WO2011007492A1 - 荷電粒子線顕微鏡及びそれを用いた測定方法 - Google Patents
荷電粒子線顕微鏡及びそれを用いた測定方法 Download PDFInfo
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Definitions
- the present invention relates to a charged particle beam microscope such as a scanning electron microscope or an ion microscope and a measurement method using the same.
- Charged particles such as Scanning Electron Microscope (SEM), Scanning Transmission Electron Microscope (STEM), and Transmission Electron Microscope (TEM) that can observe the structure of a sample with a spatial resolution on the order of nanometers (nm) in semiconductor device development and nanomaterial development Sample structure analysis with a line microscope is essential.
- SEM Scanning Electron Microscope
- STEM Scanning Transmission Electron Microscope
- TEM Transmission Electron Microscope
- the charged particle beam device is disclosed in Patent Documents 1 and 2, for example.
- Sample drift is one of the obstacles to high accuracy. If there is sample drift, the captured image will be blurred or distorted. This is shown in FIGS. 2A to 2C.
- FIG. 2A shows the original image.
- the STEM scans the sample with a finely focused electron beam, detects the electron beam transmitted through the sample, and forms an image in synchronization with the scanning signal.
- the STEM detects secondary electrons and reflected electrons.
- the SEM is formed.
- the image is blurred or distorted depends on the shooting method.
- a Fast scan method in which a plurality of images are formed by scanning a beam at a high speed, and a stored image is captured by integrating them
- a Slow scan method in which a stored image is captured in a single low-speed scan.
- the sample drift causes a visual field shift between frames.
- the stored image is blurred in the drift direction (FIG. 2B).
- the sample drift generates image distortion in the drift direction (FIG. 2C).
- the sample drift acts as image blur for a TEM that forms an image by irradiating the sample with an electron beam in parallel and detecting the electron beam transmitted through the sample with a camera.
- Patent Document 1 describes a drift correction technique in SEM.
- the influence of drift is reduced by capturing a plurality of Fast scan frame integration images and integrating the frame integration images while correcting the visual field deviation between the images. Obtaining a desired target image is described.
- two Fast scan frame integrated images are taken, a field shift between the images is obtained, and an image shift deflector (hereinafter abbreviated as image shift) or a sample stage is used to cancel the field shift.
- image shift an image shift deflector
- the target image is shot by the Slow scan method
- two fast scan frame integration images are taken before, after, or after shooting the saved image, and the amount of deviation between the images is obtained. It is described that the horizontal and vertical deformation amounts of the stored image are obtained from the above, and the captured stored image F0 is deformed to construct a new target image F0 ′.
- Patent Document 2 describes the following technology.
- the first scanning electron microscope detects the amount of visual field drift by matching the image data of a small area inside or outside the observation area with the image data of the small area obtained by scanning after a certain period of time. And means for correcting the scanning position of the electron beam relative to the sample so as to compensate for the detected visual field drift.
- the second scanning electron microscope detects the amount of visual field drift by matching the image data of a small area inside or outside the observation area with the image data of the small area obtained by scanning after a certain period of time. And means for shifting and integrating pixels in the integration so as to compensate for the detected visual field drift.
- the third scanning electron microscope has a means for storing a signal for the line scan obtained from the sample by one line or a plurality of line scans on the sample of the electron beam, and is adjacent to the signal obtained by the line scan as a unit. And a means for shifting the pixels for each unit and storing them in the image memory so that the correlation is maximized by the correlation processing.
- drift correction is insufficient when, for example, the field diameter is set to a high magnification of about 250 nm ⁇ 250 nm.
- An object of the present invention is to provide a charged particle beam apparatus which is not affected by the sample drift even at a high magnification or has a very small effect, and a measurement method using the charged particle beam apparatus.
- a charged particle generation source a charged particle generation source control circuit for controlling the charged particle generation source, and a sample irradiated with charged particles emitted from the charged particle source are mounted.
- a sample stage a sample stage control circuit for controlling the sample stage, a detector for detecting charged particles from the sample, a detector control circuit for controlling the detector, a computer for controlling the control circuits,
- a charged particle beam microscope having a display unit connected to a computer, wherein the computer records a plurality of images created using charged particles from a specific pattern formed on the sample surface at different times
- a recording unit that calculates a visual field deviation amount between the plurality of images using the specific pattern in the image, and a sample drift from the visual field deviation amount.
- the charged particle beam microscope comprising: an analysis unit for obtaining an approximate function used for correction of the field displacement, the.
- a plurality of images including the specific pattern are obtained at different times.
- a charged particle generation source a charged particle generation source control circuit for controlling the charged particle generation source, a sample stage on which a sample irradiated with charged particles emitted from the charged particle source is mounted, and a sample for controlling the sample stage A stage control circuit; a detector for detecting charged particles from the sample; a detector control circuit for controlling the detector; a computer for controlling the control circuits; and a display unit connected to the computer.
- the display unit sets a correction condition for correcting a visual field shift in a captured image obtained based on charged particles from the sample, and a sample drift of the sample used for correcting the visual field shift.
- a charged particle beam microscope is characterized in that an approximation function for approximating a trajectory and an imaging end condition setting for the sample can be set.
- FIG. 5 is a diagram for explaining image blur and image distortion due to sample drift, and shows an original image. It is a figure for demonstrating the image blur and image distortion by sample drift, and shows the image blurred by sample drift. It is a figure for demonstrating the image blur and image distortion by sample drift, and shows the image distorted by sample drift.
- the present inventors have corrected the visual field deviation by converting the visual field deviation amount obtained from the visual field deviation measurement image into a correction amount or a sample drift speed as it is in the conventional technique. Therefore, it has been found that high-precision correction may not be executed. Specifically, this is a case where the measurement error of visual field deviation cannot be ignored.
