WO2012000426A1 - 抛光垫修整头 - Google Patents

抛光垫修整头 Download PDF

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Publication number
WO2012000426A1
WO2012000426A1 PCT/CN2011/076500 CN2011076500W WO2012000426A1 WO 2012000426 A1 WO2012000426 A1 WO 2012000426A1 CN 2011076500 W CN2011076500 W CN 2011076500W WO 2012000426 A1 WO2012000426 A1 WO 2012000426A1
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WO
WIPO (PCT)
Prior art keywords
polishing pad
main shaft
disk
pressure plate
flange
Prior art date
Application number
PCT/CN2011/076500
Other languages
English (en)
French (fr)
Inventor
路新春
沈攀
何永勇
雒建斌
Original Assignee
清华大学
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 清华大学 filed Critical 清华大学
Priority to US13/384,631 priority Critical patent/US20120115403A1/en
Publication of WO2012000426A1 publication Critical patent/WO2012000426A1/zh

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools

Definitions

  • the invention relates to the technical field of chemical mechanical polishing equipment, in particular to a polishing pad finishing head. Background technique
  • the surface of the polishing pad becomes smooth, forming a glaze layer, and the polishing pad stores and transports the abrasive.
  • the reduced ability results in a decrease in material removal rate and polishing surface quality.
  • the current polishing pad trimming head structure is relatively complicated, and the clamping mechanism for generating the pressing motion and the diamond disc is separate and independent, and the guiding and torque transmission of the pressing motion are realized by the key connection, and the up and down telescopic movement is realized. Limits need to be added to add extra parts. Summary of the invention
  • An embodiment of the present invention provides a polishing pad dressing head that is simple and compact in structure and easy to process and assemble.
  • a polishing pad finishing head includes: a bearing housing, a main shaft, a protective cover, a pressure plate, an adaptive disk, a diamond disk, and a flexible ring; a bearing end cover is mounted on an upper end of the bearing housing; a bearing rotatably mounted in the bearing housing, the main shaft having an axial passage extending therethrough, an upper end of the main shaft extending from the bearing end cover, and a lower end of the main shaft a lower end of the bearing housing extends and a seal is arranged between the lower end of the bearing seat and the main shaft, a synchronous pulley is mounted on the upper end of the main shaft, and a rotary joint is mounted on the upper end of the axial passage, the main shaft a lower end is mounted with a flange, a lower surface of the flange is mounted with a pressing piece; the protective cover is disposed around the
  • the polishing pad trimming head according to the embodiment of the invention has the advantages of simple and compact structure, easy processing and assembly, smooth and reliable movement, high practicability, and can be widely used in polishing equipment.
  • a first sealing ring is disposed between the pressure plate and the adaptive disk, and the protective cover
  • a second sealing jaw is disposed between the pressure plate and a third sealing jaw between the main shaft and the flange.
  • the seal between the lower end of the bearing housing and the main shaft is a labyrinth seal.
  • a first air hole is disposed in the bearing housing, a second air hole communicating with the first air hole is disposed in the bearing end cover, and a quick change is installed at an upper end of the second air hole.
  • a joint, a lower end of the first air hole leads to a space between an inner bottom surface of the bearing seat and the main shaft such that a seal between a lower end of the bearing seat and the main shaft is a gas seal.
  • the axial passage includes an upper section and a lower section, wherein the lower section has a radial dimension greater than a radial dimension of the upper section.
  • the axial passage has a circular cross section.
  • the upper and lower edges of the flexible ring are flat and the upper and lower edges are connected by a curved transition.
  • the adaptive disk includes a lower disk body and an upper shaft portion, and a lower surface of the lower disk body is provided with a groove, and a lower end of the upper shaft portion and an upper portion of the lower disk body The surfaces are connected, and a lower end of the upper shaft portion is fitted in the axial passage, and the communication passage is formed in the upper shaft portion.
  • the communication passage includes a vertical passage portion and a lateral passage portion that communicate with each other, the vertical passage portion extending downward from the upper end of the upper shaft portion by a predetermined length, the lateral passage portion along the edge
  • the upper shaft portion extends circumferentially to communicate the vertical passage portion with the closed cavity.
  • the top wall of the groove is a sheet structure and has a thickness of 0.1 mm to 0.5 mm.
  • FIG. 1 is a schematic structural view of a polishing pad trimming head according to an embodiment of the present invention
  • FIG. 2 is a schematic perspective view of a flexible ring according to an embodiment of the present invention.
  • FIG. 3 is a cross-sectional view of a flexible ring in accordance with an embodiment of the present invention.
  • FIG. 4 is a schematic perspective structural view of an adaptive disk according to an embodiment of the present invention.
  • FIG. 5 is a cross-sectional view of an adaptive disk in accordance with an embodiment of the present invention. Specific way
  • installation should be understood broadly, and may be fixed connections, for example, or Removable connection, or integral connection; can be mechanical connection or electrical connection; it can be directly connected or indirectly connected through an intermediate medium, which can be the internal communication between the two components.
