WO2010082241A1 - 有機el素子およびその製造方法 - Google Patents
有機el素子およびその製造方法 Download PDFInfo
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- WO2010082241A1 WO2010082241A1 PCT/JP2009/003913 JP2009003913W WO2010082241A1 WO 2010082241 A1 WO2010082241 A1 WO 2010082241A1 JP 2009003913 W JP2009003913 W JP 2009003913W WO 2010082241 A1 WO2010082241 A1 WO 2010082241A1
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- Prior art keywords
- organic
- electrode
- substrate
- layer
- conductive member
- Prior art date
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- 238000000034 method Methods 0.000 title claims description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- 239000000758 substrate Substances 0.000 claims abstract description 117
- 239000010410 layer Substances 0.000 claims abstract description 90
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- 239000012044 organic layer Substances 0.000 claims abstract description 52
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- 229910052751 metal Inorganic materials 0.000 claims description 26
- 229910052782 aluminium Inorganic materials 0.000 claims description 22
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 21
- 239000011575 calcium Substances 0.000 claims description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 18
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 16
- 239000011777 magnesium Substances 0.000 claims description 15
- 239000010931 gold Substances 0.000 claims description 12
- 229910052791 calcium Inorganic materials 0.000 claims description 11
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 10
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 10
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 10
- 229910052744 lithium Inorganic materials 0.000 claims description 10
- 229910052749 magnesium Inorganic materials 0.000 claims description 10
- 229910052709 silver Inorganic materials 0.000 claims description 10
- 239000011734 sodium Substances 0.000 claims description 10
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 8
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- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
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- 239000000126 substance Substances 0.000 description 1
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- 229910001887 tin oxide Inorganic materials 0.000 description 1
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- 150000003852 triazoles Chemical class 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 150000001651 triphenylamine derivatives Chemical class 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/87—Arrangements for heating or cooling
Definitions
- the present invention relates to an organic electroluminescence element (organic electroluminescence element: hereinafter referred to as “organic EL element”) and a method for producing the same.
- organic electroluminescence element hereinafter referred to as “organic EL element”
- organic EL display devices have attracted attention as next-generation flat panel display devices.
- This organic EL display device is a self-luminous display device, has excellent viewing angle characteristics, high visibility, low power consumption, and can be reduced in thickness, so that demand is increasing.
- the organic EL display device includes a plurality of organic EL elements arranged in a predetermined arrangement, and each of the plurality of organic EL elements includes an anode that is a first electrode formed on an insulating substrate, and a first electrode.
- the organic layer which has the light emitting layer formed on the electrode, and the cathode which is the 2nd electrode formed on the organic layer are provided.
- a vacuum deposition method is known as a method for forming an organic EL thin film used in the organic EL display device on a substrate.
- this vacuum vapor deposition method first, under vacuum, the substrate is placed in a horizontal state with the surface to be deposited on the lower side, and a metal mask is brought into close contact with the substrate surface.
- an organic EL thin film having a predetermined pattern is formed on the surface of the substrate by evaporating an evaporation material (that is, an organic EL material) from the evaporation source provided below the substrate surface through a mask opening in which the predetermined pattern is formed. I am letting.
- an evaporation material that is, an organic EL material
- a method of manufacturing an organic EL element has been proposed in order to prevent a crosstalk phenomenon caused by a leak current and prevent a deterioration in display quality. More specifically, when an organic EL thin film is formed on a substrate, a substrate temperature control device comprising a temperature sensor for controlling the temperature of the film formation side surface of the substrate and a heat release / absorber is provided. A method for manufacturing an organic EL element using a vacuum deposition apparatus is disclosed. In this method for manufacturing an organic EL element, the substrate temperature is controlled to 70 ° C. or lower using a vacuum vapor deposition apparatus, and the absolute value of the temperature change rate is controlled within 1.5 ° C./sec. Further, it is described that an organic EL element having excellent rectifying characteristics can be manufactured by such a method, and a display panel with high display quality without crosstalk can be manufactured (for example, see Patent Document 1).
- the present invention has been made in view of the above-described problems, and an organic EL element and a method for manufacturing the same that can reduce driving voltage and increase luminous efficiency.
- the purpose is to provide.
- an organic EL device of the present invention includes a substrate, a first electrode formed on the substrate, an organic layer formed on the first electrode and having a light emitting layer, and an organic layer. And a conductive member made of a material having higher thermal conductivity than the substrate and higher electrical conductivity than the substrate, on the surface of the substrate opposite to the first electrode side. Is provided.
