WO2013099594A1 - 基板処理装置および基板処理方法 - Google Patents

基板処理装置および基板処理方法 Download PDF

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Publication number
WO2013099594A1
WO2013099594A1 PCT/JP2012/082102 JP2012082102W WO2013099594A1 WO 2013099594 A1 WO2013099594 A1 WO 2013099594A1 JP 2012082102 W JP2012082102 W JP 2012082102W WO 2013099594 A1 WO2013099594 A1 WO 2013099594A1
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WO
WIPO (PCT)
Prior art keywords
substrate
opening
upper opening
processing
plate
Prior art date
Application number
PCT/JP2012/082102
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English (en)
French (fr)
Japanese (ja)
Inventor
友明 相原
一郎 光吉
前川　直嗣
慶一 土谷
Original Assignee
大日本スクリーン製造株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 大日本スクリーン製造株式会社 filed Critical 大日本スクリーン製造株式会社
Priority to KR1020147018428A priority Critical patent/KR101919183B1/ko
Priority to CN201280063629.XA priority patent/CN103999196B/zh
Publication of WO2013099594A1 publication Critical patent/WO2013099594A1/ja

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels

Definitions

  • the present invention relates to a substrate processing apparatus and a substrate processing method for processing a substrate.
  • a substrate processing apparatus for processing a substrate using a processing solution such as pure water or a chemical solution has been used.
  • a processing solution such as pure water or a chemical solution
  • the substrate processing apparatuses are in an upright state arranged in parallel to each other.
  • a plurality of substrates are disposed in the processing tank, and the processing with the processing liquid is collectively performed on the plurality of substrates.
  • Japanese Patent Laid-Open No. 2000-150609 discloses a substrate carry-in / out device.
  • the substrate carry-in / out device includes a placement unit for placing a pod containing a substrate, and a transfer for transferring the substrate from the pod. A part.
  • the placement unit includes a plurality of placement units, and each placement unit is detachably attached to the transfer unit. When carrying out repair / maintenance of the mounting unit, the mounting unit is removed from the transfer unit, and the region of the transfer unit where the mounting unit is mounted is shielded by the roll sheet.
  • the upper opening of the processing tank is closed in order to prevent the processing liquid from scattering and the processing liquid atmosphere from being diffused.
  • a pair of hinged doors arranged on the left half and the right half of the upper opening, respectively, and a mechanism that opens and closes the upper opening by rotating the hinges provided at the left and right ends of the upper opening in opposite directions so-called It is conceivable that the upper opening is closed at the time of processing by adopting a mechanism having a door-like structure), but such a mechanism requires a space for the hinged door to pass along with opening and closing of the upper opening,
  • the substrate processing apparatus is substantially increased in size.
  • the present invention is directed to a substrate processing apparatus and aims to reduce the size of the substrate processing apparatus.
  • a substrate processing apparatus includes a processing tank that processes a substrate with a processing solution and has an upper opening, and a pair of rolls around which both ends of a continuous sheet-like or bellows-like continuous member are wound.
  • An intermediate portion that is a portion of the continuous member between the pair of rolls is disposed in parallel to the opening surface of the upper opening in the vicinity of the upper opening, and the intermediate portion is rotated by rotating the pair of rolls.
  • the substrate between the cover that moves along the opening surface, the support that supports the substrate in an upright state at least in the processing bath, and the processing position in the processing bath and the retreat position outside the processing bath.
  • a passage opening which is an opening in the continuous member, is formed, and when the substrate is raised and lowered between the processing position and the retracted position, the passage opening is connected to the true opening of the upper opening.
  • the substrate processing apparatus can be downsized.
  • the support portion supports a plurality of upright substrates arranged in parallel to each other from below, and a claw portion that is long in the front-rear direction perpendicular to the main surface of the plurality of substrates;
  • An end portion of the claw portion is fixed and a support main body extending upward from a fixing position of the claw portion, and the elevating portion provided outside the processing tank raises and lowers the support main body,
  • the intermediate portion moves in the front-rear direction, the edge of the passage opening is close to the support body, and the upper opening is substantially blocked by the continuous member.
  • the support body is a plate-like member that is long in the vertical direction and perpendicular to the front-rear direction, and when the substrate is processed in the processing tank, the front and rear of the passage port When the linear edge perpendicular to the direction approaches one main surface of the plate-like member, the portion on the one main surface side of the upper opening partitioned by the plate-like member is closed, and the substrate A processing apparatus is further provided with the shielding part which obstruct
  • diffusion of a processing liquid atmosphere can be suppressed more reliably.
