WO2011030519A1 - 弾性波素子と弾性波素子センサ - Google Patents
弾性波素子と弾性波素子センサ Download PDFInfo
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- WO2011030519A1 WO2011030519A1 PCT/JP2010/005318 JP2010005318W WO2011030519A1 WO 2011030519 A1 WO2011030519 A1 WO 2011030519A1 JP 2010005318 W JP2010005318 W JP 2010005318W WO 2011030519 A1 WO2011030519 A1 WO 2011030519A1
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/0222—Details of interface-acoustic, boundary, pseudo-acoustic or Stonely wave devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/022—Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02984—Protection measures against damaging
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/04—Wave modes and trajectories
- G01N2291/042—Wave modes
- G01N2291/0423—Surface waves, e.g. Rayleigh waves, Love waves
Definitions
- the present invention relates to an acoustic wave element and an acoustic wave element sensor.
- FIG. 10 is a cross-sectional view of a conventional acoustic wave device.
- the acoustic wave element 1 is provided on the piezoelectric body 2, the IDT electrode 3 provided on the piezoelectric body 2 to excite the main acoustic wave having the wavelength ⁇ , and the IDT electrode 3 on the piezoelectric body 2 so as to cover the IDT electrode 3.
- the dielectric layer 4, the adhesion layer 5 provided on the dielectric layer 4, and the reaction unit 6 provided on the adhesion layer 5 and reacts with the detection target substance or the binding substance that binds to the detection target substance. Consists of.
- the main acoustic wave excited by the IDT electrode 3 was a surface acoustic wave propagating on the surface of the dielectric layer 4.
- the dielectric layer 4 is thin enough to distribute energy on the surface of the dielectric layer 4, the IDT electrode 3 is damaged by external factors during use of the acoustic wave device 1 or in the manufacturing process, and the performance is deteriorated. There was a problem to do.
- Patent Document 1 is known as prior art document information related to the invention of this application.
- the acoustic wave device of the present invention includes a piezoelectric body, an input IDT electrode provided on the piezoelectric body for exciting the primary acoustic wave, and an output provided on the piezoelectric body for receiving the primary acoustic wave and outputting a signal.
- the main elastic wave is an elastic boundary wave that propagates between the piezoelectric body and the first dielectric layer in the input IDT electrode and the output IDT electrode, and the elastic wave that propagates on the upper surface of the propagation path in the propagation path. It is the structure which becomes a surface wave.
- FIG. 1 is a cross-sectional view of an acoustic wave device according to Embodiment 1 of the present invention.
- FIG. 2 is an energy distribution diagram of the acoustic wave device according to Embodiment 1 of the present invention.
- FIG. 3 is another cross-sectional view of the acoustic wave device according to Embodiment 1 of the present invention.
- FIG. 4 is another cross-sectional view of the acoustic wave device according to Embodiment 1 of the present invention.
- FIG. 5 is another cross-sectional view of the acoustic wave device according to Embodiment 1 of the present invention.
- FIG. 6 is another cross-sectional view of the acoustic wave device according to Embodiment 1 of the present invention.
- FIG. 1 is a cross-sectional view of an acoustic wave device according to Embodiment 1 of the present invention.
- FIG. 2 is an energy distribution diagram of the acoustic wave device according to Embodiment
- FIG. 7 is another cross-sectional view of the acoustic wave device according to the first exemplary embodiment of the present invention.
- FIG. 8 is another energy distribution diagram of the acoustic wave device according to the first exemplary embodiment of the present invention.
- FIG. 9 is a cross-sectional view of the acoustic wave element sensor according to Embodiment 1 of the present invention.
- FIG. 10 is a cross-sectional view of a conventional acoustic wave device.
- FIG. 1 is a cross-sectional view of the acoustic wave device according to the first embodiment.
- an acoustic wave element 7 includes a piezoelectric body 8 and an input IDT (InterDigital Transducer) that is provided on the piezoelectric body 8 and excites main acoustic waves such as SH (Shear-Horizontal) waves having a wavelength ⁇ .
