Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
  • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
  • H01S3/08—Construction or shape of optical resonators or components thereof
  • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
  • H01S3/0813—Configuration of resonator
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
  • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
  • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
  • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
  • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
  • B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
  • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
  • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
  • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
  • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
  • B23K26/0613—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
  • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
  • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
  • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
  • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
  • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
  • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
  • H01S3/08—Construction or shape of optical resonators or components thereof
  • H01S3/08086—Multiple-wavelength emission
  • H01S3/0809—Two-wavelenghth emission
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
  • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
  • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
  • H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
  • H01S3/109—Frequency multiplication, e.g. harmonic generation
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
  • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
  • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
  • H01S3/08—Construction or shape of optical resonators or components thereof
  • H01S3/08054—Passive cavity elements acting on the polarization, e.g. a polarizer for branching or walk-off compensation
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
  • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
  • H01S3/10038—Amplitude control
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
  • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
  • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
  • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
  • H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect

Definitions

• the present invention relates to a laser oscillator for generating two laser beams of different wavelengths with a laser resonator comprising a laser-active solid for generating a fundamental laser radiation, a non-linear solid for generating a frequency-converted laser radiation from the fundamental laser radiation and at least one output mirror for decoupling the fundamental and the frequency-converted laser Having radiation from the laser resonator, as well as a method for generating two laser beams of different wavelengths.
• the resonator For material processing intensive laser radiation with stable parameters, such as. Laser energy, laser power and beam quality needed. Theoretically, many laser modes fall within the gain bandwidth of an active solid-state medium within a laser cavity. However, the resonator preferably lasers on the laser mode within the gain bandwidth that experiences the highest gain. If the resonator works exactly on this laser mode, it is in a stable state. For internal frequency conversion, the conversion efficiency depends on crystal properties, temperature, phase, angle of incidence and laser mode of the radiation to be converted. For the laser resonator, the frequency conversion is considered to be loss of laser radiation and it will try to work on another laser mode within the gain bandwidth which has a more favorable gain / loss ratio.
• resonator-internal frequency conversion thus occur in the generation of frequency-converted laser light, the problems of dynamic instability by mode jumps, this problem is particularly noticeable in high-power lasers.
• the fiber coupling of pure infrared resonators sometimes leads to strong unwanted relaxation oscillations when reflected back into the resonator.
• resonator-internal frequency conversion requires complicated frequency-selective elements to fix the wavelength (i.e., to produce losses for wavelengths that are not converted).
• the fundamental and the frequency-converted laser beam are decoupled via the same output mirror in a predefined power ratio.
• the desired power ratio of the two laser beams is adjusted externally on the resonator via the selected reflection coating of the beam splitter as desired, but then fixed.
• GB 2 175 737 A it is known from GB 2 175 737 A that the coupling of a high-energy laser beam into a workpiece is improved by using a second laser beam of shorter wavelength, which impinges on the workpiece simultaneously and in the same processing point as the first laser beam.
• the longer wavelength laser beam is generated with a C0 2 laser and the shorter wavelength laser beam with a YAG laser.
• US 2008/0296272 A1 discloses a laser oscillator in which two laser beams of different wavelengths having an adjustable modulation frequency are coupled out of the laser resonator alternately and are each directed to the same processing point.
• the laser resonator comprises a first optical resonator path for generating the first laser beam and a first output mirror for decoupling only the first laser beam, a second optical resonator path for generating the second laser beam and a second output mirror for decoupling only the second laser beam, and an electro-optical modulator, which either switches one or the other optical resonator path.
• the modulation frequency of the two laser beams is determined by the voltage pulse sequence applied to the electro-optical modulator.
• the fundamental laser radiation of the laser-active solid and the second harmonic laser radiation are alternately generated at the modulation frequency in the two optical resonator paths and coupled out of the laser resonator via the respective outcoupling mirrors, whereby the frequency conversion of the coupled-out laser beams to the third resonator is external and fourth harmonic takes place.
• the power ratio of the two decoupled laser beams easily and long !! to be able to change.
• This object is achieved in the case of the laser oscillator mentioned above in that the laser resonator has a modulation device for modulation of the decoupling ratio of fundamental and frequency-converted laser radiation.
• the fundamental and frequency-converted laser radiation can be decoupled simultaneously in almost any adjustable power ratio with high overall efficiency and high power (> 100 watts cw) and are available for the machining process.
• the variable coupling-out ratio enables optimum machining of the workpiece by means of the two laser beams.
• the Auskoppelconce modulation means by a polarization-dependent Auskoppelspiegel for polarization-dependent coupling out of the fundamental laser radiation and a NEN polarization modulator for adjusting the polarization direction of the
• This polarization modulation can be done mechanically in the ms range, e.g. with a motor-rotatable retarder plate, or electro-optically (or else photoelastically or magneto-optically) in the ns to ps range with an electrically controllable polarization modulator (for example Pockels cell).
