WO2013062100A1 - Procédé de production d'une solution de sel de tétraalkylammonium - Google Patents

Procédé de production d'une solution de sel de tétraalkylammonium Download PDF

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WO2013062100A1
WO2013062100A1 PCT/JP2012/077779 JP2012077779W WO2013062100A1 WO 2013062100 A1 WO2013062100 A1 WO 2013062100A1 JP 2012077779 W JP2012077779 W JP 2012077779W WO 2013062100 A1 WO2013062100 A1 WO 2013062100A1
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tetraalkylammonium
solution
ion
exchange resin
cation exchange
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PCT/JP2012/077779
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English (en)
Japanese (ja)
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渡邉　淳
直幸 梅津
喜文 山下
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株式会社トクヤマ
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Priority to KR1020147005045A priority Critical patent/KR101987409B1/ko
Priority to CN201280038087.0A priority patent/CN103732573B/zh
Publication of WO2013062100A1 publication Critical patent/WO2013062100A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/04—Processes using organic exchangers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J49/00—Regeneration or reactivation of ion-exchangers; Apparatus therefor
    • B01J49/05—Regeneration or reactivation of ion-exchangers; Apparatus therefor of fixed beds
    • B01J49/06—Regeneration or reactivation of ion-exchangers; Apparatus therefor of fixed beds containing cationic exchangers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
    • C07C209/82—Purification; Separation; Stabilisation; Use of additives
    • C07C209/84—Purification
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/425—Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/30—Organic compounds
    • C02F2101/38—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/40—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Definitions

  • the present invention relates to a novel method for producing a solution containing a tetraalkylammonium salt using a cation exchange resin, and a method for producing tetraalkylammonium hydroxide using the same as a raw material.
  • Tetraalkylammonium hydroxide (hereinafter, abbreviated as TAAH) is a compound useful as a standard transfer solution for bases in non-aqueous solution titration or an organic alkaline agent in organic synthesis, including a phase transfer catalyst. In addition, it is used as a processing agent for cleaning, etching, development of a photoresist, etc. of a semiconductor substrate in the manufacture of integrated circuits and large scale integrated circuits. In particular, in applications for semiconductors, since semiconductor substrates are contaminated, high purity TAAH containing as little impurities as possible is required.
  • waste liquid used for developing the photoresist as described above contains metal ion impurities and TAAH in addition to the photoresist, and in order to reduce the environmental load, TAAH is recovered from the waste liquid and reused.
  • Photoresist development waste liquid waste liquid containing photoresist and TAAH
  • the method for treating photoresist development waste liquid is concentrated by evaporation method or reverse osmosis membrane method and disposed of ( The methods of incineration or collection with workers, and the methods of biodegrading with activated sludge and releasing it were the mainstream.
  • many attempts have been proposed to recover and reuse TAAH from the waste solution in consideration of the environment.
  • a tetraalkyl ammonium ion (TAA ion) is adsorbed to a cation exchange resin by bringing a photoresist development waste solution and a cation exchange resin into contact with each other.
  • hydrochloric acid is passed through the cation exchange resin to recover the TAA salt, and perchloric acid is added to the obtained solution to form tetraalkylammonium perchlorate (TAA perchlorate).
  • TAA perchlorate is purified by crystallization, and then the obtained perchlorate is brought into contact with an anion exchange resin to recover TAAH.
  • the process is complicated, and industrial production is difficult due to the use of perchlorate which may cause explosion.
  • Patent Documents 5 and 6 there is disclosed a technology of producing TAAH by adsorbing TAA ions to an ion exchange resin to recover a TAA salt from a dilute development waste liquid and electrolyzing the salt.
  • Patent Documents 5 and 6 since the conditions for eluting the TAA salt from the ion exchange resin are not controlled, metal ion impurities are mixed in the obtained TAA salt solution, and as a result, metal ion impurities are contained in the TAAH solution after electrolysis. There was a problem that it mixes in relatively high concentration.
