KR101250396B1 - A Wire Grid Polarazer and Liquid Crystal Display within the same - Google Patents

Abstract

The present invention relates to a wire grid polarizer, comprising: a first grid layer having at least one first grid pattern on a substrate and at least one second grid pattern formed of a metallic material on the first grid pattern; A polarizing film integrated wire grid polarizer may be implemented by including a second lattice layer and a polarizing film stacked on an upper surface of the second lattice layer.
According to the present invention, an absorption type polarizing film and a wire grid polarizer are integrated to reduce the overall thickness and provide a polarizing module that realizes high brightness efficiency.

Description

Wire grid polarizer and liquid crystal display including the same {A Wire Grid Polarazer and Liquid Crystal Display within the same}

The present invention relates to a structure of a liquid crystal display device having a wire grid polarizer.

Liquid crystal displays (LCDs) are flat panel displays that are now widely used in mobile phones, laptops, monitors and TVs. A liquid crystal display is a device that transmits or blocks light by applying an electrical signal to each pixel in a liquid crystal panel positioned between two polarizers to change the arrangement of liquid crystals. Therefore, a separate light source is required to operate the liquid crystal display, and providing such a light source corresponds to a backlight unit.

1 is a conceptual view illustrating a general structure of a conventional liquid crystal display device, in which a liquid crystal panel A is disposed above the liquid crystal panel A, and a backlight unit B is disposed below the liquid crystal panel A. The liquid crystal LC is disposed between the substrate 9 and the lower substrate 6, and has a configuration including ITOs 7 and 8 for driving. Particularly, the upper part is a color filter and the lower part is a TFT array. Will be. The backlight unit is disposed below the liquid crystal panel and includes a light guide plate 2, a reflection sheet 1, a diffusion plate 3, and a reinforcing film (BEF) 4 to guide a light source upward.

In particular, polarizing films 5 and 10 may be provided on the lower surface of the lower substrate 6 constituting the TFT array of the liquid crystal panel and the upper surface of the upper substrate 9 constituting the color filter array to increase light transmittance. To make it work.

However, the conventional liquid crystal display device has a problem in that a manufacturing cost is increased because of the use of an expensive polarizing film and a slim liquid crystal display device due to the thickness of the polarizing film. In addition, the durability and heat resistance of the polarizing film is weak, there is a problem that the utilization of the manufacturing process of the liquid crystal display device is extremely limited, there is also a problem that decreases the brightness due to the use of the absorption type polarizing film.

The present invention has been made to solve the above problems, an object of the present invention is to provide a polarizing module that integrates the absorption type polarizing film and the wire grid polarizer to reduce the overall thickness, and to implement high brightness efficiency.

As a means for solving the above problems, the present invention is a first lattice layer having at least one first lattice pattern on the substrate; A second grid layer having at least one second grid pattern formed of a metal material on the first grid pattern; A polarization film laminated on the upper surface of the second lattice layer; to implement a wire grid polarizer comprising a.

In addition, the wire grid polarizer according to the present invention may be implemented by further including an optical pattern formed on the back of the substrate, the optical pattern, the projection pattern formed on the substrate may be arranged in a regular or irregular. .

In addition, the present invention includes a first grid layer having at least one first grid pattern on the substrate; A second grid layer having at least one second grid pattern formed of a metal material on the first grid pattern; A polarizing film laminated on a rear surface of the substrate; It may be implemented as a wire grid polarizer having a structure including; a protective layer stacked on the second grid layer.

Also in this case, the optical pattern may be further formed on the rear surface of the substrate, the projection pattern formed on the substrate may be arranged regularly or irregularly.

In any case, the first grid layer of the wire grid polarizer according to the present invention may be formed of the same polymer material as the refractive index of the substrate.

In addition, the second grid pattern of the wire grid polarizer according to the present invention may be formed of any one metal selected from aluminum, chromium, silver, copper, nickel, cobalt, or an alloy thereof.

In addition, the ratio of the width and height of the first grid pattern may be implemented in a structure that satisfies 1: (0.2 to 5), and the ratio of the width of the first grid pattern to the width of the second grid pattern is 1. The range of (0.2 to 1.5) may be implemented to satisfy a range of 10 nm to 200 nm and a height of 10 nm to 500 nm.

In addition, the width of the second grid pattern may be implemented in 2nm ~ 300nm, the period of the first grid pattern may be implemented in the range of 100nm ~ 250nm.