  • installation should be understood broadly, and may be fixed connections, for example, or Removable connection, or integral connection; can be mechanical connection or electrical connection; it can be directly connected or indirectly connected through an intermediate medium, which can be the internal communication between the two components.
  • a polishing pad finishing head includes: a bearing housing 6, a spindle 14, a protective cover 5, a pressure plate 3, an adaptive disk 19, a diamond disk 1 and a flexible ring 18.
  • the main shaft 14 can be rotatably mounted in the bearing housing 6 through the bearing 9.
  • a bearing end cap 13 can be mounted on the upper end of the bearing housing 6, whereby the bearing end cap 13 is used to fix the glaze holder 9 in the bearing housing 6.
  • the main shaft 14 can be axially positioned by two sets of bearings 9 to avoid axial movement of the main shaft 14, and a sleeve 8 can be disposed between the two sets of bearings 9, whereby the two sets of bearings 9 can pass through the bearing end cover 13 and the sleeve 8. It is fixed in the bearing housing 6.
  • the main shaft 14 may be provided with an axial passage 141 extending in the axial direction (up and down direction in Fig. 1).
  • the upper end of the main shaft 14 extends from the shaft end cover 13, and the lower end of the main shaft 14 is from the shaft base.
  • the lower end of the sleeve 6 extends, and a seal 20 is provided between the lower end of the shaft seat 6 and the main shaft 14. More specifically, the main shaft 14 is provided with a seal 20 between the lower end of the shaft base 6 and the opening for projecting the lower end of the main shaft 14, thereby preventing liquid from entering the bearing housing 6 during polishing.
  • the upper end of the main shaft 14 is mounted with a timing pulley 10, for example, the upper end portion of the main shaft 14 is fixedly connected to the timing pulley 10 by screws, and the timing pulley 10 can be connected to a driving device (not shown, for example, a driving motor) through a belt.
  • the spindle 14 can be driven to rotate.
  • a rotary joint 1 1 is mounted at the upper end of the axial passage 141, whereby the rotary joint 11 can be connected to a gas source (not shown) or a vacuuming device (not shown, such as a vacuum pump), thereby rotating the spindle 14
  • the axial passage 141 may be evacuated or supplied with gas into the axial passage 141 during this period.
  • the lower end of the main shaft 14 is mounted with a flange 15, and the lower surface of the flange 15 is mounted with a pressing piece 17, for example, the flange 15 is fixed to the lower end surface of the main shaft 14 by screws, and the pressing piece 17 is fixed under the flange 15 by screws. On the end face.
  • the protective cover 5 is disposed around the flange 15. As shown in FIG. 1, the inner cavity of the protective cover 5 is provided with a step, and the pressure plate 3 is connected to the protective cover 5. More specifically, as shown in FIG. 1, the pressure plate 3 is connected to the lower end surface of the step in the inner cavity of the protective cover 5 through a pin shaft, and the lower end of the adaptive disk 19 is connected to the pressure plate 3 and the adaptive disk 19 is The upper end is movably fitted in the axial passage 141, and the adaptive disk 19 is provided with a communication passage 191 (see Fig. 5), and the diamond disk 1 is mounted on the lower surface of the pressure plate 3.
  • the protective cover 5, the pressure plate 3, the adaptive disk 19 and the diamond disk 1 can be connected by screws Integrally, the flange 15 and the pressing piece 17 are covered and fixed.
  • the upper edge 181 of the flexible ring 18 is sandwiched between the flange 15 and the pressing piece 17, and the lower edge 182 of the flexible ring 18 is sandwiched between the protective cover 5 and the pressure plate 3, wherein the flexible ring 18, the flange 15, and the pressure plate 3 Together with the adaptive disk 19, a closed cavity M is formed.
  • the protective cover 5, the pressure plate 3, the adaptive disk 19 and the diamond disk 1 can be rotated by the flexible ring 18 with the spindle 14 and can be rotated relative to the spindle by the expansion and contraction of the flexible ring 18. 14 moves up and down, and the closed cavity M communicates with the axial passage 141 through the communication passage 191.
  • the polishing pad trimming head according to the embodiment of the invention has the advantages of simple and compact structure, easy processing and assembly, smooth and reliable movement, high practicability, and can be widely used in polishing equipment.
  • the up and down movement of the dressing head is effected by the flexible ring 18, the flexible ring 18 is extended downward when the diamond disk 1 is moved downward, and the spindle 14 transmits torque to the diamond disk 1 through the flexible ring 18 and rotates together with the diamond disk 1
  • the polishing pad is trimmed; during the downward movement of the diamond disk 1 and the polishing pad, the adaptive disk 19 can be elastically deformed, so that the diamond disk 1 is adaptive and can be completely finished in the process of trimming the polishing pad.
  • the surface is laminated to obtain a good finishing effect.
  • the vacuum of the vacuum may be 0-100 kPa.
  • the positive pressure pressure to inflate the inside of the sealed cavity M
  • the downward pressure of the dressing head can be linearly changed when the diamond disk 1 is in contact with the polishing pad, and the positive pressure can be adjusted as needed to obtain different trimming heads.
