WO2014157026A1 - 露光装置、露光方法 - Google Patents

露光装置、露光方法 Download PDF

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Publication number
WO2014157026A1
WO2014157026A1 PCT/JP2014/057968 JP2014057968W WO2014157026A1 WO 2014157026 A1 WO2014157026 A1 WO 2014157026A1 JP 2014057968 W JP2014057968 W JP 2014057968W WO 2014157026 A1 WO2014157026 A1 WO 2014157026A1
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WO
WIPO (PCT)
Prior art keywords
unit
exposure
substrate
clamping
moving
Prior art date
Application number
PCT/JP2014/057968
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English (en)
French (fr)
Japanese (ja)
Inventor
三宅　健
俊博 高木
Original Assignee
サンエー技研株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by サンエー技研株式会社 filed Critical サンエー技研株式会社
Priority to KR1020157030099A priority Critical patent/KR102102939B1/ko
Priority to CN201480017126.8A priority patent/CN105190444B/zh
Publication of WO2014157026A1 publication Critical patent/WO2014157026A1/ja

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Definitions

  • the present invention relates to a substrate exposure technique using an exposure apparatus.
  • the exposed surface of the substrate often has a non-flat shape due to non-uniformity in the thickness direction, production errors, temperature, humidity changes, expansion / contraction due to thermal history up to the exposure process, etc.
  • it is difficult to form an image over the entire area of the exposure surface and the maskless exposure method using the imaging optical system may not be able to perform high-precision exposure.
  • it is possible to introduce an optical system having an autofocus function but the control becomes complicated and the apparatus becomes expensive. For this reason, there is a need for an exposure technique that can form an image stably over the entire exposure surface with a simple configuration.
  • the substrate when the substrate has a flexible belt shape, the substrate is easily bent, and it is necessary to apply a predetermined tension to the substrate in the longitudinal direction in order to eliminate the deflection or to convey the substrate without bending. There is. However, if excessive tension is applied to the substrate, the substrate will stretch in the longitudinal direction. If exposure is performed in this state, the substrate will be exposed to a different shape from the original substrate, and the pattern can be accurately formed on the substrate. Can not do it. For this reason, there is a demand for an exposure technique that can form a pattern with high accuracy by exposing a flexible strip-shaped substrate to the original substrate shape.
  • the present invention has been made to solve at least a part of the above-described problems, and can be realized, for example, as the following modes.
  • the first embodiment of the present invention is provided as an exposure apparatus that exposes a flexible belt-like substrate.
  • the exposure apparatus includes a first sandwiching section and a second sandwiching section that are formed of a light transmissive member and have a transmissive section having a flat surface, and each of which can sandwich the substrate.
  • a first moving unit that moves at least one of the first clamping unit and the second clamping unit in a direction in which the first clamping unit and the second clamping unit approach and away from each other, and light irradiation in the first direction
  • a first exposure unit having an imaging optical system that forms an image on the flat surface of the first clamping unit, the first exposure unit and the first exposure unit being spaced apart from each other, opposite to the first direction.
  • a second exposure unit having an imaging optical system that irradiates light in a second direction and forms an image on the flat surface of the second clamping unit, and the first clamping unit by the first moving unit And by moving at least one of the second clamping part, each of the flat surfaces of the first clamping part and the second clamping part In the sandwiched state in which the substrate disposed between each of the flat surfaces is sandwiched between the first sandwiching section and the second sandwiching section, the first exposure section and the second exposure section are connected to the first sandwiching section.
  • the second clamping unit and the second clamping unit include a second moving unit that relatively moves so as to pass between the first exposure unit and the second exposure unit in only one direction.
  • the exposure apparatus in the clamping state, maintains a constant distance between the flat surfaces of the first clamping unit and the second clamping unit and the first exposure unit and the second exposure unit in one direction. Irradiating light from each of the first exposure unit and the second exposure unit, and simultaneously exposing both surfaces of the substrate through the transmission unit of the first clamping unit and the second clamping unit. To do.
  • the second moving unit moves the first holding unit and the second holding unit in the holding state, and the substrate is sent in the longitudinal direction of the substrate by the movement.
  • the exposure surfaces on both sides of the flexible strip-shaped substrate are sandwiched between the first sandwiching portion and the second sandwiching portion. Is flattened.
  • the distance in the first direction between the flat surface of the sandwiching portion and the first exposure portion is kept constant. For this reason, the 1st exposure part can be imaged stably on the flat surface of 1 clamping part which contacts the exposure surface of a board
  • the flexible belt-like substrate is usually thin, the distance in the second direction between the flat surface of the second sandwiching portion and the second exposure portion in the sandwiched state is also constant. Kept.
  • the second exposure unit stably forms an image on the flat surface of the second clamping unit that contacts the exposure surface of the substrate without moving in the direction approaching or moving away from the first exposure unit. can do. Therefore, with a simple configuration, it is possible to form an image stably over the entire exposure area on both sides of the substrate.
  • both the first sandwiching portion and the second sandwiching portion move, and the amount of movement thereof
  • the first exposure unit and the second exposure unit move according to the above.
