WO2013156737A1 - Procede de fabrication d'un bain electrolytique pour la realisation d'une sous-couche metallique a base de platine sur un substrat metallique - Google Patents
Procede de fabrication d'un bain electrolytique pour la realisation d'une sous-couche metallique a base de platine sur un substrat metallique Download PDFInfo
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- WO2013156737A1 WO2013156737A1 PCT/FR2013/050855 FR2013050855W WO2013156737A1 WO 2013156737 A1 WO2013156737 A1 WO 2013156737A1 FR 2013050855 W FR2013050855 W FR 2013050855W WO 2013156737 A1 WO2013156737 A1 WO 2013156737A1
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- WIPO (PCT)
- Prior art keywords
- solution
- platinum
- electrolytic bath
- salt
- hpo
- Prior art date
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 title claims abstract description 93
- 229910052697 platinum Inorganic materials 0.000 title claims abstract description 47
- 239000000758 substrate Substances 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims abstract description 16
- 230000008569 process Effects 0.000 title claims abstract description 5
- 239000000243 solution Substances 0.000 claims abstract description 69
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 66
- 229910052751 metal Inorganic materials 0.000 claims abstract description 30
- 239000002184 metal Substances 0.000 claims abstract description 30
- 239000003446 ligand Substances 0.000 claims abstract description 16
- 150000003839 salts Chemical class 0.000 claims abstract description 15
- 239000007864 aqueous solution Substances 0.000 claims abstract description 14
- 150000001875 compounds Chemical class 0.000 claims abstract description 6
- 239000002253 acid Substances 0.000 claims abstract description 4
- 239000007853 buffer solution Substances 0.000 claims abstract description 4
- 150000003057 platinum Chemical class 0.000 claims description 22
- 238000007254 oxidation reaction Methods 0.000 claims description 21
- 230000003647 oxidation Effects 0.000 claims description 20
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 claims description 12
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 claims description 10
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 claims description 10
- 229910000388 diammonium phosphate Inorganic materials 0.000 claims description 10
- 235000019838 diammonium phosphate Nutrition 0.000 claims description 10
- 235000019837 monoammonium phosphate Nutrition 0.000 claims description 10
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims description 8
- -1 platinum amine Chemical class 0.000 claims description 7
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 7
- 238000009713 electroplating Methods 0.000 claims description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- GNFTZDOKVXKIBK-UHFFFAOYSA-N 3-(2-methoxyethoxy)benzohydrazide Chemical compound COCCOC1=CC=CC(C(=O)NN)=C1 GNFTZDOKVXKIBK-UHFFFAOYSA-N 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- 101100283604 Caenorhabditis elegans pigk-1 gene Proteins 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-M dihydrogenphosphate Chemical compound OP(O)([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-M 0.000 claims 1
- 229910000601 superalloy Inorganic materials 0.000 abstract description 9
- 230000004888 barrier function Effects 0.000 abstract description 6
- 125000003277 amino group Chemical group 0.000 abstract description 2
- 150000001412 amines Chemical class 0.000 abstract 2
- 238000000151 deposition Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 15
- 230000008021 deposition Effects 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- 239000000126 substance Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- 239000000919 ceramic Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 229910000951 Aluminide Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-L Phosphate ion(2-) Chemical compound OP([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-L 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000907 nickel aluminide Inorganic materials 0.000 description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- ZNZJJSYHZBXQSM-UHFFFAOYSA-N propane-2,2-diamine Chemical class CC(C)(N)N ZNZJJSYHZBXQSM-UHFFFAOYSA-N 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- 241000920340 Pion Species 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000005700 Putrescine Substances 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- BIGPRXCJEDHCLP-UHFFFAOYSA-N ammonium bisulfate Chemical compound [NH4+].OS([O-])(=O)=O BIGPRXCJEDHCLP-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 150000005829 chemical entities Chemical class 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- PCLURTMBFDTLSK-UHFFFAOYSA-N nickel platinum Chemical class [Ni].[Pt] PCLURTMBFDTLSK-UHFFFAOYSA-N 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010891 toxic waste Substances 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
Definitions
- the invention relates to a method of manufacturing an electrolytic bath for producing a platinum-based metal underlayer on a metal substrate.
- Such metal sub-layers belong in particular to a coating on a substrate consisting of a metal part called to withstand high mechanical and thermal stresses in operation, in particular a superalloy substrate.
