WO2011010389A1 - 半導体装置の製造方法及び半導体装置 - Google Patents
半導体装置の製造方法及び半導体装置 Download PDFInfo
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- WO2011010389A1 WO2011010389A1 PCT/JP2009/063280 JP2009063280W WO2011010389A1 WO 2011010389 A1 WO2011010389 A1 WO 2011010389A1 JP 2009063280 W JP2009063280 W JP 2009063280W WO 2011010389 A1 WO2011010389 A1 WO 2011010389A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/341—Structures having reduced dimensionality, e.g. quantum wires
- H01S5/3412—Structures having reduced dimensionality, e.g. quantum wires quantum box or quantum dash
Definitions
- the present invention relates to a manufacturing method of a semiconductor device including quantum dots formed on a semiconductor substrate, and a technical field of the semiconductor device manufactured by the manufacturing method.
- a semiconductor device manufactured by this type of manufacturing method there is a semiconductor device including a GaAs (gallium arsenide) substrate.
- a semiconductor device manufactured by this type of manufacturing method is applied to, for example, optical fiber transmission.
- optical fiber transmission a semiconductor device that emits light having a wavelength of 1250 nm (nanometer) to 1650 nm is required. Therefore, in this type of manufacturing method, for example, it is possible to manufacture a semiconductor device including a GaAs substrate that emits light having a wavelength of 1200 nm or more.
- Patent Document 1 on a GaAs layer, InAs (indium arsenic) is supplied at an average supply rate of 0.002 ML (Monolayer) per second to form quantum dots, A first carrier confinement layer containing In x Ga 1-x As (0.1 ⁇ x ⁇ 0.17) is formed so as to cover the quantum dots, and GaAs is formed on the first carrier confinement layer.
- a manufacturing method for forming a second carrier confinement layer is described.
- a GaAs buffer layer is formed on a GaAs substrate at 580 ° C., and InAs quantum dots are formed on the buffer layer at 500 ° C. at a growth rate of 0.015 ML per second.
- a manufacturing method is described in which a GaAs cap layer is formed at 500 ° C. and then annealed at 580 ° C.
- Patent Document 1 has a technical problem that it is difficult to control the supply amount of InAs and it may be difficult to ensure sufficient reproducibility.
- Patent Document 2 has a technical problem that In may diffuse into the cap layer due to annealing, and the quantum confinement effect of the quantum dots may be reduced.
- the present invention has been made in view of the above problems, for example, and an object of the present invention is to provide a semiconductor device manufacturing method and a semiconductor device capable of improving reproducibility and quantum confinement effect.
- a method for manufacturing a semiconductor device is a method for manufacturing a semiconductor device in which a peak wavelength of PL (Photoluminescence) emission is 1.2 ⁇ m (micrometers) or more at a temperature of 300 K (Kelvin).
- PL Photoluminescence
- the second growth temperature which is the temperature at which the cap layer is formed in the third forming step, is lower than the temperature.
- the method is a method for manufacturing a semiconductor device in which the peak wavelength of PL emission is 1.2 ⁇ m or more at a temperature of 300 K (ie, room temperature).
- the manufacturing method includes first to third forming steps.
- a buffer layer containing GaAs is formed on a semiconductor substrate such as a GaAs substrate.
- quantum dots containing InAs are self-formed on the formed buffer layer.
- a cap layer containing GaAs is formed so as to cover the formed quantum dots.
- the first growth temperature which is the temperature at which the quantum dots are self-formed in the second forming step
- the second growth temperature which is the temperature at which the cap layer is formed in the third formation step
- the second growth temperature is lower than the first growth temperature
- Patent Document 2 it is estimated in Patent Document 2 that In is diffused in the cap layer during annealing. That is, in Patent Document 2, it is presumed that the quantum dots are substantially covered with a cap layer made of InGaAs. Alternatively, it is presumed that Ga is diffused into the quantum dots during annealing, and the quantum dots are mixed crystals of InAs and InGaAs. This may reduce the quantum confinement effect of the quantum dots.
- the second growth temperature which is the temperature at which the cap layer is formed in the third formation step
- the first growth temperature which is the temperature at which the quantum dots are self-formed in the second formation step. ing.
- the quantum confinement effect of the quantum dots can be improved as compared with the case where the quantum dots are covered with a cap layer made of InGaAs.
- it is easier to control the first and second growth temperatures than to control the supply amount of a material (for example, InAs) reproducibility can be improved.
- the first growth temperature is set so that the peak wavelength is longer.
