WO2013035956A1 - 트리알콕시실란의 제조방법 - Google Patents
트리알콕시실란의 제조방법 Download PDFInfo
- Publication number
- WO2013035956A1 WO2013035956A1 PCT/KR2012/002428 KR2012002428W WO2013035956A1 WO 2013035956 A1 WO2013035956 A1 WO 2013035956A1 KR 2012002428 W KR2012002428 W KR 2012002428W WO 2013035956 A1 WO2013035956 A1 WO 2013035956A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- silicon
- solvent
- reaction
- trialkoxysilane
- reactor
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 99
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 131
- 239000010703 silicon Substances 0.000 claims abstract description 127
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 127
- 239000002904 solvent Substances 0.000 claims abstract description 97
- 238000006243 chemical reaction Methods 0.000 claims abstract description 87
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 55
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 49
- 239000012535 impurity Substances 0.000 claims abstract description 22
- 239000012528 membrane Substances 0.000 claims abstract description 20
- 238000010298 pulverizing process Methods 0.000 claims abstract description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims abstract description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims abstract description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims abstract description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 70
- 230000008569 process Effects 0.000 claims description 55
- 239000003054 catalyst Substances 0.000 claims description 43
- 239000000725 suspension Substances 0.000 claims description 41
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 36
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims description 25
- 238000000227 grinding Methods 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 22
- 239000000919 ceramic Substances 0.000 claims description 19
- 230000000740 bleeding effect Effects 0.000 claims description 17
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 9
- 239000011148 porous material Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 230000002194 synthesizing effect Effects 0.000 claims description 3
- 230000006698 induction Effects 0.000 abstract description 21
- 238000007254 oxidation reaction Methods 0.000 abstract description 4
- 230000003647 oxidation Effects 0.000 abstract description 3
- 239000002210 silicon-based material Substances 0.000 abstract 1
- 235000019441 ethanol Nutrition 0.000 description 46
- 238000002360 preparation method Methods 0.000 description 18
- 239000002994 raw material Substances 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 238000001994 activation Methods 0.000 description 13
- 230000004913 activation Effects 0.000 description 11
- 239000003153 chemical reaction reagent Substances 0.000 description 11
- 229920001296 polysiloxane Polymers 0.000 description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- 239000001257 hydrogen Substances 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 10
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 230000003993 interaction Effects 0.000 description 8
- 238000007086 side reaction Methods 0.000 description 8
- 150000004820 halides Chemical class 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 238000004904 shortening Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000011856 silicon-based particle Substances 0.000 description 4
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 4
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- 229940045803 cuprous chloride Drugs 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000011863 silicon-based powder Substances 0.000 description 3
- MHCVCKDNQYMGEX-UHFFFAOYSA-N 1,1'-biphenyl;phenoxybenzene Chemical compound C1=CC=CC=C1C1=CC=CC=C1.C=1C=CC=CC=1OC1=CC=CC=C1 MHCVCKDNQYMGEX-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 150000001555 benzenes Chemical class 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical class C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- CLZJXKIKGCZUQD-UHFFFAOYSA-N S.[F] Chemical compound S.[F] CLZJXKIKGCZUQD-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical class [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001348 alkyl chlorides Chemical class 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- -1 alkyl silicates Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- WCCJDBZJUYKDBF-UHFFFAOYSA-N copper silicon Chemical compound [Si].[Cu] WCCJDBZJUYKDBF-UHFFFAOYSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000012263 liquid product Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- HGUBFVKLMFGDJZ-UHFFFAOYSA-N methanol;silicon Chemical compound [Si].OC HGUBFVKLMFGDJZ-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 150000002790 naphthalenes Chemical class 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910001392 phosphorus oxide Inorganic materials 0.000 description 1
- LFGREXWGYUGZLY-UHFFFAOYSA-N phosphoryl Chemical class [P]=O LFGREXWGYUGZLY-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229960002415 trichloroethylene Drugs 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/025—Silicon compounds without C-silicon linkages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/72—Copper
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/04—Esters of silicic acids
Definitions
- the present invention relates to a method for producing a trialkoxysilane, and more particularly, to a method for producing a SiH (OR) type 3 trialkoxysilane, wherein R is a methyl, ethyl or propyl group having 1 to 3 carbon atoms.
- the trialkoxysilane is used in various fields such as siliceous oligomers, monosilanes, solar energy or silicon production for semiconductors, and two basic methods are used to synthesize the trialkoxysilane.
- the first is to synthesize in a fixed or fluidized bed in a vapor-gas environment.
- Manufacturing in a vapor-gas environment involves the passage of alcohol vapor through a silicon powder bed comprising a catalyst located in a fixed bed or fluidized bed, which is not widely used due to the difficulty of maintaining a uniform temperature distribution throughout the reactor capacity. .
- This drawback can be eliminated when the direct synthesis reaction takes place in the fluidized bed.
- a method of diluting the gas in alcohol vapors can be used to prevent or minimize the temperature in the fluidized bed at its peak.
- Argon, nitrogen, helium, neon, hydrogen and other gases may be used as the diluent gas.
- the application of additional materials increases the manufacturing cost and the loss of trialkoxysilane and alcohol due to carryover of inert gas.
- the synthesis can be performed at a lower pressure to improve the yield of the target trimethoxysilane, wherein the silicon conversion is 90%, selectivity is 84.2%, and at normal pressures are 65% and 48.8%, respectively.
- the pressure is lowered, the reaction rate is reduced, and as a result, there is a disadvantage that the productivity is lowered.
- [2] proposes to pass hydrogen along with alcohol vapor to the contact mass.
- the hydrogen production and purification parts are separately required, thereby increasing the production cost.
