WO2011115162A1 - Composition de résine polymérisable par un rayonnement énergétique actif et article ayant une structure finement rugueuse à la surface - Google Patents
Composition de résine polymérisable par un rayonnement énergétique actif et article ayant une structure finement rugueuse à la surface Download PDFInfo
- Publication number
- WO2011115162A1 WO2011115162A1 PCT/JP2011/056187 JP2011056187W WO2011115162A1 WO 2011115162 A1 WO2011115162 A1 WO 2011115162A1 JP 2011056187 W JP2011056187 W JP 2011056187W WO 2011115162 A1 WO2011115162 A1 WO 2011115162A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- monomer
- resin composition
- active energy
- energy ray
- curable resin
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 80
- 239000000178 monomer Substances 0.000 claims abstract description 130
- 125000000524 functional group Chemical group 0.000 claims abstract description 44
- 239000003999 initiator Substances 0.000 claims abstract description 22
- 125000005702 oxyalkylene group Chemical group 0.000 claims abstract description 17
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 72
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 10
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 claims description 8
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 claims description 7
- 239000002202 Polyethylene glycol Substances 0.000 claims description 7
- 229920001223 polyethylene glycol Polymers 0.000 claims description 7
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 7
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 claims description 7
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 claims description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 6
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 claims description 6
- 125000004386 diacrylate group Chemical group 0.000 claims description 6
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims description 6
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 claims description 5
- 239000005057 Hexamethylene diisocyanate Substances 0.000 claims description 5
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 5
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 claims description 5
- 239000007795 chemical reaction product Substances 0.000 claims description 5
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 claims description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 4
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 claims description 4
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims description 4
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical class C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 claims description 4
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 claims description 4
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 claims description 4
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical class OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 claims description 3
- 239000005058 Isophorone diisocyanate Substances 0.000 claims description 3
- KNSXNCFKSZZHEA-UHFFFAOYSA-N [3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical class C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C KNSXNCFKSZZHEA-UHFFFAOYSA-N 0.000 claims description 3
- 235000011187 glycerol Nutrition 0.000 claims description 3
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 claims description 3
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 claims description 3
- 239000001384 succinic acid Substances 0.000 claims description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 238000005299 abrasion Methods 0.000 abstract description 4
- 230000003578 releasing effect Effects 0.000 abstract 1
- 239000011148 porous material Substances 0.000 description 49
- 239000000047 product Substances 0.000 description 42
- 239000011347 resin Substances 0.000 description 25
- 229920005989 resin Polymers 0.000 description 25
- 239000000463 material Substances 0.000 description 24
- 229910052782 aluminium Inorganic materials 0.000 description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 23
- 150000003254 radicals Chemical class 0.000 description 23
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 21
- -1 methacryloyl group Chemical group 0.000 description 21
- 239000000758 substrate Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 11
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 10
- 230000007423 decrease Effects 0.000 description 10
- 238000006116 polymerization reaction Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 230000001771 impaired effect Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 230000001588 bifunctional effect Effects 0.000 description 8
- 239000008151 electrolyte solution Substances 0.000 description 8
- 239000003963 antioxidant agent Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 235000006408 oxalic acid Nutrition 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 230000009257 reactivity Effects 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 5
- 230000003078 antioxidant effect Effects 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 230000001678 irradiating effect Effects 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 4
- 238000002048 anodisation reaction Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 229920000570 polyether Polymers 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000008399 tap water Substances 0.000 description 4
- 235000020679 tap water Nutrition 0.000 description 4
- 238000007743 anodising Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 2
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 2
- 241000872198 Serjania polyphylla Species 0.000 description 2
- 206010040880 Skin irritation Diseases 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical class C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 238000007046 ethoxylation reaction Methods 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- 230000036556 skin irritation Effects 0.000 description 2
- 231100000475 skin irritation Toxicity 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- VQIPSVLHHAYQJH-UHFFFAOYSA-N 1-(7-acridin-1-ylheptyl)acridine Chemical compound C1=CC=C2C=C3C(CCCCCCCC=4C5=CC6=CC=CC=C6N=C5C=CC=4)=CC=CC3=NC2=C1 VQIPSVLHHAYQJH-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- BGJQNPIOBWKQAW-UHFFFAOYSA-N 1-tert-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)(C)C BGJQNPIOBWKQAW-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- UXCIJKOCUAQMKD-UHFFFAOYSA-N 2,4-dichlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC(Cl)=C3SC2=C1 UXCIJKOCUAQMKD-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- SITYOOWCYAYOKL-UHFFFAOYSA-N 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl]-5-(3-dodecoxy-2-hydroxypropoxy)phenol Chemical compound OC1=CC(OCC(O)COCCCCCCCCCCCC)=CC=C1C1=NC(C=2C(=CC(C)=CC=2)C)=NC(C=2C(=CC(C)=CC=2)C)=N1 SITYOOWCYAYOKL-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 1
- 125000004864 4-thiomethylphenyl group Chemical group 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 description 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 101000720524 Gordonia sp. (strain TY-5) Acetone monooxygenase (methyl acetate-forming) Proteins 0.000 description 1
- 239000004609 Impact Modifier Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- KQBTUOVABZLXGP-UHFFFAOYSA-N butane-1,4-diol;ethane-1,2-diol Chemical compound OCCO.OCCCCO KQBTUOVABZLXGP-UHFFFAOYSA-N 0.000 description 1
- DDPAAMHROJBRGE-UHFFFAOYSA-N butane-1,4-diol;propane-1,2-diol Chemical compound CC(O)CO.OCCCCO DDPAAMHROJBRGE-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- FAOSYNUKPVJLNZ-UHFFFAOYSA-N butylstannane Chemical compound CCCC[SnH3] FAOSYNUKPVJLNZ-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000004113 cell culture Methods 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- UTZKJCIQQWLQPV-UHFFFAOYSA-N ethane-1,2-diol;propane-1,2-diol Chemical compound OCCO.OCCO.CC(O)CO UTZKJCIQQWLQPV-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 210000003746 feather Anatomy 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- HPAFOABSQZMTHE-UHFFFAOYSA-N phenyl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)C1=CC=CC=C1 HPAFOABSQZMTHE-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/062—Polyethers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
Definitions
- the present invention relates to an active energy ray-curable resin composition and an article (an antireflection article or the like) having a fine concavo-convex structure formed using the same on the surface.
- An active energy ray-curable resin composition is filled between a stamper having a reverse structure of a fine concavo-convex structure on the surface and a transparent substrate, cured by irradiation with active energy rays, and then the stamper is released And then transferring the fine concavo-convex structure to the cured product, or after filling the active energy ray-curable resin composition between the stamper and the transparent substrate, the stamper is released to be active energy ray curable.
- a photocurable resin composition containing an acrylate oligomer such as urethane acrylate, an acrylic resin having a radical polymerizable functional group, a release agent, and a photopolymerization initiator (Patent Document 1).
- a photocurable resin comprising (meth) acrylate such as ethoxylated bisphenol A di (meth) acrylate, a reactive diluent such as N-vinylpyrrolidone, a photopolymerization initiator, and a fluorosurfactant.
- Composition (patent document 2).
- the photocurable resin composition (1) has the following problems. -Since the main component is an oligomer and a resin, the viscosity is high, the photocurable resin composition cannot sufficiently flow into the fine uneven structure of the stamper, and the transferability of the fine uneven structure is poor. ⁇ Since the elastic modulus of the cured product is low, it is easily damaged by rubbing. ⁇ Since the hydrophilicity of the cured product is insufficient, even if you try to wipe off dirt such as fingerprints adhering to the cured product (micro uneven structure), the dirt does not float up with water and it is difficult to wipe off fingerprints etc. .
- the photocurable resin composition (2) has the following problems. ⁇ Since the hydrophilicity of the cured product is insufficient, even if you try to wipe off dirt such as fingerprints adhering to the cured product (micro uneven structure), the dirt does not float up with water and it is difficult to wipe off fingerprints etc. .
