WO2013178040A1 - Système de dégonflage et technologie associée - Google Patents

Système de dégonflage et technologie associée Download PDF

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Publication number
WO2013178040A1
WO2013178040A1 PCT/CN2013/076219 CN2013076219W WO2013178040A1 WO 2013178040 A1 WO2013178040 A1 WO 2013178040A1 CN 2013076219 W CN2013076219 W CN 2013076219W WO 2013178040 A1 WO2013178040 A1 WO 2013178040A1
Authority
WO
WIPO (PCT)
Prior art keywords
arc
titanium
pump
gas
gas main
Prior art date
Application number
PCT/CN2013/076219
Other languages
English (en)
Chinese (zh)
Inventor
储琦
储昕
Original Assignee
Chu Qi
Chu Xin
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chu Qi, Chu Xin filed Critical Chu Qi
Publication of WO2013178040A1 publication Critical patent/WO2013178040A1/fr

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/02—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by absorption or adsorption
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum

Definitions

  • the invention belongs to the technical field of vacuum acquisition, and in particular relates to a pumping system and a process.
  • the conventional titanium pump is a vacuum pump that uses a sublimation principle to evaporate a titanium film and then utilizes chemical adsorption of a fresh titanium film to achieve pumping.
  • the traditional titanium pump has a high pumping speed.
  • the titanium membrane has a low evapotranspiration rate, a small amount of pumping, and a low utilization rate of evapotranspiration. It is usually only used in high vacuum applications with a pressure of ⁇ 10-4 Pa.
  • the pump is used in industrial high vacuum applications of 10-2 ⁇ 10-3Pa, and the pumping speed is greatly reduced, which loses practical value.
  • An object of the embodiments of the present invention is to provide a pumping system, which aims to solve the problem of complicated structure of the existing pumping system.
  • Embodiments of the present invention are achieved in such a manner that an air extraction system includes an arc titanium pump and a vacuum chamber that is in direct communication with the vacuum chamber.
  • Another object of the embodiments of the present invention is to provide a pumping process applied to the air pumping system. After the arc pump is exhausted, the titanium target of the arc titanium pump is cooled before the vacuum chamber is exposed to the atmosphere. a period of time.
  • the arc titanium pump is directly connected to the vacuum chamber, so that the high vacuum valve between the two is omitted, the structure is simple, and the cost of the pumping system is greatly reduced.
  • the titanium target is cooled for a period of time before the vacuum chamber is exposed to the atmosphere, thereby reducing the oxidation loss on the surface of the titanium target and increasing the service life of the titanium target. This makes the pumping system extremely cost-effective.
  • FIG. 1 is a schematic structural view of a pumping system according to a first embodiment of the present invention
  • FIG. 2 is a schematic structural view of an arc titanium pump according to a first embodiment of the present invention
  • FIG. 3 is a schematic structural view of an arc titanium pump according to a second embodiment of the present invention.
  • FIG. 4 is a schematic structural view of an arc titanium pump according to a third embodiment of the present invention.
  • the arc titanium pump is directly connected to the vacuum chamber, so that the high vacuum valve between the two is omitted, the structure is simple, and the cost of the pumping system is greatly reduced.
  • the titanium target is cooled for a period of time before the vacuum chamber is exposed to the atmosphere, thereby reducing the oxidation loss on the surface of the titanium target and increasing the service life of the titanium target. This makes the pumping system extremely cost-effective.
  • the air extraction system provided by the embodiment of the present invention includes an arc titanium pump 12 and a vacuum chamber 13 , and the arc titanium pump 12 directly communicates with the vacuum chamber 13 .
  • the high vacuum valve between the arc titanium pump 12 and the vacuum chamber 13 can be omitted, and the structure is simple, which greatly reduces the total cost of the pumping system.
  • the titanium chamber of the arc titanium pump 12 is cooled for a period of time before the vacuum chamber 13 is exposed to the atmosphere, thereby reducing the oxidation loss on the surface of the titanium target and improving The service life of the titanium target. This makes the pumping system extremely cost-effective.
  • cooling the titanium target by the cooling member of the arc titanium pump 12 is convenient and quick.
  • the cooling time of the titanium target is preferably 10 to 300 seconds, and the time is short, which has little influence on production.