- the measurement error of visual field deviation increases.
- the shooting magnification is increased, the size of one pixel is reduced, but the resolution of the STEM has an upper limit.
- the pixel size is smaller than the resolution, the image is blurred.
- the resolution when a sample with a sample thickness of several hundred nm is observed with a general-purpose STEM is about 1 nm.
- the pixel size is 0.5 nm.
- the field-of-view shift amount of an image shot under such conditions includes a measurement error of about ⁇ 0.5 pixels.
- the sample drift amount during image capturing assumed in the general-purpose STEM is several nm to several tens of nm.
- the measurement error of 0.5 nm is 50% for 1 nm and 5% for 10 nm, and cannot be ignored.
- FIG. 16 shows an example of a time variation of the sample drift after the sample stage is stopped in the STEM / TEM sample stage.
- a waiting time of about 5 minutes is required until the sample drift speed during imaging converges to a substantially constant state.
- manual focus / astigmatism adjustment is performed before shooting, so a time of about 5 minutes is always set between the sample stage stop and shooting.
- TAT is greatly reduced by providing a waiting time of 5 minutes for the sample drift speed to converge. Because it does. It is necessary to be able to perform highly accurate correction even if the sample drift speed changes.
- FIG. 3 shows a basic flow of the sample drift correction system using the charged particle beam microscope according to the embodiment.
- the sample drift correction system includes a step 1 for obtaining an approximate function of sample drift before capturing a stored image, a step 2 for capturing a stored image while correcting the drift, and a step for creating a target image in which the influence of the sample drift is reduced from the stored image. It consists of three.
- FIG. 4 shows a flow when a stored image is taken by the Slow scan method.
- the sample drift speed is conventionally obtained from the field deviation amount of two images.
- a plurality of field deviation amounts are obtained from three or more images.
- An approximate function of sample drift is obtained from this locus.
- the first captured image is used as a reference image
- the subsequent captured image is used as an input image to obtain a visual field shift amount with respect to the reference image, and is corrected by image shift. Since the field of view follows the sample drift by the image shift, the locus of the image shift control value can be regarded as the locus of the sample drift.
- the influence of the field deviation measurement error which is another problem, can be reduced.
- the sample drift can be assumed to be a smooth movement
- the high frequency component included in the sample drift trajectory can be regarded as a visual field shift measurement error.
- smoothing processing such as addition averaging and frequency processing such as low-pass filter may be performed before fitting.
- An appropriate correction may be applied to the approximate function as necessary.
- a sample drift vector is obtained by approximating the sample drift before imaging by a linear expression, and correction during imaging is performed by a value obtained by multiplying this vector by an appropriate coefficient, for example, 0.5 to 1.0. It is estimated that the sample drift velocity is gradually decreasing just after the sample stage is stopped, but the field-of-view deviation measurement error is large, and the fitting result becomes unstable if the sample drift locus is approximated by a second-order polynomial or higher. It is effective in the case.
- the coefficient is adjusted according to the time after the stage stops and the characteristics of the stage.
- step 2 a stored image is taken while controlling the image shift so as to cancel the sample drift based on the obtained approximate function.
- a target image in which the influence of the sample drift is reduced is created from the stored image.
- the sample drift during imaging is corrected with the approximate function 101 obtained from the sample drift trajectory before imaging, there may be a deviation from the actual sample drift. Therefore, the sample drift is measured even after the stored image is photographed, and the approximate function 102 is obtained from the locus of the sample drift before and after the photographing.
- the difference between the approximate function 101 and the approximate function 102 is regarded as a deviation between the actual drift and the correction amount, and an approximate function of the field deviation during photographing is obtained from this deviation.
- image distortion caused by visual field deviation is corrected by image processing.
- the intensity of each pixel in the discrete image is I (xn, yn).
- xn and yn are integers.
- Correction data is generated by shifting the visual field shift amount ( ⁇ x (t), ⁇ y (t)) of each pixel at the photographing time t. Since ( ⁇ x (t), ⁇ y (t)) is a real number, the intensity of each pixel is obtained by interpolation calculation to create a target image. When the difference between the actual sample drift and the correction amount is small, correction by image processing can be omitted. Further, correction by image shift can be omitted and correction can be performed only by image processing.
- Step 1 is the same as in the case of the slow scan method.
- step 2 a plurality of frame integrated images obtained by integrating several Fast scan images while correcting the sample drift by image shift are captured and stored.
- the frame integrated image includes one integrated image.
- step 3 the visual field shift amount of each frame integrated image with respect to the reference image is obtained, and the frame integrated image is integrated while correcting this to create a target image.
- the measured field deviation amount is directly converted into a correction amount.
- the field deviation locus is obtained, and the field deviation approximation function 103 is obtained from this locus.
- the measured trajectory is considered to be a combination of a smooth curve caused by sample drift and fine rattling caused by a visual field shift measurement error.
- the suppression of high-frequency components includes smoothing processing such as addition averaging, frequency processing using a low-pass filter, and fitting processing to a polynomial of an appropriate order. Furthermore, the correction shown in FIG. 9A can be performed by using an approximate function.
- the number of accumulated frame images to be saved in step 2 is reduced, and if possible, the number is accumulated to save the first frame accumulated image. Since the first frame integrated image has a low SN that makes it difficult to measure the visual field deviation by image processing, the first frame integrated image is integrated every several frames, and a second frame integrated image of SN capable of visual field deviation measurement is created. To do. A locus of visual field deviation is obtained using the second frame integrated image, and an approximate function of visual field deviation is obtained.
