201243506 六、發明說明： 【發明所屬之技術領域】 本發明係關於液晶顯示元件之製造方法及其 使用彼所製作之液晶面板，特別是關於適於藉由 法對液晶配向膜賦予配向特性之液晶用配向膜曝 其系統以及使用彼所製作的液晶面板。 【先前技術】 液晶顯示元件，作爲大型電視、3D電視、個 可攜終端之顯示器，爲了要高品質地顯示更多的 要求著高畫質化、高精細化。 要實現此液晶顯示元件的高畫質化、高精細 於構成液晶顯示元件的一對對向的玻璃基板間的 分子之排列（配向）有必要在被形成於玻璃基板 上透明的電極（透明電極）上使其齊一。 要使此液晶材料的分子的排列（配向）齊一 使用在形成於玻璃基板的透明電極上形成配向膜 擦此配向膜而賦予配向特性的方法。但是，此方 向膜的一部份剝離而產生細微的塵芥，成爲元件 因，很難跨玻璃基板的顯示區域全面賦予齊一的 ，成爲形成更高精細的顯示元件上的一個課題。 作爲藉由此摩擦方法對配向膜賦予配向特性 替代手法，例如在專利文獻1，記載著藉由把被 體的陣列側基板的光配向膜之畫素內以遮罩等分 系統以及 光學的手 光方法及 人電腦或 資訊，被 化，密封 液晶材料 上的光學 ，從前， ，以布摩 法會使配 不良的原 配向特性 的方法之 形成電晶 割爲二， -5- 201243506 分別對其照射由〇度與180度之2個方向來的斜向光，另一 方面，於對向基板的光配向膜照射與陣列側正交的2個方 向來照射斜向光，而在1個畫素內得到4個方向的配向之方 法。 此外，在專利文獻2，記載著藉由使用對光照射進行 可逆的變化之光配向膜，對陣列側基板全面照射斜向光之 後，使畫素內之一半由180度方向照射斜向光，而在畫素 內得到2方向的配向之方法。 〔先前技術文獻〕 〔專利文獻〕 [專利文獻1]日本特許第3850002號公報 [專利文獻2]日本特開2007-219191號公報 【發明內容】 〔發明所欲解決之課題〕 在記載於專利文獻1、2的方法，藉由使陣列側基板與 對向基板的配向方向正交，而實現在各基板爲正逆2方向 的配向，同時作爲液晶面板實現畫素內4配向。結果，於 各90度的4方位亮度變大視角擴大，特別在電視用途賦予 了有用的性能。然而，此方法，對於今後被期待著要普及 的3 D電視或者家庭劇院等高品質電視，還有以下數點特性 需要改善。 亦即，在專利文獻1、2所記載的方法，在畫素內4方 位區域之各個決定亮度方位的液晶的配向方位是在上下基 -6- 201243506 板扭轉9 0度’所以在施加電壓使液晶往一方向傾倒時，必 須要有能量來完成解消此液晶扭曲的分子動作，因而使液 晶的回應性降低。 本發明之目的係爲了解決前述之從前的技術上的課題 ，提供可以達成液晶的高速回應之光配向膜的處理方法及 其系統以及利用彼所製作之液晶面板。 〔供解決課題之手段〕 爲了達成前述目的，在本發明把液晶用配向膜曝光系 統，構成爲具備液晶用配向膜曝光裝置，與使以該液晶配 向膜曝光裝置曝光的基板方向旋轉的基板旋轉手段，使前 述液晶用配向膜曝光裝置，具備：可以載置基板而在平面 內移動的台座手段，於載置在該台座手段的基板對該基板 的表面的法線方向由第1傾斜方向對前述基板上的第1特定 區域照射第1曝光光線的第1曝光光線照射手段，於載置在 前述台座手段的基板對該基板的表面的法線方向由第2傾 斜方向對前述基板上的第2特定區域照射第2曝光光線的第 2曝光光線照射手段，計測前述台座的位置之台座位置計 測手段，根據以該台座位置計測手段計測得的前述台座位 置資訊，控制根據前述第1曝光光線照射手段之第1曝光光 線的照射與根據前述第2曝光光線照射手段之第2曝光光線 的照射之開關的切換的控制手段。 此外’爲了達成前述目的，在本發明，係具備曝光於 表面塗佈了光配向膜的基板的特定區域對前述光配向膜的 201243506 前述特定區域賦予配向特性的第1曝光步驟、使在該第1曝 光步驟對特定的區域賦予了配向特性的基板的方向旋轉的 基板旋轉步驟，曝光在該基板旋轉步驟旋轉的基板上之與 前述特定區域不同的區域而對前述光配向膜之與前述特定 區域不同的區域賦予配向特性的第2曝光步驟之液晶用配 向膜之曝光方法，於前述第1曝光步驟，使載置前述基板 的台座移動於一方向同時對該基板表面的法線方向由第1 傾斜方向對被塗佈於前述基板上的光配向膜之第1特定區 域照射第1曝光光線對前述光配向膜之第1特定區域賦予第 1配向特性同時對前述基板表面的法線方向由第2傾斜方向 對被塗佈於前述基板上的光配向膜之第2特定區域照射第2 曝光光線對前述光配向膜之第2特定區域賦予第2配向特性 ，於前述第2曝光步驟，使載置在前述基板旋轉步驟旋轉 的基板之則述台座移動於前述一方向同時對該基板表面的 法線方向由第1傾斜方向對被塗佈於前述基板上的光配向 膜之第3特定區域照射第1曝光光線對前述光配向膜之第3 特定區域賦予第3配向特性同時對前述基板表面的法線方 向由第2傾斜方向對被塗佈於前述基板上的光配向膜之第4 特定區域照射第2曝光光線對前述光配向膜之第4特定區域 賦予第4配向特性。 此外，爲了達成前述目的，在本發明，把於在表面被 形成第1液晶用配向膜的第1基板與在表面被形成第2液晶 用配向膜的第2基板之間挾著液晶形成的液晶面板，構成 爲前述第1基板之第1液晶用配向膜係把前述液晶面板之相 -8 - 201243506 當於1畫素的區域分割爲4個小區域而對該分 賦予配向特性，前述第2基板之第2液晶用配 液晶面板之相當於1畫素的區域分割爲4個小 割的各小區域賦予配向特性。 〔發明之效果〕 藉由根據如此構成的本發明之液晶用配 ，可以使液晶面板之陣列側基板的畫素內， 之斜向光之4次曝光分割爲4方位4個區域， 配向方向相異。使用此基板與未進行分割配 基板，可以製造高視野角的液晶顯示面板。 列側基板分割配向而使對向基板側分割配向 對向基板，使用藉由對畫素內提供與陣列任 行配向的4次曝光而形成4個配向區域的基板 前述180度逆平行配向的液晶顯示面板，被 板與對向基板的液晶在電壓施加時不會產生 倒，所以在亮度調變時可以高速地回應。 【實施方式】 以下’使用圖面說明本發明之實施例。 〔實施例1〕 圖1係顯示根據本實施例之液晶用配向 的構成。液晶用配向膜曝光單元70、，具 割的各小區域 向膜係把前述 區域而對該分 向膜曝光系統 藉由使用光罩 使各個區域的 向處理的對向 也可以不使陣 。此外，作爲 IJ成180度逆平 也可以。具有 挾於陣列側基 分子扭曲而傾 膜曝光單元70 莆發射波長爲 -9 - 201243506 2 3〇1^〜35〇111^的同調光之同調光源11、鏡12、空間調變 元件21、遮蔽帶201、成像透鏡31、檢測基板6的表面高度 的高度感測器5 1。空間調變元件2 1，根據以高度感測器5 1 檢測出的基板6的高度資訊藉由控制系統9來控制。此外， 基板6，被載置於未圖示的台座，在XY平面內移動。 於這樣的構成，在液晶用配向膜曝光單元70，射出同 調光源11，以鏡12反射的光101，入射至空間調變元件21 。空間調變元件2 1在打開（ON )時產生的繞射光1 02、 103藉由成像透鏡31成像於基板6。空間調變元件21在關閉 (OFF)時產生的0次光，藉由遮蔽帶201遮光，不會到達 基板6。於基板6的表面被塗佈未圖示之光配向膜。 此處，藉由圖2、3說明空間調變元件2 1的動作。 圖2顯示空間調變元件2 1爲打開（ON )時的狀態。空 間調變元件2 1，係將多數微小的鏡排列爲1次元或2次元之 微鏡群2 1 1與細微的電極群2 1 0的構成，在ON狀態下電極 群210之各個電極（圖2的場合爲電極2101至21 06)被控制 而每隔1個成爲ON，微鏡群2 1 1之對應的微鏡（圖2的場合 爲微鏡2111至2116)以電極群210的靜電力撓曲，微鏡群 211例如以6個（圖2的場合爲微鏡2111至2116)構成1個繞 射格子，此爲1畫素的一半。此時，對於入射光1〇〇，發生 〇次光104，同時由例如鏡2114的邊緣部分21141發生繞射 光 102 、 103。 圖3顯示空間調變元件2 1爲關閉（OFF )的狀態。電極 群210所有的電極（圖3的場合爲電極2101至2106)成爲關201243506 6. Technical Field of the Invention The present invention relates to a method for fabricating a liquid crystal display device and a liquid crystal panel produced by the same, and more particularly to a liquid crystal suitable for imparting alignment characteristics to a liquid crystal alignment film by a method. Exposing the system with an alignment film and using the liquid crystal panel produced by the same. [Prior Art] A liquid crystal display device, which is a display for a large-sized television, a 3D television, or a portable terminal, requires high image quality and high definition in order to display more high quality. In order to achieve high image quality of the liquid crystal display element and high order of alignment (alignment) of molecules between a pair of opposed glass substrates constituting the liquid crystal display element, it is necessary to form a transparent electrode (transparent electrode) formed on the glass substrate. ) Make it one. The alignment (orientation) of molecules of the liquid crystal material is performed in a manner in which an alignment film is formed on a transparent electrode formed on a glass substrate, and the alignment film is rubbed to impart alignment characteristics. However, this part of the film is peeled off to cause fine dust and mustard, and it is difficult to provide uniformity across the display area of the glass substrate, which is a problem in forming a finer display element. As an alternative method of imparting an alignment property to the alignment film by the rubbing method, for example, Patent Document 1 discloses that a light is applied to the pixels of the array side substrate to mask the aliquot system and the optical hand. The light method and the human computer or information are chemicalized and sealed on the liquid crystal material. In the past, the method of using the cloth method will make the formation of the poor matching original alignment characteristic into two, -5- 201243506 Irradiation of oblique light in two directions of twist and 180 degrees, and irradiation of oblique light in two directions orthogonal to the array side on the light alignment film of the opposite substrate, and one painting A method of aligning in four directions. Further, in Patent Document 2, it is described that by using an optical alignment film that reversibly changes light irradiation, the array side substrate is entirely irradiated with oblique light, and then one half of the pixels is irradiated with oblique light by a direction of 180 degrees. In the pixel, a method of aligning in two directions