WO2010003621A1 - Electrolyte cuivre-étain amélioré et procédé de dépôt de couches de bronze - Google Patents
Electrolyte cuivre-étain amélioré et procédé de dépôt de couches de bronze Download PDFInfo
- Publication number
- WO2010003621A1 WO2010003621A1 PCT/EP2009/004879 EP2009004879W WO2010003621A1 WO 2010003621 A1 WO2010003621 A1 WO 2010003621A1 EP 2009004879 W EP2009004879 W EP 2009004879W WO 2010003621 A1 WO2010003621 A1 WO 2010003621A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrolyte
- acid
- phosphonic acid
- tin
- copper
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Definitions
- the invention relates to a copper-tin electrolyte which is free of toxic constituents such as cyanides.
- the invention relates to a corresponding electrolyte having a novel brightener system. It likewise encompasses a process for the deposition of decorative, white and yellow bronze layers on consumer goods and industrial articles using the electrolyte of the invention.
- Consumer goods or consumer articles as defined in the consumer articles regulations are finished with thin, oxidation-stable metal layers for decorative reasons and in order to prevent corrosion. These layers have to be mechanically stable and should not display any tarnishing or signs of wear even after prolonged use. Since 2001 , the sale of consumer goods coated with nickel-containing finishing alloys has no longer been permitted, or is possible only with observance of strict conditions, in Europe pursuant to EU directive 94/27/EC since nickel and nickel-containing metal layers are contact allergens. Bronze alloys in particular have become established as a replacement for nickel-containing finishing layers and these enable such mass-produced consumer goods to be finished inexpensively in barrel or rack electroplating processes to give allergen-free, attractive products.
- the solderability of the resulting layer and, if appropriate, its mechanical adhesive strength are the critical properties of the layer to be produced.
- the appearance of the layers is generally less important than their functionality.
- the decorative effect (shine and brightness) and also a long service life of the resulting layer with an essentially unchanged appearance are the important target parameters.
- EP 1 111 097 A2 describes an electrolyte comprising an organosulfonic acid and ions of tin and copper together with dispersants and brightening additives and also, if appropriate, antioxidants.
- EP 1 408 141 A1 describes a process for the electrochemical deposition of bronzes, in which an acidic electrolyte comprising tin and copper ions together with an alkylsulfonic acid and an aromatic, nonionic wetting agent.
- DE 100 46 600 A1 describes an alkylsulfonic or alkanolsulfonic acid-containing bath which comprises soluble tin and copper salts together with organic sulfur compounds, and a process using this bath.
- a significant disadvantage of such electrolytes produced on the basis of organosulfonic acids is their high corrosivity.
- baths based on methanesulfonic acids frequently have pH values below one.
- the high corrosivity of these baths limits their use range in respect of the substrate materials to be finished and requires the use of particularly corrosion-resistant working materials for carrying out the process.
- EP 1 146 148 A2 describes a cyanide-free copper-tin electrolyte based on diphosphoric acid, which in addition to the reaction product of an amine and an epihalohydrin in a molar ratio of 1 :1 contains a cationic surfactant.
- WO 2004/005528 describes a cyanide- free diphosphoric acid-copper-tin electrolyte which contains an additive composed of amine derivative, an epihalohydrin and a glicidyl ether compound. Electrolytes based on diphosphoric acid generally have very limited long-term stabilities and have to be renewed frequently.
- EP 1 001 054 A2 describes a tin-copper electrolyte which comprises a water-soluble tin salt, a water- soluble copper salt, an inorganic or organic acid or a water-soluble salt thereof and also one or more compounds from the group consisting of generally toxic thiourea or thiol derivatives.
- the inventive bath described there can additionally contain one or more compounds selected from the group consisting of carboxylic acids, lactones, phosphoric acid condensates, phosphonic acid derivatives or water-soluble salts of these or combinations thereof.
- WO2004/005528 describes a cyanide-free diphosphoric acid-copper-tin electrolyte which contains an additive composed of an amine derivative, an epichlorohydrin and a glycidyl ether compound in a molar ratio of 1 :0.5 - 2:0.1 - 5. It was an object of this document to further widen the current density range in which uniform deposition of the metals in a shiny layer can be achieved. It is explicitly mentioned that such deposition can only be attained when the additive added is made up of all three of the abovementioned components.