- the ultraviolet curable resin composition of (3) has a sufficiently high hydrophobicity of the cured product, so that dirt such as fingerprints hardly adheres.
- the ultraviolet curable resin composition of (3) includes the following: There's a problem. -Although the viscosity is low because the polymerizable component has a relatively low molecular weight as a main component, the cured product becomes hard and brittle because the polymerizable component has a low molecular weight, making it difficult to release the stamper. -Moreover, since the cured product is hard and brittle, it is easily damaged by rubbing.
- Patent Document 4 The resin compositions described in Patent Documents 1 to 3 do not sufficiently satisfy the scratch resistance, antifouling property and productivity. As a solution to these problems, the resin composition described in Patent Document 4 can be mentioned.
- the resin composition described in Patent Document 4 is an invention that enables removal of fingerprint-fouling stains while retaining scratch resistance, but higher scratch resistance has been desired.
- paragraph [0039] of Patent Document 4 describes that a polyfunctional (meth) acrylate having a functionality of 4 or more is “when the amount exceeds 50 parts by mass, a small crack is formed on the resin surface, resulting in poor appearance”.
- the present invention provides an active energy ray-curable resin composition capable of forming a cured product having a relatively low viscosity, good releasability from a stamper, high scratch resistance, and good fingerprint wiping property; and Provided is an article having a fine concavo-convex structure on the surface having high scratch resistance and good fingerprint wiping property.
- the active energy ray-curable resin composition of the present invention includes the following polymerizable component (X) and a photopolymerization initiator (D).
- (Polymerizable component (X)) 50 to 80% by mass of a monomer (A) having 3 or more radical polymerizable functional groups in the molecule and having a molecular weight of 110 to 200 per functional group; 10 to 50% by mass of a monomer (B) having two radical polymerizable functional groups in the molecule and having 11 or more oxyalkylene groups in the molecule;
- a polymerizable component (X) comprising 0 to 20% by mass of a monomer (C) having one radical polymerizable functional group in the molecule.
- the article having the fine concavo-convex structure on the surface of the present invention is an article having the fine concavo-convex structure on the surface, and the fine concavo-convex structure reverses the fine concavo-convex structure of the active energy ray-curable resin composition of the present invention. It is formed by contacting and curing with a stamper having a structure on its surface.
- the article having the fine concavo-convex structure of the present invention on the surface is preferably an antireflection article.
- An active energy ray-curable resin composition comprising the following polymerizable component (X) and a photopolymerization initiator (D).
- the active energy ray-curable resin composition according to (1) wherein the monomer (A) has 3 to 15 radical polymerizable functional groups in the molecule.
- the monomer (A) is a monomer having a structure derived from at least one compound selected from the group consisting of trimethylolpropane, trimethylolethane, pentaerythritol, glycerin, hexamethylene diisocyanate, and isophorone diisocyanate.
- the monomer (A) is trimethylolpropane triacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated pentaerythritol tetraacrylate, tetrafunctional urethane hard acrylate, hexafunctional urethane hard acrylate, trimethylolethane / acrylic.
- the active energy ray-curable resin composition according to any one of the above.
- the monomer (C) is at least one selected from the group consisting of acryloylmorpholine, hydroxyethyl acrylate, N, N-dimethylacrylamide, N-vinylpyrrolidone, N-vinylformamide, methyl acrylate, and ethyl acrylate.
- the active energy ray-curable resin composition according to any one of (1) to (6), which is a monomer.
- An article having a fine concavo-convex structure on its surface (11)
- the fine concavo-convex structure contacts the active energy ray-curable resin composition according to any one of (1) to (10) with a stamper having an inverted structure of the fine concavo-convex structure on the surface;
- a cured product having a relatively low viscosity, good releasability from a stamper, high scratch resistance, and good fingerprint wiping property can be formed.
- the article having the fine concavo-convex structure of the present invention on the surface has high scratch resistance of the fine concavo-convex structure and good fingerprint wiping property.
- the radical polymerizable functional group means a (meth) acryloyl group, a vinyl group, or the like.
- the (meth) acryloyl group means an acryloyl group and / or a methacryloyl group.
- (Meth) acrylate means acrylate and / or methacrylate.
- an active energy ray means visible light, an ultraviolet-ray, an electron beam, plasma, a heat ray (infrared rays etc.), etc.
- the active energy ray-curable resin composition is a resin composition that is cured by irradiating an active energy ray so that a polymerization reaction proceeds.
- the active energy ray-curable resin composition of the present invention comprises a polymerizable component (X) and a photopolymerization initiator (D) as essential components, and if necessary, an ultraviolet absorber and / or an antioxidant (E ) And other components.
- the viscosity of the active energy ray-curable resin composition is preferably not too high from the viewpoint of easy flow into the fine uneven structure on the surface of the stamper. Therefore, the viscosity of the active energy ray-curable resin composition on a rotary B-type viscometer at 25 ° C. is preferably 10000 mPa ⁇ s or less, more preferably 5000 mPa ⁇ s or less, and further preferably 2000 mPa ⁇ s or less. However, even if the viscosity of the active energy ray-curable resin composition exceeds 10,000 mPa ⁇ s, there is no particular problem as long as the viscosity can be lowered by preheating when contacting the stamper.
- the viscosity of the active energy ray-curable resin composition in a rotary B-type viscometer at 70 ° C. is preferably 5000 mPa ⁇ s or less, and more preferably 2000 mPa ⁇ s or less. If the viscosity is too low, it may spread out and interfere with production. It is preferable if it is 10 mPa ⁇ s or more.
- the range of the viscosity with a rotary B-type viscometer at 25 ° C. is preferably 10 to 10,000 mPa ⁇ s, more preferably 10 to 5000 mPa ⁇ s, and even more preferably 10 to 2000 mPa ⁇ s.
- the viscosity range at 70 ° C. with a rotary B-type viscometer is preferably 10 to 5000 mPa ⁇ s, more preferably 10 to 2000 mPa ⁇ s.
- the polymerizable component (X) contains a specific monomer (A) and a specific monomer (B) as essential components, and if necessary, the monomer (C), other polymerizable components (monomer (A), monomer (B ) And monomer (C).
- the monomer (A) is a compound having 3 or more radical polymerizable functional groups in the molecule and a molecular weight of 110 to 200 per functional group.
- the molecular weight per functional group is a value obtained by dividing the molecular weight of the monomer (A) by the number of radical polymerizable functional groups in one molecule.
- the monomer (A) preferably has 3 or more and 15 or less radical polymerizable functional groups in the molecule, and more preferably 3 or more and 10 or less.
- trimethylolpropane triacrylate which is a typical trifunctional monomer
- the molecular weight is 296 and the number of radical polymerizable functional groups is 3, so the molecular weight per functional group is 98.67. It becomes. Therefore, trimethylolpropane triacrylate does not correspond to the monomer (A).
- a tetrafunctional monomer having a molecular weight exceeding 800 or a hexafunctional monomer having a molecular weight exceeding 1200 does not correspond to the monomer (A) because the molecular weight per functional group exceeds 200.
- the molecular weight per functional group of the monomer (A) is preferably 120 to 180, and more preferably 130 to 150.
- Examples of the monomer (A) include urethane (meth) acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, and polyether (meth) acrylate having a molecular weight of 110 to 200 per functional group.
- Examples of the trifunctional polyether (meth) acrylate include alkoxylated trimethylolpropane tri (meth) acrylate, alkoxylated pentaerythritol tri (meth) acrylate, and alkoxylated isocyanuric acid tri (meth) acrylate.
- Examples of the tetrafunctional polyether (meth) acrylate include alkoxylated pentaerythritol tetra (meth) acrylate and alkoxylated ditrimethylolpropane (meth) acrylate.