is obtained. [Prior Art Document] [Patent Document 1] Japanese Patent No. 3850002 (Patent Document 2) JP-A-2007-219191 SUMMARY OF INVENTION [Problems to be Solved by the Invention] In the method of the first aspect, the alignment direction of the array side substrate and the counter substrate is orthogonal to each other, and the alignment of the respective substrates in the forward and reverse directions is realized, and the intra-pixel alignment is realized as the liquid crystal panel. As a result, the viewing angle at the four-direction brightness of each of 90 degrees is enlarged, and the useful performance is particularly given for television use. However, this method has the following characteristics to be improved for high-quality TVs such as 3D TVs or home theaters that are expected to be popular in the future. In other words, in the methods described in Patent Documents 1 and 2, the alignment direction of the liquid crystal which determines the luminance orientation in each of the four azimuth regions in the pixel is 90 degrees in the upper and lower bases of the -6-201243506, so the voltage is applied. When the liquid crystal is poured in one direction, it is necessary to have energy to complete the molecular action of canceling the distortion of the liquid crystal, thereby lowering the responsiveness of the liquid crystal. SUMMARY OF THE INVENTION An object of the present invention is to provide a method and a system for processing an optical alignment film capable of achieving high-speed response of a liquid crystal, and a liquid crystal panel produced by the same, in order to solve the above-mentioned technical problems. [Means for Solving the Problem] In order to achieve the above object, in the present invention, the liquid crystal alignment film exposure system is configured to include a liquid crystal alignment film exposure apparatus, and to rotate the substrate in a direction in which the substrate is exposed by the liquid crystal alignment film exposure apparatus. In the above-described liquid crystal alignment film exposure apparatus, the pedestal means for moving the substrate in a plane can be provided, and the substrate placed on the pedestal means is oriented in the first oblique direction from the normal direction of the surface of the substrate a first exposure light irradiation means for irradiating the first exposure light on the first specific region on the substrate, wherein the substrate placed on the pedestal means has a second oblique direction on the substrate in a direction normal to a surface of the substrate a second exposure light irradiation means for irradiating the second exposure light to the specific area, a pedestal position measuring means for measuring the position of the pedestal, and controlling the first exposure light irradiation based on the pedestal position information measured by the pedestal position measuring means Irradiation of the first exposure light of the means and second exposure light according to the second exposure light irradiation means The control means for switching the switch of the line illumination. In addition, in order to achieve the above object, the present invention provides a first exposure step of imparting alignment characteristics to the specific region of the photo-alignment film of 201243506 by exposure to a specific region of the substrate on which the photo-alignment film is applied. (1) an exposure step of a substrate rotating step in which a direction of a substrate having an alignment characteristic is applied to a specific region, and exposing a region different from the specific region on a substrate rotated by the substrate rotation step to the specific region of the optical alignment film In the first exposure step, the pedestal on which the substrate is placed is moved in one direction while the normal direction of the substrate surface is the first in the first exposure step. Irradiating the first specific region of the photo-alignment film coated on the substrate in the oblique direction, the first exposure ray is applied to the first specific region of the photo-alignment film, and the normal direction of the substrate surface is 2 oblique direction to the second specific region of the photo-alignment film coated on the substrate before the second exposure light pair The second alignment characteristic is applied to the second specific region of the optical alignment film, and in the second exposure step, the pedestal placed on the substrate rotating in the substrate rotation step is moved in the one direction and the normal direction of the substrate surface Irradiating the first exposure light to the third specific region of the photo-alignment film applied to the substrate in the first oblique direction, the third alignment characteristic is applied to the third specific region of the photo-alignment film, and the normal to the substrate surface The direction of the second exposure light is applied to the fourth specific region of the photo-alignment film coated on the substrate by the second oblique direction to impart a fourth alignment characteristic to the fourth specific region of the photo-alignment film. Further, in order to achieve the above object, in the present invention, a liquid crystal formed by liquid crystal is formed between a first substrate on which a first liquid crystal alignment film is formed on the surface and a second substrate on which a second liquid crystal alignment film is formed. In the panel, the first liquid crystal alignment film of the first substrate is divided into four small regions by the phase of the liquid crystal panel, and the second pixel is divided into four small regions, and the second alignment is imparted to the distribution. The region corresponding to one pixel of the liquid crystal panel for the second liquid crystal liquid crystal panel of the substrate is divided into four small regions of small cuts to impart alignment characteristics. [Effects of the