WO2014157688A1 - Outil de découpe revêtu et son procédé de production - Google Patents
Outil de découpe revêtu et son procédé de production Download PDFInfo
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- WO2014157688A1 WO2014157688A1 PCT/JP2014/059331 JP2014059331W WO2014157688A1 WO 2014157688 A1 WO2014157688 A1 WO 2014157688A1 JP 2014059331 W JP2014059331 W JP 2014059331W WO 2014157688 A1 WO2014157688 A1 WO 2014157688A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
Definitions
- the present invention relates to a coated cutting tool suitable for application to, for example, cutting of steel, cast iron, heat-resistant alloy, and the like, and a manufacturing method thereof.
- Patent Document 1 discloses that the hardness of AlTiN starts to decrease when the Al content ratio (atomic%) of metal (including metalloid) elements is 60% or more. When the content ratio (atomic%) is 70%, the hcp structure is confirmed as part of the crystal structure.
- Patent Document 2 proposes a coating method of an AlTi nitride film in which the fcc structure is easily maintained even when the Al content is large.
- a cathode in which a permanent magnet is disposed laterally or in front is used, and a magnetic field line that diverges forward or travels substantially in front of the target evaporation surface is formed, thereby forming a film forming gas in the vicinity of the object to be processed.
- the plasma density is significantly higher than that of a conventional cathode.
- An object of this invention is to provide the coated cutting tool excellent in durability, and its manufacturing method.
- the inventors of the present invention have used AlN having a hexagonal close-packed (hcp; hereinafter simply abbreviated as “hcp”) structure contained in the microstructure of a hard film made of an AlTi-based nitride or carbonitride. We found the optimal tissue morphology that was reduced. And, by providing a special intermediate film between the base material and the hard film, it was confirmed that the effect of the hard film was sufficiently exhibited, and excellent durability was exhibited even at high speed processing of high hardness materials. The present invention has been reached.
- hcp hexagonal close-packed
- this invention is a coated cutting tool which coat
- a base material an intermediate film disposed on the base material and made of carbide containing tungsten (W) and titanium (Ti) and having a thickness of 1 nm or more and 10 nm or less, and on the intermediate film
- the crystal structure arranged and specified by X-ray diffraction is a face-centered cubic lattice (fcc; hereinafter simply abbreviated as “fcc”) structure, and is based on the total amount of metal (including metalloid) elements
- a hard film made of an AlTi-based nitride or carbonitride having an Al content ratio (atomic%) of 60% or more and a Ti content ratio (atomic%) of 20% or more,
- the hard coating is a coated cutting tool that satisfies a relationship of “Ih ⁇ 100 / Is ⁇ 20” in an intensity profile obtained from a limited field diffraction pattern of
- Ih peak intensity due to AlN (010) plane of hcp structure
- Is fcc structure of AlN (111) plane, TiN (111) plane, AlN (002) plane, TiN (002) plane, AlN (022) plane
- the hard coating has an Al content ratio (atomic%) of 62% to 70% and a Ti content ratio (atomic%) of 25% or more with respect to the total amount of metal (including metalloid) elements.
- the total content ratio (atomic%) of Al and Ti is 90% or more with respect to the total amount of metal (including metalloid) elements.
- the film thickness of the intermediate film is preferably 1 nm or more and less than 6 nm. Furthermore, it is preferable that the half width of the (200) plane of the fcc structure specified by X-ray diffraction is 1.8 ° or less. Moreover, it is preferable that in the intensity
- the peak intensity attributed to the same crystal plane is more preferably the peak intensity attributed to the AlN (002) plane and TiN (002) plane of the fcc structure.
- the hard coating preferably contains tungsten (W), and the content ratio (atomic%) of W is 1% or more and 10% or less with respect to the total amount of metal (including metalloid) elements. preferable. Further, the W content (atomic%) is preferably 2% or more and 6% or less.
- the film thickness of the hard coating is preferably 1 ⁇ m or more and 5 ⁇ m or less.
- the cutting tool serving as the substrate is preferably a radius end mill or a square end mill.
- the coated cutting tool of this invention is suitably manufactured with the manufacturing method of the coated cutting tool of this invention shown below.
