WO2013186965A1 - Appareil de génération de puissance et module de génération de puissance - Google Patents

Appareil de génération de puissance et module de génération de puissance Download PDF

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Publication number
WO2013186965A1
WO2013186965A1 PCT/JP2013/001418 JP2013001418W WO2013186965A1 WO 2013186965 A1 WO2013186965 A1 WO 2013186965A1 JP 2013001418 W JP2013001418 W JP 2013001418W WO 2013186965 A1 WO2013186965 A1 WO 2013186965A1
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WIPO (PCT)
Prior art keywords
power generation
cantilever
electrode
fluid
generation device
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PCT/JP2013/001418
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English (en)
Japanese (ja)
Inventor
純矢 小川
規裕 山内
後藤 浩嗣
有宇 和家佐
相澤 浩一
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パナソニック株式会社
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Priority to JP2014520864A priority Critical patent/JPWO2013186965A1/ja
Publication of WO2013186965A1 publication Critical patent/WO2013186965A1/fr

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    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02NELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/18Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing electrical output from mechanical input, e.g. generators
    • H02N2/185Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing electrical output from mechanical input, e.g. generators using fluid streams
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/30Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
    • H10N30/304Beam type
    • H10N30/306Cantilevers

Definitions

  • the present invention relates to a power generation device and a power generation module.
  • This power generation device includes a frame part (support part) 121 and a cantilever forming substrate 120 having a cantilever part 122 supported by the frame part 121 in a swingable manner, and a piezoelectric conversion that generates an AC voltage in response to the vibration of the cantilever part 122.
  • the piezoelectric conversion portion 124 is formed on the cantilever portion 122 on one surface side of the cantilever forming substrate 120.
  • the cantilever forming substrate 120 is integrally provided with a weight portion 123 at the tip end portion of the cantilever portion 122.
  • the frame part 121, the cantilever part 122, and the weight part 123 are formed using an element forming substrate 120a.
  • an element formation substrate 120a a single crystal silicon substrate, a polycrystalline silicon substrate, an SOI (Silicon-on-Insulator) substrate, a metal substrate, and the like are described.
  • the piezoelectric conversion portion 124 includes a lower electrode 124a, a piezoelectric layer 124b formed on the opposite side of the lower electrode 124a to the cantilever portion 122 side, and an upper electrode formed on the opposite side of the piezoelectric layer 124b to the lower electrode 124a side. 124c.
  • a lower electrode pad 127a and an upper electrode pad 127c that are electrically connected to the lower electrode 124a and the upper electrode 124c through connection wirings 126a and 126c, respectively, are formed.
  • the inventors of the present application considered generating the above-described power generation device with a fluid. That is, the inventors of the present application have considered arranging the above-described power generation device in a fluid flow path and generating the power generation device using fluid instead of external vibration.
  • the present invention has been made in view of the above-described reasons, and an object thereof is to provide a power generation device and a power generation module that can generate power using a fluid.
  • the power generation device (1) of the present invention includes a frame-shaped support portion (11), a cantilever portion (12) swingably supported by the support portion (11), and one surface of the cantilever portion (12) ( 121) provided on the side of the power generation unit (14) that generates an AC voltage in response to vibration of the cantilever unit (12), and provided between the support unit (11) and the cantilever unit (12).
  • a flow path (15) through which the fluid (F) can pass along the thickness direction of the portion (11), and the distal end portion (12a) of the cantilever portion (12) is the base end of the cantilever portion (12).
  • the part (12b) is shifted in a direction away from the support part (12a).
  • the power generation section (14) includes a first electrode (14a) provided on one surface (121) side in the thickness direction of the cantilever section (12) and the cantilever section (12).
  • a second electrode (14c) provided on the other surface (122) side; and a piezoelectric thin film (14b) provided between the first electrode (14a) and the second electrode (14c). It is preferable that the distal end portion (12a) of the cantilever portion (12) is shifted away from the support portion (11) with respect to the base end portion (12b) due to the internal stress of the thin film (14b).
  • the power generation section (14) includes a first electrode (14a) provided on one surface (121) side in the thickness direction of the cantilever section (12) and the cantilever section (12).
  • a second electrode (14c) provided on the other surface (122) side; and a piezoelectric thin film (14b) provided between the first electrode (14a) and the second electrode (14c), the cantilever
  • the stress control film (19) provided on the one surface (121) side of the part (12)
  • the tip part (12a) of the cantilever part is placed on the support part (11) rather than the base end part (12b). It is preferable that it is shifted in a direction away from.
  • the cantilever part (12) is arranged to be inclined with respect to the support part (11), whereby the tip part (12a) of the cantilever part is replaced with the base end part (12b). It is preferable to shift the direction away from the support portion (11).
  • the support portion (11) is formed in a shape in which the cross-sectional area of the flow path (15) is wider on both sides in the thickness direction of the support portion than in the middle in the thickness direction. It is preferable.
  • the power generation device (1) includes a power generation element (1a) and a storage member (1b).
  • the power generation element (1a) includes the support portion (11), the cantilever portion (12), the power generation portion (14), and the flow path. It forms so that the said electric power generation element (1a) may be accommodated.
  • the storage member (1b) includes an inlet (1ba) into which the fluid (F) flows and an outlet (1bb) from which the fluid (F) flows out.