Invention] According to the liquid crystal device of the present invention thus constituted, it is possible to divide the four-direction exposure of the oblique light in the pixels of the array side substrate of the liquid crystal panel into four directions and four directions, and to align the direction. different. By using this substrate and the substrate which is not divided, it is possible to manufacture a liquid crystal display panel having a high viewing angle. The column-side substrate is divided and aligned, and the counter substrate is divided and aligned, and the 180-degree anti-parallel alignment liquid crystal of the substrate in which four alignment regions are formed by providing four exposures to the array in the pixel is used. In the display panel, the liquid crystal of the board and the counter substrate does not fall when the voltage is applied, so that the brightness can be responded at high speed when the brightness is changed. [Embodiment] Hereinafter, embodiments of the present invention will be described using the drawings. [Embodiment 1] Fig. 1 is a view showing the configuration of a liquid crystal alignment according to this embodiment. The alignment film exposure unit 70 for liquid crystal, the small areas to be cut, and the above-mentioned areas are applied to the film system, and the alignment film exposure system can be prevented from being aligned by the use of the mask. In addition, it is also possible to make a 180 degree flattening as IJ. Coherent light source 11, mirror 12, spatial modulation element 21, masking with the same dimming light of the tilting film exposure unit 70 莆 emission wavelength of -9 - 201243506 2 3〇1^~35〇111^ A belt 201, an imaging lens 31, and a height sensor 51 for detecting the surface height of the substrate 6. The spatial modulation element 2 1 is controlled by the control system 9 based on the height information of the substrate 6 detected by the height sensor 51. Further, the substrate 6 is placed on a pedestal (not shown) and moved in the XY plane. With such a configuration, the liquid crystal alignment film exposure unit 70 emits the coherent light source 11 and the light 101 reflected by the mirror 12 is incident on the spatial modulation element 21. The diffracted light 102, 103 generated when the spatial modulation element 2 1 is turned on (ON) is imaged on the substrate 6 by the imaging lens 31. The zero-order light generated when the spatial modulation element 21 is turned off (OFF) is shielded from light by the masking tape 201 and does not reach the substrate 6. A light alignment film (not shown) is applied to the surface of the substrate 6. Here, the operation of the spatial modulation element 21 will be described with reference to Figs. Fig. 2 shows a state in which the spatial modulation element 21 is turned "ON". The spatial modulation element 21 is a configuration in which a plurality of minute mirrors are arranged in a 1-dimensional or 2-dimensional micromirror group 2 1 1 and a fine electrode group 2 1 0, and the respective electrodes of the electrode group 210 in an ON state (Fig. In the case of 2, the electrodes 2101 to 21 06) are controlled to be turned on every other one, and the micromirrors corresponding to the micromirror group 2 1 1 (the micromirrors 2111 to 2116 in the case of Fig. 2) are electrostatically charged by the electrode group 210. In the deflection, the micromirror group 211 constitutes one diffraction grating, for example, six micromirrors 2111 to 2116 in the case of Fig. 2, which is half of one pixel. At this time, for the incident light 1 〇, the secondary light 104 is generated while the diffracted light 102, 103 is generated by, for example, the edge portion 21141 of the mirror 2114. Fig. 3 shows a state in which the spatial modulation element 21 is OFF. All the electrodes of the electrode group 210 (electrodes 2101 to 2106 in the case of Fig. 3) become off
C •10- 201243506 閉（OFF)，微鏡群211之所有的微鏡（圖3的場合爲微鏡 21 11至2116)爲相同高度，所以不發生繞射光，僅發生〇 次光（正反射光）1〇4。此0次光104以圖1之遮蔽帶201遮 光，如圖2所示由以畫素單位控制的微鏡群2 1 1發生的繞射 光102、103被照射至被塗佈光配向膜的基板6，所以各畫 素的開關（ΟΝ/OFF )成爲可能。又’在圖2及圖3’說明 了入射光1〇〇對空間調變元件21由垂直方向入射的狀態， 但實際上如圖1所示入射光1 〇 1對空間調變元件2 1由斜方向 入射，來自微鏡群211的正反射光沿著光軸1001行進，而 以遮蔽帶201遮光。 微鏡群21 1及電極群210，分別以多數的元件（1 000個 以上）形成。例如圖2及圖3所說明的例子那樣以對應於將 6個元件（微鏡及電極）形成於基板6的液晶元件之1畫素 的一半尺寸的方式構成的場合，藉由以6個爲單位於各單 位控制電極群210開關（ON/OFF )，能夠以畫素尺寸的一 半爲單位跨複數畫素同時處理對應於液晶元件的各畫素的 配向膜特性。 此處回到圖1，說明液晶用配向膜曝光單元70的動作 。成像透鏡31的光軸1001對基板6的法線1 000僅傾斜角度α 。此係使基板6上的液晶配向膜（光配向膜）配向於1方向 ’所以α被設定在4度以上40度以下的範圍。爲了對此液晶 配向膜（光配向膜）賦予所要的配向特性，照射波長爲 23 0〜3 5 0nm的範圍的紫外線區域的同調光。基板6被載置 於未圖示的台座上，於曝光中掃描於箭頭91的方向，此時 -11 - 201243506 ，因台座的間距或是起因於基板6的撓曲使基板的高度由 h〇的位置下降到h的位置時，空間調變元件2 1的轉印位置 變成僅偏移ΔΧ。此處，藉由高度感測器5 1，計測曝光前的 基板6的高度變化d : ( h〇-h,)。高度感測器51，例如爲應 用檢測出照射狹縫光時的反射光位置的三角測量原理之感 測器。控制系統9 ’係以輸入高度感測器5 1的輸出與掃描 時的基板位置的訊號，而根據這些輸入訊號而對基板6上 的特定位置照射曝光光線的方式控制空間調變元件2 1的電 極群2 1 0之各個電極的開關（ON/OFF )的計時。 圖4係顯示表示基板6的位置的編碼訊號與基板6的高 度之影像訊號，以及基板6的高度之影像訊號的時序圖。 控制系統9，在來自高度感測器51的輸出而基板6的高度爲 h〇的場合，以編碼訊號402的時序輸出影像訊號41 0，但在 基板6的高度爲1^的場合曝光位置會前進，因此以編碼訊 號401的時序輸出影像訊號411。藉此，總是可以在基板6 之如原先設計的位置進行曝光。 又，在本實施例，是由高度感測器5 1的計測結果控制 影像訊號40 1的時序，但是以高度感測器5 1的計測結果成 爲一定的方式，使液晶用配向膜曝光單元70上下移動亦可 。在此場合，影像訊號40 1的時序控制變成不需要，但需 要使液晶用配向膜曝光單元70上下移動的機構。 於圖5，顯示實裝了液晶用配向膜曝光單元70的液晶 用配向膜曝光裝置7的側面圖。此外，於圖6，顯示了在圖 5顯示側面圖的液晶用配向膜曝光裝置7的平面圖。於液晶 -12- 201243506 用配向膜曝光裝置7’具備：因基板6在箭頭92方向上往復 掃描而對圖1所說明的液晶用配向膜曝光單元70追加高度 感測器5 2之液晶用配向膜曝光單元7 1，以及以可以對基板 6上的不同區域同時實施來自與液晶用配向膜曝光單元71 相反的方向之曝光的方式，與液晶用配向膜曝光單元71對 向而配置的液晶用配向膜曝光單元72。液晶用配向膜曝光 單元71與液晶用配向膜曝光單元72，被設置於架台500上 。液晶用配向膜曝光單元72，具備：同調光源11、鏡12、 空間調變元件22、遮蔽帶202、成像透鏡32、及一對高度 感測器53與54 »在液晶用配向膜曝光單元72對基板6的法 線1000之成像透鏡32的光軸1002的角度被設定爲_α。空間 調變元件21與22之影像控制由控制系統90進行。 圖6所示的構成，係顯示於液晶用配向膜曝光單元71 與液晶用配向膜曝光單元72，被安裝著調整分別的高度之 用的高度調整單元78與79的構成。使台座73連續移動於X 方向同時以液晶用配向膜曝光單元71與液晶用配向膜曝光 單元7 2曝光基板6時，藉由在控制系統9 0根據高度感測器 51與52，或者高度感測器53與54的輸出控制高度調整單元 7 8或79，而使液晶用配向膜曝光單元71及液晶用配向膜曝 光單元72移動於上下方向而使成像透鏡31或32與基板6之 間隔維持一定。 基板6被載置於可在χγ平面內移動而對χγ平面可垂直 地繞軸旋轉的台座73。台座73，其可在X方向移動的X台 座731以X軸驅動馬達74驅動，可在Υ方向移動的Υ台座732 -13- 201243506 以Y軸驅動馬達75驅動，可對XY平面垂直地繞軸旋轉的θ 台座733以Θ驅動馬達（未圖示）驅動。