- a thermomechanical part constitutes in particular an aeronautical or terrestrial turbine engine part. Said part may for example be a blade or a turbomachine turbine distributor and in particular in a high-pressure turbojet or turboprop turboprop turbine.
- the limit temperature of use of the superalloys is of the order of 1100 ° C, the temperature of the gases at the outlet of the combustion chamber or turbine inlet up to 1600 ° C.
- thermal barriers in aircraft engines has become widespread over the last thirty years and makes it possible to increase the inlet temperature of the gases in the turbines, to reduce the cooling air flow and thus improve the efficiency of the engines.
- this insulating coating makes it possible to create on a cooled part, in steady state of operation, a thermal gradient through the coating, whose total amplitude can exceed 100 ° C for a coating of about 150 to 200 ⁇ m in thickness. having a conductivity of 1.1 Wm ⁇ .K "1.
- the operating temperature of the underlying metal forming the substrate for the coating is decreased by the same gradient, which leads to significant gains in the required cooling air volume, the service life of the part and the specific consumption of the turbine engine.
- a thermal barrier comprising a yttria-stabilized zirconia-based ceramic layer, namely a yttria-containing zirconia comprising a molar content of yttrium oxide between 4 and 12% (especially between 6 and 8%), which has a coefficient of expansion different from the superalloy constituting the substrate and a relatively low thermal conductivity.
- zirconia-based ceramic layer partially stabilized with yttrium oxide for example Zr0.92YO.0eO1.96.
- a metal underlayer with a coefficient of expansion ideally close to the substrate, is generally interposed between the substrate of the part and the ceramic layer.
- the metal sub-layer firstly makes it possible to reduce the stresses due to the difference between the thermal expansion coefficients of the ceramic layer and the superalloy forming the substrate.
- This underlayer also provides adhesion between the substrate of the part and the ceramic layer, knowing that the adhesion between the underlayer and the substrate of the part is by inter-diffusion, and that the adhesion between the underlayer and the ceramic layer is made by mechanical anchoring and by the propensity of the underlayer to be developed at high temperature, at the ceramic / underlayer interface, a thin oxide layer which ensures the chemical contact with ceramics.
- this metal sub-layer ensures the protection of the superalloy of the part against corrosion and oxidation phenomena (the ceramic layer is permeable to oxygen).
- a sublayer consisting of a nickel aluminide comprising a metal selected from platinum, chromium, palladium, ruthenium, iridium, osmium, rhodium, or mixture of these metals and / or a reactive element selected from zirconium (Zr), cerium (Ce), lanthanum (La), titanium (Ti), tantalum (Ta), hafnium (Hf), silicon (Si) and yttrium (Y).
- Zr zirconium
- Ce cerium
- La lanthanum
- Ti titanium
- Ta tantalum
- Hf hafnium
- Si silicon
- Y yttrium
- a (Ni, Pt) Al type coating is used in which the platinum is inserted into the nickel network of the ⁇ - ⁇ intermetallic compounds.
- platinum When developing thermal barriers, platinum has a dual role: it is a diffusion barrier to prevent the diffusion of aluminum from the layer to the substrate.
- platinum aluminide increases the corrosion resistance at high temperature and the adhesion of protective layers.
- platinum aluminide coatings rapidly degrade at 1100 ° C: there are phase transformations related to the inter-diffusion of the elements of the coating and the substrates.
- This metal sub-layer may in this case consist of a nickel-modified platinum nickel aluminide NiPtAI, according to a process comprising the following steps: the preparation of the surface of the workpiece by chemical etching and sandblasting; depositing on the part, by electrolysis, a platinum coating (Pt); the possible heat treatment of the assembly to diffuse Pt in the room; aluminum deposition (Al) by chemical vapor deposition (CVD) or physical vapor deposition (PVD); the possible heat treatment of the assembly to diffuse Pt and Al in the room; preparing the surface of the formed metallic underlayer; and electron beam evaporation (EB-PVD) deposition of a ceramic coating.
- Pt platinum coating
- Al aluminum deposition
- CVD chemical vapor deposition
- PVD physical vapor deposition
- EB-PVD electron beam evaporation
- the platinum is deposited electrolytically before the thermochemical treatment of aluminization in the vapor phase.
- electroplating reduces a complexed metal entity initially present in the solution by passing an electric current over a conductive part (the cathode). between an anode (electrode seat of an oxidation reaction) and a cathode on which deposition takes place (and on which other reduction reactions can take place simultaneously).