• an electrically controllable polarization modulator for example Pockels cell
• the decoupling ratio modulation device is formed by a heating and / or cooling device for regulating the temperature of the non-linear solid.
• the frequency conversion efficiency of the nonlinear solid is temperature-dependent and can therefore be adjusted selectively via the temperature of the non-linear solid.
• the decoupling ratio modulation device is formed by a device for rotating the non-linear solid body relative to the incident fundamental laser radiation.
• the frequency conversion efficiency of the non-linear solid depends on the angle of incidence of the fundamental laser radiation and can therefore be adjusted in a targeted manner via the angle of rotation of the non-linear solid.
• the laser-active medium may comprise, for example, a host crystal which is selected from the group comprising: YAG, YVO 4, YO 3, Sc 2 O 3, Lu 2 O 3, KGdWO 4, KYWO 4, YAP, YALO, GGG, GSGG, GSAG, LBS, GCOB, FAP, SFAP, YLF etc. These host crystals may each be doped with Yb3 + or Nd3 +, Ho, Tm3, etc. as the active material.
• the laser-active solid can, for example
• the invention also relates to a method for generating two laser beams of different wavelengths, in particular for laser machining of a workpiece by means of the two laser beams, wherein the two laser beams generated in a laser resonator as fundamental laser radiation and frequency-converted laser radiation of a laser-active solid and at least one Auskoppel- mirror from the Laser resonator are coupled out simultaneously and according to the invention, the power ratio of the two decoupled laser beams within the resonator is adjusted by modulating the decoupling ratio of fundamental and frequency-converted laser radiation.
• the Auskoppelconce of fundamental and frequency-converted laser radiation is changed during a machining process.
• the power fraction of decoupled frequency-converted laser radiation is at least 25%, preferably at least 50%, particularly preferably at least 90%, and then in the further processing process to less than 50%, preferably between 0.1% and 20%, be reduced.
• This variable coupling-out ratio enables optimum machining of the workpiece by means of the two laser beams.
• the workpiece material is still cold and still has a lower absorption for infrared radiation, so that a higher proportion of frequency-converted laser radiation is needed. This effect is particularly pronounced with Cu materials.
• FIG. 1 Show: Fign. 1-4 different embodiments of the laser oscillator according to the invention, each having a modulation device for modulating the decoupling ratio of fundamental and frequency-converted laser radiation, namely with a rotatable wave plate (FIG. 1), with an electro-optical polarization modulator (FIG. 2), with a temperature control (FIG ) and with a rotary drive (Figure 4);
• a modulation device for modulating the decoupling ratio of fundamental and frequency-converted laser radiation namely with a rotatable wave plate (FIG. 1), with an electro-optical polarization modulator (FIG. 2), with a temperature control (FIG ) and with a rotary drive (Figure 4);
• FIGS. 5a-5c different variants of a free beam of the decoupled
• FIGS. 6a, 6b different variant of a fiber guide of the coupled-out laser beams of the laser oscillator according to the invention.
• FIGS. 7a, 7b different variants of focusing the decoupled laser beams of the laser oscillator according to the invention.
• the laser oscillator 1 is used to generate two laser beams A, B of different wavelengths ⁇ ⁇ , ⁇ 2 ⁇ and is described in the figures using the example of a disk laser.
• the pump source eg, laser diodes
• the pump source required for optically pumping the disk laser is omitted.
• Identical or functionally identical components are designated by the same reference numbers in the figures.
• the in Fign. 1 to 4 each comprise a laser resonator 2 with a laser-active solid in the form of a Yb: YAG disk laser crystal 3 for generating a fundamental laser radiation ⁇ ⁇ .
• the laser resonator 2 is highly reflective by two with respect to the fundamental laser radiation ⁇ ⁇ Defined ⁇ end mirror 4a, 4b, between which the fundamental laser radiation ⁇ ⁇ is reflected back and forth.
• the laser resonator 2 are further a Auskoppelapt 5 for coupling only the fundamental laser radiation ⁇ ⁇ , two (or more) with respect to the fundamental laser radiation ⁇ ⁇ highly reflective A w -Umlenkapt 6, 7 and a nonlinear solid (SHG crystal) 8 for generating a frequency doubled laser radiation ⁇ 2 W arranged from the fundamental laser radiation ⁇ ⁇ .
• the A w -EndLite 4a is also for the frequency-doubled laser radiation AE2 W highly reflective, and thus also represents a highly reflective A 2w -Endspiegel.
