TW201100888A - Wire-grid polarizer and method of fabricating same - Google Patents

Abstract

Provided is a wire-grid polarizer having high degree of polarization and high p-polarized light transmission and a low back s-polarized light reflectance, and also provided is a method of fabricating same. A wire-grid polarizer (10) comprises a light-transmissive substrate (14) having a surface on which a plurality of ribs (12) which decreases in width gradually from the bottom toward the top are formed in parallel with a flat part (13) formed therebetween and at a predetermined pitch (Pp), a first reflective layer (20) composed of a metal material and covering the first side surface (16) of the rib (12), and a first absorption layer (22) composed of a light-absorbing material which absorbs light more than the metal material and existing between the rib (12) and the first reflective layer (20) to cover the first side surface (16) of the ribs (12) entirely. A method of fabricating the wire-grid polarizer (10) comprises a step for forming the first absorption layer (22) and the first reflective layer (20) by oblique deposition. A liquid crystal display equipped with the wire-grid polarizer (10) is also provided.

Description

201100888 VI. Description of the Invention: C. The present invention relates to a wire grid type polarizer and a method of manufacturing the same. BACKGROUND OF THE INVENTION A polarizing member (also referred to as a polarization separating element) for a liquid crystal display device, a rear projection type projection television, and a front projection type projector 4 image display device and exhibiting a polarization separation capability in a visible light region includes an absorption type polarizing member. And reflective polarizers. For example, the absorbing polarizer is a polarizer that directs a dichroism pigment such as iodine to the resin film. However, since the absorbing polarizer absorbs a part of the polarized light, the light utilization efficiency is low. On the other hand, the reflective polarizer causes the light that is not incident on the polarizer to be incident on the polarizer again, so that the light use efficiency can be improved. Therefore, the demand for the reflective polarizer has been increasing for the purpose of increasing the luminance of the liquid crystal display device or the like. The reflective polarizer includes a linear polarizer composed of a birefringent resin laminate, a circular polarizer composed of a cholesteric liquid crystal, and a wire grid polarizer. However, the polarization separation ability of the linear polarizer and the circular polarizer is low. Therefore, a wire grid type polarizer which exhibits a polarization separation capability is attracting attention. In the grid! The polarizer has a structure in which a plurality of metal thin wires are arranged in parallel with each other on a transparent substrate. When the pitch of the fine metal wires is sufficiently shorter than the wavelength of the incident light, the light beam vector having a ridge line side (hereinafter referred to as a surface side) formed by the wire grid type polarizer has a composition of an electric field vector perpendicular to the thin metal wire ( That is, 'P-polarized light' is transmitted, and a component having an electric field vector parallel to the thin metal wire (that is, s-polarized light) is reflected. A linear thumb polarizer which exhibits a polarization separation ability in the visible light region is known as follows. (1) A wire-grid type polarizer in which a metal layer is formed on a plurality of ridges formed at a predetermined pitch on a surface of a light-transmitting substrate to form a metal thin wire (Patent Documents 1 and 2). Since the wire grid type polarizer of (1) is formed of metal thin wires by metal vapor deposition, productivity is preferable. However, when the wire-grid polarizer of (1) is attached to the backlight side surface of the liquid crystal panel in the liquid crystal display device, the liquid crystal panel side is not formed on the side of the liquid crystal panel (the wire-grid type polarizer is not formed, and the inside is hereinafter referred to as the inside). The side S incident light is reflected by the thin metal wires, resulting in a decrease in the contrast of the displayed image. On the other hand, a wire grid type polarizer in which the S-polarized reflectance (hereinafter referred to as s-polarized reflectance) incident on the back side has been suppressed has been proposed. (2) A wire-grid polarizer in which a black layer and a metal layer are formed on a portion of a plurality of ridges having a rectangular cross section formed at a predetermined pitch on a surface of a light-transmitting substrate (Special Document No. 28(a), (b) Figure). PRIOR ART DOCUMENT PATENT DOCUMENT PATENT DOCUMENT PATENT DOCUMENT 1: 曰本特开 2006_003447号号 201100888 Patent Document 2: International Publication No. 2006/064693 (U.S. Publication No. 2008/0129931) Patent Document 3: International Publication No. 2〇〇8/〇84856 The manual of the invention is disclosed in the present invention. However, the wire grid type polarizer of the above (2) (a) has the following problems.

(1) The cross-sectional shape of the ridge is a rectangle, and an L-shaped metal layer is formed on the upper portion of the rectangular ridge. Therefore, the transmittance of the P-polarized light is low, and the brightness of the image displayed by the blue-light is lowered. (II) Since the black layer is formed only on the top of the ridge, the reflectance of the inside s polarized light cannot be sufficiently suppressed, resulting in a decrease in the contrast of the displayed image. (III) In order to obtain the effect of suppressing the polarized light reflectance of the facet 8, it is necessary to attach the side of the black layer to the liquid crystal panel, but the side of the black layer is uneven, so that the wire grid type polarizer is not easily formed on the liquid crystal panel. Also, the optical characteristics may be lowered by the influence of the adhesive used in the attachment. (IV) Since light from the backlight is incident from the side of the light-transmissive substrate, p-polarized light is reflected at the interface between the air and the light-transmitting substrate, and the brightness of the displayed image is lowered. Further, the wire grid type polarizer of (b) (b) has the following problems. (1) The wearing surface of the ridge is a rectangle, and a metal layer of L liter/ is formed on the upper portion of the rectangular ridge. Therefore, the transmittance of the light (10) is low, resulting in a decrease in the brightness of the displayed image. 201100888

(9) Since the metal layer is formed only on the top of the ridge (10), the black layer is not completely covered with the ridge - the edge is cut low, and the polarization reflectance is insufficient, resulting in the fact that the invention provides a high degree of polarization and High 2 = low. A wire grid type polarizer having a low S-disparity rate and its manufacturing = radiance, and means for solving the problem. The wire grid type polarizer of the present invention is characterized in that a cladding plate is formed on the surface to form a right full age ^ γ4. The light base / formed with a plurality of ridges, the (4) in the ridges _ flat part of each other (four) into the pain Λ / owe according to the pre-pitch spacing, the layer, the visibility is from the bottom toward The top portion is gradually narrowed; the first reflection is the first side surface of the ridge and is made of a metal material; and the ith absorbing layer is present in the ridge * and is purely formed as 'and brother, +, and so many 4 俅 /, then The reflective layer between the first and second reflection layers is covered with a light absorbing material that absorbs light more than the metal (four). The thickness of the first absorption layer is preferably 3 to 2 nm. Preferably, the wire grid type polarizer of the present month has a base layer which is present between the first #j surface of the ridge and the first absorbing layer and covers the entire first side of the ridge 'And consists of a metal material. Preferably, the wire grid type polarizer of the present invention further has a second absorbing layer covering the entire second surface of the ridge and comprising the light absorbing material. Preferably, the wire grid type polarizer of the present invention further has a second reflection layer covering the surface of the second absorption layer and made of a metal material. The cross-sectional shape of the aforementioned ribs orthogonal to the longitudinal direction thereof is preferably a triangle 201100888 or a trapezoid. The aforementioned interval Pp is preferably 300 nm or less. A method of manufacturing a wire grid polarizer according to the present invention is a method for producing a wire grid polarizer including a light-transmitting substrate, a first reflective layer, and a first absorption layer, wherein the light-transmitting substrate has a plurality of convex surfaces formed thereon And the plurality of ribs are parallel to each other and formed at a predetermined interval, and the width of the plurality of ridges gradually narrows from the bottom toward the top; a reflective layer covering the first side surface of the ridge and comprising a metal quinone V material; the first absorbing layer being present between the first side surface of the ridge and the first reflective layer, and covering the ridge The first side surface is entirely made of a light absorbing material that absorbs light more than the metal material. The method for manufacturing the wire grid type polarizer is characterized in that steaming is performed in one direction under the condition of a steaming amount of 3 to 20 nm. The first light absorbing layer is formed by the light absorbing material, and the direction intersects substantially perpendicularly in the longitudinal direction of the ridge, and forms an angle of 25 to 40° on the side of the first side surface with respect to the height direction of the ridge. The amount of evaporation is 15~5 Under the condition of 0 nm, the metal material is vapor-deposited from the other direction to form the first reflective layer, and the other direction is slightly perpendicular to the longitudinal direction of the ridge, and the first side is opposite to the height direction of the ridge The sides constitute an angle of 25 to 50°. - The cross-sectional shape of the aforementioned ribs orthogonal to the longitudinal direction thereof is preferably a triangle or a trapezoid. The ridges are preferably composed of a photocurable resin or a thermoplastic resin, and are preferably formed by an imprint method. 201100888 The liquid of the present invention is characterized in that the pair of bases and the white display device are characterized by comprising: a liquid crystal panel in which the liquid crystal layer is held between the plates; the backlight unit, the gate type polarizer is configured to form The two sides of the ridge are used as the backlight unit side, and the side on which the side of the ridge is not formed is displayed on the visual side of the device. On the day of the squad, the liquid crystal display of the present invention has an absorbing type of polarizing element, and the horizontal grating type polarizing element is disposed on the front side of the front panel. The surface absorbing polarizer is disposed on the front slab. The upper side is opposite to the side on which the two-gate polarizer is disposed. Further, the wire grid type polarizer is disposed on the surface of the backlight unit on the liquid crystal panel, and the front surface is disposed on the surface of the front liquid crystal panel opposite to the side of the backlight unit. . Preferably, the liquid crystal display device of the present invention further has an absorbing polarizer, and the wire grid polarizer is dimerized with one of the substrates of the liquid crystal panel, and the absorbing polarizer is disposed on the liquid crystal panel. The side of the wire-grid polarizer is the surface of the substrate on the opposite side. ^ A wire grid type polarizer is preferably formed with the substrate on the liquid crystal panel which is located in the moonlight early reading, and the absorption type polarizer is disposed on the substrate opposite to the backlight unit side of the liquid crystal panel. surface. Preferably, the liquid crystal display device of the present invention further comprises an absorbing polarizer, wherein the wire grid polarizer is disposed on the liquid crystal layer side of the substrate of the pair of substrates of the liquid crystal panel. The absorbing polarizer is disposed on the liquid crystal panel. The surface of the substrate 201100888 is opposite to the side on which the green gate type polarizer is disposed. Further, the wire grid type polarizer is disposed on the liquid crystal layer side of the backlight unit (four) substrate of the pair of substrates of the front crystal panel, and the front light absorption type polarizer is disposed on the liquid crystal panel with respect to the back surface. The unit side is the surface on the opposite side. Effect of the Invention The wire grid type polarizer of the present invention has high polarization and high Ρ polarized light transmission