- the heat of the substrate is conducted to the conductive member, and the substrate is cooled by the conductive member, so that it is possible to suppress an increase in the temperature of the substrate.
- the second electrode is formed by the vacuum deposition method
- the static electricity held by the substrate is removed by the conductive member, and the static electricity of the substrate is removed by the conductive member. It becomes possible to prevent the influence. Therefore, current can be easily injected from the organic layer to the second electrode, so that the driving voltage of the organic EL element can be lowered and the light emission efficiency of the element can be improved.
- the conductive member is provided on the surface of the substrate, when current is injected from the organic layer to the second electrode, the current density per unit area is reduced and the current is distributed to the second electrode. Will be injected. Accordingly, deterioration due to current is reduced, and as a result, it is possible to extend the life of the organic EL element.
- the material forming the conductive member may have a thermal conductivity of 80 W / m ⁇ K or more and an electric conductivity of 8 ⁇ 10 6 / m ⁇ or more.
- the thermal conductivity and electrical conductivity of the conductive member can be made sufficiently higher than those of the substrate, so that when the second electrode is formed by vacuum deposition, the temperature of the substrate increases. Can be reliably suppressed, and the influence of static electricity can be reliably prevented.
- the material forming the conductive member may be a metal.
- the thermal conductivity and electrical conductivity of the conductive member can be easily improved.
- the metal forming the conductive member is silver, copper, gold, aluminum, calcium, tungsten, magnesium, rhodium, iridium, sodium, molybdenum, ruthenium, zinc, cobalt, cadmium, nickel And at least one selected from the group consisting of osmium, lithium, indium, and iron.
- the conductive member can be formed from an inexpensive and versatile material.
- the organic EL device manufacturing method of the present invention is a method for manufacturing an organic EL device in which a first electrode, an organic layer having a light emitting layer, and a second electrode are formed in this order on a substrate, and the surface of the substrate And a step of forming a conductive member made of a material having a higher thermal conductivity than the substrate and a higher electric conductivity than the substrate, and a surface of the substrate opposite to the side where the conductive member is formed. It includes at least a step of forming an electrode and a step of forming an organic layer on the first electrode and a second electrode on the organic layer by vacuum deposition using a mask.
- the heat of the substrate is conducted to the conductive member, and the substrate is cooled by the conductive member, so that it is possible to suppress an increase in the temperature of the substrate.
- the second electrode is formed by the vacuum deposition method
- the static electricity held by the substrate is removed by the conductive member, and the static electricity of the substrate is removed by the conductive member. It becomes possible to prevent the influence. Therefore, since it becomes easy to inject current from the organic layer to the second electrode, it is possible to provide an organic EL element that can reduce the driving voltage and improve the light emission efficiency of the element. .
- the material forming the conductive member may have a thermal conductivity of 80 W / m ⁇ K or more and an electric conductivity of 8 ⁇ 10 6 / m ⁇ or more.
- the thermal conductivity and electrical conductivity of the conductive member can be made sufficiently higher than those of the substrate, so that when the second electrode is formed by vacuum deposition, the temperature of the substrate increases. Can be reliably suppressed, and the influence of static electricity can be reliably prevented.
- the material forming the conductive member may be a metal.
- the thermal conductivity and electrical conductivity of the conductive member can be easily improved.
- the metal forming the conductive member is silver, copper, gold, aluminum, calcium, tungsten, magnesium, rhodium, iridium, sodium, molybdenum, ruthenium, zinc, cobalt, It may be at least one selected from the group consisting of cadmium, nickel, osmium, lithium, indium, and iron.
- the conductive member can be formed from an inexpensive and versatile material.
- an organic EL element that can reduce the driving voltage and improve the light emission efficiency of the element.
- an organic EL element capable of extending the life.
- FIG. 1 is a cross-sectional view of an organic EL element according to an embodiment of the present invention
- FIG. 2 is a cross-sectional view for explaining a shape of a second electrode in the organic EL element according to an embodiment of the present invention.
- the organic EL element 1 is used for a display such as a mobile phone, a personal digital assistant (PDA), a television, an electronic book, a monitor, an electronic poster clock, an electronic shelf label, and an emergency guide.
- a display such as a mobile phone, a personal digital assistant (PDA), a television, an electronic book, a monitor, an electronic poster clock, an electronic shelf label, and an emergency guide.