- a visual field shift amount of the first frame integrated image is obtained using this approximate function, and is integrated while correcting the visual field shift to create a third frame integrated image. Since image blur due to visual field shift is reduced, the third frame integrated image is sharper than the second frame integrated image. Using the third frame integrated image reduces the error in measuring the field deviation amount. Therefore, the locus of visual field deviation is measured again using the third frame integrated image to obtain an approximate function of the field deviation.
- sample drift amount is small, it is possible to omit drift measurement before photographing in step 1 and drift correction during photographing by image shift in step 2.
- the case where the sample drift amount is small refers to the case where the drift amount is about the measurement error or less.
- the visual field deviation amount is directly converted into the correction amount or the sample drift speed, but in this embodiment, an approximate function used for correcting the sample drift is obtained from a plurality of visual field deviation amounts, and this approximate function is used. It is corrected.
- One of the effects of using the approximate function is to reduce the influence of the visual field shift measurement error.
- the visual field deviation measurement error is directly reflected in the correction error.
- Another effect of correcting based on the approximate function is that highly accurate drift correction is possible even when the sample drift velocity changes with time.
- the measurement TAT is measured with a waiting time until the sample drift becomes almost constant. Is significantly reduced.
- the waiting time can be shortened without degrading the correction accuracy.
- drift correction when it is desired to observe the image contrast due to charging by SEM observation, a desired image contrast may not be obtained if a waiting time is provided until the sample drift becomes substantially constant. Even if the sample drift changes with time, it is necessary to apply drift correction, which can be said to be an example in which the effect of improving the precision of drift correction according to the present embodiment is significant. As described above, according to the present embodiment, the accuracy of sample drift correction and TAT improvement are improved, and the efficiency of measurement, inspection, and analysis of nanodevices and nanomaterials using an electron microscope is greatly improved.
- This example shows an example in which the sample drift automatic correction system is applied to STEM slow scan imaging. Items described in the column for carrying out the invention and not described in the present embodiment are the same as those for carrying out the invention.
- FIG. 10 shows a basic configuration diagram of the STEM / SEM used in the examples.
- Electron gun 11 that generates the primary electron beam 31 and its control circuit 11 ′, irradiation lenses 12-1 and 12-2 that converge the primary electron beam 31, and its control circuit 12 ′, the divergence angle of the primary electron beam 31 And the control circuit 13 'for controlling the angle, the axis deviation correcting deflector 14 for controlling the incident angle with respect to the sample 30, the control circuit 14', and the beam shape of the primary electron beam 31 incident on the sample 30 are corrected.
- the scanning deflector 17 for raster scanning and its control circuit 17 ′, the objective lens 18 for adjusting the focal position of the primary electron beam 31 with respect to the sample 30 and its control circuit 18 ′, and the sample 30 The sample stage 19 and its control circuit 19 'for setting the position and rotation angle with respect to the electron beam 31, the electron detector 22 for detecting the electron beam 32 generated from the sample 30 and its control circuit, and the electron beam 32 for the electron beam detector Projection lens 20 and its control circuit 20 'for projecting onto 22, deflector 21 for deflecting electron beam 32 and its control circuit 21', diaphragm 23 for controlling the divergence angle of electron beam 32 and its control circuit 23 ', electron beam It comprises an image forming circuit 28 that forms a STEM / SEM image from the detector output signal
- the computer 29 includes a recording unit 29-1 for recording a plurality of images, a calculation unit 29-2 for measuring the amount of visual field deviation between images, an analysis unit 29-3 for obtaining an approximation function used for visual field deviation correction, and an image.
- a display unit 29-4 for displaying calculation results and analysis results is mounted.
- Each control circuit and image forming circuit are command-controlled by a computer 29.
- the present apparatus is equipped with a plurality of electron beam detectors 22.
- the bright field detector 22-1 for detecting the low angle scattered electrons 32-1 and the high angle scattered electrons 32.
- -2 for detecting -2 and a detector 22-3 for detecting reflected electrons and secondary electrons 32-3 emitted to the rear of the sample 30.
- control circuits 22-1 ', 22-2' and 22-3 ' are provided.
- an image formed with electrons emitted to the front of the sample 30 is referred to as a STEM image, and an image formed with electrons emitted to the rear of the sample 30 is referred to as an SEM image.
- the transmission electron beam can be spectrally measured by the energy loss electron spectrometer 41 and its control circuit 41 'by splitting it into an elastic scattered transmission electron beam 32-4 and an inelastic scattered transmission electron beam 32-5.
- X-rays generated from the sample can be measured by the energy dispersive X-ray spectrometer 40 and its control circuit 40 '. By using the energy dispersive X-ray spectrometer 40 and the energy loss electron spectrometer 41, the composition and chemical bonding state of the sample can be analyzed.
- An image obtained by the surface analysis of the energy dispersive X-ray spectrometer 40 is called an EDX image
- an image obtained by the surface analysis of the energy loss electron spectrometer 41 is called an EELS image.
- a direction substantially parallel to the optical axis of the housing 200 is defined as a Z direction, and a surface substantially orthogonal to the optical axis is defined as an XY plane.
- Fig. 4 shows the flow of sample drift correction when a stored image is taken by the Slow scan method.
- a reference image used for visual field shift measurement is taken (S1-1).
- STEM has two image forming modes for display and storage.
- the storage image is an image to be stored in an electronic file, and a high-quality image is taken for about 10 seconds.
- the display image is an image for display on the monitor. Although the image quality is low, the image can be taken into the image processing apparatus at any time.
- a display image is used to measure the sample drift.