台座73的X軸方向 的位置以X方向位置感測器76檢測，X方向的位置以Υ方向 位置感測器7 7檢測。以X方向位置感測器7 6及Υ方向位置 感測器"77檢測之台座73的位置的訊號被輸入至控制系統90 而被處理，根據處理的結果以控制系統90控制X軸驅動馬 達74以及Υ軸驅動馬達75，調整台座73的X軸方向及Υ軸方 向的移動量。此外，Θ台座733以Θ軸驅動馬達（未圖示） 驅動，而補正基板6的繞著Θ軸之偏移。此外，亦可爲Θ台 座733旋轉90度而使基板6的方向旋轉90度的方式構成。 此外，控制系統90，藉由根據以X方向位置感測器76 及Υ方向位置感測器77檢測台座73位置的訊號之處理結果 ，分別控制空間調變元件21與22而曝光基板6上的特定位 置的光配向膜，對光配向膜之分別的區域賦予特定的配向 特性。 如圖6所示，空間調變元件2 1與22，係藉由以X軸驅動 馬達74驅動的台座73而在對基板6掃描的箭頭92的方向成 直角的方向上使微鏡群211排列配置，藉由同步於台座73 的移動而以控制系統9 0控制空間調變元件2 1與2 2，能夠以 台座73之〗次掃描來曝光配向方向611與配向方向613之區 域。 圖7係顯示具備把基板6旋轉90度的旋轉機構42與機械 臂4 1之曝光系統7 00的構成。以圖5及圖6所示的液晶用配 向膜曝光裝置7把載置基板6的台座73在X方向掃描一回而 201243506 曝光配向方向611與配向方向613的區域之後，把基板6以 機械臂41由液晶用配向膜曝光裝置7搬出，將此搬出的基 板ό移送至旋轉機構42。以旋轉機構42使基板6旋轉90度後 ’再度以機械臂41由旋轉機構42取出基板6載置於液晶用 配向膜曝光裝置7的台座73，藉由使台座73在X方向上掃描 1回’基板6在與先前曝光的配向方向611與配向方向613的 區域不同的區域進行配向方向612與配向方向614的曝光。 全區域被曝光的基板6以機械臂41由液晶用配向膜曝光裝 置7搬出，往未圖示的基板搬送單元移動被搬送往次—步 驟。 接著，藉由圖8說明曝光處理順序。首先，於步驟 S901 ’藉由旋轉機構42，把基板6的方向設定於對液晶用 配向膜曝光裝置7的掃描方向爲0度方向。接著在步驟S902 ，藉由機械臂41把基板6搬入液晶用配向膜曝光裝置7而載 置於台座73上。在步驟S903，藉由未圖示的對準檢測系統 進行基板6的對準用標記檢測，進行基板的Χ-Υ-Θ方向之位 置調整。在步驟S904，藉由使台座73在X方向上以一定的 速度移動而以控制系統90控制空間調變元件2 1、22同時掃 描基板6進行曝光，而對圖6所示的區域611與61 3之配向膜 分別賦予箭頭所示的特定之配向特性，執行第1曝光步驟 。其次，在步驟S905，藉由機械臂41把基板6由液晶用配 向膜曝光裝置7搬出而搬入旋轉機構42。在步驟S9 06，以 旋轉機構42使基板6旋轉90度後，在步驟S 9 07以機械臂41 把基板6搬入液晶用配向膜曝光裝置7而載置於台座73上。 -15- 201243506 其次’在步驟S908’藉由未圖示的對準檢測系統進行基板 6的對準用標記檢測’進行基板6的X - Y - Θ方向的位置調整 ’在步驟S909，使台座73在X方向上以一定的速度移動而 以控制系統9 0控制空間調變元件2 1、2 2同時掃描基板6進 行曝光’而對圖6所示的區域612與614之配向膜分別賦予 箭頭所示的特定之配向特性，執行第2曝光步驟。 藉由經過以上之第1〜第2曝光步驟，如圖9所示，可 以在例如61所示的1個畫素內，產生4個箭頭611至614所示 的4個方向的配向區域。亦即，可以在圖8所說明的S904之 第1曝光步驟’例如藉由以空間調變元件2 1曝光圖9的區域 611 ’以空間調變元件22曝光區域613而在基板6上各畫素 61內分別產生箭頭所示的2方向之配向區域，在S909之第2 曝光步驟，例如藉由以空間調變元件2 1曝光圖9的區域6 1 2 ，以空間調變元件22曝光區域614而在基板6上各畫素61內 分別產生與第1步驟不同的箭頭所示的2方向之配向區域， 而產生4方向之配向區域。 又’於前述實施例，說明了使用旋轉機構42使基板6 旋轉90度的構成，但不使用旋轉機構42而使用Θ軸驅動馬 達（未圖示）使台座73的Θ台座73 3在液晶用配向膜曝光裝 置7的內部旋轉90度亦可》 〔實施例2〕 在實施例1，說明了遮住來自空間調變元件2 1而被反 射散射的光之中的正反射光，使根據散射光之繞射像成像 -16- 201243506 於基板上曝光被塗佈於基板上的光配向膜的方式，但在實 施例2，說明使來自空間調變元件1 02 1的正反射光之像成 像於基板上而曝光被塗佈於基板上的光配向膜的方式。 圖10顯不液晶用配向膜曝光單兀1070的構成。液晶用 配向膜曝光單元1070，具備發射波長爲2 30nm〜3 50nm的 同調的單波長光之同調光源1 0 1 0、鏡1 2、空間調變元件 1021、具有輪帶狀遮光圖案的遮蔽帶1201、成像透鏡1031 、檢測基板6的表面高度的高度感測器51。此處，賦予與 圖1相同編號的構成要素，發揮與在圖1說明的作用相同的 作用。空間調變元件1 02 1，根據以高度感測器5 1檢測出的 基板6的高度資訊藉由控制系統109來控制。此外，基板6 ，被載置於未圖示的台座，在XY平面內移動。_ 於這樣的構成，在液晶用配向膜曝光單元1 070，射出 同調光源1010，以鏡12反射的光1011，入射至空間調變元 件1021。如圖1 1及圖12所示，空間調變元件1021，與在實 施例1所說明的同樣，被構成爲具有把多數微小鏡排列爲1 次元或2次元的微鏡群1211與細微的電極群1210。 在圖1 1所示的空間調變元件1 02 1爲打開（ON )的狀 態，電極群1210之各個電極（圖11的場合爲12101至12106 )被控制而每隔1個成爲打開（ON )，微鏡群1 2 1 1之對應 的微鏡（圖11的場合爲微鏡12111、12113、12115)因電 極群1210的靜電力而撓曲，在微鏡12112、12114、12116 之間形成階差。在本實施例，此階差被構成爲波長的1 Μ (λ/4 )之長度。 -17- 201243506 圖1 1所示之空間調變元件1 02 1爲打開（ON )時產生 的繞射光1 1 02、1 1 03 (相當於在實施例1說明的繞射光1 02 及103)，如圖10所示以具有輪帶狀遮光圖案的遮蔽帶 120 1遮光。另一方面0次光（正反射光）1110(圖11的場 合爲1 1 1 1、1 1 1 2等），如前所述在空間調變元件1 02 1爲打 開（ON)時微鏡12111與12112之高度差爲1/4波長（λ/4) 的方式被調整，所以來自微鏡12111的正反射光1111與來 自微鏡1 2 1 1 2的正反射光1 1 1 2的相位相差1 8 0度，相互抵消 所以外觀上的正反射光的光量爲零。 另一方面，圖12顯示空間調變元件1021爲關閉（OFF )的狀態。電極群1210所有的電極（圖12的場合爲電極 12101至12106)成爲關閉（OFF)，微鏡群1211之所有的 微鏡（圖1 2的場合爲微鏡1 2 1 1 1至1 2 1 1 6 )爲排列於相同面 上爲相同高度，所以由同調光源1 0 1 0發射而以鏡1 2反射的 光1 0 1 1照射於空間調變元件1 0 2 1時，由微鏡1 2 1 1 1至1 2 1 1 6 不發生繞射光，僅由分別的微鏡發生0次光（正反射光） 1120(圖12的場合爲1112、1113等）。 此時，空間調變元件1021之各微鏡所發生的0次光的 相位差，例如來自微鏡12111的正反射光1113與來自微鏡 12112的正反射光的相位差成爲0度。結果，來自分別的微 鏡的反射光之中，通過具有輪帶狀遮光圖案的遮蔽帶1201 的中央部之正反射光，透過成像透鏡1031被加算光量成像 於基板上而曝光被塗佈於基板上的光配向膜。 相對於在實施例1，是液晶用配向膜曝光單元70打開C •10- 201243506 OFF (OFF), all the micromirrors of the micromirror group 211 (the micromirrors 21 11 to 2116 in the case of Fig. 3) have the same height, so no diffracted light occurs, and only the secondary light (positive reflection) Light) 1〇4. This 0-order light 104 is shielded by the masking tape 201 of FIG. 1, and the diffracted light 102, 103 generated by the micromirror group 2 1 1 controlled by the pixel unit is irradiated onto the substrate of the coated photo-alignment film as shown in FIG. 6, so the switch (ΟΝ/OFF) of each pixel is possible. Further, in FIG. 2 and FIG. 3', the state in which the incident light 1 〇〇 is incident on the spatial modulation element 21 from the vertical direction is explained, but actually, as shown in FIG. 1, the incident light 1 〇 1 is applied to the spatial modulation element 2 1 Incidentally, the specular reflection light from the micromirror group 211 travels along the optical axis 1001, and is shielded by the masking tape 201. The micromirror group 21 1 and the electrode group 210 are each formed of a plurality of elements (1,000 or more). For example, as shown in FIG. 2 and FIG. 3, in the case where six elements (micromirrors and electrodes) are formed on one half of the size of one pixel of the liquid crystal element of the substrate 6, six are used. The unit control electrode group 210 is individually turned on and off (ON/OFF), and the alignment film characteristics of the respective pixels corresponding to the liquid crystal element can be simultaneously processed across a plurality of pixels in units of a pixel size. Returning to Fig. 1, the operation of the alignment film exposure unit 70 for liquid crystal will be described. The optical axis 1001 of the imaging lens 31 is inclined only by an angle α to the normal line 1000 of the substrate 6. In this manner, the liquid crystal alignment film (optical alignment film) on the substrate 6 is aligned in one direction. Therefore, α is set in a range of 4 degrees or more and 40 degrees or less. In order to impart desired alignment characteristics to the liquid crystal alignment film (optical alignment film), the same dimming of the ultraviolet region in the range of 23 0 to 350 nm is irradiated. The substrate 6 is placed on a pedestal (not shown) and scanned in the direction of the arrow 91 during exposure. At this time, -11 - 201243506, the height of the substrate is caused by the pitch of the pedestal or the deflection of the substrate 6. When the position is lowered to the position of h, the transfer position of the spatial modulation element 21 becomes only ΔΧ. Here, the height change d: (h〇-h,) of the substrate 6 before exposure is measured by