- PDA personal digital assistant
- the organic EL display element 1 includes an insulating substrate 3, a first electrode 6 (anode) provided on the surface of the insulating substrate 3, and a surface of the first electrode 6.
- An organic layer 7 provided on the top and a second electrode 8 (cathode) provided on the surface of the organic layer 7 are provided.
- the organic layer 7 is formed on the surface of the hole injection layer 9, the hole transport layer 10 formed on the surface of the hole injection layer 9, and the hole transport layer 10.
- a light emitting layer 11 that emits one of red light, green light, and blue light
- an electron transport layer 12 formed on the surface of the light emitting layer 11, and an electron injection formed on the surface of the electron transport layer 12 Layer 13.
- the organic layer 7 is comprised by laminating
- the hole injection layer 9, the hole transport layer 10, the light emitting layer 11, the electron transport layer 12, and the electron injection layer 13 are not limited to a five-layer laminated structure. , And an electron transport layer / electron injection layer.
- the substrate 3 has a function of ensuring the mechanical durability of the organic EL element 1 and a function of preventing moisture and oxygen from entering the organic EL element 1 from the outside.
- the substrate 3 has, for example, a length of 100 to 3000 mm, a width of 100 to 3000 mm, and a thickness of 0.1 to 2 mm.
- the substrate 3 examples include a glass substrate made of quartz, soda glass, non-alkali glass, a ceramic substrate made of alumina, a plastic substrate made of polyethylene terephthalate, a metal substrate made of aluminum, iron, or the like on one side of SiO 2.
- Examples thereof include a substrate coated with an insulating material such as (silica gel) or an organic insulating material, and a substrate obtained by subjecting the surface of a metal substrate such as aluminum or iron to an insulating treatment by a method such as anodization.
- various wirings for controlling driving of organic EL display and switching elements such as thin film transistors (TFTs) are usually formed.
- the first electrode 6 is made of a conductive material, and has a thickness of 50 to 500 nm, for example.
- the first electrode 6 has a function of injecting holes into the organic layer 7.
- Examples of the material for forming the first electrode 6 include silver (Ag), aluminum (Al), vanadium (V), cobalt (Co), nickel (Ni), tungsten (W), gold (Au), calcium ( Ca), titanium (Ti), yttrium (Y), sodium (Na), Examples thereof include metal materials such as ruthenium (Ru), manganese (Mn), indium (In), magnesium (Mg), lithium (Li), ytterbium (Yb), and lithium fluoride (LiF).
- the first electrode 6 may be, for example, magnesium (Mg) / copper (Cu), magnesium (Mg) / silver (Ag), sodium (Na) / potassium (K), astatine (At) / oxidized astatine (AtO2).
- the first electrode 6 may be formed of a conductive oxide such as tin oxide (SnO), zinc oxide (ZnO), indium tin oxide (ITO), indium zinc oxide (IZO), or the like.
- the first electrode 31 is preferably formed of a material having a large work function from the viewpoint of improving the efficiency of hole injection into the organic layer 7.
- a material having a large work function include gold (Au), nickel (Ni), indium tin oxide (ITO), indium zinc oxide (IZO), and the like.
- the first electrode 6 is formed of a light transmissive or light semi-transmissive material such as ITO. Is preferred.
- the first electrode 6 may be formed of a light reflective material such as aluminum. preferable.
- the 1st electrode 6 may be comprised by the multiple layer in which each was formed with the said electroconductive material.
- the hole injection layer 9 is also called an anode buffer layer, and has a function of bringing the energy levels of the first electrode 6 and the organic layer 7 closer to each other and improving the hole injection efficiency from the first electrode 6 to the light emitting layer 11.
- Examples of the material for forming the hole injection layer 9 include benzine, styrylamine, triphenylamine, porphyrin, triazole, imidazole, oxadiazole, polyarylalkane, phenylenediamine, arylamine, oxazole, anthracene, fluorenone, Examples include hydrazone, stilbene, triphenylene, azatriphenylene, or derivatives thereof, or heterocyclic conjugated monomers, oligomers, or polymers such as polysilane compounds, vinylcarbazole compounds, thiophene compounds, or aniline compounds. .
- the hole injection layer 9 has a thickness of 10 to 300 nm.
- the hole transport layer 10 has a function of improving the hole transport efficiency from the first electrode 6 to the organic layer 7.
