CN101972988A - 一种抛光垫修整头 - Google Patents
一种抛光垫修整头 Download PDFInfo
- Publication number
- CN101972988A CN101972988A CN2010102170136A CN201010217013A CN101972988A CN 101972988 A CN101972988 A CN 101972988A CN 2010102170136 A CN2010102170136 A CN 2010102170136A CN 201010217013 A CN201010217013 A CN 201010217013A CN 101972988 A CN101972988 A CN 101972988A
- Authority
- CN
- China
- Prior art keywords
- main shaft
- polishing pad
- flange
- diamond disk
- bearing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 38
- 238000009966 trimming Methods 0.000 title claims abstract description 6
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 40
- 239000010432 diamond Substances 0.000 claims abstract description 40
- 230000001360 synchronised effect Effects 0.000 claims abstract description 3
- 238000007789 sealing Methods 0.000 claims description 34
- 230000006978 adaptation Effects 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 11
- 210000004907 gland Anatomy 0.000 claims description 9
- 230000000694 effects Effects 0.000 claims description 8
- 239000011148 porous material Substances 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000007517 polishing process Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 abstract 2
- 230000003044 adaptive effect Effects 0.000 abstract 1
- 230000006835 compression Effects 0.000 abstract 1
- 238000007906 compression Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000000428 dust Substances 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
Description
Claims (8)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010102170136A CN101972988B (zh) | 2010-06-28 | 2010-06-28 | 一种抛光垫修整头 |
US13/384,631 US20120115403A1 (en) | 2010-06-28 | 2011-06-28 | Pad conditioner head for conditioning a polishing pad |
PCT/CN2011/076500 WO2012000426A1 (zh) | 2010-06-28 | 2011-06-28 | 抛光垫修整头 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010102170136A CN101972988B (zh) | 2010-06-28 | 2010-06-28 | 一种抛光垫修整头 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101972988A true CN101972988A (zh) | 2011-02-16 |
CN101972988B CN101972988B (zh) | 2012-05-16 |
Family
ID=43572912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010102170136A Active CN101972988B (zh) | 2010-06-28 | 2010-06-28 | 一种抛光垫修整头 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20120115403A1 (zh) |
CN (1) | CN101972988B (zh) |
WO (1) | WO2012000426A1 (zh) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102528628A (zh) * | 2011-12-30 | 2012-07-04 | 中国科学院长春光学精密机械与物理研究所 | 一种角度自适应抛光磨头 |
CN102601713A (zh) * | 2012-04-18 | 2012-07-25 | 安徽力成机械装备有限公司 | 数控立式双工位球笼弧沟道球孔磨床 |
CN107457702A (zh) * | 2017-09-11 | 2017-12-12 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 抛光垫修整器及修整设备 |
CN110091251A (zh) * | 2018-12-04 | 2019-08-06 | 杭州众硅电子科技有限公司 | 一种集成式晶圆抛光主轴 |
CN110977772A (zh) * | 2019-06-28 | 2020-04-10 | 天津华海清科机电科技有限公司 | 一种修整头 |
CN113561054A (zh) * | 2021-07-28 | 2021-10-29 | 北京烁科精微电子装备有限公司 | 一种抛光垫修整装置及抛光设备 |