In addition, the wire grid polarizer according to the present invention is a surface treatment layer is formed on the first grid pattern or the second grid pattern of the wire grid polarizer, or is formed on part or all of the first grid pattern of the wire grid polarizer It may be implemented in a structure having a blackening layer.

In addition, the wire grid polarizer according to the present invention may be further configured to include a light absorbing layer stacked on the second grid layer to absorb the light flowing from the outside.

In this case, the light absorption layer may include: a first absorption grid pattern formed on the second grid pattern; and a third grid pattern formed of a metal material on the first absorption grid pattern; It may be implemented in a structure including a; second absorption grid pattern formed on the third grid pattern.

The light absorption layer may include: a first absorption grid pattern formed on the second grid pattern; and a third grid pattern formed of a metal material on the first absorption grid pattern; It may be implemented in a structure having a; second absorption grid layer formed on the third grid pattern.

Alternatively, the wire grid polarizer according to the present invention may include: a first lattice layer having at least one first lattice pattern on a substrate; A light absorption layer having an absorption type grid pattern formed on the first grid pattern; And a second grid layer having at least one second grid pattern formed of a metal material on the absorption grid pattern.

The wire grid polarizer according to the present invention may be applied to implement a liquid crystal display device including a backlight unit emitting upward from a light source and a liquid crystal panel stacked on the backlight unit to form a pixel.

According to the present invention, an absorption type polarizing film and a wire grid polarizer are integrated to reduce the overall thickness and provide a polarizing module that realizes high brightness efficiency.

In particular, according to the present invention, by implementing the insulating first grid pattern formed on the substrate and the metal grid pattern thereon, by controlling the transmittance of each wavelength according to the light angle of the incident light to minimize the color change rate according to the viewing angle An advantage of providing a wire-grid polarizer integrated touch panel is also realized.

In addition, according to the present invention, through the wire grid polarizer having the absorption function and the reflection function at the same time, it is possible to implement a brightness improvement without lowering the contrast contrast, and at the same time provides a touch panel with a slim thickness and an integrated touch function with improved reliability. There are also effects that can be done.

1 shows the structure and function of a conventional liquid crystal display.
2 is a cross-sectional conceptual view showing the structure of a wire grid polarizer according to the present invention.
3 to 14 is a cross-sectional conceptual view showing a structure as another embodiment of the wire grid polarizer according to the present invention.
15 is a conceptual diagram illustrating a structure of a liquid crystal display device including a wire grid polarizer according to the present invention.

Hereinafter, with reference to the accompanying drawings will be described in detail the configuration and operation according to the present invention. In the description with reference to the accompanying drawings, the same components are given the same reference numerals regardless of the reference numerals, and duplicate description thereof will be omitted. The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another.

The present invention is to provide a wire grid polarizer having both an absorption function and a reflection function at the same time, to integrate the absorption polarizing plate into the wire grid polarizer to slim the thickness and to implement a high brightness polarization efficiency.

1. Basic Structure of Wire Grid Polarizer

2 is a cross-sectional conceptual view illustrating a structure of a wire grating polarizer integrated touch panel according to the present invention.

Referring to the drawings, the wire grid polarizer integrated touch panel according to the present invention includes a first grid layer 120 and the first grid layer having at least one first grid pattern 121 on the first substrate 110. A second grid layer including at least one second grid pattern 130 formed of a metal material on the grid pattern 121, and a polarizing film P is stacked on the second grid layer. It may be formed into a structure. That is, the polarizing film P is bonded to a wire grid polarizer that implements a brightness enhancement function to provide an integrated structure to slim the overall thickness and to implement a module that provides a high brightness polarization function. In particular, by implementing the insulating first grid pattern and the metal grid pattern thereon, it is possible to minimize the color change rate according to the observation angle by controlling the transmittance of each wavelength according to the light angle of the incident light.

Specifically, the substrate 110 may implement a function as a support and a protective sheet, it is preferable to use a substrate of a transparent material that can transmit visible light. The first substrate may be a glass substrate and various polymers such as quartz, acryl, TAC, COP, PC, PET, and the like. In particular, the present invention can be implemented to be processed in a continuous process through a process using an optical film substrate having a certain degree of flexibility.

