of the orientation process.
  • the friction plates 2 may be one piece or a plurality of pieces. That is, when the substrate 3 is oriented by the orientation device provided by the embodiment of the present invention, the array substrate 31 on the same row on the substrate 3 may be first oriented using only one friction plate 2, and then the substrate 3 or the friction plate may be moved. 2, the array substrate 31 on the other rows on the substrate 3 is oriented; a plurality of friction plates 2 may also be used, and each row of the array substrate 31 on one substrate 3 corresponds to one friction plate 2, so that it can be operated once. All of the array substrates 31 on the substrate 3 are oriented, and the orientation speed is relatively fast. Preferably, if there are a plurality of blocks, the distance between the adjacent two friction plates 2 is equal.
  • the specific implementation process of the orientation device provided by the embodiment of the present invention for orienting the substrate is illustrated by a specific example.
  • the array substrate is arranged in an array of 4*3, and the size of each array substrate It is about 23 cm * 41 cm, the number of the friction plates 2 is three, and the number of the orientation rubbing cloths 21 on each of the friction plates 2 is 4 (that is, each array substrate corresponds to one orientation rubbing cloth), and each of the orientation rubbing cloths 21
  • the length of the belt is about 23.4cm, the width is about 4cm, and the distance that the conveyor belt 411 can move is about 37cm.
  • each of the friction plates 2 is placed in the movable area of the array substrate 21 of each row, and the initial position of the orientation rubbing cloth 21 on each of the friction plates 2 is: the upper edge of the orientation rubbing cloth 21 and the bulk metal 311 The lower edges of the overlap are coincident (the orientation rubbing cloth is not in the bulk metal floor area).
  • the driving motor 6 drives the driving screw 7 to rotate, thereby driving the slider 71 to move up and down along the driving screw 7, thereby driving the pallet 52 to move to adjust the distance between the friction surface of the friction plate 2 and the supporting surface, so that The hair of the oriented rubbing cloth 21 is pressed into the substrate 3 by a value of about 0.4 mm, and the belt 411 is moved, thereby causing the orientation rubbing cloth 21 to perform rubbing orientation on the substrate 3 (moving along the column direction of the substrate 3), and the moving distance of the belt When it is about 37 cm, the movement is stopped, and the orientation of the substrate 21 is completed.
  • the base 1 can also be moved so that each array substrate 31 within the substrate 3 can be oriented by relative displacement between the base 1 and the transmission 4.
  • the substrate when the orientation is performed, the substrate is placed on the base, and the friction plate is placed in the movable area of the substrate row upward, and the transmission device drives the friction plate to move, thereby driving the movement of the orientation friction cloth to the substrate.
  • the rubbing orientation of the regions effectively avoids the orientation of the oriented rubbing cloth to the bulk metal substrate region, and at the same time, the substrate is oriented in a translational manner, so that the oriented hair has the same degree of curvature. .
  • the orientation device provided by the embodiment of the invention avoids the orientation of the orientation roller in the existing orientation device to the bulk metal substrate region of the substrate, thereby avoiding the formation of the bulk metal in the gray state of the bulk metal substrate region.