  • the substrate processing apparatus may further include another cover portion that performs this.
  • the support body is a plate-like member that is long in the vertical direction and perpendicular to the front-rear direction, and when the substrate is processed in the processing tank, the front and rear of the passage port in the cover portion
  • the straight edge perpendicular to the direction approaches one main surface of the plate-like member, the portion of the upper opening partitioned by the plate-like member is closed,
  • the linear edge perpendicular to the front-rear direction of the passage opening of the continuous member in one cover portion approaches the other main surface of the plate-like member, whereby the upper opening partitioned by the plate-like member is formed.
  • the other main surface portion is closed. Thereby, scattering of a processing liquid and spreading
  • the present invention is also directed to a substrate processing method in a substrate processing apparatus.
  • FIG. 1 is a diagram showing an internal configuration of the substrate processing apparatus 1
  • FIG. 2 is a perspective view showing an external appearance of a part of the substrate processing apparatus 1.
  • the substrate processing apparatus 1 collectively performs processing with a processing liquid which is a chemical liquid such as pure water or hydrofluoric acid (HF) on a plurality of disk-shaped silicon substrates 9 (hereinafter simply referred to as “substrates 9”).
  • a processing liquid which is a chemical liquid such as pure water or hydrofluoric acid (HF) on a plurality of disk-shaped silicon substrates 9 (hereinafter simply referred to as “substrates 9”).
  • HF hydrofluoric acid
  • FIG. 1 and FIG. 2 two horizontal directions orthogonal to each other are shown as an X direction and a Y direction, and a vertical direction (gravity direction) perpendicular to the X direction and the Y direction is shown as a Z direction.
  • the substrate processing apparatus 1 accommodates a plurality of substrates 9 therein, stores a predetermined processing solution, and supports a processing tank 3 having an upper opening 30 and a plurality of upright substrates 9 arranged in parallel to each other.
  • substrate 9 are provided.
  • a plurality of treatment liquid nozzles 31 for ejecting a treatment liquid and a discharge valve 32 attached to the discharge port of the treatment tank 3 are provided in the treatment tank 3.
  • Various treatments such as washing and etching are performed by dipping.
  • the processing liquid nozzle 31 is connected to the processing liquid supply unit 33 through a supply pipe, and the discharge valve 32 is connected to the drainage processing unit 34 through a discharge pipe.
  • a plurality of types of processing liquids can be selectively supplied to the processing liquid nozzle 31.
  • An auxiliary tank 35 that receives the processing liquid overflowing from the processing tank 3 is provided around the upper portion of the processing tank 3, and a discharge port formed in the auxiliary tank 35 is also connected to the drainage processing unit 34 through a discharge pipe.
  • the support portion 4 includes a plurality of claw portions 41 that are long in a direction perpendicular to the main surfaces of the plurality of substrates 9 (the Y direction in FIG. 1 and hereinafter also referred to as “front-rear direction”), and a plurality of claw portions 41. And a support main body 42 that is a plate-like member extending upward from the fixing position of the claw portion 41.
  • the elevating unit 2 is provided outside the processing tank 3 and elevates and lowers the support body 42 in the vertical direction (Z direction) in FIG.
  • a plurality of upright substrates 9 that is, a plurality of substrates 9 aligned in the front-rear direction
  • the substrate 9 moves between a processing position in the processing tank 3 (position shown in FIG. 1) and a retracted position outside the processing tank 3 (above the processing tank 3).
  • the substrate processing apparatus 1 further includes a cover portion 5 that opens and closes the upper opening 30 of the processing tank 3.
  • the cover unit 5 includes a pair of rolls 51 and 52 around which both ends of a continuous sheet-like continuous member 50 are wound, and the pair of rolls 51 and 52 are arranged in the front-rear direction (Y direction). ) Are disposed so as to sandwich the processing tank 3 and the auxiliary tank 35 therebetween.
  • the continuous member 50 is formed of a fluororesin (for example, Teflon (registered trademark)) and has heat resistance and chemical resistance.
  • An intermediate portion 501 which is a part of the continuous member 50 between the pair of rolls 51 and 52, has an opening surface of the upper opening 30 in the vicinity of the upper opening 30 (that is, almost the entire upper end of the processing tank 3 forming the upper opening 30. (Inclusive plane).
  • the intermediate portion 501 has a size that covers the entire processing tank 3 and the auxiliary tank 35 except for a portion of a passage port 502 described later.
  • the rolls 51 and 52 are connected to motors 53 and 54 (for example, stepping motors and servomotors) shown in FIG. 3 described later.
  • the motors 53 and 54 that are driven in synchronization with each other rotate the rolls 51 and 52 in the same rotational direction, whereby the intermediate portion 501 moves in the front-rear direction along the opening surface of the upper opening 30.
  • the motors 53 and 54 are controlled so that a constant tension always acts.
  • the continuous member 50 is formed with a rectangular opening 502 along the X direction and the Y direction, and the outer edge (that is, four linear edges) of the opening 502 is formed of the support body 42 and the plurality of claw portions in a plan view. 41 and a plurality of substrates 9 are surrounded. As will be described later, the plurality of substrates 9 supported by the claw portion 41 passes through the opening 502 and is carried into or out of the processing tank 3. It is referred to as “passage port 502”.
  • FIG. 3 is a block diagram showing a functional configuration of the substrate processing apparatus 1.
  • the substrate processing apparatus 1 further includes a control unit 10 that controls each component.
  • the control unit 10 is also connected to the processing liquid supply unit 33 and the like.
  • FIG. 4 is a diagram showing a flow of operations in which the substrate processing apparatus 1 processes the substrate 9.
  • FIG. 5 is a diagram for explaining the operation of the substrate processing apparatus 1. 5, the cross section of the substrate processing apparatus 1 in a plane perpendicular to the longitudinal direction of the rolls 51 and 52 is shown in a simplified manner, and a passage port 502 in the continuous member 50 is shown by a broken line (FIGS. 6 to 13 described later). The same in).
  • Step S11 When the substrate processing apparatus 1 processes the substrate 9, first, by driving the motors 53 and 54, the passage port 502 in the continuous member 50 is disposed immediately above the upper opening 30 as shown in FIG. 5. (Step S11). Further, as shown by a two-dot chain line in FIG. 5, a plurality of upright substrates 9 are placed on the claw portion 41 disposed above the processing tank 3, and the support portion is supported by the elevating unit 2. When 4 is lowered, the plurality of substrates 9 pass through the passage opening 502 and the upper opening 30 and are arranged at the processing position (position indicated by a solid line in FIG. 5) (step S12).
  • the outer edge of the opening formed by the overlap of the passage opening 502 and the upper opening 30 in plan view (that is, the outer edge of the region where both openings overlap) is the claw portion 41, the support body 42, and the plurality of substrates 9. Since the size surrounds the periphery, the movement of the plurality of substrates 9 is not hindered.
  • the passage port 502 is disposed at a position shifted from just above the upper opening 30 as shown in FIG.
  • one roll 51 hereinafter, also referred to as “front roll 51” in which the intermediate portion 501 of the continuous member 50 is disposed on the free end side ((+ Y) side) of the claw portion 41 extending in the front-rear direction.
  • rear roll 52 disposed on the fixed end side (( ⁇ Y) side) of the claw portion 41.
  • a linear edge 503 (edge on the front roll 51 side) perpendicular to the front-rear direction of the passage port 502 is formed on a main surface 421 (hereinafter referred to as “front surface 421”) on which the claw portion 41 of the support body 42 is provided. Proximity. Thereby, the part by the side of the front surface 421 of the upper opening 30 partitioned by the support main body 42 is covered with the continuous member 50, and the upper opening 30 is substantially obstruct
  • the intermediate portion 501 of the continuous member 50 shown in FIG. 6 moves in the direction from the rear roll 52 toward the front roll 51, and the passage port 502 in the continuous member 50 is located at the top as shown in FIG.
  • the upper opening 30 is opened by being disposed immediately above the opening 30 (step S15).
  • the support unit 4 is raised by the elevating unit 2
  • the plurality of substrates 9 pass through the upper opening 30 and the passage port 502 and are disposed at the retracted position (the position indicated by the two-dot chain line in FIG. 5).
  • Step S16 the plurality of substrates 9 are unloaded from the processing tank 3 and the processing in the substrate processing apparatus 1 is completed.
  • the plurality of substrates 9 at the retracted position are transferred from the claw portion 41 to an external transport mechanism, and are transported to the next processing apparatus as necessary.
  • FIG. 7 is a view showing a substrate processing apparatus of a comparative example.
  • a pair of hinged doors 91 arranged in the left half and the right half of the upper opening 92 in FIG. 7 are provided, and hinges 911 provided at the left and right ends of the upper opening 92 are used as axes.
  • the upper opening 92 is opened and closed by rotating in opposite directions.