  • Patent Document 7 discloses a technique for producing TAAH by using a metal hydroxide when eluting TAA ions from an ion exchange resin to which TAA ions are adsorbed.
  • a metal hydroxide when eluting TAA ions from an ion exchange resin to which TAA ions are adsorbed.
  • organic substances such as resist contained in the development waste liquid are mixed in TAAH.
  • TAA ions can be recovered from the development waste liquid with a high yield, but in the method, removal of the resist component becomes insufficient, and metal ion impurities are mixed. There was a problem that only dilute TAA salt solution could be obtained.
  • the present inventors diligently studied to solve the above problems. As a result, when contacting the photoresist development waste fluid with a cation exchange resin to cause the cation exchange resin to adsorb TAA ions, and then passing the salt solution through the cation exchange resin to recover a TAA salt. By stopping the recovery before the metal ion concentration of the resulting TAA salt solution reaches a predetermined concentration, it is possible to obtain a TAA salt having a low metal ion impurity concentration, which is treated by electrolysis to form a resist component. It has been found that TAAH which does not contain a resist component can be produced because it can be efficiently decomposed and removed, and the present invention has been completed.
  • the present invention is a method for producing a tetraalkylammonium salt solution, which obtains a solution containing a tetraalkylammonium salt having a reduced metal ion content ratio from a solution containing metal ions and tetraalkylammonium hydroxide, (1) A solution containing metal ions and tetraalkylammonium hydroxide is passed through an adsorption column packed with a cation exchange resin of hydrogen ion type to make the tetraalkylammonium ion in the solution a cation exchange resin.
  • Adsorption process to be adsorbed (2) A solution of an alkali metal salt is passed through an adsorption tower filled with a cation exchange resin to which a tetraalkylammonium ion is adsorbed in the adsorption step, and the tetraalkylammonium ion adsorbed on the resin is absorbed.
  • a recovery step in which the effluent flowing out of the adsorption tower is recovered in a storage tank, And measuring the alkali metal ion concentration in the effluent from the adsorption column, and before the alkali metal ion concentration rapidly increases, It is a method for producing a tetraalkylammonium salt solution characterized by stopping recovery of effluent.
  • Another invention comprises the same steps as the above (1) adsorption step and (2) recovery step, and in the recovery step, the concentration of the alkali metal ion in the effluent from the adsorption column is measured, Production of a tetraalkylammonium salt solution characterized in that collection of effluent to the storage tank is stopped when the alkali metal ion concentration reaches a predetermined concentration provided between 0.5 and 10 mg / L. It is a method.
  • a highly pure TAAH solution can be obtained by electrolyzing the TAA salt thus obtained.
  • the amount of metal ions in the TAA salt solution to be recovered can be reduced, a TAA salt with less metal ion impurities can be efficiently obtained from the photoresist waste liquid. Therefore, the load of the metal removal process by the chelate resin etc. of front and / or back processes can be reduced, and it leads to cost reduction.
  • FIG. 5 is a process chart showing a preferred embodiment when tetraalkyl ammonium salt (TAA salt) is recovered from a photoresist development waste liquid and tetraalkyl ammonium hydroxide (TAAH) is produced from the TAA salt.
  • TAA salt tetraalkyl ammonium salt
  • TAAH tetraalkyl ammonium hydroxide
  • the present invention provides a method for producing a metal ion-reduced tetraalkylammonium salt (TAA salt) solution from a solution containing metal ions and tetraalkylammonium hydroxide (TAAH), wherein the TAAH solution is cationic.
  • the catalyst is brought into contact with an exchange resin to adsorb TAA ions to the cation exchange resin, and then a salt solution is passed through the adsorption column to measure the metal ion concentration of the recovered liquid flowing out of the adsorption column to recover the recovered liquid. Determine the timing of recovery stop and obtain TAA salt.
  • the metal ion content ratio is reduced means that the amount relative to the TAA ion has been reduced.