  • the power generation element (1a) is disposed between the inlet (1ba) and the outlet (1bb).
  • the storage member (1b) has an opening area that decreases from the inlet (1ba) to the power generation element (1a), and an opening area that decreases from the power generation element (1a) to the outlet (1bb). It is preferable to be formed in a large shape.
  • the power generation module (A1) increases the flow rate of the power generation device (1) and the fluid (F) that is provided outside the power generation device (1) and passes through the flow path. It is preferable to include a fluid control unit (3) capable of controlling the flow of fluid.
  • the tip end of the cantilever part is shifted in a direction away from the support part from the base end part of the cantilever part, so that power can be generated using a fluid.
  • the power generation module of the present invention it is possible to generate power using a fluid.
  • FIG. 1 is a schematic plan view of a power generator according to Embodiment 1.
  • FIG. FIG. 1B is a schematic cross-sectional view taken along the line A-A ′ of FIG. 1A.
  • FIG. 1B is a schematic cross-sectional view taken along the line B-B ′ of FIG. 1A. It is principal part sectional drawing of the electric power generating apparatus in FIG. 1A.
  • It is a schematic plan view of the power generator of Embodiment 2. It is A-A 'schematic sectional drawing of FIG. 2A.
  • FIG. 2B is a schematic cross-sectional view taken along the line B-B ′ of FIG. 2A. It is principal part sectional drawing of the electric power generating apparatus in FIG. 2A.
  • FIG. 4B is a schematic cross-sectional view taken along the line A-A ′ of FIG. 4A.
  • FIG. 4B is a schematic cross-sectional view taken along the line B-B ′ of FIG. 4A.
  • FIG. 9B is a schematic cross-sectional view taken along the line A-A ′ of FIG. 9A.
  • the power generation device 1 includes a frame-shaped support portion 11, a cantilever portion 12 that is swingably supported by the support portion 11, and a power generation portion that is provided in the cantilever portion 12 and generates an AC voltage according to the vibration of the cantilever portion 12. 14.
  • the power generation device 1 includes a flow path 15 that is provided between the support portion 11 and the cantilever portion 12 and that allows fluid to pass along the thickness direction of the support portion 11 (vertical direction in FIGS. 1B and C). Yes. Further, in the power generation device 1, the distal end portion 12 a of the cantilever portion 12 is shifted in a direction away from the support portion 11 with respect to the proximal end portion 12 b of the cantilever portion 12.
  • the support part 11 has a predetermined thickness in the first direction D1 (thickness direction). Moreover, the support part 11 is extended in the 2nd direction D2 (for example, the left-right direction of FIG. 1C) orthogonal to the 1st direction D1, and has the opening 11a.
  • the support part 11 has a first end part 11b and a second end part 11f on the first and second sides in the second direction D2, respectively.
  • the support part 11 is formed in a rectangular shape.
  • the support part 11 has the 1st surface (1st surface) 111 and the other surface (2nd surface) 112 in the 1st and 2nd side of the 1st direction D1, respectively.
  • the cantilever portion 12 has a first surface (first surface) 121 and another surface (second surface) 122 on the first and second sides in the first direction D1. Further, the cantilever portion 12 has a base end portion 12b (supported end) and a tip end portion 12a (free end) on the first and second sides in the first direction D1, respectively. In the example of FIG. Is formed. Further, the supported end 12b is supported by the first end portion 11b so that the first surface 121 of the supported end 12b communicates with the first surface 111 of the first end portion 11b. Thereby, the cantilever part 12 and the support part 11 are integrally formed. Further, the free end 12a of the cantilever portion 12 is configured to warp from the first surface 111 of the second end portion 11f to the first side (the upper side in FIG. 1C) in the first direction D1.
  • the power generator 1 is manufactured using a manufacturing technology of MEMS (micro-electro-mechanical systems).
  • the support portion 11 and the cantilever portion 12 are formed from the substrate 10.
  • the substrate 10 has one surface (first surface) 101 and another surface (second surface) 102 in the first direction D1.
  • a cantilever portion 12 is formed on the first surface 101 side of the substrate 10.
  • the first surface 101 of the substrate 10 may correspond to the first surface 111 of the support portion 11 and the first surface 121 of the cantilever portion 12.
  • the power generation unit 14 is monolithically formed on the substrate 10. That is, the power generation unit 14 is located on the base end portion 12 b side of the cantilever portion 12 and is formed on the first surface 121 side of the cantilever portion 12.
  • the power generation unit 14 is formed on the first surface 121 side of the cantilever unit 12 (on the first surface 101 side of the substrate 10).
  • the power generation unit 14 includes a first electrode (lower electrode) 14a, a piezoelectric layer 14b, and a second electrode (upper electrode) 14c in order from the cantilever unit 12 side.
  • the first electrode 14 a is formed on the first surface 121 side of the cantilever portion 12.
  • the piezoelectric layer 14b is formed on the first electrode 14a.
  • the second electrode 14c is formed on the piezoelectric layer 14b.
  • the power generation unit 14 includes a piezoelectric layer 14b and a first electrode 14a and a second electrode 14c facing each other with the piezoelectric layer 14b sandwiched from both sides in the thickness direction.
  • the substrate 10 an SOI substrate in which a silicon layer 10c is formed on a buried oxide film 10b made of a silicon oxide film on a silicon substrate 10a is used.