The first grid layer 120 is formed in close contact with the upper surface of the first substrate 110, the material may be implemented as a resin layer made of a polymer material, in particular, the first grid of a certain protrusion pattern on the surface It is preferable to have many patterns 121. That is, the first lattice layer 120 is defined as including a layer including a plurality of first lattice patterns 121, which are protrusion patterns having a predetermined period, on the surface of the resin layer formed of a polymer. The first grid layer 120 may be formed by implementing a pattern by an imprinting method using a mold. In particular, the first lattice layer 120 according to the present invention is more preferably used to improve the utilization efficiency of light by using a material having a lower refractive index or the same or higher than the substrate 110 according to the purpose. .

In particular, the second grid pattern 121 made of a metal material is made of a metal material having a high reflectance, so that the light can be recycled by increasing the reflection efficiency of the light.

The second grid layer 130 collectively includes a structure including a plurality of second grid patterns 130, which are metal grid patterns formed on the first grid pattern 121, as one layer. It is defined as. The second grid pattern 130 has a structure in which the fine protrusion patterns of the metal material are arranged at regular intervals, and in particular, the second grid pattern 130 is a protrusion structure formed on the upper surface of the first grid pattern 121 by a process such as deposition. It may be formed using any one metal selected from aluminum (Al), chromium (Cr), silver (Ag), copper (Cu), nickel (Ni), cobalt (Co), and molybdenum (Mo) or an alloy thereof. Can be. In particular, the method of forming the second lattice pattern may be implemented by a deposition method such as sputtering, chemical vapor deposition, or an evaporator. Here, the period refers to a distance between one lattice pattern (eg, the second lattice pattern) and a neighboring lattice pattern (eg, the second lattice pattern). In particular, the second grid layer is implemented by the second grid pattern 130 made of a metal material, and reflects light to recycle light, thereby performing a function of increasing brightness. In addition, the shape of the cross-section of the second grid pattern 130 may have a variety of structures, such as square, triangle, semi-circular, etc., may have a metal line shape formed on a portion of the substrate patterned in the form of a triangle, square, sine wave, and the like. have. In other words, any one having a long line of metal line lattice having a certain period in one direction regardless of the cross-sectional structure may be used. In this case, the period may be less than half of the wavelength of the light used, and thus the period may be formed in the range of 50 nm to 400 nm, and more preferably in the range of 50 nm to 200 nm. .

In addition, in the preferred embodiment of the present invention can be implemented as 1: (0.5 ~ 1.5) of the ratio of the width and height of the metal grid pattern 130. Furthermore, in the wire grid polarizer according to the present invention, the transmittance may be adjusted according to the height and width of each of the two gratings (first and second grid patterns). If the width of the lattice is wider at the same pitch, the transmittance is lowered and the polarization extinction ratio is increased. In order to ensure maximum polarization efficiency, the polarization characteristic increases as the pitch decreases. As the height of the lattice increases, the polarization characteristic increases, and when the distance between the same lattice and the same lattice height is formed, the polarization characteristic improves as the width of the lattice increases. In this case, it is preferable to adjust the width of the first grid to have a width of (0.2 to 1.5) times the width of the second grid pattern in the present invention. In addition, the width of the first grid pattern or the second grid pattern may be implemented in the range of 25nm ~ 200nm.

Furthermore, in the wire grid polarizer according to the present invention, the transmittance may be adjusted according to the height and width of each of the two gratings (first and second grid patterns). If the width of the lattice is wider at the same pitch, the transmittance is lowered and the polarization extinction ratio is increased. In order to ensure maximum polarization efficiency, the polarization characteristic increases as the pitch decreases. As the height of the lattice increases, the polarization characteristic increases, and when the distance between the same lattice and the same lattice height is formed, the polarization characteristic improves as the width of the lattice increases. In this case, it is preferable to adjust the width of the first grid to have a width of (0.2 to 1.5) times the width of the second grid pattern in the present invention.

2. Embodiment 2-Structure of Optical Pattern

A modified embodiment of the wire grid polarizer according to the present invention in FIG. 2 described above will be described with reference to FIGS. 3 and 4.

Specifically, in the second embodiment, the basic structure is the same as that of FIG. 2, but the optical pattern M is further implemented on the rear surface of the substrate.