- a nontoxic electrolyte for the deposition of decorative bronze alloy layers on consumer goods and industrial articles which electrolyte contains the metals to be deposited in the form of water-soluble salts and further comprises one or more phosphonic acid derivatives as complexing agents and also a brighter system composed of a disulfide compound and a carbonate or hydrogencarbonate salt, completely surprisingly but nonetheless advantageously achieves the stated objects.
- the inventive electrolyte having a different composition than in the prior art makes it possible to obtain excellent electrolytic deposits of bronze layers. In particular, the good brightness and shine of the bronze layers can be obtained independently of their thickness.
- the alloy composition remains approximately constant over a wide current density range, which is in no way suggested by the prior art.
- the metals copper and tin or copper, tin and zinc to be deposited are present in dissolved form as their ions. They are preferably introduced in the form of water-soluble salts which are preferably selected from the group consisting of pyrophosphates, carbonates, hydroxide-carbonates, hydrogencarbonates, sulfites, sulfates, phosphates, nitrites, nitrates, halides, hydroxides, oxide-hydroxides, oxides or combinations thereof.
- the metals are used in the form of salts with ions selected from the group consisting of pyrophosphate, carbonate, hydroxide- carbonate, oxide-hydroxide, hydroxide and hydrogencarbonate.
- ions selected from the group consisting of pyrophosphate, carbonate, hydroxide- carbonate, oxide-hydroxide, hydroxide and hydrogencarbonate.
- Which salts are introduced in which amount into the electrolyte can determine the color of the resulting decorative bronze layers and can be adjusted according to customer requirements.
- the metals to be deposited are, as indicated, present in ionically dissolved form in the electrolyte for application of decorative bronze layers to consumer goods and industrial articles.
- the ion concentration of copper can be set in the range from 0.2 to 10 g/l, preferably from 0.3 to 4 g/l, of electrolyte
- the ion concentration of tin can be set in the range from 1.0 to 30 g/l, preferably 2 - 20 g/l, of electrolyte
- the ion concentration of zinc can be set in the range from 1.0 to 20 g/l, preferably 0 - 3 g/l, of electrolyte.
- the metals to be deposited are particularly preferably introduced as salt of a pyrophosphate, carbonate, hydrogencarbonate or hydroxide-carbonate in such a way that the resulting ion concentration is in the range from 0.3 to 4 gram of copper, from 2 to 20 gram of tin and from 0 to 3 gram of zinc, in case per liter of electrolyte.
- the electrolyte of the invention has some concentration of carbonate or hydrogencarbonate ions. These can be present in the electrolyte in the form of preferably soluble salts selected from the group consisting of alkali metal and alkaline earth metal salts, in particular sodium or potassium carbonate or sodium or potassium hydrogencarbonate.
- alkali metal and alkaline earth metal salts in particular sodium or potassium carbonate or sodium or potassium hydrogencarbonate.
- the embodiment in which the metals which are used and are to be deposited are also added either completely or partly in the form of carbonates or hydrogencarbonates to the electrolyte is preferred.
- the embodiment in which only copper is present as carbonate in the bath formulation is advantageous. Tin and zinc and also, during operation of the bath, copper are then advantageously added as pyrophosphate.
- Addition of the abovementioned salts enables a concentration of carbonate or hydrogencarbonate ions in the electrolyte of from 0.5 to 100 g/l of electrolyte to be set.
- the concentration is particularly preferably in the range from 5 to 40 g/l and very particularly preferably from 15 to 30 g/l.
- disulfide compounds As further components of the electrolyte, mention may be made of disulfide compounds. These can advantageously be selected from the group consisting of substituted and unsubstituted bisalkyl or bis(hetero)aryl or alkyl (hetero)aryl disulfides, in particular those of the general formula (I),
- R and R' can each be, independently of one another, substituted or unsubstituted (C 1 - C 8 )-alkyl, (C 3 -C 6 )-cycloalkyl, (C 7 -C 19 )-alkylaryl, (C 6 -C 18 )-aryl, (C 7 -C 19 )-aralkyl, (C 3 -C 18 )- heteroaryl, (C 4 -C 19 )-alkylheteroaryl, (C 4 -C 19 )-heteroaralkyl.
- R and R' can also be joined to form a ring.
- R and R' are in principle all groups of substituents which a person skilled in the art would consider for this purpose. These are, in particular, substituents selected from the group consisting of amine radicals, nitro groups, hydroxyl radicals, halide radicals, acid radicals such as carboxylic acids, sulfonic acids and phosphonic acids.