- the acoustic wave element 7 includes a first dielectric layer 12 that is provided on the piezoelectric body 8 so as to cover the input IDT electrode 9 and the output IDT electrode 10 and has a film thickness of 0.8 times the wavelength ⁇ or more. .
- the acoustic wave element 7 is provided on the propagation path and has a reaction part (not shown) that reacts with the detection target substance or the binding substance that binds to the detection target substance. You may have.
- the piezoelectric body 8 is formed of a single crystal piezoelectric substrate having a thickness of about 100 ⁇ m to 350 ⁇ m, and is, for example, a lithium niobate-based, lithium tantalate-based, crystal, or potassium niobate-based substrate.
- the input IDT electrode 9 and the output IDT electrode 10 are comb-shaped electrodes having a normalized film thickness of about 0.01 ⁇ to 0.12 ⁇ , and are made of, for example, aluminum, copper, silver, gold, titanium, tungsten, platinum, molybdenum, or chromium. It is the structure by which these single metals or the alloy which has these as a main component, or these metals were laminated
- the first dielectric layer 12 is, for example, silicon oxide, diamond, silicon, silicon nitride, aluminum nitride, or aluminum oxide. Further, the first dielectric layer 12 is selected so that the velocity of the slowest bulk wave propagating through the first dielectric layer 12 is higher than the velocity of the main elastic wave excited by the input IDT electrode 9 or the output IDT electrode 10. By doing so, the main elastic wave can be confined at the boundary between the first dielectric layer 12 and the piezoelectric body 8.
- the velocity of the main acoustic wave at the input IDT electrode 9 or the output IDT electrode 10 is mainly determined by the material of the first dielectric layer 12, the material of the IDT electrodes 9, 10, and the film thickness.
- the film thickness of the first dielectric layer 12 is preferably 0.8 ⁇ or more, where ⁇ is the wavelength of the main acoustic wave excited by the input IDT electrode 9.
- ⁇ is the wavelength of the main acoustic wave excited by the input IDT electrode 9.
- the vertical axis in FIG. 2 indicates the energy value when the maximum energy value of the main elastic wave is 1
- the horizontal axis in FIG. 2 indicates that the boundary surface between the IDT electrodes 9 and 10 and the piezoelectric body 8 is 0.
- the distance normalized by the wavelength ⁇ of the main acoustic wave when the thickness direction on the piezoelectric body 8 side (the lower direction in FIG. 1) is positive is shown.
- u1, u2, and u3 represent the longitudinal wave component, the transverse wave component, and the depth direction component of the energy of the main elastic wave, respectively. The same applies to FIG. 8 described later.
- the main elastic wave can be almost completely confined in the elastic wave element 7.
- a medium having a frequency temperature characteristic opposite to that of the piezoelectric body 8 such as silicon oxide
- the frequency temperature characteristic of the acoustic wave element 7 can be improved.
- the acoustic wave element 7 can be reduced in height by setting the film thickness of the first dielectric layer 12 to 5 ⁇ or less.
- the main elastic wave excited by the input IDT electrode 9 propagates as a boundary wave at the boundary between the first dielectric layer 12 and the piezoelectric body 8 in the input IDT electrode 9 and in the propagation path 11 the piezoelectric body 8. 2 propagates as a surface acoustic wave in which main acoustic waves are concentrated on the surface of the first ID layer 10 and becomes a boundary wave propagating again at the boundary between the first dielectric layer 12 and the piezoelectric body 8 as shown in FIG.
- the main acoustic wave is a surface wave, so that, for example, when the acoustic wave device is used as a sensor, the sensing sensitivity can be maintained.
- the input IDT electrode 9 and the output IDT electrode 10 are configured to be covered with the thick first dielectric layer 12, the input IDT electrode 9 and the output IDT electrode 10 are used when the acoustic wave device 7 is used or in the manufacturing process. However, it is possible to prevent the performance from being damaged due to external factors.
- the first dielectric layer 12 may be composed of a plurality of dielectric layers.