- the peak wavelength of PL emission can be surely increased (that is, the peak wavelength can be set to 1.2 ⁇ m or more at room temperature), which is very advantageous in practice.
- the first growth temperature is 490 ° C. or more and 530 ° C. or less
- the quantum dot growth rate in the second formation step is 0.02 ML / s ( Monomolecular layer / second) to 0.4 ML / s
- the second growth temperature is 420 ° C. to 480 ° C.
- the growth rate of the cap layer in the third formation step is 0.1 ML / s s to 0.5 ML / s.
- the peak wavelength of PL emission can be about 1.3 ⁇ m at room temperature.
- the dose of As molecular beam in the second formation step is 1 ⁇ 10 ⁇ 5 Torr.
- the temperature of the semiconductor substrate is lowered by 20 ° C./min or more and 35 ° C./min or less after the second formation step and before the third formation step. And a temperature lowering step.
- the peak intensity of PL emission can be increased, which is very advantageous in practice.
- the formed quantum dots have a diameter of 30 nm to 60 nm, and the formed quantum dots have a height of 15 nm or less.
- the peak wavelength of PL emission can be about 1.3 ⁇ m at room temperature.
- the diameter and height of the quantum dots are based on values measured by an AFM (Atomic Force Microscope) before forming the cap layer.
- a first semiconductor device of the present invention includes quantum dots formed by the semiconductor device manufacturing method of the present invention described above (including various aspects thereof).
- the quantum dot formed by the above-described method for manufacturing a semiconductor device of the present invention is provided, a semiconductor device having a relatively high quantum confinement effect can be provided.
- the manufacturing cost of the semiconductor device can be reduced, which is very advantageous in practice.
- a second semiconductor device of the present invention is a semiconductor device in which the peak wavelength of PL emission is 1.2 ⁇ m or more and 1.3 ⁇ m or less at a temperature of 300 K, and includes a semiconductor substrate and the semiconductor An active layer formed on a substrate, wherein the active layer covers a buffer layer containing GaAs, a quantum dot formed on the buffer layer and containing InAs, and the quantum dot And a volume of at least a part of the quantum dots is 800 nm 3 or more and 3000 nm 3 or less.
- the semiconductor device is a semiconductor device having a PL emission peak wavelength of 1.2 ⁇ m or more and 1.3 ⁇ m or less at a temperature of 300K.
- the semiconductor device includes a semiconductor substrate such as a GaAs substrate and an active layer formed on the semiconductor substrate.
- the active layer includes a buffer layer containing GaAs, a quantum dot formed on the buffer layer and containing InAs, and a cap layer formed to cover the quantum dot and containing GaAs. Configured.
- the volume of at least some of the formed quantum dots is 800 nm 3 or more and 3000 nm 3 or less.
- the volume of the quantum dot is a value obtained by assuming that the shape of the quantum dot is a cone based on an image observed with a transmission electron microscope (TEM).
- the peak wavelength of PL emission can be about 1.3 ⁇ m at room temperature.
- the semiconductor device can be applied to optical fiber transmission.
- at least a portion of the volume of the quantum dots of the plurality of quantum dots formed in order to 800 nm 3 or more 3000 nm 3 or less, the quantum dots are formed by the method of manufacturing a semiconductor device of the present invention described above. Therefore, a semiconductor device having a relatively high quantum confinement effect can be provided.
- the manufacturing cost of the semiconductor device can be reduced, which is very advantageous in practice.
- the thickness of the cap layer is larger than the height of the quantum dots.
- the quantum confinement effect can be surely obtained, which is very advantageous in practice.
- FIG. 2 is a process diagram illustrating a buffer layer forming process subsequent to the process of FIG. 1.
- FIG. 3 is a process diagram illustrating a quantum dot formation process subsequent to the process of FIG. 2.
- It is an example of the experimental value which shows the relationship between the substrate temperature and the quantum dot diameter for each growth amount of the InAs layer when the growth rate is 0.04 ML / s.
- It is an example of the experimental value which shows the relationship between the substrate temperature and the quantum dot height when the growth rate is 0.04 ML / s for each growth amount of the InAs layer.
- FIG. 1 is a process diagram showing a part of the process of the forming method according to the present embodiment.
- FIG. 1 detailed members of the MBE growth apparatus 200 are omitted as appropriate, and only directly related members are shown.
- the inside of the growth chamber 201 is set to 1 ⁇ 10 ⁇ 9 Torr or less, for example.
