WO2010104265A3 - 결점 검사를 위한 검사장치 - Google Patents

결점 검사를 위한 검사장치 Download PDF

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Publication number
WO2010104265A3
WO2010104265A3 PCT/KR2009/007560 KR2009007560W WO2010104265A3 WO 2010104265 A3 WO2010104265 A3 WO 2010104265A3 KR 2009007560 W KR2009007560 W KR 2009007560W WO 2010104265 A3 WO2010104265 A3 WO 2010104265A3
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WO
WIPO (PCT)
Prior art keywords
inspection
light
changes
field
density gradient
Prior art date
Application number
PCT/KR2009/007560
Other languages
English (en)
French (fr)
Other versions
WO2010104265A2 (ko
Inventor
이제선
장기수
Original Assignee
주식회사 쓰리비 시스템
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 쓰리비 시스템 filed Critical 주식회사 쓰리비 시스템
Priority to JP2011553931A priority Critical patent/JP2012519866A/ja
Priority to US13/255,751 priority patent/US20110317156A1/en
Priority to EP09841578A priority patent/EP2426457A2/en
Priority to CN2009801580919A priority patent/CN102348955A/zh
Publication of WO2010104265A2 publication Critical patent/WO2010104265A2/ko
Publication of WO2010104265A3 publication Critical patent/WO2010104265A3/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/024—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by means of diode-array scanning
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00—Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/02—Measuring arrangements characterised by the use of mechanical techniques for measuring length, width or thickness
    • G01B5/025—Measuring of circumference; Measuring length of ring-shaped articles
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/50—Optics for phase object visualisation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

본 발명은 재귀 반사판을 볼록렌즈 또는 오목거울처럼 사용하여 투명 또는 반사체로 이루어진 피검체가 굴곡지거나 피검체가 이동 중에 진동이 발생하는 경우에도 안정적으로 결점을 검출할 수 있도록 하며, 검사영역에서 일어나는 투과검사시의 밀도 구배와 반사검사시의 반사각도의 변화를 이용하여 측정영역을 통과하거나 반사하는 평행광의 변위현상을 포착하는 검사방법이다. 또한, 본 발명은 투과광 또는 반사광이 모이는 카메라 렌즈 전면에 나이프 에지(knife edge)를 광축에 수평으로 설치하여 평행 광으로부터 벗어난 광을 차단함으로써 카메라에는 검사영역의 밀도구배에 기인하는 광의 명암의 변화로 얻어져 3차원 결점영상으로 얻을 수 있도록 하는 결점검사를 위한 검사장치이다.
PCT/KR2009/007560 2009-03-09 2009-12-17 결점 검사를 위한 검사장치 WO2010104265A2 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011553931A JP2012519866A (ja) 2009-03-09 2009-12-17 欠点検査のための検査装置
US13/255,751 US20110317156A1 (en) 2009-03-09 2009-12-17 Inspection device for defect inspection
EP09841578A EP2426457A2 (en) 2009-03-09 2009-12-17 Inspection device for defect inspection
CN2009801580919A CN102348955A (zh) 2009-03-09 2009-12-17 用于缺陷检测的检测设备

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0019652 2009-03-09
KR1020090019652A KR101114362B1 (ko) 2009-03-09 2009-03-09 결점검사를 위한 검사장치

Publications (2)

Publication Number Publication Date
WO2010104265A2 WO2010104265A2 (ko) 2010-09-16
WO2010104265A3 true WO2010104265A3 (ko) 2010-10-28

Family

ID=42728903

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/007560 WO2010104265A2 (ko) 2009-03-09 2009-12-17 결점 검사를 위한 검사장치

Country Status (6)

Country Link
US (1) US20110317156A1 (ko)
EP (1) EP2426457A2 (ko)
JP (1) JP2012519866A (ko)
KR (1) KR101114362B1 (ko)
CN (1) CN102348955A (ko)
WO (1) WO2010104265A2 (ko)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130242083A1 (en) * 2010-10-08 2013-09-19 Timothy A. Potts Retro-reflective imaging
KR101272902B1 (ko) * 2012-04-05 2013-06-11 단국대학교 산학협력단 엑스선 위상차 영상 장치
KR101316052B1 (ko) * 2012-04-05 2013-10-11 단국대학교 산학협력단 엑스선 위상차 영상 획득 방법
KR101913311B1 (ko) * 2012-04-09 2019-01-15 삼성디스플레이 주식회사 실리콘 박막 측정 방법, 실리콘 박막 결함 검출 방법, 및 실리콘 박막 결함 검출 장치
US9217714B2 (en) * 2012-12-06 2015-12-22 Seagate Technology Llc Reflective surfaces for surface features of an article
WO2014112653A1 (ja) * 2013-01-16 2014-07-24 住友化学株式会社 画像生成装置、欠陥検査装置および欠陥検査方法
KR20160004099A (ko) * 2014-07-02 2016-01-12 한화테크윈 주식회사 결함 검사 장치
KR101555153B1 (ko) * 2014-09-03 2015-10-06 한국기초과학지원연구원 온도 분포 측정 장치 및 방법
KR20220103201A (ko) * 2014-12-05 2022-07-21 케이엘에이 코포레이션 워크 피스들에서의 결함 검출을 위한 장치, 방법 및 컴퓨터 프로그램 제품
US9885656B2 (en) 2014-12-17 2018-02-06 Kla-Tencor Corporation Line scan knife edge height sensor for semiconductor inspection and metrology
JP5943366B1 (ja) * 2015-08-28 2016-07-05 株式会社サタケ 光学ユニットを備えた装置
US11493454B2 (en) * 2015-11-13 2022-11-08 Cognex Corporation System and method for detecting defects on a specular surface with a vision system
CN105486700B (zh) * 2016-02-01 2022-01-11 许迪 一种检测透明物体缺陷的系统及其使用方法
JP6765327B2 (ja) * 2017-03-15 2020-10-07 Ｊｆｅスチール株式会社 放射温度測定装置及び放射温度測定方法
CN107941823A (zh) * 2017-11-23 2018-04-20 苏州艺力鼎丰智能技术有限公司 一种碳纤维汽车零部件表面印刷体缺陷智能检测方法
JP7104433B2 (ja) * 2020-11-04 2022-07-21 株式会社ヒューテック 欠陥検査装置
CN112683186B (zh) * 2020-11-25 2022-03-01 浙江大学 一种物理模型试验三维变形非接触式高频监测装置
WO2023018919A1 (en) * 2021-08-11 2023-02-16 Bedrock Surgical, Inc Methods for monitoring and tracking sterile processing of surgical instruments