- Examples of the pentafunctional or higher functional polyether (meth) acrylate include alkoxylated dipentaerythritol hexa (meth) acrylate.
- alkoxylation, ethoxylation, propoxylation, ethoxy propoxylation, butoxylation, etc. are mentioned.
- Examples of the urethane (meth) acrylate include a reaction product of a polyol, an isocyanate compound, and a (meth) acrylate having a hydroxyl group, and commercially available products include NK Oligo U-4HA and NK Oligo U-6HA (Shin Nakamura). Chemical Industry Co., Ltd.).
- Examples of the polyester (meth) acrylate include a reaction product of trimethylolethane, succinic acid, and (meth) acrylic acid.
- ethoxylated trimethylolpropane tri (meth) acrylate ethoxylated pentaerythritol tri (meth) acrylate, ethoxylated ditrimethylolpropane (meth) acrylate, ethoxylated dipentaerythritol
- hexa (meth) acrylate commercially available urethane (meth) acrylate (NK oligo U-4HA, NK oligo U-6HA), and the like.
- the monomer (A) preferably has a structure derived from at least one selected from the group consisting of trimethylolpropane, trimethylolethane, pentaerythritol, glycerin, hexamethylene diisocyanate, and isophorone diisocyanate.
- a monomer (A) may be used individually by 1 type, and may use 2 or more types together.
- the proportion of the monomer (A) is from 50 to 80% by mass, preferably from 55 to 80% by mass, more preferably from 60 to 80% by mass, based on 100% by mass of the polymerizable component (X), and from 60 to 75% by mass. Is more preferable, and 60 to 70% by mass is particularly preferable.
- the proportion of the monomer (A) is less than 50% by mass, the elastic modulus and hardness of the cured product are lowered, and the scratch resistance may be impaired.
- the proportion of the monomer (A) exceeds 80% by mass, the cured product has a high elastic modulus, so that the cured product is cracked when the stamper is released from the cured product, and the hardened and brittle product is also scratch resistant. May impair sex.
- the resin becomes brittle, it was not possible to use more than 50 parts by mass of a tetrafunctional or higher monomer.
- a compound having a molecular weight of 110 to 200 per functional group is used. Even when 50 parts by mass or more of a tetrafunctional or higher monomer is used, the resin does not become brittle, and the scratch resistance can be effectively enhanced.
- the monomer (B) has two radical polymerizable functional groups in the molecule, and has 11 or more oxyalkylene groups (oxyethylene group: — (CH 2 CH 2 O) — etc.) in the molecule. It is a compound that has. That is, the monomer (B) is a compound having a polyoxyalkylene structure (polyoxyethylene structure: — (CH 2 CH 2 O) n — etc.). When the monomer (B) is a mixture of two or more kinds of compounds having different numbers of oxyalkylene groups, the number of oxyalkylene groups is an average value.
- alkoxylation is performed by adding alkylene oxide (ethylene oxide, propylene oxide, etc.) to the raw material polyol, and the molecular weight is increased. It is well known to do. As the chain length of the polyoxyalkylene structure increases, the skin irritation decreases and the glass transition temperature of the cured product also decreases, giving a flexible cured product. In addition, it is well known that in a monomer having two or more functional groups, when one radical polymerizable functional group reacts, the reactivity of the remaining radical polymerizable functional group decreases. Polymerization reactivity is also improved by separating radically polymerizable functional groups in the molecule.
- alkylene oxide ethylene oxide, propylene oxide, etc.
- the polyoxyalkylene structure may be composed of a single oxyalkylene group or may be composed of two or more types of oxyalkylene groups. Further, other groups such as bisphenol A may be present in the middle of the polyoxyalkylene structure.
- the polyoxyalkylene structure is preferably a polyoxyethylene structure from the viewpoint of wiping off the fingerprint of the cured product.
- the number of oxyalkylene groups in the polyoxyalkylene structure is preferably 11 to 30, and more preferably 11 to 25.
- polyalkylene glycol di (meth) acrylate As the monomer (B), polyalkylene glycol di (meth) acrylate, alkoxylated bisphenol A di (meth) acrylate having 11 or more oxyalkylene groups in the molecule, and alkoxylated 2-methyl-1,3- Examples include propanediol di (meth) acrylate.
- polyalkylene glycol di (meth) acrylate examples include polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, polytetramethylene glycol di (meth) acrylate, poly (ethylene glycol-tetramethylene glycol) di ( And (meth) acrylate, poly (propylene glycol-tetramethylene glycol) di (meth) acrylate, poly (ethylene glycol-propylene glycol-ethylene glycol) di (meth) acrylate, and the like.
- alkoxylated bisphenol A di (meth) acrylate examples include ethoxylated bisphenol A di (meth) acrylate, propoxylated bisphenol A di (meth) acrylate, and propoxylated ethoxylated bisphenol A di (meth) acrylate.
- alkoxylated 2-methyl-1,3-propanediol di (meth) acrylate examples include ethoxylated 2-methyl-1,3-propanediol di (meth) acrylate.
- a monomer (B) may be used individually by 1 type, and may use 2 or more types together.
- the proportion of the monomer (B) is from 10 to 50% by mass, preferably from 15 to 45% by mass, more preferably from 15 to 40% by mass, and from 20 to 40% by mass, based on 100% by mass of the polymerizable component (X). Is more preferable.
- the proportion of monomer (B) is less than 10% by mass, the elastic modulus of the cured product becomes high, so that when the stamper is released from the cured product, the cured product is cracked and hard and brittle. May be damaged.
- the proportion of the monomer (B) exceeds 50% by mass, the elastic modulus of the cured product is lowered and the scratch resistance may be impaired.
- the viscosity of the active energy ray-curable resin composition tends to increase.
- the monomer (C) is a compound having one radical polymerizable functional group in the molecule and copolymerizable with the monomer (A) or the monomer (B), and is added as necessary.
- a hydrophilic monomer is preferable from the viewpoint of fingerprint wiping property of the cured product.
- the hydrophilic monomer is a monomer that can be dissolved in 1 g or more in 100 g of water at 25 ° C.
- the active energy ray-curable resin composition it is the polyfunctional monomer that is the main skeleton that greatly affects the physical properties.
- many multifunctional monomers have a high viscosity, and in order to improve the handling property, they are diluted with a monomer (C) having a low viscosity.
- a monomer having two or more functional groups when one radical polymerizable functional group reacts, the reactivity of the remaining radical polymerizable functional group decreases, so that the polymerization reaction in the entire active energy ray-curable resin composition In order to improve the property, the monomer (C) is added.
- the active energy ray-curable resin composition is rarely cured alone, and is usually used by curing the active energy ray-curable resin composition on a substrate described later and integrating it with the substrate. .
- a monomer (C) having a small molecular weight is added, and an optimum monomer for imparting adhesion is selected according to the material of the substrate.
- Examples of the monomer (C) include alkyl (meth) acrylate (methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl (meth) acrylate, t-butyl (meth) acrylate) , 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, etc.), benzyl (meth) acrylate, (meth) acrylate having alicyclic structure (isobornyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, adamantyl ( (Meth) acrylate, and dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth) acrylate, etc.), (meth) acrylate having an amino group (dimethylaminoethyl (meth) acrylate, and dimethyl
- the monomer (C) a monomer that is not so bulky is preferable from the viewpoint of polymerization reactivity, and a monomer that is not highly hydrophobic is preferable from the viewpoint of antifouling property.
- the molecular weight is preferably 150 or less.
- the molecular weight of the monomer (C) is preferably from 70 to 150, more preferably from 70 to 115.
- acryloylmorpholine, hydroxyethyl acrylate, N, N-dimethylacrylamide, N-vinylpyrrolidone, N-vinylformamide, methyl acrylate, ethyl acrylate, and the like are preferable.
- the material of the base material is an acrylic resin, methyl acrylate and ethyl acrylate are particularly preferable.
- a monomer (C) may be used individually by 1 type, and may use 2 or more types together.