- Examples of the material for forming the hole transport layer 10 include porphyrin derivatives, aromatic tertiary amine compounds, styrylamine derivatives, polyvinylcarbazole, poly-p-phenylene vinylene, polysilane, triazole derivatives, oxadiazole derivatives, Imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amine-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, stilbene derivatives, hydrogenated amorphous silicon, hydrogenated Amorphous silicon carbide, zinc sulfide, zinc selenide and the like can be mentioned.
- the hole transport layer 10 has a
- the light emitting layer 11 is a region in which holes and electrons are injected from each of the two electrodes when a voltage is applied by the first electrode 6 and the second electrode 8, and the holes and electrons are recombined.
- the light emitting layer 11 has a function of emitting light by recombining holes injected from the first electrode 6 and electrons injected from the second electrode 34.
- the light emitting layer 11 is formed of a material having high luminous efficiency, and is formed of, for example, an organic material such as a low molecular fluorescent dye, a fluorescent polymer, or a metal complex.
- the light-emitting layer 11 may contain a hole transport material, an electron transport material, an additive (donor, acceptor, etc.), a light-emitting dopant, and the like. These additives may be dispersed and added in a polymer material (binding resin) or an inorganic material. In addition, when the luminescent dopant is added, it is preferable that the dopant is added in the state disperse
- Examples of the luminescent dopant include 4,4′-bis (2,2′-diphenylvinyl) -biphenyl (DPVBi), 4,4′-bis [2- ⁇ 4- (N, N-diphenylamino) Aromatic dimethylidene derivatives such as phenyl ⁇ vinyl] biphenyl (DPAVBi); styryl derivatives; coumarin derivatives such as perylene, iridium complexes, and coumarin 6; lumogen F red, dicyanomethylenepyran, phenoxazone, and porphyrin derivatives. Note that by appropriately selecting the type of dopant, a red light emitting layer that emits red light, a green light emitting layer that emits green light, and a blue light emitting layer that emits blue light are obtained.
- DPVBi 4,4′-bis (2,2′-diphenylvinyl) -biphenyl
- DPAVBi 4,4′-bis [2-
- the electron transport layer 12 is also called a cathode buffer layer and has a function of efficiently moving electrons injected from the second electrode 8 to the light emitting layer 11.
- Examples of the material for forming the electron transport layer 12 include oxadiazole derivatives, triazole derivatives, benzoquinone derivatives, naphthoquinone derivatives, anthraquinone derivatives, tetracyanoanthraquinodimethane derivatives, diphenoquinone derivatives, fluorenone derivatives, silole derivatives, metal oxinoids. Compounds and the like.
- the electron transport layer 12 has a thickness of 10 to 300 nm.
- the electron injection layer 13 has a function of bringing the energy levels of the second electrode 8 and the organic layer 7 closer to each other and improving the electron injection efficiency from the second electrode 8 to the light emitting layer 11.
- a material for forming the electron injection layer 13 calcium (Ca), cerium (Ce), cesium (Cs), rubidium (Rb), strontium (Sr), barium (Ba), magnesium (Mg), lithium (Li A low work function metal having a work function of 4.0 eV or less can be used.
- Ca and Ba are preferably used as materials for forming the electron injection layer 13.
- the electron injection layer 13 has nickel (Ni), osmium (Os), platinum (Pt), palladium (Pd), aluminum (Al), in order to suppress alteration of the low work function metal due to oxygen, water, or the like.
- carbon dioxides such as calcium carbonate (CaCO 3 ) and barium carbonate (BaCO 3 ) are preferably used.
- an organic material having an electron injection property using, for example, an organic material such as CuPc and a low work function metal as a dopant in the metal layer portion. It can also be used.
- This electron injection layer has a thickness of 0.1 to 100 nm.
- the second electrode 8 is made of a conductive material, and has a thickness of 50 to 500 nm, for example.
- the second electrode 8 has a function of injecting electrons into the organic layer 7.
- the second electrode 8 may be formed with a smaller area than the organic layer 7 or may be formed so as to completely cover the organic layer 7.
- Examples of the conductive material of the second electrode 8 include the same materials as those of the first electrode 6.
- the second electrode 8 includes, for example, a stack of a low work function layer formed of a material having a low work function and a metal layer having relatively high chemical durability (for example, Ca / Al, Ce / Al, Cs / Al, Ba / Al, etc.).
