WO2012132561A1 - Procédé et système permettant d'exposer un film d'alignement pour un cristal liquide, et panneau à cristaux liquides fabriqué à l'aide dudit système - Google Patents

Procédé et système permettant d'exposer un film d'alignement pour un cristal liquide, et panneau à cristaux liquides fabriqué à l'aide dudit système Download PDF

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Publication number
WO2012132561A1
WO2012132561A1 PCT/JP2012/052874 JP2012052874W WO2012132561A1 WO 2012132561 A1 WO2012132561 A1 WO 2012132561A1 JP 2012052874 W JP2012052874 W JP 2012052874W WO 2012132561 A1 WO2012132561 A1 WO 2012132561A1
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Prior art keywords
substrate
exposure
alignment film
liquid crystal
exposure light
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PCT/JP2012/052874
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English (en)
Japanese (ja)
Inventor
吉武　康裕
文雄 片岡
根本　亮二
孝生 釜石
聡 植原
理子 畠山
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株式会社日立ハイテクノロジーズ
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Priority to JP2013507234A priority Critical patent/JPWO2012132561A1/ja
Publication of WO2012132561A1 publication Critical patent/WO2012132561A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
    • G02F1/133757—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle with different alignment orientations

Definitions

  • Liquid crystal display elements are required to have higher image quality and higher definition in order to display more information with higher quality as displays for large televisions, 3D televisions, personal computers and mobile terminals.
  • this liquid crystal display element In order to realize high image quality and high definition of this liquid crystal display element, an arrangement (orientation) of molecules of liquid crystal material to be sealed between a pair of opposing glass substrates constituting the liquid crystal display element is formed on the glass substrate. It is necessary to make it uniform on the optically transparent electrode (transparent electrode).
  • an alignment film exposure system for liquid crystal includes an alignment film exposure apparatus for liquid crystal, and a substrate rotating means for rotating the orientation of the substrate exposed by the alignment film exposure apparatus for liquid crystal.
  • the liquid crystal alignment film exposure apparatus comprises a stage unit that can move in a plane with a substrate mounted thereon, and a normal direction of the surface of the substrate on the substrate mounted on the stage unit.
  • the first substrate having the first liquid crystal alignment film formed on the surface and the second substrate having the second liquid crystal alignment film formed on the surface A liquid crystal panel formed by sandwiching liquid crystal between the first liquid crystal alignment film of the first substrate and a region corresponding to one pixel of the liquid crystal panel divided into four small regions. An alignment characteristic is imparted to each small region, and the second liquid crystal alignment film on the second substrate divides a region corresponding to one pixel of the liquid crystal panel into four small regions, and each of the divided small regions. It was configured such that orientation characteristics were given to each region.
  • Example 1 of this invention It is a flowchart which shows operation
  • FIG. 2 shows a state when the spatial modulation element 21 is ON.
  • the spatial modulation element 21 includes a micro mirror group 211 in which a large number of micro mirrors are arranged one-dimensionally or two-dimensionally and a fine electrode group 210, and each electrode of the electrode group 210 is in an ON state.
  • Each electrode 2101 to 2106 in the case of FIG. 2 is controlled to turn on every other one, and the corresponding micromirrors of the micromirror group 211 (micromirrors 2111 to 2116 in the case of FIG.
  • six micromirror groups 211 constitute one diffraction grating, which is half of one pixel.
  • zero-order light 104 is generated with respect to the incident light 100, and diffracted lights 102 and 103 are generated from the edge portion 21141 of the mirror 2114, for example.
  • the optical axis 1001 of the imaging lens 31 is inclined by an angle ⁇ with respect to the normal line 1000 of the substrate 6. This is to align the liquid crystal alignment film (photo-alignment film) on the substrate 6 in one direction, and ⁇ is set in the range of 4 degrees to 40 degrees.
  • ⁇ is set in the range of 4 degrees to 40 degrees.
  • coherent light in the ultraviolet region having a wavelength in the range of 230 to 350 nm is irradiated.
  • the substrate 6 is placed on a stage (not shown) and is scanned in the direction of arrow 91 during exposure.
  • the control system 9 inputs the output of the height sensor 51 and the signal of the substrate position at the time of scanning, and the spatial modulation element 21 so that the exposure light is irradiated to a predetermined position on the substrate 6 based on these input signals.
  • the ON / OFF timing of each electrode of the electrode group 210 is controlled.