the height sensor 51. The height sensor 51 is, for example, a sensor for detecting the principle of the triangulation of the position of the reflected light when the slit light is irradiated. The control system 9' controls the spatial modulation element 2 1 by inputting the signal of the position of the height sensor 51 and the position of the substrate during scanning, and irradiating the specific position on the substrate 6 with the exposure light according to the input signals. Timing of the switch (ON/OFF) of each electrode of the electrode group 2 10 . Fig. 4 is a timing chart showing an image signal indicating the position of the substrate 6 and the image signal of the height of the substrate 6, and the image signal of the height of the substrate 6. The control system 9 outputs the image signal 41 0 at the timing of the encoded signal 402 when the height of the substrate 6 is h〇 from the output of the height sensor 51, but the exposure position is when the height of the substrate 6 is 1^. Moving forward, the video signal 411 is output at the timing of the encoded signal 401. Thereby, exposure can always be performed at the position of the substrate 6 as originally designed. Further, in the present embodiment, the timing of the video signal 40 1 is controlled by the measurement result of the height sensor 51, but the measurement result of the height sensor 51 is made constant, and the alignment film exposure unit 70 for liquid crystal is used. You can also move up and down. In this case, the timing control of the image signal 40 1 becomes unnecessary, but a mechanism for moving the liquid crystal alignment film exposure unit 70 up and down is required. Fig. 5 is a side view showing the alignment film exposure device 7 for liquid crystal in which the alignment film exposure unit 70 for liquid crystal is mounted. Further, Fig. 6 is a plan view showing the alignment film exposure device 7 for liquid crystal shown in Fig. 5 in a side view. In the alignment film exposure apparatus 7' of the liquid crystal -12-201243506, the liquid crystal alignment of the height sensor 52 is added to the liquid crystal alignment film exposure unit 70 described in FIG. 1 by the substrate 6 reciprocatingly scanning in the direction of the arrow 92. The film exposure unit 171 and the liquid crystal disposed opposite to the alignment film exposure unit 71 for liquid crystal are disposed so that the exposure from the opposite direction to the liquid crystal alignment film exposure unit 71 can be simultaneously performed on different regions on the substrate 6. The alignment film exposure unit 72. The alignment film exposure unit 71 for liquid crystal and the alignment film exposure unit 72 for liquid crystal are provided on the gantry 500. The alignment film exposure unit 72 for liquid crystal includes a coherent light source 11, a mirror 12, a spatial modulation element 22, a masking tape 202, an imaging lens 32, and a pair of height sensors 53 and 54 » alignment film exposure unit 72 for liquid crystal The angle of the optical axis 1002 of the imaging lens 32 to the normal 1000 of the substrate 6 is set to _α. Image control of spatial modulation elements 21 and 22 is performed by control system 90. The configuration shown in Fig. 6 is shown in the liquid crystal alignment film exposing unit 71 and the liquid crystal alignment film exposing unit 72, and the height adjusting units 78 and 79 for adjusting the respective heights are attached. When the pedestal 73 is continuously moved in the X direction and the substrate 6 is exposed by the alignment film exposure unit 71 for liquid crystal and the alignment film exposure unit 72 for liquid crystal, it is based on the height sensors 51 and 52 or the sense of height in the control system 90. The outputs of the detectors 53 and 54 control the height adjusting unit 78 or 79, and the liquid crystal alignment film exposing unit 71 and the liquid crystal alignment film exposing unit 72 are moved in the up and down direction to maintain the interval between the imaging lens 31 or 32 and the substrate 6. for sure. The substrate 6 is placed on a pedestal 73 which is movable in the χγ plane and is vertically rotatable about the χγ plane. The pedestal 73, which is movable in the X direction, is driven by the X-axis drive motor 74, and the pedestal 732-13-201243506, which is movable in the x-direction, is driven by the Y-axis drive motor 75, and can be vertically pivoted to the XY plane. The rotating θ pedestal 733 is driven by a Θ drive motor (not shown). The position of the pedestal 73 in the X-axis direction is detected by the X-direction position sensor 76, and the position of the X-direction is detected by the Υ-direction position sensor 77. The signals of the positions of the pedestal 73 detected by the X-direction position sensor 76 and the Υ-direction position sensor & 77 are input to the control system 90, and are controlled by the control system 90 according to the result of the processing. 74 and the cymbal drive motor 75 adjust the amount of movement of the pedestal 73 in the X-axis direction and the y-axis direction. Further, the pedestal 733 is driven by a cymbal drive motor (not shown) to correct the offset of the substrate 6 about the yaw axis. Further, the pedestal 733 may be rotated by 90 degrees to rotate the direction of the substrate 6 by 90 degrees. In addition, the control system 90 controls the spatial modulation elements 21 and 22 to expose the substrate 6 by the processing results of detecting the position of the pedestal 73 by the X-direction position sensor 76 and the Υ-direction position sensor 77, respectively. The photoalignment film at a specific position imparts specific alignment characteristics to respective regions of the photoalignment film. As shown in Fig. 6, the spatial modulation elements 2 1 and 22 are arranged in the direction perpendicular to the direction of the arrow 92 scanned by the substrate 6 by the pedestal 73 driven by the X-axis drive motor 