WO2010069438A1 - Infrarotstrahler-anordnung für hochtemperatur-vakuumprozesse - Google Patents
Infrarotstrahler-anordnung für hochtemperatur-vakuumprozesse Download PDFInfo
- Publication number
- WO2010069438A1 WO2010069438A1 PCT/EP2009/008076 EP2009008076W WO2010069438A1 WO 2010069438 A1 WO2010069438 A1 WO 2010069438A1 EP 2009008076 W EP2009008076 W EP 2009008076W WO 2010069438 A1 WO2010069438 A1 WO 2010069438A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- tube
- infrared radiator
- radiator
- opaque
- radiator according
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000009434 installation Methods 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 208000034656 Contusions Diseases 0.000 claims description 5
- 230000007704 transition Effects 0.000 claims description 5
- 238000005253 cladding Methods 0.000 description 21
- 238000007789 sealing Methods 0.000 description 12
- 239000011521 glass Substances 0.000 description 7
- 230000005855 radiation Effects 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 241000219104 Cucurbitaceae Species 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007511 glassblowing Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 235000020354 squash Nutrition 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01K—ELECTRIC INCANDESCENT LAMPS
- H01K1/00—Details
- H01K1/18—Mountings or supports for the incandescent body
- H01K1/24—Mounts for lamps with connections at opposite ends, e.g. for tubular lamp
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01K—ELECTRIC INCANDESCENT LAMPS
- H01K1/00—Details
- H01K1/58—Cooling arrangements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
- H05B3/0038—Heating devices using lamps for industrial applications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/42—Heating elements having the shape of rods or tubes non-flexible
- H05B3/44—Heating elements having the shape of rods or tubes non-flexible heating conductor arranged within rods or tubes of insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/42—Heating elements having the shape of rods or tubes non-flexible
- H05B3/48—Heating elements having the shape of rods or tubes non-flexible heating conductor embedded in insulating material
Definitions
- the invention relates to an arrangement for infrared radiators with at least one radiator tube.
- infrared radiation elements in vacuum, in vacuum processes with reactive atmospheres, or in corrosive or reactive atmospheres, such as coating processes, chemical vapor deposition, physical vapor deposition, etching in the gas phase, the production of thin-film solar cells in CIS technology, RTP Processes in which a significant amount of heat is to be introduced into a substrate in a very short time and thus a combination of vacuum or an atmosphere of hot corrosive gases with high amounts of heat released and cyclic stress, pose a particular challenge to the components and materials used.
- IR heating elements which consist of the quartz tube type, in which therefore the outer shell of the radiator consists of a tube made of heat-resistant and almost all atmospheres resistant quartz glass, almost all technical hurdles remain. Among other things, these are the corrosion of the electrical supply lines to the radiators when they are carried out in a corrosive atmosphere or in a vacuum.
- Flashovers between the electrical leads to each other or to the chamber wall occur in certain pressure ranges when the leads are made in the chamber.
- radiant heaters in cladding tubes wherein the cladding tubes represent parts of the wall of the process chamber, a heat accumulation problem is quickly generated, which leads to the destruction of the radiator or at least limits the maximum power of the radiator used.
- maximum power is limited both thermally by the heat accumulation in the cladding tube, as well as geometrically by the forced large distances between the cladding tubes.
- EP 1 228 668 B1 describes an arrangement in which at least one infrared radiator is arranged in a cladding tube.
- the cladding tube is sealed against the vacuum chamber and also protects the radiator against the possibly occurring reactive gases in the chamber.
- the disadvantage is that the radiators can quickly overheat and be destroyed in such a cladding tube, since the cladding tube must already have a considerable temperature in order to be able to release heat to the environment via radiation.
- the wall temperature of the radiator is considerably higher than that of a radiator that is directly in vacuum or that of a radiator, which is cooled by convection.
- water is used as coolant, then the problem of the temperature gradient in the cladding tube can be avoided.
- the use of water can only be done in a separate pipe, since the electrical leads should not be carried out lying in the water.