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  • Spectroscopy & Molecular Physics (AREA)
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  • General Physics & Mathematics (AREA)
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Abstract

公开了一种取向装置，包括基台（1），基台（1）具有支撑基板（3）的支撑面；还包括至少一块摩擦板（2），每一块摩擦板（2）朝向支撑面的一面贴附有取向摩擦布（21），取向摩擦布（21）的毛发所在的平面为摩擦面，且摩擦面与支撑面平行；以及驱动摩擦板（2）对基板（3）的活动区域进行摩擦取向的传动装置（4）。该取向装置提高了取向工艺的均一性。

Description

取向装置 技术领域
本发明的实施例涉及液晶显示器制备工艺技术领域， 特别涉及一种取向 装置。 背景技术
传统的 TFT-LCD(Thin Film Transistor-Liquid Crystal Display,薄膜晶体管 液晶显示装置)制造工艺中， 将金属村垫（pad ) 区域利用镀膜、 曝光、 刻蚀 工艺将诸如金属布线和识别标识等块状金属放置在具有薄膜晶体管构造的显 示屏的有效区域旁， 以便连接引线使具有薄膜晶体管构造的显示屏的有效区 域导电。 这样， 阵列基板上的金属村底区域会高于显示的活动区域。
在液晶显示装置的生产过程中， 一般在一个具有多个阵列基板的大的玻 璃基板上进行取向。传统的取向工艺如图 1所示，玻璃基板 01包括多个阵列 基板， 该阵列基板包括块状金属村底区域 011和显示用的活动区域 012。 取 向装置的取向辊 02的截面为圓形， 取向辊 02可以在电机的带动下绕着中心 轴旋转， 玻璃基板 01相对取向辊沿如图 1所示的箭头方向移动， 取向辊 02 上的取向摩擦布的取向毛发 021将与涂覆有取向液的阵列基板接触， 由于玻 璃基板 01相对取向辊 02移动，取向毛发 021与阵列基板之间将产生摩擦力， 利用取向辊 02上的取向毛发 021与阵列基板之间的摩擦作用，可以在阵列基 板上形成取向沟槽。
但是， 由于一个玻璃基板 01只有一个取向辊 02, 采用滚动的方式对玻 璃基板 01进行取向，会使得取向毛发 021的弯曲程度不同，且传统的取向辊 02在取向时， 会取向到每一个阵列基板的块状金属村底区域 011 (阵列基板 上的金属村底区域 011会高于显示的活动区域 012, 高低程度不同也会使得 取向毛发 021的弯曲程度不同）， 取向辊 02对块状金属村底区域 011进行取 向时，取向毛发 021的弯曲程度如图 2所示，取向辊 02在显示用的有效区域 012内取向时， 取向毛发 021的弯曲程度如图 3所示。 在灰阶状态下， 块状 金属村底区域 011会呈现出多个黑色竖道 0111的缺陷，影响到显示区域，如 发明内容
本发明实施例提供了一种取向装置， 避免对基板内的块状金属村底区域 进行取向， 提高了取向工艺的均一性。
本发明实施例提供的取向装置， 包括基台， 所述基台具有支撑基板的支 撑面， 还包括：
至少一块摩擦板， 每一块所述摩擦板朝向所述支撑面的一面贴附有取向 摩擦布， 所述取向摩擦布的毛发所在的平面为摩擦面， 且所述摩擦面与所述 支撑面平行；
驱动所述摩擦板对所述基板的活动区域进行摩擦取向的传动装置。
在一个实施例中， 所述传动装置包括：
分别位于所述基台相对的两侧的支架；
设置于每一个所述支架上的输送机构， 每一块所述摩擦板的一端与一个 所述输送机构固定连接， 另一端与另一个所述输送机构固定连接， 其中， 所 述摩擦面与所述基台的支撑面之间的间距可调。
在一个实施例中， 每一个所述支架包括至少两根与所述支撑面垂直的导 向杆、 与所述导向杆滑动连接的托板、 以及驱动所述托板沿所述导向杆滑动 的驱动装置， 所述输送机构设置于所述托板背离所述支撑面的一面。
在一个实施例中， 所述驱动装置包括：
与所述支撑面垂直的传动丝杠；
与所述导向杆相对固定、且与所述传动丝杠的一端传动连接的驱动电机； 固定于所述支撑面上、 且与所述传动丝杠的一端传动连接的滑块。
在一个实施例中， 每一个所述输送机构为传送带。