- the contact mass was activated with nitrogen and zinc was added as an accelerator at a reaction temperature of 280 ° C. or lower, the triethoxysilane content in the reaction mass was 87%, but the silicon conversion was very low, 23%.
- the catalytic mass activation comprising silicon and catalyst is carried out stepwise at a temperature of less than 450 DEG C, in [2] and [5] at 300 to 350 DEG C, and under nitrogen or another inert gas atmosphere. Is preferred.
- [6] to [9] propose a method of applying hydrogen for silicon and catalytic activity.
- Activation with hydrogen is carried out in a fixed bed or fluidized bed at approximately 400 ° C.
- the silicon and catalyst mixtures comprise at least 1.5% copper.
- no information on the selectivity, reactivity and reaction stability is given.
- [1] to [9] show that the synthesis of the fluidized bed to obtain triethoxysilane results in a high yield of triethoxysilane and a low silicon conversion rate when the reaction is performed under atmospheric pressure, and the reaction is performed at a low pressure.
- the main synthetic index is improved, but this advantage is offset by the technical characteristics accordingly.
- the liquefied material is additionally injected with alcohol, the value is partially increased, but some problems occur in the trialkoxysilane synthesis process in the fluidized bed, and slight carryover of silicon and the catalyst necessarily occurs, so that the filtration process for the final product Additionally required.
- the second method involves the direct reaction of silicone and alcohol in suspension in the liquid solvent environment of the reactor with agitation.
- the solvent is used to maintain a uniform temperature in the reaction mixture, greatly reducing the possibility of overheating of the reaction environment. It is possible to prevent side reactions, to increase the selectivity of the trialkoxysilane, and to increase the silicon conversion rate.
- the high temperature up to 300 ° C. is maintained in the synthesis of trialkoxysilanes, so that the solvent used in the synthesis should not be decomposed at these temperatures.
- the solvent must be able to effectively maintain a uniform temperature in the reaction system.
- the silicon powder should be well dispersed, and should not cause oxidation in the reaction temperature range of 100 to 300 ° C.
- [16] ⁇ [20] have a considerable induction period until the reaction is activated after the addition of the reaction raw material of silicon and alcohol, which can last from 1 hour to 12 hours.
- the main reason for the induction period is known to be due to the oxide film on the silicon surface. It is proposed to add an activation step to the synthesis of trialkoxysilane to reduce the induction period.
- Activation can take place in the reactor in which the reaction proceeds or in a separate device.
- the activated silicon is preferably transferred to the reactor in a dry neutral environment. Activation takes place at 20-400 ° C., but 150-300 ° C. is preferred. It is proposed to use hydrogen and nitrogen together as an active gas and to activate silicon by methanol for the reaction between silicon and ethanol, because methanol has higher reaction activity on silicon than ethanol or higher alcohols. For example, adding 5% methanol to ethanol significantly increases the reaction rate.
- reaction suspension containing 1 kg of silicon, 14.1 g of copper hydroxide and 2.1 kg of solvent MARLOTHERM ® S was activated at 150 to 250 ° C. for 65 minutes using hydrogen and nitrogen.
- Methanol was fed for 5 hours at a rate of 4.3 g / min at 250 ° C.
- the temperature was then lowered to 230 ° C., the methanol feed was stopped and ethanol was fed at the same rate, at which time the hydrogen feed was stopped and the nitrogen feed was maintained.
- the total amount of active material is calculated stoichiometrically so that the divalent or monovalent copper catalyst is sufficient to be free copper.
- the actual activation process takes considerable time, which is claimed to be due to the large surface of the silicon-copper mass (silicon particulate diameter 50-300 ⁇ m).
- special conditions regarding the particle size of the catalyst used are also required.
- the particle size should be in the range of 1 to 100 ⁇ m, preferably 0.1 to 50 ⁇ m, and more preferably 0.1 to 30 ⁇ m.
- the specific surface area of the catalyst in the raw material is 0.1 to 2 m 2 / g, more preferably 10 to 50 m 2 / g.
- Direct synthesis reactions of silicon using alcohols are possible in both periodic and continuous modes. In cyclic mode, silicon is all introduced into the reactor early in the process, but alcohol is supplied continuously until all of the silicon has reacted.
- reaction temperature is carried out at 150 °C or more, so as not to exceed the temperature at which decomposition of alcohol and solvent occurs. It is preferable to make it at the temperature of 200-260 degreeC. In the case of methanol reaction, 220-250 degreeC is preferable, and in the case of ethanol, it is 200-240 degreeC. Direct synthesis reactions of trialkoxysilanes are possible with both high and low pressures, but atmospheric pressure is more preferred.
- [21] and [22] propose to treat powdered silicon with hydrofluoric acid in order to remove the oxide film on the silicon surface before the operation for the purpose of shortening the induction period.
- [10] and [22] propose to activate the reaction mass by maintaining a high temperature in nitrogen, argon and other inert environments, and [23] suggest that silicon and catalysts can be maintained in a mill for 8 hours in an inert atmosphere. It is suggested to premix.
- [21] suggests the injection of alkyl chloride, hydrogen chloride and ammonium chloride to activate the silicon prior to synthesis
- [24] suggests the injection of halides such as NH 4 HF 2 .
- materials such as halides, alkyl halides and methanol are injected into the reactor prior to synthesis, the distillation step of the target is added to remove impurities of the target, which means that the preparation of trialkoxysilanes is complicated.
- side reactions may form oligoalkoxysiloxanes, moisture and other side reactions in addition to the main synthesis reactions of trialkoxysilanes, which are present in the reaction environment. May accumulate at and slow down the synthesis process.
- the metals present in the form of impurities in the silicon synthesis are included in the catalyst, and the metal copper accumulates in the components of the solvent as a result of decomposition of the catalyst. As the residual silicon and the silicon and trialkoxysilane containing impurities accumulate, the reaction rate decreases. In this case, the solvent must be regenerated to continue using the solvent in the trialkoxysilane synthesis.