  • the exposure surface is flattened by being sandwiched between the first sandwiching portion and the second sandwiching portion, it is not necessary to apply an unnecessary tension in the longitudinal direction of the substrate in order to achieve the planarization. For this reason, it is not exposed in the state where the excessive tension acts on the substrate and the exposure surface extends in the longitudinal direction. Therefore, the pattern can be formed on the substrate with high accuracy.
  • the first clamping unit has a fixed position in the direction in which the first moving unit moves at least one of the first clamping unit and the second clamping unit. May be.
  • the second clamping unit may be configured to be movable in position by the first moving unit. According to such a configuration, since only the second holding portion needs to be configured to be movable, the configuration is simple. Even when the substrate is disposed between the first sandwiching portion and the second sandwiching portion so as not to contact the first sandwiching portion and the second sandwiching portion, the substrate is tensioned more than necessary in the longitudinal direction of the substrate. If the substrate is arranged in a state where no occurrence occurs, the substrate can be bent in the direction in which the first moving unit moves the second holding unit.
  • the 2nd clamping part presses a board
  • the position of the first clamping unit in the direction in which the second clamping unit is moved is fixed, the flat surface of the first clamping unit and the first exposure unit between the first exposure unit and the first exposure unit are fixed in the clamping state.
  • the distance in the direction of is kept constant.
  • the first exposure unit can stably form an image on the flat surface of the first clamping unit.
  • the flexible strip-shaped substrate is usually thin, the distance in the second direction between the flat surface of the second sandwiching portion and the second exposure portion is kept constant in the sandwiched state. .
  • the second exposure unit can stably form an image on the flat surface of the second clamping unit without moving in the direction approaching or moving away from the first exposure unit. Therefore, with a simple configuration, it is possible to form an image stably over the entire exposure area on both sides of the substrate.
  • the exposure apparatus in the first mode, includes a third moving unit that linearly moves the second exposure unit in a direction approaching and moving away from the first exposure unit; A fourth moving unit that linearly moves the first exposure unit in a direction approaching and moving away from the second exposure unit; and a detection unit that detects at least one of the position and shape of the sandwiched substrate. It may be.
  • the second exposure unit may be fixed to a first support member that can be moved by the third moving unit, and may perform exposure according to a detection result by the detection unit.
  • the 1st exposure part is being fixed to the 2nd support member which can move by the 4th movement part, and may perform exposure according to the detection result by a detection part.
  • the detection unit may be fixed to at least one of a first support member common to the second exposure unit and a second support member common to the first exposure unit. According to this mode, since at least one of the position and the shape of the substrate is detected in the sandwiched state, that is, in the same state as at the time of exposure, it is possible to expose to an accurate position. Further, the first exposure unit is moved in accordance with the position of the first clamping unit to form an image on the flat surface of the first clamping unit, and the first exposure unit is used to form an image on the flat surface of the second clamping unit. When the second exposure unit is moved according to the position of the second clamping unit, the detection unit also moves simultaneously by the same distance in the same direction as at least one of the first exposure unit and the second exposure unit. become.
  • the first holding unit always contacts the exposure surface of the substrate according to the position where the substrate of the first holding unit and the second holding unit is held. It is possible to form an image on the flat surfaces of the sandwiching portion and the second sandwiching portion, and to simplify the apparatus configuration.
  • a fourth embodiment of the present invention is provided as an exposure apparatus that exposes a substrate.
  • the exposure apparatus includes a transmissive portion that is formed of a light transmissive member and has a flat surface.
  • the first nip portion and the second nip portion that can hold the substrate by each of the flat surfaces;
  • a first moving unit that moves the holding unit in a direction approaching and moving away from the first holding unit, and a position fixed on the first holding unit side, and light in the first direction. Is disposed on the side of the first exposure unit and the second clamping unit, spaced apart from the first exposure unit, having an imaging optical system that forms an image on the flat surface of the first clamping unit.
  • a second exposure unit having an imaging optical system that irradiates light in a second direction opposite to the first direction and forms an image on the flat surface of the second clamping unit; and a first movement
  • the substrate disposed between the flat surfaces of the first holding part and the second holding part is flat.
  • the first clamping unit and the second clamping unit are the first clamping unit and the second clamping unit.
  • a second moving unit that relatively moves in only one direction so as to pass between the first exposure unit and the second exposure unit, and a second exposure unit that moves closer to and away from the first exposure unit.
  • a third moving unit that moves linearly in the direction.
  • the position of the first clamping unit in the direction in which the first moving unit moves the second clamping unit is fixed.
  • the exposure apparatus in the clamping state, maintains a constant distance between the flat surfaces of the first clamping unit and the second clamping unit and the first exposure unit and the second exposure unit in one direction. Irradiating light from each of the first exposure unit and the second exposure unit, and simultaneously exposing both surfaces of the substrate through the transmission unit of the first clamping unit and the second clamping unit. To do.
  • the substrate is exposed by being sandwiched between the first sandwiching portion and the second sandwiching portion. Since the surface is pressed against the flat surface of the first holding part and the flat surface of the second holding part and follows these flat surfaces, the non-flat shape is reduced.