- the value of each pixel in the image is sequentially updated by electron beam scanning, so that if there is a sample drift, different fields of view are photographed at the top and bottom of the image. Therefore, if the start of scanning is not synchronized with the timing to be captured by the image processing apparatus, the visual field deviation is measured using images obtained by photographing different visual fields at the top and bottom of the image. Although it is not impossible to monitor the scan waveform and synchronize the timing, it complicates the system.
- the display image of the Fast scan method is a frame integration image of the latest n Fast scan images. If the sample drifts, the display image is blurred, but it is not necessary to synchronize the timing of taking it into the image processing apparatus with the electron beam scanning. That is, the shooting timing can be set freely.
- the Fast scan method display image is used for the visual field deviation measurement image. Thereafter, if there is no special notation other than during shooting, the visual field deviation measurement image is a Fast scan display image.
- the locus of the image shift control value can be regarded as the locus of the sample drift (S1-2).
- General-purpose image processing such as standardized cross-correlation method, phase-only correlation method, and least-squares method is used for visual field shift measurement. Since the method suitable for the visual field shift measurement differs depending on the input image, an appropriate method is selected with reference to the visual field shift measurement error and the correlation value. Note that in an apparatus in which a piezo stage for fine movement of the sample stage is mounted, the sample drift correction may be executed by the piezo stage instead of the image shift. By using a piezo stage, a moving distance of about 1 ⁇ m can be controlled on the order of 0.1 nm.
- the approximate function 101 of the sample drift is obtained from the locus of the sample drift (S1-3). It is assumed that the sample drift is a smooth movement, and the shakiness appearing on the measured sample drift trajectory is regarded as a visual field deviation measurement error. If the locus of visual field deviation is approximated by a complicated expression, the result becomes unstable. Therefore, a quadratic or lower order polynomial with time as a variable is suitable as the approximation function.
- ⁇ Appropriate correction may be applied to the approximate function obtained from Fitting as necessary.
- the sample drift velocity is obtained by approximating the sample drift before imaging by a linear expression, and correction during imaging is performed by multiplying this sample drift velocity by an appropriate coefficient, for example, 0.5 to 1.0. To do. Although it is estimated that the sample drift velocity is gradually decreasing just after the sample stage is stopped, the field-of-view measurement error is large, and the fitting result becomes unstable if the sample drift locus is approximated by a second-order polynomial or higher. It is effective in the case.
- the coefficient is adjusted according to the time after the stage stops and the characteristics of the stage.
- the correction accuracy is improved by setting so that a part of the measurement results can be selected instead of using all the results measured by the image processing for the estimation of the approximate function. For example, the setting of the visual field deviation measurement result whose correlation value between images is below a certain value is not used for estimation of the approximate function, and the result that is far away from the previous visual field deviation measurement result is not used for estimation of the approximate function. It is.
- the visual field shift amount measured first is the sample drift between S3-1 and S1-2 in FIG.
- setting is made to start measurement of the sample drift trajectory. Which approximate function is suitable is determined by measuring the amount of visual field deviation with respect to the reference image after taking a stored image and determining whether the visual field deviation amount is the smallest.
- step 2 take a saved image while correcting for drift (step 2).
- the image capturing method is set to Slow scan, and the stored image is imaged (S2-1) while controlling the image shift based on the approximate function of the sample drift (S2-2).
- the control of the image shift may be performed by sending a control value obtained from the approximation function at equal time intervals, for example, at intervals of 0.5 seconds, or by an equal movement amount, for example, a time for the control value change amount from the approximation function to be 0.1 pixel You may calculate and transmit a control value at the time.
- the transmission interval should be made finer as the magnification becomes higher. Therefore, the correction interval is automatically adjusted by linking to the magnification.
- a target image in which the effect of sample drift is reduced is created from the stored image (step 3).
- the sample drift during imaging is corrected with the approximate function 101 obtained from the sample drift trajectory before imaging, the actual sample drift may deviate.
- the sample drift is measured even after the stored image is photographed, and the approximate function 102 is obtained from the locus of the sample drift before and after the photographing (S3-2).
- the difference between the approximate function 102 and the approximate function 101 is regarded as a difference between the actual sample drift and the predicted drift, and an approximate function of the visual field deviation during imaging is obtained from this difference. Based on this approximate function, image distortion due to visual field deviation is corrected by image processing (S3-3).
- step 1 When obtaining the approximate function 102, in addition to the approximate function footing used in step 1, an interpolation function created by spline interpolation or the like may be used.
- step 1 since the sample drift during imaging is predicted from the trajectory before imaging, it is expected that the deviation from the actual sample drift is smaller when approximated by a polynomial than by extrapolation with an interpolation formula.
- step 3 since the sample drift during imaging is predicted from the trajectory before and after imaging, it is considered that the sample drift during imaging can be accurately predicted by interpolation using an interpolation formula. Which approximate function is used is selected with reference to the mean square residual between the locus of the sample drift and the approximate function.
- visual field shift amounts ⁇ x (t) and ⁇ y (t) at each time are obtained from the approximate function 101 and the approximate function 102.
- a method of creating a target image from a stored image using the obtained visual field deviation amounts ⁇ x (t) and ⁇ y (t) will be described with reference to FIG.
- the intensity of each pixel in the discrete image is I (xn, yn).
- xn and yn are integers.
- Correction data is generated by shifting the visual field shift amount ( ⁇ x (t), ⁇ y (t)) of each pixel at the photographing time t. Since ( ⁇ x (t), ⁇ y (t)) is a real number, the intensity of each pixel is obtained by interpolation calculation to create a target image.
- One image for visual field deviation measurement is photographed after photographing, and it is checked whether or not the visual field deviation amount is within an allowable range.