- [1] proposed a method for producing a trialkoxysilane comprising a silicon grinding operation and an interaction process between silicon and alcohol ground under the action of a catalyst.
- feedstock industrial silicones ground in air up to a particle size of 500 ⁇ m are used. Ethanol and methanol are used as alcohol reagents, and a copper-containing compound such as copper chloride (CuCl) is used as a catalyst. It is mixed with the pulverized silicon and activated by heating the catalyst by preheating for several hours at a temperature below 300 ° C to activate the technical interaction of alcohol and silicon. This technical method is used in other methods similar to [1].
- CuCl copper chloride
- halides are applied for the purpose of the interaction of silicones with alcohols, as organic and inorganic substances containing halogens, such as chlorides, fluorides, methyl bromide, ethyl bromide, ethylene trichloride, fluorine Hydrogen sulfide (HF), hydrogen chloride (HCl), HBr, HI, and the like.
- halogens such as chlorides, fluorides, methyl bromide, ethyl bromide, ethylene trichloride, fluorine Hydrogen sulfide (HF), hydrogen chloride (HCl), HBr, HI, and the like.
- HF fluorine Hydrogen sulfide
- HCl hydrogen chloride
- HBr HBr
- HI HI
- the method has significant drawbacks despite its usefulness.
- the additional energy loss is significant by preheating the catalyst for a long time at temperatures below 300 ° ⁇ , resulting in longer overall process times and increased energy consumption
- [26] includes a silicon grinding operation and an interaction between the alcohol and the ground silicon via a catalyst in an activated heating solvent environment.
- the silicon is ground in air to a particle size of 500 ⁇ m.
- Ethanol and methanol are used as alcohol reagents, and triethoxysilane and trimethoxysilane are obtained as final products, respectively.
- a catalyst a compound containing copper is usually used, and mainly copper chloride (CuCl) is used.
- Polyaromatic oil is used as the solvent, and the main technical process of the interaction between the pulverized silicone and the alcohol is performed in an environment where it is heated to 200 ° C. Reagent activation technology has been applied, the reason for applying this technique is as follows.
- the applied technical measures are to separate unreacted silicon to compensate for the loss of solvent and catalyst,
- the process was activated by adding the concentrated mixture of catalysts periodically to the reaction mass, but there is a technical disadvantage that the process becomes very complicated.
- the addition of a new reagent in place of the bleeding portion does not consider the action of eliminating or shortening the reaction induction period because the reaction may be rapidly reduced or slowed down.
- British Patent No. 2263113 Process for producing trialkoxysilanes / Yamada, Yoshinori, Harada, Katsuyoshi, 1993.
- Japanese Patent Application Laid-Open No. 51-1692 Process for producing trialkoxysilanes / Hisashi Muraoka, Yokohama, Masafumi Asano, 1976.
- the present invention aims to solve the following problems:
- the present invention proposes to solve the above problems.
- mTES is the triethoxysilane mass
- mTEOS is the mass of tetraethoxysilane obtained per unit time as a result of the direct reaction
- k1 and k2 are the molar ratios of silicon consumed during the synthesis of triethoxysilane and tetraethoxysilane, respectively;
- the object of the present invention for solving the problems of the present invention as a preferred embodiment can be achieved by the following methods.
- the object of the present invention is achieved by selecting silicone having a linear dimension of 20 mm to 20 cm before grinding.
- the object of the present invention is also achieved by injecting the required amount of catalyst directly into the silicon mass during the grinding of the solvent environment.
- the object of the present invention is also achieved by using the amount of catalyst used in the range of 1.0 to 10.0 wt% relative to silicon.
- the object of the present invention is also achieved in that the mass ratio of solvent and silicon is from 1: 2 to 2: 1.
- the object of the invention is also achieved by maintaining the solvent in an environment heated to 160-300 ° C. during trialkoxysilane synthesis.
- the object of the present invention is also achieved by continuously mixing the suspension before feeding it to the reactor to maintain a stable ratio of silicon, solvent and catalyst in a continuous process mode.
- the object of the invention is also achieved by keeping the amounts of silicon, solvent and catalyst in the reaction environment evenly throughout the entire synthesis of the trialkoxysilane.
- the object of the present invention is also achieved by bleeding a solvent containing impurities formed in the components of the solvent as the reaction proceeds through a ceramic membrane filter installed in the reactor body.
- the pore size of the ceramic membrane is from 1 to 10 ⁇ m.
- the object of the present invention is also achieved by using a bleeding solvent in the reaction environment through the purification process in the process.
- the raw material silicon in the raw material preparation operation, is pulverized in a solvent environment without contact with the atmosphere, and measures for preventing the formation of oxide film on the surface of the silicon are made, thereby ensuring the activation of the reaction in the technical process, Unlike the prior arts, the initial induction period of the silicone and alcohol reactions is significantly shortened, thereby shortening the process time and maximizing the productivity of the product.
- the silicon grinding process which is a raw material preparation work, is performed in an environment using a solvent having the same component as the solvent used in the future synthesis process, the technical process is not complicated, and the continuous process is possible by continuously supplying the consumed suspension. .
- the present invention can reduce the induction period of the direct synthesis reaction in the manufacturing process of the trialkoxysilane, and can be continuously synthesized by the continuous removal of impurities, thereby significantly shortening the overall process time and at the same time continuing production of the trialkoxysilane. Can be maximized.
- TES triethoxysilane
- the present invention relates to the production of trialkoxysilanes, including the activation of the reaction mass through the silicon grinding operation, in particular the interaction process of the ground silicon with anhydrous alcohol without contact with the atmosphere in the solvent environment, the removal of impurities and the replenishment of the amount of raw materials.