- As is irradiated from the evaporation source 214 to the GaAs substrate 110 at an irradiation amount of, for example, about 1 ⁇ 10 ⁇ 5 Torr.
- the substrate temperature of the GaAs substrate 110 is heated to, for example, about 600 degrees Celsius by the substrate rotation heating mechanism 211, and the surface of the GaAs substrate 110 is cleaned.
- FIG. 2 is a process diagram showing a buffer layer forming process subsequent to the process of FIG. In FIG. 2, illustration of members related to the MBE growth apparatus 200 is omitted (hereinafter the same).
- the doses of As and Ga are set as doses that allow the GaAs buffer layer 120 to grow at a growth rate of about 1 ML / s, for example.
- the thickness of the formed GaAs layer is, for example, about 150 nm.
- the substrate temperature is set to a temperature of 490 ° C. or higher and 530 ° C. or lower as an example of the “first growth temperature” according to the present invention.
- As and In are irradiated from the evaporation sources 214 and 213 onto the GaAs buffer layer 120, respectively.
- a plurality of quantum dots 131 containing InAs are formed on the upper surface 130a of the InAs layer 130 by self-organized growth.
- an InAs layer 130 is formed on the GaAs buffer layer 120 as shown in FIG.
- FIG. 3 is a process diagram showing a quantum dot forming process following the process of FIG.
- the doses of As and In are set as doses that allow the InAs layer 130 to grow at a growth rate of 0.02 ML / s to 0.4 ML / s.
- the growth amount of the InAs layer 130 is, for example, 1.8 ML.
- the diameter of the quantum dot 131 is 30 nm or more and 60 nm or less, and the height of the quantum dot 131 is 15 nm or less.
- the diameter of the quantum dot 131 is 30 nm or more and 60 nm or less. It is within the range (see FIG. 5), and it can be seen that the height of the quantum dot 131 is 15 nm or less (see FIG. 6).
- the experimental values shown in FIGS. 5 and 6 are values measured by AFM before the GaAs cap layer 140 is formed.
- the substrate temperature is lowered to a temperature of 420 ° C. or higher and 480 ° C. or lower as an example of the “second growth temperature” according to the present invention.
- the temperature decrease rate of the substrate temperature is in the range of 20 ° C./min to 35 ° C./min.
- As and Ga are irradiated from the evaporation sources 214 and 213 so as to cover the quantum dots 131, respectively.
- a GaAs cap layer 140 is formed as shown in FIG.
- FIG. 4 is a process diagram showing a cap layer forming process subsequent to the process of FIG.
- the doses of As and Ga are set as doses at which the GaAs cap layer 140 can grow at a growth rate of 0.1 ML / s to 0.5 ML / s.
- the formed cap layer 140 has a thickness of 24 nm, for example.
- the portion from the GaAs substrate 110 to the GaAs cap layer 140 constitutes an example of the “semiconductor device” according to the present invention.
- the “buffer layer forming step”, “quantum dot forming step”, and “cap layer forming step” according to the present embodiment are respectively referred to as “first forming step”, “second forming step”, and “ It is an example of a “third forming step”.
- the growth temperature of the quantum dots 131 (that is, the “first growth temperature” according to the present invention) is 510 ° C.
- the growth temperature of the GaAs cap layer 140 (that is, the present invention).
- the “second growth temperature”) is 450 ° C.
- the growth temperature of the quantum dots 131 relating to the semiconductor device according to the comparative example is 510 ° C.
- the growth temperature of the GaAs cap layer 140 is 510 ° C. All other conditions are the same.
- FIG. 7 is an example of experimental data showing the change in the peak of PL emission when the growth temperature of the cap layer is changed.
- the PL emission spectrum at room temperature of the semiconductor device according to the present embodiment is indicated by a solid line
- the PL emission spectrum at room temperature of the semiconductor device according to the comparative example is indicated by a dotted line.
- a peak of PL emission appears in the vicinity of a wavelength of 1.3 ⁇ m.
- the semiconductor device according to the comparative example there is no PL emission peak at a wavelength of 1.2 ⁇ m or more. That is, by making the growth temperature of the GaAs cap layer 140 lower than the growth temperature of the quantum dots, the peak wavelength of PL emission is lengthened (that is, the peak wavelength is set to 1.2 ⁇ m or more at room temperature). You can see that
- FIG. 8 is another example of experimental data showing the change in the peak of PL emission when the growth temperature of the cap layer is changed.
- the conditions other than the growth temperature of the GaAs cap layer 140 are all the same.
- the peak wavelength of PL emission from the ground level of the quantum dots 131 becomes longer as the growth temperature of the GaAs cap layer 140 is lower.