- the flow may be such that distortion correction is not performed on images within the range, and distortion correction is performed only on images outside the range. Drift correction during shooting by image shift may not be executed, but only drift correction after shooting by image processing may be executed.
- FIGS. 1A to 1C The screens for setting the above flow and setting the approximation function are shown in FIGS. 1A to 1C.
- a field display amount measured at each time a correction amount by image shift, that is, a graph displaying a locus of a sample drift and an approximation function, and a setting for opening a sub-window for setting a correction condition and an approximation function
- a button, a start button for instructing the start of drift correction, and an end button for instructing an end in the middle are arranged.
- Clicking the setting button displays a sub-screen corresponding to each button (FIG. 1B).
- a screen for inputting a drift correction number and correction interval before and after shooting a shooting time and a correction interval is displayed.
- the unit of the correction interval during shooting can be set to time or to distance.
- a function that approximates the locus of the sample drift is specified. Clicking the approximation method displays available approximation methods, so dragging and dropping to the specified method selects that method.
- FIG. 1C a sub-screen for setting parameters of the selected approximation method is displayed (FIG. 1C).
- Clicking on smoothing displays a sub-screen for setting parameters for smoothing. Set the necessary parameters and close the sub-screen.
- the shooting end condition setting first, it is selected whether to automatically determine whether re-shooting is necessary or not (FIG. 1B). If automatic is selected, enter the allowable field deviation tolerance and the upper limit of measurement repetition.
- the visual field deviation allowable range may be set to a fixed value, or may be set to a reference that varies depending on the sample, such as 3 ⁇ of the visual field deviation amount and the square residual of the approximate function with respect to the locus of the sample drift. If it is less than the permissible range of visual field deviation, the process proceeds to the next step (S3-2) because it is not necessary to re-correct, and if it is greater than the permissible range, it starts again from the drift measurement (S1-2) before photographing (FIG. 4).
- the approximate function 102 is obtained only by measuring the trajectory of the sample drift after imaging, and the correction number is set otherwise. Only a determination is made as to whether or not the visual field deviation amount is within an allowable range once.
- the sample deviation amount is equal to or larger than the distortion correction application range
- the trajectory of the sample drift after imaging is measured at the correction number and correction interval specified in the correction condition setting, and distortion correction by image processing is executed.
- the distortion correction application range is set to infinity, distortion correction is not performed on all images.
- the administrator may create a recipe, and the general user may read out the designated recipe.
- both rotating series image photography for CT and device length measurement by STEM take a large number of images at a high magnification, but the type of sample folder used and the moving procedure of the sample stage are also different.
- the parameters of the sample drift correction system are adjusted according to each condition, stored as a recipe, and read out when used.
- the present embodiment it is possible to provide a STEM / SEM that has no or very little influence of sample drift even when the field diameter is as high as about 250 nm ⁇ 250 nm, and a measurement method using the STEM / SEM.
- Fig. 8 shows the flow of sample drift correction when a saved image is taken by the Fast scan method.
- the step (step 1) for obtaining the approximate function of the sample drift trajectory before the stored image is photographed is substantially the same as in the first embodiment.
- a frame integrated image obtained by integrating a predetermined number of Fast scan images is used as the stored image.
- step 3 the locus of visual field shift of this frame integrated image with respect to the reference image is obtained (S3-1).
- the procedure is repeated from the sample drift measurement (S1-2) before photographing.
- the approximate function 103 for visual field deviation is obtained from the locus of visual field deviation during photographing (S3-2)
- the high frequency component appearing in the measured trajectory is regarded as the visual field deviation measurement error and is reduced by calculation.
- smoothing processing such as addition averaging is performed on the trajectory. Apply a low pass filter to the trajectory.
- the locus may be approximated to a polynomial function of an appropriate order. A plurality of processes such as approximation to a polynomial may be performed after smoothing or filtering.
- the frame integrated image is integrated while correcting the visual field shift to obtain a target image (S3-3).
- a target image S3-3
- an image with greatly reduced image blur and image distortion could be obtained.
- the pattern size formed on the sample surface was measured using the image created in this way, a result in which an error of several nm due to image blur and image distortion was reduced was obtained.
- step 1 when the result that the sample drift speed is slow is obtained in step 1, the drift correction by the image shift performed in step 2 can be omitted. Further, if it can be assumed that the sample drift speed is sufficiently slow, the sample drift measurement in step 1 can be omitted.
- processing shown in FIG. 9A and FIG. 9B can be performed by describing the visual field shift with an approximate function.
- the number of accumulated frame images to be saved in step 2 is reduced, and if possible, the number is accumulated to save the first frame accumulated image.
- the first frame integrated image Since the first frame integrated image has a low SN that makes it difficult to measure the visual field deviation by image processing, the first frame integrated image is integrated every several frames, and a second frame integrated image of SN capable of visual field deviation measurement is created. To do. The locus of visual field shift with respect to the reference image is measured using the second frame integrated image, and the approximate function 103 is obtained.
- An interpolation formula such as spline interpolation is suitable for the approximate function 103. If the visual field deviation measurement error is large, polynomial approximation may be used. Further, after smoothing the locus, spline interpolation or polynomial approximation may be applied. The approximation method is selected with reference to the mean square residual between the locus and the approximation function.
- a third frame integrated image in which a shift between the first frame integrated images is corrected based on the obtained approximate function is created. Since image blur due to sample drift is reduced, the third frame integrated image is sharper than the second frame integrated image. The use of the third frame integrated image reduces the error of the visual field deviation amount measurement, so the locus of visual field deviation is measured again using the third frame integrated image, and the approximate function 103 is obtained. By repeating this process until the approximate function 103 converges, image blur due to sample drift can be significantly reduced. Based on the converged approximate function 103, a target image is created by integrating the third frame integrated image while correcting the visual field shift.