  • the arc titanium pump includes a set of cathode arc sources 1 and a gas main trap plate 2 located directly in front of the cathode arc source 1.
  • the distance between the cathode arc source 1 and the gas main collecting plate 2 is sufficiently large, preferably 200 to 400 mm, so that the particles evaporated by the cathode arc source 1 will be deposited on the gas main collecting plate 2 as a whole.
  • the surface has good film uniformity, which is beneficial to increase the adsorption probability of the titanium film, so that the arc titanium pump has a high pumping speed.
  • the cathode arc source 1 in the embodiment of the present invention includes a cooling member, a magnetic member (not shown), and a plate-shaped titanium target 11 disposed in front of the electromagnetic member, the gas main collecting plate 2 being parallel to the titanium target 11.
  • the energy of the arc discharge is used to evaporate the titanium target material to the gas main collecting plate 2 to form a thin layer of active atoms for adsorbing gas molecules, thereby achieving pumping.
  • the titanium target 11 described herein may be made of other metals or alloys that are chemically active, such as titanium aluminum alloys.
  • the arc titanium pump has a housing 3.
  • the gas main collecting plate 2 is disposed on the inner wall of the titanium pump casing opposite to the titanium target 11, and the remaining titanium pump casing inner wall serves as a gas-assisted collecting plate 4 to enhance the utilization of the titanium material.
  • a separate gas-assisted trap plate 4 can also be provided on the inner wall of the titanium pump housing for replacement and maintenance of the arc-titanium pump.
  • the surface of the gas main trap plate 2 and/or the gas-assisted trap plate 4 has a concave-convex shape, such as a sawtooth surface, a corrugated surface or other non-planar surface, thus increasing the effective trapping area and increasing the adsorption probability of the gas trap plate. Increase the utilization rate of titanium film by more than 25%, and reduce the cost of the arc arc pump.
  • the gas main collecting plate 2 and/or the gas auxiliary collecting plate 4 is provided with a cooling member 5 for lowering the temperature thereof, and the cooling member 5 may be a cooling water jacket or cooling. pipeline.
  • the serrations or corrugations run perpendicular to the pump port, which facilitates the removal of the spent titanium film.
  • a dust shield 6 that doubles as a gas-assisted trap plate is provided at the pump port of the arc-titanium pump.
  • the dust shield 6 is preferably a louver type dust shield composed of a plurality of blades 61.
  • the louver type dust shield may be installed vertically or horizontally.
  • the width of the blade 61 is preferably 0.8 to 2 times the pitch of the adjacent blades, and the inclination angle of the blade is preferably 30 to 60°, so that it is difficult for the dust to enter the vacuum chamber.
  • double-layer or multi-layer dust shields can be used.
  • the blades of the adjacent dust shields are inclined in opposite directions.
  • a cooling member 5 such as a cooling water jacket or a cooling duct is disposed at the dust shield 6.
  • the arc titanium pump provided by the embodiment of the invention comprises two sets of cathode arc source 7 and two gas main collecting plates 8, and the two gas main collecting plates 8 are disposed on opposite sets of cathodes.
  • the cathode arc source 7 is in one-to-one correspondence with the gas main collecting plate 8, and the distance between the two is relatively large, preferably 200 to 400 mm, so that the titanium film deposited on the gas main collecting plate 8 is uniform. It is beneficial to increase the adsorption probability of the titanium film.
  • the pumping speed of the arc arc pump is increased by about 40% compared to a conventional arc titanium pump of the same size.
  • the casing inner wall 3 of the arc titanium pump is used as a gas-assisted collecting plate.
  • the surface of the gas main collecting plate 8 may be a flat surface or a non-planar surface, for example, a sawtooth surface or a corrugated surface, so that the pumping speed of the arc arc pump can be further improved.
  • a cooling duct 10 may be disposed between the two gas main collecting plates 8 to increase the adsorption probability of the gas molecules by the two trap plates.
  • the gas main collecting plate 15 is formed by arranging a plurality of mutually parallel sub-boards 16 as shown in FIG.
  • the ratio of the width of the sub-board 16 to the spacing of the adjacent sub-boards is preferably 1.4 to 3 times, and the inclination angle of the sub-board 16 is preferably 40 to 75 degrees.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Abstract