  • FIG. 4 shows an encoder signal indicating the position of the substrate 6, an image signal at the height of the substrate 6, and a timing chart of the image signal at the height of the substrate 6.
  • the control system 9 outputs the image signal 410 at the timing of the encoder signal 402 when the height of the substrate 6 is h 0 from the output of the height sensor 51, but when the height of the substrate 6 is h 1 , the exposure position. Therefore, the image signal 411 is output at the timing of the encoder signal 401. As a result, the exposure can always be performed at the position as designed of the substrate 6.
  • FIG. 5 shows a side view of a liquid crystal alignment film exposure apparatus 7 in which the liquid crystal alignment film exposure unit 70 is mounted.
  • FIG. 6 is a plan view of the alignment film exposure apparatus 7 for liquid crystal whose side view is shown in FIG. Since the substrate 6 is reciprocally scanned in the direction of the arrow 92 in the alignment film exposure apparatus 7 for liquid crystal, the alignment film exposure unit 71 for liquid crystal in which a height sensor 52 is added to the alignment film exposure unit 70 for liquid crystal described in FIG. And a liquid crystal alignment film exposure unit 72 disposed opposite to the liquid crystal alignment film exposure unit 71 so that different regions on the substrate 6 can be exposed simultaneously from the direction opposite to the liquid crystal alignment film exposure unit 71. It has.
  • the alignment film exposure unit for liquid crystal 71 and the alignment film exposure unit for liquid crystal 72 are installed on the gantry 500.
  • the liquid crystal alignment film exposure unit 72 includes a coherent light source 11, a mirror 12, a spatial modulation element 22, a shielding band 202, an imaging lens 32, and a pair of height sensors 53 and 54.
  • the angle of the optical axis 1002 of the imaging lens 32 with respect to the normal line 1000 of the substrate 6 is set to ⁇ .
  • the control system 90 performs image control of the spatial modulation elements 21 and 22.
  • the configuration shown in FIG. 6 shows a configuration in which height adjusting units 78 and 79 for adjusting the respective heights are attached to the alignment film exposure unit 71 for liquid crystal and the alignment film exposure unit 72 for liquid crystal. ing.
  • the height sensor 51 and 52 By controlling the height adjustment unit 78 or 79 based on the outputs of the height sensors 53 and 54, the liquid crystal alignment film exposure unit 71 and the liquid crystal alignment film exposure unit 72 are moved in the vertical direction to form the imaging lens 31. Alternatively, the distance between 32 and the substrate 6 is kept constant.
  • the substrate 6 is placed on a stage 73 that can move in the XY plane and can rotate around an axis perpendicular to the XY plane.
  • an X stage 731 movable in the X direction is driven by an X axis drive motor 74
  • a Y stage 732 movable in the Y direction is driven by a Y axis drive motor 75 around an axis perpendicular to the XY plane.
  • a rotatable ⁇ stage 733 is driven by a ⁇ drive motor (not shown).
  • the position of the stage 73 in the X-axis direction is detected by the X-direction position sensor 76, and the position in the Y direction is detected by the Y-direction position sensor 77.
  • a signal obtained by detecting the position of the stage 73 by the X-direction position sensor 76 and the Y-direction position sensor 77 is input to the control system 90 and processed. Based on the processed result, the control system 90 causes the X-axis drive motor 74 and the Y-axis drive. The motor 75 is controlled to adjust the amount of movement of the stage 73 in the X-axis direction and the Y-axis direction.
  • the ⁇ stage 733 is driven by a ⁇ -axis drive motor (not shown) to correct the deviation of the substrate 6 around the ⁇ -axis. Further, the ⁇ stage 733 may be configured to rotate 90 ° to rotate the direction of the substrate 6 by 90 °.
  • control system 90 controls the spatial modulation elements 21 and 22 on the substrate 6 based on the result of processing the signals obtained by detecting the position of the stage 73 by the X direction position sensor 76 and the Y direction position sensor 77, respectively.
  • a predetermined alignment characteristic is imparted to each region of the photo-alignment film.
  • the spatial modulation elements 21 and 22 include a micromirror group 211 in a direction perpendicular to the direction of an arrow 92 in which the substrate 6 is scanned by a stage 73 driven by an X-axis drive motor 74.
  • the spatial modulation elements 21 and 22 are controlled by the control system 90 in synchronization with the movement of the stage 73, and the domains of the alignment direction 611 and the alignment direction 613 are scanned once by the stage 73. Can be exposed.
  • FIG. 7 shows a configuration of an exposure system 700 including a rotation mechanism 42 that rotates the substrate 6 by 90 degrees and a robot arm 41.
