WO2012090754A1 - Procédé de production de substrat en verre pour support d'enregistrement - Google Patents

Procédé de production de substrat en verre pour support d'enregistrement Download PDF

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Publication number
WO2012090754A1
WO2012090754A1 PCT/JP2011/079330 JP2011079330W WO2012090754A1 WO 2012090754 A1 WO2012090754 A1 WO 2012090754A1 JP 2011079330 W JP2011079330 W JP 2011079330W WO 2012090754 A1 WO2012090754 A1 WO 2012090754A1
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WO
WIPO (PCT)
Prior art keywords
glass substrate
polishing
recording medium
abrasive
producing
Prior art date
Application number
PCT/JP2011/079330
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English (en)
Japanese (ja)
Inventor
典子 島津
Original Assignee
コニカミノルタオプト株式会社
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Filing date
Publication date
Application filed by コニカミノルタオプト株式会社 filed Critical コニカミノルタオプト株式会社
Publication of WO2012090754A1 publication Critical patent/WO2012090754A1/fr

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means

Definitions

  • the present invention relates to a method for producing a glass substrate for a recording medium.
  • the magnetic head thermally expands due to the heat generated by the heat generating element provided in the magnetic head, and the magnetic head is operated so as to slightly protrude in the air bearing surface (ABS) direction. Flying height can be kept constant.
  • a head equipped with such a DFH mechanism has a flying height of about several nanometers, defects such as head crashes tend to occur when a magnetic recording medium is used. In order to reduce such defects, it is required to improve the surface smoothness of the magnetic recording medium.
  • Patent Document 1 As an attempt to increase the surface smoothness of a glass substrate, for example, in Japanese Patent Application Laid-Open No. 2010-238310 (Patent Document 1), a glass substrate is polished by traversing a polishing grindstone with a predetermined amount of movement. A technique for reducing the size and number of surface defects has been proposed.
  • Patent Document 2 Japanese Patent Application Laid-Open No. 2009-087441 controls the potential difference between the glass substrate and the aggregated silica particles and impurity particles contained in the polishing liquid when the glass substrate is polished with silica particles.
  • a technique is disclosed that suppresses the formation of surface defects on the main surface of the glass substrate by polishing while polishing.
  • Patent Document 3 discloses a technique for polishing a glass substrate under neutral liquid conditions using cerium oxide.
  • a glass substrate for a magnetic recording medium is usually subjected to evaluation of deposits attached to the surface and end surface of the glass substrate by an optical defect inspection apparatus (OSA: Optical Surface Analyzer) after the final cleaning.
  • OSA optical defect inspection apparatus
  • the glass substrate manufactured by the methods of Patent Documents 1 and 3 has an advantage that the number of defects is determined to be small even by evaluation by OSA, and the manufacturing efficiency of the magnetic recording medium is high.
  • Patent Document 2 can suppress surface defects caused by silica particles to some extent by controlling the potential difference between the aggregated silica particles and impurity particles contained in the polishing liquid and the glass substrate.
  • the above-mentioned problem caused by the abrasive itself could not be solved.
  • the above problem cannot be solved by controlling only the potential difference between the glass substrate and the abrasive.
  • the present inventor investigated the cause of the defect and found that the cause was that the abrasive used for polishing the end face of the glass substrate adhered to the end face of the glass substrate. That is, when the abrasive attached to the end surface of the glass substrate scatters from the end surface to the main surface during the formation of the magnetic film, and this causes a defect such as a head crash later when used as a magnetic recording medium for a recording apparatus. I got the knowledge.
  • the present invention has been made under such circumstances, and the object of the present invention is to prevent the scattering of the abrasive from the end surface of the glass substrate to the main surface during the formation of the magnetic film.
  • An object of the present invention is to provide a method for manufacturing a glass substrate for a recording medium that is less likely to cause errors.
  • the inventors' research has revealed that the cause of adhesion of the abrasive to the glass substrate is due to polishing with a neutral polishing liquid. That is, when neutral and rough polishing was performed, it was found that the zeta potential of the polishing agent approaches the isoelectric point, so that the polishing agent easily adheres to the glass substrate.
  • the abrasive remains on the end surface of the glass substrate by appropriately controlling the zeta potential of the abrasive, the glass substrate precursor, and the polishing brush. It was found that it was possible to prevent the abrasive from being scattered from the end surface of the glass substrate to the main surface during the formation of the magnetic film, and this could make it difficult to cause a subsequent error, and the present invention was completed.
