Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/0605—Carbon
• • C—CHEMISTRY; METALLURGY
  • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
  • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
  • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
  • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
  • C04B35/52—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbon, e.g. graphite
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/0605—Carbon
  • C23C14/0611—Diamond
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/24—Vacuum evaporation
  • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
  • C23C14/325—Electric arc evaporation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/34—Sputtering
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
  • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
  • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
  • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
  • C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
  • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
  • C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
  • H01J37/32055—Arc discharge
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
  • H01J37/32321—Discharge generated by other radiation
  • H01J37/32339—Discharge generated by other radiation using electromagnetic radiation
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
  • H01J37/3411—Constructional aspects of the reactor
  • H01J37/3438—Electrodes other than cathode
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
  • H01J2237/32—Processing objects by plasma generation
  • H01J2237/327—Arrangements for generating the plasma
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
  • H01J2237/32—Processing objects by plasma generation
  • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
  • H01J2237/332—Coating
  • H01J2237/3321—CVD [Chemical Vapor Deposition]

Definitions

• the invention relates to a process for the production of wear protection layers, which have been formed on surfaces of components of internal combustion engines which are exposed to frictional wear by means of electrical arc discharge under vacuum conditions on the respective surface, and wear protection layers produced by the process.
• the wear protection layers are formed from hydrogen-free, tetrahedral amorphous carbon (ta-C) hybridized from sp 2 and sp 3 . It has been found that this type of layers, in which a maximum hydrogen content of 1 atomic%, preferably at most 0.5 atomic%, is still permissible, have particularly favorable wear and sliding properties.
• Such layers can be produced by various PVD vacuum coating methods using a graphite cathode. It has been found that a particularly high coating rate can be achieved in processes in which electrical arc discharges can be achieved between an anode or a cathode formed from graphite. In these methods, however, it is disadvantageous that in the coating larger particles or so-called droplets are formed, which are deposited in the layer and the surface properties are adversely affected thereby, so that the surface must be leveled by a post-processing.
• This type of layers but also in a conventional method, in which an electric arc discharge in a vacuum to produce of the plasma is used without the
• Arc discharge initiated with a laser beam can be applied.
• the arc discharge can be ignited in a known manner, either alone by a sufficiently high voltage between an anode and a target connected as a cathode and, secondly, there is the possibility of ignition by means of electrically conductive ignition elements due
• the structure of these systems is very complex and correspondingly expensive.
• the diameter of the magnetic filter and thus the diameter of the coating surface is limited to approximately 150 mm due to the required powerful magnetic fields and the required electrical power.
• the coating rate of the processes is reduced to about 15-20% as compared to that without using the magnetic filter.
• Claim 7 relates to wear protection layers produced by the method.
• Advantageous embodiments and developments of the invention can be realized with features that are designated in the subordinate claims.
• a plasma is formed by means of pulsed laser irradiation of sequentially ignited electrical arc discharges under vacuum conditions in which the electrical arc discharge between an anode and a graphite cathode is operated.
• ta-C tetrahedral amorphous
• ta-C tetrahedral amorphous
• Positively charged ions of the plasma are moved by means of an absorber electrode in the direction of the at least one component.
• at least approximately the same electrical voltage is applied to the anode and the absorber electrode.
• an electrical current flows through the absorber electrode that is at least 1.5 times greater, preferably at least twice greater than the electrical current that flows through the anode.
• a subsequent smoothing of the surface of the formed wear protection layer is not required in particular by the influence of the respectively different electrical current flowing through the anode and the absorber electrode.
• the plasma is formed within a laser arc chamber and deflected into a vacuum chamber in which the at least one component is arranged.
• the laser arc chamber can be flanged to the vacuum chamber.
• a vacuum is also maintained in the laser arc chamber.
• a thin adhesive layer may be deposited on the at least one component.
• an absorber electrode with a plurality of strips can be used. Between the strips larger droplets or droplets can be removed so that they do not hit the surface of the at least one component. A reflection of the direction of droplets inducing reflection can be avoided as far as possible.
• the wear protection layer produced according to the invention is formed on surfaces of components of internal combustion engines which are exposed to frictional wear. They have been formed by electrical arc discharge under vacuum conditions on the respective surface, and are made of at least approximately hydrogen-free, tetrahedral amorphous (ta-
• C) consisting of a mixture of sp 2 and sp 3 hybrized carbon educated.