  • the first clamping unit of the substrate since the position of the first clamping unit in the direction in which the first moving unit moves the second clamping unit is fixed, in the clamping state, the first clamping unit of the substrate that contacts the flat surface of the first clamping unit The distance in the first direction between the exposure surface and the first exposure unit is kept constant.
  • the third moving unit causes the second exposure unit to have the same amount as the amount of change in the exposure surface of the substrate that is in contact with the flat surface of the second holding unit (the amount of change due to the difference in substrate thickness).
  • a detection unit for detecting at least one of the position and shape of the sandwiched substrate may be further provided.
  • the second exposure unit is fixed to a support member movable by the third moving unit, and may perform exposure according to the detection result by the detection unit.
  • the detection unit may be fixed to a support member common to the second exposure unit.
  • the detection unit is also the same as the second exposure unit. The same distance is simultaneously moved in the direction of. For this reason, the detection unit also forms an image on the flat surface of the second clamping unit that contacts the exposure surface of the substrate. That is, an image can be formed on the flat surface of the second clamping unit that always contacts the exposure surface of the substrate according to the thickness of the substrate without providing another means such as autofocus or another mechanism in the detection unit. Configuration is also simple.
  • the exposure apparatus according to the fourth or fifth aspect further includes a seal portion formed by an elastic member on one of the first sandwiching portion and the second sandwiching portion, A seal portion that surrounds the periphery of the substrate disposed between each of the flat surfaces and seals the periphery of the substrate when the first and second sandwiching portions are in contact with the other of the second sandwiching portion; In the state which contact
  • the pressure inside the seal portion is depressurized so that the seal portion is crushed and the second sandwiching portion is moved to the first sandwiching portion side so that the first sandwiching portion and the second sandwiching portion are moved.
  • the substrate is non-planar, that is, a substrate that is uneven in the thickness direction or a substrate that warps greatly, the substrate reliably follows the flat surfaces of the first sandwiching portion and the second sandwiching portion. Therefore, highly accurate exposure can be performed.
  • the flat surfaces of the first sandwiching part and the second sandwiching part may be provided facing each other.
  • the first moving unit may move at least one of the first clamping unit and the second clamping unit in a direction orthogonal to the flat surface. According to such a configuration, the substrate can be clamped only by moving at least one of the first clamping part and the second clamping part only in one direction, so that the apparatus configuration is simple.
  • the present invention can also be realized as an exposure method for exposing a flexible strip substrate with an exposure apparatus, an exposure method for exposing a substrate with an exposure apparatus, and the like.
  • FIG. 2 is an AA arrow view of the exposure apparatus shown in FIG.
  • FIG. 3 is a BB arrow view of the exposure apparatus shown in FIG. 2.
  • It is explanatory drawing which shows the state of the exposure apparatus in each process of the flowchart shown in FIG.
  • FIG. 8 is a CC arrow view of the exposure apparatus shown in FIG.
  • A. First embodiment: 1 to 3 show a schematic configuration of an exposure apparatus 10 as an embodiment of the present invention.
  • 2 is an AA arrow view of the exposure apparatus 10 shown in FIG. 1
  • FIG. 3 is an BB arrow view of the exposure apparatus 10 shown in FIG.
  • the exposure apparatus 10 forms the pattern on the substrate by performing exposure on the exposure surface of the substrate having the photosensitive layer on the surface based on exposure data representing a two-dimensional pattern such as an electric circuit.
  • the exposure apparatus 10 forms a pattern on both surfaces of the substrate without using a photomask. As shown in FIG.
  • the exposure apparatus 10 is installed on a base member 15, and includes a first clamping unit 20a, a second clamping unit 20b, a first exposure unit 30, a second exposure unit 40, A first moving unit 50, a second moving unit 60, a third moving unit 70, and detection units 81 to 84 are provided.
  • the first clamping unit 20a and the second clamping unit 20b are also referred to as the clamping unit 20.
  • the 1st clamping part 20a is provided with the permeation
  • the transmission part 21a is formed of a light transmissive member.
  • the transmission part 21a is made of glass. However, acrylic or the like may be used instead of glass.
  • the transmission portion 21a has a rectangular flat plate shape, and the upper surface thereof is formed as a flat flat surface 23a.
  • the transmission part 21a is also called the lower glass plate 21a.
  • the support part 22a surrounds the periphery of the transmission part 21a and supports the transmission part 21a.
  • the support portion 22a has a frame shape in which a through hole is formed at the center of a rectangular flat plate.
  • the through hole of the support portion 22a has a shape in which a first through hole having a relatively small rectangular shape and a second through hole having a relatively large rectangular shape are combined.
  • the first through hole is formed on the lower side, and the second through hole is formed on the upper side.
  • the transmission part 21a is inserted in the 2nd through-hole.
  • the outer edge portion of the transmission portion 21a is bonded to the support portion 22a using the difference in size between the two through holes described above.
  • the 2nd clamping part 20b is provided with the permeation
  • the transmission part 21b and the support part 22b have the same configuration as the transmission part 21a and the support part 22a. However, the transmission part 21b and the support part 22b are arranged upside down as compared with the transmission part 21a and the support part 22a.
