WO2010126110A1 - Polariseur à grille métallique et son procédé de fabrication - Google Patents

Polariseur à grille métallique et son procédé de fabrication Download PDF

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Publication number
WO2010126110A1
WO2010126110A1 PCT/JP2010/057625 JP2010057625W WO2010126110A1 WO 2010126110 A1 WO2010126110 A1 WO 2010126110A1 JP 2010057625 W JP2010057625 W JP 2010057625W WO 2010126110 A1 WO2010126110 A1 WO 2010126110A1
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WIPO (PCT)
Prior art keywords
wire grid
ridge
liquid crystal
grid polarizer
light
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Application number
PCT/JP2010/057625
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English (en)
Japanese (ja)
Inventor
由里子 海田
寛 坂本
陽介 秋田
宏巳 桜井
康宏 池田
栄治 志堂寺
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旭硝子株式会社
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Application filed by 旭硝子株式会社 filed Critical 旭硝子株式会社
Priority to JP2011511455A priority Critical patent/JPWO2010126110A1/ja
Publication of WO2010126110A1 publication Critical patent/WO2010126110A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00634—Production of filters
    • B29D11/00644—Production of filters polarizing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G02F1/133548—Wire-grid polarisers

Definitions

  • the present invention relates to a wire grid polarizer and a manufacturing method thereof.
  • a polarizer also referred to as a polarization separation element having polarization separation ability in a visible light region, which is used in an image display device such as a liquid crystal display device, a rear projection television, or a front projector
  • an absorption polarizer and a reflection polarizer there is.
  • the absorptive polarizer is, for example, a polarizer in which a dichroic dye such as iodine is oriented in a resin film.
  • the absorption polarizer absorbs one polarized light, the light use efficiency is low.
  • the reflective polarizer can increase the light utilization efficiency by allowing the reflected light to reenter the polarizer without entering the polarizer. Therefore, the need for a reflective polarizer is increasing for the purpose of increasing the brightness of liquid crystal display devices and the like.
  • the reflective polarizer include a linear polarizer made of a birefringent resin laminate, a circular polarizer made of cholesteric liquid crystal, and a wire grid polarizer.
  • linear polarizers and circular polarizers have low polarization separation ability. For this reason, wire grid polarizers exhibiting high polarization separation ability have attracted attention.
  • the wire grid polarizer has a structure in which a plurality of fine metal wires are arranged in parallel to each other on a light-transmitting substrate.
  • the pitch of the fine metal wires is sufficiently shorter than the wavelength of the incident light
  • the light incident from the side on which the ridges of the wire grid polarizer are formed (hereinafter referred to as the surface side) is orthogonal to the fine metal wires.
  • a component having an electric field vector ie, p-polarized light
  • a component having an electric field vector parallel to the metal wire ie, s-polarized light
  • wire grid polarizers that exhibit polarization separation in the visible light region.
  • a wire grid type polarizer in which a metal layer is formed on a plurality of protrusions formed at a predetermined pitch on the surface of a light-transmitting substrate to form a thin metal wire Patent Documents 1 and 2.
  • the wire grid polarizer has good productivity because it forms fine metal wires by vapor deposition of metal.
  • the wire grid polarizer of (1) is attached to the backlight side surface of the liquid crystal panel of the liquid crystal display device, the liquid crystal panel side (the side on which the protrusions of the wire grid polarizer are not formed).
  • the s-polarized light incident from the back surface side is reflected by the thin metal wire, and the contrast of the displayed image is lowered.
  • wire grid polarizers in which the reflectance of s-polarized light incident from the back surface side (hereinafter referred to as back surface s-polarized reflectance) is suppressed.
  • back surface s-polarized reflectance the reflectance of s-polarized light incident from the back surface side
  • the wire grid polarizer of (2) (a) has the following problems.
  • the black layer side needs to be attached to the liquid crystal panel. However, since the black layer side is uneven, the wire grid polarizer is applied to the liquid crystal panel. Difficult to paste.
  • the wire grid polarizer (2) (b) has the following problems.
  • the present invention provides a wire grid polarizer having a high degree of polarization and p-polarized light transmittance and a low back surface s-polarized light reflectance, and a method for producing the same.
  • a plurality of ridges whose width gradually decreases from the bottom to the top are parallel to each other through a flat portion formed between the ridges and have a predetermined pitch.
  • a light-transmitting substrate formed on the surface, a first reflective layer made of a metal material covering the first side surface of the ridge, the first side surface of the ridge and the first reflective layer And a first absorption layer made of a light-absorbing material that absorbs light more than the metal material, covering the entire first side surface of the ridge.
  • the thickness of the first absorption layer is preferably 3 to 20 nm.
  • the wire grid polarizer of the present invention is made of a metal material that exists between the first side surface of the ridge and the first absorption layer and covers the entire surface of the first side surface of the ridge. It is preferable to further have an underlayer.
  • the wire grid polarizer of the present invention preferably further includes a second absorption layer made of the light absorbing material that covers the entire surface of the second side surface of the ridge. It is preferable that the wire grid polarizer of the present invention further includes a second reflective layer made of a metal material that covers the surface of the second absorption layer.
  • the cross-sectional shape perpendicular to the length direction of the ridge is preferably a triangle or a trapezoid.
  • the pitch Pp is preferably 300 nm or less.
  • the plurality of ridges whose width gradually decreases from the bottom to the top are parallel to each other via the flat portion formed between the ridges, and A light-transmitting substrate formed on the surface at a predetermined pitch, a first reflective layer made of a metal material covering the first side surface of the ridge, the first side surface of the ridge and the first And a first absorption layer made of a light-absorbing material that absorbs light rather than the metal material, which is present between the reflective layer and covers the entire first side surface of the ridge.
  • a method of manufacturing a polarizer wherein the polarizer is substantially orthogonal to the length direction of the ridge, and forms an angle of 25 to 40 ° on the first side surface side with respect to the height direction of the ridge.
  • the light-absorbing material is deposited from the direction under the condition that the deposition amount is 3 to 20 nm. Forming the absorbing layer, substantially perpendicular to the length direction of the ridges, and from the direction forming an angle of 25 to 50 ° to the first side surface with respect to the height direction of the ridges.
  • the first reflective layer is formed by vapor-depositing a material under conditions that the vapor deposition amount is 15 to 50 nm.
  • the cross-sectional shape perpendicular to the length direction of the ridge is preferably a triangle or a trapezoid.
  • the ridges are preferably made of a photo-curing resin or a thermoplastic resin and formed by an imprint method.
  • a liquid crystal panel having a liquid crystal layer sandwiched between a pair of substrates, a backlight unit, and a surface on which the protrusions are formed are on the backlight unit side, and the protrusions are formed.
  • the wire grid polarizer according to the present invention is arranged so that the surface on the side that is not provided is the viewing side of the liquid crystal display device.
  • the liquid crystal display device of the present invention further includes an absorption polarizer, the wire grid polarizer is disposed on one surface of the liquid crystal panel, and the absorption polarizer is the wire grid polarizer. It is preferable to be disposed on the surface of the liquid crystal panel opposite to the disposed side.
  • the wire grid polarizer is disposed on the surface of the liquid crystal panel on the backlight unit side, and the absorption polarizer is disposed on the surface of the liquid crystal panel on the side opposite to the backlight unit side. More preferably.
  • the liquid crystal display device of the present invention further includes an absorptive polarizer, the wire grid polarizer is integrated with one of the pair of substrates of the liquid crystal panel, and the absorptive polarizer is It is preferable that the liquid crystal panel is disposed on the surface of the liquid crystal panel opposite to the side on which the wire grid polarizer is integrated. Further, the wire grid polarizer is integrated with the substrate of the liquid crystal panel on the backlight unit side, and the absorption polarizer is formed on the surface of the liquid crystal panel on the side opposite to the backlight unit side. More preferably, they are arranged.
  • the liquid crystal display device of the present invention further includes an absorptive polarizer, and the wire grid polarizer is disposed on the liquid crystal layer side of one of the pair of substrates of the liquid crystal panel, and the absorptive type It is preferable that the polarizer is disposed on the surface of the substrate of the liquid crystal panel opposite to the side on which the wire grid polarizer is disposed.
  • the wire grid polarizer is disposed on the liquid crystal layer side of the backlight unit side substrate of the pair of substrates of the liquid crystal panel, and the absorption polarizer is the backlight unit side. More preferably, it is disposed on the surface of the liquid crystal panel on the opposite side.