  • the stage 73 on which the substrate 6 is placed is scanned once in the X direction by the liquid crystal alignment film exposure apparatus 7 shown in FIGS. 5 and 6 to expose the domains in the alignment direction 611 and the alignment direction 613, and then the substrate 6 is
  • the robot arm 41 carries out the liquid crystal alignment film exposure apparatus 7, and the carried substrate 6 is transferred to the rotation mechanism 42.
  • the substrate 6 is rotated 90 degrees by the rotation mechanism 42, the substrate 6 is taken out of the rotation mechanism 42 again by the robot arm 41 and placed on the stage 73 of the alignment film exposure apparatus 7 for liquid crystal, and the stage 73 is moved in the X direction.
  • the substrate 6 By scanning once, the substrate 6 exposes the alignment direction 612 and the alignment direction 614 to a region different from the domains of the alignment direction 611 and the alignment direction 613 previously exposed.
  • the substrate 6 on which the entire area has been exposed is unloaded from the alignment film exposure apparatus for liquid crystal 7 by the robot arm 41, transferred to a substrate transfer unit (not shown), and transferred to the next step.
  • step S ⁇ b> 901 the rotation mechanism 42 sets the orientation of the substrate 6 in the direction of 0 degrees with respect to the scanning direction of the liquid crystal alignment film exposure apparatus 7.
  • step S902 the robot arm 41 carries the substrate 6 into the liquid crystal alignment film exposure apparatus 7 and places it on the stage 73.
  • step S903 alignment marks on the substrate 6 are detected by an alignment detection system (not shown), and the position of the substrate in the XY- ⁇ direction is adjusted.
  • step S904 the stage 73 is moved at a constant speed in the X direction, and the substrate 6 is scanned and exposed while the spatial modulation elements 21 and 22 are controlled by the control system 90, whereby the areas 611 and 613 shown in FIG.
  • step S 905 the substrate 6 is unloaded from the liquid crystal alignment film exposure apparatus 7 by the robot arm 41 and loaded into the rotation mechanism 42.
  • step S906 the substrate 6 is rotated 90 degrees by the rotation mechanism 42, and then in step S907, the substrate 6 is carried into the liquid crystal alignment film exposure apparatus 7 by the robot arm 41 and placed on the stage 73.
  • alignment marks on the substrate 6 are detected by an alignment detection system (not shown) in step S908, and the position of the substrate 6 in the XY- ⁇ direction is adjusted.
  • step S909 the stage 73 is moved in the X direction.
  • the substrate 6 is scanned and exposed while moving at a constant speed and the spatial modulation elements 21 and 22 are controlled by the control system 90, whereby the alignment films of the regions 612 and 614 shown in FIG. A predetermined alignment characteristic as shown is given, and the second exposure process is executed.
  • FIG. 9 For example, four orientation regions indicated by four arrows 611 to 614 are generated in one pixel indicated by 61. Can do. That is, in the first exposure process of S904 described with reference to FIG. 8, the region 611 in FIG. 9 is exposed with, for example, the spatial modulation element 21 and the region 613 is exposed with the spatial modulation element 22, thereby the inside of each pixel 61 on the substrate 6. In the second exposure step of S909, for example, the area 612 in FIG. 9 is exposed by the spatial modulation element 21 and the area 614 is exposed by the spatial modulation element 22 in the second exposure step of S909. By doing so, it is possible to generate a four-direction alignment region in each pixel 61 on the substrate 6 by generating a two-direction alignment region as indicated by an arrow different from the first step.
  • the configuration in which the substrate 6 is rotated by 90 ° using the rotation mechanism 42 has been described.
  • the ⁇ stage 733 of the stage 73 is moved to a ⁇ -axis drive motor (not shown) without using the rotation mechanism 42. ) May be rotated 90 ° inside the alignment film exposure apparatus 7 for liquid crystal.
  • a regular reflection light out of the light reflected and scattered from the spatial modulation element 21 is shielded, a diffraction image by the scattered light is formed on the substrate, and the photo-alignment film applied on the substrate is exposed.
  • a method of forming an image of specularly reflected light from the spatial modulation element 1021 on the substrate and exposing the photo-alignment film applied on the substrate will be described.
  • FIG. 10 shows the configuration of an alignment film exposure unit 1070 for liquid crystal.