  • the downforce trim pressure range is 0-300 Newtons.
  • a first sealing jaw 2 may be disposed between the pressure plate 3 and the adaptive disk 19
  • a second sealing ring 4 may be disposed between the protective cover 5 and the pressure plate 3
  • a third sealing ring 7 may be disposed between the main shaft 14 and the flange 15.
  • the seal 20 between the lower end of the bearing housing 6 and the main shaft 14 may be a gas seal.
  • the bearing housing 6 may be provided with a first air hole 61.
  • the bearing end cover 13 may be provided with a second air hole 131 communicating with the first air hole 61.
  • the upper end of the second air hole 131 is provided with a quick change joint 12,
  • the lower end of an air hole 61 leads to a space between the inner bottom surface of the shaft 7
  • the gas enters the cavity of the bearing housing 6 through the quick-change joint 12, and part of the gas is blown out from the gap between the main shaft 14 and the bearing housing 6 to form a gas seal, thereby preventing liquid from entering the bearing housing 6 during the polishing process.
  • the seal 20 between the lower end of the bearing housing 6 and the main shaft 14 may be a labyrinth seal. Thereby, it is possible to prevent liquid from entering the housing 6 during the polishing process.
  • the axial passage 141 includes an upper section 1411 and a lower section 1412, wherein the lower section 1412 has a radial dimension that is greater than a radial dimension of the upper section 1411. It should be noted that the diamond disk 1 can be implemented. The up and down telescopic movement, the axial passage 141 can serve to guide the adaptive disk 19 to guide the diamond disk 1.
  • the top end of the adaptive disk 19 abuts against the top end of the lower stage 1412, thus defining an upper limit point for the upward movement of the adaptive disk 19.
  • the oblique side of the protective cover 5 fits obliquely with the shoulder of the flange 15, which defines the lower limit position of the downward movement of the adaptive disc 19, thereby defining the travel of the diamond disc 1 up and down.
  • the stroke of the diamond disk 1 moving up and down can be limited to 0-15 mm.
  • the axial passage 141 may have a circular cross section, which facilitates machining.
  • the axial passage 1 14 can also have a rectangular cross section.
  • the upper edge 181 and the lower edge 182 of the flexible ring 18 may be flat and the upper edge 181 and the lower edge 182 are joined by a curved transition 183.
  • the upper edge 181 of the flexible ring 18 can be sandwiched between the flange 15 and the pressing piece 17, and the lower edge 182 of the flexible ring 18 is sandwiched between the protective cover 5 and the pressure plate 3.
  • the adaptive disk 19 includes a lower disk body 192 and an upper shaft portion 193.
  • the lower surface of the lower disk body 192 is provided with a recess 194, and an upper shaft portion 193.
  • the lower end is connected to the upper surface of the lower disc body 192, and the lower end of the upper shaft portion 193 is fitted in the axial passage 141, and the communication passage 191 is formed in the upper shaft portion 193.
  • the communication of the communication passage 191 and the closed cavity M through the rotary joint 1 1 and the axial passage 141 can be realized.
  • the communication passage 191 includes a vertical passage portion 1911 and a lateral passage portion 1912 that communicate with each other, the vertical passage portion 1911 extends downward from the upper end of the upper shaft portion 193 by a predetermined length, and the lateral passage portion 1912 is along the circumference of the upper shaft portion 193.
  • the extension extends to connect the vertical passage portion 1911 with the closed cavity M. Thereby, it is possible to evacuate or pressurize the closed cavity M through the rotary joint 1 1 .
  • the top wall of the recess 194 is a sheet structure and has a thickness of 0.1 mm to 0.5 mm.
  • the adaptive disk 19 can be made to be more elastically deformed, so that the diamond disk 1 is adaptive.