- the pH of these solutions can be basic, acidic or neutral.
- the compounds obtained at the end of platinum extraction are ammonium hexachloroplatinate (IV): (NH 4 ) 2 PtCl 6 or potassium hexachloroplatinate (IV): K 2 PtCl 6 .
- the main platinum compounds present in the casting baths are derived from the transformation of these compounds.
- the present invention aims to provide an electrolytic bath for the deposition of platinum on a metal substrate, which electrolytic bath has an improvement in technical performance, including identical or almost identical parameters and deposition conditions regardless of the geometry of the piece, an identical or almost identical deposition rate regardless of the current density applied, a deposition quality in accordance with the specifications, and an improved service life.
- the method of manufacturing an electrolytic bath is characterized in that it comprises the following steps :
- a complex resulting from the bond between an amino ligand and a platinum metal salt is preferred.
- a ligand without a carbon chain and a single amine functional group: NH 3 (ammonia) or a salt xNH 4 + or an X-NH 2 ammonium) has been chosen, or X is chosen either as an inert molecule, a spectator of the main reaction is as an interacting molecule in formulation reactions.
- the metal salt of the third system is chosen from platinum salts of oxidation state IV.
- This solution also has the additional advantage of allowing, in addition, the use of platinum salts of oxidation degree IV, which are much more stable than the platinum salts of oxidation state IL.
- the first system, the second system and the fourth system are grouped into a single solution forming a first solution B.
- the third system forms a second solution A consisting of an aqueous solution with platinum, comprising sodium hydroxide (NaOH) and at least one platinum salt of degree of oxidation IV.
- a second solution A consisting of an aqueous solution with platinum, comprising sodium hydroxide (NaOH) and at least one platinum salt of degree of oxidation IV.
- the molar ratio between the amount of sodium hydroxide NaOH and the amount of platinum salt of oxidation degree IV is 2.
- the third system forms a second solution A consisting of an aqueous solution with platinum, comprising sodium hydroxide (NaOH) and at least one platinum salt with a degree of oxidation IV, and in step e), the following sub-steps are carried out:
- the first solution B is covered and its temperature is raised to at least 50 ° C for at least 1H30,
- a step f) is carried out during which said electrolytic bath is heated at a temperature of between 80 ° C. and 97 ° C. for at least two hours.
- a step g) is carried out during which electroplating of a platinum deposit on a metal substrate is carried out with said electrolytic bath.
- the second solution A is added to the first solution B.
- the first solution B is brought to a temperature of 60 ° C.
- said oxidation state platinum salt IV is diammonium hexachloroplatinate of formula (NH 4 ) 2 PtCl 6 .
- said amine compound x p " (NH 4 ) + p comprises diammonium hydrogenophosphate (NH 4 ) 2 HPO 4 and / or ammonium dihydrogen phosphate NH 4 H 2 PO 4 .
- the first system comprises diammonium hydrogenophosphate (NH 4 ) 2 HPO 4 and ammonium dihydrogen phosphate NH 4 H 2 PO 4 with a molar ratio of 2 between the amount of ammonium dihydrogen phosphate NH 4 H 2 PO 4 and the amount of diammonium hydrogen phosphate (NH 4 ) 2 HPO 4 .
- the first solution B supplied in step a) is obtained with water having a temperature of the order of 30 ° C.
- the second solution A supplied in stage c) is obtained with water having a temperature of the order of 45.degree.
- step b) the temperature of the first solution B is raised to at least 50 ° C. for at least 3 hours 30 minutes;
- said electrolytic bath is heated to a temperature of at least 80 ° C. for at least three hours (for example at 85 ° C. for 3 hours).
- the present invention also relates to a process for manufacturing a platinum-based metal underlayer from the electrolytic bath obtained according to the manufacturing method which has just been described, characterized in that it comprises the following steps :
- the present invention also relates to a set of solutions for the manufacture of an electrolytic bath for producing a platinum-based metal underlayer on a metal substrate, characterized in that it comprises:
- a first solution B consisting of an aqueous solution with an amino ligand, comprising at least one compound X- (NH 2 ) n , with X belonging to the group consisting of (CH 3 , CH 3 -CH 2 , CH 3 - (CH 2) 2 ) m ), or NH 3 or a salt x p " (NH 4 ) + P having one or more amino functions and with x acid radical belonging to the group consisting of (PO 4 3- ", HPO 4 2 ⁇ , H 2 PO 4 ⁇ , HP0 4 2" H2PO4 ", S0 4 2", HSO 4 ", HS04" and H 2 SO 4, CH 3 COO " , CH 3 COOH, CH 3 COOH and CH 3 COO " ), or H 2 SO 4 , or CH 3 COOH, n, m and p being non-zero integers, and
- a second solution A consisting of an aqueous solution with platinum, comprising sodium hydroxide (NaOH) and at least one platinum salt of oxidation degree IV.