  • the lower surface of the transmission part 21b is formed as a flat flat surface 23b.
  • the transmission part 21b is also called the upper glass plate 21b.
  • the first clamping part 20a and the second clamping part 20b are arranged to face each other in the vertical direction. Accordingly, the flat surface 23a and the flat surface 23b are also opposed to each other.
  • the vertical position of the first clamping unit 20a is fixed.
  • the second holding unit 20b is configured to be movable by the first moving unit 50 in the vertical direction, in other words, in the direction in which the first holding unit 20a and the second holding unit 20b approach and away from each other.
  • the substrate S is sandwiched between the flat surface 23a and the flat surface 23b by the second sandwiching portion 20b moving downward with the substrate S placed on the flat surface 23a of the lower glass plate 21a.
  • a state in which the substrate S is sandwiched in this way is also referred to as a sandwiched state.
  • the flat surface 23a and the flat surface 23b are not necessarily arranged to face each other, and at least one of the first holding unit 20a and the second holding unit 20b can move in the horizontal direction and the vertical direction.
  • the substrate S may be sandwiched by the movement in both directions.
  • the first moving unit 50 includes a guide shaft 51.
  • the guide shaft 51 is disposed at four corners of the first sandwiching portion 20a and the second sandwiching portion 20b so as to penetrate the first sandwiching portion 20a and the second sandwiching portion 20b in the vertical direction.
  • the first moving unit 50 reciprocates the second holding unit 20b in the vertical direction along the guide shaft 51 by an actuator (not shown).
  • the second moving unit 60 includes a linear motor 61, two guides 62, and two guide rails 63.
  • the two guide rails 63 are arranged in parallel, and are formed to extend linearly in a predetermined direction orthogonal to the vertical direction.
  • One of the two guides 62 is fixed to the mover of the linear motor 61.
  • the support portion 22a of the first sandwiching portion 20a is fixed to the two guides 62.
  • the linear motor 61 is driven, the first clamping unit 20 a and the second clamping unit 20 b connected to the first clamping unit 20 a via the guide shaft 51 are connected to the guide rail 63 via the two guides 62.
  • Move up With this configuration, the second moving unit 60 moves the holding unit 20 in the holding state (the substrate S held by the holding unit 20) between the first exposure unit 30 and the second exposure unit 40 described later. Move to pass.
  • the first exposure unit 30 irradiates light in the first direction.
  • the first exposure unit 30 is disposed on the first clamping unit 20a side, that is, on the lower side of the first clamping unit 20a and the second clamping unit 20b.
  • the first direction is a direction from the bottom to the top.
  • the first exposure unit 30 includes two exposure units 31 and 32 as shown in FIG.
  • Each of the exposure units 31 and 32 includes a light source (here, a laser light source) and a polygon mirror that deflects and scans a light beam.
  • the exposure units 31 and 32 are arranged in the direction in which the second moving unit 60 moves the substrate S.
  • the exposure units 31 and 32 are fixed on a support member 16 provided on the base member 15.
  • the second exposure unit 40 is provided above the first exposure unit 30 (on the second holding unit 20b side) and is separated from the first exposure unit 30 and is opposite to the first direction. In other words, the light is irradiated in the direction from the top to the bottom.
  • the second exposure unit 40 includes two exposure units 41 and 42.
  • the exposure units 41 and 42 have the same configuration as the exposure units 31 and 32, and are provided at positions facing the exposure units 31 and 32 in the vertical direction.
  • the exposure units 41 and 42 are fixed to the support member 17 provided above them.
  • the configuration of the first exposure unit 30 and the second exposure unit 40 is not limited to the above-described example as long as the first exposure unit 30 and the second exposure unit 40 are spaced apart from each other in the vertical direction with a region where the substrate S moves therebetween. It can be.
  • the laser light source may be installed outside the exposure units 31 and 32, and light may be supplied to the exposure units 31 and 32 via optical fibers.
  • a DMD Digital Mirror Device
  • each of the first exposure unit 30 and the second exposure unit 40 may be composed of a single unit.
  • two or more units may be arranged in a direction orthogonal to the direction in which the second moving unit 60 moves the substrate S.
  • the first exposure unit 30 and the second exposure unit 40 may have different configurations.
  • the operations of the first exposure unit 30 and the second exposure unit 40 are controlled by an image processing unit (not shown) that handles exposure data.
  • This image processing unit controls the irradiation of light from the first exposure unit 30 and the second exposure unit 40 in accordance with detection results of detection units 81 to 84 described later.
  • the third moving unit 70 includes a guide 71 and a guide rail 72.
  • the guide rail 72 is formed to extend linearly in the vertical direction.
  • the guide 71 is fixed to the support member 17 via the support plate 18.
  • the support member 17 is connected to an actuator (not shown), and slides on the guide rail 72 along the guide rail 72 by driving the actuator.
  • the actuator is not particularly limited, and for example, a motor and a ball screw can be used.