  • the polishing pad dressing head according to the embodiment of the present invention has a simple structure, and the diamond disk 1 has adaptability, which improves the precision and efficiency of the polishing pad dressing.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)

Description

拋光垫修整头 技术领域
本发明涉及化学机械抛光设备技术领域, 特别涉及一种抛光垫修整头。 背景技术
化学机械抛光设备中 ,抛光垫在使用一段时间后, 随着自身的磨损以及磨屑对抛光 垫表面微孔的填充, 抛光垫表面变得平滑, 形成釉化层, 使抛光垫存储、 输送磨料的能 力降低,导致材料去除率和抛光表面质量下降。通过修整头上金刚石盘对抛光垫进行适 当的修整, 可去除釉化层以及抛光垫上的磨屑, 提高抛光垫粗糙度及其使用寿命, 降低 成本,保证抛光一致性。修整头带动金刚石盘下压与抛光垫接触,并带动金刚石盘旋转, 金刚石盘在与抛光垫接触并旋转的过程中对抛光垫进行修整。
目前的抛光垫修整头结构都较为复杂,产生下压运动的腔体与金刚石盘的夹持机构 是分离独体的, 下压运动的导向和扭矩的传递都通过键连接来实现,上下伸缩运动的限 位需要增加额外的零件来实现。 发明内容
根据本发明的实施例提供了一种结构简单紧凑, 易于加工装配的抛光垫修整头。 根据本发明实施例的抛光垫修整头, 包括: 轴承座、 主轴、 保护盖、 压盘、 自适应 盘、金刚石盘和柔性环; 所述轴承座的上端安装有轴承端盖; 所述主轴通过轴承可旋转 地安装在所述轴承座内, 所述主轴内设有沿其轴向贯通的轴向通道, 所述主轴的上端从 所述轴承端盖延伸出,所述主轴的下端从所述轴承座的下端延伸出且所述轴承座的下端 与所述主轴之间设有密封, 所述主轴的上端安装有同步带轮,所述轴向通道的上端处安 装有旋转接头, 所述主轴的下端安装有法兰, 所述法兰的下表面安装有压片; 所述保护 盖围绕所述法兰设置; 所述压盘与所述保护盖相连; 所述自适应盘的下端与所述压盘相 连且所述自适应盘的上端可移动地配合在所述轴向通道内,所述自适应盘内设有连通通 道; 所述金刚石盘安装在所述压盘的下表面上; 所述柔性环的上沿夹在所述法兰与所述 压片之间, 所述柔性环的下沿夹在所述保护盖与所述压盘之间, 其中所述柔性环、 所述 法兰、 所述压盘、 和所述自适应盘共同形成密闭空腔, 所述保护盖、 所述压盘、 所述自 适应盘和所述金刚石盘通过所述柔性环能够随所述主轴旋转且通过所述柔性坏的伸缩 变形能够相对于所述主轴上下移动,所述密闭空腔通过所述连通通道与所述轴向通道连 通。
根据本发明实施例的抛光垫修整头具有结构简单紧凑美观, 易于加工制造及装配, 运动平稳可靠, 具有很高的实用性, 可广泛用于抛光设备中。
根据本发明的一些实施例, 所述压盘与自适应盘之间设有第一密封圈,所述保护盖 与所述压盘之间设有第二密封圏, 所述主轴与所述法兰之间设有第三密封圏。
根据本发明的一个实施例, 所述轴承座的下端与所述主轴之间的密封为迷宫式密 封。
根据本发明的一些示例, 所述轴承座内设有第一气孔, 所述轴承端盖内设有与所述 第一气孔连通的第二气孔, 所述第二气孔的上端处安装有快换接头, 所述第一气孔的下 端通向所述轴承座的内底面与所述主轴之间的空间以便所述轴承座的下端与所述主轴 之间的密封为气封。
根据本发明的一个示例, 所述轴向通道包括上段和下段, 其中所述下段径向尺寸大 于所述上段的径向尺寸。
根据本发明的一个具体示例, 所述轴向通道具有圓形横截面。
根据本发明的一个实施例,所述柔性环的上沿和下沿为平板状且所述上沿和所述下 沿通过弯曲过渡部相连。
根据本发明的一些实施例, 所述自适应盘包括下盘体和上轴部, 所述下盘体的下表 面设有凹槽, 所述上轴部的下端与所述下盘体的上表面相连, 且所述上轴部的下端配合 在所述轴向通道内, 所述连通通道形成在所述上轴部内。
根据本发明的一些示例,所述连通通道包括彼此连通的竖向通道部分和横向通道部 分, 所述竖向通道部分从所述上轴部的上端向下延伸预定长度, 所述横向通道部分沿所 述上轴部的周向延伸以将所述竖向通道部分与所述密闭空腔连通。
根据本发明的一些实施例, 所述凹槽的顶壁为薄片结构且具有 0. 1 mm-0.5mm的厚 度。
本发明的附加方面和优点将在下面的描述中部分给出,部分将从下面的描述中变得 明显, 或通过本发明的实践了解到。 酎图说明
本发明的上述和 /或附加的方面和优点从结合下面附图对实施例的描述中将变得明 显和容易理解, 其中:
图 1是根据本发明实施例的抛光垫修整头的结构示意图;
图 2是根据本发明实施例的柔性环的立体结构示意图;
图 3是根据本发明实施例的柔性环的剖视示意图;
图 4是根据本发明实施例的自适应盘的立体结构示意图; 和
图 5是根据本发明实施例的自适应盘的剖视示意图。 具体实旄方式