  • the wire grid polarizer of the present invention has a high degree of polarization and p-polarized light transmittance, and a low back surface s-polarized light reflectance. Moreover, since the back surface side can be affixed to a liquid crystal panel, it is easy to affix a wire grid type polarizer to a liquid crystal panel. Furthermore, since light from the backlight is incident from the surface side, reflection of p-polarized light at the interface can be suppressed. According to the method for manufacturing a wire grid polarizer of the present invention, a wire grid polarizer having a high degree of polarization and p-polarized light transmittance and a low back surface s-polarized light reflectance can be manufactured with high productivity.
  • high p-polarized light transmittance of 35% or more, more preferably 38% or more, most preferably 40% or more at wavelengths of 450 nm, 550 nm, and 700 nm, and 35% or more at each wavelength.
  • a wire grid polarizer having a high front surface s-polarized reflectance, a lower back surface s-polarized reflectance of less than 20% at the same wavelength, and a degree of polarization of 99.2% or more can be obtained.
  • the liquid crystal display device of the present invention has high luminance and can suppress a reduction in contrast.
  • a plurality of ridges whose width gradually decreases from the bottom to the top are parallel to each other through a flat portion formed between the ridges and have a predetermined pitch.
  • a light-transmitting substrate formed on the surface, a first reflective layer made of a metal material covering the first side surface of the ridge, and between the first side surface of the ridge and the first reflective layer And a first absorption layer made of a light-absorbing material that absorbs light rather than a metal material, covering the entire surface of the first side surface of the ridge.
  • the first reflective layer and the first absorption layer on the first side surface of the ridge have a strip shape extending in the length direction of the ridge, and correspond to the fine metal wires constituting the wire grid polarizer.
  • the surface of the light transmissive substrate described above is formed to extend in one direction of the light transmissive substrate at a predetermined pitch.
  • the cross-sectional shape in the length direction is opposed to a triangular or trapezoidal ridge.
  • One of the side surfaces is referred to as a first side surface and the other is referred to as a second side surface.
  • the wire grid type polarizer of the present invention includes an underlayer made of a metal material that exists between the first side surface of the ridge and the first absorption layer and covers the entire surface of the first side surface of the ridge. You may have. Furthermore, you may have the 2nd absorption layer which consists of a light absorptive material which coat
  • the wire grid polarizer of the present invention may further include a second reflective layer made of a metal material that covers the surface of the second absorption layer.
  • the coating in the present invention is not limited to the case where the layer is directly formed on the surface, but includes the case where the layer is formed so as to cover the surface via another layer.
  • “ ⁇ ” is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
  • the light transmissive substrate is a substrate having light transmittance in the wavelength range of use of the wire grid polarizer.
  • the light transmission means that light is transmitted, and the wavelength range used is specifically in the range of 400 nm to 800 nm.
  • the average light transmittance in the range of 400 nm to 800 nm is 85% or more.
  • the ridge refers to a portion rising from the main surface (flat portion) of the light-transmitting substrate and extending in one direction.
  • the ridges are integral with the main surface of the light-transmitting substrate, and may be made of the same light-transmitting material as the main surface of the light-transmitting substrate, or of a light-transmitting material different from the main surface of the light-transmitting substrate. May be.
  • the ridge is preferably integral with the main surface of the light transmissive substrate and made of the same material as the main surface of the light transmissive substrate, and is formed by molding at least the main surface of the light transmissive substrate. Preferably it is a strip.
  • the plurality of ridges may be formed so that corresponding side surfaces of the ridges are formed substantially in parallel, and may not be formed completely in parallel.
  • Each ridge is preferably a straight line that most easily exhibits optical anisotropy in a plane, but may be a curved line or a polygonal line as long as adjacent ridges do not contact each other.
  • the shape of the cross-section in the direction perpendicular to the length direction and the main surface of the light-transmitting substrate is substantially constant over the length direction, and all of the cross-section shapes of the plurality of ridges are substantially constant. Preferably there is.
  • the cross-sectional shape of the ridge is a shape in which the width gradually decreases from the bottom (the main surface of the light-transmitting substrate) toward the top.
  • Specific examples of the cross-sectional shape include a triangle and a trapezoid.
  • the cross-sectional shape may have a curved corner or side (side surface).
  • it is preferable that the pitch width between the plurality of protrusions formed on the main surface of the light-transmitting substrate in parallel or substantially parallel, that is, the width of the flat portion is constant or substantially constant.
  • the top of the ridge means a portion where the highest cross-sectional portion is continuous in the length direction.
  • the top of the ridge may be a surface or a line.
  • the cross-sectional shape is trapezoidal, the top portion forms a surface, and when the cross-sectional shape is triangular, the top portion forms a line.
  • the surface other than the top of the ridge is referred to as a side surface of the ridge.
  • channel formed from two adjacent protrusions) between two adjacent protrusions is considered not the surface of a protrusion but the main surface of a light-transmitting board
  • Examples of the material for the light-transmitting substrate include a photo-curing resin, a thermoplastic resin, and glass.
  • a photo-curing resin or a thermoplastic resin is preferable from the viewpoint that ridges can be formed by an imprint method described later.
  • Photocuring resins are particularly preferred because they can form ridges by the printing method and are excellent in heat resistance and durability.
  • a photocurable resin obtained by photocuring a photocurable composition that can be photocured by photoradical polymerization is preferable from the viewpoint of productivity.
  • the photocurable composition those having a contact angle with respect to water of the cured film after photocuring of 90 ° or more are preferable. If the contact angle of the cured film with respect to water is 90 ° or more, when forming the ridges by the optical imprint method, the mold can be easily released from the mold, and the transfer can be performed with high accuracy. Type polarizers can fully exhibit their intended performance. Further, even if the contact angle is high, there is no hindrance to adhesion of each absorbing layer or underlayer.
  • the 1st reflective layer has made the filament extended in the length direction of a protruding item
  • the first reflective layer covers a part or the entire surface of the first side surface of the ridge.
  • the first reflective layer preferably covers a part of the first side surface of the ridge from the viewpoint that the back surface s-polarized reflectance becomes lower.
  • the first reflective layer may cover part or all of the top of the ridge. Further, the first reflective layer may cover a part of the flat portion adjacent to the first side surface of the ridge.
  • the first reflective layer covering the first side surface of the ridge is usually continuous.
  • the first side surface of the ridge is preferably continuously covered with the first reflective layer, but a very small part of the first side surface is not covered with the first reflective layer due to manufacturing problems or the like. In some cases. Even in this case, if the first side surface is substantially continuously covered by the first reflective layer, it is considered that the first side surface is continuously covered by the first reflective layer.
  • the metal material of the first reflective layer is not particularly limited as long as it has a high visible light reflectivity and sufficient conductivity, and is preferably a material that takes into account characteristics such as corrosion resistance.
  • the metal material include simple metals, alloys, metals containing dopants or impurities, and the like. Specific examples include aluminum, silver, magnesium, aluminum-based alloys, silver-based alloys, and the like. From the viewpoint of high reflectivity for visible light, low visible light absorption, and high conductivity, aluminum, aluminum Alloys, silver and magnesium are preferable, and aluminum and aluminum alloys are particularly preferable.
  • the 2nd reflective layer has made the filament extended in the length direction of a protruding item
  • the second reflective layer covers a part or the entire surface of the second side surface of the ridge.
  • the second reflective layer preferably covers a part of the second side surface of the ridge from the viewpoint that the back surface s-polarized reflectance becomes lower.
  • the second reflective layer may cover part or all of the top of the ridge.
  • the second reflective layer may cover a part of the flat portion adjacent to the second side surface of the ridge.
  • the second reflective layer covering the second side surface of the ridge is usually continuous in the longitudinal direction of the second side surface.
  • the second side surface of the ridge is preferably continuously covered with the second reflective layer, but a very small portion of the second side surface is not covered with the second reflective layer due to manufacturing problems or the like. In some cases. Even in this case, if the second side surface is substantially continuously covered with the second reflective layer, it is considered that the second side surface is continuously covered with the second reflective layer.
  • the presence of the second reflective layer increases the amount of the metal material that covers the ridges, so that the extinction ratio can be improved with little decrease in transmittance.
  • Examples of the metal material for the second reflective layer include the same materials as those for the first reflective layer.
  • the first absorbing layer exists between the first side surface of the ridge and the first reflective layer, and covers the entire surface of the first side surface of the ridge.
  • the first absorption layer may cover a part or all of the top of the ridge. It is preferable that the first absorption layer does not cover the top of the ridge from the viewpoint of excellent p-polarized light transmittance.
  • the 1st absorption layer may coat a part of flat part adjacent to the 1st side of a ridge.
  • line it is usual that it is continuing in the longitudinal direction of the 1st side surface.
  • the first side surface of the ridge is preferably completely covered with the first absorbent layer, but only a small part of the first side surface is not covered with the first absorbent layer due to manufacturing problems or the like. There is also. Even in this case, if almost the entire first side surface is covered with the first absorption layer, it is considered that the entire first side surface is covered with the first absorption layer.