  • a liquid crystal alignment film exposure unit 1070 includes a coherent light source 1010 that emits coherent single-wavelength light having a wavelength of 230 nm to 350 nm, a mirror 12, a spatial modulation element 1021, a shielding band 1201 having an annular light shielding pattern, and an imaging lens 1031.
  • a height sensor 51 for detecting the height of the surface of the substrate 6 is provided.
  • the constituent elements having the same numbers as those in FIG. 1 perform the same operations as described in FIG.
  • the spatial modulation element 1021 is controlled by the control system 109 based on the height information of the substrate 6 detected by the height sensor 51.
  • the substrate 6 is placed on a stage (not shown) and moves within the XY plane.
  • the spatial modulation element 1021 includes a micromirror group 1211 in which a large number of micromirrors are arranged one-dimensionally or two-dimensionally and a microelectrode group, as described in the first embodiment. 1210 is configured.
  • the individual electrodes (electrodes 12101 to 12106 in the case of FIG. 11) of the electrode group 1210 are controlled to turn on every other, and the micromirror group 1211 Corresponding micromirrors (in the case of FIG. 11, micromirrors 12111, 12113, and 12115) are bent by the electrostatic force of the electrode group 1210, and steps are formed between the micromirrors 12112, 12114, and 12116.
  • the step is configured to have a length of 1 ⁇ 4 ( ⁇ / 4) of the wavelength.
  • the diffracted lights 1102 and 1103 (corresponding to the diffracted lights 102 and 103 described in the first embodiment) generated when the spatial modulation element 1021 shown in FIG. 11 is turned on are shielded with an annular light shielding pattern as shown in FIG. Light is shielded by a band 1201.
  • the 0th-order light (regular reflection light) 1110 (1111, 1112 in the case of FIG. 11), as described above, is the difference in height between the micromirrors 12111 and 12112 when the spatial modulation element 1021 is ON.
  • the phase difference of the zero-order light generated from each micromirror of the spatial modulation element 1021 for example, the phase difference between the regular reflection light 1113 from the micromirror 12111 and the regular reflection light 1112 from the micromirror 12112 is 0 °.
  • the specularly reflected light that has passed through the central portion of the shielding band 1201 having a ring-shaped shielding pattern is transmitted through the imaging lens 1031 and added to the light amount.
  • the photo-alignment film formed on the substrate after being imaged is exposed.
  • Example 1 when the alignment film exposure unit for liquid crystal 70 is turned on, the photo-alignment film formed on the substrate 6 is exposed, whereas in Example 2, the alignment film exposure unit for liquid crystal 1070 is turned off.
  • the other operations are the same as those of the alignment film exposure unit for liquid crystal 70 described in the first embodiment, the description thereof is omitted.
  • the contents described in the first embodiment with reference to FIGS. 4 to 9 are also applied to the second embodiment as they are, the description thereof is omitted.
  • the liquid crystal panel is manufactured by sandwiching a liquid crystal 81 between an array substrate 651 on which an alignment film 65 is formed and a counter substrate 661 on which an alignment film 66 is formed.
  • 13A shows the orientation distribution within one pixel applied to the alignment film 65 of the array-side substrate 651
  • FIG. 13B shows the orientation distribution within one pixel applied to the alignment film 66 of the counter substrate 661
  • FIG. ) Shows the orientation distribution of the liquid crystal in one pixel when a voltage is applied.
  • the alignment film 65 in the pixel 641 of the array side substrate 651 in FIG. 13A and the alignment film 66 in the pixel 642 of the counter substrate 661 in FIG. 13B are each divided into four regions.
  • the orientation characteristic is imparted by the method described in the first embodiment.
  • the orientation in the pixel 641 and the orientation in the pixel 642 are different from each other in the opposite direction, ie, 180 °.
  • FIG. 14 shows a cross-sectional view of the liquid crystal panel in a region 691 surrounded by a dotted line in FIG.
  • an electrode film 652 and an alignment film 65 are formed on a glass substrate 651 on the array side, and an electrode film 662 and an alignment film 66 are also formed on a glass substrate 661 that is a counter substrate.
  • the alignment directions of the left half of the alignment films 65 and 66 are opposite to each other in the plane perpendicular to the paper surface as directions 655 and 665, respectively. Are directed in opposite directions within the plane of the paper, as indicated by directions 656 and 666, respectively.
  • an alternating voltage 67 is applied between the electrode films 652 and 662 in this state, the liquid crystal molecules 82 are aligned in a plane perpendicular to the paper surface in the left half and in the paper surface in the right half.