Ο rate, and S polarized light reflectance is low. Further, the side of the kneading surface can be attached to the liquid crystal panel, so that the wire grid type polarizing member can be easily attached to the liquid crystal panel. Furthermore, since the backlight _ light system is emitted from the surface, the reflection of the polarized light at the interface can be suppressed. According to the method for producing a wire grid type polarizer of the present invention, a wire grid type polarizer having high polarization and high Ρ polarized light transmittance and low inside 3 polarized light reflectivity can be produced with good productivity. In particular, according to a preferred embodiment of the present invention, a wire grid type polarizer having a polarization degree of 99.2% or more can be obtained, and the wire grid type polarizer has a wavelength of more than 35% at wavelengths of 450 nm, 550 nm, and 700 nm (suitable It is more than 38% and more than 40%), and has a high surface s polarized reflectance of 35% or more at the same wavelength, and has an inner s polarized light of less than 2% at the same wavelength. Reflectivity. The liquid crystal display device of the present invention has high luminance, and the reduction in contrast is also suppressed. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an example of a wire grid type polarizing member of the present invention. 9 201100888 Brother 2 is a perspective view of a wire shed type polarizer of the present invention. Fig. 3 is a perspective view showing another example of the wire grid type polarizing member of the present invention. Fig. 4 is a perspective view showing another example of the wire shed type polarizer of the present invention. Fig. 5 is a perspective view showing another example of the wire shed type polarizing member of the present invention. Fig. 6 is a perspective view showing another example of the wire grid type polarizing member of the present invention. Fig. 7 is a plan view showing an example of a liquid crystal display device of the present invention. I. Embodiment 3 Embodiment of the invention <Wire-grid type polarizer> The wire grid type polarizer of the present invention has a translucent substrate having a plurality of ridges whose width gradually narrows from the bottom toward the top. The plurality of ridges are formed on the surface at a predetermined pitch in parallel with each other across the flat portion formed between the ridges; the first reflective layer covers the first side ′ of the ridge and is made of a metal material The second absorption layer is formed between the first side surface of the ridge and the first reflection layer, and covers the entire surface of the first side surface of the ridge, and is made of a light absorbing material that absorbs light more than a metal material. The first reflection layer and the first absorption layer on the first side surface of the ridges have a strip shape extending in the longitudinal direction of the ribs, and correspond to the metal thin wires constituting the wire grid type polarizer. In the present invention, the ridges (for example, ridges having a triangular or trapezoidal cross-sectional shape in the longitudinal direction) formed on the surface of the light-transmitting substrate at a predetermined pitch in the direction of the light-transmitting substrate are opposite sides. One of the parties is referred to as the first side and the other is referred to as the second side. The wire grid type polarizer of the present invention may have a base layer made of a metal material. The base layer is present between the first side surface of the ridge and the first absorbing layer, and covers the entire surface of the first side surface of the τ beam. Further, a second absorption layer made of a light absorbing material and covering the entire surface of the second side surface may be provided on the second side surface of the ridge (i.e., the other side surface of the ridge). Further, the wire grid type polarizer of the present invention may further have a second reflection layer made of a metal material covering the surface of the second absorption layer. In the present invention, the term "covered" is not limited to the case where the layer is directly formed on the surface. The case where the layer is formed on the surface by covering the other layer via the other layer is also included. In the present specification, "~" is used in the sense that the numerical values described before and after are included as the lower limit and the upper limit. (Transparent Substrate) The translucent substrate is a substrate having translucency in the wavelength range of use of the wire grid type polarizer. Translucent means that light is permeable, and the wavelength range of use is specifically in the range of 400 nm to 800 nm. Preferably, the average light transmittance in the range of 400 nm to 800 nm is 85% or more. In the present invention, the rib refers to a portion which rises from the main surface (flat portion) of the light-transmitting substrate and which rises in one direction. The main surface of the ridge strip and the light-transmitting substrate is a body, and may be made of the same light-emitting material as the main surface of the light-transmitting substrate. 'It may also be made of a light-transmitting material different from the main surface of the light-transmitting substrate. . The ridge is made of a light-transmissive material which is the same as the main surface of the light-transmissive substrate, and is formed of a light-transmitting material which is the same as the main surface of the light-transmissive substrate, and is formed by molding at least the main surface of the light-transmitting substrate. Formed ribs. The plurality of ridges need only be formed such that the corresponding sides of each rib are substantially parallel or not completely parallel. Further, although each of the ridges is preferably a linear shape which is most likely to exhibit optical anisotropy in the plane of 11 201100888, it may be curved or polygonal in a circular garden in which adjacent ridges do not contact each other. The cross-section of the ridge (the direction perpendicular to the longitudinal direction of the ridge and the main surface of the light-transmissive substrate) is substantially fixed across the longitudinal direction, and the cross-sectional shapes of the ridges are generally substantially fixed. . The cross-sectional shape of the ridges exhibits a shape in which the width gradually narrows from the bottom (the main surface of the through-substrate substrate) toward the top. For example, specific cross-sectional shapes include, for example, a triangle and a trapezoid. The angle of the f-domain (four) and the side (side) may also be φ-line. Further, the pitch width (i.e., the width of the flat portion) formed between the plurality of ridges formed in parallel or substantially in parallel with the main surface of the light-transmitting substrate is preferably fixed or substantially fixed, respectively. In the present invention, the top of the ridge means a portion in which the highest portion of the aforementioned cross-sectional shape continues in the longitudinal direction. The top of the rib can be either face or line. For example, when the cross-sectional shape of the field is trapezoidal, the top of the ridge forms a face, and when the cross-sectional shape is a corner open, the top of the temple & strip forms a line. In the present invention, the surface other than the top of the ridge is referred to as the side of the ridge. In addition, the flat portion between the adjacent two ridges (the bottom surface of the groove formed by the adjacent two ribs) is not the surface of the ridge, but is regarded as the main surface of the light-transmitting substrate. The lining material may be, for example, a photo-curable resin, a thermoplastic resin, or a glass. In general, the screen-off filament is convex. It is preferable to use a photo-curable resin or a thermoplastic resin to reduce the eucalyptus, and to form a embossing by photoimprinting. From the viewpoint of the article and the viewpoint of excellent heat resistance and durability, it is particularly preferable to use a photocurable resin. In view of the point of production, the photo-curing resin is preferably a photocurable resin obtained by photohardening a composition which can be photo-hardened by photo-radical polymerization and hardened. The photocurable composition is preferably one in which the contact angle of the cured film after photohardening is more than 90° with respect to water. When the contact angle of the cured film to water is more than 90°, when the ridge is formed by photoimprinting, the release property from the mold becomes good, and high-accuracy transfer can be obtained. The wire grid type polarizer will be able to fully perform its intended function. Further, even if the contact angle is increased, the adhesion of each of the absorbing layers or the underlayer is not hindered. (First reflection layer) The reflection layer of 苐1 has a line extending in the longitudinal direction of the ridge, and corresponds to a thin metal wire constituting the wire grid type polarizer. The first reflective layer covers a part of the first side surface of the ridge or the entire surface. On the other hand, the first reflective layer is preferably a part of the first side surface of the covered ridge. The first reflective layer may also cover part or all of the top of the ridge. Further, the first reflection layer may cover a portion of the flat portion adjacent to the first side surface of the ridge. It is customary for the first reflecting layer on the first side surface of the covering ridge to be continuous. Although the first side surface of the ridge is preferably continuously covered by the first reflection layer, there may be a case where the second side surface of the ridge is not covered by the first reflection layer due to a manufacturing problem or the like. Even in this case, as long as the second side surface is substantially continuously covered by the first reflecting layer, the first side surface is continuously covered by the i-th reflecting layer. The metal material of the first reflective layer is only required to have high reflectance for visible light and sufficient conductivity, and it is preferable to take into consideration characteristics such as corrosion resistance. The metal material may, for example, be a metal monomer, an alloy, a metal containing a dopant or an impurity, or the like. Specifically, for example, aluminum, silver, town, Shaoren 13 201100888 gold, silver alloy, etc., from the viewpoints of high reflectance to visible light, less visible light absorption, and high electrical conductivity, aluminum, aluminum Alloys, silver and magnesium are preferred, and aluminum and aluminum alloys are preferred. (Second reflection layer) The second reflection layer has a line ′ extending in the longitudinal direction of the ridge, which corresponds to a thin metal wire constituting the wire grid type polarizer. The second reflection layer covers a part of the second side surface of the ridge or the entire surface. In view of the fact that the s-polar reflectance of the inside s can be lowered to a lower level, the second reflecting layer is preferably a part of the second side surface of the covering ridge. The second reflective layer may also cover part or all of the top of the rib. Further, the second reflection layer may cover a portion of the flat portion adjacent to the second side surface of the ridge. It is customary for the second reflecting layer on the second side surface of the covering ridge to be continuous along the longitudinal direction of the second side surface. Although the second side surface of the ridge is preferably continuously covered by the second reflecting layer, the second side surface of the extremely small portion may not be covered by the second reflecting layer due to manufacturing problems or the like. Even in this case, as long as the second side surface is substantially continuously covered by the second reflection layer, the second side surface is continuously covered by the second reflection layer. Due to the presence of the second reflecting layer, the amount of the metal material covering the ridges is increased, and the extinction ratio can be increased in a state where the amount of decrease in the transmittance is small. The metal material of the second reflection layer is the same as the metal material of the first reflection layer. (First Absorbing Layer) The first absorbing layer is present between the first side surface of the ridge and the first reflecting layer, and covers the entire surface of the first side surface of the ridge. The first absorbent layer may cover a part or all of the top of the ridge. From the viewpoint of having excellent p-polarized light transmittance, the first absorbent layer of 201100888 is preferably not coated with the top of the ridge. The first absorbing layer may also cover a portion of the flat portion adjacent to the first side surface of the rib. Ο