- trialkoxysilane can be synthesized through the following sequential steps.
- a trialkoxysilane represented by the following formula (1) may be preferably prepared.
- R is a methyl, ethyl, propyl or isopropyl group having 1 to 3 carbon atoms.
- the physical basis of the technical scheme proposed by the present invention in the first step of reagent activation is the condition that the grinding of the raw silicon is carried out in a solvent environment, not in the air as in the prior art methods, thereby allowing the natural oxide on the surface of the silicon particles to be produced after grinding. Prevent layer formation.
- the oxide layer is necessarily created on all metal silicon surfaces when in contact with oxygen in the air. This oxidation reaction is possible at all temperatures, including room temperature, and is independent of the chemical purity of the silicon, ie can occur in any case where the silicon pulverization occurs in the air, as in the methods of the prior art.
- the native oxide present on the surface of the pulverized silicon particles causes all difficulties in the technical process for the interaction of silicon with alcohol, namely reaction 'induction period' generation; The necessity of heating the mixture of the ground silicon and the catalyst of [1]; Unreacted silicon production due to incomplete reactions; The use of additional catalysts in the form of halides [1] or the need to recover the concentrated mixture to the reaction mass [26]; And as a result, the design of the technology and apparatus becomes very complex.
- the main disadvantage of the method of the prior arts is excluded, because the grinding operation of the silicon is carried out in a liquid, that is, in a solvent environment so that the grinding operation does not come into contact with the atmosphere, and the oxide on the surface of the silicon particles produced as a result of grinding This is because no layer is formed. That is because it has an active surface. This is because there is no contact with air and at the same time no oxidation can occur by contact with the solvent, which solvent is used continuously in the chemical reactions of the main technical process for future direct use.
- the technical solution according to the present invention prevents the formation of an oxide layer on the surface of the initial silicon particles, thereby ensuring the activation of the main technical process reagents, which are prepared to proceed directly to the trialkoxysilane synthesis reaction.
- the pulverized particulate size of the method proposed by the present invention is 30 to 100 ⁇ m, which is 10 times smaller than [1] and [26], so that the area in which the major reagents come into contact with each other is much increased, and consequently the induction period is increased. Abruptly shortened.
- silicon is pulverized to such a small size in air as in the method similar to [1] or the method proposed in [26]
- the total surface area of the same amount of silicon is reduced rapidly by reducing the particle size. Since the natural oxide film is formed on the surface in the increased state, the induction period is increased and other negative properties are enhanced.
- the invention uses a method of bleeding the suspension through a ceramic membrane filter to prevent removal of coarse silicon fine particles with reactivity in the reactor.
- the amount of silicon supplied to the reactor as the suspension component remains the same as the amount of silicon reacted, and the amount of silicon reacted is determined according to the amount of trialkoxysilane synthesized and / or the amount of hydrogen formed as a result of the reaction.
- the solvent is continuously bleeded at the reactor outlet and this amount of solvent is supplied to the reactor as a suspension component to replenish the bleeding amount to remove impurities from the reactor.
- a linear dimension of 20 mm or more, preferably 20 mm to 20 cm, before grinding can be selected to reliably prevent the possibility that a considerable amount of silicon fine particles having an oxide on the surface will be introduced into the reaction mixture.
- the characteristics appearing by adding the catalyst to the silicon mass before grinding the silicon is as follows. First, both materials are ground to the same size. Second, the materials are homogeneously mixed in the suspension of the solvent environment in which the grinding takes place as a feature of the invention.
- the pore size in the ceramic membrane filter is 1 to 10 ⁇ m. If the pore is smaller than 1 ⁇ m, the filtration process becomes difficult, and if it is larger than 10 ⁇ m, the loss of silicon is increased because the reactive silicon fine particles are removed through the filter. If the initial size of the silicon fine particles is 30-100 ⁇ m, the appropriate pore size in the ceramic membrane filter is 5 ⁇ m, with the total loss of silicon being less than 0.5%.
- the method proposed by the present invention is realized as follows.
- the first silicon which is 98 to 99% pure metal silicon
- the solvent functions as a thermal oil, and as the solvent, for example, alkylated benzene, alkylated naphthalene, polyaromatic oil, etc. may be used, and preferably, THERMINOL ® 66 or other polyaromatic oils may be used as in [26] and other similar methods. Can be.
- the silicon grinding operation is carried out in the solvent environment until the particle size reaches 30 to 100 ⁇ m, and the obtained suspension is continuously supplied to the reactor using a metering pump so that the interaction between the silicon and the alcohol is continued. But do not separate the silicone powder from the solvent. In this case, a contact mass of the planned capacity and components is formed.
- the suspension component added by the amount consumed in the synthesis process in order to maintain a continuous reaction is calculated by using the formula (1), consisting of silicon and the corresponding solvent and catalyst calculated from the amount of trialkoxysilane synthesized In this case, the reaction is continuously and stably added.
- anhydrous alcohol used in the present invention well-known anhydrous ethanol or anhydrous methanol can be used.
- a copper-containing catalyst such as copper chloride (CuCl) can be used.
- the generated vapor-gas mixture and liquid are continuously removed from the reaction volume and separated by any well known technical method, including those used in [1] and [26] or other similar methods.
- the desired triethoxysilane or trimethoxysilane is also separated by this general method.
- the present invention can continuously bleed the solvent using a ceramic membrane filter, and in particular, the induction period can be drastically shortened through the difference in the grinding process of the raw silicon.