  • the light absorbing material of the first absorption layer may be a material that absorbs light more than the metal material of the first reflection layer.
  • the light absorbing material include low reflective metals such as nickel, chromium, titanium, tungsten, platinum, molybdenum, and vanadium; inorganic oxides such as chromium oxide and aluminum oxide; titanium nitride, silicon nitride, and the like. Inorganic nitrides; inorganic carbides such as aluminum carbide and molybdenum carbide; carbon compounds such as carbon black and carbon nanotubes, etc., but inorganic oxides react with metal and oxygen when forming the first absorption layer This is not preferable because the ridges are easily deformed by the heat generated by.
  • nickel, chromium, and titanium are preferable because they have a large light absorption rate and high productivity.
  • the underlayer exists between the first side surface of the ridge and the first absorption layer, and covers the entire surface of the first side surface of the ridge.
  • the underlayer may cover part or all of the top of the ridge. Further, the underlayer may cover a part of the flat portion adjacent to the first side surface of the ridge.
  • the base layer covering the first side surface of the ridge is usually continuous in the longitudinal direction of the first side surface. It is preferable that the first side surface of the ridge is completely covered with the underlayer. However, a part of the first side surface may not be covered with the underlayer due to a manufacturing problem or the like. Even in this case, if almost the entire first side surface is covered with the underlayer, it is considered that the entire first side surface is covered with the underlayer.
  • the ridge Since the first absorption layer made of the light-absorbing material has a large compressive stress, the ridge is easily deformed (bent) in a direction perpendicular to the length direction thereof.
  • the underlayer made of a metal material has an action of relaxing the compressive stress in the first absorption layer. Therefore, the metal material of the underlayer is preferably one that generates less compressive stress, and specifically includes aluminum, silver, magnesium, aluminum-based alloys, silver-based alloys, etc., and reflectivity in the visible light region. From the viewpoint of high, aluminum and aluminum-based alloys are preferable.
  • the second absorption layer covers the entire second side surface of the ridge.
  • the second absorption layer may cover a part or all of the top of the ridge, or may cover a part of the flat portion adjacent to the second side surface of the ridge.
  • the second absorbent layer covering the second side surface of the ridge is continuous in the longitudinal direction of the second side surface.
  • the second side surface of the ridge is preferably completely covered with the second absorbent layer, but only a small portion of the second side surface is not covered with the second absorbent layer due to manufacturing problems or the like. There is also. Even in this case, if almost the entire second side surface is covered with the second absorption layer, it is considered that the entire second side surface is covered with the second absorption layer.
  • the first absorption layer made of the light-absorbing material has a large compressive stress, the ridge is easily deformed (bent) in a direction perpendicular to the length direction thereof.
  • the 2nd absorption layer which consists of light absorption materials has the effect
  • a wire grid polarizer is manufactured by forming a light-transmitting substrate having a plurality of protrusions formed on a surface thereof in parallel with each other at a predetermined pitch, and then sequentially forming each layer.
  • Examples of a method for manufacturing a light-transmitting substrate include an imprint method (an optical imprint method and a thermal imprint method), a lithography method, and the like.
  • the imprinting method is preferable from the viewpoint of being able to be formed, and the optical imprinting method is particularly preferable from the viewpoint that the ridges can be formed with higher productivity and the groove of the mold can be accurately transferred.
  • the optical imprint method for example, a mold in which a plurality of grooves are formed in parallel with each other at a predetermined pitch by a combination of electron beam drawing and etching, and the grooves of the mold are formed on the surface of an arbitrary substrate. It is a method of transferring to the photocurable composition applied to the film and simultaneously photocuring the photocurable composition.
  • the production of the light transmissive substrate by the optical imprint method is preferably performed through the following steps (i) to (iv).
  • Radiation (ultraviolet ray, electron beam, etc.) is applied to the photocurable composition while the mold is pressed against the photocurable composition to cure the photocurable composition to have a plurality of ridges corresponding to the mold grooves.
  • Producing a light-transmitting substrate (Iv) A step of separating the mold from the light transmissive substrate.
  • the obtained light-transmitting substrate on the base material can form each layer described later while being integrated with the base material. If necessary, the light-transmitting substrate and the base material can be separated after forming each layer. Furthermore, after separating the light-transmitting substrate produced on the base material from the base material, each layer described later can be formed.
  • the production of the light-transmitting substrate by the thermal imprint method is preferably performed through the following steps (i) to (iii).
  • (I) A step of forming a transfer film of a thermoplastic resin on the surface of a substrate, or a step of producing a transfer film of a thermoplastic resin.
  • (Ii) Glass mold temperature (Tg) or melting point (Tm) of the thermoplastic resin so that the groove is in contact with the film to be transferred or the film to be transferred in a mold in which a plurality of grooves are formed in parallel with each other at a constant pitch.
  • Tg Glass mold temperature
  • Tm melting point
  • the obtained light-transmitting substrate on the base material can form each layer described later while being integrated with the base material. If necessary, the light-transmitting substrate and the base material can be separated after forming each layer. Furthermore, after separating the light-transmitting substrate produced on the base material from the base material, each layer described later can be formed.
  • Examples of the mold material used in the imprint method include silicon, nickel, quartz, resin, and the like, and resin is preferable from the viewpoint of transfer accuracy.
  • Examples of the resin include a fluorine-based resin (ethylene-tetrafluoroethylene copolymer, etc.), a cyclic olefin, a silicone resin, an epoxy resin, an acrylic resin, and the like. From the viewpoint of mold accuracy, a photocurable acrylic resin is used. preferable.
  • the resin mold preferably has an inorganic film having a thickness of 2 to 10 nm on the surface from the viewpoint of repeated transfer durability.
  • As the inorganic film an oxide film such as silicon oxide, titanium oxide, and aluminum oxide is preferable.
  • Each layer is preferably formed by a vapor deposition method.
  • the vapor deposition method include physical vapor deposition (PVD) and chemical vapor deposition (CVD), and vacuum vapor deposition, sputtering, and ion plating are preferred, and vacuum vapor deposition is particularly preferred.
  • PVD physical vapor deposition
  • CVD chemical vapor deposition
  • vacuum vapor deposition, sputtering, and ion plating are preferred, and vacuum vapor deposition is particularly preferred.
  • vacuum evaporation method it is easy to control the incident direction of the fine particles to be attached to the light-transmitting substrate, and it is easy to perform the oblique evaporation method described later. Since each layer needs to be formed by selectively vapor-depositing each material on each side surface of the ridge, an oblique vapor deposition method by a vacuum vapor deposition method is most preferable.
  • the underlayer is made of metal from a direction that is substantially orthogonal to the length direction of the ridges and that forms an angle of 25 to 40 ° to the first side surface with respect to the height direction of the ridges.
  • the material can be formed by vapor deposition under the condition that the vapor deposition amount is 3 to 15 nm.
  • the angle is preferably 30 to 45 °, and the deposition amount is preferably 5 to 15 nm.
  • the condition that the deposition amount is 3 to 15 nm is formed by depositing a metal or a metal compound on the surface of a region where the ridge is not formed (flat flat portion) when the metal layer is formed on the ridge.
  • the thickness of the metal layer is 3 to 15 nm.
  • the underlayer is formed by oblique deposition.
  • the conditions of the vapor deposition amount in the formation of the following 1st absorption layer, 2nd absorption layer, 1st reflection layer, and 2nd reflection layer are also the same.
  • the first absorbent layer is substantially orthogonal to the length direction of the ridges and forms an angle of 25 to 40 ° on the first side surface side with respect to the height direction of the ridges.
  • the light absorbing material can be formed from the direction by vapor deposition under the condition that the vapor deposition amount is 3 to 20 nm.
  • the angle is preferably 30 to 35 °, and the deposition amount is preferably 5 to 15 nm.
  • the second absorbent layer is substantially orthogonal to the length direction of the ridges and forms an angle of 25 to 40 ° on the second side surface side with respect to the height direction of the ridges.
  • the light absorbing material can be formed from the direction by vapor deposition under the condition that the vapor deposition amount is 3 to 20 nm.
  • the angle is preferably 30 to 40 °, and the deposition amount is preferably 5 to 15 nm.
  • the first reflective layer is substantially orthogonal to the length direction of the ridges and forms an angle of 25 to 50 ° on the first side surface side with respect to the height direction of the ridges.
  • a metal material can be formed from the direction by vapor deposition under the condition that the vapor deposition amount is 15 to 50 nm.
  • the angle is preferably 30 to 45 °, and the deposition amount is preferably 20 to 45 nm.
  • the second reflective layer is substantially orthogonal to the length direction of the ridges and forms an angle of 25 to 50 ° on the second side surface side with respect to the height direction of the ridges.
