WO2013178040A1

WO2013178040A1 - Deflation system and technology thereof

Info

Publication number: WO2013178040A1
Application number: PCT/CN2013/076219
Authority: WO
Inventors: 储琦; 储昕
Original assignee: Chu Qi; Chu Xin
Priority date: 2012-05-29
Filing date: 2013-05-24
Publication date: 2013-12-05
Also published as: CN102691640B; CN102691640A

Abstract

Disclosed are a deflation system and technology thereof. The deflation system comprises an electric arc titanium pump (12) and a vacuum chamber (13), and the electric arc titanium pump (12) is communicated with the vacuum chamber directly. Therefore, a high-vacuum valve between the electric arc titanium pump (12) and the vacuum chamber (13) can be eliminated, so that the structure is simple and the cost of the deflation system is reduced. According to the deflation system, after the deflation operation of the electric arc titanium pump (12) is finished and before the vacuum chamber (13) is exposed to the air, a titanium target is cooled for a certain time, so as to reduce the oxidization loss on the surface of the titanium target and prolong the service life of the titanium target.

Description

Pumping system and process

The invention belongs to the technical field of vacuum acquisition, and in particular relates to a pumping system and a process.

The conventional titanium pump (ie, sublimation titanium pump) is a vacuum pump that uses a sublimation principle to evaporate a titanium film and then utilizes chemical adsorption of a fresh titanium film to achieve pumping. The traditional titanium pump has a high pumping speed. However, the titanium membrane has a low evapotranspiration rate, a small amount of pumping, and a low utilization rate of evapotranspiration. It is usually only used in high vacuum applications with a pressure of ≤10-4 Pa. The pump is used in industrial high vacuum applications of 10-2~10-3Pa, and the pumping speed is greatly reduced, which loses practical value.

With the advancement of science and technology, the current working range of arc titanium pump has been extended to the industrial high vacuum section of 10-2~10-3Pa, which has certain practicability. However, the existing pumping system has a complicated structure and high cost, which is not conducive to popularization and application.

An object of the embodiments of the present invention is to provide a pumping system, which aims to solve the problem of complicated structure of the existing pumping system.

Embodiments of the present invention are achieved in such a manner that an air extraction system includes an arc titanium pump and a vacuum chamber that is in direct communication with the vacuum chamber.

Another object of the embodiments of the present invention is to provide a pumping process applied to the air pumping system. After the arc pump is exhausted, the titanium target of the arc titanium pump is cooled before the vacuum chamber is exposed to the atmosphere. a period of time.

In the embodiment of the invention, the arc titanium pump is directly connected to the vacuum chamber, so that the high vacuum valve between the two is omitted, the structure is simple, and the cost of the pumping system is greatly reduced. In accordance with the present extraction system, after the arc pump is exhausted, the titanium target is cooled for a period of time before the vacuum chamber is exposed to the atmosphere, thereby reducing the oxidation loss on the surface of the titanium target and increasing the service life of the titanium target. This makes the pumping system extremely cost-effective.

1 is a schematic structural view of a pumping system according to a first embodiment of the present invention;

2 is a schematic structural view of an arc titanium pump according to a first embodiment of the present invention;

3 is a schematic structural view of an arc titanium pump according to a second embodiment of the present invention;

4 is a schematic structural view of an arc titanium pump according to a third embodiment of the present invention.

The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It is understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

The implementation of the invention is described in detail below with reference to a few embodiments.

Embodiment 1

As shown in FIG. 1 , the air extraction system provided by the embodiment of the present invention includes an arc titanium pump 12 and a vacuum chamber 13 , and the arc titanium pump 12 directly communicates with the vacuum chamber 13 . In this way, the high vacuum valve between the arc titanium pump 12 and the vacuum chamber 13 can be omitted, and the structure is simple, which greatly reduces the total cost of the pumping system. In accordance with the present pumping system, after the arc pump 12 is exhausted, the titanium chamber of the arc titanium pump 12 is cooled for a period of time before the vacuum chamber 13 is exposed to the atmosphere, thereby reducing the oxidation loss on the surface of the titanium target and improving The service life of the titanium target. This makes the pumping system extremely cost-effective.

Generally, cooling the titanium target by the cooling member of the arc titanium pump 12 is convenient and quick. Wherein, the cooling time of the titanium target is preferably 10 to 300 seconds, and the time is short, which has little influence on production.

As shown in FIG. 2, the arc titanium pump includes a set of cathode arc sources 1 and a gas main trap plate 2 located directly in front of the cathode arc source 1. At this time, the distance between the cathode arc source 1 and the gas main collecting plate 2 is sufficiently large, preferably 200 to 400 mm, so that the particles evaporated by the cathode arc source 1 will be deposited on the gas main collecting plate 2 as a whole. The surface has good film uniformity, which is beneficial to increase the adsorption probability of the titanium film, so that the arc titanium pump has a high pumping speed.

The cathode arc source 1 in the embodiment of the present invention includes a cooling member, a magnetic member (not shown), and a plate-shaped titanium target 11 disposed in front of the electromagnetic member, the gas main collecting plate 2 being parallel to the titanium target 11. Here, the energy of the arc discharge is used to evaporate the titanium target material to the gas main collecting plate 2 to form a thin layer of active atoms for adsorbing gas molecules, thereby achieving pumping. The titanium target 11 described herein may be made of other metals or alloys that are chemically active, such as titanium aluminum alloys.