- the prior art crushes the raw material silicon in general air, and inevitably an oxide film is formed on the silicon surface, so that an induction period, which is the most important factor in the synthesis of trialkoxysilane, necessarily exists, which is subsequently
- the induction period when the raw material is additionally supplied by bleeding the suspension, the induction period must be passed, but in the present invention, the initial synthesis induction period must be eliminated and abruptly shortened when the trialkoxysilane is synthesized, and impurities can be continuously processed by using a ceramic membrane. There is an effect that can be removed continuously from.
- An example of the method proposed by the present invention is based on the results of experiments in specially designed equipment for trialkoxysilane synthesis.
- the preparation of triethoxysilane is carried out in a 9 L reactor with a working capacity, which is equipped with an electric heating control of the reaction capacity, and is equipped with an impeller stirrer with four wings whose rotation speed is controlled up to 300 to 1500 rpm. It was assumed that. 3.3 kg of metalsilicone were ground in a 6.6 kg solvent THERMINOL ® 66 environment using a Planetary Mill until the particulate size was 30-100 ⁇ m. In the milling process, 0.2 kg of cuprous chloride (CuCl) catalyst was added to the suspension.
- CuCl cuprous chloride
- mTES is the mass of triethoxysilane and mTEOS is the mass of tetraethoxysilane obtained per unit time as a result of the direct reaction.
- Solvents with dissolved impurities are collected in a collection container for recycling. Vacuum is formed from the rear of the ceramic membrane filter to 10 mbar to filter off the unreacted silicon and catalyst and to drain the solvent. At this time, the solvent is continuously discharged from the reactor through the ceramic membrane, and the discharge amount is twice the mSi defined according to Equation 1, which is equal to the amount of the solvent introduced into the reactor as a suspension component. This allows the contact mass component to be kept constant and the level of the component in the reactor constant. The sample of the reactor is bleeded every three hours to adjust the contact mass component. The contact mass level in the reactor is checked visually through the reactor window.
- the synthesis reaction started, the reaction rate increased rapidly for the first 60 minutes, then slowly increased to 120 minutes, and stabilized at the triethoxysilane synthesis level of 420-450 g / h. .
- the silicone 600 g, THERMINOL ® 66 solvent 1200 g of a suspension component was continuously supplied for 500 minutes. During this period 3380 g of triethoxysilane and 141 g of tetraethoxysilane were obtained. The selectivity of the triethoxysilane was 96%.
- Table 1 shows the results of the Examples and Comparative Examples.
- the technical solution proposed by the present invention differs significantly from the conventional methods in that the raw material silicon is pulverized in a liquid environment in the raw material preparation operation, and measures for preventing the formation of an oxide film on the silicon surface are made.
- Example 2 when the suspension is added (Examples 2 and 3), the effect of TES production, TES selectivity, and a significant shortening of the initial induction period were confirmed as compared with the comparative examples, and the bleeding process was also performed (Example 2). Compared with the comparative example, TES production was more than twice as high during the same reaction time.
- the technical solution proposed by the present invention is simply realized by using the prior art equipment, and the above-described raw material preparation work (silicon grinding) is a solvent environment, that is, an environment in which a substance used for its original purpose in a future technical process is used as a solvent. The process is simplified and not complicated.
- the silicon grinding process which is a raw material preparation operation
- the technical process is not complicated, and the suspension is continuously supplied, and the ceramic membrane filter is continuously supplied. It is possible to maximize the productivity and economical efficiency by enabling continuous synthesis process through the continuous removal of impurities, which can drastically shorten the overall process time and continuously produce trialkoxysilane.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
Description
예 | 실리콘 분말 분쇄 방법 |
에탄올 투입후 반응개시 (유도기간, 분) |
투입량 | 블리딩량 | 결과 | |||
MG Si (g) |
용매 (g) |
용매(g) | TES 생산량(g) |
TEOS 생산량(g) |
TES선택성(%) | |||
실시예 1 | 용매 환경 |
10 | - | - | - | 1635 | 105 | 93 |
비교예 | 공기 중 | 150 | - | - | - | 1435 | 614 | 70 |
실시예 2 | 용매 환경 |
10 | 600 | 1200 | 1200 | 3380 | 141 | 96 |
실시예 3 | 용매 환경 |
9 | 290 | 580 | - | 1600 | 120 | 94 |
Claims (12)
- (a) 용매 환경 내에서 실리콘(Si)을 30 ~ 100 μm 미립자 크기로 분쇄하되, 향후 상기 용매를 트리알콕시실란 합성 과정에 직접 용매로 사용하도록 하는 용매 환경에서의 실리콘의 분쇄 단계;
(b) 트리알콕시실란을 합성하는 과정에서 반응에 소모된 양 만큼의 실리콘과 무수알코올의 서스펜션을 계속 반응기에 공급하되, 서스펜션 성분으로 반응기에 공급되는 실리콘의 양과 반응과정에서 반응이 완료된 실리콘의 양을 동일하게 유지하도록, 다음 수학식 1을 이용하여 합성된 트리알콕시실란 양으로부터 서스펜션 소모량을 산출하여, 지속적이고 안정적으로 반응이 진행되도록 서스펜션을 공급하는 트리알콕시실란의 연속 합성단계,
[수학식 1]
mSi=k1·mTES+k2·mTEOS
위 식에서 mTES는 트리에톡시실란 질량, mTEOS는 직접 반응 결과 단위시간당 획득된 테트라에톡시실란의 질량, k1 및 k2는 각각 트리에톡시실란과 테트라에톡시실란의 합성 과정에서 실리콘의 소비된 몰비; 및
(c) 반응기로부터 세라믹 멤브레인 필터를 사용하여 연속적으로 용매를 블리딩(bleeding)하는 방식으로 반응기에 축적된 불순물을 제거하되, 상기 블리딩된 양만큼의 용매를 서스펜션 성분으로 반응기에 계속 공급하여 용매가 보충되도록 하는 불순물 제거단계;
를 포함하는 트리알콕시실란의 제조방법. - 청구항 1에 있어서, 실리콘은 분쇄 전 선형치수가 20 mm ~ 20 cm인 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 용매와 실리콘의 질량비가 1:2 ~ 2:1인 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 촉매가 용매 환경의 분쇄과정에서 직접 실리콘 매스에 1.0 ~ 10.0 wt%의 양으로 투입되는 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 촉매는 구리 함유 촉매인 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 트리알콕시실란의 합성단계에서 용매를 160-300℃로 가열하는 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 실리콘 분쇄단계에서 구리 함유 촉매를 사용하고, 무수알코올로 무수메탄올 또는 무수 에탄올을 사용하며, 합성단계에서 용매를 160-300℃로 가열하면서 상기 (a), (b), (c) 공정을 순차적으로 진행하는 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 실리콘, 용매 및 촉매의 안정적인 비율 유지를 위해 반응기에 공급하기 전 서스펜션을 계속 섞어주는 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 합성 과정 중에 용매에 녹아 있는 불순물과의 반응 과정에서 반응기 본체에 설치된 세라믹 멤브레인 필터를 통해 용매를 블리딩하는 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 세라믹 멤브레인의 기공 크기가 1 ~ 10 μm인 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 트리알콕시실란 합성의 전 과정에 걸쳐 반응 환경 내 실리콘, 용매, 촉매의 양이 일정하게 유지되는 것을 특징으로 하는 방법.