It is customary for the first absorbent layer on the first side surface of the covering ridge to be continuous along the longitudinal direction of the first side surface. It is preferable that the first side surface of the ridge is completely covered by the first absorbing layer. However, there is a case where a very small portion of the first side surface is not covered by the first absorbing layer due to a manufacturing problem or the like. Even in this case, as long as the first side surface is substantially covered by the first absorbing layer, the entire first surface is covered by the first absorbing layer. The entire surface of the first side surface of the ridge is covered with the first absorbing layer, whereby the polarized reflectance of the inside S of the wire grid type polarizer is lowered. The light absorbing material of the first absorbing layer only needs to be a material which absorbs light more than the metal material of the ninth reflecting layer. The light absorption degree of each material is: the absorption rate of light having a wavelength of 55 〇 nm in a film state having a thickness of 60 nm. This absorption rate is defined by the following formula. Light absorption at a wavelength of 55 〇 nm (%) = 1 〇〇 _ [wavelength 55 〇 nm 2 light transmittance (%)] - [wave reflectance at a wavelength of 550 nm (0 / 〇)] Specifically, 'light absorbing material Examples include: recording, complex, titanium, crane, surface, touching her and other (four) metals; oxygen secret and reducing inorganic oxygen', and inorganic nitrides such as nitrogen cutting; carbon (four) and carbonized saturated inorganic carbides 1 and Carbon black and nano carbon carbon compounds; however, when the inorganic emulsion forms a ninth absorption layer, it is less desirable because the metal reacts with oxygen to cause heat to cause the ridge "deformation". From the viewpoint of high light absorption and productivity, the light absorbing material is preferably nickel, complex and condensed. 15 201100888 (base layer) The base layer is present between the first side surface of the ridge and the first absorbing layer, covering the entire surface of the first side surface of the ridge. The base layer may be partially or wholly covered by one of the tops of the ribs. Further, the base layer may be covered with a portion of the flat portion adjacent to the first side surface of the ridge. It is customary for the base layer of the first side surface of the covering ridge to be continuously continuous along the first side surface. Although the first side surface of the ridge is preferably completely covered by the base layer, there may be cases where a very small portion of the first side surface is not covered by the base layer due to a manufacturing problem or the like. Even in this case, as long as the first side surface is substantially covered by the base layer, the entire surface of the first side surface is covered by the base layer. Since the first absorbent layer composed of the light absorbing material has a large compressive stress, the ridges are easily deformed (bent) in a direction perpendicular to the longitudinal direction. The base layer made of a metal material has a function of alleviating the compressive stress of the first absorbent layer. Therefore, it is preferable that the metal material of the underlayer is less subject to a reduction in shrinkage stress, and specific examples thereof include, for example, Ming, Silver, Magnesium, Ming alloy, and silver alloy, and the viewpoint of high reflectance in the visible light region is high. In view of it, aluminum and aluminum alloys are ideal. (Second Absorbing Layer) The second absorbent layer covers the entire surface of the second side surface of the ridge. The second absorbent layer may cover part or all of the top of the ridge, or may cover a portion of the flat portion adjacent to the second side of the ridge. It is customary for the second absorbent layer on the second side of the covering ridge to be continuous along the length of the second side 16 201100888. Although the second side surface of the ridge is preferably completely covered by the second absorbing layer, the second side surface of the extremely small portion may not be covered by the second absorbing layer due to manufacturing problems or the like. Even in this case, as long as the second side surface is substantially covered by the second absorbent layer, the entire second surface is covered by the second absorbent layer. Since the first absorbent layer composed of the light absorbing material has a large compressive stress, the ridges are easily deformed (bent) in a direction perpendicular to the longitudinal direction. The second absorbing layer composed of the light absorbing material has a function of canceling the compressive stress by opposing the first absorbing layer. Therefore, the light absorbing material of the second absorbing layer only needs to be the same as the light absorbing material of the second absorbing layer, and it is preferably the same. &lt;Manufacturing method of wire grid type polarizer&gt; After a light-transmissive substrate having a plurality of mutually parallel ridges formed at a predetermined pitch is formed, each layer is sequentially formed to form a wire grid type polarizer. (Production of a light-transmissive substrate) Examples of the method for producing a light-transmitting substrate include an imprint method (photolithography method, hot stamping method), and the like, and a shaft ridge can be produced from a good productivity. From the viewpoint of large-scale optical substrate, etc., it is preferable to use an imprint method, and to form a ridge from a more productive property and to transfer the groove on the mold with high precision, the viewpoint is Photoimprinting is especially good. For example, photoimprinting is a method in which a combination of electron beam lithography and lithography is used to produce a plurality of trenches that are parallel to each other in a predetermined interval. The groove of the mold is transferred to a graded composition that has been applied to the surface of any substrate, and the photocurable composition is photohardened at the same time. The production of the light-transmitting substrate by photoimprinting is specifically carried out via the following steps (i) to (iv): (1) a step of applying a photocurable composition to the surface of the substrate. (ii) a step of pressing a mold having a plurality of grooves parallel to each other at a predetermined interval to the photocurable composition to bring the film into contact with the photocurable composition. (iii) irradiating radiation (ultraviolet 'electron beam, etc.) to the photocurable group in a state where the mold is pressed against the photocurable composition, and the light transmittance of the plurality of ridges having the corresponding mold grooves is produced. The steps of the substrate. (iv) a step of separating the mold from the light-transmitting substrate. Further, the light-transmitting substrate on the substrate to be applied can be directly formed into a layer in a state of being integrated with the substrate. In addition, the neodymium (four) wire may be rotated after the formation of each layer as needed. Further, after the transparent substrate formed on the substrate is separated from the substrate, the formation of each layer described later can be carried out. Specifically, it is preferably carried out by the following steps (i) to (iii) by using a hot stamping substrate, or: (1) step of forming a transfer film of a thermoplastic resin on the surface of the substrate, or It is a step of producing a transfer film of a thermoplastic resin. Steps of forming a translucent substrate with a groove and a film to be transferred are formed by pressing the molds of the grooves in a manner that is parallel to the heat-plasticity or the transfer film is joined to each other. . /, there are complex protrusions corresponding to the mold grooves. 18 201100888 (Hi) The step of cooling the light-transmitting substrate to a temperature lower than Tg.Tm and separating the mold from the light-transmitting substrate. Further, the light-transmitting substrate on the obtained substrate can be directly formed into layers in a state of being integrated with the substrate. The light-transmitting substrate may be separated from the substrate after formation of each layer as needed. Further, after the light-transmitting substrate on the wire material is separated from the substrate, the formation of each layer described later can be carried out. The materials which can be used for the imprinting method are, for example, 11, recording, quartz, and resin, and from the viewpoint of transfer accuracy, resin is preferred. Further, examples of the resin include a fluororesin (such as ethylene/tetrafluoroethylene copolymer), a ring-shaped flue gas, a polyoxymethylene resin, an epoxy resin, and an acrylic resin. From the viewpoint of mold precision, the i-light curing acrylic resin is #. From the viewpoint of repeating the durability of the transfer, the resin mold preferably has an inorganic film having a thickness of 2 to 1 (). There is no mechanism to oxidize ♦, titanium oxide and oxide oxide film. (Formation of each layer) Each layer is preferably formed by a steaming method. The steaming method may, for example, be a physical vapor deposition method (PVD) or a chemical vapor deposition method (CVD), and is preferably a vacuum vapor deposition method, a mineralization method, and an ion plating method. The true line method is easy to control the direction of the human shot of the microparticles of the substrate to be attached, and it is easy to implement the post-slope steaming method. Because of the formation of various shapes, it is necessary to selectively compete for each material on each side of the ridge. Therefore, the oblique forging method using the true two-steaming method is most desirable. (Formation of the base layer) Specifically, under the condition that the amount of the ore is 3 to 15 nm, the direction perpendicular to the longitudinal direction of the ridge and the height direction of the ridge and the side of the (4) 19 201100888 surface are 25 ~4G. The metal material is vaporized in the direction of the corners, thereby forming a base layer. The angle is 30~45. Preferably, the amount of vapor deposition is preferably 5 to 15 nm. The condition that the amount of vapor deposition is 3 to 15 nm means that a metal layer formed by vapor-depositing a metal or a metal compound on a surface where a ridge is not formed (a flat flat portion) is formed when a metal layer is formed in a ridge. The thickness will be 3 to 15 mn, and under this condition, the underlayer of the filament is examined obliquely. Further, when the following first absorption layer, second absorption layer, first reflection layer, and second reflection layer are formed, the conditions of the vapor deposition amount are also the same. (Formation of the first absorption layer) Specifically, it can be formed in a direction perpendicular to the longitudinal direction of the ridge and to the side of the first side surface with respect to the height direction of the ridge 25 under the condition that the amount of the steamed bond is 3 to 20 nm. ~4G. The light absorbing material is vapor-deposited in the direction of the corners to form the first absorption layer. The angle is 3 (two) 5. For better, the secret is Mb. (Formation of the second absorption layer) Specifically, it can be intersected in the longitudinal direction of the ridge and perpendicular to the height direction of the ridge and the side of the second side surface under the condition that the amount of the steamed bond is 3 to 2 〇 nm. It is 25~4〇. The light absorption property (IV) is vapor-deposited in the form of a shape, whereby the second absorption layer is formed. The angle is 30~40. Preferably, the evaporation amount is preferably 5 to 15 nm. (Formation of the first reflective layer) Specifically, under the condition that the vapor deposition amount is 15 to 50 nm, the side perpendicular to the longitudinal direction of the ridge and the side of the ridge side with respect to the height direction of the ridge can be 25 ~5〇. A metal material is vapor-deposited in the direction of the corners, thereby forming an i-th reflective layer. The angle is 30~45. It is better that the amount of vapor deposition is preferably 2 〇 to 45 nm. (Formation of the second reflection layer) 20 201100888 The specific groove can be perpendicularly intersected in the longitudinal direction of the ridge and perpendicular to the height direction of the ridge and the side of the second side under the condition that the deposition amount is 15 to 50 nm. It is 25~50. The metal material is vaporized in the direction of the corners, thereby forming a second reflecting layer. The angle is 30~45. Preferably, the evaporation amount is preferably 20 to 45 nm. &lt;Implementation Pattern of Wire Grid Type Polarizer&gt; The following is a description of the embodiment of the wire grid type polarizer of the present invention. The following figure is a pattern diagram, and the actual wire grid type polarizer does not have a theoretical and ideal shape as shown. For example, in the actual wire grid type polarizer, the shape of the ridges or the like is somewhat deformed, and the thickness of each layer is uneven. Furthermore, in the present invention, the individual dimensions of the ridges and the layers are: in the scanning electron microscope image or the transmission electron microscope image of the cross section of the wire grid type polarizer, 'measure 5 ribs and layers on the ribs The individual size is the maximum and the five are the average. [First Embodiment] Fig. 1 is a perspective view showing a first embodiment of the wire grid type polarizer of the present invention. The wire grid type polarizer 10 has a light-transmissive substrate 14 having a plurality of ridges 12 ′ extending along the direction of the arrow A and having a trapezoidal cross-sectional shape, and the ribs 12 are formed by the grooves (formed on the surface) The flat portions 13 between the ridges 12 are parallel to each other and formed at a predetermined pitch pp; the first reflective layer 20 is made of a metal material and covers a part of the surface of the first side face 16 of the ridge 12; The layer 22' is composed of a light absorbing material and exists between the side of the ridge 1 of the ridge 12 and the reflection layer 20 of the ridge 1 and covers the entire surface of the first side 16 of the rib 12. The first reflective layer 20 extends along the longitudinal direction of the ridge 12 to constitute a metal 21 201100888 thin line. (translucent substrate)

The sum of the bottom width Dpb of the Pp rib 12 and the width of the flat portion 13 formed between the ridges 12. Pp is preferably 3 〇〇 nm or less, and preferably 5 〇 to 3 〇〇 1 ^, and preferably 50 to 250 mn. When Pp is 3 〇〇 nm or less, a high surface s polarized reflectance is exhibited, and a high polarization degree can be exhibited even in a short wavelength region of about 4 〇〇 nm. Furthermore, the coloring caused by the diffraction can be suppressed. Further, when Pp is 50 to 200 nm, it is easy to form each layer by vapor deposition.

The ratio of Dpb to Pp (Dpb/Pp) is preferably 〇 1 to 〇 7 and more preferably 〇 25 to 〇 55. If Dpb/Pp is 0.1 or more, high polarization can be exhibited. By making

Dpb/Pp is reduced to below 〇7, which suppresses the phenomenon of transmitted light coloring caused by interference. From the viewpoint of easily forming each layer by vapor deposition, Dpb is preferably 30 to 100 nm. When the cross-sectional shape of the ridge is trapezoidal, the width 〇1 of the top 19 of the ridge 12 is preferably one-half or less of Dpb, preferably 4 Å or less, more preferably 2 Å or less. If Dpt is less than one-half of Dpb, the polarized light transmission will be more improved and the angle dependence will be sufficiently reduced. The height Hp of the ridges 12 is preferably from 8 Å to 500 nm, preferably from 80 to 400 nm, more preferably from 120 to 300 nm, and most preferably from (10) to (10). If Qiu Da rib (10) or more, the polarization separation ability will be fully improved. If 11]? is 5〇〇11111 or less, the wavelength dispersion will be reduced. Further, when Hp is from 8 Å to 270 nm, it is easy to form each layer by vapor recording. The angle 1 of the first side surface 16 with respect to the main surface constituting the flat portion of the light-transmissive substrate is preferably 3 〇 with respect to the inclination angle Θ 1 of the 201100888 inclination angle Θ 1 and the second side surface 18 . Above and less than 卯. It is better to use 50° or more and less than 9′, and 7 (). Above and less than 9 "Easy" is preferably 75 or more and less than 9 〇. W and Θ2 may be the same or different. The thickness Hs of the light-transmitting substrate 14 is preferably 0.5 to 1 Å, and more preferably 4 Å &quot; m. (First reflection layer) The thickness maximum value Dr1 of the first reflection layer 2 in the width direction of the ridge 12 is preferably such that the following formula (I) is satisfied. 0.2x(Pp-Dpb)$ Drl $ 〇.5x(Pp-Dpb)... (I) If Drl is above 0.2x (Pp-Dpb), it will exhibit high p-polarized transmittance and small wavelength chromaticity. . If Drl is below 〇.5x (Pp-Dpb), the polarization separation capability will be fully advanced. The height Hrl of the first reflective layer 20 is preferably 80 to 500 nm, preferably 80 to 400 nm, more preferably 120 to 300 nm. When Hrl is 80 nm or more, crystallization of the first reflective layer 20 is suppressed, and high s polarized reflectance is exhibited. When Hr 1 is below 500 nm, the polarization separation ability is sufficiently improved even in a short wavelength region.