  • a metal material can be formed from the direction by vapor deposition under the condition that the vapor deposition amount is 15 to 50 nm.
  • the angle is preferably 30 to 45 °, and the deposition amount is preferably 20 to 45 nm.
  • FIG. 1 is a perspective view showing a first embodiment of a wire grid polarizer of the present invention.
  • a plurality of ridges 12 having a trapezoidal cross-sectional shape extending in the direction of the arrow A on the drawing are parallel to each other via a flat portion 13 of a groove formed between the ridges 12.
  • the first reflective layer 20 extends in the length direction of the ridges 12 to form a fine metal wire.
  • Pp is the sum of the width Dpb of the bottom of the ridge 12 and the width of the flat portion 13 formed between the ridges 12.
  • Pp is preferably 300 nm or less, preferably in the range of 50 to 300 nm, and more preferably 50 to 250 nm.
  • Pp is 300 nm or less, a high surface s-polarized reflectance is exhibited, and a high degree of polarization is exhibited even in a short wavelength region of about 400 nm. Moreover, the coloring phenomenon by diffraction is suppressed. If Pp is 50 to 200 nm, each layer is easily formed by vapor deposition.
  • the ratio of Dpb to Pp is preferably 0.1 to 0.7, and more preferably 0.25 to 0.55.
  • Dpb / Pp is 0.1 or more, a high degree of polarization is exhibited.
  • Dpb is preferably 30 to 100 nm from the viewpoint of easy formation of each layer by vapor deposition.
  • the width Dpt of the top portion 19 of the ridge 12 is preferably less than or equal to half of Dpb, more preferably 40 nm or less, and even more preferably 20 nm or less. If Dpt is less than or equal to half of Dpb, the p-polarized light transmittance is higher and the angle dependency is sufficiently low.
  • the height Hp of the ridge 12 is preferably 80 to 500 nm, more preferably 80 to 400 nm, still more preferably 120 to 300 nm, and most preferably 120 to 270 nm. If Hp is 80 nm or more, the polarization separation ability is sufficiently high. If Hp is 500 nm or less, the chromatic dispersion is small. If Hp is 80 to 270 nm, each layer is easily formed by vapor deposition.
  • the inclination angle ⁇ 1 of the first side surface 16 with respect to the main surface forming the flat portion of the light-transmitting substrate and the inclination angle ⁇ 2 of the second side surface 18 are preferably 30 ° or more and less than 90 °, preferably 50 ° or more and less than 90 °. Is more preferable, more preferably 70 or more and less than 90 °, and most preferably 75 ° or more and less than 90 °. ⁇ 1 and ⁇ 2 may be the same or different.
  • the thickness Hs of the light transmissive substrate 14 is preferably 0.5 to 1000 ⁇ m, and more preferably 1 to 40 ⁇ m.
  • the maximum value Dr1 of the thickness of the first reflective layer 20 in the width direction of the ridges 12 satisfies the following formula (I). 0.2 ⁇ (Pp ⁇ Dpb) ⁇ Dr1 ⁇ 0.5 ⁇ (Pp ⁇ Dpb) (I) When Dr1 is 0.2 ⁇ (Pp ⁇ Dpb) or more, high p-polarized light transmittance is exhibited and chromatic dispersion is small. When Dr1 is 0.5 ⁇ (Pp ⁇ Dpb) or less, the polarization separation ability is sufficiently high.
  • the height Hr1 of the first reflective layer 20 is preferably 80 to 500 nm, more preferably 80 to 400 nm, and further preferably 120 to 300 nm. If Hr1 is 80 nm or more, crystallization of the first reflective layer 20 is suppressed, and high s-polarized reflectance is exhibited. If Hr1 is 500 nm or less, the polarization separation ability is sufficiently high even in a short wavelength region.
  • Hr1 / Hp is preferably from 0.5 to 1, and more preferably from 0.6 to 1. When Hr1 / Hp is 1 or less, the polarization separation ability is improved. If Hr1 / Hp is 0.5 or more, the angle dependency of the optical characteristics is sufficiently low.
  • the height at the top is preferably 20 nm or less from the viewpoint of suppressing a decrease in transmittance.
  • the maximum value Da1 of the thickness of the first absorbent layer 22 in the width direction of the ridges 12 is preferably 3 to 20 nm, and more preferably 5 to 15 nm. If Da1 is 3 nm or more, the back surface s-polarized reflectance is sufficiently low. If Da1 is 20 nm or less, the compressive stress of the first absorption layer 22 can be kept low.
  • the height Ha1 of the first absorption layer 22 is substantially the same as Hp because the first absorption layer is coated and formed on the entire first side surface.
  • FIG. 2 is a perspective view showing a second embodiment of the wire grid polarizer of the present invention.
  • the wire grid polarizer 10 a plurality of ridges 12 having a trapezoidal cross-sectional shape are formed on the surface in parallel with each other and at a predetermined pitch Pp through a flat portion 13 of a groove formed between the ridges 12.
  • the light-transmitting substrate 14, the first reflective layer 20 made of a metal material covering a part of the surface of the first side surface 16 of the ridge 12, the first side surface of the ridge 12 and the first
  • a first absorbing layer 22 made of a light-absorbing material and covering the entire surface of the first side surface 16 of the ridge 12, and the ridge 12 and the first absorption layer 22.
  • a base layer 24 made of a metal material that covers the entire surface of the first side surface 16 of the ridge 12.
  • the description of the same configuration as that of the wire grid polarizer 10 of the first and second embodiments is omitted.
  • the maximum value Db1 of the underlayer 24 in the width direction of the ridges 12 is preferably 3 to 20 nm, and more preferably 5 to 15 nm. If Db1 is 3 nm or more, the compressive stress in the first absorption layer 22 can be sufficiently relaxed. If Db1 is 20 nm or less, an increase in the back surface s-polarized reflectance can be suppressed.
  • the height Hb1 of the underlayer 24 is substantially the same as Hp because the underlayer is covered and formed on the entire first side surface.
  • FIG. 3 is a perspective view showing a third embodiment of the wire grid polarizer of the present invention.
  • the wire grid polarizer 10 a plurality of ridges 12 having a trapezoidal cross-sectional shape are formed on the surface in parallel with each other and at a predetermined pitch Pp through a flat portion 13 of a groove formed between the ridges 12.
  • the light-transmitting substrate 14, the first reflective layer 20 made of a metal material covering a part of the surface of the first side surface 16 of the ridge 12, the ridge 12 and the first reflective layer 20, Between the first absorption layer 22 made of a light-absorbing material and covering the entire surface of the second side surface 18 of the ridge 12.
  • a second absorption layer made of a light-absorbing material.
  • the description of the same configuration as that of the wire grid polarizer 10 of the first embodiment is omitted.
  • the maximum value Da2 of the thickness of the second absorbent layer 26 in the width direction of the ridges 12 is preferably 3 to 20 nm, and more preferably 5 to 15 nm. If Da2 is 3 nm or more, the back surface s-polarized reflectance is sufficiently low. If Da2 is 20 nm or less, the compressive stress of the second absorption layer 26 can be kept low. Da2 is preferably 0.55 to 2 times the thickness of Da1 and more preferably 0.55 to 1.5 from the viewpoint that the compressive stress is canceled by the first absorption layer 22 and the second absorption layer 26. .
  • the height Ha2 of the second absorption layer 26 is substantially the same as Hp because the second absorption layer is coated and formed on the entire second side surface.
  • FIG. 4 is a perspective view showing a fourth embodiment of the wire grid polarizer of the present invention.
  • the wire grid polarizer 10 a plurality of ridges 12 having a trapezoidal cross-sectional shape are formed on the surface in parallel with each other and at a predetermined pitch Pp through a flat portion 13 of a groove formed between the ridges 12.
  • the light-transmitting substrate 14, the first reflective layer 20 made of a metal material covering a part of the surface of the first side surface 16 of the ridge 12, the first side surface of the ridge 12 and the first
  • a first absorbing layer 22 made of a light-absorbing material and covering the entire surface of the first side surface 16 of the ridge 12, and the ridge 12 and the first absorption layer 22.
  • FIG. 5 is a perspective view showing a fifth embodiment of the wire grid polarizer of the present invention.
  • the wire grid polarizer 10 a plurality of ridges 12 having a trapezoidal cross-sectional shape are formed on the surface in parallel with each other and at a predetermined pitch Pp through a flat portion 13 of a groove formed between the ridges 12.
  • the first reflective layer 20 made of a metal material covering a part of the first side surface 16 of the ridge 12, and between the ridge 12 and the first reflective layer 20.
  • a first absorbing layer 22 made of a light-absorbing material that covers the entire surface of the first side surface 16 of the ridge 12, and a metal that covers a part of the second side surface 18 of the ridge 12.