下面详细描述本发明的实施例, 所述实施例的示例在附图中示出, 其中自始至终相 同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附 图描述的实施例是示例性的, 仅用于解释本发明, 而不能理解为对本发明的限制。 在本发明的描述中, 需要理解的是, 术语 "中心,, 、 "纵向,, 、 "横向,, 、 "上" 、 "下" 、 "前" 、 "后" 、 "左" 、 "右" 、 "竖直" 、 "水平,, 、 "顶" 、 "底" "内" 、 "外"等指示的方位或位置关系为基于附图所示的方位或位置关系, 仅是为了便于描述 本发明和筒化描述, 而不是指示或暗示所指的装置或元件必须具有特定的方位、 以特定 的方位构造和操作, 因此不能理解为对本发明的限制。 此外, 术语 "第一" 、 "第二" 仅用于描述目的, 而不能理解为指示或暗示相对重要性。
在本发明的描述中, 需要说明的是, 除非另有明确的规定和限定, 术语 "安装" 、 "相连,, 、 "连接,' 应做广义理解, 例如, 可以是固定连接, 也可以是可拆卸连接, 或 一体地连接; 可以是机械连接, 也可以是电连接; 可以是直接相连, 也可以通过中间媒 介间接相连, 可以是两个元件内部的连通。 对于本领域的普通技术人员而言, 可以具体 情况理解上述术语在本发明中的具体含义。
下面参考附图描述根据本发明实施例的抛光修整头。
如图 1至图 5所示, 根据本发明一个实施例的抛光垫修整头包括: 轴承座 6、 主轴 14、 保护盖 5、 压盘 3、 自适应盘 19、 金刚石盘 1和柔性环 18。
具体地, 主轴 14可以通过轴承 9可旋转地安装在轴承座 6内。 轴承座 6的上端可 以安装有轴承端盖 13 , 由此, 轴承端盖 13用于将釉承 9固定在轴承座 6内。 例如主轴 14可以通过两组轴承 9轴向定位, 避免主轴 14轴向串动, 在两组轴承 9之间可以设置 套筒 8 , 由此两组轴承 9可以通过轴承端盖 13和套筒 8固定在轴承座 6内。
如图 1所示, 主轴 14 内可以设有沿其轴向 (图 1 中的上下方向) 贯通的轴向通道 141 , 主轴 14的上端从轴 端盖 13延伸出, 主轴 14的下端从轴 座 6的下端延伸出, 轴 座 6的下端与主轴 14之间设有密封 20。 更具体而言, 主轴 14与轴 座 6下端的 供主轴 14的下端伸出的开口之间设有密封 20 , 由此可以避免在抛光过程中液体进入到 轴承座 6内。
主轴 14的上端安装有同步带轮 10 , 例如主轴 14的上端部通过螺钉与同步带轮 10 固定连接, 同步带轮 10可以通过皮带与驱动装置 (未示出, 例如驱动电机) 相连, 由 此可以驱动主轴 14旋转。
轴向通道 141的上端处安装有旋转接头 1 1 , 由此, 旋转接头 1 1可以与气源 (未示 出) 或抽真空装置 (未示出, 例如真空泵) 相连, 由此在主轴 14旋转期间可以对轴向 通道 141抽真空或向轴向通道 141 内供给气体。
主轴 14的下端安装有法兰 15, 法兰 15的下表面安装有压片 17 , 例如法兰 15通过 螺钉固定在主轴 14的下端面上, 而压片 17通过螺钉固定在法兰 15的下端面上。
保护盖 5围绕法兰 15设置, 如图 1所示, 保护盖 5的内腔设有台阶, 压盘 3与保 护盖 5相连。 更具体而言, 如图 1所示, 压盘 3通过销轴连接在保护盖 5的内腔中的台 阶的下端面上, 自适应盘 19的下端与压盘 3相连且自适应盘 19的上端可移动地配合在 轴向通道 141 内, 自适应盘 19内设有连通通道 191 (参见图 5 ) , 金刚石盘 1安装在压 盘 3的下表面上。 保护盖 5、 压盘 3、 自适应盘 19和金刚石盘 1四者可以通过螺钉连接 成一体, 从而将法兰 15和压片 17包覆固定。
柔性环 18的上沿 181夹在法兰 15与压片 17之间,柔性环 18的下沿 182夹在保护 盖 5与压盘 3之间, 其中柔性环 18、 法兰 15、 压盘 3、 和自适应盘 19共同形成密闭空 腔 M, 保护盖 5、 压盘 3、 自适应盘 19和金刚石盘 1通过柔性环 18能够随主轴 14旋 转且通过柔性环 18的伸缩变形能够相对于主轴 14上下移动, 密闭空腔 M通过连通通 道 191与轴向通道 141连通。
根据本发明实施例的抛光垫修整头具有结构简单紧凑美观, 易于加工制造及装配, 运动平稳可靠, 具有很高的实用性, 可广泛用于抛光设备中。
使用中, 通过旋转接头 11对密闭空腔 M抽真空时, 金刚石盘 1、 压盘 3、 保护盖 5和自适应盘 19将一起向上运动, 对密闭空腔 M加正压 (通过旋转接头 1 1 向密闭空 腔 M内充气) 时, 金刚石盘 1、 压盘 3、 保护盖 5和自适应盘 19将通过柔性环 8的变 形一起向下运动。 修整头的上下运动通过柔性环 18实现, 金刚石盘 1向下运动时, 柔 性环 18向下伸长, 且主轴 14通过柔性环 18将扭矩传递给金刚石盘 1 并与金刚石盘 1 共同旋转, 从而对抛光垫进行修整; 金刚石盘 1向下运动与抛光垫接触的过程中, 自适 应盘 19能产生弹性变形, 从而使金刚石盘 1具有自适应性, 能在修整抛光垫的过程中 与之完全面面贴合, 得到良好的修整效果。
当密闭空腔 M抽真空时, 金刚石盘 1、 压盘 3、 保护盖 5和自适应盘 19将一起向 上运动, 抽真空的真空度可以为 0-100kPa。 通过控制正压压力 (向密封空腔 M内充气 的压力), 金刚石盘 1与抛光垫的接触时修整头的下压力可线性变化, 可以根据需要调 整正压压力大小来获得不同的修整头下压力,从而满足不同的抛光垫以及同种抛光垫不 同的修整工艺要求, 下压力修整压力范围为 0-300牛顿。