- the surface of the base material is subjected to metal bombardment to form an intermediate film having a thickness of 1 nm to 10 nm made of carbide containing tungsten (W) and titanium (Ti) on the surface of the base material;
- a cathode having a magnetic flux density of 18 mT or more applying a bias voltage of ⁇ 200 V or more and ⁇ 70 V or less to the base material, and with respect to the total amount of metal (including metalloid) elements on the intermediate film, Forms a hard coating made of AlTi nitride or carbonitride with aluminum (Al) content (atomic%) of 60% or more and titanium (Ti) content (atomic%) of 20% or more
- a method of manufacturing a coated cutting tool is suitably manufactured with the manufacturing method of the coated cutting tool of this invention shown below.
- the surface of the base material is subjected to metal bombardment to form an intermediate film having
- the hard film is formed at a substrate temperature of 450 ° C. or higher and 580 ° C. or lower.
- the heating temperature of the base material before the metal bombardment treatment is preferably 500 ° C. or less.
- the hard film further contains tungsten (W).
- the hard coating preferably has a tungsten (W) content ratio (atomic%) of 1% or more and 10 or less% with respect to the total amount of metal (including metalloid) elements.
- the content ratio (atomic%) of the tungsten (W) is 2% or more and 6% or less.
- the manufacturing method of the said coated tool is applied to a radius end mill or a square end mill.
- the coated cutting tool excellent in durability and its manufacturing method are provided. That is, according to the present invention, in addition to high-speed machining of a high-hardness material, excellent durability is exhibited also in cutting of high-carbon steel, Ni-base superalloy, and the like.
- FIG. 1 is a cross-sectional observation photograph of a hard film with a transmission electron microscope (the circumferential portion in the figure is an electron beam irradiation position when a limited field diffraction pattern is photographed).
- FIG. 2 is a diagram showing a limited field diffraction pattern when an electron beam is irradiated within the lower circumference of FIG.
- FIG. 3 is a diagram showing an intensity profile of the limited field diffraction pattern shown in FIG.
- FIG. 4 is a cross-sectional observation photograph of the sample tool of Example 1 of the present invention using a transmission electron microscope.
- FIG. 5 is a diagram showing a nanobeam diffraction pattern at a point indicated by an arrow 1 in FIG. FIG.
- FIG. 6 is a diagram showing an EDS spectrum analysis result at a point indicated by an arrow 1 in FIG.
- FIG. 7 is a diagram showing a nanobeam diffraction pattern at a point indicated by an arrow 2 in FIG.
- FIG. 8 is a diagram showing an EDS spectrum analysis result at a point indicated by an arrow 2 in FIG.
- FIG. 9 is a diagram showing an EDS spectrum analysis result at a point indicated by an arrow 3 in FIG.
- FIG. 10 is an observation photograph of the cutting edge of the sample tool of Examples 1 to 5 of the present invention after cutting 25 m with an electron microscope.
- FIG. 11 is an observation photograph of the tool edge of the sample tools of Examples 6 to 8 of the present invention after 25 m cutting with an electron microscope.
- FIG. 12 is an observation photograph of the tool edge of the sample tools of Comparative Examples 1 to 6 after 25 m cutting with an electron microscope.
- FIG. 13 is an observation photograph of the tool edge of the sample tools of Comparative Examples 7 to 10 after 25 m cutting with an electron microscope.
- FIG. 14 is an observation photograph of the tool cutting edge of the sample tools of Invention Examples 20 to 23 and Comparative Example 20 after 4 m cutting with an electron microscope.
- the inventors of the present invention can analyze only the peak intensity of the fcc structure (face-centered cubic lattice structure) in X-ray diffraction, even if it is a nitride or carbonitride containing Al and Ti, and is analyzed with a transmission electron microscope. It was confirmed that the microstructure contained AlN having an hcp structure. And it turned out that a favorable characteristic as a hard film is acquired by reducing AlN of the hcp structure (hexagonal close-packed structure) contained in a microstructure. Furthermore, it has been found that the durability of the coated cutting tool can be improved by providing an intermediate film having a specific composition and film thickness between the substrate and the hard film.
- the coated cutting tool of the present invention and the manufacturing method thereof will be described in detail.
- the hard film is a nitride or carbonitride which is a film type having excellent heat resistance and wear resistance. More preferred is nitride.
- Al is an element that imparts heat resistance to the hard coating. By containing the most Al content (atomic%) among metal (including metalloid) elements, it exhibits excellent heat resistance and is coated. The durability of the cutting tool is improved.