在一个实施例中， 每一块所述摩擦板的两端分别与两个所述传送带通过 固定件连接。
在一个实施例中， 每一个所述输送机构包括： 与所述托板滑动配合的传 送板， 所述传送板朝向所述支撑面的一面具有第二滑块；
与所述第二滑块传动连接的第二传动丝杠；
固定于所述托板上的步进电机， 该步进电机的输出轴与所述第二传动丝 杠的一端传动连接。
在一个实施例中， 每一块所述摩擦板的两端分别与两个所述传送板通过 固定件连接。
在一个实施例中， 每一个所述传送板设置有多个间隔分布的卡槽， 每一 个所述摩擦板一端与一个所述传送板上的一个所述卡槽卡合， 另一端与另一 个所述传送板上的对应位置处的所述卡槽卡合。
在一个实施例中， 每一个所述导向杆为由驱动电机驱动的传动丝杠， 传 动丝杠上设置有可滑动的第三滑块， 托板的两端固定至该第三滑块。
在一个实施例中， 所述摩擦板为多块， 且相邻两块所述摩擦板之间的距 离相等。
在一个实施例中， 每一块所述摩擦板朝向所述支撑面的一面贴附有多个 间隔分布的取向摩擦布。
在一个实施例中， 每一个所述取向摩擦布的宽度为 2cm~8cm。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 筒单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1为现有的取向辊取向示意图；
图 2为现有的取向辊在块状金属村底区域取向时取向毛发的弯曲程度示 意图；
图 3为现有的取向辊在显示的活动区域取向时取向毛发的弯曲程度示意 图；
图 4为块状金属村底区域在灰阶状态下的结构示意图；
图 5为本发明实施例提供的第一种取向装置结构示意图；
图 6为本发明实施例提供的第二种取向装置结构示意图；
图 7为图 6所示的取向装置中输送装置为传送带时的沿 b向观察的结构 示意图；
图 8为图 6所示的取向装置中输送装置为传送板时的沿 b向观察的结构 示意图； 图 9为本发明实施例提供的第二种取向装置中传送板与摩擦板的结构示 意图。 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例中的附图， 对本发明实施例中的技术方案进行清楚、 完整地描述， 显然， 所描述的实施例仅仅是本发明一部分实施例， 而不是全部的实施例。 基于所描述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前 提下所获得的所有其他实施例， 都属于本发明保护的范围。
需要说明的是， 在显示领域中， 基板不限于如图 5所示的尺寸和结构， 为方便说明， 下面的实施例中均参照第五代线基板（4*3 )为例进行说明。 另 夕卜， 本发明实施例提供的取向装置不仅仅对阵列基板可以取向， 也可以对彩 膜基板进行取向。 下文以取向装置对阵列基板进行取向为例进行解释说明。 实施例 1
本实施例提供的取向装置的结构如图 5所示， 包括基台 1 , 基台 1具有 支撑基板 3的支撑面， 该取向装置还包括：
至少一块摩擦板 2 (例如三个 ), 每一块摩擦板 2朝向支撑面的一面贴附 有取向摩擦布 21 , 取向摩擦布 21的毛发所在的平面为摩擦面， 且摩擦面与 支撑面平行；
驱动摩擦板 2对基板 3的活动区域进行摩擦取向的传动装置 4。
如图 5所示， 基板 3上一般设置有多个均匀分布的阵列基板 31 (即行向 有 n个阵列基板， 列向有 m个阵列基板）， 且每一个阵列基板 31上具有块状 金属村底区域和活动区域， 且块状金属 311 的上边缘与对应的阵列基板 31 上的边缘重合。
在取向时， 将基板 3放在基台 1上， 在基板 3上涂覆取向液以形成取向 层， 将摩擦板 2分别放置在同一行阵列基板 31的活动区域内。 例如， 在传动 装置 4的传送方向是摩擦板 2的运动方向 a时，摩擦板 2上的取向摩擦布 21 的初始位置为：取向摩擦布 21的上边缘与块状金属 311的下边缘重合（即取 向摩擦布不在块状金属村底区域中）,调节摩擦板 2的摩擦面与支撑面之间的 距离，进而调整取向摩擦布 21的毛发压入基板 3上取向层内的深度，传动装 置 4驱动摩擦板 2移动，进而带动取向摩擦布 21在基板 3上进行摩擦取向（沿 着基板的列向移动）， 为了避免取向摩擦布 21取向到下一行上的每一个阵列 基板 31的块状金属 311所在的区域,设定取向装置的移动距离（即取向距离） 为： 每一个阵列基板 31的活动区域的长度 L与取向摩擦布 21的宽度 W之 差。