- Particularly advantageous disulfide compounds are compounds selected from the group consisting of 2,2 ' -dithiodipyridine, 4,4 ⁇ -dithiodipyridine, 6,6 ' -dithiodinicotinic acid, bis(4-aminophenyl) disulfide, 2,2 ⁇ -dithiosalicylic acid, D-cystine, L-cystine, DL-cystine, 2,2 * -dithio(bis)benzothiazole, 2,2 ' -dithiobis(5-nitropyridine).
- the compound bis-(3-sodium sulfopropyl) disulfide referred to as SPS for short.
- the disulfide compounds are preferably used in an amount of from 0.01 mg per liter to 10.0 g per liter of electrolyte. Particular preference is given to use in a concentration range from 0.5 mg per liter to 7.5 g per liter of electrolyte.
- the disulfide compound, in particular the abovementioned SPS is very particularly preferably used in a concentration range from 0.1 mg per liter to 5 g per liter in the electrolyte.
- the application of the decorative bronze layers to consumer goods and industrial articles using the electrolyte of the invention is effected, as indicated, in an electroplating process. It is important here that the metals to be deposited are kept permanently in solution during the process, regardless of whether electroplating is carried out in a continuous process or in a batch process. To ensure this, the electrolyte of the invention contains phosphonic acids as complexing agents.
- Particular preference is given to using one or more compounds selected from the group consisting of aminotris(methylenephosphonic acid) ATMP 1 diethylenetriamine- penta(methylenphosphonic acid) DTPMP, ethylenediaminetetra(methylenephosphonic acid) EDTMP, 1-hydroxyethane(1 ,1 -diphosphonic acid) HEDP, hydroxyethylamino- di(methylenephosphonic acid) HEMPA, hexamethylenediaminetetra(methylphosphonic acid) HDTMP, salts derived therefrom and condensates derived therefrom, or combinations thereof.
- aminotris(methylenephosphonic acid) ATMP 1 diethylenetriamine- penta(methylenphosphonic acid) DTPMP ethylenediaminetetra(methylenephosphonic acid) EDTMP
- 1-hydroxyethane(1 ,1 -diphosphonic acid) HEDP 1-hydroxyethane(1 ,1 -diphosphonic acid) HEMPA
- HEMPA
- the pH of the electrolyte is in the range from 6 to 14 required for the electroplating application. Preference is given to a range of 8 - 12 and very particular preference to about 10.
- the electrolyte can contain further organic additives which assume functions as complexing ligands, brighteners, wetting agents or stabilizers.
- the electrolyte of the invention can also dispense with the use of cationic surfactants.
- the addition of further brighteners and wetting agents is only preferred in the case of the appearance of the decorative bronze layers to be deposited having to meet special requirements. They make it possible to adjust not only the color of the bronze layers, which depends critically on the ratio of the metals to be deposited, but also the shine of the layers in all gradations from matt silk to high gloss.
- R is substituted or unsubstituted (CrC 8 )-alkyl, (Ca-C ⁇ J-cycloalkyl, (C 7 -C 19 )-alkylaryl, (Ce-
- R and R' are in principle all groups of substituents which a person skilled in the art would consider for this purpose. These are, in particular, substituents selected from the group consisting of amine radicals, nitro groups, hydroxyl radicals, halide radicals, acid radicals such as carboxylic acids, sulfonic acids and phosphonic acids. This applies analogously to the corresponding salts, in particular salts with cations of the alkali metals or alkaline earth metals.
- Preferred compounds are those selected from the group consisting of 3-mercapto-1- propanesulfonic acid Na salt, 3-(2-benzothiazolyl-2-mercapto)propanesulfonic acid Na salt, saccharin-N-propylsulfonate Na salt, 3-sulfopropyl N,N-dimethyl dithiocarbamate Na salt, 1 -propanesulfonic acid and 3[(ethoxythioxomethyl)thio] K salt.
- disulfide required for the brightener system and the sulfonic acid being present in one compound as is the case, for example, for bis-(3-sodium sulfopropyl) disulfide.
- citric acid as carboxylic acid
- citric acid Die galvanische Abscheidung von Zinn und Zinnlegleiteren, Saulgau 1993, page 156
- Betaines to be used can preferably be found in WO2004/005528 or in Jordan, Manfred (Die galvanische Abscheidung von Zinn und Zinnlegleiteren, Saulgau 1993, page 156). Particular preference is given to those presented in EP636713. Further additives may be found in the literature (Jordan, Manfred, Die galvanische Abscheidung von Zinn und Zinnlegleiteren, Saulgau 1993).