  • the first surface 101 of the substrate 10 is a (100) surface, but is not limited thereto, and may be a (110) surface, for example.
  • the support portion 11 is formed of a silicon substrate 10a, a buried oxide film 10b, and a silicon layer 10c among SOI substrates.
  • the cantilever part 12 is formed of the buried oxide film 10b and the silicon layer 10c in the SOI substrate, is thinner than the support part 11, and has flexibility.
  • the cantilever portion 12 has elasticity.
  • the substrate 10 and the power generation unit 14 are electrically insulated by a first insulating film 18 a made of a silicon oxide film formed on the first surface 101 side of the substrate 10. That is, the first insulating film 18a is formed on the first surface 101 side of the substrate 10 so that the substrate 10 and the power generation unit 14 are electrically insulated.
  • the first insulating film 18a include an insulating film made of a silicon oxide film.
  • a second insulating film 18 b is formed on the second surface 102 side of the substrate 10.
  • An example of the second insulating film 18b is an insulating film made of a silicon oxide film.
  • the first insulating film 18a and the second insulating film 18b described above are formed by a thermal oxidation method.
  • the formation method of the first insulating film 18a and the second insulating film 18b is not limited to the thermal oxidation method, and may be a CVD (Chemical Vapor Deposition) method or the like.
  • the first side surface 18aa in the first direction D1 of the first insulating film 18a is the first surface 111 of the support portion 11.
  • the second side surface 18bb of the second insulating film 18b in the first direction D1 corresponds to the second surface 112 of the support portion 11.
  • the second insulating film 18b is optional and is not necessarily provided. As described above, when the second insulating film 18 b is not provided on the second surface 102 side of the substrate 10, the second surface 102 of the substrate 10 corresponds to the second surface 112 of the support portion 11.
  • the substrate 10 is not limited to an SOI substrate, and a single crystal silicon substrate, a polycrystalline silicon substrate, a magnesium oxide (MgO) substrate, a metal substrate, a glass substrate, a polymer substrate, or the like can also be used.
  • an insulating substrate such as an MgO substrate, a glass substrate, or a polymer substrate is used as the substrate 10
  • the first insulating film 18a and the second insulating film 18b are optional and need not necessarily be provided. In this way, when the first insulating film 18a is not provided on the first surface 101 side of the substrate 10 and the second insulating film 18b is not provided on the second surface 102 side of the substrate 10, the first surface 101 and the first surface of the substrate 10 are not provided.
  • the two surfaces 102 correspond to the first surface 111 and the second surface 112 of the support portion 11, respectively.
  • the support portion 11 preferably employs a rectangular frame shape as the frame shape.
  • the power generation device 1 prepares a wafer (here, an SOI wafer) as a basis of the support portion 11 and the cantilever portion 12 during manufacturing, and performs a pre-process for forming a large number of power generation devices 1 from the wafer.
  • a wafer here, an SOI wafer
  • the workability of the dicing process can be improved.
  • the support portion 11 preferably has a rectangular outer peripheral shape, but the inner peripheral shape is not limited to a rectangular shape, and may be, for example, a polygonal shape other than a rectangular shape, a circular shape, an elliptical shape, or the like. Further, the outer peripheral shape of the support portion 11 may be a shape other than a rectangular shape.
  • the power generation device 1 has a cantilever portion 12 disposed inside the support portion 11 in a plan view.
  • a slit 10 d having a U-shape in a plan view surrounding the cantilever portion 12 is formed in the substrate 10, so that portions other than the connection portion of the cantilever portion 12 with the support portion 11 are connected to the support portion 11 (space). Separated). Thereby, the cantilever part 12 is formed in a rectangular shape in plan view.
  • the slit 10 d constitutes the flow path 15.
  • the cantilever portion 12 is formed in a rectangular plate shape.
  • the tip end portion 12 a is swingable at the second end portion 11 f of the support portion 11.
  • the base end portion 12 b of the cantilever portion 12 is integrally supported with the first end portion 11 b of the support portion 11 so that the first surface 121 of the cantilever portion 12 communicates with the first surface 111 of the support portion 11.
  • a gap (flow path 15) is formed between the second end portion 11f and the distal end portion 12a. Therefore, the opening amount (opening area) of the gap (outlet port) changes according to the swing of the cantilever portion 12.
  • the first surface 121 of the base end portion 12b is flush with the first surface 111 of the first end portion 11b, and the cantilever portion 12 and the support portion 11 are formed integrally, the first surface of the cantilever portion 12 is formed.
  • the first surface 121 is continuous with the first surface 111 of the support portion 11 without a step.
  • the piezoelectric layer 14 b of the power generation unit 14 is stressed by the vibration of the cantilever unit 12, and a charge bias is generated between the second electrode 14 c and the first electrode 14 a, and an AC voltage is generated in the power generation unit 14. appear.
  • the power generation apparatus 1 is a vibration-type power generation element in which the power generation unit 14 generates power using the piezoelectric effect of the piezoelectric material.
  • the planar shape of the piezoelectric layer 14b is a rectangular shape that is slightly smaller than the first electrode 14a and slightly larger than the planar shape of the second electrode 14c.
  • the power generation device 1 has a first electrode 14a, a piezoelectric layer 14b, and a second electrode 14c in a second direction D2 (for example, the left-right direction in FIG. 1A) that is a direction connecting the support portion 11 and the cantilever portion 12.