  • the detection units 81 to 84 each have a camera. These cameras are based on the coordinate position of the read mark by optically reading an alignment mark or pattern (hereinafter also simply referred to as a mark) previously attached to a predetermined position on the substrate S in the sandwiched state. The position and shape of the sandwiched substrate S are detected.
  • the detection units 81 and 82 detect the position and shape of the upper surface of the substrate S (the side exposed by the second exposure unit 40), and the detection units 83 and 84 detect the lower surface of the substrate S (the first exposure unit 30 The position and shape of the exposure side) are detected. Note that the detectors 81 to 84 may detect only one of the position and shape of the substrate S.
  • the detection units 81 to 84 are more upstream than the first exposure unit 30 and the second exposure unit 40 when the substrate S moves toward the first exposure unit 30 and the second exposure unit 40. Has been placed.
  • the detection units 81 and 82 are fixed to the support member 17 that supports the second exposure unit 40. That is, the detection units 81 and 82 are fixed to the support member 17 common to the second exposure unit 40. Therefore, the third moving unit 70 can simultaneously move the second exposure unit 40 and the detection units 81 and 82 by the same distance in the same direction with a simple configuration.
  • the number of detection units is not particularly limited, and one or more arbitrary numbers may be provided for each of both surfaces of the substrate S.
  • the detection unit may be provided only on one surface side of the substrate S.
  • FIG. 4 shows a flow of exposure processing of the substrate S.
  • FIG. 5 shows the state of the exposure apparatus 10 in each step shown in FIG.
  • the substrate S is placed between the first sandwiching portion 20a and the second sandwiching portion 20b, and the flat surface 23a of the lower glass plate 21a.
  • the substrate S is placed on the substrate (step S110).
  • Such an operation can be performed by, for example, a clamp device (not shown) that holds the substrate S by suction.
  • the exposure apparatus 10 When the substrate S is placed, the exposure apparatus 10 then lowers the second clamping unit 20b by the first moving unit 50, and the flat surface 23b of the upper glass plate 21b and the flat surface of the lower glass plate 21a. The substrate S is sandwiched between 23a (step S120). At this time, since the substrate S is pressed toward the lower glass plate 21a by the upper glass plate 21b, the non-flat shape is reduced even if the exposure surface of the substrate S has a non-flat shape.
  • the exposure apparatus 10 advances the substrate S toward the first exposure unit 30 and the second exposure unit 40 by the second moving unit 60, and sandwiches by the detection units 81 to 84.
  • the marks on both sides of the substrate S in the state are read (step S130).
  • the marks are attached near the four corners of both surfaces of the substrate S.
  • FIG. 5C two marks on one end side (the first exposure unit 30 and the second exposure unit 40 side) of the sandwiched substrate S are read.
  • FIG. 5D two marks on the other end side of the sandwiched substrate S are read.
  • the mark is read in the same state as during exposure, that is, in the sandwiched state, exposure can be performed with high accuracy.
  • the exposure apparatus 10 When the mark is read, the exposure apparatus 10 next recognizes the position and shape of the substrate S from the reading results of the detectors 81 to 84, and corrects the exposure data according to the recognition result (step S140). Next, as shown in FIG. 5E, the exposure apparatus 10 emits light to both surfaces of the sandwiched substrate S from the first exposure unit 30 and the second exposure unit 40 while further moving the substrate S forward. Irradiate to expose both sides of the substrate S simultaneously (step S150). The light irradiation timing is controlled according to the reading results of the detection units 81 to 84, that is, the position, shape, inclination, etc. of the substrate S.
  • the substrate S Since the substrate S is sandwiched between the lower glass plate 21a and the upper glass plate 21b, the light emitted from the first exposure unit 30 and the second exposure unit 40 is emitted from the lower glass plate 21a or the upper glass plate. It passes through 21b and reaches the substrate S.
  • the first clamping unit 20a and the second clamping unit 20b move in the horizontal direction without changing the vertical position, so that the flat surface 23a (that is, the lower surface side of the substrate S) ) And the first exposure unit 30 in the light irradiation direction (vertical distance), the flat surface 23b (that is, the exposure surface on the upper surface side of the substrate S), and the second exposure unit 40.
  • the distance in the light irradiation direction is kept constant.
  • the position of the first clamping unit 20a is fixed, the distance between the flat surface 23a and the first exposure unit 30 is always constant regardless of the thickness of the substrate S.
  • FIG. 5F shows a state in which the substrate S has further advanced and the exposure of all the required exposure areas of the substrate S has been completed.
  • the exposure apparatus 10 then causes the second moving unit 60 to retract the sandwiched substrate S to the initial position (see FIG. 5B) (step S160). Then, the exposure apparatus 10 lifts the second clamping unit 20b by the first moving unit 50 to release the clamping state, and discharges the substrate S after the exposure (step S170).
  • the substrate S is discharged by the above-described clamping device.
  • the exposure apparatus 10 has a position setting unit that moves the position of the second exposure unit 40 in advance to a predetermined position according to the thickness of the substrate S by the third moving unit 70. ing. Specifically, the vertical position of the flat surface 23b (exposure surface of the substrate S) of the second clamping unit 20b in the clamping state varies depending on the thickness of the substrate S, so that the position setting unit is in the clamping state.