  • the solution containing a metal ion impurities and tetraalkylammonium hydroxide is not particularly limited, but is preferably a photoresist development waste solution generated in a semiconductor manufacturing process, a liquid crystal display manufacturing process, and the like.
  • waste liquids are waste liquids discharged when developing the photoresist after exposure with an alkaline developer, and mainly contain photoresist, TAAH and metal ions.
  • Such waste liquid is usually an aqueous solution.
  • the photoresist developing solution usually exhibits alkalinity of pH 10 to 14, and in the photoresist, in the alkaline developing solution, acid groups such as carboxyl groups and phenolic hydroxyl groups are dissolved and dissolved.
  • Main examples of the photoresist include indene carboxylic acid generated by photolysis of a photosensitizer o-diazonaphthoquinone and phenols derived from novolac resin.
  • a single-wafer automatic developing apparatus is usually used in many cases, but in this apparatus, the step of using a developing solution containing TAAH and the subsequent rinsing with pure water (substrate cleaning) are performed in the same tank At this time, in the rinse step, pure water in an amount of 5 to 10 times that of the developer is used. For this reason, the developer used in the development step is usually a waste solution diluted 5-10 times.
  • the composition of the waste liquid discharged in this development step is such that the TAAH is about 0.001 to 1% by mass, the resist is about 10 to 100 ppm, and the surfactant is about 0 to several 10 ppm.
  • waste solution from other processes may be mixed, and the TAAH concentration may be further lowered in the above range. Specifically, it may be 0.05% by mass or less (about 0.001 to 0.05% by mass).
  • the photoresist development waste discharged from the liquid crystal display manufacturing process often has a TAAH concentration of 0.001 to 0.5% by mass in many cases, and the method of the present invention It can be employed particularly suitably for producing
  • the photoresist development waste liquid contains a plurality of metal ions.
  • metal ions For example, sodium, potassium and the like as monovalent ions, calcium, zinc and the like as divalent ions, aluminum, nickel, copper, chromium, iron and the like as polyvalent ions in the photoresist development waste solution It is a metal that is typically contained in large quantities. Such a metal is usually contained in the photoresist developing waste liquid at about 0.1 to 100 ppb.
  • TAAH in the photoresist development waste is an alkali used for a developer of a photoresist used in the production of various electronic parts.
  • Specific examples of TAAH include tetramethylammonium hydroxide (hereinafter abbreviated as TMAH), tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, methyltriethylammonium hydroxide, trimethylethylammonium hydroxide, water Dimethyldiethylammonium oxide, trimethyl (2-hydroxyethyl) ammonium hydroxide, triethyl (2-hydroxyethyl) ammonium hydroxide, dimethyldi (2-hydroxyethyl) ammonium hydroxide, diethyldi (2-hydroxyethyl) ammonium hydroxide, water Methyl tri (2-hydroxyethyl) ammonium oxide, ethyl tri
  • Step of adsorbing tetraalkyl ammonium ion to cation exchange resin a solution containing the above metal ion and tetraalkylammonium hydroxide is passed through an adsorption column filled with a cation exchange resin of hydrogen ion type (hereinafter also referred to as "H type") to The TAA ion is adsorbed to a cation exchange resin.
  • H type hydrogen ion type
  • TAA ion is a cation
  • it is ion-exchanged with the hydrogen ion of the cation exchange resin by being brought into contact with the H-type cation exchange resin, and is adsorbed to the resin. Therefore, TAA ions can be efficiently recovered from the waste solution. TAA ions can be recovered at low cost even in the case of waste liquid particularly when the concentration of TAAH is low.
  • metal ion impurities are also cations, they will be adsorbed to the cation exchange resin by this solution flow.
  • the present invention efficiently separates metal ion impurities and TAA ions adsorbed on such cation exchange resin by adopting the method described later. Even in the case of metal ion impurities, it is difficult to be adsorbed by the cation exchange resin when the ion species containing metal itself is an anion due to chemical equilibrium reaction such as complex formation in the development waste liquid. , Discharged from the adsorption tower.