  • the end T on the support portion 11 side (base end portion 12b side) of the region R where the two overlap each other is aligned with the boundary between the support portion 11 and the cantilever portion 12.
  • the power generation device 1 When the cantilever portion 12 vibrates, stress on the cantilever portion 12 is concentrated on the boundary between the cantilever portion 12 and the support portion 11 (first end portion 11b). Therefore, compared with the case where the end T on the support portion 11 side of the region R is closer to the cantilever portion 12 side than the boundary R, the power generation device 1 generates power in a portion where stress is increased when the cantilever portion 12 vibrates. The area of the portion 14 can be increased, and the power generation efficiency can be improved.
  • the AC voltage generated in the power generation unit 14 is a sinusoidal AC voltage corresponding to the vibration of the piezoelectric layer 14b.
  • the power generation unit 14 of the power generation device 1 generates power using self-excited vibration generated by flowing through the flow path 15 from the fluid.
  • the resonance frequency of the power generation device 1 is determined by the structural parameters and material of the movable part composed of the cantilever part 12 and the power generation part 14. Examples of the fluid flowing through the flow path 15 include air, gas, a mixed gas of air and gas, and liquid.
  • the power generation device 1 includes a first pad 16a electrically connected to the first electrode 14a via the first wiring part 17a, and a second electrode 14c electrically connected to the support part 11 via the second wiring part 17c. And a second pad 16c connected to the.
  • the material of the first wiring part 17a, the second wiring part 17c, the first pad 16a and the second pad 16c is Au, but is not limited to this. For example, Mo, Al, Pt, Ir, etc. Good.
  • the materials of the first wiring portion 17a, the second wiring portion 17c, the first pad 16a, and the second pad 16c are not limited to the same material, and different materials may be employed.
  • the first wiring portion 17a, the second wiring portion 17c, the first pad 16a, and the second pad 16c are not limited to a single layer structure, and may be a multilayer structure having two or more layers.
  • an insulating layer (not shown) that prevents a short circuit between the second wiring portion 17c and the first electrode 14a is provided between the second wiring portion 17c and the first electrode 14a.
  • This insulating layer is formed of a silicon oxide film, but is not limited to a silicon oxide film, and may be formed of, for example, a silicon nitride film. Further, the power generation device 1 may be provided with an appropriate insulating film depending on the material of the substrate 10.
  • the piezoelectric material of the piezoelectric layer 14b PZT (Pb (Zr, Ti) O 3 ) is adopted, but not limited to this, for example, PZT-PMN (Pb (Mn, Nb) O 3 ) and others PZT to which the impurities are added may be used.
  • the piezoelectric material is AlN, ZnO, KNN (K 0.5 Na 0.5 NbO 3 ), KN (KNbO 3 ), NN (NaNbO 3 ), or KNN as impurities (eg, Li, Nb, Ta, Sb, Cu, etc.). The thing etc. which added may be sufficient.
  • the piezoelectric layer 14b is configured by a piezoelectric thin film.
  • the material of the first electrode 14a is Pt, but is not limited thereto, and may be Au, Al, Ir or the like, for example. Further, although Au is adopted as the material of the second electrode 14c, it is not limited to this, and for example, Mo, Al, Pt, Ir, or the like may be used.
  • the thickness of the first electrode 14 a is set to 500 nm
  • the thickness of the piezoelectric layer 14 b is set to 3000 nm
  • the thickness of the second electrode 14 c is set to 500 nm. is not.
  • the power generation device 1 may have a structure in which a buffer layer is provided between the substrate 10 and the first electrode 14a.
  • the material of the buffer layer may be appropriately selected according to the piezoelectric material of the piezoelectric layer 14b.
  • the piezoelectric material of the piezoelectric layer 14b is PZT, for example, SrRuO 3 , (Pb, La) TiO 3 , PbTiO 3 is used . 3 , MgO, LaNiO 3 or the like is preferably used.
  • the buffer layer may be constituted by a laminated film of a Pt film and a SrRuO 3 film, for example. By providing the buffer layer, the crystallinity of the piezoelectric layer 14b can be improved.
  • the structure of the electric power generating apparatus 1 is not restricted to the above-mentioned example, for example, the electric power generation part 14 makes the dimension along the 3rd direction D3 (for example, the up-down direction of FIG. 1A) which points the width direction of the cantilever part 12 small. And the several electric power generation part 14 can be arranged in parallel along the said 3rd direction D3 in the said 1st surface 121 side of the one cantilever part 12.
  • one end (first connection end) and the other end (second connection end) of the series circuit of the plurality of power generation units 14 are configured to be electrically connected to the first pad 16a and the second pad 16c, respectively. .
  • a substrate 10 made of an SOI substrate is prepared, and then an insulating film forming step is performed.
  • a first insulating film 18a made of a silicon oxide film, a second insulating film 18a, and a second insulating film 18a are formed on the first surface 101 side and the second surface 102 side of the substrate 10 by using a thermal oxidation method or the like.
  • An insulating film 18b is formed.
  • the thermal oxidation method is adopted as a method of forming the first insulating film 18a and the second insulating film 18b.
  • the present invention is not limited to this, and a CVD method or the like may be adopted.