- FIGS. 11A and 11B an example of a display screen used for executing the sample drift correction is shown in FIGS. 11A and 11B.
- This screen is a screen used when executing only the step of creating the target image in which the influence of the sample drift is reduced from the stored image in Step 3 while omitting the sample drift correction in Step 1 and Step 2.
- a graph displaying the locus of field shift of the frame integrated image with respect to the reference image and an approximation function, a setting button for opening a sub-window for setting shooting conditions, approximation functions, and correction conditions, shooting and correction
- a button for instructing execution is arranged.
- the second frame integration number can be input only as a multiple of the first frame integration number. In addition, when the first frame integration number and the second frame integration number are the same, the input of the number of repetitions is invalid.
- the correction button is clicked, a second frame integrated image is created from the first frame integrated image, the amount of visual field deviation of the second frame integrated image with respect to the reference image is measured, and the locus of visual field deviation is displayed.
- a target image is generated by integrating the second frame integration image while correcting the field deviation based on the visual field deviation approximation function 103.
- the second frame integration number is larger than the first frame integration number and the number of repetitions is one, the first frame integration image is corrected for the field deviation based on the field deviation approximation function 103.
- the accumulated target image is created.
- a third frame image obtained by integrating the first frame integrated image by correcting the visual field deviation based on the visual field deviation approximate function 103 is formed and designated by the correction condition. Saved in a folder. Then, the visual field shift amount of the third frame integrated image with respect to the reference image is measured, and the second visual field shift locus is displayed on the main screen. Based on the second approximate function obtained from the second locus, a target image is formed by integrating the first frame integrated image while correcting the visual field shift.
- a fourth frame integrated image is formed by correcting the first frame integrated image based on the second approximate function and correcting the visual field shift, and the above steps are repeated. Since the mean square residual of the nth approximate function and the (n ⁇ 1) th approximate function is displayed on the main screen, the number of iterations n is optimized so that the residual converges.
- the present embodiment it is possible to provide a STEM / SEM that has no or very little influence of sample drift even when the field diameter is as high as about 250 nm ⁇ 250 nm, and a measurement method using the STEM / SEM.
- the apparatus of FIG. 10 is used as in the first embodiment, and in step 2, several lines are stored by the slow scan method, and then switched to the fast scan to measure the visual field shift amount with respect to the reference image.
- step 2 several lines are stored by the slow scan method, and then switched to the fast scan to measure the visual field shift amount with respect to the reference image.
- a case will be described below in which a stored image is obtained by repeating the process of switching to Slow scan and storing several lines of data again.
- the sample drift correction flow in this case is shown in FIG.
- the step (step 1) for obtaining the approximate function of the sample drift trajectory before the stored image is photographed is substantially the same as in the first embodiment.
- Example 3 when capturing a stored image while correcting the sample drift by image shift, several lines were stored using the Slow scan method (S2-1), and then switching to Fast scan to measure the amount of visual field deviation with respect to the reference image. This is stored together with the measurement time (S3-1).
- step 2 the process of switching to Slow scan and storing several lines of data again is repeated to capture the stored image. Note that, since the sample drift correction in step 2 is deviated from the actual sample drift, if the visual field deviation during photographing of the stored image becomes too large, the sample drift measurement before photographing is repeated (S1-2).
- an approximate function 103 for visual field deviation is obtained (S3-2).
- the visual field shift amounts ⁇ x (t) and ⁇ y (t) can be obtained. Since the method of creating the target image with corrected visual field deviation from the saved image has been described with reference to FIG. As a result, an image with greatly reduced image blur and image distortion could be obtained. Further, when the pattern size formed on the sample surface was measured using the image created in this way, a result in which an error of several nm due to image blur and image distortion was reduced was obtained.
- FIGS. 13A and 13B an example of a display screen used for executing the sample drift correction is shown in FIGS. 13A and 13B. This screen is used when executing only the image distortion reduction due to the sample drift in step 3 while omitting the sample drift correction in step 1 and step 2.
- the main screen of FIG. 13A includes a graph that displays a locus of visual field deviation and an approximation function, a setting button for opening a sub-window for setting shooting conditions, an approximation function, and correction conditions, and a button for instructing execution of shooting and correction. Has been.
- the present embodiment it is possible to provide a STEM / SEM that has no or very little influence of sample drift even when the field diameter is as high as about 250 nm ⁇ 250 nm, and a measurement method using the STEM / SEM.
- Example 4 shows sample drift correction in SEM.
- FIG. 14 shows a basic configuration diagram of a wafer-compatible SEM used in this embodiment.
- An electron gun 11 that generates the primary electron beam 31 and a control circuit 11 ′ that controls the acceleration voltage and extraction voltage of the primary electron beam 31.
- Irradiation lenses 12-1 and 12-2 that adjust the convergence condition of the primary electron beam 31.
- a control circuit 12 ′ for controlling the current value thereof, a condenser aperture 13 for controlling the divergence angle of the primary electron beam 31, a control circuit 13 ′ for controlling the position of the condenser aperture, and a primary electron beam incident on the sample 30.
- the axis deviation correcting deflector 14 for adjusting the incident angle of the light source 31 and the control circuit 14 'for controlling the current value thereof, the stigmeter 15 for adjusting the beam shape of the primary electron beam 31 incident on the sample 30, and the current value thereof.
- the control circuit 15 ′ for controlling, the image shift deflector 16 for adjusting the irradiation region of the primary electron beam 31 incident on the sample 30, the control circuit 16 ′ for controlling the current value thereof, and the sample 30
- a scanning deflector 17 for raster scanning the incident primary electron beam 31 and a control circuit 17 ′ for controlling the current value thereof, an objective lens 18 for adjusting the focal position of the primary electron beam 31 with respect to the sample 30 and the current value thereof.