- the Al content (atomic%) of the metal (including metalloid) elements is set to 60% or more.
- a more preferable Al content ratio (atomic%) is 62% or more, and further 65% or more with respect to the total amount of metal (including metalloid) elements.
- the Al content ratio (atomic%) is preferably 75% or less with respect to the total amount of metal (including metalloid) elements.
- a more preferable Al content ratio (atomic%) is 70% or less with respect to the total amount of metal (including metalloid) elements.
- Ti is an important element in that it imparts wear resistance to the hard coating and has a fcc structure crystal structure with excellent durability as a coated cutting tool.
- the Ti content decreases, the wear resistance of the hard coating decreases, and the hcp structure AlN increases as the peak intensity of the hcp structure is confirmed by X-ray diffraction.
- the Ti content is set to the total amount of metal (including metalloid) elements. 20% or more.
- the Ti content ratio (atomic%) is more preferably 25% or more.
- the nitride or carbonitride containing Al and Ti has a total content ratio (atomic%) of Al and Ti of metal (including metalloid) from the viewpoint of heat resistance and wear resistance. It is preferable to set it as 90% or more with respect to the total amount of an element.
- the crystal structure specified by X-ray diffraction is an fcc structure, for example, when measured using a commercially available X-ray diffractometer (RINT2500V-PSRC / MDG manufactured by Rigaku Corporation). It means that the peak intensity due to the hcp structure is not confirmed.
- TEM transmission electron microscope
- FIG. 1 the cross-sectional TEM observation photograph (40,000 times) of a hard film is shown.
- FIG. 2 is a limited field diffraction pattern of the lower circle part of FIG. Then, the intensity of the limited field diffraction pattern of FIG. 3 was obtained by converting the luminance of the limited field diffraction pattern of FIG.
- the horizontal axis represents the distance (radius r) from the center of the (000) plane spot, and the vertical axis represents the integrated intensity (arbitrary unit) for one circle around each radius r.
- an arrow 1 is a peak due to the AlN (010) plane of the hcp structure, and is the maximum intensity of AlN of the hcp structure.
- Arrow 2 is a peak due to the AlN (011) plane of the hcp structure, the AlN (111) plane of the fcc structure, and the TiN (111) plane.
- Arrow 3 is a peak due to the AlN (002) plane and TiN (002) plane of the fcc structure.
- the arrow 4 is a peak due to the AlN (110) plane of the hcp structure.
- An arrow 5 is a peak due to the AlN (022) plane and TiN (022) plane of the fcc structure.
- the inventors of the present invention have made a ratio (%) between the sum of peak intensities (Is) indicated by arrows 1 to 5 in FIG. 3 and the peak intensity (Ih) attributed to the AlN (010) plane, which is the maximum intensity of the hcp structure. It has been found that by calculating Ih ⁇ 100 / Is), AlN having an hcp structure contained in the hard coating can be quantitatively evaluated.
- the peak intensity due to the AlN (010) plane of the hcp structure is Ih, and the AlN (111) plane, TiN (111) plane, AlN (002) plane, TiN (002) plane of the fcc structure,
- the sum of the peak intensity attributed to the AlN (022) plane and the TiN (022) plane and the peak intensity attributed to the AlN (010) plane, (011) plane, and (110) plane of the hcp structure is defined as Is.
- Is the relationship “Ih ⁇ 100 / Is ⁇ 20” is satisfied. When this relationship was satisfied, it was confirmed that the hcp-structured AlN contained in the hard film was small and the durability of the coated cutting tool was excellent.
- the case where the relationship of “Ih ⁇ 100 / Is ⁇ 15” is satisfied and still more preferably, the case where the relationship of “Ih ⁇ 100 / Is ⁇ 13” is satisfied.
- the background value was evaluated without removing it.
- the (002) plane and the (200) plane are equivalent, and the (022) plane and the (220) plane are equivalent.
- the (111) plane, (002) plane, and (022) plane are shown as representative of the equivalent crystal plane of the fcc structure.
- the peak intensity due to the same crystal plane on the substrate side and the surface side shows the maximum intensity of the hard film in the present invention.
- the entire hard film is continuous and uniform by making the crystal face showing the maximum strength the same on the substrate side and the surface side of the hard film.
- the durability of the coated cutting tool is improved.
- the peak strength due to the AlN (002) surface and TiN (002) surface of the fcc structure is maximized on the base material side and the surface side of the hard coating, which is preferable because durability tends to be improved. .