- the second electrode 8 is made of an alloy containing a material having a low work function (for example, Ca: Al alloy, Mg: Ag alloy, Li: Al alloy, etc.), a layer made of an alkali metal fluoride and a conductive layer ( For example, LiF / Al, LiF / Ca / Al, BaF2 / Ba / Al, etc.), transparent conductive oxide doped with a material having a low work function (for example, ITO: Cs, IDIXO: Cs, SnO2: Cs, etc.)
- it may be constituted by a laminate of a layer made of a transparent conductive oxide and a layer made of a material having a low work function (for example, Ba / ITO, Ca / IDIXO, Ba / SnO 2, etc.).
- the second electrode 8 is preferably formed of a very thin layer such as Al or Ag, or a light transmissive or light semi-transmissive material such as ITO.
- the second electrode 8 is preferably formed of a light reflective material such as aluminum.
- the second electrode 8 may be composed of a plurality of layers each formed of the conductive material.
- the organic EL element 1 having the above configuration, when the TFT provided on the substrate 3 is turned on, holes (holes) are injected from the first electrode 6 into the organic layer 11 and the second electrode. Electrons are injected from 8 respectively. Then, the holes and electrons recombine in the organic layer 7, and the energy released thereby excites the light emitting material of the light emitting layer 11, and the fluorescence is emitted when the excited light emitting material returns from the excited state to the ground state. And emit phosphorescence. Then, the fluorescence or phosphorescence is emitted to the outside as the light emission of the organic layer 7, and a predetermined image is displayed.
- the first electrode 6 is an anode and the second electrode 8 is a cathode.
- the first electrode 6 is a cathode and the second electrode 8 is an anode. May be.
- electrons are injected from the first electrode 6 into the organic layer 7 and holes are injected from the second electrode 8 into the organic layer 7 so that they recombine, whereby the organic layer 7 emits light and a predetermined image is obtained. Is displayed.
- the surface 3 a of the substrate 3 on the side opposite to the first electrode 6 side has higher thermal conductivity than the substrate 3 and is more electrically conductive than the substrate 3.
- the conductive member 2 made of a material having a high rate is provided.
- the cathode as the second electrode 8 is formed by the vacuum deposition method, the static electricity held by the substrate 3 is removed by the conductive member 2, and the static electricity of the substrate 3 is removed by the conductive member 2, so that the second electrode When forming 8, the influence of static electricity can be prevented. Therefore, current can be easily injected from the organic layer 7 to the second electrode 8, so that the driving voltage of the organic EL element 1 can be lowered and the light emission efficiency can be improved.
- the second electrode 8 is formed by stacking a layer made of an alkali metal fluoride and a conductive layer (for example, LiF / Al), if the conductive member 2 is provided on the surface 3a of the substrate 3, a vacuum is formed.
- the cathode which is the second electrode 8 is formed by the vapor deposition method, the substrate 3 is cooled by the conductive member 2 and the static electricity of the substrate 3 is removed by the conductive member 2 as described above.
- LiF can be formed into a round and large film without being affected by heat or static electricity. Accordingly, since the contact area between the organic layer 7 and LiF is widened, the injection of current (arrow in the figure) from the organic layer 7 to the second electrode 8 is improved. As a result, it becomes possible to reduce the drive voltage of the organic EL element and to increase the luminous efficiency.
- the contact area between the organic layer 7 and LiF is widened. Therefore, when current is injected from the organic layer 7 to the second electrode 8, The current density per unit area decreases, and the current is dispersed and injected into the second electrode. Therefore, deterioration due to current is reduced.
- any material may be used as long as it has higher thermal conductivity than the substrate 3 and higher electrical conductivity than the substrate 3.
- silver electrical conductivity: 63 ⁇ 10 6 / m ⁇ , thermal conductivity: about 429 W / m ⁇ K
- copper electrical conductivity: about 59.6 ⁇ 10 6 / m ⁇ , thermal conductivity: about 401 W / m ⁇ K
- gold thermal conductivity: about 45.2 ⁇ 10 6 / m ⁇
- thermal conductivity about 317 W / m ⁇ K
- aluminum electrical conductivity: about 37.7 ⁇ 10 6 / m ⁇ , heat Conductivity: about 237 W / m ⁇ K
- calcium electrical conductivity: about 29.8 ⁇ 10 6 / m ⁇ , thermal conductivity: about 201 W / m ⁇ K
- tungsten electrical conductivity: about 18.9 ⁇ 10 6 / m ⁇ , thermal conductivity: about 174 W /
- a metal material such as m ⁇ K can be preferably used. These metal materials may be used alone or in combination of two or more.