在本实施例中， 如图 6 所示， 每一个取向摩擦布 21 的宽度例如为 2cm~8cm。 也就是说， 取向布 21的宽度要小于每一个阵列基板 31的活动区 域的长度 每一个取向摩擦布 21的宽度 W例如可以为约 2cm、 4cm、 6cm、 8cm等。 在本实施例中， 每一块摩擦板 2朝向支撑面的一面贴附有多个间隔 分布的取向摩擦布 21 ,便于更好的对基板 3进行均匀取向。在其他实施例中， 每一个摩擦板上可仅具有一块取向摩擦布。
通过本实施例提供的取向装置， 有效地避免了取向摩擦布取向到阵列基 板的块状金属村底区域， 同时采用平动的方式对基板进行取向， 可以使取向 毛发的弯曲程度相同。 所以， 本实施例提供的取向装置， 提高了取向工艺的 均一性。 实施例 2
本实施例提供了如图 6所示的第二种取向装置结构示意图。 该取向装置 包括基台 1 , 至少一块摩擦板 2 (例如三个）和传动装置 4。 与实施例 1不同 的是， 本实施例的传动装置包括：
分别位于基台 1相对的两侧的支架（图中未示出）；
设置于每一个支架上的输送机构 41 ,每一块摩擦板 2的一端与一个输送 机构 41固定连接， 另一端与另一个输送机构 41固定连接； 其中， 摩擦面与 基台 1的支撑面之间的间距可调。
例如， 如图 7 所示， 每一个支架包括至少两根与支撑面垂直的导向杆 51、 与导向杆 51滑动连接的托板 52、 以及驱动托板 52沿导向杆 51滑动的 驱动装置，输送机构 41设置于托板 52背离支撑面的一面。托板 52可以沿着 导向杆 51移动，进而实现摩擦板 2的摩擦面与基台 1的支撑面之间的间距可 调。 继续参考图 7, 例如， 在一个示例中， 驱动装置可以包括： 与支撑面垂直的传动丝杠 7;
固定于支撑面上且与传动丝杠 7的一端传动连接的驱动电机 6;
固定于托板 52、 与传动丝杠 7传动连接的滑块 71。
在工作时， 驱动电机 6驱动传动丝杠 7转动， 传动丝杠 7带动滑块 71 沿着传动丝杠 7上下移动， 滑块 71又带动托板 52沿着导向杆 51上下移动， 因此， 可以实现摩擦板 2的摩擦面与基台 1的支撑面之间的间距可调。
在另一个示例中， 还可以将导向杆 51 替换为由驱动电机驱动的传动丝 杠。 此时，托板的两端各固定有一个滑块，每一个滑块与传动丝杠传动连接， 以使滑块在传动丝杠上滑动。 进一步地， 为了保持托板移动的平稳性， 且始 终保持与支撑面平行， 两个传动丝杠的转动方向需要相同， 两个驱动电机的 传动速率需要相同。 工作时， 每一个驱动电机驱动对应的传动丝杠转动， 传 动丝杠带动滑块可以沿着传动丝杠上下移动， 滑块又带动托板沿着传动丝杠 上下移动， 实现摩擦板 2的摩擦面与基台 1的支撑面之间的间距可调。
本实施例的输送机构可以具有以下两种结构：
输送机构的结构一
如图 7所示， 每一个输送机构例如为传送带 411 , 摩擦板 2的两端安装 在该传送带上。 工作时， 传送带 411带动摩擦板 2移动， 进而带动取向摩擦 布 21的取向毛发摩擦基板 3 , 对基板 3内的阵列基板 31的活动区域进行取 向。 采用传送带 411传送摩擦板 2的速度比较快且均匀， 传送的比较平稳。
可选地， 为了防止传送带 411在移动过程中， 摩擦板 2从传送带 411上 脱落， 如图 7所示， 每一块摩擦板 2的两端分别与两个传送带 411通过诸如 螺釘 8的固定件连接。 更优选地， 可在螺釘 8与传送带 411的固定处设置垫 片以用于紧固。
输送机构的结构二
如图 8所示， 每一个输送机构包括：
与托板 52滑动配合的传送板 412,传送板 412朝向支撑面的一面具有滑 块 71';
与滑块 7Γ传动连接的传动丝杠 7'；
固定于托板 52上的步进电机 9, 该步进电机 9的输出轴与传动丝杠 7' 的一端传动连接。
工作时，将摩擦板 2的两端安装在该传送板 412上。托板 52背离支撑面 的一面设有滑槽， 步进电机 9驱动传动丝杠 7'转动， 进而带动滑块 71'沿着传 动丝杠 7'滑动， 从而可以推动传动板 412沿着滑槽滑动。 传送板 412带动摩 擦板 2移动， 进而带动取向摩擦布 21的取向毛发摩擦基板 3 , 对基板 3内的 阵列基板 31的活动区域进行取向。