- the thickness of the hard coating an appropriate value may be selected from a range of 0.5 ⁇ m to 10 ⁇ m, for example.
- the thickness of the hard film is more preferably 1 ⁇ m or more.
- the thickness of the hard coating is more preferably 2 ⁇ m or more.
- the thickness of the hard film is more preferably 5 ⁇ m or less.
- the intermediate film will be described.
- the present inventors have intensively studied, and by providing an intermediate film made of carbide containing W and Ti on the base material, not only the adhesion between the base material and the hard film is improved, but also included in the hard film. It was confirmed that the AlN having a hcp structure was reduced and the durability of the coated cutting tool was improved.
- the intermediate film immediately above the base material is a carbide containing W, it is considered that the affinity with the cemented carbide, which is the base material, becomes strong and the adhesiveness is excellent.
- the carbide of Ti has an fcc structure, the hard film immediately above the intermediate film grows starting from the carbide of Ti, so that the AlN having an hcp structure included in the hard film. Is considered to be reduced.
- the film thickness of the intermediate film is in the range of 1 nm to 10 nm.
- the lower limit of the thickness of the intermediate film is preferably 2 nm or more, and more preferably 3 nm or more.
- the upper limit of the film thickness of the intermediate film is preferably less than 6 nm.
- the intermediate film may contain a film component and a base material component in addition to W and Ti.
- the intermediate film can contain Co on the base material side and Al or N on the hard film side, but the effect of the present invention is exhibited by using carbide containing W and Ti.
- the presence of the intermediate film can be confirmed by cross-sectional observation by transmission electron microscope observation, composition analysis, and nanobeam diffraction pattern.
- the half width of the (200) plane of the fcc structure specified by X-ray diffraction is 1.8 ° or less.
- the hard coating in the present invention is one or more selected from the group consisting of metal elements of Group 4a (excluding Ti), Group 5a, Group 6a (excluding Cr), Si and B of the periodic table.
- the element can be contained in a content ratio (atomic%) of metal (including metalloid) elements of 0% or more and 15% or less. These elements are generally elements added to the hard coating, and do not reduce the durability of the coated cutting tool of the present invention as long as the content ratio is not excessive. Further, according to the study by the present inventors, it has been confirmed that depending on the work material and the processing conditions, the hard coating may further contain the above-described elements, thereby exhibiting superior durability.
- AlTi-based nitrides or carbonitrides contain other metal (semi-metal) elements to improve heat resistance and toughness.
- the content of the additive element is too large, the wear resistance and heat resistance of the hard coating tend to be lowered. Therefore, even when added, the content ratio (atomic%) of metal (including metalloid) elements is preferably less than 15%.
- the hard film in the present invention contains W (tungsten), so that the compressive residual stress of the film can be reduced while maintaining high hardness.
- W tungsten
- the hard coating when the hard coating contains W, superior durability is easily exhibited not only in high-hardness materials but also in cutting of high-carbon steel and Ni-base superalloys. .
- the hard coating has a W content (atomic%) of 1% relative to the total amount of metal (including metalloid) elements. It is more preferably 10% or less and more preferably 2% or more and 6% or less.
- the composition of the hard film after coating may be different from the target composition.
- the composition of the hard film in the present invention can be confirmed, for example, by using a wavelength dispersion type electron probe microanalysis (WDS-EPMA).
- WDS-EPMA wavelength dispersion type electron probe microanalysis
- another layer may be coated on the hard film made of an AlTi-based nitride or carbonitride in order to exhibit the effects of the present invention. Therefore, in the present invention, the film structure having the intermediate film made of carbide containing W and Ti and the hard film made of AlTi nitride or carbonitride is made of AlTi nitride or carbonitride.
- another layer may be coated.
- another hard film made of nitride or carbonitride having excellent heat resistance and wear resistance is coated on the hard film made of AlTi nitride or carbonitride as a protective film.
- the protective film is a layer made of nitride.
- the coating method of the hard film of this invention is demonstrated.
- the inventors of the present invention have confirmed that the magnetic field of the cathode used for coating the hard film affects the amount of AlN of the hcp structure contained in the microstructure of the AlTi nitride or carbonitride. Then, for example, by arranging permanent magnets on the outer periphery and back surface of the target, and covering the hard film with a cathode having a magnetic flux density of 18 mT or more near the center of the target, the AlN having an hcp structure contained in the microstructure It was confirmed that the amount decreased and the durability of the coated cutting tool improved. More preferably, the magnetic flux density near the center of the target is 20 mT or more.
