WO2014134895A1 - 触摸屏及其制造方法 - Google Patents

触摸屏及其制造方法 Download PDF

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Publication number
WO2014134895A1
WO2014134895A1 PCT/CN2013/078974 CN2013078974W WO2014134895A1 WO 2014134895 A1 WO2014134895 A1 WO 2014134895A1 CN 2013078974 W CN2013078974 W CN 2013078974W WO 2014134895 A1 WO2014134895 A1 WO 2014134895A1
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WO
WIPO (PCT)
Prior art keywords
transparent insulating
insulating substrate
grid
touch screen
electrode layer
Prior art date
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PCT/CN2013/078974
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English (en)
French (fr)
Inventor
何钊
Original Assignee
南昌欧菲光科技有限公司
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Application filed by 南昌欧菲光科技有限公司 filed Critical 南昌欧菲光科技有限公司
Priority to US13/985,996 priority Critical patent/US20140253826A1/en
Priority to JP2015503749A priority patent/JP2015512114A/ja
Priority to KR1020137025317A priority patent/KR101501940B1/ko
Publication of WO2014134895A1 publication Critical patent/WO2014134895A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes

Definitions

  • the present invention relates to the field of touch technologies, and in particular, to a touch screen and a method of manufacturing the touch screen.
  • Touch screens are widely used in a variety of electronic devices with display screens, such as smart phones, televisions, PDAs, tablets, notebook computers, computer or electronic devices including industrial display touch processing machines, integrated computers and ultrabooks. According to the working principle, the touch screen can be divided into capacitive type, resistive type and surface light wave type.
  • Capacitive touch screens use the current sensing of the human body to work.
  • the finger touches the metal layer the user and the surface of the touch screen form a coupling capacitor due to the electric field of the human body.
  • the capacitor is a direct conductor, and the finger sucks a small current from the contact point.
  • This current flows out from the electrodes on the four corners of the touch screen, and the current flowing through the four electrodes is proportional to the distance from the finger to the four corners.
  • the controller calculates the position of the touch point by accurately calculating the ratio of the four currents. .
  • capacitive touch screens use glass ITO or thin film ITO (that is, a driving electrode and a sensing electrode pattern are formed on a glass or a film).
  • glass ITO or thin film ITO forms the driving electrode and the sensing electrode pattern, which has the following disadvantages: on the one hand, the ITO driving electrode or the sensing electrode protrusion is easily scratched or dropped on the surface of the glass or the surface of the transparent film, resulting in a decrease in production yield.
  • the main material of glass ITO or thin film ITO is mainly rare metal indium, so the cost is relatively expensive, and the resistance or square resistance of ITO in making large-sized touch screen is relatively large, which affects the signal transmission speed, resulting in poor touch sensitivity and thus affecting The user experience of the entire electronic product is not good.
  • a method of manufacturing a touch screen is also provided.
  • a touch screen comprising: a first transparent insulating substrate; a second transparent insulating substrate comprising a first surface facing the first transparent insulating substrate and a second surface opposite to the first surface; a sensing electrode layer Between the first transparent insulating substrate and the second transparent insulating substrate, the sensing electrode layer comprises a plurality of independently arranged sensing electrodes, each of the sensing electrodes comprises a grid conductive circuit; and a driving electrode layer, the setting On the first surface or the second surface of the second transparent insulating substrate, the driving electrode layer includes a plurality of independently disposed driving electrodes.
  • a touch screen comprising: a rigid transparent insulating substrate; a sensing electrode layer formed on a surface of the rigid transparent insulating substrate, comprising a plurality of independently arranged sensing electrodes; each sensing electrode of the sensing electrode layer comprises a grid a conductive circuit; a flexible transparent insulating substrate comprising a first surface and a second surface opposite to the first surface; a driving electrode layer formed on the first surface or the second surface of the flexible transparent insulating substrate, including Separately disposed driving electrodes; the first surface or the second surface of the flexible transparent insulating substrate is attached to the rigid transparent insulating substrate.
  • a method of manufacturing a touch screen comprising the steps of: providing a first transparent insulating substrate; forming a sensing electrode layer on one side of the first transparent insulating substrate; and sensing electrodes of the sensing electrode layer are a plurality of cell grids a grid conductive circuit; providing a second transparent insulating substrate; forming a driving electrode layer on one side of the second transparent insulating substrate; attaching the second transparent insulating substrate to the first transparent insulating substrate .
  • a method of manufacturing a touch screen comprising the steps of: providing a first transparent insulating substrate; providing a second transparent insulating substrate; forming a driving electrode layer on one side of the second transparent insulating substrate; and the second transparent insulating layer Forming a sensing electrode layer on the other side of the substrate; the sensing electrode of the sensing electrode layer is a grid conductive circuit including a plurality of cell grids; attaching the first transparent insulating substrate to the second transparent insulating substrate on.
  • the driving electrode of the touch screen is formed as a conductive mesh formed by the grid conductive circuit, the touch screen does not have such a surface that is easily scratched or dropped, and the cost is high, and the size is large. The problem of large resistance is higher, so the cost of the touch screen is lower and the sensitivity is higher.
  • FIG. 1 is a schematic diagram of an electronic device to which the touch screen of the present invention is applied;
  • FIG. 2 is a schematic cross-sectional view of a first type of touch screen of the present invention
  • Figure 3 is a schematic cross-sectional view of a specific embodiment of Figure 2;
  • FIG. 4 is a schematic plan view showing a surface of the second transparent insulating substrate formed by the sensing electrode layer shown in FIG. 3;
  • Figure 5 is a schematic cross-sectional view taken along line aa' of Figure 4.
  • Figure 6 is a schematic cross-sectional view taken along line bb' of Figure 4.
  • FIG. 7 is a schematic plan view showing a surface of the first transparent insulating substrate formed by the driving electrode layer shown in FIG. 3;
  • Figure 8 is a cross-sectional view taken along line AA' of Figure 7;
  • Figure 9 is a schematic cross-sectional view taken along line BB' of Figure 7;
  • Figure 10 is a cross-sectional view showing a second type of touch screen of the present invention.
  • Figure 11 is a schematic cross-sectional view of a specific embodiment of Figure 10;
  • FIG. 12 is a schematic cross-sectional view of a third type touch panel of the present invention.
  • Figure 13 is a schematic cross-sectional view of a specific embodiment of Figure 12;
  • FIG. 14 is a cross-sectional view showing a specific embodiment of a fourth type touch panel of the present invention.
  • 15a and 15b are schematic diagrams showing the arrangement and shape of the sensing electrode and the driving electrode
  • 16a, 16b, 16c, and 16d are partially enlarged views respectively corresponding to the portion A in Fig. 15a or the portion B in Fig. 15b in an embodiment;
  • FIG. 17 is a flow chart of a method of manufacturing a touch screen according to an embodiment
  • step S102 is a specific flowchart of step S102 in the flow shown in FIG. 17;
  • Figure 19 is a view showing a layer structure of a driving electrode obtained in accordance with step S102 in the flow shown in Figure 17;
  • FIG. 20 is a flow chart of a method of manufacturing a touch screen according to another embodiment
  • FIG. 21 is a specific flowchart of step S204 in the flow shown in FIG. 20.
  • Transparent in the transparent insulating substrate described in the present invention can be understood as “transparent” and “Substantially transparent”; “insulation” in a transparent insulating substrate is understood to mean “insulating” and “dielectric” in the present invention.
  • transparent insulating substrate as described in the present invention should be construed to include, but is not limited to, a transparent insulating substrate, a substantially transparent insulating substrate, a transparent dielectric substrate, and a substantially transparent dielectric substrate.
  • the electronic device 10 is a smart phone or a tablet computer.
  • the touch screen 100 is attached to the upper surface of the LCD display, and is used for an I/O device of one of the human-computer interactions of the electronic device. It can be understood that the touch screen 100 of the present invention can also be applied to mobile phones, mobile communication phones, televisions, tablets, notebook computers, industrial machine tools including touch screen displays, aviation touch display electronic devices, GPS electronic devices, integrated computers. And super computer equipment.