  • the method for producing a glass substrate for a recording medium of the present invention uses a glass substrate precursor, and comprises a step of polishing an end surface of the glass substrate precursor with a polishing brush using a polishing liquid containing an abrasive.
  • the polishing step when the zeta potential of the abrasive is ⁇ pol, the zeta potential of the polishing brush is ⁇ brush, and the zeta potential of the glass substrate precursor is ⁇ sub, both ⁇ pol and ⁇ sub are less than 0 mV, ⁇ sub is smaller than ⁇ brush.
  • ⁇ sub is preferably ⁇ 30 mV or less.
  • the pH of the polishing liquid is preferably 9 or more and 13 or less.
  • the polishing liquid further contains a dispersant, and the dispersant is preferably at least one selected from the group consisting of a polycarboxylic acid, a urethane resin, and an acrylic resin.
  • the abrasive is preferably composed of one or more selected from the group consisting of cerium oxide, zirconium oxide, and aluminum oxide.
  • the polishing liquid further contains a water-soluble polymer, and the water-soluble polymer is selected from the group consisting of polyvinyl alcohol, modified polyvinyl alcohol, polyvinyl pyrrolidone, methacrylic acid copolymer, polymethacrylamide copolymer, and polyethylene glycol. It is preferable that it consists of 1 or more types.
  • the polishing liquid further contains a surfactant, and the surfactant preferably contains a sulfonic acid surfactant, a phosphoric acid surfactant, or a nonionic surfactant.
  • the polishing brush is preferably made of one or more materials selected from the group consisting of aramid fibers, polybutylene terephthalate, and polypropylene.
  • the method for producing a glass substrate for a recording medium of the present invention has the above-described configuration, and thus can prevent the abrasive from scattering from the end surface of the glass substrate to the main surface during the formation of the magnetic film. It shows an extremely excellent effect that it is difficult for subsequent errors to occur. For this reason, the glass substrate for recording media manufactured by the manufacturing method of this invention shows the effect that a late error does not generate
  • the method for producing a glass substrate for a recording medium of the present invention includes at least a step of polishing an end surface of a glass substrate precursor with a polishing brush using a polishing liquid containing an abrasive (hereinafter referred to as “end surface polishing step”).
  • the method for producing a glass substrate for a recording medium of the present invention can include other steps as long as the chemical strengthening step and the end surface polishing step are thus included.
  • a disk processing process for processing the glass substrate precursor into a disk shape for example, a lapping process for adjusting the parallelism and thickness of the glass substrate precursor, and the surface smoothness of the glass substrate precursor are improved.
  • Rough polishing process for polishing precision polishing process for polishing to improve the smoothness of the glass substrate precursor than polishing in the rough polishing process, chemical strengthening to form a chemically strengthened layer on the surface and end face of the glass substrate precursor
  • Examples of the process include a cleaning process for cleaning the surface and the end face of the glass substrate precursor.
  • the glass substrate for a recording medium produced by the present invention is used as a substrate for an information recording medium in an information recording apparatus such as a hard disk drive device, and its size and shape are not particularly limited.
  • the outer diameter is 2.5 inches, 1.8 inches, 1 inch, 0.8 inches, etc.
  • the thickness is 2 mm, 1 mm, 0.65 mm, 0.8 mm, etc. be able to.
  • a hole for setting in the information recording apparatus may be formed in the disc-shaped central portion.
  • ⁇ Disk processing process> In the disk processing step, first, a glass material is melted (glass melting step), molten glass is poured into a lower mold, and press molding is performed with an upper mold to obtain a disk-shaped glass substrate precursor (press molding process).
  • the disk-shaped glass substrate precursor may be produced by cutting a sheet glass formed by, for example, a downdraw method or a float method with a grinding stone, without using such a press molding process.
  • the glass material is not particularly limited as long as it can be chemically strengthened by ion exchange.
  • soda lime glass mainly composed of SiO 2 , Na 2 O, CaO
  • R ′ Mg, Ca, Sr, Ba
  • aluminosilicate glass and borosilicate glass are particularly preferable because they are excellent in impact resistance and vibration resistance.
  • the total of SiO 2 , Al 2 O 3 and B 2 O 3 is 50 to 85% by mass, and the total of LiO 2 , Na 2 and K 2 O is 0.1 to 20% by mass. %, And the total of MgO, CaO, BaO, SrO and ZnO is 2 to 20% by mass.