  • the second exposure unit 40 is vertically moved to a position where an image is formed on the flat surface 23b according to information (hereinafter also referred to as position information) that can specify the vertical position of the second clamping unit 20b (flat surface 23b). Move in the direction.
  • Such a position setting unit is included in a control device that controls the overall operation of the exposure apparatus 10.
  • the position setting unit receives position information input by the user and moves the second exposure unit 40 to a position corresponding to the input value.
  • the position information can be, for example, the thickness of the substrate S (for example, the design dimension of the substrate S). According to such a configuration, even when the thickness of the substrate S to be processed is different, stable image formation can be performed on the exposure surface of the substrate S.
  • the difference in thickness according to the type of substrate S is usually up to several millimeters at most.
  • the movable range of the second exposure unit 40 by the third moving unit 70 may be about several mm.
  • the second exposure unit 40 has a movable range (for example, several tens of centimeters) wider than the movable range necessary for forming an image on the flat surface 23b.
  • the exposure apparatus 10 may include a measurement unit that measures the distance between the second exposure unit 40 and the exposure surface (upper surface) of the sandwiched substrate S.
  • the position setting unit may accept the measurement result of the measurement unit as position information, and change the position of the second exposure unit 40 according to the measurement result of the measurement unit.
  • the measurement unit may be a laser distance meter, for example.
  • the measurement unit may be fixed to the support member 17. In this case, since the measurement unit and the second exposure unit 40 are both fixed to the support member 17, the distance between them is always constant. For this reason, the distance between the measurement unit and the second exposure unit 40 is added to or subtracted from the distance between the measurement unit and the exposure surface measured by the measurement unit. The distance from the exposure surface (upper surface) of S can be easily measured. With these configurations, the above-described user input is not necessary, and the convenience for the user is improved.
  • the measurement by the measurement unit may be performed for each substrate S or may be performed for each type of substrate S processed by the exposure apparatus 10.
  • the substrate S is pressed in the direction perpendicular to the exposure surface by being held by the holding unit 20. And non-flat shapes are reduced. That is, the non-flat shape of the substrate S is corrected so as to approach the flat shape. Further, since the position of the first clamping unit 20a in the direction in which the first moving unit 50 moves the second clamping unit 20b is fixed, the flat surface 23a of the first clamping unit 20a in the clamping state. The distance in the vertical direction between the exposure surface of the substrate S in contact with the first exposure unit 30 is kept constant. For this reason, it is possible to form an image stably over the entire area of the exposure surface of the substrate S in contact with the flat surface 23a.
  • the second exposure unit 40 is moved by the third moving unit 70 by the same amount as the position of the exposure surface of the substrate S in contact with the flat surface 23b of the second holding unit 20b. Can be moved linearly, the vertical direction of the exposure surface of the substrate S contacting the flat surface 23b of the second clamping unit 20b and the second exposure unit 40 without using the autofocus function.
  • the distance of (light irradiation direction) can be kept constant even if the thickness of the substrate S changes.
  • the detection units 81 and 82 are fixed to the support member 17 that is a support member common to the second exposure unit 40. Therefore, the third moving unit 70 can simultaneously move the second exposure unit 40 and the detection units 81 and 82 by the same distance in the same direction with a simple configuration. Therefore, if the second exposure unit 40 and the detection units 81 and 82 are originally at a position where an image is formed on the exposure surface of the substrate S on the second sandwiching unit 20b side, the second exposure unit according to the thickness of the substrate S When 40 is moved, the detectors 81 and 82 move by the same distance in the same direction as the movement, so that the positions of the detectors 81 and 82 need not be readjusted. For this reason, user convenience is improved.
  • the apparatus configuration can be simplified. Moreover, since only one actuator is required to move the second exposure unit 40 and the detection units 81 and 82, the apparatus configuration can be simplified in this respect. Further, when the second exposure unit 40 and the detection units 81 and 82 are configured to be independently movable, the second exposure unit 40 and the detection units 81 and 82 are moved when the second exposure unit 40 and the detection units 81 and 82 are moved.
  • the relative positions of the detection units 81 and 82 and the second exposure unit 40 in the moving direction of the clamping unit 20 (substrate S) by the second moving unit 60 may be shifted due to the installation accuracy of the members, According to the configuration of the embodiment, since the second exposure unit 40 and the detection units 81 and 82 are integrated via the support member 17, such a possibility does not occur.
  • FIG. 6 shows a schematic configuration of an exposure apparatus 210 as the second embodiment.
  • FIG. 6 corresponds to FIG. 2 of the first embodiment.
  • the same components as those in the first embodiment are denoted by the same reference numerals as those in FIG.
  • the exposure apparatus 210 includes a seal unit 281 and a decompression unit 290 in addition to the configuration of the exposure apparatus 10 as the first embodiment.
  • the seal portion 281 is formed of an elastic member, and is attached to the upper surface of the support portion 22a so as to surround the lower glass plate 21a.