  • the touch screen 100 includes a first transparent insulating substrate 110, a sensing electrode layer 120, an adhesive layer 130, a driving electrode layer 140, and a second transparent insulating substrate 150.
  • the sensing electrode layer 120 is disposed between the first transparent insulating substrate 110 and the second transparent insulating substrate 150.
  • the second transparent insulating substrate 150 includes a first surface 152 facing the first transparent insulating substrate and a second surface 154 opposite the first surface.
  • the drive electrode layer 150 is formed on the first surface 152. In other embodiments, the driving electrode layer 150 may also be disposed on the second surface 154.
  • the adhesive layer 130 is used to bond the first transparent insulating substrate 110 and the second transparent insulating substrate 150 into one body. When the driving electrode layer 150 is disposed on the first surface 152, the adhesive layer 130 is also used to insulate between the sensing electrode layer 120 and the driving electrode layer 140.
  • the adhesive layer 130 can be optically transparent OCA (Optical) Clear Adhesive) Glue or LOCA Glue.
  • FIG. 3 is a cross-sectional view of a first embodiment of the first type of touch screen of the present invention.
  • 4 is a plan view of a sensing electrode layer.
  • the sensing electrode layer 120 includes a plurality of independently arranged sensing electrodes 120a, and each of the sensing electrodes 120a includes a grid conductive circuit 120b.
  • the driving electrode layer 140 includes a plurality of driving electrodes 140a disposed independently.
  • the "independent setting" described in the present invention can be understood to include, but is not limited to, “independent setting", “isolation setting” or “insulation setting” and the like.
  • the sensing electrode and the driving electrode are two essential parts of the touch sensing component.
  • the sensing electrode is generally close to the touch surface of the touch screen, and the driving electrode is relatively far from the touch surface.
  • the driving electrode is connected to the scanning signal generating device, and the scanning signal generating device provides the scanning signal, and the sensing electrode generates an electrical parameter change when touched by the charging conductor to sense the touch area or the touch position.
  • Each of the sensing electrodes included in the sensing layer 120 is electrically connected to the sensing detection processing module of the touch screen peripheral device.
  • the driving electrodes of the driving layer 140 are electrically connected to the excitation signal module of the touch screen peripheral device.
  • a mutual capacitance is formed between the sensing electrode and the driving electrode.
  • the sensing electrode layer 120 and the driving electrode layer 140 are formed in different manners, different materials, and different processes.
  • the sensing electrode layer 120 includes a plurality of mutually independent grid conductive circuits 120b.
  • the mesh conductive circuit 120b is embedded or buried in the transparent insulating layer 160, and the transparent insulating layer 160 is adhered to the surface of the first transparent insulating substrate 110 through the adhesion promoting layer 21.
  • the material of the grid conductive circuit 120b is selected from the group consisting of gold, silver, copper, aluminum, zinc, gold plated silver, or an alloy of at least two. The above materials are easy to obtain, and the cost is low. In particular, the silver paste is used to obtain the above-mentioned grid conductive circuit 120b, which has good electrical conductivity and low cost.
  • the grid conductive circuit 120b is embedded or buried in the transparent insulating layer 160.
  • One preferred way is to form a plurality of staggered grid grooves in the transparent insulating layer 160, the grid is conductive.
  • the circuit 120b is disposed in the recess such that the grid conductive circuit 120b is formed in the surface of the transparent insulating layer 160 in an embedded or buried form.
  • the sensing electrode 120a is not easily damaged or peeled off due to being firmly attached to the first transparent insulating substrate 110. It is easy to know that the grid conductive circuit 120b can also be directly embedded or buried in the surface of the first transparent insulating substrate 110.
  • the grid spacing of the grid conductive circuit 120b is d 1 and 100 ⁇ m ⁇ d 1 ⁇ 600 ⁇ m; the sheet resistance of the grid conductive circuit 120b is R, and 0.1 ⁇ /sq ⁇ R ⁇ 200 ⁇ / sq .
  • the square resistance R of the grid conductive circuit 120b Affects the current signal transmission speed, which affects the sensitivity of the touch screen response. Therefore, the grid resistance R of the grid conductive circuit 120b is preferably 1 ⁇ / sq ⁇ R ⁇ 60 ⁇ / sq. Square resistance R in this range , can significantly improve the conductivity of the conductive film, significantly improve the transmission speed of the electrical signal, and the accuracy requirements are more than 0.1 ⁇ / sq ⁇ R ⁇ 200 ⁇ / sq Low, that is, the process requirements are reduced and the cost is reduced while ensuring conductivity.
  • the grid resistance of the grid conductive circuit 120b is R. It is determined by a combination of factors such as grid spacing, material, and wire diameter (line width).
  • the grid line width of the grid conductive circuit 120b is d 2 and 1 ⁇ m ⁇ d 2 ⁇ 10 ⁇ m.
  • the line width of the grid affects the light transmittance of the conductive film, and the smaller the grid line width, the better the light transmittance.
  • the grid line spacing d 1 of the conductive grid is 100 ⁇ m ⁇ d 1 ⁇ 600 ⁇ m
  • the sheet resistance R of the grid conductive circuit 120b is 0.1 ⁇ /sq ⁇ R ⁇ 200 ⁇ /sq
  • the grid line width d 2 is 1 ⁇ m.
  • ⁇ d 2 ⁇ 10 ⁇ m can meet the requirements, and at the same time can improve the light transmittance of the entire touch screen.
  • the grid line width d 2 of the grid conductive circuit 120b is 2 ⁇ m ⁇ d 2 ⁇ 5 ⁇ m
  • the light transmission area of the touch screen is larger, the light transmittance is better, and the accuracy requirement is relatively low.
  • the grid conductive circuit 120b is made of a silver material and has a regular pattern, and the grid line spacing is 200 ⁇ m ⁇ 500 ⁇ m; the surface resistance of the grid conductive circuit 120b is 4 ⁇ / sq ⁇ R ⁇ 50 ⁇ / sq, silver coating
  • the amount of cloth is from 0.7 g/m 2 to 1.1 g/m 2 .
  • d 1 200 ⁇ m
  • the grid line width d 2 500 nm to 5 ⁇ m.
  • the value of the sheet resistance R and the amount of silver are affected by the grid line width d 2 and the depth of the filled groove. The larger the grid line width d 2 is, the larger the groove depth is filled. The resistance will increase and the amount of silver will increase.
  • d 1 300 ⁇ m
  • R 10 ⁇ / sq
  • the silver content is 0.9 to 1.0 g/m 2
  • the grid line width d 2 is 500 nm to 5 ⁇ m.
  • the value of the sheet resistance R and the amount of silver are affected by the grid line width d 2 and the depth of the filled groove. The larger the grid line width d 2 is, the larger the groove depth is filled. The resistance will increase and the amount of silver will increase.
  • d 1 500 ⁇ m
  • the grid line width d 2 500 nm to 5 ⁇ m.
  • the value of the sheet resistance R and the amount of silver are affected by the grid line width d 2 and the depth of the filled groove. The larger the grid line width d 2 is, the larger the groove depth is filled. The resistance will increase and the amount of silver will increase.
  • grid conductive circuit 120b made of a metal conductive material
  • one of transparent conductive polymer materials, graphene or carbon nanotubes may be used.
  • the driving electrode of the driving electrode layer 140 is made of indium tin oxide (Indium Tin). Oxide, ITO), Antimony Doped Tin Oxide (ATO), Indium Zinc (Indium Zinc) Oxide, IZO), Aluminum Zinc Oxide (AZO), Polyethylene Dioxythiophene (PEDOT) It is made of any one of transparent conductive polymer material, graphene or carbon nanotube.
  • the patterned sensing electrode is formed by engineering etching, printing, coating, photolithography, or yellow light processing.
  • the sensing electrode layer 120 is directly formed on the surface of the first transparent insulating substrate 110, and the first transparent insulating substrate 110 is a rigid substrate.
  • the rigid substrate is a reinforced glass or transparent plastic plate, referred to as a tempered glass or a reinforced plastic plate.
  • the tempered glass comprises a functional layer having an anti-glare, hardening, anti-reflection or atomization function.