- the first dielectric layer A covering the input IDT electrode 9 and the output IDT electrode 10 for example, silicon oxide, which is a medium having a frequency temperature characteristic opposite to that of the piezoelectric body 8, is used.
- the dielectric layer B a medium in which the velocity of the slowest bulk wave propagating in the dielectric layer is faster than the velocity of the main elastic wave propagating through the IDT electrodes 9 and 10, such as diamond, silicon nitride, aluminum nitride, or When aluminum oxide is used, it is possible to achieve both frequency temperature characteristics and confinement of the main elastic wave.
- the second dielectric layer B which is a medium having a high bulk wave propagation velocity, is formed in the first layer. It is desirable that the structure covers the side surface of the dielectric layer A of the eye. Thereby, at the boundary portion between the IDT electrodes 9 and 10 and the propagation path 11, the energy of the main elastic wave enters the inside from the surface of the piezoelectric body 8, thereby preventing the loss due to the reflection of the main elastic wave.
- a tapered portion 15 in which the first dielectric layer 12 spreads downward is provided, thereby reducing acoustic impedance.
- a second dielectric layer 14 having a film thickness of 0.4 times or less the wavelength ⁇ of the main elastic wave is provided on the propagation path 11, and a reaction part (not shown) is provided. It may be provided on the second dielectric layer 14. Also in this case, in the propagation path 11 for sensing, the main acoustic wave is a surface wave, so that, for example, when an acoustic wave element is used as a sensor, sensing sensitivity can be maintained. On the other hand, since the input IDT electrode 9 and the output IDT electrode 10 are covered with the thick first dielectric layer 12, the input IDT electrode 9 and the output IDT electrode 10 are used when the acoustic wave element 7 is used or in the manufacturing process.
- the normalized film thickness of the second dielectric layer 14 is set to 0.4 ⁇ or less is that the main acoustic wave is changed from the boundary wave to the surface wave or the surface wave at the boundary between the IDT electrodes 9 and 10 and the propagation path 11. This is because it is possible to suppress energy loss at the time of conversion from to the boundary wave. Furthermore, when a medium having a frequency temperature characteristic opposite to that of the piezoelectric body 8 such as silicon oxide is used as the second dielectric layer 14, the frequency temperature characteristic of the acoustic wave element 7 can be improved.
- the main acoustic wave is also input.
- the IDT electrode 9 and the output IDT electrode 10 may be boundary acoustic waves that propagate between the piezoelectric body 8 and the first dielectric layer 12, and the propagation path 11 may be a surface acoustic wave that propagates on the upper surface of the propagation path. .
- the velocity of the main elastic wave excited by the mass addition effect of the electrodes is slower than the propagation velocity of the slowest bulk wave propagating in the first dielectric layer 12, and the propagation path 11, there is no mass addition effect of the IDT electrodes 9, 10, so that the velocity of the main elastic wave is faster than the propagation velocity of the slowest bulk wave propagating in the first dielectric layer 12.
- 12 materials and film thicknesses, and IDT electrodes 9 and 10 materials and film thicknesses are determined.
- FIG. 8 shows an energy distribution diagram in the case of the above.
- the IDT electrodes 9 and 10 are metals having a material equivalent to gold having a normalized film thickness of 0.08 ⁇ or more, and the normalized film thickness of the first dielectric layer 12 made of silicon oxide is 0.
- the main elastic wave becomes an elastic boundary wave in which the energy distribution is concentrated in the vicinity of the IDT electrode 9 in the input IDT electrode 9 and the output IDT electrode 10, and there is no mass addition effect by the electrode in the propagation path.
- the surface acoustic wave is concentrated in the energy distribution on the surface of the first dielectric layer 12.
- the main acoustic wave is a surface wave in the propagation path 11, so that, for example, when the acoustic wave element is applied as a sensor, the sensing sensitivity can be maintained.