• they can be formed with the already mentioned laser are method.
• the wear protection layer has a microhardness of at least 3500 HV and an arithmetic mean roughness R a of 0.1 ⁇ . No subsequent mechanical, physical and / or chemical surface treatment is required in order to be able to comply with these roughness values.
• the wear protection layer produced according to the invention can advantageously also have an average roughness R z of at most 1.0 ⁇ m.
• the mean roughness depth R z corresponds to the arithmetic mean of the individual depths of all measured values.
• the wear protection layer produced according to the invention should have a reduced peak height R pk of not more than 0.35 ⁇ m, preferably not more than 0.25 ⁇ m. This value is particularly important from the viewpoint of reduced sliding friction and therefore advantageous.
• Both the arithmetic mean roughness value R a , as well as the other two roughness values R 2 and Pk can be determined with the known stylus method.
• a stylus tip which preferably consists of diamond, and has a small tip radius, should be used.
• the wear protection layer has a microhardness of at least 3500 HV, preferably of 4000 HV, more preferably of at least 5000 HV, particularly preferably of at least 5700 HV and very particularly preferably of 6000 HV and preferably a mean roughness R a of less than 0.08 ⁇ , particularly preferably less than 0.05 m_auf utilizat, whereby the wear resistance and the life can be further improved or increased.
• a device "FISCHERSCOPE H100C XYP" from Helmut Fischer GmbH & Co.
• Piston pin can in a tribological system consisting of counter-body Connecting rod with bushing (brass) and piston made of aluminum with a vibrating friction wear tribometer with piston pin module from Optimol Instruments exctechnik GmbH a coefficient of friction of less than 0.03, preferably less than 0.025 can be achieved. This applies to oil-lubricated tests even in a temperature range between 100 ° C and 130 ° C, as is typical for components of internal combustion engines. The coefficient of friction changes only slightly over the life of a coated component, whereby a reduction in the coefficient of friction could be detected after a short break-in period.
• the wear rate can be reduced by a factor of 3 compared to conventional DLC coatings.
• the proportion of sp 3 hybridized carbon should be well above 40%, preferably above 50%.
• the wear protection layer should contain no other chemical elements, such as metals or halogens or phosphorus. This also applies to chemical compounds.
• the layer thicknesses should be at least 0.5 ⁇ , preferably at least 2 ⁇ or more.
• At least one adhesion and / or intermediate layer may have been formed on the surface to be coated, on which then a wear protection layer according to the invention is formed.
• a chromium layer can be selected with a layer thickness of at least 0.1 ⁇ .
• a cylindrical cathode made of graphite, which rotates about its longitudinal axis during the process, so that the respective bases of the electrical arc discharges run over the entire surface of the cathode, thereby achieving a uniform removal of the carbon can be.
• the laser beam can also be pulsed operated and deflected so that it impinges on the surface of the cathode at different predetermined positions and there as a result of the energy input an electric arc discharge can be ignited at each laser pulse.
• the electrical voltage between an anode and the cathode is controlled so that the arc extinguishes after a predetermined time again, and then to ignite at another position a renewed arc discharge.
• the layer thickness of a wear protection layer to be formed can be influenced by means of the number of utilized electrical arc discharges, given a known size of a surface to be coated. Other process parameters should then be kept as constant as possible. With the parameters electrical current and voltage with the electrical arc discharges are operated, their duration, the pulse rate and a voltage applied to a component to be coated (substrate) during the arc pulse bias voltage can also be influenced on the trainee layer. This applies in particular to the layer structure and in particular the proportions of sp 2 and sp 3 hybridized
• electrical currents above 1000 A preferably above 1500 A can be used and a pulse frequency between 300 Hz and 600 Hz can be selected. It is possible to apply a BIAS voltage in the range -50 V to -200 V, preferably in the range 100 V, to the component to be coated.
• an electrical current of 500 A ⁇ 100 A (preferably ⁇ 50 A) can flow through the anode and 1100 A ⁇ 100 A (preferably ⁇ 50 A) through the absorber electrode when electric arc discharges have been ignited and operated.
• the operation of electric arc discharges can be carried out with a pulse duration in the range 250 ⁇ $ to 600 ⁇ 5.
