WO2012128561A3 - 플라즈마 고도수처리 장치 - Google Patents

플라즈마 고도수처리 장치 Download PDF

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Publication number
WO2012128561A3
WO2012128561A3 PCT/KR2012/002051 KR2012002051W WO2012128561A3 WO 2012128561 A3 WO2012128561 A3 WO 2012128561A3 KR 2012002051 W KR2012002051 W KR 2012002051W WO 2012128561 A3 WO2012128561 A3 WO 2012128561A3
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WO
WIPO (PCT)
Prior art keywords
treatment apparatus
plasma
water treatment
double pipe
advanced water
Prior art date
Application number
PCT/KR2012/002051
Other languages
English (en)
French (fr)
Other versions
WO2012128561A2 (ko
Inventor
이민기
이재혁
Original Assignee
자원전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 자원전자 주식회사 filed Critical 자원전자 주식회사
Priority to US13/983,354 priority Critical patent/US20140069853A1/en
Priority to CN201280013758.8A priority patent/CN103429538B/zh
Priority to JP2014501002A priority patent/JP5941527B2/ja
Publication of WO2012128561A2 publication Critical patent/WO2012128561A2/ko
Publication of WO2012128561A3 publication Critical patent/WO2012128561A3/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
    • C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/245—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using internal electrodes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light

Abstract

본 발명은 대장균이나 각종 세균은 플라즈마 방전을 이용하여 제거하고, 각종 난분해성 유기물은 오존 등의 라디칼 발생원을 통하여 제거하는 플라즈마 고도수처리 장치에 관한 것으로, 본 발명에 의하면 상호 분리된 처리대상수를 위한 제1소통로와 라디칼 반응용 기체를 위한 제2소통로를 갖는 이중관체; 상기 이중관체의 제1 및 제2 소통로에 각각 배열된 전극과, 이 전극과 연결된 전원부를 포함하는 플라즈마 발생수단; 및 상기 이중관체와 연결되어 처리대상수와 라디칼 발생원의 반응이 이루어지는 수조를 포함하여 이루어지는 것을 특징으로 한다.
PCT/KR2012/002051 2011-03-22 2012-03-22 플라즈마 고도수처리 장치 WO2012128561A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US13/983,354 US20140069853A1 (en) 2011-03-22 2012-03-22 Plasma advanced water treatment apparatus
CN201280013758.8A CN103429538B (zh) 2011-03-22 2012-03-22 先进的等离子水处理装置
JP2014501002A JP5941527B2 (ja) 2011-03-22 2012-03-22 プラズマ高度水処理装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0025487 2011-03-22
KR1020110025487A KR101157122B1 (ko) 2011-03-22 2011-03-22 플라즈마 고도수처리 장치

Publications (2)

Publication Number Publication Date
WO2012128561A2 WO2012128561A2 (ko) 2012-09-27
WO2012128561A3 true WO2012128561A3 (ko) 2013-01-03

Family

ID=46689043

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/002051 WO2012128561A2 (ko) 2011-03-22 2012-03-22 플라즈마 고도수처리 장치

Country Status (5)

Country Link
US (1) US20140069853A1 (ko)
JP (1) JP5941527B2 (ko)
KR (1) KR101157122B1 (ko)
CN (1) CN103429538B (ko)
WO (1) WO2012128561A2 (ko)

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KR200472395Y1 (ko) 2012-03-21 2014-04-23 자원전자 주식회사 플라즈마 고도수 처리장치
US9868653B2 (en) 2013-05-01 2018-01-16 Nch Corporation System and method for treating water systems with high voltage discharge and ozone
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CN106063385B (zh) * 2014-02-18 2019-08-06 阿卜杜拉国王科技大学 用于在组合物中产生放电的系统和方法
KR101402935B1 (ko) * 2014-03-20 2014-06-02 (주)에프에이대원 용해조를 구비한 플라즈마 수처리시스템
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KR101596869B1 (ko) * 2015-10-06 2016-02-23 (주)아이온크린 저온 플라즈마 수처리 장치 및 수처리 방법
KR101680522B1 (ko) * 2016-06-22 2016-11-29 한주호 수처리용 자율기포생성 플라즈마 유닛
JP6945820B2 (ja) * 2016-08-30 2021-10-06 国立大学法人東北大学 病原体および害虫の駆除装置およびその反応容器
KR101946821B1 (ko) * 2016-11-18 2019-02-12 농업회사법인 주식회사 부림아그로텍 수중 플라즈마 토치
KR101942369B1 (ko) 2017-06-12 2019-01-25 자원전자 주식회사 오존 생성량 제어 기능이 구비된 플라즈마 고도수처리 장치
CN108112152A (zh) * 2017-12-20 2018-06-01 国网陕西省电力公司电力科学研究院 一种温控水中大体积放电产生装置及其方法
RU185700U1 (ru) * 2018-09-28 2018-12-14 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) Плазмокаталитический реактор обработки жидкости барьерным разрядом
RU189390U1 (ru) * 2019-01-30 2019-05-21 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) Плазмогазокаталитический реактор обработки жидкости
KR102328319B1 (ko) 2019-02-18 2021-11-18 지닉스 주식회사 자외선램프 내장형 플라즈마 고도수처리용 방전관
CN110092448B (zh) * 2019-05-06 2021-12-17 重庆工商大学 一种同心圆双电极放电等离子体o/w乳化液破乳装置
KR102483967B1 (ko) * 2020-03-13 2023-01-04 지닉스 주식회사 착유세척수 처리장치
US11535532B1 (en) * 2020-07-17 2022-12-27 Dmitry Medvedev System and method of water purification and hydrogen peroxide generation by plasma
KR102564892B1 (ko) * 2020-12-16 2023-08-11 주식회사 골든타임세이퍼 전기 수질 정화 장치
RU204654U1 (ru) * 2021-03-05 2021-06-03 Федеральное государственное бюджетное образовательное учреждение высшего образования "Национальный исследовательский Московский государственный строительный университет" (НИУ МГСУ) Плазмогенератор объемного барьерного разряда
TWI766703B (zh) * 2021-05-27 2022-06-01 凱撒衛浴股份有限公司 電漿液系統

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Also Published As

Publication number Publication date
CN103429538B (zh) 2015-05-20
CN103429538A (zh) 2013-12-04
WO2012128561A2 (ko) 2012-09-27
US20140069853A1 (en) 2014-03-13
KR101157122B1 (ko) 2012-06-22
JP5941527B2 (ja) 2016-06-29
JP2014511757A (ja) 2014-05-19

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