- the proportion of the monomer (C) is 0 to 20% by mass, preferably 0 to 15% by mass, more preferably 0 to 10% by mass, based on 100% by mass of the polymerizable component (X). Is more preferable, and 3 to 10% by mass is particularly preferable.
- proportion of the monomer (C) exceeds 20% by mass, curing of the active energy ray-curable resin composition may not be completed, and an article having a fine concavo-convex structure on the surface may be incomplete.
- unreacted monomer (C) remains in the cured product and acts as a plasticizer, which may reduce the elastic modulus of the cured product and impair scratch resistance.
- the polymerizable component (X) may contain other polymerizable components other than the monomer (A), the monomer (B) and the monomer (C) as long as the effects of the present invention are not impaired.
- the other polymerizable component include a bifunctional or higher monomer other than the monomer (A) and the monomer (B), and an oligomer or polymer having a radical polymerizable functional group.
- the proportion of the other polymerizable component is preferably 30% by mass or less, more preferably 20% by mass or less, and particularly preferably 10% by mass or less, in 100% by mass of the polymerizable component (X). That is, the total of the monomer (A), the monomer (B) and the monomer (C) is preferably 70% by mass or more out of 100% by mass of the polymerizable component (X).
- the photopolymerization initiator (D) is a compound that generates a radical that is cleaved by irradiating active energy rays to initiate a polymerization reaction.
- active energy ray ultraviolet rays are preferable from the viewpoint of apparatus cost and productivity.
- Examples of the photopolymerization initiator (D) that generates radicals by ultraviolet rays include benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylbenzophenone, methyl orthobenzoylbenzoate, 4-phenylbenzophenone, t-butylanthraquinone, 2-ethylanthraquinone, thioxanthones (such as 2,4-diethylthioxanthone, isopropylthioxanthone, and 2,4-dichlorothioxanthone), acetophenones (diethoxyacetophenone, 2-hydroxy-2 -Methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 1-hydroxycyclohexyl-phenylketone, 2-methyl-2-morpholino (4-thiomethylphenyl) propane- -One, and 2-benzyl
- a photoinitiator may be used individually by 1 type and may use 2 or more types together. When using together, it is preferable to use together 2 or more types from which absorption wavelength differs. Moreover, you may use together thermal polymerization initiators, such as persulfate (potassium persulfate, ammonium persulfate, etc.), peroxides (benzoyl peroxide etc.), and an azo initiator, as needed.
- thermal polymerization initiators such as persulfate (potassium persulfate, ammonium persulfate, etc.), peroxides (benzoyl peroxide etc.), and an azo initiator, as needed.
- the proportion of the photopolymerization initiator (D) is preferably 0.01 to 10 parts by weight, more preferably 0.1 to 5 parts by weight, and more preferably 0.2 to 3 parts by weight with respect to 100 parts by weight of the polymerizable component (X). Part by mass is more preferable. If the ratio of a photoinitiator (D) is less than 0.01 mass part, hardening of an active energy ray-curable resin composition may not be completed, and the mechanical physical property of the article
- the ratio of the photopolymerization initiator (D) exceeds 10 parts by mass, the unreacted photopolymerization initiator (D) remains in the cured product, and acts as a plasticizer, reducing the elastic modulus of the cured product, In some cases, scratch resistance may be impaired. Moreover, it may cause coloring.
- the active energy ray-curable resin composition of the present invention may further contain an ultraviolet absorber and / or an antioxidant (E).
- the ultraviolet absorber include benzophenone series, benzotriazole series, hindered amine series, benzoate series, and triazine series.
- examples of commercially available products include UV absorbers such as “Tinuvin 400” and “Tinuvin 479” manufactured by Ciba Specialty Chemicals, and “Viosorb110” manufactured by Kyodo Pharmaceutical.
- the antioxidant include hindered phenol-based, benzimidazole-based, phosphorus-based, sulfur-based, and hindered amine-based antioxidants.
- Examples of commercially available products include “IRGANOX” series manufactured by Ciba Specialty Chemicals. These ultraviolet absorbers and antioxidants may be used alone or in combination of two or more.
- the proportion of the ultraviolet absorber and / or antioxidant (E) is preferably 0.01 to 5 parts by mass in total with respect to 100 parts by mass of the polymerizable component (X).
- the active energy ray-curable resin composition of the present invention includes a surfactant, a release agent, a lubricant, a plasticizer, an antistatic agent, a light stabilizer, a flame retardant, a flame retardant aid, and a polymerization inhibitor, as necessary.
- known additives such as fillers, silane coupling agents, colorants, reinforcing agents, inorganic fillers, and impact modifiers may be included.
- the active energy ray-curable resin composition of the present invention may contain an oligomer or polymer that does not have a radical polymerizable functional group, and a trace amount of an organic solvent, if necessary.
- the specific monomer (A) and the specific monomer (B) are included at a specific ratio, the viscosity is relatively low. Regardless, a cured product having an appropriate hardness is formed. As a result, a cured product having good release properties from the stamper can be formed, and the scratch resistance is high. Moreover, since the specific monomer (B) is contained in a specific ratio, a cured product having good fingerprint wiping properties can be formed.
- the article having the fine concavo-convex structure of the present invention on the surface is formed by contacting the active energy ray-curable resin composition of the present invention with a stamper having a reverse structure of the fine concavo-convex structure on the surface, and curing the fine concavo-convex structure.
- FIG. 1 is a cross-sectional view showing an example of an article having a fine relief structure on the surface.
- the article 40 includes a base material 42 and a cured resin layer 44 formed on the surface of the base material 42.
- the base material 42 is preferably a molded body that transmits light.
- the base material include acrylic resin (polymethyl methacrylate, etc.), polycarbonate, styrene (co) polymer, methyl methacrylate-styrene copolymer, cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, polyester ( Polyethylene terephthalate, etc.), polyamide, polyimide, polyether sulfone, polysulfone, polyolefin (polyethylene, polypropylene, etc.), polymethylpentene, polyvinyl chloride, polyvinyl acetal, polyether ketone, polyurethane, and glass.
- the base material 42 may be an injection molded body, an extrusion molded body, or a cast molded body.
- the shape of the substrate 42 may be a sheet shape or a film shape.
- the surface of the base material 42 may be subjected to a coating treatment or a corona treatment in order to improve adhesion, antistatic properties, scratch resistance, weather resistance, and the like.
- the cured resin layer 44 is a film made of a cured product of the active energy ray-curable resin composition of the present invention, and has a fine uneven structure on the surface.
- the fine concavo-convex structure on the surface of the article 40 in the case of using an anodic alumina stamper described later is formed by transferring the fine concavo-convex structure on the surface of the anodized alumina, and is an active energy ray-curable resin composition. It has two or more convex portions 46 made of a cured product.
- the fine concavo-convex structure is preferably a so-called moth-eye structure in which two or more protrusions (convex portions) having a substantially conical shape or a pyramid shape are arranged. It is known that the moth-eye structure in which the distance between the protrusions is less than or equal to the wavelength of visible light is an effective anti-reflection measure by continuously increasing the refractive index from the refractive index of air to the refractive index of the material. It has been.
- the average interval between the convex portions is preferably not more than the wavelength of visible light, that is, not more than 400 nm. When the average interval exceeds 400 nm, visible light scattering occurs, which is not suitable for optical applications such as antireflection articles.
- the convex portions are formed by using an anodic alumina stamper described later, the average distance between the convex portions is about 100 nm, and is more preferably 200 nm or less, and particularly preferably 150 nm or less.
- the average interval between the convex portions is preferably 20 nm or more from the viewpoint of easy formation of the convex portions.
- the range of the average interval between the convex portions is preferably 20 to 400 nm, more preferably 20 to 200 nm, and further preferably 20 to 150 nm.
- the average interval between the convex portions is obtained by measuring 50 intervals between adjacent convex portions (distance from the center of the convex portion to the center of the adjacent convex portion) by electron microscope observation, and averaging these values. .
