SG11202103130RA - Method for producing organic solvent solution of quaternary ammonium hydroxide - Google Patents

Method for producing organic solvent solution of quaternary ammonium hydroxide

Info

Publication number
SG11202103130RA
SG11202103130RA SG11202103130RA SG11202103130RA SG11202103130RA SG 11202103130R A SG11202103130R A SG 11202103130RA SG 11202103130R A SG11202103130R A SG 11202103130RA SG 11202103130R A SG11202103130R A SG 11202103130RA SG 11202103130R A SG11202103130R A SG 11202103130RA
Authority
SG
Singapore
Prior art keywords
organic solvent
quaternary ammonium
ammonium hydroxide
solvent solution
producing organic
Prior art date
Application number
SG11202103130RA
Inventor
Shoji Tachibana
Seiji Tono
Sumito Ishizu
Yoshiaki Yamashita
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of SG11202103130RA publication Critical patent/SG11202103130RA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/62—Quaternary ammonium compounds
    • C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/10—Vacuum distillation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
    • C07C209/82—Purification; Separation; Stabilisation; Use of additives
    • C07C209/84—Purification
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
    • C07C209/82—Purification; Separation; Stabilisation; Use of additives
    • C07C209/86—Separation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G03F7/2043—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG11202103130RA 2018-09-28 2019-09-26 Method for producing organic solvent solution of quaternary ammonium hydroxide SG11202103130RA (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2018183274 2018-09-28
JP2019009734 2019-01-23
JP2019035854 2019-02-28
PCT/JP2019/038008 WO2020067365A1 (en) 2018-09-28 2019-09-26 Method for producing organic solvent solution of quaternary ammonium hydroxide

Publications (1)

Publication Number Publication Date
SG11202103130RA true SG11202103130RA (en) 2021-04-29

Family

ID=69950645

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202103130RA SG11202103130RA (en) 2018-09-28 2019-09-26 Method for producing organic solvent solution of quaternary ammonium hydroxide

Country Status (6)

Country Link
US (1) US20220033343A1 (en)
KR (1) KR20210066818A (en)
CN (1) CN112752746B (en)
SG (1) SG11202103130RA (en)
TW (1) TWI821419B (en)
WO (1) WO2020067365A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113041637A (en) * 2021-04-01 2021-06-29 沧州信联化工有限公司 Distillation device for tetramethylammonium hydroxide production and use method thereof
CN114195655A (en) * 2021-11-03 2022-03-18 华南理工大学 Dehydration method of tetramethylammonium hydroxide pentahydrate crystal

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6472155A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Developing solution for positive type photoresist
US5868916A (en) * 1997-02-12 1999-02-09 Sachem, Inc. Process for recovering organic hydroxides from waste solutions
JP3490604B2 (en) * 1998-01-26 2004-01-26 多摩化学工業株式会社 Method for producing quaternary ammonium base type semiconductor surface treating agent
JP4224651B2 (en) 1999-02-25 2009-02-18 三菱瓦斯化学株式会社 Resist stripper and method for manufacturing semiconductor device using the same
JP4012866B2 (en) * 2003-08-22 2007-11-21 多摩化学工業株式会社 Quaternary ammonium base type semiconductor surface treatment agent and method for producing the same
JP4678673B2 (en) 2005-05-12 2011-04-27 東京応化工業株式会社 Photoresist stripping solution
EP2371809A4 (en) 2008-12-26 2015-09-02 Knc Lab Co Ltd Method for producing concentrated solution for photoresist stripper having low water content
JP6165442B2 (en) 2009-07-30 2017-07-19 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Post ion implanted photoresist stripping composition for advanced semiconductor applications.
JP5808221B2 (en) * 2011-10-28 2015-11-10 株式会社トクヤマ Method for producing tetraalkylammonium salt solution
JP2017026645A (en) * 2013-12-03 2017-02-02 Jsr株式会社 Resist remover and resist removing method
JP6385857B2 (en) 2015-02-27 2018-09-05 京セラ株式会社 Power management apparatus and control method thereof
JP6694451B2 (en) * 2016-02-12 2020-05-13 富士フイルム株式会社 Pattern forming method and electronic device manufacturing method
JP6072960B1 (en) 2016-03-24 2017-02-01 株式会社バンダイ Doll toy wrist joint structure and doll toy
JP6759174B2 (en) * 2016-11-07 2020-09-23 富士フイルム株式会社 Treatment liquid and pattern formation method

Also Published As

Publication number Publication date
TW202026274A (en) 2020-07-16
US20220033343A1 (en) 2022-02-03
CN112752746A (en) 2021-05-04
CN112752746B (en) 2023-07-28
KR20210066818A (en) 2021-06-07
WO2020067365A1 (en) 2020-04-02
TWI821419B (en) 2023-11-11

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