  • the dissolved organic substance component derived from the photoresist is usually in the form of an anion, it is difficult to be adsorbed to the cation exchange resin and most of it is removed, but a part is adsorbed to the ion exchange resin Therefore, it is mixed in the TAA salt solution in the subsequent recovery step of the TAA salt (the removal of such organic components will be described later).
  • the cation exchange resin for adsorbing the above-mentioned TAA ion is not particularly limited, and known ones can be used. Specifically, any of a strongly acidic cation exchange resin in which the ion exchange group is a sulfonic acid group and a weakly acidic cation exchange resin in which the ion exchange group is a carboxyl group can be used. Among them, it is preferable to use a weakly acidic cation exchange resin because many of them have large ion exchange capacity and the amount of resin used can be reduced. Furthermore, in the case of a weakly acidic cation exchange resin, the elution of TAA ions described later is also easy.
  • the structure of the resin may be gel or MR (macroporous).
  • the shape of the resin may be any of powdery, granular, membranous, fibrous and the like. From the viewpoint of processing efficiency, operability, economy, etc., it is preferable to use styrene-type or granular-type cation exchange resins such as acrylic.
  • the counter ion of the cation exchange resin is usually marketed as hydrogen ion (H type) or sodium ion (Na type), preventing sodium ion from being mixed into the finally obtained TAAH solution, and TAA
  • the counter ion is H-type with hydrogen ions.
  • an acid such as hydrochloric acid or sulfuric acid is passed through the cation exchange resin in advance before use, and the counter ion is hydrogen by sufficiently washing with ultrapure water, etc. Use as an ion.
  • TAA ion alkali metal type such as Na
  • it is regenerated into H type by the same operation as described above and used.
  • the strongly acidic cation exchange resin examples include Amberlight IR120B manufactured by Rohm and Haas, Amberlight IR124, Diaion SK1B manufactured by Mitsubishi Chemical Corporation, Diaion PK228, Duolight C255LFH manufactured by Sumika Chemtex, and Lanxess There may be mentioned Levatit Mono Plus S100, Purolite C.
  • specific examples of the weakly acidic cation exchange resin include Amberlight IRC 76 made by Rohm and Haas, Diaion WK40L made by Mitsubishi Chemical, Duolight C433LF made by Sumika Chemtex, Duolight C476, and Lanxess Leverit CNP80WS. And Purolite Co., Ltd. Purolite C104 etc. can be mentioned.
  • a method of passing the solution into an adsorption column filled with a cation exchange resin conventionally known methods can be appropriately adopted depending on the type and shape of the cation exchange resin. Specifically, for example, a column system in which a column is packed with a cation exchange resin and the solution is continuously passed is preferable.
  • this column method it may be suitably determined in accordance with the performance of the cation exchange resin, etc., but in order to adsorb TAA ions efficiently, a solution having a content of TAAH of 0.001 to 1% by mass If the ratio (L / D) of the column height (L) to the column diameter (D) is 0.5 or more, the space velocity (SV) of the waste liquid is 1 (1 / hour) or more and 200 (1 / Hour) or less is preferable.
  • the amount of the solution to be passed is preferably an amount that does not cause breakthrough of the cation exchange resin packed in the adsorption column, in terms of efficient production of the TAA salt.
  • the TAA ions have flowed out (break through) without being adsorbed by passing of a solution containing an amount of cations larger than the exchange capacity of the cation exchange resin. It can be confirmed by analyzing the concentration of TAA ions in the liquid passing through and flowing out by ion chromatography. More simply, the height occupied by the cation exchange resin in the adsorption column may be measured. When the counter ion of the cation exchange resin changes from a hydrogen ion to a TAA ion, although depending on the type of cation exchange resin, the volume swells to about twice. The adsorption of TAA ions can be confirmed by measuring the volume of the cation exchange resin.