CN114193326A (zh) * | 2021-12-22 | 2022-03-18 | 莱玛特·沃尔特斯(沈阳)精密机械有限公司 | 一种抛光机的抛光盘修整装置 |
CN114536220A (zh) * | 2022-04-26 | 2022-05-27 | 华海清科股份有限公司 | 用于化学机械抛光的修整装置、方法及化学机械抛光系统 |
CN114762953A (zh) * | 2020-12-30 | 2022-07-19 | Skc索密思株式会社 | 抛光垫、抛光垫的制备方法及半导体器件的制造方法 |
CN116460739A (zh) * | 2023-03-22 | 2023-07-21 | 广东工科机电有限公司 | 一种磨头 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6842859B2 (ja) * | 2016-08-12 | 2021-03-17 | 株式会社荏原製作所 | ドレッシング装置、研磨装置、ホルダー、ハウジング及びドレッシング方法 |
KR20200127328A (ko) | 2019-05-02 | 2020-11-11 | 삼성전자주식회사 | 컨디셔너, 이를 포함하는 화학 기계적 연마 장치 및 이 장치를 이용한 반도체 장치의 제조 방법 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010024939A1 (en) * | 2000-03-23 | 2001-09-27 | Takao Inaba | Wafer polishing apparatus |
JP2003145411A (ja) * | 2001-11-19 | 2003-05-20 | Tokyo Seimitsu Co Ltd | 研磨装置及び研磨装置における研磨パッドのドレッシング方法 |
CN101218067A (zh) * | 2005-07-09 | 2008-07-09 | Tbw工业有限公司 | 用于cmp垫修整的增强式末端执行臂装置 |
CN101367200A (zh) * | 2007-08-14 | 2009-02-18 | 中芯国际集成电路制造(上海)有限公司 | 一种抛光垫修整头 |
CN101612718A (zh) * | 2009-07-15 | 2009-12-30 | 沈荣辉 | 一种抛光磨头 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7097544B1 (en) * | 1995-10-27 | 2006-08-29 | Applied Materials Inc. | Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion |
US5738574A (en) * | 1995-10-27 | 1998-04-14 | Applied Materials, Inc. | Continuous processing system for chemical mechanical polishing |
US5957751A (en) * | 1997-05-23 | 1999-09-28 | Applied Materials, Inc. | Carrier head with a substrate detection mechanism for a chemical mechanical polishing system |
US6200199B1 (en) * | 1998-03-31 | 2001-03-13 | Applied Materials, Inc. | Chemical mechanical polishing conditioner |
US6033290A (en) * | 1998-09-29 | 2000-03-07 | Applied Materials, Inc. | Chemical mechanical polishing conditioner |
US6217429B1 (en) * | 1999-07-09 | 2001-04-17 | Applied Materials, Inc. | Polishing pad conditioner |
US6406362B1 (en) * | 2001-01-04 | 2002-06-18 | Speedfam-Ipec Corporation | Seal for use with a chemical mechanical planarization apparatus |
US20080003931A1 (en) * | 2005-11-22 | 2008-01-03 | Manens Antoine P | System and method for in-situ head rinse |
KR101126382B1 (ko) * | 2010-05-10 | 2012-03-28 | 주식회사 케이씨텍 | 화학 기계식 연마시스템의 컨디셔너 |
-
2010
- 2010-06-28 CN CN2010102170136A patent/CN101972988B/zh active Active
-
2011
- 2011-06-28 US US13/384,631 patent/US20120115403A1/en not_active Abandoned
- 2011-06-28 WO PCT/CN2011/076500 patent/WO2012000426A1/zh active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010024939A1 (en) * | 2000-03-23 | 2001-09-27 | Takao Inaba | Wafer polishing apparatus |
JP2003145411A (ja) * | 2001-11-19 | 2003-05-20 | Tokyo Seimitsu Co Ltd | 研磨装置及び研磨装置における研磨パッドのドレッシング方法 |
CN101218067A (zh) * | 2005-07-09 | 2008-07-09 | Tbw工业有限公司 | 用于cmp垫修整的增强式末端执行臂装置 |
CN101367200A (zh) * | 2007-08-14 | 2009-02-18 | 中芯国际集成电路制造(上海)有限公司 | 一种抛光垫修整头 |