• a termination of the electric arc discharges can be achieved by reducing the electrical voltage at least at the anode.
• An ignition of electric arc discharges after pulsed irradiation of the surface of the cathode with a laser beam directed onto the surface can be carried out at an increased electrical voltage, which after Ignition of the respective electric arc discharge is reduced.
• a device When coating, a device should be used to prevent larger particles from striking the surface to be coated. This can be an absorber electrode in each case alone.
• a structure can be used, as it is known from DE 10 2006 009 160 AI, whose disclosure content is to be incorporated herein by reference.
• at least one permanent magnet element is used which is aligned parallel to the axis of rotation of the cathode or parallel to the surface of a cathode.
• an absorber electrode is present with which an electric field is formed, is guided by the plasma formed by the electric arc discharge. With both the permanent magnet element (s) and the absorber electrode, larger particles contained in the plasma can be influenced in their movement, in particular in their direction of movement, so that they do not impinge on the surface to be coated or there at an angle Installation in the layer avoids.
• At least one diaphragm can be arranged between the surface of a component to be coated and the cathode, by means of which the plasma containing the carbon ions, which can be used for layer formation, is guided in the direction of the surface to be coated.
• the absorber electrode can be arranged in the direction of movement of the plasma after a diaphragm and / or anode.
• a permanent magnet element can be arranged, for example, in the shadow of a diaphragm or of an aperture element.
• Figure 1 in schematic form the structure of a device for
• FIG. 1 shows a vacuum coating installation with a vacuum chamber 1 in which a rotating device is fixed in the components 14 to be coated, and can be coated with both double and triple rotation.
• a rotating device is fixed in the components 14 to be coated, and can be coated with both double and triple rotation.
• known arc discharge or sputtering sources 2 or a combination of both for plasma etching or the deposition of a thin adhesive layer are present.
• a laser arc chamber 3 is flanged with a rotating graphite roller as KathodelO and a film 11 to protect the laser entrance window from vapor deposition.
• a filter module 4 with service door and internal structure of the absorber-anode arrangement 5, 6 and laterally mounted permanent magnet arrangement 7 is present.
• the reference numeral 12 illustrates the path from the larger particles selected from the generated plasma by means of electrical arc discharge between the cathode 10 and the anode 6 in the direction of the absorber electrode 5 with an arrow.
• the electric arc discharges are ignited by means of the deflectable laser beam 9 on the surface of the cathode 10, which consists of 99.9% graphite.
• the cathode 10 rotates about an axis of rotation, which is aligned perpendicular to the plane of the drawing and the laser beam 9 is deflected along this axis of rotation.
• the absorber electrode 5 is connected to an electrically positive potential. It is formed with a plurality of electrically conductive strip-shaped elements, which are arranged at a distance from each other. Between the strip-shaped elements, gaps are formed through which larger particles can be guided.
• the reference numeral 13 illustrates the path of the deflected carbon ions of the plasma to the rotating device with the components to be coated 14 with an arrow.
• wear protection layers on the surfaces of the components 14 should preferably be coated with triple rotation.
• a Cr-adhesion layer with a thickness of about 0.1 pm is deposited by means of sputtering.
• the deposition of the ta-C layer takes place with a thickness of about 1 pm. Due to the selected parameters of the pulsed laser arc source, electric arc current 1600 A, pulse length 350 ps at a frequency of 520 Hz in combination with the substrate bias parameters adapted to the laser arc source in a high voltage range of - 800 V. with a pulse length of 350 ps and a low voltage range of -100 V with a pulse length of 200 ps, very hard and smooth ta-C layers with a high adhesion to the device surface (Rc 1) are deposited. There is a division of the electric current, with 1100 A flow through the absorber electrode 5 and 500 A through the anode 6. The anode 6 is arranged closer to the cathode 10 than the foot of the absorber electrode 5 pointing in the direction of the cathode 10.
• the roughness values determined by means of profilometer are: R a on average 0.09 ⁇ m, R z on average 1.0 ⁇ m and R pk on average 0.28 ⁇ m.
• the microhardness of the wear protection layer determined by means of Fisher's Scope is 7040 HV or the E-modul determined by Lawave is 740 GPa.

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• Chemical & Material Sciences (AREA)
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• 2014
  • 2014-04-30 EP EP14720969.6A patent/EP2992121B1/de active Active
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