- the deflector 27 and the control circuit 27 'for controlling the current value thereof, the reflector 28 with which the deflected electron beam 32 collides, the electron detector 20 for detecting the electron beam emitted from the reflector 28, and its gain and offset are controlled.
- FIG. Reference numeral 200 denotes a housing.
- the computer 29 includes a recording unit 29-1 for recording a plurality of images, a calculation unit 29-2 for measuring the amount of visual field deviation between images, an analysis unit 29-3 for obtaining an approximation function used for visual field deviation correction, and an image.
- a display unit 29-4 for displaying calculation results and analysis results is mounted.
- Each control circuit is command-controlled by a computer 29.
- the STEM / SEM of Example 1 is compared, and the SN of the SEM image is increased by the E ⁇ B deflector 27 and the reflector 28, and a high resolution image is obtained even with low acceleration by a retarding electrode (not shown).
- the sample drift correction system shown in the first to third embodiments can be applied as it is. As a result, an image with greatly reduced image blur and image distortion could be obtained. Further, when the pattern size formed on the sample surface was measured using the image created in this way, a result in which an error of several nm due to image blur and image distortion was reduced was obtained.
- a scanning electron microscope which is not affected by or very little affected by sample drift even when the field diameter is as high as about 250 nm ⁇ 250 nm, and a measurement method using the same. Can do.
- Example 5 shows sample drift correction in TEM.
- FIG. 15 shows a basic configuration diagram of a TEM used in this embodiment.
- An electron gun 11 that generates the primary electron beam 31 and a control circuit 11 ′ that controls the acceleration voltage and extraction voltage of the primary electron beam 31.
- Irradiation lenses 12-1 and 12- that adjust the convergence condition of the primary electron beam 31. 2 and a control circuit 12 ′ for controlling the current value thereof, a capacitor aperture 13 for controlling the divergence angle of the primary electron beam 31, a control circuit 13 ′ for controlling the position of the capacitor aperture, and a primary electron incident on the sample 30.
- Control circuit 15 ′ for controlling the objective lens 18 for adjusting the focal position of the primary electron beam 31 with respect to the sample 30, and a control circuit 18 ′ for controlling the current value thereof, in the sample chamber of the sample 30 The sample stage 19 for setting the position and the control circuit 19 ′ for controlling the position thereof, the objective aperture 24 and its control circuit 24 ′, the limited field stop 25 and its control circuit 25 ′, and the transmitted electron beam 32 that has passed through the sample 30 are projected.
- Reference numeral 200 denotes a housing.
- the computer 29 includes a recording unit 29-1 for recording a plurality of images, a calculation unit 29-2 for measuring the amount of visual field deviation between images, an analysis unit 29-3 for obtaining an approximation function used for visual field deviation correction, and an image.
- a display unit 29-4 for displaying calculation results and analysis results is mounted.
- Each control circuit is command-controlled by a computer 29.
- the storage time of the stored image is divided into a plurality of times, and a plurality of short-time integrated images corresponding to the frame integrated images in the second embodiment are stored.
- the target image is created by integrating the short-time integrated images while correcting the visual field shift between the images.
- the flow of the sample drift correction is the same as that obtained by replacing the frame integration image in FIG. 3 with a short-time image.
- TEM transmission electron microscope
- the visual field deviation measurement image and the stored image are formed by the same electron beam.
- the SEM / image is formed by synchronizing the raster scanning signal of the incident electron beam and the detector signal.
- STEM it is also possible to form an image for sample drift measurement and a stored image with different electron beams.
- a STEM image is used as an image for measuring a field shift
- an EDX image is used as a stored image.
- the STEM image is used as a field deviation measurement image
- the EELS image is used as a stored image.
- the reflected electron beam image of the SEM is used as a field deviation measurement image
- the secondary electron image is used as a stored image.
- Example 2 is applied to a combination in which the SN of the stored image is low and the SN of the drift correction image is high, the field shift obtained from the first frame integrated image that is the stored image and the field shift measurement image It is also possible to store the trajectory and not to store the image for measuring visual field deviation. This can reduce the memory required for processing.
- a target image is created from the first frame integrated image based on an approximate expression obtained from the locus of visual field deviation after the end of imaging.
- the step of obtaining the target image from the first frame integrated image and the locus of visual field deviation may be divided into a plurality of times.
- an approximate expression is obtained from the locus of visual field deviation obtained during that period, a target image is created and stored, and the first frame integrated image is erased from the memory. .
- This process is repeated to obtain a plurality of stored images.
- a high SN target image is created by integrating a plurality of stored images while correcting the visual field deviation.
- the function of limiting the image shift operation range to a small area and canceling the image shift movement at the sample stage when the operation range is exceeded may be used.
- Examples 1 to 5 an example in which an electron beam is used as a charged particle beam incident on a sample has been described. However, the same drift occurs when an image is formed by entering another charged particle tip such as a focused ion beam. A correction system can be applied.
- the present embodiment it is possible to provide a charged particle beam microscope which is not affected by the sample drift or has a very small effect even when the field diameter is as high as about 250 nm ⁇ 250 nm and a measurement method using the charged particle beam microscope. .
- the sample drift measurement image and the stored image with different electron beams, it is possible to obtain a target image that is not affected by the sample drift or has a very small effect even if the stored image has a very low SN. it can.
- the accuracy of sample drift correction and TAT can be improved.
- a high-resolution microscope such as STEM, SEM, or TEM
- the performance of the sample drift correction is improved, blurring and distortion of the image are reduced, and information obtained from the image is increased.