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05259031A (ja) * 1992-03-12 1993-10-08 Nikon Corp 傾き検出装置
JPH07107346A (ja) * 1993-09-29 1995-04-21 New Kurieishiyon:Kk 検査装置
JPH11118668A (ja) * 1997-10-16 1999-04-30 Sumitomo Chem Co Ltd 物体の欠陥の検査方法および検査装置
JP2005316436A (ja) * 2004-03-31 2005-11-10 Topcon Corp 眼鏡レンズへの自動装着装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3734626A (en) * 1972-01-14 1973-05-22 Control Data Corp Light apparatus for testing surfaces
US3815998A (en) * 1972-10-30 1974-06-11 Ibm Surface contrast system and method
US4207467A (en) * 1978-09-05 1980-06-10 Laser Precision Corp. Film measuring apparatus and method
US4547073A (en) * 1981-02-17 1985-10-15 Matsushita Electric Industrial Co., Ltd. Surface examining apparatus and method
JPS586127A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd フオトマスク欠陥修正方法とその装置
US4455086A (en) * 1982-02-09 1984-06-19 Sira Institute Limited Optical test apparatus for examining an object
US4863268A (en) * 1984-02-14 1989-09-05 Diffracto Ltd. Diffractosight improvements
US4784485A (en) * 1984-11-29 1988-11-15 Unisearch Limited Contact lens zonometer
DE69421844T2 (de) * 1993-04-23 2000-06-29 Japan Res Dev Corp Verfahren zur Kontrolle der Schichtdicke und/oder des Brechungsindexes
JP2002022415A (ja) * 2000-05-01 2002-01-23 Hitachi Electronics Eng Co Ltd 微小突起物検査装置
JP3762952B2 (ja) * 2002-09-04 2006-04-05 レーザーテック株式会社 光学装置並びにそれを用いた画像測定装置及び検査装置
JP2004279079A (ja) * 2003-03-13 2004-10-07 Frontier System:Kk 樹脂チューブフィルムの印刷不良検査装置
JP2004309137A (ja) * 2003-04-01 2004-11-04 Tosoh Corp 石英ガラス材内部の欠陥検査方法および欠陥検査装置
JPWO2005040775A1 (ja) * 2003-10-27 2007-04-19 株式会社ソニー・ディスクアンドデジタルソリューションズ 外観検査装置
CN100543519C (zh) * 2004-03-31 2009-09-23 株式会社拓普康 夹具安装装置
JP2006258778A (ja) * 2005-03-15 2006-09-28 Nippon Electro Sensari Device Kk 表面欠陥検査方法および表面欠陥検査装置
IL174713A0 (en) * 2006-04-02 2007-05-15 Abraham Aharoni System and method for optical sensing of surface motions
US7595893B2 (en) * 2006-09-20 2009-09-29 Mitutoyo Corporation Shape measurement method and shape measurement apparatus
JP2008157788A (ja) * 2006-12-25 2008-07-10 Nippon Steel Corp 表面検査方法及び表面検査装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05259031A (ja) * 1992-03-12 1993-10-08 Nikon Corp 傾き検出装置
JPH07107346A (ja) * 1993-09-29 1995-04-21 New Kurieishiyon:Kk 検査装置
JPH11118668A (ja) * 1997-10-16 1999-04-30 Sumitomo Chem Co Ltd 物体の欠陥の検査方法および検査装置
JP2005316436A (ja) * 2004-03-31 2005-11-10 Topcon Corp 眼鏡レンズへの自動装着装置

Also Published As

Publication number Publication date
KR101114362B1 (ko) 2012-02-14
CN102348955A (zh) 2012-02-08
EP2426457A2 (en) 2012-03-07
JP2012519866A (ja) 2012-08-30
US20110317156A1 (en) 2011-12-29
WO2010104265A2 (ko) 2010-09-16
KR20100101259A (ko) 2010-09-17

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