  • the functional layer having anti-glare or atomization function is formed by coating with a coating having anti-glare or atomization function, the coating includes metal oxide particles; and the functional layer having a hardening function is coated with a polymer coating having a hardening function.
  • the functional layer having an anti-reflection function is titanium dioxide plating, magnesium fluoride plating or calcium fluoride plating. It can be understood that the plastic plate having good light transmittance can also be processed as described above by the tempered glass to form the rigid transparent insulating substrate of the present invention.
  • the first transparent insulating substrate 110 is made of a flexible material, such as flexible polyethylene terephthalate (PET), polycarbonate (PC), and polyethylene. Any of (PE), polyvinyl chloride (PVC), polypropylene (PP), polystyrene (PS) or polymethyl methacrylate (PMMA).
  • an adhesion promoting layer 141 is added to one surface of the first transparent insulating substrate 110 so that the upper transparent insulating layer is firmly adhered to the first transparent insulating substrate 110. It should be noted that since the first transparent insulating substrate 110 is made of a flexible material, the flexible material is inevitably deformed or bent during the moving or handling process, so that the embedded or embedded driving electrode is more reliable. .
  • the first transparent insulating substrate 110 is made of a substrate made of polyethylene terephthalate (PET); the second transparent insulating substrate 150 is used.
  • PET polyethylene terephthalate
  • a flexible substrate made of polyphthalic plastic (PET) is attached to the second transparent insulating substrate 150 made of tempered glass, and the above embodiment facilitates the bonding of the flexible substrate to the flexible substrate.
  • the touch screen included in the present invention is formed by strengthening the glass. The above manufacturing process is simple while reducing the thickness of the touch screen.
  • FIG. 10 and FIG. 11 are schematic cross-sectional views of a second type of touch screen of the present invention and a cross-sectional view of a specific embodiment.
  • the embodiment of the present invention is different in the first type of embodiment in that the driving electrode layer 240 is disposed on the second surface of the second transparent insulating substrate 250. Or alternatively, the back surface of the second transparent insulating substrate 250 provided with the driving electrode layer 240 is integrated with the first transparent insulating substrate 210 with respect to the first type of touch screen.
  • the manner in which the sensing electrode layer 220 and the driving electrode layer 240 are formed is the same as that of the first embodiment.
  • FIG. 12 and FIG. 13 are schematic cross-sectional views of a third type of touch screen according to the present invention and a cross-sectional view of a specific embodiment.
  • the sensing electrode layer 320 is formed on the first surface of the second transparent insulating substrate 350
  • the driving electrode layer 340 is formed on the second surface of the second transparent insulating substrate 350, that is, DITO. structure.
  • the DITO structure is then bonded to the first transparent insulating substrate 310 through an adhesive layer 330.
  • the first transparent insulating substrate 310 may be made of tempered glass, flexible polyethylene terephthalate (PET), or polycarbonate. Any of (PC), polyethylene (PE), polyvinyl chloride (PVC), polypropylene (PP), polystyrene (PS) or polymethyl methacrylate (PMMA).
  • FIG. 14 is a cross-sectional view of a fourth type touch screen of the present invention.
  • the touch panel includes a second transparent insulating substrate 450, a driving electrode layer 440, an adhesive layer 430, a sensing electrode layer 420, a first transparent insulating substrate 410, an adhesive layer 430, and a third transparent insulating substrate which are sequentially stacked. 470.
  • the sensing electrode layer 420 may be bonded to the first transparent insulating substrate 410 through the adhesion promoting layer 21; the driving electrode layer 440 may be bonded to the second transparent insulating substrate 450 through the adhesion promoting layer 21.
  • the sensing electrode layer 420 includes a grid conductive circuit 420b.
  • the embodiment further includes a third transparent insulating substrate 470, and the third transparent insulating substrate 470 can be selected from a tempered glass and a flexible transparent panel.
  • flexible transparent panel can be selected from flexible polyethylene terephthalate (PET) and polycarbonate. Made of (PC), polyethylene (PE), polyvinyl chloride (PVC), polypropylene (PP), polystyrene (PS) or polymethyl methacrylate (PMMA).
  • the first transparent insulating substrate 410 and the second transparent insulating substrate 450 can be selected from tempered glass and flexible polyethylene terephthalate (PET).
  • PET polyethylene terephthalate
  • PC Polycarbonate
  • PE polyethylene Made of
  • PE polyvinyl chloride
  • PP polypropylene
  • PS polystyrene
  • PMMA polymethyl methacrylate
  • the first transparent insulating substrate 410 and the second transparent insulating substrate 450 each employ a flexible substrate such as flexible polyethylene terephthalate (PET).
  • FIG. 15a and 15b are schematic diagrams showing the arrangement and shape of the sensing electrodes and driving electrodes of the present invention including several types of embodiments.
  • the sensing electrodes disposed independently of each other are disposed in parallel and equidistantly in a first axial direction (X-axis); the driving electrodes disposed independently of each other are disposed in parallel and equidistantly in a second axial direction (Y-axis).
  • X-axis first axial direction
  • Y-axis second axial direction
  • FIG. 15a the sensing electrode and the driving electrode are both bar-shaped and staggered in a mutually perpendicular manner
  • FIG. 15b is a diamond-shaped structure in which the sensing electrode and the driving electrode are vertically staggered.
  • 16a, 16b, 16c, and 16d are partially enlarged views respectively corresponding to the portion A in Fig. 15a or the portion B in Fig. 15b, respectively, in one embodiment.
  • the grid conductive circuit shown in Figures 16a and 16b uses an irregular grid. This irregular grid conductive circuit is less difficult to manufacture and saves related processes.
  • the grid conductive circuits shown in 16c and 16d are uniformly arranged regular patterns.
  • the touch screen can be evenly transmitted; on the other hand, the grid resistance of the grid conductive circuit (referred to as square resistance) is evenly distributed, and the resistance deviation is small, and it is not necessary to correct the setting of the resistance deviation, so that the imaging is uniform.
  • It may be a linear lattice pattern of approximately orthogonal form, a curved wavy line lattice pattern, or the like.
  • the cell grid of the grid conductive circuit can be a regular pattern, such as a triangle, a diamond or a regular polygon, or an irregular geometric figure.
  • FIG. 17 is a flow chart showing a method of manufacturing a touch panel according to an embodiment. Please refer to FIG. 3 together, and the method includes the following steps.
  • the first transparent insulating substrate 110 is a rigid transparent insulating substrate or a flexible transparent insulating substrate, wherein the rigid transparent insulating substrate may be a tempered glass and a flexible transparent panel.
  • flexible transparent panel can be selected from flexible polyethylene terephthalate (PET) and polycarbonate. Made of (PC), polyethylene (PE), polyvinyl chloride (PVC), polypropylene (PP), polystyrene (PS) or polymethyl methacrylate (PMMA).
  • S102 forming a sensing electrode layer on a surface of the first transparent insulating substrate.
  • the second transparent insulating substrate 150 is a flexible transparent insulating substrate, and can be selected from flexible polyethylene terephthalate (PET), polycarbonate (PC), and polyethylene. Made of (PE), polyvinyl chloride (PVC), polypropylene (PP), polystyrene (PS) or polymethyl methacrylate (PMMA).
  • the second transparent insulating substrate 150 is a flexible film that can be easily attached to the rigid first transparent insulating substrate 110.
  • the above steps S101 to S102 and steps S103 to S104 have no order.
  • the formation of the sensing electrode layer 120 on the first transparent insulating substrate 110 may be completed first, or the driving electrode layer 140 may be formed on the second transparent insulating substrate 150, or both.
  • one surface of the second transparent insulating substrate 150 on which the driving electrode layer 140 is provided may be bonded to one surface of the first transparent insulating substrate 110 on which the sensing electrode layer 120 is provided.
  • the second transparent insulating substrate flexible insulating substrate 250 is not provided with the driving electrode layer 240.
  • One side of the first transparent insulating substrate 210 is provided with one surface of the sensing electrode layer 220.
  • step S102 specifically includes:
  • the transparent insulating layer 160 is exemplified by a UV glue.
  • an adhesion promoting layer 141 may be added between the first transparent insulating substrate 110 and the transparent insulating layer 160.