- water which is usually arranged in the gap between the radiator and the cladding tube or at a comparable position, absorbs a minimum of about 50% of the total radiator output.
- water can only be used in cases where the wall temperature of the cladding tube may be low and where the additional heating of the cladding tube is not required for the process.
- flanges directly on the radiator tube are therefore extremely expensive.
- Such flanges must also be movably mounted in the direction of the radiator axis against the chamber wall in order not to convert small thermal expansions into a destructive for the radiator tube tension: Since the thermal expansion of the quartz glass is about an order of magnitude lower than that of the metallic chamber wall, already small Variations in the temperature of the chamber wall lead to destructive tensile stress on quartz glass.
- the object of the invention is therefore to provide an arrangement of infrared radiators in process chambers or vacuum chambers, in which the above-mentioned disadvantages are avoided and a structurally simple solution is provided which also enables a long service life of the radiator.
- the infrared radiator according to the invention comprises at least one radiator tube which has bruises at its respective ends, wherein at least one opaque tube section is welded in alignment with the at least one radiator tube and is located between pinch and radiator tube.
- Such an infrared radiator allows it to be installed directly in a chamber for vacuum processes with reactive atmospheres or in vacuum without an additional cladding tube.
- the infrared radiator according to the invention has opaque tube sections in front of the bruises, which at the same time serve as a vacuum feedthrough against which is sealed.
- the opaque tube sections reduce the radiant power in the tube towards the ends (squeezing) so that the seals can not overheat.
- a radiator guided only on one side into the vacuum chamber twin tube, one-sided Final
- only one side of such an opaque pipe section are used, while in radiators with double-sided electrical connection and vacuum on both sides are required.
- the invention provides that the opaque pipe sections are round outside.
- the opaque pipe sections have at least one bore inside.
- the invention provides that a disk is arranged between the opaque pipe sections and the radiator pipe.
- the disk contains quartz glass.
- the diameter of the two sealing surfaces can additionally be designed differently. During assembly, the first sealing surface still slides easily through the provided for the second seal flange, as it has a slightly smaller diameter.
- FIG. 1 shows a round tube radiator according to the invention
- Figure 2 shows the seal of a round tube emitter according to the invention
- FIGa, 3b, 3c, 3d different variants of the round tube emitter according to the invention.
- the round tube emitter for the use of a vacuum chamber consisting of a central radiator tube 10, which is made of transparent quartz glass.
- the round tube emitter has a diameter of 1, 5 x 14 mm and is about 2 to 5 cm shorter in length than the free width of the vacuum chamber in which it is installed.
- the central radiator tube 10 is in each case an opaque tube section 12, which are recognized, for example by means of a glass lathe frontally aligned can.
- the dimensions of the opaque pipe section 12 are in this case 3 x 16 mm.
- the length of the sections results from the section to be bridged in the chamber of 10 mm to 25 mm and the thickness of the chamber wall including the seal of typically about 50 mm for a simple chamber wall without thermal shields or insulation. So that a typical length of 60 mm to 100 mm occurs.
- the round tube emitter comprises two transparent pipe sections 14, which are also attached by means of a glass lathe axially aligned outside the opaque pipe sections 12.
- the transparent pipe sections 14 have a diameter of 1, 5 x 14 mm, with their length resulting from manufacturing parameters. In these pipe sections 14, the pinch is introduced and depending on the squeezing additional dimensions to be separated after squeezing outside the pinch (not shown here) are needed.
- the round tube emitter thus constructed also has a helix 16 within the emitter tube.
- the coil 16 is contacted with long rods 18 to a molybdenum foil 20, which later squeezed used to carry out the electric current.
- On the rods 18 additional support rings 22 are applied, which support the rod 18 in the tubes 10 and 14.
- a stranded wire 26 can be posted for the power supply to the outside rods 24 after crushing.
- Such a manufactured emitter 1 can then be mounted parallel to other emitters 1, for example in a vacuum chamber.