- the input IDT electrode 9 and the output IDT electrode 10 are covered with the thick first dielectric layer 12, the input IDT electrode 9 and the output IDT electrode 10 are used when the acoustic wave element 7 is used or in the manufacturing process. However, it is possible to prevent the performance from being damaged due to external factors.
- the reaction unit 13 is an organic material film such as an appropriate artificial cell film that reacts with a detection target substance or a binding substance that binds to the detection target substance, a single metal such as nickel, copper, gold, cobalt, or zinc, or a metal made of an alloy. It can be composed of a membrane. Moreover, this reaction part 13 does not need to be a film
- the reaction unit 13 may have an adhesive layer (not shown) made of titanium or the like at the interface with the piezoelectric body 8.
- the specimen containing the histidine-tagged protein in the liquid is brought into contact with the reaction unit 13, the histidine-tagged protein is adsorbed on the reaction unit 13, and the frequency characteristic of the acoustic wave element sensor 16 is measured.
- the presence or absence of histidine-tagged protein in the sample is detected based on the difference from the resonance frequency in the characteristics.
- the concentration of the histidine-tagged protein can be detected by preparing a calibration curve in advance as follows. That is, the frequency characteristics of the acoustic wave element sensor 16 are measured in the same manner as described above using standard samples containing a plurality of histidine-tagged proteins with known concentrations. A calibration curve based on the difference between the plurality of types of resonance frequencies obtained from the frequency characteristics when the standard specimens having a plurality of types of known concentrations are contacted and the resonance frequency when the reference liquid is contacted. Create Then, the resonance frequency of the acoustic wave element sensor 16 for the unknown specimen containing the histidine-tagged protein is detected, and the difference between this detection result and the resonance frequency of the acoustic wave element sensor 16 for the reference liquid is obtained. The concentration of the histidine-tagged protein may be determined based on the calibration curve.
- the input IDT electrode 9 and the output IDT electrode 10 are configured to be covered with the thick dielectric layer 12, so that when the acoustic wave element sensor 16 is used or in the manufacturing process, input is performed. It can be suppressed that the IDT electrode 9 and the output IDT electrode 10 are damaged due to external factors and the performance is deteriorated.
- the main elastic wave changes not only the SH wave but also the cut direction of the piezoelectric body 8 to change the traveling direction component and the depth direction component.
- a Rayleigh wave having a may be used as a main elastic wave. Thereby, confinement to the surface of the main elastic wave propagating on the propagation path 11 is further strengthened, and the sensing sensitivity can be improved.
- the propagation path 11 is open to the surface, but may be covered with an electrode (not shown).
- an electrode By covering with the electrode, the confinement of the main elastic wave propagating on the propagation path 11 due to the short-circuit effect and the mass load effect is further strengthened, and the sensing sensitivity can be improved.
- the acoustic wave element 7 or the acoustic wave element sensor 16 is a transversal type element, but is not limited to this.
- the acoustic wave element 7 includes a resonator type element, A DMS (double mode surface acoustic wave) element or a ladder type acoustic wave element may be used.
- the acoustic wave device according to the present invention has, for example, a feature of suppressing deterioration of sensor characteristics and can be applied to electronic devices such as medical devices.