  • the transparent insulating laminate is formed into a grid groove. Referring to FIG. 19, after the transparent insulating layer 160 is pressed through the mold, a plurality of grid grooves 170 having the same shape as the driving electrodes are formed, and the sensing electrode layer 120 is formed in the grid grooves 170.
  • S123 adding a metal paste in the grid groove, and performing blade coating and sintering curing to form a conductive mesh.
  • the metal paste is added to the grid groove 170, and after being scraped, the grid groove is filled with a metal paste, and then sintered and solidified to obtain a conductive mesh.
  • the metal paste is preferably a nano silver paste.
  • the metal forming the grid conductive circuit may also be alloyed with gold, silver, copper, aluminum, zinc, gold plated silver or at least two of the above metals.
  • the grid conductive circuit can also be implemented by other processes, such as a photolithography process.
  • a transparent panel 470 may also be formed on the first transparent insulating substrate 410.
  • the transparent panel 470 is made of tempered glass or a flexible transparent panel.
  • FIG. 20 is a flow chart showing a method of manufacturing a touch panel according to another embodiment. Please refer to FIG. 13 together, and the method includes the following steps.
  • the first transparent insulating substrate 310 is a rigid transparent insulating substrate or a flexible transparent insulating substrate, wherein the rigid transparent insulating substrate may be a tempered glass and a flexible transparent panel.
  • flexible transparent panel can be selected from flexible polyethylene terephthalate (PET) and polycarbonate. Made of (PC), polyethylene (PE), polyvinyl chloride (PVC), polypropylene (PP), polystyrene (PS) or polymethyl methacrylate (PMMA).
  • the second transparent insulating substrate 350 is a flexible transparent insulating substrate, and optional flexible polyethylene terephthalate (PET) or polycarbonate can be used.
  • PET polyethylene terephthalate
  • PC polyethylene Made of
  • PE polyvinyl chloride
  • PP polypropylene
  • PS polystyrene
  • PMMA polymethyl methacrylate
  • the second transparent insulating substrate 350 is a flexible film that can be easily attached to the first transparent insulating substrate 310.
  • the above steps S203 and S204 have no order.
  • the formation of the sensing electrode layer 320 on the second transparent insulating substrate 350 may be completed first, or the driving electrode layer 340 may be formed on the second transparent insulating substrate 350.
  • the first transparent insulating substrate 310 is bonded to one surface of the second transparent insulating substrate 350 on which the sensing electrode layer 320 is provided.
  • step S204 specifically includes:
  • the transparent insulating layer 160 is exemplified by a UV glue.
  • an adhesion promoting layer may be added between the second transparent insulating substrate 150 and the transparent insulating layer 160.
  • the transparent insulating laminate is formed into a grid groove. Referring to FIG. 19, after the transparent insulating layer 160 is pressed through the mold, a plurality of mesh grooves 170 having the same shape as the sensing electrodes are formed, and the sensing electrode layer 120 is formed in the mesh grooves 170.
  • S243 adding a metal paste in the mesh groove, and performing blade coating and sintering curing to form a conductive mesh.
  • the metal paste is added to the grid groove 170, and after being scraped, the grid groove is filled with a metal paste, and then sintered and solidified to obtain a conductive mesh.