- pyrophosphate ions which can be present in the electrolyte and can advantageously be introduced into the electrolyte as anions of the metal salts to be deposited.
- the embodiment in which the pyrophosphate ions are added in the form of salts of other metals, in particular of alkali and alkaline earth metals in the electrolyte is likewise possible.
- the amount of pyrophosphate ions can be set in a precise manner by a person skilled in the art. It is limited by the fact that the concentration in the electrolyte should be above a minimum amount in order to be able still to bring about the effect discussed to a sufficient extent.
- the amount of pyrophosphate to be used is guided by economic aspects. In this context, reference may be made to EP1146148 and the relevant information presented there.
- the amount of pyrophosphate to be used in the electrolyte is preferably 1 - 400 g/l. Particular preference is given to using an amount of 2 - 200 g/l of electrolyte.
- the pyrophosphate can, if it is, as indicated, not introduced as salt constituent of the metals to be deposited, be used as sodium or potassium diphosphate or as H 2 P 2 O 7 in combination with a base of the alkali or alkaline earth metals. Preference is given to using K 2 P 2 O 7 for this purpose.
- the electrolyte of the invention is free of hazardous materials classified as toxic (T) or very toxic (T + ). No cyanides, no thiourea derivatives or similarly toxic materials are present.
- the nontoxic electrolyte of the invention is particularly suitable for the electrochemical application of decorative bronze layers to consumer goods and industrial articles. It can be used in barrel, rack, belt or reel to reel electroplating plants.
- the consumer goods and industrial articles to be coated dip into the nontoxic electrolyte of the invention and form the cathode.
- the electrolyte is preferably maintained in the range from 20 to 70 0 C. It is possible to set a current density which is in the range from 0.01 to 100 ampere per square decimeter [A/dm 2 ] and depends on the type of plating plant. In barrel plating plants, current densities in the range from 0.05 to 0.75 A/dm 2 are preferred, more preferably from 0.1 to 0.5 A/dm 2 and very particularly preferably about 0.3 A/dm 2 . In rack plating processes, current densities in the range from 0.2 to 10.0 A/dm 2 are preferably chosen, particularly preferably from 0.2 to 5.0 A/dm 2 and very particularly preferably from 0.25 to 1.0 A/dm 2 .
- anodes can be employed when using the nontoxic electrolyte of the invention.
- Soluble or insoluble anodes are suitable, as is the combination of soluble and insoluble anodes.
- soluble anodes preference is given to using anodes made of a material selected from the group consisting of electrolytic copper, phosphorus-containing copper, tin, tin- copper alloy, zinc-copper alloy and zinc-tin-copper alloy. Particular preference is given to combinations of different soluble anodes made of these materials, and also combinations of soluble tin anodes with insoluble anodes.
- insoluble anodes preference is given to using anodes made of a material selected from the group consisting of platinized titanium, graphite, iridium-transition metal mixed oxide and special carbon material ("Diamond Like Carbon", DLC) or combinations of these anodes.
- DLC Diamond Like Carbon
- mixed oxide anodes composed of iridium-ruthenium mixed oxide, iridium-ruthenium-titanium mixed oxide or iridum- tantalum mixed oxide.
- insoluble anodes are used, this is a particularly preferred embodiment of the process when the substrates to be provided with decorative bronze layers, which represent the cathode, are separated from the insoluble anode by an ion-exchange membrane so as to form a cathode space and an anode space.
- an aqueous solution containing only a conductive salt is preferably present in the anode space.
- the disadvantage of additive-free phosphonate-based copper-tin electrolytes is the restriction to a narrow current density range and the lack of shine and the lower brightness of the layers deposited.
- the novel brightener system avoids these disadvantages in the phosphonate-based electrolyte system. Only when the electrolyte of the invention is used is the deposition of bright and shiny layers made possible over a wide current density range. None of the known cyanide-free substitute processes (pyrophosphate, phosphonate, alkylsulfonate) achieves the properties of cyanide- containing baths (particularly in the case of shine and brightness, also only to an extent).
- the use of the brightener combination according to the invention for the first time makes it possible to achieve the shine and brightness which is comparable to the cyanide-containing electrolytes of the prior art and is thus significantly better than in all known cyanide-free substitute processes.
- the novel brightener system enables the electrolyte to be operated at higher copper contents.