- 청구항 1에 있어서, 트리알콕시실란은 다음 화학식 1로 표시되는 것을 특징으로 하는 방법:
[화학식 1]
SiH(OR)3
상기 화학식 1에서 R은 탄소수 1 내지 3의 메틸, 에틸, 프로필 또는 이소프로필기이다.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/241,581 US9156861B2 (en) | 2011-09-06 | 2012-03-30 | Method for preparing trialkoxysilane |
CN201280043428.3A CN103797018A (zh) | 2011-09-06 | 2012-03-30 | 制备三烷氧基硅烷的方法 |
EP12829300.8A EP2754664B1 (en) | 2011-09-06 | 2012-03-30 | Method for preparing trialkoxysilane |
JP2014529602A JP5836489B2 (ja) | 2011-09-06 | 2012-03-30 | トリアルコキシシランの製造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
UZIAP20110393 | 2011-09-06 | ||
UZ1100393 | 2011-09-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2013035956A1 true WO2013035956A1 (ko) | 2013-03-14 |
Family
ID=47832369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/002428 WO2013035956A1 (ko) | 2011-09-06 | 2012-03-30 | 트리알콕시실란의 제조방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9156861B2 (ko) |
EP (1) | EP2754664B1 (ko) |
JP (1) | JP5836489B2 (ko) |
KR (1) | KR101422080B1 (ko) |
CN (1) | CN103797018A (ko) |
WO (1) | WO2013035956A1 (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104387413B (zh) * | 2014-11-03 | 2017-03-15 | 湖北武大有机硅新材料股份有限公司 | 一种直接法制备三烷氧基硅烷的生产方法 |
KR102060081B1 (ko) * | 2019-04-29 | 2019-12-30 | 한국과학기술연구원 | 테트라알콕시실란의 연속 제조방법 |
CN110745834B (zh) * | 2019-11-27 | 2021-09-10 | 鑫创新材料科技(徐州)有限公司 | 一种气凝胶的绿色生产工艺及其应用 |
CN113683635B (zh) * | 2021-09-02 | 2024-03-26 | 上海赛奥分离技术工程有限公司 | 陶瓷膜技术在四甲基二乙烯基二硅氧烷生产中的应用方法 |
Citations (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2380997A (en) | 1941-09-26 | 1945-08-07 | Gen Electric | Contact masses |
US2473260A (en) | 1946-06-26 | 1949-06-14 | Gen Electric | Preparation of tetramethyl silicate |
US3072700A (en) | 1959-08-07 | 1963-01-08 | Union Carbide Corp | Process for producing silanes |
US3641077A (en) | 1970-09-01 | 1972-02-08 | Eugene G Rochow | Method for preparing alkoxy derivatives of silicon germanium tin thallium and arsenic |
US3775457A (en) | 1971-09-30 | 1973-11-27 | Tokyo Shibaura Electric Co | Method of manufacturing alkoxysilanes |
JPS5034540A (ko) | 1973-07-27 | 1975-04-02 | ||
JPS511692A (ja) | 1974-06-26 | 1976-01-08 | Asahi Chemical Ind | Koseibutsushitsukorisuchinno seiseiho |
US4314908A (en) | 1979-10-24 | 1982-02-09 | Union Carbide Corporation | Preparation of reaction mass for the production of methylchlorosilane |
US4487949A (en) | 1983-11-22 | 1984-12-11 | Union Carbide Corporation | Process for the preparation of alkyl silicates |
US4727173A (en) | 1987-03-31 | 1988-02-23 | Union Carbide Corporation | Process for producing trialkoxysilanes from the reaction of silicon metal and alcohol |
US4762939A (en) | 1987-09-30 | 1988-08-09 | Union Carbide Corporation | Process for trialkoxysilane/tetraalkoxysilane mixtures from silicon metal and alcohol |
US4931578A (en) | 1987-02-23 | 1990-06-05 | Tama Chemicals Co Ltd | Process for the production of trialkoxysilanes |
US5084590A (en) * | 1991-06-24 | 1992-01-28 | Union Carbide Chemicals & Plastics Technology Corporation | Trimethoxysilane preparation via the methanol-silicon reaction using a continuous process and multiple reactors |
US5166384A (en) | 1992-04-07 | 1992-11-24 | Union Carbide Chemicals & Plastics Technology Corporation | Method for the removal of siloxane dissolved in the solvent employed in the preparation of trimethoxysilane via methanol-silicon metal reaction |
EP0517398A1 (en) | 1991-06-03 | 1992-12-09 | Dow Corning Corporation | Preparation of alkoxysilanes |
GB2263113A (en) | 1992-01-13 | 1993-07-14 | Toa Gosei Chem Ind | A process for producing trialkoxysilanes |
JPH05178864A (ja) | 1991-12-27 | 1993-07-20 | Toagosei Chem Ind Co Ltd | トリアルコキシシランの製造方法 |
JPH0665258A (ja) | 1992-08-18 | 1994-03-08 | Toagosei Chem Ind Co Ltd | トリアルコキシシランの製造方法 |
JPH06312994A (ja) | 1993-04-30 | 1994-11-08 | Toagosei Chem Ind Co Ltd | トリアルコキシシランの製造方法 |
JPH06312992A (ja) | 1993-04-30 | 1994-11-08 | Toagosei Chem Ind Co Ltd | トリアルコキシシランの製造方法 |
US5362897A (en) | 1993-04-30 | 1994-11-08 | Toagosei Chemical Industry Co., Ltd. | Process for producing trialkoxysilanes |