- the negative bias voltage applied to the base material during the coating of the hard film is larger than ⁇ 70 V (positive side with respect to ⁇ 70 V), the amount of AlN in the hcp structure tends to increase. Therefore, the negative bias voltage applied to the base material during the coating of the hard film is preferably in the range of ⁇ 200 V to ⁇ 70 V, more preferably in the range of ⁇ 150 V to ⁇ 100 V.
- the film structure tends to be coarse when the film formation temperature is low. However, if the film forming temperature of the hard film becomes too low, the compressive residual stress of the film becomes too high and the film tends to be self-destructed. Therefore, it is preferable that the hard film is formed at a substrate temperature of 450 ° C. or higher. On the other hand, when the film formation temperature of the hard film increases, the film structure tends to become finer. However, if the film formation temperature of the hard film becomes too high, the residual stress applied to the hard film is lowered, the hard film is softened, and the wear resistance is likely to be lowered. Therefore, it is preferable to form the hard film at a substrate temperature of 580 ° C. or lower.
- the heating temperature of the base material before the bombarding process is preferably 500 ° C. or less.
- membrane by adjusting the nitrogen gas flow rate introduce
- a cathode having a magnetic field configuration in which a coil magnet is arranged on the outer periphery of the target to confine the arc spot inside the target, and Ti is used as a metal bombardment. It is preferred to perform bombardment.
- Ti which is an element species that easily forms carbides
- the oxide on the substrate surface is removed and cleaned, and the bombarded Ti ions are removed from the substrate surface.
- Carbides containing W and Ti are easily formed by diffusing into WC.
- the negative bias voltage applied to the substrate is preferably ⁇ 1000 V or more and ⁇ 700 V or less.
- the current supplied to the target is preferably 80 A or more and 150 A or less.
- carbonized_material containing W and Ti will become difficult to be formed when the heating temperature of the base material before a bombard process becomes low, it exists in the tendency for the adhesiveness of a base material and a hard film to fall. Therefore, it is preferable that the heating temperature of the substrate is set to 450 ° C. or higher and the subsequent bombardment treatment is performed.
- Ti bombardment may be carried out while introducing argon gas, nitrogen gas, hydrogen gas, hydrocarbon-based gas, etc., but it can be performed by carrying out the furnace atmosphere under a vacuum of 1.0 ⁇ 10 ⁇ 2 Pa or less.
- the material surface is preferably cleaned and the diffusion layer is easily formed.
- the coated cutting tool of the present invention is particularly effective when applied to a radius end mill or a square end mill that mainly uses an outer peripheral blade.
- the composition is WC (bal.)-Co (8 mass%)-TaC (0.25 mass%)-Cr 3 C 2 (0.9 mass%).
- An insert type radius end mill made of cemented carbide having a hardness of 6 ⁇ m and a hardness of 93.4 HRA was prepared. Note that WC represents tungsten carbide, Co represents a cobalt atom, and TaC represents tantalum carbide.
- ⁇ Deposition system> For film formation, an arc ion plating type film forming apparatus was used.
- the inside of the vacuum vessel provided in the film forming apparatus is evacuated by a vacuum pump, and then gas is introduced from a supply port.
- Each base material installed in the vacuum vessel is electrically connected to a bias power source, and a negative DC bias voltage can be independently applied to each base material.
- a base material rotating mechanism for rotating the base material is provided in the vacuum vessel.
- This base material rotating mechanism includes a planetary, a plate-like jig arranged on the planetary, and a pipe-like jig arranged on the plate-like jig, and the planetary rotates at a speed of 3 revolutions per minute. And the plate-like jig and the pipe-like jig revolve each other.
- a permanent magnet was provided on the outer periphery and the rear surface of the target, and a cathode (hereinafter referred to as C1) that generates an average magnetic flux density of 20.2 mT was used.
- a permanent magnet was provided on the back surface, and a cathode (hereinafter referred to as C2) having an average magnetic flux density of 15.1 mT was used.
- the cathode (henceforth C3) which provided the coil magnet on the outer periphery of the target was used.