- the assembly takes place in such a way that the radiators 1 are transversely mounted to the direction in which the substrate is transported.
- the radiators are either sealed on both sides with O-rings or on one side by means of an O-ring and on the other side with a sliding stuffing box.
- On both sides is located in the press ring, a bead which prevents the radiator from slipping out of its sealing position and thus fixes it in the vacuum chamber.
- a radiator distance of 40 mm or even up to 30 mm can thus be achieved in a vacuum chamber. As a result, a larger number of radiators can be easily mounted within the vacuum chamber.
- Figure 2 shows schematically the attachment of such emitters with the seal.
- Another embodiment provides that on a twin pipe with a diameter of 33 x 14 mm and a length resulting from the transverse dimension of the vacuum chamber, on one side an opaque pipe section 12 with a diameter of 5 x 40 mm, aligned by means of a glass lathe becomes.
- the transition from the opaque pipe section 12 the twin pipe can either be freely formed or, in an advantageous embodiment, a flat quartz glass disk can be placed beforehand on the twin pipe, which serves for the transition from the twin pipe to the opaque round pipe and is correspondingly shaped.
- another piece of twin tube 10 with a diameter of 33 ⁇ 14 mm is attached to the other end of the opaque tube section 12. From such a radiator tube, a radiator is manufactured with one-sided connection.
- Such a manufactured spotlight can be mounted in a vacuum chamber, wherein the seal on the opaque pipe section 12 by means of an O-ring and the radiator 1 is mechanically fixed on the opposite side of the chamber, for example by means of a simple fork clamp.
- the distance between the radiator axes is a minimum of approx. 60 mm if all seals are located on one side of the chamber.
- the radiators are introduced alternately on both sides in the chamber, whereby the distance between the axes of the radiator 1 can be reduced to about 35 mm.
- 3a to 3d show various embodiments of the special sealing surfaces, wherein only one tube side is shown. To simplify the figure was on spirals, rods, molybdenum foils, etc., omitted.
- FIG. 3a shows a round tube radiator 1, as already illustrated in FIG. 1 and explained in greater detail.
- An emitter tube 40 has both sides in the finished state squashes 41 and ceramic base 42 and strands 43.
- opaque pipe sections 45 have been welded by means of a glass lathe parallel to the pipes as future sealing surfaces.
- the cross section of the opaque tube section 44 is shown on the radiator tube 40.
- FIG. 3b shows a twin tube radiator, as already explained above.
- opaque tube sections are welded by means of a glass lathe parallel to the tubes 54 as future sealing surfaces.
- either a laser-cut disk of quartz glass is used as transition piece either for the transition from twin pipe 32 to the opaque pipe section 54 on both sides or the opaque pipe 54 is formed by a strong flame directly on the twin pipe 32 out.
- the cross section of the opaque pipe section 54 is shown mounted on the twin tube 32.
- FIG. 3c shows a twin tube radiator with a matched, opaque tube section.
- the emitter tube 50 has crimps 51 on both sides, ceramic sockets 52 and also strands 53.
- opaque tube sections are welded parallel to the tubes 54 by means of a glass lathe as future sealing surfaces. These pipe sections are round on the outside for optimum sealing of the vacuum chamber and inside they have two holes, which are similar to the dimensions of the two channels of the twin pipe. Such an opaque tube piece can be easily cast and sintered, so that only the outer surfaces must be ground. Thus, the opaque pipe section can be attached directly to the twin pipe 55 without complex glass-blowing deformation or without washers. The cross section of the opaque tube section 12 is shown on the twin tube 55.
- FIG. 3d shows a twin tube radiator with a twin tube 60 and an externally placed opaque tube section.
- the emitter tube 60 has crushed portions 61, ceramic bases 62 and strands 63 on both sides in the finished state.
- opaque tube sections are welded parallel to the tubes 64 by means of a glass lathe.
- These pipe sections are now connected at one position annular with the twin tube radiator. Preference is given to using a laser-cut disk of appropriate dimensions made of quartz glass. As a result, only at one position, a pipe section must be used, which provides a certain savings in the production and causes, however, that the diameter of the opaque pipe section is slightly larger. As a result, the radiator distances within the vacuum chamber also become larger.