US5783720A (en) | 1996-10-10 | 1998-07-21 | Osi Specialties, Inc. | Surface-active additives in the direct synthesis of trialkoxysilanes |
US6090965A (en) | 1998-04-02 | 2000-07-18 | Osi Specialties, Inc. | Removal of dissolved silicates from alcohol-silicon direct synthesis solvents |
US6580000B1 (en) * | 2002-06-06 | 2003-06-17 | Ak Research Company | Process for the manufacture of alkoxysilanes and alkoxy orthosilicates |
KR20030077594A (ko) * | 2001-01-31 | 2003-10-01 | 크롬프톤 코포레이션 | 트리알콕시실란의 직접 합성을 위한 나노크기 구리 촉매전구체 |
RU2235726C1 (ru) | 2003-05-28 | 2004-09-10 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт химии и технологии элементоорганических соединений" | Способ получения алкоксисиланов |
WO2007032865A2 (en) | 2005-09-13 | 2007-03-22 | Momentive Performance Materials Inc. | Process for the direct synthesis of trialkoxysilane |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5034540B2 (ko) | 1972-09-30 | 1975-11-10 | ||
CN1027508C (zh) * | 1992-04-23 | 1995-01-25 | 化工部成都有机硅应用研究技术服务中心 | 直接法合成烷氧基硅烷 |
US7365220B2 (en) * | 2005-09-29 | 2008-04-29 | Momentive Performance Materials Inc. | Process for the recovery of alkoxysilanes obtained from the direct reaction of silicon with alkanols |
CN101353356A (zh) * | 2008-09-22 | 2009-01-28 | 哈尔滨工业大学 | 直接合成三烷氧基硅烷的方法 |
GB0919830D0 (en) | 2009-11-12 | 2009-12-30 | Isis Innovation | Preparation of silicon for fast generation of hydrogen through reaction with water |
-
2012
- 2012-03-28 KR KR1020120031567A patent/KR101422080B1/ko active IP Right Grant
- 2012-03-30 JP JP2014529602A patent/JP5836489B2/ja active Active
- 2012-03-30 EP EP12829300.8A patent/EP2754664B1/en active Active
- 2012-03-30 WO PCT/KR2012/002428 patent/WO2013035956A1/ko active Application Filing
- 2012-03-30 CN CN201280043428.3A patent/CN103797018A/zh active Pending
- 2012-03-30 US US14/241,581 patent/US9156861B2/en active Active
Patent Citations (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2380997A (en) | 1941-09-26 | 1945-08-07 | Gen Electric | Contact masses |
US2473260A (en) | 1946-06-26 | 1949-06-14 | Gen Electric | Preparation of tetramethyl silicate |
US3072700A (en) | 1959-08-07 | 1963-01-08 | Union Carbide Corp | Process for producing silanes |
US3641077A (en) | 1970-09-01 | 1972-02-08 | Eugene G Rochow | Method for preparing alkoxy derivatives of silicon germanium tin thallium and arsenic |
US3775457A (en) | 1971-09-30 | 1973-11-27 | Tokyo Shibaura Electric Co | Method of manufacturing alkoxysilanes |
JPS5034540A (ko) | 1973-07-27 | 1975-04-02 | ||
JPS511692A (ja) | 1974-06-26 | 1976-01-08 | Asahi Chemical Ind | Koseibutsushitsukorisuchinno seiseiho |
US4314908A (en) | 1979-10-24 | 1982-02-09 | Union Carbide Corporation | Preparation of reaction mass for the production of methylchlorosilane |
US4487949A (en) | 1983-11-22 | 1984-12-11 | Union Carbide Corporation | Process for the preparation of alkyl silicates |
US4931578A (en) | 1987-02-23 | 1990-06-05 | Tama Chemicals Co Ltd | Process for the production of trialkoxysilanes |
US4727173A (en) | 1987-03-31 | 1988-02-23 | Union Carbide Corporation | Process for producing trialkoxysilanes from the reaction of silicon metal and alcohol |
US4762939A (en) | 1987-09-30 | 1988-08-09 | Union Carbide Corporation | Process for trialkoxysilane/tetraalkoxysilane mixtures from silicon metal and alcohol |
EP0517398A1 (en) | 1991-06-03 | 1992-12-09 | Dow Corning Corporation | Preparation of alkoxysilanes |
US5177234A (en) | 1991-06-03 | 1993-01-05 | Dow Corning Corporation | Preparation of alkoxysilanes by contacting a solution of hydrogen fluoride in an alcohol with silicon |
US5084590A (en) * | 1991-06-24 | 1992-01-28 | Union Carbide Chemicals & Plastics Technology Corporation | Trimethoxysilane preparation via the methanol-silicon reaction using a continuous process and multiple reactors |
JPH05178864A (ja) | 1991-12-27 | 1993-07-20 | Toagosei Chem Ind Co Ltd | トリアルコキシシランの製造方法 |