  • the height of the seal portion 281 is formed larger than the thickness of the substrate S.
  • a through hole 285 is formed in the lower glass plate 21a, and a decompression unit 290 is connected to the through hole 285 through a pipe.
  • the decompression unit 290 can be, for example, a vacuum pump.
  • the seal portion 281 and the lower surface of the support portion 22b are surrounded by the periphery of the substrate S.
  • the periphery of the substrate S is sealed by the seal portion 281.
  • a slight gap is formed between the substrate S and the flat surface 23b, or the substrate S and the flat surface 23b are almost in contact with each other.
  • the decompression unit 290 is driven to decompress the space inside the seal unit 281. Accordingly, the seal portion 281 is crushed in the vertical direction, and the second sandwiching portion 20b is further moved downward. As a result, the flat surface 23b contacts the substrate S and presses the substrate S downward with a very strong force. In the exposure apparatus 210, the clamping state is obtained in this way.
  • the through hole 285 may be formed in the support portion 22a. Further, the seal portion 281 may be formed on the lower glass plate 21a. Furthermore, the seal part 281 and the through hole 285 may be formed in the second clamping part 20b.
  • FIG. 7 shows a schematic configuration of an exposure apparatus 310 as a third embodiment.
  • 8 is a CC arrow view of the exposure apparatus 310 shown in FIG.
  • FIG. 7 corresponds to FIG. 2 of the first embodiment
  • FIG. 8 corresponds to FIG. 7 and 8, the same components as those in the first embodiment are denoted by the same reference numerals as those in FIGS.
  • a flexible strip substrate is used as the substrate S.
  • the exposure device 310 includes a feeding device 381, rollers 382, 383, 385, 386, a transport device 384, and a winding device 387.
  • the feeding device 381 rotates the drum (winding drum) on which the roll-shaped substrate S to be subjected to exposure processing is set, and feeds the substrate S.
  • the substrate S fed from the feeding device 381 passes between the first clamping unit 20a and the second clamping unit 20b via the roller 382, and further, the first exposure unit 30 and the second exposure unit. It passes between the portions 40, and is taken up by the take-up device 387 via the roller 383, the conveying device 384, and the rollers 385, 386.
  • the winding device 387 rotates the drum and winds the exposed substrate S on the drum.
  • the transport device 384 transports the substrate S between the feeding device 381 and the winding device 387 in a direction from the feeding device 381 to the winding device 387 and in a direction from the winding device 387 to the feeding device 381.
  • the transport device 384 is a nip roller.
  • the tension of the substrate S between the feeding device 381 and the winding device 387 is adjusted so that the tension in the longitudinal direction does not act on the substrate S as much as possible. This tension adjustment is desirably performed to such an extent that the substrate S does not come into contact with the first clamping unit 20a. By doing so, the substrate S does not slide on the first sandwiching portion 20a when the sandwiching portion 20 moves while the sandwiching portion 20 does not sandwich the substrate S, so that the substrate S is damaged. This can be suppressed.
  • the exposure apparatus 310 operates as follows, for example. First, as shown in FIG. 7, the exposure apparatus 310 lowers the second clamping unit 20b at a position between the roller 382 and the detection units 81 to 84, and the substrate S is formed by the flat surface 23a and the flat surface 23b. The predetermined exposure area is sandwiched. Next, the exposure apparatus 310 moves the clamping unit 20 in the clamping state 20 in the direction of the first exposure unit 30 and the second exposure unit 40, so that the substrate S is wound in the longitudinal direction (from the feeding device 381). In the direction toward the take-off device 387). At this time, the feeding device 381 and the winding device 387 rotate the drum within a range where tension is not generated as much as possible on the substrate S.
  • the feeding device 381 and the winding device 387 are merely performing the feeding or winding operation of the substrate S, and do not apply the force necessary for feeding the substrate S to the substrate S. Similarly, at this time, the transfer device 384 does not contribute to the transfer operation of the substrate S.
  • the exposure apparatus 310 detects a mark on the substrate S provided in or near a predetermined exposure region by the detectors 81 to 84. Then, the exposure apparatus 310 exposes a predetermined exposure region of the sandwiched substrate S by the first exposure unit 30 and the second exposure unit 40 according to the detection result while feeding the substrate S. When the exposure of the predetermined exposure area is completed, the exposure apparatus 310 raises the second clamping unit 20b and releases the clamping state. When the nipping state is released, the exposure apparatus 310 moves the substrate S in the reverse direction, that is, the direction from the winding apparatus 387 toward the feeding apparatus 381 by the transport apparatus 384.
  • the feeding device 381 and the winding device 387 also rotate the drum in the opposite direction as long as no tension is generated on the substrate S.
  • the movement of the substrate S in the reverse direction is performed until the exposure area to be exposed next returns to a predetermined position between the roller 382 and the detection units 81 to 84.
  • the exposure apparatus 310 moves the next exposure area while holding the holding part 20 in a state where the second holding part 20b is raised, that is, in a non-holding state. Move to a position where it can be clamped. Then, the exposure apparatus 310 lowers the second holding unit 20b again to hold the next exposure area of the substrate S. Thereafter, the exposure cycle described above is repeated.