- the disclosed variants allow, in a particularly simple and elegant manner, the application of an additional reflector made of opaque quartz glass, as described in DE 10 2004 051 846.
- a reflector is particularly well suited for vacuum but has typical thicknesses of 0.5 mm to 1.5 mm.
- a coated emitter can usually no longer be sealed off against the emitter tube, since it no longer fits through the hole provided in the vacuum chamber for receiving the emitter tube.
- the sealing piece (34, 44, 54, 64) should have a slightly larger diameter than the radiator tube. This diameter can be easily adapted to the need for an applied coating, so that the radiator pipe with coating in any case still has a smaller diameter than the sealing piece and so in any case can be easily mounted and replaced.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Resistance Heating (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/140,609 US8436523B2 (en) | 2008-12-19 | 2009-11-13 | Infrared emitter arrangement for high-temperature vacuum processes |
EP09760728A EP2359386A1 (de) | 2008-12-19 | 2009-11-13 | Infrarotstrahler-anordnung für hochtemperatur-vakuumprozesse |
CN200980151902.2A CN102257598B (zh) | 2008-12-19 | 2009-11-13 | 用于高温真空工艺的红外辐射器装置 |
BRPI0923019A BRPI0923019A2 (pt) | 2008-12-19 | 2009-11-13 | disposição de emissor de infravermelho para porcessos a vácuo em alta temperatura |
KR1020117011334A KR101285528B1 (ko) | 2008-12-19 | 2009-11-13 | 고온 진공 공정을 위한 적외선 에미터 장치 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008063677.0 | 2008-12-19 | ||
DE102008063677A DE102008063677B4 (de) | 2008-12-19 | 2008-12-19 | Infrarotstrahler und Verwendung des Infrarotstrahlers in einer Prozesskammer |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2010069438A1 true WO2010069438A1 (de) | 2010-06-24 |
Family
ID=42084614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/008076 WO2010069438A1 (de) | 2008-12-19 | 2009-11-13 | Infrarotstrahler-anordnung für hochtemperatur-vakuumprozesse |
Country Status (7)
Country | Link |
---|---|
US (1) | US8436523B2 (de) |
EP (1) | EP2359386A1 (de) |
KR (1) | KR101285528B1 (de) |
CN (1) | CN102257598B (de) |
BR (1) | BRPI0923019A2 (de) |
DE (1) | DE102008063677B4 (de) |
WO (1) | WO2010069438A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013050158A1 (en) * | 2011-10-06 | 2013-04-11 | Sanofi Pasteur Sa | Heating device for rotary drum freeze-dryer |
WO2017044674A1 (en) * | 2015-09-09 | 2017-03-16 | Watlow Electric Manufacturing Company | High temperature tubular heaters |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011115841A1 (de) | 2010-11-19 | 2012-05-24 | Heraeus Noblelight Gmbh | Bestrahlungsvorrichtung |
DE102010064141A1 (de) | 2010-12-23 | 2012-06-28 | Von Ardenne Anlagentechnik Gmbh | Heizeinrichtung für Substratbehandlungsanlagen und Substratbehandlungsanlage |
DE102011009284B4 (de) | 2011-01-24 | 2014-09-11 | Von Ardenne Gmbh | Elektrische Durchführung in ein Vakuumgehäuse |
DE102012025142A1 (de) | 2012-12-21 | 2014-06-26 | Heraeus Noblelight Gmbh | Infrarotstrahler mit hoher Strahlungsleistung |
JP6217251B2 (ja) * | 2013-09-05 | 2017-10-25 | 岩崎電気株式会社 | ハロゲンランプ |