The optical pattern is formed on a transparent substrate, and may be formed by regularly or irregularly arranging various patterns such as a lenticular lens pattern, a microlens pattern, a prism pattern, a circular shape, a hemispherical shape, an oval shape, and a spherical bead. For example, FIG. 3 illustrates a structure in which a microlens array pattern is implemented on an upper surface of a substrate, and FIG. 4 illustrates a structure in which a prism pattern is implemented on an upper surface of a substrate. Of course, it is also possible to implement as a separate structure by attaching an optical sheet or a prism sheet in which the micropattern is implemented on the upper surface of the protective layer.

In addition to the shape of the optical pattern, technical materials such as materials, numerical limitations, and periods of the first and second grid patterns described with reference to FIG. 2 may be applied to the second embodiment.

The optical pattern forming structure may be implemented directly on the back surface of the substrate, or may be laminated with a polymer layer having a separate optical pattern.

That is, the optical layer is formed on the opposite surface of the substrate on which the second grid layer 120 is formed to reduce the optical loss when the light is incident, thereby increasing the amount of light transmitted to achieve stable color coordinates. It becomes possible.

In this case, the polymer layer formed on the opposite surface on which the second grid pattern 130 of the substrate 110 is formed is preferably an optical pattern 141 implemented as a plurality of nano-size nanopatterns. The polymer layer may be a UV resin or a thermosetting resin, but is not necessarily limited thereto, and of course, a polymer resin having good light transmittance may be applied. The optical pattern formed on the surface of the polymer layer 140 may have a protrusion pattern protruding from the surface of the polymer layer uniformly or non-uniformly, such a protrusion pattern may be implemented in the range of 10nm ~ 200nm width. have. The optical pattern may have various shapes having a three-dimensional structure as a protruding pattern. For example, the shape of the vertical cross-section such as a cone, a cylinder, a prism, and a grating may be rectangular, triangular, or the like. It may have various structures such as semicircular.

In addition, the optical pattern may be formed by pressing using a mold in which the pattern is formed when the polymer layer is formed on the substrate. In addition, the polymer layer according to the present invention may be more preferably formed of a material having a lower refractive index than the substrate. Through this, the critical angle of the incident light is increased to reduce the surface reflection of the incident surface, thereby improving the transmittance. Also, the presence of the nanoscale optical pattern on the incident surface of the light increases the incident area of the light, thereby improving the transmittance. It becomes possible. In addition, the presence of the polymer layer may be implemented to increase the scratch resistance of the substrate in parallel with the function of the protective film on the substrate 110.

3. Third Implementation

It is also possible to implement a wire grid polarizer having a structure different from the above-described embodiment.

Referring to FIG. 5, the basic structure in which the first grid layer 120 and the second grid pattern 130 are provided on the substrate 110 according to the present invention is the same as that shown in FIG. 2, but the polarizing film ( P is bonded to the back surface of the substrate 110 instead of forming the structure on the second lattice pattern 130, and is different in that a protective layer R is formed on the second lattice pattern 130. . Except for the arrangement of the protective layer (R) and the polarizing film (P), the technical configuration such as the material, numerical limitation, and period of the first and second lattice patterns described in FIG. 2 may be applied to the second embodiment. Of course.

This structure protects the second grid pattern 130, which is a metal grid pattern, and simultaneously provides a polarizing film-integrated wire grid polarizer, thereby reducing the thickness and realizing the insulating first grid pattern and the metal grid pattern thereon. By controlling the transmittance of each wavelength according to the light angle of the incident light as described above it is possible to implement the advantage of minimizing the color change rate according to the observation angle.

4. Fourth implementation

Referring to Figures 6 and 7, another embodiment according to the present invention will be described.

The fourth embodiment has the same structure as that shown in FIG. 5, but the difference is that the optical pattern M is implemented on the upper surface of the protective layer R. FIG. The shape and arrangement of the optical pattern M may be formed in the same shape, material, and arrangement as those described in the second embodiment. For example, FIG. 6 illustrates a structure in which a microlens array pattern is implemented on an upper surface of the protective layer R, and FIG. 7 illustrates a structure in which a prism pattern is implemented on an upper surface of the protective layer R. Referring to FIG. Of course, it is also possible to implement as a separate structure by attaching an optical sheet or a prism sheet in which the micropattern is implemented on the upper surface of the protective layer.