  • the responsiveness of the liquid crystal can be improved.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

La présente invention concerne un procédé et un système permettant d'exposer un film d'alignement optique, une réponse à vitesse élevée d'un cristal liquide étant rendue possible. Dans le système permettant d'exposer un film d'alignement pour un cristal liquide, ledit système est doté d'un appareil d'exposition de film d'alignement pour cristal liquide et d'un moyen de rotation de substrat, ledit appareil étant conçu de façon à comprendre : un moyen d'étage ; un premier moyen d'émission d'une lumière d'exposition qui émet, depuis la première direction inclinée, une première lumière d'exposition vers une première région prédéfinie sur un substrat ; un second moyen d'émission d'une lumière d'exposition qui émet, depuis la seconde région inclinée, une seconde lumière d'exposition vers une seconde région prédéfinie sur le substrat ; un moyen de mesure de la position d'un étage, qui mesure la position d'un étage ; et un moyen de commande qui commande, sur la base des informations de position d'étage obtenues par la mesure exécutée par le moyen de mesure de la position d'étage, un basculement entre une activation et une désactivation de la première émission de lumière d'exposition réalisée par le premier moyen d'émission de lumière d'exposition, et de la seconde émission de lumière d'exposition réalisée par le second moyen d'émission de lumière d'exposition.
PCT/JP2012/052874 2011-03-25 2012-02-08 Procédé et système permettant d'exposer un film d'alignement pour un cristal liquide, et panneau à cristaux liquides fabriqué à l'aide dudit système WO2012132561A1 (fr)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170015799A (ko) * 2015-07-31 2017-02-09 엘지디스플레이 주식회사 광배향 장치 및 이를 이용한 광배향 방법
WO2017217300A1 (fr) * 2016-06-14 2017-12-21 シャープ株式会社 Dispositif d'irradiation de lumière polarisée et procédé de fabrication d'un dispositif d'affichage à cristaux liquides

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05224205A (ja) * 1992-02-15 1993-09-03 Seiko Instr Inc 電気光学装置の製造方法および装置
JPH10142608A (ja) * 1996-11-07 1998-05-29 Lg Electron Inc 液晶セルの製造方法
JPH11133429A (ja) * 1997-02-27 1999-05-21 Fujitsu Ltd 液晶表示装置
JP2000122302A (ja) * 1998-10-12 2000-04-28 Ushio Inc 斜めから光を照射するプロキシミティ露光方法
JP2001281669A (ja) * 2000-03-30 2001-10-10 Matsushita Electric Ind Co Ltd 液晶配向膜とその製造方法、およびそれを用いた液晶表示装置とその製造方法
JP2010039492A (ja) * 2008-08-06 2010-02-18 Samsung Electronics Co Ltd 配向基板、これの製造方法、及びこれを有する液晶表示装置
JP2012018256A (ja) * 2010-07-07 2012-01-26 Hitachi High-Technologies Corp 液晶用配向膜露光方法及びその装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05224205A (ja) * 1992-02-15 1993-09-03 Seiko Instr Inc 電気光学装置の製造方法および装置
JPH10142608A (ja) * 1996-11-07 1998-05-29 Lg Electron Inc 液晶セルの製造方法
JPH11133429A (ja) * 1997-02-27 1999-05-21 Fujitsu Ltd 液晶表示装置
JP2000122302A (ja) * 1998-10-12 2000-04-28 Ushio Inc 斜めから光を照射するプロキシミティ露光方法
JP2001281669A (ja) * 2000-03-30 2001-10-10 Matsushita Electric Ind Co Ltd 液晶配向膜とその製造方法、およびそれを用いた液晶表示装置とその製造方法
JP2010039492A (ja) * 2008-08-06 2010-02-18 Samsung Electronics Co Ltd 配向基板、これの製造方法、及びこれを有する液晶表示装置
JP2012018256A (ja) * 2010-07-07 2012-01-26 Hitachi High-Technologies Corp 液晶用配向膜露光方法及びその装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170015799A (ko) * 2015-07-31 2017-02-09 엘지디스플레이 주식회사 광배향 장치 및 이를 이용한 광배향 방법
KR102387205B1 (ko) * 2015-07-31 2022-04-15 엘지디스플레이 주식회사 광배향 장치 및 이를 이용한 광배향 방법
WO2017217300A1 (fr) * 2016-06-14 2017-12-21 シャープ株式会社 Dispositif d'irradiation de lumière polarisée et procédé de fabrication d'un dispositif d'affichage à cristaux liquides

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