  • the pH of the solution is 10 or more
  • the pH of the passed solution becomes alkaline, so that it can be confirmed by a pH meter.
  • the electric conductivity of the liquid is increased, so that it can be confirmed by the electric conductivity.
  • Step of recovering tetraalkylammonium salt from cation exchange resin adsorbed with tetraalkylammonium ion In the present invention, after TAA ions are adsorbed to a cation exchange resin by the above method, a solution of an alkali metal salt is passed through an adsorption tower packed with the cation exchange resin, and the recovered liquid flows out from the adsorption tower Are recovered to produce a tetraalkyl ammonium salt.
  • a solution of an alkali metal salt is introduced into one of the adsorption columns from one end of the adsorption column, and the solution is allowed to flow out from the other end, thereby passing a large excess of alkali metal ions contained in the salt solution with TAA ions. It is sequentially substituted, and the TAA ion flows out of the adsorption tower as an acid salt of the used salt.
  • alkali metal sodium or potassium is preferable in terms of solubility and availability, and sodium is particularly preferable.
  • the alkali metal salt may be an inorganic acid salt or an organic acid salt.
  • salts of weak acids and salts of strong acids may be used.
  • a weak acid means an acid having a dissociation constant K at 25 ° C. of 10 ⁇ 3 or less.
  • the alkali metal salt is an inorganic acid salt in that the TAA salt produced by the method of the present invention is less likely to have an adverse effect such as mixing of organic components when it is subjected to the electrolysis step described later to convert to TAAH.
  • the inorganic acid include carbonic acid, nitrous acid, hydrofluoric acid and hypochlorous acid.
  • organic acids include carboxylic acids such as acetic acid, oxalic acid, formic acid and benzoic acid, phenols and cresols.
  • the alkali metal salts of carbonic acid which is a dibasic acid include carbonates (M 2 CO 3 : M represents alkali metals) and bicarbonates (MHCO 3 ), but the concentration of TAA ions in the recovery solution is higher. It is preferable to use carbonate as this can be achieved.
  • Particularly preferred alkali metal salts in the present invention include sodium carbonate, sodium hydrogen carbonate, potassium carbonate and potassium hydrogen carbonate, with sodium carbonate being most preferred.
  • the solute constituting the solution of the weak acid salt of an alkali metal used in the present invention is not particularly limited as long as it is a liquid capable of dissolving the alkali metal salt, but the solubility of the alkali metal salt, cost, and production of TAAH It is preferable that it is water from the point of not exerting a bad influence at the time of electrolysis for.
  • water ion exchange water, pure water, ultrapure water or the like can be used.
  • the concentration of the alkali metal salt solution can be appropriately selected in the range of 0.1 N to 10 N, but it is 0 in that it is easy to prevent the high concentration of TAA salt flowing out and mixing of metal ions.
  • the range of 5N to 4N is particularly preferred.
  • the flow rate of the alkali metal salt solution can be appropriately set according to the size of the adsorption tower, the type and amount of cation exchange resin used, the concentration of the salt solution, etc.
  • the space of the alkali metal salt solution is used.
  • the speed (SV) is 1 (1 / hour) or more and 50 (1 / hour) or less. If it is smaller than this, processing will take time.
  • the method of contacting an alkali metal salt solution with a cation exchange resin having a TAA ion as a counter ion is preferably a column method in which the column is filled with the cation exchange resin and the alkali metal salt solution is continuously passed.
  • a column system the work can be efficiently carried out, so that TAA ions are adsorbed to a cation exchange resin packed in the column using an identical column, and subsequently an alkali metal salt solution is allowed to pass through. Is preferred.
  • TAA ion flows out from one end of the adsorption column as a TAA salt with an anion (for example, CO 3 2- or the like in the case of carbonate) as a counter ion
  • an anion for example, CO 3 2- or the like in the case of carbonate
  • One of the features of the present invention is that the concentration of alkali metal ions in the effluent is measured, and recovery to the storage tank is stopped before the concentration of alkali metal ions rapidly increases.