  • the second reflective layer 28 made of a material, and the second reflective layer 28 made of a light-absorbing material, which exists between the ridge 12 and the second reflective layer 28 and covers the entire surface of the second side surface 18 of the ridge 12. 2 absorption layers 26.
  • the description of the same configuration as that of the wire grid polarizer 10 of the first to fourth embodiments is omitted.
  • the maximum value Dr2 of the thickness in the width direction of the ridges 12 of the second reflective layer 28 preferably satisfies the following formula (II). 0.2 ⁇ (Pp ⁇ Dpb) ⁇ Dr2 ⁇ 0.5 ⁇ (Pp ⁇ Dpb) (II) If Dr2 is 0.2 ⁇ (Pp ⁇ Dpb) or more, high p-polarized light transmittance is exhibited and chromatic dispersion is small. When Dr2 is 0.5 ⁇ (Pp ⁇ Dpb) or less, the polarization separation ability is sufficiently high.
  • the height Hr2 of the second reflective layer 28 is preferably 80 to 500 nm, more preferably 80 to 400 nm, and further preferably 120 to 300 nm. If Hr2 is 80 nm or more, crystallization of the second reflective layer 28 is suppressed and high s-polarized reflectance is exhibited. If Hr2 is 500 nm or less, the polarization separation ability is sufficiently high even in a short wavelength region.
  • Hr2 / Hp is preferably 0.5 to 1, and more preferably 0.6 to 1. If Hr2 / Hp is 1 or less, the polarization separation ability is improved. If Hr2 / Hp is 0.5 or more, the angle dependency of the optical characteristics is sufficiently low.
  • the second reflective layer 28 covers a part or the whole of the top of the ridge 12, the height at the top is preferably 20 nm or less from the viewpoint of suppressing a decrease in transmittance.
  • the first side surface of the ridge is the right side surface of the ridge.
  • the second side surface of the ridge is the left side surface of the ridge, and the second side surface
  • the example in which the second absorbing layer and the second reflecting layer are formed has been described.
  • the first side surface of the ridges in each drawing is the left side surface of the ridges, and the second side surface of the ridges is the same. It is good also as a surface on the right side of a protruding item
  • the manufacturing method of the wire grid type polarizer of each embodiment [Method for Manufacturing Wire Grid Polarizer of First Embodiment]
  • the first absorption layer 22 is formed on the surface of the first side surface 16 of the ridge 12 of the light-transmitting substrate 14, and the first absorption layer 22 It can be manufactured by forming the first reflective layer 20 on the surface.
  • the first absorbent layer 22 is substantially orthogonal to the length direction L of the ridges 12 and on the first side face 16 side with respect to the height direction H of the ridges 12.
  • the light-absorbing material from a direction V1 constituting a 25-40 ° angle theta R can be formed by depositing under the condition that the deposition amount described above is 3 ⁇ 20 nm.
  • Deposition may be performed n times (where n is an integer of 2 or more) under the condition that the total deposition amount is 3 to 20 nm.
  • i-th (where, i is 1 to a n-1 an integer.) angle theta R i and i + 1 th angle theta R i + 1 of is preferably ⁇ R i + 1 ⁇ R i.
  • Deposition sources include light absorbing materials (low reflective metals such as nickel, chromium, titanium, tungsten, platinum, molybdenum and vanadium; inorganic oxides such as chromium oxide and aluminum oxide; inorganic nitrides such as titanium nitride and silicon nitride) Inorganic carbides such as aluminum carbide and molybdenum carbide; carbon compounds such as carbon black and carbon nanotubes, etc.), and nickel, chromium and titanium are preferred from the standpoints of high absorption rate and high productivity.
  • low reflective metals such as nickel, chromium, titanium, tungsten, platinum, molybdenum and vanadium
  • inorganic oxides such as chromium oxide and aluminum oxide
  • inorganic nitrides such as titanium nitride and silicon nitride
  • Inorganic carbides such as aluminum carbide and molybdenum carbide
  • carbon compounds such as carbon black and carbon nanotubes, etc.
  • the first reflective layer 20 is substantially orthogonal to the length direction L of the ridges 12 and on the first side surface 16 side with respect to the height direction H of the ridges 12.
  • the metallic material from a direction V1 constituting 25-50 ° angle theta R, the deposition amount described above can be formed by depositing the condition to be 15 ⁇ 50 nm.
  • Deposition may be performed n times (where n is an integer of 2 or more) under the condition that the total deposition amount is 15 to 50 nm.
  • i-th (where, i is 1 to a n-1 an integer.) angle theta R i and i + 1 th angle theta R i + 1 of is preferably ⁇ R i + 1 ⁇ R i.
  • Examples of the deposition source include metal materials (aluminum, silver, magnesium, aluminum-based alloys, silver-based alloys, etc.), high reflectivity for visible light, little absorption of visible light, and high conductivity. Therefore, aluminum, aluminum-based alloy, silver and magnesium are preferable, and aluminum and aluminum-based alloy are particularly preferable.
  • a base layer 24 is formed on the surface of the first side surface 16 of the ridge 12 of the light-transmitting substrate 14, and the first absorption is formed on the surface of the base layer 24. It can be manufactured by forming the layer 22 and forming the first reflective layer 20 on the surface of the first absorption layer 22.
  • the description of the same configuration as that of the wire grid polarizer 10 of the first embodiment is omitted.
  • the base layer 24 is substantially orthogonal to the length direction L of the ridges 12 and 25 to 40 on the first side face 16 side with respect to the height direction H of the ridges 12.
  • the metallic material from a direction V1 constituting a degree angle theta R can be formed by depositing under the condition that the deposition amount described above is 3 ⁇ 15 nm.
  • Deposition may be performed n times (where n is an integer of 2 or more) under the condition that the total deposition amount is 3 to 15 nm.
  • i-th (where, i is 1 to a n-1 an integer.) angle theta R i and i + 1 th angle theta R i + 1 of is preferably ⁇ R i + 1 ⁇ R i.
  • Examples of the deposition source include metal materials (aluminum, silver, magnesium, aluminum-based alloys, silver-based alloys, etc.), and aluminum and aluminum-based alloys are preferable from the viewpoint of high reflectivity in the visible light region.
  • the wire grid polarizer 10 of the third embodiment can be manufactured by adding the following steps to the manufacturing method of the first embodiment. At an arbitrary stage, a step of forming the second absorption layer 26 on the surface of the second side face 18 of the ridge 12 of the light transmissive substrate 14 is added. In the third embodiment, the description of the same configuration as that of the wire grid polarizer 10 of the first embodiment is omitted.
  • the second absorbent layer 26 is substantially orthogonal to the length direction L of the ridges 12 and on the second side surface 18 side with respect to the height direction H of the ridges 12.
  • the light-absorbing material from a direction V2 constituting 25-40 ° angle theta L can be formed by depositing under the condition that the deposition amount described above is 3 ⁇ 20 nm.
  • Deposition may be performed n times (where n is an integer of 2 or more) under the condition that the total deposition amount is 3 to 20 nm. i-th (where i is an integer from 1 to n ⁇ 1). ) Angle ⁇ L i and the (i + 1) th angle ⁇ L i + 1 are preferably ⁇ L i + 1 ⁇ L i .
  • vapor deposition sources include light absorbing materials (nickel, chromium, titanium, tungsten, platinum, molybdenum, vanadium nickel, chromium, titanium, etc.). Chromium and titanium are preferred.
  • the wire grid polarizer 10 of the fourth embodiment can be manufactured by adding the following steps to the manufacturing method of the second embodiment. At an arbitrary stage, a step of forming the second absorption layer 26 on the surface of the second side face 18 of the ridge 12 of the light transmissive substrate 14 is added. In the fourth embodiment, the description of the same configuration as that of the wire grid polarizer 10 of the first to third embodiments is omitted.
  • the wire grid polarizer 10 of the fifth embodiment can be manufactured by adding the following steps to the manufacturing method of the third embodiment. At an optional stage, a step of forming the second reflective layer 28 on the surface of the second absorption layer 26 is added. In the fifth embodiment, the description of the same configuration as that of the wire grid polarizer 10 of the first to fourth embodiments is omitted.
  • the second reflective layer 28 is substantially orthogonal to the length direction L of the ridges 12 and on the second side surface 18 side with respect to the height direction H of the ridges 12. It can be formed by vapor-depositing a metal material from the direction V2 forming an angle ⁇ L of 25 to 50 ° under the condition that the vapor deposition amount is 15 to 50 nm.
  • Deposition may be performed n times (where n is an integer of 2 or more) under the condition that the total deposition amount is 15 to 50 nm.
  • i-th (where, i is 1 to a n-1 an integer.) angle theta L i and i + 1 th angle theta L i + 1 of is preferably ⁇ L i + 1 ⁇ L i.