- the height of the protrusions is preferably 80 to 500 nm, more preferably 120 to 400 nm, and particularly preferably 150 to 300 nm when the average interval is 100 nm. If the height of the convex portion is 80 nm or more, the reflectance is sufficiently low and the wavelength dependency of the reflectance is small. If the height of a convex part is 500 nm or less, the scratch resistance of a convex part will become favorable.
- the height of the convex portion is a value obtained by measuring the distance between the topmost portion of the convex portion and the bottommost portion of the concave portion existing between the convex portions when observed with an electron microscope at a magnification of 30000 times.
- the aspect ratio of the protrusions (the height of the protrusions / the average interval between the protrusions) is preferably 0.8 to 5, more preferably 1.2 to 4, and particularly preferably 1.5 to 3. If the aspect ratio of the convex portion is 1.0 or more, the reflectance is sufficiently low. When the aspect ratio of the convex portion is 5 or less, the scratch resistance of the convex portion is good.
- the shape of the convex part is a shape in which the convex sectional area in the direction perpendicular to the height direction continuously increases in the depth direction from the outermost surface, that is, the sectional shape in the height direction of the convex part is a triangle, trapezoid, A shape such as a bell shape is preferred.
- the difference between the refractive index of the cured resin layer 44 and the refractive index of the substrate 42 is preferably 0.2 or less, more preferably 0.1 or less, and particularly preferably 0.05 or less.
- the refractive index difference is 0.2 or less, reflection at the interface between the cured resin layer 44 and the base material 42 is suppressed.
- stamper has an inverted structure of a fine concavo-convex structure on the surface.
- material of the stamper include metals (including those having an oxide film formed on the surface), quartz, glass, resin, and ceramics.
- shape of the stamper include a roll shape, a circular tube shape, a flat plate shape, and a sheet shape.
- Examples of the method for producing the stamper include the following method (I-1) and method (I-2).
- the method (I-) can be used because the area can be increased and the production is simple. 1) is particularly preferred.
- (I-1) A method of forming anodized alumina having two or more pores (recesses) on the surface of an aluminum substrate.
- (I-2) A method of forming an inverted structure of a fine concavo-convex structure on the surface of a stamper substrate by an electron beam lithography method or a laser beam interference method.
- a method having the following steps (a) to (f) is preferable.
- B A step of removing the oxide film and forming anodic oxidation pore generation points on the surface of the aluminum substrate.
- C After the step (b), the step of anodizing the aluminum substrate again in the electrolytic solution to form an oxide film having pores at the pore generation points.
- D A step of expanding the diameter of the pores after the step (c).
- E A step of anodizing again in the electrolytic solution after the step (d).
- F A step of repeating steps (d) and (e) to obtain a stamper in which anodized alumina having two or more pores is formed on the surface of an aluminum substrate.
- the shape of the aluminum substrate include a roll shape, a circular tube shape, a flat plate shape, and a sheet shape. Since the oil used when processing the aluminum base material into a predetermined shape may be adhered, it is preferable to degrease the aluminum base material in advance.
- the aluminum substrate is preferably subjected to electrolytic polishing (etching) in order to smooth the surface state.
- the purity of aluminum is preferably 99% or more, more preferably 99.5% or more, and particularly preferably 99.8% or more.
- the purity of aluminum is low, when anodized, an uneven structure having a size to scatter visible light may be formed due to segregation of impurities, or the regularity of pores obtained by anodization may be lowered.
- the electrolytic solution include sulfuric acid, oxalic acid, and phosphoric acid.
- the concentration of oxalic acid is preferably 0.7 M or less. When the concentration of oxalic acid exceeds 0.7M, the current value becomes too high, and the surface of the oxide film may become rough. When the formation voltage is 30 to 60 V, anodized alumina having highly regular pores with a period of 100 nm can be obtained. Regardless of whether the formation voltage is higher or lower than this range, the regularity tends to decrease.
- the temperature of the electrolytic solution is preferably 60 ° C. or lower, and more preferably 45 ° C. or lower. When the temperature of the electrolytic solution exceeds 60 ° C., a so-called “burn” phenomenon occurs, and the pores may be broken, or the surface may melt and the regularity of the pores may be disturbed.
- the concentration of sulfuric acid is preferably 0.7M or less. If the concentration of sulfuric acid exceeds 0.7M, the current value may become too high to maintain a constant voltage. When the formation voltage is 25 to 30 V, anodized alumina having highly regular pores with a period of 63 nm can be obtained. The regularity tends to decrease whether the formation voltage is higher or lower than this range.
- the temperature of the electrolytic solution is preferably 30 ° C. or lower, and more preferably 20 ° C. or lower. When the temperature of the electrolytic solution exceeds 30 ° C., a so-called “burn” phenomenon occurs, and the pores may be broken or the surface may melt and the regularity of the pores may be disturbed.
- Examples of the method for removing the oxide film include a method in which aluminum is not dissolved but dissolved in a solution that selectively dissolves the oxide film and removed.
- Examples of such a solution include a chromic acid / phosphoric acid mixed solution.
- the pore diameter expansion treatment is a treatment for expanding the diameter of the pores obtained by anodic oxidation by immersing in a solution dissolving the oxide film. Examples of such a solution include a phosphoric acid aqueous solution of about 5% by mass. The longer the pore diameter expansion processing time, the larger the pore diameter.
- the total number of repetitions is preferably 3 times or more, and more preferably 5 times or more.
- the diameter of the pores decreases discontinuously, so that the effect of reducing the reflectance of the moth-eye structure formed using anodized alumina having such pores is insufficient.
- Examples of the shape of the pore 12 include a substantially conical shape, a pyramid shape, a cylindrical shape, and the like, and a cross-sectional area of the pore perpendicular to the depth direction from the outermost surface, such as a conical shape and a pyramid shape, A shape that continuously decreases in the depth direction is preferable.
- the average interval between the pores 12 is not more than the wavelength of visible light, that is, not more than 400 nm.
- the average interval between the pores 12 is preferably 20 nm or more.
- the average interval between the pores 12 was measured by measuring the distance between adjacent pores 12 (distance from the center of the pore 12 to the center of the adjacent pore 12) by electron microscope observation, and averaging these values. It is a thing.
- the depth of the pores 12 is preferably 80 to 500 nm, more preferably 120 to 400 nm, and particularly preferably 150 to 300 nm.
- the depth of the pore 12 is a value obtained by measuring the distance between the bottom of the pore 12 and the top of the convex portion existing between the pores 12 when observed with an electron microscope at a magnification of 30000 times. It is.
- the aspect ratio (pore depth / average interval between pores) of the pores 12 is preferably 0.8 to 5.0, more preferably 1.2 to 4.0, and 1.5 to 3.0. Is particularly preferred.
- the surface of the stamper on which the fine uneven structure is formed may be treated with a release agent.
- the release agent include silicone resins, fluororesins, and fluorine compounds, and fluorine compounds having a hydrolyzable silyl group are particularly preferable.
- fluorine compounds having hydrolyzable silyl groups include fluoroalkylsilane, KBM-7803 (manufactured by Shin-Etsu Chemical Co., Ltd.), MRAF (manufactured by Asahi Glass Co., Ltd.), OPTOOL HD1100, HD2100 series (manufactured by Harves), OPTOOL AES4 AES6 (manufactured by Daikin Industries), Novec EGC-1720 (manufactured by Sumitomo 3M), and FS-2050 series (manufactured by Fluoro Technology).
- An article having a fine concavo-convex structure on its surface is manufactured as follows using, for example, a manufacturing apparatus shown in FIG. Active energy ray curable from the tank 22 between a roll-shaped stamper 20 having an inverted structure (not shown) having a fine concavo-convex structure on the surface and a strip-shaped film base material 42 moving along the surface of the roll-shaped stamper 20. A resin composition is supplied.