可选地， 如图 8所示， 每一块摩擦板 2的两端分别与两个传送板 412通 过诸如螺釘 8的固定件连接。 或者， 如图 9所示， 每一个传送板 412设置有 多个间隔分布的卡槽 4121 ,每一个摩擦板 2一端与一个传送板 412上的一个 卡槽 4121卡合， 另一端与另一个传送板 412上的对应位置处的卡槽 4121卡 合。 这种固定方式， 便于安装和拆卸摩擦板 2。
通过本实施例提供的取向装置， 有效地避免了取向摩擦布取向到阵列基 板的块状金属村底区域， 同时采用平动的方式对基板进行取向， 可以使取向 毛发的弯曲程度相同。 所以， 本实施例提供的取向装置， 提高了取向工艺的 均一性。
在本发明的以上实施例中， 摩擦板 2可以为一块， 也可以为多块。 也就 是说， 用在本发明实施例提供的取向装置给基板 3取向时， 可以只采用一个 摩擦板 2先对基板 3上的同一行上的阵列基板 31进行取向，然后移动基板 3 或者摩擦板 2, 对基板 3上的其它行上的阵列基板 31进行取向； 也可以采用 多个摩擦板 2, —个基板 3上的每一行阵列基板 31对应一个摩擦板 2, 这样 可以操作一次便可以对基板 3上的所有阵列基板 31进行取向，取向速度比较 快。 优选地， 若为多块时， 相邻两块摩擦板 2之间的距离相等。 下面通过具体示例说明本发明实施例提供的取向装置对基板进行取向时 的具体实现过程。
以第五代线玻璃基板 ( l.lm*1.3m )为例， 并结合图 6、 7 以输送机构 为传送带进行说明： 阵列基板按 4*3的阵列方式排布， 每个阵列基板的尺寸 为约 23cm*41cm,摩擦板 2的数量为 3块，每块摩擦板 2上的取向摩擦布 21 的个数为 4 (即每一个阵列基板对应一个取向摩擦布），每一个取向摩擦布 21 的长度约为 23.4cm, 宽度约为 4cm,传送带 411可移动的距离约为 37cm (该 距离等于 L-W ), 取向摩擦布 21的毛发长度： 约 1.2mm, 取向摩擦布 21上 的毛发压入阵列基板内的压入量约为 0.4mm。 在取向时， 将每一块摩擦板 2 放置在各行的阵列基板 21的活动区域内， 每一块摩擦板 2上的取向摩擦布 21的初始位置为：取向摩擦布 21的上边缘与块状金属 311的下边缘重合（取 向摩擦布不在块状金属村底区域中）。 工作时， 驱动电机 6驱动传动丝杠 7 转动， 进而带动滑块 71沿着传动丝杠 7上下移动， 从而带动托板 52移动来 调节摩擦板 2的摩擦面与支撑面之间的距离，使得取向摩擦布 21的毛发压入 基板 3内的值约为 0.4mm, 传送带 411移动， 进而带动取向摩擦布 21在基 板 3上进行摩擦取向（沿着基板 3的列向移动），传送带的移动距离为约 37cm 时， 停止移动， 对基板 21的取向完成。
在本发明其他实施例中， 也可以使基台 1是可以移动的， 这样便可以通 过基台 1与传动装置 4之间的相对位移对基板 3内的每一个阵列基板 31进行 取向。
上述本发明实施例提供的取向装置， 在取向时， 将基板放在基台上， 摩 擦板放置在基板行向上的活动区域内， 传动装置驱动摩擦板移动， 进而带动 取向摩擦布对基板的活动区域进行摩擦取向（沿着基板 3的列向移动），有效 地避免了取向摩擦布取向到块状金属村底区域， 同时采用平动的方式对基板 进行取向， 可以使取向毛发的弯曲程度相同。
上述本发明实施例提供的取向装置， 避免了现有取向装置中取向辊取向 到基板的块状金属村底区域， 也就避免了块状金属村底区域在灰阶状态下形 成与块状金属宽度相等的取向沟槽现象的发生。 所以， 上述本发明实施例提 供的取向装置， 提高了取向工艺的均一性。
以上所述仅是本发明的示范性实施方式， 而非用于限制本发明的保护范 围， 本发明的保护范围由所附的权利要求确定。

Claims

权利要求书
1、一种取向装置， 包括基台，所述基台具有支撑基板的支撑面，还包括： 至少一块摩擦板， 每一块所述摩擦板朝向所述支撑面的一面贴附有取向 摩擦布， 所述取向摩擦布的毛发所在的平面为摩擦面， 且所述摩擦面与所述 支撑面平行；
驱动所述摩擦板对所述基板的活动区域进行摩擦取向的传动装置。
2、 根据权利要求 1所述的取向装置， 其中所述传动装置包括： 分别位于所述基台相对的两侧的支架；
设置于每一个所述支架上的输送机构， 每一块所述摩擦板的一端与一个 所述输送机构固定连接， 另一端与另一个所述输送机构固定连接， 其中， 所 述摩擦面与所述基台的支撑面之间的间距可调。