- ⁇ Film formation process> The inside of the vacuum vessel was evacuated to 8 ⁇ 10 ⁇ 3 Pa or less. Then, the base material was heated with the heater installed in the vacuum vessel, and evacuation was performed. The heating temperature of the base material was changed for each sample tool. The pressure inside the vacuum vessel was set to 8 ⁇ 10 ⁇ 3 Pa or less. Thereafter, cleaning with Ar plasma was performed, and subsequently, Ti bombarding was performed as metal bombarding to form an intermediate film. Next, the gas in the vacuum vessel was replaced with nitrogen, and the pressure in the vacuum vessel was set to 5 Pa. The film forming temperature and the bias voltage were changed, a current of 150 A was supplied to the cathode, and a hard film having a thickness of about 2 ⁇ m was coated on the surface of the base material.
- a coated cutting tool in which the surface of the base material was coated with the intermediate film and the hard film was produced. Except for Comparative Example 1, before the hard coating was applied, vacuum evacuation was performed to 8 ⁇ 10 ⁇ 3 Pa or less, an arc current of 150 A was supplied to C3, and Ti bombarding was performed.
- the hard coating was applied without metal bombardment after cleaning with Ar plasma.
- TiN was coated as an intermediate film without performing metal bombardment.
- CrN was coated as an intermediate film without performing metal bombardment after cleaning with Ar plasma.
- composition analysis> The composition of the hard film of the sample tool was measured by wavelength dispersive electron probe microanalysis (WDS-EPMA) using an electronic probe microanalyzer device (model number: JXA-8500F) manufactured by JEOL Ltd. The composition was determined by measuring five points and averaging the measured values. The measurement conditions were acceleration voltage: 10 kV, irradiation current: 5 ⁇ 10 ⁇ 8 A, capture time: 10 seconds, analysis area diameter: 1 ⁇ m, analysis depth: approximately 1 ⁇ m.
- the hardness of the hard coating of the sample tool was measured using a nanoindentation device (model number: ENT-1100a) manufactured by Elionix Co., Ltd.
- the insert was tilted by 5 degrees, and after mirror polishing, a region where the maximum indentation depth was less than about 1/10 of the layer thickness within the polishing surface of the coating was selected. At this time, there was no influence of the base material even at about 1/5.
- the hardness was measured at 10 points, and the average value of the measured values was determined as the hardness.
- the measurement conditions were indentation load: 49 mN, maximum load holding time: 1 second, and removal speed after load application: 0.49 mN / second. Prior to the measurement, single crystal Si as a standard sample was measured, and it was confirmed that its hardness was 12 GPa.
- TEM observation> The cross section was observed with a transmission electron microscope (TEM), and the intermediate film or hard film of the sample tool was evaluated. Specifically, using a field emission transmission electron microscope (model number: JEM-2010F type) manufactured by JEOL Ltd., TEM analysis was performed under the conditions of acceleration voltage: 120 V and incident electron quantity: 5.0 pA / cm 2. Carried out. The TEM analysis was performed by observing the cut surface when the intermediate film or the hard film was cut along a plane perpendicular to the film surface. The limited field diffraction pattern was implemented with a camera length of 100 cm and a limited field region of ⁇ 750 nm.
- the peak intensities of the hcp structure and the fcc structure were obtained from the intensity profile obtained from the limited field diffraction pattern.
- the limited field diffraction pattern was measured at two locations on the substrate side and the surface side of the hard coating.
- the composition of the intermediate film was analyzed with a beam diameter of 1 nm using an attached UTW type Si (Li) semiconductor detector. Nanobeam diffraction was analyzed with a camera length of 50 cm and a beam diameter of 2 nm or less.
- the sample tool of the comparative example 3 since the Al content is a hard film with little Al, the TEM analysis of a hard film is not implemented.
- FIG. 4 shows a transmission electron micrograph (2,000,000 times) of the sample tool of Example 1 of the present invention.
- the point indicated by the arrow 1 is the base material
- the point indicated by the arrow 2 is the intermediate film
- the point indicated by the arrow 3 is the hard film.
- the arrow 1 in FIG. 4 is WC.
- the arrow 3 in FIG. 4 is a hard film.
- the intermediate film contains W and Ti. Further, it was possible to index the WC crystal structure from the nanobeam diffraction pattern of FIG.
- the intermediate film was a carbide containing W and Ti.
- the intermediate film contained the largest amount of W in the content ratio (atomic%) of metal (including metalloid) elements, and then contained a large amount of Ti.