  • the elution behavior of these metal ions has the same tendency as the elution behavior of the alkali metal ions introduced into the adsorption column at a high concentration, and starts the elution before and after the phase. If the elution behavior of the alkali metal ion is measured, and the effluent having a high concentration of the alkali metal ion is not mixed with the TAA ion-containing recovery solution containing almost no metal ion, the TAA ion can be obtained. It is possible to obtain a recovery solution which contains a high concentration and in which the concentration of various metal ions is significantly reduced.
  • the concentration of alkali metal ions in the effluent is extremely low at first. It is stable (usually less than 0.1 ppm), but when the exchange of TAA ions with alkali metal ions proceeds, the concentration of the alkali metal ion starts to rapidly increase and far exceeds 1 ppm, and is several tens to several hundreds. Also reaches ppm. Therefore, the portion immediately before the start of the rise is collected in the storage tank, and the effluent thereafter is separated to obtain a TAA salt with high recovery and high purity.
  • a criterion for determining whether the alkali metal ion concentration has started to rise rapidly when the measuring means for the alkali metal ion concentration has extremely high sensitivity, it is 10 to 10000 times the stable value, preferably 10 to 10,000.
  • the recovery to the storage tank may be stopped before, preferably immediately before, an arbitrary concentration (predetermined value) provided at 5000 times the point.
  • the initial stable value may be less than the measurement lower limit.
  • it can be substituted by stopping recovery to the storage tank before the alkali metal ion concentration reaches an arbitrary concentration (predetermined value) provided between 0.5 and 10 mg / L.
  • concentration predetermined value
  • the measurement limit of a general alkali metal ion electrode is often 1 mg / L, below the measurement lower limit, it is collected in the storage tank, and the effluent after showing a value of 1 mg / L is collected in the storage tank. It is mentioned that it stops.
  • the method for stopping the recovery of the effluent to the storage tank before the alkali metal ion concentration reaches a predetermined value as described above is not particularly limited.
  • an apparatus for measuring the alkali metal ion concentration A flow path switching valve is provided downstream of (the metal ion electrode), and the metal ion electrode senses that the alkali metal ion concentration in the effluent has risen to a predetermined value, and simultaneously switches the flow path of the valve, etc. Can be mentioned.
  • a method of measuring the metal ion concentration conventionally known methods can be appropriately adopted. Specifically, for example, a fixed amount of the effluent flowing out of the adsorption column is sampled, and a method of measuring metal ions using a metal ion electrode or the like, or an inline metal ion electrode in the middle of piping leading the effluent to a storage tank There is a method of installing and measuring. If an in-line type metal ion electrode is used, recovery can be stopped at the moment when the metal ion concentration reaches a predetermined value without extracting the solution halfway, and loss of the recovered solution can be suppressed, which is preferable.
  • TAAH Metal for producing tetraalkylammonium hydroxide from tetraalkylammonium salt
  • TAAH can be produced by subjecting the TAA salt contained in the solution recovered from the waste liquid to electrodialysis, electrolysis or the like by the above-mentioned method.
  • the TAA salt solution is brought into contact with a cation exchange resin (wherein the counter ion has been substituted with a TAA ion in advance) and / or a chelate resin to obtain metal ions in the TAA salt.
  • a cation exchange resin wherein the counter ion has been substituted with a TAA ion in advance
  • a chelate resin to obtain metal ions in the TAA salt.
  • a method of concentrating the TAA salt specifically, a method of concentration by electrodialysis, an evaporator, a reverse osmosis membrane, etc. may be mentioned.
  • TAAH electrolysis process of TAA salt
  • the step of electrolysis to electrolyze the obtained TAA salt into TAAH depending on the type of the recovered TAA salt (corresponding to the acid component constituting the used alkali metal salt).
  • the recovered TAA salt is a carbonate
  • the TAA is electrolyzed using the anode, the cathode, and the cation exchange membrane described in Japanese Patent No. 3109525 (2-chamber electrolysis: the raw material is supplied to the anode chamber).