- the base material 42 and the active energy ray-curable resin composition are nipped between the roll-shaped stamper 20 and the nip roll 26 whose nip pressure is adjusted by the pneumatic cylinder 24, and the active energy ray-curable resin composition is changed into a base material.
- the material 42 and the roll stamper 20 are uniformly distributed, and at the same time, the concave portions of the fine uneven structure of the roll stamper 20 are filled.
- the active energy ray curable resin composition is irradiated from the active energy ray irradiating device 28 installed below the roll-shaped stamper 20 through the base material 42 to the active energy ray curable resin composition to cure the active energy ray curable resin composition.
- the cured resin layer 44 to which the fine uneven structure on the surface of the roll stamper 20 is transferred is formed.
- An article 40 as shown in FIG. 1 is obtained by peeling the substrate 42 having the cured resin layer 44 formed on the surface from the roll stamper 20 by the peeling roll 30.
- the active energy ray irradiation device 28 a high-pressure mercury lamp, a metal halide lamp or the like is preferable.
- the amount of light irradiation energy is preferably 100 to 10,000 mJ / cm 2 .
- the base material 42 is a light transmissive film.
- the film material include acrylic resin, polycarbonate, styrene resin, polyester, cellulose resin (such as triacetyl cellulose), polyolefin, and alicyclic polyolefin.
- Articles having the fine concavo-convex structure of the present invention on the surface are used as antireflection articles (antireflection films, antireflection films, etc.), optical articles such as optical waveguides, relief holograms, lenses, polarization separation elements, and cell culture sheets. Applications can be expected, and it is particularly suitable for use as an antireflection article.
- antireflection article examples include an antireflection film provided on the surface of an image display device (liquid crystal display device, plasma display panel, electroluminescence display, cathode tube display device, etc.), lens, show window, glasses, etc.
- antireflection Examples thereof include a film and an antireflection sheet.
- an antireflection film may be directly attached to the image display surface, an antireflection film may be directly formed on the surface of a member constituting the image display surface, or an antireflection film is formed on the front plate. May be formed.
- the fine concavo-convex structure of the present invention since the active energy ray-curable resin composition of the present invention is used, the fine concavo-convex structure has high scratch resistance and fingerprint wiping property. It is good.
- part means “part by mass” unless otherwise specified.
- Adhesion About the interface between the base material (film) and the cured resin layer of the laminate cut into a strip shape with a width of 20 mm, using a universal tensile testing machine (manufactured by A & D, Tensilon), head speed: 10 mm / second 180 ° peel test was conducted. The average value of stress from the start to the end of peeling was defined as the adhesion force.
- A The cured resin layer and the film are sufficiently adhered, and the film is broken. (No peeling at the interface occurs.)
- C Adhesive strength is 0.1 N / mm or more and less than 0.3 N / mm.
- D Adhesion strength is less than 0.1 N / mm.
- Step (f) Step (d) and step (e) are repeated a total of four times, and finally step (d) is performed, and anodized alumina having pores having a substantially conical shape with an average interval of 100 nm and a depth of 180 nm is formed on the surface.
- Got a stamper Step (f): Step (d) and step (e) are repeated a total of four times, and finally step (d) is performed, and anodized alumina having pores having a substantially conical shape with an average interval of 100 nm and a depth of 180 nm is formed on the surface.
- the obtained stamper was washed with deionized water, and then water on the surface was removed by air blow, and OPTOOL DSX (manufactured by Daikin Industries, Ltd.) was diluted with a diluent HD-ZV (harves) so that the solid content was 0.1% by mass.
- the product was dipped in a solution diluted with (made by Kogyo Co., Ltd.) for 10 minutes, pulled up from the solution and air-dried for 20 hours to obtain a stamper treated with a release agent.
- TMPT Trimethylolpropane triacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-TMPT)
- TMPT-3EO ethoxylated trimethylolpropane triacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-TMPT-3EO)
- ATM-4E ethoxylated pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical, ATM-4E)
- U-4HA tetrafunctional urethane hard acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., U-4HA)
- U-6HA 6-functional urethane hard acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., U-6HA)
- A-200 Polyethylene glycol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-200)
- A-400 Polyethylene glycol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-400)
- A-600 polyethylene glycol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-600)
- A-1000 polyethylene glycol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-1000)
- APG-400 Polypropylene glycol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., APG-400)
- A-BPE-10 Ethoxylated bisphenol A diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-BPE-10), A-BPE-30: Ethoxylated bisphenol A diacrylate (manufactured by Shin-Naka
- the monomer (C) used in the examples is as follows.
- HEA 2-hydroxyethyl acrylate
- ACMO acryloylmorpholine
- MA methyl acrylate.
- photopolymerization initiator (D) The photopolymerization initiator (D) used in the examples is as follows. 1173: 2-hydroxy-2-methyl-1-phenylpropan-1-one (manufactured by Ciba Geigy, DAROCURE 1173), TPO: 2,4,6-trimethylbenzoyldiphenylphosphine oxide (Ciba Geigy, DAROCURE TPO).
- Example 1 60 parts of TMPT-3EO, 40 parts of A-600, 0.53 of 1173, An active energy ray-curable resin composition was prepared by mixing 0.5 part of TPO.
- Examples 2 to 51, Comparative Examples 1 to 18 Articles having a fine concavo-convex structure on the surface were obtained in the same manner as in Example 1 except that the composition of the active energy ray-curable resin composition was changed to the compositions shown in Tables 3 to 9 and Table 12. The results are shown in Tables 3 to 9 and Table 12.
- the articles obtained in Examples 1 to 51 had good scratch resistance, fingerprint wiping property, and water resistance.
- the articles obtained in Comparative Examples 1 to 3 did not use a specific polyfunctional monomer, the cured resin layer became hard and brittle, and good scratch resistance was not obtained.
- the articles obtained in Comparative Examples 4 to 6 and 10 to 11 had a small number of oxyalkylene groups in the bifunctional monomer, and good scratch resistance and fingerprint wiping properties were not obtained.
- the articles obtained in Comparative Examples 7 to 9 have too many bifunctional monomers and exhibit fingerprint wiping properties, but the cured resin layer easily absorbs water, the convex portions soften and the convex portions stick to each other. Performance has been impaired.
- the article obtained in Comparative Example 12 has too few bifunctional monomers and has a fingerprint wiping property due to HEA, the cured resin layer easily absorbs water, and the protrusions soften and the protrusions stick to each other. The optical performance has been impaired. Since the articles obtained in Comparative Examples 13 to 15 did not use a specific bifunctional monomer, the fingerprint wiping property did not appear. Since the article obtained in Comparative Example 16 had few bifunctional monomers, the fingerprint wiping property was slightly inferior. Moreover, there were too many polyfunctional monomers and the abrasion resistance was a little inferior. Since the article obtained in Comparative Example 17 had a small number of oxyalkylene groups in the bifunctional monomer, good fingerprint wiping properties could not be obtained.