  • Examples of the deposition source include metal materials (aluminum, silver, magnesium, aluminum-based alloys, silver-based alloys, etc.), high reflectivity for visible light, little absorption of visible light, and high conductivity. Therefore, aluminum, aluminum-based alloy, silver and magnesium are preferable, and aluminum and aluminum-based alloy are particularly preferable.
  • the angle ⁇ R ( ⁇ L ) in the manufacturing methods of the first to fifth embodiments can be adjusted by using, for example, the following vapor deposition apparatus.
  • An angle ⁇ R ( ⁇ L ) is formed on the first side surface 16 (second side surface 18) side with respect to the height direction H of the ridge 12 and substantially perpendicular to the length direction L of the ridge 12.
  • the vapor deposition apparatus which can change the inclination of the light-transmitting substrate 14 arrange
  • the cross-sectional shape of the plurality of ridges formed on the surface of the light-transmitting substrate is such that the width gradually decreases from the bottom toward the top.
  • the first side surface of the ridge is covered with the first reflective layer, it exhibits a high degree of polarization and a high p-polarized light transmittance.
  • line and a 1st reflective layer a back surface s polarized light reflectance is low.
  • the first side surface side is substantially orthogonal to the length direction of the ridges and the height direction of the ridges.
  • a light-absorbing material is deposited from a direction that forms an angle of 25 to 40 ° under the condition that the deposition amount is 3 to 20 nm to form a first absorption layer, and is substantially orthogonal to the length direction of the ridges.
  • a metal material is vapor-deposited from a direction that forms an angle ⁇ of 25 to 40 ° on the side of the first side surface with respect to the height direction of the ridges, under the condition that the vapor deposition amount is 15 to 50 nm. Since the reflective layer is formed, a wire grid type polarizer having a high degree of polarization and p-polarized light transmittance and a low back surface s-polarized light reflectance can be produced with high productivity.
  • the liquid crystal panel having a liquid crystal layer sandwiched between a pair of substrates, the backlight unit, and the surface on which the protrusions are formed are on the backlight unit side, and no protrusions are formed.
  • the wire grid polarizer of the present invention is arranged so that the side surface is on the viewing side of the liquid crystal display device.
  • the wire grid polarizer may be disposed on one surface of the liquid crystal panel, and is preferably disposed on the surface of the liquid crystal panel on the backlight unit side. Further, the wire grid type polarizer is arranged in an integrated state with one of the pair of substrates of the liquid crystal panel as described in FIG. 15 of Japanese Patent Application Laid-Open No. 2006-139283. Alternatively, it is preferably integrated with the substrate of the liquid crystal panel on the backlight unit side.
  • the wire grid polarizer is arranged on the liquid crystal layer side of one of the pair of substrates of the liquid crystal panel, that is, inside the liquid crystal panel, as described in FIG. 14 of Japanese Patent No. 412388. Of the pair of substrates of the liquid crystal panel, it is preferably disposed on the liquid crystal layer side of the substrate on the backlight unit side.
  • the liquid crystal display device of the present invention preferably has an absorptive polarizer on the surface of the liquid crystal panel opposite to the side on which the wire grid polarizer is disposed, from the viewpoint of thinning.
  • the absorptive polarizer is more preferably disposed on the surface of the liquid crystal panel opposite to the backlight unit side.
  • FIG. 7 is a cross-sectional view showing an example of the liquid crystal display device of the present invention.
  • the liquid crystal display device 30 includes a liquid crystal panel 34 having a liquid crystal layer 33 sandwiched between a pair of substrates 31 and 32, a backlight unit 35, and the liquid crystal panel 34 on the backlight unit 35 side. And the absorptive polarizer 36 attached to the surface of the liquid crystal panel 34 opposite to the backlight unit 35 side.
  • the liquid crystal display device of the present invention described above has a high luminance because it has a wire grid type polarizer having a high degree of polarization and high p-polarized light transmittance.
  • the s-polarized reflectance of one surface is high, and the other surface (the ridges are not formed).
  • the wire grid polarizer obtained by the manufacturing method of the present invention having a low s-polarized reflectance on the side surface (that is, the back surface) the surface on which the protrusions are formed becomes the backlight unit side, and the protrusions are formed. Since it is arranged so that the surface on the side that is not provided is the viewing side of the liquid crystal display device, a decrease in contrast can be suppressed.
  • Examples 1 to 30 are examples, and examples 31 to 34 are comparative examples.
  • the dimensions of the ridges and the respective layers are the maximum values of the dimensions of the five ridges and the respective layers on the ridges in the transmission electron microscope image of the cross section of the wire grid polarizer (however, Dr1, Dr2, Db1, Da1 and Da2 were values defined above.) And the five maximum values were averaged.
  • the p-polarized light transmittance was measured using an ultraviolet-visible spectrophotometer (manufactured by JASCO, V-7200).
  • the attached polarizer is set between the light source and the wire grid polarizer so that the absorption axis is parallel to the major axis of the metal wire of the wire grid polarizer, and the surface of the wire grid polarizer is set.
  • Polarization was made incident from the side (side where the ridges were formed) or the back side (side where the ridges were not formed).
  • the measurement wavelengths were 450 nm, 550 nm, and 700 nm.
  • the p-polarized light transmittance was 40% or more as S, 35% or more and less than 40% as A, 30% or more and less than 35% as B, and less than 30% as X.
  • the s-polarized reflectance was measured using an ultraviolet-visible spectrophotometer (manufactured by JASCO, V-7200). In the measurement, the attached polarizer is set between the light source and the wire grid polarizer so that the absorption axis is perpendicular to the long axis of the metal fine wire of the wire grid polarizer, and the surface of the wire grid polarizer is set. Alternatively, the incident light was incident on the back surface at an angle of 5 degrees. The measurement wavelengths were 450 nm, 550 nm, and 700 nm.
  • the surface s-polarized reflectance was 40% or more as S, 35% or more and less than 40% as A, and 30% or more and less than 35% as B. Further, the back surface s-polarized reflectance was less than 10% as S, 10% or more but less than 20% as A, 20% or more as B, and less than 20% as X.
  • the luminance was measured by the following method.
  • a wire grid polarizer and a liquid crystal cell were stacked in this order on a 2-inch LED sidelight-type backlight.
  • the wire grid type polarizer was installed so that the back side was the liquid crystal cell side.
  • As the liquid crystal cell a cell having an iodine polarizing plate only on the upper side was used.
  • a backlight and a liquid crystal cell were launched in the dark room.
  • the display on the entire surface of the liquid crystal cell was white display, and the central luminance B31 after 10 minutes of lighting was measured with a color luminance meter (Topcon, BM-5AS) at a viewing angle of 0.1 °.
  • the entire surface of the liquid crystal cell was displayed as black, and the luminance B32 at that time was measured.
  • the same backlight was used, and a liquid crystal cell provided with iodine-based polarizing plates on the upper side and the lower side was stacked thereon.
  • the backlight and the liquid crystal cell were started up in the dark room, and similarly, the central luminance B21 when the entire display of the liquid crystal cell was displayed as white was measured.
  • the luminance improvement rate was obtained from the following formula.
  • Brightness improvement rate (B32 ⁇ B21) / B21 ⁇ 100
  • the luminance improvement rate was 25% or more as S, 20% or more and less than 25% as A, 15% or more and less than 20% as B, and less than 15% as X.
  • Contrast B31 / B32 Contrast was 1000 or more as S, 500 or more and less than 1000 as A, 300 or more and less than 500 as B, and less than 300% as X.
  • the absorption rate of the light-absorbing material was estimated by the following method.
  • Nickel absorption rate A 5-inch quartz wafer with a thickness of 0.55 mm was set horizontally with respect to the target in a vacuum deposition apparatus (SEC-16CM, manufactured by Showa Vacuum Co., Ltd.), and the pressure was 1.2 ⁇ 10 ⁇ 4 Pa. Under the conditions, nickel was deposited on a quartz wafer so as to have a thickness of 60 nm. Using a UV-visible spectrophotometer (manufactured by JASCO, V-7200), the transmittance and reflectance at a wavelength of 550 nm of a quartz wafer having a nickel thin film formed on the upper surface were determined. A quartz wafer was used as a blank. The absorption rate was estimated from the following equation.
  • Absorptivity (%) of light having a wavelength of 550 nm 100 ⁇ Transmittance (%) of light having a wavelength of 550 nm ⁇ Reflectance (%) of light having a wavelength of 550 nm Transmittance: 1%, Reflectance: 25%, Absorption rate: 74%
  • Absorption rate Absorption rate was estimated by the same method as nickel. Transmittance: 0%, reflectivity: 95%, absorption rate: 5%
  • the flask was homogenized by stirring for 1 hour in a state of normal temperature and light shielding.