Hrl/Hp is preferably 0·5 to 1 and more preferably 0.6 to 1. If Hrl/Hp is below 1, the polarization separation ability will increase. When Hrl/Hp is 0.5 or more, the angular dependence of optical characteristics is sufficiently lowered. When the first reflecting layer 20 covers part or all of the top of the ridge 12, the height at the top is preferably 20 nm or less from the viewpoint of suppressing the decrease in transmittance. (First absorption layer) 23 201100888 The thickness maximum value Da of the first absorption layer 22 in the width direction of the ridge 12 is preferably 3 to 20 nm, more preferably 5 to 15 nm. If Dal is above 3 nm, the internal 8 light reflectance will be sufficiently reduced. When Dal is 20 nm or less, the compressive stress of the first absorption layer 22 can be suppressed to be low. Because the first absorption layer is covered! Since the side surface is formed on the entire surface, the height Hal of the first absorption layer 22 is substantially the same as Hp. [Second Embodiment] Fig. 2 is a perspective view showing a second embodiment of the wire grid type polarizer of the present invention. The wire grid type polarizer 1A has a light-transmissive substrate 14 having a plurality of ridges 12 having a trapezoidal cross-sectional shape formed on the surface thereof, and the ridges 12 are flat across the grooves (formed between the ridges 12). The portions 13 are parallel to each other and formed at a predetermined pitch Pp; the first reflective layer 20 is made of a metal material and covers a surface of one of the first side faces 16 of the ridges 12; and the first absorbing layer 22 is made of light absorbing. The material is formed between the first side surface of the ridge 2 and the first reflection layer 2, and covers the entire surface of the first side surface 16 of the ridge 12; the base layer 24 is made of a metal material and exists. The entire surface of the first side surface 16 of the ridge 12 is covered between the ridge 12 and the first absorbing layer 22. In the second embodiment, the same components as those of the wire grid type polarizer 10 of the first and second embodiments are not described. (Base Layer) The thickness maximum value Db1 of the base layer 24 in the width direction of the ridge 12 is preferably 3 to 20 nm, and more preferably 5 to 15 nm. When Dbl is 3 nm or more, the compressive stress in the first absorption layer 22 can be sufficiently alleviated. If Dbl is below 20 nm, the increase in the s-polar reflectance of the inside can be suppressed. 24 201100888 Since the base layer is formed covering the entire surface of the first side surface, the height Hb1 of the base layer 24 is substantially the same as Hp. [Third Embodiment] Fig. 3 is a perspective view showing a third embodiment of the wire grid type polarizer of the present invention. The wire grid type polarizer 10 has a translucent substrate 14 having a plurality of ridges 12 having a trapezoidal cross-sectional shape formed on the surface thereof, and the ribs 12 are flat portions of the grooves (formed between the ridges 12). 13 is parallel to each other and formed at a predetermined pitch Pp, and the first reflective layer 2 is made of a metal material and covers a part of the surface of the first side surface 16 of the ridge 12; The absorbing layer 22 is formed of a light absorbing material and exists between the ridge 12 and the first reflecting layer 2, and covers the entire surface of the first side surface 16 of the ridge 12; the second absorbing layer 26 is made of light. The absorbent material is formed and covers the entire surface of the second side surface 18 of the ridge 12. In the third embodiment, the same components as those of the wire grid type polarizer 10 of the second embodiment will not be described. (Second Absorbing Layer) The thickness maximum value Da2 of the second absorbent layer 26 in the width direction of the ridge 12 is preferably 3 to 20 nm, more preferably 5 to 15 nm. If Da2 is above 3 nm, the s-polar reflectance inside will be sufficiently reduced. When Da2 is 20 nm or less, the compressive stress of the second absorption layer 26 can be suppressed to be low. From the viewpoint of canceling the compressive stress of the first absorption layer 22 and the second absorption layer 26, Da2 is preferably 0.55 to 2 times the thickness of Dal, and more preferably 0.55 to 1.5 times. Since the second absorption layer is formed covering the entire surface of the second side surface, the heights Ha2 and Hp of the second absorption layer 26 are substantially the same. [Fourth Embodiment] Fig. 4 is a perspective view showing a fourth embodiment of the wire grid type polarizer of the present invention. The wire grid type polarizer 1A has a light-transmissive substrate 14 having a plurality of ridges 12 having a trapezoidal cross-sectional shape formed on the surface thereof, and the ridges 12 are flat across the grooves (formed between the ridges 12). The portions 13 are parallel to each other and formed at a predetermined pitch Pp. The first reflective layer 2 is made of a metal material and covers a surface of one of the first side faces 16 of the ridges 12. The first absorbing layer π is absorbed by light. The material is formed between the first side surface of the ridge 12 and the first reflective layer 20, and covers the entire surface of the first side surface 16 of the ridge 12; the base layer 24 is made of a metal material and exists in the convex portion. Between the strip 12 and the first absorbing layer 22, and covering the first side surface 16 of the ridge 12, the second absorbing layer 26 is made of a light absorbing material, and the second side surface 18 of the covering rib 12 is completed. surface. In the fourth embodiment, the description of the same components as those of the wire grid type polarizer 10 of the first to third embodiments will be omitted. [Fifth Embodiment] Fig. 5 is a perspective view showing a fifth embodiment of the wire grid type polarizer of the present invention. The wire grid type polarizer 10 has a translucent substrate 14 having a plurality of ridges 12 having a trapezoidal cross-sectional shape formed on the surface thereof, and the ribs 12 are flat portions of the grooves (formed between the ridges 12). 13 is formed parallel to each other and at a predetermined pitch Pp; the first reflective layer 2 is made of a metal material and covers a surface of one of the first side faces 16 of the ridges 12; and the first absorbing layer 22 is made of light absorbing. The material is formed between the ridge 12 and the first reflective layer 20, and covers the entire surface of the first side surface 16 of the ridge 12; the second reflective layer 28 is made of a metal material, and the ridge 12 is covered. One of the second side faces 18; the second absorbent layer 26 201100888 26 is composed of a light absorbing material, exists between the ridges 12 and the second reflective layer 28, and covers the entire second side 18 of the ridges 12. surface. In the fifth embodiment, the same components as those of the wire grid type polarizer 10 of the first to fourth embodiments are not described. (Second Reflective Layer) The thickness maximum value Dr2 of the second reflecting layer 28 in the width direction of the ridge 12 should preferably satisfy the following formula (Π). 0.2x(Pp-Dpb)^ Dr2 ^ 0.5x(Pp-Dpb)··· (II)

If Dr2 is above 0_2x (Pp-Dpb), it will exhibit high p-polarized light transmittance and small wavelength dispersion. If Dr2 is below 〇.5x (Pp-Dpb), the polarization separation ability will be sufficiently improved. The height Hr2 of the second reflecting layer 28 is preferably 80 to 500 nm, preferably 80 to 400 nm, more preferably 120 to 300 nm. When Hr2 is 80 nm or more, crystallization of the second reflection layer 28 is suppressed&apos; and a high s-polarized reflectance is exhibited. If Hr2 is below 500 nm, even in the short-wavelength region, the polarization separation capability will be sufficiently advanced.

Hr2/Hp is preferably 0.5 to 1, and more preferably 〇6 to 1. If Hr2/Hp is below 1 , the polarization separation capability will increase. When Hr2/Hp is at 〇.5 or more, the angular dependence of optical characteristics is sufficiently lowered. In the case where the 苐2 reflection layer 28 covers part or all of the top of the ridge 12, the height at the top is preferably 20 nm or less from the viewpoint of suppressing reduction in light transmittance. In the description of the fifth to fifth figures of the wire grid type polarizer according to the first to fifth embodiments of the present invention, the first side surface of the ridge is the right side surface of the same ridge and 27 201100888 is the first An example in which the first absorption layer, the first reflection layer, and the base layer are formed on the side surface is described] and the second side surface of the ridge is a left side surface of the same ridge and the second absorption layer is formed on the second side surface. An example of the second reflecting layer will be described. However, it should be noted that the first side surface of the ridge of each drawing may be the left side of the same ridge, and the second side of the ridge may be the right side of the same ridge. . &lt;Manufacturing Method of Wire-Grid Polarizer of Each Embodiment&gt; [Method of Manufacturing Wire-Grid Polarizer of First Embodiment] The surface of the first side surface 16 of the ridges 12 of the light-transmitting substrate 14 can be formed. The absorbing layer 22 is formed on the surface of the first absorbing layer 22, and the y-reflecting layer 2 is formed on the surface of the first absorbing layer 22, whereby the wire-grid polarizer 1A of the first embodiment is manufactured. (Formation of the first absorption layer) As shown in Fig. 6, it is possible to intersect the longitudinal direction of the ridge 12 substantially perpendicularly under the condition that the vapor deposition amount is 3 to 2 〇 nm [and with respect to the ridges 丨 $ The height direction of the tether is 25 to 4 inches from the side of the first side face 16. The angle 0 R direction vi vapor-deposits the light absorbing material, thereby forming the second absorbing layer 22. ° Luo plating can be carried out in n times (but 耵 above the integer) under the condition that the total evaporation amount is 3 to 2 〇 nm. The angle of the i-th (but (8) to W integer) 2 1+1-time angle 0 '+1 is 0 '+ι&lt;0, preferably. The vapor deposition source may, for example, be a light absorbing material (nickel, road, titanium, turn, name, and hunger, etc.; oxidized chromium and oxidized material, inorganic oxidized white, disordered titanium and lut material, orbital; carbonization, carbonization, carbonization Nickel, chromium, and titanium are preferred from the viewpoint of high productivity, such as carbon black and carbon compounds such as carbon nanotubes. (Production of the first reflective layer) 28 201100888 As shown in Fig. 6, the vapor deposition amount is 15 to 5 〇 nm, and the vertical direction intersects the longitudinal direction L of the ridge 12 and is inclined with respect to the south direction of the ridge 12 The side of the first side face 16 is 25 to 50. The metal material is vapor-deposited in the direction VI of the angle 0 R, thereby forming the first reflective layer 20. The vapor deposition can be divided into a total evaporation amount of 15 to 5 Onm. (but η is an integer of 2 or more). The angle 0\ of the i-th (but i is an integer of 1 to η-1) and the angle of the i-th order are 0, and +1 is 0Ri+1 &lt; 0Ri. The evaporation source may be exemplified by a metal material (aluminum, silver, magnesium, an aluminum alloy, a silver alloy, etc.), which has high reflectance to visible light, less absorption of visible light, and high conductivity. In view of the above, the aluminum, the aluminum alloy, the silver, and the magnesium are preferable, and the alloy is preferably used. [The method of manufacturing the wire grid type polarizer of the second embodiment] The convexity of the light-transmitting substrate 14 The base layer 24 is formed on the surface of the first side surface 16 of the strip 12, the first absorption layer 22 is formed on the surface of the base layer 24, and the first reflection layer 20 is formed on the surface of the first absorption layer 22, thereby producing the second embodiment. In the second embodiment, the same components as those of the wire-grid polarizer 10 of the first embodiment will be omitted. (Formation of the underlayer) As shown in Fig. 6 Under the condition that the vapor deposition amount is 3 to 15 nm, the longitudinal direction intersects the longitudinal direction L of the ridge 12 substantially perpendicularly with respect to the height direction of the ridge 12 and the side of the first side surface 16 is 25 to 40 °. The metal material is vapor-deposited in the direction VI of the angle R, thereby forming the underlayer 24. The vapor clock can be divided into n times (but η is an integer of 2 29 201100888 or more) under the condition that the total vapor deposition amount is 3 to 15 nm. The angle of the third time (but i is an integer of nl) 6»Ri and the angle of the i+th order Θ '+1 is preferably Ri+1&lt;0 Ri. The vapor deposition source may be, for example, a metal material (aluminum, silver, magnesium, aluminum alloy, or silver alloy). From the viewpoint of the reflectance in the visible light region, aluminum and an aluminum alloy are preferred. [Line 3] The method of manufacturing the gate-type polarizer] The wire-grid polarizer 10 of the third embodiment can be manufactured by adding the following steps to the manufacturing method of the first embodiment. At any stage, the ridges of the light-transmitting substrate 14 are added. The step of forming the second absorption layer 26 on the surface of the second side surface 18 of the first embodiment is the same as that of the wire grid type polarizer 10 of the first embodiment. (Formation of the second absorption layer), as shown in the figure, can be perpendicularly intersected in the longitudinal direction L of the ridge 12 and relative to the ridge under the condition that the amount of the smelting is 3 to 2 〇nrn. The height direction of the tether and the side of the second side face 18 are 25 to 40. The angle of 0 L is V2, and the light absorbing material is vapor-deposited, whereby the second absorbing layer % is formed. The vapor deposition can be carried out by dividing the total vapor deposition amount to 3 to 20 nm (but 11 is an integer of 2 or more). The angle θ of the i-th (but i is an integer of 1 to n) and the angle 0S+ of the i+th order are preferred. ,