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Abstract
Description
以下、本発明の実施の形態1における弾性波素子について図面を参照しながら説明する。図1は、実施の形態1における弾性波素子の断面図である。
また、例えば、図9に示すように、伝搬路11上に特定の物質による反応部13を設けた場合について詳述する。この場合、本発明による弾性波素子7は弾性波素子センサ16として利用することができる。
8 圧電体
9 入力IDT電極
10 出力IDT電極
11 伝搬路
12 第1誘電体層
13 反応部
14 第2誘電体層
15 テーパー部
Claims (8)
- 圧電体と、
前記圧電体の上に設けられて主要弾性波を励振させる入力IDT電極と、
前記圧電体の上に設けられて前記主要弾性波を受け信号を出力する出力IDT電極と、
前記入力IDT電極と前記出力IDT電極との間に設けられた伝搬路と、
前記圧電体上に前記入力IDT電極及び前記出力IDT電極を覆うように設けられた第1誘電体層を備え、
前記主要弾性波は、前記入力IDT電極及び前記出力IDT電極において前記圧電体と前記第1誘電体層との間を伝搬する弾性境界波となり、前記伝搬路において前記伝搬路の上面を伝搬する弾性表面波となる弾性波素子。 - 前記第1誘電体層は、前記波長λの0.8倍以上の膜厚を有すると共に、前記第1誘電体層を伝搬する最も遅いバルク波の速度は、前記入力IDT電極または前記出力IDT電極を伝搬する前記主要弾性波の速度より速い請求項1に記載の弾性波素子。
- 前記第1誘電体層は、前記入力IDT電極と前記出力IDT電極を覆う酸化ケイ素からなる誘電体層Aと、
前記誘電体層Aの上に設けられた誘電体層Bとを備え、
前記誘電体層Bを伝搬する最も遅いバルク波の速度は前記入力IDT電極を伝搬する主要弾性波の速度より速く、かつ、
前記入力IDT電極又は前記出力IDT電極と前記伝搬路の境界部分において、前記誘電体層Bが前記誘電体層Aの側面を覆う構成である請求項1に記載の弾性波素子。 - 前記第1誘電体層は、前記入力IDT電極又は前記出力IDT電極と前記伝搬路の境界部において、下方に広がるテーパー部を有する請求項1に記載の弾性波素子。
- 前記第1誘電体層は、前記入力IDT電極と前記出力IDT電極と前記伝搬路の上に設けられた請求項1に記載の弾性波素子。
- 圧電体と、
前記圧電体の上に設けられて主要弾性波を励振させる入力IDT電極と、
前記圧電体の上に設けられて前記主要弾性波を受け信号を出力する出力IDT電極と、
前記入力IDT電極と前記出力IDT電極との間に設けられた伝搬路と、
前記圧電体上に前記入力IDT電極及び前記出力IDT電極を覆うように設けられた第1誘電体層と、
前記伝搬路の上に設けられて、検出対象物質または検出対象物質と結合する結合物質に反応する反応部とを備え、
前記主要弾性波は、前記入力IDT電極及び前記出力IDT電極において前記圧電体と前記第1誘電体層との間を伝搬する弾性境界波となり、前記伝搬路において前記伝搬路の上面を伝搬する弾性表面波となる弾性波素子センサ。 - 前記反応部は、前記圧電体の上に直接設けられた請求項6に記載の弾性波素子センサ。
- 前記第1誘電体層を伝搬する最も遅いバルク波の速度は、前記入力IDT電極または前記出力IDT電極を伝搬する前記主要弾性波の速度より遅いと共に、
前記反応膜は、前記伝搬路に設けられた前記波長の0.4倍以下の第2誘電体層の上に設けられた請求項6に記載の弾性波素子センサ。
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US13/391,416 US9160299B2 (en) | 2009-09-11 | 2010-08-30 | Acoustic wave element and acoustic wave element sensor |
CN201080037249XA CN102484466A (zh) | 2009-09-11 | 2010-08-30 | 弹性波元件与弹性波元件传感器 |
EP10815120.0A EP2477332A4 (en) | 2009-09-11 | 2010-08-30 | ACOUSTIC WAVE ELEMENT AND ACOUSTIC WAVE ELEMENT SENSOR |
JP2011530739A JPWO2011030519A1 (ja) | 2009-09-11 | 2010-08-30 | 弾性波素子と弾性波素子センサ |
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WO2013108608A1 (ja) | 2012-01-20 | 2013-07-25 | パナソニック株式会社 | 弾性波センサ |
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Also Published As
Publication number | Publication date |
---|---|
EP2477332A1 (en) | 2012-07-18 |
JPWO2011030519A1 (ja) | 2013-02-04 |
EP2477332A4 (en) | 2013-12-25 |
CN102484466A (zh) | 2012-05-30 |
US20120146457A1 (en) | 2012-06-14 |
US9160299B2 (en) | 2015-10-13 |
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