- said platinum salt of oxidation state IV is diammonium hexachloroplatinate of formula ( ⁇ 4 ) 2 ⁇ 0 6 .
- the molar ratio between the amount of sodium hydroxide NaOH and the amount of platinum salt of oxidation degree IV is 2.
- said amine compound x p ⁇ (NH 4 ) + p comprises diammonium hydrogen phosphate (NH 4 ) 2 HPO 4 and / or ammonium dihydrogen phosphate NH 4 H 2 PO 4 .
- the first solution B comprises diammonium hydrogen phosphate (NH 4 ) 2HPO 4 and ammonium dihydrogen phosphate NH 4 H 2 PO 4 with a molar ratio of 2 between the amount of ammonium dihydrogenophosphate NH 4 H 2 PO 4 4 and the amount of diammonium hydrogen phosphate (NH 4 ) 2 HPO 4 .
- the invention also relates to the electrolytic bath resulting from the manufacturing method according to the invention.
- Such an electrolytic bath for producing a platinum-based metal underlayer on a superalloying substrate is characterized in that it comprises a platinum amine complex of the wavelength of a Pt-NH bond. 3 or Pt-NH 2 and a buffer solution
- FIG. 1A to II, 2A and 2B show different curves showing the characteristics and behavior of different electrolytic baths manufactured according to the manufacturing method of the invention.
- An electrolytic bath makes it possible to deposit the platinum in a way which is particularly ecological and economical (short time of realization, realization under atmospheric pressure avoiding the equipment of putting under vacuum) compared to techniques of deposition in vapor phase or thermal projection.
- this deposition method is compatible with pierced parts: the geometry of the current lines preventing significant deposition in the holes, in particular small cooling holes which are thus not obstructed.
- the bath formulation is made from four ingredients distributed between two separate solutions, A and B, heated and stirred separately to react the ingredients together in each solution, before mixing together the two solutions A and B.
- the mixture between the two solutions A and B is then itself heated and stirred. Once the heating time of the mixture A + B is respected, the platinum plating bath is ready for use for carrying out the electroplating.
- solution A comprises, inter alia, the platinum salt (s)
- solution B is the solution comprising, inter alia, ligands (it is recalled that a ligand is a chemical entity, ionic or molecular, bearing chemical functions allowing it to bind to one or more metallic entities, usually a cation, the association of a metallic entity with one or more ligands forming a soluble edifice in solution called complex).
- solution A in 300 ml of distilled water at 45 ° C., put 5 g of sodium hydroxide of the chemical formula NaOH (ie 0.080 mole) and 18.3 g of diammonium hexachloroplatinate platinum salt of formula (NH 4 ) 2 PtCl 6 (ie 0.040 moles).
- the molar ratio between the amount of sodium hydroxide and diammonium hexachloroplatinate salt is 2. Let the platinum salts dissolve in solution A;
- solution A is prepared and is added to solution B previously heated to 60 ° C.
- the mixture A + B (whose pH is previously adjusted to 6.3 by adding a basic solution such as, for example, sodium hydroxide, potassium hydroxide, sodium triphosphate) is raised to 85 ° C for 3 hours. All solutions are covered during the heating stages.
- a basic solution such as, for example, sodium hydroxide, potassium hydroxide, sodium triphosphate
- the pH of the mixture of solutions A + B is set between 6 and 10 and preferably between 6 and 7.
- pions are coated with platinum at different intensities. Each pawn is weighed before and after deposit.
- the bath of test 2 offers the following advantages: It is a bath whose high repeatability has been observed, and which compared to a reference bath, the average deposition rate is important for a new bath ( Figure lA), and remains sufficiently important during operation ( Figure lA).
- the bath of the test 2 is indeed repeatable because the curves of the average speed and the dispersion of the fabrications 1 and 2 are superimposable, which shows the extreme reproducibility of the manufacture.
- the bath of test 2 has a good plateau dispersion (FIG.