- the “material having higher thermal conductivity than that of the substrate 3” as used herein means that the thermal conductivity of the substrate 3 is 0.55 W / m ⁇ K to 0.75 W / m ⁇ K. This refers to a material having a thermal conductivity greater than / m ⁇ K.
- a material having a higher electrical conductivity than the substrate 3 means that the substrate 3 has an electrical conductivity of 10 ⁇ 10 / m ⁇ to 10 ⁇ 14 / m ⁇ , and therefore has a thermal conductivity greater than 10 ⁇ 10 / m ⁇ .
- thermal conductivity referred to here refers to that measured in accordance with JIS K6911. This thermal conductivity is also called thermal conductivity.
- Electrical conductivity refers to that measured in accordance with JIS K0130.
- the thermal conductivity is 80 W / m as a material for forming the conductive member 2.
- -It is preferable to use what is K or more and whose electrical conductivity is 8x10 ⁇ 6 > / m (ohm) or more.
- FIG. 7 is a view for explaining particularly the formation of a cathode as a second electrode. It is.
- a surface 3a of the insulating substrate 3 such as a glass substrate having a substrate size of 300 ⁇ 400 mm and a thickness of 0.7 mm opposite to the side on which the first electrode 6 is formed.
- the conductive member 2 made of aluminum was formed by vapor-depositing aluminum having higher thermal conductivity than the substrate 3 and higher electrical conductivity than the substrate 3. At this time, the thickness of the conductive member 2 was 100 nm.
- the first electrode 6 was formed by patterning an ITO film on the surface of the substrate 3 opposite to the side on which the conductive member 2 was formed by sputtering. At this time, the thickness of the first electrode 6 was 150 nm.
- the organic layer 7 including the light emitting layer 11 and the second electrode 8 were formed on the first electrode 6 by a vacuum deposition method using a metal mask.
- an insulating substrate 3 provided with the conductive member 2 and the first electrode 6 was placed in a chamber of a vapor deposition apparatus provided with a vapor deposition source. Note that the inside of the chamber of the vapor deposition apparatus was kept at a vacuum degree of 1 ⁇ 10 ⁇ 5 to 1 ⁇ 10 ⁇ 4 (Pa) by a vacuum pump.
- the insulating substrate 3 provided with the conductive member 2 and the first electrode 6 was installed in a state where two sides were fixed by a pair of substrate receivers attached in the chamber.
- a metal mask 14 was provided, and the four corners of the mask 14 were fixed with a mask receiver in the chamber.
- the mask 16 a mask obtained by laser welding an Invar mask having a thickness of about 40 ⁇ m to an Invar frame having a thickness of about 8 mm was used.
- the deposition materials of the hole injection layer 9, the hole transport layer 10, the light emitting layer 11, the electron transport layer 12, and the electron injection layer 13 are sequentially evaporated from the deposition source 15, By stacking the hole transport layer 10, the light emitting layer 11, the electron transport layer 12, and the electron injection layer 13, the organic layer 7 was formed on the first electrode 6 as shown in FIG. 6.
- a hole injection layer 9 made of m-MTDATA (4,4,4-tris (3-methylphenylphenylamino) triphenylamine) is formed on the first electrode 6 patterned on the insulating substrate 3.
- a hole transport layer 10 made of ⁇ -NPD (4,4-bis (N-1-naphthyl-N-phenylamino) biphenyl) is formed on the hole injection layer 9 through a mask 14 with a thickness of 30 nm. It was formed with a film thickness.
- lithium fluoride (LiF) and aluminum (Al), which are vapor deposition materials for the second electrode 8 are evaporated from the vapor deposition source 15, and the second electrode 8 is stacked via the mask 14, thereby forming FIG.
- the second electrode 8 was formed on the organic layer 7 with a thickness of 10 nm to manufacture the organic EL element 1 shown in FIG.
- an organic EL element as a comparative example was prepared in the same manner as in the above-described example except that the above-described conductive member 2 was not formed on the surface of the substrate.
- the organic EL element 1 produced by the present Example and the organic EL element as a comparative example compared the drive voltage of the element, the luminous efficiency of the element, and the element lifetime.
- the results are shown in Table 1.