- the combination of the compounds used, in particular those of the brightener system comprising carbonate ions and disulfide compounds, is critical here. In the presence of carbonate ions, even very small amounts of organic disulfidates influence copper-tin alloy formation. In contrast to additive-free baths, a largely constant alloy composition is obtained over a wider current density range as a result of the addition of the brightener system (fig. 1 - comparison of copper-tin electrolyte based on phosphonic acid with and without brightener system). In the case of additive- free baths, tin is deposited preferentially at higher current densities, which leads to a loss of shine of the layers.
- (CrC 8 )-alkyl is an alkyl radical having from 1 to 8 carbon atoms. This can be branched as desired or in the case of (C 3 -C 6 )-cycloalkyl be cyclic. This is, in particular, radicals such as methyl, ethyl, propyl, isopropyl, butyl, sec- butyl, isobutyl, pentyl, hexyl, cyclopropyl, cyclopentyl, cyclohexyl etc.
- (C 6 -Ci 8 )-Arryl is an aromatic system which is made up entirely of from 6 to 18 carbon atoms. This is, in particular, selected from the group consisting of phenyl, naphthyl, anthracenyl etc.
- (C 7 -Ci 9 )-Alkylaryl radicals are radicals which have a (Ci-C 8 )-alkyl radical on the (C ⁇ - Ci 8 )-aryl radical.
- (C 7 -Ci 9 )-Aralkyl radicals are radicals which have a (C 6 -Ci 8 )-aryl radical on a (C 1 -C 8 )- alkyl radical, via which the radical is bound to the molecule concerned.
- a (C 3 -C 18 )-heteroaryl radical is an aromatic system which has at least three carbon atoms.
- further heteroatoms are present in the aromatic system. These are preferably nitrogen and/or sulfur.
- Such heteroaromatics are described, for example, in the book Bayer-Walter, Lehrbuch der Organischen Chemie, S. Hirzel Verlag, 22nd edition, p. 703 ff .
- (C 4 -Ci 9 )-alkylheteroaryl is a (C 3 -C 18 )-heteroaryl radical which is supplemented by a (Ci-C 8 )-alkyl substituent.
- the bonding to the molecule under consideration is via the heteroaromatic here.
- (C 4 -Ci 9 )-heteroaralkyl is a (C 3 -C 18 )-heteroaryl which is bound to the molecule concerned via a (Ci-C 8 )-alkyl substituent.
- halide encompasses chloride, bromide and fluoride.
- Alkyl(hetero)aryl is alkylaryl and alkylheteroaryl.
- Barrel deposition of white bronze layers was carried out using a nontoxic electrolyte according to the invention containing 100 g/l of ethylenediaminetetra(methylenephosphonic acid) EDTMP, 1.5 g/l of copper as copper hydroxide carbonate, 5 g/l of tin as tin pyrophosphate, 2 g/l of zinc as zinc pyrophosphate, 10 ml/I of methanesulfonic acid (70%), 20 g/l of potassium hydrogencarbonate and 10 mg/l of bis(3-sodium sulfopropyl) disulfide.
- EDTMP ethylenediaminetetra(methylenephosphonic acid)
- the electrolyte was maintained at 50 0 C.
- a set current density of from 0.05 to 0.5 A/dm 2 optically uniform, high-shine bronze layers having the color typical of white bronze were obtained in a drum plating apparatus.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT09776985T ATE549434T1 (de) | 2008-07-10 | 2009-07-06 | Verbesserter kupfer-zinn-elektrolyt und verfahren zur auftragung von zinn-bronzeschichten |
PL09776985T PL2310558T3 (pl) | 2008-07-10 | 2009-07-06 | Ulepszony elektrolit miedziowo-cynowy i sposób osadzania warstw cyny i brązu |
JP2011517017A JP2011527381A (ja) | 2008-07-10 | 2009-07-06 | 改良された銅−錫電解液及び青銅層の析出方法 |
CN2009801264856A CN102089466B (zh) | 2008-07-10 | 2009-07-06 | 改良的铜-锡电解液和沉积青铜层的方法 |
EP09776985A EP2310558B1 (fr) | 2008-07-10 | 2009-07-06 | Electrolyte cuivre-étain amélioré et procédé de dépôt de couches de étain-bronze |