  • SiO 2 is 50 to 70% by mass
  • Al 2 O 3 is 0 to 20% by mass
  • B 2 O 3 is 0 to 5% by mass. .
  • the glass substrate precursor press-molded as described above is perforated at the center with a core drill or the like having a diamond grindstone or the like in the cutter (coring process).
  • the end face of the hole is referred to as an inner peripheral end face.
  • a lapping process is performed on both the front and back surfaces of the glass substrate precursor.
  • the lapping process can be performed by, for example, a grinding process, whereby the overall shape of the glass substrate precursor, that is, the parallelism, flatness, and thickness of the glass substrate precursor can be preliminarily adjusted.
  • End face polishing process The end surface of the glass substrate precursor after the lapping step is polished with a polishing brush using a polishing liquid containing an abrasive. Specifically, a polishing liquid containing an abrasive is supplied to the polishing brush, the polishing brush is disposed so as to contact the end surface of the glass substrate precursor, and then the polishing brush is applied while rotating the glass substrate precursor. Thus, the end face of the glass substrate precursor is polished.
  • the “end face” in the present invention means the inner peripheral end face and the outer peripheral end face of the glass substrate precursor.
  • the polishing in the end face polishing step using the polishing brush, if the zeta potential of the abrasive is ⁇ pol, the zeta potential of the polishing brush is ⁇ brush, and the zeta potential of the glass substrate precursor is ⁇ sub, Further, the polishing is characterized in that the polishing is carried out by setting it to be less than 0 mV and ⁇ sub to be smaller than ⁇ brush. Thus, adhesion of the abrasive to the glass substrate precursor can be prevented by making the zeta potential of the abrasive and the glass substrate precursor negative.
  • the zeta potential of the glass substrate precursor lower than the zeta potential of the polishing brush, the repulsive force of the abrasive with respect to the glass substrate precursor is increased, and the abrasive is easily separated from the glass substrate precursor. (Prevents adhesion of abrasive). By preventing the adhesion of the abrasive in this way, it is possible to prevent the abrasive from being scattered from the end surface of the glass substrate to the main surface, thereby preventing the occurrence of subsequent defects when processed as a magnetic recording medium. Can do.
  • the zeta potential means that when a solid is dispersed in a solvent, charge separation occurs at the interface between the solution and the solid, and a potential difference occurs near the interface. It means the potential difference between the potential and the potential of the solvent sufficiently away from the interface.
  • the ⁇ potential is repulsive between those having a positive ⁇ potential or between those having a negative ⁇ potential, and is attractive between those having a positive ⁇ potential and those having a negative ⁇ potential. As the absolute value of the ⁇ potential is larger, a stronger attractive force or repulsive force is applied.
  • the present invention makes use of such ⁇ potential characteristics to make both the ⁇ potential of the glass substrate precursor and the ⁇ potential of the polishing agent negative, and in particular, to increase the absolute value of the ⁇ potential of the glass substrate precursor.
  • the repulsive force between the glass substrate precursor and the abrasive is increased so that the abrasive does not adhere to the end face of the glass substrate precursor or even if it adheres, it can be easily removed in the cleaning process.
  • a conventionally known method can be used, but an electrophoresis method, a streaming potential method, an ultrasonic method, an ESA method, or the like is used. It is preferable.
  • the above ⁇ sub is preferably ⁇ 30 mV or less.
  • the abrasive can be more easily electrically separated from the glass substrate precursor.
  • the method is not limited to this method. For example, additives such as a dispersant and the glass composition are changed. Therefore, it is possible to change ⁇ sub.
  • the abrasive contained in the above polishing liquid is preferably contained at 1 to 15% by mass, more preferably 3 to 7% by mass. Moreover, it is preferable that the average particle diameter of an abrasive
  • polishing agent is 1 micrometer or more and 2.5 micrometers or less, More preferably, they are 1 micrometer or more and 1.5 micrometers or less.
  • the abrasive used in the above is made of at least one selected from the group consisting of cerium oxide, zirconium oxide, and aluminum oxide. This is because such an abrasive can efficiently polish the glass substrate precursor and can easily control the zeta potential of the abrasive.
  • the zeta potential of such an abrasive can be reduced by adding a polycarboxylic acid-based dispersant as the composition of the polishing liquid in which the abrasive is dispersed.
  • the zeta potential of the polishing agent can be lowered by making the polishing solution liquid alkaline.