  • a first conductive layer forming step for forming a first conductive layer serving as a basis for the first electrode 14a and the first wiring portion 17a on the entire surface of the substrate 10 on the first surface 101 side.
  • a piezoelectric material layer forming step for forming a piezoelectric material layer serving as a basis of the piezoelectric layer 14b is performed.
  • the sputtering method is adopted, but not limited thereto, for example, a CVD method or a vapor deposition method may be adopted.
  • the sputtering method is adopted, but not limited thereto, for example, a CVD method or a sol-gel method may be adopted.
  • a piezoelectric material layer patterning step for patterning the piezoelectric material layer into a predetermined shape of the piezoelectric layer is performed, and then the first conductive layer is formed on the first electrode 14a and the first wiring portion 17a.
  • a first conductive layer patterning step for patterning into a predetermined shape is performed.
  • the piezoelectric material layer patterning step the piezoelectric material layer is patterned using a lithography technique and an etching technique.
  • the first conductive layer patterning step the first conductive layer is patterned using a lithography technique and an etching technique.
  • an insulating layer forming step for forming the insulating layer 18a on the first surface 101 side of the substrate 10 is performed.
  • a second conductive layer forming step is performed in which a second conductive layer that forms the basis of the second electrode 14c and the second wiring portion 17c is formed on the entire surface of the substrate 10 on the first surface 101 side, and then the second conductive layer is formed.
  • a second conductive layer patterning step is performed for patterning the conductive layer into a predetermined shape of the second electrode 14c and the second wiring portion 17c.
  • the sputtering method is adopted, but not limited thereto, for example, a CVD method or a vapor deposition method may be adopted.
  • the second conductive layer patterning step the second conductive layer is patterned using a lithography technique and an etching technique.
  • a third conductive layer is formed on the entire surface of the substrate 10 on the first surface 101 side, with the third conductive layer serving as the basis of the first pad 16a and the second pad 16c being formed. Then, a third conductive layer patterning step of patterning the third conductive layer into a predetermined shape of the first pad 16a and the second pad 16c is performed.
  • a groove is formed by etching a portion other than the support portion 11 and the cantilever portion 12 (a region where the slit 10 d is to be formed) by an amount corresponding to the thickness of the cantilever portion 12.
  • a groove forming step is performed. After that, by performing a cantilever part forming step of forming the cantilever part 12 together with the support part 11 by etching a part other than the support part 11 from the second surface 102 side of the substrate 10, the power generation device 1 is obtain.
  • the groove is formed using a lithography technique, an etching technique, and the like.
  • the cantilever part 12 is formed together with the support part 11 using a lithography technique and an etching technique.
  • Each etching in the groove forming step and the cantilever part forming step is dry etching using an inductively coupled plasma type dry etching apparatus capable of vertical deepening.
  • a slit 10d is formed.
  • the process until the cantilever part formation process is completed is performed at the wafer level, and then the dicing process is performed to divide the individual power generation devices 1.
  • the power generation device 1 includes the flow path 15 that is provided between the support portion 11 and the cantilever portion 12 and allows fluid to pass along the thickness direction of the support portion 11 as described above. 12 a is shifted in a direction away from the support portion 11 with respect to the base end portion 12 b of the cantilever portion 12.
  • the initial deviation G1 (see FIG. 1B) is preferably 200 ⁇ m or more.
  • a deviation in the thickness direction of the support portion 11 of the line of intersection between the neutral surface of the cantilever portion 12 and the tip surface of the cantilever portion 12 is defined as an initial deviation G1.
  • the cantilever portion 12 is configured such that the distal end portion 12a of the cantilever portion 12 is supported more than the proximal end portion 12b of the cantilever portion 12 as shown in FIGS. 1B and 1C. It is shifted in the direction away from.
  • the cantilever portion 12 is curved so that the first surface 121 side is a concave curved surface and the second surface 122 side is a convex curved surface.
  • the distal end portion 12a of the cantilever portion 12 is shifted away from the support portion 11 relative to the base end portion 12b due to the internal stress of the piezoelectric thin film constituting the piezoelectric layer 14b.
  • the internal stress of the piezoelectric thin film can be adjusted by appropriately setting process conditions such as gas pressure and temperature.
  • the direction in which the fluid flows and the thickness direction of the support portion 11 coincide with each other, the first surface 101 side of the substrate 10 is upstream of the fluid, and the second surface 102 side of the substrate 10 is fluid. Arrange it so that it is on the downstream side.
  • the flow velocity increases, so that the second surface 122 side of the cantilever portion 12 and the inner side surface of the support portion 11
  • the pressure in the enclosed space 10f is reduced, and the tip 12a of the cantilever part 12 is displaced in a direction approaching the support part 11 (the space 10f side).
  • the power generation device 1 of the present embodiment includes the flow path 15 provided between the support portion 11 and the cantilever portion 12 and allowing fluid to pass along the thickness direction of the support portion 11. Further, in the power generation device 1 of the present embodiment, the distal end portion 12a of the cantilever portion 12 is shifted in a direction away from the support portion 11 relative to the base end portion 12b of the cantilever portion 12. As a result, the power generation device 1 is configured such that the pressure difference between the first surface 121 side and the second surface 122 side of the cantilever portion 12 generated by the flow of fluid (airflow) through the flow path 15 and the elasticity of the cantilever portion 12. Since self-excited vibration can be generated by the above, power can be generated using a fluid.