如图 1所示, 根据本发明的一些实施例, 压盘 3与自适应盘 19之间可以设有第一 密封圏 2 , 保护盖 5与压盘 3之间可以设有第二密封圈 4 , 主轴 14与法兰 15之间可以 设有第三密封圈 7。 由此, 提高了密闭空腔 M 的密封性, 提升了抛光修整头的性能和 可靠性。
如图 1所示, 根据本发明的一个实施例, 轴承座 6的下端与主轴 14之间的密封 20 可以为气封。 具体地, 轴承座 6内可以设有第一气孔 61 , 轴承端盖 13 内可以设有与第 一气孔 61连通的第二气孔 131 , 第二气孔 131的上端处安装有快换接头 12, 第一气孔 61 的下端通向轴 7|座 6的内底面与主轴 14之间的空间以便轴 7|座 6的下端与主轴 14 之间的密封 20为气封。 需要说明的是, 气体通过快换接头 12进入轴承座 6腔内, 部分 气体从主轴 14与轴承座 6之间的间隙吹出, 形成气封, 从而避免在抛光过程中有液体 进入轴承座 6腔内。
可选地, 轴承座 6的下端与主轴 14之间的密封 20可以为迷宫式密封。 由此, 可以 避免在抛光过程中有液体进入轴承座 6腔内。
如图 1所示, 才 据本发明的一些示例, 轴向通道 141 包括上段 1411和下段 1412, 其中下段 1412径向尺寸大于上段 1411的径向尺寸。 需要说明的是,金刚石盘 1可以实 现上下伸缩运动, 轴向通道 141可以起到对自适应盘 19进行导向的作用, 从而对金刚 石盘 1进行导向。
具体地, 金刚石盘 1向上运动时, 自适应盘 19的顶端与下段 1412的顶端顶靠, 这 样就限定了 自适应盘 19向上运动的上限位点。 金刚石盘 1向下运动时, 保护盖 5的斜 边与法兰 15的轴肩斜边贴合, 限定了自适应盘 19向下运动的下限位点, 从而限定了金 刚石盘 1上下运动的行程。 例如金刚石盘 1上下运动的行程可以限定为 0-15mm。
根据本发明的一个示例,轴向通道 141可以具有圆形横截面,这样便于加工。然而, 轴向通道 1 14也可以具有矩形横截面。
如图 1-3所示, 根据本发明的一个实施例, 柔性环 18的上沿 181和下沿 182可以 为平板状且上沿 181和下沿 182通过弯曲过渡部 183相连。 由此, 可以使柔性环 18的 上沿 181夹在法兰 15与压片 17之间, 柔性环 18的下沿 182夹在保护盖 5与压盘 3之 间。
参见图 1、 图 4和图 5 , 根据本发明的一个实施例, 自适应盘 19 包括下盘体 192 和上轴部 193, 下盘体 192的下表面设有凹槽 194, 上轴部 193的下端与下盘体 192的 上表面相连, 且上轴部 193的下端配合在轴向通道 141 内, 连通通道 191形成在上轴部 193 内。 由此, 可以实现通过旋转接头 1 1、 轴向通道 141连通通道 191和密闭空腔 M 的连通。
进一步地,连通通道 191 包括彼此连通的竖向通道部分 1911和横向通道部分 1912, 竖向通道部分 1911从上轴部 193的上端向下延伸预定长度,横向通道部分 1912沿上轴 部 193的周向延伸以将竖向通道部分 1911与密闭空腔 M连通。 由此, 可以实现通过旋 转接头 1 1对密闭空腔 M抽真空或加压。
优选地, 凹槽 194的顶壁为薄片结构且具有 0.1mm-0.5mm的厚度。 例如为 0.3mm。 由此可以使自适应盘 19产生较适合的弹性变形, 从而使金刚石盘 1具有自适应性。
根据本发明实施例的抛光垫修整头, 结构简单, 金刚石盘 1具有自适应性, 提高了 抛光垫修整的精度和效率。
在本说明书的描述中, 参考术语 "一个实施例,, 、 "一些实施例" 、 "示例" 、 "具体示例" 、 或 "一些示例" 等的描述意指结合该实施例或示例描述的具体特征、 结 构、 材料或者特点包含于本发明的至少一个实施例或示例中。 在本说明书中, 对上述术 语的示意性表述不一定指的是相同的实施例或示例。 而且, 描述的具体特征、 结构、 材 料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。
尽管已经示出和描述了本发明的实施例, 本领域的普通技术人员可以理解: 在不脱 离本发明的原理和宗旨的情况下可以对这些实施例进行多种变化、 修改、 替换和变型, 本发明的范围由权利要求及其等同物限定。

Claims

权利要求书
1、 一种抛光垫修整头, 其特征在于, 包括:
轴承座 (6) , 所述轴承座(6) 的上端安装有轴承端盖 (13 ) ;
主轴( 14 ) , 所述主轴( 14 )通过轴承( 9 )可旋转地安装在所述轴承座 ( 6 ) 内, 所述主轴 (14) 内设有沿其轴向贯通的轴向通道(141 ) , 所述主轴 (14) 的上端从所 述轴承端盖 (13 )延伸出, 所述主轴 (14) 的下端从所述轴承座(6) 的下端延伸出且 所述轴承座 (6) 的下端与所述主轴 (14)之间设有密封(20) , 所述主轴 (14) 的上 端安装有同步带轮( 10) , 所述轴向通道( 141 ) 的上端处安装有旋转接头 (11 ) , 所 述主轴 (14) 的下端安装有法兰 ( 15) , 所述法兰 (15) 的下表面安装有压片 (17) ; 保护盖 (5) , 所述保护盖 (5) 围绕所述法兰 (15)设置;
压盘( 3 ) 、 所述压盘 ( 3 ) 与所述保护盖 ( 5 )相连;