US13/003,209 US20110174631A1 (en) | 2008-07-10 | 2009-07-06 | Copper-tin electrolyte and process for the deposition of bronze layers |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008032398.5 | 2008-07-10 | ||
DE102008032398A DE102008032398A1 (de) | 2008-07-10 | 2008-07-10 | Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2010003621A1 true WO2010003621A1 (fr) | 2010-01-14 |
Family
ID=41258161
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/004879 WO2010003621A1 (fr) | 2008-07-10 | 2009-07-06 | Electrolyte cuivre-étain amélioré et procédé de dépôt de couches de bronze |
Country Status (10)
Country | Link |
---|---|
US (1) | US20110174631A1 (fr) |
EP (1) | EP2310558B1 (fr) |
JP (1) | JP2011527381A (fr) |
KR (1) | KR20110031183A (fr) |
CN (1) | CN102089466B (fr) |
AT (1) | ATE549434T1 (fr) |
DE (1) | DE102008032398A1 (fr) |
PL (1) | PL2310558T3 (fr) |
TW (1) | TW201014935A (fr) |
WO (1) | WO2010003621A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013226297B3 (de) * | 2013-12-17 | 2015-03-26 | Umicore Galvanotechnik Gmbh | Wässriger, cyanidfreier Elektrolyt für die Abscheidung von Kupfer-Zinn- und Kupfer-Zinn-Zink-Legierungen aus einem Elektrolyten und Verfahren zur elektrolytischen Abscheidung dieser Legierungen |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102010044551A1 (de) * | 2010-09-07 | 2012-03-08 | Coventya Gmbh | Anode sowie deren Verwendung in einem alkalischen Galvanikbad |
DE102011121799B4 (de) * | 2011-12-21 | 2013-08-29 | Umicore Galvanotechnik Gmbh | Elektrolyt und Verfahren zur elektrolytischen Abscheidung von Cu-Zn-Sn-Legierungsschichten und Verfahren zur Herstellung einer Dünnschichtsolarzelle |
DE102012008544A1 (de) | 2012-05-02 | 2013-11-07 | Umicore Galvanotechnik Gmbh | Verchromte Verbundwerkstoffe ohne Nickelschicht |
AT514818B1 (de) * | 2013-09-18 | 2015-10-15 | W Garhöfer Ges M B H Ing | Abscheidung von Cu, Sn, Zn-Beschichtungen auf metallischen Substraten |
CN103789803B (zh) * | 2014-01-13 | 2016-04-27 | 孙松华 | 一种无氰铜锡合金电镀液及其制备方法 |
JP5938426B2 (ja) * | 2014-02-04 | 2016-06-22 | 株式会社豊田中央研究所 | 電気めっきセル、及び、金属皮膜の製造方法 |
AR100422A1 (es) * | 2014-05-15 | 2016-10-05 | Nippon Steel & Sumitomo Metal Corp | Solución para deposición para conexión roscada para un caño o tubo y método de producción de la conexión roscada para un caño o tubo |
CN106521574B (zh) * | 2016-12-05 | 2018-10-26 | 浙江工业大学 | 一种适用于宽pH和宽电流密度范围的无氰镀铜电镀液及其制备方法 |
US11274375B2 (en) * | 2016-12-28 | 2022-03-15 | Atotech Deutschland Gmbh | Tin plating bath and a method for depositing tin or tin alloy onto a surface of a substrate |
CN110344079B (zh) * | 2019-08-16 | 2021-06-08 | 广东超华科技股份有限公司 | 一种降低电解铜箔电解液中铁离子浓度的装置及方法 |
RU2762501C1 (ru) * | 2021-05-17 | 2021-12-21 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) | Щелочной электролит для электролитического осаждения желтой оловянной бронзы |
DE202021004169U1 (de) | 2021-07-02 | 2022-12-07 | Umicore Galvanotechnik Gmbh | Bronzeschicht als Edelmetallersatz in Smart Cards |
DE102021117095A1 (de) | 2021-07-02 | 2023-01-05 | Umicore Galvanotechnik Gmbh | Bronzeschichten als Edelmetallersatz |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4347108A (en) * | 1981-05-29 | 1982-08-31 | Rohco, Inc. | Electrodeposition of copper, acidic copper electroplating baths and additives therefor |
WO2004027120A1 (fr) * | 2002-09-17 | 2004-04-01 | Omg Galvanotechnik Gmbh | Couches noires |
US20040249177A1 (en) * | 2003-06-04 | 2004-12-09 | Shipley Company, L.L.C. | Leveler compounds |