  • the liquid property of the polishing liquid is not particularly limited as long as the zeta potential of the polishing agent can be controlled to ⁇ 30 mV or less, but is preferably alkaline, more preferably pH. 9 or more and 13 or less. By using a polishing liquid having such a liquid property, it becomes easy to adjust the zeta potential of the abrasive to minus.
  • the above polishing liquid preferably contains a dispersant.
  • the dispersant is preferably at least one selected from the group consisting of polycarboxylic acids, urethane resins, and acrylic resins. By including such a dispersing agent, it is possible to uniformly disperse the abrasive in the polishing liquid, and thus it is possible to efficiently polish the end face of the glass substrate precursor.
  • the polishing liquid preferably further contains a water-soluble polymer.
  • the water-soluble polymer is preferably composed of at least one selected from the group consisting of polyvinyl alcohol, modified polyvinyl alcohol, polyvinyl pyrrolidone, methacrylic acid copolymer, polymethacrylamide copolymer, and polyethylene glycol.
  • the polishing liquid preferably further contains a surfactant.
  • a surfactant one or more selected from the group consisting of a sulfonic acid surfactant, a phosphoric acid surfactant, or a nonionic surfactant can be used.
  • a surfactant such as hydroxyl group ethylidene phosphophone (HEDP: 1-Hydroxy Ethylidene-1,1-Diphosphonic Acid)
  • HEDP 1-Hydroxy Ethylidene-1,1-Diphosphonic Acid
  • the polishing brush for polishing the end surface of the glass substrate precursor is preferably composed of one or more selected from the group consisting of aramid fibers, polybutylene terephthalate, and polypropylene.
  • the end face shape can be created while controlling the zeta potential more easily.
  • the zeta potential of the polishing brush or the glass substrate can be adjusted by bringing the water-soluble polymer or surfactant into contact with the surface prior to the polishing treatment. It is possible to increase or decrease the value of the zeta potential by adjusting the treatment time with the surfactant and the concentration of the water-soluble polymer and the surfactant used in the treatment.
  • the value of the zeta potential decreases, and the OH group or COOH group
  • the zeta potential value tends to increase.
  • the front and back surfaces of the glass substrate precursor after the end face polishing step are polished with a polishing pad using a polishing liquid containing an abrasive.
  • a polishing liquid containing an abrasive is supplied to the surface of the glass substrate precursor, and the polishing pads are arranged so as to be in contact with both the front and back surfaces of the glass substrate precursor. By rotating in the reverse direction, the surface of the glass substrate precursor is polished.
  • the polishing pad used in the rough polishing step for example, a urethane foam pad can be used, and a hard pad having a hardness A of about 80 to 90 is preferable.
  • polishing agent and polishing liquid as those described in the end face polishing step can be used. Further, by controlling the zeta potential of the polishing pad, the polishing agent, and the polishing liquid in the same manner as the polishing brush, it is possible to make it difficult for the polishing agent to adhere to the front and back surfaces of the glass substrate precursor.
  • the precision polishing step is performed to further improve the surface smoothness of the glass substrate precursor, and is a step of polishing the glass substrate precursor by a polishing method with higher accuracy than the above rough polishing step.
  • a precision polishing step it is preferable to perform mirror polishing of the front and back surfaces of the glass substrate using a polishing pad of a polyurethane-based soft polisher with a double-side polishing apparatus having a planetary gear mechanism.
  • the polishing liquid used here for example, a dispersion in which colloidal silica having an average particle size of 40 nm or less is dispersed in ultrapure water, more preferably colloidal silica having an average particle size of 20 to 40 nm is used. Use dispersed ones.
  • a chemically strengthened layer is formed on the surface and the end face of the glass substrate precursor subjected to the above-described precision polishing.
  • Such a process usually reinforces the surface of the glass substrate precursor using a chemical strengthening treatment liquid.
  • Such a chemical strengthening process can employ
  • a step of immersing the glass substrate precursor in a chemical strengthening treatment liquid can be exemplified.
  • a chemical strengthening layer is formed in the area
  • alkali metal ions such as lithium ions and sodium ions contained in the glass substrate precursor are further reduced.
  • alkali metal ions such as potassium ions having a large ion radius are substituted. Compressive stress is generated in the ion-exchanged region due to the strain caused by the difference in ion radius, and the surface of the glass substrate precursor is strengthened in the region.
  • Examples of such chemical strengthening treatment liquid include a solution in which potassium nitrate (60%) and sodium nitrate (40%) are mixed.