74. In the arrangement, the spatial modulation elements 2 1 and 2 2 are controlled by the control system 90 in synchronization with the movement of the pedestal 73, and the areas of the alignment direction 611 and the alignment direction 613 can be exposed by the sub-scan of the pedestal 73. Fig. 7 shows the configuration of an exposure system 00 having a rotating mechanism 42 for rotating the substrate 6 by 90 degrees and a mechanical arm 41. The alignment film exposure apparatus 7 for liquid crystal shown in FIG. 5 and FIG. 6 scans the pedestal 73 of the substrate 6 in the X direction and the area of the alignment direction 611 and the alignment direction 613 in 201243506, and then the substrate 6 is a robot arm. 41 is carried out by the alignment film exposure device 7 for liquid crystal, and the substrate 搬 carried out is transferred to the rotation mechanism 42. After the substrate 6 is rotated by 90 degrees by the rotating mechanism 42, the substrate 6 is again taken out by the rotating mechanism 42 by the robot arm 41, and placed on the pedestal 73 of the liquid crystal alignment film exposure device 7, and the pedestal 73 is scanned one time in the X direction. The substrate 6 is exposed in the alignment direction 612 and the alignment direction 614 in a region different from the region of the alignment direction 611 and the alignment direction 613 of the previous exposure. The substrate 6 to be exposed in the entire area is carried out by the liquid crystal alignment film exposure device 7 by the robot arm 41, and is moved to the substrate transfer unit (not shown) to be transported to the next step. Next, the exposure processing sequence will be described with reference to FIG. First, in step S901', the direction of the substrate 6 is set to a direction of 0 degree with respect to the scanning direction of the liquid crystal alignment film exposure device 7 by the rotating mechanism 42. Next, in step S902, the substrate 6 is carried into the liquid crystal alignment film exposure device 7 by the robot arm 41, and placed on the pedestal 73. In step S903, alignment detection of the substrate 6 is performed by an alignment detecting system (not shown) to adjust the position of the substrate in the Χ-Υ-Θ direction. In step S904, the control unit 90 controls the spatial modulation elements 2 1 and 22 to simultaneously scan the substrate 6 for exposure by moving the pedestal 73 at a certain speed in the X direction, and to the areas 611 and 61 shown in FIG. The alignment film of 3 is given a specific alignment characteristic indicated by an arrow, and the first exposure step is performed. Then, in step S905, the substrate 6 is carried out by the liquid crystal alignment film exposure device 7 by the robot arm 41, and is carried into the rotating mechanism 42. In step S9 06, the substrate 6 is rotated by 90 degrees by the rotating mechanism 42, and then the substrate 6 is carried into the liquid crystal alignment film exposure device 7 by the robot arm 41 in step S9 07, and placed on the pedestal 73. -15-201243506 Next, in step S908, the alignment detecting system (not shown) performs the alignment mark detection 'the positional adjustment of the substrate 6 in the X - Y - Θ direction'. In step S909, the pedestal 73 is made. Moving at a certain speed in the X direction, the control system 90 controls the spatial modulation elements 2 1 and 2 2 while scanning the substrate 6 for exposure ', and the alignment films of the regions 612 and 614 shown in FIG. 6 are respectively given arrows. The second alignment step is performed with the specific alignment characteristics shown. By the first to second exposure steps described above, as shown in Fig. 9, an alignment region of four directions indicated by four arrows 611 to 614 can be generated in one pixel as indicated by 61, for example. That is, the first exposure step S90 of S904 illustrated in FIG. 8 may be performed on the substrate 6 by exposing the region 611 ' of FIG. 9 with the spatial modulation element 2 1 to expose the region 613 with the spatial modulation element 22 The alignment direction of the two directions indicated by the arrows is generated in the element 61, and the exposure area of the spatial modulation element 22 is exposed in the second exposure step of S909, for example, by exposing the area 6 1 2 of FIG. 9 with the spatial modulation element 2 1 . 614, in each of the pixels 61 on the substrate 6, an alignment region in two directions indicated by an arrow different from the first step is generated, and an alignment region in four directions is generated. Further, in the above-described embodiment, the configuration in which the substrate 6 is rotated by 90 degrees by the rotation mechanism 42 has been described. However, the stern drive 73 (not shown) is used to make the pedestal 73 3 of the pedestal 73 for liquid crystal without using the rotation mechanism 42. The inside of the alignment film exposure device 7 is rotated by 90 degrees. [Embodiment 2] In the first embodiment, the regular reflection light among the light reflected and scattered from the spatial modulation element 21 is blocked, so that the scattering is based on the scattering. Diffraction of light image imaging-16-201243506 A method of exposing a light alignment film coated on a substrate on a substrate, but in Embodiment 2, an image of a specular reflection light from the spatial modulation element 102 1 is imaged A method of exposing the photoalignment film applied on the substrate to the substrate. Fig. 10 shows a configuration in which the alignment film of the liquid crystal is used to expose the unit 1070. The alignment film exposure unit 1070 for liquid crystals includes a coherent light source of a single-wavelength light having a wavelength of 2 30 nm to 3 50 nm, a mirror 12, a spatial modulation element 1021, and a masking tape having a belt-shaped light-shielding pattern. 