The source of the steamed minerals may be, for example, a light absorbing material (10), a complex, a chin, a lanthanum, a ruthenium, a ruthenium or a ruthenium, etc.), from the viewpoint of "absorption" and high productivity, and nickel, chromium and titanium. [The method of manufacturing the wire grid type polarizer of the fourth embodiment] 30 201100888 The wire grid type polarizer 1 of the fourth embodiment can be manufactured by adding the following steps to the manufacturing method of the second embodiment. In the fourth step, the second absorption layer 26 is formed on the surface of the second side surface 18 of the ridges 12 of the light-transmitting substrate 14. In the fourth embodiment, the wire-grid polarizer 10 of the first to third embodiments is added. The description of the portion of the same structure will be omitted. [The method of manufacturing the wire-grid polarizer of the fifth embodiment] The wire-grid polarizer of the fifth embodiment can be added to the following method by the manufacturing method of the third embodiment. In the fifth step, the second reflecting layer 28 is formed on the surface of the second absorbing layer 26. In the fifth embodiment, the same structure as the wire grid polarizer 10 of the first to fourth embodiments is added. The description will be omitted. (Formation of the second reflection layer) As shown in FIG. 6, the side of the second side surface 18 can be slanted from the longitudinal direction L of the ridge 12 and the height direction of the ridge 12 substantially perpendicularly under the condition that the amount of smelting is 15 to 50 nm. The second reflective layer 28 is formed by vapor-depositing a metal material in a direction V2 of an angle of 25 to 50. The vapor deposition can be divided into "under (but η is 2 or more) under the condition that the total vapor deposition amount is 15 to 5 Onm. The integer) is performed. The angle 01^ of the i-th (but i is an integer of 1 to η-1) and the angle 0\+1 of the 1st-th order are preferably (9 Li+丨&lt;6&gt; Li. The steam source can be enumerated as Metal materials (aluminum, silver, magnesium, aluminum alloys, silver alloys, etc.) are made of aluminum, aluminum alloy, silver, and magnesium from the viewpoints of high reflectance to visible light, less absorption of visible light, and south conductivity. Preferably, the aluminum alloy and the aluminum alloy are particularly preferable. For example, the angle 0 r (0 L) in the manufacturing method of the first to fifth embodiments can be adjusted by using the following vapor deposition device. The vapor deposition device that changes the inclination of the light-transmitting substrate 14 is disposed opposite to the vapor deposition source such that the vapor deposition source is positioned on an extension line of the direction V1 (V2), and the direction V1 (V2) is The invention is substantially perpendicular to the longitudinal direction L′ of the ridge 12 and is at an angle of 0 R( 0 l) with respect to the side of the second side surface 18 (the second side surface 18) with respect to the height direction η of the ridge 12 . In the wire grid type polarizer, the cross-sectional shape of the plurality of ridges formed on the surface of the light-transmitting substrate is a shape in which the width is gradually narrowed from the bottom toward the top, and the ridge is formed Since the first side surface is covered by the second reflective layer, the south polarizing light and the south p polarized light transmittance are exhibited. Further, the first absorption layer covering the entire first surface of the convex strip is present in the convex strip and the first reflective layer. In the method of manufacturing the wire grid type polarizer of the present invention described above, the method of manufacturing the wire grid type polarizer described above is substantially perpendicular to the convexity under the condition that the vapor deposition amount is 3 to 20 nm. In the longitudinal direction of the strip, the light absorbing material is vapor-deposited in a direction of 25 to 40 in the direction of the height of the ridge and the side of the second side to form the ith absorbing layer', and the amount of the smelting is 15 to 50 nm. Then, a metal layer is formed by vapor-depositing a metal material in a direction perpendicular to the longitudinal direction of the ridge and perpendicular to the height direction of the ridge and at a side angle of 25 to 40 with respect to the side of the second side surface, thereby producing a first shot layer. A wire grid type polarizer having a high degree of polarization and p-polarized transmittance and low s-polar reflectance is formed. <Liquid crystal display device> 32 201100888 The liquid crystal display device of the present invention comprises: entanglement between a pair of substrates a liquid crystal panel holding a liquid crystal layer; The light unit; and the wire grid type polarizer of the present invention are arranged such that the surface on the side where the ridge is formed is the side of the backlight unit 70, and the surface on the side where the ridge is not formed is used as a visual inspection of the liquid crystal display device The wire grid type polarizer may be disposed on the surface of one side of the liquid crystal panel, and is preferably a surface of the liquid crystal panel disposed on the backlight unit side. 0 Further, the wire grid type polarizer is disclosed in Japanese Laid-Open Patent Publication No. 2006-139283 As shown in Fig. 15, it may be arranged in a state of being integrated with one of the substrates of the liquid crystal panel, and it is preferably integrated with the substrate of the liquid crystal panel on the backlight unit side. The grid-type polarizing member may be disposed on the liquid crystal layer side (ie, inside the liquid crystal panel) of one of the pair of substrates of the liquid crystal panel, as shown in FIG. 14 of Japanese Patent No. 4412388, and is preferably disposed in the liquid crystal layer. The substrate on the backlight unit side of the pair of substrates of the panel is on the liquid crystal layer side.液晶 The liquid crystal display device of the present invention preferably has an absorbing polarizer, and the absorbing polarizer is disposed on the surface of the liquid crystal panel opposite to the side on which the wire grid polarizer is disposed. The absorbing polarizer is preferably disposed on the surface of the liquid crystal panel on the opposite side of the backlight unit side. Fig. 7 is a cross-sectional view showing an example of a liquid crystal display device of the present invention. The liquid crystal display device 30 has a liquid crystal panel 34 in which a liquid crystal layer 33 is sandwiched between a pair of substrates 31 and a substrate, and a backlight unit %; the manufacturing of the present invention attached to the side surface of the backlight unit 35 of the liquid crystal panel 34 The obtained thumb 33 201100888 type polarizer 10 is attached to the absorptive polarizer 36 on the surface of the liquid crystal panel 34 on the opposite side of the backlight unit 35 side. As described above, in the liquid crystal display device of the present invention, since the wire grid type polarizer having both the polarization degree and the ρ polarized light transmittance is high, the brightness is extremely high. Further, in the liquid crystal display device of the present invention, the s-light reflectance of the one surface (the surface on the side where the ridges are formed, that is, the surface) is high, and the S-polar reflectance of the other surface (the surface on which the ridges are not formed, that is, the inside) is low. In the wire grid type polarizer obtained by the manufacturing method of the present invention, since the surface on which the ridge forming side is disposed is the backlight unit side and the surface on which the ridge is not formed is the visual side of the liquid crystal display device, the reduction in contrast is suppressed. EXAMPLES Hereinafter, the present invention will be described in more detail by way of examples, but the invention should not be construed as limited. Examples 1 to 30 are examples, and examples 31 to 34 are comparative examples. (the individual dimensions of the ridges and the layers) The maximum size of each of the five ridges and the layers on the ridges is determined in the transmission electron microscope image of the cross section of the wire grid type polarizer (however, for example, 2

Db Bu Dal &amp; Da2 is the aforementioned defined value), and the five maximum values are averaged to obtain the ridges and the individual sizes of the layers. (P-polarized transmittance) P-polarized transmittance was determined using an ultraviolet-visible spectrophotometer (JASCO). The auxiliary polarizer is disposed between the wire and the wire grid type = 'the direction of the absorption axis is parallel to the long axis of the metal thin wire of the wire grid type polarizer, and is formed from the surface side of the wire grid type polarizer Side) or inside 34 201100888 The side of the face (the side where the ridge does not form) is incident on the polarized light, and the measurement is performed in this manner. The measurement wavelengths were 450 nm, 550 nm, and 700 nm. The P polarizing transmittance of 40% or more is S, 35% or more and less than 40% is A ′ 30% or more and less than 35% is B, and less than 30% is X. (s polarized reflectance)