  • the metal paste is preferably a nano silver paste.
  • the metal forming the grid conductive circuit may also be alloyed with gold, silver, copper, aluminum, zinc, gold plated silver or at least two of the above metals.
  • the grid conductive circuit can also be implemented by other processes, such as a photolithography process.
  • a transparent panel may also be formed on the first transparent insulating substrate.
  • the transparent panel is made of tempered glass or a flexible transparent panel.
  • the above method makes the driving electrode of the touch screen into a conductive mesh formed by the grid conductive circuit, so the touch screen does not exist when the film ITO is used, such as the surface is easily scratched or dropped, the cost is high, and the square resistance is large when the size is large.
  • the problem is that the cost of the touch screen is lower and the sensitivity is higher.

Abstract

本发明公开一种触摸屏，包括：第一透明绝缘衬底；第二透明绝缘衬底，包括面向所述第一透明绝缘衬底的第一表面和与所述第一表面相对的第二表面；感应电极层，设置于所述第一透明绝缘衬底和第二透明绝缘衬底之间，感应电极层包括若干独立设置的感应电极，所述每一感应电极包括网格导电电路；及驱动电极层，设置在所述第二透明绝缘衬底的第一表面或第二表面，驱动电极层包括若干独立设置的驱动电极。还公开一种上述触摸屏的制造方法。上述触摸屏成本较低、灵敏度更高。

Description

触摸屏及其制造方法
【技术领域】
本发明涉及触控技术领域，特别是涉及一种触摸屏和一种触摸屏的制造方法。
【背景技术】
触摸屏被广泛应用于各种带有显示屏的电子装置中，如智能手机、电视、PDA、平板电脑、笔记本电脑、包含工业显示触摸加工机床、一体化计算机及超级本等计算机或电子设备等。触摸屏按照工作原理可以分为电容式、电阻式以及表面光波式等。
电容式触摸屏是利用人体的电流感应进行工作的。当手指触摸在金属层上时，由于人体电场，用户和触摸屏表面形成以一个耦合电容，对于高频电流来说，电容是直接导体，于是手指从接触点吸走一个很小的电流。这个电流分别从触摸屏的四角上的电极中流出，并且流经这四个电极的电流与手指到四角的距离成正比，控制器通过对这四个电流比例的精确计算，得出触摸点的位置。
目前电容式触摸屏都采用玻璃ITO或薄膜ITO（也即在玻璃或者薄膜上形成驱动电极和感应电极图案）。但是上述玻璃ITO或薄膜ITO形成驱动电极和感应电极图案存在以下几个缺点：一方面ITO驱动电极或感应电极凸起在玻璃表面或者透明薄膜表面容易被划伤或掉落，导致生产良率降低；另一方面，玻璃ITO或薄膜ITO主要材料主要是稀有金属铟，因此成本比较昂贵，而且ITO在做大尺寸触摸屏的电阻或方阻比较大，影响信号传输速度，导致触摸灵敏度差，从而影响整个电子产品用户体验感欠佳。
【发明内容】
基于此，有必要提供一种成本较低、灵敏度更高的触摸屏。
此外，还提供一种触摸屏的制造方法。
一种触摸屏，包括：第一透明绝缘衬底；第二透明绝缘衬底，包括面向所述第一透明绝缘衬底的第一表面和与所述第一表面相对的第二表面；感应电极层，设置于所述第一透明绝缘衬底和第二透明绝缘衬底之间，感应电极层包括若干独立设置的感应电极，所述每一感应电极包括网格导电电路；及驱动电极层，设置在所述第二透明绝缘衬底的第一表面或第二表面，驱动电极层包括若干独立设置的驱动电极。
一种触摸屏，包括：刚性透明绝缘衬底；感应电极层，形成于所述刚性透明绝缘衬底的一表面，包括若干独立设置的感应电极；所述感应电极层的每个感应电极包括网格导电电路；柔性透明绝缘衬底，包括第一表面和与所述第一表面相对的第二表面；驱动电极层，形成于所述柔性透明绝缘衬底的第一表面或第二表面，包括若干独立设置的驱动电极；所述柔性透明绝缘衬底的第一表面或第二表面贴合于所述刚性透明绝缘衬底上。
一种触摸屏的制造方法，包括如下步骤：提供第一透明绝缘衬底；在所述第一透明绝缘衬底的一面形成感应电极层；所述感应电极层的感应电极是包括大量单元网格的网格导电电路；提供第二透明绝缘衬底；在所述第二透明绝缘衬底的一面形成驱动电极层；将所述第二透明绝缘衬底贴附在所述第一透明绝缘衬底上。
一种触摸屏的制造方法，包括如下步骤：提供第一透明绝缘衬底；提供第二透明绝缘衬底；在所述第二透明绝缘衬底的一面形成驱动电极层；在所述第二透明绝缘衬底的另一面形成感应电极层；所述感应电极层的感应电极是包括大量单元网格的网格导电电路；将所述第一透明绝缘衬底贴附在所述第二透明绝缘衬底上。
上述触摸屏及其制造方法，由于将触摸屏的驱动电极制作为网格导电电路形成的导电网格，因此触摸屏不存在采用薄膜ITO时存在的诸如表面容易划伤或掉落、成本较高、大尺寸时方阻较大等问题，故触摸屏的成本较低、灵敏度更高。
【附图说明】
图1是应用本发明触摸屏的电子设备示意图；
图2为本发明第一类触摸屏的横截面示意图；
图3为图2所示一具体实施方式的横截面示意图；
图4为图3所示感应电极层形成第二透明绝缘衬底一表面的平面示意图；
图5是图4沿aa’剖面线的截面示意图；
图6是图4沿bb’ 剖面线的截面示意图；
图7是图3所示驱动电极层形成第一透明绝缘衬底一表面的平面示意图；
图8是图7沿AA’剖面线的截面示意图；
图9是图7沿BB’ 剖面线的截面示意图；
图10为本发明第二类触摸屏的横截面示意图；
图11为图10所示一具体实施方式的横截面示意图；
图12为本发明第三类触摸屏的横截面示意图；
图13为图12所示一具体实施方式的横截面示意图；
图14为本发明第四类触摸屏的一具体实施方式的横截面示意图；
图15a和图15b为感应电极和驱动电极排列及形状示意图；
图16a、16b、16c及16d分别为一实施例中分别对应于图15a中的A部分或图15b中的B部分的局部放大图；
图17为一实施例的触摸屏的制造方法流程图；
图18为图17所示流程中的步骤S102的具体流程图；
图19为根据图17所示流程中的步骤S102得到的驱动电极层状结构图；
图20为另一实施例的触摸屏的制造方法流程图；
图21为图20所示流程中的步骤S204的具体流程图。
【具体实施方式】
为了便于理解本发明，下面将参照相关附图对本发明进行更全面的描述。附图中给出了本发明的首选实施例。但是，本发明可以以许多不同的形式来实现，并不限于本文所描述的实施例。相反地，提供这些实施例的目的是使对本发明的公开内容更加透彻全面。
除非另有定义，本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施例的目的，不是旨在于限制本发明。本文所使用的术语“及／或”包括一个或多个相关的所列项目的任意的和所有的组合。
在本发明中所描述的透明绝缘衬底中的“透明”可理解为“透明”和 “基本透明”；透明绝缘衬底中的“绝缘”在本发明中可理解为“绝缘”和“介电质（dielectric）”。因此本发明中所描述的“透明绝缘衬底”应当解释包括但不限于透明绝缘衬底、基本透明绝缘衬底、透明介电质衬底和基本透明介电质衬底。
请参阅图1，为应用本发明触摸屏的电子设备其中之一的实施方式，其中所述电子设备10为智能手机或平板计算机。在上述电子设备10中，所述的触摸屏100贴合于LCD显示屏的上表面，用于电子设备人机交互的其中之一的I/O设备。可以理解，本发明的所述触摸屏100还可应用于行动电话、移动通信电话、电视、平板电脑、笔记本电脑、包含触摸显示屏的工业机床、航空触摸显示电子装置、GPS电子装置、一体化计算机及超级本等计算机设备。