1201. An imaging lens 1031, a height sensor 51 that detects the surface height of the substrate 6. Here, the components having the same reference numerals as those in Fig. 1 perform the same functions as those explained in Fig. 1. The spatial modulation element 102 1 is controlled by the control system 109 based on the height information of the substrate 6 detected by the height sensor 51. Further, the substrate 6 is placed on a pedestal (not shown) and moved in the XY plane. In such a configuration, the liquid crystal alignment film exposure unit 1 070 emits the coherent light source 1010, and the light 1011 reflected by the mirror 12 is incident on the spatial modulation element 1021. As shown in FIGS. 11 and 12, the spatial modulation element 1021 is configured to have a micromirror group 1211 and a fine electrode in which a plurality of micromirrors are arranged in a 1st or 2nd order, as in the first embodiment. Group 1210. In the state in which the spatial modulation element 102 1 shown in FIG. 11 is turned "ON", the respective electrodes of the electrode group 1210 (12101 to 12106 in the case of FIG. 11) are controlled to be turned on every other (ON). The micromirrors corresponding to the micromirror group 1 2 1 1 (the micromirrors 12111, 12113, and 12115 in the case of FIG. 11) are deflected by the electrostatic force of the electrode group 1210, and a step is formed between the micromirrors 12112, 12114, and 12116. difference. In the present embodiment, this step is constructed as the length of 1 Μ (λ/4 ) of the wavelength. -17- 201243506 The spatial modulation element 1 02 1 shown in Fig. 1 1 is the diffracted light 1 1 02, 1 1 03 generated when it is turned on (corresponding to the diffracted lights 102 and 103 described in the first embodiment) As shown in FIG. 10, the masking tape 120 1 having the belt-shaped light shielding pattern is shielded from light. On the other hand, the zero-order light (positive-reflected light) 1110 (in the case of FIG. 11 is 1 1 1 1 , 1 1 1 2 , etc.), as described above, when the spatial modulation element 102 1 is turned on (ON) The height difference between 12111 and 12112 is 1/4 wavelength (λ/4), so the phase of the specular reflected light 1111 from the micromirror 12111 and the specular reflected light 1 1 1 2 from the micromirror 1 2 1 1 2 The difference is 180 degrees, which cancel each other out, so the amount of specular reflected light in the appearance is zero. On the other hand, Fig. 12 shows a state in which the spatial modulation element 1021 is off (OFF). All the electrodes of the electrode group 1210 (the electrodes 12101 to 12106 in the case of Fig. 12) are turned off (OFF), and all the micromirrors of the micromirror group 1211 (the case of Fig. 12 is the micromirror 1 2 1 1 1 to 1 2 1) 1 6 ) is arranged at the same height on the same surface, so that the light 1 0 1 1 emitted by the coherent light source 1 0 1 0 and reflected by the mirror 12 is irradiated to the spatial modulation element 1 0 2 1 by the micromirror 1 2 1 1 1 to 1 2 1 1 6 The diffracted light does not occur, and only 0 times of light (positive reflected light) 1120 is generated by the respective micromirrors (1112, 1113, etc. in the case of Fig. 12). At this time, the phase difference of the zero-order light generated by each of the micromirrors of the spatial modulation element 1021, for example, the phase difference between the specular reflected light 1113 from the micromirror 12111 and the specular reflected light from the micromirror 12112 becomes 0 degree. As a result, among the reflected light from the respective micromirrors, the specular reflected light passing through the central portion of the masking strip 1201 having the strip-shaped light-shielding pattern is imaged on the substrate by the applied light amount through the imaging lens 1031, and the exposure is applied to the substrate. Light alignment film on. With respect to the first embodiment, the liquid crystal alignment film exposure unit 70 is opened.
-18- 201243506 (ON)時曝光形成於基板6上的光配向膜，在實施例2則 是液晶用配向膜曝光單元1 070關閉（OFF )時曝光形成於 基板6上的光配向膜這一點有所不同，其他的動作與在實 施例1說明的液晶用配向膜曝光單元70的動作相同，所以 省略說明。此外，於實施例1使用圖4至圖9所說明的內容 ，直接適用於實施例2，所以省略其說明。 〔實施例3〕 在前述第1實施例說明了對不同區域以來自不同角度 的斜向光進行曝光而如圖9所示把1個畫素分割爲4個區域 對分別的區域賦予配向特性的方法，但在此使用圖1 3及圖 14說明藉由組合此將1畫素分割爲4個區域而對分別的區域 賦予配向特性的玻璃基板，而作爲液晶面板對1畫素內賦 予4方向的配向特性的方法。 液晶面板，如圖1 4所示，係在被形成配向膜65的陣列 側基板651與同樣被形成配向膜66的對向基板661之間挾著 液晶8 1而製作的。圖1 3之（a )顯示被賦予至陣列側基板 651的配向膜65的1畫素內的配向分布，（b)被賦予對向 基板661的配向膜66之1畫素內的配向分布，（c)顯示電 壓施加時之1畫素內的液晶配向分布。圖1 3 ( a )之陣列側 基板651的畫素641內的配向膜65與（b)之對向基板661的 畫素642內的配向膜66，分別被分割爲4區域，分別的區域 藉由在第1實施例說明的方法被賦予配向特性。畫素64 1內 的配向與畫素642內的配向爲相反方向亦即方向相差180度 19- 201243506 圖1 3 ( c )之以虛線包圍的區域6 9 1之液晶面板的剖面 圖顯示於圖1 4。在圖1 4，於陣列側的玻璃基板6 5 1上被形 成電極膜652與配向膜65，於對向基板之玻璃基板661上也 被形成電極膜662與配向膜66。在圖14’配向膜65、66的 左半邊的配向方向，以分別成爲方向655、665的方式在與 紙面垂直的面內朝向相反方向，配向膜65、66的右半邊的 配向方向，分別成如方向65 6、6 66的方式在與紙面內朝向 相反方向。在此狀態，對電極膜652、662間施加交流電壓 67的話，液晶分子82在左半邊配向於垂直於紙面的面內， 在右半邊配向於紙面內。 如以上所示，於陣列基板與對向基板對應處所的配向 膜的配向方向爲平行，所以可以提高液晶的回應性。 以上根據實施例具體說明根據本案發明人所進行的發 明，但本發明並不以上述實施例爲限，在不逸脫其要旨的 範圍內當然可進行種種的變更。 【圖式簡單說明】 圖1係本發明的實施例1之液晶用配向膜曝光單元的槪 略側面圖。 圖2係顯示本發明之實施例1之空間調變元件的打開（ ON )狀態之側面圖^ 圖3係顯示本發明之實施例1之空間調變元件的關閉（ OFF )狀態之側面圖。 -20- 201243506 圖4係編碼訊號與影像訊號之時序圖。 圖5係顯示本發明之實施例1之液晶用配向膜曝光裝置 之槪略構成之側面圖。 圖6係顯示本發明之實施例1之液晶用配向膜曝光裝置 之槪略構成之平面圖。 圖7係顯示本發明之實施例1之基板旋轉系統的槪略構 成之平面圖。 圖8係顯示本發明之實施例1之可照射4方向斜向光的 曝光裝置的動作之流程圖。 圖9係顯示本發明之實施例1之形成4方向的配向區域 之基板的平面圖。 圖10係本發明的實施例2之液晶用配向膜曝光單元的 槪略側面圖。 圖11係本發明的實施例2之液晶用配向膜曝光單元的 槪略側面圖。 圖1 2係顯示本發明之實施例2之空間調變元件的關閉 (OFF)狀態之側面圖。 圖1 3之（a )爲顯示液晶顯示面板的陣列側基板的畫 素內配向分布之陣列側基板的平面圖，（b)爲顯示液晶 面板的對向基板之畫素內配向分布的對向基板的平面圖， (c)爲顯示液晶的配向分布之液晶面板的平面圖》 圖1 4爲液晶面板之剖面圖。 