3、根据权利要求 2所述的取向装置，其中每一个所述支架包括至少两根 与所述支撑面垂直的导向杆、 与所述导向杆滑动连接的托板、 以及驱动所述 托板沿所述导向杆滑动的驱动装置， 所述输送机构设置于所述托板背离所述 支撑面的一面。
4、 根据权利要求 3所述的取向装置， 其中所述驱动装置包括： 与所述支撑面垂直的传动丝杠；
固定于所述支撑面上、 且与所述传动丝杠的一端传动连接的驱动电机； 固定于所述托板、 与所述传动丝杠传动连接的第一滑块。
5、根据权利要求 3所述的取向装置，其中每一个所述输送机构为传送带。
6、根据权利要求 5所述的取向装置，其中每一块所述摩擦板的两端分别 与两个所述传送带通过固定件连接。
7、 根据权利要求 3所述的取向装置， 其中每一个所述输送机构包括： 与所述托板滑动配合的传送板， 所述传送板朝向所述支撑面的一面具有 第二滑块；
与所述第二滑块传动连接的第二传动丝杠；
固定于所述托板上的步进电机， 该步进电机的输出轴与所述第二传动丝 杠的一端传动连接。
8、根据权利要求 7所述的取向装置，其中每一块所述摩擦板的两端分别 与两个所述传送板通过固定件连接。
9、根据权利要求 7所述的取向装置，其中每一个所述传送板设置有多个 间隔分布的卡槽， 每一个所述摩擦板一端与一个所述传送板上的一个所述卡 槽卡合， 另一端与另一个所述传送板上的对应位置处的所述卡槽卡合。
10、 根据权利要求 3所述的取向装置， 其中每一个所述导向杆为由驱动 电机驱动的传动丝杠， 传动丝杠上设置有可滑动的第三滑块， 托板的两端固 定至该第三滑块。
11、 根据权利要求 1~10任一项所述的取向装置， 其中所述摩擦板为多 块， 且相邻两块所述摩擦板之间的距离相等。
12、根据权利要求 11所述的取向装置，其中每一块所述摩擦板朝向所述 支撑面的一面贴附有多个间隔分布的取向摩擦布。
13、根据权利要求 12所述的取向装置，其中每一个所述取向摩擦布的宽 度为 2cm~8cm„
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5870210A (ja) * 1981-10-22 1983-04-26 Dainippon Printing Co Ltd ラビング処理方法
JPS62270918A (ja) * 1986-05-20 1987-11-25 Stanley Electric Co Ltd 液晶表示素子の傾斜配向処理方法
JPS62280821A (ja) * 1986-05-30 1987-12-05 Stanley Electric Co Ltd 液晶表示素子の傾斜配向処理方法
JPH04241322A (ja) * 1991-01-16 1992-08-28 Fujitsu Ltd ラビング布材およびラビング装置
JP2009069737A (ja) * 2007-09-18 2009-04-02 Mitsubishi Electric Corp ラビング装置およびラビング方法
CN101770115A (zh) * 2008-12-30 2010-07-07 北京京东方光电科技有限公司 取向膜摩擦工艺及设备

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5870210A (ja) * 1981-10-22 1983-04-26 Dainippon Printing Co Ltd ラビング処理方法
JPS62270918A (ja) * 1986-05-20 1987-11-25 Stanley Electric Co Ltd 液晶表示素子の傾斜配向処理方法
JPS62280821A (ja) * 1986-05-30 1987-12-05 Stanley Electric Co Ltd 液晶表示素子の傾斜配向処理方法
JPH04241322A (ja) * 1991-01-16 1992-08-28 Fujitsu Ltd ラビング布材およびラビング装置
JP2009069737A (ja) * 2007-09-18 2009-04-02 Mitsubishi Electric Corp ラビング装置およびラビング方法
CN101770115A (zh) * 2008-12-30 2010-07-07 北京京东方光电科技有限公司 取向膜摩擦工艺及设备

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