GB2263113A (en) | 1992-01-13 | 1993-07-14 | Toa Gosei Chem Ind | A process for producing trialkoxysilanes |
US5260471A (en) | 1992-01-13 | 1993-11-09 | Toagosei Chemical Industry Co., Ltd. | Process for producing trialkoxysilane |
US5166384A (en) | 1992-04-07 | 1992-11-24 | Union Carbide Chemicals & Plastics Technology Corporation | Method for the removal of siloxane dissolved in the solvent employed in the preparation of trimethoxysilane via methanol-silicon metal reaction |
JPH0665258A (ja) | 1992-08-18 | 1994-03-08 | Toagosei Chem Ind Co Ltd | トリアルコキシシランの製造方法 |
JPH06312992A (ja) | 1993-04-30 | 1994-11-08 | Toagosei Chem Ind Co Ltd | トリアルコキシシランの製造方法 |
JPH06312994A (ja) | 1993-04-30 | 1994-11-08 | Toagosei Chem Ind Co Ltd | トリアルコキシシランの製造方法 |
US5362897A (en) | 1993-04-30 | 1994-11-08 | Toagosei Chemical Industry Co., Ltd. | Process for producing trialkoxysilanes |
US5783720A (en) | 1996-10-10 | 1998-07-21 | Osi Specialties, Inc. | Surface-active additives in the direct synthesis of trialkoxysilanes |
US6090965A (en) | 1998-04-02 | 2000-07-18 | Osi Specialties, Inc. | Removal of dissolved silicates from alcohol-silicon direct synthesis solvents |
KR100625148B1 (ko) * | 1998-04-02 | 2006-09-20 | 제너럴 일렉트릭 캄파니 | 알콜-규소 직접 합성 용매에서 용해된 규산염을 제거하는 방법 |
KR20030077594A (ko) * | 2001-01-31 | 2003-10-01 | 크롬프톤 코포레이션 | 트리알콕시실란의 직접 합성을 위한 나노크기 구리 촉매전구체 |
US6580000B1 (en) * | 2002-06-06 | 2003-06-17 | Ak Research Company | Process for the manufacture of alkoxysilanes and alkoxy orthosilicates |
RU2235726C1 (ru) | 2003-05-28 | 2004-09-10 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт химии и технологии элементоорганических соединений" | Способ получения алкоксисиланов |
WO2007032865A2 (en) | 2005-09-13 | 2007-03-22 | Momentive Performance Materials Inc. | Process for the direct synthesis of trialkoxysilane |
Non-Patent Citations (1)
Title |
---|
See also references of EP2754664A4 * |
Also Published As
Publication number | Publication date |
---|---|
JP5836489B2 (ja) | 2015-12-24 |
EP2754664A4 (en) | 2014-07-16 |
EP2754664B1 (en) | 2016-12-28 |
CN103797018A (zh) | 2014-05-14 |
US20140364639A1 (en) | 2014-12-11 |
US9156861B2 (en) | 2015-10-13 |
KR20130027074A (ko) | 2013-03-14 |
JP2014525473A (ja) | 2014-09-29 |
EP2754664A1 (en) | 2014-07-16 |
KR101422080B1 (ko) | 2014-07-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5527520B2 (ja) | アルコキシシランの調製工程 | |
WO2013035956A1 (ko) | 트리알콕시실란의 제조방법 | |
EP3847178B1 (en) | Method for preparing alkylalkoxysilanes | |
KR101153590B1 (ko) | 페닐클로로실란의 제조 방법 | |
EP1368359B1 (en) | Continuous transesterification process for alkoxyorganosilicon compounds | |
EP2099809B1 (en) | Process for preparing organic silane compounds having beta-cyano ester group | |
JP6014771B2 (ja) | トリアルコキシシランを用いたモノシランの製造方法 | |
CN108084219B (zh) | 一种二(二乙基氨基)硅烷合成方法 | |
EP2797855B1 (en) | Method of producing an organic silicon compound | |
EP2032588B1 (en) | Method for preparation of alkoxysilanes having reduced halide content | |
Kim et al. | 111111 Ill lllll lllll lllll lllll lllll 111111111111111111111111111111111 | |
TWI549910B (zh) | 製備三烷氧矽烷之方法 | |
JP3658901B2 (ja) | アルコキシシランの製造方法 | |
KR101344356B1 (ko) | 모노실란 및 테트라알콕시실란의 제조방법 | |
KR20110005910A (ko) | 모노실란 및 테트라알콕시실란의 제조방법 | |
EP3039027B1 (en) | Slurry phase direct synthesis of organohalosilanes from cyclone fines | |
US20200339609A1 (en) | Method for continuous production of tetraalkoxysilane | |
TWI535657B (zh) | 利用三烷氧基矽烷製備甲矽烷的方法 | |
KR19990085368A (ko) | 테트라알콕시실란의 제조방법 | |
JPH0723383B2 (ja) | アルコキシシラン類の製造方法 | |
JPH03190888A (ja) | アミノシラン化合物の製造方法 | |
JPH06312993A (ja) | トリアルコキシシランの製造方法 | |
JPH10182661A (ja) | アルコキシシランの製造法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12829300 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14241581 Country of ref document: US |
|
REEP | Request for entry into the european phase |
Ref document number: 2012829300 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012829300 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref document number: 2014529602 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |