WO2013011761A1 - 洗浄装置 - Google Patents
洗浄装置 Download PDFInfo
- Publication number
- WO2013011761A1 WO2013011761A1 PCT/JP2012/064516 JP2012064516W WO2013011761A1 WO 2013011761 A1 WO2013011761 A1 WO 2013011761A1 JP 2012064516 W JP2012064516 W JP 2012064516W WO 2013011761 A1 WO2013011761 A1 WO 2013011761A1
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- WIPO (PCT)
- Prior art keywords
- liquid
- gas
- cleaning
- electrode
- cleaned
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 100
- 239000007788 liquid Substances 0.000 claims abstract description 224
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 49
- 238000002347 injection Methods 0.000 claims abstract description 28
- 239000007924 injection Substances 0.000 claims abstract description 28
- 239000007789 gas Substances 0.000 claims description 141
- 238000003860 storage Methods 0.000 claims description 61
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 15
- 239000001301 oxygen Substances 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 15
- 238000005192 partition Methods 0.000 claims description 9
- 238000000746 purification Methods 0.000 abstract description 6
- 239000012530 fluid Substances 0.000 abstract 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 34
- 239000000919 ceramic Substances 0.000 description 15
- 239000005416 organic matter Substances 0.000 description 11
- 239000000126 substance Substances 0.000 description 9
- 238000005406 washing Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 150000001721 carbon Chemical group 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 210000002374 sebum Anatomy 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 206010014357 Electric shock Diseases 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 239000002101 nanobubble Substances 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D27/00—Shaving accessories
- A45D27/46—Devices specially adapted for cleaning or disinfecting shavers or razors
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/14—Plasma, i.e. ionised gases
Definitions
- the present invention relates to a cleaning apparatus for cleaning small electric equipment such as an electric razor.
- the liquid to be treated contains various contaminants and impurities. Therefore, the electrical resistance value of the liquid may fluctuate greatly depending on these components.
- the electrical resistance of the liquid fluctuates, even if a predetermined voltage is applied between the electrodes, the manner of occurrence of discharge varies, and plasma cannot be generated stably. As a result, the amount of radicals generated varies, and there is a problem that a large amount of radicals cannot be obtained stably.
- the generated radicals biologically treat water (wastewater) containing organic matter in the presence of activated sludge containing aerobic or anaerobic microorganisms.
- water wastewater
- waste water containing a non-biodegradable substance there are cases where physical dirt present in the liquid adheres to the portion to be cleaned. Such a problem is a problem that may occur even in a conventional cleaning apparatus that is not plasma cleaning.
- the present invention has been made to solve the above-described problems, and an object of the present invention is to provide a cleaning apparatus capable of removing physical dirt adhering to a portion to be cleaned.
- the cleaning apparatus is a cleaning apparatus for cleaning a small electric device, cleaning an object to be cleaned in a cleaning liquid, and from a water injection unit toward the object to be cleaned at the time of cleaning finishing. It is characterized by pouring water.
- the cleaning apparatus according to the second aspect of the present invention is characterized in that the water injection section injects the liquid when the object to be cleaned is exposed.
- the cleaning apparatus according to the third aspect of the present invention is characterized in that the water injection section is disposed above the liquid surface of the cleaning liquid.
- the cleaning device is characterized in that the water injection section is disposed so as to surround the object to be cleaned.
- the cleaning apparatus includes a liquid storage unit that stores a liquid containing at least water, a gas storage unit that stores gas, and the gas storage unit and the gas storage unit that are separated from each other.
- a partition wall formed with a gas passage for allowing the gas to flow in the housing portion and guiding the gas to the liquid housing portion; a first electrode disposed in the gas housing portion; and the first electrode; A second electrode disposed at a distance and at least a portion of the first electrode paired with the liquid in the liquid container; and the gas in the gas container is used as the gas.
- a cleaning device using a plasma generator including a plasma power supply unit that converts the gas introduced into the gas storage unit into plasma in the liquid in the liquid storage unit, The cleaning object is cleaned in a cleaning liquid generated by a generator.
- FIG. 1 is a diagram including a partial cross-section schematically showing a configuration of a plasma generator according to an embodiment of the present invention.
- FIG. 2 is a diagram showing the relationship between the potential on the first electrode side and the potential on the second electrode side of the plasma generator according to one embodiment of the present invention.
- FIG. 3 is a partial enlarged cross-sectional view schematically showing one state for explaining the operation of the plasma generator according to one embodiment of the present invention.
- 4 is a partially enlarged cross-sectional view schematically showing a state after the state shown in FIG.
- FIG. 5 is a diagram including a partial cross-section schematically showing the configuration of the cleaning and purifying apparatus according to the embodiment of the present invention.
- FIG. 1 is a diagram including a partial cross-section schematically showing a configuration of a plasma generator according to an embodiment of the present invention.
- FIG. 2 is a diagram showing the relationship between the potential on the first electrode side and the potential on the second electrode side of the plasma generator according to one embodiment of the present invention.
- FIG. 6 is a perspective view showing a specific example of a cleaning and purifying apparatus using a plasma generator according to an embodiment of the present invention.
- 7 is a side sectional view of the cleaning and purifying apparatus shown in FIG. 8 is a cross-sectional view taken along the line AA in FIG.
- FIG. 9 is a side sectional view of a cleaning and purifying apparatus using the plasma generator according to one embodiment of the present invention.
- the cleaning and purifying apparatus according to the present embodiment is premised on the use of the plasma generator 1 that can efficiently generate a large amount of radicals. First, the plasma generator 1 will be described in detail.
- the plasma generator 1 includes a substantially cylindrical case member 2.
- the shape of the case member 2 is not limited to a cylindrical shape, and may be a rectangular tube shape.
- a ceramic member 3 is disposed inside the case member 2, and the internal space of the case member 2 is vertically partitioned by the ceramic member 3.
- the upper region of the ceramic member 3 is a liquid storage portion 4 that stores a liquid 17 containing water.
- the lower region of the ceramic member 3 is a gas accommodating portion 5 that accommodates gas.
- the ceramic member 3 corresponds to a partition wall that separates the liquid container 4 and the gas container 5.
- a ring-shaped sealing material 6 that closes the gap between the case member 2 and the ceramic member 3 is attached to the outer peripheral end of the liquid storage portion 4. As a result, the liquid 17 in the liquid storage part 4 does not leak into the gas storage part 5 from the gap between the case member 2 and the ceramic member 3.
- a liquid inlet 7 for introducing the liquid 17 into the liquid storage part 4 is provided in the top wall part (wall part on the liquid storage part 4 side) 2 a of the case member 2.
- a liquid discharge port 8 is provided through which the liquid 17 introduced into the liquid storage unit 4 is sent to the outside.
- a gas inlet 9 that communicates the gas storage portion 5 with the outside is provided at the lower portion of the side wall 2 b of the case member 2.
- a pipe (gas introduction path) 10 is inserted into the gas introduction port 9, and the gas storage part 5 and the gas supply part 11 are connected via the pipe 10.
- a gas containing at least oxygen (O 2 ) is supplied from the gas supply unit 11 into the gas storage unit 5.
- a gas passage 3 a is formed in the ceramic member 3. Therefore, the gas or the like introduced from the gas supply unit 11 into the gas storage unit 5 is sent out into the liquid storage unit 4 through the gas passage 3a.
- the gas supply unit 11 has a function of supplying a gas containing at least oxygen to the gas storage unit 5 in a mode in which the gas in the gas storage unit 5 is pumped to the liquid storage unit 4 through the gas passage 3a.
- the hole diameter of the gas passage 3a is about 1 ⁇ m to 10 ⁇ m so that the liquid 17 stored in the liquid storage portion 4 does not leak into the gas storage portion 5 from the gas passage 3a.
- the plasma generator 1 includes a first electrode 12 and a second electrode 13.
- the first electrode 12 is disposed in the gas storage unit 5.
- the second electrode 13 is spaced apart from the first electrode 12, and is disposed so that at least a portion that is paired with the first electrode 12 is in contact with the liquid 17 in the liquid storage unit 4.
- the doughnut-shaped first electrode 12 and the doughnut-shaped second electrode 13 are disposed in the gas storage unit 5 and the liquid storage unit 4, respectively.
- the doughnut-shaped first electrode 12 is disposed on the surface 3 b of the ceramic member 3 on the gas accommodating portion 5 side so that the center is the gas passage 3 a.
- the surface of the first electrode 12 is covered with a dielectric (not shown).
- the second electrode 13 is disposed in the liquid storage unit 4 so that at least a part on the side paired with the first electrode 12 is in contact with the liquid 17 in the liquid storage unit 4.
- the second electrode 13 is also arranged so that the center is the gas passage 3a. That is, the first electrode 12 and the second electrode 13 are arranged concentrically.
- the doughnut-shaped first electrode 12 is disposed in the gas storage unit 5 so that the first electrode 12 does not come into contact with the liquid 17 introduced into the liquid storage unit 4.
- the second electrode 13 is introduced into the liquid storage part 4. In contact with the liquid 17.
- the first electrode 12 and the second electrode 13 are electrically connected to the plasma power supply unit 15 (see FIG. 1) via lead wires 14, and the first electrode 12 and the second electrode 13 are connected to each other. A predetermined voltage is applied between them. As shown in FIG. 2, the risk of electric shock can be avoided by making the potential on the second electrode 13 side in the liquid 17 lower than the potential on the first electrode 12 side in the gas. .
- the gas containing oxygen is supplied to the gas accommodating part 5 in the aspect which pumps the gas of the gas accommodating part 5 to the liquid accommodating part 4 via the gas passage 3a (process to supply gas).
- a gas containing oxygen based on air (flow rate of about 0.01 L / min to 1.0 L / min (10 cc / min to 1000 cc / min)) is supplied to the gas supply unit.
- 11 is sent into the gas storage unit 5 through the pipe 10.
- the pressure for feeding the gas is an order of about 0.0098MPa ⁇ 0.49MPa (0.1kgf / cm 2 ⁇ 5kgf / cm 2).
- the gas supply unit 11 has a function of supplying gas (air) in the atmosphere.
- the gas supply flow rate is controlled by a flow rate control unit provided in the gas supply unit 11.
- the gas supply unit 11 may be provided with a function (a species control unit) that can supply not only the gas in the atmosphere but also other types of gases (for example, gases having different oxygen concentrations). This makes it possible to selectively supply one type or a plurality of types of gases from various types of gases.
- the pressure of the gas container 5 is about 0.11 MPa to 0.59 MPa (1.1 kgf / cm 2 to 6 kgf / cm 2 ) when gas is supplied to the gas container 5 and this pressure is added to the atmospheric pressure. It becomes the degree and becomes a positive pressure state.
- a gas flow from the gas accommodating part 5 to the liquid accommodating part 4 through the gas passage 3a is formed.
- the liquid 17 accommodated in the liquid accommodating part 4 leaks in the gas accommodating part 5 from the gas channel
- the bubble 16 containing oxygen is formed in the opening end 3c on the liquid container 4 side (upper side in FIG. 1) of the gas passage 3a. Grow (the process of growing bubbles).
- a predetermined voltage is applied to the first electrode 12 and the second electrode 13 by the plasma power supply unit 15.
- This voltage is preferably a voltage (power: about 10 W to about 100 W) that enables glow discharge under atmospheric pressure.
- a predetermined voltage is applied to the first electrode 12 and the second electrode 13
- a discharge is generated between the first electrode 12 and the second electrode 13 under a gas atmosphere at atmospheric pressure or higher. Occurs.
- plasma is generated in the gas region in the liquid 17 of the liquid storage unit 4, and ozone, hydroxy radicals, and the like are generated by water contained in the liquid and oxygen contained in the gas (step of generating hydroxy radicals).
- the technique for generating plasma under atmospheric pressure is reported in, for example, Document A (Sachiko Okazaki, “Atmospheric pressure glow discharge plasma and its application”, review lecture: 20th JSPF Annual Meeting).
- plasma is generated by generating a potential difference in the gas in the bubble 16 (the gas in the vicinity of the gas-liquid interface in the liquid 17 of the liquid container 4).
- a potential difference in the vicinity of the gas-liquid boundary surface where hydroxy radicals are likely to be generated near the open end 3c facing the liquid 17 in the gas passage 3a
- more ozone, hydroxy radicals, and the like are generated. . That is, ozone, hydroxyl radicals, and the like can be generated not only in the bubbles 16 near the opening end 3 c facing the liquid 17 in the gas passage 3 a but also in the bubbles 16 sent out to the liquid storage unit 4.
- the ozone, hydroxy radicals, and the like thus generated are sent out to the liquid storage unit 4 along with the gas flow described above.
- the bubbles 16 containing hydroxy radicals and the like are sheared from the ceramic member (partition wall portion) 3 and released into the liquid 17 by the flow of the liquid 17 in the liquid storage portion 4 (bubble releasing step).
- the flow of the liquid 17 is generated by the introduction of the liquid 17.
- the flow of the liquid 17 acts as a shearing force on the bubble 16, and the bubble 16 is released into the liquid 17 from the opening end 3c.
- the bubbles 16 released in the liquid 17 are fine bubbles, they are diffused to every corner of the liquid 17 without being immediately released into the atmosphere. A part of the diffused fine bubbles 16 is easily dissolved in the liquid 17. At this time, ozone or the like contained in the bubbles 16 is dissolved in the liquid 17, so that the ozone concentration of the liquid rises at a stretch.
- a hydroxy radical or the like has a relatively large energy of about 120 kcal / mol.
- N N
- C C
- C N
- the first electrode 12 is disposed in the gas storage unit 5, and the second electrode 13 is at least a portion that faces the first electrode 12 in the liquid storage. It arrange
- the liquid 17 is introduced into the liquid container 4, and the first electrode 12 that generates plasma is disposed in the gas container 5 defined by the ceramic member 3. Therefore, the first electrode 12 does not contact the liquid 17 at all and is not affected by the electric resistance of the liquid 17. As a result, a discharge can be stably generated between the first electrode 12 and the second electrode 13, and the gas containing oxygen introduced into the gas storage unit 5 is reliably turned into plasma, and water and oxygen From this, ozone or hydroxy radicals can be stably generated.
- ozone, hydroxy radicals, and the like are generated in the gas in the bubbles 16 (the gas in the vicinity of the gas-liquid interface in the liquid 17 of the liquid container 4).
- a gas containing ozone, hydroxy radicals, and the like is diffused into the liquid 17 as fine bubbles 16.
- the ozone and various radicals can be efficiently fed into the liquid 17 in a very short time before they disappear.
- the fine bubbles 16 containing ozone and various radicals diffuse into the liquid 17, so that the ozone concentration of the liquid 17 is increased and the bubbles 16 are adsorbed to the organic matter contained in the liquid 17.
- organic matter, bacteria, and the like can be efficiently decomposed by ozone dissolved in the liquid 17 and various radicals contained in the adsorbed bubbles 16.
- the size of the main body portion of the plasma generator 1 excluding the plasma power supply unit 15 and the gas supply unit 11 can be made compact. can do. As a result, it can be easily incorporated into an existing device, and even when newly installed in the device, the occupied space can be minimized.
- the gas supply unit 11 has a gas type control unit that controls the type of gas, it is possible to adjust the amount of ozone, hydroxy radicals, and the like generated. At this time, if the gas supply unit 11 has a function of supplying air in the atmosphere, the gas can be supplied more easily. Furthermore, if the gas supply flow rate is controlled by the flow rate control unit, plasma can be generated more stably.
- the cleaning and purifying device 20 includes the above-described plasma generator 1 as shown in FIG.
- a pipe (liquid introduction path) 21 that introduces the liquid 17 that has been processed from the object to be cleaned (object to be cleaned) 30 into the liquid container 4 at the liquid inlet 7 of the case member 2 that accommodates the ceramic member 3. Is connected.
- the liquid discharge port 8 is connected to a pipe (liquid discharge path) 22 for sending the liquid in the liquid storage unit 4 to the target portion 30 to be cleaned.
- a predetermined flow rate gas containing oxygen based on air is sent from the gas supply unit 11 into the gas storage unit 5 through a pipe (gas introduction path) 10.
- the gas accommodating part 5 is made into a positive pressure state, and the flow of the gas which goes to the liquid accommodating part 4 through the gas channel
- the liquid 17 that has been processed is introduced into the liquid storage unit 4 through the pipe (liquid introduction path) 21 and the liquid introduction port 7 from the target portion 30 to be cleaned.
- the fine bubbles 16 released in the liquid diffuse to every corner of the liquid. At this time, a part of the diffused fine bubbles 16 is easily dissolved in the liquid 17 together with ozone, hydroxy radicals, etc. contained in the bubbles 16 and the ozone concentration is increased. Also, some of the bubbles 16 are easily adsorbed by organic substances or the like contained in the liquid 17 in a state containing ozone, hydroxy radicals, or the like. Further, fine organic substances are adsorbed on a part of the bubbles 16.
- the organic matter or the like in the liquid 17 is efficiently decomposed by ozone or radicals dissolved in the liquid 17 or ozone or radicals contained in the bubbles 16 adsorbed on the organic matter.
- the liquid 17 purified by decomposing organic matter or the like is returned from the liquid discharge port 8 through the pipe (liquid discharge path) 22 to the target portion 30 to be cleaned and used again.
- the cleaning and purifying device 20 is exemplified by the usage mode (usage mode A) in which the liquid 17 is cleaned and purified in the case member 2, but in addition to this, the liquid 17 in which fine bubbles are diffused is used.
- a usage mode (Usage mode B) in which the cleaning liquid is supplied to a predetermined apparatus is also possible.
- the cleaning and purifying device 20 operates as follows.
- fine bubbles 16 containing ozone and hydroxy radicals are diffused in the liquid 17 introduced into the case member 2, and the ozone and radicals contained in the fine bubbles 16 are dissolved. At this time, fine organic substances are adsorbed on a part of the bubbles 16.
- the liquid 17 is supplied to the cleaning target portion 30 as a cleaning liquid.
- the organic matter or the like is efficiently decomposed by ozone or radicals dissolved in the liquid 17 or ozone or radicals contained in the bubbles 16 adsorbed by the organic matter or the like.
- cleaning purification apparatus can be applied, for example to purification
- usage mode B for example, it can be used as a cleaning liquid in water used for various home appliances such as washing machines and dishwashers, health home appliances such as a mouth washer, and sanitary equipment such as a toilet.
- home appliances and the like it can be widely applied to industries such as washing of food and washing in the manufacturing process of industrial products.
- the cleaning and purifying apparatus 20 with the plasma generator 1 described above, it is possible to obtain the cleaning and purifying apparatus 20 that can efficiently generate a large amount of radicals. Moreover, if the cleaning and purifying apparatus 20 is provided with a position adjusting unit that adjusts the position of the plasma generator 1, the plasma can be further stabilized.
- the cleaning and purifying device 40 is for cleaning the head portion 51 of the electric razor 50 that is a kind of hair removal device, and is a cleaning and purifying device used as the above-described use mode B.
- the head portion 51 of the electric razor 50 corresponds to the cleaning target portion 30.
- the cleaning and purifying apparatus 40 includes a housing 41 having an opening 41a for inserting an electric shaver 50 with the head portion 51 facing downward, and a head portion 51 inserted through the opening 41a. And a receiving tray 42 for receiving. Further, a tank 43 for storing liquid, an overflow part 44 communicated with the tray 42, and a pump 45 for circulating and supplying the liquid in the tank 43 to the liquid inlet 7 of the water injection part 60 are provided. Furthermore, a cartridge 46 having a filter 46a for filtering liquid, an on-off valve 47 for controlling the airtight state in the tank 43, and a circulation path for circulating the liquid are provided.
- This circulation path is composed of a pipe (liquid introduction path) 21, a pipe (liquid discharge path) 22, a path 23 (discharge path), a path 24, a path 25, and a path 26.
- the pipe (liquid introduction path) 21 guides the liquid stored in the tank 43 to the liquid introduction port 7.
- the pipe (liquid discharge path) 22 guides the liquid discharged from the liquid discharge port 8 to the tray 42.
- the path 23 (discharge path) guides the liquid discharged from the receiving tray 42 to the cartridge 46.
- the path 24 guides the liquid discharged from the overflow portion 44 to the cartridge 46.
- the path 25 guides the liquid discharged from the cartridge 46 to the pump 45.
- the path 26 guides the liquid delivered from the pump 45 to the tank 43.
- An open / close valve 47 is connected to the tank 43 via an airtight path 27.
- the housing 41 has a stand part 41b that comes into contact with the grip part 52 of the electric razor 50 at its rear part, and holds the electric razor 50 inserted from the opening 41a together with the receiving tray 42.
- a contact member 41c for detecting that the electric shaver 50 is attached to the cleaning and purifying device 40 is provided on the front surface of the stand portion 41b.
- the contact member 41 c detects the mounting of the electric razor 50 by contact with a terminal 52 a provided on the back surface of the grip portion 52.
- the electric razor 50 is provided with a function of outputting various control signals and driving power.
- a fan 48 for drying the head part 51 after cleaning is accommodated above the front part of the housing 41.
- a ventilation window 41d for the fan 48 On the front surface of the housing 41, there are provided a ventilation window 41d for the fan 48, an operation button 41e for executing a cleaning operation, a lamp 41f for displaying an operation state, and the like.
- the rear surface side of the housing 41 is a mounting portion for mounting the tank 43, and has connection ports 41 g, 41 h, 41 i connected to the ports 43 a, 43 b, 43 c of the tank 43.
- the connection port 41g is connected to the pipe (liquid introduction path) 21, the connection port 41h is connected to the path 26, and the connection port 41i is connected to the airtight path 27.
- the receiving tray 42 has a concave shape that follows the shape of the head portion 51, and the plasma generator 1 is provided on the back side of the bottom wall portion. You may make it provide the position adjustment part which adjusts the position of the plasma generator 1 in the washing
- FIG. For example, an arm portion is provided on the back side of the bottom wall portion, the plasma generating device 1 is swingably attached by the arm portion, and the plasma generating device 1 can be adjusted by the position adjusting portion so as to be horizontally disposed. May be. If it carries out like this, the plasma generator 1 can always be arrange
- the plasma generator 1 has a liquid inlet 7 connected to a pipe (liquid inlet path) 21 and a liquid outlet 8 connected to a pipe (liquid outlet path) 22.
- a supply port 41 j connected to the pipe (liquid discharge path) 22 and a discharge port 41 k connected to the path 23 are provided on the bottom wall portion of the tray 42.
- a heater 49 is provided on the back side of the bottom wall of the tray 42 (see FIG. 8). The heater 49 is used to dry the head unit 51 in conjunction with the fan 48.
- An overflow portion 44 is provided in front of the tray 42. In the present embodiment, the tray 42 and the overflow portion 44 are integrally formed. The inlet of the overflow part 44 is connected to the tray 42 and the outlet is connected to the path 24. The path 24 reaches from the outlet of the overflow part 44 to the cartridge 46 via the relay port 42a provided at the rear part of the tray 42.
- the tank 43 has a discharge port 43a, an inflow port 43b, and a vent port 43c for opening an airtight state on the front surface, and liquid discharge from the discharge port 43a is controlled by opening and closing the vent port 43c. .
- the tank 43 is detachably provided on the rear surface side of the housing 41.
- the discharge port 43 a is connected to the connection port 41 g and is connected to the liquid introduction port 7 of the plasma generator 1 by the pipe (liquid introduction path) 21.
- the inflow port 43b is connected to the connection port 41h and is connected to the delivery port 45a of the pump 45 through the path 26.
- the air vent 43 c is connected to the connection port 41 i and connected to the on-off valve 47 through the airtight path 27.
- the cartridge 46 is a substantially box-shaped body in which the filter 46 a is accommodated, and is detachably provided at the lower rear of the housing 41.
- the upper part has an inflow port 46b, and the front part has an outflow port 46c.
- the inflow port 46 b is connected to the discharge port 41 k by the path 23 (discharge path) and is connected to the outlet of the overflow portion 44 by the path 24. Further, the outlet 46 c is connected to the suction port 45 b of the pump 45 through the path 25.
- fine bubbles 16 containing ozone, hydroxy radicals, etc. are diffused into the liquid introduced from the tank 43 into the plasma generator 1 to generate a cleaning liquid.
- the generated cleaning liquid is supplied into the receiving tray 42 from the supply port 41j, and is supplied to the head unit 51 as the processing target portion 30 to be cleaned.
- the organic matter or the like attached to the head unit 51 can be efficiently decomposed by ozone or radicals dissolved in the liquid (cleaning liquid), ozone or radicals contained in the bubbles 16, or the like.
- the cleaning liquid in the tray 42 has physical dirt such as wrinkles and sebum, and such physical dirt may adhere to the head portion 51. Therefore, in the present embodiment, in order to remove physical dirt adhering to the head unit 51, a water injection unit 60 for injecting liquid toward the head unit 51 is provided as shown in FIGS.
- the water injection part 60 is a square-shaped nozzle that surrounds the head part 51 from four directions, and a plurality of openings 41m are formed inside the water injection part 60 at predetermined intervals.
- the liquid inlet 7 of the water injection section 60 is connected to the tank 43.
- the attachment position of the water injection part 60 is not specifically limited, It is preferable to arrange
- the liquid level 70 of the cleaning liquid here is the maximum liquid level 70 assumed when the liquid is stored in the tray 42. If the water injection part 60 is arranged above the liquid level 70 of the cleaning liquid, the liquid can be injected without receiving resistance in the cleaning liquid. Further, as shown in FIG. 7, since the head portion 51 is held by the casing 41 in a state of being inclined at a predetermined angle, the water injection portion 60 is also inclined and attached at a predetermined angle. preferable. In this way, the opening 41 m of the water injection part 60 faces the surface of the head part 51, and liquid can be uniformly injected into the head part 51.
- the head part 51 is washed in the washing liquid in the receiving tray 42, and a liquid is poured from the water injection part 60 toward the head part 51 at the time of cleaning finishing.
- the liquid is introduced from the tank 43 to the water injection unit 60.
- This liquid is ejected from the opening 41m of the water injection section 60 toward the head section 51, and soot and sebum adhering to the head section 51 are removed.
- the ejected liquid is discharged from the liquid discharge port 8 via the receiving tray 42 and is guided to the tank 43 via the cartridge 46.
- the cleaning and purifying apparatus When the cleaning and purifying apparatus is used as the use mode A described above, as shown in FIG. 9, the top wall of the case member 2 of the plasma generator 1 is opened, and the liquid cleaned and purified in the case member 2 is used.
- the head portion 51 may be immersed in the head 17. Even if it does in this way, like the case of the use aspect B, the organic substance etc. which adhered to the head part 51 can be decomposed
- the head unit 51 is cleaned in the cleaning liquid generated by the plasma generator 1, and liquid is supplied from the water injection unit 60 toward the head unit 51 during the cleaning finish. Water is poured. As a result, a large amount of radicals can be efficiently generated, and physical dirt attached to the head unit 51 can be removed.
- the water injection unit 60 injects liquid when the head unit 51 is exposed. Thereby, since the water can be poured more vigorously than in the case where the head unit 51 is in the cleaning liquid, it is possible to further increase the cleaning power.
- the water injection unit 60 is disposed above the liquid level 70 of the cleaning liquid. Thereby, since the liquid can be poured without receiving resistance in the cleaning liquid, it is possible to further increase the cleaning power.
- the water injection part 60 is arranged so as to surround the head part 51. Thereby, since water can be poured from four directions toward the head portion 51 without a blind spot, it is possible to more effectively and uniformly remove physical dirt, and it is possible to shorten the cleaning time. .
- the ceramic member is exemplified as the partition wall portion in which the gas passage is formed.
- the material of the partition wall portion is not limited to the ceramic member.
- an appropriate member such as a glass plate that partitions gas and liquid is used, and a member having fine pores of about 1 ⁇ m to 10 ⁇ m formed by photolithography and etching is used. Is possible.
- a plurality of gas passages may be provided in the partition wall.
- the specifications (shape, size, layout, etc.) of the liquid storage unit, the gas storage unit, and other details can be changed as appropriate.
- the water injection section 60 is not limited to the one illustrated here. That is, it is only necessary that the liquid can be poured toward the head portion 51, and the shape, size, layout, and the like can be changed.
- the timing of pouring water is preferably when the head portion 51 is exposed as described above, but it is also possible to pour water when the head portion 51 is in the cleaning liquid.
- the cleaning and purification apparatus 40 has been described on the assumption that the plasma generator 1 is used, but the present invention is not limited to this. That is, the present invention can be applied to a conventional cleaning apparatus that is not plasma cleaning as long as it is a cleaning apparatus for cleaning small electric devices such as the electric shaver 50.
- the present invention can be applied to a cleaning apparatus that needs to remove physical dirt adhering to a portion to be cleaned.
- Plasma generator Ceramic member (partition wall) 3a Gas passage 4 Liquid storage part 5 Gas storage part 11 Gas supply part 12 First electrode 13 Second electrode 15 Plasma power supply part 20 Cleaning and purifying device 30 Target part to be cleaned (object to be cleaned) 40 Cleaning and purifying device 60 Water injection part 70 Liquid level of cleaning liquid