- the drive voltage is the voltage value [V]
- the light emission efficiency is the ratio of the luminance of the element to the current density [cd / A]
- the element life is the measurement result of the light emission time [h].
- the driving voltage and the luminous efficiency the luminance was 1000 cd / m 2 and the voltage was gradually increased from 0 to 15 V in increments of 0.2 volts, and the luminous efficiency was calculated from the current and luminance at each voltage value.
- the initial luminance was set to 6000 cd / m 2 and the time until the initial luminance was reduced to half was defined as the element lifetime.
- the driving voltage of the organic EL element 1 can be reduced as compared with the comparative example in which the conductive member 2 is not formed. I understand that I can do it.
- the luminous efficiency is remarkably improved as compared with Comparative Example 1, and the luminous efficiency is extremely good.
- the device life is drastically improved as compared with Comparative Example 1, and the life of the organic EL device 1 can be extended.
- the substrate 3 is cooled by the conductive member 2 when the cathode as the second electrode 8 is formed by the vacuum evaporation method. This is presumably because the static electricity of the substrate 3 was removed by the conductive member 2.
- the roundness in the shape of LiF that forms the cathode as the second electrode 8 is measured with the organic EL element 1 produced in this example and the organic EL element of the comparative example. did.
- the results are shown in Table 2.
- the roundness in the shape of LiF was measured by measuring the load length ratio tp and the load area ratio Rmr (50%).
- the load length ratio tp is defined in JIS B0601-2001 and can be measured with a surface shape measuring microscope or the like.
- the load length ratio tp is expressed by the following formula (1), a predetermined reference length L is extracted from the roughness curve, and the average height and the maximum height of the roughness curve of the extracted portion are obtained, and the average height or more is obtained. And the sum (load length np) of the cut lengths (b 1 , b 2 ,..., B n ) of the portion that is 50% or more of the maximum height and higher than the average height, and the reference length L, The ratio (np / L) is expressed as a percentage.
- the load area ratio Rmr (50%) can be measured with an atomic force microscope such as VN-8000 manufactured by KEYENCE.
- the load area ratio Rmr (50%) is expressed by the following formula (2), a predetermined reference area S is extracted from the roughness curve, and the average height and the maximum height of the roughness curve of the extracted portion are obtained.
- the ratio (np / S) is expressed as a percentage.
- the surface 3a of the substrate 3 opposite to the first electrode 6 side is made of a material having a higher thermal conductivity than the substrate 3 and a higher electrical conductivity than the substrate 3.
- the member 2 is provided. Therefore, when the second electrode 8 is formed by the vacuum deposition method, the heat of the substrate 3 is conducted to the conductive member 2 and the substrate 3 is cooled by the conductive member 2, so that an increase in the temperature of the substrate 3 can be suppressed. It becomes possible. Further, when the second electrode 8 is formed by the vacuum deposition method, the static electricity held by the substrate 3 is removed by the conductive member 2, and the static electricity of the substrate 3 is removed by the conductive member 2, so that the second electrode 8 is formed. In this case, it becomes possible to prevent the influence of static electricity. Therefore, current can be easily injected from the organic layer 7 to the second electrode 8, so that the driving voltage of the organic EL element 1 can be lowered and the light emission efficiency of the element can be improved.
- the thermal conductivity of the material forming the conductive member 2 is set to 80 W / m ⁇ K or more, and the electrical conductivity of the material forming the conductive member 2 is 8 ⁇ 10 6 / m ⁇ .
- the configuration is as described above. Therefore, the thermal conductivity and electrical conductivity of the conductive member 2 can be made sufficiently higher than those of the substrate. Therefore, when the second electrode 8 is formed by the vacuum evaporation method, the temperature of the substrate 3 is increased. In addition to being able to be reliably suppressed, the influence of static electricity can be reliably prevented.
- the material forming the conductive member 2 is a metal. Accordingly, the thermal conductivity and electrical conductivity of the conductive member 2 can be easily improved.
- the metal forming the conductive member 2 is silver, copper, gold, aluminum, calcium, tungsten, magnesium, rhodium, iridium, sodium, molybdenum, ruthenium, zinc, cobalt, cadmium, nickel,
- the structure uses osmium, lithium, indium, and iron. Accordingly, the conductive member 2 can be formed from an inexpensive and versatile material.
- a metal is used as a material for forming the conductive member 2, but a material other than a metal may be used. That is, the material has higher thermal conductivity than the substrate 3 and higher electrical conductivity than the substrate 3, has a thermal conductivity of 80 W / m ⁇ K or more, and an electrical conductivity of 8 ⁇ 10 6 / m ⁇ . Any material may be used as long as it is the above material.