  • a special space is required for the hinged door 91 that is a closing member to move as the upper opening 92 is opened and closed. Therefore, in order to move the substrate in the lateral direction in FIG.
  • the substrate processing apparatus becomes larger in the height direction.
  • the blocking member is also larger, the height of the apparatus is further increased.
  • the portion of the continuous member 50 between the pair of rolls 51 and 52 around which both ends of the continuous member 50 are wound is located in the vicinity of the upper opening 30 of the processing tank 3.
  • the opening 30 is arranged in parallel to the opening surface. Then, when the substrate 9 is moved up and down between the processing position and the retracted position, the passage port 502 formed in the continuous member 50 by the rotation of the rolls 51 and 52 is disposed directly above the upper opening 30. Further, when the substrate 9 is processed in the processing tank 3, the passage opening 502 is disposed at a position shifted from right above the upper opening 30 by the rotation of the rolls 51 and 52, and the upper opening 30 is formed by the continuous member 50. Blocked.
  • the opening / closing of the upper opening 30 of the treatment tank 3 can be realized without providing a special space for the movement of the closing member during the opening / closing operation of the upper opening 30 (that is, the space-saving cover portion 5). Can be realized.) Further, even when the substrate 9 is moved horizontally above the processing tank 3, it is only necessary to raise the substrate 9 slightly above the intermediate portion 501 (that is, the retreat position can be set near the processing tank 3. Therefore, the substrate processing apparatus 1 for processing a large substrate 9 (for example, a substrate 9 having a diameter of 450 mm) can be downsized (particularly in the height direction).
  • the support portion 4 has a support body 42 that is a plate-like member that is long in the vertical direction and perpendicular to the front-rear direction, and when the substrate 9 is processed in the processing tank 3, The edge 503 is close to the front surface 421 of the support body 42 (may contact). Thereby, the portion on the front surface 421 side of the upper opening 30 partitioned by the support body 42 can be tightly closed by the continuous member 50.
  • the pair of rolls 51 and 52 are provided on the (+ Y) side and the ( ⁇ Y) side of the auxiliary tank 35, but as shown in FIG.
  • the rear roll 52 may be disposed below the ( ⁇ Y) side portion of the auxiliary tank 35.
  • the auxiliary roller 511 thinner than the front roll 51 is disposed on the (+ Y) side of the auxiliary tank 35, and the (+ Y) side portion of the intermediate portion 501 continues to the front roll 51 via the auxiliary roller 511.
  • the auxiliary roller 521 thinner than the rear roll 52 is disposed on the ( ⁇ Y) side of the auxiliary tank 35, and the ( ⁇ Y) side portion of the intermediate portion 501 continues to the rear roll 52 via the auxiliary roller 521.
  • the rear roll 52 may be arranged above the ( ⁇ Y) side portion of the auxiliary tank 35 (the same applies to the front roll 51). Also in this case, the auxiliary roller 521 thinner than the rear roll 52 is disposed on the ( ⁇ Y) side of the auxiliary tank 35, and the ( ⁇ Y) side portion of the intermediate portion 501 passes through the auxiliary roller 521 to the rear roll 52. It is continuous. As described above, in the substrate processing apparatus 1, it is possible to arrange the rolls 51 and 52 in a vacant space according to the design so that the space can be effectively used.
  • FIG. 9 is a diagram showing another example of the substrate processing apparatus.
  • two droplet removal units 61 are provided on both outer sides of the auxiliary tank 35 in the front-rear direction (Y direction), and a tank 11 that accommodates the processing tank 3 is provided.
  • Other configurations are the same as those of the substrate processing apparatus 1 of FIG.
  • One droplet removing unit 61 is provided between the (+ Y) side portion of the auxiliary tank 35 and the front roll 51, and the other droplet removing unit 61 is connected to the ( ⁇ Y) side portion of the auxiliary tank 35. It is provided between the rear roll 52.
  • Each droplet removing unit 61 is a blade formed of, for example, rubber or plastic, and contacts the surface 500 of the intermediate unit 501 on the processing tank 3 side over the entire width of the continuous member 50 in the X direction.
  • the droplet on the surface 500 is removed by the droplet removing unit 61.
  • the liquid removed by the droplet removing unit 61 is received by the tank 11 and discharged from the discharge port provided at the bottom of the tank 11.
  • FIG. 10 is a diagram showing still another example of the substrate processing apparatus.
  • a part 62 is provided.
  • Other configurations are the same as those of the substrate processing apparatus 1 of FIG.