Landscapes
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
Description
本実施形態にかかるプラズマ発生装置1は、図1に示すように、略円筒状のケース部材2を備えている。ケース部材2の形状は円筒状に限らず、角筒状としてもよい。ケース部材2の内側にはセラミックス部材3が配設されており、このセラミックス部材3によってケース部材2の内部空間が上下に仕切られている。ケース部材2の内部空間のうち、セラミックス部材3の上側の領域は、水を含む液体17を収容する液体収容部4となっている。一方、セラミックス部材3の下側の領域は、気体を収容する気体収容部5となっている。このように、セラミックス部材3は、液体収容部4と気体収容部5とを隔てる隔壁部に相当する。
次に、プラズマ発生装置1を用いた洗浄浄化装置の一例について説明する。
3 セラミックス部材(隔壁部)
3a 気体通路
4 液体収容部
5 気体収容部
11 気体供給部
12 第1電極
13 第2電極
15 プラズマ電源部
20 洗浄浄化装置
30 被洗浄処理対象部(洗浄対象物)
40 洗浄浄化装置
60 注水部
70 洗浄液の液面
Claims (5)
- 小型電気機器を洗浄するための洗浄装置であって、
洗浄液中で洗浄対象物を洗浄し、洗浄仕上げ時に前記洗浄対象物に向けて注水部より液体を注水することを特徴とする洗浄装置。 - 前記注水部は、前記洗浄対象物が露出している時に前記液体を注水することを特徴とする請求項1記載の洗浄装置。
- 前記注水部は、前記洗浄液の液面より上に配置されていることを特徴とする請求項1記載の洗浄装置。
- 前記注水部は、前記洗浄対象物を取り囲むように配置されていることを特徴とする請求項1記載の洗浄装置。
- 前記洗浄装置は、少なくとも水を含む液体を収容する液体収容部と、気体を収容する気体収容部と、前記液体収容部と前記気体収容部とを隔て、前記気体収容部中の前記気体の流通を許容して前記気体を前記液体収容部へ導く気体通路が形成された隔壁部と、前記気体収容部に配設された第1電極と、前記第1電極と距離を隔てられ、少なくとも前記第1電極と対になる側の部分が前記液体収容部中の前記液体と接触するように配設された第2電極と、前記気体収容部の前記気体を前記気体通路を介して前記液体収容部へ圧送させる態様で、前記気体収容部に少なくとも酸素を含む気体を供給する気体供給部と、前記第1電極と前記第2電極との間に所定の電圧を供給して前記第1電極と前記第2電極との間に放電を発生させることにより、前記液体収容部中の前記液体内において前記気体収容部に導入された前記気体がプラズマ化するプラズマ電源部とを備えたプラズマ発生装置を用いた洗浄装置であって、前記プラズマ発生装置により生成された洗浄液中で前記洗浄対象物を洗浄することを特徴とする請求項1から4のいずれか一項に記載の洗浄装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2013158946/12A RU2013158946A (ru) | 2011-07-15 | 2012-06-06 | Устройство чистки |
US14/130,656 US20140130979A1 (en) | 2011-07-15 | 2012-06-06 | Cleaning apparatus |
EP12814730.3A EP2732886A1 (en) | 2011-07-15 | 2012-06-06 | Cleaning apparatus |
CN201280033274.XA CN103648667A (zh) | 2011-07-15 | 2012-06-06 | 清洗装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2011-156442 | 2011-07-15 | ||
JP2011156442A JP2013022475A (ja) | 2011-07-15 | 2011-07-15 | 洗浄装置 |
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WO2013011761A1 true WO2013011761A1 (ja) | 2013-01-24 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2012/064516 WO2013011761A1 (ja) | 2011-07-15 | 2012-06-06 | 洗浄装置 |
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US (1) | US20140130979A1 (ja) |
EP (1) | EP2732886A1 (ja) |
JP (1) | JP2013022475A (ja) |
CN (1) | CN103648667A (ja) |
RU (1) | RU2013158946A (ja) |
WO (1) | WO2013011761A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9540262B2 (en) | 2011-05-17 | 2017-01-10 | Panasonic Intellectual Property Management Co., Ltd. | Plasma generating apparatus and plasma generating method |
US9688549B2 (en) | 2012-07-24 | 2017-06-27 | Panasonic Intellectual Property Management Co., Ltd. | Liquid treatment device and liquid treatment method |
Families Citing this family (3)
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JP2012164557A (ja) * | 2011-02-08 | 2012-08-30 | Panasonic Corp | プラズマ発生装置、当該プラズマ発生装置を用いた洗浄浄化装置および小型電器機器 |
WO2017009589A1 (en) * | 2015-07-10 | 2017-01-19 | David Lam | A razor blade cleaning device, system and method |
JP6886787B2 (ja) * | 2016-08-03 | 2021-06-16 | 東芝ライフスタイル株式会社 | 電気機器および電気掃除機 |
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-
2012
- 2012-06-06 US US14/130,656 patent/US20140130979A1/en not_active Abandoned
- 2012-06-06 WO PCT/JP2012/064516 patent/WO2013011761A1/ja active Application Filing
- 2012-06-06 RU RU2013158946/12A patent/RU2013158946A/ru not_active Application Discontinuation
- 2012-06-06 EP EP12814730.3A patent/EP2732886A1/en not_active Withdrawn
- 2012-06-06 CN CN201280033274.XA patent/CN103648667A/zh active Pending
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Also Published As
Publication number | Publication date |
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JP2013022475A (ja) | 2013-02-04 |
CN103648667A (zh) | 2014-03-19 |
EP2732886A1 (en) | 2014-05-21 |
US20140130979A1 (en) | 2014-05-15 |
RU2013158946A (ru) | 2015-08-27 |
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