- the intensity of PL emission from the ground level of the quantum dots 131 increases as the growth temperature of the GaAs cap layer 140 decreases.
- the reason why the peak of PL emission does not appear at a wavelength of 1.2 ⁇ m or more is that (i) surface segregation of indium is suppressed (ii) due to thermal energy Migration is not sufficiently performed and lattice mismatch of GaAs / InAs is not relaxed. (Iii) It is considered that light emission energy is absorbed by interband levels generated due to dislocations in the GaAs cap layer 140. .
- FIG. 9 is an example of experimental data showing a change in the peak of PL emission when the growth temperature of the cap layer is fixed and the growth temperature of the quantum dots is changed.
- the formation conditions of the InAs layer 130 other than the growth temperature of the quantum dots 131 are a growth rate of 0.04 ML / s and a growth amount of 1.8 ML. Further, after the quantum dots 131 were formed, the substrate temperature was raised to 450 ° C. while irradiating As, and then the GaAs cap layer 140 was formed. The wavelength of the excitation light source irradiated to the semiconductor device is 532 nm, and the incident intensity is 0.2 mW.
- FIGS. 8 and 9 there is a PL emission peak in the vicinity of a wavelength of 1060 nm. This is a case where the laser beam irradiated for the measurement of the PL emission characteristic is detected as noise ( The same applies to FIGS. 11 and 12).
- FIG. 10A is an example of experimental data showing a change in the peak of PL emission when one of the growth temperature of the cap layer and the growth temperature of the quantum dots is changed
- the half width of the PL emission spectrum having a peak wavelength of 1.3 ⁇ m (that is, photon energy 0.95 eV) is 26 meV.
- FIG. 11 is an example of experimental data showing changes in the peak of PL emission when the temperature drop rate of the substrate is changed between the quantum dot formation step and the cap layer formation step.
- the growth temperature of the quantum dots 131 is 510 ° C.
- the growth rate of the quantum dots 131 is 0.028 ML / s
- the growth amount of the quantum dots 131 is 1.8 ML.
- the growth temperature of the GaAs cap layer 140 is 420 ° C.
- the PL emission intensity changes as the temperature drop rate changes. That is, the intensity of PL light emission can be increased by appropriately controlling the temperature lowering rate.
- FIG. 12 is an example of experimental data showing changes in the peak of PL emission when the thickness of the cap layer is changed.
- the growth temperature of the quantum dots 131 is 510 ° C.
- the growth rate of the quantum dots 131 is 0.028 ML / s
- the growth amount of the quantum dots 131 is 1.8 ML.
- the growth temperature of the GaAs cap layer 140 is 430 ° C.
- the growth rate of the GaAs cap layer 140 is 0.2 ML / s.
- the PL emission intensity changes as the thickness of the GaAs cap layer 140 changes. This is because as the GaAs cap layer 140 becomes thicker, the number of electron-hole pairs generated in GaAs increases. That is, the intensity of PL light emission can be increased by appropriately controlling the thickness of the GaAs cap layer 140.
- FIG. 13 is an example of experimental data indicating the size and volume of quantum dots based on a TEM image.
- the volume of the quantum dot 131 in which the peak wavelength of PL emission is in the range of 1.2 ⁇ m to 1.3 ⁇ m is 800 nm 3 to 3000 nm 3 , the diameter is 20 nm to 30 nm, and the height is 15 nm. It turns out that it is the following.
- the volume of the quantum dot 131 is a value obtained by assuming that the quantum dot shape is a cone.
- the values measured by the AFM shown in FIGS. 5 and 6 and the values measured by the TEM shown in FIG. 13 are different from each other. It has been found by research. The difference in the measurement method particularly affects the value of the diameter of the quantum dot 131, and it has been found by the inventor's research that the value measured by TEM by about 15 nm is smaller than the value measured by AFM.
- the quantum dots containing InAs are formed by repeatedly forming the quantum dots containing InAs on the GaAs cap layer 140 by the above-described method and coating the quantum dots with GaAs as described above. May be multilayered.
- the present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the gist or concept of the invention that can be read from the claims and the entire specification, and the manufacture of a semiconductor device with such changes A method and a semiconductor device are also included in the technical scope of the present invention.