  • the shielding part 62 has a surface parallel to the opening surface of the upper opening 30.
  • the surface covers the entire width of the continuous member 50 in the X direction and covers the entire ( ⁇ Y) side portion of the auxiliary tank 35. Further, in the state where the substrate 9 is disposed at the processing position, the shielding part 62 is positioned close to the upper end of the processing tank 3 on the ( ⁇ Y) side.
  • the linear edge 503 perpendicular to the front-rear direction of the passage port 502 approaches the front surface 421 of the support body 42.
  • the portion on the front surface 421 side of the upper opening 30 partitioned by the support body 42 is closed by the continuous member 50.
  • the portion of the upper opening 30 on the other main surface 422 (that is, the rear surface 422) side of the support body 42 is closed by the shielding portion 62.
  • the entire upper opening 30 is closed, and the dispersion of the processing liquid and the diffusion of the processing liquid atmosphere can be more reliably suppressed.
  • the substrate processing apparatus 1b can be downsized by the space-saving cover portion 5.
  • the shielding part 62 is provided on the support body 42.
  • the shielding part 62a is provided in the tank 11 that accommodates the processing tank 3. May be.
  • the shielding part 62a is rotated about an axis 621 parallel to the X direction by a rotation mechanism (not shown). Specifically, when the support unit 4 is moved up and down by the lift unit 2, the shielding unit 62a is in an upright posture as shown by a two-dot chain line in FIG. 11, and the lifting operation of the support unit 4 is performed by the shielding unit 62a. Is prevented from being inhibited.
  • the shielding portion 62a is rotated, as shown by a solid line in FIG. Becomes horizontal.
  • the tip of the shielding portion 62a (the end opposite to the shaft 621) abuts or approaches the rear surface 422 of the support body 42. Therefore, the portion of the upper opening 30 on the rear surface 422 side of the support main body 42 is blocked by the shielding portion 62a, and the dispersion of the processing liquid and the diffusion of the processing liquid atmosphere can be more reliably suppressed.
  • the shielding part 62a does not necessarily have to rotate about the shaft 621. For example, the shielding part 62a moves in the horizontal direction, so that the part of the upper opening 30 on the rear surface 422 side of the support body 42 is provided. May be occluded.
  • FIG. 12 is a diagram showing still another example of the substrate processing apparatus.
  • another cover 5a (hereinafter referred to as “auxiliary cover 5a”) having the same structure as the cover 5 is provided.
  • auxiliary cover 5a also cover 5a having the same structure as the cover 5 is provided.
  • Other configurations are the same as those in FIG.
  • the pair of rolls 51a, 52a of the auxiliary cover part 5a is arranged outside the pair of rolls 51, 52 of the cover part 5 in the front-rear direction (Y direction), and is an intermediate part of the continuous member 50a between the pair of rolls 51a, 52a.
  • 501 a is located near the upper part of the intermediate part 501 of the cover part 5.
  • each roll 51a, 52a is connected to a motor (not shown), and the intermediate part 501a moves along the opening surface of the upper opening 30 by driving the motor.
  • the continuous member 50a is formed with a passage port 502a having the same shape as the passage port 502 of the continuous member 50.
  • the passage port 502 of the cover unit 5 is disposed right above the upper opening 30 as shown in FIG.
  • the passage opening 502a of the auxiliary cover portion 5a is also disposed immediately above the upper opening 30.
  • the support portion 4 passes through the passage openings 502 and 502 a and the upper opening 30 together with the plurality of substrates 9.
  • the outer edge of the opening formed by the overlap of the passage opening 502, the passage opening 502a and the upper opening 30 in a plan view has a size surrounding the periphery of the claw portion 41, the support body 42, and the plurality of substrates 9, The movement of the substrate 9 is not hindered.
  • the entire passage port 502 of the cover unit 5, the entire passage port 502a of the auxiliary cover unit 5a, and the entire upper opening 30 overlap in the vertical direction.
  • the intermediate portion 501 of the continuous member 50 in the cover portion 5 moves in the ( ⁇ Y) direction, and as shown in FIG. A straight edge 503 perpendicular to the direction (that is, the rear edge in the moving direction of the intermediate portion 501) is close to the front surface 421 of the support body 42. As a result, the portion on the front surface 421 side of the upper opening 30 partitioned by the support body 42 is closed by the continuous member 50.
