JP6621401B2 - 耐摩耗層を生産する方法およびその方法によって生産された耐摩耗層 - Google Patents

耐摩耗層を生産する方法およびその方法によって生産された耐摩耗層 Download PDF

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JP6621401B2
JP6621401B2 JP2016511068A JP2016511068A JP6621401B2 JP 6621401 B2 JP6621401 B2 JP 6621401B2 JP 2016511068 A JP2016511068 A JP 2016511068A JP 2016511068 A JP2016511068 A JP 2016511068A JP 6621401 B2 JP6621401 B2 JP 6621401B2
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plasma
cathode
wear
anode
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JP2016524651A5 (enExample
JP2016524651A (ja
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アンドレアス レソン
アンドレアス レソン
ハンス−ヨアヒム シャイベ
ハンス−ヨアヒム シャイベ
フランク−ペーター バッハ
フランク−ペーター バッハ
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フラウンホッファー−ゲゼルシャフト・ツァー・フォデラング・デル・アンゲワンテン・フォーシュング・エー．ファウ．
ハー−オー−テー ヘァテ− ウント オーバーフレッヘンテヒニク ゲーエムベーハー ウント コー．カーゲー
ハー−オー−テー ヘァテ− ウント オーバーフレッヘンテヒニク ゲーエムベーハー ウント コー．カーゲー
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/52—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbon, e.g. graphite
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C23C14/0611—Diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
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    • C—CHEMISTRY; METALLURGY
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
    • C—CHEMISTRY; METALLURGY
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    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/32339—Discharge generated by other radiation using electromagnetic radiation
    • H—ELECTRICITY
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    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma
    • H—ELECTRICITY
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    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]

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  • Chemical & Material Sciences (AREA)
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  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
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JP2016511068A 2013-04-30 2014-04-30 耐摩耗層を生産する方法およびその方法によって生産された耐摩耗層 Active JP6621401B2 (ja)

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DE102013007986.1 2013-04-30
DE102013007986 2013-04-30
PCT/EP2014/058884 WO2014177641A1 (de) 2013-04-30 2014-04-30 VERFAHREN ZUR HERSTELLUNG EINER VERSCHLEIßSCHUTZSCHICHT UND MIT DEM VERFAHREN HERGESTELLTE VERSCHLEIßSCHUTZSCHICHT

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JP2016524651A JP2016524651A (ja) 2016-08-18
JP2016524651A5 JP2016524651A5 (enExample) 2017-05-25
JP6621401B2 true JP6621401B2 (ja) 2019-12-18

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US (1) US9803273B2 (enExample)
EP (1) EP2992121B1 (enExample)
JP (1) JP6621401B2 (enExample)
KR (1) KR20160003045A (enExample)
PL (1) PL2992121T3 (enExample)
WO (1) WO2014177641A1 (enExample)

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DE102017220152B4 (de) * 2017-11-13 2021-01-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Antriebsanordnung für ein Zweirad
CN109055901A (zh) * 2018-10-25 2018-12-21 大连维钛克科技股份有限公司 一种提高硬质涂层与基材结合力的装置及工艺
JP7417916B2 (ja) * 2018-11-06 2024-01-19 株式会社ダイセル 炭素移着膜が形成された摺動部材
DE102019210061A1 (de) * 2019-07-09 2021-01-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Auf Gleitreibung beanspruchtes System
EP4004251A1 (en) * 2019-07-31 2022-06-01 Oerlikon Surface Solutions AG, Pfäffikon Graded hydrogen-free carbon-based hard material layer coated onto a substrate
DE102019213573A1 (de) * 2019-09-06 2021-03-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Ausbildung einer mit ta-C gebildeten Schicht oder einer mit mindestens einer mit ta-C gebildeten Schicht gebildeten Beschichtung sowie damit ausgebildet ta-C-Schicht oder Beschichtung
JP7302878B2 (ja) * 2020-04-17 2023-07-04 日本アイ・ティ・エフ株式会社 炭素膜および摺動部材
JP2023544788A (ja) 2020-10-06 2023-10-25 エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト，プフェフィコーン ＨｉＰＩＭＳによって接着強度が改善された硬質炭素コーティングおよびその方法
JP2024539171A (ja) 2021-10-22 2024-10-28 エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト，プフェフィコーン スパッタリングによって高硬度かつ超平滑なａ－Ｃを形成するための方法

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CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
DE102004041235A1 (de) 2004-08-26 2006-03-02 Ina-Schaeffler Kg Verschleißfeste Beschichtung und Verfahren zur Herstellung derselben
DE102006009160B4 (de) * 2006-02-22 2010-01-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anordnung für die Separation von Partikeln aus einem Plasma
JP2007297592A (ja) * 2006-04-04 2007-11-15 Nissan Motor Co Ltd 低摩擦摺動機構
ATE529881T1 (de) * 2006-08-03 2011-11-15 Creepservice S A R L Verfahren zur beschichtung von substraten mit diamantähnlichen kohlenstoffschichten
JP5273337B2 (ja) * 2007-06-01 2013-08-28 神奈川県 低摩擦摺動部材
WO2010020274A1 (en) 2008-08-18 2010-02-25 Metso Paper, Inc. Coating for lowering friction effect and improving wear resistance of a component in a fibre web machine and process of producing the same
DE102011003254A1 (de) 2011-01-27 2012-08-02 Federal-Mogul Burscheid Gmbh Gleitelement, insbesondere Kolbenring, mit einer Beschichtung sowie Verfahren zur Herstellung eines Gleitelements
DE102011016611A1 (de) 2011-04-01 2012-10-04 Technische Universität Dresden Gleitsystem
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EP2587518B1 (en) * 2011-10-31 2018-12-19 IHI Hauzer Techno Coating B.V. Apparatus and Method for depositing Hydrogen-free ta C Layers on Workpieces and Workpiece

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EP2992121B1 (de) 2019-06-19
US9803273B2 (en) 2017-10-31
US20160153083A1 (en) 2016-06-02
KR20160003045A (ko) 2016-01-08
JP2016524651A (ja) 2016-08-18
WO2014177641A1 (de) 2014-11-06
EP2992121A1 (de) 2016-03-09
PL2992121T3 (pl) 2019-11-29

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