- the bath of the test 2 has little loss of platinum over time (Figure 1 C) and that the average efficiency (Figure 2A) and the speed (Figure 2B) of the bath is almost identical after three successive regenerations.
- Concerning the platinum losses we encounter with the reference bath many platinum losses, mainly in the form of a platinum solid precipitate at the bottom of the tank.
- the baths according to the invention that the platinum losses are lower and above all constant in time (constant with the electrolyses).
- the bath of test 2 is the one with less platinum losses, so the bath of test 2 is more economical from the economic point of view.
- the baths of tests 4 and 7 offer results quite similar to those of test 2.
- the electrolytic bath of test 2 gives stable results over time, in terms of deposition rate, and after several regenerations of the bath: the speed of deposit is almost unchanged between the first and the third regeneration.
- To regenerate a bath we add platinum salts in the bath to enhance its platinum content. Once the salts have been added, the bath is left stirring at 65 ° C. for 12 to 24 hours so that all the salts are dissolved in the bath.
- the manufacture of the electrolytic bath is similar to that of the recipe of Example 1, except for the following points.
- Solution B contains ammonium hydrogen sulphate of chemical formula (NH 4 ) 2 SO 4 in an amount of 43.5 g and diammonium sulphate of chemical formula NH 4 S O 4 in an amount of 76 g and water . The whole is brought to 50 ° C during 4:30.
- the manufacture of the electrolytic bath is similar to that of the recipe of Example 1, except for the following points.
- Solution B contains ammonium acetate of chemical formula CH 3 COONH 4 in an amount of 102.4 g and acetic acid of chemical formula CH 3 COOH in an amount of 39.6 g.
- the whole is brought to 50 ° C during 4:30.
- the pH of the mixture of solutions A + B is set between 1 and 5.
- the ligand is chosen from aliphatic polyamines of 3 to 20 carbon atoms with a linear or branched carbon chain.
- the ligand is chosen from primary polyamines such as diaminopropanes such as 1,3-diaminopropane and 1,2-diaminopropane, diethylenetriamine, 1,4-diaminobutane and 1,6-diaminohexane; secondary polyamines such as ⁇ , ⁇ 'dimethyl-1,3-propanediamine; and tertiary polyamines such as N, N, N ', N' tetramethylethylenediamine.
- the ligands preferentially chosen are diaminopropanes.
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Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
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US14/395,190 US9752243B2 (en) | 2012-04-19 | 2013-04-18 | Method of fabricating a bath of electrolyte for plating a platinum-based metallic underlayer on a metallic substrate |
BR112014026033-8A BR112014026033B1 (pt) | 2012-04-19 | 2013-04-18 | Metodo de fabricaqao para fabricar um banho de eletrolito |
IN8735DEN2014 IN2014DN08735A (en, 2012) | 2012-04-19 | 2013-04-18 | |
CA2870760A CA2870760C (fr) | 2012-04-19 | 2013-04-18 | Procede de fabrication d'un bain electrolytique pour la realisation d'une sous-couche metallique a base de platine sur un substrat metallique |
EP13722499.4A EP2839059B1 (fr) | 2012-04-19 | 2013-04-18 | Procédé de fabrication d'un bain électrolytique pour la réalisation d'une sous-couche métallique à base de platine sur un substrat métallique. |
CN201380023550.9A CN104271811B (zh) | 2012-04-19 | 2013-04-18 | 一种在金属基体上电镀铂基金属底层的电解浴的制备方法 |
JP2015506292A JP6290179B2 (ja) | 2012-04-19 | 2013-04-18 | 金属基材上にプラチナ系金属基層をめっきするための電解質の浴を製造する方法 |
RU2014146284A RU2625923C2 (ru) | 2012-04-19 | 2013-04-18 | Способ изготовления ванны электролита для нанесения металлического грунтового слоя на основе платины на металлический субстрат |
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FR1253599 | 2012-04-19 | ||