  • the salt is TAAH.
  • the column uses ION-pac CS12A for cation analysis, ION-pac AS15 for anion analysis, and the eluent is methanesulfonic acid, for cation analysis,
  • the anion analysis was performed using potassium hydroxide.
  • the concentration of metal ions contained in the solution can be determined using the ion electrode (portable water quality meter) method (model number: IM-32P (made by Toa DKK)), high frequency inductively coupled plasma mass spectrometry (ICP-MS) method (measuring device: HP- Measured by the method of 4500 (Agilent) and high frequency inductively coupled plasma optical emission spectrometry (ICP-OES) method (measurement apparatus: iCAP 6500 DUO (manufactured by Thermo Electron Co., Ltd.). Unless otherwise indicated, each concentration is based on mass. is there.
  • Example 1 (TMA ion waste liquid adsorption process) A column having a diameter of 50 mm was filled with 1000 ml of a weakly acidic cation exchange resin Diaion WK40L (manufactured by Mitsubishi Chemical Corporation) to make the resin height 510 mm.
  • a weakly acidic cation exchange resin Diaion WK40L manufactured by Mitsubishi Chemical Corporation
  • TMAH waste solution photoresist development waste solution photoresist content COD conversion 10 ppm, metal ion concentration Na: 2.5 ppb, K: 5.4 ppb, Ca: 4.1 ppb, Al: 3.2 ppb , Ni: 2.0 ppb, Cu: 2.0 ppb, Cr: 2.5 ppb, Fe: 5.3 ppb
  • 1000 L at SV (space velocity) 100 (1 / hour) to adsorb TMA ions
  • Example 2 (TMA ion adsorption process) A column having a diameter of 50 mm was packed with 1000 ml of a weakly acidic cation exchange resin, Levatit CNP-80WS (manufactured by LANXESS Co., Ltd.) to make the resin height 510 mm.
  • a weakly acidic cation exchange resin Levatit CNP-80WS (manufactured by LANXESS Co., Ltd.)
  • TMAH waste solution photoresist development waste solution photoresist content COD conversion 10 ppm, metal ion concentration Na: 2.5 ppb, K: 5.4 ppb, Ca: 4.1 ppb, Al: 3.2 ppb , Ni: 2.0 ppb, Cu: 2.0 ppb, Cr: 2.5 ppb, Fe: 5.3 ppb
  • 1000 L at SV (space velocity) 100 (1 / hour) to adsorb TMA ions
  • the metal ion concentration increased from I at which the potassium ion concentration reached the lower limit value or more.
  • the total amount recovered when fraction C to H was recovered was 3000 ml, and the concentration of TMA carbonate was 9.1% by mass (0.44 mol / l).
  • Example 3 (TMA ion adsorption process) A column of 50 mm in diameter was filled with 1000 ml of weak acid cation exchange resin Duolite C 476 (manufactured by Sumika Chemtex Co., Ltd.) to make the resin height 510 mm.
  • TMAH waste solution photoresist development waste solution photoresist content COD conversion 10 ppm, metal ion concentration Na: 2.5 ppb, K: 5.4 ppb, Ca: 4.1 ppb, Al: 3.2 ppb , Ni: 2.0 ppb, Cu: 2.0 ppb, Cr: 2.5 ppb, Fe: 5.3 ppb
  • 1000 L at SV (space velocity) 100 (1 / hour) to adsorb TMA ions
  • the metal ion concentration increased from N where the sodium ion concentration is at or above the lower limit value.
  • the total amount of recovered liquid from the liquid fractions C to M was 5500 ml, and the concentration of TMA carbonate was 6.2% by mass (0.30 mol / l).