The s polarized light transmittance was measured using an ultraviolet-visible spectrophotometer (JASCO Corporation 'V-7200). The auxiliary polarizing member is disposed between the light source and the wire grid type polarizing member such that the direction of the absorption axis is perpendicular to the long axis of the metal thin wire of the wire grid type polarizing member, and the wire grid type polarizing member is opposed at an angle of 5 degrees. The surface or the inside is incident on the polarized light and measured in this manner. The measurement wavelength was 45 〇 nm, 550 nm, and 700 nm. The surface s polarized reflectance of 40% or more is S, 35% or more and less than 40% is A, 30% or more and less than 35 °/. For B. Further, the surface s polarized reflectance is less than 10% s, 1% or more and less than 20% is A, 20% or more is B, and less than 20% is X. (Polarization degree) The degree of polarization is calculated by the following formula. The degree of polarization saTp-TsVCTp+Ts))0·5 However, Tp is the surface p-polarized transmittance, and Ts is the surface s polarized transmittance. The degree of polarization of 99.5% or more is S ′ 99.2% or more and less than 99.5% is A, 99% or more and less than 99.2% is B, and less than 99% is X. (Brightness) Brightness was measured by the following method. On the 2-sided LED side-lit backlight, the wire grid type and the liquid crystal cell are sequentially overlapped. The wire shed type polarizer is arranged such that the morning side is the liquid crystal cell side. The liquid crystal cell is used only with a polarizing plate on the upper side. The backlight and the liquid crystal cell are activated in the dark room. The liquid crystal cell was displayed in a full white display, and the center luminance B31 after lighting for 10 minutes was measured with a color luminance meter (manufactured by TOPCON Co., Ltd., BM-5AS) at a viewing angle of 0.1 °. Then, the liquid crystal cell is fully displayed as a black display, and the brightness B32 at this time is measured. The same backlight is used, and the liquid crystal cell of the iodine-based polarizing plate is provided on both the upper side and the lower side. The backlight and the liquid crystal cell were activated in the dark room. Similarly, the center luminance B2 when the liquid crystal cell was completely displayed in white was measured. Using the values obtained by the above measurement, the luminance enhancement rate was obtained from the following equation. Brightness increase rate = (B3 2-B21) / B21X100 Let the brightness increase rate be 25% or more as S, 20% or more and less than 25% as A, 15% or more and less than 20°/. For B, less than 15% is X. (Comparative) Using the values obtained by the above measurement, a comparison was obtained from the following formula. Contrast = B31/B32 Let the comparison of 1000 or more be S, 500 or more and less than 1000 be A, 300 or more and less than 500 be B, and less than 300% be X. (Measurement of Absorbance of Light Absorbing Material) The absorptance of the light absorbing material was estimated by the following method. (Absorption rate of nickel) In a vacuum evaporation apparatus (SEC-16CM, manufactured by Showa Vacuum Co., Ltd.), a 5 忖 quartz wafer of 36 201100888 thickness: 0.55 mm is set horizontally with respect to the standard dryness at a pressure of 1.2 x 1 ( Under the condition of T4Pa, the thickness of the stone was increased to 60 nm on the stone drum. The ultraviolet crystal was used to obtain the quartz crystal K formed on the (four) film at a wavelength using an ultraviolet-visible spectrophotometer (v_72〇〇, manufactured by JASc Co., Ltd.). Transmittance and reflectance at 55 (nm). Quartz wafer was used as a blank control group (Sister &quot;. Absorption rate was calculated by the following equation. Absorption rate of light with a wavelength of 55 〇 nm (%)=1 〇〇-transmittance of light having a wavelength of 550 nm (%) - reflectance of light having a wavelength of 550 nm (0/〇) Transmittance: 1%, reflectance: 25%, absorptance: 74% (absorption rate of titanium) The absorption rate was estimated in the same manner as nickel. Transmittance·0.5% 'Reflectance: 18%, Absorption rate: Μ%%' (Chromium absorption rate) The absorption rate was estimated in the same manner as nickel. Q Transmittance: 2% 'reflectance: 15%' absorption rate: 87%. (absorption rate of aluminum) The absorption rate is estimated in the same manner as nickel. :〇% 'Reflectance: 95%, Absorption rate: 5%. (Modulation of photocurable composition) In a 4-neck flask of a women's mixer and cooling tube: Monomer 1 (New Nakamura Chemical Industry Co., Ltd., NK Ester a-DPH, dipentaerythritol hexaacrylate) 60g; 37 201100888 Monomer 2 (Nok Nakamura Chemical Industry Co., Ltd., NK Ester A-NPG, Xin 40-g of a neopentylglycol diacrylate, a photopolymerization initiator ("IRGACURE907" manufactured by Ciba Specialty Chemicals Co., Ltd.) 4.0 g; a fluorine-containing surfactant (manufactured by Asahi Glass Co., Ltd., fluoroacrylate (CH2=CHCOO (CH2)) 2(CF2)8F) co-polymerization with butyl acrylate, fluorine content: about 30% by mass, mass average molecular weight: about 3000) 0 lg; polymerization inhibitor (made by Wako Pure Chemical Industries, Q13〇l) 〇g; and 65.0 g of cyclohexanone. The inside of the flask was kept at room temperature and light-shielded, and homogenization was carried out while stirring for a while. Then, 100 g of colloidal cerium oxide was slowly added while stirring the inside of the flask (solid content: 3〇g), even in the state where the inside of the flask is at normal temperature and shading The mixture was stirred for 1 hour and homogenized. Then, 340 g of cyclohexanone was added, and when the inside of the flask was kept at room temperature and light-shielded, H was stirred to obtain a solution of the photocurable composition 1. [Example 1] In the thickness ΙΟΟμιη High-transmission polyethylene terephthalate (pET) film (Teijin Tetoron 03, 100 mm x 100 mm, manufactured by Teijin Dupont Co., Ltd.) Surface 'coated with photocurable composition 1 by spin coating to form a thickness of 5 μm A coating film of the photocurable composition 1. At 25 ° C and 0_5 MPa (measuring pressure), a quartz mold (area: l) having a plurality of mutually parallel grooves (parallel to each other across a flat portion formed between the grooves) is formed at a predetermined pitch ^OmmxlSOnmi, pattern area: lOOmmxlOOmm' trench pitch Pp: 140nm, trench upper width Dpb: 38 201100888 60nm, trench bottom width Dpt: 20nm, trench depth Hp: 200nm, trench length: 100mm, trench cross-sectional shape : a substantially trapezoidal shape is applied to the coating film contacting the photocurable composition 1 so that the groove is in contact with the coating film of the photocurable composition. While maintaining this state, the light from the PET film side was irradiated with a high-pressure mercury lamp (frequency: 1.5 kHz to 2.0 kHz 'main wavelength light, 255 nm, 315 nm, and 365 nm, irradiation energy at 365 nm: l〇〇〇mj) for 15 seconds. The photocurable composition 1 is cured to form a light-transmissive substrate 1 having a plurality of ridges corresponding to grooves of a quartz mold and a flat portion between the ridges (protrusion pitch Pp: 140 nm, ridge bottom) Width Dpb: 60 nm, ridge top width Dpt: 2 〇 nm, ridge height Hp: 200 nm, 0 1 and 0 2 ·· 84.). The quartz mold was slowly separated from the light-transmitting substrate 1. A vacuum vapor deposition apparatus (SEC-16CM, manufactured by Showa Vacuum Co., Ltd.) which can change the inclination of the light-transmissive substrate relative to the vapor deposition source was used, and the pressure was ι2 χ l〇_4 Pa, as shown in Table 1. Direction v, angle, and vapor deposition amount t, as the first vapor deposition, the first absorption layer is formed on the second side surface of the ridge of the light-transmissive substrate ', and then in the direction V shown in Table 1, The angle 0 R and the vapor deposition amount t are vapor-deposited aluminum as the second vapor deposition, and the first reflection layer is formed on the first absorption layer to obtain a wire grid type polarizer in which a PET film is adhered. Further, the vapor deposition amount t was measured by using a crystal oscillator as a thickness monitor of the film thickness sensor. [Examples 2 and 3] A wire grid type polarizer was produced in the same manner as in Example 1 except that the nickel forming the first absorption layer was changed to titanium or chromium. 39 201100888 [Example 4] A wire grid type polarizer was produced in the same manner as in Example 1 except that the angle 6 &gt; R when the first reflection layer was formed was the angle shown in Table 1. [Example 5] Under the conditions of pressure: 1.2×10 −4 Pa, aluminum was vapor-deposited in the direction V, the angle 0 R and the vapor deposition amount t shown in Table 1 as the first vapor deposition, and the same manner as in Example 1 was carried out. The base layer is formed on the first side surface of the ridge of the optical substrate 1, and then nickel is vapor-deposited as the second vapor deposition in the direction V, the angle θ R and the vapor deposition amount t shown in Table 1, and is formed on the base layer. In the first absorption layer, aluminum is vapor-deposited in the direction V, the angle 6 &gt;R and the vapor deposition amount t shown in Table 1 as the third vapor deposition, and the first reflection layer is formed on the surface of the first absorption layer. A wire grid type polarizer having a PET film attached thereto is obtained. [Examples 6 and 7] A wire grid type polarizer was produced in the same manner as in Example 5 except that the nickel forming the first absorption layer was changed to titanium or chromium. [Example 8] A wire-grid type polarizer was produced in the same manner as in Example 6 except that the angle 0R at the time of forming the first reflecting layer was the angle shown in Table 1. [Example 9] Under the conditions of a pressure of 1.2 x 10 ° C, nickel was vapor-deposited in the direction V, the angle 0 L, and the vapor deposition amount t shown in Table 1, as the first vapor deposition, and the same manner as in Example 1 was carried out. A second absorption layer is formed on the second side surface of the ridge of the optical substrate 1, and then nickel is vapor-deposited as the second vapor deposition in the direction V, the angle 0R, and the vapor deposition amount t shown in Table 1, and the ridge is The first absorption layer is formed on the side surface, and then the first reflection layer is formed by vapor deposition of aluminum as the third vaporization in the direction v, the angle 0R, and the vapor deposition amount t shown in Table 1, and the inner reflection layer is formed. Wire grid type polarizer for PET film. [Examples 10 and 11] A wire grid type polarizer was produced in the same manner as in Example 9 except that the nickel in which the first absorption layer and the second absorption layer were formed was changed to titanium or chromium. [Example 12] A wire-grid type polarizing member was produced in the same manner as in Example 10 except that the angle 0R at the time of forming the first reflecting layer was the angle shown in Table 1. [Example 13] Under the condition of pressure: l_2xl0_4pa, the direction v, the angle • ^ and the vapor deposition amount t are evaporated as the first steaming, and in the case of the w-like method. On the first side surface of the ridge of the substrate 1, the wire bottom layer is formed, and then, from the direction v, the angle Θ L shown in Table 1, and the steaming amount t, the nickel is distilled as the second steaming 'on the second side of the ridge A second absorption layer is formed on the surface, and then the orientation V, the angle, and the amount of steamed metal t are recorded as the third steaming, and the surface is formed on the surface of the base layer! The absorbing layer is then shown in Table i: steaming the v, the angle 0R, and the steaming amount t as the fourth steaming, and forming the first on the surface of the first absorbent layer! The reflective layer is made of a wire grid type polarizer with a PET crucible attached thereto. [Examples 14 and 15] The wire-type polarizers were produced in the same manner as in Example 13 except that the first absorption layer and the second absorption layer were changed to the same. [Example 16] 41 201100888 A wire grid type polarizer was produced in the same manner as in Example 14 except that the angle at which the first reflecting layer was formed was the same as the angle shown in Table 丨. ' [Example 17] Under the pressure: 1.2xl 〇 -4Pa, in the direction shown in the table 乂, angle and steaming amount t steamed nickel as the first! Secondary steaming, and the first absorbing layer is formed on the side of the ridge of the ridge of the light-transmissive substrate 1 which is made by the old method, and then the nickel is vaporized in the direction V, the degree of Xiao, and the amount of steam in the direction shown in Table 1. As the second vapor deposition, a second absorption layer is formed on the second side surface of the ridge, and then, in the direction V, the angle, and the ship 4t shown in Table 1, the surface of the first absorption layer is formed. The first reflective layer is formed, and then aluminum is vapor-deposited in a direction V, an angle of 0 L, and a vapor deposition amount t, and a second reflective layer is formed on the second absorption layer to obtain a PET film. Wire grid type polarizer. [Examples 18 and 19] A wire grid type polarizer was produced in the same manner as in Example 17 except that the nickel in which the first absorption layer and the second absorption layer were formed was changed to titanium or chromium. [Example 20] A wire-grid type polarizer was produced in the same manner as in Example 18 except that the angle 0L at the time of forming the second reflection layer was the angle shown in Table 。. [Example 21] The mold used a quartz mold having a plurality of mutually parallel plural grooves (parallel to each other across a flat portion formed between the grooves) at a predetermined pitch (area: 150 mm x 150 mm, pattern area: 100 mm x 100 mm, groove) Pp: 140 nm, groove width Dpb: 60 nm, groove depth Hp: 200 nm, groove length: 100 mm, groove cross-sectional shape: substantially isosceles triangle), 42 201100888 Other than the same as Example 1, A light-transmissive substrate 2 having a plurality of ridges corresponding to grooves of a quartz mold and a flat portion between the ridges was produced (rare pitch Pp: 140 nm, ridge width 〇 {) 1): 6〇11111, convex Strip height Ηρ:2〇〇ηηι, ' 0 1 and 0 2 : 87. ). A wire grid type polarizer was produced in the same manner as in the case of using the light-transmitting substrate 2'. [Example 22] The light-transmitting substrate 2 produced in the same manner as in Example 21 was used, and the angle 0R at the time of forming the first reflecting layer was the angle shown in Table 2, and the same was obtained in the same manner as the example. Wire grid type polarizer. [Example 23] A wire-type polarizing member was produced in the same manner as in Example 5 except that the light-transmitting substrate 2 produced in the same manner as in Example 21 was used. [Example 24] The light-transmitting substrate 2 produced in the same manner as in Example 21 was used, and the angle 61 R at the time of forming the 〇1 reflecting layer was the angle shown in Table 2, except that it was the same as Example 5. A wire grid type polarizer is produced. [Example 25] A wire-type polarizing member was produced in the same manner as in Example 9 except that the light-transmitting substrate 2 produced in the same manner as in Example 21 was used. [Example 26] A wire grid type polarized light was produced in the same manner as in Example 9 except that the angle at which the first reflecting layer was formed was the angle shown in Table 2 Pieces. 43 201100888 [Example 27] A wire-grid type polarizer was produced in the same manner as in Example 13 except that the light-transmitting substrate 2 produced in the same manner as in Example 21 was used. [Example 28] The light-transmitting substrate 2 produced in the same manner as in Example 21 was used, and the angle Μ at the time of forming the first reflecting layer was the angle shown in Table 2, except that the same procedure as in Example 13 was carried out to obtain a line. [Example 29] A wire-grid polarizer was produced in the same manner as in Example 17 except that the light-transmitting substrate 2 was produced in the same manner as in Example 21. [Example 30] The same procedure as in Example 21 was carried out. The light-transmitting substrate 2 was produced in the same manner as in Example 17 except that the angle θ% at which the first reflecting layer was formed and the angle 01 formed when the second reflecting layer was formed was the angle "not shown in Table 2". A wire-type polarizing member is obtained. [Example 31] A mold in which a plurality of mutually parallel plural grooves (parallel to each other across a flat portion formed between the grooves) are formed at a predetermined pitch (area: 150 mm x 150 mm) Pattern area: 1〇〇mmxl〇〇_, groove pitch Pp: 150mn, groove width Dpb: 6〇nm, groove depth Hp: 2〇〇nm, groove length: l〇〇mm, groove cross-sectional shape : Rectangular), except for the same as in Example 1, and a plurality of ridges having grooves corresponding to the mold made of quartz and the protrusions were produced. The light-transmissive substrate 3 in the flat portion (the ridge pitch Pp: 150 nm, the ridge width Dpb: 60 nm, the ridge height Hp: 2 〇〇 nm, 0 1 44 201100888 and 6 > 2 : 90°). The curable substrate 3 was subjected to a vacuum vapor deposition apparatus as in Example 1 at a pressure of 1.2 x 1 (in the case of T4 Pa, while introducing oxygen of 2.2 nm/sec) in the direction V, the angle 0R shown in Table 2, and The vapor deposition amount t is vapor-deposited and oxidized to form a first absorption layer (oxidation layer) on the first side surface of the ridge of the light-transmitting substrate 3 as the first vapor deposition. Then, the introduction of oxygen gas is stopped. Aluminum was vapor-deposited in the direction V, the angle 0R, and the vapor deposition amount t shown in Table 2, and a first reflection layer (aluminum layer) was formed on the surface of the first absorption layer to obtain a wire grid with a PET film attached thereto. The polarizing member has a chromium oxide layer and an outermost layer of aluminum formed only near the top of the ridge. The maximum width of the chromium oxide layer in the width direction of the ridge is 67 nm and the height is 45 nm. The aluminum layer is in the width direction of the ridge. The maximum width is 75 nm and the height is 117 nm. [Example 32] The light-transmitting substrate 3 prepared in Example 31 was used, and the same as in Example 1 was used. The vacuum evaporation apparatus is characterized in that: under the condition of pressure: 1.2×1 〇—4 Pa, aluminum is vapor-deposited as the i-th vapor deposition in the direction V, the angle 0R, and the vapor deposition amount t shown in Table 2, and the light-transmitting substrate 3 is used. A first reflective layer (aluminum layer) is formed on the first side surface of the ridge. Then, while introducing 0.2 nm/sec of oxygen, the chromium is vaporized in the direction V, the angle, and the vapor deposition amount t shown in Table 2, and Oxidation is performed to form a first absorption layer (chromium oxide layer) on the aforementioned second reflection layer, and a wire grid type polarizer having a PET film attached thereto is obtained. The aluminum layer and the outermost layer of chromium oxide are formed only near the top of the ridge. The maximum width of the layer in the width direction of the ridge is 7〇mn and the height is 45 201100888 116nm. The outermost layer of chromium oxide has a maximum width of 74 nm in the width direction of the ridges and a height of 20 nm. [Example 33] The light-transmitting substrate 2 produced in the same manner as in Example 21 was used, and the angle 0R at the time of forming the first absorption layer was the angle shown in Table 2, and otherwise the same as in Example 1 to obtain a line. Gate type polarizer. [Example 34] The convexity of the light-transmitting substrate 2 produced in the same manner as in Example 21 was carried out under the conditions of a pressure of 1.2 x 10 -4 Pa in the direction V, the angle 0R, and the vapor deposition amount t shown in Table 2. A first reflection layer was formed on the strip, and then nickel was vapor-deposited in the direction V, the angle, and the vapor deposition amount t shown in Table 2 to form a first absorption layer, and a wire grid type polarizer having a PET film attached thereto was obtained. [Measurement and Evaluation] The respective dimensions of the respective layers of the wire grid type polarizers of Examples 1 to 34 were measured. The results are shown in Tables 3 and 4. Further, the transmittance, reflectance, degree of polarization, brightness, and contrast of the wire grid type polarizers of Examples 1 to 34 were measured. The results are shown in Tables 5 and 6. 46 201100888 [Table l]