US20050067297A1 (en) * | 2003-09-26 | 2005-03-31 | Innovative Technology Licensing, Llc | Copper bath for electroplating fine circuitry on semiconductor chips |
US20060231409A1 (en) * | 2005-03-31 | 2006-10-19 | Tdk Corporation | Plating solution, conductive material, and surface treatment method of conductive material |
WO2008098666A1 (fr) * | 2007-02-14 | 2008-08-21 | Umicore Galvanotechnik Gmbh | Électrolyte cuivre-étain et procédé de dépôt de couches de bronze |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3833486A (en) * | 1973-03-26 | 1974-09-03 | Lea Ronal Inc | Cyanide-free electroplating |
US4289286A (en) * | 1978-10-16 | 1981-09-15 | East/West Industries, Inc. | Replaceable harness bracket assembly |
US4356067A (en) * | 1979-06-13 | 1982-10-26 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
US4389286A (en) * | 1980-07-17 | 1983-06-21 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
US4417956A (en) * | 1980-07-17 | 1983-11-29 | Electrochemical Products, Inc. | Alkaline plating baths and electroplating process |
CN1004010B (zh) * | 1986-07-11 | 1989-04-26 | 南京大学 | 无氰仿金电镀液 |
DE4324995C2 (de) * | 1993-07-26 | 1995-12-21 | Demetron Gmbh | Cyanidisch-alkalische Bäder zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
SG68083A1 (en) * | 1997-10-30 | 1999-10-19 | Sung Soo Moon | Tin alloy plating compositions |
TW577938B (en) | 1998-11-05 | 2004-03-01 | Uyemura C & Co Ltd | Tin-copper alloy electroplating bath and plating process therewith |
JP2001181889A (ja) * | 1999-12-22 | 2001-07-03 | Nippon Macdermid Kk | 光沢錫−銅合金電気めっき浴 |
JP3455712B2 (ja) * | 2000-04-14 | 2003-10-14 | 日本ニュークローム株式会社 | 銅−スズ合金めっき用ピロリン酸浴 |
US7179362B2 (en) * | 2000-09-20 | 2007-02-20 | Dr.-Ing. Max Schlotter Gmbh & Co.Kg | Electrolyte and method for depositing tin-copper alloy layers |
DE10046600C2 (de) | 2000-09-20 | 2003-02-20 | Schloetter Fa Dr Ing Max | Elektrolyt und Verfahren zur Abscheidung von Zinn-Kupfer-Legierungsschichten und Verwendung des Elektrolyten |
US6645364B2 (en) * | 2000-10-20 | 2003-11-11 | Shipley Company, L.L.C. | Electroplating bath control |
JP4249438B2 (ja) * | 2002-07-05 | 2009-04-02 | 日本ニュークローム株式会社 | 銅―錫合金めっき用ピロリン酸浴 |
ES2531163T3 (es) * | 2002-10-11 | 2015-03-11 | Enthone | Procedimiento y electrolito para la deposición galvánica de bronces |
JP4441726B2 (ja) * | 2003-01-24 | 2010-03-31 | 石原薬品株式会社 | スズ又はスズ合金の脂肪族スルホン酸メッキ浴の製造方法 |
EP1870495A1 (fr) * | 2006-06-21 | 2007-12-26 | Atotech Deutschland Gmbh | Bain aqueux alcalin, exempt de cyanide, pour la déposition galvanique de couches de Zinc et alliages de Zinc |
-
2008
- 2008-07-10 DE DE102008032398A patent/DE102008032398A1/de not_active Ceased
-
2009
- 2009-07-03 TW TW098122653A patent/TW201014935A/zh unknown
- 2009-07-06 CN CN2009801264856A patent/CN102089466B/zh not_active Expired - Fee Related
- 2009-07-06 AT AT09776985T patent/ATE549434T1/de active
- 2009-07-06 US US13/003,209 patent/US20110174631A1/en not_active Abandoned
- 2009-07-06 EP EP09776985A patent/EP2310558B1/fr not_active Not-in-force
- 2009-07-06 KR KR1020117000324A patent/KR20110031183A/ko not_active Application Discontinuation
- 2009-07-06 WO PCT/EP2009/004879 patent/WO2010003621A1/fr active Application Filing
- 2009-07-06 JP JP2011517017A patent/JP2011527381A/ja not_active Withdrawn
- 2009-07-06 PL PL09776985T patent/PL2310558T3/pl unknown
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4347108A (en) * | 1981-05-29 | 1982-08-31 | Rohco, Inc. | Electrodeposition of copper, acidic copper electroplating baths and additives therefor |
WO2004027120A1 (fr) * | 2002-09-17 | 2004-04-01 | Omg Galvanotechnik Gmbh | Couches noires |