Furthermore, it is of course possible to form a polymer layer having a separate optical pattern. That is, the protrusion pattern may be uniformly or non-uniformly arranged on the surface of the polymer layer, and the protrusion pattern may be realized in the range of 10 nm to 200 nm, and the cone, cylinder, prism, grating, etc. The shape of the vertical cross section may have various structures such as square, triangle, semicircle, and the like as described above in the second embodiment.

5. Fifth Implementation

Hereinafter, another embodiment in which the structure of the wire grid polarizer according to the present invention is modified will be described. Of course, the method of implementing the attachment structure or the optical pattern of the polarizing sheet is the same, but the structure in which the first lattice layer 120 and the second lattice pattern 130 are implemented on the substrate 110 is the same, and the additional deformation This section focuses on the parts that are imported.

(1) Formation structure of blackening process layer

The first lattice layer 120 and the second lattice pattern 130 are implemented on the substrate 110, and have a structure for implementing a blackening layer formed on part or all of the second lattice pattern 130. Can be. Such a blackening layer can significantly reduce the surface re-reflection of the light flowing from the outside to enhance the contrast ratio, and can improve the readability. Of course, the wire grid polarizer having such a structure can be applied to FIGS. 2 to 7.

The blackening layer may be implemented by basically blackening a part or all of the second grid pattern 130 with an organic material or an inorganic material. That is, the blackening treatment in the preferred embodiment of the present invention means forming a cover film having a structure covering the surface of the second grid pattern 130 by using an organic material or an inorganic material, and more preferably as a blackening treatment layer. This allows the surface reflectivity of the substrate to be realized at 40% or less.

As the organic material capable of performing the blackening treatment, a material containing chromium oxide or carbon may be used, and the inorganic material may be performed by an oxidation treatment process for copper. That is, in the case of inorganic materials, after copper is deposited on the metal lattice pattern described above, copper is etched to form only part or all of the copper on the metal lattice pattern, and then wet or dry metal oxidation (blackening) to blacken copper. It may be carried out in a process of advancing the process. Alternatively, the blackening layer may be formed by depositing chromium on the metal lattice pattern and etching to form part or all of the metal lattice pattern as described above.

(2) Formation of protective layer

Referring to FIG. 8, the surface treatment layer 140 formed on the first grid pattern 110 or the second grid pattern 120 in the structure of FIGS. 2 to 7 constituting the wire grid polarizer according to the present invention. It can also be implemented as an example of forming). Of course, the technical gist of forming the optical pattern on the protective layer and the protective layer or the formation structure of the polarizing film or the optical pattern attached to the substrate in each of the drawings can be applied.

The surface treatment layer 140 may be formed on the first lattice pattern or the second lattice pattern, and the surface treatment layer may include an atmospheric pressure plasma treatment, a vacuum plasma treatment, a hydrogen peroxide solution treatment, and an oxidation accelerator to improve durability and strength. The surface treatment may be performed by any one method of treatment, corrosion inhibitor treatment, and self-assembly monolayer coating (SAM coating).

Particularly, in the case of forming a surface treatment layer including the entirety of the second grid pattern 130 and the close contact portion of the first grid pattern 121 and the second grid pattern, the deformation of the lattice pattern may be caused. By providing an oxide film or a similar surface treatment film to improve the durability without the optical properties, it is possible to implement the physical properties to improve the adhesion between the second grid pattern and the polymer layer of the first grid pattern.

(3) Implementation of multilayer structure of light absorbing layer

As shown in FIG. 9, the wire grid polarizer according to the present invention has a first lattice layer 120 having the at least one first lattice pattern 121 on the substrate 110 and the first lattice pattern ( A second lattice layer having at least one second lattice pattern 130 formed of a metallic material on the upper part of the upper part 121), and a light absorbing layer A laminated on the second lattice layer to absorb light introduced from the outside; It is also possible to implement in a structure comprising a. Of course, the technical gist of forming the optical pattern on the protective structure and the protective layer or the protective layer and the protective layer of the polarizing film or optical pattern attached to the substrate in Figures 2 to 7 can be applied.

The second grid pattern 121 is made of a metal material is made of a metal material with a high reflectance, so that the light can be recycled by increasing the reflection efficiency of the light, the light absorption layer (Q) to receive light from the outside By performing the function of absorbing it is possible to implement the brightness enhancement.