- the efficiency of measurement, inspection, and analysis of nanodevices and nanomaterials using an electron microscope is greatly improved, and their development is accelerated.
- energy loss electron spectrometer 41 '... an energy loss electron spectrometer control circuit, 101 ... an approximate function obtained from a sample drift trajectory before imaging, 102 ... an approximate function obtained from a sample drift trajectory before and after imaging, 103 ... visual field deviation during imaging Approximate function obtained from the locus, 200...
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Abstract
Description
するという工程を繰り返すことによって保存画像を得る場合について述べる。
Claims (13)
- 荷電粒子発生源及び前記荷電粒子発生源を制御する荷電粒子発生源制御回路と、前記荷電粒子源から放出された荷電粒子が照射される試料を載せる試料ステージ及び前記試料ステージを制御する試料ステージ制御回路と、前記試料からの荷電粒子を検出する検出器及び前記検出器を制御する検出器制御回路と、前記各制御回路を制御する計算機と、前記計算機に接続された表示部とを有する荷電粒子線顕微鏡であって、
前記計算機は、
異なる時刻において、前記試料表面に形成された特定パターンからの荷電粒子を用いて作成される複数の画像を記録する記録部と、
前記画像内の前記特定パターンを用いて、複数の前記画像間の視野ずれ量を求める計算部と、
前記視野ずれ量から試料ドリフトによる視野ずれの補正に用いる近似関数を求める解析部と、
を備えることを特徴とする荷電粒子線顕微鏡。 - 請求項1記載の荷電粒子線顕微鏡において、
前記表示部は、複数の前記画像間の視野ずれ量から求めた試料ドリフトの軌跡及び前記視野ずれの近似関数を表示するものであることを特徴とする荷電粒子線顕微鏡。 - 請求項1記載の荷電粒子線顕微鏡において、
前記表示部は、複数の前記画像間の視野ずれ量から求めた視野ずれの軌跡及び前記視野ずれの近似関数を表示するものであることを特徴とする荷電粒子線顕微鏡。 - 荷電粒子線顕微鏡を用いて試料表面の特定パターンに荷電粒子線を照射することにより得られる画像から前記特定パターンを計測する計測方法において、
異なる時刻において、前記特定パターンを含む複数の画像を撮影する第1工程と、
複数の前記画像間の視野ずれ量を求める第2工程と、
複数の前記画像間の視野ずれ量から試料ドリフトによる視野ずれの補正に用いる近似関数を求める第3工程と、
前記近似関数に基づいて前記視野ずれを相殺する第4工程と、を備えることを特徴とする計測方法。 - 請求項4記載の計測方法において、
前記第3の工程は、近似関数を複数の候補から選択する工程を含むことを特徴とする計測方法。 - 荷電粒子発生源及び前記荷電粒子発生源を制御する荷電粒子発生源制御回路と、前記荷電粒子源から放出された荷電粒子が照射される試料を載せる試料ステージ及び前記試料ステージを制御する試料ステージ制御回路と、前記試料からの荷電粒子を検出する検出器及び前記検出器を制御する検出器制御回路と、前記各制御回路を制御する計算機と、前記計算機に接続された表示部とを有する荷電粒子線顕微鏡であって、
前記表示部は、
前記試料からの荷電粒子に基づいて得られる撮影画像における視野ずれを補正する補正条件設定と、
前記視野ずれの補正に用いる前記試料の試料ドリフトの軌跡を近似する近似関数の設定と、
前記試料の撮影終了条件設定と、を行なえるものであることを特徴とする荷電粒子線顕微鏡。 - 請求項6記載の荷電粒子線顕微鏡において、
前記補正条件設定は、
前記試料の保存画像撮影前の補正数と補正間隔、
前記試料の保存画像撮影時間と補正間隔、
前記試料の保存画像撮影後の補正数と補正間隔の少なくとも1つの設定であることを特徴とする荷電粒子線顕微鏡。 - 請求項6記載の荷電粒子線顕微鏡において、
前記近似関数設定は、前記試料の保存画像撮影前における前記試料ドリフトの軌跡から求めた近似関数の設定であることを特徴とする荷電粒子線顕微鏡。 - 請求項8記載の荷電粒子線顕微鏡において、
前記近似関数が、1次関数の場合には補正係数、
スプライン補間の場合には次数、が更に設定が行なえるものであることを特徴とする荷電粒子線顕微鏡。 - 請求項9記載の荷電粒子線顕微鏡において、
前記近似関数の設定は、前記試料の保存画像撮影前後における前記試料ドリフトの軌跡から求めた近似関数の設定であることを特徴とする荷電粒子線顕微鏡。 - 請求項10記載の荷電粒子線顕微鏡において、
前記近似関数が、1次関数の場合には補正係数、
スプライン補間の場合には次数、の設定が更に行なえるものであることを特徴とする荷電粒子線顕微鏡。 - 請求項6記載の荷電粒子線顕微鏡において、
前記撮影終了条件設定は、再撮影の要不要を自動で判断するか手動で判断するかを選択する設定であることを特徴とする荷電粒子線顕微鏡。 - 請求項12記載の荷電粒子線顕微鏡において、
前記設定が自動の場合、視野ずれ許容範囲及び測定繰り返し上限の設定が更に行なえるものであることを特徴とする荷電粒子線顕微鏡。
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- 2010-06-01 US US13/383,259 patent/US20120104253A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
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JPWO2011007492A1 (ja) | 2012-12-20 |
DE112010002934T5 (de) | 2012-08-30 |
US20120104253A1 (en) | 2012-05-03 |
JP5462875B2 (ja) | 2014-04-02 |
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