如图2所示，为本发明触摸屏的第一类实施例的横截面示意图。该触摸屏100包括第一透明绝缘衬底110、感应电极层120、粘合层130、驱动电极层140以及第二透明绝缘衬底150。所述感应电极层120设置于所述第一透明绝缘衬底110和第二透明绝缘衬底150之间。其中第二透明绝缘衬底150包括面向所述第一透明绝缘衬底的第一表面152和与所述第一表面相对的第二表面154。所述驱动电极层150形成于所述第一表面152。在其他实施方式中，所述驱动电极层150还可设置于第二表面154。
所述粘合层130用于将第一透明绝缘衬底110和第二透明绝缘衬底150粘合成一体。当所述驱动电极层150设置在第一表面152时，所述粘合层130还用于将感应电极层120与驱动电极层140之间进行绝缘设置。粘合层130可以选用光学透明的OCA（Optical Clear Adhesive）胶或LOCA胶。
请参考图3，是本发明的第一类触摸屏一具体实施方式横截面示意图。图4是感应电极层的平面图。所述感应电极层120包括若干独立设置的感应电极120a，所述每一感应电极120a包括网格导电电路120b。请一并参考图7，所述驱动电极层140包括若干独立设置的驱动电极140a。在本发明中所描述的“独立设置”可以理解为包括但不限于“独立设置”、“隔离设置”或“绝缘设置”等几种解释。
在电容式触摸屏中，感应电极和驱动电极是触控感应组件的必不可少的两个部分。感应电极一般靠近触摸屏的触摸面，驱动电极则相对远离触摸面。驱动电极连接扫描信号发生装置，由扫描信号发生装置提供扫描信号，感应电极则在被带电导体触碰时产生电参数变化，以感应触摸区域或触控位置。
其中，所述感应层120包含的各个感应电极与所述触摸屏外设的传感侦测处理模块电连接，所述驱动层140的各个驱动电极与所述触摸屏外设的激励信号模块电连接，所述感应电极和所述驱动电极之间形成互电容。当所述触摸屏表面发生触摸动作时，触碰中心区域的互电容值会发生变化，所述触碰动作转换为电信号，经过对电容值变换区域数据的处理就可以获得触碰动作中心位置的坐标数据，可处理相关数据的电子装置就可以依据触碰动作中心位置的坐标数据判断出触碰动作对应在触摸屏贴合于显示屏上的准确位置，从而完成相应的功能或输入操作。
在本发明中，所述感应电极层120与驱动电极层140采用不同方式、不同的材料及不同工艺制成。
具体地说，请一并参考图5和图6，分别是图4沿aa’剖面线和bb’ 剖面线的截面示意图。所述感应电极层120包括若干相互独立网格导电电路120b。所述网格导电电路120b嵌入或埋入在透明绝缘层160中，所述透明绝缘层160通过增粘层21黏附于第一透明绝缘衬底110的表面。所述网格导电电路120b的材料选自金、银、铜、铝、锌、镀金的银或至少二者的合金。上述材料容易得到，且成本较低，特别是银浆制得上述网格导电电路120b，导电性能好，成本低。
可以容易地理解，网格导电电路120b嵌入或埋入在透明绝缘层160中方式居多，其中一种优选方式是在所述透明绝缘层160形成若干交错的网格凹槽，所述网格导电电路120b设置于所述凹槽，从而使得网格导电电路120b以嵌入或埋入形式形成于透明绝缘层160表面。这样依附有所述感应电极120a的第一透明绝缘衬底110在移动或者搬运过程中，感应电极120a由于牢固依附于第一透明绝缘衬底110，不容易被损坏或者脱落。容易得知，网格导电电路120b也可直接嵌入或埋入第一透明绝缘衬底110的表面。
更具体地说，所述网格导电电路120b的网格间距为d1 、且100µm≤ d1＜600µm；网格导电电路120b的方块电阻为R 、且 0.1Ω/sq ≤ R＜200Ω /sq。
所述网格导电电路120b的方块电阻 R 影响着电流信号传递速度，从而影响着触摸屏反应灵敏度。所以所述网格导电电路120b方块电阻R优选为1Ω /sq ≤R≤60Ω /sq 。在这一范围内的方块电阻R ，能显著提高导电膜的导电性，显著提高电信号的传输速度，且对精度的要求较0.1Ω /sq ≤ R＜200Ω /sq 低，即在保证导电性的前提下降低了工艺要求，降低了成本。当然在制造过程中，网格导电电路 120b 的方块电阻为 R 与网格间距、材料、线径（线宽）等多个因素共同决定。
所述网格导电电路 120b 的网格线宽为d2 、且1µm ≤d2≤ 10µm 。网格的线宽影响导电膜的透光性，网格线宽越小，透光性越好。在导电网格的网格线间距d1为 100µm ≤ d1＜600µm，网格导电电路120b的方块电阻 R 为0.1Ω /sq ≤ R＜200 Ω /sq 时，网格线宽d2 为 1µm ≤ d2 ≤ 10µm 可满足要求，且同时能提高整个触摸屏的透光性。特别是网格导电电路120b的网格线宽d2为2µm ≤ d2＜ 5µm 时，触摸屏透光面积越大，透光性越好，且精度要求相对较低。
在优选的实施方式中，网格导电电路120b选用 银材料，且采用规则图形，网格线间距200µm ~500µm ；网格导电电路120b表面电阻为4Ω/sq ≤ R＜50Ω/sq ，银的涂布量为0.7g/m2~1.1g/m2 。
在实施例一中，取d1=200µm、R=4~5 Ω /sq，含银量取1.1g/m2，网格线宽d2取500nm~5μm 。当然，方块电阻 R 的取值、含银量的多少均会受到网格线宽d2和填充的凹槽深度的影响，网格线宽d2越大、填充的凹槽深度越大，方块电阻会随之有所增大、含银量也随之增加。
在实施例二中，取d1=300µm、R= 10 Ω /sq ，含银量取0.9~1.0g/m2，网格线宽d2取500nm~5μm 。当然，方块电阻R的取值、含银量的多少均会受到网格线宽d2和填充的凹槽深度的影响，网格线宽d2越大、填充的凹槽深度越大，方块电阻会随之有所增大、含银量也随之增加。
在实施例三中，取d1=500µm、R= 30~40Ω/sq，含银量取0.7g/m2，网格线宽d2取500nm~5μm。当然，方块电阻R的取值、含银量的多少均会受到网格线宽d2和填充的凹槽深度的影响，网格线宽d2越大、填充的凹槽深度越大，方块电阻会随之有所增大、含银量也随之增加。
当然，除了选用金属导电材料制得上述网格导电电路120b之外，还可以选用透明导电高分子材料、石墨烯或者碳纳米管中的一种制得。
请一并参考图7、图8及图9，所述驱动电极层140的驱动电极采用氧化铟锡(Indium Tin Oxide，ITO)、氧化锡锑 (Antimony Doped Tin Oxide，ATO)、氧化铟锌(Indium Zinc Oxide，IZO)、氧化锌铝(Aluminum Zinc Oxide，AZO)、聚乙撑二氧噻吩(PEDOT) 、透明导电高分子材料、石墨烯或者碳纳米管中的任意一种材料制成。通过工程上的蚀刻、印刷、涂布、光刻、或黄光制程等工艺加工形成图案化的感应电极。
在本类实施方式中，所述感应电极层120直接形成于第一透明绝缘衬底110的表面，而所述第一透明绝缘衬底110为刚性衬底。更具体地说，所述刚性衬底采用经过强化处理过的玻璃或透明塑胶板，简称强化玻璃或强化塑胶板。其中所述强化玻璃包括具有防眩、硬化、增透或雾化功能的功能层。其中，具有防眩或雾化功能的功能层，由具有防眩或雾化功能的涂料涂敷形成，涂料包括金属氧化物颗粒；具有硬化功能的功能层由具有硬化功能的高分子涂料涂敷形成或直接通过化学或物理方法硬化；具有增透功能的功能层为二氧化钛镀层、氟化镁镀层或氟化钙镀层。可以理解，采用透光率良好的塑胶板也可如上述强化玻璃方式进行处理制成本发明所述的刚性透明绝缘衬底。
请进一步参考图3，所述第一透明绝缘衬底110为柔性材料制成，如选用柔性聚对苯二甲酸乙二酯(PET)、聚碳酸脂 (PC)、聚乙烯 (PE)、聚氯乙烯(PVC)、聚丙烯(PP)、聚苯乙烯(PS)或聚甲基丙烯酸甲酯(PMMA)中的任意一种。另外，为了增加第一透明绝缘衬底110粘性，在第一透明绝缘衬底110的一表面增设一增粘层141，以便上透明绝缘层牢固黏贴于第一透明绝缘衬底110。有必要说明的是，由于所述第一透明绝缘衬底110为柔性材料制成，因此在移动或者搬运过程中，柔性材料不可避免发生形变或弯曲，因此采用嵌入或埋入的驱动电极更加可靠。
在本发明触摸屏的第一类实施方式中某一具体的实施例，第一透明绝缘衬底110采用聚对苯二甲酸类塑料（PET）制成的衬底；第二透明绝缘衬底150采用强化玻璃制成的衬底，在本强化玻璃形成透明的ITO材料驱动电极层，同时在聚对苯二甲酸类塑料（PET）制成的衬底一表面形成包含网格导电电路的感应电极层，然后将聚对苯二甲酸类塑料（PET）制成的柔性衬底贴合于强化玻璃制成的第二透明绝缘衬底150上，上述实施方式将柔性衬底的较方便地贴合于强化玻璃上，而制成本发明包含的触摸屏。上述制造工艺简单，同时减少触摸屏的厚度。