4th vapor deposition amount t (nm) 1 1 1 1 1 I 1 1 1 I i 1 〇〇iO CM ιο «Si to CM IQ cw angle β RCL) (.) 1 1 1 1 1 1 i I 1 1 II s U1) &lt;0 g 〇 (A CO direction VII 1 1 1 Weng 1 I 1 1 1 1 &gt;·»«&lt;·&gt; »*· &gt;&gt;&gt;&gt;&gt;&gt; material 1 1 1 1 1 1 I 1 1 1 II &lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt; | 3rd vapor deposition evaporation it (nrr〇I 1 ! 1 iO in tn to to Inch 40 inch to r*» 卜Γ&quot;·* in €M in ΙΟ CM in CS| Angle β R(L&gt; (° &gt; 1 1 I 1 ss in % 宕o Λ in CO U) CO to &lt;n C9 IO CO u&gt; 00 l〇o to &lt;〇u&gt; cn direction V 1 1 1 1 &gt;&gt; ** &gt;&gt;&gt;&gt; w 1«N* &gt; ψ··* &gt;&gt;&gt;&gt;&gt; Material t \ 1 1 &lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt; 2nd vapor deposition evaporation amount t (nm) in In in arm in in T&quot;· in in 卜卜卜卜卜卜卜卜卜 angle (°) g 〇o C*5 IO CO U&gt; om CO LO in &lt;〇ir&gt; CO tf&gt; €* &gt; in eo CO l〇03 i〇ml〇to i〇CO i n «Ο l〇fO l〇co Direction VT_ &gt;&gt;&gt;&gt;&gt;&gt;&gt;&gt;&gt;&gt;&gt;&gt; CM &gt; «VI &gt; CSf &gt; M &gt; CM &gt; €SI &gt; CSI &gt; Material &lt;&lt;&lt;&lt; 芝 - ώ F 芝w w. ϋ H 〇iz P 〇K The first evaporation evaporation t (nm) &lt;M T&quot; CM Y-· &lt;NC*J &lt;N CM CSI CM CM CO 00 00 CO Bubb angle β R(L&gt; Γ ) U? ID CO to Λ in u> Λ u&gt; CO 03⁄4 m CO u&gt; ⁄*· &gt; »— &gt; t— &gt; CM &gt;&lt;N&gt; $ &gt;&gt; r-· &gt;I·&quot;»&gt;&gt;&gt; T** &gt; T·* &gt; γ— &gt ; material z k. o &lt;&lt;&lt;&lt; 0 &lt;&lt;&lt; - om cs 〇*&gt; inch &lt;〇卜0Q 〇&gt; 〇»· T— CM CO ·*- inch In &lt;D c〇〇» 〇0*4 47 201100888 [Table 2] 1 4th evaporation I evaporation amount t (nm) 1 1 1 1 1 1 〇5 *n M fcO OJ 1 1 1 1 Angle (. &gt; 1 1 1 1 1 1 〇CO i〇S JO 1 1 i 1 direction V 1 1 1 1 1 1 r- &gt; *r~ Csl &gt; Csi &gt; 1 1 1 1 Material 1 1 ! 1 i 1 &lt;&lt;&lt;&lt;&lt; 1 i 1 1 3rd vapor deposition I i vapor deposition amount t (nm) 1 1 ΙΟ in LO in 卜i iO &lt;v| in CM 1 1 1 1 Angle 0 is C) 1 1 ο C0 s Uf&gt;ur&gt; CO U&gt; CO IA CO ΙΛ 1 1 1 1 Direction V 1 I &gt;&gt;&gt;&gt;&gt;&gt;&gt;&gt; 1 1 1 1 Material 1 1 &lt;&lt;&lt;&lt; Z &lt;&lt; l 1 1 1 | 2nd vapor deposition j vapor deposition it (nm) ΙΛ ιη ψ&quot;» u&gt; 卜卜卜卜卜so &lt;M LO wear angle gwu (. % ΙΟ 40 CO in ¢0 in CO m CO w co L〇CO in &lt;〇ir&gt; oos u&gt; inch direction V &gt;&gt;&gt;&gt;&gt;&gt;&gt; C4 &gt; V·» &gt;&gt;&gt; Material &lt;&lt;&lt; 1 CrOx! &lt; 2: z Z 2; Z h- | 1st steam evaporation amount t (nm) C*l «Ρ* CSJ f- r - CM ▼—· ¢0 CO Bub S % in Angle 9mu (.) in ΙΑ &lt;0 if&gt; ο in Λ m in 00 m co u&gt;&lt;〇to ¢0 in CO !? IO in in in in Direction V &gt;&gt;&gt; & Gt &gt;&gt;&gt;&gt;&gt;&gt;&gt; V·» &gt;V&quot;·&gt; Material ζ &lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&gt; To CM 卜 04 GO 04 φ cs oc»&gt; Γ0 CM CO CO CO Section o 48 201100888 Table - - o . .ο τ~ ΓΛ 味 ^ Ε工&gt;5 1 1 1 1 1 1 ! g CM g (N § o CM oo CM ososos 〇ososoo CM «ΐ 1 1 1 1 1 1 1 1 tn m in in in tn in in mm ID 竑i 1 1 1 1 i 1 IZH &lt;5 P 2 〇i==ZHOP ( S Completion S 1 1 1 1 1 1 I i 1 1 i 1 ! I 1 o 00 g § ▼»· o U) y·» ΐ Ε 〇S 1 1 1 1 1 I 1 1 1 1 1 1 1 1 1 lo &lt;M o eg o esi a 荽1 1 1 1 1 1 I 1 I 1 1 1 1 1 1 1 &lt; 5 &lt; 5 &lt; t$n 埃 ii 1 1 1 1 〇% 〇sos O s 1 i 1 1 os 〇o 〇so S 1 1 i 1 i! 1 1 1 1 〇oo 1 1 1 1 iO in in to 1 1 I 1 m 1 1 1 1 &lt;&lt;&lt;&lt; 1 1 1 1 &lt;&lt;&lt;&lt;&lt;&lt; 1 1 1 1 — sister-^ ^ S o 04 ososog 〇gosososoo CM oso 8 〇〇est os O sosooo CV| osos 〇o CM asooooooooo 2 o ® u&gt; LO l〇in IO iO U) In u Pan F 1_ oz 2: H k_ 〇zwo K 2: OP ϋ P i. oq|d Ζ ΐ ^ ss ·*«» s *P&gt;· 1 S «·» O sogoso in os 〇8 oso to o CO o CO V·· O CO S 〇CO § o CD s τ 1e QS ooo O o cr> % % % σ 〇oo tn r&gt; to CO tf&gt; to to 00 sss 8 St &lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt; ·»to IO CO ▼-»· c〇Τ·&quot;· 〇&gt; * vs φ . ·5 II Iqa-mu ooglgH -i siido.Eu s:qdo-EC ondd: w 49 201100888 Table ±i CM CO &lt;S4 jo rs 映Ha2 (nm) ! 1 1 1 〇s 〇oo 〇&lt;N 〇s 〇o cst os 1 1 if Da2 (nm) 1 1 1 I l〇IO to lf&gt; in 1 1 i 1 1 t 1 1 1 zzzz 2: 1 I 1 1 η 昧Hr2 (nm) 1 1 1 1 1 1 \ 1 o 5 〇s I i I 1 ΐί ε Q &gt;5 i 1 1 t 1 1 1 I u&gt; Tn 1 1 1 1 Code 1 1 1 1 1 1 i 1 &lt; 1 1 1 I q|b Hbl (nm) 1 1 ooos I 1 osoo C4 1 1 I 1 1 1 Dbl (nm) 1 ot·· o 1 1 un in I 1 1 II f 诨ii &lt;&lt; 1 1 &l t; &lt; 1 i 1 1 1 ic|ffi Hide (UIU&gt; 〇S oo CM oo CM oso 〇CSI os 〇sososos IO S o LO *&quot;« 〇Oal (nm) 〇o Ψ·» oo 〇s tn Ιο w&gt; S U&gt; in z 2: 3C z Z 2: 2: z X 〇〇X lack iq|b ZB ^ 3 〇C&gt;l § 〇so C4 s •mm 〇sg S •Ψ··» s 卜&lt;〇〇i〇τ Ί 〇o % 〇o IX&gt;&lt;·&gt; ss JO 〇os &&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt; CM Csi CM 5 u&gt;&lt;〇¢0e&gt;i cn O CSI &lt;·» CO o inch•OSCD*o6:lcb— -Eu 003O.H 'i 09:10-io2aQ* Is laCL: e«_±l-^^. 00&lt;Nq&gt;- ·£»1&lt;Χ&gt;-i oocslaH *—4jaa*euo9:qdo-i ?l:dd: 3 璀^趄采栖 50 201100888 [Table 5]