  • the glass substrate on which the chemical strengthening layer is formed is preferably washed with a neutral detergent and pure water and dried. By performing such cleaning, it is possible to wash away the adhesion of foreign substances contained in the chemical strengthening treatment liquid, and to stabilize the surface of the glass substrate for recording media and to have excellent long-term storage stability. it can.
  • a glass substrate for a recording medium can be produced as described above.
  • the method of manufacturing the glass substrate for recording medium of the present invention is not limited to the above-described manufacturing method, and may be manufactured by reversing the order of the precision polishing step and the chemical strengthening step, for example. Thus, even if the glass substrate for recording media is manufactured, the same performance as the glass substrate for recording media manufactured by the above manufacturing method can be obtained.
  • Example 1 a glass substrate for a recording medium was manufactured by the following steps.
  • a multicomponent glass material made of amorphous glass was prepared.
  • aluminosilicate glass was used as the composition of the glass material.
  • the chemical composition of the glass material SiO 2 is 50 to 70 wt%, Al 2 O 3 is 0 to 20 wt%, B 2 O 3 0 to 5 wt% (however, SiO 2, Al 2 O 3 , and B 2 O 3 is 50 to 85% by mass), Li 2 O, Na 2 O, and K 2 O are 0.1 to 20% by mass, MgO, CaO, BaO, SrO, and ZnO. Was 2 to 20% by mass.
  • a disk-shaped glass substrate precursor was formed by molding the above glass material by a direct press method. And the hole was made in the center part of the glass substrate precursor using the grindstone, and it was set as the disk-shaped glass substrate precursor which has a circular hole in the center part. Furthermore, the outer peripheral end surface and the inner peripheral end surface of the glass substrate precursor were chamfered.
  • ⁇ Lapping process> The glass substrate precursor whose end face was polished as described above was ground on both the front and back surfaces of the glass substrate precursor using abrasive grains having a particle size of # 1000. Thereby, while adjusting the glass substrate precursor to the thickness of about 0.95 mm, the parallelism of the glass substrate precursor was improved.
  • the surface roughness of the end surface (inner periphery, outer periphery) of the glass substrate with a polishing brush is about 1.0 ⁇ m at the maximum height (Rmax), arithmetic average roughness (Ra) was polished to about 0.3 ⁇ m.
  • a polishing brush made of nylon 6 was used, and a polishing liquid was included in advance.
  • a polishing agent made of cerium oxide having an average particle diameter of 1.5 ⁇ m was mixed with water, so that the concentration of the polishing agent was 7% by mass. Further, the pH was adjusted to 10 by adding 1 mol / L potassium hydroxide.
  • the zeta potential ⁇ pol of the abrasive contained in such a polishing liquid was measured by applying an applied voltage of 60 mV / cm using a flow cell unit. Further, the zeta potential ⁇ sub of the glass substrate precursor and the zeta potential ⁇ brush of the polishing brush were each measured by preparing a 37 mm ⁇ 16 mm ⁇ 5 mm sample and using a flat plate cell. These zeta potentials were measured using a zeta potential / particle size measurement system (product name: ELSZ-2 (manufactured by Otsuka Electronics Co., Ltd.). As a result of the above zeta potential measurement, ⁇ pol was ⁇ 50 mV.
  • ⁇ sub was ⁇ 40 mV
  • ⁇ brush was ⁇ 30 mV.
  • the zeta potential of the polishing brush and the glass substrate was adjusted to adjust the time of contact with the phosphate surfactant solution as a surfactant before polishing treatment in addition to adjusting the pH of the polishing solution. To adjust each. Specifically, it adjusted by changing the density
  • ⁇ Precision polishing process> Using a double-side polishing apparatus having a planetary gear mechanism, the front and back surfaces of the glass substrate precursor were mirror-polished using a polishing pad of a polyurethane-based soft polisher.
  • the polishing liquid used was a dispersion of colloidal silica having an average particle diameter of 20 nm in ultrapure water.
  • the glass substrate precursor was immersed in an aqueous NaOH solution having a concentration of 3 to 5% by mass and subjected to alkali cleaning while applying ultrasonic waves. Furthermore, it wash
  • Examples 2 to 8, Comparative Examples 1 to 3> Compared to Example 1 above, the zeta potentials of the abrasive, the polishing brush, and the glass substrate precursor in the rough polishing step are different as shown in Table 1, and by adding a sulfuric acid aqueous solution or potassium hydroxide to the polishing liquid.