• the second A w deflection mirror 7 trans for the frequency-doubled laser radiation ⁇ 2 ⁇ missive and thus forms an output mirror for Decoupling only the frequency-doubled laser radiation ⁇ 2 ⁇ ⁇
• the fundamental laser radiation ⁇ ⁇ and the frequency-doubled laser radiation ⁇ 2 ⁇ are decoupled simultaneously from the laser resonator 2.
• the laser resonator 2 can, as shown in FIGS. 1 to 4, have a single resonator path for the fundamental laser radiation ⁇ ⁇ and the frequency-converted laser radiation ⁇ 2 ⁇ .
• wavelengths other than those at which the highest efficiency is obtained in the doubling process can be oscillated.
• frequency-selective elements such as wavelength filters, are incorporated.
• wavelength filters 9 are arranged, for example, between A w end mirror 4 b and disk laser crystal 3, but may also be located elsewhere in the laser resonator 2.
• the filtering can also be realized only with a filter.
• an intracavity radiation field with the fundamental Yb: YAG laser radiation ⁇ ⁇ of 1030 nm is generated.
• a part of this fundamental laser radiation ⁇ ⁇ is coupled out via the A w -Auskoppelspiegel 5 from the laser resonator 2 as a laser beam A.
• Another part of the fundamental laser radiation ⁇ ⁇ is frequency-doubled by means of the SHG crystal 8 to 515 nm and coupled out via the frequency-selective ⁇ 2 W -Auskoppelspiegel 7 from the laser resonator 2 as a laser beam B.
• the wavelength filter 9 is incorporated as a frequency-selective element in the beam path.
• Laser oscillator 1 shown 1 and 2 further comprises in the beam path of the fundamental laser radiation ⁇ ⁇ modulation means 10 for modulating the Auskoppelmiks of fundamental and frequency-converted laser radiation ⁇ ⁇ , ⁇ 2 ⁇ on.
• This modulation device 10 is formed by a polarization-dependent coupling-out mirror 5 for the polarization-dependent coupling out of the fundamental laser radiation ⁇ ⁇ and by a polarization modulator for adjusting the polarization direction of the fundamental laser radiation ⁇ ⁇ impinging on the coupling-out mirror 5.
• the polarization modulator is shown in FIG.
• a lambda retardation plate 11 that can be rotated in the double arrowed direction 12 about the optical axis for modulation into the ms range and in FIG. 2 by an electrooptical polarization modulator 21, such as a Pockels cell, or a photoelastic or magneto-optical modulator designed for a modulation to the ns to ps range.
• an electrooptical polarization modulator 21 such as a Pockels cell, or a photoelastic or magneto-optical modulator designed for a modulation to the ns to ps range.
• the polarization dependent coupling mirror 5 has for different polarization directions of the fundamental laser radiation ⁇ ⁇ different degrees of transmission. Depending on the polarization direction of the incident fundamental laser radiation ⁇ ⁇ , the coupling-out mirror 5 forms a partially reflective ⁇ ⁇ coupling-out mirror, at which a part of the fundamental laser radiation ⁇ ⁇ is coupled out of the laser resonator 2 as laser beam A, or a highly reflective ⁇ deflection mirror, on which no fundamental laser radiation ⁇ ⁇ is coupled out of the laser resonator 2.
• the partial reflectivity of the output mirror 5 can thus ⁇ of the fundamental wavelength ⁇ - and consequently also the out-coupled power of the fundamental laser radiation ⁇ ⁇ and the respectively associated frequency doubled laser radiation ⁇ 2 ⁇ - be varied.
• ⁇ the fundamental wavelength
• ⁇ the respectively associated frequency doubled laser radiation
• ⁇ 2 ⁇ - the respectively associated frequency doubled laser radiation
• the workpiece material is still cold and still has a lower absorption for infrared radiation, so that a higher proportion of frequency-converted laser radiation is needed.
• This effect is especially pronounced for Cu materials.
• the overall performance plays a role, so that the proportion of frequency-converted laser radiation can be reduced.
• the two laser beams A, B at the same time with different focal position or at different positions, such as the frequency-converted laser radiation in the flow of the fundamental laser radiation, impinge on the workpiece, so as the coupling of the fundamental laser radiation ⁇ ⁇ in the workpiece through Use of the frequency-doubled laser radiation ⁇ 2 ⁇ to improve.
• the laser oscillator oscillator 1 could, for example, be designed as follows: A Yb: YAG disk laser head forms a multimode CW laser. Typical resonator-internal circulating power is 10 kW. An overall output of fundamental and frequency-converted laser radiation of 10% is selected. For the total decoupling of 1 kW, a doubling efficiency of 1% is necessary to produce 00 W frequency-converted light. This is sufficient to be able to omit frequency-selective elements. Typical crystal lengths are between a few 100 ⁇ and a few mm. In particular, at high CW intensities, it might be useful to provide the frequency-converting crystal with a highly reflective HR coating and to arrange on a heat sink analogous to the disk laser crystal. Power scaling by using multiple laser heads is possible.