  • the fluid passing through the flow path 15 may be air, gas, a mixed gas of air and gas, a liquid, or the like.
  • the electric power generating apparatus 1 of this embodiment is demonstrated based on FIG. 2A thru
  • the stress control film 19 provided on the first surface 121 side of the cantilever portion 12 causes the distal end portion 12a of the cantilever portion 12 to move away from the support portion 11 more than the base end portion 12b. It is shifted. That is, the stress control film 19 is provided on the first surface 121 side of the cantilever part 12, and the stress control film 19 causes the tip part 12 a of the cantilever part 12 to warp from the first surface 111 of the support part 11. .
  • symbol is attached
  • the stress control film 19 is formed on the opposite side of the second electrode 14c from the piezoelectric layer 14b side.
  • the stress control film 19 is composed of a SiO 2 film, but is not limited thereto, and may be composed of, for example, a Si 3 N 4 film.
  • the stress control film 19 may be formed between the cantilever portion 12 and the first electrode 14a. Further, the stress control film 19 may be formed on the second surface 122 side of the cantilever portion 12. As shown in FIG. 2C, the stress control film 19 is formed so as to cover the entire surface of the piezoelectric conversion unit 14 on the first surface 121 side of the cantilever unit 12, but the stress control film 19 is formed of the piezoelectric conversion unit 14. It may be formed so as to cover only a part of.
  • the power generation device 1 has a pressure difference between the first surface 121 side and the second surface 122 side of the cantilever portion 12 generated by the fluid flow through the flow path 15, and the cantilever. Since the self-excited vibration can be generated by the elasticity of the portion 12, power can be generated using the fluid.
  • the tip 12a of the cantilever 12 is caused by the stress acting on the cantilever 12 due to the stress control film 19 and the internal stress of the piezoelectric layer 14b that is a piezoelectric thin film. You may shift to the direction which leaves
  • the electric power generating apparatus 1 of this embodiment is demonstrated based on FIG.
  • the cantilever portion 12 is disposed so as to be inclined with respect to the first surface 111 of the support portion 11, so that the distal end portion 12 a of the cantilever portion 12 is further away from the support portion 11 than the base end portion 12 b. It has been shifted away. That is, in the power generation device 1 of this embodiment, the cantilever part 12 is inclined with respect to the first surface 111 (upper surface in FIG. 3) of the support part 11 orthogonal to the thickness direction of the support part 11.
  • the power generation device 1 includes a frame-shaped support portion 11 having an opening 11 a and a cantilever portion 12.
  • the cantilever portion 12 is disposed on the first side in the first direction D1 from the first surface 111 of the support portion 11 with a predetermined interval.
  • the cantilever portion 12 is supported by the support portion 11 (first end portion 11b) so as to face the opening 11a (first surface 111 of the support portion 11).
  • the cantilever portion 12 has a proximal end portion 12b and a distal end portion 12a.
  • the cantilever part 12 is inclined with respect to the first surface 111 of the support part 11, and the distal end part 12 a side is farther from the first surface 111 of the support part 11 than the base end part 12 b side. Furthermore, by supporting the base end portion 12b on the first surface 111 side of the support portion 11, the tip end portion 12a of the cantilever portion 12 is configured to be swingable.
  • the power generator 1 of Embodiment 1 shown in FIGS. 1A to 1D is a thin-film piezoelectric vibration power generator manufactured using MEMS manufacturing technology, and includes a first electrode 14a, a piezoelectric layer 14b, and a second layer.
  • Each of the electrodes 14c is composed of a first metal thin film, a piezoelectric thin film, and a second metal thin film.
  • the power generation device 1 of this embodiment is a bulk-type piezoelectric vibration power generation device, which uses a bulk as the piezoelectric layer 14b, and the thickness of the piezoelectric layer 14b.
  • the power generation unit 14 includes the piezoelectric layer 14b, the first electrode 14a, and the second electrode 14c.
  • the piezoelectric layer 14b has a first surface 141 and a second surface 142 on the first and second sides in the first direction D1, respectively.
  • a second electrode 14c is formed on the first surface 141 side of the piezoelectric layer 14b, and a first electrode 14a is formed on the second surface 142 side of the piezoelectric layer 14b.
  • Each of the first electrode 14a and the second electrode 14c is formed of a metal film.
  • the power generation unit 14 is formed on the beam member 20 and is inclined with respect to the first surface 111 of the support unit 11.
  • a mounting base portion 21 having a desired angle is provided on the first surface 111 side of the support portion 11.
  • the mounting base 21 has an inclined surface 21a.
  • the inclined surface 21 a is fixed to the second surface 142 side of the beam member 20.
  • the beam member 20 may be fixed to the mounting base portion 21 provided on the first surface 111 of the support portion 11 with, for example, an adhesive.
  • the mounting base 21 has an inclined surface 21a for inclining and arranging the beam member 20 at a desired angle.
  • the piezoelectric layer 14b also serves as the cantilever portion 12. Note that the mount 21 may be fixed to the support 11 with, for example, an adhesive.
  • the support portion 11 may be formed by machining a metal plate, or may be formed of a resin molded product, and the substrate 10 may be formed using a MEMS manufacturing technique or the like as in the first embodiment. It may be formed by processing.