【主要元件符號說明】 -21 - 201243506 6 :基板 7 :液晶用配向膜曝光裝置 9 :控制系統 1 1 :同調光源 12 :鏡 21，22 :空間調變元件 3 1，3 2 :成像透鏡 41 :機械臂 42 :旋轉機構 5 1、5 2、5 3、5 4 :高度感測器 7 1、72 :液晶用配向膜曝光單元 8 2 :液晶分子 -22--18-201243506 (ON) Exposure of the photoalignment film formed on the substrate 6, and in the second embodiment, when the alignment film exposure unit 1 070 for liquid crystal is turned off (OFF), the photoalignment film formed on the substrate 6 is exposed. The other operations are the same as those of the liquid crystal alignment film exposure unit 70 described in the first embodiment, and thus the description thereof is omitted. Further, the contents described in the first embodiment using FIGS. 4 to 9 are directly applied to the second embodiment, and therefore the description thereof will be omitted. [Embodiment 3] In the first embodiment, it has been described that exposure of oblique light from different angles to different regions is performed, and as shown in Fig. 9, one pixel is divided into four regions to impart alignment characteristics to the respective regions. In the above, a glass substrate in which one pixel is divided into four regions and the alignment characteristics are given to the respective regions is described with reference to FIG. 13 and FIG. 14 , and the liquid crystal panel is given four directions in one pixel. The method of alignment characteristics. As shown in Fig. 14, the liquid crystal panel is produced by sandwiching the liquid crystal 81 between the array side substrate 651 on which the alignment film 65 is formed and the opposite substrate 661 on which the alignment film 66 is formed. (a) of FIG. 13 shows an alignment distribution in one pixel of the alignment film 65 given to the array side substrate 651, and (b) an alignment distribution in one pixel of the alignment film 66 of the opposite substrate 661. (c) shows the liquid crystal alignment distribution in one pixel at the time of voltage application. The alignment film 65 in the pixel 641 of the array side substrate 651 of FIG. 1 (a) and the alignment film 66 in the pixel 642 of the opposite substrate 661 of (b) are respectively divided into four regions, and the respective regions are borrowed. The alignment characteristics are imparted by the method described in the first embodiment. The alignment in the pixel 64 1 and the alignment in the pixel 642 are opposite directions, that is, the direction is different by 180 degrees. 19-201243506 Fig. 1 3 (c) The area surrounded by the dotted line 6 9 1 is a sectional view of the liquid crystal panel shown in the figure 1 4. In Fig. 14, an electrode film 652 and an alignment film 65 are formed on the glass substrate 615 on the array side, and an electrode film 662 and an alignment film 66 are also formed on the glass substrate 661 of the opposite substrate. In the direction of the left half of the alignment films 65 and 66 in Fig. 14 ', the directions of the directions 655 and 665 are opposite to each other in the plane perpendicular to the plane of the paper, and the alignment directions of the right half of the alignment films 65 and 66 are respectively formed. The way of directions 65 6 and 6 66 is in the opposite direction to the inside of the paper. In this state, when an alternating voltage 67 is applied between the electrode films 652 and 662, the liquid crystal molecules 82 are aligned in the plane perpendicular to the paper surface on the left half and aligned in the paper surface on the right half. As described above, the alignment direction of the alignment film at the position corresponding to the array substrate and the counter substrate is parallel, so that the responsiveness of the liquid crystal can be improved. The invention made by the inventors of the present invention is specifically described above based on the embodiments, but the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit and scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic side view showing an alignment film exposure unit for a liquid crystal according to a first embodiment of the present invention. Fig. 2 is a side elevational view showing the open (ON) state of the spatial modulation element according to the first embodiment of the present invention. Fig. 3 is a side view showing the closed (OFF) state of the spatial modulation element according to the first embodiment of the present invention. -20- 201243506 Figure 4 is a timing diagram of the encoded signal and video signal. Fig. 5 is a side view showing a schematic configuration of an alignment film exposure apparatus for liquid crystal according to Embodiment 1 of the present invention. Fig. 6 is a plan view showing a schematic configuration of an alignment film exposure apparatus for liquid crystal according to Embodiment 1 of the present invention. Fig. 7 is a plan view showing a schematic configuration of a substrate rotating system of Embodiment 1 of the present invention. Fig. 8 is a flow chart showing the operation of the exposure apparatus capable of illuminating 4-direction oblique light according to the first embodiment of the present invention. Fig. 9 is a plan view showing a substrate which forms an alignment region of four directions in the first embodiment of the present invention. Fig. 10 is a schematic side view showing an alignment film exposure unit for liquid crystal according to a second embodiment of the present invention. Figure 11 is a schematic side view showing an alignment film exposure unit for liquid crystal according to Example 2 of the present invention. Fig. 1 is a side view showing the OFF state of the spatial modulation element of the second embodiment of the present invention. FIG. 13(a) is a plan view showing an array side substrate in which the intra-pixel alignment of the array side substrate of the liquid crystal display panel is displayed, and (b) is an opposite substrate showing the intra-pixel alignment of the opposite substrate of the liquid crystal panel. (c) is a plan view of a liquid crystal panel showing alignment distribution of liquid crystals. Fig. 14 is a cross-sectional view of the liquid crystal panel. [Description of main component symbols] -21 - 201243506 6 : Substrate 7 : Alignment film exposure device for liquid crystal 9 : Control system 1 1 : Coherent light source 12 : Mirror 21 , 22 : Space modulation element 3 1,3 2 : Imaging lens 41 : Robot arm 42 : Rotating mechanism 5 1 , 5 2, 5 3, 5 4 : Height sensor 7 1 , 72 : alignment film exposure unit for liquid crystal 8 2 : liquid crystal molecule-22-