  • 100 g (solid content: 30 g) of colloidal silica was slowly added while stirring in the flask, and the mixture was further homogenized by stirring for 1 hour while keeping the temperature of the flask at room temperature and light shielding.
  • 340 g of cyclohexanone was added, and the solution was stirred for 1 hour with the inside of the flask at room temperature and light-shielded to obtain a solution of the photocurable composition 1.
  • Example 1 The photocurable composition 1 was applied by spin coating on the surface of a 100 ⁇ m thick highly transparent polyethylene terephthalate (PET) film (Teijin DuPont, Teijin Tetron O3, 100 mm ⁇ 100 mm), and photocured with a thickness of 5 ⁇ m. A coating film of the composition 1 was formed.
  • PET polyethylene terephthalate
  • a quartz mold (area: 150 mm ⁇ 150 mm, pattern area: 100 mm ⁇ 100 mm, groove pitch Pp: a plurality of grooves formed in parallel with each other at a predetermined pitch through flat portions formed between the grooves. 140 nm, groove top width Dpb: 60 nm, groove bottom width Dpt: 20 nm, groove depth Hp: 200 nm, groove length: 100 mm, groove cross-sectional shape: substantially trapezoidal).
  • the film was pressed against the coating film of the photocurable composition 1 at 25 MPa at 0.5 MPa (gauge pressure) so as to be in contact with the coating film of the composition 1.
  • the PET film side was irradiated with light of a high-pressure mercury lamp (frequency: 1.5 kHz to 2.0 kHz, main wavelength light: irradiation energy at 255 nm, 315 nm, 365 nm, 365 nm: 1000 mJ) for 15 seconds,
  • the photocurable composition 1 is cured, and a light-transmitting substrate 1 having a plurality of ridges corresponding to the grooves of the quartz mold and flat portions between the ridges (pitch pitch Pp of ridges: 140 nm,
  • the bottom width Dpb 60 nm, the top width Dpt of the ridge: 20 nm, the height Hp of the ridge: 200 nm, ⁇ 1 and ⁇ 2: 84 °
  • the quartz mold was slowly separated from the light transmissive substrate 1.
  • a vacuum vapor deposition apparatus capable of changing the inclination of the light transmissive substrate 1 facing the vapor deposition source, under a pressure of 1.2 ⁇ 10 ⁇ 4 Pa, the light transmissive substrate to a first aspect of the first convex, the direction V shown in Table 1 as the first deposition to form a first absorbent layer by depositing a nickel at an angle theta R and deposition amount t, then the first A wire grid in which aluminum is deposited in the direction V, angle ⁇ R and deposition amount t shown in Table 1 as the second deposition on the surface of the absorbent layer, a first reflective layer is formed, and a PET film is adhered to the back surface A type polarizer was obtained.
  • the deposition amount t was measured by a film thickness monitor using a crystal resonator as a film thickness sensor.
  • Example 2 and 3 A wire grid polarizer was obtained in the same manner as in Example 1 except that the nickel forming the first absorption layer was changed to titanium or chromium.
  • Example 4 Except that the angle theta R for forming the first reflective layer and the angle shown in Table 1, to obtain a wire grid polarizer in the same manner as in Example 1.
  • Example 5 On the first side surface of the ridge of the light-transmitting substrate 1 produced in the same manner as in Example 1 under the pressure of 1.2 ⁇ 10 ⁇ 4 Pa, the direction V and the angle ⁇ shown in Table 1 as the first deposition. A base layer is formed by vapor-depositing aluminum with R and a deposition amount t, and then nickel is deposited on the surface of the base layer with a direction V, an angle ⁇ R and a deposition amount t shown in Table 1 as a second deposition.
  • Example 6 and 7 A wire grid type polarizer was obtained in the same manner as in Example 5 except that the nickel forming the first absorption layer was changed to titanium or chromium.
  • Example 8 Except that the angle theta R for forming the first reflective layer and the angle shown in Table 1, to obtain a wire grid polarizer in the same manner as in Example 6.
  • Example 9 On the second side surface of the ridge of the light-transmitting substrate 1 produced in the same manner as in Example 1 under the condition of pressure: 1.2 ⁇ 10 ⁇ 4 Pa, the direction V and the angle ⁇ shown in Table 1 as the first deposition.
  • the second absorption layer is formed by depositing nickel with L and the deposition amount t, and then the direction V, the angle ⁇ R and the deposition amount t shown in Table 1 as the second deposition on the first side surface of the ridge.
  • Example 10 and 11 A wire grid polarizer was obtained in the same manner as in Example 9 except that nickel forming the first absorption layer and the second absorption layer was changed to titanium or chromium.
  • Example 12 Except that the angle theta R for forming the first reflective layer and the angle shown in Table 1, to obtain a wire grid polarizer in the same manner as in Example 10.
  • Example 13 On the first side surface of the ridge of the light-transmitting substrate 1 produced in the same manner as in Example 1 under the pressure of 1.2 ⁇ 10 ⁇ 4 Pa, the direction V and the angle ⁇ shown in Table 1 as the first deposition. A base layer is formed by vapor-depositing aluminum with R and a deposition amount t, and then nickel is deposited with the direction V, angle ⁇ L and deposition amount t shown in Table 1 as the second deposition on the second side surface of the ridge.
  • the forming the second absorbent layer by depositing and then, the first absorbent layer by depositing the nickel in the direction V shown in Table 1 as the third deposited underlayer surface, the angle theta R and deposition amount t Then, aluminum is vapor-deposited on the first absorption layer surface in the direction V, angle ⁇ R and vapor deposition amount t shown in Table 1 as the fourth vapor deposition, to form the first reflective layer, and on the back surface A wire grid polarizer with a PET film attached thereto was obtained.
  • Example 14 and 15 A wire grid polarizer was obtained in the same manner as in Example 13 except that the nickel forming the first absorption layer and the second absorption layer was changed to titanium or chromium.
  • Example 16 Except that the angle theta R for forming the first reflective layer and the angle shown in Table 1, to obtain a wire grid polarizer in the same manner as in Example 14.
  • Example 17 On the first side surface of the ridge of the light-transmitting substrate 1 produced in the same manner as in Example 1 under the pressure of 1.2 ⁇ 10 ⁇ 4 Pa, the direction V and the angle ⁇ shown in Table 1 as the first deposition.
  • the first absorption layer is formed by evaporating nickel with R and the deposition amount t, and then the direction V, the angle ⁇ L and the deposition amount t shown in Table 1 as the second deposition on the second side surface of the ridge. Then, nickel is vapor-deposited to form a second absorption layer, and then aluminum is vapor-deposited on the surface of the first absorption layer in the direction V, angle ⁇ R and vapor deposition amount t shown in Table 1 to form the first absorption layer.
  • a reflective layer is formed, and then aluminum is deposited on the second absorption layer surface in the direction V, angle ⁇ L and deposition amount t shown in Table 1 to form the second reflective layer, and the PET film is formed on the back surface.
  • a wire grid type polarizer attached with was obtained.
  • Example 18 A wire grid polarizer was obtained in the same manner as in Example 17 except that nickel forming the first absorption layer and the second absorption layer was changed to titanium or chromium.
  • Example 20 A wire grid polarizer was obtained in the same manner as in Example 18 except that the angle ⁇ L when forming the second reflective layer was changed to the angle shown in Table 1.
  • Example 21 As a mold, a quartz mold (area: 150 mm ⁇ 150 mm, pattern area: 100 mm ⁇ 100 mm, groove area) in which a plurality of grooves are formed in parallel with each other at a predetermined pitch through flat portions formed between the grooves. (Pitch Pp: 140 nm, groove width Dpb: 60 nm, groove depth Hp: 200 nm, groove length: 100 mm, groove cross-sectional shape: substantially isosceles triangle).
  • Light transmissive substrate 2 having a plurality of ridges corresponding to the grooves of the quartz mold and flat portions between the ridges (ridge pitch Pp: 140 nm, ridge width Dpb: 60 nm, ridge height Hp : 200 nm, ⁇ 1 and ⁇ 2: 87 °).
  • a wire grid polarizer was obtained in the same manner as in Example 1 except that the light-transmitting substrate 2 was used.
  • Example 21 using the light-transmitting substrate 2 was prepared in the same manner as, except that the angle theta R for forming the first reflective layer was angle shown in Table 2, in the same manner as in Example 1 wire grid type polarization I got a child.
  • Example 23 A wire grid polarizer was obtained in the same manner as in Example 5 except that the light-transmitting substrate 2 produced in the same manner as in Example 21 was used.