Light absorbing layer (Q) is implemented on the second grid pattern to perform the function of absorbing light from the outside, its structure can be implemented in a variety of shapes. As shown in FIG. 5, the light absorption layer Q is disposed on the first absorption grid pattern 140 and the first absorption grid pattern 140 formed on the second grid pattern 130. It may be formed of a laminated structure of the third grid pattern 150 of the metal material to be formed, and the second absorption grid pattern 160 formed on the third grid pattern. This can absorb the light from the outside. In particular, the first and second absorption type grating patterns may be formed using transparent metal oxides such as SiO ₂ , MgO ₂ , CeO ₂ , ZrO ₂ , ZnO, ITO, and the like to improve light absorption efficiency. The grid pattern 150 may be provided as a metal material. The third grid pattern 150 is any one metal selected from aluminum (Al), chromium (Cr), silver (Ag), copper (Cu), nickel (Ni), cobalt (Co), and molybdenum (Mo). Or it can form using these alloys. In this case, the thickness h1 of the first absorption grating pattern 140 is 50 nm to 300 nm, and the thickness of the third lattice pattern 150 is 1 nm to 20 nm, and the second absorption grating pattern 160 is It can be implemented with a thickness (h2) in the range of 50nm ~ 500nm.

Of course, the formation structure of the light absorbing layer can be modified to various structures as shown in Figure 10 to 14.

For example, as shown in FIG. 9, not the pattern structure formed on the second grid pattern 130, but the second absorption grating layer 170 having a structure implementing one layer as shown in FIG. 10. It can be formed into a structure having a structure). Such a structure is formed by depositing a structure covering the entire second lattice layer instead of the second absorptive lattice pattern 140 described above, and the second absorptive lattice layer 170 absorbs light. In addition to the ability to do this, the advantages of simultaneously implementing the protective layer of the entire wire grid polarizer will be implemented.

Alternatively, as shown in FIGS. 11 and 12, the structure of the wire grid polarizer of FIG. 9 may further include a functional film 180 on the second absorption type lattice pattern 160, or as illustrated in FIG. 12. As shown in FIG. 10, the second film may further include a functional film 180 on the second absorption type grating layer 170 of the wire grid polarizer.

The functional film 180 is disposed on the light absorbing layer (Q) according to the present invention to implement a viewing angle compensation or a special color coordinate stability, for this purpose, the compensation film (COP, TAC, PC substrate) through a lamination method It can be formed.

Alternatively, the wire grid polarizer having the structure shown in FIGS. 13 and 14 may be implemented.

Referring to FIG. 13, this is a first grid layer 120 having at least one first grid pattern 121 on a substrate 110, and an absorption type grid pattern formed on the first grid pattern 121. Light absorbing layer (Q) having a structure is implemented, it may be implemented in a structure including a second grid layer 130 having at least one or more second grid pattern formed of a metal material on the light absorbing layer (Q). . That is, the structure of the second lattice layer 130 in FIG. 9 or FIG. 10 may be modified to a structure in which it is disposed at the top.

The light absorbing layer Q is formed of a first lattice pattern 140 formed on the first lattice pattern 121 and a third lattice of metal material formed on the first absorptive lattice pattern 140. The pattern 150 and the second absorption grid pattern 160 formed on the third grid pattern may be formed in a stacked structure. This can absorb the light from the outside. In particular, the first and second absorption type grating patterns may be formed using a transparent metal oxide such as SiO _2, and the third grid pattern 150 may be formed of a metal material to improve light absorption efficiency. .

That is, the third grid pattern 150 is any one selected from aluminum (Al), chromium (Cr), silver (Ag), copper (Cu), nickel (Ni), cobalt (Co), and molybdenum (Mo). It can be formed using a metal or an alloy thereof. In this case, the thickness of the first absorption grating pattern 140 is 50 nm to 300 nm, the thickness of the third lattice pattern 150 is 1 nm to 20 nm, and the second absorption grating pattern 160 is 50 nm to 500 nm. It can be implemented in the thickness of the range as described above, and other configurations, such as the adjustment of the standard of the first grid pattern and the second grid pattern can be applied to the same materials and standards as described in FIG.

FIG. 14 may protect the second grid pattern 130, which is a metal pattern, by forming a protective layer formed of an oxide layer or a polymer resin on the second grid pattern 130 in the structure of FIG. 13. .

6. Application Example to Liquid Crystal Display

15 illustrates a structure of a liquid crystal display device including a wire grid polarizer according to the present invention.