DE102015102665A1 (de) | 2015-02-25 | 2016-08-25 | Heraeus Noblelight Gmbh | Bestrahlungsvorrichtung zur Einkopplung von Infrarot-Strahlung in eine Vakuum-Prozesskammer mit einem einseitig gesockelten Infrarotstrahler |
USD771219S1 (en) * | 2015-09-15 | 2016-11-08 | Cutting Edge Products, Inc | Electric stun gun having an electric cigarette-shaped mouthpiece |
USD783117S1 (en) * | 2015-09-15 | 2017-04-04 | Cutting Edge Products, Inc. | Electric stun gun |
DE102016111234B4 (de) | 2016-06-20 | 2018-01-25 | Heraeus Noblelight Gmbh | Vorrichtung für die thermische Behandlung eines Substrats sowie Trägerhorde und Substrat-Trägerelement dafür |
US10707067B2 (en) | 2016-09-22 | 2020-07-07 | Heraeus Noblelight Gmbh | Infrared radiating element |
CN108863028A (zh) * | 2017-05-10 | 2018-11-23 | 张忠恕 | 一种新型石英管加工方法 |
US11589966B2 (en) * | 2018-10-29 | 2023-02-28 | Vita Zahnfabrik H. Rauter Gmbh & Co. Kg | Heating element for a dental-ceramic furnace and dental sintering furnace |
US11370213B2 (en) | 2020-10-23 | 2022-06-28 | Darcy Wallace | Apparatus and method for removing paint from a surface |
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GB817908A (en) * | 1956-08-17 | 1959-08-06 | Gen Electric Co Ltd | Improvements in or relating to electrical devices and terminal caps therefor |
US4918355A (en) * | 1985-04-01 | 1990-04-17 | Gte Products Corporation | Electric lamp with protective base |
US5252132A (en) * | 1990-11-22 | 1993-10-12 | Mitsubishi Denki Kabushiki Kaisha | Apparatus for producing semiconductor film |
EP0848575A1 (de) * | 1996-12-04 | 1998-06-17 | Micro C Technologies, Inc. | Heizvorrichtung, Zusammenbau und Verfahren |
US20020148824A1 (en) * | 2001-04-17 | 2002-10-17 | Markus Hauf | Rapid thermal processing system for integrated circuits |
JP2006108526A (ja) * | 2004-10-08 | 2006-04-20 | Ushio Inc | 加熱ユニット |
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JPS59138812A (ja) * | 1983-01-31 | 1984-08-09 | Ngk Spark Plug Co Ltd | セラミツクグロ−プラグ |
DE9401436U1 (de) * | 1994-01-28 | 1994-03-31 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH, 81543 München | Metallhalogenidentladungslampe für Projektionszwecke |
WO2001035699A1 (de) | 1999-11-09 | 2001-05-17 | Centrotherm Elektrische Anlagen Gmbh & Co. | Strahlungsheizung mit einer hohen infrarot-strahlungsleistung für bearbeitungskammern |
US6376992B1 (en) * | 1999-12-23 | 2002-04-23 | Godfrey Engineering, Inc. | Sealed beam high intensity discharge lamp system for aircraft |
EP1168417A1 (de) * | 2000-06-26 | 2002-01-02 | General Electric Company | Glühlampe mit einer IR-reflektierenden Beschichtung und einer vollständig reflektierenden Endbeschichtung |
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JP3899273B2 (ja) | 2002-02-01 | 2007-03-28 | 株式会社トゥルーウェル | ヒータ |
DE10204691C1 (de) * | 2002-02-06 | 2003-04-24 | Philips Corp Intellectual Pty | Quecksilberfreie Hochdruckgasentladungslampe und Beleuchtungseinheit mit einer solchen Hochdruckgasentladungslampe |
AU2003288668A1 (en) * | 2003-01-15 | 2004-08-10 | Koninklijke Philips Electronics N.V. | Lamp and lighting unit with interference coating and blocking device for improved uniformity of color temperature |