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Abstract
Description
本実施形態に係る半導体装置の製造方法について、図1乃至図4を参照して説明する。
次に、上述の製造方法により製造された、本実施形態に係る半導体装置について、図7乃至図13を参照して説明する。
120 GaAsバッファ層
130 InAs層
131 量子ドット
140 GaAsキャップ層
200 MBE成長装置
211 基板回転加熱機構
212、213、214 蒸発源
Claims (9)
- 温度300Kにおいて、PL発光のピーク波長が1.2μm以上となる半導体装置の製造方法であって、
半導体基板上に、GaAsを含んでなるバッファ層を形成する第1形成工程と、
前記形成されたバッファ層上に、InAsを含んでなる量子ドットを自己形成させる第2形成工程と、
前記形成された量子ドットを覆うように、GaAsを含んでなるキャップ層を形成する第3形成工程と
を備え、
前記第2形成工程において前記量子ドットを自己形成させる際の温度である第1成長温度よりも、前記第3形成工程において前記キャップ層を形成する際の温度である第2成長温度が低い
ことを特徴とする半導体装置の製造方法。 - 前記第1成長温度は、前記ピーク波長が長波長化するように設定されていることを特徴とする請求項1に記載の半導体装置の製造方法。
- 前記第1成長温度は、490℃以上530℃以下であり、
前記第2形成工程における前記量子ドットの成長速度は、0.02ML/s以上0.4ML/s以下であり、
前記第2成長温度は、420℃以上480℃以下であり、
前記第3形成工程における前記キャップ層の成長速度は、0.1ML/s以上0.5ML/s以下である
ことを特徴とする請求項1に記載の半導体装置の製造方法。 - 前記第2形成工程におけるAs分子線の照射量は、1×10-5Torrであることを特徴とする請求項1に記載の半導体装置の製造方法。
- 前記第2形成工程の後、前記第3形成工程の前に、前記半導体基板の温度を、20℃/min以上35℃/min以下で降温する降温工程を更に備えることを特徴とする請求項1に記載の半導体装置の製造方法。
- 前記形成された量子ドットの直径は、30nm以上60nm以下であり、
前記形成された量子ドットの高さは、15nm以下である
ことを特徴とする請求項1に記載の半導体装置の製造方法。 - 請求項1乃至4のいずれか一項に記載の半導体装置の製造方法により形成された量子ドットを備えることを特徴とする半導体装置。
- 温度300Kにおいて、PL発光のピーク波長が1.2μm以上1.3μm以下となる半導体装置であって、
半導体基板と、
前記半導体基板上に形成された活性層と
を備え、
前記活性層は、
GaAsを含んでなるバッファ層と、
前記バッファ層上に形成され、InAsを含んでなる量子ドットと、
前記量子ドットを覆うように形成され、GaAsを含んでなるキャップ層と
を含み、
前記量子ドットの少なくとも一部の体積は、800nm3以上3000nm3以下である
ことを特徴とする半導体装置。 - 前記キャップ層の厚さは、前記量子ドットの高さよりも大きいことを特徴とする請求項8に記載の半導体装置。
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US13/384,827 US20120119188A1 (en) | 2009-07-24 | 2009-07-24 | Semiconductor apparatus manufacturing method and semiconductor apparatus |
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JP2005079182A (ja) * | 2003-08-28 | 2005-03-24 | Univ Tokyo | 半導体量子ドット素子及びその製造方法 |
JP2006080293A (ja) * | 2004-09-09 | 2006-03-23 | Univ Of Electro-Communications | 量子ドットの形成方法 |
JP2006351956A (ja) * | 2005-06-17 | 2006-12-28 | Univ Of Tokyo | 化合物半導体結晶の成長方法、その成長方法を用いて成長した化合物半導体結晶の層を備えた半導体装置及び半導体基板 |
JP2008091420A (ja) * | 2006-09-29 | 2008-04-17 | Fujitsu Ltd | 量子ドット光半導体素子の製造方法 |
JP2009141032A (ja) * | 2007-12-05 | 2009-06-25 | Fujitsu Ltd | 半導体装置の製造方法及び半導体装置 |
JP2009164194A (ja) * | 2007-12-28 | 2009-07-23 | Fujitsu Ltd | 量子ドット構造を備えた半導体光装置の製造方法 |
Cited By (2)
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JP2019120668A (ja) * | 2018-01-11 | 2019-07-22 | 国立大学法人 和歌山大学 | 3次元量子構造の評価方法、3次元量子構造評価装置、及びコンピュータプログラム |
JP7054511B2 (ja) | 2018-01-11 | 2022-04-14 | 国立大学法人 和歌山大学 | 3次元量子構造の評価方法、3次元量子構造評価装置、及びコンピュータプログラム |
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