• the polarization modulator 21 can also be arranged between the outcoupling mirror 5 and the SHG crystal 8 in order to determine the polarization of the laser beam impinging on the SHG crystal 8 and thereby changing the conversion efficiency of the SHG crystal 8.
• the polarization modulator 21 can also be arranged between the outcoupling mirror 5 and the SHG crystal 8 in order to determine the polarization of the laser beam impinging on the SHG crystal 8 and thereby changing the conversion efficiency of the SHG crystal 8.
• the A w -Auskoppelapt 5 also forms the end mirror 4b and is not polarization dependent, that a further deflection mirror 16 is provided and that the modulation means 10 for modulation of the coupling-out ratio of fundamental and frequency-converted laser radiation ⁇ ⁇ , ⁇ 2 ⁇ is formed by a heating and / or cooling device 31 with associated temperature control, which is in thermal contact with the SHG crystal 8.
• the frequency conversion efficiency of the SHG crystal 8 is temperature-dependent and therefore can be adjusted selectively, albeit slowly, via the temperature of the SHG crystal 8. From Fig. 3, the laser oscillator 1 shown in Fig.
• the modulation device 10 for modulating the Auskoppelmiks of fundamental and frequency-converted laser radiation ⁇ ⁇ , ⁇ 2 ⁇ by a rotary drive 41 for tilting (double arrow 42) of the SHG crystal. 8 is formed opposite to the incident fundamental laser radiation ⁇ ⁇ .
• the frequency conversion efficiency of the nonlinear solid 8 is dependent on the angle of incidence of the fundamental laser radiation ⁇ ⁇ and can therefore be set selectively via the tilt angle of the SHG crystal 8.
• the rotation was chosen around an axis that is perpendicular to the beam axis; a rotation about the beam axis is also conceivable.
• the laser resonator of the laser oscillator according to the invention may also be a ring resonator in which the fundamental laser radiation ⁇ ⁇ rotates, so no end mirror but only deflecting mirrors are provided, and the fundamental and the frequency doubled laser radiation ⁇ ⁇ , ⁇ 2 ⁇ 1 or at two different outcoupling mirrors analogous to FIG. 2 are coupled out of the ring resonator at the same Auskoppelspiegel analogous to FIG.
• a single outcoupling beam with ⁇ ⁇ and ⁇ 2 ⁇ and in the second case a first outcoupling beam with ⁇ ⁇ and a second outcoupling beam with ⁇ 2 ⁇ is coupled out.
• the two laser beams A, B can be separated via free-jet propagation either separately (FIG. 5a) or spatially superimposed (FIGS. 5b, 5c) to the machining head (FIG. not shown) of a laser processing machine.
• the laser beam A is two of the fundamental wavelength ⁇ ⁇ highly reflective w A deflection mirror 51 collinear deflected to the laser beam B 52, wherein the second deflecting mirror 52 for the frequency-converted wavelength ⁇ 2 ⁇ is transmissive.
• the laser beam B is shown in Figure 5c. Two for the frequency-converted wavelength ⁇ 2 ⁇ highly reflective AE2 W deflection mirror 53, deflected 54 collinear with the laser beam A, said second deflecting mirror 54 for the fundamental wavelength is transmissive ⁇ ⁇ .
• the two laser beams A, B can either be coupled via a coupling lens 61, 62 into a transport fiber 63, 64 (FIG spatial collinear superimposition (analogous to FIGS. 5b, 5b) via a common coupling-in lens 65 into a common transport fiber 66 (FIG. 6b).
• the laser beams A, B guided separately or together in the free-jet or fiber guide can finally be focused together onto the workpiece.
• separately guided laser beams A, B (FIG.
• the laser beams A, B are focused on the workpiece surface by means of a spatial collinear superposition (analogous to FIGS. 5 b, 5 c) via focusing optics 71.
• the laser beams A, B are focused on the workpiece surface via a collimating lens 72 and a focusing lens 73, wherein all the optical components can be made achromatic.

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• Physics & Mathematics (AREA)
• Optics & Photonics (AREA)
• Engineering & Computer Science (AREA)
• Plasma & Fusion (AREA)
• Electromagnetism (AREA)
• Mechanical Engineering (AREA)
• Nonlinear Science (AREA)
• Lasers (AREA)
• Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
• Laser Surgery Devices (AREA)

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• 2012
  • 2012-07-19 DE DE102012212672.4A patent/DE102012212672B4/de active Active
• 2013
  • 2013-07-11 WO PCT/EP2013/064721 patent/WO2014012847A1/de active Application Filing
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