  • the intermediate portion 501a of the continuous member 50a in the auxiliary cover portion 5a moves in the (+ Y) direction, and the linear edge 503a perpendicular to the front-rear direction of the passage port 502a (that is, the rear side in the moving direction of the intermediate portion 501a). Edge) is close to the rear surface 422 of the support body 42. Thereby, the part by the side of the rear surface 422 of the upper opening 30 partitioned by the support body 42 is closed by the continuous member 50a. As a result, in the substrate processing apparatus 1d, approximately the entire upper opening 30 is closed, and the scattering of the processing liquid and the diffusion of the processing liquid atmosphere can be more reliably suppressed. Further, the substrate processing apparatus 1d can be downsized by the space-saving cover portions 5 and 5a.
  • the pair of rolls 51 and 52 are in the X direction of the processing tank 3 (a horizontal direction parallel to the main surface of the substrate 9 and a direction perpendicular to the front-rear direction in which the plurality of substrates 9 are arranged).
  • the intermediate portion 501 of the continuous member 50 may be moved in the X direction along the opening surface of the upper opening 30 (same for the auxiliary cover portion 5a; the same applies hereinafter).
  • the motor is connected to both of the pair of rolls 51 and 52.
  • a mechanism for winding the continuous member 50 around the roll by the power of the mainspring spring is provided, and the other roll Only a motor may be provided.
  • the upper opening 30 can be opened and closed only by controlling the driving of the motor of the other roll.
  • a mechanism for moving the pair of rolls 51, 52 in the vertical direction is provided, and when the substrate 9 is processed in the processing tank 3, the pair of rolls 51, 52 is lowered and the intermediate portion 501 is moved. By approaching the liquid level of the processing liquid, the upper opening 30 of the processing tank 3 may be tightly closed.
  • the continuous member 50 may be formed of a resin such as nylon in addition to the fluororesin. Further, the sheet-like continuous member 50 may be a cloth, and in this case, a waterproof material such as Gore-Tex (registered trademark) can be used. Furthermore, the continuous member 50 may be a continuous bellows-like member as long as both ends can be wound around the pair of rolls 51 and 52.
  • the support body 42 in the support part 4 may have a shape other than a plate shape (for example, a rod shape). However, in order to tightly close the upper opening 30, the support body 42 is a plate-like member perpendicular to the front-rear direction. When the substrate 9 is processed in the treatment tank 3, the support body 42 is perpendicular to the front-rear direction of the passage port 502. It is preferable that the straight edge is close to one main surface of the plate member.
  • a plurality of claw portions 41 may be attached to the processing tank 3 and the support body 42 may be omitted in the support portion 4.
  • an elevating unit having a pair of support members whose interval in the X direction can be changed is provided.
  • the substrate 9 is supported by the pair of support members, and the substrate 9 is raised and lowered between the processing position in the processing tank 3 and the retreat position outside the processing tank 3.
  • the lifting / lowering section only the lifting / lowering section is retracted from the processing tank 3.
  • the upper opening 30 is closed by the cover portion 5.
  • the support section may be any structure that supports the substrate 9 in an upright state at least in the processing tank 3, and the lift section may be configured to be separated from the support section.
  • the treatment tank 3 is not limited to the one that stores the treatment liquid and immerses the substrate 9, and may be one that supplies the treatment liquid to the substrate 9 in a spray form, for example. In other words, the treatment tank 3 may be anything that treats the substrate 9 with the treatment liquid. Further, instead of discarding the processing liquid in the drainage processing unit 34, a circulating system that is used for substrate processing again after filtering or the like may be used.
  • the substrate 9 processed in the substrate processing apparatus 1 is not limited to a silicon substrate, and may be another type of substrate such as a glass substrate.

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  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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  • Manufacturing & Machinery (AREA)
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PCT/JP2012/082102 2011-12-27 2012-12-11 基板処理装置および基板処理方法 WO2013099594A1 (ja)

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KR1020147018428A KR101919183B1 (ko) 2011-12-27 2012-12-11 기판 처리 장치 및 기판 처리 방법
CN201280063629.XA CN103999196B (zh) 2011-12-27 2012-12-11 基板处理装置以及基板处理方法

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JP2011-286427 2011-12-27
JP2011286427A JP5746611B2 (ja) 2011-12-27 2011-12-27 基板処理装置

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JP7002400B2 (ja) * 2018-04-27 2022-01-20 株式会社ディスコ 洗浄装置
CN110854040B (zh) * 2019-10-25 2021-03-02 长江存储科技有限责任公司 待清洗工件的装夹系统及装夹方法
CN112371591B (zh) * 2020-10-26 2022-03-04 华海清科(北京)科技有限公司 晶圆清洗装置

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