自适应盘 ( 19) , 所述自适应盘 ( 19) 的下端与所述压盘 (3)相连且所述自适应 盘(19) 的上端可移动地配合在所述轴向通道( 141 ) 内, 所述自适应盘 (19) 内设有 连通通道( 191 ) ;
金刚石盘 ( 1 ) , 所述金刚石盘(1 )安装在所述压盘(3) 的下表面上; 和 柔性环 ( 18) , 所述柔性环 (18) 的上沿 (181 ) 夹在所述法兰 (15) 与所述压片 ( 17)之间, 所述柔性环 (18) 的下沿 (182) 夹在所述保护盖 (5) 与所述压盘 (3) 之间, 其中所述柔性环( 18 )、 所述法兰( 15 )、 所述压盘( 3 )、 和所述自适应盘( 19 ) 共同形成密闭空腔(M) , 所述保护盖 (5) 、 所述压盘(3) 、 所述自适应盘( 19)和 所述金刚石盘 ( 1 )通过所述柔性坏 (18) 能够随所述主轴 (14)旋转且通过所述柔性 环( 18) 的伸缩变形能够相对于所述主轴( 14)上下移动, 所述密闭空腔(M)通过所 述连通通道( 191 ) 与所述轴向通道( 141 ) 连通。
2、 根据权利要求 1所述的抛光垫修整头, 其特征在于, 所述压盘(3 )与自适应盘 ( 19)之间设有第一密封圏 (2) , 所述保护盖 (5) 与所述压盘(3)之间设有第二密 封圏 (4) , 所述主轴 (14) 与所述法兰 (15)之间设有第三密封圈 (7) 。
3、 根据权利要求 1所述的抛光垫修整头, 其特征在于, 所述轴承座(6)的下端与 所述主轴( 14)之间的密封(20) 为迷宫式密封。
4、 根据权利要求 1所述的抛光垫修整头, 其特征在于, 所述轴承座(6) 内设有第 一气孔(61 ) ,所述轴承端盖( 13 )内设有与所述第一气孔(61 )连通的第二气孔( 131 ) , 所述第二气孔(131 ) 的上端处安装有快换接头 (12) , 所述第一气孔(61 ) 的下端通 向所述轴承座( 6 )的内底面与所述主轴( 14 )之间的空间以便所述轴承座( 6 )的下端 与所述主轴 ( 14 )之间的密封 ( 20 ) 为气封。
5、 根据权利要求 1所述的抛光垫修整头, 其特征在于, 所述轴向通道( 141 )包括 上段( 1411 )和下段( 1412) , 其中所述下段( 1412 )径向尺寸大于所述上段( 1411 ) 的径向尺寸。
6、 根据权利要求 5所述的抛光垫修整头, 其特征在于, 所述轴向通道( 141 )具有 圓形横截面。
7、 根据权利要求 1所述的抛光垫修整头, 其特征在于, 所述柔性环 (18) 的上沿 ( 181 )和下沿 ( 182)为平板状且所述上沿 ( 181 )和所述下沿( 182)通过弯曲过渡部
( 183 )相连。
8、 根据权利要求 1所述的抛光垫修整头, 其特征在于, 所述自适应盘(19) 包括 下盘体(192)和上轴部(193) , 所述下盘体(192) 的下表面设有凹槽(194) , 所述 上轴部 ( 193 ) 的下端与所述下盘体 (192) 的上表面相连, 且所述上轴部 ( 193) 的下 端配合在所述轴向通道( 141 ) 内, 所述连通通道( 191 )形成在所述上轴部( 193 ) 内。
9、 #居权利要求 8所述的抛光垫修整头, 其特征在于, 所述连通通道( 191 )包括 彼此连通的竖向通道部分( 1911 )和横向通道部分( 1912) , 所述竖向通道部分( 1911 ) 从所述上轴部 (193 ) 的上端向下延伸预定长度, 所述横向通道部分(1912) 沿所述上 轴部 ( 193 ) 的周向延伸以将所述竖向通道部分( 1911 ) 与所述密闭空腔 (M) 连通。
10、 根据权利要求 8所述的抛光垫修整头, 其特征在于, 所述凹槽(194) 的顶壁 为薄片结构且具有 0.1mm-0.5mm的厚度。
PCT/CN2011/076500 2010-06-28 2011-06-28 抛光垫修整头 WO2012000426A1 (zh)

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Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102528628B (zh) * 2011-12-30 2014-01-15 中国科学院长春光学精密机械与物理研究所 一种角度自适应抛光磨头
CN102601713A (zh) * 2012-04-18 2012-07-25 安徽力成机械装备有限公司 数控立式双工位球笼弧沟道球孔磨床
JP6842859B2 (ja) * 2016-08-12 2021-03-17 株式会社荏原製作所 ドレッシング装置、研磨装置、ホルダー、ハウジング及びドレッシング方法
CN107457702B (zh) * 2017-09-11 2019-11-05 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) 抛光垫修整器及修整设备
CN109318121A (zh) * 2018-12-04 2019-02-12 杭州众硅电子科技有限公司 集成式晶圆抛光主轴
KR20200127328A (ko) 2019-05-02 2020-11-11 삼성전자주식회사 컨디셔너, 이를 포함하는 화학 기계적 연마 장치 및 이 장치를 이용한 반도체 장치의 제조 방법