  • Example 4 (Purification process) A column (resin height 510 mm) 50 mm in diameter packed with 1000 ml of a chelate resin (Duolite C 747 manufactured by Rohm and Haas Co., Ltd.) regenerated by contact with hydrochloric acid and ultrapure water in advance and a cation exchange resin (Rome A column (resin height of 510 mm) with a diameter of 50 mm packed with 1000 ml of Amberlyst 15 J) manufactured by Andhers Inc. was prepared.
  • a chelate resin Duolite C 747 manufactured by Rohm and Haas Co., Ltd.
  • a cation exchange resin Rosin height of 510 mm
  • Example 1 The fractionated solutions C to H in Example 1 were passed through the above-mentioned chelate resin column to obtain a treatment solution A. Subsequently, the treatment liquid A was passed through a cation exchange resin column to obtain a treatment liquid B. Table 4 shows the results of analysis of the treatment solutions A and B.
  • Example 5 The treatment liquid B obtained from Example 4 was concentrated by an evaporation concentrator so that the TMA carbonate concentration would be 26.1% by mass. The obtained TMA carbonate was subjected to an electrolysis step to produce TMAH.
  • a two-chamber electrolytic cell in which an anode, a cation exchange membrane (Nafion 90209 (manufactured by DuPont)), and a cathode are disposed is used.
  • the effective membrane area of the above ion exchange membrane was 2 dm 2 , and the Nafion membrane was placed with the surface having carboxylic acid groups facing the cathode.
  • the anode used was a titanium plate subjected to platinum plating, and the cathode used SUS316.
  • Electrolysis was continuously carried out while circulating TMA carbonate in the anode chamber of the electrolytic cell and pure water in the cathode chamber, maintaining the current density at 18 A / dm 2 and the temperature at 40 ° C.
  • the TMAH concentration in the cathode chamber was 18% by mass.
  • Table 5 shows the results of analysis of TMAH obtained after 12 hours (at the time of stabilization) and when three months of continuous operation were performed after the start of electrolysis and the operation was stable.
  • Comparative Example 1 The measurement was conducted in the same manner as in Example 1 except that the measurement of conductivity and pH was performed without measuring the effluent at the metal ion electrode in Example 1.
  • the effluent was fractionated one by one every 500 ml and fractionated into 10 liquids (fractional liquids A to J).
  • the TMA carbonate concentration, metal ion concentration, conductivity and pH of these fractionated solutions were measured respectively. The results are shown in Table 6.

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Abstract

La présente invention concerne l'élimination efficace d'un ion métallique d'une solution contenant un ion métallique et un ion de tétraalkylammonium, telle qu'une solution usagée de développement de réserve ou une solution équivalente. Pour ce faire, une solution contenant un ion métallique et un ion de tétraalkylammonium et une résine échangeuse de cations sont mis en contact, ce qui aboutit à l'adsorption des ions sur la résine qui sont ensuite élués avec une solution de sel de métal alcalin. L'ion de métal alcalin ainsi que la solution de sel de tétraalkylammonium, à une concentration inférieure à celle de cet ion métallique, peuvent être récupérés en surveillant la concentration en ion de métal alcalin dans l'éluat et en basculant la voie de récupération avant que la concentration en ion de métal alcalin augmente brusquement. Le sel de tétraalkylammonium récupéré peut être converti en hydroxyde de tétraalkylammonium par électrolyse. Une solution aqueuse de carbonate de sodium est le meilleur choix de solution de sel de métal alcalin, car elle n'induit pas d'interférence lors de l'électrolyse et, entre autres, présente des avantages en termes de coût.
PCT/JP2012/077779 2011-10-28 2012-10-26 Procédé de production d'une solution de sel de tétraalkylammonium WO2013062100A1 (fr)

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CN114920658A (zh) * 2022-06-28 2022-08-19 大连理工大学盘锦产业技术研究院 一种离子交换树脂纯化氢氧化胆碱的方法

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CN114920658A (zh) * 2022-06-28 2022-08-19 大连理工大学盘锦产业技术研究院 一种离子交换树脂纯化氢氧化胆碱的方法
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