请一并参阅图10及图11，为本发明第二类触摸屏的横截面示意图及一具体实施方式的横截面示意图。本类实施方式于第一类实施方式的不同点在于：所述驱动电极层240设置于第二透明绝缘衬底250的第二表面。或者换一种表述，相对第一类触摸屏而言，所述设置有驱动电极层240的第二透明绝缘衬底250背面与第一透明绝缘衬底210贴合于一体。而所述感应电极层220与驱动电极层240形成方式与第一类实施方式相同。
请一并参阅图12及图13，为本发明第三类触摸屏的横截面示意图及一具体实施方式的横截面示意图。相对于第一类实施方式，所述感应电极层320形成于第二透明绝缘衬底350的第一表面，所述驱动电极层340形成于第二透明绝缘衬底350的第二表面，即DITO结构。然后通过粘合层330将所述DITO结构贴合第一透明绝缘衬底310上。在本类实施方式中，所述第一透明绝缘衬底310可选用强化玻璃、柔性聚对苯二甲酸乙二酯(PET)、聚碳酸脂 (PC)、聚乙烯 (PE)、聚氯乙烯(PVC)、聚丙烯(PP)、聚苯乙烯(PS)或聚甲基丙烯酸甲酯(PMMA)中的任意一种。
请参阅图14，为本发明第四类触摸屏的横截面示意图。该触控面板包括依次层叠的第二透明绝缘衬底450、驱动电极层440、粘合层430、感应电极层420、第一透明绝缘衬底410、粘合层430以及第三透明绝缘衬底470。感应电极层420可以通过增粘层21与第一透明绝缘衬底410粘合；驱动电极层440可以通过增粘层21与第二透明绝缘衬底450粘合。感应电极层420包括网格导电电路420b。相对于上述三类实施方式，本类实施方式还包括第三透明绝缘衬底470，所述第三透明绝缘衬底470可选用强化玻璃和可挠性透明面板。其中可挠性透明面板可选用柔性聚对苯二甲酸乙二酯(PET)、聚碳酸脂 (PC)、聚乙烯 (PE)、聚氯乙烯(PVC)、聚丙烯(PP)、聚苯乙烯(PS)或聚甲基丙烯酸甲酯(PMMA)中的任意一种制成。
本类实施方式与上述三类的实施方式还有如下区别：第一透明绝缘衬底410和第二透明绝缘衬底450均可采用选用强化玻璃、柔性聚对苯二甲酸乙二酯(PET)、聚碳酸脂 (PC)、聚乙烯 (PE)、聚氯乙烯(PVC)、聚丙烯(PP)、聚苯乙烯(PS)或聚甲基丙烯酸甲酯(PMMA)中的任意一种制成。其中较佳优先方式是，第一透明绝缘衬底410和第二透明绝缘衬底450均采用柔性衬底，如柔性聚对苯二甲酸乙二酯(PET)。
请参阅图15a和图15b，为本发明包含几类实施方式的感应电极和驱动电极排列及形状平面示意图。所述相互独立设置的感应电极在第一轴向（X轴）平行且等间距的设置；所述相互独立设置的驱动电极在第二轴向（Y轴）平行且等间距的设置。其中图15a感应电极和驱动电极均为方块状结构（bar）且相互垂直交错排布；图15b感应电极和驱动电极为菱形状结构且相互垂直交错排布。
图16a、16b、16c及16d分别为一实施例中分别对应于图15a中的A部分或图15b中的B部分的局部放大图。
图16a和16b所示网格导电电路采用非规则网格，这种非规则网格导电电路的制造难度较低，节省相关工序等。
16c和16d所示网格导电电路，所述网格导电电路120b为均匀布置的规则图形。导电网格布置均匀规则，网格线间距d 均相等，一方面可使触摸屏透光均匀；另一方面，网格导电电路的方块电阻（简称方阻）分布均匀，电阻偏差小，无需用于补正电阻偏差的设定，使成像均匀。可以是近似正交形态的直线格子图案、弯曲的波浪线格子图案等。网格导电电路的单元网格可以为规则图形，例如三角形、菱形或正多边形等，也可以为不规则几何图形。
如图17所示，为一实施例的触摸屏的制造方法流程。请一并参考图3，该方法包括如下步骤。
S101：提供第一透明绝缘衬底。所述第一透明绝缘衬底110采用刚性透明绝缘衬底或柔性的透明绝缘衬底，其中刚性透明绝缘衬底可采用强化玻璃和可挠性透明面板。其中可挠性透明面板可选用柔性聚对苯二甲酸乙二酯(PET)、聚碳酸脂 (PC)、聚乙烯 (PE)、聚氯乙烯(PVC)、聚丙烯(PP)、聚苯乙烯(PS)或聚甲基丙烯酸甲酯(PMMA)中的任意一种制成。
S102：在所述第一透明绝缘衬底的一表面形成感应电极层。
S103：提供第二透明绝缘衬底。第二透明绝缘衬底150为柔性透明绝缘基板，可选用柔性聚对苯二甲酸乙二酯(PET)、聚碳酸脂 (PC)、聚乙烯 (PE)、聚氯乙烯(PVC)、聚丙烯(PP)、聚苯乙烯(PS)或聚甲基丙烯酸甲酯(PMMA)中的任意一种制成。第二透明绝缘衬底150为可挠性薄膜，可以方便地贴附于刚性的第一透明绝缘衬底110上。
S104：在所述第二透明绝缘衬底的一表面形成驱动电极层。
上述步骤S101~S102和步骤S103~S104并无先后顺序。既可以先完成在第一透明绝缘衬底110上形成感应电极层120，也可以先完成在第二透明绝缘衬底150上形成驱动电极层140，或者二者同时进行。
S105：将所述第二透明绝缘衬底贴附在所述第一透明绝缘衬底上。
贴附的方式既可以如图3所示，是将第二透明绝缘衬底150设有驱动电极层140的一面与第一透明绝缘衬底110设有感应电极层120的一面贴合。也可以是如图11所示，将第二透明绝缘衬底柔性绝缘基板250未设驱动电极层240 的一面与第一透明绝缘衬底210设有感应电极层220的一面贴合。
参考图18~19上述步骤S102具体包括：
S121：在所述第一透明绝缘衬底上涂布透明绝缘层。透明绝缘层160示例为UV胶。为增加UV胶与第一透明绝缘衬底的附着力，可在第一透明绝缘衬底110和透明绝缘层160之间添加增粘层141。
S122：所述透明绝缘层压印形成网格凹槽。参考图19，透明绝缘层160上经过模具压过之后，形成多个与驱动电极形状相同的网格凹槽170，感应电极层120形成于该网格凹槽170中。
S123：在所述网格凹槽中添加金属浆料、并进行刮涂和烧结固化以形成导电网格。把金属浆料添加到网格凹槽170中，并经过刮涂，使网格凹槽中填充金属浆料，然后进行烧结固化即可得到导电网格。该金属浆料优选为纳米银浆。其他实施例中，形成网格导电电路的金属还可以采用金、银、铜、铝、锌、镀金的银或以上金属的至少二者的合金。
在其他的实施例中，网格导电电路还可以采用其他工艺实现，例如光刻工艺。
进一步地，参考图14，还可以在第一透明绝缘衬底410上形成透明面板470。该透明面板470选用强化玻璃或可挠性透明面板。
如图20所示，为另一实施例的触摸屏的制造方法流程。请一并参考图13，该方法包括如下步骤。
S201：提供第一透明绝缘衬底。所述第一透明绝缘衬底310采用刚性透明绝缘衬底或柔性的透明绝缘衬底，其中刚性透明绝缘衬底可采用强化玻璃和可挠性透明面板。其中可挠性透明面板可选用柔性聚对苯二甲酸乙二酯(PET)、聚碳酸脂 (PC)、聚乙烯 (PE)、聚氯乙烯(PVC)、聚丙烯(PP)、聚苯乙烯(PS)或聚甲基丙烯酸甲酯(PMMA)中的任意一种制成。
S202：提供第二透明绝缘衬底。第二透明绝缘衬底350为柔性透明绝缘基板，可以采用可选用柔性聚对苯二甲酸乙二酯(PET)、聚碳酸脂 (PC)、聚乙烯 (PE)、聚氯乙烯(PVC)、聚丙烯(PP)、聚苯乙烯(PS)或聚甲基丙烯酸甲酯(PMMA)中的任意一种制成。第二透明绝缘衬底350为可挠性薄膜，可以方便地贴附于第一透明绝缘衬底310上。
S203：在所述第二透明绝缘衬底的一表面形成驱动电极层。
S204：在所述第二透明绝缘衬底的另一表面形成感应电极层。
上述步骤S203和S204并无先后顺序。既可以先完成在第二透明绝缘衬底350上形成感应电极层320，也可以先完成在第二透明绝缘衬底350上形成驱动电极层340。
S205：将所述第一透明绝缘衬底贴附在所述第二透明绝缘衬底上。
贴附的方式具体是将第一透明绝缘衬底310与第二透明绝缘衬底350设有感应电极层320的一面贴合。
参考图19~21，上述步骤S204具体包括：
S241：在所述第二透明绝缘衬底上涂布透明绝缘层。透明绝缘层160示例为UV胶。为增加UV胶与柔性绝缘基板的附着力，可在第二透明绝缘衬底150和透明绝缘层160之间添加增粘层。
S242：所述透明绝缘层压印形成网格凹槽。参考图19，透明绝缘层160上经过模具压过之后，形成多个与感应电极形状相同的网格凹槽170，感应电极层120形成于该网格凹槽170中。
S243：在所述网格凹槽中添加金属浆料、并进行刮涂和烧结固化以形成导电网格。把金属浆料添加到网格凹槽170中，并经过刮涂，使网格凹槽中填充金属浆料，然后进行烧结固化即可得到导电网格。该金属浆料优选为纳米银浆。其他实施例中，形成网格导电电路的金属还可以采用金、银、铜、铝、锌、镀金的银或以上金属的至少二者的合金。
在其他的实施例中，网格导电电路还可以采用其他工艺实现，例如光刻工艺。