- W and Ti Al and N, which are hard film components, were contained.
- Co which is a base material component, was also slightly contained.
- ⁇ Cutting test> A cutting test was performed with the work material as SKD11. Cutting conditions are as follows. ⁇ Conditions for cutting test> ⁇ Tool: Insert type radius end mill for machining hard materials ⁇ 12 ⁇ R2 ⁇ 3 flute (manufactured by Hitachi Tool Co., Ltd.) ⁇ Cutter model number: ASRM-1012R-3-M6 -Insert model number: EPHN0402TN-2 ⁇ Cutting method: Bottom cutting ⁇ Work material: SKD11 (60HRC) ⁇ Incision: axial direction 0.15mm, radial direction 6mm ⁇ Number of teeth: 1 ⁇ Spindle speed: 1856min -1 ⁇ Table feed: 742 mm / min ⁇ Single blade feed rate: 0.4mm / tooth ⁇ Cutting oil: Air blow ⁇ Cutting distance: 25 m
- FIG. 10 shows an observation photograph (100 times) of the cutting edge after the cutting test performed on the sample tools of Examples 1 to 5 of the present invention.
- FIG. 11 shows an observation photograph (100 times) of the cutting edge after the cutting test performed on the sample tools of Examples 6 to 8 of the present invention.
- the sample tools of Examples 1 to 8 of the present invention had a higher Al content than the sample tool of Comparative Example 2, but it was confirmed that there was less hcp structure of AlN on the base material side and the surface side of the hard coating. All of the sample tools of the examples of the present invention were in a damaged state at a level that enables cutting following the cutting test.
- the film thickness of the intermediate film is more excellent than the thickness of 2 nm among the preferable ranges of the film thickness of the intermediate film. It was confirmed that it showed high durability. From the comparison of the sample tool of the present invention example 1 and the sample tool of the present invention example 5, even in the sample tool of the present invention example in which the film thickness of the intermediate coating film is in the preferred range, the same on the substrate side and the surface side of the hard coating film It was confirmed that the peak intensity resulting from the crystal plane showed the maximum strength with less film damage and better durability.
- FIG. 12 shows an observation photograph (100 times) of the cutting edge after a 25 m cutting test performed on the sample tools of Comparative Examples 1 to 6.
- FIG. 13 shows an observation photograph (100 times) of the cutting edge after a 25 m cutting test performed on the sample tools of Comparative Examples 7 to 10.
- the sample tool of Comparative Example 1 has a small value of “Ih ⁇ 100 / Is” of the hard coating, but since the intermediate coating is not formed, the adhesion between the base material and the hard coating is not sufficient, and the tool damage is large. became.
- the sample tool of Comparative Example 2 was coated with a hard film using a cathode having a smaller magnetic flux density near the target surface than the sample tool of the present invention example, the hcp structure AlN contained in the hard film increased. , Tool damage increased. Since the sample tool of Comparative Example 3 has a small Al content contained in the hard coating, the tool damage was large. In the sample tool of Comparative Example 4, since the bias voltage applied to the base material was small when the hard film was coated, the peak intensity due to the hcp-structured AlN was confirmed even by X-ray diffraction. As a result, tool damage increased. In the sample tool of Comparative Example 5, since the AlCr-based nitride was formed on the hard coating, the tool damage increased.
- Example 2 In Example 1, except that the film forming conditions in the film forming process were changed as shown in Table 3, the coated cutting in which the intermediate film and the hard film were coated on the surface of the substrate in the same manner as in Example 1 A tool (sample tool) was produced. A cutting test was performed on the sample tools of Examples 20 to 23 of the present invention and Comparative Example 20 in order to confirm the effect of the additive element with S50C as the work material. Cutting conditions are as follows. The film formation conditions are shown in Table 3, and the physical properties of the sample tool thus produced are shown in Table 4, respectively.
- FIG. 14 the electron microscope observation photograph (40 times) which observed the damage state of the rake face after a cutting test is shown.
- the part that looks white in the figure shows the worn part. It can be confirmed that crater wear is suppressed when the hard coating contains W. It was confirmed that all of the sample tools of the present invention showed excellent cutting performance in the high hardness steel and high carbon steel of Example 1.