  • Example 21 using the light-transmitting substrate 2 was prepared in the same manner as, except that the angle theta R for forming the first reflective layer was angle shown in Table 2, a wire grid type polarization in the same manner as in Example 5 I got a child.
  • Example 25 A wire grid polarizer was obtained in the same manner as in Example 9 except that the light-transmitting substrate 2 produced in the same manner as in Example 21 was used.
  • Example 21 using the light-transmitting substrate 2 was prepared in the same manner as, except that the angle theta R for forming the first reflective layer was angle shown in Table 2, a wire grid type polarization in the same manner as in Example 9 I got a child.
  • Example 27 A wire grid polarizer was obtained in the same manner as in Example 13 except that the light-transmitting substrate 2 produced in the same manner as in Example 21 was used.
  • Example 21 using the light-transmitting substrate 2 was prepared in the same manner as, except that the angle theta R for forming the first reflective layer was angle shown in Table 2, a wire grid type polarization in the same manner as in Example 13 I got a child.
  • Example 29 A wire grid polarizer was obtained in the same manner as in Example 17 except that the light-transmitting substrate 2 produced in the same manner as in Example 21 was used.
  • Example 30 Using the light-transmitting substrate 2 produced in the same manner as in Example 21, the angle ⁇ R when forming the first reflective layer and the angle ⁇ L when forming the second reflective layer are the angles shown in Table 2.
  • a wire grid polarizer was obtained in the same manner as in Example 17 except that.
  • Example 31 As a mold, a quartz mold (area: 150 mm ⁇ 150 mm, pattern area: 100 mm ⁇ 100 mm, groove area) in which a plurality of grooves are formed in parallel with each other at a predetermined pitch through flat portions formed between the grooves.
  • a quartz mold is used in the same manner as in Example 1 except that the pitch Pp is 150 nm, the groove width Dpb is 60 nm, the groove depth Hp is 200 nm, the groove length is 100 mm, and the groove cross-sectional shape is rectangular.
  • a light-transmitting substrate 3 having a plurality of ridges corresponding to the grooves and a flat portion between the ridges (ridge pitch Pp: 150 nm, ridge width Dpb: 60 nm, ridge height Hp: 200 nm, ⁇ 1 and ⁇ 2: 90 °).
  • the photocurable substrate 3 Using the photocurable substrate 3 and using the same vacuum vapor deposition apparatus as in Example 1, while introducing 0.2 nm / sec of oxygen under the condition of pressure: 1.2 ⁇ 10 ⁇ 4 Pa, the light transmissive substrate 3 to a first aspect of the ridges of the first deposition, the direction shown in Table 2 V, at an angle theta R and deposition amount t, the first absorbent layer is evaporated while oxidizing the chromium (chromium oxide layer) Formed.
  • the first absorption layer plane direction V shown in Table 2 aluminum was vapor deposition at an angle theta R and deposition amount t, forming the first reflective layer (aluminum layer)
  • a wire grid polarizer with a PET film attached to the back surface was obtained.
  • the chromium oxide layer and the outermost aluminum layer were formed only near the tops of the ridges.
  • the maximum width in the width direction of the ridges of the chromium oxide layer was 67 nm and the height was 45 nm.
  • the maximum width in the width direction of the ridges of the aluminum layer was 75 nm, and the height was 117 nm.
  • Example 32 Using the light-transmitting substrate 3 prepared in Example 31, using the same vacuum deposition apparatus as in Example 1, under the condition of pressure: 1.2 ⁇ 10 ⁇ 4 Pa, the first of the ridges of the light-transmitting substrate 3 on the sides, as the first deposition, the direction shown in Table 2 V, aluminum was vapor deposition at an angle theta R and deposition amount t, forming the first reflective layer (aluminum layer).
  • the said first direction V shown in Table 2 was formed, and a wire grid polarizer having a PET film attached to the back surface was obtained.
  • the aluminum layer and the outermost chromium oxide layer were formed only near the top of the ridge.
  • the maximum width in the width direction of the ridges of the aluminum layer was 70 nm, and the height was 116 nm.
  • the maximum width in the width direction of the ridge of the chromium oxide layer as the outermost layer was 74 nm, and the height was 20 nm.
  • Example 21 using the light-transmitting substrate 2 was prepared in the same manner as, except that the angle theta R for forming the first absorbent layer was the angle shown in Table 2, in the same manner as in Example 1 wire grid type polarization I got a child.
  • Example 34 Pressure: the conditions of 1.2 ⁇ 10 -4 Pa, the ridges of the light-transmitting substrate 2 was prepared in the same manner as in Example 21, the direction shown in Table 2 V, the aluminum at an angle theta R and deposition amount t The first reflective layer is formed by vapor deposition, then nickel is vapor-deposited in the direction V, angle ⁇ L and vapor deposition amount t shown in Table 2 to form the first absorption layer, and a PET film is pasted on the back surface. A worn wire grid polarizer was obtained.
  • the wire grid polarizer of the present invention is useful as a polarizer for an image display device such as a liquid crystal display device, a rear projection television, or a front projector.
  • image display device such as a liquid crystal display device, a rear projection television, or a front projector.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Polarising Elements (AREA)

Abstract

L'invention porte sur un polariseur à grille métallique ayant un degré élevé de polarisation et de transmission de lumière polarisée p et une faible rétroréflexion de lumière polarisée s, et également sur un procédé de fabrication de celui-ci. Le polariseur à grille métallique (10) comprend un substrat transmettant la lumière (14) ayant une surface sur laquelle une pluralité de nervures (12) dont la largeur diminue progressivement de la partie inférieure vers la partie supérieure, sont formées en parallèle avec une partie plate (13) formée entre celles-ci et à un pas prédéterminé (Pp), une première couche réfléchissante (20) composée d'un matériau métallique et recouvrant la première surface latérale (16) de la nervure (12), et une première couche d'absorption (22) composée d'un matériau absorbant la lumière qui absorbe davantage la lumière que le matériau métallique et est présent entre la nervure (12) et la première couche réfléchissante (20) pour recouvrir la première surface latérale (16) des nervures (12) dans leur ensemble. Le procédé de fabrication du polariseur à grille métallique (10) comprend une étape de formation de la première couche d'absorption (22) et de la première couche réfléchissante (20) par dépôt oblique. L'invention porte également sur un dispositif d'affichage à cristaux liquides équipé du polariseur à grille métallique (10).
PCT/JP2010/057625 2009-04-30 2010-04-28 Polariseur à grille métallique et son procédé de fabrication WO2010126110A1 (fr)

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JP2013120319A (ja) * 2011-12-08 2013-06-17 Sharp Corp 液晶表示装置
US20160327713A1 (en) * 2014-12-30 2016-11-10 Boe Technology Group Co., Ltd. Wire grid polarizer and manufacturing method thereof, and display device
US9897735B2 (en) 2014-10-17 2018-02-20 Boe Technology Group Co., Ltd. Wire grid polarizer and fabrication method thereof, and display device
US10042099B2 (en) 2014-12-30 2018-08-07 Boe Technology Group Co., Ltd. Wire grid polarizer and manufacturing method thereof, and display device

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DE112012004296B4 (de) * 2011-10-14 2021-01-07 Asahi Kasei E-Materials Corp. Drahtgitter-Polarisationsplatte und projektionsartigeBildanzeigevorrichtung
US9632224B2 (en) 2014-06-25 2017-04-25 Moxtek, Inc. Broadband, selectively-absorptive wire grid polarizer
WO2016114847A1 (fr) * 2015-01-16 2016-07-21 Moxtek, Inc. Polariseur à grille de fils à absorption sélective et à large bande
JP6586404B2 (ja) * 2016-09-27 2019-10-02 日東電工株式会社 光学積層体および該光学積層体を用いた液晶表示装置
US10824011B2 (en) * 2017-01-04 2020-11-03 Samsung Electronics Co., Ltd. Photoluminescent polarizers having metal film with surface plasmon coupling and electronic devices including the same
CN111580302B (zh) * 2020-06-16 2023-01-10 京东方科技集团股份有限公司 反射式液晶显示板及显示装置

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JP2012155163A (ja) * 2011-01-27 2012-08-16 Asahi Kasei E-Materials Corp ワイヤグリッド偏光板
JP2013120319A (ja) * 2011-12-08 2013-06-17 Sharp Corp 液晶表示装置
US9897735B2 (en) 2014-10-17 2018-02-20 Boe Technology Group Co., Ltd. Wire grid polarizer and fabrication method thereof, and display device
US20160327713A1 (en) * 2014-12-30 2016-11-10 Boe Technology Group Co., Ltd. Wire grid polarizer and manufacturing method thereof, and display device
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US10042099B2 (en) 2014-12-30 2018-08-07 Boe Technology Group Co., Ltd. Wire grid polarizer and manufacturing method thereof, and display device

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