进一步地，还可以在第一透明绝缘衬底上形成透明面板。该透明面板选用强化玻璃或可挠性透明面板。
上述方法将触摸屏的驱动电极制作为网格导电电路形成的导电网格，因此触摸屏不存在采用薄膜ITO时存在的诸如表面容易划伤或掉落、成本较高、大尺寸时方阻较大等问题，故触摸屏的成本较低、灵敏度更高。
以上所述实施例仅表达了本发明的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对本发明专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本发明构思的前提下，还可以做出若干变形和改进，这些都属于本发明的保护范围。因此，本发明专利的保护范围应以所附权利要求为准。

Claims (38)

  1. 一种触摸屏，其特征在于，包括：
    第一透明绝缘衬底；
    第二透明绝缘衬底，包括面向所述第一透明绝缘衬底的第一表面和与所述第一表面相对的第二表面；
    感应电极层，设置于所述第一透明绝缘衬底和第二透明绝缘衬底之间，感应电极层包括若干独立设置的感应电极，所述每一感应电极包括网格导电电路；及
    驱动电极层，设置在所述第二透明绝缘衬底的第一表面或第二表面，驱动电极层包括若干独立设置的驱动电极。
  2. 根据权利要求1所述的触摸屏，其特征在于，所述网格导电电路的网格间距为d1、且100µm≤d1＜600µm；网格导电电路的方块电阻为R、且0.1Ω/sq≤R＜200Ω/sq。
  3. 根据权利要求1所述的触摸屏，其特征在于，还包括形成于所述第一透明绝缘衬底一表面的透明绝缘层，所述网格导电电路嵌入或埋入设置于透明绝缘层中。
  4. 根据权利要求3所述的触摸屏，其特征在于，所述透明绝缘层形成若干交错的网格凹槽，所述网格导电电路设置于所述网格凹槽。
  5. 根据权利要求1所述的触摸屏，其特征在于，所述第一透明绝缘衬底为刚性衬底，所述第二透明绝缘衬底为柔性衬底。
  6. 根据权利要求5所述的触摸屏，其特征在于，所述刚性的第一透明绝缘衬底为强化玻璃，所述柔性的第二透明绝缘衬底为柔性聚对苯二甲酸乙二酯、聚碳酸脂、聚乙烯、聚氯乙烯、聚丙烯、聚苯乙烯或聚甲基丙烯酸甲酯中的任意一种。
  7. 根据权利要求1所述的触摸屏，其特征在于，所述第一透明绝缘衬底为柔性衬底，第二透明绝缘衬底选用刚性衬底或柔性衬底。
  8. 根据权利要求7所述的触摸屏，其特征在于，还包括贴合于所述第一透明绝缘衬底一表面的透明面板。
  9. 根据权利要求8所述的触摸屏，其特征在于，所述透明面板选用强化玻璃或可挠性透明面板。
  10. 根据权利要求1所述的触摸屏，其特征在于，还包括粘合层，所述粘合层形成于所述第一透明绝缘衬底和第二透明绝缘衬底之间。
  11. 根据权利要求10所述的触摸屏，其特征在于，所述粘合层为光学透明的OCA胶或LOCA胶。
  12. 根据权利要求1所述的触摸屏，其特征在于，所述驱动电极采用氧化铟锡、氧化锡锑、氧化铟锌、氧化锌铝或聚乙撑二氧噻吩中的一种制成。
  13. 根据权利要求1所述的触摸屏，其特征在于，所述网格导电电路的网格采用规则几何图形网格。
  14. 根据权利要求1所述的触摸屏，其特征在于，所述网格导电电路的网格采用不规则几何图形网格。
  15. 根据权利要求1所述的触摸屏，其特征在于，所述网格导电电路选用银材料，网格导电电路的网格线间距200µm ~500µm；网格导电电路的方阻为4Ω/sq≤R＜50Ω/sq，银的涂布量为0.7 g/m2~1.1 g/m2。
  16. 根据权利要求1所述的触摸屏，其特征在于，所述网格导电电路选用金、银、铜、铝、锌、镀金的银或以上金属的至少二者的合金材料中的任意一种制成。
  17. 根据权利要求3所述的触摸屏，所述透明绝缘层可以是光固胶、热固胶或自干胶固化形成。
  18. 一种触摸屏，包括：
    刚性透明绝缘衬底；
    感应电极层，形成于所述刚性透明绝缘衬底的一表面，包括若干独立设置的感应电极；所述感应电极层的每个感应电极包括网格导电电路；
    柔性透明绝缘衬底，包括第一表面和与所述第一表面相对的第二表面；
    驱动电极层，形成于所述柔性透明绝缘衬底的第一表面或第二表面，包括若干独立设置的驱动电极；
    所述柔性透明绝缘衬底的第一表面或第二表面贴合于所述刚性透明绝缘衬底上。
  19. 根据权利要求18所述的触摸屏，其特征在于，所述网格导电电路的网格间距为d1、且100µm≤d1＜600µm；网格导电电路的方块电阻为R、且0.1Ω/sq≤R＜200Ω/sq。
  20. 根据权利要求18所述的触摸屏，其特征在于，还包括形成于所述刚性透明绝缘衬底一表面的透明绝缘层，所述网格导电电路嵌入或埋入设置于透明绝缘层中。
  21. 根据权利要求20所述的触摸屏，其特征在于，所述透明绝缘层形成若干交错的网格凹槽，所述网格导电电路设置于所述网格凹槽。
  22. 根据权利要求18所述的触摸屏，其特征在于，所述刚性透明绝缘衬底为强化玻璃，所述柔性透明绝缘衬底选用柔性聚对苯二甲酸乙二酯、聚碳酸脂、聚乙烯、聚氯乙烯、聚丙烯、聚苯乙烯或聚甲基丙烯酸甲酯中的任意一种。
  23. 根据权利要求18所述的触摸屏，其特征在于，所述驱动电极采用透明的氧化铟锡材料制成。
  24. 根据权利要求18所述的触摸屏，其特征在于，所述网格导电电路的网格采用规则几何图形网格。
  25. 根据权利要求18所述的触摸屏，其特征在于，所述网格导电电路的网格采用不规则几何图形网格。
  26. 根据权利要求24所述的触摸屏，其特征在于，所述网格的单元网格形状为单一的三角形、菱形或正多边形。
  27. 一种触摸屏的制造方法，包括如下步骤：
    提供第一透明绝缘衬底；
    在所述第一透明绝缘衬底的一面形成感应电极层；所述感应电极层的感应电极是包括大量单元网格的网格导电电路；
    提供第二透明绝缘衬底；
    在所述第二透明绝缘衬底的一面形成驱动电极层；及
    将所述第二透明绝缘衬底贴附在所述第一透明绝缘衬底上。
  28. 根据权利要求27所述的触摸屏的制造方法，其特征在于，所述在第一透明绝缘衬底的一面形成感应电极层的步骤具体包括：
    在所述第一透明绝缘衬底上涂布透明绝缘层；
    在所述透明绝缘层压印形成网格凹槽；及
    在所述网格凹槽中形成所述网格导电电路。
  29. 根据权利要求28所述的触摸屏的制造方法，其特征在于，所述在网格凹槽中形成网格导电电路的步骤具体包括：在所述网格凹槽中添加金属浆料、并进行刮涂和烧结固化。
  30. 根据权利要求27所述的触摸屏的制造方法，其特征在于，所述将第二透明绝缘衬底贴附在第一透明绝缘衬底上具体是：将第二透明绝缘衬底形成有驱动电极层的一面与第一透明绝缘衬底形成有感应电极层的一面贴合；或者，将第二透明绝缘衬底未形成有驱动电极层的一面与第一透明绝缘衬底形成有感应电极层的一面贴合。
  31. 根据权利要求27所述的触摸屏的制造方法，其特征在于，还包括在所述第一透明绝缘衬底的一表面形成透明面板。
  32. 根据权利要求31所述的触摸屏的制造方法，其特征在于，所述透明面板选用强化玻璃或可挠性透明面板。
  33. 一种触摸屏的制造方法，包括如下步骤：
    提供第一透明绝缘衬底；
    提供第二透明绝缘衬底；
    在所述第二透明绝缘衬底的一面形成驱动电极层；在所述第二透明绝缘衬底的另一面形成感应电极层；所述感应电极层的感应电极是包括大量单元网格的网格导电电路；及
    将所述第一透明绝缘衬底贴附在所述第二透明绝缘衬底上。
  34. 根据权利要求33所述的触摸屏的制造方法，其特征在于，所述在第一透明绝缘衬底的另一面形成感应电极层的步骤具体包括：
    在所述第二透明绝缘衬底上涂布透明绝缘层；
    在所述透明绝缘层压印形成网格凹槽；及
    在所述网格凹槽中形成所述网格导电电路。
  35. 根据权利要求34所述的触摸屏的制造方法，其特征在于，所述在网格凹槽中形成网格导电电路的步骤具体包括：在所述网格凹槽中添加金属浆料、并进行刮涂和烧结固化。
  36. 根据权利要求33所述的触摸屏的制造方法，其特征在于，所述将第一透明绝缘衬底贴附在第二透明绝缘衬底上具体是：将第一透明绝缘衬底与第一透明绝缘衬底形成有感应电极层的一面贴合。
  37. 根据权利要求33所述的触摸屏的制造方法，其特征在于，还包括在所述第一透明绝缘衬底的一表面形成透明面板。
  38. 根据权利要求37所述的触摸屏的制造方法，其特征在于，所述透明面板选用强化玻璃或可挠性透明面板。
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