Referring to the drawings, a backlight unit (B) emitting from the light source and a liquid crystal panel (A) stacked on top of the backlight unit to form a pixel, the liquid crystal panel (A) In the bottom of the) is arranged the wire grid polarizer 100 described in Figures 2 to 7 according to the present invention,

The light absorbing polarizer 5 may be disposed on the upper glass substrate 8.

In the liquid crystal panel A, the TFT array 6 including ITO may be disposed on the lower glass substrate 8. The color filter 7 and the liquid crystal LC may be disposed below the upper glass substrate 8.

In addition, the backlight unit B disposed below the liquid crystal panel A may include a light guide plate or a diffuser plate 2 that guides the light source L upwards, and various optical sheets 4 and reflector plates 1. The structure of a general backlight unit including may be implemented.

In the foregoing detailed description of the present invention, specific examples have been described. However, various modifications are possible within the scope of the present invention. The technical idea of the present invention should not be limited to the embodiments of the present invention but should be determined by the equivalents of the claims and the claims.

1: reflective sheet 2: light guide plate
3: diffuser plate 4: optical sheet
5, P: polarizing film 6: TFT array
7: color filter 8, 9: glass substrate
100: wire grid polarizer
110: lower substrate
120: first lattice layer
121: first grid pattern
130: second grid pattern
140: protective layer, blackening layer, surface treatment layer, polymer material layer, the first absorption grating pattern
150: third grid pattern
160: second absorption grating pattern
170: second absorption grating layer
180: functional film
190: protective film
R: protective layer
M: optical pattern

Claims (20)

delete delete delete A first grid layer having at least one first grid pattern on the substrate;
A second grid layer having at least one second grid pattern formed of a metal material on the first grid pattern;
A polarizing film laminated on a rear surface of the substrate;
A protective layer stacked on the second grid layer;
An optical pattern formed on the protective layer; / RTI >
The wire grid polarizer having a surface treatment layer or a blackening treatment layer formed on the entire surface of the second grid pattern.
delete The method of claim 4,
The optical pattern,
Wire grid polarizer consisting of a regular or irregular arrangement of protruding patterns.
The method according to claim 4 or 6,
The first grid layer is a wire grid polarizer formed of the same polymer material as the refractive index of the substrate.
The method of claim 7,
The second grid pattern is,
Wire grid polarizer formed of any one metal selected from aluminum, chromium, silver, copper, nickel, cobalt or alloys thereof.
The method of claim 7,
A wire grid polarizer in which a ratio of width and height of the first grid pattern satisfies 1: (0.2 to 5).
The method according to claim 9,
The ratio of the width of the first grid pattern to the width of the second grid pattern is 1: (0.2 ~ 1.5) wire grid polarizer.
The method according to claim 9,
A wire grid polarizer satisfying a range of 10 nm to 200 nm and a height of 10 nm to 500 nm of the first grid pattern.
The method of claim 11,
The width of the second grid pattern is a wire grid polarizer 2nm ~ 300nm.
The method according to claim 9,
The period of the first grid pattern is a wire grid polarizer of 100nm ~ 250nm.
delete delete The method of claim 7,
The wire grid polarizer,
A light absorbing layer stacked on the second grid layer to absorb light introduced from the outside;
The wire grid polarizer further comprises.
18. The method of claim 16,
The light absorption layer,
A first absorption grid pattern formed on the second grid pattern; and
A third grid pattern of metal material formed on the first absorption grid pattern;
A second absorption grating pattern formed on the third grating pattern;
Wire grid polarizer having a structure comprising a.
18. The method of claim 16,
The light absorption layer,
A first absorption grid pattern formed on the second grid pattern; and
A third grid pattern of metal material formed on the first absorption grid pattern;
A second absorption grating layer formed on the third grid pattern;
Wire grid polarizer having a structure having a.
18. The method of claim 16,
The wire grid polarizer,
A first grid layer having at least one first grid pattern on the substrate;
A light absorption layer having an absorption type grid pattern formed on the first grid pattern;
And a second lattice layer having at least one second lattice pattern formed of a metal material on the upper portion of the absorption type lattice pattern.
A backlight unit emitting upward from the light source;
A liquid crystal panel stacked on the backlight unit to form a pixel;
The wire grid polarizer of claim 4 or 6, which is disposed above or below the liquid crystal panel.

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