Ffl ffl CO &lt;&lt;&lt;&lt;&lt; CO &lt;&lt;&lt;&lt; Φ Φ CO wwww &lt;n CO brightness enhancement m ω m &lt;&lt;&lt;&lt;&lt; ω &lt;0 to &lt;n &lt; % Nww to t/iw ¢0 CO 700nm luminosity (Λ &lt;0 CO co &lt;0 CO CO w CO CO (Λ &lt;/3 CO w &lt;/&gt; ww S« light reflectance sleep m CO κη CO CO m &lt;y&gt; ω &lt;Λ CO CO w CO CO CO w K/i %nww 陋m CO 60 Φ &lt; Φ (/&gt;c/&gt;&lt; ω OD φ &lt; w W CO &lt; To CO &lt;Λ &lt; P polarized light transmittance @ m u&gt; (Λ m 05 (A wm to w W w ω CO ¢0 CO &lt;/&gt;&lt;0 w κ/i CO sleep m CO €0 m 〇&gt; in tn co CO CO Φ tn ¢0 CO &lt;/} CO €0 CO &lt;〇u% 550nm luminosity only « W CO &lt; in CO 05 &lt;&lt;/3 07 φ &lt; CO ww &lt ; CO tn &lt; 8 damage reflectance « CO W CO co C/3 w CO CO w « φ w &lt;〇CO ¢0 &lt;0 tn CO m ¢0 CO i/i &lt; CO CO 00 &lt; (/) ϋ&gt; ω &lt; CO CO to &lt;〇CO σ&gt; co w &飧» m to ω &lt;0 w « &lt;〇w « CO ω CO tn w OT w CO CO CO &lt;/ ) » m CO €0 CO CO (/} iA &lt;/&gt;i〇〇&gt;&lt;0 CO w 〇&gt; CO w CO &lt;nw CO 450nm brilliance CD ω CD CO &lt;&lt;&lt; ca &lt;&lt;&lt; ω u&gt; CO &lt;0 &lt; €0 &lt;/&gt; « &lt; 8 polarized reflector car mm ω ω ω &lt;&lt;&lt;&lt; CO &lt;&lt;&lt; tn w CO w 05 05 to 07 瞌mww CO €0 i/i Φ &lt;A ¢0 «0 05 〇&gt ; CO CO CO &lt;/&gt; CO w Φ w P polarized transmittance sleep m &lt;&lt;&lt;&lt;&lt;&lt;&lt; 〇ω m ffl &lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&gt; OT w Ά m &lt;&lt;&lt; CO &lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;Ί&quot;· 1-· CM T·· in Bu «0 2 o CM 51 201100888 [Table 6] Contrast W t/i 05 &lt; Φ w CO in ϋ&gt; W ω XXX Brightness Enhancement &lt;/&gt; CO tn &lt ; &lt;&lt;&lt;&lt;&lt; ω W G0 ω (Ω ω 700nm Polarization W w « mww ω & 0 X €0 0Q XS hire light reflection string 1_ Wrap CQ &lt;r&gt; ¢0 &lt;n Φ 03 Φ ϋ&gt;&lt;Λ WXX ω X Surface CO tn 00 φ CO CO in Φ Λ Λ « φ ω &lt;&lt; P polarized transmittance inside m W &lt;/&gt; xn « U) ω C0 C0 X ω &lt; CD surface U) %n Φ &lt;z&gt; V) &lt;/&gt; « W κη X ω &lt; CD 550nm 俪 φ φ tn CO &lt; w W m CO ω ω X CO XXS two light reflection string CO κ/&gt; CO CO « Φ ¢0 κη ω CO XX ω X ft surface CO tn CO &lt;Λ tn φ ¢0 CO 0) Visit &lt;&lt; P polarized transmittance CO tn CO CO OT m (AW CO C0 XX &lt; m % &lt;/&gt; Φ CO CO CO m CO W C0 υ&gt; XX &lt; m 450nm Employer &lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt;&lt; Λ WX ω XX 8 polarized reflectance S φ CO €0 ¢0 CO &lt;〇« C0 m X ω X Surface (Ο in CO &lt;0 〇&gt; tfi CO &lt;/&gt; φ CO &lt;Λ « &lt ; &lt; P polarized light transmittance φ CO ¢ 0 &lt;&lt;&lt;&lt; ΚΛ C0 οα X &lt; Ώ Surface W %n (Λ &lt;&lt;&lt;&lt;ί/&gt; « CQ X &lt; m 1 wave* 1 $ csi w ΙΛ €M &lt;〇CM &lt;ΰ &lt;Μ 9&gt; «Μ ο CM ο ο &lt;〇s 52 201100888 Industrial Applicability The wire grid type polarizer of the present invention is used as Polarizers for image display devices such as liquid crystal display devices, rear projection projectors, and front projection projectors Very useful. In addition, Japanese Patent Application No. 2009-111487, filed on Apr. 30, 2009, which is hereby incorporated by reference in its entirety, the entire contents of 0 [Simple diagram of the drawing 3] Fig. 1 is a perspective view showing an example of the wire grid type polarizing member of the present invention. Fig. 2 is a perspective view showing another example of the wire grid type polarizing member of the present invention. Fig. 3 is a perspective view showing another example of the wire grid type polarizing member of the present invention. Fig. 4 is a perspective view showing another example of the wire grid type polarizing member of the present invention. Fig. 5 is a perspective view showing another example of the wire grid type polarizing member of the present invention. Fig. 6 is a perspective view showing another example of the wire grid type polarizing member of the present invention. Fig. 7 is a cross-sectional view showing an example of a liquid crystal display device of the present invention. [Main component symbol description] 10 wire grid type polarizer 20 first reflection layer 12 ridge 22 first suction (10) 13 flat portion 24 base layer 14 light transmissive substrate 26 second absorption layer 16 first side surface 28 second reflection layer 18 Second side 30 Liquid crystal display device 19 Top 31 53 201100888 32 35 Backlight unit 33 Liquid crystal layer 36 Absorptive polarizer 34 Liquid crystal panel 54

Claims (1)

201100888 Seven's patent application scope: L-type wire grid type polarizing member, comprising: a light-transmitting substrate, wherein a plurality of convex strips are formed on the surface, and the plurality of convex strips are formed between the convex strips The flat portions are parallel to each other and are formed at a predetermined pitch, and the widths of the plurality of ridges are gradually narrowed from the bottom toward the top; The first reflective layer covers the first side surface of the ridge and is made of a metal material; and the first absorbing layer exists between the ridge and the ninth reflective layer, and is covered with a side surface of the ridge 1 of the rib The entire surface is composed of a light absorbing material that absorbs light more than the aforementioned metal material. 2) The wire grid type polarizing member of claim 1, wherein the thickness of the ith absorbing layer is 3 to 20 nm. 3. The wire grid type polarizer of claim 1 or 2, further comprising a base layer present between the ridge and the first absorbing layer and covering the first rib The entire side is made of a metal material. The wire grid type polarizer according to any one of claims 1 to 3, further comprising a second absorption layer covering the second side surface of the ridges and having the light Made up of absorbent material. 5. The wire grid type polarizer of claim 4, further comprising a second reflective layer covering the surface of the second absorption layer and made of a metal material. 6. The wire grid type polarizer according to any one of claims 1 to 5, wherein the cross-sectional shape of the ribs orthogonal to the longitudinal direction thereof is triangular or trapezoidal. The wire grid type polarizer according to any one of claims 1 to 6, wherein the interval ΡΡ is 300 nm or less. The wire grid type polarizing member according to any one of claims 1 to 7, wherein the thickness of the first reflecting layer is 3 to 2 mn. The wire grid type polarizer according to any one of claims 1 to 8, wherein a width Dpb of the bottom of the ridge and a sum total length Pp of the width of the Dpb and the flat portion formed between the ridges are The ratio (Dpb/Pp) is 0.1 to 0.7. The wire grid type polarizer according to any one of claims 1 to 9, wherein the width of the bottom of the ridge is Dpb, and the total length of the width of the Dpb and the flat portion formed between the ridges is obtained. When Pp is the maximum value of the thickness of the first reflecting layer in the width direction of the ridges, Drl satisfies the following formula: 〇.2x(Pp-Dpb)$DrlS〇.5x(Pp-Dpb). The wire grid type polarizer according to any one of claims 1 to 10, wherein a ratio of a height Hr 1 of the first reflection layer formed on the first side surface of the ridge to a height Hp of the ridge ( Hrl/Hp) is 0.5 to 1.0. 12. A method of manufacturing a wire grid type polarizer, which is a method of manufacturing a wire grid type polarizer including a light-transmitting substrate, a first reflection layer, and a first absorption layer, wherein the light-transmissive substrate is formed with a surface a plurality of ridges, wherein the plurality of ridges are parallel to each other and formed at a predetermined interval, and the width of the plurality of ridges is gradually narrowed from the bottom toward the top; The first reflective layer covers the first side surface of the ridge, and 56 201100888 is made of a metal material; the first absorbing layer exists between the ridge and the first reflective layer, and covers the first side of the ridge The whole surface is composed of a light absorbing material that absorbs light more than the foregoing metal material. The method for manufacturing the wire grid type polarizing member comprises the following steps: steaming the same from one direction under the condition of a smelting amount of 3 to 20 nm The light absorbing material forms the first absorbing layer, and the direction intersects substantially perpendicularly in the longitudinal direction of the ridge, and forms an angle of 25 to 40° on the side of the first side surface with respect to the height direction of the ridge, and is vapor-deposited. The amount is 15 Under the condition of 50 nm, the metal material is vapor-deposited from the other direction to form the first reflective layer, and the other direction intersects substantially perpendicularly in the longitudinal direction of the ridge, and is in the first direction with respect to the height direction of the ridge The sides of the sides form an angle of 25 to 50 degrees. 13. The method of manufacturing a wire grid type polarizer according to claim 12, wherein the cross-sectional shape of the ridges orthogonal to the longitudinal direction thereof is triangular or trapezoidal. 14. The method of producing a wire grid type polarizing member according to claim 12, wherein the ridge is formed of a photocurable resin or a thermoplastic resin and formed by an imprint method. A liquid crystal display device comprising: a liquid crystal panel in which a liquid crystal layer is sandwiched between a pair of substrates; a backlight unit; and the wire grid type polarizer according to any one of claims 1 to 11. The surface on which the side of the ridge is formed is set as the side of the backlight unit, and the side on which the side of the ridge is not formed is used as the side of the liquid crystal display device. The liquid crystal display device of claim 15, further comprising an absorbing polarizer, wherein the wire grid polarizer is disposed on a surface of one side of the liquid crystal panel, and the absorbing polarizer is disposed on the liquid crystal panel The side on which the side of the wire grid type polarizer is disposed is the opposite side. 17. The liquid crystal display device of claim 16, wherein the wire grid type polarizer is disposed on a surface of the liquid crystal panel on the backlight unit side, and the absorption type polarizer is disposed on the liquid crystal panel with respect to the backlight The unit side is the surface on the opposite side. 18. The liquid crystal display device of claim 15, further comprising an absorbing polarizer, wherein the wire grid polarizer is integrated with one of the pair of substrates of the liquid crystal panel, and the absorbing polarizer is disposed. The side of the liquid crystal panel that is integrated with respect to the side of the wire grid type polarizer is the substrate surface on the opposite side. [19] The liquid crystal display device of claim 18, wherein the wire grid type polarizer is integrated with the substrate on the backlight unit side of the liquid crystal panel, and the absorption type polarizer is disposed on the liquid crystal panel with respect to the foregoing The backlight unit side is the surface on the opposite side. 20. The liquid crystal display device of claim 15, further comprising an absorption type 58 201100888 21. Ο type polarizer, wherein the wire grid type polarizer is disposed on a liquid crystal layer of one of the pair of substrates of the liquid crystal panel On the side, the absorptive polarizer is disposed on the surface of the substrate on the liquid crystal panel opposite to the side on which the wire grid polarizer is disposed. The liquid crystal display device of claim 20, wherein the wire grid polarizer is disposed on a liquid crystal layer side of the substrate on the backlight unit side of the pair of substrates of the liquid crystal panel, and the absorption type polarizer is disposed on the liquid crystal layer The surface of the liquid crystal panel opposite to the side of the backlight unit is the opposite side. 〇 59