- Table 5 shows the results of measuring the area ratio of a worn white portion by image analysis software. Among the sample tools of the present invention example, it was confirmed that crater wear was significantly suppressed in the sample tools of Invention Examples 22 and 23 containing a certain amount of W.
- Example 3 The sample tools of Examples 20 to 23 of the present invention used in Example 2 and the sample tool of Comparative Example 20 are prepared, and the condition that the tool load is larger than that in Example 1 is selected with the work material as SKD11 (60HRC). Then, a cutting test was performed and evaluated. The cutting conditions are shown below. The results of the cutting test are shown in Table 6.
- the distance to reach the tool life in the high-efficiency machining of high hardness steel was more than twice that of the sample tool of the comparative example.
- the sample tools of Invention Examples 21 and 22 containing W in a more preferable range resulted in a longer distance for reaching the tool life and excellent durability.
- Example 4 In Example 1, using the coated cutting tools (sample tools of Invention Examples 1 to 8, 21 to 23, and Comparative Examples 1 to 9) coated with a hard film under the conditions of Tables 1 and 3, the following: A cutting test was conducted on Ni-base superalloys under the conditions and evaluated. The results of the cutting test are shown in Table 7.
- ⁇ Conditions for cutting test> ⁇ Tool: Solid end mill ⁇ 10 ⁇ 2 flute (HES2100 manufactured by Hitachi Tool Co., Ltd.) Base material: WC (bal.)-Co (11 mass%)-TaC (0.4 mass%)-Cr 3 C 2 (0.9 mass%), WC average particle diameter 0.6 ⁇ m, hardness 92.4HRA Cemented Carbide / Cutting Method: Side Cutting / Working Material: Ni-19% Cr-18.7% Fe-3.0% Mo-5.0% (Nd + Ta) -0.8% Ti Ni-base alloy with a composition of -0.5% Al-0.03% C (age-hardened) ⁇ Infeed: axial direction 6mm, radial direction 0.3mm ⁇ Cutting speed: 40 m / min ⁇ Single-blade feed amount: 0.04 mm / tooth ⁇ Cutting oil: Water-soluble cutting oil ⁇ Cutting distance: 0.2 m
- a sample tool showing durability superior to that of the comparative example was obtained in the cutting of the Ni-base superalloy.
- the sample tools of Invention Examples 21 and 22 containing W in a preferable range tend to have a small wear width. It was confirmed that the hard film in the present invention contains W, so that it exhibits superior durability in a wide range of work materials.
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Abstract
La présente invention concerne un outil de découpe revêtu qui comporte : un substrat ; un film de revêtement intermédiaire comprenant un carbure contenant du tungstène (W) et du titane (Ti) et ayant une épaisseur de film de 1-10 nm ; et un film de revêtement dur comprenant un nitrure ou carbonitrure à base d'AlTi ayant une structure cristalline qui est une structure à réseau cubique à face centrée, et ayant une teneur en Al (% atomique) d'au moins 60 % et une teneur en Ti (% atomique) d'au moins 20 %. Du film de revêtement dur, dans un profil de résistance conformément à un motif choisi de diffraction de surface dans un microscope électronique à transmission, lorsque la résistance de pic provoquée par le plan AlN (010) d'une structure fortement comprimée hexagonale est Ih et le total de la résistance de pic provoquée par le plan AlN (111), le plan TiN (111), le plan AlN (002), le plan TiN (002), le plan AlN (022) et le plan TiN (022) dans la structure à réseau cubique à face centrée et la résistance de pic provoquée par le plan AlN (010), le plan AlN (011) et le plan AlN (110) dans la structure fortement comprimée hexagonale est Is, Ih × 100/Is ≤ 20.
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WO2016035854A1 (fr) * | 2014-09-03 | 2016-03-10 | 三菱マテリアル株式会社 | Outil de coupe revêtu en surface et son procédé de fabrication |
CN111511490A (zh) * | 2017-11-20 | 2020-08-07 | 三菱日立工具株式会社 | 包覆切削工具 |
CN112055632A (zh) * | 2018-05-30 | 2020-12-08 | 株式会社Moldino | 包覆切削工具及其制造方法 |
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EP4082699A4 (fr) * | 2019-12-24 | 2022-12-14 | MOLDINO Tool Engineering, Ltd. | Outil de coupe revêtu |
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JP6555796B2 (ja) * | 2014-09-26 | 2019-08-07 | 日立金属株式会社 | 被覆切削工具 |
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