  • the power generation device 1 has a pressure difference between the first surface 121 side and the second surface 122 side of the cantilever portion 12 generated by the fluid flow through the flow path 15, and the cantilever. Since the self-excited vibration can be generated by the elasticity of the portion 12, power can be generated using the fluid.
  • or FIG. 4D the electric power generating apparatus 1 of this embodiment is demonstrated based on FIG. 4A thru
  • the power generation device 1 of the present embodiment is different from the power generation device 1 of the first embodiment in the shape of the inner surface of the support portion 11.
  • symbol is attached
  • the support unit 11 in the power generation device 1 of the present embodiment has a cross-sectional area of the flow channel 15 that is greater than the cross-sectional area of the flow channel 15 located in the middle of the thickness direction on both sides of the support unit 11 in the thickness direction (first direction D1). Is also formed in a wider shape.
  • the power generation apparatus 1 is configured such that the etching in the groove forming step and the cantilever portion forming step is anisotropic etching with an alkaline solution, whereby the above-described support portion 11 and The shape of the flow path 15 can be realized.
  • the support part 11 passes through the flow path 15 because the cross-sectional area of the flow path 15 is wider than the middle in the thickness direction on both sides in the thickness direction of the support part 11. It becomes possible to increase the flow rate of the fluid. Therefore, the power generation device 1 can increase the pressure difference between the first surface 121 side and the second surface 122 side of the cantilever portion 12 generated when the fluid passes through the flow path 15, and more efficiently. It is possible to generate electricity.
  • the power generation device 1 of the present embodiment includes a power generation element 1a including a support portion 11, a cantilever portion 12, a power generation portion 14, and a flow path 15, and a storage member 1b that stores the power generation element 1a.
  • a power generation element 1a including a support portion 11, a cantilever portion 12, a power generation portion 14, and a flow path 15, and a storage member 1b that stores the power generation element 1a.
  • symbol is attached
  • the configuration of the power generation element 1a of the present embodiment is the same as that of the power generation device 1 of the first embodiment, the same components as those of the first embodiment are denoted by the same reference numerals and description thereof is omitted.
  • the power generation element 1a is not limited to the power generation device 1 of the first embodiment, and may have the same configuration as the power generation device 1 of any of the second to fourth embodiments.
  • the power generation device 1 of the present embodiment includes a power generation element 1a including a support portion 11, a cantilever portion 12, a power generation portion 14, and a flow path 15, and a storage member 1b that stores the power generation element 1a.
  • the storage member 1b is provided with an inlet 1ba through which the fluid F flows and an outlet 1bb through which the fluid flows out.
  • the power generation element 1a is arranged between the inflow port 1ba and the outflow port 1bb.
  • the storage member 1b is formed in such a shape that the opening area decreases as it approaches the power generation element 1a from the inlet 1ba, and the opening area increases as it approaches the outlet 1bb from the power generation element 1a.
  • the storage member 1b is provided with an inlet 1ba through which the fluid F flows in and an outlet 1bb through which the fluid F flows out, and the power generation element 1a is disposed between the inlet 1ba and the outlet 1bb.
  • 5A and 5B schematically show the direction in which the fluid F flows.
  • the storage member 1b is formed in a shape in which the opening area decreases as it approaches the power generation element 1a from the inlet 1ba, and the opening area increases as it approaches the outlet 1bb from the power generation element 1a.
  • the storage member 1b holds the peripheral portion of the support portion 11 of the power generation element 1a.
  • the storage member 1b has a rectangular outer peripheral shape and a rectangular opening shape. For example, if the storage member 1b is formed by joining two half-tubular members, the power generation element 1 can be easily stored and held.
  • the housing member 1b may be formed using a three-dimensional circuit forming substrate or the like. Further, the storage member 1b may be provided with, for example, a power storage unit, a charging circuit that rectifies an AC voltage generated in the power generation element 1a and charges the power storage unit.
  • the power generation device 1 includes the storage member 1b that stores the power generation element 1a.
  • the storage member 1b approaches the power generation element 1a from the inflow port 1ba, the opening area decreases, and the power generation element 1a. Is formed in a shape in which the opening area increases as it approaches the outlet 1bb.
  • the power generation device 1 can increase the flow rate of the fluid F passing through the flow path 15. Therefore, the power generation device 1 can increase the pressure difference between the one surface side and the other surface side of the cantilever portion 12 generated by the fluid F passing through the flow path 15, and can generate power more efficiently. It becomes possible.
  • the power generation device 1 of the present embodiment includes the storage member 1b, the power generation element 1a can be protected by the storage member 1b, and there is an advantage that handling is easy.
  • Embodiment 6 Below, the electric power generating apparatus 1 of this embodiment is demonstrated based on FIG. 6A and 6B.
  • the power generation device 1 of the present embodiment is different from the power generation device 1 of the fifth embodiment in the shape of the storage member 1b.
  • symbol is attached
  • the storage member 1b is formed in a drum shape.
  • the power generation device 1 can further increase the flow rate of the fluid F passing through the flow path 15. Therefore, the power generation device 1 can further increase the pressure difference between the first surface 121 side and the second surface 122 side of the cantilever portion 12 generated when the fluid F passes through the flow path 15. It becomes possible to generate power efficiently.
  • the power generation module A1 of the present embodiment includes a power generation device 1 and a fluid control unit 3 that is provided outside the power generation device 1 and that can control the flow of the fluid F so as to increase the flow rate of the fluid F that passes through the flow path 15. I have.