CN110977772A (zh) * 2019-06-28 2020-04-10 天津华海清科机电科技有限公司 一种修整头
KR102512675B1 (ko) * 2020-12-30 2023-03-21 에스케이엔펄스 주식회사 연마 패드, 연마 패드의 제조 방법 및 이를 이용한 반도체 소자의 제조 방법
CN113561054A (zh) * 2021-07-28 2021-10-29 北京烁科精微电子装备有限公司 一种抛光垫修整装置及抛光设备
CN114193326A (zh) * 2021-12-22 2022-03-18 莱玛特·沃尔特斯(沈阳)精密机械有限公司 一种抛光机的抛光盘修整装置
CN114536220B (zh) * 2022-04-26 2022-07-15 华海清科股份有限公司 用于化学机械抛光的修整装置、方法及化学机械抛光系统
CN116460739B (zh) * 2023-03-22 2023-12-08 广东工科机电有限公司 一种磨头

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6217429B1 (en) * 1999-07-09 2001-04-17 Applied Materials, Inc. Polishing pad conditioner
TW431938B (en) * 1997-05-23 2001-05-01 Applied Materials Inc A carrier head with a substrate detection mechanism for a chemical mechanical polishing system
CN101367200A (zh) * 2007-08-14 2009-02-18 中芯国际集成电路制造(上海)有限公司 一种抛光垫修整头

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5738574A (en) * 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
US7097544B1 (en) * 1995-10-27 2006-08-29 Applied Materials Inc. Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
US6200199B1 (en) * 1998-03-31 2001-03-13 Applied Materials, Inc. Chemical mechanical polishing conditioner
US6033290A (en) * 1998-09-29 2000-03-07 Applied Materials, Inc. Chemical mechanical polishing conditioner
JP2001274122A (ja) * 2000-03-23 2001-10-05 Tokyo Seimitsu Co Ltd ウェハ研磨装置
US6406362B1 (en) * 2001-01-04 2002-06-18 Speedfam-Ipec Corporation Seal for use with a chemical mechanical planarization apparatus
JP2003145411A (ja) * 2001-11-19 2003-05-20 Tokyo Seimitsu Co Ltd 研磨装置及び研磨装置における研磨パッドのドレッシング方法
CA2614483A1 (en) * 2005-07-09 2007-01-18 Tbw Industries Inc. Enhanced end effector arm arrangement for cmp pad conditioning
US20080003931A1 (en) * 2005-11-22 2008-01-03 Manens Antoine P System and method for in-situ head rinse
CN101612718B (zh) * 2009-07-15 2011-08-10 沈荣辉 一种抛光磨头
KR101126382B1 (ko) * 2010-05-10 2012-03-28 주식회사 케이씨텍 화학 기계식 연마시스템의 컨디셔너

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW431938B (en) * 1997-05-23 2001-05-01 Applied Materials Inc A carrier head with a substrate detection mechanism for a chemical mechanical polishing system
US6217429B1 (en) * 1999-07-09 2001-04-17 Applied Materials, Inc. Polishing pad conditioner
CN101367200A (zh) * 2007-08-14 2009-02-18 中芯国际集成电路制造(上海)有限公司 一种抛光垫修整头

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