- An article having a fine concavo-convex structure on the surface obtained by curing the active energy ray-curable resin composition of the present invention has both good fingerprint wiping property and high scratch resistance while maintaining excellent optical performance. Therefore, it can be used for various displays such as televisions, cellular phones, and portable game machines, and is extremely useful industrially. It can also be used for mirrors, window materials, and the like that have poor visibility due to water droplets.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011515612A JP5573836B2 (ja) | 2010-03-17 | 2011-03-16 | 活性エネルギー線硬化性樹脂組成物および微細凹凸構造を表面に有する物品 |
CN201180013138.XA CN102791755B (zh) | 2010-03-17 | 2011-03-16 | 活性能量线固化性树脂组合物以及表面具有微细凹凸结构的物品 |
US13/634,290 US20130004718A1 (en) | 2010-03-17 | 2011-03-16 | Active energy ray curable resin composition and article having fine concave-convex structure on surface |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010060906 | 2010-03-17 | ||
JP2010-060906 | 2010-03-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011115162A1 true WO2011115162A1 (fr) | 2011-09-22 |
Family
ID=44649245
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2011/056187 WO2011115162A1 (fr) | 2010-03-17 | 2011-03-16 | Composition de résine polymérisable par un rayonnement énergétique actif et article ayant une structure finement rugueuse à la surface |
Country Status (5)
Country | Link |
---|---|
US (1) | US20130004718A1 (fr) |
JP (1) | JP5573836B2 (fr) |
CN (1) | CN102791755B (fr) |
TW (1) | TWI495955B (fr) |
WO (1) | WO2011115162A1 (fr) |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012014961A1 (fr) * | 2010-07-29 | 2012-02-02 | 株式会社日立ハイテクノロジーズ | Composition de résine photopolymérisable pour utilisation dans le transfert d'une microstructure |
WO2012157717A1 (fr) * | 2011-05-17 | 2012-11-22 | 株式会社Dnpファインケミカル | Structure ayant une forme de surface spécifique et son procédé de fabrication |
JP5144826B1 (ja) * | 2012-06-05 | 2013-02-13 | 旭化成イーマテリアルズ株式会社 | 光学素子 |
JP2013097306A (ja) * | 2011-11-04 | 2013-05-20 | Mitsubishi Rayon Co Ltd | 微細凹凸構造体、ディスプレイ及び微細凹凸構造体の製造方法 |
JP2013160954A (ja) * | 2012-02-06 | 2013-08-19 | Lintec Corp | 光学用フィルム、並びにディスプレイ装置 |
JP2013175733A (ja) * | 2011-01-12 | 2013-09-05 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法 |
JP2014047300A (ja) * | 2012-08-31 | 2014-03-17 | Lintec Corp | 凹凸成型用硬化性材料、光学部材および光学部材の製造方法 |
US20140205801A1 (en) * | 2013-01-23 | 2014-07-24 | Dexerials Corporation | Hydrophilic laminate and method for manufacturing the same, antifouling laminate, product and method for manufacturing the same, and antifouling method |
JPWO2012133943A1 (ja) * | 2011-03-31 | 2014-07-28 | ソニー株式会社 | 印刷物および印画物 |
JP2015129947A (ja) * | 2012-06-15 | 2015-07-16 | 三菱レイヨン株式会社 | 物品 |
WO2015190553A1 (fr) * | 2014-06-12 | 2015-12-17 | 三菱レイヨン株式会社 | Composition de résine durcissable par un faisceau d'énergie active, articles moulés en résine, et procédé de production d'articles moulés en résine |
WO2016017391A1 (fr) * | 2014-07-30 | 2016-02-04 | デクセリアルズ株式会社 | Stratifié transparent |
JP2016117797A (ja) * | 2014-12-19 | 2016-06-30 | 東亞合成株式会社 | 樹脂シート製造用硬化型組成物 |
JPWO2014046021A1 (ja) * | 2012-09-20 | 2016-08-18 | シャープ株式会社 | 反射防止フィルム及びその製造方法、並びに、表示装置 |
JP5985100B1 (ja) * | 2015-05-21 | 2016-09-06 | デクセリアルズ株式会社 | 透明積層体 |
JP2017043103A (ja) * | 2016-11-08 | 2017-03-02 | リンテック株式会社 | 光学用フィルム、並びにディスプレイ装置 |
WO2018037711A1 (fr) * | 2016-08-25 | 2018-03-01 | シャープ株式会社 | Film antisalissure |
WO2018135358A1 (fr) * | 2017-01-18 | 2018-07-26 | シャープ株式会社 | Film antisalissure |
WO2018139418A1 (fr) * | 2017-01-30 | 2018-08-02 | シャープ株式会社 | Film antisalissure |
JP2018135512A (ja) * | 2017-02-23 | 2018-08-30 | 三洋化成工業株式会社 | 活性エネルギー線硬化性樹脂組成物 |
JPWO2022025175A1 (fr) * | 2020-07-30 | 2022-02-03 | ||
JP7476553B2 (ja) | 2020-02-12 | 2024-05-01 | 東亞合成株式会社 | 活性エネルギー線硬化型組成物 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101529418B1 (ko) * | 2011-04-15 | 2015-06-16 | 미쯔비시 레이온 가부시끼가이샤 | 활성 에너지선 경화성 수지 조성물, 성형품, 미세 요철 구조체, 발수성 물품, 몰드, 및 미세 요철 구조체의 제조 방법 |
EP2979854A4 (fr) * | 2013-03-29 | 2016-04-06 | Mitsubishi Rayon Co | Article |
CN105102211B (zh) * | 2013-04-05 | 2018-05-01 | 三菱化学株式会社 | 微细凹凸结构体、装饰板材和装饰树脂成形体,以及微细凹凸结构体和装饰树脂成形体的制造方法 |
CN103246164A (zh) * | 2013-06-04 | 2013-08-14 | 苏州太速雷电子科技有限公司 | 一种用于立体光刻成型的光敏树脂及其制备方法 |
JP6451627B2 (ja) * | 2014-03-11 | 2019-01-16 | 三菱ケミカル株式会社 | 活性エネルギー線硬化性樹脂組成物及び自動車ヘッドランプレンズ |
WO2017022701A1 (fr) * | 2015-08-06 | 2017-02-09 | シャープ株式会社 | Élément optique et composition polymérisable pour nano-impression |
JP2018077304A (ja) * | 2016-11-08 | 2018-05-17 | 株式会社デンソー | 撮像装置 |
CN114280850A (zh) * | 2021-12-31 | 2022-04-05 | 凯鑫森(上海)功能性薄膜产业股份有限公司 | 具有良好配屏适应性的高亮置顶双棱镜贴合膜的制备方法及屏幕 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5930810A (ja) * | 1982-08-12 | 1984-02-18 | Mitsui Petrochem Ind Ltd | 被覆用硬化型樹脂組成物 |
JP2010000719A (ja) * | 2008-06-20 | 2010-01-07 | Mitsubishi Rayon Co Ltd | フィルム状レプリカモールド、その製造方法および微細凹凸構造を有するフィルム製品の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4475016B2 (ja) * | 2003-06-30 | 2010-06-09 | 東レ株式会社 | ハードコートフィルム、反射防止フィルムおよび画像表示装置 |
-
2011
- 2011-03-16 CN CN201180013138.XA patent/CN102791755B/zh active Active
- 2011-03-16 JP JP2011515612A patent/JP5573836B2/ja active Active
- 2011-03-16 US US13/634,290 patent/US20130004718A1/en not_active Abandoned
- 2011-03-16 WO PCT/JP2011/056187 patent/WO2011115162A1/fr active Application Filing
- 2011-03-17 TW TW100109137A patent/TWI495955B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5930810A (ja) * | 1982-08-12 | 1984-02-18 | Mitsui Petrochem Ind Ltd | 被覆用硬化型樹脂組成物 |
JP2010000719A (ja) * | 2008-06-20 | 2010-01-07 | Mitsubishi Rayon Co Ltd | フィルム状レプリカモールド、その製造方法および微細凹凸構造を有するフィルム製品の製造方法 |
Cited By (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012031240A (ja) * | 2010-07-29 | 2012-02-16 | Hitachi High-Technologies Corp | 微細構造転写用の光重合性樹脂組成物 |