  • the exposure apparatus 310 even when the substrate S is slightly bent, the substrate S is sandwiched between the flat surface 23a and the flat surface 23b, so that the substrate S is sandwiched in an extremely flat state. Moreover, in the clamping state, the vertical distance between the exposure surface of the substrate S that contacts the flat surface 23a of the first clamping unit 20a and the first exposure unit 30 is constant as in the first embodiment. Kept. In addition, since the flexible strip-shaped substrate S is usually thin, the vertical direction between the exposure surface of the substrate S that contacts the flat surface 23b of the second clamping unit 20b and the second exposure unit 40 in the clamping state. The distance is also kept constant. Therefore, it is possible to form an image stably on the exposure surfaces on both sides of the substrate S with a simple configuration.
  • the exposure apparatus 310 when the substrate S is fed, that is, during exposure, excessive longitudinal tension is not generated on the exposure surface of the substrate S. That is, the substrate S is not exposed in the state where the excessive tension acts on the substrate S and the exposure surface extends in the longitudinal direction. Therefore, the pattern can be formed on the substrate S with high accuracy.
  • the exposure apparatus 310 since the exposure apparatus 310 includes the transport device 384, when the substrate S is replaced, the substrate S newly attached to the feeding device 381 is sent by the transport device 384 in the direction of the winding device 387.
  • the device 387 can be wound. Further, the tension of the substrate S can be easily adjusted.
  • the conveyance device 384 can be omitted. In this case, the movement of the substrate S in the reverse direction may also be performed by the first clamping part 20a and the second clamping part 20b.
  • the exposure apparatus 310 performs the first clamping at a predetermined position.
  • the substrate S may be sandwiched between the portion 20a and the second sandwiching portion 20b.
  • the exposure apparatus 310 adds the first exposure unit 30 to the first exposure unit 30 in addition to the third moving unit 70 that linearly moves the second exposure unit 40 in the direction approaching and moving away from the first exposure unit 30.
  • a fourth moving unit that linearly moves in the direction approaching and moving away from the second exposure unit 40 may be provided.
  • the first exposure unit 30 may be fixed to a support member (also referred to as a second support member) that can be moved by the fourth moving unit.
  • the detection units 83 and 84 may be fixed to the second support member.
  • the fourth moving unit can have the same configuration as the third moving unit. Also with these configurations, it is possible to form an image stably over the entire exposure area on both sides of the substrate S.
  • Modification 2 In the above-described embodiment, the transmission portions 21a and 21b are supported by the support portions 22a and 22b, but the support portions 22a and 22b can be omitted.
  • the transmission parts 21a and 21b may have a shape that combines the transmission parts 21a and 21b and the support parts 22a and 22b.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
PCT/JP2014/057968 2013-03-26 2014-03-24 露光装置、露光方法 WO2014157026A1 (ja)

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Citations (5)

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JPH07239551A (ja) * 1994-02-28 1995-09-12 Seikosha Co Ltd 露光装置
JP2000095402A (ja) * 1998-09-28 2000-04-04 Ushio Inc 帯状ワークの露光装置
JP2000235267A (ja) * 1999-02-15 2000-08-29 Asahi Optical Co Ltd 走査式描画装置
JP2005326550A (ja) * 2004-05-13 2005-11-24 Sanee Giken Kk 露光装置
JP2006106097A (ja) * 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法

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JPH05265220A (ja) * 1992-03-19 1993-10-15 Orc Mfg Co Ltd 基板傾斜式露光装置
US5337151A (en) * 1992-07-28 1994-08-09 Optical Radiation Corporation Double-sided circuit board exposure machine and method with optical registration and material variation compensation
FR2748887B1 (fr) * 1996-05-15 1998-08-21 Automa Tech Sa Installation d'exposition a la lumiere d'une plaque de circuit imprime double face a travers des cliches
JP2002099095A (ja) * 2000-09-25 2002-04-05 Orc Mfg Co Ltd 自動両面露光装置およびその方法
JP4472560B2 (ja) 2005-03-08 2010-06-02 日立ビアメカニクス株式会社 マスクレス露光装置及びその露光方法並びに配線基板の製造方法
JP4984631B2 (ja) * 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法

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Publication number Priority date Publication date Assignee Title
JPH07239551A (ja) * 1994-02-28 1995-09-12 Seikosha Co Ltd 露光装置
JP2000095402A (ja) * 1998-09-28 2000-04-04 Ushio Inc 帯状ワークの露光装置
JP2000235267A (ja) * 1999-02-15 2000-08-29 Asahi Optical Co Ltd 走査式描画装置
JP2005326550A (ja) * 2004-05-13 2005-11-24 Sanee Giken Kk 露光装置
JP2006106097A (ja) * 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法

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CN105190444B (zh) 2017-07-11
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TW201514629A (zh) 2015-04-16
KR102102939B1 (ko) 2020-04-21
JP2014190987A (ja) 2014-10-06
CN105190444A (zh) 2015-12-23
KR20150135380A (ko) 2015-12-02

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