FR1253599A FR2989694B1 (fr) | 2012-04-19 | 2012-04-19 | Procede de fabrication d'un bain electrolytique pour la realisation d'une sous-couche metallique a base de platine sur un substrat metallique |
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US (1) | US9752243B2 (en, 2012) |
EP (1) | EP2839059B1 (en, 2012) |
JP (1) | JP6290179B2 (en, 2012) |
CN (1) | CN104271811B (en, 2012) |
BR (1) | BR112014026033B1 (en, 2012) |
CA (1) | CA2870760C (en, 2012) |
FR (1) | FR2989694B1 (en, 2012) |
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CN104975312A (zh) * | 2015-07-30 | 2015-10-14 | 江苏金曼科技有限责任公司 | 一种延长镀液使用寿命的电镀方法 |
FR3058165B1 (fr) | 2016-10-27 | 2018-12-14 | Safran Aircraft Engines | Procede et dispositif de regeneration de bain de platine |
FR3066505B1 (fr) | 2017-05-16 | 2021-04-09 | Safran Aircraft Engines | Procede et dispositif ameliores de filtration de bain de platine par electrodialyse |
CN110894617A (zh) * | 2018-09-13 | 2020-03-20 | 深圳市永达锐国际科技有限公司 | 3d铂金电铸工艺方法 |
CN114214685A (zh) * | 2021-09-22 | 2022-03-22 | 湘潭大学 | 高温防护涂层及其制备方法与应用 |
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US4427502A (en) * | 1981-11-16 | 1984-01-24 | Bell Telephone Laboratories, Incorporated | Platinum and platinum alloy electroplating baths and processes |
EP0465073A1 (en) * | 1990-06-29 | 1992-01-08 | Electroplating Engineers of Japan Limited | Platinum electroforming and platinum electroplating |
GB2351089A (en) * | 1999-06-15 | 2000-12-20 | Hong Kong Productivity Council | Platinum electroforming/electroplating using haloplatinics |
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NL124423C (en, 2012) * | 1963-03-20 | |||
US3285839A (en) * | 1963-12-16 | 1966-11-15 | American Chem & Refining Co | Method and bath for electroplating rhenium |
GB1431548A (en) * | 1972-09-21 | 1976-04-07 | Engelhard Ind Ltd | Electrodeposition of plantinum |
US4182724A (en) * | 1976-04-06 | 1980-01-08 | Rustenburg Platinum Mines Limited | Compositions containing platinum |
SU707382A1 (ru) * | 1978-05-30 | 2000-06-20 | Р.В. Джагацпанян | Электролит платинирования |
SU954527A1 (ru) * | 1980-12-30 | 1982-08-30 | Предприятие П/Я В-2287 | Электролит дл платинировани титана |
GB8821005D0 (en) * | 1988-09-07 | 1988-10-05 | Johnson Matthey Plc | Improvements in plating |
US5041196A (en) * | 1989-12-26 | 1991-08-20 | Olin Corporation | Electrochemical method for producing chlorine dioxide solutions |
JP2577832B2 (ja) * | 1990-06-29 | 1997-02-05 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 白金電鋳浴 |
JPH04333589A (ja) * | 1990-06-29 | 1992-11-20 | Electroplating Eng Of Japan Co | 高硬度白金材料の製造方法及びその高硬度白金材料 |
US5788823A (en) * | 1996-07-23 | 1998-08-04 | Howmet Research Corporation | Platinum modified aluminide diffusion coating and method |
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Patent Citations (3)
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US4427502A (en) * | 1981-11-16 | 1984-01-24 | Bell Telephone Laboratories, Incorporated | Platinum and platinum alloy electroplating baths and processes |
EP0465073A1 (en) * | 1990-06-29 | 1992-01-08 | Electroplating Engineers of Japan Limited | Platinum electroforming and platinum electroplating |
GB2351089A (en) * | 1999-06-15 | 2000-12-20 | Hong Kong Productivity Council | Platinum electroforming/electroplating using haloplatinics |
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US20150075996A1 (en) | 2015-03-19 |
US9752243B2 (en) | 2017-09-05 |
IN2014DN08735A (en, 2012) | 2015-05-22 |
CA2870760C (fr) | 2021-02-23 |
RU2625923C2 (ru) | 2017-07-19 |
FR2989694B1 (fr) | 2015-02-27 |
EP2839059B1 (fr) | 2016-04-13 |
CA2870760A1 (fr) | 2013-10-24 |
BR112014026033B1 (pt) | 2020-11-24 |
BR112014026033A2 (pt) | 2017-06-27 |
CN104271811A (zh) | 2015-01-07 |
RU2014146284A (ru) | 2016-06-10 |
FR2989694A1 (fr) | 2013-10-25 |
EP2839059A1 (fr) | 2015-02-25 |
JP6290179B2 (ja) | 2018-03-07 |
JP2015514873A (ja) | 2015-05-21 |
CN104271811B (zh) | 2016-10-12 |
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