Typically, the arc titanium pump has a housing 3. Here, the gas main collecting plate 2 is disposed on the inner wall of the titanium pump casing opposite to the titanium target 11, and the remaining titanium pump casing inner wall serves as a gas-assisted collecting plate 4 to enhance the utilization of the titanium material. Of course, a separate gas-assisted trap plate 4 can also be provided on the inner wall of the titanium pump housing for replacement and maintenance of the arc-titanium pump.

The surface of the gas main trap plate 2 and/or the gas-assisted trap plate 4 has a concave-convex shape, such as a sawtooth surface, a corrugated surface or other non-planar surface, thus increasing the effective trapping area and increasing the adsorption probability of the gas trap plate. Increase the utilization rate of titanium film by more than 25%, and reduce the cost of the arc arc pump. In order to further increase the probability of adsorbing gas by the collecting plate, the gas main collecting plate 2 and/or the gas auxiliary collecting plate 4 is provided with a cooling member 5 for lowering the temperature thereof, and the cooling member 5 may be a cooling water jacket or cooling. pipeline. Furthermore, the serrations or corrugations run perpendicular to the pump port, which facilitates the removal of the spent titanium film.

Wherein, a dust shield 6 that doubles as a gas-assisted trap plate is provided at the pump port of the arc-titanium pump. The dust shield 6 is preferably a louver type dust shield composed of a plurality of blades 61. The louver type dust shield may be installed vertically or horizontally. The width of the blade 61 is preferably 0.8 to 2 times the pitch of the adjacent blades, and the inclination angle of the blade is preferably 30 to 60°, so that it is difficult for the dust to enter the vacuum chamber. Of course, in the case of sensitive dust pollution (such as optical coating), double-layer or multi-layer dust shields can be used. When the arc arc pump is provided with a multi-layer dust shield, the blades of the adjacent dust shields are inclined in opposite directions.

In addition, in order to increase the probability of adsorption of the gas molecules by the dust shield 6, a cooling member 5 such as a cooling water jacket or a cooling duct is disposed at the dust shield 6.

Embodiment 2

Different from the first embodiment, the arc titanium pump provided by the embodiment of the invention comprises two sets of cathode arc source 7 and two gas main collecting plates 8, and the two gas main collecting plates 8 are disposed on opposite sets of cathodes. Between arc sources 7, as shown in Figure 3. Here, the cathode arc source 7 is in one-to-one correspondence with the gas main collecting plate 8, and the distance between the two is relatively large, preferably 200 to 400 mm, so that the titanium film deposited on the gas main collecting plate 8 is uniform. It is beneficial to increase the adsorption probability of the titanium film. Due to the addition of a set of cathode arc sources 7 and associated gas main trap plates 8, the pumping speed of the arc arc pump is increased by about 40% compared to a conventional arc titanium pump of the same size. In order to further increase the pumping speed of the arc arc pump, the casing inner wall 3 of the arc titanium pump is used as a gas-assisted collecting plate.

At this time, the surface of the gas main collecting plate 8 may be a flat surface or a non-planar surface, for example, a sawtooth surface or a corrugated surface, so that the pumping speed of the arc arc pump can be further improved. In addition, a cooling duct 10 may be disposed between the two gas main collecting plates 8 to increase the adsorption probability of the gas molecules by the two trap plates.

Embodiment 3

Different from the second embodiment, in the embodiment of the present invention, the gas main collecting plate 15 is formed by arranging a plurality of mutually parallel sub-boards 16 as shown in FIG. The ratio of the width of the sub-board 16 to the spacing of the adjacent sub-boards is preferably 1.4 to 3 times, and the inclination angle of the sub-board 16 is preferably 40 to 75 degrees.

The above is only the preferred embodiment of the present invention, and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection of the present invention. Within the scope .

Claims

An air extraction system comprising an arc titanium pump and a vacuum chamber, wherein the arc titanium pump is in direct communication with the vacuum chamber.
The pumping system of claim 1 wherein said arc titanium pump comprises at least one set of cathode arc sources and a gas main trap plate located directly in front of said cathode arc source.
The air extraction system according to claim 2, wherein said cathode arc source comprises a cooling member, a magnetic member, and a plate-shaped titanium target disposed in front of said electromagnetic member, said gas main trap plate being parallel to titanium target.
The pumping system according to claim 3, wherein said cathode arc source is a group, said gas main trap plate is disposed on an inner wall of a titanium pump casing opposite said titanium target, and the remaining titanium pump casing The inner wall acts as a gas-assisted trap.
The pumping system of claim 3 wherein said source of cathode arcs is two; said gas main trap is disposed between opposing sets of cathode arc sources.
The air extraction system according to claim 5, wherein the inner wall of the casing of the air extraction system serves as a gas-assisted collecting plate.
The air extraction system according to any one of claims 2 to 6, wherein the surface of the gas main collecting plate and/or the gas auxiliary collecting plate is flat, serrated or corrugated.
The air extraction system according to claim 5, wherein said gas main collecting plate is formed by arranging a plurality of mutually parallel sub-plates.
A pumping process applied to the pumping system according to any one of claims 1 to 8, characterized in that after the arc pump is exhausted, the arc chamber is heated before the vacuum chamber is exposed to the atmosphere. The titanium target is cooled for a while.
The pumping process according to claim 9, wherein the titanium target is cooled by a cooling member of the arc titanium pump, and the cooling time is 10 to 300 seconds.