L'invention concerne un système de dégonflage et une technologie associée. Le système de dégonflage comprend une pompe à arc électrique en titane (12) et une chambre à vide (13) et la pompe à arc électrique en titane (12) est en communication directe avec la chambre à vide. De ce fait, on peut éliminer une vanne à vide poussé entre la pompe à arc électrique en titane (12) et la chambre à vide (13), ainsi la structure est simple et on peut réduire le coût du système de dégonflage. Selon le système de dégonflage, après la fin de l'action de dégonflage de la pompe à arc électrique en titane (12) et avant l'exposition de la chambre à vide (13) à l'air, une cible en titane est refroidie pendant un certain temps afin de réduire les pertes par oxydation sur la surface de la cible en titane et de prolonger la durée de vie de la cible en titane.
PCT/CN2013/076219 2012-05-29 2013-05-24 Système de dégonflage et technologie associée WO2013178040A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201210170072.1A CN102691640B (zh) 2012-05-29 2012-05-29 一种抽气系统及工艺
CN201210170072.1 2012-05-29

Publications (1)

Publication Number Publication Date
WO2013178040A1 true WO2013178040A1 (fr) 2013-12-05

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PCT/CN2013/076219 WO2013178040A1 (fr) 2012-05-29 2013-05-24 Système de dégonflage et technologie associée

Country Status (2)

Country Link
CN (1) CN102691640B (fr)
WO (1) WO2013178040A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102691640B (zh) * 2012-05-29 2015-12-02 储琦 一种抽气系统及工艺
CN103320752B (zh) * 2013-06-19 2016-02-03 储琦 蒸发镀膜设备及其抽气工艺
CN103290388B (zh) * 2013-06-19 2016-02-03 储昕 等离子体镀膜设备及其抽气工艺
CN103291586B (zh) * 2013-06-19 2016-03-30 储继国 真空炉抽气系统及其抽气工艺
CN104100492B (zh) * 2014-07-17 2017-07-25 储继国 高真空电弧泵及其抽气机组

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU528386A1 (ru) * 1975-07-07 1976-09-15 Предприятие П/Я В-8495 Сорбционный вакуумный насос
JPH08232840A (ja) * 1995-02-22 1996-09-10 Osaka Shinku Kiki Seisakusho:Kk 極高真空ポンプ系
CN2239511Y (zh) * 1995-10-24 1996-11-06 袁哲 真空电弧钛泵
CN101936278A (zh) * 2010-09-13 2011-01-05 储继国 一种电弧钛泵及包括该电弧钛泵的真空抽气机组
CN201891569U (zh) * 2010-11-26 2011-07-06 黄瑞安 一种真空电弧钛泵
CN102691640A (zh) * 2012-05-29 2012-09-26 储琦 一种抽气系统及工艺

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2750248B1 (fr) * 1996-06-19 1998-08-28 Org Europeene De Rech Dispositif de pompage par getter non evaporable et procede de mise en oeuvre de ce getter
DE10241549B4 (de) * 2002-09-05 2004-07-22 Nawotec Gmbh Orbitron-Pumpe
CN101776063B (zh) * 2010-01-21 2012-01-04 储继国 大型高真空抽气机组

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU528386A1 (ru) * 1975-07-07 1976-09-15 Предприятие П/Я В-8495 Сорбционный вакуумный насос
JPH08232840A (ja) * 1995-02-22 1996-09-10 Osaka Shinku Kiki Seisakusho:Kk 極高真空ポンプ系
CN2239511Y (zh) * 1995-10-24 1996-11-06 袁哲 真空电弧钛泵
CN101936278A (zh) * 2010-09-13 2011-01-05 储继国 一种电弧钛泵及包括该电弧钛泵的真空抽气机组
CN201891569U (zh) * 2010-11-26 2011-07-06 黄瑞安 一种真空电弧钛泵
CN102691640A (zh) * 2012-05-29 2012-09-26 储琦 一种抽气系统及工艺

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CN102691640A (zh) 2012-09-26

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