JP2004342417A (ja) * | 2003-05-14 | 2004-12-02 | Ushio Inc | 白熱ランプ |
DE102004002357A1 (de) | 2004-01-15 | 2005-08-11 | Heraeus Noblelight Gmbh | Verfahren zum Betreiben eines Infrarotstrahlerelements sowie Verwendung |
JP2005315447A (ja) * | 2004-04-27 | 2005-11-10 | Kyocera Corp | セラミックヒーターおよびグロープラグ |
DE102004051846B4 (de) | 2004-08-23 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Bauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung |
KR101016977B1 (ko) * | 2005-07-26 | 2011-02-25 | 쿄세라 코포레이션 | 납땜 구조체, 세라믹 히터 및 글로우 플러그 |
US20080036384A1 (en) * | 2006-08-09 | 2008-02-14 | Chowdhury Ashfaqul I | Lamp with high reflectance end coat |
DE202007017598U1 (de) * | 2007-12-18 | 2008-07-31 | Osram Gesellschaft mit beschränkter Haftung | Halogenglühlampe mit IRC-Beschichtung |
-
2008
- 2008-12-19 DE DE102008063677A patent/DE102008063677B4/de not_active Expired - Fee Related
-
2009
- 2009-11-13 KR KR1020117011334A patent/KR101285528B1/ko not_active IP Right Cessation
- 2009-11-13 BR BRPI0923019A patent/BRPI0923019A2/pt not_active IP Right Cessation
- 2009-11-13 US US13/140,609 patent/US8436523B2/en not_active Expired - Fee Related
- 2009-11-13 CN CN200980151902.2A patent/CN102257598B/zh not_active Expired - Fee Related
- 2009-11-13 EP EP09760728A patent/EP2359386A1/de not_active Withdrawn
- 2009-11-13 WO PCT/EP2009/008076 patent/WO2010069438A1/de active Application Filing
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---|---|---|---|---|
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013050158A1 (en) * | 2011-10-06 | 2013-04-11 | Sanofi Pasteur Sa | Heating device for rotary drum freeze-dryer |
CN104024777A (zh) * | 2011-10-06 | 2014-09-03 | 赛诺菲巴斯德有限公司 | 用于旋转滚筒冷冻干燥器的加热装置 |
JP2014528565A (ja) * | 2011-10-06 | 2014-10-27 | サノフィ パスツール ソシエテ アノニム | 回転ドラム式フリーズドライ乾燥機のための加熱装置 |
CN104024777B (zh) * | 2011-10-06 | 2016-05-11 | 赛诺菲巴斯德有限公司 | 用于旋转滚筒冷冻干燥器的加热装置 |
EA027028B1 (ru) * | 2011-10-06 | 2017-06-30 | Санофи Пастер Са | Нагревательное устройство для роторной барабанной лиофильной сушилки |
US10451345B2 (en) | 2011-10-06 | 2019-10-22 | Sanofi Pasteur Sa | Heating device for rotary drum freeze-dryer |
US11512898B2 (en) | 2011-10-06 | 2022-11-29 | Sanofi Pasteur Sa | Heating device for rotary drum freeze-dryer |
WO2017044674A1 (en) * | 2015-09-09 | 2017-03-16 | Watlow Electric Manufacturing Company | High temperature tubular heaters |
US10770318B2 (en) | 2015-09-09 | 2020-09-08 | Watlow Electric Manufacturing Company | High temperature tubular heaters |
JP7196234B2 (ja) | 2015-09-09 | 2022-12-26 | ワットロー・エレクトリック・マニュファクチャリング・カンパニー | 高温管状ヒーター |
Also Published As
Publication number | Publication date |
---|---|
BRPI0923019A2 (pt) | 2015-12-15 |
EP2359386A1 (de) | 2011-08-24 |
US20110248621A1 (en) | 2011-10-13 |
DE102008063677B4 (de) | 2012-10-04 |
CN102257598A (zh) | 2011-11-23 |
CN102257598B (zh) | 2015-05-20 |
KR101285528B1 (ko) | 2013-07-17 |
US8436523B2 (en) | 2013-05-07 |
DE102008063677A1 (de) | 2010-07-08 |
KR20110086710A (ko) | 2011-07-29 |
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