  • the glass substrates for recording media of Examples 2 to 8 and Comparative Examples 1 to 3 were prepared in the same manner as in Example 1 except that the pH of the polishing liquid was different as shown in Table 1.
  • the number of recording medium glass substrates in which errors were detected was counted using the TA test head equipped with the DFH mechanism for the recording medium glass substrates thus prepared.
  • the collision error means a collision error that occurred between 5 mm from the outer peripheral end surface of the glass substrate for recording medium. The smaller the number of collision errors, the better the surface smoothness of the glass substrate for recording medium. Is shown.
  • the glass substrates for recording media manufactured by the manufacturing methods of Examples 1 to 8 had a polishing agent that scattered from the end surface to the main surface due to a decrease in the polishing agent adhering to the end surface. It was confirmed that collision errors are less likely to occur due to the decrease. In contrast, the recording medium glass substrates manufactured by the manufacturing methods of Comparative Examples 1 to 3 are likely to cause a collision error because the abrasive adhered to the end surface of the magnetic film is scattered on the main surface when the magnetic film is formed. confirmed.
  • the glass substrate for a recording medium manufactured according to the manufacturing method of the present invention performs rough polishing by controlling the zeta potential of the polishing agent, the glass substrate precursor, and the polishing brush, so that the end surface of the polishing agent is removed. It is clear that it was possible to prevent adhesion and to prevent the abrasive from scattering from the end surface to the main surface, thereby making it difficult to cause a collision error.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

L'invention concerne un procédé de production de substrat en verre pour support d'enregistrement permettant d'empêcher l'éclaboussure d'un agent de polissage à partir de la surface d'extrémité de la surface principale du substrat de verre, ce qui rend difficile l'apparition d'erreurs ultérieures. Le procédé de production de substrat en verre pour support d'enregistrement est caractérisé en ce qu'il comprend une étape de polissage de la surface d'extrémité d'un précurseur de substrat en verre au moyen d'une brosse de polissage utilisant un liquide de polissage contenant un agent de polissage. Dans l'étape de polissage, lorsque le potentiel zêta de l'agent de polissage est ζpol, le potentiel zêta de la brosse de polissage est ζbrush, et le potentiel zêta du précurseur de substrat en verre est ζsub, ζpol et ζsub sont tous deux inférieurs à 0 mV, et ζsub est inférieur à ζbrush.
PCT/JP2011/079330 2010-12-28 2011-12-19 Procédé de production de substrat en verre pour support d'enregistrement WO2012090754A1 (fr)

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JP2010292325 2010-12-28

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005154558A (ja) * 2003-11-25 2005-06-16 Kishimoto Sangyo Co Ltd 洗浄剤
JP2006120912A (ja) * 2004-10-22 2006-05-11 Matsushita Electric Ind Co Ltd 半導体装置の製造方法および製造装置
JP2006306924A (ja) * 2005-04-26 2006-11-09 Kao Corp 研磨液組成物
JP2010080022A (ja) * 2008-09-29 2010-04-08 Showa Denko Kk 垂直磁気記録媒体の製造方法
JP2010086632A (ja) * 2008-10-02 2010-04-15 Konica Minolta Opto Inc 磁気記録媒体用ガラス基板の製造方法
JP2010192041A (ja) * 2009-02-18 2010-09-02 Fuji Electric Device Technology Co Ltd 磁気記録媒体用ガラス基板の製造方法、それが使用される磁気記録媒体用ガラス基板、および、垂直磁気記録媒体

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005154558A (ja) * 2003-11-25 2005-06-16 Kishimoto Sangyo Co Ltd 洗浄剤
JP2006120912A (ja) * 2004-10-22 2006-05-11 Matsushita Electric Ind Co Ltd 半導体装置の製造方法および製造装置
JP2006306924A (ja) * 2005-04-26 2006-11-09 Kao Corp 研磨液組成物
JP2010080022A (ja) * 2008-09-29 2010-04-08 Showa Denko Kk 垂直磁気記録媒体の製造方法
JP2010086632A (ja) * 2008-10-02 2010-04-15 Konica Minolta Opto Inc 磁気記録媒体用ガラス基板の製造方法
JP2010192041A (ja) * 2009-02-18 2010-09-02 Fuji Electric Device Technology Co Ltd 磁気記録媒体用ガラス基板の製造方法、それが使用される磁気記録媒体用ガラス基板、および、垂直磁気記録媒体

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