US20040249177A1 (en) * | 2003-06-04 | 2004-12-09 | Shipley Company, L.L.C. | Leveler compounds |
US20050067297A1 (en) * | 2003-09-26 | 2005-03-31 | Innovative Technology Licensing, Llc | Copper bath for electroplating fine circuitry on semiconductor chips |
US20060231409A1 (en) * | 2005-03-31 | 2006-10-19 | Tdk Corporation | Plating solution, conductive material, and surface treatment method of conductive material |
WO2008098666A1 (fr) * | 2007-02-14 | 2008-08-21 | Umicore Galvanotechnik Gmbh | Électrolyte cuivre-étain et procédé de dépôt de couches de bronze |
Non-Patent Citations (3)
Title |
---|
"COUNCIL DIRECTIVE 67/548/EEC", OFFICIAL JOURNAL OF THE EUROPEAN COMMUNITIES, no. 196, 16 August 1967 (1967-08-16), XP002557881 * |
CHEMICAL ABSTRACTS, 3 April 1989 (1989-04-03), XP000062520, ISSN: 0009-2258 * |
WILHELM DOMKE: "Werkstoffkunde und Werkstoffprüfung passage", WERKSTOFFKUNDE UND WERKSTOFFPR}FUNG, CORNELSEN VERLAGSGESELLSCHAFT, BIELEFELD, DE, 1 January 1986 (1986-01-01), pages 4 - 5,235, XP002448279 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013226297B3 (de) * | 2013-12-17 | 2015-03-26 | Umicore Galvanotechnik Gmbh | Wässriger, cyanidfreier Elektrolyt für die Abscheidung von Kupfer-Zinn- und Kupfer-Zinn-Zink-Legierungen aus einem Elektrolyten und Verfahren zur elektrolytischen Abscheidung dieser Legierungen |
WO2015091201A1 (fr) | 2013-12-17 | 2015-06-25 | Umicore Galvanotechnik Gmbh | Dépôt d'alliages cuivre-étain et cuivre-étain-zinc à partir d'un électrolyte |
EP3084042B1 (fr) * | 2013-12-17 | 2018-11-07 | Umicore Galvanotechnik GmbH | Dépôt d'alliages cuivre-étain et cuivre-étain-zinc à partir d'un électrolyte |
Also Published As
Publication number | Publication date |
---|---|
JP2011527381A (ja) | 2011-10-27 |
US20110174631A1 (en) | 2011-07-21 |
KR20110031183A (ko) | 2011-03-24 |
DE102008032398A1 (de) | 2010-01-14 |
CN102089466B (zh) | 2012-11-07 |
EP2310558B1 (fr) | 2012-03-14 |
TW201014935A (en) | 2010-04-16 |
PL2310558T3 (pl) | 2012-09-28 |
EP2310558A1 (fr) | 2011-04-20 |
ATE549434T1 (de) | 2012-03-15 |
CN102089466A (zh) | 2011-06-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2310558B1 (fr) | Electrolyte cuivre-étain amélioré et procédé de dépôt de couches de étain-bronze | |
US8211285B2 (en) | Copper-tin electrolyte and method for depositing bronze layers | |
EP1874982B1 (fr) | Methode d'electrodeposition de bronzes | |
CN105829583B (zh) | 从电解质中沉积铜-锡合金和铜-锡-锌合金 | |
US20110089043A1 (en) | Modified copper-tin electrolyte and process for the deposition of bronze layers | |
US20130140185A1 (en) | Electrolyte and process for the deposition of copper-tin alloy layers | |
JP2012504701A (ja) | 向上した白色度を有するパラジウム−ロジウム層の堆積方法 | |
US20190071789A1 (en) | Additive for silver-palladium alloy electrolytes | |
JP2013534276A5 (fr) | ||
US8211286B2 (en) | Electrolyte and method for depositing decorative and technical layers of black ruthenium | |
KR20180083429A (ko) | SnAg 합금 도금액 | |
WO2013092312A1 (fr) | Dépôt d'alliages cuivre-étain-zinc à partir d'un électrolyte | |
US20160194775A1 (en) | Galvanic bath | |
EP2405034A1 (fr) | Bain d'électro-placage d'alliage de cuivre et de zinc et procédé de placage au moyen de celui-ci |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200980126485.6 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09776985 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 20117000324 Country of ref document: KR Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 2011517017 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2009776985 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13003209 Country of ref document: US |