WO2012014961A1 (fr) * | 2010-07-29 | 2012-02-02 | 株式会社日立ハイテクノロジーズ | Composition de résine photopolymérisable pour utilisation dans le transfert d'une microstructure |
JP2013175733A (ja) * | 2011-01-12 | 2013-09-05 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法 |
KR101500897B1 (ko) * | 2011-01-12 | 2015-03-12 | 미쯔비시 레이온 가부시끼가이샤 | 활성 에너지선 경화성 수지 조성물, 미세 요철 구조체 및 미세 요철 구조체의 제조 방법 |
JPWO2012133943A1 (ja) * | 2011-03-31 | 2014-07-28 | ソニー株式会社 | 印刷物および印画物 |
WO2012157717A1 (fr) * | 2011-05-17 | 2012-11-22 | 株式会社Dnpファインケミカル | Structure ayant une forme de surface spécifique et son procédé de fabrication |
JP2013097306A (ja) * | 2011-11-04 | 2013-05-20 | Mitsubishi Rayon Co Ltd | 微細凹凸構造体、ディスプレイ及び微細凹凸構造体の製造方法 |
JP2013160954A (ja) * | 2012-02-06 | 2013-08-19 | Lintec Corp | 光学用フィルム、並びにディスプレイ装置 |
JP5144826B1 (ja) * | 2012-06-05 | 2013-02-13 | 旭化成イーマテリアルズ株式会社 | 光学素子 |
JP2015129947A (ja) * | 2012-06-15 | 2015-07-16 | 三菱レイヨン株式会社 | 物品 |
US9718910B2 (en) | 2012-06-15 | 2017-08-01 | Mitsubishi Rayon Co., Ltd. | Article and active energy ray-curable resin composition |
JP2014047300A (ja) * | 2012-08-31 | 2014-03-17 | Lintec Corp | 凹凸成型用硬化性材料、光学部材および光学部材の製造方法 |
US10094952B2 (en) | 2012-09-20 | 2018-10-09 | Sharp Kabushiki Kaisha | Anti-reflection film, method of producing the film and display device |
JPWO2014046021A1 (ja) * | 2012-09-20 | 2016-08-18 | シャープ株式会社 | 反射防止フィルム及びその製造方法、並びに、表示装置 |
US20140205801A1 (en) * | 2013-01-23 | 2014-07-24 | Dexerials Corporation | Hydrophilic laminate and method for manufacturing the same, antifouling laminate, product and method for manufacturing the same, and antifouling method |
US10252302B2 (en) * | 2013-01-23 | 2019-04-09 | Dexerials Corporation | Hydrophilic laminate and method for manufacturing the same, antifouling laminate, product and method for manufacturing the same, and antifouling method |
US10040945B2 (en) | 2014-06-12 | 2018-08-07 | Mitsubishi Chemical Corporation | Active energy ray curable resin composition, resin molded article, and method for producing resin molded article |
WO2015190553A1 (fr) * | 2014-06-12 | 2015-12-17 | 三菱レイヨン株式会社 | Composition de résine durcissable par un faisceau d'énergie active, articles moulés en résine, et procédé de production d'articles moulés en résine |
US10653560B2 (en) | 2014-07-30 | 2020-05-19 | Dexerials Corporation | Transparent laminate |
JP2016033647A (ja) * | 2014-07-30 | 2016-03-10 | デクセリアルズ株式会社 | 透明積層体 |
WO2016017391A1 (fr) * | 2014-07-30 | 2016-02-04 | デクセリアルズ株式会社 | Stratifié transparent |
JP2016117797A (ja) * | 2014-12-19 | 2016-06-30 | 東亞合成株式会社 | 樹脂シート製造用硬化型組成物 |
JP2016218442A (ja) * | 2015-05-21 | 2016-12-22 | デクセリアルズ株式会社 | 透明積層体 |
EP3882673A1 (fr) | 2015-05-21 | 2021-09-22 | Dexerials Corporation | Stratifié transparent |
WO2016186013A1 (fr) * | 2015-05-21 | 2016-11-24 | デクセリアルズ株式会社 | Stratifié transparent |
KR20180008582A (ko) | 2015-05-21 | 2018-01-24 | 데쿠세리아루즈 가부시키가이샤 | 투명 적층체 |
US11124657B2 (en) | 2015-05-21 | 2021-09-21 | Dexerials Corporation | Transparent laminate |
JP5985100B1 (ja) * | 2015-05-21 | 2016-09-06 | デクセリアルズ株式会社 | 透明積層体 |
JPWO2018037711A1 (ja) * | 2016-08-25 | 2019-06-20 | シャープ株式会社 | 防汚性フィルム |
WO2018037711A1 (fr) * | 2016-08-25 | 2018-03-01 | シャープ株式会社 | Film antisalissure |
JP2017043103A (ja) * | 2016-11-08 | 2017-03-02 | リンテック株式会社 | 光学用フィルム、並びにディスプレイ装置 |
JPWO2018135358A1 (ja) * | 2017-01-18 | 2019-11-07 | シャープ株式会社 | 防汚性フィルム |
WO2018135358A1 (fr) * | 2017-01-18 | 2018-07-26 | シャープ株式会社 | Film antisalissure |
WO2018139418A1 (fr) * | 2017-01-30 | 2018-08-02 | シャープ株式会社 | Film antisalissure |
JPWO2018139418A1 (ja) * | 2017-01-30 | 2019-12-19 | シャープ株式会社 | 防汚性フィルム |
JP2018135512A (ja) * | 2017-02-23 | 2018-08-30 | 三洋化成工業株式会社 | 活性エネルギー線硬化性樹脂組成物 |
JP7476553B2 (ja) | 2020-02-12 | 2024-05-01 | 東亞合成株式会社 | 活性エネルギー線硬化型組成物 |
JPWO2022025175A1 (fr) * | 2020-07-30 | 2022-02-03 | ||
WO2022025175A1 (fr) * | 2020-07-30 | 2022-02-03 | 中国塗料株式会社 | Composition de résine photodurcissable, film de revêtement durci et article moulé avec film de revêtement durci |
JP7530979B2 (ja) | 2020-07-30 | 2024-08-08 | 中国塗料株式会社 | 光硬化性樹脂組成物、硬化被膜、および硬化被膜付き成形品 |
Also Published As
Publication number | Publication date |
---|---|
JP5573836B2 (ja) | 2014-08-20 |
TWI495955B (zh) | 2015-08-11 |
CN102791755A (zh) | 2012-11-21 |
CN102791755B (zh) | 2015-02-18 |
TW201144940A (en) | 2011-12-16 |
US20130004718A1 (en) | 2013-01-03 |
JPWO2011115162A1 (ja) | 2013-07-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5573836B2 (ja) | 活性エネルギー線硬化性樹脂組成物および微細凹凸構造を表面に有する物品 | |
JP5352020B2 (ja) | 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法 | |
US9718910B2 (en) | Article and active energy ray-curable resin composition | |
WO2013005769A1 (fr) | Article ayant une fine structure concavo-convexe sur la surface, dispositif d'affichage d'images le comportant | |
JP5958338B2 (ja) | 微細凹凸構造体、撥水性物品、モールド、及び微細凹凸構造体の製造方法 | |
JP5648632B2 (ja) | 活性エネルギー線硬化性樹脂組成物、及びそれを用いたナノ凹凸構造体とその製造方法、及びナノ凹凸構造体を備えた撥水性物品 | |
JP6686284B2 (ja) | 活性エネルギー線硬化性樹脂組成物の硬化物を含む物品 | |
JP2013029828A (ja) | 光透過性成形体及びそれを用いた反射防止物品 | |
JP5876977B2 (ja) | 活性エネルギー線硬化性樹脂組成物、及びそれを用いたナノ凹凸構造体とその製造方法、及びナノ凹凸構造体を備えた撥水性物品 | |
JP2013241503A (ja) | 多官能ウレタン(メタ)アクリレート、活性エネルギー線硬化性樹脂組成物及び微細凹凸構造を表面に有する物品 | |
JP5879939B2 (ja) | 微細凹凸構造体、ディスプレイ及び微細凹凸構造体の製造方法 | |
WO2016158979A1 (fr) | Composition et article de résine durcissable par rayonnement d'énergie active |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201180013138.X Country of ref document: CN |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2011515612 Country of ref document: JP |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11756346 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13634290 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 11756346 Country of ref document: EP Kind code of ref document: A1 |