  • the arrow in FIG. 7 has shown typically the direction through which the fluid F flows.
  • the configuration of the power generation device 1 is the same as that of the power generation device 1 of the fifth embodiment, but is not limited thereto, and may be the same as that of any one of the power generation devices 1 of the first to fourth embodiments.
  • the power generation module A1 may include a plurality of power generation devices 1 for one fluid control unit 3.
  • the fluid control unit 3 and the power generator 1 are arranged side by side along the direction in which the fluid F flows in the duct 4.
  • the fluid control unit 3 is disposed on the upstream side of the fluid F flowing in the duct 4
  • the power generation device 1 is disposed on the downstream side of the fluid control unit 3.
  • the duct 4 should just be provided in the inside or the exterior of various apparatuses, and as an apparatus, an air conditioner etc. may be sufficient, for example.
  • the duct 4 is not limited to a cylindrical body having a uniform opening area, and may have a bellows shape, for example.
  • the fluid control unit 3 is configured by a nozzle, and is arranged so that the side near the power generation device 1 is the air outlet 3b and the side far from the light emitting device 1 is the suction port 3a.
  • the opening area of the blower outlet 3b is smaller than the opening area of the suction inlet 3a.
  • the power generation module A1 includes the power generation device 1 and the fluid control unit 3 that is provided outside the power generation device 1 and that can control the flow of the fluid F so as to increase the flow rate of the fluid F that passes through the flow path 15. As a result, the flow rate of the fluid F passing through the flow path 15 of the power generation device 1 can be further increased. Therefore, the power generation module can further increase the pressure difference between the first surface 121 side and the second surface 122 side of the cantilever portion 12 generated when the fluid F passes through the flow path 15 of the power generation device 1. Thus, it is possible to generate power more efficiently.
  • the fluid control unit 3 has a cylindrical shape, but is not limited thereto, and may be, for example, a triangular prism shape or a spherical shape.
  • the power generation module of the present embodiment is a fluid that can control the flow of the fluid F so as to increase the flow rate of the fluid F that is provided outside the power generation device 1 and passes through the flow path 15. And a control unit 3. Therefore, the power generation module can further increase the flow rate of the fluid F passing through the flow path 15 of the power generation device 1. Therefore, the power generation module can further increase the pressure difference between the first surface 121 side and the second surface 122 side of the cantilever portion 12 generated when the fluid F passes through the flow path 15 of the power generation device 1. Thus, it is possible to generate power more efficiently.

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  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Micromachines (AREA)

Abstract

La présente invention porte sur un appareil de génération de puissance (1) qui comporte : une section de support en forme de cadre (11) ; une section poutre en porte-à-faux (12) supportée de manière glissante par la section de support (11) ; et une section (14), qui est disposée sur un côté de surface (121) de la section poutre en porte-à-faux (12) et qui génère une tension à courant alternatif correspondant au glissement de la section poutre en porte-à-faux (12). L'appareil de génération de puissance (1) comporte un canal d'écoulement (15), qui est disposé entre la section de support (11) et la section poutre en porte-à-faux (12), et qui a un fluide traversant dans la direction d'épaisseur de la section de support (11). L'appareil de génération de puissance (1) a une partie d'extrémité avant (12a) de la section de poutre en porte-à-faux (12) décalée dans la direction à l'opposé de la section de support (11) à partir d'une partie d'extrémité de base (12b) de la section poutre en porte-à-faux (12).
PCT/JP2013/001418 2012-06-12 2013-03-06 Appareil de génération de puissance et module de génération de puissance WO2013186965A1 (fr)

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US20170033713A1 (en) * 2014-04-11 2017-02-02 Fondazione Istituto Italiano Di Tecnologia Device for harvesting energy from a fluidic flow including a thin film of piezoelectric material
JP2017050355A (ja) * 2015-08-31 2017-03-09 国立研究開発法人産業技術総合研究所 電子デバイス及びその製造方法
IT201800003552A1 (it) * 2018-03-14 2019-09-14 St Microelectronics Srl Modulo valvola piezoelettrico, metodo di fabbricazione del modulo valvola, metodo di funzionamento del modulo valvola e dispositivo di ausilio alla respirazione includente uno o piu' moduli valvola

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US10153713B2 (en) * 2014-04-11 2018-12-11 Fondzione Istituto Italiano Di Tecnologia Device for harvesting energy from a fluidic flow including a thin film of piezoelectric material
JP2016039343A (ja) * 2014-08-11 2016-03-22 国立研究開発法人産業技術総合研究所 電子デバイス及びその製造方法
JP2017050355A (ja) * 2015-08-31 2017-03-09 国立研究開発法人産業技術総合研究所 電子デバイス及びその製造方法
IT201800003552A1 (it) * 2018-03-14 2019-09-14 St Microelectronics Srl Modulo valvola piezoelettrico, metodo di fabbricazione del modulo valvola, metodo di funzionamento del modulo valvola e dispositivo di ausilio alla respirazione includente uno o piu' moduli valvola
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US10941880B2 (en) 2018-03-14 2021-03-09 Stmicroelectronics S.R.L. Piezoelectric valve module, method for manufacturing the valve module, method for operating the valve module, and respiratory aid device including one or more of the valve modules

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