- the conductive member 2 may be formed of a conductive resin.
- the present invention is particularly useful for an organic EL element for forming a second electrode by a vacuum deposition method and a method for manufacturing the same.
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Abstract
Description
ルテニウム(Ru)、マンガン(Mn)、インジウム(In)、マグネシウム(Mg)、リチウム(Li)、イッテルビウム(Yb)、フッ化リチウム(LiF)等の金属材料が挙げられる。また、第1電極6は、例えば、マグネシウム(Mg)/銅(Cu)、マグネシウム(Mg)/銀(Ag)、ナトリウム(Na)/カリウム(K)、アスタチン(At)/酸化アスタチン(AtO2)、リチウム(Li)/アルミニウム(Al)、リチウム(Li)/カルシウム(Ca)/アルミニウム(Al)、フッ化リチウム(LiF)/カルシウム(Ca)/アルミニウム(Al)等の合金で形成されていてもよい。さらに、第1電極6は、酸化スズ(SnO)、酸化亜鉛(ZnO)、インジウムスズ酸化物(ITO)、インジウム亜鉛酸化物(IZO)などの導電性酸化物等で形成されていてもよい。
2 伝導部材
3 基板
6 第1電極
7 有機層
8 第2電極
11 発光層
1 マスク
Claims (8)
- 基板と、
前記基板上に形成された第1電極と、
該第1電極上に形成されるとともに、発光層を有する有機層と、
該有機層上に形成された第2電極と
を備える有機EL素子であって、
前記基板の、前記第1電極側と反対側の表面に、前記基板よりも熱伝導率が高く、かつ前記基板よりも電気伝導率が高い材料からなる伝導部材が設けられていることを特徴とする有機EL素子。 - 前記熱伝導率が80W/m・K以上であり、前記電気伝導率が8×106/mΩ以上であることを特徴とする請求項1に記載の有機EL素子。
- 前記材料が、金属であることを特徴とする請求項1または請求項2に記載の有機EL素子。
- 前記金属が、銀、銅、金、アルミニウム、カルシウム、タングステン、マグネシウム、ロジウム、イリジウム、ナトリウム、モリブデン、ルテニウム、亜鉛、コバルト、カドミウム、ニッケル、オスミウム、リチウム、インジウム、及び鉄からなる群より選ばれる少なくとも1種であることを特徴とする請求項3に記載の有機EL素子。
- 基板上に、第1電極、発光層を有する有機層、及び第2電極がこの順で形成された有機EL素子の製造方法であって、
前記基板の表面に、該基板よりも熱伝導率が高く、かつ該基板よりも電気伝導率が高い材料からなる伝導部材を形成する工程と、
前記基板の、前記伝導部材が形成された側と反対側の表面に、前記第1電極を形成する工程と、
マスクを用いた真空蒸着法により、前記第1電極上に前記有機層を形成するとともに、該有機層上に前記第2電極を形成する工程と
を少なくとも含むことを特徴とする有機EL素子の製造方法。 - 前記熱伝導率が80W/m・K以上であり、前記電気伝導率が8×106/mΩ以上であることを特徴とする請求項5に記載の有機EL素子の製造方法。
- 前記材料が、金属であることを特徴とする請求項5または請求項6に記載の有機EL素子の製造方法。
- 前記金属が、銀、銅、金、アルミニウム、カルシウム、タングステン、マグネシウム、ロジウム、イリジウム、ナトリウム、モリブデン、ルテニウム、亜鉛、コバルト、カドミウム、ニッケル、オスミウム、リチウム、インジウム、及び鉄からなる群より選ばれる少なくとも1種であることを特徴とする請求項7に記載の有機EL素子の製造方法。
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CN104993070A (zh) * | 2015-07-02 | 2015-10-21 | 深圳市华星光电技术有限公司 | 一种制作柔性oled显示器件的方法 |
CN108963088A (zh) * | 2017-12-18 | 2018-12-07 | 广东聚华印刷显示技术有限公司 | 有机发光二极管及其电子注入层和应用 |
US11456208B2 (en) | 2020-08-11 | 2022-09-27 | Micron Technology, Inc. | Methods of forming apparatuses including air gaps between conductive lines and related apparatuses, memory devices, and electronic systems |
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