CN101612718A (zh) * | 2009-07-15 | 2009-12-30 | 沈荣辉 | 一种抛光磨头 |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102528628A (zh) * | 2011-12-30 | 2012-07-04 | 中国科学院长春光学精密机械与物理研究所 | 一种角度自适应抛光磨头 |
CN102601713A (zh) * | 2012-04-18 | 2012-07-25 | 安徽力成机械装备有限公司 | 数控立式双工位球笼弧沟道球孔磨床 |
CN107457702A (zh) * | 2017-09-11 | 2017-12-12 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 抛光垫修整器及修整设备 |
CN107457702B (zh) * | 2017-09-11 | 2019-11-05 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 抛光垫修整器及修整设备 |
CN110091251A (zh) * | 2018-12-04 | 2019-08-06 | 杭州众硅电子科技有限公司 | 一种集成式晶圆抛光主轴 |
CN110977772A (zh) * | 2019-06-28 | 2020-04-10 | 天津华海清科机电科技有限公司 | 一种修整头 |
CN114762953A (zh) * | 2020-12-30 | 2022-07-19 | Skc索密思株式会社 | 抛光垫、抛光垫的制备方法及半导体器件的制造方法 |
CN114762953B (zh) * | 2020-12-30 | 2023-12-29 | Sk恩普士有限公司 | 抛光垫、抛光垫的制备方法及半导体器件的制造方法 |
CN113561054A (zh) * | 2021-07-28 | 2021-10-29 | 北京烁科精微电子装备有限公司 | 一种抛光垫修整装置及抛光设备 |
CN114193326A (zh) * | 2021-12-22 | 2022-03-18 | 莱玛特·沃尔特斯(沈阳)精密机械有限公司 | 一种抛光机的抛光盘修整装置 |
CN114536220B (zh) * | 2022-04-26 | 2022-07-15 | 华海清科股份有限公司 | 用于化学机械抛光的修整装置、方法及化学机械抛光系统 |
CN114536220A (zh) * | 2022-04-26 | 2022-05-27 | 华海清科股份有限公司 | 用于化学机械抛光的修整装置、方法及化学机械抛光系统 |
CN116460739A (zh) * | 2023-03-22 | 2023-07-21 | 广东工科机电有限公司 | 一种磨头 |
CN116460739B (zh) * | 2023-03-22 | 2023-12-08 | 广东工科机电有限公司 | 一种磨头 |
Also Published As
Publication number | Publication date |
---|---|
CN101972988B (zh) | 2012-05-16 |
US20120115403A1 (en) | 2012-05-10 |
WO2012000426A1 (zh) | 2012-01-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: TIANJIN HWATSING TECHNOLOGY COMPANY LIMITED Free format text: FORMER OWNER: TSINGHUA UNIVERSITY Effective date: 20150213 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100084 HAIDIAN, BEIJING TO: 300350 JINNAN, TIANJIN |
|
TR01 | Transfer of patent right |
Effective date of registration: 20150213 Address after: 300350, No. 8, building 9, ha Hing Road, Haihe science and Technology Park, Jinnan District, Tianjin Patentee after: TIANJIN HWATSING TECHNOLOGY COMPANY LIMITED (HWATSING CO., LTD.) Address before: 100084 Beijing 100084-82 mailbox Patentee before: Tsinghua University |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Trimming head for polishing pad Effective date of registration: 20180206 Granted publication date: 20120516 Pledgee: Tsinghua Holdings Co., Ltd. Pledgor: TIANJIN HWATSING TECHNOLOGY COMPANY LIMITED (HWATSING CO., LTD.) Registration number: 2018120000003 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20191022 Granted publication date: 20120516 Pledgee: Tsinghua Holdings Co., Ltd. Pledgor: TIANJIN HWATSING TECHNOLOGY COMPANY LIMITED (HWATSING CO., LTD.) Registration number: 2018120000003 |
|
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 300350, Tianjin City, Jinnan District Science and Technology Park, Hai Hing Road, No. 9, building No. 8 Patentee after: Huahaiqingke Co.,Ltd. Address before: 300350, Tianjin City, Jinnan District Science and Technology Park, Hai Hing Road, No. 9, building No. 8 Patentee before: TSINGHUA University |